TWI563133B - - Google Patents

Info

Publication number
TWI563133B
TWI563133B TW104120459A TW104120459A TWI563133B TW I563133 B TWI563133 B TW I563133B TW 104120459 A TW104120459 A TW 104120459A TW 104120459 A TW104120459 A TW 104120459A TW I563133 B TWI563133 B TW I563133B
Authority
TW
Taiwan
Application number
TW104120459A
Other languages
Chinese (zh)
Other versions
TW201627544A (en
Inventor
Morimichi Watanabe
Jun Yoshikawa
Tsutomu Nanataki
Katsuhiro Imai
Tomohiko Sugiyama
Takashi Yoshino
Yukihisa Takeuchi
Kei Sato
Original Assignee
Ngk Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ngk Insulators Ltd filed Critical Ngk Insulators Ltd
Publication of TW201627544A publication Critical patent/TW201627544A/en
Application granted granted Critical
Publication of TWI563133B publication Critical patent/TWI563133B/zh

Links

TW104120459A 2013-12-18 2015-06-25 Freestanding gallium nitride substrate, light-emitting element and manufacturing method of these TW201627544A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013260868 2013-12-18
JP2014071342 2014-03-31
JP2014199217A JP5770905B1 (en) 2013-12-18 2014-09-29 Gallium nitride free-standing substrate, light emitting device, and manufacturing method thereof

Publications (2)

Publication Number Publication Date
TW201627544A TW201627544A (en) 2016-08-01
TWI563133B true TWI563133B (en) 2016-12-21

Family

ID=54187194

Family Applications (2)

Application Number Title Priority Date Filing Date
TW105136228A TWI662163B (en) 2013-12-18 2015-06-25 Free-standing gallium nitride substrate, light-emitting element, and manufacturing method thereof
TW104120459A TW201627544A (en) 2013-12-18 2015-06-25 Freestanding gallium nitride substrate, light-emitting element and manufacturing method of these

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW105136228A TWI662163B (en) 2013-12-18 2015-06-25 Free-standing gallium nitride substrate, light-emitting element, and manufacturing method thereof

Country Status (2)

Country Link
JP (2) JP5770905B1 (en)
TW (2) TWI662163B (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6474734B2 (en) * 2013-12-18 2019-02-27 日本碍子株式会社 COMPOSITE SUBSTRATE FOR LIGHT EMITTING ELEMENT AND MANUFACTURING METHOD THEREOF
CN107208312B (en) 2015-01-29 2019-10-01 日本碍子株式会社 Self-supporting substrate, function element and its manufacturing method
WO2017057271A1 (en) * 2015-09-30 2017-04-06 日本碍子株式会社 Oriented alumina substrate for epitaxial growth
CN108025979B (en) * 2015-09-30 2021-06-01 日本碍子株式会社 Oriented alumina substrate for epitaxial growth
JP6715861B2 (en) 2015-11-16 2020-07-01 日本碍子株式会社 Manufacturing method of oriented sintered body
JP6688109B2 (en) 2016-02-25 2020-04-28 日本碍子株式会社 Surface emitting device, external cavity type vertical surface emitting laser, and method for manufacturing surface emitting device
WO2017145802A1 (en) * 2016-02-25 2017-08-31 日本碍子株式会社 Polycrystalline gallium nitride self-supported substrate and light emitting element using same
WO2017169622A1 (en) * 2016-03-29 2017-10-05 日本碍子株式会社 Free-standing substrate and laminated body
JP6639317B2 (en) * 2016-04-21 2020-02-05 日本碍子株式会社 Method for producing group 13 element nitride crystal and seed crystal substrate
JP6846913B2 (en) * 2016-11-11 2021-03-24 日本碍子株式会社 Method for manufacturing wide-wavelength light-emitting device and wide-wavelength light-emitting device
TWI621249B (en) * 2017-03-27 2018-04-11 英屬開曼群島商錼創科技股份有限公司 Micro light emitting diode and display panel
TWI632673B (en) * 2017-07-11 2018-08-11 錼創科技股份有限公司 Micro light-emitting device and display apparatus
CN111052414B (en) 2017-08-24 2023-07-21 日本碍子株式会社 Group 13 element nitride layer, free-standing substrate, and functional element
US11309455B2 (en) 2017-08-24 2022-04-19 Ngk Insulators, Ltd. Group 13 element nitride layer, free-standing substrate and functional element
JP6639751B2 (en) 2017-08-24 2020-02-05 日本碍子株式会社 Group 13 element nitride layer, free-standing substrate and functional element
JP6854903B2 (en) 2017-08-24 2021-04-07 日本碍子株式会社 Group 13 element nitride layer, self-supporting substrate and functional element
JP7185123B2 (en) * 2017-12-26 2022-12-07 日亜化学工業株式会社 Optical member and light emitting device
JP7147644B2 (en) * 2019-03-18 2022-10-05 豊田合成株式会社 Method for manufacturing group III nitride semiconductor
CN111607825A (en) * 2020-06-02 2020-09-01 无锡吴越半导体有限公司 Substrate, self-supporting GaN single crystal based on substrate and preparation method of self-supporting GaN single crystal
CN116364819B (en) * 2023-05-31 2023-12-15 江西兆驰半导体有限公司 LED epitaxial wafer, preparation method thereof and LED

