TWI599928B - Display device and fabrication method thereof - Google Patents

Description

Display device and manufacturing method thereof

The present invention relates to a display device and a method of fabricating the same.

In recent years, the touch sensing device is combined with the display panel to simultaneously achieve the functions of touch and display. For example, the touch sensing device is widely used in various electronic devices, such as a smart phone, a tablet, a notebook computer, etc., in combination with a display panel.

The touch sensing device is preferably designed to have a high transmittance to be combined with the display panel, but in reality, a portion of the touch sensing device may be partially reflected. In a touch display device combining a touch sensing device and a display panel, how to avoid the influence of the light reflected by the touch sensing device on the visual effect of the user is an important issue.

According to an aspect of the present invention, a display device includes a display panel, a transparent conductive layer, at least one opaque connecting line, at least one insulating block, and a patterned light shielding layer. The transparent conductive layer is disposed on a surface of the display panel. The transparent conductive layer includes at least two first transparent electrodes, at least one transparent connecting line, and at least two Two transparent electrodes. A transparent connecting wire is connected to the first transparent electrode. The opaque connecting line is connected to the second transparent electrode, and the opaque connecting line is interlaced with the transparent connecting line. The insulating block is disposed between the opaque connecting line and the transparent connecting line. The patterned shading layer covers the opaque connecting line.

In one or more embodiments of the present invention, the display panel includes at least one sub-pixel, wherein the sub-pixel includes at least one color filter unit, and the projection and color filter of the patterned light-shielding layer in the direction of the vertical display panel The units at least partially overlap.

In one or more embodiments of the present invention, the sub-pixel includes at least one black matrix surrounding the color filter unit, and the projection of the patterned light-shielding layer in the direction of the vertical display panel at least partially overlaps the black matrix.

In one or more embodiments of the present invention, the projection of the patterned light shielding layer in the direction of the vertical display panel completely falls within the color filter unit.

In one or more embodiments of the present invention, the patterned light shielding layer is a color filter layer, and the patterned light shielding layer and the color filter unit have substantially the same visible light transmission spectrum.

In one or more embodiments of the present invention, the patterned light shielding layer is a color filter layer, and the display panel includes at least one sub-pixel, the sub-pixel includes at least one black matrix surrounding the periphery of the sub-pixel, and the color filter The projection of the layer in the direction of the vertical display panel overlaps with the black matrix.

In one or more embodiments of the present invention, the display panel includes a visible area and a non-visible area located on at least one side of the visible area, and the display device further includes a plurality of opaque leads and a plurality of lead shielding layers, and the opaque leads correspond to the non-visible area The opaque lead is electrically connected to the first transparent electrode and the second transparent electric The poles and the light shielding layer respectively cover the opaque leads.

In one or more embodiments of the present invention, the wire light shielding layer and the patterned light shielding layer belong to the same patterned layer.

In one or more embodiments of the present invention, the display device further includes a plurality of transparent leads disposed on a surface of the display panel and disposed corresponding to the non-visible area, and the opaque leads are respectively overlapped with the transparent leads.

A method for manufacturing a display device according to an aspect of the present invention includes the steps of: providing a color filter substrate; forming at least two first transparent electrodes, at least one transparent connection line, and at least two second transparent electrodes on the color filter substrate a transparent connecting line connecting the first transparent electrode; forming at least one insulating block, wherein the insulating block at least partially covers the transparent connecting line; forming an opaque conductor layer on at least the insulating block; forming a patterned light shielding layer on the opaque conductor layer; The opaque conductor layer is patterned by using the patterned light shielding layer as a mask to form an opaque connecting line, the opaque connecting line is connected to the second transparent electrode, and the opaque connecting line is located on the insulating block, so that the insulating block is between the opaque connecting line and the transparent connecting line between.

In one or more embodiments of the present invention, the color filter substrate includes a visible area and one of the non-visible areas on at least one side of the visible area, wherein the step of forming the patterned light shielding layer further comprises forming a plurality of lead light shielding layers.

In one or more embodiments of the present invention, the step of patterning the opaque conductor layer includes patterning the opaque conductor layer with the wire shielding layer as a mask to form a plurality of opaque leads, and the opaque leads are disposed corresponding to the non-visible area, and The first transparent electrode and the second transparent electrode are electrically connected respectively.

In one or more embodiments of the present invention, the step of forming the first transparent electrode, the transparent connecting line and the second transparent electrode comprises forming a plurality of transparent leads The wires are arranged on the color filter substrate, and the transparent leads are arranged corresponding to the non-visible regions, and the subsequently formed opaque leads are respectively overlapped with the transparent leads.

In one or more embodiments of the present invention, the color filter substrate includes an alignment mark thereon, wherein the step of forming the first transparent electrode, the transparent connection line and the second transparent electrode comprises: forming a transparent conductive layer in color Filtering the substrate; and patterning the transparent conductive layer to form a first transparent electrode, a transparent connecting line and a second transparent electrode.

In one or more embodiments of the present invention, the manufacturing method further includes forming a display panel by aligning the color filter substrate and the active device array substrate before forming the first transparent electrode, the transparent connecting line, and the second transparent electrode.

