TWI600524B - A surface patterning method by imprint - Google Patents

Description

Method of forming a surface pattern by imprinting

The invention relates to a method for fabricating a surface pattern, in particular to a embossing with a simple structure to form a complex structure pattern, such as a long range order structure surface pattern, short-range ordered quasicrystal Short range order quasi-crystal structure surface pattern, and a method of surface pattern of nature-like/biomimetic structure.

Surface patterns are used in a wide range of applications. The most notable examples are applied to solar cells, light-emitting diodes and other components with various surface patterns, such as photonic crystal structures or photonic crystal structures, to enhance light incidence. Rate, or light extraction rate.

At present, there are two ways to form a surface pattern on an object, for example, a surface pattern formed by forming cerium oxide on a sapphire substrate: one is to produce light having a pattern corresponding to a desired surface pattern to be formed. The hood is then subjected to a photolithography process and an etching process, and the pattern of the reticle is transferred onto the sapphire substrate to obtain a desired surface pattern; the other is A mold having a pattern corresponding to the surface pattern is prepared, and then a nanoimprint lithography process is performed to transfer the pattern of the mold to the sapphire substrate. The required surface pattern.

Although the above two methods can obtain the desired surface pattern, the common disadvantage is that the pattern of the reticle or the pattern of the mold directly determines the surface pattern formed by transfer or transfer, that is, Each mask or mold can only be transferred or stamped to form a corresponding single surface pattern, and when the required surface pattern becomes more complicated, the design and production of the mask or mold will be more Difficulties, production costs will also be greatly improved, especially, when the surface pattern to be produced is a pattern with high symmetry or close to natural morphology, such as long-range ordered lattice structure surface pattern, short-range ordered quasi-lattice structure surface Patterns, and the appearance of natural structural surface patterns, the design of the mask or mold, the difficulty of the production, as well as the overall production costs will be greatly improved, and even some natural patterns can only be completed with complex and costly technology. Small-size exhibits are not able to achieve the actual commercial mass production.

Accordingly, it is an object of the present invention to provide a method for producing a complicated surface pattern in a simple and low-cost manner by providing an imprint process using a mold having a simple structure.

Thus, the method of forming a surface pattern by imprinting of the present invention comprises a mold establishing step, a base pattern forming step, and a secondary pattern forming step.

The mold establishing step is to form a mold core by forming a plurality of structural points on a mold substrate with a spacing distribution and a size of the self-pattern not exceeding the micrometer scale.

The base pattern forming step performs a nanoimprint lithography process using the block mold to form a first pattern structure corresponding to the plurality of structural points on a substrate.

The secondary pattern forming step is performed on the substrate of the first pattern structure in which the plurality of structure dots are formed on the block, and the mold core is rotated according to a selected origin and a substrate having the first pattern structure formed on the block, and then Performing a nanoimprint lithography process on the rotated mold core, and forming a second pattern structure corresponding to the plurality of structural points on the substrate on which the block is formed with the first pattern structure, The first and second pattern structures form a surface pattern on the block substrate that is derived from a plurality of structural points of the mold core.

Meanwhile, the method of the present invention for forming a surface pattern by imprinting may further include a re-patterning step. The re-pattern forming step re-rotates the block mold core at the same origin and the same rotation mode on the substrate on which the first and second pattern structures are formed, and performs the nanometer with the re-rotating mold block. Embossing a lithography process, and forming a third pattern structure corresponding to the plurality of structural points on the substrate on which the first and second pattern structures are formed, the first, second, and third pattern structures That is, a surface pattern derived from a plurality of structural points of the mold core is formed on the block substrate.

Further, in the present invention, a method of forming a surface pattern by imprinting may be carried out, and a re-pattern forming step different from the above embodiment may be implemented. The re-patterning step further determines a derivative origin and a derivative plane change pattern having a predetermined mathematical relationship with the origin and the mold change pattern on the substrate on which the first and second pattern structures are formed (ie, Find a corresponding reference point on the substrate (ie, the derived origin), and use the reference point as the origin to perform plane coordinate changes between the mold and the existing structural pattern, including rotation and displacement, and use the derivative origin And changing the relative position of the mold core to the substrate on which the first and second pattern structures are formed, and performing the nanoimprint lithography process on the mold core after changing the relative position of the pattern Forming the first and second pattern structures on the substrate, and forming a third pattern structure corresponding to the first and second pattern structures corresponding to the structure points, the first, second, and third The pattern structure forms a surface pattern on the substrate that is derived from a plurality of structural points of the mold core.

