TWI561685B - - Google Patents
Info
- Publication number
- TWI561685B TWI561685B TW104118022A TW104118022A TWI561685B TW I561685 B TWI561685 B TW I561685B TW 104118022 A TW104118022 A TW 104118022A TW 104118022 A TW104118022 A TW 104118022A TW I561685 B TWI561685 B TW I561685B
- Authority
- TW
- Taiwan
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW104118022A TW201643280A (zh) | 2015-06-03 | 2015-06-03 | 電子元件微電鍍監測添加劑含量之快速定量法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW104118022A TW201643280A (zh) | 2015-06-03 | 2015-06-03 | 電子元件微電鍍監測添加劑含量之快速定量法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI561685B true TWI561685B (zh) | 2016-12-11 |
TW201643280A TW201643280A (zh) | 2016-12-16 |
Family
ID=58055854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104118022A TW201643280A (zh) | 2015-06-03 | 2015-06-03 | 電子元件微電鍍監測添加劑含量之快速定量法 |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW201643280A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114438548A (zh) * | 2022-01-12 | 2022-05-06 | 杭州三耐环保科技股份有限公司 | 一种电解生产中的添加剂异常监控方法和系统 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200727755A (en) * | 2006-01-06 | 2007-07-16 | Rockwood Electrochemicals Asia Ltd | Method for monitoring the filling performance of copper plating formular |
TW201425924A (zh) * | 2012-12-20 | 2014-07-01 | Atotech Deutschland Gmbh | 監控銅電解質填充性質之方法 |
-
2015
- 2015-06-03 TW TW104118022A patent/TW201643280A/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200727755A (en) * | 2006-01-06 | 2007-07-16 | Rockwood Electrochemicals Asia Ltd | Method for monitoring the filling performance of copper plating formular |
TW201425924A (zh) * | 2012-12-20 | 2014-07-01 | Atotech Deutschland Gmbh | 監控銅電解質填充性質之方法 |
Non-Patent Citations (1)
Title |
---|
盧政泯,"微電子製程中銅電鍍快速監測及動力學之研究",國立聯合大學 化學工程學系碩士班 碩士論文,國家圖書館上架日 2014/08/20 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114438548A (zh) * | 2022-01-12 | 2022-05-06 | 杭州三耐环保科技股份有限公司 | 一种电解生产中的添加剂异常监控方法和系统 |
Also Published As
Publication number | Publication date |
---|---|
TW201643280A (zh) | 2016-12-16 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |