TWI555974B - Gas permeability measuring device - Google Patents
Gas permeability measuring device Download PDFInfo
- Publication number
- TWI555974B TWI555974B TW103131965A TW103131965A TWI555974B TW I555974 B TWI555974 B TW I555974B TW 103131965 A TW103131965 A TW 103131965A TW 103131965 A TW103131965 A TW 103131965A TW I555974 B TWI555974 B TW I555974B
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- measurement
- barrier film
- state
- unit
- Prior art date
Links
- 230000035699 permeability Effects 0.000 title claims description 92
- 238000005259 measurement Methods 0.000 claims description 117
- 230000004888 barrier function Effects 0.000 claims description 66
- 238000012937 correction Methods 0.000 claims description 15
- 230000005540 biological transmission Effects 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 239000007789 gas Substances 0.000 description 346
- 239000010408 film Substances 0.000 description 83
- 238000007789 sealing Methods 0.000 description 10
- 238000011088 calibration curve Methods 0.000 description 7
- 238000011144 upstream manufacturing Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000009530 blood pressure measurement Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 108010083687 Ion Pumps Proteins 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/08—Investigating permeability, pore-volume, or surface area of porous materials
- G01N15/082—Investigating permeability by forcing a fluid through a sample
- G01N15/0826—Investigating permeability by forcing a fluid through a sample and measuring fluid flow rate, i.e. permeation rate or pressure change
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Fluid Mechanics (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Examining Or Testing Airtightness (AREA)
- Measuring Volume Flow (AREA)
Description
本發明係關於一種具有測定阻氣薄膜之氣體透過度之測定部、與進行該測定部之校正之校正部之氣體透過度測定裝置。 The present invention relates to a gas permeability measuring device having a measuring unit for measuring a gas permeability of a gas barrier film and a correcting portion for correcting the measuring portion.
期待阻氣薄膜於食品、藥品、電子零件等之包裝領域及電子零件之密封領域等各種領域中發揮重要之作用。由於上述阻氣薄膜係根據其阻氣特性、即氣體透過度而使用，故上述阻氣薄膜之上述氣體透過度之正確測定於發揮上述作用之方面成為極其重要之事項。 It is expected that gas barrier films will play an important role in various fields such as packaging of foods, pharmaceuticals, and electronic parts, and sealing of electronic parts. Since the gas barrier film is used in accordance with its gas barrier property, that is, gas permeability, it is extremely important to accurately measure the gas permeability of the gas barrier film to exhibit the above-described effects.
作為測定上述阻氣薄膜之上述氣體透過度之裝置，有人提出一種裝置，其係例如連接有用以保持薄膜之凸緣、用以於上述薄膜暴露氣體之容器、及可相對於與上述薄膜之氣體暴露面相反側之氣體透過面排氣至特定壓力之真空部，且藉由安裝於上述真空部之質譜儀，測定自上述氣體透過面透過至上述真空部內之氣體之氣體透過度(參照專利文獻1)。 As a means for measuring the gas permeability of the gas barrier film, there has been proposed a device which is connected, for example, to a flange for holding a film, a container for exposing a gas to the film, and a gas which is permeable to the film. The gas permeation surface on the opposite side of the exposed surface is evacuated to a vacuum portion of a specific pressure, and the gas permeability of the gas permeating from the gas permeation surface into the vacuum portion is measured by a mass spectrometer attached to the vacuum portion (refer to the patent literature) 1).
然而，於上述裝置中，由於不具有校正上述質譜儀之機構，故為了校正上述質譜儀，必須自上述裝置拆卸上述質譜儀，且使用適當之校正機構進行校正。該情形時，不僅校正作業繁雜化，且根據伴隨著拆卸/輸送/安裝作業之再現性、或校正時與測定時之環境條件(溫度等)及設置方向之不同，上述質譜儀之感度特性發生變化，而有無法正確測定氣體透過度之情形。 However, in the above apparatus, since the mechanism for correcting the mass spectrometer is not provided, in order to calibrate the mass spectrometer, it is necessary to detach the mass spectrometer from the above apparatus and perform correction using an appropriate calibration mechanism. In this case, not only the correction work is complicated, but also the sensitivity characteristics of the mass spectrometer occur depending on the reproducibility accompanying the disassembly/transport/installation operation, or the environmental conditions (temperature, etc.) at the time of the calibration and the setting direction. Change, but there is a situation where the gas permeability cannot be measured correctly.
又，由於供安裝上述質譜儀之校正用氣體流道系統、與上述裝 置之氣體流道系統不同，故使用以上述校正用氣體流道系統進行校正之上述質譜儀測定上述裝置之氣體流道系統之上述氣體透過度之情形時，上述校正無法反映上述裝置之氣體流道系統中之上述氣體之流量，而有無法正確測定上述阻氣薄膜之上述氣體透過度之問題。 Moreover, the gas flow system for calibration for mounting the mass spectrometer described above, The gas flow path system is different. Therefore, when the gas permeability of the gas flow path system of the above device is measured by the mass spectrometer corrected by the calibration gas flow channel system, the correction does not reflect the gas flow of the device. The flow rate of the above gas in the channel system may not be able to accurately measure the gas permeability of the gas barrier film.
