201134980 、發明說明： 【發明所屬之技術領域】 本發明的實施例一般係涉 ^ . ^ nn 夂電子兀件製造。更具體地 說本發明的實施例係涉及防止在 大面積基板處理室中於狹 縫閥紅（sht valve tunne_近變形的方法和設備。 【先前技術】 基板處理室一般通過可來抖pq 1 J在封開口與基板傳遞室連通，而 該可密封開口係寬且相對敕銪 w 了較短以方便水平定向基板的置入 和移除。眾所周知，使用腔官 用紅至^離閥（亦稱之為狹缝閥）來 密封這樣的開Π。例如’可使狹縫閥的密封板（亦稱之為密 封門）延伸以密封開Π，並且縮回以允許基板穿過此開口。 狹缝閥經設計以在處理期間密封處理室，並且允許處理 室維持在例如真空環境的處理條件。然而，在處理室内部和 外部之間的壓差可能導致由狹縫閥密封的開口變形。對於處 理需要非常寬開口的非常大型的基板（即，尺寸大於約i,000 mm X 1，〇〇〇 mm )的處理室尤其如此。 因此’存在對於預防腔室之間的大壓差的改進狹縫閥的 需要。 【發明内容】 本發明的實施例提供了用於防止在大面積基板處理室 201134980 中於狹縫閥通道附近變形的方法和設備。 本發明的一個實施例提供一處理室，其包括 具有配置以允許基板通過的開 外側，以選擇性地密封開口； 接在室體與狹缝閥的殼體之間 —室體， 口，一狹缝閥，係設置在室體 以及一支撐組件，係剛性地耦 ’以防止開口變形。 【實施方式】 本發明揭示了用於防止狹縫閥通道變形的方法和設 備。本發明的實施例包含狹縫閥通道支撐組件13〇，該狹縫 閥通道支撑組件130增加了室體的剛性，尤其在長狹：閥通 道附近增加了室體的剛性以防止室體變形。在一個實施例 中，狹縫閥通道支撐組件包含耦接至室體的板支撐件，該室 體連接至Ί*支#件，該管支料祕至設置在腔室外部的狹 ㈣㈣（h_ing)。室體形成具有狹縫閥殼體、管支樓件和 板支樓件的剛性結構，因此獲得了增加的剛性，以預防由在 室體内部和外部之間的壓差所導致的變形。處理的精確性和 處理的均勻性可隨著變形的減少而改進。 第1圖為可適用而受益於本發明的示例性基板處理系統 10的示意平面圖。基板處理系統10可以包括加載鎖定室 20、傳遞室30'傳遞機器手（r〇b〇t)31和多個基板處理室 和50 #載鎖疋室2〇允許將一或多個基板引入基板處理系 統10的真空環境中，而無需將整個系統加壓到大氣壓力。 在處理至40和處理室5〇中處理基板。基板處理室的和基 201134980 板處理室50可以在基板上執行例如：化學氣相沉積卜“爪卜心 vapor deposition; CVD)、物理氣相沉積（physicai vap〇r deposition; PVD)和電漿增強化學氣相沉積（piasma enhanced chemical vapor deposition; PECVD)的處理。在一個實施例 中，處理系統10係配置以處理大面積基板，諸如用於平板 顯示器的基板。 一般地，基板處理室4〇和基板處理室50可以彼此隔 離，以使不相容處理氣體的滲透降至最低，且因為不同處理 可此需要顯著不同的真空度。在傳遞室30内部的傳遞機器 手31根據需要而在基板處理室4〇、基板處理室5〇和加載鎖 疋至20之間傳遞基板。一般地，基板處理系統1〇的各腔室 可以借助於一或多個狹縫閥101與所有其他腔室隔離。如第 1圖所示，狹縫閥1〇1係設置在傳遞室3〇中，並且在處理室 4〇、處理室50的外部。 處理室40、處理室50中的至少一者與通道支撐組件ι〇3 接5 如下文進一步描述，通道支撐組件103增加處理室40、 50的室體之的剛性，尤其在長狹縫閥通道附近增加了室體的 剛性以防止室體變形。 第2圖是根據本發明的一個實施例之附接至狹縫閥1 〇 i 的處理室50之示意截面前視圖。第3圖是第2圖的處理室 5 0與狹缝閥10 1之示意截面側視圖。可以類似地建構處理室 40 〇 處理室50包含室體52、附接至室體52的蓋56、及背 板60、懸掛件58 ’以及設置在蓋56的開口中用於向處理室 201134980 50供應處理氣體的氣體分配板62。狹縫閥通道54在室體52 的一侧上形成，並且經配置以允許待處理的基板通過。 在一個貫施例中，狹缝閥i 〇丨在室體5 2外部附接至處 理室50。狹缝閥1〇1係配置以選擇性地密封該狹縫閥通道 54，並且當狹缝閥通道54密封時允許在處理室5()内部和外 部之間的壓差。 在一個實施例中，狹縫閥丨〇丨包含用於密封狹縫閥通道 54的封閉構件1〇3和至少一部分封閉構件1〇3可以在其中移 動地設置的閥殼體1 05。閥殼體} 〇5通常是具有開口〗丨7和 開口 11 5的金屬外殼，而開口 i丨5、丨丨7與處理室的狹縫閥通 道54對準。當未密封時’狹縫閥通道54與開口丨丨7、開口 u5 —起提供用於待處理的基板之通道。狹缝閥1〇1的閥殼 體105可以抵靠處理室50放置，以使得在閥殼體1〇5和待 密封的狹縫閥通道54之間形成密封。閥殼體丨〇5尤其在高 壓差處理期間向室體5 2提供結構支撑。 封閉構件103在閥殼體1 〇5内垂直地移動，以密封和開 啟處理室50的狹縫閥通道54。在一個實施例中，密封件ι〇4 了以》又置在開口 117周圍，或在封閉構件1 〇 3上，以實現在 封閉構件103和閥殼體105之間的氣密密封。 在一個實施例中’通道支撐組件130耦接至處理室5〇 以防止狹縫閥通道54由於在室體52内部的真空和在室體52 卜的大氣壓力之間的壓差所而產生的變形。例如，通道支 撐組件130係配置以防止狹縫閥通道54的上邊緣Ma由於作 用於至體52的内向壓力而下垂，如虛線5 4b所示。 201134980 在一個實施例中，通道支撐組件13G包含輕接至狹縫間 殼體⑼的管支樓件m，和減至管支撐件處理室 5〇兩者的板切件122。在—個實施财，管切件12〇和 板支撑件122可以設置在狹縫閥殼體105上方，並且至少产 著狹縫閥通道54的長度而延伸。空心的管支撐件12〇重量 輕’並且對處理室5G提供剛性。在―個實施例中，管支樓 件120和板支樓件122可由鋼形成。管支料⑶和板支撐 件122可以藉由緊固、灸緊或其他適當的方法固定就位。 在第3圖所繪的實施例中，板支禮# 122通過緊固件14〇 連接至管支撐件120，該緊固件140穿過在板支撐件122中 先成的孔142並且與管支撐# 12()中形成的螺紋&⑷唾 合。管支撐件m藉由緊固件19〇連接至狹缝間殼體1〇5, 該緊固件190穿過太與士一从， 在&支撐件120中形成的孔192並且與狹 途閥殼體1 〇 5中开;^ 成的累紋孔194喃合。可以預期板支樓件 芽件1 22和狹縫閥殼體丨〇5可以採提供防止狹縫 間通:C中的下垂的預期效果的不同方式緊固及/或固定在一 起。 處理至50的室體52與板支撑件I22、管支禮件12〇和 閥殼體1 0 5形成剛极挪 ^ 體’.因此獲得了增加的剛性，以預防由 在室體内部和外部之間的壓差導致的變形。處理的精確性和 處理的均勻性可隨著變形的減少而改進。 在一個實施例φ 甲如第3圖所示，緊固件iso延伸穿過 在板支撐件120中形成的孔152’並且與在室體52中形成的 螺紋孔156喷合。為了允許緊固件15〇進入孔M2,可以在 201134980201134980, invention description: [Technical field to which the invention pertains] Embodiments of the invention generally relate to the manufacture of electronic components. More specifically, embodiments of the present invention relate to methods and apparatus for preventing slit valve red in a large-area substrate processing chamber. [Prior Art] The substrate processing chamber generally passes through a pj 1 J is connected to the substrate transfer chamber in the sealing opening, and the sealable opening is wide and relatively short to facilitate the placement and removal of the horizontally oriented substrate. It is known to use the cavity to use the red to the valve (also It is referred to as a slit valve to seal such an opening. For example, a sealing plate (also referred to as a sealing door) of the slit valve may be extended to seal the opening and retracted to allow the substrate to pass through the opening. The slit valve is designed to seal the process chamber during processing and to allow the process chamber to be maintained under processing conditions such as a vacuum environment. However, a pressure differential between the interior and exterior of the process chamber may cause deformation of the opening sealed by the slit valve. This is especially true for processing chambers that require very large openings with very wide openings (ie, sizes greater than about i, 000 mm X 1, 〇〇〇 mm). Therefore 'there is a large differential pressure between the chambers. The need for a slit valve. SUMMARY OF THE INVENTION Embodiments of the present invention provide methods and apparatus for preventing deformation in the vicinity of a slit valve passage in a large area substrate processing chamber 201134980. One embodiment of the present invention provides a process a chamber comprising an open outer side configured to allow passage of the substrate to selectively seal the opening; between the chamber body and the housing of the slit valve - a chamber body, a port, a slit valve, and a chamber body And a support assembly rigidly coupled to prevent deformation of the opening. [Embodiment] The present invention discloses a method and apparatus for preventing deformation of a slit valve passage. Embodiments of the present invention include a slit valve passage support assembly 13 The slit valve passage support assembly 130 increases the rigidity of the chamber body, particularly in the vicinity of the valve passage to increase the rigidity of the chamber body to prevent deformation of the chamber body. In one embodiment, the slit valve passage support assembly includes a coupling. Connected to the plate support of the chamber body, the chamber body is connected to the Ί*支# piece, the pipe branch is secreted to a narrow (four) (four) (h_ing) disposed outside the chamber. The chamber body is formed with a slit valve housing, The rigid structure of the pipe slab and the slab floor member thus achieves increased rigidity to prevent deformation caused by the pressure difference between the inside and the outside of the chamber body. The accuracy of the treatment and the uniformity of the treatment can be Figure 1 is a schematic plan view of an exemplary substrate processing system 10 that may be utilized to benefit from the present invention. The substrate processing system 10 may include a load lock chamber 20, a transfer chamber 30' transfer robot (r〇 The b〇t) 31 and the plurality of substrate processing chambers and the 50 # load lock chamber 2 allow one or more substrates to be introduced into the vacuum environment of