TWI589915B - Cover lens and method for fabricating the same - Google Patents

Cover lens and method for fabricating the same Download PDF

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Publication number
TWI589915B
TWI589915B TW105111362A TW105111362A TWI589915B TW I589915 B TWI589915 B TW I589915B TW 105111362 A TW105111362 A TW 105111362A TW 105111362 A TW105111362 A TW 105111362A TW I589915 B TWI589915 B TW I589915B
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Taiwan
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layer
stack
refractive index
substrate
layer stack
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TW105111362A
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Chinese (zh)
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TW201727268A (en
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許毅中
徐國書
吳宇川
徐俊
楊婷婷
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宸鴻科技(廈門)有限公司
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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/16Constructional details or arrangements
    • G06F1/1601Constructional details related to the housing of computer displays, e.g. of CRT monitors, of flat displays
    • G06F1/1603Arrangements to protect the display from incident light, e.g. hoods
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • G02B1/115Multilayers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2200/00Indexing scheme relating to G06F1/04 - G06F1/32
    • G06F2200/16Indexing scheme relating to G06F1/16 - G06F1/18
    • G06F2200/161Indexing scheme relating to constructional details of the monitor
    • G06F2200/1612Flat panel monitor

Description

保護蓋板及其製作方法 Protective cover and manufacturing method thereof

本發明是關於一種保護蓋板及其製作方法。 The present invention relates to a protective cover and a method of making the same.

近年來,顯示裝置作為資訊展示的介面而大量地運用於各種電子產品中。顯示裝置內常設置有遮光層,以遮蔽周邊線路。為了提升視覺效果,往往在顯示裝置外設置有抗反射層,以降低環境光影響輸出的影像品質。使用上,往往依照影像品質的需求而設計此抗反射層的特性,即抗反射層是搭配顯示裝置的可視區而設計的,此等抗反射層往往傾向具有較大的抗反射效果。 In recent years, display devices have been widely used in various electronic products as an interface for information display. A light shielding layer is often disposed in the display device to shield the peripheral lines. In order to enhance the visual effect, an anti-reflection layer is often disposed outside the display device to reduce the image quality of the ambient light. In use, the characteristics of the anti-reflection layer are often designed according to the requirements of image quality, that is, the anti-reflection layer is designed to match the visible area of the display device, and these anti-reflection layers tend to have a large anti-reflection effect.

為了使得非可視區也具有抗反射效果,然而,由於遮光層所定義的非可視區內具有較低的亮度,因此,具有較大的抗反射能力的抗反射層並不是最適合搭配非可視區的,換句話說,將適用於可視區的抗反射能力高的抗反射層設置於非可視區,人眼仍容易在非可視區內觀察到不佳的視覺外觀效果,例如遮光層不能呈現出其本來的真實顏色而出現異色問題,從而影響顯示裝置的外觀效果。 In order to make the non-visible area also have an anti-reflection effect, however, since the non-visible area defined by the light-shielding layer has a low brightness, the anti-reflection layer having a large anti-reflection capability is not the most suitable for the non-visible area. In other words, the anti-reflection layer with high anti-reflection capability applicable to the visible area is disposed in the non-visible area, and the human eye still easily observes a poor visual appearance effect in the non-visible area, for example, the light shielding layer cannot be presented. The original true color causes a problem of a heterochromatic color, thereby affecting the appearance of the display device.

本發明之多個實施方式提供一種保護蓋板,藉由改變非可視區上的層體性質,該位於非可視區的層體具有低反射率(反射率小於2.5%),而使遮光層所在的非可視區具有抗反射效果,同時該位於非可視區的層體於可見光內的抗反射效果接近一致(反射率差異小於2%),從而使得遮光層可以呈現其真實顏色而降低異色的問題。 Embodiments of the present invention provide a protective cover plate. By changing the layer properties on the non-visible area, the layer body located in the non-visible area has low reflectance (reflectance less than 2.5%), and the light shielding layer is located The non-visible area has an anti-reflection effect, and the anti-reflection effect of the layer body in the non-visible area in visible light is nearly uniform (the reflectance difference is less than 2%), so that the light-shielding layer can present its true color and reduce the problem of different colors. .

根據本發明之部分實施方式,保護蓋板包含基板、遮光層以及第一層體堆疊。基板具有相對設置的第一表面與第二表面。遮光層設置於基板之第一表面,其中遮光層具有遮光層開口,以定義基板之可視區與非可視區。第一層體堆疊設置於基板之第二表面且至少位於非可視區。第一層體堆疊於可見光波長範圍內之反射率差異小於2%,第一層體堆疊在非可視區於可見光波長範圍內之反射率小於2.5%。 According to some embodiments of the present invention, the protective cover comprises a substrate, a light shielding layer, and a first layer stack. The substrate has opposite first and second surfaces. The light shielding layer is disposed on the first surface of the substrate, wherein the light shielding layer has a light shielding layer opening to define the visible area and the non-visible area of the substrate. The first layer stack is disposed on the second surface of the substrate and at least in the non-visible area. The difference in reflectance of the first layer stack in the visible wavelength range is less than 2%, and the reflectivity of the first layer stack in the non-visible region in the visible wavelength range is less than 2.5%.

於本發明之多個實施方式中,第一層體堆疊包含第一折射率層,其中第一折射率層的折射率範圍為大約1.2至大約1.8。 In various embodiments of the invention, the first layer stack comprises a first index of refraction layer, wherein the first index of refraction layer has a refractive index ranging from about 1.2 to about 1.8.

於本發明之多個實施方式中,保護蓋板包含第二層體堆疊,設置於基板之第二表面且位於可視區內,其中第一層體堆疊與第二層體堆疊相連,且第二層體堆疊為抗反射堆疊。 In various embodiments of the present invention, the protective cover comprises a second layer stack disposed on the second surface of the substrate and located in the visible region, wherein the first layer stack is connected to the second layer stack, and the second The layer stack is an anti-reflection stack.

於本發明之多個實施方式中,保護蓋板包含第二層體堆疊與第三層體堆疊,設置於基板之第二表面且位於該可視區,其中第二層體堆疊係位於第三層體堆疊與基板之間,第 二層體堆疊鄰近第三層體堆疊的一層體的折射率大於第三層體堆疊鄰近第二層體堆疊的一層體的折射率。 In a plurality of embodiments of the present invention, the protective cover plate comprises a second layer stack and a third layer stack disposed on the second surface of the substrate and located in the visible area, wherein the second layer stack is located on the third layer Between the body stack and the substrate, The refractive index of the layer of the two-layer stack adjacent to the third layer stack is greater than the refractive index of the layer of the third layer stack adjacent to the second layer stack.

於本發明之多個實施方式中,第三層體堆疊與第一層體堆疊的材料相同,且第三層體堆疊與第一層體堆疊為同一製程形成。 In various embodiments of the present invention, the third layer stack is the same material as the first layer stack, and the third layer stack is formed in the same process as the first layer stack.

於本發明之多個實施方式中,位於可視區的相疊之第三層體堆疊與第二層體堆疊之反射率小於位於非可視區的第一層體堆疊之反射率。 In various embodiments of the invention, the reflectivity of the stacked third layer stack and the second layer stack in the viewable area is less than the reflectivity of the first layer stack in the non-visible area.

於本發明之多個實施方式中,位於可視區的相疊之第三抗層體堆疊與第二層體堆疊於可見光波長之反射率差異小於1%。 In various embodiments of the present invention, the reflectance difference between the stacked third anti-layer stack and the second layer stack at the visible region is less than 1%.

於本發明之多個實施方式中,第一層體堆疊具有開口,位於可視區內,第二層體堆疊位於第一層體堆疊之開口內。 In various embodiments of the invention, the first layer stack has an opening in the viewable area and the second layer stack is located in the opening of the first layer stack.

於本發明之多個實施方式中,第二層體堆疊包含多個第三折射率層以及第四折射率層,每二個第三折射率層由第四折射率層間隔開來,其中第三折射率層之一鄰接基板,其中第三折射率層的折射率大於第四折射率層與該第一層體堆疊的第一折射率層的折射率。 In various embodiments of the present invention, the second layer stack includes a plurality of third refractive index layers and a fourth refractive index layer, and each of the two third refractive index layers is separated by a fourth refractive index layer, wherein One of the triple refractive index layers abuts the substrate, wherein the refractive index of the third refractive index layer is greater than the refractive index of the fourth refractive index layer and the first refractive index layer of the first layer stack.

