TWI595689B - Piezoelectric device, liquid ejection head, and method of manufacturing piezoelectric device - Google Patents

Piezoelectric device, liquid ejection head, and method of manufacturing piezoelectric device Download PDF

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TWI595689B
TWI595689B TW105120612A TW105120612A TWI595689B TW I595689 B TWI595689 B TW I595689B TW 105120612 A TW105120612 A TW 105120612A TW 105120612 A TW105120612 A TW 105120612A TW I595689 B TWI595689 B TW I595689B
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substrate
pressure chamber
piezoelectric element
region
piezoelectric
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TW105120612A
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TW201703297A (en
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高部本規
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精工愛普生股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1607Production of print heads with piezoelectric elements
    • B41J2/161Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14201Structure of print heads with piezoelectric elements
    • B41J2/14233Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1623Manufacturing processes bonding and adhesion
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1632Manufacturing processes machining
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/1051Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/20Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • H10N30/204Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
    • H10N30/2047Membrane type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14201Structure of print heads with piezoelectric elements
    • B41J2/14233Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • B41J2002/14241Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm having a cover around the piezoelectric thin film element
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14201Structure of print heads with piezoelectric elements
    • B41J2/14233Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • B41J2002/14266Sheet-like thin film type piezoelectric element

Description

壓電裝置、液體噴射頭、及壓電裝置之製造方法 Piezoelectric device, liquid ejecting head, and manufacturing method of piezoelectric device

本發明係關於一種具備形成有空室之第1基板、及積層於區劃空室之振動板上之壓電元件之壓電裝置、液體噴射頭、及壓電裝置之製造方法者。 The present invention relates to a piezoelectric device including a first substrate on which an empty chamber is formed, and a piezoelectric device, a liquid ejecting head, and a piezoelectric device, which are laminated on a piezoelectric element on a vibrating plate.

壓電裝置係具備壓電元件,且應用於各種液體噴射裝置或振動感測器等。例如,於液體噴射裝置中,利用壓電裝置自液體噴射頭噴射(噴出)各種液體。作為該液體噴射裝置,有噴墨式印表機或噴墨式繪圖機等圖像記錄裝置,但最近活用可使極少量之液體準確地噴附至特定位置之特點而亦應用於各種製造裝置。例如,應用於製造液晶顯示器等之彩色濾光片之顯示器製造裝置、形成有機EL(Electro Luminescence:電致發光)顯示器或FED(面發光顯示器)等之電極之電極形成裝置、製造生物晶片(生物化學元件)之晶片製造裝置。且,於圖像記錄裝置用之記錄頭中噴射液狀之墨水,於顯示器製造裝置用之色材噴射頭中噴射R(Red:紅)、G(Green:綠)、B(Blue:藍)之各色材之溶液。又,於電極形成裝置用之電極材料噴射頭中噴射液狀之電極材料,於晶片製造裝置用之生物體有機物噴射頭中噴射生物體有機物之溶液。 The piezoelectric device is provided with a piezoelectric element and is applied to various liquid ejecting apparatuses, vibration sensors, and the like. For example, in the liquid ejecting apparatus, various liquids are ejected (sprayed) from the liquid ejecting head by the piezoelectric device. As the liquid ejecting apparatus, there is an image recording apparatus such as an ink jet printer or an ink jet type plotter, but recently, it has been applied to various manufacturing apparatuses by utilizing a feature that a very small amount of liquid can be accurately attached to a specific position. . For example, a display manufacturing apparatus for manufacturing a color filter such as a liquid crystal display, an electrode forming apparatus for forming an electrode of an organic EL (Electro Luminescence) display or an FED (Face Light Emitting Display), or the like, and a biochip (bio Wafer manufacturing apparatus for chemical components). Further, liquid ink is ejected into the recording head for the image recording apparatus, and R (Red: red), G (Green: green), and B (Blue: blue) are ejected in the color material ejecting head for the display manufacturing apparatus. a solution of each color material. Further, a liquid electrode material is ejected from the electrode material ejecting head for the electrode forming apparatus, and a solution of the biological organic substance is ejected in the bioorganic material ejecting head for the wafer manufacturing apparatus.

利用上述壓電裝置之液體噴射頭具備複數個噴嘴、與其對應之壓力室及壓電元件。壓力室係藉由蝕刻壓力室形成基板(致動器基板)而形成,其一部分係藉由具有可撓性之振動板而區劃。於該振動板 上,形成有下電極層、包含鋯鈦酸鉛(PZT)等之壓電材料之壓電體層、及上電極層等積層而成之壓電元件。又,於與壓力室形成基板相反之側接合有連通基板,經由形成於該連通基板之噴嘴連通路而連通有壓力室與噴嘴。且,如此般構成之液體噴射頭係藉由電壓之施加而使與各噴嘴對應之壓電元件變形,於對應之壓力室內之液體產生壓力變動而自各噴嘴噴射液體(例如,參照專利文獻1)。 The liquid ejecting head using the above piezoelectric device includes a plurality of nozzles, a pressure chamber corresponding thereto, and a piezoelectric element. The pressure chamber is formed by forming a substrate (actuator substrate) by etching a pressure chamber, and a part thereof is partitioned by a vibrating plate having flexibility. On the vibrating plate A piezoelectric element in which a lower electrode layer, a piezoelectric layer including a piezoelectric material such as lead zirconate titanate (PZT), and a top electrode layer are laminated is formed. Further, a communication substrate is joined to the side opposite to the pressure chamber forming substrate, and a pressure chamber and a nozzle are communicated via a nozzle communication path formed in the communication substrate. In the liquid ejecting head configured as described above, the piezoelectric element corresponding to each nozzle is deformed by the application of a voltage, and a liquid is generated in a pressure in the corresponding pressure chamber to eject the liquid from each nozzle (for example, refer to Patent Document 1). .

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2015-089614號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2015-089614

然而,伴隨液體噴射頭之小型化,壓力室形成基板之板厚有變薄之傾向。因此,壓力室形成基板因剛性變低而容易變形。尤其,壓力室形成基板中區劃相鄰之壓力室之隔板因近年之伴隨噴嘴之高密度化之壓力室之窄間距化而有壓力室之排列設置方向之尺寸變小之傾向。因此,區劃壓力室之隔板之剛性有進一步變低之傾向。其結果,有壓力室形成基板易變形,且壓力室形成基板與接合於其之連通基板背離之虞。例如,如圖12所例示之記錄頭100,複數層積層而成之壓電元件90有因構成該壓電元件90之層(膜)所產生之拉伸力等,而於初始狀態(未施加電壓之狀態)下朝與壓力室91相反之側彎曲之虞。若該彎曲經由振動板92傳遞至區劃壓力室91之周圍之壓力室形成基板93之一部分,則尤其壓力室91之周邊部之壓力室形成基板93(即,區劃壓力室91之隔板部)以朝壓電元件90側翹曲之方式變形。其結果,有接合壓力室形成基板93與連通基板94之接著劑等剝落,壓力室形成基板93之一部分自連通基板94剝離之虞。此種問題亦同樣存在於具備有於空室上積層壓電元件之第1基板及與其接合之第2基板之壓電裝置中。 However, with the miniaturization of the liquid ejecting head, the thickness of the substrate in which the pressure chamber is formed tends to be thin. Therefore, the pressure chamber forming substrate is easily deformed due to the low rigidity. In particular, in the pressure chamber forming the separator in which the pressure chambers adjacent to each other in the substrate are formed, the size of the pressure chambers in the arrangement direction of the pressure chambers tends to be small due to the narrow pitch of the pressure chambers which have been increased in density in recent years. Therefore, the rigidity of the partition of the zone pressure chamber tends to be further lowered. As a result, the pressure chamber forming substrate is easily deformed, and the pressure chamber forming substrate faces away from the communicating substrate bonded thereto. For example, as in the recording head 100 illustrated in Fig. 12, a plurality of laminated piezoelectric elements 90 have an initial state (not applied) due to a tensile force or the like generated by a layer (film) constituting the piezoelectric element 90. In the state of the voltage, the lower side is bent toward the side opposite to the pressure chamber 91. If the bending is transmitted to a portion of the pressure chamber forming substrate 93 around the division pressure chamber 91 via the vibration plate 92, the pressure chamber forming the substrate 93 (i.e., the partition portion of the division pressure chamber 91) is formed in the peripheral portion of the pressure chamber 91. It is deformed in such a manner as to warp toward the piezoelectric element 90 side. As a result, the bonding pressure chamber forming substrate 93 and the interconnecting substrate 94 are peeled off, and a part of the pressure chamber forming substrate 93 is peeled off from the communicating substrate 94. This problem also exists in a piezoelectric device including a first substrate in which a piezoelectric element is laminated on an empty chamber and a second substrate bonded thereto.

本發明係鑑於此種情況而完成者,其目的在於提供一種可抑制形成空室之第1基板與積層於第1基板之第2基板之剝離之壓電裝置、液體噴射頭、及壓電裝置之製造方法。 The present invention has been made in view of the above circumstances, and an object of the invention is to provide a piezoelectric device, a liquid ejecting head, and a piezoelectric device capable of suppressing peeling of a first substrate forming a blank and a second substrate laminated on a first substrate. Manufacturing method.

本發明之壓電裝置係為了達成上述目的而提出者,其特徵在於具備:第1基板,其形成有空室;振動板,其區劃上述空室之一側之面;壓電元件,其係於上述振動板之與上述空室相反之側,自振動板側起依序積層第1電極層、壓電體層、及第2電極層而成;及第2基板,其積層於上述第1基板之與振動板側相反之側;且上述第1基板之上述空室之開口周緣區域之至少一部分較該開口周緣區域更外側之區域之板厚更厚。 In order to achieve the above object, a piezoelectric device according to the present invention includes: a first substrate formed with an empty chamber; a diaphragm that partitions a surface on one side of the empty chamber; and a piezoelectric element a first electrode layer, a piezoelectric layer, and a second electrode layer are sequentially laminated from the side of the vibrating plate on a side opposite to the empty chamber; and the second substrate is laminated on the first substrate The side opposite to the vibrating plate side; and at least a portion of the opening peripheral region of the empty chamber of the first substrate is thicker than a region outside the opening peripheral region.

根據該構成,即便壓電元件朝與振動板相反之側變形,亦可抑制第1基板與第2基板之剝離。其結果,可提高壓電裝置之可靠性。 According to this configuration, even if the piezoelectric element is deformed toward the side opposite to the diaphragm, peeling of the first substrate and the second substrate can be suppressed. As a result, the reliability of the piezoelectric device can be improved.

又,於上述構成中,較理想為上述開口周緣區域之整周較該開口周緣區域更外側之區域之板厚更厚。 Further, in the above configuration, it is preferable that the entire circumference of the opening peripheral region is thicker than the outer region of the opening peripheral region.

根據該構成,可進一步抑制第1基板與第2基板之剝離。其結果,可進一步提高壓電裝置之可靠性。 According to this configuration, peeling of the first substrate and the second substrate can be further suppressed. As a result, the reliability of the piezoelectric device can be further improved.

再者,本發明之壓電裝置之特徵在於具備:第1基板,其形成有空室;振動板,其區劃上述空室之一側之面;壓電元件,其係於上述振動板之與上述空室相反之側,自振動板側起依序積層第1電極層、壓電體層、及第2電極層而成;及第2基板,其積層於上述第1基板之與振動板側相反之側;且上述第1基板之至少一部分朝上述空室板厚逐漸變厚。 Furthermore, the piezoelectric device of the present invention is characterized by comprising: a first substrate having an empty chamber; a vibration plate dicating a surface on one side of the empty chamber; and a piezoelectric element attached to the vibration plate On the opposite side of the empty chamber, the first electrode layer, the piezoelectric layer, and the second electrode layer are sequentially stacked from the side of the vibrating plate; and the second substrate is laminated on the side of the first substrate opposite to the vibrating plate And a side of the first substrate is gradually thicker toward the thickness of the empty chamber.

根據該構成,可抑制第1基板與第2基板之剝離。其結果,可提高壓電裝置之可靠性。 According to this configuration, peeling of the first substrate and the second substrate can be suppressed. As a result, the reliability of the piezoelectric device can be improved.

且,本發明之液體噴射頭之特徵在於具備:上述各構成之壓電裝置;及噴嘴,其連通於上述空室。 Further, the liquid ejecting head according to the present invention includes the piezoelectric device of each of the above configurations, and a nozzle that communicates with the empty chamber.

又,本發明之壓電裝置之製造方法係為了達成上述目的而提出者,該壓電裝置具備:第1基板,其形成有空室;振動板,其區劃上述空室之一側之面;壓電元件,其係於上述振動板之與上述空室相反之側,自振動板側起依序積層第1電極層、壓電體層、及第2電極層而成;及第2基板,其積層於上述第1基板之與振動板側相反之側;且壓電裝置之製造方法之特徵在於包含:壓電元件形成步驟,其於成為上述第1基板及上述振動板之基板原片之成為上述振動板之側之面,形成上述壓電元件;研磨步驟,其以將上述基板原片之自上述壓電元件遠離之區域自壓電元件側於板厚方向按壓之狀態,自與壓電元件側相反之側研磨上述基板原片,使未被按壓之區域之上述基板原片之板厚較被按壓之區域之上述基板原片之板厚更厚;空室形成步驟,其於被研磨之上述基板原片之板厚較厚之區域、即與上述壓電元件對應之區域形成上述空室,且將上述基板原片設為上述第1基板及上述振動板;及基板接合步驟,其於上述第1基板之與壓電元件側相反之側接合上述第2基板。 Moreover, the method for manufacturing a piezoelectric device according to the present invention has been proposed in order to achieve the above object, the piezoelectric device comprising: a first substrate having an empty chamber; and a vibration plate partitioning a surface on one side of the empty chamber; a piezoelectric element which is formed on a side opposite to the empty chamber of the vibrating plate, and sequentially forms a first electrode layer, a piezoelectric layer, and a second electrode layer from the vibrating plate side; and a second substrate The method of manufacturing a piezoelectric device includes a piezoelectric element forming step of forming a substrate of the first substrate and the vibrating plate on the side opposite to the vibrating plate side of the first substrate. a surface of the side of the vibrating plate forming the piezoelectric element; and a polishing step of pressing the region of the original substrate from the piezoelectric element away from the piezoelectric element in a thickness direction Polishing the substrate original sheet on the side opposite to the element side, so that the thickness of the substrate original sheet in the unpressed region is thicker than the thickness of the substrate original sheet in the pressed region; the empty chamber forming step is to be ground The above substrate a region having a thick plate thickness, that is, a region corresponding to the piezoelectric element, forming the empty chamber, the substrate original sheet being the first substrate and the vibrating plate, and a substrate bonding step on the first substrate The second substrate is bonded to the side opposite to the piezoelectric element side.

又,於上述方法之上述研磨步驟中,較理想為上述基板原片之未被按壓之區域較被按壓之區域更朝與壓電元件側相反之側隆起。 Further, in the polishing step of the above method, it is preferable that the unpressed region of the substrate original sheet is raised toward the side opposite to the piezoelectric element side from the pressed region.

根據該等方法,可抑制第1基板與第2基板之剝離,且可製作可靠性較高之壓電裝置。 According to these methods, peeling of the first substrate and the second substrate can be suppressed, and a piezoelectric device having high reliability can be produced.

1‧‧‧印表機 1‧‧‧Printer

2‧‧‧記錄媒體 2‧‧‧Recording media

3‧‧‧記錄頭 3‧‧‧record head

4‧‧‧托架 4‧‧‧ bracket

5‧‧‧托架移動機構 5‧‧‧ bracket moving mechanism

6‧‧‧搬送機構 6‧‧‧Transportation agency

7‧‧‧墨水匣 7‧‧‧Ink 匣

8‧‧‧正時皮帶 8‧‧‧ Timing belt

9‧‧‧脈衝馬達 9‧‧‧ pulse motor

10‧‧‧導桿 10‧‧‧guides

17‧‧‧壓力產生單元 17‧‧‧Pressure generating unit

18‧‧‧流道單元 18‧‧‧ runner unit

19‧‧‧頭殼 19‧‧‧ head shell

20‧‧‧液體導入路 20‧‧‧ Liquid introduction route

21‧‧‧噴嘴板 21‧‧‧Nozzle plate

22‧‧‧噴嘴 22‧‧‧Nozzles

23‧‧‧相容性基板 23‧‧‧Compatible substrate

24‧‧‧連通基板 24‧‧‧Connected substrate

25‧‧‧共通液室 25‧‧‧Common liquid room

27‧‧‧收納空部 27‧‧‧ vacant department

28‧‧‧供給口 28‧‧‧ supply port

29‧‧‧壓力室形成基板 29‧‧‧ Pressure chamber forming substrate

29'‧‧‧壓力室形成基板 29'‧‧‧ Pressure chamber forming substrate

30‧‧‧壓力室 30‧‧‧ Pressure chamber

30'‧‧‧壓力室 30'‧‧‧ Pressure chamber

31‧‧‧振動板 31‧‧‧Vibration plate

32‧‧‧壓電元件 32‧‧‧Piezoelectric components

33‧‧‧密封板 33‧‧‧ Sealing plate

33a‧‧‧頂板部 33a‧‧‧Top Board

33b‧‧‧側壁部 33b‧‧‧ Sidewall

35‧‧‧噴嘴連通路 35‧‧‧Nozzle communication road

36‧‧‧下電極層 36‧‧‧ lower electrode layer

37‧‧‧壓電體層 37‧‧‧piezoelectric layer

38‧‧‧上電極層 38‧‧‧Upper electrode layer

39‧‧‧金屬層 39‧‧‧metal layer

40‧‧‧引線電極 40‧‧‧Lead electrode

41‧‧‧壓電元件收納空部 41‧‧‧ Piezoelectric component storage

43‧‧‧基板原片 43‧‧‧ substrate original film

43'‧‧‧基板原片 43'‧‧‧ substrate original film

44‧‧‧按壓用基板 44‧‧‧Pushing substrate

44a‧‧‧空部 44a‧‧‧empty department

44b‧‧‧按壓部 44b‧‧‧ Pressing Department

90‧‧‧壓電元件 90‧‧‧Piezoelectric components

91‧‧‧壓力室 91‧‧‧ Pressure chamber

92‧‧‧振動板 92‧‧‧vibration board

93‧‧‧壓力室形成基板 93‧‧‧ Pressure chamber forming substrate

94‧‧‧連通基板 94‧‧‧Connected substrate

100‧‧‧記錄頭 100‧‧‧record head

Ae‧‧‧開口周緣區域 Ae‧‧‧Open Peripheral Area

ta‧‧‧距離 Ta‧‧‧distance

ta'‧‧‧板厚 Ta'‧‧‧ plate thickness

tb‧‧‧板厚 Tb‧‧‧ plate thickness

圖1係說明印表機之構成之立體圖。 Figure 1 is a perspective view showing the construction of a printer.

圖2係將說明記錄頭之構成之要部加以放大之剖視圖。 Fig. 2 is a cross-sectional view showing an enlarged portion of the configuration of the recording head.

圖3係自振動板側觀察壓力室形成基板之俯視圖。 Fig. 3 is a plan view showing the substrate formed by the pressure chamber from the side of the vibrating plate.

圖4係圖3之A-A剖視圖。 Figure 4 is a cross-sectional view taken along line A-A of Figure 3.

圖5係圖3之B-B剖視圖。 Figure 5 is a cross-sectional view taken along line B-B of Figure 3.

圖6(a)、(b)係說明記錄頭之製造步驟之概略圖。 6(a) and 6(b) are schematic views showing the steps of manufacturing the recording head.

圖7(a)、(b)係說明記錄頭之製造步驟之概略圖。 7(a) and 7(b) are schematic views showing the steps of manufacturing the recording head.

圖8(a)~(c)係說明記錄頭之製造步驟之概略圖。 8(a) to (c) are schematic views showing the steps of manufacturing the recording head.

圖9係自振動板側觀察第2實施形態之記錄頭之壓力室形成基板之俯視圖。 Fig. 9 is a plan view showing the pressure chamber forming substrate of the recording head of the second embodiment viewed from the side of the diaphragm.

圖10(a)、(b)係說明第2實施形態之記錄頭之製造步驟之概略圖。 Figs. 10(a) and (b) are schematic views showing the steps of manufacturing the recording head of the second embodiment.

圖11(a)~(c)係說明第2實施形態之記錄頭之製造步驟之概略圖。 11(a) to 11(c) are schematic diagrams showing the steps of manufacturing the recording head of the second embodiment.

圖12係放大了說明先前之記錄頭之構成之要部之剖視圖。 Fig. 12 is a cross-sectional view showing an enlarged portion of the configuration of the prior recording head.

以下,參照附加圖式,說明用以實施本發明之形態。另,於以下所述之實施形態中,雖作為本發明較佳之具體例而加以多種限定,但本發明之範圍係只要於以下之說明中不存在特別限定本發明之意旨之記載,則並非限於該等態樣。又,於以下,列舉搭載有具備本發明之壓電裝置之液體噴射頭之一種即噴墨式記錄頭(以下為記錄頭)之液體噴射裝置之一種即噴墨式印表機(以下為印表機)為例進行說明。 Hereinafter, embodiments for carrying out the invention will be described with reference to the accompanying drawings. In the following embodiments, the preferred embodiments of the present invention are variously limited, but the scope of the present invention is not limited to the following description, and is not limited to the meaning of the present invention. The same. In the following, an ink jet printer (hereinafter referred to as a liquid jet apparatus) which is an ink jet type recording head (hereinafter referred to as a recording head) which is a type of liquid ejecting head including the piezoelectric device of the present invention is mounted. Table machine) is explained as an example.

