TWI581952B - Method for manufacturing a composite film with high aspect ratio micro-structures - Google Patents

Method for manufacturing a composite film with high aspect ratio micro-structures Download PDF

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TWI581952B
TWI581952B TW105119582A TW105119582A TWI581952B TW I581952 B TWI581952 B TW I581952B TW 105119582 A TW105119582 A TW 105119582A TW 105119582 A TW105119582 A TW 105119582A TW I581952 B TWI581952 B TW I581952B
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aspect ratio
composite film
high aspect
polymer layer
film according
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TW105119582A
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TW201800219A (en
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吳龍海
趙士維
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明基材料股份有限公司
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具高深寬比微結構之複合膜之製造方法 Method for manufacturing composite film with high aspect ratio microstructure

本發明是有關於一種具高深寬比微結構之複合膜之製造方法,該具高深寬比微結構之複合膜係應用於防窺膜,以提供良好之側視角防窺效果。 The invention relates to a method for manufacturing a composite film with a high aspect ratio microstructure, which is applied to a peep protection film to provide a good side view anti-peep effect.

由於行動裝置的普及,人們對於在公共場所使用行動裝置時的隱私需求亦隨之增加。現行普遍採用外貼一防窺膜的形式,以使任一行動裝置具有防窺效果。為了達到良好的防窺性,防窺膜常採用的做法為在膜材上形成許多具一定深度的遮光微結構。請參考第1圖所示,其為示例性地以習知壓印製程製作防窺膜1的方法,步驟100至103由括弧內之參考數字表示。在習知壓印製程中,例如可藉由於透明基材2上塗佈未固化之樹脂3(步驟100),並以具有微結構之壓印模具4壓印該樹脂3(步驟101),經過脫模以及固化形成複數個溝槽結構3a後(步驟102),再填入遮光材料5而形成防窺膜1(步驟103)。為了達到側視角良好之防窺效果,該些溝槽結構3a需具有較大之深寬比,但於壓印製程中,為使壓印模具4於壓印後便於脫模,所形成之該些溝槽結構3a之深度無法過大,以避免脫模過程,尚未固化的該些溝槽結構3a容易被破壞。因此,利用第1圖所示之習知壓印製程所製作的該防窺膜1,常因深度不足而造成側視防窺 效果不佳。若為使該些溝槽結構3a達到足夠深度,則須相應增加該些溝槽結構3a之寬度,但此設計也將一併降低該防窺膜1垂直方向之正視角穿透度。 Due to the popularity of mobile devices, the need for privacy when using mobile devices in public places has also increased. In the current practice, a form of anti-peep film is generally applied to make any mobile device have an anti-spying effect. In order to achieve good anti-spyness, the anti-spy film is often used to form a plurality of light-shielding microstructures having a certain depth on the film. Please refer to FIG. 1, which is a method for fabricating the privacy film 1 by way of a conventional imprint process, and steps 100 to 103 are indicated by reference numerals in parentheses. In a conventional imprint process, for example, the uncured resin 3 is coated on the transparent substrate 2 (step 100), and the resin 3 is embossed with a microstructured imprint mold 4 (step 101). After the mold release and solidification are formed to form a plurality of groove structures 3a (step 102), the light shielding material 5 is filled in to form the privacy film 1 (step 103). In order to achieve a good anti-snap effect of the side viewing angle, the groove structures 3a need to have a large aspect ratio, but in the imprinting process, in order to facilitate the demolding of the imprinting mold 4 after imprinting, the formed The depth of the groove structures 3a cannot be excessively large to avoid the demolding process, and the groove structures 3a which have not been cured are easily broken. Therefore, the privacy film 1 produced by the conventional imprint process shown in FIG. 1 is often caused by insufficient depth to cause side view prevention. not effectively. If the trench structures 3a are sufficiently deep, the width of the trench structures 3a must be increased accordingly, but this design will also reduce the positive viewing angle of the vertical direction of the privacy film 1 together.

