TWI562279B - Method for forming semiconductor structure having metal connection - Google Patents
Method for forming semiconductor structure having metal connectionInfo
- Publication number
- TWI562279B TWI562279B TW101145686A TW101145686A TWI562279B TW I562279 B TWI562279 B TW I562279B TW 101145686 A TW101145686 A TW 101145686A TW 101145686 A TW101145686 A TW 101145686A TW I562279 B TWI562279 B TW I562279B
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor structure
- metal connection
- forming semiconductor
- forming
- metal
- Prior art date
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101145686A TWI562279B (en) | 2012-12-05 | 2012-12-05 | Method for forming semiconductor structure having metal connection |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101145686A TWI562279B (en) | 2012-12-05 | 2012-12-05 | Method for forming semiconductor structure having metal connection |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201423908A TW201423908A (zh) | 2014-06-16 |
TWI562279B true TWI562279B (en) | 2016-12-11 |
Family
ID=51394138
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101145686A TWI562279B (en) | 2012-12-05 | 2012-12-05 | Method for forming semiconductor structure having metal connection |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI562279B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9627215B1 (en) | 2015-09-25 | 2017-04-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Structure and method for interconnection |
US10886226B2 (en) | 2018-07-31 | 2021-01-05 | Taiwan Semiconductor Manufacturing Co, Ltd. | Conductive contact having staircase barrier layers |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200816482A (en) * | 2006-09-04 | 2008-04-01 | Samsung Electronics Co Ltd | Semiconductor device free of gate spacer stress and method of manufacturing the same |
-
2012
- 2012-12-05 TW TW101145686A patent/TWI562279B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200816482A (en) * | 2006-09-04 | 2008-04-01 | Samsung Electronics Co Ltd | Semiconductor device free of gate spacer stress and method of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
TW201423908A (zh) | 2014-06-16 |
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