TWI570729B - Memory device and reading method thereof - Google Patents

Memory device and reading method thereof Download PDF

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TWI570729B
TWI570729B TW104111546A TW104111546A TWI570729B TW I570729 B TWI570729 B TW I570729B TW 104111546 A TW104111546 A TW 104111546A TW 104111546 A TW104111546 A TW 104111546A TW I570729 B TWI570729 B TW I570729B
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bit lines
line
voltage
page
bit
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TW104111546A
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TW201637017A (en
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張國彬
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旺宏電子股份有限公司
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記憶體裝置與其讀取方法 Memory device and its reading method

本案是有關於一種記憶體裝置與其讀取方法。 This case is related to a memory device and its reading method.

在記憶體讀取過程中,有可能會發生讀取干擾誤差(read disturbance error)。讀取干擾誤差是指,由於記憶體晶體電晶體之閘極電壓太高,使得通道的電子或源極/汲極內的電子/電洞被吸引到浮動閘內,造成儲存的資料改變(由1變成0)。比如,被選頁(page)正在被讀取時,施加至未讀取頁電晶體閘極之電壓如果太高的話,可能會對其他未被讀取頁造成讀取干擾誤差。如果讀取次數高達數千或數百萬次的話,則讀取干擾誤差可能變成更嚴重。 During the memory reading process, a read disturbance error may occur. The read interference error means that the gate voltage of the memory crystal transistor is too high, so that the electrons/holes in the electron or source/drain of the channel are attracted into the floating gate, causing the stored data to be changed (by 1 becomes 0). For example, when the selected page is being read, if the voltage applied to the unread page transistor gate is too high, it may cause read disturb errors to other unread pages. If the number of reads is thousands or millions of times, the read interference error may become more severe.

故而,本案提出一種記憶體裝置與其讀取方法,其能減少讀取干擾誤差。 Therefore, the present invention proposes a memory device and a reading method thereof, which can reduce read interference errors.

本案係有關於一種記憶體裝置,包括一偶源極線(耦接至複數偶位元線)與一奇源極線(耦接至複數奇位元線),但此偶數源極線與奇數源極線彼此電性絕緣。 The present invention relates to a memory device comprising an even source line (coupled to a complex even bit line) and an odd source line (coupled to a plurality of odd bit lines), but the even source line and the odd number The source lines are electrically insulated from each other.

本案係有關於另一種記憶體裝置,包括一偶接地選 擇線(耦接至複數偶位元線)與一奇接地選擇線(耦接至複數奇位元線),但該偶接地選擇線與該奇接地選擇線彼此電性絕緣。 This case is about another memory device, including an even grounding option. The line selection (coupled to the complex even bit line) and the odd ground selection line (coupled to the complex odd bit line), but the even ground selection line and the odd ground selection line are electrically insulated from each other.

本案係有關於一種記憶體裝置之讀取方法,在讀取時,利用強迫偏壓或自我升壓,來降低未讀取/未被選之記憶體晶胞之閘極-源極跨壓,以減少讀取干擾誤差的出現。 The present invention relates to a method for reading a memory device, which uses forced bias or self-boost to reduce the gate-source voltage across unread/unselected memory cells during reading. To reduce the occurrence of read interference errors.

根據本案一實施例,提出一種記憶體裝置,包括:複數導電堆疊結構,包括至少一串選擇線、複數字元線與至少一接地選擇線;複數記憶體晶胞,形成於該些導電堆疊結構之內;複數位元線,形成於該些導電堆疊結構之上;以及至少一奇共同源極線,與至少一偶共同源極線,形成於該些導電堆疊結構之上。該奇共同源極線耦接至該些位元線之複數奇位元線,該偶共同源極線耦接至該些位元線之複數偶位元線。 According to an embodiment of the present invention, a memory device is provided, including: a plurality of conductive stack structures including at least one string of select lines, complex digital lines, and at least one ground select line; and a plurality of memory cells formed on the conductive stack structures And a plurality of bit lines formed on the conductive stack structures; and at least one odd common source line and at least one even source line formed on the conductive stack structures. The odd common source line is coupled to the plurality of odd bit lines of the bit lines, and the even common source lines are coupled to the complex even bit lines of the bit lines.

根據本案另一實施例,提出一種記憶體裝置,包括:複數導電堆疊結構,包括至少一串選擇線、複數字元線、至少一奇接地選擇線與至少一偶接地選擇線;複數記憶體晶胞,形成於該些導電堆疊結構之內;複數位元線,形成於該些導電堆疊結構之上;以及至少一共同源極線,形成於該些導電堆疊結構之上。該奇接地選擇線耦接至該些位元線之複數奇位元線,該偶接地選擇線耦接至該些位元線之複數偶位元線。 According to another embodiment of the present invention, a memory device is provided, comprising: a plurality of conductive stack structures including at least one string of select lines, complex digital element lines, at least one odd ground selection line, and at least one even ground selection line; a plurality of memory crystals Forming cells within the conductive stack structure; complex bit lines formed over the conductive stack structures; and at least one common source line formed over the conductive stack structures. The odd ground selection line is coupled to the plurality of odd bit lines of the bit lines, and the even ground selection lines are coupled to the complex even bit lines of the bit lines.

根據本案又一實施例,提出一種記憶體裝置之讀取方法。該記憶體裝置包括複數第一位元線,複數第二位元線,耦接至該些第一位元線之至少一第一共同源極線,與耦接至該些第 二位元線之至少一第二共同源極線。於讀取一被選頁之該些第一位元線時:施加一參考電壓至該被選頁之該第一共同源極線;施加一位元線電壓至該被選頁之該些第一位元線;以及施加該位元線電壓與一另一參考電壓兩者之任一者至該被選頁之該些第二位元線與該第二共同源極線,該位元線電壓高於該參考電壓,該另一參考電壓高於該參考電壓,使得該被選頁之該些第一位元線上之複數記憶體晶胞之一第一跨壓高於該被選頁之該些第二位元線上之複數記憶體晶胞之一第二跨壓。對於一未選頁:施加該參考電壓至該未選頁之該第一共同源極線;施加該位元線電壓至該未選頁之該些第一位元線;以及施加該位元線電壓與該另一參考電壓兩者之任一者至該未選頁之該些第二位元線與該第二共同源極線,使得該未選頁之該些第一位元線上之複數記憶體晶胞之該第一跨壓高於該未選頁之該些第二位元線上之複數記憶體晶胞之該第二跨壓。 According to still another embodiment of the present invention, a method of reading a memory device is proposed. The memory device includes a plurality of first bit lines, a plurality of second bit lines coupled to the at least one first common source line of the first bit lines, and coupled to the At least one second common source line of the two bit lines. When reading the first bit lines of a selected page: applying a reference voltage to the first common source line of the selected page; applying a bit line voltage to the selected page a bit line; and applying any one of the bit line voltage and a further reference voltage to the second bit line of the selected page and the second common source line, the bit line The voltage is higher than the reference voltage, and the other reference voltage is higher than the reference voltage, such that one of the plurality of memory cells on the first bit lines of the selected page has a first voltage across the selected page. One of the plurality of memory cells on the second bit line is second across the voltage. For a unselected page: applying the reference voltage to the first common source line of the unselected page; applying the bit line voltage to the first bit lines of the unselected page; and applying the bit line And any one of the voltage and the another reference voltage to the second bit line of the unselected page and the second common source line, such that the plurality of first bit lines of the unselected page The first voltage across the memory cell is higher than the second voltage of the plurality of memory cells on the second bit lines of the unselected page.

根據本案更一實施例,提出一種記憶體裝置之讀取方法。該記憶體裝置包括複數第一位元線,複數第二位元線,耦接至該些第一位元線與該些第二位元線之至少一共同源極線,控制該些第一通道之一第一接地選擇線,控制該些第二通道之一第二接地選擇線。於讀取一被選頁之該些第一位元線時,施加一參考電壓至該被選頁之該共同源極線;施加一位元線電壓至該被選頁之該些第一位元線;以及施加該位元線電壓與一另一參考電壓兩者之任一者至該被選頁之該些第二位元線,該位元線電壓高於 該參考電壓,該另一參考電壓高於該參考電壓,施加該另一參考電壓至該第一接地選擇線以導通該些第一位元線上之複數接地選擇開關,施加一關閉電壓至該第二接地選擇線以關閉該些第二位元線上之複數接地選擇開關,使得該被選頁之該些第一位元線上之複數記憶體晶胞之一第一跨壓高於該被選頁之該些第二位元線上之複數記憶體晶胞之一第二跨壓。對於一未選頁:施加該參考電壓至該未選頁之該共同源極線;施加該位元線電壓至該未選頁之該些第一位元線;以及施加該位元線電壓與該另一參考電壓兩者之任一者至該未選頁之該些第二位元線,施加該另一參考電壓至該第一接地選擇線以導通該未選頁之該些第一通道上之複數接地選擇開關,施加該關閉電壓至該第二接地選擇線以關閉該未選頁之該些第二通道上之複數接地選擇開關,使得該未選頁之該些第一位元線上之複數記憶體晶胞之該第一跨壓高於該未選頁之該些第二位元線上之複數記憶體晶胞之該第二跨壓。 According to a further embodiment of the present invention, a method of reading a memory device is proposed. The memory device includes a plurality of first bit lines, and a plurality of second bit lines coupled to the first bit lines and at least one common source line of the second bit lines to control the first One of the channels is a first ground selection line that controls one of the second channels and a second ground selection line. Applying a reference voltage to the common source line of the selected page when reading the first bit lines of a selected page; applying a bit line voltage to the first bits of the selected page And applying any one of the bit line voltage and a further reference voltage to the second bit lines of the selected page, the bit line voltage being higher than The reference voltage, the other reference voltage is higher than the reference voltage, applying the another reference voltage to the first ground selection line to turn on the plurality of ground selection switches on the first bit lines, and applying a shutdown voltage to the first Two ground selection lines to turn off the plurality of ground selection switches on the second bit lines such that one of the plurality of memory cells on the first bit lines of the selected page has a first voltage across the selected page One of the plurality of memory cells on the second bit line is second across the voltage. For a unselected page: applying the reference voltage to the common source line of the unselected page; applying the bit line voltage to the first bit lines of the unselected page; and applying the bit line voltage and And applying any one of the other reference voltages to the second bit lines of the unselected page, applying the another reference voltage to the first ground selection line to turn on the first channels of the unselected page a plurality of ground selection switches, applying the shutdown voltage to the second ground selection line to turn off the plurality of ground selection switches on the second channels of the unselected page, such that the first bit lines of the unselected page The first voltage across the plurality of memory cells is higher than the second voltage of the plurality of memory cells on the second bit lines of the unselected page.

