TWI558841B - Slit valve tunnel support - Google Patents

Description

Slit valve channel support

Embodiments of the invention generally relate to the manufacture of electronic components. More specifically, embodiments of the present invention relate to methods and apparatus for preventing deformation in the vicinity of a slit valve tunnel in a large area substrate processing chamber.

The substrate processing chamber is typically in communication with the substrate transfer chamber through a sealable opening that is wide and relatively short to facilitate placement and removal of the horizontally oriented substrate. It is known to use a chamber isolation valve (also known as a slit valve) to seal such an opening. For example, a sealing plate (also referred to as a sealing door) of the slit valve can be extended to seal the opening and retracted to allow the substrate to pass through the opening.

The slit valve is designed to seal the process chamber during processing and to allow the process chamber to be maintained under processing conditions such as a vacuum environment. However, a pressure differential between the interior of the processing chamber and the exterior may cause deformation of the opening sealed by the slit valve. This is especially true for processing chambers that require very large substrates that require very wide openings (i.e., sizes greater than about 1,000 mm x 1,000 mm).

Therefore, there is a need for an improved slit valve that prevents large pressure differences between chambers.

Embodiments of the present invention provide methods and apparatus for preventing deformation in the vicinity of a slit valve passage in a large area substrate processing chamber.

One embodiment of the present invention provides a processing chamber including: a chamber having an opening configured to allow passage of a substrate; a slit valve disposed outside the chamber to selectively seal the opening; and a support assembly , is rigidly coupled between the chamber body and the housing of the slit valve to prevent deformation of the opening.

Methods and apparatus for preventing deformation of a slit valve passage are disclosed. Embodiments of the present invention include a slit valve channel support assembly 130 that increases the rigidity of the chamber body, particularly in the vicinity of the long slit valve passage, to increase the rigidity of the chamber body to prevent deformation of the chamber body. In one embodiment, the slit valve channel support assembly includes a plate support coupled to the chamber body, the chamber body coupled to the tube support, the tube support coupled to a slit valve housing disposed outside the chamber (housing). The chamber body forms a rigid structure with a slit valve housing, a tube support and a plate support, thus achieving increased rigidity to prevent deformation caused by a pressure differential between the interior and exterior of the chamber body. The accuracy of the treatment and the uniformity of the treatment can be improved as the deformation is reduced.

1 is a schematic plan view of an exemplary substrate processing system 10 that is applicable to benefit from the present invention. The substrate processing system 10 can include a load lock chamber 20, a transfer chamber 30, a transfer robot 31, and a plurality of substrate processing chambers 40 and 50. The load lock chamber 20 allows one or more substrates to be introduced into the vacuum environment of the substrate processing system 10 without pressurizing the entire system to atmospheric pressure. The substrate is processed in the processing chamber 40 and the processing chamber 50. The substrate processing chamber 40 and the substrate processing chamber 50 may perform, for example, chemical vapor deposition (CVD), physical vapor deposition (PVD), and plasma enhanced chemical vapor deposition (plasma-) on the substrate. Enhanced chemical vapor deposition; PECVD). In one embodiment, processing system 10 is configured to process large area substrates, such as substrates for flat panel displays.

In general, substrate processing chamber 40 and substrate processing chamber 50 may be isolated from each other to minimize penetration of incompatible process gases, and may require significantly different degrees of vacuum because of different processes. The transfer robot 31 inside the transfer chamber 30 transfers the substrate between the substrate processing chamber 40, the substrate processing chamber 50, and the load lock chamber 20 as needed. In general, each chamber of substrate processing system 10 can be isolated from all other chambers by means of one or more slit valves 101. As shown in Fig. 1, the slit valve 101 is provided in the transfer chamber 30 and outside the processing chamber 40 and the processing chamber 50.

At least one of the processing chamber 40, the processing chamber 50 is engaged with the channel support assembly 130. As further described below, the channel support assembly 130 increases the rigidity of the chamber body of the processing chambers 40, 50, particularly in the vicinity of the long slit valve passages to increase the rigidity of the chamber body to prevent deformation of the chamber body.

2 is a schematic cross-sectional front view of a processing chamber 50 attached to a slit valve 101 in accordance with one embodiment of the present invention. Fig. 3 is a schematic cross-sectional side view of the processing chamber 50 and the slit valve 101 of Fig. 2. The processing chamber 40 can be similarly constructed.

The processing chamber 50 includes a chamber body 52, a cover 56 attached to the chamber body 52, and a backing plate 60, a hanger 58, and a gas distribution plate 62 disposed in the opening of the cover 56 for supplying process gas to the processing chamber 50. A slit valve passage 54 is formed on one side of the chamber body 52 and is configured to allow passage of the substrate to be processed.

