TWI571710B - Method and system for monitoring module actuation of alignment light source device in exposure apparatus - Google Patents

Description

Exposure machine aligns module operation monitoring method and monitoring system in light source device

The invention relates to a monitoring method and a monitoring system for a semiconductor process machine module actuation, and in particular to a module operation monitoring method and a monitoring system in an exposure machine alignment light source device.

In the lithography process, the formation of the pattern on the wafer is dependent on a stable and uniform exposure, and the precise alignment system before exposure has an absolute influence on the pattern formation.

Due to the long-term use of the alignment light source system in the exposure machine, the transmission will generate abnormalities (such as gear wear or accumulated dust), so that the modules in the alignment light source system cannot be in the correct position during operation. And directly affects the amount of light that is directed at the light source. As a result, the reliability of the alignment operation is reduced, resulting in loss of product yield. Therefore, how to immediately detect the positional deviation of the module in the alignment system in the exposure machine is an important issue.

The invention provides a module operation monitoring method and a monitoring system in an exposure machine alignment light source device, which can instantly monitor whether the position of the module in the alignment light source device is offset.

The invention provides a module operation monitoring method in an exposure machine alignment light source device, which comprises the following steps. An alignment light source device is provided. The alignment light source device includes at least one module. The absolute offset value of the module is measured by a non-contact position measurement method. Determine if this absolute offset value exceeds the allowable range. An abnormal signal is generated when the measured absolute offset value exceeds the allowable range.

According to an embodiment of the present invention, in the module operation monitoring method in the above-mentioned exposure machine alignment light source device, the non-contact position measurement method includes an optical position measurement method or a magnetic position measurement method. .

According to an embodiment of the invention, in the method for monitoring the module actuation in the exposure machine alignment light source device, the optical position measurement method comprises a light interruption type measurement method. The light interruption type measurement method includes the following steps. Light is emitted by the light generator, and the light is intended to pass through the positioning holes of the module. The light is received by the light receiver, and the absolute offset value is calculated according to the change in the amount of light of the light.

According to an embodiment of the invention, in the method for monitoring the module actuation in the exposure machine alignment light source device, the optical position measurement method comprises a light reflection type measurement method. The light reflection measurement method includes the following steps. The light scale member is coupled to the module and the light scale member is coupled to the module. Optical light to light by optical encoder The scale member receives the light with position information reflected by the light scale member by the optical encoder. The absolute offset value is calculated by interpreting the position information in the light by the optical encoder.

According to an embodiment of the present invention, in the module operation monitoring method in the exposure machine aligning light source device, the magnetic position measurement method includes the following steps. The magnetic member is coupled to the module and the magnetic member is coupled to the module. The absolute offset value is calculated by sensing the motion of the magnetic member by the magnetic encoder.

According to an embodiment of the present invention, in the module operation monitoring method in the exposure machine illuminating the light source device, the method further includes transmitting the abnormal signal to the alignment light source device to stop the operation of the alignment light source device.

According to an embodiment of the present invention, in the method for monitoring the operation of the module in the light source device, the method further includes transmitting an abnormal signal to the warning device to cause the warning device to send a warning signal.

According to an embodiment of the present invention, in the module operation monitoring method in the exposure machine alignment light source device, the warning device comprises a light emitting device, an acoustic device, an electronic display device or a signal source controller.

According to an embodiment of the present invention, in the module operation monitoring method in the exposure machine alignment light source device, the module includes at least one neutral density filter (NDF) module.

According to an embodiment of the present invention, in the module operation monitoring method in the exposure machine alignment light source device, when the absolute offset value is within an allowable range, the alignment light source device continues to operate.

The invention provides a module actuation monitoring system in an exposure machine alignment light source device, which can be used to monitor at least one module in the alignment light source device, and includes a non-contact position measuring device and a monitoring device. The non-contact position measuring device is used to measure the absolute offset value of the module. The monitoring device is coupled to the non-contact position measuring device and determines whether the absolute offset value exceeds an allowable range. An abnormal signal is generated when the measured absolute offset value exceeds the allowable range.