再者，正尋求開發接近於阻氣薄膜之實際使用條件之濕潤環境、例如使用水蒸氣與氧之混合氣體之氣體氛圍下之適當之氣體阻隔性之評估方法，但由於不存在適當之校正/評估方法，故現狀為未實用化。 Furthermore, it is seeking to develop a method for evaluating the appropriate gas barrier properties in a humid environment close to the actual use conditions of the gas barrier film, for example, a gas atmosphere using a mixed gas of water vapor and oxygen, but since there is no appropriate correction/ The evaluation method is not practical.
[專利文獻1]日本特開平6-241978號公報 [Patent Document 1] Japanese Patent Laid-Open No. Hei 6-241978
本發明之課題在於解決先前之上述諸問題，而達成以下之目的。即，本發明之目的在於提供一種不需要拆卸氣體透過度測定部，而可簡化其校正作業，且可正確測定氣體透過度之氣體透過度測定裝置。 An object of the present invention is to solve the above problems and achieve the following objects. That is, an object of the present invention is to provide a gas permeability measuring device which can simplify the calibration operation without requiring the gas permeability measuring unit to be detached, and can accurately measure the gas permeability.
作為用以解決上述問題之機構，係如以下所述。即， As a mechanism for solving the above problems, it is as follows. which is,
<1>本發明係一種氣體透過度測定裝置，其特徵在於包含：薄膜保持室，其係可由配置於阻氣薄膜之氣體暴露面側之氣體暴露側保持部與配置於上述阻氣薄膜之氣體透過面側之氣體透過側保持部夾持而保持上述阻氣薄膜之周部，且於保持有上述阻氣薄膜時，形成由流入測定用氣體之上述氣體暴露面與上述氣體暴露側保持部區劃之氣體暴露室、及由流入自上述氣體透過面透過之上述測定用氣體之上述氣體透過面與上述氣體透過側保持部區劃之氣體透過室；氣體上游部， 其具備：氣體供給部，其供給上述測定用氣體；測定用流道，其配置於上述氣體供給部-上述氣體暴露側保持部間且自由開關；及校正用流道，其配置於上述氣體供給部-上述氣體暴露側保持部間，以於將上述測定用流道設為關狀態時設為開狀態、且於將上述測定用流道設為開狀態時設為關狀態之方式自由開關，且具有可於開狀態下測定流入至未保持上述阻氣薄膜之狀態之上述薄膜保持室之上述測定用氣體之流量之校正用測定部；及氣體下游部，其具備：中空之真空部，其係與上述氣體透過側保持部連接；真空泵，其將上述真空部內排氣；及氣體透過度測定部，其安裝於上述真空部，可藉由上述校正用測定部校正而測定自未保持上述阻氣薄膜之狀態之上述薄膜保持室流出之上述測定用氣體之流量，且可藉由上述校正用測定部校正而測定於保持有上述阻氣薄膜之狀態自上述氣體透過室流出且透過上述阻氣薄膜之上述測定用氣體之流量。 <1> The present invention relates to a gas permeability measuring apparatus, comprising: a film holding chamber which is disposed on a gas-exposed side holding portion disposed on a gas-exposed surface side of a gas barrier film, and a gas disposed in the gas barrier film The gas-permeable side holding portion of the surface side is sandwiched to hold the peripheral portion of the gas barrier film, and when the gas barrier film is held, the gas exposed surface from which the gas for measurement flows is formed and the gas exposed side holding portion is partitioned a gas exposure chamber and a gas permeation chamber partitioned by the gas permeation surface of the measurement gas that has passed through the gas transmission surface and the gas permeation side holding portion; a gas supply unit that supplies the measurement gas, a measurement flow path that is disposed between the gas supply unit and the gas exposure-side holding unit, and a free switch; and a correction flow path that is disposed in the gas supply The portion between the gas-exposed-side holding portions is opened in a state in which the measurement flow path is in an OFF state, and is turned on in an OFF state when the measurement flow channel is in an ON state. And a calibration measuring unit that can measure a flow rate of the measurement gas flowing into the film holding chamber in a state in which the gas barrier film is not held in an open state, and a gas downstream portion including a hollow vacuum portion. a vacuum pump that exhausts the inside of the vacuum portion, and a gas permeability measuring unit that is attached to the vacuum unit and that is calibrated by the calibration measuring unit to measure the resistance The flow rate of the measurement gas flowing out of the film holding chamber in the state of the gas film, and the measurement by the calibration measuring unit can be measured and held State of the air film from said chamber and through the gas outflow through the above-described gas barrier film of the above-mentioned flow rate measurement of gas.
<2>如上述技術方案<1>之氣體透過度測定裝置，其中構成為使上述測定用氣體沿著流入至薄膜保持室之測定用氣體之流入方向自氣體透過側保持部流出，且將真空部沿著上述流入方向設為中空，於上述流入方向之延長位置配置真空泵。 (2) The gas permeability measuring apparatus according to the above aspect of the invention, wherein the measurement gas flows out from the gas permeation side holding portion along the inflow direction of the measurement gas flowing into the film holding chamber, and the vacuum is applied. The portion is hollow along the inflow direction, and a vacuum pump is disposed at an extended position in the inflow direction.
