TWI561937B - - Google Patents

Info

Publication number
TWI561937B
TWI561937B TW101130476A TW101130476A TWI561937B TW I561937 B TWI561937 B TW I561937B TW 101130476 A TW101130476 A TW 101130476A TW 101130476 A TW101130476 A TW 101130476A TW I561937 B TWI561937 B TW I561937B
Authority
TW
Taiwan
Application number
TW101130476A
Other versions
TW201316133A (zh
Inventor
yong-hui Chen
Li-Wei Wu
Jun Zhang
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of TW201316133A publication Critical patent/TW201316133A/zh
Application granted granted Critical
Publication of TWI561937B publication Critical patent/TWI561937B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
TW101130476A 2011-08-22 2012-08-22 步進光蝕刻設備及光蝕刻曝光方法 TW201316133A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201110241791.3A CN102955368B (zh) 2011-08-22 2011-08-22 一种步进光刻设备及光刻曝光方法

Publications (2)

Publication Number Publication Date
TW201316133A TW201316133A (zh) 2013-04-16
TWI561937B true TWI561937B (zh) 2016-12-11

Family

ID=47745931

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101130476A TW201316133A (zh) 2011-08-22 2012-08-22 步進光蝕刻設備及光蝕刻曝光方法

Country Status (3)

Country Link
CN (1) CN102955368B (zh)
TW (1) TW201316133A (zh)
WO (1) WO2013026361A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106154760B (zh) * 2015-04-15 2019-01-29 上海微电子装备（集团）股份有限公司 一种曝光装置及曝光方法
TWI579662B (zh) * 2015-10-05 2017-04-21 A multi-channel alignment system based on spectrum processing, an alignment signal processing method and a photolithography apparatus
JP6723112B2 (ja) * 2016-08-29 2020-07-15 株式会社ブイ・テクノロジー 露光装置及び露光方法
CN109491201B (zh) * 2018-12-26 2024-01-19 仪晟科学仪器(嘉兴)有限公司 一种掩膜版用高精度二维运动机构
CN111082596B (zh) * 2019-12-23 2022-04-15 安徽机电职业技术学院 一种包括二自由度执行机构的自由度多方位微动台
CN114326320B (zh) * 2021-10-26 2023-11-07 江苏迪盛智能科技有限公司 步进光刻的控制方法、装置、设备及存储介质

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1470945A (zh) * 2002-06-10 2004-01-28 ������������ʽ���� 曝光装置及载物台装置、以及器件制造方法
US6937319B2 (en) * 1999-12-16 2005-08-30 Nikon Corporation Exposure method and apparatus with vibration-preventative control
TW201035692A (en) * 2008-12-19 2010-10-01 Nikon Corp Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08293459A (ja) * 1995-04-21 1996-11-05 Nikon Corp ステージ駆動制御方法及びその装置
JP3733174B2 (ja) * 1996-06-19 2006-01-11 キヤノン株式会社 走査型投影露光装置
CN2393123Y (zh) * 1999-11-01 2000-08-23 信息产业部电子第五十五研究所 大面积步进扫描式曝光机
JP2002305140A (ja) * 2001-04-06 2002-10-18 Nikon Corp 露光装置及び基板処理システム
KR101151575B1 (ko) * 2004-10-01 2012-06-01 가부시키가이샤 니콘 리니어 모터, 스테이지 장치 및 노광 장치
CN100498540C (zh) * 2005-11-17 2009-06-10 中国科学院电工研究所 步进扫描光刻机晶片台掩模台同步控制系统
CN102012639B (zh) * 2009-09-04 2013-09-11 上海微电子装备有限公司 一种硅片边缘保护方法与装置
CN102087482B (zh) * 2010-12-27 2012-10-03 中国科学院光电技术研究所 光刻机工件台同步运动误差校正控制系统

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6937319B2 (en) * 1999-12-16 2005-08-30 Nikon Corporation Exposure method and apparatus with vibration-preventative control
CN1470945A (zh) * 2002-06-10 2004-01-28 ������������ʽ���� 曝光装置及载物台装置、以及器件制造方法
TW201035692A (en) * 2008-12-19 2010-10-01 Nikon Corp Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method

Also Published As

Publication number Publication date
CN102955368A (zh) 2013-03-06
WO2013026361A1 (zh) 2013-02-28
TW201316133A (zh) 2013-04-16
CN102955368B (zh) 2015-09-30

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