the substrate processing system 10 without the need to pressurize the entire system to atmospheric pressure. The substrate is processed into the processing chamber 5 to 40. The substrate processing chamber and the substrate 201134980 The processing chamber 50 can be performed on the substrate, for example, chemical vapor deposition, "CVD deposition" (CVD), physical vapor deposition (physicai). Vap〇r deposition; PVD) and plasma enhanced chemical vapor deposition (PECVD) treatment. In one embodiment, processing system 10 is configured to process large area substrates, such as substrates for flat panel displays. In general, the substrate processing chamber 4 and the substrate processing chamber 50 can be isolated from each other to minimize penetration of incompatible process gases, and because different processes may require significantly different degrees of vacuum. The transfer robot 31 inside the transfer chamber 30 transfers the substrate between the substrate processing chamber 4, the substrate processing chamber 5, and the load lock 20 as needed. In general, the chambers of the substrate processing system 1 can be isolated from all other chambers by means of one or more slit valves 101. As shown in Fig. 1, the slit valve 1〇1 is disposed in the transfer chamber 3〇 and outside the processing chamber 4 and the processing chamber 50. At least one of the processing chamber 40, the processing chamber 50 is coupled to the channel support assembly ι3. As further described below, the channel support assembly 103 increases the rigidity of the chambers of the processing chambers 40, 50, particularly in long slit valve channels. The rigidity of the chamber body is increased nearby to prevent deformation of the chamber body. Figure 2 is a schematic cross-sectional front view of a processing chamber 50 attached to a slit valve 1 〇 i in accordance with one embodiment of the present invention. Fig. 3 is a schematic cross-sectional side view of the processing chamber 50 and the slit valve 10 1 of Fig. 2; The process chamber 40 can be similarly constructed. The process chamber 50 includes a chamber body 52, a cover 56 attached to the chamber body 52, and a backing plate 60, a hanger 58', and an opening disposed in the cover 56 for use in the process chamber 201134980 50 A gas distribution plate 62 for processing a gas is supplied. A slit valve passage 54 is formed on one side of the chamber body 52 and is configured to allow passage of the substrate to be processed. In one embodiment, the slit valve i is attached to the processing chamber 50 outside the chamber body 52. The slit valve 1〇1 is configured to selectively seal the slit valve passage 54 and to allow a pressure differential between the interior and exterior of the process chamber 5() when the slit valve passage 54 is sealed. In one embodiment, the slit valve dam includes a closure member 1〇3 for sealing the slit valve passage 54 and a valve housing 105 in which at least a portion of the closure member 1〇3 can be moved. The valve housing 〇 5 is typically a metal housing having an opening 丨 7 and an opening 11 5 , while the openings i 丨 5, 丨丨 7 are aligned with the slit valve passage 54 of the process chamber. When not sealed, the slit valve passage 54 provides a passage for the substrate to be