<3>如上述技術方案<1>或<2>之氣體透過度測定裝置，其中校正用測定部具有：電導部，其係以孔口、細管及多孔質體之至少任一者形成，且預先測定電導；及壓力測定部，其測定流入至上述電導部之測定用氣體之壓力。 (3) The gas permeability measuring apparatus according to the above aspect of the invention, wherein the measuring unit for calibration includes: an electric conducting portion formed of at least one of an orifice, a thin tube, and a porous body, and The conductance is measured in advance; and the pressure measuring unit measures the pressure of the measurement gas flowing into the conductance unit.
<4>如上述技術方案<3>之氣體透過度測定裝置，其中電導部設為可在滿足分子流條件之狀態下流通測定用氣體。 <4> The gas permeability measuring apparatus according to the above aspect, wherein the conductance unit is configured to allow the measurement gas to flow while satisfying the molecular flow condition.
根據本發明，可解決先前技術之上述諸問題，可提供一種不需要拆卸氣體透過度測定部，可簡化其校正作業，且可正確測定氣體透 過度之氣體透過度測定裝置。 According to the present invention, the above problems of the prior art can be solved, and a gas permeability measuring unit can be provided without disassembling, the calibration operation can be simplified, and the gas permeability can be accurately measured. Excessive gas permeability measuring device.
1‧‧‧氣體透過度測定裝置 1‧‧‧Gas permeability measuring device
2‧‧‧阻氣薄膜 2‧‧‧ gas barrier film
10‧‧‧薄膜保持室 10‧‧‧film holding room
11‧‧‧氣體暴露側保持部 11‧‧‧ Gas exposed side retention
12‧‧‧密封構件 12‧‧‧ Sealing members
13‧‧‧氣體透過側保持部 13‧‧‧ gas transmission side holding section
14‧‧‧密封構件 14‧‧‧ Sealing member
15‧‧‧排氣部 15‧‧‧Exhaust Department
16‧‧‧開關閥 16‧‧‧ switch valve
17‧‧‧真空泵 17‧‧‧Vacuum pump
20‧‧‧氣體上游部 20‧‧‧ gas upstream
21‧‧‧氣體供給部 21‧‧‧Gas Supply Department
22‧‧‧氣體供給部 22‧‧‧Gas Supply Department
23‧‧‧開關閥 23‧‧‧Switching valve
24‧‧‧開關閥 24‧‧‧ switch valve
25‧‧‧測定用流道 25‧‧‧Measurement flow path
26‧‧‧開關閥 26‧‧‧Switching valve
27‧‧‧校正用流道 27‧‧‧Calibration flow path
28‧‧‧電導部 28‧‧‧ Conductance Department
29‧‧‧開關閥 29‧‧‧Switching valve
30‧‧‧壓力測定部 30‧‧‧Pressure Measurement Department
40‧‧‧氣體下游部 40‧‧‧ gas downstream
41‧‧‧真空部 41‧‧‧ Vacuum Department
42‧‧‧真空泵 42‧‧‧vacuum pump
43‧‧‧氣體透過度測定部 43‧‧‧Gas permeability measurement department
A‧‧‧氣體暴露室 A‧‧‧ gas exposure room
B‧‧‧氣體透過室 B‧‧‧ gas passage
C‧‧‧排氣室 C‧‧‧Exhaust chamber
△P‧‧‧各計測值之差 △P‧‧‧The difference between the measured values
圖1(a)係顯示校正時之氣體透過度測定裝置之概要之說明圖。 Fig. 1(a) is an explanatory view showing an outline of a gas permeability measuring device at the time of calibration.
圖1(b)係顯示測定時之氣體透過度測定裝置之概要之說明圖。 Fig. 1(b) is an explanatory view showing an outline of a gas permeability measuring device at the time of measurement.
圖2係顯示實施例之檢量線圖表之圖。 Figure 2 is a diagram showing a calibration curve chart of the embodiment.
圖3係顯示關於實施例之氣體透過度之測定圖表之圖。 Fig. 3 is a graph showing a measurement chart of gas permeability of the examples.
參照圖1(a)、(b)說明本發明之氣體透過度測定裝置之一實施形態。圖1(a)係顯示校正時之氣體透過度測定裝置之概要之說明圖，圖1(b)係顯示測定時之氣體透過度測定裝置之概要之說明圖。 An embodiment of the gas permeability measuring apparatus of the present invention will be described with reference to Figs. 1(a) and 1(b). Fig. 1(a) is an explanatory view showing an outline of a gas permeability measuring device at the time of calibration, and Fig. 1(b) is an explanatory view showing an outline of a gas permeability measuring device at the time of measurement.
如圖1(a)、(b)所示，氣體透過度測定裝置1具有薄膜保持室10、氣體上游部20、及氣體下游部40。 As shown in FIGS. 1(a) and 1(b), the gas permeability measuring device 1 includes a film holding chamber 10, a gas upstream portion 20, and a gas downstream portion 40.
