TWI580057B - Semiconductor capacitor - Google Patents

Semiconductor capacitor Download PDF

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TWI580057B
TWI580057B TW102128997A TW102128997A TWI580057B TW I580057 B TWI580057 B TW I580057B TW 102128997 A TW102128997 A TW 102128997A TW 102128997 A TW102128997 A TW 102128997A TW I580057 B TWI580057 B TW I580057B
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finger electrodes
numbered
layer
odd
region
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TW102128997A
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TW201507171A (en
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施學浩
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聯華電子股份有限公司
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半導體電容 Semiconductor capacitor

本發明係有關於一種半導體結構,尤指一種半導體電容結構。 The present invention relates to a semiconductor structure, and more particularly to a semiconductor capacitor structure.

半導體電容係普遍用於現代積體電路(integrated circuits,ICs)中,以達成不同的功能,例如動態隨機存取記憶、旁路(bypassing)、以及濾波(filter)等功能。在一般類比IC製程中,電容係由兩層導電材料與夾設於其內的介電材料組成。舉例來說,習知之電容包含金屬-絕緣-金屬(metal-insulator-metal,MIM)電容與金屬-氧化物-金屬(metal-oxide-metal,MOM)電容。 Semiconductor capacitors are commonly used in modern integrated circuits (ICs) to achieve different functions such as dynamic random access memory, bypassing, and filtering. In a typical analog IC process, the capacitor is composed of two layers of conductive material and a dielectric material sandwiched therein. For example, conventional capacitors include metal-insulator-metal (MIM) capacitors and metal-oxide-metal (MOM) capacitors.

熟習該項技藝之人士應知電容結構之電容值對於製作過程與結構設計非常敏感,是以製程中因對準偏差(misalignment)而導致的變異等都是亟欲避免的問題。因此,目前仍然需要一種可降低因製程導致的結構內變異與提升電容值的半導體電容。 Those skilled in the art should be aware that the capacitance value of the capacitor structure is very sensitive to the manufacturing process and structural design, and the variation caused by the misalignment in the process is an unavoidable problem. Therefore, there is still a need for a semiconductor capacitor that reduces the variation in structure and the value of the capacitor due to the process.

根據本發明之申請專利範圍,係提供一種半導體電容,該半導體電容包含有一基底、複數個設置於該基底上之奇數層、以及複數個設置於該基底上之偶數層。該基底定義有一電容區、一端點區與一周邊區。各該奇數層分別包含複數個設置於該電容區內之第 一奇數層指狀電極(first odd finger)、複數個設置於該電容區內之第二奇數層指狀電極(second odd finger)、一設置於該端點區內之第一奇數層端點(first odd terminal)、以及一設置於該端點區內之第二奇數層端點(second odd terminal)。該等第一奇數層指狀電極與該等第二奇數層指狀電極係於該電容區內彼此叉合(interdigitated),且實體(physically)上與電性上皆彼此分離。該等第一奇數層指狀電極係電性連接至該第一奇數層端點,且該等第二奇數層指狀電極係電性連接至該第二奇數層端點。各該偶數層分別包含複數個設置於該電容區內之第一偶數層指狀電極(first even finger)、複數個設置於該電容區內之第二偶數層指狀電極(second even finger)、一設置於該端點區內之第一偶數層端點(first even terminal)、以及一設置於該端點區內之第二偶數層端點(second even terminal)。該等第一偶數層指狀電極與該等第二偶數層指狀電極係於該電容區內彼此叉合,且實體上與電性上皆彼此分離。該等第一偶數層指狀電極係電性連接至該第一偶數層端點,且該等第二偶數層指狀電極係電性連接至該第二偶數層端點。該半導體電容更包含至少一第一奇數層導電連接結構(first odd connecting structure)、至少一第二奇數層導電連接結構(second odd connecting structure)、至少一第一偶數層導電連接結構(first even connecting structure)、以及至少一第二偶數層導電連接結構(second even connecting structure)。該第一奇數層導電連接結構、該第二奇數層導電連接結構、該第一偶數層導電連接結構以及該第二偶數層導電連接結構皆設置於該端點區內。該第一奇數層導電連接結構電性連接該等奇數層內之該等第一奇數層端點、該第二奇數層導電連接結構電性連接該等奇數層內之該等第二奇數層端點、該第一偶數層導電連接結構電性連接該等偶數層內之該等第一偶數層端點、而該第二偶數層導電連接結構電性連接該等偶數層內之該等第 二偶數層端點。 According to the scope of the invention, there is provided a semiconductor capacitor comprising a substrate, a plurality of odd-numbered layers disposed on the substrate, and a plurality of even-numbered layers disposed on the substrate. The substrate defines a capacitor region, an end region and a peripheral region. Each of the odd layers includes a plurality of the plurality of layers disposed in the capacitor region An odd-numbered first odd finger, a plurality of second odd-numbered fingers disposed in the capacitance region, and a first odd-numbered layer end disposed in the end region ( First odd terminal), and a second odd terminal disposed in the end region. The first odd-numbered finger electrodes and the second odd-numbered finger electrodes are interdigitated in the capacitive region, and are physically and electrically separated from each other. The first odd-numbered finger electrodes are electrically connected to the first odd-numbered layer end, and the second odd-numbered finger electrodes are electrically connected to the second odd-numbered layer end. Each of the even layers includes a plurality of first even fingers disposed in the capacitor region, and a plurality of second even fingers disposed in the capacitor region, a first even terminal disposed in the end region, and a second even terminal disposed in the end region. The first even-numbered finger electrodes and the second even-numbered finger electrodes are interdigitated with each other in the capacitance region, and are physically and electrically separated from each other. The first even layer finger electrodes are electrically connected to the first even layer end, and the second even layer finger electrodes are electrically connected to the second even layer end. The semiconductor capacitor further includes at least one first odd connecting structure, at least one second odd connecting structure, and at least one first even connecting layer (first even connecting) And a second even connecting structure. The first odd-numbered layer conductive connection structure, the second odd-numbered layer conductive connection structure, the first even-numbered layer conductive connection structure, and the second even-numbered layer conductive connection structure are disposed in the end region. The first odd-numbered conductive connection structure is electrically connected to the first odd-numbered layer end points in the odd-numbered layers, and the second odd-numbered conductive connection structure is electrically connected to the second odd-numbered end in the odd-numbered layers The first even-layer conductive connection structure is electrically connected to the first even-numbered layer end points in the even-numbered layers, and the second even-numbered conductive connection structure is electrically connected to the first-numbered layers Two even layer endpoints.

根據本發明之申請專利範圍,另提供一種半導體電容,該半導體電容包含有一基底、一設置於該基底上之第一層、一設置於該第一層上之第二層、以及一設置於該第二層上之第三層。該基底定義有一電容區、一端點區與一周邊區。該第一層包含有複數個第一指狀電極以及複數個第二指狀電極,該等第一指狀電極與該等第二指狀電極係設置於該電容區內,並於該電容區內彼此叉合,且實體上與電性上皆彼此分離。該第二層包含有複數個第三指狀電極以及複數個第四指狀電極,該等第三指狀電極與該等第四指狀電極係設置於該電容區內,並於該電容區內彼此叉合,且實體上與電性上皆彼此分離。該第三層包含有複數個第五指狀電極以及複數個第六指狀電極,該等第五指狀電極與該等第六指狀電極係設置於該電容區內,並於該電容區內彼此叉合,且實體上與電性上皆彼此分離。更重要的是,該等第一指狀電極與該等第五指狀電極係於該端點區內彼此電性連接、該等第二指狀電極與該等第六指狀電極係於該端點區內彼此電性連接、該等第三指狀電極與該等第四指狀電極係與該等第一指狀電極、該等第二指狀電極、該等第五指狀電極與該等第六指狀電極電性隔離。 According to the patent application of the present invention, there is further provided a semiconductor capacitor, the semiconductor capacitor comprising a substrate, a first layer disposed on the substrate, a second layer disposed on the first layer, and a The third layer on the second layer. The substrate defines a capacitor region, an end region and a peripheral region. The first layer includes a plurality of first finger electrodes and a plurality of second finger electrodes. The first finger electrodes and the second finger electrodes are disposed in the capacitor region, and the capacitor region is disposed in the capacitor region. They are interdigitated with each other and are physically and electrically separated from each other. The second layer includes a plurality of third finger electrodes and a plurality of fourth finger electrodes. The third finger electrodes and the fourth finger electrodes are disposed in the capacitor region, and the capacitor region is disposed in the capacitor region. They are interdigitated with each other and are physically and electrically separated from each other. The third layer includes a plurality of fifth finger electrodes and a plurality of sixth finger electrodes, wherein the fifth finger electrodes and the sixth finger electrodes are disposed in the capacitor region, and in the capacitor region They are interdigitated with each other and are physically and electrically separated from each other. More importantly, the first finger electrodes and the fifth finger electrodes are electrically connected to each other in the end region, and the second finger electrodes and the sixth finger electrodes are connected to the The third finger electrodes and the fourth finger electrodes are connected to the first finger electrodes, the second finger electrodes, the second finger electrodes, and the fifth finger electrodes are electrically connected to each other. The sixth finger electrodes are electrically isolated.