processed together with the opening 丨丨7 and the opening u5. The valve housing 105 of the slit valve 1〇1 can be placed against the processing chamber 50 such that a seal is formed between the valve housing 1〇5 and the slit valve passage 54 to be sealed. The valve housing bore 5 provides structural support to the chamber body 52, particularly during high differential pressure processing. The closure member 103 moves vertically within the valve housing 1 〇 5 to seal and open the slit valve passage 54 of the process chamber 50. In one embodiment, the seal 〇4 is again placed around the opening 117 or on the closure member 1 〇 3 to achieve a hermetic seal between the closure member 103 and the valve housing 105. In one embodiment, the channel support assembly 130 is coupled to the processing chamber 5 to prevent the slit valve passage 54 from being created by the vacuum between the chamber body 52 and the atmospheric pressure between the chamber body 52. Deformation. For example, the channel support assembly 130 is configured to prevent the upper edge Ma of the slit valve passage 54 from sagging due to the inward pressure applied to the body 52, as indicated by the dashed line 54b. 201134980 In one embodiment, the channel support assembly 13G includes a tube support m that is lightly coupled to the inter-slit housing (9), and a plate cut 122 that is reduced to both of the tube support processing chambers 5. In one implementation, the tube cut 12 12 and the plate support 122 may be disposed above the slit valve housing 105 and extend at least to the length of the slit valve passage 54. The hollow tube support 12 is lightweight and provides rigidity to the processing chamber 5G. In one embodiment, the tubular support structure 120 and the panel support member 122 may be formed from steel. The tube support (3) and the plate support 122 can be held in place by fastening, moxibustion or other suitable means. In the embodiment depicted in FIG. 3, the board support #122 is coupled to the tube support 120 by a fastener 14 that passes through a hole 142 formed in the plate support 122 and is supported by the tube # The thread formed in 12() & (4) is spit. The tube support m is connected to the inter-slit housing 1〇5 by a fastener 19, which passes through the hole 192 formed in the & support member 120 and the narrow valve housing The body 1 〇 5 is opened; ^ is formed by the embossed hole 194. It is contemplated that the slab member bud member 1 22 and the slit valve housing 丨〇 5 may be secured and/or secured together in different ways to prevent the desired effect of sag in the slit: C. The chamber body 52 treated to 50 forms a rigid-pole body with the plate support member I22, the tube support member 12, and the valve housing 105. Thus, increased rigidity is obtained to prevent internal and external chambers. The deformation caused by the pressure difference. The accuracy of the treatment and the uniformity of the treatment can be improved as the deformation is reduced. In one embodiment, as shown in Fig. 3, the fastener iso extends through a hole 152' formed in the plate support 120 and is sprayed with a threaded hole 156 formed in the chamber body 52. In order to allow the fastener 15 to enter the hole M2, it can be in 201134980