為改善上述習知防窺膜之缺點,故本發明之發明人提出一種應用於防窺膜之高深寬比微結構複合膜之製造方法,其不需如習知壓印模具般,壓印後還須具備脫模步驟,故可形成具有高深寬比之微結構,且以此微結構複合膜所製作之防窺膜具有良好的防窺性與透光度。 In order to improve the disadvantages of the above-mentioned conventional anti-spy film, the inventors of the present invention have proposed a method for manufacturing a high aspect ratio microstructure composite film for use in a peep prevention film, which does not need to be embossed as in a conventional imprinting mold. It is also necessary to have a demolding step, so that a microstructure having a high aspect ratio can be formed, and the anti-spy film made of the micro-composite composite film has good anti-spyness and transparency.

有鑑於上述習知技藝之問題,本發明之目的在於提供一種具備新穎性、進步性及產業利用性等專利要件之高深寬比微結構複合膜之製造方法,以期克服現有產品之難點。 In view of the above problems of the prior art, the object of the present invention is to provide a method for manufacturing a high aspect ratio microstructure composite film having novelty, advancement and industrial utilization, etc., in order to overcome the difficulties of the existing products.

為達到上述目的,本發明提供一種高深寬比微結構複合膜之製造方法,其步驟包含:提供一具有凹部表面之弧形底座;設置一撓性基材於該弧形底座之凹部表面,並塗佈一可固化之聚合物層於該撓性基材表面,以形成一複合膜;預固化該聚合物層;形成複數個凹槽結構於該聚合物層上,並完全固化該聚合物層;自該弧形底座移除該複合膜,以及平坦化該複合膜,使該些凹槽結構朝向該聚合物層之厚度方向分裂而形成複數個高深寬比微結構。 In order to achieve the above object, the present invention provides a method for fabricating a high aspect ratio microstructure composite film, the method comprising: providing a curved base having a concave surface; and providing a flexible substrate on the concave surface of the curved base, and Coating a curable polymer layer on the surface of the flexible substrate to form a composite film; pre-curing the polymer layer; forming a plurality of groove structures on the polymer layer, and completely curing the polymer layer Removing the composite film from the curved base, and planarizing the composite film to split the groove structures toward the thickness of the polymer layer to form a plurality of high aspect ratio microstructures.

在本發明之一實施例之高深寬比微結構複合膜之製造方法中,該撓性基材之斷裂伸長率係介於5%至20%。 In the method for producing a high aspect ratio microstructure composite film according to an embodiment of the present invention, the flexible substrate has an elongation at break of from 5% to 20%.

在本發明之一實施例之高深寬比微結構複合膜之製造方法中,該聚合物層之斷裂伸長率係介於0至2%。 In the method for producing a high aspect ratio microstructure composite film according to an embodiment of the present invention, the polymer layer has an elongation at break of from 0 to 2%.

在本發明之一實施例之高深寬比微結構複合膜之製造方法 中,該高深寬比微結構之深寬比係介於5至100。 Method for manufacturing high aspect ratio microstructure composite film according to an embodiment of the present invention The aspect ratio of the high aspect ratio microstructure is between 5 and 100.

在本發明之一實施例之高深寬比微結構複合膜之製造方法中,形成複數個凹槽結構於該聚合物層的方式包含使用模具或雕刻輪壓印。 In a method of fabricating a high aspect ratio microstructured composite film according to an embodiment of the present invention, the manner in which a plurality of groove structures are formed in the polymer layer comprises imprinting using a mold or an engraving wheel.

在本發明之一實施例之高深寬比微結構複合膜之製造方法中,固化該聚合物層的方式包含光固化或熱固化。 In a method of fabricating a high aspect ratio microstructured composite film according to an embodiment of the present invention, the manner of curing the polymer layer comprises photocuring or heat curing.

在本發明之一實施例之高深寬比微結構複合膜之製造方法中,該撓性基材係選自聚碳酸酯、醋酸纖維素、聚烯烴、聚對苯二甲酸乙二酯。 In the method for producing a high aspect ratio microstructure composite film according to an embodiment of the present invention, the flexible substrate is selected from the group consisting of polycarbonate, cellulose acetate, polyolefin, and polyethylene terephthalate.