為了對本案之上述及其他方面有更佳的瞭解,下文特舉實施例,並配合所附圖式,作詳細說明如下: In order to better understand the above and other aspects of the present invention, the following specific embodiments, together with the drawings, are described in detail below:

100‧‧‧記憶體裝置 100‧‧‧ memory device

BL1-BL4‧‧‧位元線 BL1-BL4‧‧‧ bit line

SSL0-SSL3‧‧‧串選擇線 SSL0-SSL3‧‧‧ string selection line

GSL‧‧‧接地選擇線 GSL‧‧‧ Grounding selection line

WL1-WLN‧‧‧字元線 WL1-WLN‧‧‧ character line

CSL_odd‧‧‧奇共同源極線 CSL_odd‧‧‧Common source line

CSL_even‧‧‧偶共同源極線 CSL_even‧‧‧couple common source line

110‧‧‧基板 110‧‧‧Substrate

120‧‧‧介電層 120‧‧‧ dielectric layer

130‧‧‧絕緣層 130‧‧‧Insulation

140‧‧‧記憶體晶胞 140‧‧‧ memory cell

I1-I2‧‧‧電流路徑 I1-I2‧‧‧ current path

T01-TG1、T02-TG2、T03-TG3、T04-TG4‧‧‧電晶體 T01-TG1, T02-TG2, T03-TG3, T04-TG4‧‧‧O crystal

BL1’-BL4’‧‧‧位元線 BL1’-BL4’‧‧‧ bit line

T01’-TG1’、T02’-TG2’、T03’-TG3’、T04’-TG4’‧‧‧電晶體 T01'-TG1', T02'-TG2', T03'-TG3', T04'-TG4'‧‧‧ transistor

400‧‧‧記憶體裝置 400‧‧‧ memory device

GSL_odd‧‧‧奇接地選擇線 GSL_odd‧‧‧odd ground selection line

GSL_even‧‧‧偶接地選擇線 GSL_even‧‧‧ even ground selection line

CSL‧‧‧共同源極線 CSL‧‧‧Common source line

410‧‧‧基板 410‧‧‧Substrate

420‧‧‧介電層 420‧‧‧ dielectric layer

430‧‧‧絕緣層 430‧‧‧Insulation

440‧‧‧記憶體晶胞 440‧‧‧ memory cell

I3-I4‧‧‧電流路徑 I3-I4‧‧‧ current path

第1圖顯示根據本案第一實施例之記憶體裝置之一部份之剖面圖。 Fig. 1 is a cross-sectional view showing a portion of a memory device according to a first embodiment of the present invention.

第2A圖與第2B圖顯示根據本案第一實施例之一讀取方法(強迫偏壓(force-bias))之示意圖。 2A and 2B are diagrams showing a reading method (force-bias) according to the first embodiment of the present invention.

第3A圖與第3B圖顯示根據本案第一實施例之另一讀取方法(自我升壓(self-boosting))之示意圖。 3A and 3B show a schematic diagram of another reading method (self-boosting) according to the first embodiment of the present invention.

第4圖顯示根據本案第二實施例之記憶體裝置之一部份之剖面圖。 Figure 4 is a cross-sectional view showing a portion of a memory device in accordance with a second embodiment of the present invention.

第5A圖與第5B圖顯示根據本案第二實施例之一讀取方法(強迫偏壓)之示意圖。 5A and 5B are views showing a reading method (forced bias) according to a second embodiment of the present invention.

第6A圖與第6B圖顯示根據本案第二實施例之另一讀取方法(自我升壓)之示意圖。 6A and 6B are diagrams showing another reading method (self-boosting) according to the second embodiment of the present invention.

本說明書的技術用語係參照本技術領域之習慣用語,如本說明書對部分用語有加以說明或定義,該部分用語之解釋係以本說明書之說明或定義為準。本揭露之各個實施例分別具有一或多個技術特徵。在可能實施的前提下,本技術領域具有通常知識者可選擇性地實施任一實施例中部分或全部的技術特徵,或者選擇性地將這些實施例中部分或全部的技術特徵加以組合。 The technical terms of the present specification refer to the idioms in the technical field, and some of the terms are explained or defined in the specification, and the explanation of the terms is based on the description or definition of the specification. Various embodiments of the present disclosure each have one or more of the technical features. Those skilled in the art can selectively implement some or all of the technical features of any embodiment, or selectively combine some or all of the technical features of these embodiments, where possible.

現請參考第1圖,其顯示根據本案第一實施例之記憶體裝置100之一部份之剖面圖。如第1圖所示,根據本案第一實施例之記憶體裝置100包括:位元線BL1-BL3、串選擇線(string select line,SSL)SSL0-SSL3、接地選擇線GSL(ground select line)、字元線WL1-WLN(N為正整數)、奇共同源極線(common source line)CSL_odd、偶共同源極線CSL_even、基板110、介電層120、 多個絕緣層130與多個記憶體晶胞140。 Referring now to Figure 1, there is shown a cross-sectional view of a portion of a memory device 100 in accordance with a first embodiment of the present invention. As shown in FIG. 1, the memory device 100 according to the first embodiment of the present invention includes: a bit line BL1-BL3, a string select line (SSL) SSL0-SSL3, and a ground select line (GSL). , word line WL1-WLN (N is a positive integer), odd common source line CSL_odd, even common source line CSL_even, substrate 110, dielectric layer 120, A plurality of insulating layers 130 and a plurality of memory cells 140.

串選擇線SSL0與字元線WL1之間夾有絕緣層130;相鄰兩字元線之間也夾有絕緣層130;以及字元線WLN與接地選擇線GSL之間也夾有絕緣層130。 An insulating layer 130 is interposed between the string selection line SSL0 and the word line WL1; an insulating layer 130 is also interposed between the adjacent two word lines; and an insulating layer 130 is also interposed between the word line WLN and the ground selection line GSL. .

絕緣層130比如包括層間介電材質,如二氧化矽(silicon dioxide),或者其他具有介電常數之材質等。 The insulating layer 130 includes, for example, an interlayer dielectric material such as silicon dioxide or other materials having a dielectric constant.

上述結構形成於介電層120之上,而介電層120則形成於基板110之上。 The above structure is formed on the dielectric layer 120, and the dielectric layer 120 is formed on the substrate 110.

此外,記憶體晶胞140,其可用於儲存資料,比如包括多層隧道結構(multilayer tunneling structure)、介電電荷捕捉層(dielectric charge trapping layer)與阻擋層(blocking layer)。 In addition, the memory unit cell 140, which can be used to store data, includes, for example, a multilayer tunneling structure, a dielectric charge trapping layer, and a blocking layer.

在第1圖之記憶體裝置100中,共同源極線CSL包括奇共同源極線CSL_odd與偶共同源極線CSL_even,其中,奇共同源極線CSL_odd耦接至所有奇位元線(如BL1,BL3…);而偶共同源極線CSL_even耦接至所有偶位元線(如BL2,…)。 In the memory device 100 of FIG. 1, the common source line CSL includes an odd common source line CSL_odd and an even common source line CSL_even, wherein the odd common source line CSL_odd is coupled to all odd bit lines (such as BL1). , BL3...); and the even common source line CSL_even is coupled to all even bit lines (eg BL2, ...).

第1圖之記憶體裝置100中,該串選擇線、該些字元線與該接地選擇線堆疊成複數導電堆疊結構,其中,比如,串選擇線與該些字元線之第一字元線群組(如字元線WL1、WL2…)堆疊成一第一導電堆疊結構,而接地選擇線與該些字元線之第二字元線群組(如字元線WLN…)堆疊成第二導電堆疊結構。而記憶體裝置100之該些記憶體晶胞140則是形成該些導電堆疊結構之內,比如,該些記憶體晶胞140形成於該些導電堆疊之側壁 (sidewall)之上。該些位元線形成於該些導電堆疊結構之上。 In the memory device 100 of FIG. 1 , the string selection lines, the word lines and the ground selection lines are stacked in a plurality of conductive stack structures, wherein, for example, the string selection lines and the first characters of the word lines The line groups (eg, word lines WL1, WL2, . . . ) are stacked into a first conductive stack structure, and the ground selection line and the second word line group of the word lines (eg, word line WLN...) are stacked into a first Two conductive stack structures. The memory cells 140 of the memory device 100 are formed within the conductive stack structure. For example, the memory cells 140 are formed on the sidewalls of the conductive stacks. Above (sidewall). The bit lines are formed over the conductive stack structures.

奇共同源極線CSL_odd絕緣於偶共同源極線CSL_even。奇共同源極線CSL_odd與偶共同源極線CSL_even形成於該些導電堆疊結構之上。 The odd common source line CSL_odd is insulated from the even common source line CSL_even. The odd common source line CSL_odd and the even common source line CSL_even are formed on the conductive stack structures.

不論是哪個頁被選擇,由奇位元線所傳來的串電流(string current)流經通道後(亦即,流經一相關導電堆疊結構),流向奇共同源極線CSL_odd,如電流路徑I1所示。相同地,由偶位元線所傳來的串電流流經通道後(亦即,流經一相關導電堆疊結構),流向偶共同源極線CSL_even,如電流路徑I2所示。 Regardless of which page is selected, the string current transmitted by the odd bit line flows through the channel (ie, through an associated conductive stack structure) and flows to the odd common source line CSL_odd, such as the current path. I1 is shown. Similarly, the string currents transmitted by the even bit lines flow through the channel (i.e., through an associated conductive stack structure) and flow to the even common source line CSL_even as shown by current path I2.

現請參考第2A圖與第2B圖,其顯示根據本案第一實施例之一讀取方法(強迫偏壓(force-bias))之示意圖。第2A圖顯示根據本案第一實施例之強迫偏壓讀取方法對選擇頁之操作示意圖。第2B圖顯示根據本案第一實施例之強迫偏壓讀取方法對未選擇頁之操作示意圖。 Referring now to Figures 2A and 2B, there is shown a schematic diagram of a reading method (force-bias) according to a first embodiment of the present invention. Fig. 2A is a view showing the operation of the forced page reading method according to the first embodiment of the present invention on the selection page. Fig. 2B is a view showing the operation of the forced bias reading method according to the first embodiment of the present invention on the unselected page.