板支樓件122 —側的表面中形成扇形開口 154,如在第3A-3B 圖中進步所示者。板支撐件in可連接至室蓋56、背板 6〇或至體52。當連接至背板60時，板支撐件122可與背板 6〇為電性絕緣。定向在垂直平面中的板支撐件122對於垂直 變形具有兩度抗性，從而實質防止室冑52 T垂到狹縫閥通 道54中。 此外，如第3圖的實施例中所示，蓋56由蓋加強板18〇 及/或蓋加強管182所支撐，以防止蓋56對室體52施加力， 这可能導致狹缝閥通道54中的下垂，而該力是由於處理室 5〇内的真空而由背板60施加於蓋56上的力所引起的。在第 3圖中所繪的實施例中，蓋加強板180藉由緊固件160而連 接至蓋56’該緊固件16〇係設置穿過在蓋加強板18〇中的孔 162,並且與在蓋56中形成的螺紋孔166嚙合。在蓋加強板 180中提供扇形孔164，以提供緊固件16〇的通路。蓋加強 板180可以由諸如鋁或鋼的導電材料形成，該導電材料具有 通過蓋56返回以穿過蓋加強板18〇到覆蓋板184的射頻功 率，其將射頻電流發送回到射頻功率源（圖中未示）。在背 板60與蓋56之間設置絕緣體188以在其間提供電絕緣。 加強管182在蓋56的相對側上耦接至加強板18〇。在第 3圖中所繪示的實施例中，利用緊固件17〇將加強管a]固 定至蓋加強板180。 支撐組件130可以具有提供處理室的剛性之任何適當的 結構，其取決於腔室或狭縫閥或其他有關裝置的結構。^一 個實施例中，如第4圖所示，板支撐件124可連接至背板， 201134980 124與管支撐件12〇連 並且橋接構件126可用於將板支撐件 接0 第5圖圖示根據本發明的另一實施例之處理室與狹縫閥 的P刀截面側視圖的另一實施例。在第$圖中所繪示的處理 室广與在第3圖中所繪示的處理室5〇大致類似，除了下列 1其中支撐組件500的板支撐件5 j 〇在防止狹縫閥通道 、下垂之位置而與蓋56連接。雖然未在第5圖中圖示， 但是管支撐件12G可以採第3圖中圖示的方式或其他適當的 方式而連接至狹縫閥殼體1〇5和板支撐件51〇。 在第5圖所繪示的實施例中’板支撐件510藉由緊固件 綱而緊固於|56,該緊固件別係設置穿過在板支樓件51〇 中形成的孔502,並且與在蓋56中形成的螺紋孔5〇6啼合。 緊固件500的通路由扇形開口 5〇4提供。 "為I在蓋56與覆蓋板184之間提供良好的射頻返回路 徑’在蓋56與覆蓋板184之間連接有一導體512。導體512 通常是良好的射頻導體，諸如紹薄板。在第5圖中所繪示的 實施例中，導體51.2包括一端鉗合在板支擇件51〇與蓋％ 之間的-個突出部（tab)，以及設置而實質平行於連接至覆蓋 板m的第-突出部，並且自第一突出部偏移的第二突出 部，其給予導體實質Z形剖面。導體512與背板6G為電性 絕緣。 在本文揭示的各種實施例中，板支撐件通常圖示為具有 矩形剖面，該矩形剖面係實質沿著處理室體52的整個侧面 延伸。可以預期板支料可由m鋼或其他適當材料的 201134980 任何適當結構構件製成。雖^板支#件係圖示為具有實質矩 形剖面’但疋應瞭解板支擇件的剖®或其他幾何形狀可以包 括適於加強室體，並且防止狹_通道54 +的了垂之其他 幾何形狀。其他幾何形狀包括諸如管的空心形狀、高束形 (high beam)、三角形、梯形形狀以及其他幾何形狀。同樣地， 在此设置的管支撐件或者可以類似於板支樓件而配置，其中 設計配置係防止由於來自處理室50㈣真空壓力之力導致 的狹縫閥中的下垂。 雖然在本案中將管支撐件和板支撐件描述為支撐組 件’但《可以預期可向處理室體提供剛性以防止狹缝閥開口 變形的任何結構。 ia笞上述内谷針對本發明的實施例，但可以在不脫離本 發明的基本範圍的情況下諸如結合本發明的多個方面設想 本發明的其他及更多實施例，且本發明的範圍是由以上申請 專利範圍來決定。 【圖式簡單說明】 因此’可以詳細理解本發明的上述特徵的方式，可以參 考實施例獲得上文簡要概述的本發明的更具體描述，其中一 些實施例圖示於附圖中。然而，應注意，附圖僅圖示本發明 的典型實施例，且因此不應將其視為對本發明範圍的限制， 因為本發明可以允許其他同等有效的實施例。 第1圖，係可適用而受益於本發明的示例性基板處理系A fan-shaped opening 154 is formed in the side surface of the panel support member 122, as shown by the progress in Figures 3A-3B. The plate support in can be connected to the chamber cover 56, the back plate 6A or to the body 52. When attached to the backing plate 60, the board support 122 can be electrically insulated from the backing plate 6A. The plate support 122 oriented in the vertical plane is twice resistant to vertical deformation, thereby substantially preventing the chamber 胄 52 from falling into the slit valve passage 54. Moreover, as shown in the embodiment of Fig. 3, the cover 56 is supported by the cover reinforcement panel 18 and/or the cover reinforcement tube 182 to prevent the cover 56 from exerting a force on the chamber body 52, which may result in the slit valve passage 54. The sagging in the middle is caused by the force exerted on the cover 56 by the backing plate 60 due to the vacuum in the processing chamber 5〇. In the embodiment depicted in FIG. 3, the cover reinforcement panel 180 is coupled to the cover 56' by fasteners 160. The fasteners 16 are threaded through holes 162 in the cover reinforcement panel 18, and The threaded holes 166 formed in the cover 56 are engaged. A scalloped aperture 164 is provided in the cover reinforcement panel 180 to provide access to the fasteners 16''. The cover stiffener 180 may be formed from a conductive material, such as aluminum or steel, having a radio frequency power that is returned through the cover 56 to pass through the cover stiffener 18 to the cover plate 184, which