CN202351834U - Touch panel with conductive bridge structure - Google Patents

Touch panel with conductive bridge structure Download PDF

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Publication number
CN202351834U
CN202351834U CN2011204466905U CN201120446690U CN202351834U CN 202351834 U CN202351834 U CN 202351834U CN 2011204466905 U CN2011204466905 U CN 2011204466905U CN 201120446690 U CN201120446690 U CN 201120446690U CN 202351834 U CN202351834 U CN 202351834U
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CN
China
Prior art keywords
layer
conducting bridge
index
contact panel
refractive index
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Expired - Lifetime
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CN2011204466905U
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Chinese (zh)
Inventor
叶恵林
洪明渊
杨立春
陈聪明
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TPK Touch Solutions Xiamen Inc
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TPK Touch Solutions Xiamen Inc
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Priority to CN2011204466905U priority Critical patent/CN202351834U/en
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Publication of CN202351834U publication Critical patent/CN202351834U/en
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Abstract

The utility model relates to the technical field of touch control and provides a touch panel with a conductive bridge structure and a manufacturing method thereof, and the touch panel is characterized in that an antireflective layer is arranged on the conductive bridge. According to the touch panel with conductive bridge structure and the manufacturing method of the touch panel provided by the utility model, the visual difference problem of a touch control screen can be eliminated, and the manufacturing steps are reduced.

