TWI563408B - Method of optical proximity correction and integrated circuit layout formed by the same - Google Patents

Method of optical proximity correction and integrated circuit layout formed by the same

Info

Publication number
TWI563408B
TWI563408B TW102112336A TW102112336A TWI563408B TW I563408 B TWI563408 B TW I563408B TW 102112336 A TW102112336 A TW 102112336A TW 102112336 A TW102112336 A TW 102112336A TW I563408 B TWI563408 B TW I563408B
Authority
TW
Taiwan
Prior art keywords
integrated circuit
same
circuit layout
optical proximity
proximity correction
Prior art date
Application number
TW102112336A
Other languages
Chinese (zh)
Other versions
TW201439803A (en
Inventor
Kuan Wen Fang
Chin Lung Lin
Kuo Chang Tien
Yi Hsiu Lee
Chien Hsiung Wang
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW102112336A priority Critical patent/TWI563408B/en
Publication of TW201439803A publication Critical patent/TW201439803A/en
Application granted granted Critical
Publication of TWI563408B publication Critical patent/TWI563408B/en

Links

TW102112336A 2013-04-08 2013-04-08 Method of optical proximity correction and integrated circuit layout formed by the same TWI563408B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW102112336A TWI563408B (en) 2013-04-08 2013-04-08 Method of optical proximity correction and integrated circuit layout formed by the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW102112336A TWI563408B (en) 2013-04-08 2013-04-08 Method of optical proximity correction and integrated circuit layout formed by the same

Publications (2)

Publication Number Publication Date
TW201439803A TW201439803A (en) 2014-10-16
TWI563408B true TWI563408B (en) 2016-12-21

Family

ID=52113817

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102112336A TWI563408B (en) 2013-04-08 2013-04-08 Method of optical proximity correction and integrated circuit layout formed by the same

Country Status (1)

Country Link
TW (1) TWI563408B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11754511B2 (en) * 2017-11-21 2023-09-12 Formfactor, Inc. Method and device for optically representing electronic semiconductor components

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7425391B2 (en) * 2001-10-02 2008-09-16 Guobiao Zhang Highly-corrected mask
US7784019B1 (en) * 2006-11-01 2010-08-24 Cadence Design Systems, Inc. Yield based retargeting for semiconductor design flow
US8201110B1 (en) * 2008-04-14 2012-06-12 The Regents Of The University Of California Optical proximity correction using regression
US20120185807A1 (en) * 2011-01-21 2012-07-19 Taiwan Semiconductor Manufacturing Company, Ltd. Method for improving accuracy of parasitics extraction considering sub-wavelength lithography effects

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7425391B2 (en) * 2001-10-02 2008-09-16 Guobiao Zhang Highly-corrected mask
US7784019B1 (en) * 2006-11-01 2010-08-24 Cadence Design Systems, Inc. Yield based retargeting for semiconductor design flow
US8201110B1 (en) * 2008-04-14 2012-06-12 The Regents Of The University Of California Optical proximity correction using regression
US20120185807A1 (en) * 2011-01-21 2012-07-19 Taiwan Semiconductor Manufacturing Company, Ltd. Method for improving accuracy of parasitics extraction considering sub-wavelength lithography effects

Also Published As

Publication number Publication date
TW201439803A (en) 2014-10-16

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