根據本發明所提供之半導體電容,電容區內相鄰層內之指狀電極皆彼此電性分離。因此,在垂直基底的方向上,各指狀電極可避免彼此之間產生電磁交互作用(electromagnetic interaction),而感應效應也可避免。更重要的是,端點區內相鄰層內之各端點在實體上與電性上亦彼此分離,故更可避免端點區內產生電性上的交互作用。 According to the semiconductor capacitor provided by the present invention, the finger electrodes in the adjacent layers in the capacitor region are electrically separated from each other. Therefore, in the direction of the vertical substrate, the respective finger electrodes can avoid electromagnetic interaction between each other, and the inductive effect can also be avoided. More importantly, the endpoints in the adjacent layers in the endpoint region are physically and electrically separated from each other, so that electrical interactions in the endpoint regions are avoided.

10‧‧‧半導體電容 10‧‧‧Semiconductor capacitance

100‧‧‧基底 100‧‧‧Base

102‧‧‧電容區 102‧‧‧Capacitor zone

104‧‧‧端點區 104‧‧‧End zone

106‧‧‧周邊區 106‧‧‧The surrounding area

110‧‧‧第一層 110‧‧‧ first floor

112‧‧‧第一指狀電極 112‧‧‧First finger electrode

114‧‧‧第一端點 114‧‧‧First endpoint

116‧‧‧第二指狀電極 116‧‧‧second finger electrode

118‧‧‧第二端點 118‧‧‧second endpoint

120‧‧‧第二層 120‧‧‧ second floor

122‧‧‧第三指狀電極 122‧‧‧ third finger electrode

124‧‧‧第三端點 124‧‧‧ third endpoint

126‧‧‧第四指狀電極 126‧‧‧ fourth finger electrode

128‧‧‧第四端點 128‧‧‧ fourth endpoint

130‧‧‧第三層 130‧‧‧ third floor

132‧‧‧第五指狀電極 132‧‧‧ fifth finger electrode

134‧‧‧第五端點 134‧‧‧ fifth endpoint

136‧‧‧第六指狀電極 136‧‧‧ sixth finger electrode

138‧‧‧第六端點 138‧‧‧ sixth endpoint

140‧‧‧第四層 140‧‧‧ fourth floor

142‧‧‧第七指狀電極 142‧‧‧ seventh finger electrode

144‧‧‧第七端點 144‧‧‧ seventh endpoint

146‧‧‧第八指狀電極 146‧‧‧ eighth finger electrode

148‧‧‧第八端點 148‧‧‧ eighth endpoint

150‧‧‧第一導電連接結構 150‧‧‧First conductive connection structure

152‧‧‧第二導電連接結構 152‧‧‧Second conductive connection structure

154‧‧‧第三導電連接結構 154‧‧‧ Third conductive connection structure

156‧‧‧第四導電連接結構 156‧‧‧fourth conductive connection structure

A‧‧‧第一電極 A‧‧‧first electrode

B‧‧‧第二電極 B‧‧‧second electrode

D1‧‧‧第一方向 D1‧‧‧ first direction

D2‧‧‧第二方向 D2‧‧‧ second direction

第1圖至第3圖為本發明所提供之半導體電容之一第一較佳實施例之示意圖。 1 to 3 are schematic views showing a first preferred embodiment of a semiconductor capacitor provided by the present invention.

第1圖至第5圖為本發明所提供之半導體電容之一第二較佳實施例之示意圖。 1 to 5 are schematic views showing a second preferred embodiment of a semiconductor capacitor provided by the present invention.

請參閱第1圖至第3圖,第1圖至第3圖為本發明所提供之半導體電容之一第一較佳實施例之示意圖。如第1圖所示,本發明所提供之半導體電容10包一基底100,基底100上定義有一電容區102、一端點區104、與一周邊區106。周邊區106包圍端點區104,而端點區104則包圍電容區102。本較佳實施例所提供之半導體電容10更包含一第一層110,設置於基底100上。基本上,第一層110包含絕緣材料,用以提供電性隔離。另外如第1圖所示,第一層110係隨基底100上各區域的限定而包含了電容區102、端點區104與周邊區106。第一層110內更包含複數個第一指狀電極112與複數個第二指狀電極116,且第一指狀電極112與第二指狀電極116皆設置於電容區102內。熟習該項技藝之人士應知,本較佳實施例中第一指狀電極112與第二指狀電極116之數量僅為例示,故第一指狀電極112與第二指狀電極116之數量可依據不同的產品需求調整。如第1圖所示,第一指狀電極112與第二指狀電極116係沿一第一方向D1延伸,是以第一指狀電極112與第二指狀電極116在與基底100水平的方向上彼此平行。第一指狀電極112與第二指狀電極116係交互排列,故彼此叉合設置。更重要的是,第一指狀電 極112與第二指狀電極116於電容區102內在實體上與電性上皆彼此分離。 Please refer to FIG. 1 to FIG. 3 . FIG. 1 to FIG. 3 are schematic diagrams showing a first preferred embodiment of a semiconductor capacitor provided by the present invention. As shown in FIG. 1, the semiconductor capacitor 10 provided by the present invention includes a substrate 100 having a capacitor region 102, an end region 104, and a peripheral region 106 defined thereon. The peripheral zone 106 surrounds the end zone 104 and the end zone 104 encloses the capacitive zone 102. The semiconductor capacitor 10 provided in the preferred embodiment further includes a first layer 110 disposed on the substrate 100. Basically, the first layer 110 comprises an insulating material to provide electrical isolation. In addition, as shown in FIG. 1, the first layer 110 includes a capacitor region 102, an end region 104, and a peripheral region 106 as defined by regions on the substrate 100. The first layer 110 further includes a plurality of first finger electrodes 112 and a plurality of second finger electrodes 116, and the first finger electrodes 112 and the second finger electrodes 116 are disposed in the capacitor region 102. It is to be understood by those skilled in the art that the number of first finger electrodes 112 and second finger electrodes 116 in the preferred embodiment is merely exemplary, so the number of first finger electrodes 112 and second finger electrodes 116 is Can be adjusted according to different product needs. As shown in FIG. 1 , the first finger electrode 112 and the second finger electrode 116 extend along a first direction D1 , and the first finger electrode 112 and the second finger electrode 116 are horizontal to the substrate 100 . The directions are parallel to each other. The first finger electrodes 112 and the second finger electrodes 116 are alternately arranged, so that they are arranged to each other. More importantly, the first finger electricity The poles 112 and the second finger electrodes 116 are physically and electrically separated from each other within the capacitor region 102.

請繼續參閱第1圖。第一層110更包含一第一端點114與一第二端點118。值得注意的是,第一端點114與第二端點118係設置於端點區104內,且如第1圖所示,分別設置於電容區102相對兩側之端點區104內。因此,第一端點114與第二端點118在實體上與電性上皆彼此分離。第一端點114與第二端點118皆沿一第二方向D2延伸,且第二方向D2垂直於第一方向D1,換句話說第一端點114與第二端點118在與基底100水平的方向上彼此平行。第一端點114係與第一指狀電極112垂直,且第一指狀電極112實體上與電性上連接至第一端點114。同理,第二端點118係與第二指狀電極116垂直,且第二指狀電極116實體上與電性上連接至第二端點118。 Please continue to see Figure 1. The first layer 110 further includes a first endpoint 114 and a second endpoint 118. It should be noted that the first end point 114 and the second end point 118 are disposed in the end point area 104, and as shown in FIG. 1, are respectively disposed in the end point areas 104 on opposite sides of the capacitor area 102. Therefore, the first endpoint 114 and the second endpoint 118 are physically and electrically separated from each other. The first end point 114 and the second end point 118 both extend in a second direction D2, and the second direction D2 is perpendicular to the first direction D1. In other words, the first end point 114 and the second end point 118 are in the same direction as the base 100. The horizontal directions are parallel to each other. The first end point 114 is perpendicular to the first finger electrode 112, and the first finger electrode 112 is physically and electrically connected to the first end point 114. Similarly, the second end point 118 is perpendicular to the second finger electrode 116, and the second finger electrode 116 is physically and electrically connected to the second end point 118.