In one or more embodiments of the present invention, the step of forming the first transparent electrode, the transparent connecting line and the second transparent electrode is performed at a temperature in the range of about 100 degrees Celsius to about 200 degrees Celsius.

In one or more embodiments of the present invention, the color filter substrate includes at least one sub-pixel, wherein the sub-pixel includes at least one color filter unit, and the color filter of the patterned light-shielding layer and the color filter substrate The units overlap.

In one or more embodiments of the present invention, the patterned light shielding layer is a color filter layer, and the patterned light shielding layer and the color filter unit have substantially the same visible light transmission spectrum.

In one or more embodiments of the present invention, the color filter substrate includes at least one sub-pixel, and the sub-pixel includes at least one black matrix surrounding the periphery of the sub-pixel, and the patterned light-shielding layer overlaps the black matrix.

In one or more embodiments of the present invention, the patterned light shielding layer is a black matrix photoresist or a color photoresist.

100‧‧‧ display device

110‧‧‧ display panel

110P‧‧‧ pixels

110PR‧‧ ‧ sub-pixel

110PG‧‧‧Subpixel

110PB‧‧‧Subpixel

112‧‧‧ surface

114‧‧‧Color filter substrate

116‧‧‧Liquid layer

118‧‧‧Active component array substrate

120‧‧‧Transparent conductive layer

122‧‧‧First transparent electrode

124‧‧‧Transparent cable

126‧‧‧Second transparent electrode

128‧‧‧Transparent leads

132‧‧‧opaque cable

226‧‧‧Second transparent electrode

228‧‧‧Transparent leads

230‧‧‧Insulation block

240‧‧‧Opacity conductor layer

242‧‧‧opaque cable

244‧‧‧ opaque leads

250‧‧‧ shading layer

252‧‧‧ patterned shade layer

254‧‧‧Leading shade

260‧‧‧Active component array substrate

270‧‧‧Liquid layer

280‧‧‧ Cover glass

290‧‧‧ polarizer

300‧‧‧Optical adhesive layer

310‧‧‧ display panel

S1‧‧‧ first surface

134‧‧‧ opaque leads

140‧‧‧Insulation block

152‧‧‧ patterned blackout layer

154‧‧‧Lead shade layer

160‧‧‧ polarizer

170‧‧‧Optical adhesive layer

180‧‧‧ Cover glass

200‧‧‧ display device

210‧‧‧Color filter substrate

212‧‧‧Subpixels

212G‧‧‧Green Filter Unit

212K‧‧‧Black matrix

220‧‧‧Transparent conductive layer

222‧‧‧First transparent electrode

224‧‧‧Transparent cable

S2‧‧‧ second surface

M1‧‧‧ alignment mark

M2‧‧‧ alignment mark

M3‧‧‧ alignment mark

NA‧‧‧Invisible area

VA‧‧ visible area

BA‧‧‧Blue Filter Unit

GA‧‧‧Green Filter Unit

RA‧‧‧Red Filter Unit

KA‧‧‧Black Matrix

1C-1C‧‧‧ line

1D-1D‧‧‧ line

3B-3B‧‧‧ line

1A is a top view of a touch element in accordance with an embodiment of the present invention.

1B is a partial top view of a portion of an element of a display device in accordance with still another embodiment of the present invention.

Fig. 1C is a cross-sectional view taken along line 1C-1C of Fig. 1B.

Fig. 1D is a cross-sectional view taken along line 1D-1D of Fig. 1C.

2A is a partial cross-sectional view of a display device in accordance with another embodiment of the present invention.

Fig. 2B is a partial top view of the display device of Fig. 2A.

3A is a top view of a part of components of a display device according to still another embodiment of the present invention.

Figure 3B is a cross-sectional view taken along line 3B-3B of Figure 3A.

4A to 4H are cross-sectional views showing a method of manufacturing a display device according to still another embodiment of the present invention in a plurality of steps.

5A to 5E are cross-sectional views showing a method of manufacturing a display device according to another embodiment of the present invention in a plurality of steps.

The various embodiments of the present invention are disclosed in the drawings, and in the claims However, it should be understood that these practical details are not intended to limit the invention. Also That is to say, in some embodiments of the present invention, these practical details are not necessary. In addition, some of the conventional structures and elements are shown in the drawings in a simplified manner.

1A is a top view of a touch element in accordance with an embodiment of the present invention. A display device according to various embodiments of the present invention includes a display panel (not shown) and a touch element, and only the touch elements of the display device 100 are shown here. The touch element of the display device includes a transparent conductive layer 120, a plurality of opaque connecting lines (not shown), a plurality of insulating blocks 140, and a patterned light shielding layer 152. The transparent conductive layer 120 is disposed on a surface of a display panel (not shown). The transparent conductive layer 120 includes a plurality of first transparent electrodes 122, a plurality of transparent connecting lines 124, and a plurality of second transparent electrodes 126. The transparent connecting line 124 is used to connect the first transparent electrode 122. The opaque connecting line 132 (shown in the following illustration) is used to connect the second transparent electrode 126, the opaque connecting line is interlaced with the transparent connecting line 124, and the insulating block 140 is disposed between the opaque connecting line and the transparent connecting line 124, and is patterned. The light shielding layer 152 covers the opaque connecting line 132.