sends the RF current back to the RF power source ( Not shown in the figure). An insulator 188 is disposed between the backing plate 60 and the cover 56 to provide electrical insulation therebetween. The reinforcing tube 182 is coupled to the reinforcing plate 18A on the opposite side of the cover 56. In the embodiment illustrated in Fig. 3, the reinforcing tube a] is fixed to the cover reinforcing plate 180 by means of fasteners 17'. The support assembly 130 can have any suitable structure that provides rigidity to the processing chamber depending on the configuration of the chamber or slit valve or other associated device. In one embodiment, as shown in FIG. 4, the plate support 124 can be coupled to the backing plate, 201134980 124 can be coupled to the tube support 12 and the bridging member 126 can be used to connect the plate support to the 0. Another embodiment of a P-knife cross-sectional side view of a process chamber and a slit valve in accordance with another embodiment of the present invention. The processing chamber depicted in Fig. 5 is broadly similar to the processing chamber 5〇 illustrated in Fig. 3 except that in the following 1 wherein the plate support 5 j of the support assembly 500 is in the prevention of the slit valve passage, The position of the sagging is connected to the cover 56. Although not illustrated in Fig. 5, the tube support 12G may be coupled to the slit valve housing 1〇5 and the plate support 51A in the manner illustrated in Fig. 3 or other suitable manner. In the embodiment illustrated in FIG. 5, the 'plate support 510 is fastened to |56 by a fastener, and the fastener is disposed through a hole 502 formed in the plate member 51A, and It is engaged with the threaded hole 5〇6 formed in the cover 56. The passage of the fastener 500 is provided by a sector opening 5〇4. " provides a good RF return path between the cover 56 and the cover plate 184. A conductor 512 is connected between the cover 56 and the cover plate 184. Conductor 512 is typically a good radio frequency conductor, such as a thin plate. In the embodiment illustrated in Figure 5, the conductor 51.2 includes a tab that is clamped at one end between the plate support 51 and the cover %, and is disposed substantially parallel to the cover plate. a first protrusion of m and a second protrusion offset from the first protrusion, which imparts a substantially Z-shaped cross-section to the conductor. Conductor 512 is electrically insulated from backplane 6G. In various embodiments disclosed herein, the plate support is generally illustrated as having a rectangular cross-section that extends substantially along the entire side of the process chamber body 52. It is contemplated that the sheet stock may be made of any suitable structural member of 201134980 of m steel or other suitable material. Although the panel is shown as having a substantially rectangular cross section 'but the section or other geometry of the panel support may be included to accommodate the chamber body and to prevent the narrow channel 54 + from hanging. Geometric shape. Other geometries include hollow shapes such as tubes, high beams, triangles, trapezoidal shapes, and other geometric shapes. Likewise, the tube support provided herein may alternatively be configured similar to a