TWI563408B - Method of optical proximity correction and integrated circuit layout formed by the same - Google Patents
Method of optical proximity correction and integrated circuit layout formed by the sameInfo
- Publication number
- TWI563408B TWI563408B TW102112336A TW102112336A TWI563408B TW I563408 B TWI563408 B TW I563408B TW 102112336 A TW102112336 A TW 102112336A TW 102112336 A TW102112336 A TW 102112336A TW I563408 B TWI563408 B TW I563408B
- Authority
- TW
- Taiwan
- Prior art keywords
- integrated circuit
- same
- circuit layout
- optical proximity
- proximity correction
- Prior art date
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW102112336A TWI563408B (en) | 2013-04-08 | 2013-04-08 | Method of optical proximity correction and integrated circuit layout formed by the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW102112336A TWI563408B (en) | 2013-04-08 | 2013-04-08 | Method of optical proximity correction and integrated circuit layout formed by the same |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201439803A TW201439803A (en) | 2014-10-16 |
TWI563408B true TWI563408B (en) | 2016-12-21 |
Family
ID=52113817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102112336A TWI563408B (en) | 2013-04-08 | 2013-04-08 | Method of optical proximity correction and integrated circuit layout formed by the same |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI563408B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11754511B2 (en) * | 2017-11-21 | 2023-09-12 | Formfactor, Inc. | Method and device for optically representing electronic semiconductor components |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7425391B2 (en) * | 2001-10-02 | 2008-09-16 | Guobiao Zhang | Highly-corrected mask |
US7784019B1 (en) * | 2006-11-01 | 2010-08-24 | Cadence Design Systems, Inc. | Yield based retargeting for semiconductor design flow |
US8201110B1 (en) * | 2008-04-14 | 2012-06-12 | The Regents Of The University Of California | Optical proximity correction using regression |
US20120185807A1 (en) * | 2011-01-21 | 2012-07-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for improving accuracy of parasitics extraction considering sub-wavelength lithography effects |
-
2013
- 2013-04-08 TW TW102112336A patent/TWI563408B/en active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7425391B2 (en) * | 2001-10-02 | 2008-09-16 | Guobiao Zhang | Highly-corrected mask |
US7784019B1 (en) * | 2006-11-01 | 2010-08-24 | Cadence Design Systems, Inc. | Yield based retargeting for semiconductor design flow |
US8201110B1 (en) * | 2008-04-14 | 2012-06-12 | The Regents Of The University Of California | Optical proximity correction using regression |
US20120185807A1 (en) * | 2011-01-21 | 2012-07-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for improving accuracy of parasitics extraction considering sub-wavelength lithography effects |
Also Published As
Publication number | Publication date |
---|---|
TW201439803A (en) | 2014-10-16 |
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