於本發明之多個實施方式中,第三折射率層的折射率範圍為大約2.2至大約2.4之間,第四折射率層的折射率範圍為大約1.4至大約1.6之間。 In various embodiments of the invention, the third refractive index layer has a refractive index ranging from about 2.2 to about 2.4, and the fourth refractive index layer has a refractive index ranging from about 1.4 to about 1.6.

於本發明之多個實施方式中,其中第一層體堆疊具有開口,位於可視區內。 In various embodiments of the invention, wherein the first layer stack has an opening, located in the viewable area.

於本發明之多個實施方式中,基板包含平坦部以及設置於平坦部之至少一側的彎折部,其中遮光層與第一層體堆疊至少設置於彎折部之相對二側,彎折部位於非可視區。 In a plurality of embodiments of the present invention, the substrate includes a flat portion and a bent portion disposed on at least one side of the flat portion, wherein the light shielding layer and the first layer body stack are disposed at least on opposite sides of the bent portion, and are bent The part is located in the non-visible area.

於本發明之多個實施方式中,第一層體堆疊之一第一折射率層的材料為氟化鎂。 In various embodiments of the present invention, the material of one of the first refractive index layers of the first layer stack is magnesium fluoride.

根據本發明之部分實施方式,保護蓋板的製作方法包含提供基板,其中基板具有相對設置的第一表面與第二表面;形成遮光層於基板之第一表面,其中遮光層具有遮光層開口,以定義基板之可視區與非可視區;以及形成第一層體堆疊於基板之第二表面且至少位於非可視區,其中第一層體堆疊於可見光波長範圍內之反射率差異小於2%,且第一層體堆疊在非可視區於可見光波長範圍內之反射率小於2.5%。 According to some embodiments of the present invention, a method for fabricating a protective cover includes providing a substrate, wherein the substrate has opposite first and second surfaces; forming a light shielding layer on the first surface of the substrate, wherein the light shielding layer has a light shielding layer opening, Defining a visible area and a non-visible area of the substrate; and forming the first layer body on the second surface of the substrate and at least in the non-visible area, wherein the difference in reflectance of the first layer body stacked in the visible wavelength range is less than 2%, And the reflectivity of the first layer stack in the non-visible region in the visible wavelength range is less than 2.5%.

於本發明之多個實施方式中,保護蓋板的製作方法更包含形成第二層體堆疊於基板之第二表面且位於可視區。 In various embodiments of the present invention, the method for fabricating the protective cover further comprises forming a second layer stacked on the second surface of the substrate and located in the visible region.

於本發明之多個實施方式中,形成第二層體堆疊於基板之第二表面且位於可視區內的步驟包含形成覆膜於基板之第二表面,覆膜包含位於可視區的鏤空部;形成至少材料於覆膜上,其中材料覆蓋覆膜且填入鏤空部;以及移除覆膜以及位於覆膜上的材料,使剩餘的材料形成第二層體堆疊。 In various embodiments of the present invention, the step of forming the second layer body on the second surface of the substrate and in the visible region comprises forming a film on the second surface of the substrate, the film comprising a hollow portion located in the visible region; Forming at least a material on the film, wherein the material covers the film and filling the hollow; and removing the film and the material on the film such that the remaining material forms a second layer stack.

於本發明之多個實施方式中,保護蓋板的製作方法更包含形成一第三層體堆疊於基板之第二表面且位於可視區內,其中第二層體堆疊係位於第三層體堆疊與基板之間,第二層體堆疊鄰近第三層體堆疊的層體的折射率大於第三層體堆疊鄰近第二層體堆疊的層體的折射率。 In a plurality of embodiments of the present invention, the method for fabricating the protective cover further comprises forming a third layer body stacked on the second surface of the substrate and located in the visible region, wherein the second layer stack is located in the third layer stack. Between the substrate and the substrate, the layer stack of the second layer stack adjacent to the third layer stack has a refractive index greater than the layer stack of the third layer stack adjacent to the second layer stack.

於本發明之多個實施方式中,形成第一層體堆疊的步驟與形成第三層體堆疊的步驟同時進行。 In various embodiments of the invention, the step of forming the first layer stack is performed simultaneously with the step of forming the third layer stack.

於本發明之多個實施方式中,基板包含平坦部以及設置於平坦部之至少一側的彎折部,其中遮光層與第一層體堆疊至少設置於彎折部之相對二側,彎折部位於非可視區。 In a plurality of embodiments of the present invention, the substrate includes a flat portion and a bent portion disposed on at least one side of the flat portion, wherein the light shielding layer and the first layer body stack are disposed at least on opposite sides of the bent portion, and are bent The part is located in the non-visible area.

100‧‧‧保護蓋板 100‧‧‧ protective cover

110‧‧‧基板 110‧‧‧Substrate

112‧‧‧平坦部 112‧‧‧flat

114‧‧‧彎折部 114‧‧‧Bends

120‧‧‧遮光層 120‧‧‧ shading layer

122‧‧‧遮光層開口 122‧‧‧ shading opening

130‧‧‧第一層體堆疊 130‧‧‧First layer stacking

130a‧‧‧底面 130a‧‧‧ bottom

134‧‧‧第一折射率層 134‧‧‧First refractive index layer

136‧‧‧開口 136‧‧‧ openings

140‧‧‧第二層體堆疊 140‧‧‧Second layer stacking

140’‧‧‧材料 140’‧‧‧Materials

140a‧‧‧底面 140a‧‧‧ bottom

142‧‧‧第三折射率層 142‧‧‧ Third refractive index layer

144‧‧‧第四折射率層 144‧‧‧fourth refractive index layer

150‧‧‧第三層體堆疊 150‧‧‧Layer 3 stacking

154‧‧‧第五折射率層 154‧‧‧ fifth refractive index layer

200‧‧‧覆膜 200‧‧‧ film

210‧‧‧鏤空部 210‧‧‧镂空部

S1‧‧‧第一表面 S1‧‧‧ first surface

S2‧‧‧第二表面 S2‧‧‧ second surface

VA‧‧‧可視區 VA‧‧ visible area

NA‧‧‧非可視區 NA‧‧‧Invisible area

第1A圖為根據本發明之一實施方式之保護蓋板之剖面圖。 1A is a cross-sectional view of a protective cover according to an embodiment of the present invention.

第1B圖為根據部分實施方式保護蓋板之部份第一層體堆疊之折射率頻譜圖。 FIG. 1B is a refractive index spectrum diagram of a portion of the first layer stack of the protective cover according to some embodiments.

第1C圖為根據部分實施方式保護蓋板之第一層體堆疊之反射頻譜圖。 1C is a reflection spectrum diagram of a first layer stack of a protective cover according to some embodiments.

第2圖為根據本發明之另一實施方式之保護蓋板之剖面圖。 Figure 2 is a cross-sectional view of a protective cover according to another embodiment of the present invention.

第3圖為根據本發明之再一實施方式之保護蓋板之剖面圖。 Figure 3 is a cross-sectional view of a protective cover according to still another embodiment of the present invention.

第4圖為根據本發明之另一實施方式之保護蓋板之剖面圖。 Figure 4 is a cross-sectional view of a protective cover according to another embodiment of the present invention.

第5圖為根據本發明之又一實施方式之保護蓋板之剖面圖。 Figure 5 is a cross-sectional view of a protective cover according to still another embodiment of the present invention.

第6A圖至第6D圖為根據本發明的一實施方式的保護蓋板於多個製造階段的剖面圖。 6A to 6D are cross-sectional views of the protective cover according to an embodiment of the present invention at a plurality of manufacturing stages.

以下將以圖式揭露本發明之多個實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本發明。也就是說,在本發明部分實施方式中,這些實務上的細節是非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式為之。 The various embodiments of the present invention are disclosed in the drawings, and in the claims However, it should be understood that these practical details are not intended to limit the invention. That is, in some embodiments of the invention, these practical details are not necessary. In addition, some of the conventional structures and elements are shown in the drawings in a simplified manner.