薄膜保持室10具有：氣體暴露側保持部11，其係配置於阻氣薄膜2之氣體暴露面側；及氣體透過側保持部13，其係配置於與阻氣薄膜2之氣體暴露面相反側之氣體透過面側。該等氣體暴露側保持部11與氣體透過側保持部13係介隔阻氣薄膜2而對向配置，且可夾持阻氣薄膜2之周部進行保持。 The film holding chamber 10 has a gas exposure side holding portion 11 disposed on the gas exposure surface side of the gas barrier film 2, and a gas permeation side holding portion 13 disposed on the opposite side of the gas exposure surface of the gas barrier film 2. The gas passes through the surface side. The gas-exposed-side holding portion 11 and the gas-permeable side holding portion 13 are disposed to face each other with the gas barrier film 2 interposed therebetween, and the peripheral portion of the gas barrier film 2 can be held.
於保持有阻氣薄膜2時(參照圖1(b))，形成以流入測定用氣體之上述氣體暴露面與氣體暴露側保持部11區劃之氣體暴露室A、與以流入自上述氣體透過面透過之上述測定用氣體之上述氣體透過面與氣體透過側保持部13區劃之氣體透過室B。 When the gas barrier film 2 is held (see FIG. 1(b)), the gas exposure chamber A which is formed by the gas exposure surface flowing into the measurement gas and the gas exposure side holding portion 11 is formed, and flows into the gas permeation surface. The gas permeation surface of the measurement gas that has passed through the gas permeation chamber B is divided into the gas permeation chamber B.
氣體暴露側保持部11與氣體透過側保持部13具有於氣體暴露室A及氣體透過室B中將阻氣薄膜2暴露於足夠量之上述測定用氣體且可測定其透過量之大小。 The gas exposure side holding portion 11 and the gas permeation side holding portion 13 have the gas barrier film 2 exposed to a sufficient amount of the measurement gas in the gas exposure chamber A and the gas permeation chamber B, and the amount of the permeation amount can be measured.
又，氣體暴露側保持部11與氣體透過側保持部13為了保持氣體暴露室A及氣體透過室B之氣密性，具有O型環等之密封構件12、14，且 於密封構件12、14之間夾持阻氣薄膜2之周部而將其保持。 Further, the gas-exposed-side holding portion 11 and the gas-permeation-side holding portion 13 have sealing members 12 and 14 such as O-rings in order to maintain airtightness between the gas exposure chamber A and the gas permeation chamber B, and The peripheral portion of the gas barrier film 2 is sandwiched between the sealing members 12 and 14, and held.
作為薄膜保持室10，為了排除自密封構件12、14之間侵入至氣體暴露室A及氣體透過室B之洩漏氣體，亦可具有覆蓋該等密封構件12、14之外側而形成排氣室C之排氣部15。該情形時，排氣室C內之氣體係以打開開關閥16之狀態，使真空泵17作動而排氣。 As the film holding chamber 10, in order to exclude leakage gas from the gas sealing chamber A and the gas permeating chamber B between the sealing members 12 and 14, the outer side of the sealing members 12 and 14 may be covered to form the exhaust chamber C. Exhaust portion 15. In this case, the gas system in the exhaust chamber C is operated to open the switching valve 16, and the vacuum pump 17 is actuated to exhaust.
另，於未保持阻氣薄膜2之狀態(圖1(a))，薄膜保持室10設為可形成由氣體暴露側保持部11與氣體透過側保持部13區劃之氣密性之空間。 In the state in which the gas barrier film 2 is not held (Fig. 1 (a)), the film holding chamber 10 is formed as a space in which the gas-tightness of the gas-exposed-side holding portion 11 and the gas-permeable side holding portion 13 can be formed.
氣體上游部20包含：氣體供給部21、22，其供給上述測定用氣體；自由開關之測定用流道25，其配置於氣體供給部21、22與氣體暴露側保持部11之間；及校正用流道27，其係同樣配置於氣體供給部21、22與氣體暴露側保持部11之間。 The gas upstream portion 20 includes gas supply portions 21 and 22 that supply the measurement gas, and a free-flowing measurement flow path 25 that is disposed between the gas supply portions 21 and 22 and the gas exposure-side holding portion 11; The flow path 27 is disposed between the gas supply portions 21 and 22 and the gas exposure side holding portion 11 in the same manner.
氣體供給部21、22係以打開開關閥23、24之狀態，對測定用流道25或校正用流道27供給上述測定用氣體。作為氣體供給部21、22，可為任1個，亦可具有3個以上。於使用2種以上之混合氣體測定阻氣薄膜2之氣體透過度之情形、或依序供給2種以上之純氣體而測定阻氣薄膜2各者之氣體透過度之情形時，設為2個以上。 The gas supply units 21 and 22 supply the measurement gas to the measurement flow path 25 or the calibration flow path 27 in a state where the on-off valves 23 and 24 are opened. The gas supply units 21 and 22 may be one or three or more. When two or more types of mixed gas are used to measure the gas permeability of the gas barrier film 2, or two or more kinds of pure gases are sequentially supplied, and the gas permeability of each of the gas barrier films 2 is measured, two are used. the above.