在本發明之一實施例之高深寬比微結構複合膜之製造方法中,該聚合物層係選自酚醛樹脂、聚甲基丙烯酸甲酯、聚苯乙烯。 In a method for producing a high aspect ratio microstructure composite film according to an embodiment of the present invention, the polymer layer is selected from the group consisting of phenolic resin, polymethyl methacrylate, and polystyrene.

在本發明之一實施例之高深寬比微結構複合膜之製造方法中,該弧形底座進一步具有一黏著性表面,使該撓性基材服貼於該弧形底座之凹部表面。 In a method for fabricating a high aspect ratio microstructure composite film according to an embodiment of the present invention, the curved base further has an adhesive surface for conforming the flexible substrate to the concave surface of the curved base.

在本發明之一實施例之高深寬比微結構複合膜之製造方法中,該弧形底座進一步包含複數個氣體通道於該凹部表面,以傳導一負壓吸附該撓性基材,及傳導一正壓以移除該複合膜。 In a method for fabricating a high aspect ratio microstructure composite film according to an embodiment of the present invention, the curved base further includes a plurality of gas passages on the surface of the recess to conduct a vacuum to adsorb the flexible substrate, and conduct a Positive pressure to remove the composite film.

1‧‧‧防窺膜 1‧‧‧Provisional film

2‧‧‧透明基材 2‧‧‧Transparent substrate

20‧‧‧弧形底座 20‧‧‧ curved base

20a‧‧‧凹部表面 20a‧‧‧ concave surface

20b‧‧‧氣體通道 20b‧‧‧ gas passage

21‧‧‧具高深寬比微結構之複合膜 21‧‧‧Composite film with high aspect ratio microstructure

21a‧‧‧複合膜 21a‧‧‧Composite film

22‧‧‧撓性基材 22‧‧‧Flexible substrate

23‧‧‧聚合物層 23‧‧‧ polymer layer

23a‧‧‧高深寬比微結構 23a‧‧‧High aspect ratio microstructure

24‧‧‧固化裝置 24‧‧‧Curing device

25‧‧‧雕刻輪 25‧‧‧ Engraving wheel

26‧‧‧凹槽結構 26‧‧‧ Groove structure

3‧‧‧樹脂 3‧‧‧Resin

3a‧‧‧溝槽結構 3a‧‧‧ Groove structure

4‧‧‧壓印模具 4‧‧‧ Imprinting mold

5‧‧‧遮光材料 5‧‧‧ shading materials

A‧‧‧深寬比 A‧‧‧ aspect ratio

L1‧‧‧內弧長 L1‧‧‧ inner arc length

L2‧‧‧外弧長 L2‧‧‧ outer arc length

d1‧‧‧厚度 D1‧‧‧ thickness

G‧‧‧寬度 G‧‧‧Width

R‧‧‧曲率半徑 R‧‧‧ radius of curvature

θ‧‧‧圓心角 θ ‧‧‧ center angle

第1圖:係為習知一種壓印製程製作防窺膜的示意圖。 Fig. 1 is a schematic view showing the production of a privacy film for a conventional imprint process.

第2圖:係為本發明一實施例之具高深寬比微結構複合膜之製造方法一實施例之示意圖。 Fig. 2 is a schematic view showing an embodiment of a method for manufacturing a high aspect ratio microstructure composite film according to an embodiment of the present invention.

第3a圖至第3b圖:係為本發明之具高深寬比微結構之複合膜之製作方法中,用以控制所形成微結構之深寬比的計算方式。 3a to 3b are diagrams for calculating the aspect ratio of the formed microstructure in the method for fabricating a composite film having a high aspect ratio microstructure.

第4圖:係為本發明另一實施例之高深寬比微結構複合膜之製造方法中,所採用之弧形底座示意圖。 Fig. 4 is a schematic view showing a curved base used in a method for manufacturing a high aspect ratio microstructure composite film according to another embodiment of the present invention.