第1A圖為根據本發明之一實施方式之保護蓋板100之剖面圖。保護蓋板100包含基板110、遮光層120以及第一層體堆疊130。基板110具有相對設置的第一表面S1與第二表面S2,其中,保護蓋板100作為顯示裝置的外蓋板使用時,第二表面S2相較第一表面S1更加靠近人眼。遮光層120設置於基板110之第一表面S1,其中遮光層120具有遮光層開口122,以定義基板110之可視區VA與非可視區NA,其中遮光層開口122對應的區域為可視區VA,其它為非可視區NA。第一層體堆疊130設置於基板110之第二表面S2且至少位於非可視區NA。位於非可視區NA的第一層體堆疊130於可見光波長範圍內對應不同波長之反射率差異小於2%,且第一層體堆疊130在非可視區NA於可見光波長範圍內之反射率小於2.5%。 1A is a cross-sectional view of a protective cover 100 in accordance with an embodiment of the present invention. The protective cover 100 includes a substrate 110, a light shielding layer 120, and a first layer stack 130. The substrate 110 has a first surface S1 and a second surface S2 disposed opposite to each other. When the protective cover 100 is used as an outer cover of the display device, the second surface S2 is closer to the human eye than the first surface S1. The light shielding layer 120 is disposed on the first surface S1 of the substrate 110, wherein the light shielding layer 120 has a light shielding layer opening 122 to define the visible area VA and the non-visible area NA of the substrate 110, wherein the area corresponding to the light shielding layer opening 122 is the visible area VA. The other is the non-visible area NA. The first layer stack 130 is disposed on the second surface S2 of the substrate 110 and at least in the non-visible area NA. The first layer stack 130 located in the non-visible area NA has a reflectance difference of less than 2% corresponding to different wavelengths in the visible light wavelength range, and the reflectivity of the first layer stack 130 in the non-visible area NA in the visible wavelength range is less than 2.5. %.

於本文中,一材料或結構的「反射率差異」係定義為該材料或結構在可見光波長範圍內(波長400奈米至波長700奈米之間)之最大反射率與最小反射率的差值。 As used herein, the "reflectance difference" of a material or structure is defined as the difference between the maximum reflectance and the minimum reflectance of the material or structure in the visible wavelength range (between 400 nm and 700 nm). .

在一實施例中,第一層體堆疊130包含第一折射 率層134。第一折射率層134設置於基板110之第二表面S2且位於非可視區NA。第一折射率層134的折射率範圍為大約1.2至大約1.8。 In an embodiment, the first layer stack 130 includes a first refraction Rate layer 134. The first refractive index layer 134 is disposed on the second surface S2 of the substrate 110 and located in the non-visible area NA. The refractive index of the first refractive index layer 134 ranges from about 1.2 to about 1.8.

於本發明之多個實施方式中,在非可視區NA內,藉由僅採用反射率差異較小的第一層體堆疊130,並搭配上述第一層體堆疊130的反射率範圍。如此一來,使非可視區NA既具有抗反射的效果,同時從視覺效果來看,非可視區NA之遮光層120的顏色並不會因第一層體堆疊130而改變,可呈現遮光層120其本身的顏色,可以降低在非可視區NA上遮光層120容易觀察到異色的問題。 In various embodiments of the present invention, in the non-visible area NA, only the first layer stack 130 having a small difference in reflectance is used, and the reflectance range of the first layer stack 130 is matched. In this way, the non-visible area NA has the anti-reflection effect, and from the visual effect, the color of the light-shielding layer 120 of the non-visible area NA is not changed by the first layer stack 130, and the light-shielding layer can be present. The color of 120 itself can reduce the problem that the light shielding layer 120 is easily observed in the non-visible area NA.

請繼續參照第1A圖,於本發明之多個實施方式中,保護蓋板100包含第二層體堆疊140以及第三層體堆疊150。第二層體堆疊140設置於基板110之第二表面S2且位於可視區VA內,第三層體堆疊150設置於第二層體堆疊140相對基板110之一側,而使得第二層體堆疊140位於第三層體堆疊150與基板110之間。 With continued reference to FIG. 1A, in various embodiments of the present invention, the protective cover 100 includes a second layer stack 140 and a third layer stack 150. The second layer stack 140 is disposed on the second surface S2 of the substrate 110 and located in the visible area VA, and the third layer stack 150 is disposed on one side of the second layer stack 140 opposite to the substrate 110, so that the second layer stack is stacked. 140 is located between the third layer stack 150 and the substrate 110.

第二層體堆疊140包含多個第三折射率層142以及第四折射率層144,每二個第三折射率層142由一個第四折射率層144間隔開來,其中第三折射率層142之一(例如第1A圖中位於第四折射率層144下方的第三折射率層142)鄰接基板110,第三折射率層142之另一(例如第1A圖中位於第四折射率層144上方的第三折射率層142)鄰接第三層體堆疊150。第三折射率層142的折射率大於第四折射率層144的折射率。於部分實施方式中,第三折射率層142的折射率大於第一折射率 層134的折射率。於此,雖然僅以三層結構繪示此第二層體堆疊140,但實際應用上可以採用五層、七層等結構,不應以圖中所示而限制本發明之範圍。 The second layer stack 140 includes a plurality of third refractive index layers 142 and a fourth refractive index layer 144, and each of the two third refractive index layers 142 is separated by a fourth refractive index layer 144, wherein the third refractive index layer One of the 142s (eg, the third refractive index layer 142 located below the fourth refractive index layer 144 in FIG. 1A) is adjacent to the substrate 110, and the other of the third refractive index layer 142 (eg, the fourth refractive index layer in FIG. 1A) The third refractive index layer 142 above 144 is adjacent to the third layer stack 150. The refractive index of the third refractive index layer 142 is greater than the refractive index of the fourth refractive index layer 144. In some embodiments, the refractive index of the third refractive index layer 142 is greater than the first refractive index. The refractive index of layer 134. Herein, although the second layer stack 140 is illustrated in a three-layer structure, five or seven layers may be employed in practical applications, and the scope of the present invention should not be limited as shown in the drawings.

於部分實施方式中,第一層體堆疊130與第三層體堆疊150的材料相同。於本發明之多個實施方式中,第三層體堆疊150包含第五折射率層154。在可視區VA中以折射率較小的第五折射率層154作為連接空氣的最外層,以降低空氣與層體堆疊之間的界面的反射率。 In some embodiments, the first layer stack 130 is the same material as the third layer stack 150. In various embodiments of the invention, the third layer stack 150 includes a fifth index layer 154. A fifth refractive index layer 154 having a smaller refractive index is used as the outermost layer of the connecting air in the visible region VA to reduce the reflectance of the interface between the air and the layer stack.

且,第二層體堆疊140鄰接第三層體堆疊150的第三折射率層142的折射率大於第三層體堆疊150鄰接第二層體堆疊140的第五折射率層154的折射率,從而使得第二層體堆疊140與第三層體堆疊150形成折射率高低交錯搭配的層疊關係,以透過破壞性干涉維持可視區VA的抗反射效果。 Moreover, the refractive index of the third refractive index layer 142 of the second layer stack 140 adjacent to the third layer stack 150 is greater than the refractive index of the fifth layer stack 150 of the second layer stack 150 adjacent to the second layer stack 140. Thereby, the second layer stack 140 and the third layer stack 150 form a laminated relationship of high and low refractive index staggered to maintain the anti-reflection effect of the visible region VA through destructive interference.

於此,於可見光波長範圍內,相較於常規的適用於可視區VA的抗反射層,第一層體堆疊130的反射率差異小於2%,具有較均勻的抗反射效果,以降低非可視區NA的遮光層120出現異色的問題。位於可視區VA的相疊之第三層體堆疊150與第二層體堆疊140於可見光波長範圍內整體疊構之反射率小於位於非可視區NA的第一層體堆疊130之反射率,較佳的,位於該可視區VA的相疊之第三層體堆疊150與第二層體堆疊140整體疊構之反射率小於1%,以使可視區VA具有較佳的抗反射效果。 Here, in the visible light wavelength range, the first layer stack 130 has a reflectance difference of less than 2% compared to the conventional anti-reflection layer suitable for the visible area VA, and has a relatively uniform anti-reflection effect to reduce non-visuality. The light shielding layer 120 of the area NA has a problem of a different color. The reflectivity of the stacked third layer stack 150 and the second layer stack 140 in the visible region of the visible region is smaller than that of the first layer stack 130 in the non-visible region NA. Preferably, the reflectivity of the stacked third layer stack 150 and the second layer stack 140 in the visible area VA is less than 1%, so that the visible area VA has a better anti-reflection effect.