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200925340A (en) * 2007-10-04 2009-06-16 Sumitomo Electric Industries GaN epitaxial substrate, semiconductor device and methods for manufacturing gan epitaxial substrate and semiconductor device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3410863B2 (en) * 1995-07-12 2003-05-26 株式会社東芝 Compound semiconductor device and compound semiconductor light emitting device
JP3864870B2 (en) * 2001-09-19 2007-01-10 住友電気工業株式会社 Single crystal gallium nitride substrate, growth method thereof, and manufacturing method thereof
US7221037B2 (en) * 2003-01-20 2007-05-22 Matsushita Electric Industrial Co., Ltd. Method of manufacturing group III nitride substrate and semiconductor device
JP2004359495A (en) * 2003-06-04 2004-12-24 Ngk Insulators Ltd Alumina substrate for epitaxial film
JP4341702B2 (en) * 2007-06-21 2009-10-07 住友電気工業株式会社 Group III nitride semiconductor light emitting device
JP4981602B2 (en) * 2007-09-25 2012-07-25 パナソニック株式会社 Method for manufacturing gallium nitride substrate
US9012253B2 (en) * 2009-12-16 2015-04-21 Micron Technology, Inc. Gallium nitride wafer substrate for solid state lighting devices, and associated systems and methods

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200925340A (en) * 2007-10-04 2009-06-16 Sumitomo Electric Industries GaN epitaxial substrate, semiconductor device and methods for manufacturing gan epitaxial substrate and semiconductor device

Also Published As

Publication number Publication date
JP2015199635A (en) 2015-11-12
TW201627544A (en) 2016-08-01
TWI662163B (en) 2019-06-11
JP2016001738A (en) 2016-01-07
TW201708635A (en) 2017-03-01
JP5770905B1 (en) 2015-08-26

Similar Documents

Publication Publication Date Title
TWI563133B (en)
BR112015007533A2 (en)
BR112014017733A2 (en)
BR112014018502A2 (en)
BR112014017739A2 (en)
BR112014019326A2 (en)
BR112014018516A2 (en)
BR112014020341A2 (en)
BR112014018480A2 (en)
BR112014017855A2 (en)
BR112014017765A2 (en)
BR112014021878A2 (en)
BR112016005365A2 (en)
BR112014018468A2 (en)
BR112014018207A2 (en)
BR112014017901A2 (en)
BR112014019204A2 (en)
BR112015015948A2 (en)
BR112014018578A2 (en)
BR112014018483A2 (en)
BR112014017653A2 (en)
BR112014017794A2 (en)
BR112015015312A2 (en)
BR112014018353A2 (en)
BR112014018496A2 (en)