In one embodiment, the slit valve 101 is attached to the processing chamber 50 outside of the chamber body 52. The slit valve 101 is configured to selectively seal the slit valve passage 54 and to allow a pressure differential between the interior and exterior of the process chamber 50 when the slit valve passage 54 is sealed.

In one embodiment, the slit valve 101 includes a closure member 103 for sealing the slit valve passage 54 and a valve housing 105 at least a portion of the closure member 103 movably disposed therein. The valve housing 105 is typically a metal housing having an opening 117 and an opening 115, while the openings 115, 117 are aligned with the slit valve passage 54 of the processing chamber. When unsealed, the slit valve passage 54 together with the opening 117, opening 115 provides a passage for the substrate to be treated. The valve housing 105 of the slit valve 101 can be placed against the processing chamber 50 such that a seal is formed between the valve housing 105 and the slit valve passage 54 to be sealed. The valve housing 105 provides structural support to the chamber body 52, particularly during high pressure differential processing.

The closure member 103 moves vertically within the valve housing 105 to seal and open the slit valve passage 54 of the process chamber 50. In one embodiment, the seal 104 may be disposed around the opening 117 or on the closure member 103 to achieve a hermetic seal between the closure member 103 and the valve housing 105.

In one embodiment, the channel support assembly 130 is coupled to the processing chamber 50 to prevent deformation of the slit valve passage 54 due to a pressure differential between the vacuum inside the chamber body 52 and the atmospheric pressure outside the chamber body 52. . For example, the channel support assembly 130 is configured to prevent the upper edge 54a of the slit valve passage 54 from sagging due to the inward pressure acting on the chamber body 52, as indicated by the dashed line 54b.

In one embodiment, the channel support assembly 130 includes a tube support 120 coupled to the slit valve housing 105 and a plate support 122 coupled to both the tube support 120 and the processing chamber 50. In one embodiment, the tube support 120 and the plate support 122 may be disposed above the slit valve housing 105 and extend at least along the length of the slit valve passage 54. The hollow tube support 120 is lightweight and provides rigidity to the processing chamber 50. In one embodiment, the tube support 120 and the plate support 122 may be formed from steel. Tube support 120 and plate support 122 can be secured in place by fastening, clamping, or other suitable means.

In the embodiment depicted in FIG. 3, the plate support 122 is coupled to the tube support 120 by fasteners 140 that pass through the apertures 142 formed in the plate support 122 and form with the tube support 120. The threaded holes 144 are engaged. The tube support 120 is coupled to the slit valve housing 105 by a fastener 190 that passes through an aperture 192 formed in the tube support 120 and that engages a threaded bore 194 formed in the slit valve housing 105. It is contemplated that the plate support 122, the tube support 120, and the slit valve housing 105 can be fastened and/or secured together in different ways that provide the desired effect of preventing sagging in the slit valve passage.

The chamber body 52 of the processing chamber 50 forms a rigid body with the plate support 122, the tube support 120 and the valve housing 105, thus obtaining increased rigidity to prevent deformation caused by a pressure difference between the inside and the outside of the chamber body. . The accuracy of the treatment and the uniformity of the treatment can be improved as the deformation is reduced.

In one embodiment, as shown in FIG. 3, the fastener 150 extends through an aperture 152 formed in the panel support 122 and engages a threaded aperture 156 formed in the chamber body 52. To allow the fastener 150 to enter the aperture 152, a fan-shaped opening 154 can be formed in the surface of one side of the panel support 122, as further shown in Figures 3A-3B. The plate support 122 can be coupled to the chamber cover 56, the back plate 60, or the chamber body 52. When connected to the backing plate 60, the board support 122 can be electrically insulated from the backing plate 60. The plate support 122 oriented in a vertical plane is highly resistant to vertical deformation, thereby substantially preventing the chamber body 52 from sagging into the slit valve passage 54.

Moreover, as shown in the embodiment of FIG. 3, the cover 56 is supported by the cover reinforcement panel 180 and/or the cover reinforcement tube 182 to prevent the cover 56 from exerting a force on the chamber body 52, which may result in the slit valve passage 54. The sag is caused by the force exerted by the backing plate 60 on the cover 56 due to the vacuum within the processing chamber 50. In the embodiment depicted in FIG. 3, the cover reinforcement panel 180 is coupled to the cover 56 by a fastener 160 that is disposed through the aperture 162 in the cover reinforcement panel 180 and with the cover 56. The threaded holes 166 formed therein are engaged. A scalloped hole 164 is provided in the cover reinforcement panel 180 to provide access to the fastener 160. The cover stiffener 180 may be formed from a conductive material, such as aluminum or steel, having radio frequency power that is returned through the cover 56 to pass through the cover stiffener 180 to the cover plate 184, which sends RF current back to the RF power source (figure Not shown). An insulator 188 is disposed between the backing plate 60 and the cover 56 to provide electrical insulation therebetween.