於本實施方式中,為提高製程效率及實現第一層體堆疊130與第二層體堆疊140之間無縫連接,第一層體堆疊 130與第三層體堆疊150由相同的製程步驟所組成,兩者邊緣可以互相連接而做為連續的結構,當然不應以此限制本發明之範圍。或者,於其他實施方式中,第一層體堆疊130與第三層體堆疊150可以分別形成,兩者可以不互相連接,且其材料可以不同。 In the embodiment, in order to improve the process efficiency and achieve a seamless connection between the first layer stack 130 and the second layer stack 140, the first layer stack The 130 and the third layer stack 150 are composed of the same process steps, and the edges of the two layers may be connected to each other as a continuous structure, and the scope of the invention should not be limited thereby. Alternatively, in other embodiments, the first layer stack 130 and the third layer stack 150 may be formed separately, and the two may not be connected to each other, and the materials thereof may be different.

於部分實施方式中,第一層體堆疊130與第二層體堆疊140相鄰接,且第一層體堆疊130之底面130a對齊於第二層體堆疊140之底面140a,以使第一層體堆疊130結合第二層體堆疊140可以完全覆蓋保護蓋板100的第二表面S2。 In some embodiments, the first layer stack 130 is adjacent to the second layer stack 140, and the bottom surface 130a of the first layer stack 130 is aligned with the bottom surface 140a of the second layer stack 140 to make the first layer The body stack 130 in combination with the second layer stack 140 may completely cover the second surface S2 of the protective cover 100.

於本發明之多個實施方式中,第一層體堆疊130於基板110上的投影完全覆蓋非可視區NA,而第二層體堆疊140不位於非可視區NA中。由於第一層體堆疊130於可見光波長範圍內的各個波長的反射率較一致,因此,可以減少非可視區NA內的遮光層120受到第一層體堆疊130的影響,降低非可視區NA內的遮光層120異色的問題。於部分實施方式中,部分的第一層體堆疊130還位於可視區VA中。於其他實施方式中,第一層體堆疊130可以僅位於非可視區NA,而不位於可視區VA。 In various embodiments of the invention, the projection of the first layer stack 130 on the substrate 110 completely covers the non-visible area NA, while the second layer stack 140 is not located in the non-visible area NA. Since the reflectivity of the first layer stack 130 is uniform at each wavelength in the visible light wavelength range, the light shielding layer 120 in the non-visible area NA can be reduced from being affected by the first layer stack 130, and the non-visible area NA is reduced. The problem of the light-shielding layer 120 is different. In some embodiments, a portion of the first layer stack 130 is also located in the viewable area VA. In other embodiments, the first layer stack 130 may be located only in the non-visible area NA, not in the viewable area VA.

以下舉例說明各個層體堆疊的材料與相關特性,應了解到各個層體堆疊中的材料與層體數量可以有各種變形。 The following examples illustrate the materials and related properties of each layer stack. It should be understood that the number of materials and layers in each layer stack can be variously modified.

於本發明之多個實施方式中,第一層體堆疊130中,第一折射率層134的材料可為氟化鎂或其組合物。於此,雖然僅以單層結構繪示此第一層體堆疊130,但實際應用上第 一層體堆疊130還可以包含其他層體於第一折射率層134上,例如二氧化矽層。於本發明之多個實施方式中,第二層體堆疊140中,第三折射率層142的折射率範圍為大約2.2至大約2.4之間,第四折射率層144的折射率範圍為大約1.4至大約1.6之間。舉例而言,第三折射率層142的材料可以是氧化鈦(Ti3O5)、氮化矽(Si3N4)、氧化鈮(Nb2O5),第四折射率層144的材料可以是二氧化矽。 In various embodiments of the present invention, in the first layer stack 130, the material of the first refractive index layer 134 may be magnesium fluoride or a combination thereof. Here, although the first layer stack 130 is illustrated in a single layer structure, the first layer stack 130 may further include other layers on the first index layer 134, such as a ruthenium dioxide layer. In various embodiments of the present invention, in the second layer stack 140, the third refractive index layer 142 has a refractive index ranging from about 2.2 to about 2.4, and the fourth refractive index layer 144 has a refractive index ranging from about 1.4. It is between about 1.6. For example, the material of the third refractive index layer 142 may be titanium oxide (Ti 3 O 5 ), tantalum nitride (Si 3 N 4 ), niobium oxide (Nb 2 O 5 ), and material of the fourth refractive index layer 144. It can be cerium oxide.

詳細而言,同時參照第1B圖與第1C圖。第1B圖為根據部分實施方式保護蓋板之部份第一層體堆疊130之折射率頻譜圖,第1C圖為根據部分實施方式保護蓋板100之第一層體堆疊130之反射頻譜圖。於此,第一層體堆疊130以氟化鎂層以及二氧化矽層堆疊為例,為了更好的說明第一層體堆疊之反射率差異,第1C圖中另一條曲線為常規的抗反射層如氧化鈦以及二氧化矽堆疊的反射率頻譜,以作為對比來進行說明。第1B圖為氟化鎂層之折射率頻譜圖。參照第1B圖,第一層體堆疊130之氟化鎂層於可見光內的折射率值在1.2至1.8之間(虛線所表示的範圍內)。參照第1C圖,第一層體堆疊130於可見光內的反射率差異(以細線表示)小於氧化鈦及二氧化矽堆疊於可見光內的反射率差異(以粗線表示),例如圖中第一層體堆疊130於可見光內的反射率差異小於2%。如此一來,此等第一層體堆疊130在不犧牲可視區VA的影像品質下降低非可視區NA內的遮光層120異色的問題。 Specifically, reference is made to FIG. 1B and FIG. 1C simultaneously. 1B is a refractive index spectrum diagram of a portion of the first layer stack 130 of the protective cover according to some embodiments, and FIG. 1C is a reflection spectrum diagram of the first layer stack 130 of the protective cover 100 according to some embodiments. Herein, the first layer stack 130 is exemplified by a magnesium fluoride layer and a ceria layer stack. In order to better explain the difference in reflectance of the first layer stack, the other curve in FIG. 1C is a conventional anti-reflection. The reflectance spectra of layers such as titanium oxide and ruthenium dioxide are described for comparison. Figure 1B is a refractive index spectrum of the magnesium fluoride layer. Referring to FIG. 1B, the magnesium fluoride layer of the first layer stack 130 has a refractive index value in the visible light of between 1.2 and 1.8 (within the range indicated by the broken line). Referring to FIG. 1C, the difference in reflectance (indicated by thin lines) of the first layer stack 130 in visible light is smaller than the difference in reflectance (indicated by thick lines) of titanium oxide and cerium oxide stacked in visible light, for example, the first in the figure. The difference in reflectivity of the layer stack 130 in visible light is less than 2%. As such, the first layer stack 130 reduces the problem of the color difference of the light shielding layer 120 in the non-visible area NA without sacrificing the image quality of the visible area VA.

此外,由於在部分實施方式中,第三層體堆疊150與第一層體堆疊130的材料相同,因此,第五折射率層154可 與第一折射率層134之材料相同。 In addition, since the third layer stack 150 is the same material as the first layer stack 130 in some embodiments, the fifth index layer 154 may It is the same as the material of the first refractive index layer 134.