為使本發明之發明特徵、內容與優點及其所能達成之功效更易瞭解,茲將本發明配合附圖,並以實施例之表達形式詳細說明如下,而其中所使用之圖式,其主旨僅為示意及輔助說明書之用,未必為本發明實施後之真實比例與精準配置,故不應就所附之圖式的比例與配置關係解讀、侷限本發明於實際實施上的權利範圍,合先敘明。 In order to make the features, the contents and advantages of the invention and the effects thereof can be more easily understood, the present invention will be described in detail with reference to the accompanying drawings, The use of the present invention is not intended to be a true proportion and precise configuration after the implementation of the present invention. Therefore, the scope and configuration relationship of the attached drawings should not be interpreted or limited. Explain first.

以下將參照相關圖式,說明依本發明之高深寬比微結構複合膜之製造方法之實施例,為使便於理解,下述實施例中之相同元件係以相同之符號標示來說明。 The embodiments of the method for fabricating the high aspect ratio microstructured composite film according to the present invention will be described below with reference to the related drawings. For ease of understanding, the same elements in the following embodiments are denoted by the same reference numerals.

請參考第2圖,在一較佳實施態樣中,本發明提供一種具高深寬比微結構之複合膜21之製造方法。步驟200至205由括弧內之參考數字表示,該些步驟包含:提供一具有凹部表面20a之弧形底座20(步驟200);設置一撓性基材22於該弧形底座20之凹部表面20a,並塗佈一可固化之聚合物層23於該撓性基材22表面,以形成一複合膜21a(步驟201);預固化該聚合物層23(步驟202),例如可依聚合物23種類,採用可放射光能或熱能的固化裝置24,預固化該聚合物層23;採用表面具有微結構之雕刻輪25或壓印模板形成複數個凹槽結構26於該聚合物層23上(步驟203);並再次以固化裝置24完全固化該聚合物層23(步驟204);自該弧形底座20移除該複合膜21a,以及平坦化該複合膜21a(步驟205),使該些凹槽結構26朝向該聚合物層23之厚度方向分裂形成複數個高深寬 比微結構23a,而獲得具高深寬比微結構之複合膜21。 Referring to FIG. 2, in a preferred embodiment, the present invention provides a method of fabricating a composite film 21 having a high aspect ratio microstructure. Steps 200 through 205 are indicated by reference numerals in parentheses, the steps comprising: providing an arcuate base 20 having a recessed surface 20a (step 200); providing a flexible substrate 22 to the recessed surface 20a of the curved base 20 And coating a curable polymer layer 23 on the surface of the flexible substrate 22 to form a composite film 21a (step 201); pre-curing the polymer layer 23 (step 202), for example, depending on the polymer 23 a type, using a curing device 24 that emits light energy or heat, pre-curing the polymer layer 23; forming a plurality of groove structures 26 on the polymer layer 23 using an engraving wheel 25 or an imprint template having a microstructure on the surface ( Step 203); and completely curing the polymer layer 23 with the curing device 24 (step 204); removing the composite film 21a from the curved base 20, and planarizing the composite film 21a (step 205) to make the The groove structure 26 splits toward the thickness direction of the polymer layer 23 to form a plurality of high and deep widths The composite film 21 having a high aspect ratio microstructure is obtained than the microstructure 23a.