另，作為上述測定用氣體，可根據對阻氣薄膜2進行氣體透過度測定之目的而適當選擇。 Further, the gas for measurement can be appropriately selected according to the purpose of measuring the gas permeability of the gas barrier film 2.
測定用流道25於流道中具有開關閥26，將自氣體供給部21、22供給之上述測定用氣體輸送至氣體暴露側保持部11。又，校正用流道27於流道中具有開關閥29，將自氣體供給部21、22供給之上述測定用氣體輸送至氣體暴露側保持部11。 The measurement flow path 25 has an on-off valve 26 in the flow path, and the measurement gas supplied from the gas supply units 21 and 22 is sent to the gas exposure-side holding portion 11. Further, the calibration flow path 27 has the on-off valve 29 in the flow path, and the measurement gas supplied from the gas supply units 21 and 22 is sent to the gas exposure-side holding portion 11.
校正用流道27係於薄膜保持室10未保持阻氣薄膜2之狀態(圖1(a))下使用，且於將測定用流道25設為關狀態時設為開狀態。又，測定用流道25係於薄膜保持室10保持阻氣薄膜2之狀態(圖1(b))下使用，且於 將測定用流道25設為開狀態時，將校正用流道27設為關狀態。 The calibration flow path 27 is used in a state where the film holding chamber 10 does not hold the gas barrier film 2 (Fig. 1 (a)), and is set to an open state when the measurement flow path 25 is set to the OFF state. Further, the measurement flow path 25 is used in a state in which the film holding chamber 10 holds the gas barrier film 2 (Fig. 1 (b)), and When the measurement flow path 25 is set to the open state, the correction flow path 27 is set to the OFF state.
即，以未保持阻氣薄膜2之狀態與保持阻氣薄膜2之狀態，將任一者之流道設為開狀態，而將自氣體供給部21、22供給之上述測定用氣體輸送至氣體暴露側保持部11。 In other words, in a state where the gas barrier film 2 is not held and a state in which the gas barrier film 2 is held, the flow path of any one of the channels is opened, and the measurement gas supplied from the gas supply units 21 and 22 is supplied to the gas. The side holding portion 11 is exposed.
另，雖未圖示，但亦可配置排氣流道，其一端側與測定用流道25及校正用流道27連接，於氣體透過度之測定前將測定用流道25及校正用流道27內排氣。該情形時，例如，可以將上述排氣用流道之另一端側連接於真空泵17，而將測定用流道25及校正用流道27內排氣之方式構成。 Further, although not shown, an exhaust gas flow path may be disposed, and one end side thereof is connected to the measurement flow path 25 and the calibration flow path 27, and the measurement flow path 25 and the calibration flow are measured before the gas permeability is measured. Exhaust in channel 27. In this case, for example, the other end side of the exhaust gas flow path may be connected to the vacuum pump 17, and the measurement flow path 25 and the calibration flow path 27 may be exhausted.
校正用流道27具有校正用測定部，其係於開狀態下，測定流入至未保持阻氣薄膜2之狀態之薄膜保持室10之上述測定用氣體之流量。 The calibration flow path 27 has a calibration measuring unit that measures the flow rate of the measurement gas flowing into the film holding chamber 10 in a state where the gas barrier film 2 is not held, in an open state.
作為上述校正用測定部之具體構成，並無特別限制，但自正確測定上述測定用氣體之改道之觀點而言，較佳為包含：電導部28，其係包含孔口、細管及多孔質體之至少任一者，且預先測定流通之氣體之電導；及壓力測定部30，其測定流入至上述電導部28之上述測定用氣體之壓力。另，作為電導部28，亦可組合孔口、細管及多孔質體而構成。於使用上述混合氣體作為上述測定用氣體之情形時，作為多孔質體，可較佳地使用日本特開2011-47855號公報所記載之微小孔過濾器。又，作為壓力測定部30，可使用周知之壓力計等，但較佳為使用特性不根據氣體之種類而發生變化之壓力計(隔膜真空計等)。又，進行水蒸氣之氣體透過度試驗之情形時，亦有設置濕度計之情形。 The specific configuration of the calibration measuring unit is not particularly limited. However, from the viewpoint of accurately measuring the diversion of the measurement gas, the conductive portion 28 preferably includes an orifice, a thin tube, and a porous body. At least one of them is configured to measure the conductance of the gas flowing in advance, and the pressure measuring unit 30 measures the pressure of the measurement gas flowing into the conductance unit 28. Further, the electric conducting portion 28 may be configured by combining an orifice, a thin tube, and a porous body. In the case where the above-mentioned mixed gas is used as the gas for measurement, the microporous filter described in JP-A-2011-47855 can be preferably used as the porous body. Further, as the pressure measuring unit 30, a well-known pressure gauge or the like can be used. However, it is preferable to use a pressure gauge (diaphragm vacuum gauge or the like) whose characteristics do not change depending on the type of gas. Further, in the case of performing a gas permeability test of water vapor, there is also a case where a hygrometer is provided.