The invention has the advantages of providing a simple structure of the mold core, matching with the origin and the change of the plane position of the mold, thereby producing a complex long-range ordered lattice structure surface pattern, short-range ordered quasicrystal A lattice structure surface pattern, and a method of patterning a surface pattern of a natural state structure.

The above and other technical contents, features and advantages of the present invention will be apparent from the following detailed description of FIG.

Before the present invention is described in detail, it is noted that in the following description, similar elements are denoted by the same reference numerals.

Referring to FIG. 1, a first preferred embodiment of a method for forming a surface pattern by imprinting of the present invention includes a mold establishing step 11, a base pattern forming step 12, and a secondary pattern forming step 13 on an object. A surface pattern is formed, for example, a surface pattern formed by forming ceria as a material on a substrate.

Referring to FIG. 2, a mold-making step 11 is first performed to form a mold core 2 on a mold substrate 21 by a lithography process, and a plurality of structural points 22 having a size of not more than a micrometer are formed. Each of the at least three structural points 22 constitutes a embossed pattern unit 23 of substantially geometric geometry, in this example, a rectangular pattern of four structural points 22 as shown by the phantom line frame in FIG. 2 is an embossed pattern. Unit 23.

Referring to FIG. 1 and FIG. 3, a basic pattern forming step 12 is performed, and the block embossing 2 is used to perform, for example, hot embossing nano-imprint lithography and illuminating nano embossing lithography. A nano-imprint lithography process, or a nano-imprint lithography process, such as a nano-imprint lithography process, to form a first pattern structure of a plurality of structural dots on a substrate 3. (White dot), in detail, this step is to press the mold core 2 produced in the mold establishing step 11 onto the substrate 3 which has been rotated, for example, imprinted with photoresist, by applying pressure. A plurality of structural dots 22 of the core 2 are patterned on the photoresist, and then the photoresist pattern structure is transferred to the substrate 3 by a process such as O ₂ plasma, RIE etching, etc., and the substrate 3 is formed from the block. A first pattern structure 31 of a plurality of structural points of a plurality of structural points 22 of the mold core 2. Nano-imprint lithography processes such as hot-pressed nanoimprint lithography process, illumination-type nanoimprint lithography process, and contact-type nanoimprint lithography process are well known in the industry, and this is not the case. The focus of the invention is not detailed here, and the details of the implementation of each nanoimprint lithography process are not described here.

Referring to FIG. 1 , FIG. 4 and FIG. 5 , finally, a secondary pattern forming step 13 is performed on the substrate 3 on which the first pattern structure 31 is formed, and the mold core 2 is formed and formed according to a selected origin O. The relative position of the substrate 3 of the first pattern structure 31 is subjected to a nanoimprint lithography process by using the mold 2 after changing the relative position of the pattern, and is formed on the substrate 3 on which the first pattern structure 31 is formed. The first pattern structure 31 belongs to a second pattern structure 32 (hatched dot) of a plurality of structural points of the same plane, and the first and second pattern structures 31, 32 are a plurality of structural points 22 derived from the mold core 2. Surface pattern.

It should be noted that the selected origin O may be the origin, the center point of one of the imprint pattern units 23, or any selected point in the imprint pattern unit 23, and the plane change pattern of the mold core 2 is also not limited. In this example, the center point corresponding to the imprint pattern unit 23 is used as the origin O, and the pattern is imprinted according to the origin O relative to the substrate by 45° to form the second portions. The pattern structure 32 is made to correspond to the first pattern structure 31 formed by each of the imprint pattern units 23, and the second pattern structure 32, 33 formed corresponding to each of the imprint pattern units 23 after changing the position of the mold core 2, Together form a surface pattern that is regularly distributed.