Reference is also made to Figs. 1B and 1C. 1B is a top view of a portion of components of display device 100 in accordance with an embodiment of the present invention. Fig. 1C is a cross-sectional view taken along line 1C-1C of Fig. 1B. Herein, the display panel 110 of the display device 100 and the touch elements are illustrated to illustrate the arrangement relationship thereof. A touch element (eg, transparent conductive layer 120) is disposed on surface 112 of display panel 110. In one or more embodiments of the present invention, the display panel 110 may include a color filter substrate 114, a liquid crystal layer 116, and an active device array substrate 118. The liquid crystal layer 116 is disposed between the color filter substrate 114 and the active device array substrate 118.

Here, for the convenience of description, it is not completely shown in FIG. 1B. The display panel 110 only shows a portion of the color filter substrate 114 and the touch elements of the display panel 110. It should be understood that the figure shows only the relative relationship between the configuration of the color filter substrate 114 and the transparent conductive layer 120 or the patterned light shielding layer 152. In actual configuration, the transparent conductive layer 120 and other components can be designed in color. The upper side of the filter substrate 114 is filtered.

In this embodiment, the display panel 110 may include a plurality of pixels 110P, each pixel 110P includes at least one sub-pixel, each sub-pixel includes at least one color filter unit and at least one black matrix KA. The black matrix KA surrounds the color filter unit. For example, each pixel 110P may include three sub-pixels 110PR, 110PG, 110PB, wherein the color filter unit of the sub-pixel 110PR may be a red filter unit RA, and the color filter unit of the sub-pixel 110PG may be The green filter unit GA, the color filter unit of the sub-pixel 110PB may be a blue filter unit BA. Here, the red filter unit RA, the green filter unit GA, and the blue filter unit BA may be disposed on the color filter substrate 114 in a row. In one or more embodiments of the present invention, a plurality of thin film transistors (not shown) may be disposed on the active device array substrate 118 to control the liquid crystal layer 116.

In this embodiment, the material of the transparent conductive layer 120 may be indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium antimony zinc oxide, other suitable oxides or at least two of the above. Stacked layers. The material of the opaque connecting line 132 may be a metal material having a better electrical conductivity than the transparent conductive layer 120, such as silver, copper, aluminum, molybdenum or titanium, other suitable materials, or a stacked layer of at least two of the above materials. To pass touch sensing information. In fact, a metal material having a better electrical conductivity may also have a higher reflectance, and it is easy to generate reflected light to interfere with the user's visual effect.

In the present embodiment, the patterned light shielding layer 152 has the ability to adjust the wavelength of the transmitted light. In some embodiments, the patterned light shielding layer 152 can be a color filter layer. Formed by inkjet coating, transfer or other coating method, and a photoresist layer is disposed thereon to perform a patterning exposure process, thereby forming a color filter layer having a plurality of patterns, such as a red filter layer, Blue filter layer, green filter layer. Alternatively, in some embodiments, the color filter layer can be a color photoresist, such as a red photoresist, a blue photoresist, a green photoresist, and can be used as a patterned mask when the opaque connecting line 132 is patterned. By designing the patterned light shielding layer 152, the reflected light of the opaque connecting line 132 can be adjusted to make the wavelength of the reflected light approximate the wavelength of the light output by the display panel 110, thereby avoiding the reflection of the light to the user's visual effect.

In detail, in one or more embodiments of the present invention, the projection of the patterned light shielding layer 152 in the direction of the vertical display panel 110 may completely fall within the black matrix KA and the color filter unit of a specific color. Here, the patterned light shielding layer 152 and the color filter unit of a specific color may have substantially the same visible light transmission spectrum. For example, in this embodiment, the patterned light shielding layer 152 may be a green photoresist having substantially the same visible light transmission spectrum as the green filter unit GA, and the patterned light shielding layer 152 is oriented in the direction of the vertical display panel 110. The projection can completely fall within the black matrix KA and the green filter unit GA.

As such, the light reflected by the opaque connecting line 132 can be adjusted by the patterned light shielding layer 152 to have a specific wavelength (here, it can be green light). In one aspect, a portion of the reflected light that is adjusted by the patterned light-shielding layer 152 corresponds to a region where the display panel 110 outputs a specific light (eg, the position of the green filter unit GA), The reflected light (ie, the green light) adjusted by the eye to receive the patterned light shielding layer 152 approximates the output light of the display panel 110, so that the reflected light does not interfere with the visual effect, and the reflected light can also be improved. The overall brightness of the display device 100. On the other hand, the reflected light of the other portion of the patterned light shielding layer 152 corresponds to a region where the display panel 110 does not output light (ie, the position of the black matrix KA). As a result, the portion of the patterned light shielding layer 152 and the opaque connecting line 132 does not block or affect the output light of the display panel 110, thereby improving the overall brightness, and the light reflected by the portion of the opaque connecting line 132 can pass through the patterned light shielding layer. 152 (eg, green photoresist) is tuned to have a specific wavelength (eg, green light), which in turn reduces the intensity of the reflected light (eg, blocking red and blue light) to avoid interfering with visual effects.