關於印表機1之構成,參照圖1進行說明。印表機1係對記錄紙等記錄媒體2(噴附對象之一種)之表面噴射墨水(液體之一種)而進行圖像等之記錄之裝置。該印表機1具備記錄頭3、安裝有該記錄頭3之托架 4、使托架4於主掃描方向移動之托架移動機構5、於副掃描方向移送記錄媒體2之搬送機構6等。此處,上述墨水儲存於作為液體供給源之墨水匣7。該墨水匣7係相對於托架4、即記錄頭3可裝卸地安裝。另,亦可採用墨水匣配置於印表機之本體側,自該墨水匣通過墨水供給管供給至記錄頭之構成。 The configuration of the printer 1 will be described with reference to Fig. 1 . The printer 1 is a device that ejects ink (one of liquids) on the surface of a recording medium 2 (one of the objects to be ejected) such as recording paper to record an image or the like. The printer 1 is provided with a recording head 3 and a bracket on which the recording head 3 is mounted 4. The carriage moving mechanism 5 that moves the carriage 4 in the main scanning direction, and the conveyance mechanism 6 that transfers the recording medium 2 in the sub-scanning direction. Here, the ink is stored in the ink cartridge 7 as a liquid supply source. The ink cartridge 7 is detachably attached to the carriage 4, that is, the recording head 3. Alternatively, the ink cartridge may be disposed on the main body side of the printer, and the ink cartridge may be supplied to the recording head through the ink supply tube.

上述托架移動機構5具備正時皮帶8。且,該正時皮帶8係由DC馬達等脈衝馬達9驅動。因此,若脈衝馬達9作動,則托架4受架設於印表機1之導桿10引導,於主掃描方向(記錄媒體2之寬度方向)往復移動。托架4之主掃描方向之位置係由位置資訊檢測機構之一種即線性編碼器(未圖示)檢測。線性編碼器係將其檢測信號、即編碼器脈衝(位置資訊之一種)發送至印表機1之控制部。 The carriage moving mechanism 5 is provided with a timing belt 8. Further, the timing belt 8 is driven by a pulse motor 9 such as a DC motor. Therefore, when the pulse motor 9 is actuated, the carriage 4 is guided by the guide bar 10 mounted on the printer 1, and reciprocates in the main scanning direction (the width direction of the recording medium 2). The position of the carriage 4 in the main scanning direction is detected by a linear encoder (not shown) which is one of the position information detecting mechanisms. The linear encoder transmits its detection signal, that is, an encoder pulse (one of position information), to the control unit of the printer 1.

圖2係說明上述記錄頭3之主要部分之構成之剖視圖。圖3係自振動板31側(密封板33側)俯視構成記錄頭3之壓力室形成基板29之概略圖。另,於圖3中透過密封板33而表示。又,圖4係圖3之A-A剖面之放大圖,圖5係圖3之B-B剖面之放大圖。本實施形態之記錄頭3係如圖2所示,具備壓力產生單元17及流道單元18,且以積層有該等構件之狀態安裝於頭殼19而構成。流道單元18具有噴嘴板21、相容性基板23、及連通基板24(相當於本發明之第2基板)。又,壓力產生單元17係將形成有壓力室30之壓力室形成基板29(相當於本發明之第1基板)、振動板31、壓電元件32、及密封板33積層並單元化。另,各單元間係藉由接著劑而接合。 Fig. 2 is a cross-sectional view showing the configuration of a main portion of the recording head 3. 3 is a schematic view of the pressure chamber forming substrate 29 constituting the recording head 3 from the side of the diaphragm 31 (the side of the sealing plate 33). In addition, it is shown by the sealing plate 33 in FIG. 4 is an enlarged view of a section A-A of FIG. 3, and FIG. 5 is an enlarged view of a section B-B of FIG. As shown in FIG. 2, the recording head 3 of the present embodiment includes a pressure generating unit 17 and a flow path unit 18, and is attached to the head case 19 in a state in which the members are stacked. The flow path unit 18 has a nozzle plate 21, a compatible substrate 23, and a communication substrate 24 (corresponding to the second substrate of the present invention). Further, the pressure generating unit 17 laminates and unitizes the pressure chamber forming substrate 29 (corresponding to the first substrate of the present invention) in which the pressure chamber 30 is formed, the diaphragm 31, the piezoelectric element 32, and the sealing plate 33. Further, each unit is joined by an adhesive.

頭殼19係例如由合成樹脂製作之箱體狀之構件,接合有壓力產生單元17之連通基板24固定於底面側。於該頭殼19之下表面側,形成有自該下表面至頭殼19之高度方向之中途以長方體狀凹陷之收納空部27。若流道單元18以定位於頭殼19之下表面之狀態接合,則積層於連通基板24上之壓力產生單元17被收納於收納空部27。又,於頭殼19形 成有液體導入路20。液體導入路20係供導入來自墨水匣7側之墨水之空部。流入至該液體導入路20之墨水被導入至連通基板24之共通液室25(後述)。 The head case 19 is, for example, a box-shaped member made of synthetic resin, and the communication board 24 to which the pressure generating unit 17 is joined is fixed to the bottom surface side. On the lower surface side of the head case 19, a housing portion 27 recessed in a rectangular parallelepiped shape from the lower surface to the height direction of the head case 19 is formed. When the flow path unit 18 is joined in a state of being positioned on the lower surface of the head case 19, the pressure generating unit 17 laminated on the communication substrate 24 is housed in the storage space portion 27. Also, in the shape of the head shell 19 A liquid introduction path 20 is formed. The liquid introduction path 20 is for introducing an empty portion of the ink from the ink cartridge 7 side. The ink that has flowed into the liquid introduction path 20 is introduced into the common liquid chamber 25 (described later) that communicates with the substrate 24.

接合於頭殼19之下表面側之連通基板24係例如由單晶矽基板(以下亦簡稱為矽基板)製作之板材。於該連通基板24,成為噴嘴連通路35及共通液室25之空部係藉由各向異性蝕刻等形成。噴嘴連通路35係連通後述之噴嘴22與壓力室30之流道,形成於每個噴嘴22。各噴嘴連通路35與各自對應之壓力室30之長邊方向之一端部連通。又,共通液室25係沿噴嘴列方向(換言之,為壓力室30之排列設置方向)延伸,且對各壓力室30導入共通之墨水之空部。該共通液室25與液體導入路20連通,導入來自液體導入路20之墨水。共通液室25與各壓力室30係經由個別地設置於每個壓力室30之供給口28而連通。各供給口28與各自對應之壓力室30之長邊方向之另一端部連通。因此,共通液室25內之墨水係通過供給口28而被分配、供給至各壓力室30。 The communication substrate 24 bonded to the lower surface side of the head case 19 is, for example, a plate material made of a single crystal germanium substrate (hereinafter also simply referred to as a germanium substrate). In the communicating substrate 24, the empty portions of the nozzle communication path 35 and the common liquid chamber 25 are formed by anisotropic etching or the like. The nozzle communication passage 35 is connected to a flow passage of the nozzle 22 and the pressure chamber 30, which will be described later, and is formed in each of the nozzles 22. Each of the nozzle communication passages 35 communicates with one end portion of the longitudinal direction of the respective pressure chambers 30. Further, the common liquid chamber 25 is extended in the nozzle row direction (in other words, in the direction in which the pressure chambers 30 are arranged), and the common pressure ink is introduced into each of the pressure chambers 30. The common liquid chamber 25 communicates with the liquid introduction path 20 and introduces ink from the liquid introduction path 20. The common liquid chamber 25 and each of the pressure chambers 30 are connected to each other via a supply port 28 that is individually provided in each of the pressure chambers 30. Each of the supply ports 28 communicates with the other end of the longitudinal direction of the respective pressure chambers 30. Therefore, the ink in the common liquid chamber 25 is distributed and supplied to the pressure chambers 30 through the supply port 28.

於連通基板24之下表面(與頭殼19相反側之面),接合有噴嘴板21及相容性基板23。噴嘴板21係開設有複數個噴嘴22之板材,例如由矽基板製作。噴嘴22係沿副掃描方向形成為列狀而構成噴嘴列。該噴嘴列係自一端側之噴嘴22至另一端側之噴嘴22為止以與點形成密度對應之間距排列設置。尤其,於本實施形態中,以可形成高畫質圖像之方式,形成為窄間距(例如,42.4μm間距(即600dpi))。該噴嘴板21係以各噴嘴22與連通基板24之噴嘴連通路35分別連通之狀態接合於連通基板24之下表面之中央部分。相容性基板23係於連通基板24之下表面,以封塞共通液室25之開口之狀態接合之具有可撓性之構件。該相容性基板23發揮吸收共通液室25內之墨水之壓力變化之功能。 The nozzle plate 21 and the compatible substrate 23 are joined to the lower surface of the communication substrate 24 (the surface opposite to the head case 19). The nozzle plate 21 is provided with a plate material of a plurality of nozzles 22, for example, made of a ruthenium substrate. The nozzles 22 are formed in a line shape in the sub-scanning direction to constitute a nozzle row. The nozzle row is arranged in a row from the nozzle 22 on one end side to the nozzle 22 on the other end side in a distance corresponding to the dot formation density. In particular, in the present embodiment, a narrow pitch (for example, a 42.4 μm pitch (that is, 600 dpi)) is formed so that a high-quality image can be formed. The nozzle plate 21 is joined to a central portion of the lower surface of the communication substrate 24 in a state in which the nozzles 22 and the nozzle communication passages 35 of the communication substrate 24 communicate with each other. The compatibility substrate 23 is a flexible member joined to the lower surface of the substrate 24 and joined to the opening of the common liquid chamber 25. The compatible substrate 23 functions to absorb the pressure change of the ink in the common liquid chamber 25.