本發明之部分實施方式中,第三折射率層142之另一(例如第1A圖中位於第四折射率層144上方的第三折射率層142)鄰接第三層體堆疊150之第五折射率層154,使得在可視區VA內,反射率差異較大的第二層體堆疊140與反射率差異較小的第三層體堆疊150組合成一折射率高低交錯的結構,以破壞性干涉有效地達到抗反射的效果。而在非可視區NA內,僅採用反射率差異較小的第一層體堆疊130,以降低在非可視區NA上容易觀察到異色的問題。 In some embodiments of the present invention, the other of the third refractive index layer 142 (eg, the third refractive index layer 142 located above the fourth refractive index layer 144 in FIG. 1A) is adjacent to the fifth refraction of the third layer stack 150. The rate layer 154 is such that in the visible area VA, the second layer stack 140 having a large difference in reflectance and the third layer stack 150 having a small difference in reflectance are combined into a structure in which the refractive index is staggered, and the destructive interference is effective. The ground achieves an anti-reflective effect. In the non-visible area NA, only the first layer stack 130 having a small difference in reflectance is used to reduce the problem that the color difference is easily observed in the non-visible area NA.

第2圖為根據本發明之另一實施方式之保護蓋板100之剖面圖。本實施方式與第1A圖之實施方式相似,差別在於:本實施方式中,基板110包含平坦部112以及設置於平坦部112之至少一側的彎折部114,其中遮光層120與第一層體堆疊130至少設置於彎折部114之相對二側,彎折部114位於非可視區NA。第一層體堆疊130覆蓋彎折部114。 2 is a cross-sectional view of a protective cover 100 in accordance with another embodiment of the present invention. This embodiment is similar to the embodiment of FIG. 1A except that in the present embodiment, the substrate 110 includes a flat portion 112 and a bent portion 114 provided on at least one side of the flat portion 112, wherein the light shielding layer 120 and the first layer The body stack 130 is disposed at least on opposite sides of the bent portion 114, and the bent portion 114 is located in the non-visible area NA. The first layer stack 130 covers the bends 114.

如同前述,於可視區VA內,採用反射率差異較大的第二層體堆疊140與反射率差異較小的第三層體堆疊150組合成一折射率高低交錯的結構,且採用折射率較低的第五折射率層154作為最外層,而能有效地達到抗反射的效果。而在非可視區NA內,特別是當遮光層120還設置於彎折部114上時,如果將習知的僅適用於可視區VA的抗反射層直接設置於彎折部114上,且位於遮光層120之相對側,一方面由於曲面鍍膜會導致抗反射層出現厚度不均勻,從而導致曲面區域的遮光層異色。另一方面,利用干涉原理達到抗反射作用的抗反射 層,因為曲面的存在以及入射夾角較大的緣故,可能使反射光無法順利干涉,進而無法正常運作,容易導致曲面區域的遮光層產生異色等相應的外觀缺陷。故習知適用於可視區VA的抗反射層則不再適用於彎折部114,不能真實呈現出遮光層120本來的顏色。本發明採用反射率差異較小的第一層體堆疊130覆蓋非可視區NA,藉由此設置,可以降低在非可視區NA的彎折部114上容易觀察到遮光層120異色問題的產生。 As in the foregoing, in the visible region VA, the second layer stack 140 having a large difference in reflectance is combined with the third layer stack 150 having a small difference in reflectance to form a structure in which the refractive index is staggered, and the refractive index is low. The fifth refractive index layer 154 serves as the outermost layer and can effectively achieve an antireflection effect. In the non-visible area NA, especially when the light shielding layer 120 is further disposed on the bent portion 114, if the conventional anti-reflection layer applicable only to the visible area VA is directly disposed on the bent portion 114, and located On the opposite side of the light shielding layer 120, on the one hand, the surface of the antireflection layer may be uneven in thickness due to the curved surface coating, thereby causing the light shielding layer of the curved surface region to be different in color. On the other hand, anti-reflection that achieves anti-reflection by using the principle of interference Because of the existence of the curved surface and the large incident angle, the layer may make the reflected light unable to interfere smoothly, and thus cannot operate normally, which may easily cause corresponding appearance defects such as different colors of the light shielding layer in the curved surface region. Therefore, the anti-reflection layer suitable for the visible area VA is no longer suitable for the bent portion 114, and the original color of the light shielding layer 120 cannot be truly presented. The present invention covers the non-visible area NA by using the first layer stack 130 having a small difference in reflectance. By this arrangement, the occurrence of the problem of the color difference of the light-shielding layer 120 can be easily observed on the bent portion 114 of the non-visible area NA.

本實施方式的其他細節大致上如第1A圖之實施方式所述,在此不再贅述。 Other details of the present embodiment are substantially as described in the embodiment of FIG. 1A, and are not described herein again.

第3圖為根據本發明之再一實施方式之保護蓋板100之剖面圖。本實施方式與第1A圖之實施方式相似,差別在於:本實施方式中,保護蓋板100不包含第三層體堆疊150,且第二層體堆疊140為多層高低折射率搭配的抗反射堆疊。於此,第一層體堆疊130具有開口136,位於可視區VA內。第二層體堆疊140位於第一層體堆疊130之開口136內。第一層體堆疊130結合第二層體堆疊140全面覆蓋非可視區NA與可視區VA。 Figure 3 is a cross-sectional view of a protective cover 100 in accordance with still another embodiment of the present invention. This embodiment is similar to the embodiment of FIG. 1A. The difference is that in the embodiment, the protective cover 100 does not include the third layer stack 150, and the second layer stack 140 is a multi-layer high-low refractive index anti-reflection stack. . Here, the first layer stack 130 has an opening 136 located in the visible area VA. The second layer stack 140 is located within the opening 136 of the first layer stack 130. The first layer stack 130 in combination with the second layer stack 140 covers the non-visible area NA and the visible area VA.

於本實施方式中,第二層體堆疊140包含多個第三折射率層142以及多個第四折射率層144,第三折射率層142與第四折射率層144彼此交錯。第三折射率層142的折射率大於第四折射率層144的折射率。於此,以折射率較小的第四折射率層144作為連接空氣的最外層,以降低反射率。 In the present embodiment, the second layer stack 140 includes a plurality of third refractive index layers 142 and a plurality of fourth refractive index layers 144, and the third refractive index layer 142 and the fourth refractive index layer 144 are staggered with each other. The refractive index of the third refractive index layer 142 is greater than the refractive index of the fourth refractive index layer 144. Here, the fourth refractive index layer 144 having a smaller refractive index is used as the outermost layer of the connected air to lower the reflectance.

於本實施方式中,在可視區VA內,由第二層體堆疊140達到抗反射的效果。而在非可視區NA內,僅採用反 射率差異較第二層體堆疊140小的第一層體堆疊130,以降低在非可視區NA上容易觀察到異色的問題。本實施方式的其他細節大致上如第1A圖之實施方式所述,在此不再贅述。 In the present embodiment, the anti-reflection effect is achieved by the second layer stack 140 in the visible area VA. In the non-visible area NA, only the reverse is used. The first layer stack 130 having a lower reflectance difference than the second layer stack 140 reduces the problem of easily observing discoloration on the non-visible area NA. Other details of the present embodiment are substantially as described in the embodiment of FIG. 1A, and are not described herein again.

第4圖為根據本發明之另一實施方式之保護蓋板100之剖面圖。本實施方式與第1A圖之實施方式相似,差別在於:本實施方式中,保護蓋板100僅包含第一層體堆疊130,不包含第三層體堆疊150與第二層體堆疊140(參照第1A圖)。第一層體堆疊130具有開口136,位於可視區VA內。 Figure 4 is a cross-sectional view of a protective cover 100 in accordance with another embodiment of the present invention. The embodiment is similar to the embodiment of FIG. 1A . The difference is that in the embodiment, the protective cover 100 includes only the first layer stack 130 and does not include the third layer stack 150 and the second layer stack 140 (refer to Figure 1A). The first layer stack 130 has an opening 136 located within the viewable area VA.

本實施方式中,於可視區VA內不採用任何層體堆疊。而在非可視區NA內,僅採用反射率差異較小的第一層體堆疊130,以降低在遮光層120上容易觀察到異色的問題。本實施方式的其他細節大致上如第1A圖之實施方式所述,在此不再贅述。 In this embodiment, no layer stack is used in the visible area VA. In the non-visible area NA, only the first layer stack 130 having a small difference in reflectance is used to reduce the problem that the color difference is easily observed on the light shielding layer 120. Other details of the present embodiment are substantially as described in the embodiment of FIG. 1A, and are not described herein again.