In this way, by the arrangement of the patterned light shielding layer 152, the reflected light can be prevented from affecting the visual effect, and the overall brightness of the display device 100 can be improved.

Although the patterned light-shielding layer 152 is exemplified as a green photoresist here, the scope of the present invention should not be limited thereto. In some embodiments, the patterned light shielding layer 152 may be a red photoresist, and the projection of the red photoresist in the direction of the vertical display panel 110 at least partially overlaps the red filter unit RA. Alternatively, in other embodiments, the patterned light shielding layer 152 may be a blue photoresist, and the projection of the blue photoresist in the direction of the vertical display panel 110 at least partially overlaps with the blue filter unit BA.

Herein, the projection of the patterned light shielding layer 152 in the direction of the vertical display panel 110 at least partially overlaps with the color filter unit of the specific color (having substantially the same visible light transmission spectrum as the patterned light shielding layer 152), and the patterned shading The projection of the layer 152 in the direction of the vertical display panel 110 at least partially overlaps the black matrix KA. In other embodiments, the projection of the patterned light shielding layer 152 and the opaque connecting line 132 in the direction of the vertical display panel 110 may be completely overlapped with the black matrix KA, regardless of the size matching problem in the actual configuration. As such, the arrangement of the patterned light shielding layer 152 and the opaque connecting line 132 does not block the output light of the display panel 110.

Herein, the display device 100 may further include a polarizer 160, an optical adhesive layer 170, and a cover glass 180. The polarizer 160 is disposed on the transparent conductive layer 120, the lead light shielding layer 154, and the patterned light shielding layer 152, so that light from the display panel can pass through the polarizer 160 to have a light and dark change. The polarizer 160 may contain a colloid so that it can be attached to a touch element having a height difference. For example, the thickness of the colloid is about 5 microns to 30 microns, which is greater than the height of the opaque connecting line 132 (eg, about 0.5 microns), and the polarizer can be unaffected by the height difference of the touch elements. The optical adhesive layer 170 is disposed between the polarizer 160 and the cover glass 180 to bond and fix the display panel 110 and the touch element to the cover glass 180.

Fig. 1D is a cross-sectional view taken along line 1D-1D of Fig. 1B. Referring to FIGS. 1B and 1D, the black matrix KA of the color filter substrate 114 may cover a larger range at the edge, so that the display panel 110 includes the visible area VA and the non-visible area NA located on at least one side of the visible area VA. . The display device 100 further includes a plurality of transparent leads 128 of the transparent conductive layer 120, opaque leads 134, and a plurality of lead shielding layers 154.

The transparent lead 128 is disposed on the surface 112 of the display panel 110 and disposed corresponding to the non-visible area NA, and respectively connects the first transparent electrode 122 and the second transparent electrode 126. The opaque leads 134 are respectively overlapped with the transparent leads 128. And corresponding to the non-visible area NA setting. Since the opaque leads 134 are respectively connected to the transparent leads 128, the first transparent electrodes 122 and the second transparent electrodes 126 are electrically connected. The opaque leads 134 are often designed to have better conductivity than the transparent leads 128 to transfer touch information to the external processing wafer. The wire shielding layer 154 covers the opaque leads 134, respectively, to adjust the reflected light of the opaque leads 134. The transparent lead 128 is not necessarily disposed. In some embodiments, the transparent lead 128 can be omitted and the first transparent electrode 122 and the second transparent electrode 126 can be electrically connected only by the opaque lead 134.

In one or more embodiments of the present invention, the lead light shielding layer 154 and the patterned light shielding layer 152 belong to the same patterned layer. In some embodiments, the lead light shielding layer 154 and the patterned light shielding layer 152 may be formed by a patterning process of the same material. In some embodiments, as described above, the wire shielding layer 154 may also be a color filter layer, such as a green filter layer, a blue filter layer, or a red filter layer. Alternatively, in some embodiments, the color filter layer may also be a color photoresist such as a green photoresist, a blue photoresist, or a red photoresist.

In one or more embodiments of the invention, the opaque lead 134 and the opaque connecting line 132 belong to the same patterned layer. In some embodiments, the opaque lead 134 may have the same material as the opaque connecting line 132. For example, the material of the opaque lead 134 and the opaque connecting line 132 may be various metals with good electrical conductivity, such as silver, copper, aluminum. , molybdenum or titanium, other suitable materials, or a stacked layer of at least two of the foregoing.

As with the efficacy of the patterned light-shielding layer 152 described above, the light reflected by the opaque lead 134 can be adjusted by the wire shielding layer 154 to have a specific wavelength (eg, green light), thereby reducing the reflected light (eg, blocking red and blue light). Free of interference with visual effects.

Herein, the display panel 110 may further include an encapsulation material 117 to ensure a spacing between the color filter substrate 114 and the active device array substrate 118 and to encapsulate the liquid crystal layer 116. For example, the encapsulating material 117 can be a resin. Other details of the present embodiment are substantially as described above, and are not described herein again.