在第2A圖中,一頁至少包括位元線BL1-BL4,每一條位元線BL1-BL4則分別耦接多個電晶體T01-TG1、T02-TG2、T03-TG3、T04-TG4。當然,本案並不受限於圖示所顯示之位元線或電晶體之數量。 In FIG. 2A, one page includes at least bit lines BL1-BL4, and each of the bit lines BL1-BL4 is coupled to a plurality of transistors T01-TG1, T02-TG2, T03-TG3, T04-TG4, respectively. Of course, the present case is not limited to the number of bit lines or transistors shown in the figures.

電晶體T01-T04之閘極皆耦接至串選擇線SSL(所以,電晶體T01-T04也可稱為串選擇開關);電晶體T11-T14之閘極皆耦接至第一字元線WL1;電晶體T21-T24之閘極皆耦接至第二字元線WL2;電晶體T31-T34之閘極皆耦接至第三字元線 WL3;…;電晶體TN1-TN4之閘極皆耦接至第N字元線WLN;電晶體TG1-TG4之閘極皆耦接至接地選擇線GSL(所以,電晶體TG1-TG4也可稱為接地選擇開關)。 The gates of the transistors T01-T04 are all coupled to the string selection line SSL (so, the transistor T01-T04 can also be referred to as a string selection switch); the gates of the transistors T11-T14 are all coupled to the first word line WL1; the gates of the transistors T21-T24 are all coupled to the second word line WL2; the gates of the transistors T31-T34 are all coupled to the third word line WL3;...; the gates of the transistors TN1-TN4 are all coupled to the Nth word line WLN; the gates of the transistors TG1-TG4 are all coupled to the ground selection line GSL (so, the transistors TG1-TG4 can also be called Select the switch for grounding).

第2B圖之耦接情況類似。另一頁至少包括位元線BL1’-BL4’,每一條位元線BL1’-BL4’則分別耦接多個電晶體T01’-TG1’、T02’-TG2’、T03’-TG3’、T04’-TG4’。電晶體T01’-TG1’(串選擇開關)之閘極皆耦接至串選擇線SSL;電晶體T11’-T14’之閘極皆耦接至第一字元線WL1;電晶體T21’-T24’之閘極皆耦接至第二字元線WL2;電晶體T31’-T34’之閘極皆耦接至第三字元線WL3;…;電晶體TN1’-TN4’之閘極皆耦接至第N字元線WLN;電晶體TG1’-TG4’(接地選擇開關)之閘極皆耦接至接地選擇線GSL。 The coupling of Figure 2B is similar. The other page includes at least bit lines BL1'-BL4', and each of the bit lines BL1'-BL4' is coupled to a plurality of transistors T01'-TG1', T02'-TG2', T03'-TG3', T04'-TG4'. The gates of the transistor T01'-TG1' (serial selection switch) are all coupled to the string selection line SSL; the gates of the transistors T11'-T14' are all coupled to the first word line WL1; the transistor T21'- The gates of T24' are all coupled to the second word line WL2; the gates of the transistors T31'-T34' are all coupled to the third word line WL3; ...; the gates of the transistors TN1'-TN4' are The gate is coupled to the Nth word line WLN; the gates of the transistors TG1'-TG4' (ground selection switch) are all coupled to the ground selection line GSL.

在第2A圖與第2B圖中,各電晶體T11-TN1、T12-TN2、T13-TN3、T14-TN4、T11’-TN1’、T12’-TN2’、T13’-TN3’、T14’-TN4’構成一個記憶體晶胞。第3A圖、第3B圖、第5A圖、第5B圖、第6A圖與第6B圖也是如此。 In FIGS. 2A and 2B, each of the transistors T11-TN1, T12-TN2, T13-TN3, T14-TN4, T11'-TN1', T12'-TN2', T13'-TN3', T14'- TN4' constitutes a memory unit cell. The same applies to FIGS. 3A, 3B, 5A, 5B, 6A and 6B.

如第2A圖所示,對於選擇頁,所有位元線BL1-BL4皆施加電壓VBL,VBL為大於0V之正電壓,通常值為0.6-1V。串選擇線SSL被施加電壓Vssl,使得電晶體T01-T04被導通。在此以讀取字元線WL3上的電晶體為例做說明。字元線WL3被施加讀取電壓Vread以導通耦接至字元線WL3的電晶體T31-T34,其餘的字元線則被施加通過電壓Vpass以導通所耦接的電晶體。 接地選擇線GSL則被施加電壓Vgsl,以導通耦接至接地選擇線GSL的電晶體TG1-TG4。也就是說,在此讀取方法中,被選頁之所有通道皆為導通,其中,通道是指,由耦接至同一位元線之所有電晶體所組成的。 As shown in FIG. 2A, for the selected page, all of the bit lines BL1-BL4 are applied with a voltage VBL, which is a positive voltage greater than 0V, typically 0.6-1V. The string selection line SSL is applied with a voltage Vss1 such that the transistors T01-T04 are turned on. Here, the transistor on the read word line WL3 will be described as an example. The word line WL3 is applied with a read voltage Vread to turn on the transistors T31-T34 coupled to the word line WL3, and the remaining word lines are applied with a voltage Vpass to turn on the coupled transistors. The ground selection line GSL is then applied with a voltage Vgs1 to conduct the transistors TG1-TG4 coupled to the ground selection line GSL. That is to say, in this reading method, all the channels of the selected page are turned on, wherein the channel means that all the transistors coupled to the same bit line are composed.

在本案第一實施例之第一種讀取方法(強迫偏壓)中,如果要讀取被選頁之奇位元線的話,則奇共同源極線CSL_odd被施加接地電位(0V),而偶共同源極線CSL_even則施加電壓VBL。相似地,如果要讀取被選頁之偶位元線的話,則奇共同源極線CSL_odd被施加電壓VBL,而偶共同源極線CSL_even則施加接地電位(0V)。 In the first reading method (forced bias) of the first embodiment of the present case, if the odd bit line of the selected page is to be read, the odd common source line CSL_odd is applied with the ground potential (0V), and The even common source line CSL_even applies a voltage VBL. Similarly, if the even bit line of the selected page is to be read, the odd common source line CSL_odd is applied with the voltage VBL, and the even common source line CSL_even is applied with the ground potential (0V).

透過上式的電壓施加方式,可減輕未讀取/未選擇電晶體之閘極-源極跨壓,以減緩讀取干擾誤差。比如,以第2A圖為例,當在讀取被選頁之奇位元線時,偶位元線(如BL2)上之電晶體(如T32)之閘極-源極跨壓為(Vpass-VBL)。相較之下,於目前做法中,當在讀取被選頁之奇位元線時,偶位元線(如BL2)上之電晶體(如T32)之閘極-源極跨壓為(Vpass-0)。所以,由此可知,在本案第一實施例中,對於被選頁上之未讀取電晶體而言,其閘極-源極跨壓較為降低,所以,可以減緩讀取干擾誤差。 Through the voltage application method of the above formula, the gate-source voltage across the unread/unselected transistor can be alleviated to slow the reading interference error. For example, taking Figure 2A as an example, when reading the odd bit line of the selected page, the gate-source voltage across the transistor (such as T32) on the even bit line (such as BL2) is (Vpass). -VBL). In contrast, in the current practice, when reading the odd bit line of the selected page, the gate-source voltage of the transistor (such as T32) on the even bit line (such as BL2) is ( Vpass-0). Therefore, it can be seen from this that in the first embodiment of the present case, the gate-source voltage across the unread transistor on the selected page is relatively reduced, so that the read disturb error can be slowed down.

相似地,對於未選頁而言,串選擇線SSL被施加電壓Vunssl,使得電晶體T01’-T04’被關閉。至於施加至位元線BL1’-BL4’、字元線WL1-WLN、接地選擇線GSL之電壓則相同或相似於施加至被選頁之位元線BL1-BL4、字元線 WL1-WLN、接地選擇線GSL之電壓,其細節在此不重述。 Similarly, for unselected pages, the string selection line SSL is applied with a voltage Vunssl such that the transistors T01'-T04' are turned off. As for the voltages applied to the bit lines BL1'-BL4', the word lines WL1-WLN, and the ground selection line GSL, the voltages are the same or similar to the bit lines BL1-BL4 and word lines applied to the selected page. The voltages of WL1-WLN and ground selection line GSL are not repeated here.

同樣地,對於未選頁而言,偶位元線上之電晶體(比如,位元線BL2’上之電晶體T32’)之閘極-源極跨壓為(Vpass-VBL)(如果目前是在讀取被選頁之奇位元線的話),較為降低,故而可有效減緩讀取干擾誤差。至於未選頁之奇位元線上之電晶體(比如,位元線BL1’上之電晶體T31’)之閘極-源極跨壓為(Vpass-0V)(如果目前是在讀取被選頁之奇位元線的話)。 Similarly, for unselected pages, the gate-source voltage across the transistor on the even bit line (eg, transistor T32' on bit line BL2') is (Vpass-VBL) (if currently When reading the odd bit line of the selected page), it is relatively low, so the reading interference error can be effectively slowed down. As for the transistor on the odd bit line of the unselected page (for example, the transistor T31' on the bit line BL1'), the gate-source voltage is (Vpass-0V) (if currently selected in the read) The odd bit line of the page).

現請參考第3A圖與第3B圖,其顯示根據本案第一實施例之另一讀取方法(自我升壓(self-boosting))之示意圖。第3A圖顯示利用本案第一實施例之自我升壓讀取方法對選擇頁之操作示意圖。第3B圖顯示利用本案第一實施例之自我升壓讀取方法對未選擇頁之操作示意圖。 Referring now to FIGS. 3A and 3B, there is shown a schematic diagram of another reading method (self-boosting) according to the first embodiment of the present invention. Fig. 3A is a view showing the operation of the selection page by the self-boost reading method of the first embodiment of the present invention. Fig. 3B is a diagram showing the operation of the unselected page by the self-boosting reading method of the first embodiment of the present invention.