第5圖為根據本發明之又一實施方式之保護蓋板100之剖面圖。本實施方式與第4圖之實施方式相似,差別在於:本實施方式中,基板110包含平坦部112以及設置於平坦部112之至少一側的彎折部114,其中遮光層120與第一層體堆疊130至少設置於彎折部114之相對二側,彎折部114位於非可視區NA。第一層體堆疊130覆蓋彎折部114。 Figure 5 is a cross-sectional view of a protective cover 100 in accordance with yet another embodiment of the present invention. This embodiment is similar to the embodiment of FIG. 4 except that in the present embodiment, the substrate 110 includes a flat portion 112 and a bent portion 114 provided on at least one side of the flat portion 112, wherein the light shielding layer 120 and the first layer The body stack 130 is disposed at least on opposite sides of the bent portion 114, and the bent portion 114 is located in the non-visible area NA. The first layer stack 130 covers the bends 114.

本實施方式中,於可視區VA內不採用任何層體堆疊。而在非可視區NA內,僅採用反射率差異較小的第一層體堆疊130,以降低在非可視區NA的彎折部114上容易觀察到異色的問題。本實施方式的其他細節大致上如第1A圖之實施方式所述,在此不再贅述。 In this embodiment, no layer stack is used in the visible area VA. In the non-visible area NA, only the first layer stack 130 having a small difference in reflectance is used to reduce the problem that the color difference is easily observed on the bent portion 114 of the non-visible area NA. Other details of the present embodiment are substantially as described in the embodiment of FIG. 1A, and are not described herein again.

第6A圖至第6D圖為根據本發明的一實施方式的保護蓋板100於多個製造階段的剖面圖。以下製造流程可對應形成第2圖所示實施例的保護蓋板100,其它實施例的保護蓋板形成步驟可基本與此相同。 6A through 6D are cross-sectional views of the protective cover 100 in various stages of manufacture in accordance with an embodiment of the present invention. The following manufacturing process may correspond to the protective cover 100 of the embodiment shown in FIG. 2, and the protective cover forming step of other embodiments may be substantially the same.

首先,參照第6A圖,提供基板110並形成遮光層120其上。基板110包含平坦部112以及設置於平坦部112之至少一側的彎折部114,且基板110具有相對設置的第一表面S1與第二表面S2。於此,將遮光層120形成於基板110之第一表面S1且位於彎折部114上,本實施例中,遮光層120還有部份位於平坦部112上。於本實施方式中,遮光層120具有遮光層開口122,以定義基板110之可視區VA與非可視區NA。彎折部114位於非可視區NA。於此,還形成覆膜200於基板110之第二表面S2,其中覆膜200包含位於可視區VA的鏤空部210。 First, referring to FIG. 6A, a substrate 110 is provided and a light shielding layer 120 is formed thereon. The substrate 110 includes a flat portion 112 and a bent portion 114 disposed on at least one side of the flat portion 112, and the substrate 110 has a first surface S1 and a second surface S2 disposed opposite to each other. The light shielding layer 120 is formed on the first surface S1 of the substrate 110 and located on the bent portion 114. In this embodiment, the light shielding layer 120 is further located on the flat portion 112. In the present embodiment, the light shielding layer 120 has a light shielding layer opening 122 to define a visible area VA and a non-visible area NA of the substrate 110. The bent portion 114 is located in the non-visible area NA. Here, a film 200 is also formed on the second surface S2 of the substrate 110, wherein the film 200 includes a hollow portion 210 located in the visible region VA.

於本實施方式中,覆膜200可以是具有離型能力的軟性薄膜基板,以利一次性地剝除覆膜200。覆膜200可與基板110直接接觸,而利用其離型能力黏貼至彎折部114上。或者,可以透過塗布液態膠體於彎折部114上,再透過固化或烘烤等方式而形成覆膜200。覆膜200的材料可以是固化後能一次性剝除的材料,舉例而言,覆膜200可以是樹脂。於本實施方式中,遮光層開口122與覆膜200之關系,可以存在其他多種變型,但一般情況下,鏤空部210在基板110上的正投影位於遮光層開口122之內或與遮光層開口122大致相同。 In the present embodiment, the film 200 may be a flexible film substrate having a release property to facilitate peeling of the film 200 at one time. The film 200 can be in direct contact with the substrate 110 and adhered to the bent portion 114 by its release ability. Alternatively, the coating film 200 may be formed by applying a liquid colloid to the bent portion 114 and then curing or baking. The material of the film 200 may be a material that can be peeled off at one time after curing. For example, the film 200 may be a resin. In the present embodiment, the relationship between the light shielding layer opening 122 and the coating film 200 may be various other variations. However, in general, the orthographic projection of the hollow portion 210 on the substrate 110 is located within the opening of the light shielding layer 122 or is open to the light shielding layer. 122 is roughly the same.

於其他實施方式中,覆膜200的材料可以是光阻。藉由設置光阻層於第二表面S2上,並以遮光層120做為光 罩,使光線經過遮光層120之遮光層開口122而對光阻層進行曝光,並且在顯影之後再透過濕式剝除或乾式剝除等方式移除受到曝光顯影後之光阻層,使剩餘的光阻層做為覆膜200。於部分實施方式中,由於遮光層120做為光阻層曝光過程的光罩,鏤空部210與遮光層120之遮光層開口122具有大致相同的圖案,即遮光層開口122與覆膜200之鏤空部210在基板110上的投影形狀與面積相同。 In other embodiments, the material of the film 200 may be a photoresist. By providing a photoresist layer on the second surface S2, and using the light shielding layer 120 as light The hood passes the light through the light shielding layer opening 122 of the light shielding layer 120 to expose the photoresist layer, and after development, removes the exposed photoresist layer by wet stripping or dry stripping, etc., so that the remaining The photoresist layer is used as the film 200. In some embodiments, since the light shielding layer 120 serves as a mask for the photoresist layer exposure process, the hollow portion 210 and the light shielding layer opening 122 of the light shielding layer 120 have substantially the same pattern, that is, the light shielding layer opening 122 and the coating film 200 are hollowed out. The projected shape and area of the portion 210 on the substrate 110 are the same.

接著,參照第6B圖,形成至少一材料140’於覆膜200上,其中材料140’覆蓋覆膜200且填入鏤空部210。於本發明之多個實施方式中,可以透過沉積、塗佈等方式而將多個材料分層地填入鏤空部210,以構成多個層體,使得材料140’可以包含多個層體,例如氧化鈦層與二氧化矽層。 Next, referring to Fig. 6B, at least one material 140' is formed on the film 200, wherein the material 140' covers the film 200 and is filled in the hollow portion 210. In various embodiments of the present invention, a plurality of materials may be layered into the hollow portion 210 by deposition, coating, or the like to form a plurality of layer bodies, so that the material 140' may include a plurality of layer bodies. For example, a titanium oxide layer and a hafnium oxide layer.

參照第6C圖,移除覆膜200以及位於覆膜200上的材料140’,使剩餘的材料140’(參考第6B圖)形成第二層體堆疊140,第二層體堆疊140位於基板110之第二表面S2且位於可視區VA內。 Referring to FIG. 6C, the film 200 and the material 140' on the film 200 are removed, so that the remaining material 140' (refer to FIG. 6B) forms a second layer stack 140, and the second layer stack 140 is located on the substrate 110. The second surface S2 is located within the viewable area VA.

然後,參照第6D圖,形成第一層體堆疊130以及第三層體堆疊150於基板110之第二表面S2上。於此,相同地,可以透過沉積、塗佈等方式而形成第一層體堆疊130以及第三層體堆疊150。第一層體堆疊130至少位於非可視區NA,第三層體堆疊150位於可視區VA內。於本發明之多個實施方式中,形成第一層體堆疊130的步驟與形成第三層體堆疊150的步驟可同時進行。第三層體堆疊150與第一層體堆疊130的各個層體的材料以及製造過程大致相同。 Then, referring to FIG. 6D, the first layer body stack 130 and the third layer body stack 150 are formed on the second surface S2 of the substrate 110. Here, in the same manner, the first layer stack 130 and the third layer stack 150 may be formed by deposition, coating, or the like. The first layer stack 130 is located at least in the non-visible area NA, and the third layer stack 150 is located in the viewable area VA. In various embodiments of the invention, the step of forming the first layer stack 130 and the step of forming the third layer stack 150 may be performed simultaneously. The material and manufacturing process of the third layer stack 150 and the respective layer bodies of the first layer stack 130 are substantially the same.