panel slab, wherein the design configuration prevents sagging in the slit valve due to forces from the vacuum pressure of the processing chamber 50 (4). Although the tube support and the plate support are described in the present case as a support member 'but any structure that can provide rigidity to the process chamber body to prevent deformation of the slit valve opening can be expected. The above-described inner valleys are directed to the embodiments of the present invention, but other and further embodiments of the present invention may be conceived, such as in combination with the various aspects of the present invention, without departing from It is determined by the scope of the above patent application. BRIEF DESCRIPTION OF THE DRAWINGS [0009] A more detailed description of the present invention, which is set forth hereinbelow, It is to be understood, however, that the drawings are in FIG Figure 1 is an exemplary substrate processing system that is applicable to benefit from the present invention.
S 10 201134980 統之示意平面圖。 第2圖，係根據本發明的一個實施例之附接至狹縫閥的 處理室之示意戴面前視圖。 第3圖係第2圖的處理室與狹縫閥之示意截面側視圖。 第3AB圖，係第3圖的處理室之板支撐件的局部視圖。 第4圖，係根據本發明的另一實施例之處理室與狹縫閥 的示意截面侧視圖。 —第5 Η，係才艮據本發明的另—實施例之處理室與狹縫 的示意截面側視圖。 ’ 為π !起見’在適用的情況下已使用相同元件符 定在各圖之間所共有的相同元件。 日 【主要元件符號說明】 20 加載鎖定室 31 傳遞機器手 52 室體 54a 上邊緣 56 蓋 60 背板 101 狹縫閥 104 密封件 115，117 開口 122 板支撐件 10 系統 30 傳遞室 4〇,5〇 處理室 54 狹缝閥通道 54b 虛線 58 懸掛件 62 氣體分配板 1 03 封閉構件 105 閥殼體 120 管支撐件 201134980 124 板支禮件 126 橋接構件 130 支撐組件 140 緊固件 142 孔 144 螺紋孔 150 緊固件 152 孔 154 開口 156 子L 160 緊固件 162 子L 164 扇形孔 166 子匕 170 緊固件 180 蓋加強板 182 蓋加強管 184 覆蓋板 188 絕緣體 190 緊固件 192 194 螺紋孔 500 支撐組件/緊固件 502 子L 504 開口 506 子L 510 板支樓件 512 導體 12S 10 201134980 A schematic plan view of the system. Figure 2 is a schematic front view of a processing chamber attached to a slit valve in accordance with one embodiment of the present invention. Figure 3 is a schematic cross-sectional side view of the processing chamber and the slit valve of Figure 2; Figure 3AB is a partial view of the plate support of the processing chamber of Figure 3. Figure 4 is a schematic cross-sectional side view of a process chamber and a slit valve in accordance with another embodiment of the present invention. - Section 5 is a schematic cross-sectional side view of a processing chamber and a slit according to another embodiment of the present invention. ' As for π!' The same elements have been used to designate the same elements that are common between the figures, where applicable. [Main component symbol description] 20 Load lock chamber 31 Transfer robot hand 52 Chamber body 54a Upper edge 56 Cover 60 Back plate 101 Slit valve 104 Seal 115, 117 Opening 122 Plate support 10 System 30 Transfer chamber 4〇, 5 〇Processing chamber 54 Slit valve channel 54b Dotted line 58 Suspension 62 Gas distribution plate 1 03 Closing member 105 Valve housing 120 Tube support 201134980 124 Board support 126 Bridging member 130 Support assembly 140 Fastener 142 Hole 144 Threaded hole 150 Fasteners 152 Holes 154 Openings 156 Sub L 160 Fasteners 162 Sub L 164 Sector Holes 166 Child 匕 170 Fasteners 180 Cover Reinforcement Plate 182 Cover Reinforcement Tube 184 Cover Plate 188 Insulator 190 Fasteners 192 194 Threaded Holes 500 Support Components / Fasteners 502 sub L 504 opening 506 sub L 510 board slab 512 conductor 12