2A is a partial cross-sectional view of a display device 100 in accordance with another embodiment of the present invention. 2B is a partial top view of the display device 100 of FIG. 2A. This embodiment is similar to the embodiment of FIG. 1B except that the projection of the patterned light shielding layer 152 of the present embodiment in the direction of the vertical display panel 110 completely falls within the color filter unit. Here, as an example, the patterned light shielding layer 152 is a green photoresist, and the green photoresist projection completely falls within the green filter unit GA.

As such, as previously discussed, the light reflected by the opaque connecting line 132 can be adjusted through the patterned light-shielding layer 152 to have a particular wavelength (which can be green light). Since the light corresponds to the area where the green light is outputted by the display panel 110 (ie, the position of the green filter unit GA), the light reflected by the human eye to receive the opaque connecting line 132 (ie, the aforementioned green light) approximates the output of the display panel 110. Light, so it doesn't interfere with the visual effect. Other details of the present embodiment are substantially as described above, and are not described herein again.

FIG. 3A is a top view of a portion of components of a display device 100 in accordance with still another embodiment of the present invention. Figure 3B is a cross-sectional view taken along line 3B-3B of Figure 3A. This embodiment is similar to the embodiment of FIG. 1B except that the patterned light shielding layer 152 and the wiring light shielding layer 154 of the present embodiment are black matrix photoresists, and the patterned light shielding layer 152 of the present embodiment is on the vertical display surface. The projection of the direction of the plate 110 completely overlaps the black matrix KA.

In this way, the patterned light shielding layer 152 can block the opaque connecting line 132 without causing reflection, and thus does not interfere with the visual effect of the user. Moreover, the position of the opaque connecting line 132 and the patterned light-shielding layer 152 corresponds to the black matrix KA, and light shielding from the display device can be avoided, and the problem that the display brightness is lowered due to the arrangement of the patterned light-shielding layer 152 can be avoided. Other details of the present embodiment are substantially as described above, and are not described herein again.

4A to 4B are cross-sectional views showing a method of manufacturing a display device according to still another embodiment of the present invention in a plurality of steps. First, referring to FIG. 4A, a color filter substrate 210 is provided, and a transparent conductive layer 220 is formed on the first surface S1 of the color filter substrate 210. The color filter substrate 210 includes a visible area VA and a non-visible area NA located on at least one side of the visible area VA. The color filter substrate 210 includes a plurality of pixels, each pixel includes at least one sub-pixel (not shown), and the sub-pixel (not shown) includes a plurality of color filter units (for example, the green filter unit 212G). In and among the black matrix 212K, the black matrix 212K surrounds the periphery of the sub-pixel (not shown).

In some embodiments, the color filter substrate 210 can include an alignment mark M1 on its second surface S2. The alignment mark M1 may be a pattern formed together with any layer or element on the color filter substrate 210, and has a certain contrast for identification. For example, in the process of the color filter unit, color filter units of respective colors and a black matrix 212K may be formed by deposition and patterning, and the alignment mark M1 may be deposited and patterned together with the black matrix 212K.

Next, referring to FIG. 4B, the transparent conductive layer 220 is patterned (see the 4A) a plurality of first transparent electrodes (not shown), a plurality of transparent connecting lines 224, a plurality of second transparent electrodes 226, and a plurality of transparent leads 228 are formed on the color filter substrate 210. The transparent connecting line 224 is connected to the first transparent electrode (not shown). The transparent lead 228 corresponds to the non-visible area NA setting.

Here, the step of patterning the transparent conductive layer 220 (see FIG. 4A) may include a lithography process, and the reticle used in the lithography process and the second surface S2 of the color filter substrate 210 The quasi-marker M1 is aligned. In addition, the lithography process can also set another alignment mark M2 on the first surface S1. The alignment mark M2 may be a pattern formed by the transparent conductive layer 220 (see FIG. 4A).

Then, referring to FIG. 4C, a plurality of insulating blocks 230 are formed between any two second transparent electrodes 226, wherein the insulating blocks 230 at least partially cover the transparent connecting lines 224.

Referring to FIG. 4D, an opaque conductor layer 240 is formed on the patterned transparent conductive layer 220 and the first surface S1 of the substrate 210, and at least on the insulating block 230 and the transparent leads 228. Here, the material of the opaque conductor layer 240 may be a metal having good conductivity, such as silver, copper, aluminum, molybdenum or titanium, other suitable materials, or a stacked layer of at least two of the above materials.

Referring to FIG. 4E, a light shielding layer 250 is formed on the opaque conductor layer 240. In the present embodiment, the light shielding layer 250 substantially covers the opaque conductor layer 240, and the light shielding layer 250 may be formed of a color filter layer or a black matrix photoresist.

Referring to FIGS. 4E and 4F simultaneously, the light shielding layer 250 is patterned to form a plurality of patterned light shielding layers 252 and a plurality of wiring light shielding layers 254 on the insulating block 230 and the transparent wiring 228, respectively.