連接(積層)於連通基板24之上表面(與噴嘴板21相反側之面)之壓力室形成基板29例如由矽基板製作。尤其,於本實施形態中,藉由如 後述般研磨矽基板,而將壓力室形成基板29之板厚形成為例如約40~50μm。於該壓力室形成基板29,於板厚方向貫通該壓力室形成基板29之壓力室30(相當於本發明之空室)以與噴嘴22之間距相同之間距形成有複數個。於本實施形態中,如圖3所示,於俯視(自壓力室形成基板29之表面觀察之狀態、或自構成構件之積層方向觀察之狀態)下,形成為於正交於噴嘴列方向之方向上長條之大致平行四邊形狀。又,如圖2及圖4所示,於壓力室30之長邊方向,區劃該壓力室30之內壁係以自上表面側朝下表面側向外側擴展之方式,相對於壓力室形成基板29之表面傾斜。且,區劃壓力室形成基板29之各壓力室30之隔板與其他部分相比形成為較厚。關於該點,詳情將予以後述。 The pressure chamber forming substrate 29 that is connected (laminated) to the upper surface of the communication substrate 24 (the surface opposite to the nozzle plate 21) is made of, for example, a tantalum substrate. In particular, in the present embodiment, by The ruthenium substrate is polished as described later, and the thickness of the pressure chamber formation substrate 29 is formed to be, for example, about 40 to 50 μm. The substrate 29 is formed in the pressure chamber, and the pressure chamber 30 (corresponding to the empty chamber of the present invention) that penetrates the pressure chamber forming substrate 29 in the thickness direction is formed in plural with the same distance from the nozzle 22. In the present embodiment, as shown in FIG. 3, in a plan view (a state observed from the surface of the pressure chamber forming substrate 29 or a state observed from the laminated direction of the constituent members), it is formed to be orthogonal to the nozzle row direction. The shape of the strip is roughly parallel to the shape of the four sides. Further, as shown in FIG. 2 and FIG. 4, in the longitudinal direction of the pressure chamber 30, the inner wall of the pressure chamber 30 is partitioned to form a substrate with respect to the pressure chamber so as to expand outward from the upper surface side toward the lower surface side. The surface of 29 is inclined. Further, the partitions of the pressure chambers 30 forming the substrate 29 are formed to be thicker than the other portions. Details on this point will be described later.

振動板31係積層於壓力室形成基板29之上表面,且區劃壓力室30之一側之面(上表面)之可撓膜。該振動板31例如包含含有二氧化矽(SiO2)之彈性膜、及形成於該彈性膜上之含有氧化鋯(ZrOx)之絕緣體膜。該振動板31之區劃壓力室30之部分、即封塞成為壓力室30之空間之上部開口之部分係容許伴隨壓電元件32之彎曲變形而於自噴嘴22遠離之方向或接近之方向彎曲變形之區域。另,於本實施形態中,振動板31與壓力室形成基板29以不同之構件單獨形成,但並未限於此,亦可使振動板與壓力室形成基板一體地形成。例如,亦可自相當於壓力室形成基板之基板之下表面側,以於上表面側殘留板厚較薄之薄壁部之狀態蝕刻至該基板之厚度方向之中途為止而形成壓力室。該情形時,殘留之薄壁部相當於振動板。 The vibrating plate 31 is a flexible film which is laminated on the upper surface of the pressure chamber forming substrate 29 and which partitions the surface (upper surface) on one side of the pressure chamber 30. The diaphragm 31 includes, for example, an elastic film containing cerium oxide (SiO 2 ) and an insulator film containing zirconium oxide (ZrOx) formed on the elastic film. The portion of the vibrating plate 31 that partitions the pressure chamber 30, that is, the portion that is closed to the upper portion of the space of the pressure chamber 30, is allowed to bend and deform in a direction away from or close to the nozzle 22 with the bending deformation of the piezoelectric element 32. The area. Further, in the present embodiment, the vibrating plate 31 and the pressure chamber forming substrate 29 are separately formed by different members. However, the present invention is not limited thereto, and the vibrating plate and the pressure chamber forming substrate may be integrally formed. For example, a pressure chamber may be formed from the lower surface side of the substrate on which the substrate is formed by the pressure chamber, and the thin portion having a thin thickness on the upper surface side is etched to the middle of the thickness direction of the substrate. In this case, the remaining thin portion corresponds to the diaphragm.

於振動板31之與壓力室30對應之部分之與壓力室30相反之側,形成有壓電元件32。本實施形態之壓電元件32係所謂之彎曲模式之壓電元件。該壓電元件32係如圖2所示,自振動板31側起依序藉由成膜技術而積層有金屬製之下電極層36(相當於本發明之第1電極)、包含鋯鈦酸鉛(PZT)等之壓電體層37及金屬製之上電極層38(相當於本發明 之第2電極)。即,壓電元件32係藉由對下電極層36及上電極層38之電壓之施加而於壓電體層37產生壓電應變之部分。本實施形態之壓電元件32係如圖3所示,長邊方向之兩端部超過壓力室30之長邊方向之端而延設至較該壓力室30遠離至更外側之位置為止。另一方面,短邊方向之兩端部較壓力室30之短邊方向之端形成於更內側。 A piezoelectric element 32 is formed on the side of the vibrating plate 31 opposite to the pressure chamber 30 corresponding to the pressure chamber 30. The piezoelectric element 32 of the present embodiment is a piezoelectric element of a so-called bending mode. As shown in FIG. 2, the piezoelectric element 32 is formed by laminating a metal lower electrode layer 36 (corresponding to the first electrode of the present invention) by a film formation technique from the side of the vibrating plate 31, and contains zirconium titanate. a piezoelectric layer 37 such as lead (PZT) or a metal upper electrode layer 38 (corresponding to the present invention) The second electrode). That is, the piezoelectric element 32 is a portion where piezoelectric strain is generated in the piezoelectric layer 37 by application of a voltage to the lower electrode layer 36 and the upper electrode layer 38. As shown in FIG. 3, the piezoelectric element 32 of the present embodiment extends beyond the end in the longitudinal direction of the pressure chamber 30 to a position distant from the pressure chamber 30 to the outside. On the other hand, both end portions in the short-side direction are formed on the inner side from the end in the short-side direction of the pressure chamber 30.

於本實施形態中,將下電極層36及壓電體層37於每個壓力室30圖案化,將上電極層38跨越複數個壓力室30而圖案化。即,下電極層36成為於每個壓力室30個別之個別電極。上電極層38成為於複數個壓電元件32共通之共通電極。又,於本實施形態中,如圖2所示,於上電極層38上介隔包含鈦(Ti)或鎳(Ni)之密接層(未圖示)而積層有包含金(Au)等之金屬層39。該金屬層39係壓電元件32之長邊方向之兩端部,跨越壓力室30之長邊方向之內側與外側之邊界而積層。藉由該金屬層39,抑制壓力室30之內側與外側之邊界中之壓電元件32之變形(變位),且抑制應力集中引起之壓電元件32之破損。且,於壓電元件32之一側(記錄頭3之中央部側)之端部,連接有引線電極40。該引線電極40延設至密封板33之外側為止,與未圖示之可撓性電纜連接。另,亦可採用將下電極層36設為於複數個壓電元件32共通之共通電極,將上電極層38設為於每個壓電元件32個別之個別電極之構成。 In the present embodiment, the lower electrode layer 36 and the piezoelectric layer 37 are patterned in each of the pressure chambers 30, and the upper electrode layer 38 is patterned across a plurality of pressure chambers 30. That is, the lower electrode layer 36 is an individual electrode of each of the pressure chambers 30. The upper electrode layer 38 serves as a common electrode common to a plurality of piezoelectric elements 32. Further, in the present embodiment, as shown in FIG. 2, an adhesion layer (not shown) containing titanium (Ti) or nickel (Ni) is interposed on the upper electrode layer 38, and gold (Au) or the like is laminated. Metal layer 39. The metal layer 39 is formed at both ends in the longitudinal direction of the piezoelectric element 32, and is laminated across the boundary between the inner side and the outer side in the longitudinal direction of the pressure chamber 30. By the metal layer 39, deformation (displacement) of the piezoelectric element 32 in the boundary between the inner side and the outer side of the pressure chamber 30 is suppressed, and damage of the piezoelectric element 32 due to stress concentration is suppressed. Further, a lead electrode 40 is connected to an end portion of one side of the piezoelectric element 32 (on the side of the central portion of the recording head 3). The lead electrode 40 is extended to the outer side of the sealing plate 33, and is connected to a flexible cable (not shown). Further, the lower electrode layer 36 may be a common electrode common to the plurality of piezoelectric elements 32, and the upper electrode layer 38 may be formed as an individual electrode of each of the piezoelectric elements 32.

於形成有壓電元件32之壓力室形成基板29之上表面配置有密封板33。該密封板33例如由玻璃、陶瓷材料、單晶矽基板、金屬、合成樹脂等製作。於該密封板33之內部,於與各壓電元件32對向之區域形成有不阻礙該壓電元件32之驅動之程度大小之壓電元件收納空部41。即,密封板33之壓電元件收納空部41係藉由與壓電元件32對向之頂板部33a、與自該頂板部33a之外周延伸至壓電元件32側之側壁部33b而區劃。該側壁部33b以可全部收納排列設置於壓電元件收納空部41內之壓電元件32之方式,沿壓電元件32之排列設置方向(噴嘴列方向), 延設至該壓電元件32之列之外側為止。且,以於壓電元件收納空部41內收納有壓電元件32之列之狀態,將側壁部33b之下端面接合於壓力室形成基板29之上表面。 A sealing plate 33 is disposed on the upper surface of the pressure chamber forming substrate 29 on which the piezoelectric element 32 is formed. The sealing plate 33 is made of, for example, glass, a ceramic material, a single crystal germanium substrate, a metal, a synthetic resin, or the like. Inside the sealing plate 33, a piezoelectric element housing portion 41 having a size that does not impede the driving of the piezoelectric element 32 is formed in a region opposed to each piezoelectric element 32. In other words, the piezoelectric element housing portion 41 of the sealing plate 33 is partitioned by the top plate portion 33a opposed to the piezoelectric element 32 and the side wall portion 33b extending from the outer periphery of the top plate portion 33a to the piezoelectric element 32 side. The side wall portion 33b is disposed along the arrangement direction of the piezoelectric elements 32 (nozzle row direction) so that the piezoelectric elements 32 arranged in the piezoelectric element housing portion 41 are all accommodated. The extension is extended to the outer side of the column of the piezoelectric elements 32. In addition, the lower end surface of the side wall portion 33b is joined to the upper surface of the pressure chamber forming substrate 29 in a state in which the piezoelectric element 32 is accommodated in the piezoelectric element housing portion 41.

於如此般構成之記錄頭3中,將來自墨水匣7之墨水經由液體導入路20、共通液室25及供給口28而導入至壓力室30。以該狀態,將來自控制部之驅動信號經由可撓性電纜及引線電極40等供給至壓電元件32,驅動壓電元件32。藉此,壓力室30之容積變動,於壓力室30內產生壓力變動。藉由利用該壓力變動,而經由噴嘴連通路35自噴嘴22噴射墨水滴。另,於本實施形態中,於構成記錄頭3之各層中,連通基板24、壓力室形成基板29、振動板31、及壓電元件32之組合相當於本發明之壓電裝置。 In the recording head 3 configured as described above, the ink from the ink cartridge 7 is introduced into the pressure chamber 30 via the liquid introduction path 20, the common liquid chamber 25, and the supply port 28. In this state, the drive signal from the control unit is supplied to the piezoelectric element 32 via the flexible cable, the lead electrode 40, and the like, and the piezoelectric element 32 is driven. Thereby, the volume of the pressure chamber 30 fluctuates, and a pressure fluctuation occurs in the pressure chamber 30. By using this pressure fluctuation, ink droplets are ejected from the nozzle 22 via the nozzle communication path 35. Further, in the present embodiment, in each of the layers constituting the recording head 3, the combination of the communication substrate 24, the pressure chamber forming substrate 29, the vibration plate 31, and the piezoelectric element 32 corresponds to the piezoelectric device of the present invention.