請參考第3a圖和第3b圖,其為本發明之具高深寬比微結構之複合膜之製作方法中,用以控制所形成高深寬比微結構23a之深寬比的計算方式。高深寬比微結構23a之深寬比A滿足式一:A=d1/G,其中d1為聚合物層23之厚度,G為所形成高深寬比微結構23a之寬度。又當凹槽結構26之總數量為N時,所形成之該些高深寬比微結構23a之總數量為亦為N,故該些高深寬比微結構23a之寬度總合為N×G,且其總合為該聚合物層23平坦化前之外弧長L2與內弧長L1之差值,故每一高深寬比微結構23a之寬度G滿足式二:G=(L2-L1)/N=((2π(R+d1)-2πR)×θ/360°)/N=(2πd1×θ/360°)/N,其中R為弧形底座所賦予該聚合物層23之曲率半徑,θ為該聚合物層23之弧長所對應的圓心角。再將式二代入式一,即可得式三:A=(360°/θ)×(N/2π)。因此,只要藉由控制弧形底座20的圓心角θ,及欲形成的高深寬比微結構23a之總數量N,即可估算該些高深寬比微結構23a之深寬比A。 Please refer to FIGS. 3a and 3b, which are calculation methods for controlling the aspect ratio of the formed high aspect ratio microstructure 23a in the method for fabricating a composite film having a high aspect ratio microstructure. The aspect ratio A of the high aspect ratio microstructure 23a satisfies Equation 1: A = d1/G, where d1 is the thickness of the polymer layer 23 and G is the width of the formed high aspect ratio microstructure 23a. When the total number of the recess structures 26 is N, the total number of the high aspect ratio microstructures 23a formed is also N, so the widths of the high aspect ratio microstructures 23a are N x G. And the sum is the difference between the outer arc length L2 and the inner arc length L1 before the flattening of the polymer layer 23, so the width G of each high aspect ratio microstructure 23a satisfies the formula 2: G=(L2-L1) /N=((2π(R+d1)-2πR)× θ /360°)/N=(2πd1× θ /360°)/N, where R is the radius of curvature of the polymer layer 23 imparted by the curved base , θ is the central angle corresponding to the arc length of the polymer layer 23. Then, the second formula is substituted into the first formula, and the formula 3 is obtained: A=(360°/ θ )×(N/2π). Therefore, the aspect ratio A of the high aspect ratio microstructures 23a can be estimated by controlling the central angle θ of the curved base 20 and the total number N of high aspect ratio microstructures 23a to be formed.

在本發明之一實施例之高深寬比微結構複合膜之製造方法中,該撓性基材22之斷裂伸長率係介於5%至20%,舉例而言,該撓性基材22包括但不限於聚碳酸酯、醋酸纖維素、聚烯烴或聚對苯二甲酸乙二酯等,以提供一定可撓性與強韌度而不易斷裂。而該聚合物層23之斷裂伸長率係介於0至2%,屬於較硬而脆之材質,例如包括酚醛樹脂、聚甲基丙烯酸甲酯或聚苯乙烯等。因此,當平坦化該聚合物層23時,該些凹槽結構26提供了應力的缺口,使得該聚合物層23之厚度方向受力時可分裂形成複數個高深寬比微結構23a,且對於形成該些凹槽結構26時,因該些凹槽結構26的功能僅用於提供應力的缺口,其深寬比例如可僅為0.5至5,因此不易產生壓印後脫模不良的問題。 In the manufacturing method of the high aspect ratio microstructure composite film according to an embodiment of the present invention, the flexible substrate 22 has an elongation at break of 5% to 20%. For example, the flexible substrate 22 includes However, it is not limited to polycarbonate, cellulose acetate, polyolefin or polyethylene terephthalate, etc., to provide certain flexibility and toughness without being easily broken. The polymer layer 23 has a breaking elongation of 0 to 2%, and is a hard and brittle material, and includes, for example, a phenol resin, polymethyl methacrylate or polystyrene. Therefore, when the polymer layer 23 is planarized, the groove structures 26 provide a stress gap so that the thickness direction of the polymer layer 23 can be split to form a plurality of high aspect ratio microstructures 23a, and When the groove structures 26 are formed, since the functions of the groove structures 26 are only used to provide stress gaps, the aspect ratio thereof may be, for example, only 0.5 to 5, so that the problem of poor mold release after imprinting is less likely to occur.

在本發明之一實施例之高深寬比微結構複合膜之製造方法中,該高深寬比微結構23a之深寬比係介於5至100。 In the method for fabricating a high aspect ratio microstructure composite film according to an embodiment of the present invention, the aspect ratio of the high aspect ratio microstructure 23a is between 5 and 100.

在本發明之一實施例之高深寬比微結構複合膜之製造方法中,形成複數個凹槽結構26於該聚合物層23的方式包含使用表面具有微結構的模具或雕刻輪壓印。 In a method of fabricating a high aspect ratio microstructured composite film in accordance with an embodiment of the present invention, the manner in which the plurality of groove structures 26 are formed in the polymer layer 23 comprises embossing using a mold or engraving wheel having a microstructure on the surface.