According to an embodiment of the present invention, in the module actuation monitoring system in the exposure machine alignment light source device, the non-contact position measuring device comprises an optical position measuring device or a magnetic position measuring device. .

According to an embodiment of the invention, in the module actuation monitoring system in the exposure machine alignment light source device, the optical position measuring device comprises a light blocking position measuring device. The light-interrupting position measuring device includes a light generator, a light receiver, and an optical information processor. The light generator emits light that is predetermined to pass through the positioning aperture of the module. The light receiver receives the above light. The optical information processor calculates a change in the amount of light received by the optical receiver to obtain an absolute offset value.

According to an embodiment of the invention, in the module actuation monitoring system in the exposure machine alignment light source device, the optical position measuring device comprises a light reflection type position measuring device. The light reflective position measuring device includes a light graduation member and an optical encoder. The light scale member is coupled to the module, and the light scale member is coupled to the module. The optical encoder emits light to the light scale member, receives light with position information reflected by the light scale member, and calculates an absolute offset value by interpreting position information in the light.

According to an embodiment of the invention, in the module operation monitoring system in the exposure machine alignment light source device, the magnetic position measuring device comprises a magnetic member and a magnetic encoder. Wherein, the magnetic member is connected to the module, and the magnetic member is interlocked with the module. The magnetic encoder senses the motion of the magnetic member to calculate an absolute offset value.

According to an embodiment of the present invention, in the module actuation monitoring system in the exposure machine alignment light source device, the method further includes transmitting an abnormal signal to the alignment light source device to stop the alignment light source device from operating.

According to an embodiment of the present invention, in the module actuation monitoring system in the exposure machine alignment light source device, the warning device is further included and coupled to the monitoring device. The monitoring device can transmit an abnormal signal to the warning device to cause the warning device to send a warning signal.

In an embodiment of the invention, the warning device comprises a light emitting device, an acoustic device, an electronic display device or a signal source controller.

In an embodiment of the invention, the module includes at least one neutral density filter module.

In an embodiment of the invention, the alignment light source device continues to operate when the absolute offset value is within the tolerance range.

Based on the above, in the module operation monitoring method and the monitoring system in the exposure machine alignment light source device of the present invention, since the absolute offset value of the module can be measured by the non-contact position measurement method, it can be instantly Monitor whether the position of the module in the illuminating device is offset, so as to improve the reliability of the alignment operation, thereby improving the product quality. rate.

The above described features and advantages of the invention will be apparent from the following description.

200‧‧‧Aligning light source device

210, 220‧‧‧ filter module

230‧‧‧Light source

212, 222‧‧‧ filter

214, 224‧‧ ‧ turntable

216, 226‧‧‧ drive

2160‧‧‧Motor device

2162‧‧‧Rotary axis

2164, 2166‧‧‧ gears

2168‧‧‧Connecting members

218‧‧‧Positioning holes

300‧‧‧Monitoring system

310‧‧‧ Non-contact position measuring device

320‧‧‧Monitor

330‧‧‧Warning device

400‧‧‧Light occlusion position measuring device

410‧‧‧Light generator

420‧‧‧Light Receiver

430‧‧‧Light Information Processor

500‧‧‧Light reflective position measuring device

510‧‧‧Light scale components

520‧‧‧Optical encoder

600‧‧‧Magnetic position measuring device

610‧‧‧ magnetic components

620‧‧‧Magnetic encoder

L1, L2, L3‧‧‧ rays

S100~S112‧‧‧Steps

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a flow chart showing the operation monitoring of a module in an exposure machine alignment light source device according to an embodiment of the present invention.

2 is a schematic view of an exposure machine aligning light source device according to an embodiment of the present invention.

3 is a schematic diagram of a module actuation monitoring system in an exposure machine aligned with a light source device.

4A is a schematic diagram of a device for monitoring an alignment light source using a light-blocking position measuring device according to an embodiment of the invention.