Referring to the attachments 1, 2, and 3, the first preferred embodiment of the present invention is applied to form a photonic crystal pattern structure on the illuminating diode dies, and each structural point on the mold core is a convex column. Type, the column diameter is 350 nm, the column height is 150 nm, and the structural points are arranged at a pitch of 700 nm, and then, the nano-imprinting machine is combined with the mold core to perform hot pressing type nanoimprint lithography process to form a hole shape. a first pattern structure (as shown in Annex 1, wherein the green dot is the first pattern structure formed), and then repeating the above process at the same origin and rotating the mold core 45° to form a second pattern structure having a hole shape (As shown in Annex 2, where the green dot is the first pattern structure formed and the red dot is the second pattern structure), the surface pattern formed by the first and second pattern structures is highly symmetrical. The surface pattern further completes the light-emitting diode crystal having a photonic crystal structure; the light-emitting light pattern of the completed light-emitting diode crystal is as shown in Annex 3, and it can be verified that the present invention can be easily applied to the light-emitting diode crystal grain Complete photonic crystal structure table with high symmetry Pattern, thereby improving the light extraction efficiency of the light emitting diode die, or optical type.

Referring to FIG. 6 and FIG. 7, a second preferred embodiment of the method for forming a surface pattern by imprinting is similar to the first preferred embodiment, except that the example further includes a re-patterning step 14 On the substrate 31, a more complicated surface pattern is formed.

In detail, in this example, when the secondary pattern forming step 13 is performed, the mold core 2 is rotated by 30° to form a second pattern structure 32 (ie, a diagonal dot in the drawing), and then patterned again. In step 14, the same origin O and the same plane change pattern are used to change the relative position of the mold 2 and the substrate 3 on which the first and second pattern structures 31 and 32 are formed, that is, according to the original The point O is further rotated by 30° with respect to the substrate 3, and the nano-imprint lithography process is performed with the mold 2 after changing the relative position of the pattern, and the substrate 3 having the first and second pattern structures 31 and 32 is formed. Forming a third pattern structure 33 of a plurality of structural points (ie, black dots in the drawing), and forming the first, second, and third pattern structures 31, 32, and 33 to form a derivative pattern on the substrate 3 The surface pattern of the structural point 22 of the kernel 2.

It should be noted that, in the above method for forming a surface pattern by imprinting, the process similar to the pattern forming step 14 can be repeated, and then more pattern structures are formed on the substrate 3; Each of the imprint pattern elements 23 may be an equilateral triangle pattern composed of three structure points 22, an isosceles triangle pattern composed of three structure points 22, a rectangular pattern composed of four structure points 22, and four structure points. a chevron pattern of 22, an isosceles trapezoidal pattern composed of four structural points 22, a hexagonal pattern composed of six structural dots 22, or a composite pattern of one of such patterns, such as Archimedes A7, Patterns such as Archimedes A13, and so on, in conjunction with the plane change pattern of the mold core 2, for example, the smaller the predetermined angle of rotation relative to the substrate 3, the embossing can be more complicated for each unit cell 34 pattern. The surface pattern includes a long-range ordered lattice structure surface pattern, a short-range ordered quasi-lattice structure surface pattern, and a natural-like structure surface pattern.

A third preferred embodiment of the method for forming a surface pattern by imprinting in the present invention is similar to the second preferred embodiment, except that in the case of performing the pattern forming step again, the present embodiment is determined again. The point and the mold change mode have a derivative origin and a derivative plane change manner, and the change of the mold origin and the derivative plane change manner to form the first and second pattern structures After the relative position of the pattern of the substrate, the mold is subjected to a nanoimprint lithography process by changing the relative position of the pattern, and a plurality of pattern structures are formed on the substrate to obtain a surface derived from a plurality of structural points of the mold core. pattern.

Referring to FIG. 8, in more detail, in this example, the derivative origin is coincident with the origin O, and the mold core is rotated by 15° to obtain a second pattern structure, and then rotated by 30° and 60°, respectively. The third and fourth pattern structures are respectively obtained, thereby obtaining a surface pattern derived from a plurality of structural points of the mold core and having higher complexity.