請參閱第2圖。本較佳實施例所提供之半導體電容10更包含一第二層120,設置於第一層110上。基本上,第二層120包含絕緣材料,用以提供電性隔離。另外如第2圖所示,第二層120係隨基底100上各區域的限定而包含了電容區102、端點區104與周邊區106。第二層120包含複數個第三指狀電極122與複數個第四指狀電極126,且第三指狀電極122與第四指狀電極126皆設置於電容區102內。熟習該項技藝之人士應知,本較佳實施例中第三指狀電極122與第四指狀電極126之數量僅為例示,故第三指狀電極122與第四指狀電極126之數量可依據不同的產品需求調整。如第2圖所示,第三指狀電極122與第四指狀電極126係沿第二方向 D2延伸,是以第三指狀電極122與第四指狀電極126在與基底100水平的方向上彼此平行。另外,第三指狀電極122與第四指狀電極126在與基底100水平的方向上垂直於第一指狀電極112與第二指狀電極116。第三指狀電極122與第四指狀電極126係交互排列,故彼此叉合設置。更重要的是,第三指狀電極122與第四指狀電極126於電容區102內在實體上與電性上皆彼此分離。 Please refer to Figure 2. The semiconductor capacitor 10 provided in the preferred embodiment further includes a second layer 120 disposed on the first layer 110. Basically, the second layer 120 comprises an insulating material to provide electrical isolation. In addition, as shown in FIG. 2, the second layer 120 includes a capacitor region 102, an end region 104, and a peripheral region 106 as defined by regions on the substrate 100. The second layer 120 includes a plurality of third finger electrodes 122 and a plurality of fourth finger electrodes 126 , and the third finger electrodes 122 and the fourth finger electrodes 126 are disposed in the capacitor region 102 . It should be understood by those skilled in the art that the number of the third finger electrodes 122 and the fourth finger electrodes 126 in the preferred embodiment is merely an example, so the number of the third finger electrodes 122 and the fourth finger electrodes 126 Can be adjusted according to different product needs. As shown in FIG. 2, the third finger electrode 122 and the fourth finger electrode 126 are in the second direction. The D2 extension is such that the third finger electrode 122 and the fourth finger electrode 126 are parallel to each other in a direction horizontal to the substrate 100. In addition, the third finger electrodes 122 and the fourth finger electrodes 126 are perpendicular to the first finger electrodes 112 and the second finger electrodes 116 in a direction horizontal to the substrate 100 . The third finger electrodes 122 and the fourth finger electrodes 126 are alternately arranged, so that they are arranged to be mutually aligned. More importantly, the third finger electrode 122 and the fourth finger electrode 126 are physically and electrically separated from each other in the capacitor region 102.

請繼續參閱第2圖。第二層120內更包含一第三端點124與一第四端點128。值得注意的是,第三端點124與第四端點128係設置於端點區104內,且如第2圖所示,分別設置於電容區102另外相對兩側之端點區104內。因此,第三端點124與第四端點128在實體上與電性上皆彼此分離。第三端點124與第四端點128皆沿第一方向D1延伸,換句話說第三端點124與第四端點128在與基底100水平的方向上彼此平行。第三端點124係與第三指狀電極122垂直,且第三指狀電極122實體上與電性上連接至第三端點124。同理,第四端點128係與第四指狀電極126垂直,且第四指狀電極126實體上與電性上連接至第四端點128。 Please continue to see Figure 2. The second layer 120 further includes a third endpoint 124 and a fourth endpoint 128. It should be noted that the third end point 124 and the fourth end point 128 are disposed in the end point area 104, and as shown in FIG. 2, are respectively disposed in the end regions 104 of the opposite sides of the capacitor area 102. Therefore, the third endpoint 124 and the fourth endpoint 128 are physically and electrically separated from each other. The third end point 124 and the fourth end point 128 both extend in the first direction D1, in other words the third end point 124 and the fourth end point 128 are parallel to each other in a direction horizontal to the substrate 100. The third end point 124 is perpendicular to the third finger electrode 122, and the third finger electrode 122 is physically and electrically connected to the third end point 124. Similarly, the fourth end point 128 is perpendicular to the fourth finger electrode 126, and the fourth finger electrode 126 is physically and electrically connected to the fourth end point 128.

請參閱第3圖。本較佳實施例所提供之半導體電容10更包含一第三層130,設置於第二層120上。基本上,第三層130亦包含絕緣材料,用以提供電性隔離。另外如第3圖所示,第三層130係隨基底100上各區域的限定而包含了電容區102、端點區104與周邊區106。第三層130包含複數個第五指狀電極132與複數個第六指狀電極136,且第五指狀電極132與第六指狀電極136皆設置於電容區102內。熟習該項技藝之人士應知,本較佳實施例中第五指狀電極132與第六指狀電極136之數量亦僅為例示,故第五指狀 電極132與第六指狀電極136之數量可依據不同的產品需求調整。如第3圖所示,第五指狀電極132與第六指狀電極136係沿第一方向D1延伸,是以第五指狀電極132與第六指狀電極136在與基底100水平的方向上彼此平行。第五指狀電極132與第六指狀電極136係交互排列,故彼此叉合設置。更重要的是,第五指狀電極132與第六指狀電極136於電容區102內在實體上與電性上皆彼此分離。 Please refer to Figure 3. The semiconductor capacitor 10 provided in the preferred embodiment further includes a third layer 130 disposed on the second layer 120. Basically, the third layer 130 also includes an insulating material to provide electrical isolation. In addition, as shown in FIG. 3, the third layer 130 includes a capacitor region 102, an end region 104, and a peripheral region 106 as defined by regions on the substrate 100. The third layer 130 includes a plurality of fifth finger electrodes 132 and a plurality of sixth finger electrodes 136 , and the fifth finger electrodes 132 and the sixth finger electrodes 136 are both disposed in the capacitor region 102 . It should be understood by those skilled in the art that the number of the fifth finger electrodes 132 and the sixth finger electrodes 136 in the preferred embodiment is also merely an example, so the fifth finger shape The number of electrodes 132 and sixth finger electrodes 136 can be adjusted according to different product requirements. As shown in FIG. 3, the fifth finger electrode 132 and the sixth finger electrode 136 extend in the first direction D1, and the fifth finger electrode 132 and the sixth finger electrode 136 are horizontal to the substrate 100. Parallel to each other. The fifth finger electrode 132 and the sixth finger electrode 136 are alternately arranged, so that they are arranged to be aligned with each other. More importantly, the fifth finger electrode 132 and the sixth finger electrode 136 are physically and electrically separated from each other in the capacitor region 102.

請繼續參閱第3圖。第三層130內更包含一第五端點134與一第六端點138。值得注意的是,第五端點134與第六端點138係設置於端點區104內,且如第3圖所示,分別設置於電容區102相對兩側之端點區104內。可同時比較第1圖與第3圖,由第1圖與第3圖可知,第五端點134與第一端點114係設置於同一側,而第六端點138與第二端點118設置於同一側。換句話說,本較佳實施例所提供之第一層110與第三層130具有相同的佈局圖案,但不限於此。因此,第五端點134與第六端點138在實體上與電性上皆彼此分離。第五端點134與第六端點138皆沿第二方向D2延伸,換句話說第五端點134與第六端點138在與基底100水平的方向上彼此平行。第五端點134係與第五指狀電極132垂直,且第五指狀電極132實體上與電性上連接至第五端點134。同理,第六端點138係與第六指狀電極136垂直,且第六指狀電極136實體上與電性上連接至第六端點138。 Please continue to see Figure 3. The third layer 130 further includes a fifth endpoint 134 and a sixth endpoint 138. It should be noted that the fifth end point 134 and the sixth end point 138 are disposed in the end point area 104, and as shown in FIG. 3, are respectively disposed in the end point areas 104 on opposite sides of the capacitor area 102. The first and third figures can be compared at the same time. As can be seen from FIGS. 1 and 3, the fifth end point 134 and the first end point 114 are disposed on the same side, and the sixth end point 138 and the second end point 118 are provided. Set on the same side. In other words, the first layer 110 and the third layer 130 provided by the preferred embodiment have the same layout pattern, but are not limited thereto. Therefore, the fifth endpoint 134 and the sixth endpoint 138 are physically and electrically separated from each other. Both the fifth end point 134 and the sixth end point 138 extend in the second direction D2, in other words the fifth end point 134 and the sixth end point 138 are parallel to each other in a direction horizontal to the substrate 100. The fifth end point 134 is perpendicular to the fifth finger electrode 132, and the fifth finger electrode 132 is physically and electrically connected to the fifth end point 134. Similarly, the sixth end point 138 is perpendicular to the sixth finger electrode 136, and the sixth finger electrode 136 is physically and electrically connected to the sixth end point 138.