又，使用上述混合氣體作為上述測定用氣體之情形時，較佳為將電導部28設為可以滿足分子流條件之狀態流通上述測定用氣體。當滿足上述分子流條件時，由於可僅以分子量修正由氣體之種類引起之電導之不同，且可排除上述混合氣體中之各氣體種類之相互作用，故 可根據供給至電導部28之上述混合氣體之組成比及壓力，求出自電導部28流出之上述混合氣體之流量、流量比。另，為了滿足上述分子量條件，必須可以使供給至上述電導部28之上述混合氣體之壓力為特定之範圍之方式進行控制。 In the case where the mixed gas is used as the measurement gas, it is preferable that the measurement portion 28 is configured to flow the measurement gas in a state in which the molecular flow condition can be satisfied. When the above molecular flow conditions are satisfied, since the difference in conductance caused by the kind of the gas can be corrected only by the molecular weight, and the interaction of each gas species in the mixed gas can be eliminated, The flow rate and flow rate ratio of the mixed gas flowing out from the electric conducting portion 28 can be obtained from the composition ratio and pressure of the mixed gas supplied to the electric conducting portion 28. Further, in order to satisfy the above molecular weight condition, it is necessary to control the pressure of the mixed gas supplied to the electric conduction portion 28 to a specific range.
如此，於氣體透過度測定裝置1中，可不論純氣體、混合氣體之氣體構成及氣體種類，皆(不需要拆卸)而校正氣體透過度測定部43，且可基於所獲得之校正結果，正確測定包含其等之上述測定用氣體之相對於阻氣薄膜2之氣體透過度。 As described above, in the gas permeability measuring apparatus 1, the gas permeability measuring unit 43 can be corrected regardless of the gas composition of the pure gas, the mixed gas, and the gas type (there is no need to disassemble), and can be correctly corrected based on the obtained calibration result. The gas permeability of the gas barrier film 2 including the gas for measurement described above is measured.
氣體下游部40包含：中空之真空部41，其係與氣體透過側保持部13連接；真空泵42，其係將真空部41內排氣；及氣體透過度測定部43，其安裝於真空部41。 The gas downstream portion 40 includes a hollow vacuum portion 41 that is connected to the gas permeation side holding portion 13 , a vacuum pump 42 that exhausts the vacuum portion 41 , and a gas permeability measuring portion 43 that is attached to the vacuum portion 41 . .
作為真空部41，可由周知之真空容器構成，考慮針對高阻隔性之薄膜之測定，較佳為可排氣至10-4Pa以下之壓力。又，作為真空泵42，真空泵17亦相同，可使用擴散泵、渦輪分子泵、低溫泵、濺鍍離子泵、吸氣泵等周知之泵。另，作為真空泵42，為了將真空部41內之壓力保持為較低，較佳為高真空、超高真空用途者。 The vacuum portion 41 can be formed of a well-known vacuum container, and it is preferable to measure the pressure of the film having a high barrier property to a pressure of 10 -4 Pa or less. Further, as the vacuum pump 42, the vacuum pump 17 is also the same, and a well-known pump such as a diffusion pump, a turbo molecular pump, a cryopump, a sputter ion pump, or a getter pump can be used. Further, as the vacuum pump 42, in order to keep the pressure in the vacuum portion 41 low, it is preferable to use it for high vacuum or ultra high vacuum.
氣體透過度測定部43可將自未保持阻氣薄膜2之狀態(圖1(a))之薄膜保持室10流出之上述測定用氣體之流量藉由上述校正用測定部校正而測定，且可將於保持有阻氣薄膜2之狀態(圖1(b))自氣體透過室B流出且透過阻氣薄膜2之上述測定用氣體之流量藉由上述校正用測定部校正而測定。 The gas permeability measuring unit 43 can measure the flow rate of the measurement gas flowing out of the film holding chamber 10 in a state in which the gas barrier film 2 is not held (Fig. 1 (a)) by the calibration measuring unit, and can be measured. The flow rate of the measurement gas flowing out of the gas permeation chamber B and passing through the gas barrier film 2 in a state in which the gas barrier film 2 is held (Fig. 1 (b)) is measured by the calibration measuring unit.
作為此種氣體透過度測定部43，可使用電離真空計等周知之真空計、四級質譜儀等周知之質譜儀。 As the gas permeability measuring unit 43, a well-known mass spectrometer such as a vacuum gauge or a four-stage mass spectrometer such as an ionization vacuum gauge can be used.
於氣體透過度測定裝置1中，構成為使上述測定用氣體沿著流入至薄膜保持室10之上述測定用氣體之流入方向自氣體透過側保持部13流出，且將真空部41沿著上述流入方向設為中空，將真空泵42配置於 上述流入方向之延長位置。藉由如此般構成，流入至薄膜保持室10之上述測定用氣體不具有部分之偏差，而自氣體透過側保持部13流出，且可排除流出之上述測定用氣體於真空部41內具有部分之偏差，而可以氣體透過度測定部43測定行為穩定之上述測定用氣體之流量。 In the gas permeability measuring device 1, the measurement gas flows out from the gas permeation side holding portion 13 along the inflow direction of the measurement gas flowing into the film holding chamber 10, and the vacuum portion 41 flows along the above-described inflow. The direction is set to be hollow, and the vacuum pump 42 is disposed in The extended position of the above inflow direction. With the above configuration, the measurement gas that has flowed into the film holding chamber 10 does not have a partial variation, and flows out from the gas permeation side holding portion 13, and the measurement gas that has flowed out can be partially contained in the vacuum portion 41. In the deviation, the gas permeability measuring unit 43 can measure the flow rate of the measurement gas whose behavior is stable.