在本發明之一實施例之高深寬比微結構複合膜之製造方法中,固化該聚合物層23的方式包含光固化或熱固化。 In the method of fabricating the high aspect ratio microstructured composite film of one embodiment of the present invention, the manner of curing the polymer layer 23 comprises photocuring or heat curing.

在本發明之一實施例之高深寬比微結構複合膜之製造方法中,該弧形底座20之該凹部表面20a係為一黏著性表面,使該撓性基材22服貼於該弧形底座20之凹部表面20a。 In the manufacturing method of the high aspect ratio microstructure composite film according to an embodiment of the present invention, the concave surface 20a of the curved base 20 is an adhesive surface, and the flexible substrate 22 is applied to the curved shape. The recessed surface 20a of the base 20.

在本發明另一實施例之高深寬比微結構複合膜之製造方法中,如第4圖所示,該弧形底座20進一步包含複數個氣體通道20b於該凹部表面20a,以傳導一負壓吸附該撓性基材22,及傳導一正壓以移除該複合膜21a。 In the manufacturing method of the high aspect ratio microstructure composite film according to another embodiment of the present invention, as shown in FIG. 4, the curved base 20 further includes a plurality of gas passages 20b on the concave surface 20a to conduct a negative pressure. The flexible substrate 22 is adsorbed and a positive pressure is conducted to remove the composite film 21a.

以上所述之實施例僅係為說明本發明之技術思想及特點,其目的在使熟習此項技藝之人士能夠瞭解本發明之內容並據以實施,當不能以之限定本發明之專利範圍,即大凡依本發明所揭示之精神所作之均等變化或修飾,仍應涵蓋在本發明之專利範圍內。 The embodiments described above are merely illustrative of the technical spirit and the features of the present invention, and the objects of the present invention can be understood by those skilled in the art, and the scope of the present invention cannot be limited thereto. That is, the equivalent variations or modifications made by the spirit of the present invention should still be included in the scope of the present invention.

20‧‧‧弧形底座 20‧‧‧ curved base

20a‧‧‧凹部表面 20a‧‧‧ concave surface

21‧‧‧具高深寬比微結構之複合膜 21‧‧‧Composite film with high aspect ratio microstructure

21a‧‧‧複合膜 21a‧‧‧Composite film

22‧‧‧撓性基材 22‧‧‧Flexible substrate

23‧‧‧聚合物層 23‧‧‧ polymer layer

23a‧‧‧高深寬比微結構 23a‧‧‧High aspect ratio microstructure

24‧‧‧固化裝置 24‧‧‧Curing device

25‧‧‧雕刻輪 25‧‧‧ Engraving wheel

26‧‧‧凹槽結構 26‧‧‧ Groove structure

Claims (10)