Reinforcing tube 182 is coupled to stiffener 180 on the opposite side of cover 56. In the embodiment illustrated in FIG. 3, the reinforcement tube 182 is secured to the cover reinforcement panel 180 using fasteners 170.

The support assembly 130 can have any suitable structure that provides rigidity to the processing chamber depending on the configuration of the chamber or slit valve or other associated device. In one embodiment, as shown in FIG. 4, the plate support 124 can be coupled to the backing plate 60 and the bridging member 126 can be used to connect the plate support 124 to the tube support 120.

Figure 5 illustrates another embodiment of a partial cross-sectional side view of a process chamber and a slit valve in accordance with another embodiment of the present invention. The processing chamber 50 illustrated in FIG. 5 is substantially similar to the processing chamber 50 illustrated in FIG. 3 except for the feature in which the panel support 510 of the support assembly 500 is in the slit valve passage 54. The position of the sagging is connected to the cover 56. Although not illustrated in FIG. 5, the tube support 120 can be coupled to the slit valve housing 105 and the plate support 510 in the manner illustrated in FIG. 3 or other suitable manner.

In the embodiment illustrated in FIG. 5, the plate support 510 is secured to the cover 56 by fasteners 508 that are disposed through holes 502 formed in the plate support 510 and The threaded holes 506 formed in the cover 56 are engaged. The passage of the fastener 508 is provided by a sector opening 504.

To provide a good RF return path between the cover 56 and the cover panel 184, a conductor 512 is coupled between the cover 56 and the cover panel 184. Conductor 512 is typically a good radio frequency conductor such as an aluminum sheet. In the embodiment illustrated in FIG. 5, the conductor 512 includes a tab that is clamped between the plate support 510 and the cover 56 at one end, and is disposed substantially parallel to the first connection to the cover plate 184. A projection and a second projection offset from the first projection imparts a substantially Z-shaped cross-section to the conductor. Conductor 512 is electrically insulated from backing plate 60.

In various embodiments disclosed herein, the plate support is generally illustrated as having a rectangular cross-section that extends substantially along the entire side of the process chamber body 52. It is contemplated that the panel support can be made of any suitable structural member such as aluminum, steel, or other suitable material. While the plate support is illustrated as having a substantially rectangular cross-section, it will be appreciated that the cross-section or other geometry of the plate support may include other geometries suitable for reinforcing the chamber body and preventing sagging in the slit valve passage 54. Other geometries include hollow shapes such as tubes, high beams, triangles, trapezoidal shapes, and other geometric shapes. Likewise, the tube support disposed herein may alternatively be configured similar to a plate support that is designed to prevent sagging in the slit valve due to forces from vacuum pressure within the processing chamber 50.

Although the tube support and the plate support are described herein as a support assembly, any structure that provides rigidity to the process chamber body to prevent deformation of the slit valve opening is contemplated.

While the foregoing is directed to embodiments of the present invention, the subject matter of the invention The scope of the patent application is decided.

10. . . system

20. . . Load lock room

30. . . Transfer room

31. . . Passing robot

40,50. . . Processing room

52. . . Chamber body

54. . . Slit valve channel

54a. . . Upper edge

54b. . . dotted line

56. . . cover

58. . . Suspension

60. . . Backplane

62. . . Gas distribution plate

101. . . Slit valve

103. . . Closure member

104. . . Seals

105. . . Valve housing

115,117. . . Opening

120. . . Pipe support

122. . . Plate support

124. . . Plate support

126. . . Bridging member

130. . . Support assembly

140. . . fastener

142. . . hole

144. . . Threaded hole

150. . . fastener

152. . . hole

154. . . Opening

156. . . hole

160. . . fastener

162. . . hole

164. . . Fan hole

166. . . hole

170. . . fastener

180. . . Cover reinforcement

182. . . Cover reinforcement tube

184. . . Cover plate

188. . . Insulator

190. . . fastener

192. . . hole

194. . . Threaded hole

500. . . Support assembly/fastener

502. . . hole

504. . . Opening

506. . . hole

510. . . Plate support

512. . . conductor

Therefore, the above-described features of the present invention may be understood in detail, and a more detailed description of the invention may be It is to be understood, however, that the appended claims are in the claims

Figure 1 is a schematic plan view of an exemplary substrate processing system that may be adapted to benefit from the present invention.