Here, the step of patterning the light shielding layer 250 may include a lithography etching process, and the reticle used in the lithography etching process may be aligned with the alignment mark M1 of the color filter substrate 210 or with the previous patterned transparent conductive layer. The alignment marks M2 formed by 220 (see Fig. 4A) are aligned. In some embodiments, an additional photoresist layer can be disposed on the light shielding layer 250 to help pattern the light shielding layer 250.

In some embodiments, when the material of the light shielding layer 250 is a color filter layer, the projection of the patterned light shielding layer 252 in the direction of the vertical color filter substrate 210 may completely fall on the black matrix 212K and the color filter of the specific color described above. Within the light unit (here, the green filter unit 212G), the color filter unit of the specific color has substantially the same penetration spectrum as the light shielding layer 250. Moreover, the projection of the patterned light shielding layer 252 in the direction of the vertical color filter substrate 210 may completely fall within the color filter unit of the specific color described above, so that the color of the patterned light shielding layer 252 and the color filter substrate 210 are colored. The filter units overlap.

In some embodiments, although not shown, when the light shielding layer 250 is a black matrix photoresist, the projection of the patterned light shielding layer 252 in the direction of the vertical color filter substrate 210 may completely fall within the black matrix 212K. The patterned light shielding layer 252 overlaps with the black matrix 212K.

Referring to FIG. 4G, the opaque conductor layer 240 (see FIG. 4F) is patterned by patterning the light shielding layer 252 and the wiring light shielding layer 254 as patterned masks to form a plurality of opaque connecting lines 242 and a plurality of opaque leads 244, respectively. On the insulating block 230 and the transparent lead 228. The opaque connecting line 242 is used to connect any two second transparent electrodes 226. The insulating block 230 is interposed between the opaque connecting line 242 and the transparent connecting line 224 to insulate the opaque connecting line 242 from the transparent connecting line 224. The opaque lead 244 is corresponding to the non-visible area NA and is electrically connected The first transparent electrode (not shown) and the second transparent electrode 226 are connected to an external circuit.

Here, although the material of the light shielding layer 250 (see FIG. 4E) is a photoresist, the patterned light shielding layer 252 and the wiring light shielding layer 254 are formed by patterning the light shielding layer 250 (see FIG. 4E) located above. The opaque conductor layer 240 is etched by patterning the light shielding layer 252 and the wiring light shielding layer 254 as a patterned mask (see FIG. 4F), but the invention is not limited thereto. In another embodiment, an additional photoresist layer may be disposed on the light shielding layer 250 (see FIG. 4E), and the opaque conductor layer 240 and the light shielding layer 250 are etched in the same step to form an opaque connecting line 242 and an opaque lead. 244, patterned light shielding layer 252 and lead light shielding layer 254.

Next, referring to FIG. 4H, the color filter substrate 210 carrying the plurality of elements is paired with the active device array substrate 260, and the package material 280 is used to ensure the pitch and fill the liquid crystal layer 270 therein to form the display device 200. Here, the active device array substrate 260 may include an alignment mark M3 for alignment with the alignment mark M1 of the color filter substrate 210 to determine the alignment accuracy.

In addition, the polarizer 290 and the optical adhesive layer 300 may be disposed on the first surface S1 of the color filter substrate 210, and the structure is attached to the cover glass 280 to protect the touch sensing structure from scratches.

5A to 5E are cross-sectional views showing a method of manufacturing a display device according to another embodiment of the present invention in a plurality of steps. The embodiment is similar to the embodiment of the fourth to fourth embodiments. The difference is that in the embodiment, the display panel 310 is formed first, and then the transparent conductive layer 220 is disposed on the outer surface of the color filter substrate 210 of the display panel 310. Insulating block 230, opaque conductor layer 240, light shielding layer 250, and patterned lithographic etching process of transparent conductive layer 220 The reticle used is aligned with the alignment mark M1 of the color filter substrate 210 or the alignment mark M3 of the active device array substrate 260.

Referring to FIG. 5A, the display panel 310 includes a color filter substrate 210, an active device array substrate 260, a liquid crystal layer 270, and an encapsulation material 280. The color filter substrate 210 may include an alignment mark M1 thereon, and the active device array substrate 260 includes an alignment mark M3 thereon. In some embodiments, the alignment mark M1 and the alignment mark M3 may be overlapped and aligned, and the liquid crystal layer 270 is ensured by the encapsulation material 280 to form the display panel 310. The color filter substrate 210 includes a color filter unit (for example, a green filter unit 212G) and a black matrix 212K surrounding the color filter unit.

Next, the transparent conductive layer 220 is formed on the outer surface of the color filter substrate 210 of the display panel 310. As described above, the material of the transparent conductive layer 220 may be indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium antimony zinc oxide, or other suitable oxide, or at least The stack of the two. In one or more embodiments of the present invention, since the display panel 310 includes the liquid crystal layer 270, it is necessary to control the subsequent process temperature. For example, the step of forming the transparent conductive layer 220 described above is performed at a temperature in the range of about 100 degrees Celsius to about 200 degrees Celsius, or about 120 degrees Celsius to 180 degrees Celsius.