一種具高深寬比微結構之複合膜之製造方法,其步驟包含: 提供一具有凹部表面之弧形底座; 設置一撓性基材於該弧形底座之該凹部表面,並塗佈一可固化之聚合物層於該撓性基材表面,以形成一複合膜; 預固化該聚合物層; 形成複數個凹槽結構於該聚合物層上,並完全固化該聚合物層; 自該弧形底座移除該複合膜;以及 平坦化該複合膜,使該些凹槽結構朝向該聚合物層之厚度方向分裂而形成複數個高深寬比微結構。A method for manufacturing a composite film having a high aspect ratio microstructure, comprising the steps of: providing a curved base having a concave surface; providing a flexible substrate on the surface of the concave portion of the curved base and coating a curable layer a polymer layer on the surface of the flexible substrate to form a composite film; pre-curing the polymer layer; forming a plurality of groove structures on the polymer layer, and completely curing the polymer layer; The base removes the composite film; and planarizing the composite film to split the groove structures toward the thickness of the polymer layer to form a plurality of high aspect ratio microstructures. 如申請專利範圍第1項所述之高深寬比微結構複合膜之製造方法,其中該撓性基材之斷裂伸長率係介於5%至20%。The method for producing a high aspect ratio microstructure composite film according to claim 1, wherein the flexible substrate has an elongation at break of from 5% to 20%. 如申請專利範圍第1項所述之高深寬比微結構複合膜之製造方法,其中該聚合物層之斷裂伸長率係介於0至2%。The method for producing a high aspect ratio microstructure composite film according to claim 1, wherein the polymer layer has an elongation at break of from 0 to 2%. 如申請專利範圍第1項所述之高深寬比微結構複合膜之製造方法,其中該高深寬比微結構之深寬比係介於5至100。The method for manufacturing a high aspect ratio microstructure composite film according to claim 1, wherein the high aspect ratio microstructure has an aspect ratio of 5 to 100. 如申請專利範圍第1項所述之高深寬比微結構複合膜之製造方法,其中形成複數個凹槽結構於該聚合物層的方式包含使用模具或雕刻輪壓印。The method for manufacturing a high aspect ratio microstructure composite film according to claim 1, wherein the manner of forming the plurality of groove structures in the polymer layer comprises using a mold or an engraving wheel to imprint. 如申請專利範圍第1項所述之高深寬比微結構複合膜之製造方法,其中固化該聚合物層的方式包含光固化或熱固化。The method for producing a high aspect ratio microstructure composite film according to claim 1, wherein the method of curing the polymer layer comprises photocuring or heat curing. 如申請專利範圍第1項所述之高深寬比微結構複合膜之製造方法,其中該撓性基材係選自聚碳酸酯、醋酸纖維素、聚烯烴、聚對苯二甲酸乙二酯。The method for producing a high aspect ratio microstructure composite film according to claim 1, wherein the flexible substrate is selected from the group consisting of polycarbonate, cellulose acetate, polyolefin, and polyethylene terephthalate. 如申請專利範圍第1項所述之高深寬比微結構複合膜之製造方法,其中該聚合物層係選自酚醛樹脂、聚甲基丙烯酸甲酯、聚苯乙烯。The method for producing a high aspect ratio microstructure composite film according to claim 1, wherein the polymer layer is selected from the group consisting of phenolic resin, polymethyl methacrylate, and polystyrene. 如申請專利範圍第1項所述之高深寬比微結構複合膜之製造方法,其中該弧形底座之該凹部表面係為一黏著性表面,使該撓性基材服貼於該弧形底座之凹部表面。The method for manufacturing a high aspect ratio microstructure composite film according to claim 1, wherein the surface of the concave portion of the curved base is an adhesive surface, and the flexible substrate is applied to the curved base. The surface of the recess. 如申請專利範圍第1項所述之高深寬比微結構複合膜之製造方法,其中該弧形底座進一步包含複數個氣體通道於該凹部表面,以傳導一負壓吸附該撓性基材,及傳導一正壓以移除該複合膜。The method for manufacturing a high aspect ratio microstructure composite film according to claim 1, wherein the curved base further comprises a plurality of gas passages on the surface of the recess to conduct a vacuum to adsorb the flexible substrate, and A positive pressure is conducted to remove the composite membrane.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103568306A (en) * 2012-07-24 2014-02-12 郭敬慧 Forming mold for TPU membrane and method of preparing the TPU membrane by utilization of the mold
CN105667043A (en) * 2016-03-03 2016-06-15 上海交通大学 Omnibearing peep-proof film with antireflection function and manufacturing process thereof
JP2016110034A (en) * 2014-12-10 2016-06-20 凸版印刷株式会社 Anti-peep transparent film and manufacturing method of the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103568306A (en) * 2012-07-24 2014-02-12 郭敬慧 Forming mold for TPU membrane and method of preparing the TPU membrane by utilization of the mold
JP2016110034A (en) * 2014-12-10 2016-06-20 凸版印刷株式会社 Anti-peep transparent film and manufacturing method of the same
CN105667043A (en) * 2016-03-03 2016-06-15 上海交通大学 Omnibearing peep-proof film with antireflection function and manufacturing process thereof

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