Description

Contact panel with conducting bridge framework
Technical field
The utility model system is about a kind of contact panel and manufacturing approach thereof with conducting bridge framework about a kind of contact panel and manufacturing approach thereof especially.
Background technology
Contact panel generally includes a substrate and the sensor pad that axially is interrupted distribution in this substrate upper edge first and along the sensing array of second axial distribution, wherein along first axially be interrupted distribution sensor pad be to electrically connect and be electrically insulated with sensing array along second axial distribution by a conducting bridge.
Because conducting bridge is the light tight material (like metals such as molybdenum aluminium molybdenums) of high reflection; When controlling the touch-control screen; Conducting bridge can form spot zone by reflection ray; That is, on the touch-control screen, can demonstrate conducting bridge zone and the regional vision difference problem of no conducting bridge, cause the user visual uncomfortable.
The utility model content
Shortcoming in view of above-mentioned convention contact panel; The purpose system of the utility model provides a kind of contact panel with conducting bridge framework; It forms the anti-reflecting layer that one deck has structure one on top of another on conducting bridge, and makes conducting bridge invisible on contact panel, and then eliminates the problem of vision difference.
The utility model provides a kind of contact panel with conducting bridge framework, and this conducting bridge is provided with an anti-reflecting layer.
In the contact panel with conducting bridge framework of above-mentioned the utility model, this anti-reflecting layer comprises: one first index layer covers this conducting bridge; And one second index layer, be positioned on this first index layer; Wherein, the refractive index of said first index layer is lower than the refractive index of said conducting bridge, and the refractive index of said second index layer is higher than the refractive index of said first index layer.
This anti-reflecting layer also can comprise a third reflect rate layer, be positioned on this second index layer, and the refractive index of this third reflect rate layer is lower than the refractive index of this second index layer.This conducting bridge framework also comprises a protective seam, covers this third reflect rate layer.
This first index layer has the how thickness of rice of 19-23, and this second index layer has the how thickness of rice of 9-13, and this third reflect rate layer then has the how thickness of rice of 22-28.
This first index layer and this third reflect rate series of strata transparent conductive material, this second refractive index series of strata conductive metallic material.Preferably; This transparent conductive material system is selected from by tin indium oxide (indium tin oxide; ITO), zinc oxide aluminum (aluminum zinc oxide; AZO) and antimony tin (antimony tin oxide, the ATO) group of composition, and this conductive metallic material system is selected from the group that is made up of aluminium (Al), chromium (Cr), molybdenum (Mo) and copper (Cu).
The utility model provides a kind of manufacturing approach with contact panel of conducting bridge framework in addition, comprises following steps: form an anti-reflecting layer, be covered on this conducting bridge.
The step of this formation anti-reflecting layer comprises: form one first index layer, cover this conducting bridge; And form one second index layer, be positioned on this first index layer; Wherein, the refractive index of said first index layer is lower than the refractive index of said conducting bridge, and the refractive index of said second index layer is higher than the refractive index of said first index layer.
The step of this formation anti-reflecting layer also comprises: form third reflect rate layer, be covered on this second index layer, and the refractive index of this third reflect rate layer is lower than the refractive index of this second index layer.The step of this formation anti-reflecting layer comprises that more forming a protective seam covers this anti-reflecting layer.This conducting bridge, these antireflection series of strata are formed by same patterning process.
The contact panel of the utility model forms one deck anti-reflecting layer on the conducting bridge framework; Refractive index via different refractivity layer in this anti-reflecting layer of adjustment; Can reduce the reflectivity of anti-reflecting layer, and make conducting bridge invisible on contact panel, and then eliminate the problem of vision difference.
Other purposes and the advantage of the utility model can further be understood from the technical characterictic that the utility model disclosed.
Description of drawings
Figure 1A is the electrode structure synoptic diagram of contact panel.
Figure 1B is the diagrammatic cross-section that is illustrated along profile line I-I ' among Figure 1A.
Fig. 2 is for being made up of the synoptic diagram of anti-reflecting layer in the contact panel with conducting bridge framework of the utility model 2 layer materials.
Fig. 3 is for being made up of the synoptic diagram of anti-reflecting layer in the contact panel with conducting bridge framework of the utility model 3 layer materials.
Fig. 4 is for being made up of the synoptic diagram of anti-reflecting layer in the contact panel with conducting bridge framework of the utility model the n layer material.
[main element symbol description]
10 contact panels
11 substrates
12 first sensor pads
13 second sensor pads
14 leads
16 plain conductors
20 insulation courses
30 conducting bridges
40 protective seams
50 anti-reflecting layers
501 first index layers
502 second index layers
50n n index layer
Embodiment
Below will specify the preferred embodiment of the utility model with reference to graphic.
With reference to Figure 1A and Figure 1B, Figure 1A is the electrode structure synoptic diagram of contact panel, contact panel 10 generally include a substrate 11 with at first sensor pad 12 of this substrate 11 upper edges first axial distribution with along second sensor pad 13 of second axial distribution.Connect with lead 14 between two adjacent first sensor pads 12.Two adjacent second sensor pads 13 place the dual-side of lead 14 respectively, and connect each other with the conducting bridge 30 across lead 14, and keep being electrically insulated between conducting bridge 30 and the lead 14 with modes such as insulation courses 20.Other has a plurality of plain conductors 16 to be arranged on these electrodes week side, passes to the outside with the signal that will sense.Because conducting bridge 30 or to can be the light tight material of a kind of high reflection (like metals such as molybdenum aluminium molybdenums) made; Therefore when controlling contact panel; Conducting bridge 30 can form spot zone by reflection ray; Therefore on this conducting bridge 30, be provided with an anti-reflecting layer (will in subsequent detailed description it) and can solve the bright spot problem, and then make conducting bridge invisible on contact panel, and then eliminate the problem of vision difference.One of above touch panel structure provided embodiment that is merely the utility model, but the utility model is as limit can cause the element of bright spot, the then anti-reflecting layer of all applicable this case like appearance in the contact panel of other structures.
The diagrammatic cross-section of Figure 1B for being illustrated along profile line I-I ' among Figure 1A.Insulation course 20 covers lead 14, and conducting bridge 30 connects the second adjacent sensor pad 13 across insulation course 20, and protective seam 40 covers conducting bridge 30.。This anti-reflecting layer both can be single layer structure; Its material can be the material that reflectivity is lower than conducting bridge; Like tin indium oxide (ITO), zinc oxide aluminum (AZO) and antimony tin transparent conductive materials such as (ATO), also can be sandwich construction (2-is shown in Figure 4 like subsequent figures), wherein preferred sandwich construction.
Fig. 2 is for being made up of the synoptic diagram of anti-reflecting layer in the contact panel with conducting bridge framework of the utility model 2 layer materials.Among Fig. 2; Component symbol 20 expression insulation courses; Component symbol 30 expression conducting bridges form (as: coating) in regular turn and are used for the photoresist layer (scheming not show) of patterning as the transparent conductive material layer of first index layer 501, as the conductive metallic material layer 502, of second index layer, wherein on conducting bridge 30; The refractive index of this transparent conductive material layer 501 is lower than the refractive index of conducting bridge 30, and the refractive index of this conductive metallic material layer 502 is higher than the refractive index of this transparent conductive material layer 501.This transparent conductive material system is selected from by tin indium oxide (indium tin oxide; Abbreviation ITO), zinc oxide aluminum (aluminum zinc oxide; Be called for short AZO) with the group of antimony tin (antimony tin oxide is called for short ATO) composition, this conductive metallic material is to be selected from the group that is made up of aluminium (Al), chromium (Cr), molybdenum (Mo) and copper (Cu).Use an acidic etching liquid to carry out etching in the exposure back, and form the anti-reflecting layer 50 that one deck has structure one on top of another, on this anti-reflecting layer 50, plate layer protective layer 40 more afterwards.
As shown in Figure 3, can on this conductive metallic material layer 502, be coated with another transparent conductive material layer 503 as third reflect rate layer, to adjust the refractive index of this anti-reflecting layer 50.The refractive index of this transparent conductive material layer 503 is lower than the refractive index of this conductive metallic material layer 502.This transparent conductive material system is selected from the group that is made up of tin indium oxide, zinc oxide aluminum and antimony tin.Depend on the needs, the laminated structure of this anti-reflecting layer 50 can be coated with more than three layers, with the refractive index of this anti-reflecting layer 50 of further adjustment, shown in the first index layer 501... n index layer 50n among Fig. 4.
(embodiment 1)
On conducting bridge 30, be coated with anti-reflecting layer 50 and in regular turn and be used for the photoresist layer of patterning with ITO, Cr, three index layers of ITO; Use an acidic etching liquid to carry out etching in exposure back, make conducting bridge 30 have following structure: conducting bridge 30/ITO (thickness: 21 how rice)/Cr (thickness: 12 how rice)/ITO (thickness: 25 how rice) together with anti-reflecting layer 50.
(embodiment 2)
On conducting bridge 30, be coated with anti-reflecting layer 50 and in regular turn and be used for the photoresist layer of patterning with ITO, Al, three index layers of ITO; Use an acidic etching liquid to carry out etching in exposure back, make conducting bridge have following structure: conducting bridge/ITO (thickness: 21 how rice)/Al (thickness: 10 how rice)/ITO (thickness: 25 how rice) together with anti-reflecting layer 50.
(embodiment 3)
On conducting bridge 30, be coated with anti-reflecting layer 50 and in regular turn and be used for the photoresist layer of patterning with AZO, Al, three index layers of AZO; Use an acidic etching liquid to carry out etching in exposure back, make conducting bridge have following structure: conducting bridge/AZO (thickness: 20 how rice)/Al (thickness: 11 how rice)/AZO (thickness: 23 how rice) together with anti-reflecting layer 50.
(embodiment 4)
On conducting bridge 30, be coated with anti-reflecting layer 50 and in regular turn and be used for the photoresist layer of patterning with ATO, Mo, three index layers of ATO; Use an acidic etching liquid to carry out etching in exposure back, make conducting bridge have following structure: conducting bridge/ATO (thickness: 22 how rice)/Mo (thickness: 12 how rice)/ATO (thickness: 27 how rice) together with anti-reflecting layer 50.
(embodiment 5)
On conducting bridge 30, be coated with anti-reflecting layer 50 and in regular turn and be used for the photoresist layer of patterning with AZO, Cr, three index layers of AZO; Use an acidic etching liquid to carry out etching in exposure back, make conducting bridge have following structure: conducting bridge/AZO (thickness: 20 how rice)/Cr (thickness: 10 how rice)/AZO (thickness: 28 how rice) together with anti-reflecting layer 50.
Laminated employed material and coating thickness through the adjustment anti-reflecting layer can reduce the refractive index of anti-reflecting layer, thereby make the conducting bridge under the anti-reflecting layer invisible.In above-mentioned each specific embodiment, constitute anti-reflecting layer first, second, third layer of index layer thickness respectively 19-23 how rice, 9-13 how rice, 22-28 can obtain preferable effect how in the scope of rice.
The utility model is narrated as above with reference to preferred embodiment and illustrative figures, precisely because should not be regarded as restricted person.The personage who is familiar with correlative technology field does not all leave the scope that the utility model claim is advocated to holding any modification, omission and the variation of being made within its form and the concrete example.

