TWI599271B - A device for coating nano-particles on a substrate and a method for manufacturing the same - Google Patents

Description

Device for coating nano particles on substrate and manufacturing method thereof

The invention relates to a device for coating nano particles on a substrate and a manufacturing method thereof, in particular to a plasma processing device for cold plasma processing of at least one supply rod disposed inside thereof, and at normal temperature A device for applying a modified mixture to a substrate under pressure to modify, coat, sterilize or toxic the substrate and a method for its manufacture.

According to the vacuum photovoltaic paste, it has been used in the semiconductor process and processing of various materials in the early stage. Because the technology of processing in a vacuum environment needs to be equipped with expensive vacuum equipment, it is subject to many conditions and the industrial field of application is limited. Not competitive. At this point, there is an atmospheric photovoltaic slurry that is not required to be operated in a vacuum environment. It has been developed through the research and development of experts in the field. Among them, atmospheric photovoltaic paste is widely used, such as paper, cotton, textiles, metal, Surface modification of polymer materials such as glass, rubber, plastic or biomedical technology; disinfection and sterilization of gases, liquids or medical devices; and coating and cleaning of various materials can be seen.

The atmospheric glow plasma is powered by a power source between the two electrodes to drive an electric field, so that the gas between the electric fields collapses and dissociates due to ionization to generate active gas species (ie, plasma). In addition, according to the plasma form, a plurality of plasma source designs are also distinguished, such as Corona discharge, Dielectric barrier discharge, and Plasma jet.

See the sixth figure, which is a schematic diagram of corona discharge. As shown, the power supply 7 energizes the anode 702 and the cathode metal line 704 such that the gas between the electrodes is ionized and produces a discharge phenomenon near the tip, a so-called corona discharge 706. Although the corona discharge 706 can meet the low temperature requirement, it has to be carried out in a high voltage and high frequency environment, the plasma density is low, and the plasma space uniformity is poor (as shown in the drift region 708 in the figure). Therefore, it can only be used for lower quality material processing needs.

In addition, Patent No. I432228 discloses a micro-plasma generating device and a sterilizing system thereof, the patent specification of which is described in the second paragraph of the prior art on page 6: "To improve the damage to the treated object during sterilization, and to reduce Vacuum low-temperature plasma machine purchase cost, recently developed by using non-thermal, atmospheric pressure dielectric barrier discharge (DBD) plasma for sterilization, this DBD plasma system produces plasma between the two plane electrodes, one of which The electrode is covered with a dielectric barrier to avoid unintended micro-arcing. DBD plasma can reduce or avoid the effects of high-energy parts, as long as low energy is applied to obtain highly reactive substances to achieve sterilization. DBD plasma still has limitations in use. This is because most medical devices have irregular shapes, but DBD plasma is difficult to cover all exposed surfaces of the above medical devices, or it is difficult to apply to some gaps in the aforementioned medical devices. The bacteria hidden in the body, therefore, the effectiveness of sterilization is subject to the geometry of the object to be treated. On the other hand, the bacteria that remain and remain, Often in a humid environment, such as an aqueous solution, it is necessary to apply a sterilization technique that ensures complete sterilization in an aqueous solution. However, if DBD plasma is used for sterilization in an aqueous solution, the difficulty will be greatly improved." The absence of dielectric discharge in related process operations is disclosed and will not be described here.

Also, refer to the seventh figure, which is a schematic diagram of the micro-plasma generating device (the same as I432228) 1). As shown in the figure, the microplasma generating apparatus disclosed in Japanese Patent No. I432228 and a sterilization system thereof are operated at a normal temperature and employ a capillary hollow internal electrode. Moreover, it is not necessary to use high wattage to generate plasma, the micro-plasma generating device can be downsized to a pen type, and the reaction gas and the plasma excitation gas are shunted. The reaction gas transmitted through the internal electrode, such as oxygen, causes the composition of the plasma-excited substance to change, and the proportion of the oxygen-exciting substance in the plasma is increased. Through appropriate adjustment of the reaction gas concentration, working distance and treatment time, the micro-plasma sterilization parameters can be optimized to sterilize different strains such as Escherichia coli, Staphylococcus aureus, Thermophila, etc., even These bacteria are hidden in a liquid environment and can still achieve complete sterilization.

