TWI560878B - Method of manufacturing array substrate for liquid crystal display, method of forming metal line, and etching solution composition for metal oxide semiconductor layer - Google Patents

Method of manufacturing array substrate for liquid crystal display, method of forming metal line, and etching solution composition for metal oxide semiconductor layer

Info

Publication number
TWI560878B
TWI560878B TW101139230A TW101139230A TWI560878B TW I560878 B TWI560878 B TW I560878B TW 101139230 A TW101139230 A TW 101139230A TW 101139230 A TW101139230 A TW 101139230A TW I560878 B TWI560878 B TW I560878B
Authority
TW
Taiwan
Prior art keywords
liquid crystal
semiconductor layer
crystal display
oxide semiconductor
array substrate
Prior art date
Application number
TW101139230A
Other languages
Chinese (zh)
Other versions
TW201324781A (en
Inventor
Hyun-Kyu Lee
Suk Lee
Kyung-Sub Jung
Eun-Won Lee
Jin-Sung Kim
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020110114676A external-priority patent/KR20130049576A/en
Priority claimed from KR1020110115356A external-priority patent/KR20130050155A/en
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of TW201324781A publication Critical patent/TW201324781A/en
Application granted granted Critical
Publication of TWI560878B publication Critical patent/TWI560878B/en

Links

TW101139230A 2011-11-04 2012-10-24 Method of manufacturing array substrate for liquid crystal display, method of forming metal line, and etching solution composition for metal oxide semiconductor layer TWI560878B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110114676A KR20130049576A (en) 2011-11-04 2011-11-04 Manufacturing method of an array substrate for liquid crystal display
KR1020110115356A KR20130050155A (en) 2011-11-07 2011-11-07 Manufacturing method of an array substrate for liquid crystal display

Publications (2)

Publication Number Publication Date
TW201324781A TW201324781A (en) 2013-06-16
TWI560878B true TWI560878B (en) 2016-12-01

Family

ID=48314883

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101139230A TWI560878B (en) 2011-11-04 2012-10-24 Method of manufacturing array substrate for liquid crystal display, method of forming metal line, and etching solution composition for metal oxide semiconductor layer

Country Status (2)

Country Link
CN (1) CN103107130B (en)
TW (1) TWI560878B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI640655B (en) * 2013-12-23 2018-11-11 韓商東友精細化工有限公司 Method of preparing array of thin film transistor and etchant composition for molybdenum-based metal film/metal oxide film
KR102091541B1 (en) * 2014-02-25 2020-03-20 동우 화인켐 주식회사 Preparing method for organic light emitting display device
KR102209685B1 (en) * 2014-06-30 2021-01-29 동우 화인켐 주식회사 Etching solution composition for metal layer and manufacturing method of an array substrate for Liquid crystal display using the same
CN105118854B (en) 2015-07-01 2019-03-01 京东方科技集团股份有限公司 Metal oxide semiconductor films, thin film transistor (TFT), preparation method and device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080079006A1 (en) * 2006-09-29 2008-04-03 Samsung Electronics Co., Ltd. Signal line for a display device, etchant, thin film transistor panel, and method for manufacturing the same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101337263B1 (en) * 2004-08-25 2013-12-05 동우 화인켐 주식회사 Etchant composition for indium oxide layer and etching method using the same
JP5328083B2 (en) * 2006-08-01 2013-10-30 キヤノン株式会社 Oxide etching method
KR101619380B1 (en) * 2009-05-14 2016-05-11 삼성디스플레이 주식회사 Etchant and method of array substrate using the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080079006A1 (en) * 2006-09-29 2008-04-03 Samsung Electronics Co., Ltd. Signal line for a display device, etchant, thin film transistor panel, and method for manufacturing the same

Also Published As

Publication number Publication date
TW201324781A (en) 2013-06-16
CN103107130B (en) 2016-01-06
CN103107130A (en) 2013-05-15

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