Claims (8)

1. the contact panel with conducting bridge framework is characterized in that on conducting bridge, being provided with an anti-reflecting layer.
2. the contact panel with conducting bridge framework as claimed in claim 1 is characterized in that, this anti-reflecting layer comprises:
One first index layer covers this conducting bridge; And
One second index layer is positioned on this first index layer;
It is characterized in that the refractive index of said first index layer is lower than the refractive index of said conducting bridge, the refractive index of said second index layer is higher than the refractive index of said first index layer.
3. the contact panel with conducting bridge framework as claimed in claim 2 is characterized in that, this anti-reflecting layer also comprises third reflect rate layer, be positioned on this second index layer, and the refractive index of this third reflect rate layer is lower than the refractive index of this second index layer.
4. the contact panel with conducting bridge framework as claimed in claim 3 is characterized in that, also comprises a protective seam, covers this third reflect rate layer.
5. the contact panel with conducting bridge framework as claimed in claim 3 is characterized in that, this first index layer has the how thickness of rice of 19-23, and this second index layer has the how thickness of rice of 9-13, and this third reflect rate layer then has the how thickness of rice of 22-28.
6. the contact panel with conducting bridge framework as claimed in claim 3 is characterized in that, this first index layer and this third reflect rate series of strata transparent conductive material, this second refractive index series of strata conductive metallic material.
7. the contact panel with conducting bridge framework as claimed in claim 6 is characterized in that, this transparent conductive material system is selected from the group that is made up of tin indium oxide, zinc oxide aluminum and antimony tin.
8. the contact panel with conducting bridge framework as claimed in claim 6 is characterized in that, this conductive metallic material system is selected from the group that is made up of aluminium, chromium, molybdenum and copper.
CN2011204466905U 2011-11-02 2011-11-02 Touch panel with conductive bridge structure Expired - Lifetime CN202351834U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2011204466905U CN202351834U (en) 2011-11-02 2011-11-02 Touch panel with conductive bridge structure

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Application Number Priority Date Filing Date Title
CN2011204466905U CN202351834U (en) 2011-11-02 2011-11-02 Touch panel with conductive bridge structure

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CN202351834U true CN202351834U (en) 2012-07-25

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103092384A (en) * 2011-11-02 2013-05-08 宸鸿科技(厦门)有限公司 Touch panel with conductive bridge structure and manufacturing method thereof
CN105572982A (en) * 2016-01-18 2016-05-11 友达光电股份有限公司 Display device and manufacturing method thereof
CN106249952A (en) * 2016-07-29 2016-12-21 京东方科技集团股份有限公司 A kind of touch screen, its manufacture method and display device
CN113130343A (en) * 2021-06-17 2021-07-16 中芯集成电路制造(绍兴)有限公司 Conductive bridge between chips, manufacturing method thereof and chip testing method
EP4120054A2 (en) 2021-06-23 2023-01-18 Decentralized Biotechnology Intelligence Co., Ltd. Display with touch sensing integration

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103092384A (en) * 2011-11-02 2013-05-08 宸鸿科技(厦门)有限公司 Touch panel with conductive bridge structure and manufacturing method thereof
CN105572982A (en) * 2016-01-18 2016-05-11 友达光电股份有限公司 Display device and manufacturing method thereof
CN105572982B (en) * 2016-01-18 2019-06-25 友达光电股份有限公司 Display device and manufacturing method thereof
CN106249952A (en) * 2016-07-29 2016-12-21 京东方科技集团股份有限公司 A kind of touch screen, its manufacture method and display device
CN113130343A (en) * 2021-06-17 2021-07-16 中芯集成电路制造(绍兴)有限公司 Conductive bridge between chips, manufacturing method thereof and chip testing method
CN113130343B (en) * 2021-06-17 2021-10-01 绍兴中芯集成电路制造股份有限公司 Conductive bridge between chips, manufacturing method thereof and chip testing method
EP4120054A2 (en) 2021-06-23 2023-01-18 Decentralized Biotechnology Intelligence Co., Ltd. Display with touch sensing integration

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Granted publication date: 20120725