其次,對本實施形態之壓力室形成基板29進行詳細說明。如圖4及圖5所示,壓力室形成基板29之各壓力室30之開口周緣區域Ae(圖3之標註陰影線之區域、各壓力室30之開口周緣之整周)較該開口周緣區域Ae更外側之區域之板厚形成為更厚。尤其,於本實施形態中,以朝壓力室30板厚逐漸變厚之方式構成。若更詳細說明,則如圖4及圖5所示,因構成壓電元件32之層(例如金屬層39等)所產生之拉伸力,壓電元件32於初始狀態(未對上電極層38及下電極層36施加電壓之狀態)下朝與壓力室30相反之側彎曲,因而壓力室30之大致中央部之頂板面(封塞壓力室30之上部開口之振動板31)朝上方(密封板33側)隆起。即,壓力室30之大致中央部之振動板31之下表面與連通基板24之上表面之距離(即,壓力室30之大致中央部之高度)ta與壓力室形成基板29之較開口周緣區域Ae更外側之區域之板厚tb(例如,密封板33之側壁部33b所配置之位置的板厚)相比更大(厚)。 Next, the pressure chamber forming substrate 29 of the present embodiment will be described in detail. As shown in FIGS. 4 and 5, the peripheral peripheral edge area Ae of each pressure chamber 30 of the pressure chamber forming substrate 29 (the hatched area of FIG. 3, the entire circumference of the opening periphery of each pressure chamber 30) is larger than the peripheral peripheral area of the opening. The plate thickness of the outer side of Ae is formed to be thicker. In particular, in the present embodiment, the thickness of the pressure chamber 30 is gradually increased. As will be described in more detail, as shown in FIGS. 4 and 5, the piezoelectric element 32 is in an initial state due to the tensile force generated by the layer (for example, the metal layer 39 or the like) constituting the piezoelectric element 32 (the upper electrode layer is not 38 and the state in which the lower electrode layer 36 is applied with a voltage) are bent toward the side opposite to the pressure chamber 30, so that the top plate surface of the substantially central portion of the pressure chamber 30 (the vibration plate 31 opened at the upper portion of the plugging pressure chamber 30) faces upward ( The sealing plate 33 side is raised. That is, the distance between the lower surface of the vibrating plate 31 at the substantially central portion of the pressure chamber 30 and the upper surface of the communicating substrate 24 (i.e., the height of the substantially central portion of the pressure chamber 30) ta and the peripheral peripheral region of the pressure chamber forming substrate 29 The plate thickness tb of the outer side region of Ae (for example, the plate thickness at the position where the side wall portion 33b of the sealing plate 33 is disposed) is larger (thickness).

又,壓力室30之開口緣之壓力室形成基板29之上表面朝上方隆起。即,壓力室30之開口緣之壓力室形成基板29之板厚(換言之,為 區劃壓力室30之側壁之高度、或壓力室30之端之高度)ta'較開口周緣區域Ae更外側之區域之板厚tb厚3μm左右。於本實施形態中,壓力室30之開口緣之壓力室形成基板29之板厚ta'係與壓力室30之大致中央部之振動板31之下表面與連通基板24之上表面之距離ta大致相同,或稍小(低)而形成。另,如圖4所示,壓力室30之長邊方向之側壁以自上表面側向下表面側朝外側擴展之方式傾斜,所謂此處所言之壓力室30之開口緣之壓力室形成基板29之板厚ta'係自上表面側之開口緣(內側之開口緣)垂直向下直至與自壓力室形成基板29之下表面延長之假想面正交之位置為止之距離。即,於此處所言之壓力室形成基板29之板厚,亦包含壓力室形成基板29被切削而於一部分包含有空間之部分。 Further, the upper surface of the pressure chamber forming substrate 29 of the opening edge of the pressure chamber 30 is raised upward. That is, the pressure chamber of the opening edge of the pressure chamber 30 forms the thickness of the substrate 29 (in other words, The height of the side wall of the division pressure chamber 30 or the height of the end of the pressure chamber 30) ta' is about 3 μm thicker than the thickness tb of the area outside the opening peripheral area Ae. In the present embodiment, the thickness ta' of the pressure chamber forming substrate 29 at the opening edge of the pressure chamber 30 and the distance ta from the lower surface of the vibrating plate 31 at the substantially central portion of the pressure chamber 30 to the upper surface of the communicating substrate 24 are substantially Same, or slightly smaller (lower). Further, as shown in Fig. 4, the side wall of the longitudinal direction of the pressure chamber 30 is inclined so as to expand outward from the upper surface side toward the lower surface side, and the pressure chamber forming the substrate 29 of the opening edge of the pressure chamber 30 as described herein is formed. The plate thickness ta' is a distance from the upper edge side opening edge (inner opening edge) vertically downward to a position orthogonal to the imaginary plane extending from the lower surface of the pressure chamber forming substrate 29. That is, the thickness of the pressure chamber forming substrate 29 as referred to herein also includes the portion where the pressure chamber forming substrate 29 is cut to include a space in a part thereof.

且,壓力室30之開口緣之壓力室形成基板29之上表面係朝外側(壓力室形成基板29之外周側)向下傾斜。即,壓力室形成基板29之板厚係自板厚最厚之壓力室30之開口緣朝外側逐漸變薄。該壓力室形成基板29之板厚較其他區域更厚之區域,相當於開口周緣區域Ae。另,本實施形態之壓力室30之開口周緣區域Ae以外之區域係直至壓力室形成基板29之端部(外周)為止皆設定成大致相同之板厚tb。又,於本實施形態中,壓力室30之長邊方向之開口緣與壓力室30之短邊方向之開口緣成為相同之板厚tb,但亦可成為不同之板厚。 Further, the upper surface of the pressure chamber forming substrate 29 of the opening edge of the pressure chamber 30 is inclined downward toward the outside (the outer peripheral side of the pressure chamber forming substrate 29). That is, the thickness of the pressure chamber forming substrate 29 is gradually thinned toward the outside from the opening edge of the pressure chamber 30 having the thickest thickness. The pressure chamber forms a region in which the thickness of the substrate 29 is thicker than other regions, and corresponds to the peripheral edge region Ae. Further, the region other than the opening peripheral region Ae of the pressure chamber 30 of the present embodiment is set to have substantially the same plate thickness tb until the end portion (outer periphery) of the pressure chamber forming substrate 29. Further, in the present embodiment, the opening edge in the longitudinal direction of the pressure chamber 30 and the opening edge in the short-side direction of the pressure chamber 30 have the same plate thickness tb, but may have different plate thicknesses.

如此,因將壓力室30之開口周緣區域Ae之壓力室形成基板29之板厚設為較該開口周緣區域Ae更外側之區域之壓力室形成基板29之板厚更厚,故即便初始狀態之壓電元件32朝與振動板31相反之側變形,亦抑制開口周緣區域Ae追隨於壓電元件32之變形而變形。因此,於開口周緣區域Ae中,可抑制接合壓力室形成基板29與連通基板24之接著劑剝落致使兩基板剝離。藉此,可抑制自壓力室形成基板29與連通基板24剝離之部分浸入墨水、壓力室形成基板29與連通基板24之接著力降低之不佳狀況。又,可抑制剝離之接著劑變為異物而成 為噴嘴22堵塞或墨水滴偏飛之原因。其結果,可提高壓電裝置之可靠性。又,即便重複驅動壓電元件32,亦可抑制壓力室形成基板29與連通基板24剝離。再者,因壓力室形成基板29之板厚係以朝壓力室30逐漸變厚之方式構成,故可抑制於壓力室形成基板29形成階差所致之振動板31或連通基板24之接合不良。 In this manner, the thickness of the pressure chamber forming substrate 29 in which the thickness of the pressure chamber forming substrate 29 of the opening peripheral region Ae of the pressure chamber 30 is set to be outside the opening peripheral edge area Ae is thicker, so even in the initial state The piezoelectric element 32 is deformed toward the side opposite to the diaphragm 31, and also suppresses deformation of the opening peripheral region Ae following the deformation of the piezoelectric element 32. Therefore, in the opening peripheral region Ae, peeling of the adhesive between the bonding pressure chamber forming substrate 29 and the communication substrate 24 can be suppressed, and the two substrates can be peeled off. Thereby, it is possible to suppress a situation in which the portion where the pressure chamber forming substrate 29 and the communicating substrate 24 are separated from each other by the ink, and the pressure between the pressure chamber forming substrate 29 and the communicating substrate 24 is lowered. Moreover, the adhesive capable of suppressing peeling becomes a foreign matter The reason is that the nozzle 22 is clogged or the ink droplets are flying. As a result, the reliability of the piezoelectric device can be improved. Further, even if the piezoelectric element 32 is repeatedly driven, peeling of the pressure chamber forming substrate 29 from the communication substrate 24 can be suppressed. Further, since the thickness of the pressure chamber forming substrate 29 is gradually increased toward the pressure chamber 30, it is possible to suppress the poor bonding of the vibrating plate 31 or the communicating substrate 24 due to the step formation of the pressure chamber forming substrate 29. .