於以上所說明之氣體透過度測定裝置1中，以未保持阻氣薄膜2之狀態(圖1(a))，使自氣體供給部21、22供給之上述測定用氣體經由校正用流道27流入至薄膜保持室10，可以氣體透過度測定部43測定其流量。即，將自構成校正用流道27中之上述校正用測定部之電導部28流出之上述測定用氣體之流量，根據以壓力測定部30測定之壓力、電導部28之電導及溫度算出，且使氣體透過度測定部43之指示值與該流量關聯，而可製作與流入至薄膜保持室10、進而流入至真空部41之上述測定用氣體之流量對應之氣體透過度測定部43之指示值之檢量線。 In the gas permeability measuring apparatus 1 described above, the measurement gas supplied from the gas supply units 21 and 22 is passed through the correction flow path 27 in a state where the gas barrier film 2 is not held (Fig. 1 (a)). The flow rate is measured by the gas permeability measuring unit 43 when flowing into the film holding chamber 10. In other words, the flow rate of the measurement gas flowing out from the conductance unit 28 constituting the calibration measuring unit in the calibration flow path 27 is calculated based on the pressure measured by the pressure measuring unit 30 and the conductance and temperature of the electric conduction unit 28, and The indication value of the gas permeability measurement unit 43 is associated with the flow rate, and the indication value of the gas permeability measurement unit 43 corresponding to the flow rate of the measurement gas flowing into the film holding chamber 10 and further flowing into the vacuum unit 41 can be produced. Check line.
於保持有阻氣薄膜2之狀態(圖1(b))，使自氣體供給部21、22供給之上述測定用氣體經由測定用流道25流入至薄膜保持室10之氣體暴露室A，可以氣體透過度測定部43測定透過阻氣薄膜2且自氣體透過室B流出之上述測定用氣體(透過氣體)之流量。即，可基於以未保持阻氣薄膜2之狀態(圖1(a))所獲得之上述檢量線，求出與氣體透過度測定部43之指示值對應之上述測定用氣體(透過氣體)之流量。 In the state in which the gas barrier film 2 is held (Fig. 1 (b)), the measurement gas supplied from the gas supply portions 21, 22 flows into the gas exposure chamber A of the film holding chamber 10 via the measurement flow path 25, and The gas permeability measuring unit 43 measures the flow rate of the measurement gas (permeating gas) that has passed through the gas barrier film 2 and flows out of the gas permeation chamber B. In other words, the measurement gas (permeating gas) corresponding to the instruction value of the gas permeability measuring unit 43 can be obtained based on the calibration curve obtained in the state in which the gas barrier film 2 is not held (Fig. 1 (a)). Traffic.
於如此般構成之氣體透過度測定裝置1中，由於在裝置內配置具有用以校正氣體透過度測定部43之上述校正用測定部之校正用流道27，故可逐一將氣體透過度測定裝置43自裝置拆卸而校正，且於校正後，省略安裝於裝置之作業，而可簡化校正作業。 In the gas permeability measuring apparatus 1 configured as described above, the calibration flow path 27 for correcting the calibration measuring unit of the gas permeability measuring unit 43 is disposed in the apparatus, so that the gas permeability measuring apparatus can be used one by one. 43 is calibrated from the disassembly of the device, and after the correction, the work installed on the device is omitted, and the calibration work can be simplified.
又，藉由於氣體上游部20配置具有上述校正用測定部之校正用流道27，將自校正用流道27及測定用流道25流入至薄膜保持室10之上述測定用氣體之到達氣體透過度測定部43之流通路徑設為相同(參照圖1(a)、(b)中之表示氣體流通路徑之箭頭符號)，故可使校正時之氣 體透過度測定部43之上述測定用氣體之測定條件與測定時共通，而對校正時之氣體透過度測定部43之指示值確保高可靠性。因此，於氣體透過度測定裝置1中，於測定時，可基於校正時所製作之可靠性較高之檢量線，測定正確之氣體透過度。 In addition, the gas flow upstream portion 20 is provided with the calibration flow path 27 having the calibration measurement unit, and the gas passing through the measurement gas flowing into the film holding chamber 10 from the calibration flow channel 27 and the measurement flow channel 25 is allowed to pass through. The flow path of the degree measuring unit 43 is the same (see the arrow symbol indicating the gas flow path in FIGS. 1( a ) and 1 ( b )), so that the gas at the time of correction can be made. The measurement conditions of the measurement gas of the body permeability measurement unit 43 are common to the measurement time, and the indication value of the gas permeability measurement unit 43 at the time of correction ensures high reliability. Therefore, in the gas permeability measuring device 1, at the time of measurement, the correct gas permeability can be measured based on the highly reliable calibration curve produced at the time of calibration.