請再參閱第1圖至第3圖。根據本較佳實施例所提供之半導體電容10,第一指狀電極112、第二指狀電極116、第五指狀電極132與第六指狀電極136在與基底100水平的方向上彼此平行,而第三指狀電極122與第四指狀電極126則垂直於第一指狀電極 112、第二指狀電極116、第五指狀電極132與第六指狀電極136。 Please refer to Figures 1 to 3 again. According to the semiconductor capacitor 10 provided in the preferred embodiment, the first finger electrode 112, the second finger electrode 116, the fifth finger electrode 132 and the sixth finger electrode 136 are parallel to each other in a horizontal direction with the substrate 100. And the third finger electrode 122 and the fourth finger electrode 126 are perpendicular to the first finger electrode 112, second finger electrode 116, fifth finger electrode 132 and sixth finger electrode 136.

另外需注意的是,根據第一較佳實施例,半導體電容10另包含至少一第一導電連接結構150,設置於端點區104內,用以電性連接第一層110內的第一端點114與第三層130內的第五端點134,藉此第一指狀電極112與第五指狀電極132係於端點區104內電性連接。同理,半導體電容10另包含至少一第二導電連接結構152,設置於端點區104內,用以電性連接第一層110內的第二端點118與第三層130內的第六端點138,藉此第二指狀電極116與第六指狀電極136係於端點區104內電性連接。然而,端點區104內的第一端點114與第五端點134實體上與第二層120內的第三端點124分離;同理端點區104內的第二端點118與第六端點138實體上亦與第二層120內的第四端點128分離。另外,半導體電容10更包含一第三導電連接結構154,設置於端點區104內且電性連接第三端點124,用以提供一外部電源與半導體電容10的電性連接。同理半導體電容10更包含一第四導電連接結構156,設置於端點區104內且電性連接第四端點128,用以提供一外部電源與半導體電容10的電性連接。 It should be noted that, according to the first preferred embodiment, the semiconductor capacitor 10 further includes at least one first conductive connection structure 150 disposed in the end region 104 for electrically connecting the first end in the first layer 110. The point 114 and the fifth end point 134 in the third layer 130 are electrically connected to the first finger electrode 112 and the fifth finger electrode 132 in the end point region 104. Similarly, the semiconductor capacitor 10 further includes at least one second conductive connection structure 152 disposed in the end region 104 for electrically connecting the second end point 118 in the first layer 110 and the sixth end in the third layer 130. The terminal 138 is electrically connected to the second finger electrode 136 and the sixth finger electrode 136 in the end point region 104. However, the first endpoint 114 and the fifth endpoint 134 in the endpoint region 104 are physically separated from the third endpoint 124 in the second layer 120; similarly, the second endpoint 118 and the endpoint in the endpoint region 104 The six endpoints 138 are also physically separated from the fourth endpoints 128 in the second layer 120. In addition, the semiconductor capacitor 10 further includes a third conductive connection structure 154 disposed in the end region 104 and electrically connected to the third terminal 124 for providing an electrical connection between the external power source and the semiconductor capacitor 10. The semiconductor capacitor 10 further includes a fourth conductive connection 156 disposed in the end region 104 and electrically connected to the fourth terminal 128 for providing an electrical connection between the external power source and the semiconductor capacitor 10.

熟習該項技藝之人士應知,本較佳實施例中第一導電連接結構150、第二導電連接結構152、第三導電連接結構154與第四導電連接結構156的之數量僅為例示,上述導電連接結構150/152/154/156之數量可依據不同的產品需求調整,例如第一導電連接結構150可以是多個沿著第一端點114與第五端點134分佈的實施形態,同理第二導電連接結構152可以是多個沿著第二端點118與第六端點138分佈的實施形態、第三導電連接結構154可以是多 個沿著第三端點124分佈的實施形態、而第四導電連接結構156可以是多個沿著第四端點128分佈的實施形態。 It is to be understood by those skilled in the art that the number of the first conductive connection structure 150, the second conductive connection structure 152, the third conductive connection structure 154 and the fourth conductive connection structure 156 in the preferred embodiment is merely an example, The number of the conductive connecting structures 150/152/154/156 can be adjusted according to different product requirements. For example, the first conductive connecting structure 150 can be a plurality of embodiments distributed along the first end point 114 and the fifth end point 134. The second conductive connection structure 152 may be a plurality of embodiments distributed along the second end point 118 and the sixth end point 138, and the third conductive connection structure 154 may be multiple The embodiment of the fourth conductive connection structure 156 may be a plurality of embodiments distributed along the fourth end point 128.

更重要的是,第一指狀電極112與第五指狀電極132電性連接至一設置在周邊區106內的第一電極A(示於第5圖),且第三指狀電極122亦電性連接至此第一電極A。換句話說,第一端點114與第五端點134係藉由另外的導線電性連接至設置在周邊區106內的第一電極A,而第三端點124亦藉由另外的導線電性連接至設置在周邊區106內的第一電極A。第二指狀電極116與第六指狀電極136則電性連接至一設置在周邊區106內的第二電極B(亦示於第5圖),且第四指狀電極126亦電性連接至此第二電極B。換句話說,第二端點118與第六端點138係藉由另外的導線電性連接至設置在周邊區106內的第二電極B,而第四端點128亦藉由另外的導線電性連接至設置在周邊區106內的第二電極B。據此,半導體電容10係由兩種導電層以及夾設於其中的絕緣材料所構成。 More importantly, the first finger electrode 112 and the fifth finger electrode 132 are electrically connected to a first electrode A disposed in the peripheral region 106 (shown in FIG. 5), and the third finger electrode 122 is also Electrically connected to the first electrode A. In other words, the first end point 114 and the fifth end point 134 are electrically connected to the first electrode A disposed in the peripheral region 106 by another wire, and the third end point 124 is also electrically connected by another wire. The first electrode A is disposed in the peripheral region 106. The second finger electrode 116 and the sixth finger electrode 136 are electrically connected to a second electrode B disposed in the peripheral region 106 (also shown in FIG. 5), and the fourth finger electrode 126 is also electrically connected. So far the second electrode B. In other words, the second end point 118 and the sixth end point 138 are electrically connected to the second electrode B disposed in the peripheral region 106 by another wire, and the fourth end point 128 is also electrically connected by another wire. The second electrode B is disposed in the peripheral region 106. Accordingly, the semiconductor capacitor 10 is composed of two conductive layers and an insulating material interposed therebetween.

另外,在本較佳實施例之一變化型中,相鄰層110/120/130內的第一指狀電極112至第六指狀電極136在電容區102內可彼此電性隔離,並且藉由另外的導線電性連接周邊區內的不同電極,端視產品需要而定。 In addition, in a variation of the preferred embodiment, the first finger electrode 112 to the sixth finger electrode 136 in the adjacent layer 110/120/130 are electrically isolated from each other in the capacitor region 102, and The different wires in the peripheral zone are electrically connected by additional wires, depending on the needs of the product.

第一指狀電極112與第二指狀電極116係包含一第一材料,而第三指狀電極122、第四指狀電極126、第五指狀電極132與第六指狀電極136則包含第二材料。在本較佳實施例中,第一材料與第二材料係為相同之材料。舉例來說,當第一指狀電極112至第六指狀電極136、第一端點114至第六端點138、以及第一導電連 接結構150至第四導電連接結構156皆藉由內連線製程完成製作時,則第一材料與第二材料可包含相同的金屬材料如銅或鎢,但不限於此。另外在本較佳實施例之一變化型中,第一材料與第二材料可以是不同的材料。舉例來說,當第一層110包其他的IC建構元件時,第一材料可包含多晶矽,而第二材料可包含金屬材料。 The first finger electrode 112 and the second finger electrode 116 comprise a first material, and the third finger electrode 122, the fourth finger electrode 126, the fifth finger electrode 132 and the sixth finger electrode 136 comprise Second material. In the preferred embodiment, the first material and the second material are the same material. For example, when the first finger electrode 112 to the sixth finger electrode 136, the first end point 114 to the sixth end point 138, and the first conductive connection When the connection structure 150 to the fourth conductive connection structure 156 are both completed by an interconnect process, the first material and the second material may comprise the same metal material such as copper or tungsten, but are not limited thereto. Further in a variation of the preferred embodiment, the first material and the second material may be different materials. For example, when the first layer 110 includes other IC building elements, the first material may comprise polysilicon and the second material may comprise a metal material.