4B and 4C are schematic views showing the positional relationship between the light and the positioning hole in Fig. 4A.

FIG. 5 is a schematic diagram of a device for monitoring an alignment light source using a light reflective position measuring device according to an embodiment of the invention.

6 is a schematic diagram of a device for monitoring an alignment light source using a magnetic position measuring device according to an embodiment of the invention.

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a flow chart showing the operation monitoring of a module in an exposure machine alignment light source device according to an embodiment of the present invention.

Referring to FIG. 1, first, step S100 is performed to provide an alignment light source device, and the alignment light source device includes at least one module. The alignment light source device is, for example, an alignment light source in the exposure machine. The module includes a neutral density filter module, but the invention is not limited thereto.

Next, in step S102, the absolute offset value of the module is measured by the non-contact position measurement method. Non-contact position measurement methods include optical position measurement or magnetic position measurement. Optical position measurement methods include light interception measurement and light reflection measurement.

The light interruption type measurement method includes the following steps. First, the light is emitted by the light generator, and the light is intended to pass through the positioning holes of the module. Then, the light is received by the light receiver, and the absolute offset value is calculated according to the change in the light amount of the light.

The light reflection measurement method includes the following steps. First, the light scale member is coupled to the module, and the light scale member is coupled to the module. The light is then emitted by the optical encoder to the light scale member. Light with positional information reflected by the light scale member is then received by the optical encoder. Next, the absolute offset value is calculated by interpreting the position information in the light by the optical encoder.

The magnetic position measurement method includes the following steps. First, the magnetic member is coupled to the module, and the magnetic member is coupled to the module. Next, the absolute offset value is calculated by sensing the motion of the magnetic member by the magnetic encoder.

Then, step S104 is performed to determine whether the absolute offset value exceeds the allowable range. When the measured absolute offset value exceeds the allowable range, step S106 is performed to generate an abnormal signal. Those skilled in the art can follow the process requirements The allowable range of the absolute offset value is set and adjusted.

Next, the monitoring method can selectively perform at least one of step S108 and step S100. Step S108 is to transmit the abnormal signal to the alignment light source device to stop the alignment light source device from operating. In step S110, the abnormal signal is transmitted to the warning device, so that the warning device sends a warning signal. The warning device includes a lighting device, an acoustic device, an electronic display device or a signal source controller. Wherein, when the signal source controller detects the abnormal signal, it can provide an open circuit function to stop the illuminating device.

In step S104, when it is determined that the absolute offset value does not exceed the allowable range, step S112 is performed. Step S112 is to continue the operation of the illuminating light source device.

According to the above embodiment, in the module operation monitoring method in the exposure machine alignment light source device, the absolute offset value of the module can be measured by the non-contact position measurement method, so that the alignment can be monitored immediately. Whether the position of the module in the light source device is offset. In this way, when the position of the module in the light source device is displaced, the user can solve the problem immediately, thereby improving the reliability of the alignment operation and improving the yield of the product.

2 is a schematic view of an exposure machine aligning light source device according to an embodiment of the present invention.

Referring to FIG. 2, the object to be monitored in this embodiment is, for example, an alignment light source device 200 of an exposure machine. The alignment light source device 200 includes at least one module. In this embodiment, the module is described by taking the filter modules 210 and 220 as an example. The alignment light source device 200 further includes a light source 230. The filter module 210 and the filter module 220 are, for example, neutral density filter modules. In this embodiment, the alignment light source is mounted The setting 200 is exemplified by two modules having the filter modules 210 and 220, but the present invention is not limited thereto. In other embodiments, the number of modules of the illuminating device 200 may be one or more. Those skilled in the art may adjust the number of modules according to the design requirements of the machine.

The filter module 210 includes a filter 212, a turntable 214, and a driving device 216. Filter 212 is located on turntable 214. The driving device 216 is connected to the turntable 214 and is used to drive the turntable 214. The filter module 220 includes a filter 222, a turntable 224, and a driving device 226. Filter 222 is located on turntable 224. The driving device 226 is connected to the turntable 224 and is used to drive the turntable 224.