其次,對上述之記錄頭3中相當於壓電裝置之部分、即積層有連通基板24、壓力室形成基板29、振動板31、及壓電元件32等之部分之製造方法進行說明。首先,於成為壓力室形成基板29之基板(例如矽基板)上,形成於成為振動板31之層(例如於二氧化矽(SiO2)上積層有氧化鋯(ZrOx)之膜),且形成成為壓力室形成基板29及振動板31之基板原片43。若形成基板原片43,則移至壓電元件形成步驟。於壓電元件形成步驟中,如圖6(a)所示,於基板原片43之成為振動板31之側之面形成壓電元件32。具體而言,於基板原片43之成為振動板31之側之面製作成為下電極層36之金屬膜,藉由光微影步驟及蝕刻步驟,將下電極層36圖案化。同樣地,藉由依序形成壓電體層37、上電極層38、及金屬層39,而於基板原片43上製作壓電元件32(參照圖6(a))。另,於壓電元件32,因構成該壓電元件32之層所產生之拉伸力,使得欲朝與基板原片43相反之側彎曲之力起作用,但因基板原片43之剛性較高,故未變形。 Next, a method of manufacturing a portion corresponding to the piezoelectric device, that is, a portion in which the communication substrate 24, the pressure chamber forming substrate 29, the vibration plate 31, and the piezoelectric element 32 are laminated in the above-described recording head 3 will be described. First, a substrate (for example, a tantalum substrate) that serves as the pressure chamber forming substrate 29 is formed on a layer that serves as the vibrating plate 31 (for example, a film in which zirconium oxide (ZrOx) is laminated on SiO 2 ), and is formed. The pressure substrate is formed on the substrate 29 and the substrate original sheet 43 of the diaphragm 31. When the substrate original sheet 43 is formed, it moves to the piezoelectric element forming step. In the piezoelectric element forming step, as shown in FIG. 6(a), the piezoelectric element 32 is formed on the surface of the substrate original sheet 43 which is the side of the vibrating plate 31. Specifically, a metal film to be the lower electrode layer 36 is formed on the surface of the substrate original sheet 43 which is the side of the vibrating plate 31, and the lower electrode layer 36 is patterned by the photolithography step and the etching step. Similarly, the piezoelectric element 32 is formed on the substrate original sheet 43 by sequentially forming the piezoelectric layer 37, the upper electrode layer 38, and the metal layer 39 (see FIG. 6(a)). Further, in the piezoelectric element 32, the tensile force generated by the layer constituting the piezoelectric element 32 causes the force to be bent toward the side opposite to the original substrate 43 to act, but the rigidity of the original substrate 43 is higher. High, so it is not deformed.

若於基板原片43上形成壓電元件32,則移至研磨步驟。於研磨步驟中,將成為壓力室形成基板29之基板研磨至壓力室形成基板29之厚度(例如,約40~50μm)。此時,以將基板原片43之自壓電元件32遠離之區域(較開口周緣區域Ae更外側之區域)自壓電元件32側於板厚方向按壓之狀態,自與壓電元件32側相反之側研磨(切削)基板原片43,使未被按壓之區域(開口周緣區域Ae)之基板原片43之板厚較被按壓之區域之基板原片43之板厚更厚。於本實施形態中,如圖6(b)所 示,藉由於基板原片43之與研磨面相反側之面(壓電元件32側之面)壓抵按壓用基板44,而按壓基板原片43。該按壓用基板44係於與相當於基板原片43之開口周緣區域Ae之區域對向之部分設置有凹陷至板厚方向之中途為止之空部44a,以被壓抵至基板原片43之狀態於空部44a內收納壓電元件32。按壓用基板44之空部44a之外側成為按壓基板原片43之較相當於開口周緣區域Ae之區域更外側之區域之按壓部44b。且,如圖7(a)所示,若以將按壓用基板44壓抵至基板原片43進行按壓之狀態,自相反側藉由CMP(化學機械研磨)法等研磨基板原片43,則與未被按壓之部分對應之區域之研磨(切削)率下降,該區域之板厚與藉由按壓部44b按壓之區域之板厚相比更厚。其後,若卸除按壓用基板44,則如圖7(b)所示,作成未被按壓之區域較被按壓之區域更朝與壓電元件32側相反之側隆起之基板原片43。即,基板原片43之板厚自與自壓電元件32遠離之位置對應之區域向與壓電元件32對應之區域逐漸變厚。 When the piezoelectric element 32 is formed on the substrate original sheet 43, the polishing step is moved. In the polishing step, the substrate which becomes the pressure chamber forming substrate 29 is polished to the thickness of the pressure chamber forming substrate 29 (for example, about 40 to 50 μm). In this case, the region from the piezoelectric element 32 away from the piezoelectric element 32 (the region outside the opening peripheral region Ae) is pressed from the piezoelectric element 32 side in the thickness direction, and the piezoelectric element 32 side is pressed. On the opposite side, the substrate original sheet 43 is polished (cut) so that the thickness of the substrate original sheet 43 in the unpressed region (opening peripheral region Ae) is thicker than the thickness of the substrate original sheet 43 in the pressed region. In this embodiment, as shown in FIG. 6(b) The substrate original sheet 43 is pressed by pressing the pressing substrate 44 on the surface (the surface on the piezoelectric element 32 side) of the substrate original sheet 43 on the opposite side to the polishing surface. The pressing substrate 44 is provided with a hollow portion 44a recessed to the middle of the thickness direction in a portion opposed to a region corresponding to the peripheral edge region Ae of the substrate original sheet 43 so as to be pressed against the substrate original sheet 43. The piezoelectric element 32 is housed in the empty portion 44a. The outer side of the hollow portion 44a of the pressing substrate 44 is a pressing portion 44b that presses a region of the substrate original sheet 43 that is outside the region corresponding to the opening peripheral region Ae. As shown in Fig. 7 (a), when the pressing substrate 44 is pressed against the substrate original sheet 43 and the substrate original sheet 43 is polished by the CMP (Chemical Mechanical Polishing) method or the like from the opposite side, The polishing (cutting) rate of the region corresponding to the portion that is not pressed is lowered, and the thickness of the region is thicker than the thickness of the region pressed by the pressing portion 44b. Then, when the pressing substrate 44 is removed, as shown in FIG. 7(b), the substrate original sheet 43 which is not pressed is further raised toward the side opposite to the piezoelectric element 32 side than the pressed region. In other words, the thickness of the substrate original piece 43 gradually increases from the region corresponding to the position away from the piezoelectric element 32 to the region corresponding to the piezoelectric element 32.

以該狀態,如圖8(a)所示,於基板原片43之壓電元件32側之面,以於壓電元件收納空部41內收納有壓電元件32之狀態安裝密封板33。若已於基板原片43安裝密封板33,則移至壓力室形成步驟(相當於本發明之空室形成步驟)。於壓力室形成步驟中,於被研磨之基板原片43之板厚較厚之區域、即與壓電元件32對應之區域形成壓力室30。具體而言,於基板原片43之與壓電元件32側相反側之面藉由光微影步驟而將光阻劑圖案化。其次,藉由蝕刻步驟使基板原片43之成為壓力室形成基板29之基板於板厚方向貫通而形成壓力室30。其後,若去除光阻劑,則如圖8(b)所示,形成壓力室30,基板原片43成為壓力室形成基板29及振動板31。即,形成壓力室30,且作成朝該壓力室30板厚逐漸變厚之壓力室形成基板29。此處,因藉由壓力室30之形成而使壓力室形成基板29之剛性變弱,故藉由欲朝壓電元件32之與壓力室形成基 板29相反之側彎曲之力,將壓力室30之開口周緣區域Ae之壓力室形成基板29及振動板31朝壓電元件32側拉伸。即,壓力室形成基板29之板厚較厚之部分、即形成壓力室30之前之狀態下朝與壓電元件32側相反之側隆起之部分朝壓電元件32側隆起。藉此,壓力室形成基板29之與壓電元件32側相反側之面(與連通基板24之接合面)變得大致平坦。 In this state, as shown in FIG. 8(a), the sealing plate 33 is attached to the piezoelectric element 32 side of the substrate original piece 43 in a state in which the piezoelectric element 32 is housed in the piezoelectric element housing portion 41. When the sealing plate 33 has been attached to the substrate original sheet 43, it is moved to a pressure chamber forming step (corresponding to the empty chamber forming step of the present invention). In the pressure chamber forming step, the pressure chamber 30 is formed in a region where the thickness of the substrate original sheet 43 to be polished is thick, that is, a region corresponding to the piezoelectric element 32. Specifically, the photoresist is patterned by the photolithography step on the surface of the substrate original sheet 43 on the side opposite to the piezoelectric element 32 side. Then, the substrate of the substrate original sheet 43 which becomes the pressure chamber forming substrate 29 is penetrated in the thickness direction by the etching step to form the pressure chamber 30. Thereafter, when the photoresist is removed, the pressure chamber 30 is formed as shown in FIG. 8(b), and the substrate original sheet 43 serves as the pressure chamber forming substrate 29 and the diaphragm 31. That is, the pressure chamber 30 is formed, and the pressure chamber is formed such that the thickness of the pressure chamber 30 is gradually increased. Here, since the rigidity of the pressure chamber forming substrate 29 is weakened by the formation of the pressure chamber 30, the base is formed toward the pressure chamber by the piezoelectric element 32. The pressure on the opposite side of the plate 29 is bent, and the pressure chamber forming substrate 29 and the vibrating plate 31 of the opening peripheral region Ae of the pressure chamber 30 are pulled toward the piezoelectric element 32 side. In other words, a portion where the thickness of the pressure chamber forming substrate 29 is thick, that is, a portion which is raised toward the side opposite to the piezoelectric element 32 side in a state before the pressure chamber 30 is formed, is swelled toward the piezoelectric element 32 side. Thereby, the surface of the pressure chamber forming substrate 29 on the side opposite to the piezoelectric element 32 side (the joint surface with the communication substrate 24) becomes substantially flat.

最後,於基板接合步驟中,如圖8(c)所示,藉由於壓力室形成基板29之與壓電元件32側相反之側接合連通基板24,而作成相當於壓電裝置之部分。另,於本實施形態中,於壓力室形成步驟中,壓力室形成基板29之與壓電元件32側相反側之面變得大致平坦,但因壓電元件32之初始形狀或壓力室形成基板29之厚度等,有即便形成壓力室30,壓力室形成基板29之與壓電元件32側相反側之面亦未變得大致平坦之情形。於該情形時,亦可藉由將連通基板24按壓至壓力室形成基板29側且接合,而使壓力室形成基板29之與壓電元件32側相反側之面大致平坦,且使壓力室30之開口周緣區域Ae朝壓電元件32側隆起。該情形時,因殘留有開口周緣區域Ae欲返回至原形狀(即,朝連通基板24側隆起之狀態)之應力,故即便於壓電元件32朝與振動板相反之側變形之情形時,開口周緣區域Ae亦不易變形。因此,更確實地抑制壓力室形成基板29與連通基板24剝離之情況。 Finally, in the substrate bonding step, as shown in FIG. 8(c), a portion corresponding to the piezoelectric device is formed by bonding the communication substrate 24 to the side opposite to the piezoelectric element 32 side of the pressure chamber forming substrate 29. Further, in the present embodiment, in the pressure chamber forming step, the surface of the pressure chamber forming substrate 29 opposite to the piezoelectric element 32 side is substantially flat, but the substrate is formed by the initial shape of the piezoelectric element 32 or the pressure chamber. When the pressure chamber 30 is formed, the surface of the pressure chamber forming substrate 29 on the side opposite to the piezoelectric element 32 side is not substantially flat. In this case, by pressing the communication substrate 24 to the pressure chamber forming substrate 29 side and joining, the surface of the pressure chamber forming substrate 29 on the side opposite to the piezoelectric element 32 side can be made substantially flat, and the pressure chamber 30 can be made. The opening peripheral edge area Ae is raised toward the piezoelectric element 32 side. In this case, since the stress in the original peripheral edge area Ae is returned to the original shape (that is, in a state of being raised toward the side of the communication substrate 24), even when the piezoelectric element 32 is deformed toward the side opposite to the vibrating plate, The peripheral edge area Ae is also not easily deformed. Therefore, the case where the pressure chamber forming substrate 29 and the communicating substrate 24 are peeled off is more reliably suppressed.