根據本第一較佳實施例所提供之半導體電容10,其具有一編織狀結構,不論是在水平方向(即同一層內)以及垂直方向(即不同層內)皆由交錯排列的金屬導線編織而成。因此此一編織狀結構不論在水平方向或垂直方向上都形成電場線,更因此可獲得較高的電容值。 The semiconductor capacitor 10 according to the first preferred embodiment has a braided structure, which is woven by staggered metal wires in both the horizontal direction (i.e., in the same layer) and the vertical direction (i.e., in different layers). Made. Therefore, the woven structure forms an electric field line in both the horizontal direction and the vertical direction, and thus a higher capacitance value can be obtained.

請參閱第1圖至第5圖,第1圖至第5圖為本發明所提供之具有半導體電容一第二較佳實施例之示意圖。首先需注意的是,第一較佳實施例與第二較佳實施例中相同的組成元件係以相同的符號說明,且相同組成元件之細節係可參閱前述之第一較佳實施例,故不予贅述。在第二較佳實施例中,半導體電容10包含一第一層110、一第二層120與一第三層130,且第一層110、第二層120與第三層130之組成元件係與第一較佳實施例相同。第二較佳實施例與第一較佳實施例相同不同之處在於:本較佳實施例所提供之半導體電容10更包含一第四層140。 Please refer to FIG. 1 to FIG. 5 . FIG. 1 to FIG. 5 are schematic diagrams showing a second preferred embodiment of the semiconductor capacitor provided by the present invention. It is to be noted that the same constituent elements of the first preferred embodiment and the second preferred embodiment are denoted by the same reference numerals, and the details of the same constituent elements can be referred to the first preferred embodiment described above. Do not repeat them. In the second preferred embodiment, the semiconductor capacitor 10 includes a first layer 110, a second layer 120, and a third layer 130, and the components of the first layer 110, the second layer 120, and the third layer 130 are The same as the first preferred embodiment. The second preferred embodiment is the same as the first preferred embodiment in that the semiconductor capacitor 10 provided in the preferred embodiment further includes a fourth layer 140.

請參閱第4圖。第四層140係形成於第三層130上,且基本上亦包含絕緣材料,用以提供電性隔離。另外如第4圖所示,第四層140係隨基底100上各區域的限定而包含了電容區102、端點區104與周邊區106。第四層140內更包含複數個第七指狀電極142 與複數個第八指狀電極146,且第七指狀電極142與第八指狀電極146皆設置於電容區102內。熟習該項技藝之人士應知,本較佳實施例中第七指狀電極142與第八指狀電極146之數量僅為例示,故第七指狀電極142與第八指狀電極146之數量可依據不同的產品需求調整。如第4圖所示,第七指狀電極142與第八指狀電極146係沿第二方向D2延伸,是以第七指狀電極142與第八指狀電極146在與基底100水平的方向上彼此平行。第七指狀電極142與第八指狀電極146係交互排列,故彼此叉合設置。更重要的是,第七指狀電極142與第八指狀電極146於電容區102內在實體上與電性上皆彼此分離。 Please refer to Figure 4. The fourth layer 140 is formed on the third layer 130 and also substantially includes an insulating material to provide electrical isolation. In addition, as shown in FIG. 4, the fourth layer 140 includes a capacitor region 102, an end region 104, and a peripheral region 106 as defined by regions on the substrate 100. The fourth layer 140 further includes a plurality of seventh finger electrodes 142 And a plurality of eighth finger electrodes 146, and the seventh finger electrodes 142 and the eighth finger electrodes 146 are disposed in the capacitor region 102. It should be understood by those skilled in the art that the number of the seventh finger electrodes 142 and the eighth finger electrodes 146 in the preferred embodiment is merely an example, so the number of the seventh finger electrodes 142 and the eighth finger electrodes 146 is exemplified. Can be adjusted according to different product needs. As shown in FIG. 4, the seventh finger electrode 142 and the eighth finger electrode 146 extend in the second direction D2, and the seventh finger electrode 142 and the eighth finger electrode 146 are horizontal to the substrate 100. Parallel to each other. The seventh finger electrode 142 and the eighth finger electrode 146 are alternately arranged, so that they are arranged to each other. More importantly, the seventh finger electrode 142 and the eighth finger electrode 146 are physically and electrically separated from each other in the capacitor region 102.

請繼續參閱第4圖。第四層140更包含一第七端點144與一第八端點148。值得注意的是,第七端點144與第八端點148係設置於端點區104內,且如第2圖所示,分別設置於電容區102另外相對兩側之端點區104內。可同時比較第2圖與第4圖,由第2圖與第4圖可知,第七端點144與第三端點124係設置於同一側,而第八端點148與第四端點128設置於同一側。因此,第七端點144與第八端點148在實體上與電性上皆彼此分離。第七端點144與第八端點148皆沿第一方向D1延伸,換句話說第七端點144與第八端點148在與基底100水平的方向上彼此平行。第七端點144係與第七指狀電極142垂直,且第七指狀電極142實體上與電性上連接至第七端點144。同理,第八端點148係與第八指狀電極146垂直,且第八指狀電極146實體上與電性上連接至第八端點148。由此可知,本較佳實施例所提供之第二層120與第四層140具有相同的佈局圖案,但不限於此。 Please continue to see Figure 4. The fourth layer 140 further includes a seventh endpoint 144 and an eighth endpoint 148. It should be noted that the seventh end point 144 and the eighth end point 148 are disposed in the end point area 104, and as shown in FIG. 2, are respectively disposed in the end regions 104 of the opposite sides of the capacitor area 102. The second and fourth figures can be compared at the same time. As can be seen from the second and fourth figures, the seventh end point 144 and the third end point 124 are disposed on the same side, and the eighth end point 148 and the fourth end point 128 are provided. Set on the same side. Therefore, the seventh endpoint 144 and the eighth endpoint 148 are physically and electrically separated from each other. Both the seventh end point 144 and the eighth end point 148 extend in the first direction D1, in other words the seventh end point 144 and the eighth end point 148 are parallel to each other in a direction horizontal to the substrate 100. The seventh end point 144 is perpendicular to the seventh finger electrode 142, and the seventh finger electrode 142 is physically and electrically connected to the seventh end point 144. Similarly, the eighth end point 148 is perpendicular to the eighth finger electrode 146, and the eighth finger electrode 146 is physically and electrically connected to the eighth end point 148. It can be seen that the second layer 120 and the fourth layer 140 provided by the preferred embodiment have the same layout pattern, but are not limited thereto.

請同時參閱第2圖與第4圖。根據本較佳實施例,半導體電容10更包含至少一第三導電連接結構154,設置於端點區104內,用以電性連接第二層120內的第三端點124與第四層140內的第七端點144,藉此第三指狀電極122與第七指狀電極142係於端點區104內電性連接。同理,半導體電容10另包含至少一第四導電連接結構156,設置於端點區104內,用以電性連接第二層120內的第四端點128與第四層140內的第八端點148,藉此第四指狀電極126與第八指狀電極146係於端點區104內電性連接。如前所述,上述導電連接結構150/152/154/156之數量與排列形態係可依據不同的產品需求調整,故不限於此。 Please also refer to Figures 2 and 4. According to the preferred embodiment, the semiconductor capacitor 10 further includes at least one third conductive connection structure 154 disposed in the end region 104 for electrically connecting the third end point 124 and the fourth layer 140 in the second layer 120. The seventh end point 144 is electrically connected to the third finger electrode 122 and the seventh finger electrode 142 in the end point region 104. Similarly, the semiconductor capacitor 10 further includes at least one fourth conductive connection structure 156 disposed in the end point region 104 for electrically connecting the fourth end point 128 in the second layer 120 and the eighth end in the fourth layer 140. The end point 148 is such that the fourth finger electrode 126 and the eighth finger electrode 146 are electrically connected in the end point region 104. As described above, the number and arrangement of the above-mentioned conductive connecting structures 150/152/154/156 can be adjusted according to different product requirements, and thus are not limited thereto.