The light source 230 is used to emit light L1. Light L1 is intended to pass through filter 212 of filter module 210 and filter 222 in filter module 220. When the filter module 210 or the filter module 220 is offset, part of the light L1 is blocked by the turntable 214 or the turntable 224. Therefore, the amount of light of the light L1 is lowered, which in turn affects the subsequent exposure operation and the quality of the product. In the present embodiment, the light source 230 is, for example, a halogen light source. Further, the light source 230 is, for example, a polarized light source that is different from the exposure light source of the exposure machine.

3 is a schematic diagram of a module actuation monitoring system in an exposure machine aligned with a light source device.

Referring to FIG. 3, the monitoring system 300 is configured to monitor at least one of the modules in the alignment light source device 200 as in FIG. 2, such as the filter module 210 and the filter module 220. The monitoring system 300 includes a non-contact position measuring device 310 and a monitoring device 320.

The non-contact position measuring device 310 measures the absolute offset value of at least one of the filter module 210 and the filter module 220. The non-contact position measuring device 310 includes an optical position measuring device or a magnetic position measuring device (please refer to FIG. 6). The optical position measuring device includes a light blocking type position measuring device (please refer to FIG. 4A) or a light reflecting type position measuring device (refer to FIG. 5).

The monitoring device 320 is coupled to the non-contact position measuring device 310 and determines whether the absolute offset value exceeds the allowable range. For example, when the gears in the filter module 210 or the filter module 220 collapse or accumulate dust, the turntable 214 or the filter module 220 in the filter module 210 may be caused. The position of the turntable 224 is offset. In this case, the allowable range can be set in the following manner. When the gear of the driving device 216 or the driving device 226 is a 48-toothed gear, the angle at which each tooth rotates is 7.5 degrees (360 degrees / 48 teeth). If the offset amount of the turntable 214 or the turntable 224 caused by the gear offset half tooth is set as the allowable range, the angular shift amount of the allowable range can be set to ±3.75 degrees, but the present invention is not limited thereto. Those skilled in the art can set and adjust the allowable range of the absolute offset value according to the process requirements.

When the monitoring device 320 determines that the absolute offset value exceeds the allowable range, the monitoring device 320 generates an abnormal signal. The monitoring device 320 can transmit the abnormal signal to the alignment light source device 200 to stop the alignment light source device 200 from operating.

Additionally, the monitoring system 300 more selectively includes an alerting device 330. The alert device 330 is coupled to the monitoring device 320. The monitoring device 320 can transmit the abnormal signal to the alert device 330, and cause the alert device 330 to send a warning signal to alert the user to The module in the quasi-light source device 200 is shifted. The alert device 330 includes a light emitting device, an acoustic device, an electronic display device, or a signal source controller. Wherein, when the signal source controller detects the abnormal signal, it can provide an open circuit function to stop the illuminating device 200 from operating.

The monitoring device 320 and the warning device 330 can be separate components, respectively, or can be integrated into the illuminating device 200. The person skilled in the art can monitor the device 320 and the warning device 330 according to the design requirements of the machine. The setting method is adjusted.

In addition, the connection relationship between the monitoring device 320, the alerting device 330, and the illuminating device 200 can be such that the monitoring device 320 can transmit the abnormal signal to the alerting device 330 and the illuminating device 200. For example, the monitoring device 320 can simultaneously transmit the abnormal signal to the warning device 330 and the alignment light source device 200, so that the warning device 330 emits an alarm signal while causing the light source device 200 to be aligned and stopped. In another embodiment, the abnormality signal may be transmitted from the monitoring device 320 to the alignment light source device 200 to stop the operation of the alignment light source device 200, and then the abnormal light signal is transmitted to the warning device 330 by the alignment light source device 200. The warning device 330 is caused to emit an alert signal.