另外,於上述之第1實施形態之壓力室形成基板29中,壓力室30之開口周緣區域Ae之整體、即壓力室30之開口周緣之整周較開口周緣區域Ae之外側之區域之板厚形成為更厚,但並未限於此。只要壓力室形成基板之壓力室之開口周緣區域之至少一部分較該開口周緣區域更外側之區域之板厚形成為更厚即可。又,於上述之第1實施形態之壓力室形成基板29中,於壓力室30之開口周緣區域Ae之整體,板厚朝壓力室30逐漸變厚,但並未限於此。只要壓力室形成基板之壓力室之開口周緣區域之至少一部分朝壓力室板厚逐漸變厚即可。再者, 於上述之第1實施形態之壓力室形成基板29中,壓力室30之開口周緣區域Ae以外之區域係設定成大致相同之板厚,但並未限於此。例如,亦可使壓力室之開口周緣區域以外之區域之壓力室形成基板之一部分之板厚變厚。總而言之,只要壓力室形成基板之壓力室之開口周緣區域之板厚較開口周緣區域更外側之區域之至少一部分之板厚更厚即可。 Further, in the pressure chamber forming substrate 29 of the above-described first embodiment, the entire peripheral edge area Ae of the pressure chamber 30, that is, the entire circumference of the opening periphery of the pressure chamber 30 is thicker than the area of the outer side of the opening peripheral area Ae. It is formed to be thicker, but is not limited to this. It suffices that the thickness of at least a part of the peripheral edge region of the pressure chamber of the pressure chamber forming substrate is thicker than the region of the outer side of the opening peripheral region. Further, in the pressure chamber forming substrate 29 of the above-described first embodiment, the thickness of the entire peripheral edge region Ae of the pressure chamber 30 is gradually increased toward the pressure chamber 30, but the invention is not limited thereto. At least a part of the peripheral edge region of the pressure chamber of the pressure chamber forming substrate may be gradually thickened toward the thickness of the pressure chamber. Furthermore, In the pressure chamber forming substrate 29 of the above-described first embodiment, the regions other than the opening peripheral region Ae of the pressure chamber 30 are set to have substantially the same plate thickness, but the invention is not limited thereto. For example, the thickness of one portion of the pressure chamber forming substrate in the region other than the peripheral region of the opening of the pressure chamber may be increased. In short, it is sufficient that the thickness of the peripheral edge region of the pressure chamber of the pressure chamber forming substrate is thicker than the thickness of at least a portion of the outer region of the opening peripheral region.

例如,於圖9所示之第2實施形態之壓力室形成基板29'(壓電裝置)中,壓力室30'之開口周緣區域、及其等之間之區域之板厚變厚。另,於圖9中,以陰影線表示板厚變厚之區域。若具體說明,則於第2實施形態之壓力室形成基板29'中,自壓力室30'之長邊方向之兩端部之外側向壓力室30'之列,板厚逐漸變厚。即,較壓力室30'之長邊方向之寬度更寬幅,即沿壓電元件32之排列設置方向延伸之帶狀之區域(除壓力室30'外)之板厚較該區域更外側之區域之板厚更厚。另,於該帶狀之區域,包含有壓力室30'之開口周緣區域。於本實施形態中,壓力室形成基板29'之板厚於沿噴嘴列方向(即,壓力室30'之排列設置方向)之方向上大致一定而對齊。另,壓力室30'之排列設置間距如本實施形態般為窄間距(例如600dpi)之情形時,夾於相鄰之壓力室30'之間之區域亦可視為各壓力室30'之開口周緣區域。即,上述之帶狀之區域亦可視為各壓力室30'之開口周緣區域相連者。又,其他構成因與上述之第1實施形態相同,故省略說明。 For example, in the pressure chamber forming substrate 29' (piezoelectric device) of the second embodiment shown in Fig. 9, the thickness of the region around the opening of the pressure chamber 30' and the region between them are increased. In addition, in FIG. 9, the area|region which thickened a board|substrate is shown by hatching. Specifically, in the pressure chamber forming substrate 29' of the second embodiment, the thickness of the pressure chamber 30' is increased from the outer side in the longitudinal direction of the pressure chamber 30' to the pressure chamber 30'. That is, the width of the longitudinal direction of the pressure chamber 30' is wider, that is, the strip-shaped region (except the pressure chamber 30') extending in the direction in which the piezoelectric elements 32 are arranged is more outward than the region. The plate thickness of the area is thicker. Further, in the strip-shaped region, an opening peripheral region of the pressure chamber 30' is included. In the present embodiment, the thickness of the pressure chamber forming substrate 29' is substantially constant in the direction of the nozzle row direction (that is, the direction in which the pressure chambers 30' are arranged). Further, when the arrangement of the pressure chambers 30' is a narrow pitch (for example, 600 dpi) as in the present embodiment, the region sandwiched between the adjacent pressure chambers 30' can also be regarded as the peripheral periphery of each pressure chamber 30'. region. That is, the above-mentioned strip-shaped region may be regarded as being connected to the peripheral edge region of each of the pressure chambers 30'. The other configuration is the same as that of the first embodiment described above, and thus the description thereof is omitted.

其次,對第2實施形態之壓電裝置之製造方法進行說明。另,即便為第2實施形態之壓電裝置,亦可以與第1實施形態之製造方法相同之方法作成,此處說明更簡便之製造方法。首先,與第1實施形態之製造方法同樣,於成為壓力室形成基板29'之基板(例如矽基板)上形成成為振動板31之層,且形成成為壓力室形成基板29'及振動板31之基板原片43'。若已形成基板原片43',則與第1實施形態之製造方法同 樣,於壓電元件形成步驟中,於基板原片43'之成為振動板31之側之面形成壓電元件32(參照圖10(a))。若已於基板原片43'上形成壓電元件32,則如圖10(b)所示,於基板原片43'之壓電元件32側之面安裝密封板33。於本實施形態之製造方法中,以該狀態移至研磨步驟。 Next, a method of manufacturing the piezoelectric device of the second embodiment will be described. Further, even in the piezoelectric device of the second embodiment, it can be produced in the same manner as the manufacturing method of the first embodiment, and a simpler manufacturing method will be described here. First, similarly to the manufacturing method of the first embodiment, a layer serving as the vibrating plate 31 is formed on a substrate (for example, a ruthenium substrate) serving as the pressure chamber forming substrate 29', and the pressure chamber forming substrate 29' and the vibrating plate 31 are formed. Substrate original sheet 43'. When the substrate original sheet 43' is formed, the manufacturing method of the first embodiment is the same as that of the first embodiment. In the piezoelectric element forming step, the piezoelectric element 32 is formed on the surface of the substrate original piece 43' which is the side of the vibrating plate 31 (see FIG. 10(a)). When the piezoelectric element 32 is formed on the substrate original piece 43', as shown in Fig. 10 (b), the sealing plate 33 is attached to the surface of the substrate original piece 43' on the piezoelectric element 32 side. In the production method of the present embodiment, the state is moved to the polishing step in this state.

於研磨步驟中,自頂板部33a側按壓密封板33,且研磨成為壓力室形成基板29'之基板。密封板33之側壁部33b因於基板原片43'之較壓電元件32之長邊方向之兩端部更外側,抵接於沿壓電元件32之排列設置方向(噴嘴列方向)之區域,故該區域被按壓。且,以自壓電元件32側按壓密封板33之狀態,與第1實施形態之製造方法同樣,自與壓電元件32側相反之側研磨(切削)基板原片43',使未被按壓之區域之基板原片43'之板厚較被按壓之區域之基板原片43'之板厚更厚。藉此,如圖10(a)所示,作成未被按壓之區域(與壓電元件收納空部41對應之區域)較被按壓之區域更朝與壓電元件32側相反之側隆起之基板原片43'。即,基板原片43'之板厚自與自壓電元件32之列遠離之位置對應之區域向與壓電元件32對應之區域逐漸變厚。 In the polishing step, the sealing plate 33 is pressed from the top plate portion 33a side, and is polished into a substrate of the pressure chamber forming substrate 29'. The side wall portion 33b of the sealing plate 33 is abutting on the outer side of the longitudinal direction of the piezoelectric element 32 of the substrate original piece 43', and abuts against the arrangement direction (nozzle column direction) along the piezoelectric element 32. Therefore, the area is pressed. In the same manner as in the manufacturing method of the first embodiment, the substrate original sheet 43' is polished (cut) from the side opposite to the piezoelectric element 32 side in a state where the sealing plate 33 is pressed from the side of the piezoelectric element 32, so that the substrate is not pressed. The thickness of the substrate original sheet 43' in the region is thicker than the thickness of the substrate original sheet 43' in the pressed region. As a result, as shown in FIG. 10(a), a region in which the unpressed region (the region corresponding to the piezoelectric element housing portion 41) is raised toward the side opposite to the piezoelectric element 32 side from the pressed region is formed. Original piece 43'. That is, the thickness of the substrate original piece 43' is gradually increased from the region corresponding to the position away from the piezoelectric element 32 to the region corresponding to the piezoelectric element 32.

若已研磨基板原片43',則與第1實施形態之製造方法同樣,於壓力室形成步驟中,於被研磨之基板原片43'之板厚較厚之區域、即與壓電元件32對應之區域形成壓力室30'。藉此,如圖10(b)所示,形成壓力室30'且基板原片43'成為壓力室形成基板29'及振動板31。即,形成壓力室30',且作成自壓力室30'之列之外側朝該壓力室30'之列板厚逐漸變厚之壓力室形成基板29'。此處,於本實施形態中,亦因藉由壓力室30'之形成而使壓力室形成基板29'之剛性變弱,故藉由欲朝壓電元件32之與壓力室形成基板29'相反之側彎曲之力,將壓力室30'之列之外側之壓力室形成基板29'及振動板31朝壓電元件32側拉伸。即,壓力室形成基板29'之板厚較厚之部分、即形成壓力室30'之前之狀態下朝與壓電元件32側相反之側隆起之部分朝壓電元件32側隆起。 因此,於本實施形態中,壓力室形成基板29'之與壓電元件32側相反側之面亦變得大致平坦。且,最後,於基板接合步驟中,如圖10(c)所示,藉由於壓力室形成基板29'之與壓電元件32側相反之側接合連通基板24,而作成相當於壓電裝置之部分。 When the substrate original sheet 43' has been polished, similarly to the manufacturing method of the first embodiment, in the pressure chamber forming step, the thickness of the substrate original sheet 43' to be polished is thick, that is, the piezoelectric element 32. The corresponding area forms a pressure chamber 30'. Thereby, as shown in FIG. 10(b), the pressure chamber 30' is formed, and the substrate original piece 43' becomes the pressure chamber forming substrate 29' and the diaphragm 31. That is, the pressure chamber 30' is formed, and the pressure chamber is formed to form the substrate 29' from the outer side of the pressure chamber 30' toward the pressure chamber 30'. Here, in the present embodiment, since the rigidity of the pressure chamber forming substrate 29' is weakened by the formation of the pressure chamber 30', the substrate 29' is formed opposite to the pressure chamber by the piezoelectric element 32. The pressure on the side is bent, and the pressure chamber forming substrate 29' and the vibrating plate 31 on the outer side of the pressure chamber 30' are stretched toward the piezoelectric element 32 side. In other words, a portion of the pressure chamber forming substrate 29' having a thick thickness, that is, a portion which is raised toward the side opposite to the piezoelectric element 32 side in a state before the pressure chamber 30' is formed, is swelled toward the piezoelectric element 32 side. Therefore, in the present embodiment, the surface of the pressure chamber forming substrate 29' opposite to the piezoelectric element 32 side is also substantially flat. Finally, in the substrate bonding step, as shown in FIG. 10(c), the piezoelectric substrate is formed by bonding the communication substrate 24 to the side opposite to the piezoelectric element 32 side of the pressure chamber forming substrate 29'. section.