請參閱第5圖。值得注意的是,為清楚表示指狀電極、端點與導電連接結構之間的空間關係,第5圖中的絕緣材料與基底100係省略而未繪示。根據本較佳實施例,第一指狀電極112、第三指狀電極122、第五指狀電極132與第七指狀電極142皆電性連接至一設置於周邊區106內的第一電極A;而第二指狀電極116、第四指狀電極126、第六指狀電極136與第八指狀電極146則電性連接至一設置於周邊區106內的第二電極B。換句話說,第一端點114、第三端點124、第五端點134與第七端點144係藉由另外的導線電性連接至設置在周邊區106內的第一電極A;同理第二端點118、第四端點128、第六端點138與第八端點148係藉由另外的導線電性連接至設置在周邊區106內的第二電極B。據此,係獲得一由兩種導電層以及夾設於其中的絕緣材料所構成之半導體電容10。 Please refer to Figure 5. It should be noted that in order to clearly show the spatial relationship between the finger electrodes, the end points and the conductive connection structure, the insulating material and the substrate 100 in FIG. 5 are omitted and not shown. According to the preferred embodiment, the first finger electrode 112, the third finger electrode 122, the fifth finger electrode 132 and the seventh finger electrode 142 are electrically connected to a first electrode disposed in the peripheral region 106. A; the second finger electrode 116, the fourth finger electrode 126, the sixth finger electrode 136 and the eighth finger electrode 146 are electrically connected to a second electrode B disposed in the peripheral region 106. In other words, the first end point 114, the third end point 124, the fifth end point 134, and the seventh end point 144 are electrically connected to the first electrode A disposed in the peripheral area 106 by another wire; The second end point 118, the fourth end point 128, the sixth end point 138, and the eighth end point 148 are electrically coupled to the second electrode B disposed within the peripheral region 106 by additional wires. Accordingly, a semiconductor capacitor 10 composed of two conductive layers and an insulating material interposed therebetween is obtained.

另外,在本較佳實施例之一變化型中,相鄰層110/120/130/14內的第一指狀電極112至第八指狀電極146在電容 區102內可彼此電性隔離,並且藉由另外的導線電性連接周邊區內的不同電極,端視產品需要而定。 In addition, in a variation of the preferred embodiment, the first finger electrode 112 to the eighth finger electrode 146 in the adjacent layer 110/120/130/14 are in capacitance The regions 102 can be electrically isolated from one another and electrically connected to different electrodes in the perimeter region by additional wires, depending on product requirements.

根據本第二較佳實施例所提供之半導體電容10,其具有一編織狀結構,不論是在水平方向(即同一層內)以及垂直方向(即不同層內)皆由交錯排列的金屬導線編織而成。因此此一編織狀結構不論在水平方向或垂直方向上都產生電場線,更因此可獲得較高的電容值。 The semiconductor capacitor 10 according to the second preferred embodiment has a braided structure, which is woven by staggered metal wires in both the horizontal direction (i.e., in the same layer) and the vertical direction (i.e., in different layers). Made. Therefore, the woven structure generates electric field lines in both the horizontal direction and the vertical direction, and thus a higher capacitance value can be obtained.

另外需注意的是,本較佳實施例所提供之半導體電容10雖如第5圖所示,是以四層結構作為說明,但熟習該項技藝之人士應知半導體電容10實際上可隨產品需求在垂直基底100的方向上增加膜層。簡單地說,本發明所提供之半導體電容10實際上可包含複數個奇數層110/130與複數個偶數層120/140,且奇數層110/130與偶數層120/140係交錯設置於基底100上。各奇數層110130分別包含複數個第一奇數層指狀電極112/132與複數個第二奇數層指狀電極116/136,且第一奇數層指狀電極112/132與第二奇數層指狀電極116/136皆設置於電容區102內。第一奇數層指狀電極112/132與第二奇數層指狀電極116/136彼此叉合,且在電容區102內不論是實體上或是電性上皆彼此分離。各奇數層110/130內更分別包含一第一奇數層端點114/134與一第二奇數層端點118/138,且第一奇數層端點114/134與第二奇數層端點118/138係設置於端點區104。第一奇數層指狀電極112/132係電性連接至第一奇數層端點114/134;第二奇數層指狀電極116/136係電性連接至第二奇數層端點118/138。更重要的是,本發明所提供之半導體電容10更包含至少一第一奇數層導電連接結構150與至少一第二奇數層導電連接結構152,且第 一奇數層導電連接結構150與第二奇數層導電連接結構152係設置於端點區104內。如第5圖所示,第一奇數層導電連接結構150電性連接奇數層110/130內的各第一奇數層端點114/134;而第二奇數層導電連接結構152則電性連接奇數層110/130內的各第二奇數層端點118/138。各偶數層120140分別包含複數個第一偶數層指狀電極122/142與複數個第二偶數層指狀電極126/146,且第一偶數層指狀電極122/142與第二偶數層指狀電極126/146皆設置於電容區102內。第一偶數層指狀電極122/142與第二偶數層指狀電極126/146彼此叉合,且在電容區102內不論是實體上或是電性上皆彼此分離。各偶數層120/140更包別包含一第一偶數層端點124/144與一第二偶數層端點128/148,且第一偶數層端點124/144與第二偶數層端點128/148皆設置於端點區104。第一偶數層指狀電極122/142係電性連接至第一偶數層端點124/144;而第二偶數層指狀電極126/146係電性連接至第二偶數層端點128/148。更重要的是,本發明所提供之半導體電容10更包含至少一第一偶數層導電連接結構154與一第二偶數層導電連接結構156,且第一偶數層導電連接結構154與第二偶數層導電連接結構156係設置於端點區102。如第5圖所示,第一偶數層導電連接結構154電性連接偶數層120/140內的第一偶數層端點124/144;第二偶數層導電連接結構156電性連接偶數層120/140內的第二偶數層端點128/148。 It should be noted that the semiconductor capacitor 10 provided in the preferred embodiment is a four-layer structure as illustrated in FIG. 5, but those skilled in the art should know that the semiconductor capacitor 10 can actually be used with the product. It is desirable to add a film layer in the direction of the vertical substrate 100. In brief, the semiconductor capacitor 10 provided by the present invention may actually include a plurality of odd-numbered layers 110/130 and a plurality of even-numbered layers 120/140, and odd-numbered layers 110/130 and even-numbered layers 120/140 are interleaved on the substrate 100. on. Each of the odd-numbered layers 110130 includes a plurality of first odd-numbered finger electrodes 112/132 and a plurality of second odd-numbered finger electrodes 116/136, and the first odd-numbered finger electrodes 112/132 and the second odd-numbered fingers The electrodes 116/136 are all disposed within the capacitor region 102. The first odd-numbered finger electrodes 112/132 and the second odd-numbered finger electrodes 116/136 are interdigitated with each other, and are physically or electrically separated from each other within the capacitor region 102. Each odd layer 110/130 further includes a first odd layer endpoint 114/134 and a second odd layer endpoint 118/138, and the first odd layer endpoint 114/134 and the second odd layer endpoint 118 The /138 system is set in the endpoint area 104. The first odd-numbered finger electrodes 112/132 are electrically connected to the first odd-numbered layer ends 114/134; the second odd-numbered finger electrodes 116/136 are electrically connected to the second odd-numbered layer ends 118/138. More importantly, the semiconductor capacitor 10 provided by the present invention further includes at least a first odd-numbered layer conductive connection structure 150 and at least a second odd-numbered layer conductive connection structure 152, and An odd number of conductive connection structures 150 and a second odd number of conductive connection structures 152 are disposed within the end region 104. As shown in FIG. 5, the first odd-numbered conductive connection structure 150 is electrically connected to each of the first odd-numbered layer terminals 114/134 in the odd-numbered layers 110/130; and the second odd-numbered conductive connection structure 152 is electrically connected to the odd-numbered Each second odd layer endpoint 118/138 within layer 110/130. Each of the even layers 120140 includes a plurality of first even-numbered finger electrodes 122/142 and a plurality of second even-numbered finger electrodes 126/146, and the first even-layer finger electrodes 122/142 and the second even-layer fingers Electrodes 126/146 are all disposed within capacitor region 102. The first even-numbered finger electrodes 122/142 and the second even-numbered finger electrodes 126/146 are interdigitated with each other, and are physically or electrically separated from each other within the capacitor region 102. Each even layer 120/140 further includes a first even layer endpoint 124/144 and a second even layer endpoint 128/148, and the first even layer endpoint 124/144 and the second even layer endpoint 128 /148 is set in the endpoint area 104. The first even layer finger electrodes 122/142 are electrically connected to the first even layer end points 124/144; and the second even layer finger electrodes 126/146 are electrically connected to the second even layer end points 128/148 . More importantly, the semiconductor capacitor 10 provided by the present invention further includes at least a first even-numbered conductive connection structure 154 and a second even-numbered conductive connection structure 156, and the first even-numbered conductive connection structure 154 and the second even-numbered layer Conductive connection structure 156 is disposed in end region 102. As shown in FIG. 5, the first even-layer conductive connection structure 154 is electrically connected to the first even-numbered layer ends 124/144 in the even-numbered layers 120/140; the second even-numbered conductive connection structure 156 is electrically connected to the even-numbered layers 120/ The second even layer endpoint 128/148 within 140.