Based on the above embodiment, in the monitoring system 300, the absolute offset value of the module can be measured by the non-contact position measuring device 310, so that the filter module 210 in the illuminating device 200 can be monitored in real time. Whether the position of the filter module 220 is offset to improve the reliability of the alignment operation, thereby improving the yield of the product.

Hereinafter, monitoring is exemplified by FIGS. 4A to 4C, 5, and 6. An embodiment of the non-contact position measuring device 310 in system 300.

4A is a schematic diagram of a device for monitoring an alignment light source using a light-blocking position measuring device according to an embodiment of the invention. 4B and 4C are schematic views showing the positional relationship between the light and the positioning hole in Fig. 4A.

Referring to FIG. 2, FIG. 3 and FIG. 4A to FIG. 4C, in this embodiment, the optical occlusion type position measuring device 400 is an absolute offset value measured by the filter module 210 of FIG. The example is explained. The turntable 214 in the filter module 210 further includes a plurality of positioning holes 218. The positioning hole 218 is disposed corresponding to the position of the filter 212, and can assist in determining whether the turntable 214 is turned to a predetermined position. In addition, other components of the filter module 210 have been described in detail in the foregoing, and are denoted by the same reference numerals and will not be described again.

The light-interrupting position measuring device 400 includes a light generator 410, a light receiver 420, and a light information processor 430. The filter module 210 is disposed between the light generator 410 and the light receiver 420.

The light generator 410 emits light L2. Light ray L2 is intended to pass through a locating aperture 218 in turntable 214. The light generator 410 is, for example, a strip laser light generator. The light receiver 420 receives the light L2. The optical information processor 430 is coupled to the light receiver 420 for calculating a change in the amount of light of the light L2 received by the light receiver 420 to obtain an absolute offset value. In this embodiment, the optical information processor 430 is configured to receive the light information transmitted by the optical receiver 420 as long as it can be coupled to the optical receiver 420. The manner in which the optical information processor 430 is disposed is not particularly limited. In this embodiment, the optical information processor 430 is disposed on the optical receiver 420, for example, but the invention is not limited thereto. In other real In an embodiment, the optical information processor 430 can also be disposed inside the light receiver 420.

Referring to FIG. 4B, under normal circumstances, the turntable 214 of the filter module 210 is turned to a predetermined position to pass the light L2. Referring to FIG. 4C, when the turntable 214 of the filter module 210 generates a positioning offset, the turntable 214 may not be able to reach the predetermined position. At this time, part of the light ray L2 is shielded by the turntable 214, so that the amount of light L2 passing through the positioning hole 218 is reduced, and thus the amount of light received by the light receiver 420 is also reduced. Therefore, the optical information processor 430 can calculate the absolute offset value of the turntable 214 according to the change in the amount of light received by the light receiver 420.

FIG. 5 is a schematic diagram of a device for monitoring an alignment light source using a light reflective position measuring device according to an embodiment of the invention. In FIG. 5, the outer casing of the driving device 216 is omitted to facilitate the description of the relationship of the various components inside the driving device 216.

Referring to FIG. 2, FIG. 3 and FIG. 5 simultaneously, in this embodiment, the light reflection type position measuring device 500 is an example of measuring the absolute offset value of the filter module 210 in FIG. . The driving device 216 in the filter module 210 includes a motor device 2160, a rotating shaft 2162, a gear 2164, a gear 2166, and a connecting member 2168. The motor unit 2160 drives the turntable 214 in the filter module 210 via the rotating shaft 2162, the gear 2164, the gear 2166, and the connecting member 2168 to rotate the turntable 214 to a predetermined position. In addition, other components of the filter module 210 have been described in detail in the foregoing, and are denoted by the same reference numerals and will not be described again.