It can be seen from the description of the above three preferred embodiments that when the position of the mold relative to the plane of the substrate is changed, the same and fixed origin and the same mold are changed, so that the imprint can be improved in the same position area. The symmetry of the surface pattern can be applied to an element such as a solar cell or a light-emitting diode to form a photonic crystal structure in an ordered surface pattern, or a photonic crystal structure to enhance light incidence or light extraction rate. , or light type.

When the origin and the derived origin are predetermined mathematical relationships such as circles, ellipses, curves, vortices, etc., and the molds are changed in a predetermined mathematical equation relationship such as rotation plus displacement, a more complicated state can be formed. The surface pattern includes a long-range ordered lattice structure surface pattern, a short-range ordered quasi-lattice structure surface pattern, and a natural-like structure surface pattern. In this case, in addition to being applicable to, for example, a solar cell or a light-emitting diode, It can be applied to the production of antibacterial spots with a certain degree of disorder distribution on the substrate to enhance the overall antibacterial effect.

It should be further noted that the method for forming a surface pattern by imprinting can also be applied to a mold core or even a photomask, and after the initial mold core having a simple structure is produced, the stamping process is performed multiple times with the steps of the present invention. The final imprinting mold or the photomask having a complicated structure is formed, thereby reducing the manufacturing cost of the mold and the photomask which are complicated in design and pattern structure.

In addition, in the implementation of the mold establishing step, the present invention may also firstly fabricate a plurality of molds having a simple structure, and then in the basic pattern forming step, the secondary pattern forming step, or even when the pattern forming step is performed again, sequentially The use of different molds for nanoimprint lithography process, resulting in a more complex and diverse surface pattern.

It can be seen from the above description that the present invention mainly uses a simple structure of the mold core to carry out the current mature nanoimprint technology, and transfers a complicated surface pattern, including a long-range ordered lattice structure surface pattern, short-range orderly The surface pattern of the lattice structure and the surface pattern of the natural structure can be surely improved when the surface pattern is currently produced, which is directly limited by the pattern of the mask or the mold, so that the object of the present invention can be achieved.

The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention are All remain within the scope of the invention patent.

11. . . Mold establishment steps

12. . . Basic pattern forming step

13. . . Secondary pattern forming step

14. . . Pattern forming step again

2. . . Mold

twenty one. . . Structure point

twenty two. . . Embossed pattern unit

3. . . Substrate

31. . . First structure point

32. . . Second structure point

33. . . Third structure point

34. . . Unit cell

4. . . origin

1 is a flow chart illustrating a first preferred embodiment of the method of forming a surface pattern by imprinting of the present invention;

2 is a schematic view showing the structure of the mold core produced by the mold establishing step of the first preferred embodiment of the method for forming a surface pattern by imprinting according to the present invention;

3 is a schematic view showing a first pattern structure in which a plurality of structural dots are formed on a substrate when the basic pattern forming step of the first preferred embodiment of the method for forming a surface pattern by the imprinting method of the present invention is performed;

4 is a perspective view showing the secondary pattern forming step of the first preferred embodiment of the method for forming a surface pattern by imprinting according to the present invention, wherein the mold core is relatively changed according to an origin O and a first pattern is formed. The planar position of the substrate of the structure;

FIG. 5 is a schematic view showing a second pattern forming step of the first preferred embodiment of the method for forming a surface pattern by imprinting according to the present invention, wherein a plurality of second pattern structures are formed on the substrate to obtain a surface pattern. ;

Figure 6 is a flow chart illustrating a second preferred embodiment of the method of forming a surface pattern by imprinting of the present invention;

Figure 7 is a schematic view showing a surface pattern obtained by the second preferred embodiment of the method for forming a surface pattern by imprinting of the present invention; and

Figure 8 is a schematic view showing a surface pattern obtained by the third preferred embodiment of the method of forming a surface pattern by imprinting of the present invention.