由於各指狀電極與各端點的延伸方向、以及導電連接結構的數量與排列方式以及其他細節係同於前述實施例,故相關細節於此將不再贅述。 Since the extending directions of the respective finger electrodes and the respective end points, and the number and arrangement of the conductive connecting structures and other details are the same as those of the foregoing embodiments, the details will not be described herein.

請仍然參閱第5圖。根據本發明所提供之半導體電容10, 第一奇數層端點114/134與第一偶數層端點124/144係藉由另外的導線電性連接至設置於周邊區106內的第一電極A;而第二奇數層端點118/138與第二偶數層端點128/148則藉由又另外的導線電性連接至設置於周邊區106內的第二電極B。據此,係獲得一由兩種導電層以及夾設於其中的絕緣材料所構成之半導體電容10。 Please still refer to Figure 5. According to the semiconductor capacitor 10 provided by the present invention, The first odd layer end point 114/134 and the first even layer end point 124/144 are electrically connected to the first electrode A disposed in the peripheral region 106 by another wire; and the second odd layer end point 118/ The 138 and second even layer end points 128/148 are electrically coupled to the second electrode B disposed within the peripheral region 106 by additional wires. Accordingly, a semiconductor capacitor 10 composed of two conductive layers and an insulating material interposed therebetween is obtained.

根據本發明所提供之半導體電容10,其具有一編織狀結構,不論是在水平方向(即同一層內)以及垂直方向(即不同層內)皆由交錯排列的金屬導線編織而成。因此此一編織狀結構不論在水平方向或垂直方向上都具有電場線,更因此可獲得較高的電容值。更重要的是,奇數層110/130內的各端點114/118/134/138與偶數層120/140內的各端點124/128/144/148實體上彼此分離,且無任何導電連接結構設置於其中。換句話說,相鄰層中的各端點皆彼此實體上分離,故該等端點之間不會產生電性上的交互作用。 The semiconductor capacitor 10 according to the present invention has a woven structure, which is woven by staggered metal wires in both the horizontal direction (i.e., in the same layer) and the vertical direction (i.e., in different layers). Therefore, the woven structure has electric field lines in both the horizontal direction and the vertical direction, and thus a higher capacitance value can be obtained. More importantly, each of the endpoints 114/118/134/138 within the odd layer 110/130 and the endpoints 124/128/144/148 within the even layer 120/140 are physically separated from each other without any conductive connection. The structure is set in it. In other words, the endpoints in adjacent layers are physically separated from each other, so there is no electrical interaction between the endpoints.

簡單地說,在本發明所提供之半導體電容中,相鄰層內的導電材料之間不再提供導電連接結構作為電性連接的手段。也就是說,在電容區中,相鄰層內的各指狀電極在實體上皆彼此分離;而在端點區中,相鄰層內的各端點在實體上亦彼此分離。因此,本發明所提供之半導體電容可以避免相鄰層內的導電材料發生電磁交互作用與感應效應。 Briefly, in the semiconductor capacitor provided by the present invention, a conductive connection structure is no longer provided between the conductive materials in adjacent layers as a means of electrical connection. That is to say, in the capacitor region, the finger electrodes in the adjacent layers are physically separated from each other; and in the end region, the endpoints in the adjacent layer are physically separated from each other. Therefore, the semiconductor capacitor provided by the present invention can avoid electromagnetic interaction and inductive effects of conductive materials in adjacent layers.

10‧‧‧半導體電容 10‧‧‧Semiconductor capacitance

112‧‧‧第一指狀電極 112‧‧‧First finger electrode

114‧‧‧第一端點 114‧‧‧First endpoint

116‧‧‧第二指狀電極 116‧‧‧second finger electrode

118‧‧‧第二端點 118‧‧‧second endpoint

122‧‧‧第三指狀電極 122‧‧‧ third finger electrode

124‧‧‧第三端點 124‧‧‧ third endpoint

126‧‧‧第四指狀電極 126‧‧‧ fourth finger electrode

128‧‧‧第四端點 128‧‧‧ fourth endpoint

132‧‧‧第五指狀電極 132‧‧‧ fifth finger electrode

134‧‧‧第五端點 134‧‧‧ fifth endpoint

136‧‧‧第六指狀電極 136‧‧‧ sixth finger electrode

138‧‧‧第六端點 138‧‧‧ sixth endpoint

142‧‧‧第七指狀電極 142‧‧‧ seventh finger electrode

144‧‧‧第七端點 144‧‧‧ seventh endpoint

146‧‧‧第八指狀電極 146‧‧‧ eighth finger electrode

148‧‧‧第八端點 148‧‧‧ eighth endpoint

150‧‧‧第一導電連接結構 150‧‧‧First conductive connection structure

154‧‧‧第三導電連接結構 154‧‧‧ Third conductive connection structure

156‧‧‧第四導電連接結構 156‧‧‧fourth conductive connection structure

A‧‧‧第一電極 A‧‧‧first electrode

B‧‧‧第二電極 B‧‧‧second electrode

D1‧‧‧第一方向 D1‧‧‧ first direction

D2‧‧‧第二方向 D2‧‧‧ second direction

Claims (15)