如第3A圖所示,以讀取被選頁之奇位元線為例做說明,奇位元線BL1、BL3…皆施加位元線電壓VBL,而偶位元線BL2、BL4…皆施加參考電壓Vcc(其高於電壓Vssl)。串選擇線SSL被施加電壓Vcc,使得電晶體T01-T04被導通。在此以讀取字元線WL3上的電晶體為例。字元線WL3被施加讀取電壓Vread以導通耦接至字元線WL3的電晶體T31-T34,其餘的字元線則被施加通過電壓Vpass以導通耦接至其他字元線的電晶體。接地選擇線GSL則被施加電壓Vcc(其高於電壓Vgsl),以導通所耦接的電晶體。 As shown in FIG. 3A, the odd bit line of the selected page is taken as an example for description. The odd bit lines BL1, BL3, ... all apply the bit line voltage VBL, and the even bit lines BL2, BL4, ... are applied. The reference voltage Vcc (which is higher than the voltage Vssl). The string selection line SSL is applied with a voltage Vcc such that the transistors T01-T04 are turned on. Here, the transistor on the word line WL3 is read as an example. The word line WL3 is applied with a read voltage Vread to turn on the transistors T31-T34 coupled to the word line WL3, and the remaining word lines are applied with a voltage Vpass to conduct the transistors coupled to other word lines. The ground select line GSL is then applied with a voltage Vcc (which is higher than the voltage Vgsl) to turn on the coupled transistor.

在本案第一實施例之第二種讀取方法(自我升壓) 中,如果要讀取被選頁之奇位元線的話,則奇共同源極線CSL_odd被施加接地電位(0V),而偶共同源極線CSL_even則施加電壓Vcc,所以,如第3A圖所示,電晶體TG1與TG3為導通,而電晶體TG2與TG4則為關閉。相似地,如果要讀取被選頁之偶位元線的話,則奇共同源極線CSL_odd被施加電壓Vcc,而偶共同源極線CSL_even則施加接地電位(0V)。 The second reading method (self boosting) in the first embodiment of the present case If the odd bit line of the selected page is to be read, the odd common source line CSL_odd is applied with the ground potential (0V), and the even common source line CSL_even is applied with the voltage Vcc, so as shown in FIG. 3A It is shown that the transistors TG1 and TG3 are turned on, and the transistors TG2 and TG4 are turned off. Similarly, if the even bit line of the selected page is to be read, the odd common source line CSL_odd is applied with the voltage Vcc, and the even common source line CSL_even is applied with the ground potential (0V).

在讀取過程中,在被選頁中,在未選擇位元線(如BL2)上,其通道一端之接地選擇開關(如電晶體TG2)處於關閉,而其通道之另一端之串選擇開關(如電晶體T02)則導通。 During the reading process, in the selected page, on the unselected bit line (such as BL2), the ground selection switch (such as transistor TG2) at one end of the channel is turned off, and the string selection switch at the other end of the channel is closed. (such as transistor T02) is turned on.

之後,字元線WL1-WLN被施加通過電壓Vpass(除了要被讀取的字元線WL3被施加讀取電壓Vread)。透過耦合效應,電晶體TN2之源極電壓被上拉至電位Vch,其中,電位Vch之值有關於通過電壓Vpass與耦合係數C。比如,以耦合係數C為0.8,而通過電壓Vpass為8V,則電位Vch=Vpass*C=6.4V。故而,對於被選頁之未讀取位元線上之電晶體TN2而言,其閘極-源極跨壓為Vpass-Vch。相較於習知技術中,被選頁之未讀取位元線上之電晶體之閘極-源極跨壓為Vpass-0V,本案第一實施例之第二種讀取方式可有效減緩讀取干擾誤差。 Thereafter, the word lines WL1 - WLN are applied with a pass voltage Vpass (except that the word voltage WL3 to be read is applied with the read voltage Vread). Through the coupling effect, the source voltage of the transistor TN2 is pulled up to the potential Vch, wherein the value of the potential Vch is related to the pass voltage Vpass and the coupling coefficient C. For example, with a coupling coefficient C of 0.8 and a pass voltage Vpass of 8V, the potential Vch=Vpass*C=6.4V. Therefore, for the transistor TN2 on the unread bit line of the selected page, the gate-source voltage across the gate is Vpass-Vch. Compared with the prior art, the gate-source voltage of the transistor on the unread bit line of the selected page is Vpass-0V, and the second reading mode of the first embodiment of the present invention can effectively slow down the reading. Take the interference error.

也就是說,在此讀取方法中,在被選頁中,位於未被讀取位元線上之電晶體處於浮接(除了通道兩端之電晶體(如T02與TG2)),如電晶體T12-TN2、T14-TN4等,這些處於浮接的電晶體會受到電壓耦合的影響,使其閘極-源極跨壓降低為 Vpass-Vch。 That is to say, in this reading method, in the selected page, the transistors on the unrecorded bit line are floating (except for the transistors (such as T02 and TG2) at both ends of the channel), such as a transistor. T12-TN2, T14-TN4, etc., these floating transistors will be affected by voltage coupling, causing their gate-source voltage to be reduced to Vpass-Vch.

相似地,對於未選頁而言,如第3B圖,串選擇線SSL被施加電壓Vunssl,使得電晶體T01’-T04’被關閉。至於施加至位元線BL1’-BL4’與字元線WL1-WLN之電壓則相同或相似於施加至被選頁之位元線BL1-BL4與字元線WL1-WLN之電壓,其細節在此不重述。未選頁之接地選擇線GSL也被施加電壓Vcc。 Similarly, for the unselected page, as in Fig. 3B, the string selection line SSL is applied with the voltage Vunssl, so that the transistors T01'-T04' are turned off. The voltages applied to the bit lines BL1'-BL4' and the word lines WL1-WLN are the same or similar to the voltages applied to the bit lines BL1-BL4 and the word lines WL1-WLN of the selected page, the details of which are This is not repeated. The ground selection line GSL of the unselected page is also applied with a voltage Vcc.

同樣地,當在讀取被選頁之奇位元線時,未選頁之偶位元線上之電晶體(如T12’-TN2’)也為浮接,故而也被施加自我升壓操作。比如,偶位元線BL2’上之電晶體(如T32’)之閘極-源極跨壓為(Vpass-Vch),較為降低,故而可有效減緩讀取干擾誤差。 Similarly, when the odd bit line of the selected page is read, the transistors (e.g., T12'-TN2') on the even bit line of the unselected page are also floated, so a self boosting operation is also applied. For example, the gate-source voltage across the transistor (e.g., T32') on the even bit line BL2' is (Vpass-Vch), which is relatively low, so that the read disturb error can be effectively alleviated.

現請參考第4圖,其顯示根據本案第二實施例之記憶體裝置之一部份之剖面圖。如第4圖所示,記憶體裝置400包括:位元線(BL1-BL2)、串選擇線(SSL0)、奇接地選擇線GSL_odd、偶接地選擇線GSL_even、字元線WL1-WLN、共同源極線CSL、基板410、介電層420、多個絕緣層430與多個記憶體晶胞440。 Referring now to Figure 4, there is shown a cross-sectional view of a portion of a memory device in accordance with a second embodiment of the present invention. As shown in FIG. 4, the memory device 400 includes: a bit line (BL1-BL2), a string selection line (SSL0), an odd ground selection line GSL_odd, an even ground selection line GSL_even, a word line WL1-WLN, and a common source. The epipolar line CSL, the substrate 410, the dielectric layer 420, the plurality of insulating layers 430, and the plurality of memory cells 440.

基本上,基板410、介電層420、多個絕緣層430與多個記憶體晶胞440相同或相似於第1圖之基板110、介電層120、多個絕緣層130與多個記憶體晶胞140,故其細節在此省略。 Basically, the substrate 410, the dielectric layer 420, and the plurality of insulating layers 430 are the same as or similar to the substrate 110 of FIG. 1, the dielectric layer 120, the plurality of insulating layers 130, and the plurality of memories. The unit cell 140 is omitted here.

不同於第1圖之記憶體裝置100之處在於,在第4圖之記憶體裝置400中,共同源極線CSL是耦接至複數位元線。 奇接地選擇線GSL_odd耦接至所有奇位元線(如BL1,…),偶接地選擇線GSL_even耦接至所有偶位元線(如BL2,…)。不論是哪個頁被選擇,由奇位元線所傳來的串電流(string current)流經通道後,流向共同源極線CSL,如電流路徑I3所示。相似地,由偶位元線所傳來的串電流流經通道後,流向共同源極線CSL,如電流路徑I4所示。 Unlike the memory device 100 of FIG. 1, in the memory device 400 of FIG. 4, the common source line CSL is coupled to the complex bit line. The odd ground select line GSL_odd is coupled to all odd bit lines (eg, BL1, . . . ), and the even ground select line GSL_even is coupled to all even bit lines (eg, BL2, . . . ). Regardless of which page is selected, the string current transmitted by the odd bit line flows through the channel and flows to the common source line CSL as shown by current path I3. Similarly, the string current from the even bit line flows through the channel and flows to the common source line CSL as shown by current path I4.

現請參考第5A圖與第5B圖,其顯示根據本案第二實施例之一讀取方法(強迫偏壓)之示意圖。第5A圖顯示根據本案第二實施例之強迫偏壓讀取方法對選擇頁之操作示意圖。第5B圖顯示根據本案第二實施例之強迫偏壓讀取方法對未選擇頁之操作示意圖。 Referring now to FIGS. 5A and 5B, there is shown a schematic diagram of a reading method (forced bias) according to a second embodiment of the present invention. Fig. 5A is a view showing the operation of the forced page reading method according to the second embodiment of the present invention on the selection page. Fig. 5B is a view showing the operation of the forced bias reading method for the unselected page according to the second embodiment of the present invention.

在第5A圖與第5B圖中,接地選擇線分為奇接地選擇線GSL_odd與偶接地選擇線GSL_even。奇接地選擇線GSL_odd耦接至所有奇位元線,而偶接地選擇線GSL_even耦接至所有偶位元線。此外,共同源極線CSL則耦接至所有位元線。 In FIGS. 5A and 5B, the ground selection line is divided into an odd ground selection line GSL_odd and an even ground selection line GSL_even. The odd ground select line GSL_odd is coupled to all odd bit lines, and the even ground select line GSL_even is coupled to all even bit lines. In addition, the common source line CSL is coupled to all bit lines.