The light reflective position measuring device 500 includes a light scale member 510 and an optical encoder 520. The light scale member 510 is coupled to the gear 2166, and the light scale member 510 is coupled to the turntable 214. Optical encoder 520 emits light L3 to light scale member 510 on. Since the light scale member 510 is rotated in conjunction with the turntable 214 via the gear 2166 and the connecting member 2168, the light scale member 510 can reflect the position of the turntable 214. The optical encoder 520 receives the light L3 with position information reflected by the light scale member 510. The optical encoder 520 calculates the absolute offset value of the dial 214 by interpreting the position information in the light L3. Specifically, the light characteristics of the light ray L3 reflected by each position on the light scale member 510 are not the same, so that the optical encoder 520 can understand the light characteristics of the light ray L3 by the optical encoder 520. The position information (e.g., the angle of rotation) is such that the position information of the turntable 214 in conjunction with the light scale member 510 can be known, and the absolute offset value of the turntable 214 can be calculated.

6 is a schematic diagram of a device for monitoring an alignment light source using a magnetic position measuring device according to an embodiment of the present invention. In FIG. 6, the description of each component in the driving device 216 can be referred to FIG. 5, and details are not described herein again.

Referring to FIG. 2, FIG. 3 and FIG. 6, in this embodiment, the magnetic position measuring device 600 is an example of measuring the absolute offset value of the filter module 210 in FIG. In addition, other components of the filter module 210 have been described in detail in the foregoing, and are denoted by the same reference numerals and will not be described again.

The magnetic position measuring device 600 includes a magnetic member 610 and a magnetic encoder 620. The magnetic member 610 is coupled to the gear 2166 and the magnetic member 610 is coupled to the turntable 214. The magnetic encoder 620 senses the motion of the magnetic member 610 to calculate an absolute offset value. Specifically, since the magnetic member 610 is rotated in conjunction with the turntable 214 via the gear 2166 and the connecting member 2168, the position information (eg, the angle of rotation) generated by the magnetic member 610 is sensed by the magnetic encoder 620. Know and magnetic The position information of the turntable 214 that the force member 610 is interlocked to calculate the absolute offset value of the turntable 214.

In the above embodiment, the light-blocking position measuring device 400 shown in FIG. 4A, the light-reflecting position measuring device 500 shown in FIG. 5, and the magnetic-type position measuring device 600 shown in FIG. 6 are The absolute offset value of the filter module 210 in FIG. 2 is measured as an example. However, those skilled in the art can refer to the above embodiment to use the light-interrupting position measuring device 400 and light. The reflective position measuring device 500 or the magnetic position measuring device 600 is used to measure the absolute offset value of the filter module 220 actuation.

Further, the light-interrupting position measuring device 400, the light-reflecting position measuring device 500, and the magnetic-type position measuring device 600 can be applied to the monitoring system 300 of FIG. For example, the light blocking position measuring device 400, the light reflective position measuring device 500 or the magnetic position measuring device 600 can be coupled to the monitoring device 320. The monitoring device 320 can be used to determine whether the absolute offset value calculated by the light blocking position measuring device 400, the light reflective position measuring device 500, or the magnetic position measuring device 600 exceeds the allowable range. When the absolute offset value exceeds the allowable range, the monitoring device 320 generates an abnormal signal to instantly monitor whether the position of the module in the alignment light source device is offset.

In summary, the exposure mechanism of the above embodiment is used to align the module operation monitoring method and the monitoring system in the light source device, and the absolute offset value of the module can be measured by the non-contact position measurement method. It can instantly monitor whether the position of the module in the illuminating device is offset, so as to improve the reliability of the alignment operation, thereby improving the product quality. rate.

Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

S100~S112‧‧‧ step label

Claims (20)