於本發明之多個實施方式中,遮光層120與第一層體堆疊130至少設置於彎折部114之相對二側,並不設置第二層體堆疊140於非可視區NA。如前所述,第二層體堆疊140相較於第三層體堆疊150可以具有較高的反射率,而第一層體堆疊130之反射率差異係配置小於第二層體堆疊140之反射率差異,藉以在不犧牲影響品質的情況下,改善前述的異色問題。 In the various embodiments of the present invention, the light shielding layer 120 and the first layer stack 130 are disposed at least on opposite sides of the bent portion 114, and the second layer stack 140 is not disposed in the non-visible area NA. As previously mentioned, the second layer stack 140 may have a higher reflectivity than the third layer stack 150, while the first layer stack 130 has a lower reflectance difference configuration than the second layer stack 140. The difference in rates is used to improve the aforementioned heterochromatic problem without sacrificing quality.

於本發明之多個實施方式中,在第二層體堆疊140的形成之後才形成第三層體堆疊150於其上,使得第二層體堆疊140係位於第三層體堆疊150與基板110之間。於此,第一層體堆疊130與第二層體堆疊140是直接設置於基板110上,而使第一層體堆疊130與第二層體堆疊140相鄰接,且第一層體堆疊130之底面130a對齊於第二層體堆疊140之底面140a。 In various embodiments of the present invention, the third layer stack 150 is formed thereon after the formation of the second layer stack 140 such that the second layer stack 140 is located on the third layer stack 150 and the substrate 110. between. Here, the first layer stack 130 and the second layer stack 140 are directly disposed on the substrate 110, and the first layer stack 130 is adjacent to the second layer stack 140, and the first layer stack 130 is The bottom surface 130a is aligned with the bottom surface 140a of the second layer stack 140.

於此,第一層體堆疊130與第三層體堆疊150可以包含多個層體,例如氧化矽層與氟化鎂層。在此,為了方便說明製程步驟,並未詳細繪示各個層體堆疊內的層體,本實施方式之各個層體堆疊的詳細結構可以參考第2圖之實施方式的結構,在此不再贅述。 Here, the first layer stack 130 and the third layer stack 150 may include a plurality of layers, such as a ruthenium oxide layer and a magnesium fluoride layer. Here, in order to facilitate the description of the process steps, the layer bodies in the respective layer stacks are not shown in detail. For the detailed structure of each layer stack in the present embodiment, reference may be made to the structure of the embodiment of FIG. 2, and details are not described herein again. .

於部分實施方式中,第三層體堆疊150並非必要之配置,可以透過蝕刻製程或其他方法,移除或省略第三層體堆疊150。本實施方式的其他細節大致上如第2圖之實施方式所述,在此不再贅述。 In some embodiments, the third layer stack 150 is not necessarily configured, and the third layer stack 150 may be removed or omitted by an etching process or other methods. Other details of the present embodiment are substantially as described in the embodiment of FIG. 2 and will not be described herein.

本發明之多個實施方式提供一種保護蓋板,藉由改變非可視區上的層體性質,使該位於非可視區的層體具有低 反射率(反射率小於2.5%),而使遮光層所在的非可視區具有抗反射效果,同時該位於非可視區的層體於可見光內的抗反射效果接近一致(反射率差異小於2%)。如此一來,可以在不犧牲可視區的影像品質下降低非可視區的層體於遮光層上的反射率差異與遮光層異色的問題。 Embodiments of the present invention provide a protective cover that has a low layer body in the non-visible area by changing the layer properties on the non-visible area The reflectance (reflectance is less than 2.5%), and the non-visible area where the light shielding layer is located has an anti-reflection effect, and the anti-reflection effect of the layer body in the non-visible area in visible light is nearly uniform (the reflectance difference is less than 2%) . In this way, the problem of the difference in the reflectance of the layer of the non-visible area on the light-shielding layer and the color difference of the light-shielding layer can be reduced without sacrificing the image quality of the visible area.

雖然本發明已以多種實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 While the invention has been described above in terms of various embodiments, it is not intended to limit the invention, and the invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application attached.

100‧‧‧保護蓋板 100‧‧‧ protective cover

110‧‧‧基板 110‧‧‧Substrate

120‧‧‧遮光層 120‧‧‧ shading layer

122‧‧‧遮光層開口 122‧‧‧ shading opening

130‧‧‧第一層體堆疊 130‧‧‧First layer stacking

130a‧‧‧底面 130a‧‧‧ bottom

134‧‧‧第一折射率層 134‧‧‧First refractive index layer

140‧‧‧第二層體堆疊 140‧‧‧Second layer stacking

140a‧‧‧底面 140a‧‧‧ bottom

142‧‧‧第三折射率層 142‧‧‧ Third refractive index layer

144‧‧‧第四折射率層 144‧‧‧fourth refractive index layer

150‧‧‧第三層體堆疊 150‧‧‧Layer 3 stacking

154‧‧‧第五折射率層 154‧‧‧ fifth refractive index layer

S1‧‧‧第一表面 S1‧‧‧ first surface

S2‧‧‧第二表面 S2‧‧‧ second surface

VA‧‧‧可視區 VA‧‧ visible area

NA‧‧‧非可視區 NA‧‧‧Invisible area

Claims (17)