The micro-plasma generating device and the sterilizing system thereof of the above-mentioned Patent No. I432228, the plasma generated by the micro-plasma generating device is arranged in a small amount, and only sterilizes the bacteria, and does not disclose that the other substances can be modified, coated or cleaned. . Moreover, the formation state of the plasma depends on the gas type replacement. If the plasma coating work is performed on the substrate of other natures, the plasma content is small, and it is impossible to carry out a large or large area of the substrate. Coating operation is not suitable for mass production in such industries. Secondly, in order to adapt to the nature of the substrate, if it is only changed for gas type to change the plasma properties, it has limitations and difficulties in matching with the substrate. . Here, there is a need for improvement of the above plasma generating apparatus.

SUMMARY OF THE INVENTION A primary object of the present invention is to provide an apparatus for coating nanoparticles on a substrate and a method of manufacturing the same, which is to energize a plasma processing apparatus and introduce a gas to perform a cold plasma processing operation. And reacting with at least one feed rod disposed inside the plasma processing device to release a plurality of nano particles to process the plasma and one of the nano particles The substrate is coated on the substrate; thereby modifying, coating, disinfecting or toxicizing the substrate.

A second object of the present invention is to provide an apparatus for coating nano particles on a substrate, and a method of manufacturing the same, which comprises performing a cold plasma processing operation on at least one of the supply rods of the plasma processing apparatus, and completing the processing One of the mixtures is applied to a substrate for modification, coating, sterilization or toxicity measurement. It can be operated under normal ambient temperature and normal pressure environment, without being limited by vacuum environment and related facilities needed to adapt to vacuum environment.

A further object of the present invention is to provide an apparatus for coating nano particles on a substrate, and a method of manufacturing the same, wherein the plasma processing apparatus can be disposed on a substrate, and the substrate can be disposed on a processing platform. The processing platform can be a conveyor belt in a stationary or transport state; thereby setting up a mass production process that achieves automation and high speed for substrate modification, coating, sterilization or toxicity measurement.

The present invention provides a device for coating nano particles on a substrate and a method for manufacturing the same, which provide a plasma processing device and are disposed inside the plasma processing device. At least one feed rod. The plasma processing apparatus is energized and a gas is introduced for cold plasma processing so that the generated plasma strikes the supply rod, thereby reacting and releasing a plurality of nanoparticles. The slurry and the mixture of the nano particles are sprayed out at a discharge port of the plasma processing device and coated on a substrate to modify, polish, sterilize or test the substrate. . The working environment in which the mixture is applied to the substrate can be carried out under normal atmospheric temperature and normal pressure, and is not limited to the vacuum environment and the relevant facilities for adapting the vacuum environment.

1‧‧‧ Plasma processing equipment

102‧‧‧ inlet

104‧‧‧Outlet

106‧‧‧ Plasma

108‧‧‧Nano particles

20‧‧‧ electrodes

40‧‧‧ Feeding rod

60‧‧‧ mixture

2‧‧‧Power supply unit

202‧‧‧ positive

204‧‧‧negative

3‧‧‧ gas installation

4‧‧‧ gas flow controller

5‧‧‧Substrate

502‧‧‧ accommodating slots

504‧‧‧Liquid

6‧‧‧Processing platform

7‧‧‧Power supply

702‧‧‧Anode

704‧‧‧Cathed metal wire

706‧‧‧corona discharge

708‧‧‧ drifting area

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S4‧‧‧ steps

1 is a flow chart showing a method for producing a coated nanoparticle on a substrate according to a first embodiment of the present invention; and a second embodiment: the coated nanoparticle according to the first embodiment of the present invention A schematic diagram of a device for a substrate; a third diagram: an apparatus for coating a nanoparticle on a substrate according to a first embodiment of the present invention; and a fourth diagram: a coating of the first embodiment of the present invention Schematic diagram of the liquid and accommodating tank of the device of the granules on the substrate; FIG. 5 is a schematic view showing the array coating of the device for coating the nanoparticles on the substrate according to the second embodiment of the present invention; It is a schematic diagram of a conventional corona discharge; and a seventh diagram: it is a schematic diagram of a conventional microplasma generating device.