如第5A圖所示,對於選擇頁,所有位元線BL1-BL4皆施加電壓VBL。串選擇線SSL被施加電壓Vpass或者是Vcc,使得電晶體T01-T04被導通。在此以讀取字元線WL3上的電晶體為例。字元線WL3被施加讀取電壓Vread以導通耦接至字元線WL3的電晶體T31-T34,其餘的字元線則被施加通過電壓Vpass以導通耦接至其他字元線的電晶體。耦接至要被讀取奇位元線之奇接地選擇線GSL_odd被施加電壓Vpass或者是Vcc,以導通耦 接至奇接地選擇線GSL_odd的電晶體TG1、TG3…。耦接至未讀取偶位元線之偶接地選擇線GSL_even被施加電壓VGSL,以關閉耦接至偶接地選擇線GSL_even的電晶體TG2、TG4…。共同源極線CSL則被施加接地電位(0V)。 As shown in FIG. 5A, for the selected page, all of the bit lines BL1-BL4 are applied with a voltage VBL. The string selection line SSL is applied with a voltage Vpass or Vcc such that the transistors T01-T04 are turned on. Here, the transistor on the word line WL3 is read as an example. The word line WL3 is applied with a read voltage Vread to turn on the transistors T31-T34 coupled to the word line WL3, and the remaining word lines are applied with a voltage Vpass to conduct the transistors coupled to other word lines. The odd ground connection line GSL_odd coupled to the odd bit line to be read is applied with a voltage Vpass or Vcc to conduct a pass coupling The transistors TG1, TG3, . . . connected to the odd ground selection line GSL_odd. The even ground selection line GSL_even coupled to the unread even bit line is applied with a voltage VGSL to turn off the transistors TG2, TG4, . . . coupled to the even ground selection line GSL_even. The common source line CSL is applied with a ground potential (0V).

在本案第二實施例之第一種讀取方法(強迫偏壓)中,透過上式的電壓施加方式,可減輕未讀取/未選擇電晶體之閘極-源極跨壓,以減緩讀取干擾誤差。比如,以第5A圖為例,當在讀取被選頁之奇位元線時,偶位元線(如BL2)上之電晶體(如T32)之閘極-源極跨壓為(Vpass-VBL)(因為自我升壓的關係)。其原因在於,在偶位元線上之電晶體,除了電晶體TG2、TG4外,電晶體T12-TN2、T14-TN4處於浮接,所以,浮接電晶體T12-TN2、T14-TN4之源極電壓被自我升壓為VBL。 In the first reading method (forced bias) of the second embodiment of the present invention, the gate-source voltage across the unread/unselected transistor can be alleviated by the voltage application method of the above formula to slow the reading. Take the interference error. For example, taking Figure 5A as an example, when reading the odd bit line of the selected page, the gate-source voltage across the transistor (such as T32) on the even bit line (such as BL2) is (Vpass). -VBL) (because of the self-boosting relationship). The reason is that, in the transistor on the even bit line, except for the transistors TG2, TG4, the transistors T12-TN2, T14-TN4 are floating, so the source of the floating transistors T12-TN2, T14-TN4 The voltage is self boosted to VBL.

相較之下,於目前做法中,當在讀取被選頁之奇位元線時,偶位元線(如BL2)上之電晶體(如T32)之閘極-源極跨壓為(Vpass-0)。所以,由此可知,在本案第二實施例中,對於被選頁上之未讀取位元線上之電晶體而言,其閘極-源極跨壓較為降低,所以,可以減緩讀取干擾誤差。 In contrast, in the current practice, when reading the odd bit line of the selected page, the gate-source voltage of the transistor (such as T32) on the even bit line (such as BL2) is ( Vpass-0). Therefore, it can be seen that in the second embodiment of the present invention, the gate-source voltage across the transistor on the unread bit line on the selected page is reduced, so that the read interference can be slowed down. error.

此外,在第二實施例之第一種讀取方法中,由於所有的位元線皆施加相同電壓,故而,位元線間之耦合電容值大幅降低,故能有效改善預充電。 Further, in the first reading method of the second embodiment, since all of the bit lines are applied with the same voltage, the coupling capacitance value between the bit lines is greatly reduced, so that the precharge can be effectively improved.

相似地,對於未選頁而言,如第5B圖所示,串選擇線SSL被施加電壓Vunssl,使得電晶體T01’-T04’被關閉。 至於施加至位元線BL1’-BL4’、字元線WL1-WLN之電壓則相同或相似於施加至被選頁之位元線BL1-BL4、字元線WL1-WLN之電壓,其細節在此不重述。耦接至被讀取奇位元線之奇接地選擇線GSL_odd被施加電壓Vpass或者是Vcc,以導通耦接至奇接地選擇線GSL_odd的電晶體TG1、TG3…。耦接至未讀取偶位元線之偶接地選擇線GSL_even被施加電壓VGSL,以關閉耦接至偶接地選擇線GSL_even的電晶體TG2、TG4…。共同源極線CSL則被施加接地電位(0V)。 Similarly, for the unselected page, as shown in Fig. 5B, the string selection line SSL is applied with the voltage Vunss1 so that the transistors T01'-T04' are turned off. As for the voltages applied to the bit lines BL1'-BL4', the word lines WL1-WLN are the same or similar to the voltages applied to the bit lines BL1-BL4 and the word lines WL1-WLN of the selected page, the details of which are This is not repeated. The odd ground selection line GSL_odd coupled to the read odd bit line is applied with a voltage Vpass or Vcc to turn on the transistors TG1, TG3, ... coupled to the odd ground select line GSL_odd. The even ground selection line GSL_even coupled to the unread even bit line is applied with a voltage VGSL to turn off the transistors TG2, TG4, . . . coupled to the even ground selection line GSL_even. The common source line CSL is applied with a ground potential (0V).

同樣地,在第5B圖中,未選頁之偶位元線上之導通電晶體(如電晶體T02’-TN2’)則會被自我升壓,其理由如上所述。也就是說,未選頁之偶位元線上之導通電晶體之閘極-源極電壓降低為(Vpass-Vch),故而可有效減緩讀取干擾誤差。至於未選頁之奇位元線之電晶體之閘極-源極電壓則為Vpass-0V。 Similarly, in Fig. 5B, the conducting current crystals (e.g., transistors T02'-TN2') on the unselected bit lines are self-boosted for the reasons described above. That is to say, the gate-source voltage of the conducting current crystal on the even bit line of the unselected page is reduced to (Vpass-Vch), so that the reading interference error can be effectively alleviated. As for the transistor of the unselected page, the gate-source voltage of the transistor is Vpass-0V.

亦即,在第6A圖中,雖其為強迫偏壓讀取法,但未讀取位元線上之電晶體仍會被自我升壓。 That is, in Fig. 6A, although it is a forced bias reading method, the transistors that are not read on the bit line are still self-boosting.

現請參考第6A圖與第6B圖,其顯示根據本案第二實施例之另一讀取方法(自我升壓)之示意圖。第6A圖顯示根據本案第二實施例之自我升壓讀取方法對選擇頁之操作示意圖。第6B圖顯示根據本案第二實施例之自我升壓讀取方法對未選擇頁之操作示意圖。 Referring now to FIGS. 6A and 6B, there is shown a schematic diagram of another reading method (self-boosting) according to the second embodiment of the present invention. Fig. 6A is a view showing the operation of the self-boosting reading method on the selection page according to the second embodiment of the present invention. Fig. 6B is a view showing the operation of the self-boosting reading method according to the second embodiment of the present invention on the unselected page.

在此以讀取被選頁之奇位元線為例做說明。如第6A圖所示,所有被選頁之奇位元線BL1、BL3…皆被施加電壓VBL, 而所有被選頁之偶位元線BL2、BL4…皆被施加電壓Vcc。串選擇線SSL被施加電壓Vpass或者是Vcc,使得電晶體T01-T04被導通。在此以讀取字元線WL3上的電晶體為例。字元線WL3被施加讀取電壓Vread以導通耦接至字元線WL3的電晶體T31-T34,其餘的字元線則被施加通過電壓Vpass以導通耦接至其他字元線的電晶體。耦接至要被讀取的奇位元線之奇接地選擇線GSL_odd被施加電壓Vpass或者是Vcc,以導通耦接至奇接地選擇線GSL_odd的電晶體TG1、TG3…。耦接至未讀取的偶位元線之偶接地選擇線GSL_even被施加電壓VGSL,以關閉耦接至偶接地選擇線GSL_even的電晶體TG2、TG4…。共同源極線CSL則被施加接地電位(0V)。 Here, an example of reading a strange bit line of a selected page will be described. As shown in FIG. 6A, the voltages VBL are applied to the odd bit lines BL1, BL3, ... of all selected pages. The voltages Vcc are applied to all of the selected bit lines BL2, BL4, .... The string selection line SSL is applied with a voltage Vpass or Vcc such that the transistors T01-T04 are turned on. Here, the transistor on the word line WL3 is read as an example. The word line WL3 is applied with a read voltage Vread to turn on the transistors T31-T34 coupled to the word line WL3, and the remaining word lines are applied with a voltage Vpass to conduct the transistors coupled to other word lines. The odd ground selection line GSL_odd coupled to the odd bit line to be read is applied with a voltage Vpass or Vcc to turn on the transistors TG1, TG3, ... coupled to the odd ground selection line GSL_odd. The even ground selection line GSL_even coupled to the unread even bit line is applied with a voltage VGSL to turn off the transistors TG2, TG4, . . . coupled to the even ground selection line GSL_even. The common source line CSL is applied with a ground potential (0V).

在本案第二實施例之第二種讀取方法(自我升壓)中,透過上式的電壓施加方式,可減輕未讀取/未選擇電晶體之閘極-源極跨壓,以減緩讀取干擾誤差。比如,以第6A圖為例,當在讀取被選頁之奇位元線時,偶位元線(如BL2)上之電晶體(如T32)之閘極-源極跨壓為(Vpass-VBL)(因為自我升壓的關係),其中,在偶位元線上之電晶體,電晶體T12-TN2、T14-TN4處於浮接,故而,浮接電晶體T12-TN2、T14-TN4…之源極電壓會被自我升壓為VBL。 In the second reading method (self-boosting) of the second embodiment of the present invention, the gate-source voltage across the unread/unselected transistor can be alleviated by the voltage application method of the above formula to slow the reading. Take the interference error. For example, taking Figure 6A as an example, when reading the odd bit line of the selected page, the gate-source voltage across the transistor (such as T32) on the even bit line (such as BL2) is (Vpass). -VBL) (due to the self-boosting relationship), in which the transistors on the even bit line, the transistors T12-TN2, T14-TN4 are floating, so, floating transistors T12-TN2, T14-TN4... The source voltage is self boosted to VBL.