Thereafter, referring to FIG. 5B, the transparent conductive layer 220 is patterned to form a plurality of first transparent electrodes (not shown), a plurality of transparent connecting lines 224, a plurality of second transparent electrodes 226, and a plurality of transparent leads 228 in color. Filter on the substrate 210. The transparent connecting line 224 is connected to the first transparent electrode (not shown).

Here, the step of patterning the transparent conductive layer 220 may include a lithography process, and the reticle used in the lithography process may be combined with a color filter. The alignment marks M1 of the board 210 or the alignment marks M3 of the active device array substrate 260 are aligned. In addition, this lithography process can also set another alignment mark M2 on the surface of the display panel 310.

Referring to FIG. 5C, a plurality of insulating blocks 230, an opaque conductor layer 240, and a light shielding layer 250 are formed. The insulating block 230 is formed between any two second transparent electrodes 226 and at least partially covers the transparent connecting lines 224. The opaque conductor layer 240 is disposed on the patterned transparent conductive layer 220 and the substrate 210. In the present embodiment, the light shielding layer 250 substantially covers the opaque conductor layer 240, and the light shielding layer 250 is at least located on the insulating block 230 and the transparent lead 228. Here, the light shielding layer 250 may be formed of a color filter layer or a black photoresist.

Next, referring to FIG. 5D, the opaque conductor layer 240 and the light shielding layer 250 (see FIG. 5C) are patterned to form a plurality of opaque connecting lines 242, a plurality of opaque leads 244, a plurality of patterned light shielding layers 252, and a plurality of leads Light shielding layer 254. As described above, in some embodiments, the material of the light shielding layer 250 is a photoresist material, and the patterned light shielding layer 252 and the wiring light shielding layer 254 are used as a patterned mask to pattern the opaque conductor layer 240. In some embodiments, the opaque conductor layer 240 and the light shielding layer 250 (see FIG. 5C) may be patterned by another reticle, the relevant details of which are substantially as described above, and are not described herein again.

Here, the opaque connecting line 242 is used to connect any two second transparent electrodes 226 such that the insulating block 230 is interposed between the opaque connecting line 242 and the transparent connecting line 224. The opaque leads 244 are electrically connected to the first transparent electrode (not shown) and the second transparent electrode 226 to the external circuit, respectively. The patterned light shielding layer 252 and the wire shielding layer 254 are respectively disposed on the opaque connecting line 242 and the opaque lead 244 to shield or adjust the opposite of the opaque connecting line 242 and the opaque lead 244. Light.

Referring to FIG. 5E, a polarizer 290 and an optical adhesive layer 300 may be formed on the display panel 310 such that the display panel 310 can adjust the brightness of the light and have a flat surface to be attached to the cover glass 280. Forming display device 200

Referring to FIGS. 5A to 5E, it should be noted that the plurality of steps described above, for example, forming the first transparent electrode 222, the transparent connecting line 224 and the second transparent electrode 226, and the transparent wiring 228, or patterning the light shielding layer 250 to form The patterned light-shielding layer 252 and the wire light-shielding layer 254 can be performed at a temperature in the range of about 100 degrees Celsius to about 200 degrees Celsius, and can be performed in the range of 120 degrees to 180 degrees, so that the liquid crystal layer 270 is not too cold or overheated. Restore the nature of normal operation.

Other related details of the present embodiment are substantially as described in the embodiments of FIGS. 4A to 4H, and are not described herein again.

In various embodiments of the present invention, the light shielding layer is designed to be in a region of the touch sensing device that reflects light to block or adjust the reflected light so as not to affect the user's visual effect. In this case, the area of the touch sensing device that reflects the light can be designed to correspond to the internal configuration of the display panel, for example, corresponding to the black matrix of the color filter substrate, to avoid brightness degradation caused by the touch sensing device, or, for example, Corresponding to the color filter unit of a specific color, the adjusted reflected light color is approximated to the color of the color filter unit, so that the user is less susceptible to the visual effect by the light shielding layer. Moreover, the material of the light shielding layer can be designed as a photoresist, and as a patterned mask to save the process. In addition, the touch sensing device can be formed directly on the display panel or the color filter substrate, and the alignment mark thereon can be utilized to ensure The alignment of the touch sensing device with the display panel or the color filter substrate.

While the invention has been described above in terms of various embodiments, it is not intended to limit the invention, and the invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application attached.

100‧‧‧ display device

110P‧‧‧ pixels

110PR‧‧ ‧ sub-pixel

110PG‧‧‧Subpixel

110PB‧‧‧Subpixel

114‧‧‧Color filter substrate

120‧‧‧Transparent conductive layer

122‧‧‧First transparent electrode

124‧‧‧Transparent cable

126‧‧‧Second transparent electrode

128‧‧‧Transparent leads

140‧‧‧Insulation block

152‧‧‧ patterned blackout layer

154‧‧‧Lead shade layer

BA‧‧‧Blue Filter Unit

GA‧‧‧Green Filter Unit

RA‧‧‧Red Filter Unit

KA‧‧‧Black Matrix

1C-1C‧‧‧ line

1D-1D‧‧‧ line

Claims (19)