如此,於本實施形態之製造方法中,因藉由密封板33按壓基板原片43',故與第1實施形態之製造方法不同,無須另外使用按壓用基板44按壓基板原片43',可減少製造步驟。其結果,可進而容易地製作抑制壓力室形成基板29'與連通基板24之剝離而提高可靠性之壓電裝置。 As described above, in the manufacturing method of the present embodiment, since the substrate original sheet 43' is pressed by the sealing plate 33, unlike the manufacturing method of the first embodiment, it is not necessary to separately press the substrate original sheet 43' using the pressing substrate 44. Reduce manufacturing steps. As a result, it is possible to easily produce a piezoelectric device that suppresses peeling of the pressure chamber forming substrate 29' and the communication substrate 24 and improves reliability.

另外,於上述之各實施形態中,壓力室30、30'於俯視時形成為大致平行四邊形狀,但並未限於此。例如,可於俯視時採取矩形狀、梯形狀、圓形狀、橢圓形狀等多種形狀。總而言之,無論壓力室為何種形狀,只要壓力室形成基板之壓力室之開口周緣區域之至少一部分較該開口周緣區域更外側之區域之板厚形成為更厚即可。又,只要壓力室形成基板之壓力室之開口周緣區域之至少一部分朝壓力室板厚逐漸變厚即可。 Further, in each of the above embodiments, the pressure chambers 30 and 30' are formed in a substantially parallelogram shape in plan view, but the present invention is not limited thereto. For example, a plurality of shapes such as a rectangular shape, a trapezoidal shape, a circular shape, and an elliptical shape can be adopted in a plan view. In short, regardless of the shape of the pressure chamber, it is sufficient that the thickness of at least a portion of the peripheral region of the opening of the pressure chamber forming the substrate of the pressure chamber is thicker than the thickness of the region outside the peripheral portion of the opening. Further, at least a part of the peripheral edge region of the pressure chamber of the pressure chamber forming substrate may be gradually thickened toward the thickness of the pressure chamber.

且,於以上,作為壓電裝置列舉包含記錄頭3之連通基板24、壓力室形成基板29、振動板31、及壓電元件32之構成為例進行說明,但本發明亦可應用於具備形成有空室之第1基板、介隔振動板形成於空室上之壓電元件、及積層於第1基板之與壓電元件側相反之側之第2基板之其他壓電裝置。又,作為液體噴射頭,例如,亦可於使用於液晶顯示器等之彩色濾光片之製造之色材噴出頭、使用於有機EL(Electro Luminescence)顯示器、FED(面發光顯示器)等之電極形成之電極材料噴出頭、使用於生物晶片(生物化學元件)之製造之生物體有機物噴出頭等應用本發明。 In the above, the piezoelectric device includes a configuration in which the communication substrate 24 including the recording head 3, the pressure chamber forming substrate 29, the vibration plate 31, and the piezoelectric element 32 are described as an example. However, the present invention can also be applied to formation. The first substrate having the empty chamber, the piezoelectric element in which the vibrating plate is interposed in the empty chamber, and the other piezoelectric device laminated on the second substrate on the side opposite to the piezoelectric element side of the first substrate. Further, the liquid ejecting head can be formed, for example, as a color material ejecting head for manufacturing a color filter such as a liquid crystal display, or an electrode for use in an organic EL (Electro Luminescence) display or an FED (Face Light Emitting Display). The present invention is applied to an electrode material ejection head, a biological organic matter ejection head used for the production of a biochip (biochemical element), and the like.

24‧‧‧連通基板 24‧‧‧Connected substrate

29‧‧‧壓力室形成基板 29‧‧‧ Pressure chamber forming substrate

30‧‧‧壓力室 30‧‧‧ Pressure chamber

31‧‧‧振動板 31‧‧‧Vibration plate

32‧‧‧壓電元件 32‧‧‧Piezoelectric components

33‧‧‧密封板 33‧‧‧ Sealing plate

33a‧‧‧頂板部 33a‧‧‧Top Board

33b‧‧‧側壁部 33b‧‧‧ Sidewall

41‧‧‧壓電元件收納空部 41‧‧‧ Piezoelectric component storage

Ae‧‧‧開口周緣區域 Ae‧‧‧Open Peripheral Area

ta‧‧‧距離 Ta‧‧‧distance

ta'‧‧‧板厚 Ta'‧‧‧ plate thickness

tb‧‧‧板厚 Tb‧‧‧ plate thickness

Claims (6)

一種壓電裝置,其特徵在於包含:第1基板,其形成有空室;振動板,其區劃上述空室之一側之面;壓電元件,其係於上述振動板之與上述空室相反之側,自振動板側起依序積層第1電極層、壓電體層、及第2電極層而成;及第2基板,其積層於上述第1基板之與振動板側相反之側;且上述第1基板之上述空室之開口周緣區域之至少一部分較該開口周緣區域更外側之區域之板厚更厚。 A piezoelectric device comprising: a first substrate formed with an empty chamber; a vibration plate that faces a surface on one side of the empty chamber; and a piezoelectric element attached to the vibrating plate opposite to the empty chamber a first electrode layer, a piezoelectric layer, and a second electrode layer are sequentially stacked from the side of the vibrating plate; and the second substrate is laminated on a side opposite to the vibrating plate side of the first substrate; At least a portion of the peripheral edge region of the opening of the empty chamber of the first substrate is thicker than a region of the outer region of the opening peripheral region. 如請求項1之壓電裝置,其中上述開口周緣區域之整周較該開口周緣區域更外側之區域之板厚更厚。 The piezoelectric device according to claim 1, wherein the entire circumference of the opening peripheral region is thicker than the outer portion of the opening peripheral region. 一種壓電裝置,其特徵在於包含:第1基板,其形成有空室;振動板,其區劃上述空室之一側之面;壓電元件,其係於上述振動板之與上述空室相反之側,自振動板側起依序積層第1電極層、壓電體層、及第2電極層而成;及第2基板,其積層於上述第1基板之與振動板側相反之側;且上述第1基板之至少一部分朝上述空室板厚逐漸變厚。 A piezoelectric device comprising: a first substrate formed with an empty chamber; a vibration plate that faces a surface on one side of the empty chamber; and a piezoelectric element attached to the vibrating plate opposite to the empty chamber a first electrode layer, a piezoelectric layer, and a second electrode layer are sequentially stacked from the side of the vibrating plate; and the second substrate is laminated on a side opposite to the vibrating plate side of the first substrate; At least a portion of the first substrate gradually increases in thickness toward the empty chamber. 一種液體噴射頭,其特徵在於包含:如請求項1至3中任一項之壓電裝置;及噴嘴,其連通於上述空室。 A liquid ejecting head comprising: the piezoelectric device according to any one of claims 1 to 3; and a nozzle connected to the empty chamber. 一種壓電裝置之製造方法,該壓電裝置包含:第1基板,其形成有空室; 振動板,其區劃上述空室之一側之面;壓電元件,其係於上述振動板之與上述空室相反之側,自振動板側起依序積層第1電極層、壓電體層、及第2電極層而成;及第2基板,其積層於上述第1基板之與振動板側相反之側;且該壓電裝置之製造方法之特徵在於包含:壓電元件形成步驟,其於成為上述第1基板及上述振動板之基板原片之成為上述振動板之側之面,形成上述壓電元件;研磨步驟,其以將上述基板原片之自上述壓電元件遠離之區域自壓電元件側朝板厚方向按壓之狀態,自與壓電元件側相反之側研磨上述基板原片,使未被按壓之區域之上述基板原片之板厚較被按壓之區域之上述基板原片之板厚更厚;空室形成步驟,其於經研磨之上述基板原片之板厚較厚之區域、即與上述壓電元件對應之區域形成上述空室,且將上述基板原片設為上述第1基板及上述振動板;及基板接合步驟,其於上述第1基板之與壓電元件側相反之側接合上述第2基板。 A method of manufacturing a piezoelectric device, comprising: a first substrate formed with an empty chamber; a vibrating plate that divides a surface on one side of the empty chamber; a piezoelectric element that is disposed on a side opposite to the empty chamber of the vibrating plate, and sequentially stacks the first electrode layer and the piezoelectric layer from the side of the vibrating plate And the second electrode layer; and the second substrate is laminated on a side opposite to the vibration plate side of the first substrate; and the method of manufacturing the piezoelectric device includes a piezoelectric element forming step, wherein Forming the piezoelectric element on a surface of the original substrate of the first substrate and the vibrating plate on the side of the vibrating plate, and performing a polishing step of self-pressing the region of the substrate original from the piezoelectric element In a state in which the electric component side is pressed in the thickness direction, the substrate original sheet is polished from the side opposite to the piezoelectric element side, and the substrate original sheet of the region where the substrate original sheet is not pressed in the unpressed region is pressed. a thicker plate forming step of forming the empty space in a region where the thickness of the original substrate of the substrate is thick, that is, a region corresponding to the piezoelectric element, and the original substrate is set as The first substrate and the upper substrate Vibration plate; and a substrate bonding step, the second substrate which is the opposite side of the side of the piezoelectric element is bonded to the first substrate. 如請求項5之壓電裝置之製造方法,其中於上述研磨步驟中,上述基板原片之未被按壓之區域較被按壓之區域更朝與壓電元件側相反之側隆起。 The method of manufacturing a piezoelectric device according to claim 5, wherein in the polishing step, the unpressed region of the substrate original sheet is raised toward the side opposite to the piezoelectric element side from the pressed region.
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US20170001443A1 (en) 2017-01-05

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