相較之下,於目前做法中,當在讀取被選頁之奇位元線時,偶位元線(如BL2)上之電晶體(如T32)之閘極-源極跨壓為(Vpass-0)。所以,由此可知,在本案第二實施例中,對於被選 頁上之未讀取位元線上之電晶體而言,其閘極-源極跨壓較為降低,所以,可以減緩讀取干擾誤差。 In contrast, in the current practice, when reading the odd bit line of the selected page, the gate-source voltage of the transistor (such as T32) on the even bit line (such as BL2) is ( Vpass-0). Therefore, it can be seen from this that in the second embodiment of the present case, In the case of a transistor on an unread bit line on the page, the gate-source voltage across the gate is reduced, so the read disturb error can be slowed down.

至於被選頁之奇位元線上之電晶體之閘極-源極電壓則仍為Vpass-0V或者是Vread-0V。 As for the gate-source voltage of the transistor on the odd bit line of the selected page, it is still Vpass-0V or Vread-0V.

相似地,對於未選頁而言,如第6B圖所示,串選擇線SSL被施加電壓Vunssl,使得電晶體T01’-T04’被關閉。至於施加至位元線BL1’-BL4’、字元線WL1-WLN之電壓則相同或相似於施加至被選頁之位元線BL1-BL4、字元線WL1-WLN之電壓,其細節在此不重述。耦接至奇位元線之奇接地選擇線GSL_odd被施加電壓Vpass或者是Vcc,以導通耦接至奇接地選擇線GSL_odd的電晶體TG1、TG3…。耦接至未讀取的偶位元線之偶接地選擇線GSL_even被施加電壓VGSL,以關閉耦接至偶接地選擇線GSL_even的電晶體TG2、TG4…。共同源極線CSL則被施加接地電位(0V)。 Similarly, for the unselected page, as shown in Fig. 6B, the string selection line SSL is applied with the voltage Vunss1 so that the transistors T01'-T04' are turned off. As for the voltages applied to the bit lines BL1'-BL4', the word lines WL1-WLN are the same or similar to the voltages applied to the bit lines BL1-BL4 and the word lines WL1-WLN of the selected page, the details of which are This is not repeated. The odd ground selection line GSL_odd coupled to the odd bit line is applied with a voltage Vpass or Vcc to turn on the transistors TG1, TG3, ... coupled to the odd ground select line GSL_odd. The even ground selection line GSL_even coupled to the unread even bit line is applied with a voltage VGSL to turn off the transistors TG2, TG4, . . . coupled to the even ground selection line GSL_even. The common source line CSL is applied with a ground potential (0V).

同樣地,對於未選頁而言,在第6B圖中,偶位元線上之導通電晶體(如電晶體T02’-TN2’)則會被自我升壓,其理由如上所述,於此不再重述。也就是說,未選頁之偶位元線上之導通電晶體之閘極-源極電壓降低為(Vpass-Vch),故而可有效減緩讀取干擾誤差。至於未選頁之奇位元線之電晶體之閘極-源極電壓則為Vpass-0V。 Similarly, for the unselected pages, in Figure 6B, the conductive crystals on the even bit lines (such as transistors T02'-TN2') are self-boosted, for the reasons described above. Repeat again. That is to say, the gate-source voltage of the conducting current crystal on the even bit line of the unselected page is reduced to (Vpass-Vch), so that the reading interference error can be effectively alleviated. As for the transistor of the unselected page, the gate-source voltage of the transistor is Vpass-0V.

在本案第二實施例中,下表1顯示在讀取操作期間,當選擇串選擇線SSL與位元線時,如何施加電壓給奇接地選 擇線GSL_odd與偶接地選擇線GSL_even。 In the second embodiment of the present case, Table 1 below shows how to apply a voltage to the odd ground selection when the string selection line SSL and the bit line are selected during the read operation. Select the line GSL_odd and the even ground selection line GSL_even.

在上表1中,當選擇要讀取相關於SSL0之頁時,(1)在讀取奇位元線時,施加至奇共同源極線GSL_odd之電壓為Vcc,而施加至偶共同源極線GSL_even之電壓為VGSL;(2)在讀取偶位元線時,施加至奇共同源極線GSL_odd之電壓為VGSL,而施加至偶共同源極線GSL_even之電壓為Vcc。 In the above Table 1, when the page related to SSL0 is selected to be read, (1) when the odd bit line is read, the voltage applied to the odd common source line GSL_odd is Vcc, and is applied to the even common source. The voltage of the line GSL_even is VGSL; (2) when the even bit line is read, the voltage applied to the odd common source line GSL_odd is VGSL, and the voltage applied to the even common source line GSL_even is Vcc.

相似地,當選擇要讀取相關於SSL1之頁時,(1)在讀取奇位元線時,施加至奇共同源極線GSL_odd之電壓為VGSL,而施加至偶共同源極線GSL_even之電壓為Vcc;(2)在讀取偶位元線時,施加至奇共同源極線GSL_odd之電壓為Vcc,而施加至偶共同源極線GSL_even之電壓為VGSL。 Similarly, when selecting to read the page related to SSL1, (1) when reading the odd bit line, the voltage applied to the odd common source line GSL_odd is VGSL, and is applied to the even common source line GSL_even The voltage is Vcc; (2) When the even bit line is read, the voltage applied to the odd common source line GSL_odd is Vcc, and the voltage applied to the even common source line GSL_even is VGSL.

選擇要讀取SSL2、SSL4、SSL6…之頁時,其電壓 施加情形相同於SSL0之電壓施加情形。選擇要讀取SSL3、SSL5、SSL7…之頁時,其電壓施加情形相同於SSL1之電壓施加情形。 Select the voltage to read the pages of SSL2, SSL4, SSL6... The application is the same as the voltage application of SSL0. When you select a page to read SSL3, SSL5, SSL7..., the voltage application is the same as the voltage application of SSL1.

綜上所述可知,在本案上述兩個實施例中,不論是以強迫偏壓或者是以自我升壓來讀取,未被選/未讀取之電晶體之閘極-源極跨壓可被有效降低,所以,可以有效減少讀取干擾誤差之出現。 In summary, in the above two embodiments of the present invention, whether it is forced bias or self-boosting, the gate-source voltage across the unselected/unread transistor can be It is effectively reduced, so the occurrence of read disturb errors can be effectively reduced.

此外,對於預充電而言,在本案上述實施例中,如果奇位元線與偶位元線皆被施加相同電壓的話,則其耦合電容值可被有效降低,故而,可有效改善預充電、感應雜訊與電流消耗。 In addition, for the pre-charging, in the above embodiment of the present invention, if both the odd bit line and the even bit line are applied with the same voltage, the coupling capacitance value can be effectively reduced, so that the pre-charging can be effectively improved. Inductive noise and current consumption.

綜上所述,雖然本案已以實施例揭露如上,然其並非用以限定本案。本案所屬技術領域中具有通常知識者,在不脫離本案之精神和範圍內,當可作各種之更動與潤飾。因此,本案之保護範圍當視後附之申請專利範圍所界定者為準。 In summary, although the present invention has been disclosed above by way of example, it is not intended to limit the present invention. Those who have ordinary knowledge in the technical field of the present invention can make various changes and refinements without departing from the spirit and scope of the present case. Therefore, the scope of protection of this case is subject to the definition of the scope of the patent application attached.

100‧‧‧記憶體裝置 100‧‧‧ memory device

BL1-BL3‧‧‧位元線 BL1-BL3‧‧‧ bit line

SSL0-SSL1‧‧‧串選擇線 SSL0-SSL1‧‧‧ string selection line

GSL‧‧‧接地選擇線 GSL‧‧‧ Grounding selection line

WL1、WLN‧‧‧字元線 WL1, WLN‧‧‧ character line

CSL_odd‧‧‧奇共同源極線 CSL_odd‧‧‧Common source line

CSL_even‧‧‧偶共同源極線 CSL_even‧‧‧couple common source line

110‧‧‧基板 110‧‧‧Substrate

120‧‧‧介電層 120‧‧‧ dielectric layer

130‧‧‧絕緣層 130‧‧‧Insulation

140‧‧‧記憶體晶胞 140‧‧‧ memory cell

I1-I2‧‧‧電流路徑 I1-I2‧‧‧ current path

Claims (11)