一種保護蓋板,包含:一基板,具有相對設置的一第一表面與一第二表面;一遮光層,設置於該基板之該第一表面,其中該遮光層具有一遮光層開口,以定義該基板之一可視區與一非可視區;一第一層體堆疊,設置於該基板之該第二表面且至少位於該非可視區,該第一層體堆疊於可見光波長範圍內對應不同波長之反射率差異小於2%,該第一層體堆疊在該非可視區於可見光波長範圍內之反射率小於2.5%;以及一第二層體堆疊,設置於該基板之該第二表面且位於該可視區內,其中該第一層體堆疊與該第二層體堆疊相連,且該第二層體堆疊為一抗反射堆疊。 A protective cover comprising: a substrate having a first surface and a second surface disposed oppositely; a light shielding layer disposed on the first surface of the substrate, wherein the light shielding layer has a light shielding layer opening to define a visible area of the substrate and a non-visible area; a first layer stack is disposed on the second surface of the substrate and at least in the non-visible area, the first layer is stacked in a visible wavelength range corresponding to different wavelengths The difference in reflectance is less than 2%, the reflectivity of the first layer stack in the visible light wavelength range is less than 2.5%; and a second layer stack is disposed on the second surface of the substrate and located in the visible In the area, the first layer stack is connected to the second layer stack, and the second layer stack is an anti-reflection stack. 如請求項1所述之保護蓋板,其中該第一層體堆疊包含:一第一折射率層,其中該第一折射率層的折射率範圍為大約1.2至大約1.8。 The protective cover of claim 1, wherein the first layer stack comprises: a first refractive index layer, wherein the first refractive index layer has a refractive index ranging from about 1.2 to about 1.8. 如請求項1所述之保護蓋板,更包含一第三層體堆疊,設置於該基板之該第二表面且位於該可視區,其中該第二層體堆疊係位於該第三層體堆疊與基板之間,該第二層體堆疊鄰近該第三層體堆疊的一層體的折射率大於該第三層體堆疊鄰近該第二層體堆疊的一層體的折射率。 The protective cover of claim 1, further comprising a third layer stack disposed on the second surface of the substrate and located in the visible area, wherein the second layer stack is located in the third layer stack Between the substrate and the substrate, a layer of the second layer stack adjacent to the third layer stack has a refractive index greater than a refractive index of the layer stack adjacent to the second layer stack. 如請求項3所述之保護蓋板,其中該第三層體堆疊與該第一層體堆疊的材料相同,且該第三層體堆疊與該第一層體堆疊為同一製程形成。 The protective cover of claim 3, wherein the third layer stack is the same material as the first layer stack, and the third layer stack is formed in the same process as the first layer stack. 如請求項3所述之保護蓋板,其中位於該可視區的相疊之該第三層體堆疊與該第二層體堆疊之反射率小於位於該非可視區的第一層體堆疊之反射率。 The protective cover of claim 3, wherein a reflectivity of the stacked third layer stack and the second layer stack in the visible area is smaller than a reflectivity of the first layer stack in the non-visible area . 如請求項5所述之保護蓋板,其中位於該可視區的相疊之該第三層體堆疊與該第二層體堆疊於可見光波長範圍內之反射率小於1%。 The protective cover of claim 5, wherein the stack of the third layer stack and the second layer stack located in the visible region have a reflectance of less than 1% in a visible wavelength range. 如請求項1所述之保護蓋板,其中該第一層體堆疊具有一開口,位該可視區內,該第二層體堆疊位於該第一層體堆疊之該開口內。 The protective cover of claim 1, wherein the first layer stack has an opening in the visible area, and the second layer stack is located in the opening of the first layer stack. 如請求項1所述之保護蓋板,其中該第二層體堆疊包含:複數個第三折射率層;以及至少一第四折射率層,其中每二個該些第三折射率層由該第四折射率層間隔開來,其中該些第三折射率層之一鄰接該基板,其中該第三折射率層的折射率大於該第四折射率層與該第一層體堆疊的一第一折射率層的折射率。 The protective cover of claim 1, wherein the second layer stack comprises: a plurality of third refractive index layers; and at least a fourth refractive index layer, wherein each of the two third refractive index layers is The fourth refractive index layer is spaced apart, wherein one of the third refractive index layers is adjacent to the substrate, wherein a refractive index of the third refractive index layer is greater than a fourth of the fourth refractive index layer and the first layer stack The refractive index of a refractive index layer. 如請求項8所述之保護蓋板,其中該些第三折射率層的折射率範圍為大約2.2至大約2.4之間,該第四折射率層的折射率範圍為大約1.4至大約1.6之間。 The protective cover of claim 8, wherein the third refractive index layer has a refractive index ranging from about 2.2 to about 2.4, and the fourth refractive index layer has a refractive index ranging from about 1.4 to about 1.6. . 如請求項1至9任意一項所述之保護蓋板,其中該基板包含一平坦部以及設置於該平坦部之至少一側的一彎折部,其中該遮光層與該第一層體堆疊至少設置於該彎折部之相對二側,該彎折部位於該非可視區。 The protective cover of any one of claims 1 to 9, wherein the substrate comprises a flat portion and a bent portion disposed on at least one side of the flat portion, wherein the light shielding layer is stacked with the first layer body At least two opposite sides of the bent portion are disposed, and the bent portion is located in the non-visible area. 如請求項1所述之保護蓋板,其中該第一層體堆疊之一第一折射率層的材料為氟化鎂。 The protective cover of claim 1, wherein a material of the first refractive index layer of the first layer stack is magnesium fluoride. 一種保護蓋板的製作方法,包含:提供一基板,其中該基板具有相對設置的一第一表面與一第二表面;形成一遮光層於該基板之該第一表面,其中該遮光層具有一遮光層開口,以定義該基板之一可視區與一非可視區;形成一第一層體堆疊於該基板之該第二表面且至少位於該非可視區,其中該第一層體堆疊於可見光波長範圍內之反射率差異小於2%,且第一層體堆疊在該非可視區的於可見光波長範圍內之反射率小於2.5%;以及形成一第二層體堆疊於該基板之該第二表面且位於該可視區。 A method for manufacturing a protective cover, comprising: providing a substrate, wherein the substrate has a first surface and a second surface disposed oppositely; forming a light shielding layer on the first surface of the substrate, wherein the light shielding layer has a a light shielding layer opening to define a visible area and a non-visible area of the substrate; forming a first layer body stacked on the second surface of the substrate and at least in the non-visible area, wherein the first layer body is stacked on visible light wavelength The difference in reflectance within the range is less than 2%, and the reflectivity of the first layer stack in the visible light wavelength range of the non-visible region is less than 2.5%; and a second layer body is formed on the second surface of the substrate and Located in the viewable area. 如請求項12所述之保護蓋板的製作方法,其中形成該第二層體堆疊於該基板之該第二表面且位於該可視區內的步驟包含:形成一覆膜於該基板之該第二表面,該覆膜包含位於該可視區之一鏤空部;形成至少一材料於該覆膜上,其中該材料覆蓋該覆膜且填入該鏤空部;以及移除該覆膜以及位於該覆膜上的該材料,使剩餘的該材料形成該第二層體堆疊。 The method of manufacturing the protective cover of claim 12, wherein the step of forming the second layer on the second surface of the substrate and located in the visible region comprises: forming a film on the substrate a second surface, the coating comprising a hollow portion located in the visible region; forming at least one material on the coating, wherein the material covers the coating and filling the hollow portion; and removing the coating and being located on the coating The material on the film causes the remaining material to form the second layer stack. 如請求項12所述之保護蓋板的製作方法,更包含:形成一第三層體堆疊,於該基板之該第二表面且位於該可視區,其中該第二層體堆疊係位於該第三層體堆疊與基板之間,該第二層體堆疊鄰近該第三層體堆疊的一層體的折射率大於該第三層體堆疊鄰近該第二層體堆疊的一層體的折射率。 The method of manufacturing the protective cover of claim 12, further comprising: forming a third layer stack on the second surface of the substrate and located in the visible area, wherein the second layer stack is located in the first layer Between the three-layer body stack and the substrate, the refractive index of the layer body adjacent to the third layer body stack of the second layer body stack is greater than the refractive index of the layer body of the third layer body stack adjacent to the second layer body stack. 如請求項14所述之保護蓋板的製作方法,其中該形成該第一層體堆疊的步驟與該形成該第三層體堆疊的步驟同時進行。 The method of fabricating a protective cover according to claim 14, wherein the step of forming the first layer stack is performed simultaneously with the step of forming the third layer stack. 如請求項13至15任意一項之保護蓋板的製作方法,其中該基板包含一平坦部以及設置於該平坦部之 至少一側的一彎折部,其中該遮光層與該第一層體堆疊至少設置於該彎折部之相對二側,該彎折部位於該非可視區。 The method of manufacturing a protective cover according to any one of claims 13 to 15, wherein the substrate comprises a flat portion and is disposed on the flat portion a bent portion of the at least one side, wherein the light shielding layer and the first layer body stack are disposed at least on opposite sides of the bent portion, and the bent portion is located in the non-visible portion. 一種保護蓋板,包含:一基板,包含一平坦部以及設置於該平坦部之至少一側的一彎折部,其中該基板具有相對設置的一第一表面與一第二表面;一遮光層,設置於該基板之該第一表面,其中該遮光層具有一遮光層開口,以定義該基板之一可視區與一非可視區,其中該彎折部位於該非可視區;以及一第一層體堆疊,設置於該基板之該第二表面且至少位於該非可視區,其中該遮光層與該第一層體堆疊至少設置於該彎折部之相對二側,該第一層體堆疊具有一位於該可視區內的開口,其中該第一層體堆疊於可見光波長範圍內對應不同波長之反射率差異小於2%,該第一層體堆疊在該非可視區於可見光波長範圍內之反射率小於2.5%。 A protective cover, comprising: a substrate comprising a flat portion and a bent portion disposed on at least one side of the flat portion, wherein the substrate has a first surface and a second surface disposed opposite to each other; a light shielding layer Provided on the first surface of the substrate, wherein the light shielding layer has a light shielding layer opening to define a visible area and a non-visible area of the substrate, wherein the bending portion is located in the non-visible area; and a first layer The body stack is disposed on the second surface of the substrate and at least in the non-visible area, wherein the light shielding layer and the first layer body stack are disposed at least on opposite sides of the bent portion, and the first layer body stack has a An opening located in the visible region, wherein the first layer body is stacked in a visible light wavelength range, and the difference in reflectance corresponding to different wavelengths is less than 2%, and the reflectivity of the first layer body stack in the visible light wavelength range of the non-visible region is less than 2.5%.
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