[A brief description of the attachment]

The first preferred embodiment of the present invention is a surface pattern obtained by first imprinting when a photonic crystal pattern structure is actually formed on a light-emitting diode die;

Attachment 2 is a surface pattern obtained by the second imprinting when the first preferred embodiment of the present invention is applied to form a photonic crystal pattern structure on a light-emitting diode die;

The third embodiment of the present invention is applied to the light-emitting pattern of the finally produced light-emitting diode crystal grains when the photonic crystal pattern structure is actually formed on the light-emitting diode crystal grains.

11. . . Mold establishment steps

12. . . Basic pattern forming step

13. . . Secondary pattern forming step

14. . . Pattern forming step again

Claims (6)

A method for forming a surface pattern by imprinting comprises: a mold establishing step of forming a mold core by forming a plurality of structural points on a mold substrate and forming a plurality of spaced apart structures and having a size of not exceeding a micrometer size by a lithography process a basic pattern forming step of performing a nanoimprint lithography process on the mold, and forming a plurality of first pattern structures corresponding to the structure dots on a substrate; a secondary pattern forming step, Forming the substrate with the first pattern structure, rotating the mold core according to a selected origin and forming a first pattern structure with respect to the substrate, and then performing nanoimprinting with the rotated mold core a lithography process, wherein a second pattern structure corresponding to the plurality of structural points is formed on the substrate on which the first pattern structure is formed, and the first and second pattern structures are on the substrate Forming a surface pattern of a plurality of structural points derived from the mold core; and a patterning step of re-determining a derived from the origin and the block mold on the substrate on which the first and second pattern structures are formed benevolence a derivative origin of the dynamic mode and a derivative plane change manner, and then changing the planar position of the block mold body with the first and second pattern structures relative to the block by the derivative origin and the derivative plane variation manner And performing the nanoimprint lithography process with the mold core after changing the position, and forming a third corresponding to the plurality of structural points on the substrate on which the first and second pattern structures are formed. The pattern structure, the first, second, and third pattern structures form a surface pattern on the block substrate that is derived from a plurality of structural points of the mold core. The method for forming a surface pattern by imprinting according to claim 1 of the patent application, further comprising a re-pattern forming step of using the same origin on the substrate on which the first and second pattern structures are formed Rotating the mold core with the same rotation mode, and performing the nanoimprint lithography process with the re-rotating mold core, and forming a corresponding substrate on the substrate on which the first and second pattern structures are formed. The third pattern structure of the plurality of structural points, wherein the first, second, and third pattern structures form a surface pattern on the block substrate that is derived from a plurality of structural points of the mold core. A method for forming a surface pattern by imprinting according to the second aspect of the patent application, wherein a plurality of structural points of the mold core constitute an imprint pattern unit of a plurality of geometrically substantially symmetrical and repeating periodic distributions, each The embossed pattern unit is an equilateral triangle pattern composed of three structural points, an isosceles triangle pattern composed of three structural points, a rectangular pattern composed of four structural points, a 鸢-shaped pattern composed of four structural points, An isosceles trapezoidal pattern of four structural points, a hexagonal pattern of six structural points, or a composite pattern of one of the patterns. A method for forming a surface pattern by imprinting according to item 3 of the patent application, wherein the origin is selected as an origin, a center point of one of the imprint pattern units, or a predetermined in the imprint pattern unit Pick a point. A method for forming a surface pattern by imprinting according to the first aspect of the patent application, wherein a plurality of structural points of the mold core constitute an imprint pattern unit of a plurality of geometrically substantially symmetrical and repeating periodic distributions, each The imprint pattern unit is an equilateral triangle pattern composed of three structural points, an isosceles triangle pattern composed of three structural points, a rectangular pattern composed of four structural points, and four A circular pattern of structural points, an isosceles trapezoidal pattern composed of four structural points, a hexagonal pattern composed of six structural points, or a composite pattern of one of the patterns. A method for forming a surface pattern by imprinting according to item 3 of the patent application, wherein the origin is selected as an origin, a center point of one of the imprint pattern units, or a predetermined in the imprint pattern unit Pick a point.