一種記憶體裝置,包括:複數導電堆疊結構,各該導電堆疊結構包括至少一串選擇線、複數字元線與至少一接地選擇線;複數記憶體晶胞,形成於該些導電堆疊結構之內;複數位元線,形成於該些導電堆疊結構之上;以及至少一奇共同源極線,與至少一偶共同源極線,形成於該些導電堆疊結構之上;其中,該奇共同源極線耦接至該些位元線之複數奇位元線,該偶共同源極線耦接至該些位元線之複數偶位元線。 A memory device includes: a plurality of conductive stack structures, each of the conductive stack structures including at least one string of select lines, complex digital lines, and at least one ground select line; and a plurality of memory cells formed within the conductive stack a plurality of bit lines formed on the conductive stack structures; and at least one odd common source line, and at least one even source line formed on the conductive stack structures; wherein the odd common source The pole line is coupled to the plurality of odd bit lines of the bit lines, and the even common source lines are coupled to the complex even bit lines of the bit lines. 如申請專利範圍第1項所述之記憶體裝置,其中,由該些奇位元線之任一奇位元線所傳來的一串電流流經該些導電堆疊結構之一相關導電堆疊結構後,流向該奇共同源極線;由該些偶位元線之任一偶位元線所傳來的另一串電流流經該些導電堆疊結構之另一相關導電堆疊結構後,流向該偶共同源極線;該串選擇線與該些字元線之一第一字元線群組堆疊成該些導電堆疊結構之一第一導電堆疊結構;該接地選擇線與該些字元線之一第二字元線群組堆疊成該些導電堆疊結構之一第二導電堆疊結構;該些記憶體晶胞形成該些導電堆疊之複數側壁之上;以及 該奇共同源極線絕緣於該偶共同源極線。 The memory device of claim 1, wherein a string of currents transmitted by any one of the odd bit lines flows through an associated conductive stack structure of the conductive stack structures. And flowing to the odd common source line; another series of currents transmitted by any of the even bit lines of the even bit lines flow through another associated conductive stack structure of the conductive stacked structures, and then flow to the a common source line; the string selection line and one of the first word line groups of the word lines are stacked into a first conductive stack structure of the conductive stack structures; the ground selection line and the word lines One of the second word line groups is stacked into one of the conductive stack structures; the memory cells form a plurality of sidewalls of the conductive stack; The odd common source line is insulated from the even common source line. 一種記憶體裝置,包括:複數導電堆疊結構,包括至少一串選擇線、複數字元線、至少一奇接地選擇線與至少一偶接地選擇線,各該導電堆疊結構包括該串選擇線及該些字元線,且包括該奇接地選擇線與該偶接地選擇線之其中一者;複數記憶體晶胞,形成於該些導電堆疊結構之內;複數位元線,形成於該些導電堆疊結構之上;以及.至少一共同源極線,形成於該些導電堆疊結構之上;其中,該奇接地選擇線耦接至該些位元線之複數奇位元線,該偶接地選擇線耦接至該些位元線之複數偶位元線。 A memory device includes: a plurality of conductive stack structures including at least one string of select lines, complex digital element lines, at least one odd ground select line, and at least one even ground select line, each of the conductive stack structures including the string selection line and the And a word line including one of the odd ground selection line and the even ground selection line; a plurality of memory cells formed within the conductive stack structure; and a plurality of bit lines formed on the conductive stack Above the structure; and at least one common source line formed on the conductive stack structures; wherein the odd ground select lines are coupled to the plurality of odd bit lines of the bit lines, the even ground select lines A plurality of even bit lines coupled to the bit lines. 如申請專利範圍第3項所述之記憶體裝置,其中,由該些奇位元線之任一奇位元線所傳來的一串電流流經該些導電堆疊結構之一相關導電堆疊結構後,流向該共同源極線;由該些偶位元線之任一偶位元線所傳來的另一串電流流經該些導電堆疊結構之另一相關導電堆疊結構後,流向該共同源極線;該串選擇線與該些字元線之一第一字元線群組堆疊成該些導電堆疊結構之一第一導電堆疊結構;該接地選擇線與該些字元線之一第二字元線群組堆疊成該些導電堆疊結構之一第二導電堆疊結構;該些記憶體晶胞形成該些導電堆疊之複數側壁之上;以及 該奇接地選擇線絕緣於該偶接地選擇線。 The memory device of claim 3, wherein a string of currents transmitted from any of the odd bit lines of the odd bit lines flows through an associated conductive stack structure of the conductive stack structures. And flowing to the common source line; another series of currents transmitted by any of the even bit lines of the even bit lines flow through another associated conductive stack structure of the conductive stack structures, and then flow to the common a source line; the string selection line and one of the first word line groups of the word lines are stacked into a first conductive stack structure of the conductive stack structures; the ground selection line and one of the word lines Stacking a second word line group into a second conductive stack structure of the conductive stack structures; the memory cells forming a plurality of sidewalls of the conductive stacks; The odd ground selection line is insulated from the even ground selection line. 一種記憶體裝置之讀取方法,該記憶體裝置包括複數第一位元線,複數第二位元線,耦接至該些第一位元線之至少一第一共同源極線,與耦接至該些第二位元線之至少一第二共同源極線,該讀取方法包括:於讀取一被選頁之該些第一位元線時,施加一參考電壓至該被選頁之該第一共同源極線;施加一位元線電壓至該被選頁之該些第一位元線;以及施加該位元線電壓與一另一參考電壓兩者之任一者至該被選頁之該些第二位元線與該第二共同源極線,該位元線電壓高於該參考電壓,該另一參考電壓高於該參考電壓,使得該被選頁之該些第一位元線上之複數記憶體晶胞之一第一跨壓高於該被選頁之該些第二位元線上之複數記憶體晶胞之一第二跨壓;對於一未選頁:施加該參考電壓至該未選頁之該第一共同源極線;施加該位元線電壓至該未選頁之該些第一位元線;以及施加該位元線電壓與該另一參考電壓兩者之該者至該未選頁之該些第二位元線與該第二共同源極線,使得該未選頁之該些第一位元線上之複數記憶體晶胞之該第一跨壓高於該未選頁之該些第二位元線上之複數記憶體晶胞之該第二跨壓。 A method for reading a memory device, the memory device comprising a plurality of first bit lines, a plurality of second bit lines, coupled to at least one first common source line of the first bit lines, and a coupling Connecting to the at least one second common source line of the second bit lines, the reading method includes: applying a reference voltage to the selected one when reading the first bit lines of a selected page a first common source line of the page; applying a bit line voltage to the first bit lines of the selected page; and applying either the bit line voltage and a further reference voltage to The second bit line of the selected page and the second common source line, the bit line voltage is higher than the reference voltage, and the other reference voltage is higher than the reference voltage, so that the selected page is The first span voltage of one of the plurality of memory cells on the first bit line is higher than the second span voltage of one of the plurality of memory cells on the second bit lines of the selected page; for an unselected page Applying the reference voltage to the first common source line of the unselected page; applying the bit line voltage to the first of the unselected pages And applying the bit line voltage and the other reference voltage to the second bit line of the unselected page and the second common source line, such that the unselected page The first voltage across the plurality of memory cells on the first bit line is higher than the second voltage across the plurality of memory cells on the second bit lines of the unselected page. 如申請專利範圍第5項所述之讀取方法,其中,於讀取該被選頁之該些第一位元線時, 如果施加該位元線電壓至該被選頁之該些第二位元線與該第二共同源極線:施加一串選擇導通電壓至該被選頁之該些第一與該第二位元線上之複數串選擇開關,以導通該被選頁之該些串選擇開關;以及施加一接地選擇導通電壓至該被選頁之該些第一與該第二位元線上之複數接地選擇開關,以導通該被選頁之該些接地擇開關;以及對於該未選頁:如果施加該位元線電壓至該被選頁之該些第二位元線與該第二共同源極線:施加一串選擇關閉電壓至該未選頁之該些第一與該些第二位元線上之複數串選擇開關,以關閉該未選頁之該些串選擇開關;以及施加該接地選擇導通電壓至該未選頁之該些第一與該第二位元線上之複數接地擇開關,以導通該未選頁之該些接地擇開關。 The reading method of claim 5, wherein when reading the first bit lines of the selected page, If the bit line voltage is applied to the second bit lines of the selected page and the second common source line: applying a series of selected turn-on voltages to the first and second bits of the selected page a plurality of string selection switches on the line to turn on the string selection switches of the selected page; and applying a ground selection turn-on voltage to the plurality of ground selection switches on the first and second bit lines of the selected page To turn on the ground selection switches of the selected page; and for the unselected page: if the bit line voltage is applied to the second bit lines of the selected page and the second common source line: Applying a series of select string turn-off voltages to the plurality of string select switches of the first and second bit lines of the unselected page to turn off the string select switches of the unselected page; and applying the ground select turn-on voltage And a plurality of grounding switches on the first and the second bit lines of the unselected page to turn on the grounding switches of the unselected pages. 如申請專利範圍第5項所述之讀取方法,其中,於讀取該被選頁之該些第一位元線時,如果施加該另一參考電壓至該被選頁之該些第二位元線與該第二共同源極線:施加該另一參考電壓至該被選頁之該些第一與該第二 位元線上之複數串選擇開關,以導通該被選頁之該些串選擇開關;施加該另一參考電壓至該被選頁之該些第一位元線上之複數接地擇開關,以導通該被選頁之該些第一位元線上之該些接地擇開關;施加該另一參考電壓至該被選頁之該些第二位元線上之複數接地擇開關,以關閉該被選頁之該些第二位元線上之該些接地擇開關;以及於關閉該被選頁之該些第二位元線上之該些接地擇開關之後,施加一通過電壓或一讀取電壓至複數字元線,以使得該被選頁之該些第二位元線上之該些記憶體晶胞處於浮接,以將該被選頁之該些第二位元線上之該些浮接記憶體晶胞之一端電壓透過電壓耦合而自我升壓至一電壓,該電壓有關於該另一參考電壓與一耦合係數;以及對於該未選頁:如果施加該另一參考電壓至該未選頁之該些第二位元線與該第二共同源極線:施加一串選擇關閉電壓至該未選頁之該些第一與該第二位元線上之複數串選擇開關,以關閉該未選頁之該些第一與該第二位元線上之該些串選擇開關;施加該另一參考電壓至該未選頁之該些第一位元線上之複數接地擇開關,以導通該未選頁之該些第一位元線上之該些 接地擇開關;施加該另一參考電壓至該未選頁之該些第二位元線上之複數接地擇開關,以關閉該未選頁之該些第二位元線上之該些接地擇開關;以及於關閉該未選頁之該些第二位元線上之該些接地擇開關之後,施加該通過電壓或該讀取電壓至該些字元線,以使得該未選頁之該些第二位元線上之該些記憶體晶胞處於浮接,以將該被選頁之該些第二位元線上之該些浮接記憶體晶胞之一端電壓透過電壓耦合而自我升壓至該電壓。 The reading method of claim 5, wherein, when reading the first bit lines of the selected page, if the another reference voltage is applied to the second of the selected pages a bit line and the second common source line: applying the another reference voltage to the first and second portions of the selected page a plurality of string selection switches on the bit line to turn on the string selection switches of the selected page; applying the other reference voltage to the plurality of ground selection switches on the first bit lines of the selected page to turn on the Selecting the grounding switches on the first bit lines of the selected page; applying the other reference voltage to the plurality of grounding switches on the second bit lines of the selected page to close the selected page The grounding switches on the second bit lines; and after turning off the grounding switches on the second bit lines of the selected page, applying a pass voltage or a read voltage to the complex digital element a line such that the memory cells of the second bit lines of the selected page are floating to form the floating memory cells on the second bit lines of the selected page One of the terminal voltages is self-boosted to a voltage by voltage coupling, the voltage being related to the other reference voltage and a coupling coefficient; and for the unselected page: if the other reference voltage is applied to the unselected page a second bit line and the second common source line: applying one Selecting a turn-off voltage to the plurality of string selection switches on the first and second bit lines of the unselected page to turn off the string selection switches on the first and second bit lines of the unselected page Applying the other reference voltage to the plurality of grounding switches on the first bit lines of the unselected page to turn on the first bit lines of the unselected page Grounding a switch; applying the other reference voltage to the plurality of grounding switches on the second bit lines of the unselected page to turn off the grounding switches on the second bit lines of the unselected page; And after the grounding switches on the second bit lines of the unselected page are turned off, applying the pass voltage or the read voltage to the word lines to make the second of the unselected pages The memory cells on the bit line are floating to self-boost the voltage of one of the floating memory cells on the second bit lines of the selected page through voltage coupling to the voltage . 