2 is a schematic cross-sectional front view of a processing chamber attached to a slit valve in accordance with an embodiment of the present invention.

Fig. 3 is a schematic cross-sectional side view of the processing chamber and the slit valve of Fig. 2.

3A-B is a partial view of the plate support of the processing chamber of Fig. 3.

Figure 4 is a schematic cross-sectional side view of a process chamber and a slit valve in accordance with another embodiment of the present invention.

Figure 5 is a schematic cross-sectional side view of a process chamber and a slit valve in accordance with another embodiment of the present invention.

For the sake of clarity, the same component symbols have been used where applicable to specify the same components that are common between the various figures.

50. . . Processing room

54. . . Slit valve channel

54a. . . Upper edge

54b. . . dotted line

56. . . cover

60. . . Backplane

103. . . Closure member

104. . . Seals

105. . . Valve housing

117. . . Opening

120. . . Pipe support

Claims (20)

A processing chamber comprising: a chamber body having a passage configured to allow passage of a substrate; a slit valve disposed on an outer side of the chamber body to selectively seal the passage; and a support assembly rigidly Coupling between the chamber body and a housing of the slit valve to prevent deformation of the passage, wherein the support assembly further comprises: a tube support coupled to a housing of the slit valve; A plate support is coupled to the tube support and the chamber body. A processing chamber comprising: a chamber body having a passage configured to allow passage of a substrate; a slit valve disposed on an outer side of the chamber body to selectively seal the passage; and a support assembly rigidly Coupling between the chamber body and a housing of the slit valve to prevent deformation of the passage, wherein the support assembly further comprises: a plate support member disposed above the housing of the slit valve And extending at least along a length of one of the channels formed through the chamber body. A processing chamber comprising: a chamber body having a passage configured to allow passage of a substrate; a slit valve disposed on an outer side of the chamber body to selectively seal the passage; and a support assembly rigidly coupled between the chamber body and a housing of the slit valve to prevent The channel is deformed, wherein the support assembly further comprises: a hollow tube support coupled to the processing chamber above the passage formed through the chamber body. The processing chamber of claim 1 or 2, wherein the plate support is coupled to a cover of the chamber body. The process chamber of claim 1 or 2, wherein the plate support is coupled to a backing plate of a gas distribution assembly. The processing chamber of claim 1, wherein the plate support and the tube support are formed of steel. The processing chamber of any one of claims 1-3, further comprising: a cover for closing the chamber body; and a cover reinforcing plate and/or a cover reinforcing tube coupled to the cover An upper surface. The processing chamber of any one of claims 1-3, further comprising: a cover that closes the chamber; An RF conductive cover reinforcing plate is coupled to an upper surface of the cover. The processing chamber of claim 8 further comprising: a reinforcing tube coupled to the reinforcing plate on one side of the cover. The processing chamber of claim 8, further comprising: a cover plate disposed above the cover reinforcement plate, the cover plate electrically connecting the cover reinforcement plate and a radio frequency power source to serve as a grounding Returns a part of the path. The processing chamber of claim 10, further comprising: a conductor for providing a radio frequency connection between the cover and the cover plate. The processing chamber of claim 10, further comprising: a conductor coupled between the cover and the cover plate. The processing chamber of claim 12, wherein the conductor further comprises: an aluminum plate. The processing chamber of claim 12, wherein the conductor further comprises: a first tab coupled to the cover; and a second protrusion disposed parallel to the first Protruding section, and Offset from the first protrusion, the second protrusion is coupled to the cover plate. The processing chamber of claim 12, wherein the conductor further comprises a Z-shaped cross section. A processing chamber comprising: a chamber having a passage configured to allow passage of a substrate; a cover disposed on the chamber; a gas distribution plate located in the chamber; a backing plate supporting the a gas distribution plate; a slit valve disposed in a housing coupled to the chamber body, the slit valve being operable to selectively seal the passage; and a support assembly rigidly coupled to At least one of the gas distribution plate, the lid and the chamber body, the support assembly is disposed adjacent to the passage formed in the chamber body in a position to prevent deformation of the passage. The processing chamber of claim 16, wherein the support assembly comprises: a plate support oriented in a vertical plane and coupled to the gas distribution plate, the cover and the chamber body at an edge At least one of them. The process chamber of claim 17, wherein the plate support is steel. The processing chamber of claim 16, wherein the support assembly comprises: a hollow tube coupled to both the housing and the plate support. The processing chamber of claim 16, further comprising: a cover plate disposed above the cover, the cover plate being part of a radio frequency ground return path.