For a better understanding and understanding of the features and advantages of the present invention, the preferred embodiments and the detailed description are described as follows: Referring to the first figure, which is a first embodiment of the present invention A block diagram of a method for producing a coated nanoparticle on a substrate. As shown in the figure, the present invention is a method for producing a coated nanoparticle on a substrate, comprising the steps of: step S1: providing a plasma processing device for performing cold plasma processing; and step S2: at least a feeding rod is disposed in the plasma processing device; step S3: the plasma processing device is energized and a gas is introduced, the plasma processing device is subjected to cold plasma processing and plasma is generated, and the feeding rod is electrically The slurry impacts and releases a plurality of nano particles, and the plasma is mixed with the nano particles to be one of the plasma processing devices The discharge port is sprayed, the discharge port is at normal temperature and pressure; and step S4: providing a substrate, the substrate is disposed at a position opposite to the discharge port, and the substrate is at normal temperature and pressure, The plasma and the nanoparticulates are applied to the substrate.

The foregoing manufacturing method is referred to, and reference is made to the second drawing and the third drawing, which is a schematic view and an operation diagram of the apparatus for coating the nanoparticle on the substrate according to the first embodiment of the present invention. As shown, when the plasma processing apparatus 1 is to perform cold plasma processing, a positive electrode 202 and a negative electrode 204 coupled to the plasma processing apparatus 1 are energized by a power supply unit 2. The gas supplied from a gas device 3 is introduced into the plasma processing apparatus 1 from the gas inlet port 102 provided in the plasma processing apparatus 1. One of the electrodes 20 provided in the plasma processing apparatus 1 is subjected to cold plasma processing by a gas to generate a plasma 106.

The gas supply of the gas device 3 can be a plasma excitation gas and a reaction gas. The type, flow rate and time of the gas introduction into the gas inlet port 102 can be regulated by a gas flow controller 4. One side of the gas flow controller 4 communicates with the gas device 3 to receive the supplied gas, and the other side of the gas flow controller 4 communicates with the inlet port 102 to determine parameter adjustments such as the type of gas introduced, flow rate, and time.

The plasma 106 generated by the plasma processing apparatus 1 is impacted by the supply rod 40 disposed in the plasma processing apparatus 1 to release a plurality of nano particles 108, which can be set in plural, and can be used in accordance with the The amount of the elastic amount of the supply rod 40 is set for the demand of the amount of the rice particles 108. The plasma 106 and the nanoparticles 108 are then ejected at the discharge port 104 of the plasma processing apparatus 1, and the ejected material is a mixture 60 having a plasma 106 and a plurality of nanoparticles 108.

Wherein, the supply rod 40 is a metal material rod, an alloy material rod, a carbon material rod, a polymer Material, ceramic or plastic; nanoparticulates 108 are particles of metals, oxides, nitrides, carbides, polymeric materials, ceramics or plastics; however, others may react with the plasma 106 and release the nanoparticles 108, The materials coated on the substrate 5 can be used, and are not limited thereto. Here, the nanoparticles 108 are changed depending on the material state of the supply rod 40, or the gas supply type is changed, so that the plasma 106 generated by the cold plasma processing reacts with the supply rod 40 to determine the nanometer. The nature of the particles 108.

A processing platform 6 is disposed outside the plasma processing apparatus 1 and opposite to the discharge opening 104. The processing platform 6 is a conveyor belt, which can be in a stationary state or a transmission state. The substrate 5 is disposed on the processing platform 6 at a position relative to the discharge opening 104. The nanoparticles 108 (or the mixture 60) produced by the plasma processing apparatus 1 by cold plasma processing are applied onto the substrate 5, and the substrate 5 has a metal, an oxide, a nitride, a carbide, a polymer material, The ceramic or plastic nanoparticle 108 is modified, coated, sterilized or tested for toxicity on the substrate 5. Wherein, the material is located at the discharge port 104 and the substrate 5 (processing platform 6) is an environment of normal temperature and pressure, that is, when the plasma processing apparatus 1 of the present invention applies the substrate 5, it can be used in general. The environment is carried out without limitation in the vacuum environment or other operating conditions limited by the substrate 5, the plasma processing apparatus 1 or the relevant facilities adapted to the vacuum environment.

In addition, the coated substrate 5 can be tri-state (ie, solid, liquid, and gaseous) materials such as cotton objects, plastics, textiles, metals, paper, diapers, OK stretch, liquid or air. That is, the aspect of the substrate 5 is not restricted to a specific state, and the plasma processing apparatus 1 can be used to perform the coating operation of the nanoparticle 108 (or the mixture 60). In this way, it is beneficial to apply to various products in various fields for product modification, coating, sterilization or toxicity testing to enhance the main or additional price of the product. value.

Referring to the fourth drawing, it is a schematic diagram of a liquid and a receiving tank of a device for coating nanoparticle on a substrate according to a first embodiment of the present invention. As shown in the figure, the present invention is based on the substrate 5 of the coating material as a liquid 504. Here, the liquid 504 is placed in a receiving groove 502, and the cold processing slurry is processed by the power supply processing device 1. The nanoparticles 108 (or mixture 60) are sprayed at the discharge port 104 and applied to the liquid 504 for modification, detection or sterilization.

Referring to FIG. 5, it is a schematic diagram of array coating of a device for coating nanoparticles on a substrate according to a second embodiment of the present invention. As shown in the figure, the plasma processing apparatus 1 of the present invention can adopt an array arrangement of a plurality of combined types, and the plurality of plasma processing apparatuses 1 provided in the array are disposed opposite to the substrate 5 (processing platform 6). The array arrangement is advantageous for coating the large or large area substrate 5 with the nanoparticle 108 (or mixture 60) to achieve high speed processing. Moreover, the coating operation of the present invention can be carried out under normal temperature and normal pressure conditions, and is also not restricted by the nature of the substrate 5 without causing complete coating of the substrate. It is different from the conventional plasma processing equipment 1 in plasma processing in high temperature and high pressure or vacuum environment, and is limited by the size of the equipment or environmental restrictions and cannot be arrayed. Furthermore, it is limited by the appearance or the nature of the substrate 5 to increase the difficulty of performing a complete coating operation on the substrate 5.

In summary, the apparatus for coating a nanoparticle on a substrate of the present invention and a method of manufacturing the same are used for cold plasma processing by a plasma processing apparatus, and the generated plasma impact is provided in the interior of the plasma processing apparatus. The rods are released to release a plurality of nanoparticles. Then, the plasma and the mixture of the nanoparticles are sprayed out at the discharge port of the plasma processing device to coat the substrate relative to the discharge port, and then the related material is attached to the substrate. Nanoparticles with modification, coating, sterilization or toxicity detection effect. The coating operation can be carried out under normal temperature and pressure, and the substrate can be completely coated without limitation. Alternatively, the plasma processing apparatus may be arranged to perform coating operations on a large number of large-area substrates, and the substrate may be placed on a processing platform (conveyor belt) for an automated coating process to achieve high-speed operation.

The invention has indeed reached a breakthrough structure, and has improved invention content, and at the same time, can achieve industrial utilization and progress. When complying with the provisions of the patent law, the invention patent application is filed according to law, and the application for review by the bureau is required. Legal patents, to the pray.

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Claims (6)

A method for producing a coated nanoparticle on a substrate, comprising the steps of: providing a plasma processing device for performing cold plasma processing; and providing at least one supply rod in the plasma processing device; the plasma The processing device is energized and a gas is introduced, the plasma processing device is subjected to cold plasma processing and plasma is generated, and the feeding rod is impacted by the plasma to release a plurality of nano particles, and the nano particles are processed by the plasma. One of the discharge ports of the device is sprayed out, the discharge port is at normal temperature and pressure; and at least one substrate is provided, the substrate is disposed at a position opposite to the discharge port, and the substrate is at normal temperature and pressure. The nanoparticles are coated on the substrate. The method for producing a coated nanoparticle according to claim 1, wherein the plasma processing apparatus is disposed in an array and is disposed to be coated with respect to the substrate. The method for producing a coated nanoparticle according to claim 1, wherein the supply rod is a metal material rod, an alloy material rod, a carbon material rod, a polymer material or a ceramic. The method for producing a coated nanoparticle according to claim 1, wherein the nanoparticle is Particles of metals, oxides, nitrides, carbides, polymeric materials or ceramics. The method for producing a coated nanoparticle according to claim 1, wherein the substrate is a cotton object, a plastic, a textile, a metal, a paper or a liquid. The method for producing a coated nanoparticle according to claim 1, wherein the substrate is disposed on a processing platform, and the processing platform is in a static state or a transport state.