一種記憶體裝置之讀取方法,該記憶體裝置包括複數第一位元線,複數第二位元線,耦接至該些第一位元線與該些第二位元線之至少一共同源極線,控制複數第一通道之一第一接地選擇線,控制複數第二通道之一第二接地選擇線,該讀取方法包括:於讀取一被選頁之該些第一位元線時,施加一參考電壓至該被選頁之該共同源極線;施加一位元線電壓至該被選頁之該些第一位元線;以及施加該位元線電壓與一另一參考電壓兩者之任一者至該被選頁之該些第二位元線,該位元線電壓高於該參考電壓,該另一參考電壓高於該參考電壓,施加該另一參考電壓至該第一接地選擇線以導通該些第一位元線上之複數接地選擇開關,施加一關閉電壓至該第二接地選擇線以關閉該些第二位元線上之複數接地選擇開關,使得該被選頁之該些第一位元線上之複數記憶體 晶胞之一第一跨壓高於該被選頁之該些第二位元線上之複數記憶體晶胞之一第二跨壓;對於一未選頁:施加該參考電壓至該未選頁之該共同源極線;施加該位元線電壓至該未選頁之該些第一位元線;以及施加該位元線電壓與該另一參考電壓兩者之該者至該未選頁之該些第二位元線,施加該另一參考電壓至該第一接地選擇線以導通該未選頁之該些第一通道上之複數接地選擇開關,施加該關閉電壓至該第二接地選擇線以關閉該未選頁之該些第二通道上之複數接地選擇開關,使得該未選頁之該些第一位元線上之複數記憶體晶胞之該第一跨壓高於該未選頁之該些第二位元線上之複數記憶體晶胞之該第二跨壓。 A method for reading a memory device, the memory device comprising a plurality of first bit lines, a plurality of second bit lines, coupled to the first bit lines and at least one of the second bit lines a source line, controlling one of the first ground selection lines of the plurality of first channels, and controlling one of the second ground selection lines of the plurality of second channels, the reading method comprising: reading the first bits of a selected page a line, applying a reference voltage to the common source line of the selected page; applying a bit line voltage to the first bit lines of the selected page; and applying the bit line voltage to the other Any one of the reference voltages to the second bit lines of the selected page, the bit line voltage is higher than the reference voltage, the other reference voltage is higher than the reference voltage, and the another reference voltage is applied Up to the first ground selection line to turn on the plurality of ground selection switches on the first bit lines, applying a shutdown voltage to the second ground selection line to turn off the plurality of ground selection switches on the second bit lines, such that The plurality of memory on the first bit line of the selected page a first voltage across one of the unit cells is higher than a second voltage across the plurality of memory cells on the second bit lines of the selected page; for an unselected page: applying the reference voltage to the unselected page a common source line; applying the bit line voltage to the first bit lines of the unselected page; and applying the bit line voltage to the other reference voltage to the unselected page The second bit lines, applying the other reference voltage to the first ground selection line to turn on the plurality of ground selection switches on the first channels of the unselected page, applying the shutdown voltage to the second ground Selecting a line to turn off the plurality of ground selection switches on the second channels of the unselected page such that the first voltage across the plurality of memory cells on the first bit lines of the unselected page is higher than the The second cross-over of the plurality of memory cells on the second bit lines of the page. 如申請專利範圍第8項所述之讀取方法,其中,於讀取該被選頁之該些第一位元線時,如果施加該位元線電壓至該被選頁之該些第二位元線:導通該被選頁之該些第一與該些第二位元線上之複數串選擇開關;以及對於該未選頁:如果施加該位元線電壓至該被選頁之該些第二位元線:施加一串選擇關閉電壓至該未選頁之該些第一與該些第二位元線上之複數串選擇開關,以關閉該未選頁之該些第一與該些第二位元線上之該些串選擇開關。 The reading method of claim 8, wherein when the first bit lines of the selected page are read, if the bit line voltage is applied to the second of the selected pages Bit line: a plurality of string selection switches that turn on the first and second bit lines of the selected page; and for the unselected page: if the bit line voltage is applied to the selected page a second bit line: applying a string of selection off voltages to the plurality of string selection switches on the first and second bit lines of the unselected page to close the first and the other of the unselected pages The string selection switches on the second bit line. 如申請專利範圍第8項所述之讀取方法,其中,於讀取該被選頁之該些第一位元線時,如果施加該另一參考電壓至該被選頁之該些第二位元線:施加該另一參考電壓至該被選頁之該些第一與該些第二位元線上之複數串選擇開關,以導通該被選頁之該些第一與該些第二位元線上之該些串選擇開關;以及於關閉該被選頁之該些第二位元線上之該些串選擇開關之後,施加一通過電壓或一讀取電壓至複數字元線,以使得該被選頁之該些第二位元線上之該些記憶體晶胞處於浮接,以將該被選頁之該些第二位元線上之該些浮接記憶體晶胞之一端電壓透過電壓耦合而自我升壓至一電壓,該電壓有關於該另一參考電壓與一耦合係數;以及對於該未選頁:如果施加該另一參考電壓至該未選頁之該些第二位元線:施加一串選擇關閉電壓至該未選頁之該些第一與該第二位元線上之複數串選擇開關,以關閉該未選頁之該些第一與該第二位元線上之該些串選擇開關;以及於關閉該未選頁之該些第二位元線上之該些接地擇開關之後,施加該通過電壓或該讀取電壓至該些字元線,以使得該未選頁之該些第二位元線上之該些記憶體晶胞處於浮接,以將該未選頁之該些第二位元線上之該些浮接記憶體晶胞之一端電壓透過電壓耦合而自我升壓至該電壓。 The reading method of claim 8, wherein, when reading the first bit lines of the selected page, if the another reference voltage is applied to the second of the selected pages Bit line: applying the other reference voltage to the plurality of string selection switches on the first and second bit lines of the selected page to turn on the first and second parts of the selected page The string selection switches on the bit line; and after turning off the string selection switches on the second bit lines of the selected page, applying a pass voltage or a read voltage to the complex digital line to make The memory cells of the second bit lines of the selected page are floating to transmit a voltage of one of the floating memory cells on the second bit lines of the selected page Voltage-coupling self-boosting to a voltage related to the other reference voltage and a coupling coefficient; and for the unselected page: if the other reference voltage is applied to the second bit of the unselected page Line: applying a series of selected off voltages to the first and second bits of the unselected page a plurality of string selection switches on the line to turn off the string selection switches on the first and second bit lines of the unselected page; and the second bit lines on the unselected pages After the grounding switch is selected, the pass voltage or the read voltage is applied to the word lines such that the memory cells on the second bit lines of the unselected page are floating to One of the floating-cell memory cell voltages on the second bit lines of the page selects self-boost to the voltage through voltage coupling. 一種記憶體裝置,包括:複數個導電堆疊結構,各該導電堆疊結構包括複數個導電層及複數個絕緣層,各該導電堆疊中該些導電層及該些絕緣層係交互堆疊,各該導電堆疊中之該些導電層包括至少一串選擇線、複數字元線與至少一接地選擇線;複數記憶體晶胞,形成於該些導電堆疊結構之內;複數位元線,形成於該些導電堆疊結構之上;以及至少一奇共同源極線,與至少一偶共同源極線,形成於該些導電堆疊結構之上;其中,該奇共同源極線耦接至該些位元線之複數奇位元線,該偶共同源極線耦接至該些位元線之複數偶位元線。 A memory device includes: a plurality of conductive stack structures, each of the conductive stack structures comprising a plurality of conductive layers and a plurality of insulating layers, wherein the conductive layers and the insulating layers are alternately stacked in the conductive stack, each of the conductive layers The conductive layers in the stack include at least one string of selection lines, complex digital element lines, and at least one ground selection line; a plurality of memory cells are formed within the conductive stack structures; and a plurality of bit lines are formed in the plurality of lines Above the conductive stack structure; and at least one odd common source line, and at least one even source line formed on the conductive stack structure; wherein the odd common source line is coupled to the bit lines The plurality of odd bit lines are coupled to the complex even bit lines of the bit lines.
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8503213B2 (en) * 2011-01-19 2013-08-06 Macronix International Co., Ltd. Memory architecture of 3D array with alternating memory string orientation and string select structures
US20130336061A1 (en) * 2010-08-26 2013-12-19 Samsung Electronics Co., Ltd. Nonvolatile memory device, operating method thereof and memory system including the same
US20140198576A1 (en) * 2013-01-16 2014-07-17 Macronix International Co, Ltd. Programming technique for reducing program disturb in stacked memory structures
US20140254284A1 (en) * 2013-03-11 2014-09-11 Macronix International Co., Ltd. Word line driver circuit for selecting and deselecting word lines
US8917548B2 (en) * 2011-06-29 2014-12-23 Kabushiki Kaisha Toshiba Non-volatile semiconductor memory device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130336061A1 (en) * 2010-08-26 2013-12-19 Samsung Electronics Co., Ltd. Nonvolatile memory device, operating method thereof and memory system including the same
US8503213B2 (en) * 2011-01-19 2013-08-06 Macronix International Co., Ltd. Memory architecture of 3D array with alternating memory string orientation and string select structures
US8917548B2 (en) * 2011-06-29 2014-12-23 Kabushiki Kaisha Toshiba Non-volatile semiconductor memory device
US20140198576A1 (en) * 2013-01-16 2014-07-17 Macronix International Co, Ltd. Programming technique for reducing program disturb in stacked memory structures
US20140198570A1 (en) * 2013-01-16 2014-07-17 Macronix International Co., Ltd. Programming multibit memory cells
US20140254284A1 (en) * 2013-03-11 2014-09-11 Macronix International Co., Ltd. Word line driver circuit for selecting and deselecting word lines

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