一種半導體電容,包含有:一基底,其上定義有一電容區、一端點區與一周邊區;複數個奇數層,設置於該基底上,且各該奇數層分別包含:複數個第一奇數層指狀電極(first odd finger),設置於該電容區內;複數個第二奇數層指狀電極(second odd finger),設置於該電容區內,該等第一奇數層指狀電極與該等第二奇數層指狀電極係於該電容區內彼此叉合(interdigitated),且實體(physically)上與電性上皆彼此分離;一第一奇數層端點(first odd terminal),設置於該端點區,且該等第一奇數層指狀電極係電性連接至該第一奇數層端點;以及一第二奇數層端點(second odd terminal),設置於該端點區,且該等第二奇數層指狀電極係電性連接至該第二奇數層端點;複數個偶數層,設置於該基底上,且各該偶數層分別包含:複數個第一偶數層指狀電極(first even finger),設置於該電容區內;複數個第二偶數層指狀電極(second even finger),設置於該電容區內,該等第一偶數層指狀電極與該等第二偶數層指狀電極係於該電容區內彼此叉合,且實體上與電性上皆彼此分離;一第一偶數層端點(first even terminal),設置於該端點區,且該等第一偶數層指狀電極係電性連接至該第一偶數 層端點;以及一第二偶數層端點(second even terminal),設置於該端點區,且該等第二偶數層指狀電極係電性連接至該第二偶數層端點;至少一第一奇數層導電連接結構(first odd connecting structure),設置於該端點區內,該第一奇數層導電連接結構電性連接該等奇數層內之該等第一奇數層端點;至少一第二奇數層導電連接結構(second odd connecting structure),設置於該端點區內,該第二奇數層導電連接結構電性連接該等奇數層內之該等第二奇數層端點;至少一第一偶數層導電連接結構(first even connecting structure),設置於該端點區內,該第一偶數層導電連接結構電性連接該等偶數層內之該等第一偶數層端點;以及至少一第二偶數層導電連接結構(second even connecting structure),設置於該端點區內,該第二偶數層導電連接結構電性連接該等偶數層內之該等第二偶數層端點。 A semiconductor capacitor includes: a substrate defining a capacitor region, an end region and a peripheral region; a plurality of odd layers disposed on the substrate, and each of the odd layers respectively includes: a plurality of first odd layer fingers a first odd finger disposed in the capacitor region; a plurality of second odd-numbered finger electrodes disposed in the capacitor region, the first odd-numbered layer finger electrodes and the first The two odd-numbered finger electrodes are interdigitated in the capacitance region, and are physically and electrically separated from each other; a first odd terminal is disposed at the end a dot area, wherein the first odd-numbered finger electrodes are electrically connected to the first odd-numbered layer end point; and a second odd-numbered terminal (second odd terminal) is disposed in the end point area, and the a second odd-numbered finger electrode is electrically connected to the second odd-numbered layer end; a plurality of even-numbered layers are disposed on the substrate, and each of the even-numbered layers respectively includes: a plurality of first even-numbered layer finger electrodes (first Even finger), set in the capacitor area a plurality of second even-numbered finger electrodes disposed in the capacitor region, wherein the first even-numbered finger electrodes and the second even-numbered finger electrodes are interdigitated in the capacitor region And being physically and electrically separated from each other; a first even terminal is disposed in the end region, and the first even layer finger electrodes are electrically connected to the first An even number And a second even terminal is disposed in the end region, and the second even layer finger electrodes are electrically connected to the second even layer end; at least one a first odd-numbered connection structure is disposed in the end region, and the first odd-numbered conductive connection structure is electrically connected to the first odd-numbered layer end points in the odd-numbered layers; at least one a second odd-numbered connection structure is disposed in the end region, and the second odd-numbered conductive connection structure is electrically connected to the second odd-numbered layer end points in the odd-numbered layers; at least one a first even connecting structure disposed in the end region, the first even layer conductive connecting structure electrically connecting the first even layer end points in the even layers; and at least A second even-numbered connection structure is disposed in the end region, and the second even-layer conductive connection structure is electrically connected to the second even-numbered layer end points in the even-numbered layers. 如申請專利範圍第1項所述之半導體電容,其中該等第一奇數層指狀電極與該等第二奇數層指狀電極係沿一第一方向延伸,該等第一偶數層指狀電極與該等第二偶數層指狀電極係沿一第二方向延伸。 The semiconductor capacitor of claim 1, wherein the first odd-numbered finger electrodes and the second odd-numbered finger electrode systems extend in a first direction, the first even-numbered finger electrodes And the second even layer finger electrode lines extend in a second direction. 如申請專利範圍第2項所述之半導體電容,其中該第一方向與該第二方向彼此垂直。 The semiconductor capacitor of claim 2, wherein the first direction and the second direction are perpendicular to each other. 如申請專利範圍第2項所述之半導體電容,其中該等第一奇 數層端點與該等第二奇數層端點係沿該第二方向延伸,該等第一偶數層端點與該等第二偶數層端點係沿該第一方向延伸。 Such as the semiconductor capacitor described in claim 2, wherein the first odd The plurality of end points and the second odd layer end points extend along the second direction, and the first even layer end points and the second even number end points extend in the first direction. .如申請專利範圍第1項所述之半導體電容,其中該等第一奇數層端點、該等第二奇數層端點、該等第一偶數層端點與該等第二偶數層端點在該端點區內彼此隔離。 The semiconductor capacitor of claim 1, wherein the first odd-numbered layer endpoints, the second odd-numbered layer endpoints, the first even-numbered layer endpoints, and the second even-numbered layer endpoints They are isolated from each other within the endpoint area. 如申請專利範圍第1項所述之半導體電容,更包含一第一電極與一第二電極,設置於該周邊區。 The semiconductor capacitor of claim 1, further comprising a first electrode and a second electrode disposed in the peripheral region. 如申請專利範圍第6項所述之半導體電容,其中該等第一奇數層端點與該等第一偶數層端點係電性連接至該第一電極,該等第二奇數層端點與該等第二偶數層端點係電性連接至該第二電極。 The semiconductor capacitor of claim 6, wherein the first odd-numbered layer end points and the first even-numbered layer end points are electrically connected to the first electrode, and the second odd-numbered layer ends The second even layer end points are electrically connected to the second electrode. 一種半導體電容,包含有:一基底,其上定義有一電容區、一端點區與一周邊區;一第一層,設置於該基底上,且該第一層包含有:複數個第一指狀電極,設置於該電容區內;以及複數個第二指狀電極,設置於該電容區內,該等第一指狀電極與該等第二指狀電極係於該電容區內彼此叉合,且實體上與電性上皆彼此分離;一第二層,設置於該基底上,且該第二層包含有:複數個第三指狀電極,設置於該電容區內;以及複數個第四指狀電極,設置於該電容區內,該等第三指狀電極與該等第四指狀電極係於該電容區內彼此叉合,且實體上與電性上皆彼此分離;以及 一第三層,設置於該基底上,且該第三層包含有:複數個第五指狀電極,設置於該電容區內,以及複數個第六指狀電極,設置於該電容區內,該等第五指狀電極與該等第六指狀電極係於該電容區內彼此叉合,且實體上與電性上皆彼此分離,其中該等第一指狀電極與該等第五指狀電極係於該端點區內彼此電性連接、該等第二指狀電極與該等第六指狀電極係於該端點區內彼此電性連接、該等第三指狀電極與該等第四指狀電極係與該等第一指狀電極、該等第二指狀電極、該等第五指狀電極與該等第六指狀電極電性隔離。 A semiconductor capacitor comprising: a substrate defining a capacitor region, an end region and a peripheral region; a first layer disposed on the substrate, and the first layer comprising: a plurality of first finger electrodes And disposed in the capacitor region; and the plurality of second finger electrodes are disposed in the capacitor region, wherein the first finger electrodes and the second finger electrodes are in the capacitor region, and Physically and electrically separated from each other; a second layer disposed on the substrate, and the second layer includes: a plurality of third finger electrodes disposed in the capacitor region; and a plurality of fourth fingers An electrode is disposed in the capacitor region, and the third finger electrodes and the fourth finger electrodes are mutually orthogonal to each other in the capacitor region, and are physically and electrically separated from each other; a third layer is disposed on the substrate, and the third layer includes: a plurality of fifth finger electrodes disposed in the capacitor region, and a plurality of sixth finger electrodes disposed in the capacitor region The fifth finger electrodes and the sixth finger electrodes are mutually orthogonal to each other in the capacitance region, and are physically and electrically separated from each other, wherein the first finger electrodes and the fifth fingers are The electrodes are electrically connected to each other in the end region, the second finger electrodes and the sixth finger electrodes are electrically connected to each other in the end region, and the third finger electrodes and the The fourth finger electrode is electrically isolated from the first finger electrodes, the second finger electrodes, the fifth finger electrodes, and the sixth finger electrodes. 如申請專利範圍第8項所述之半導體電容,其中該等第一指狀電極、該等第二指狀電極、該等第五指狀電極與該等第六指狀電極係彼此平行。 The semiconductor capacitor of claim 8, wherein the first finger electrodes, the second finger electrodes, the fifth finger electrodes, and the sixth finger electrodes are parallel to each other. 如申請專利範圍第9項所述之半導體電容,其中該等第三指狀電極與該等第四指狀電極係垂直於該等第一指狀電極、該等第二指狀電極、該等第五指狀電極與該等第六指狀電極。 The semiconductor capacitor of claim 9, wherein the third finger electrodes and the fourth finger electrodes are perpendicular to the first finger electrodes, the second finger electrodes, and the like a fifth finger electrode and the sixth finger electrodes. 如申請專利範圍第8項所述之半導體電容,其中該等第一指狀電極、該等第三指狀電極與該等第五指狀電極係電性連接至一設置於該周邊區內之第一電極。 The semiconductor capacitor of claim 8, wherein the first finger electrodes, the third finger electrodes and the fifth finger electrodes are electrically connected to a peripheral region. First electrode. 如申請專利範圍第11項所述之半導體電容,其中該等第二指狀電極、該等第四指狀電極與該等第六指狀電極係電性連接至一設置於該周邊區內之第二電極。 The semiconductor capacitor of claim 11, wherein the second finger electrodes, the fourth finger electrodes and the sixth finger electrodes are electrically connected to a peripheral region. Second electrode. 如申請專利範圍第8項所述之半導體電容,其中該等第一指狀電極與該等第二指狀電極包含一第一材料,且該等第三指狀電極、該等第四指狀電極、該等第五指狀電極該等第六指狀電極包含一第二材料。 The semiconductor capacitor of claim 8, wherein the first finger electrodes and the second finger electrodes comprise a first material, and the third finger electrodes, the fourth fingers The electrodes, the fifth finger electrodes, and the sixth finger electrodes comprise a second material. 如申請專利範圍第13項所述之半導體電容,其中該第一材料與該第二材料相同。 The semiconductor capacitor of claim 13, wherein the first material is the same as the second material. 如申請專利範圍第13項所述之半導體電容,其中該第一材料與該第二材料不同。 The semiconductor capacitor of claim 13, wherein the first material is different from the second material.
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TWI707480B (en) * 2019-07-23 2020-10-11 瑞昱半導體股份有限公司 Capacitor structure

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US20040174655A1 (en) * 2003-03-04 2004-09-09 Tse-Lun Tsai Interdigitated capacitor structure for an integrated circuit
US20080128857A1 (en) * 2006-12-05 2008-06-05 Integrated Device Technology, Inc. Multi-Finger Capacitor
TW201324556A (en) * 2011-12-07 2013-06-16 Via Tech Inc Capacitor structure

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US20040174655A1 (en) * 2003-03-04 2004-09-09 Tse-Lun Tsai Interdigitated capacitor structure for an integrated circuit
US20080128857A1 (en) * 2006-12-05 2008-06-05 Integrated Device Technology, Inc. Multi-Finger Capacitor
TW201324556A (en) * 2011-12-07 2013-06-16 Via Tech Inc Capacitor structure

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TWI707480B (en) * 2019-07-23 2020-10-11 瑞昱半導體股份有限公司 Capacitor structure

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