A display device comprising: a display panel comprising at least one sub-pixel, wherein the sub-pixel comprises at least one color filter unit and at least one black matrix, the black matrix surrounding the color filter unit; a transparent conductive layer, The transparent conductive layer comprises: at least two first transparent electrodes; at least one transparent connecting line, wherein the transparent connecting lines are connected to the at least two first transparent electrodes; and at least two second transparent electrodes are disposed on the surface of the display panel At least one opaque connecting line, the opaque connecting line is connected to the at least two second transparent electrodes, the opaque connecting line is interlaced with the transparent connecting line; at least one insulating block is disposed between the opaque connecting line and the transparent connecting line; And a patterned light shielding layer covering the opaque connecting line, wherein the projection of the patterned light shielding layer in a direction perpendicular to the display panel at least partially overlaps at least one of the color filter unit and the black matrix. The display device of claim 1, wherein the projection of the patterned light shielding layer in a direction perpendicular to the display panel at least partially overlaps the color filter unit. The display device according to claim 2, the patterned shading The projection of the layer in the direction perpendicular to the display panel falls completely within the color filter unit. The display device of claim 1, wherein the patterned light shielding layer is a color filter layer, and the projection of the color filter layer in a direction perpendicular to the display panel overlaps with the color filter unit, and the patterned shading The layer has substantially the same visible light transmission spectrum as the color filter unit. The display device of claim 1, wherein the patterned light shielding layer is a color filter layer, and the projection of the color filter layer in a direction perpendicular to the display panel overlaps the black matrix. The display device of claim 1, wherein the display panel comprises a visible area and a non-visible area located on at least one side of the visible area; the display apparatus further comprises: a plurality of opaque leads, corresponding to the non-visible area setting, The opaque leads are electrically connected to the first transparent electrodes and the second transparent electrodes respectively; and a plurality of lead shielding layers respectively cover the opaque leads. The display device of claim 6, wherein the lead light shielding layer and the patterned light shielding layer belong to the same patterned layer. The display device of claim 6, further comprising: A plurality of transparent leads are disposed on the surface of the display panel and disposed in the non-visible area, and the opaque leads are respectively overlapped with the transparent leads. A method for manufacturing a display device, comprising: providing a color filter substrate; forming at least two first transparent electrodes, at least one transparent connection line and at least two second transparent electrodes on the color filter substrate, wherein the transparent connection line is connected Forming at least two first transparent electrodes; forming at least one insulating block, wherein the insulating block at least partially covers the transparent connecting line; forming an opaque conductor layer on at least the insulating block; forming a patterned light shielding layer on the opaque conductor layer And patterning the opaque conductor layer with the patterned light shielding layer as a mask to form an opaque connecting line, the opaque connecting line connecting the at least two second transparent electrodes, and the opaque connecting line is located on the insulating block The insulating block is interposed between the opaque connecting line and the transparent connecting line. The method of manufacturing a display device according to claim 9, wherein the color filter substrate comprises a visible area and an invisible area on at least one side of the visible area; wherein the step of forming the patterned light shielding layer further comprises forming a plurality One wire shade layer. A method of manufacturing a display device according to claim 10, The step of patterning the opaque conductor layer comprises: patterning the opaque conductor layer with the lead light shielding layer as a mask to form a plurality of opaque leads, wherein the opaque leads are disposed in a non-visible area, and respectively electrically Connecting the first transparent electrodes and the second transparent electrodes. The method of manufacturing the display device of claim 11, wherein the forming the first transparent electrode, the transparent connecting line and the second transparent electrodes comprises: forming a plurality of transparent leads on the color filter substrate, And the transparent leads are disposed in the non-visible area, and the subsequently formed opaque leads are respectively overlapped with the transparent leads. The method of manufacturing the display device of claim 9, wherein the forming the first transparent electrode, the transparent connecting line and the second transparent electrodes comprises: forming a transparent conductive layer on the color filter substrate; And patterning the transparent conductive layer to form the first transparent electrode, the transparent connecting line and the second transparent electrodes. The method of manufacturing the display device of claim 9, further comprising: before forming the first transparent electrode, the transparent connecting line and the second transparent electrodes, the color filter substrate and an active device array substrate A display panel is formed for the group. The method of manufacturing the display device of claim 14, wherein the step of forming the first transparent electrode, the transparent connecting line and the second transparent electrodes is performed at a temperature in the range of about 100 degrees Celsius to about 200 degrees Celsius. The method of manufacturing a display device according to claim 9, wherein the color filter substrate comprises at least one sub-pixel, wherein the sub-pixel comprises at least one color filter unit, the patterned light-shielding layer and the color filter The color filter units of the light substrate overlap. The method of manufacturing a display device according to claim 16, wherein the patterned light shielding layer is a color filter layer, and the patterned light shielding layer and the color filter unit have substantially the same visible light transmission spectrum. The method of manufacturing a display device according to claim 9, wherein the color filter substrate comprises at least one sub-pixel, the sub-pixel comprising at least one black matrix surrounding the periphery of the sub-pixel, the patterned light-shielding layer The black matrix overlaps. The method of manufacturing a display device according to claim 18, wherein the patterned light shielding layer is a black matrix photoresist or a color photoresist.