A method for monitoring the operation of a module in an exposure machine aligned with a light source device, comprising: providing an alignment light source device, wherein the alignment light source device comprises at least one module; and measuring by a non-contact position measurement method An absolute offset value of the at least one module; and determining whether the absolute offset value exceeds an allowable range, and when the absolute offset value exceeds the allowable range, generating an abnormal signal. The method according to claim 1, wherein the non-contact position measurement method comprises an optical position measurement method or a magnetic position measurement method. The method for monitoring the operation of the module in the light source device according to the second aspect of the invention, wherein the optical position measurement method comprises a light interception measurement method, and the light interception measurement method The method includes: transmitting, by a light generator, a light that is predetermined to pass through a positioning hole of the at least one module; and calculating the absolute offset value by a change in the amount of light of the light received by the light receiver . The method for monitoring the operation of a module in an exposure machine according to claim 2, wherein the optical position measurement method comprises a light reflection type measurement method, and the light reflection type measurement method comprises Connecting a light scale member to the at least one module, and the light scale member is coupled to the at least one module; emitting a light to the light scale member by an optical encoder; Receiving, by the optical encoder, the light with a position information reflected by the optical scale member; and calculating the absolute offset value by interpreting the position information in the light by the optical encoder. The method for monitoring the operation of the module in the light source device according to the second aspect of the invention, wherein the magnetic position measurement method comprises: connecting a magnetic member to the at least one module, and the magnetic force The member is coupled to the at least one module; and the absolute offset value is calculated by sensing a motion of the magnetic member by a magnetic encoder. The method for monitoring the operation of the module in the light source device according to the first aspect of the invention, further comprising: transmitting the abnormal signal to the alignment light source device to stop the operation of the alignment light source device. The method for monitoring the operation of the module in the light source device according to the first aspect of the invention, further comprising: transmitting the abnormal signal to a warning device, so that the warning device sends a warning signal. The method for monitoring the operation of the module in the light source device according to the invention of claim 7, wherein the warning device comprises a light emitting device, an acoustic device, an electronic display device or a signal source controller. The method according to claim 1, wherein the at least one module comprises at least one neutral density filter module. The method for monitoring the operation of the module in the exposure apparatus according to claim 1, wherein the alignment light source device continues to operate when the absolute offset value is within the allowable range. An exposure monitoring system for aligning a module in a light source device for monitoring at least one module in an illuminating device, and comprising: a non-contact position measuring device for measuring the at least one module And an absolute offset value; and a monitoring device coupled to the non-contact position measuring device, and determining whether the absolute offset value exceeds an allowable range, and when the absolute offset value exceeds the allowable range, generating a Abnormal signal. The exposure machine of claim 11, wherein the non-contact position measuring device comprises an optical position measuring device or a magnetic position measuring device. The exposure machine of claim 12, wherein the optical position measuring device comprises a light blocking position measuring device, the light blocking position. The measuring device comprises: a light generator that emits a light, the light is intended to pass through a positioning hole of the at least one module; an optical receiver receives the light; and an optical information processor calculates the optical receiver The received light amount of the light changes to obtain the absolute offset value. The exposure machine of claim 12 is directed to the module actuation monitoring system in the light source device, wherein the optical position measuring device comprises a light reflective position measuring device, and the light reflective position measuring device The device includes: An optical scale member coupled to the at least one module, wherein the light scale member is coupled to the at least one module; and an optical encoder that emits a light to the light scale member for receiving reflection by the light scale member The light with a positional information is calculated by interpreting the position information in the light. The exposure machine of claim 12 is directed to the module actuation monitoring system in the light source device, wherein the magnetic position measuring device comprises: a magnetic member connected to the at least one module, and the magnetic force The member is coupled to the at least one module; and a magnetic encoder that senses the motion of the magnetic member to calculate the absolute offset value. For example, the exposure machine of claim 11 is directed to the module actuation monitoring system in the light source device, and further includes transmitting the abnormal signal to the alignment light source device to stop the alignment light source device from operating. The module operation monitoring system in the illuminating device of the illuminating device according to claim 11 further includes a warning device coupled to the monitoring device, and further comprising transmitting the abnormal signal to the warning device. The warning device is caused to give a warning signal. The exposure machine according to claim 17 is directed to the module actuation monitoring system in the light source device, wherein the warning device comprises a lighting device, an acoustic device, an electronic display device or a signal source controller. The exposure machine of claim 11, wherein the at least one module comprises at least one neutral density filter module. The exposure machine according to claim 11 is directed to the module actuation monitoring system in the light source device, wherein the alignment light source device continues to operate when the absolute offset value is within the allowable range.