此處，於裝置內設置校正部之情形時，亦研究僅將測定用流道25配置於氣體上游部20，而將校正用流道27配置於氣體下游部40之真空部41之構成，但於該構成中，由於流入至薄膜保持室10之上述測定氣體之到達氣體透過度測定部43之流通路徑於校正時與測定時之情形時不同，故於兩者之間真空部41內之壓力分佈或飛行之氣體分子之方向分佈發生變化。因此，受到由上述測定氣體之流通條件之不同造成之影響，基於校正時所製作之檢量線，使針對測定時所測定之氣體透過度之測定結果之可靠性下降。 In the case where the correction unit is provided in the apparatus, the measurement flow path 25 is disposed only in the gas upstream portion 20, and the correction flow path 27 is disposed in the vacuum portion 41 of the gas downstream portion 40. In this configuration, since the flow path of the measurement gas flowing into the film holding chamber 10 to the gas permeability measuring unit 43 is different between the calibration time and the measurement time, the pressure in the vacuum portion 41 between the two is different. The distribution of the direction of the gas molecules distributed or flying changes. Therefore, the reliability of the measurement result of the gas permeability measured at the time of measurement is lowered by the influence of the difference in the flow conditions of the measurement gas described above.
另，氣體透過度測定裝置1係例示本發明之一實施形態者，只要發揮上述之效果，本發明之技術思想並非限定於此。 In addition, the gas permeability measuring apparatus 1 is an embodiment of the present invention, and the technical idea of the present invention is not limited thereto as long as the above effects are exhibited.
將使用氣體透過度測定裝置1之氣體透過度之測定方法與實際之測定例一併作為實施例進行說明。即，對使用依照上述之氣體透過度測定裝置1(參照圖1(a)、(b))而構成之氣體透過度測定裝置進行氣體透過度之測定時之測定方法及測定結果進行說明。另，以下，為了便於說明，使用與氣體透過度測定裝置1相同之符號說明測定方法及測定結果。 The method of measuring the gas permeability of the gas permeability measuring device 1 will be described as an example together with the actual measurement example. In other words, a measurement method and a measurement result when the gas permeability is measured using the gas permeability measuring device configured by the above-described gas permeability measuring device 1 (see FIGS. 1(a) and 1(b)) will be described. In the following, for convenience of explanation, the measurement method and the measurement result will be described using the same reference numerals as those of the gas permeability measuring device 1.
首先，以未保持阻氣薄膜之狀態(參照圖1(a))，使真空泵17、42分別作動，而將氣體透過度測定裝置1內真空排氣。接著，將該狀態之壓力測定部30、氣體透過度測定部43之計測值記錄為零點。接著，以關閉測定用流道25之開關閥26，且打開校正用流道27之開關閥29之狀態，打開氣體供給部21之開關閥23，而自氣體供給部21開始測定用 氣體之供給。上述測定用氣體係經由校正用流道27自氣體暴露側保持部11側流入至薄膜保持室10，且自氣體透過側保持部13側流出至真空部41。接著，等待壓力測定部30、氣體透過度測定部43之計測值為固定，而以壓力測定部30計測上述測定用氣體流入電導部28前之壓力，且計測關於流出至真空部41內之上述測定用氣體之流量之資訊。 First, the vacuum pumps 17 and 42 are operated in a state where the gas barrier film is not held (see FIG. 1(a)), and the gas permeability measuring device 1 is evacuated. Then, the measured values of the pressure measuring unit 30 and the gas permeability measuring unit 43 in this state are recorded as zero points. Then, the on-off valve 26 of the measurement flow path 25 is closed, and the on-off valve 29 of the correction flow path 27 is opened to open the on-off valve 23 of the gas supply unit 21, and the measurement is started from the gas supply unit 21. The supply of gas. The gas system for measurement flows into the film holding chamber 10 from the gas-exposed-side holding portion 11 side via the calibration flow path 27, and flows out from the gas-permeable side holding portion 13 side to the vacuum portion 41. Then, the pressure measurement unit 30 measures the pressure before the measurement gas flows into the conductance unit 28, and the pressure measurement unit 30 measures the pressure before flowing into the vacuum unit 41. Information on the flow rate of the gas used for the measurement.
測定係使用水蒸氣作為上述測定用氣體，且使用電離真空計及四級質譜儀作為氣體透過度測定部43而進行。 In the measurement, steam is used as the gas for measurement, and an ionization vacuum gauge and a four-stage mass spectrometer are used as the gas permeability measuring unit 43.
另，以壓力測定部30計測之流入電導部28前之壓力可藉由調整來自氣體供給部21之上述測定用氣體之供給量，而以使流通電導部28之上述測定用氣體之流動滿足分子流條件之方式進行控制。 The pressure before flowing into the conductance unit 28 measured by the pressure measuring unit 30 can adjust the supply amount of the measurement gas from the gas supply unit 21 so that the flow of the measurement gas flowing through the electric conduction unit 28 satisfies the molecule. The flow condition is controlled in a manner.
於此種條件下，流通電導部28，經由薄膜保持室10，流出至真空部41之上述測定用氣體之流量Qs(Pa．m3/s)係以下述式(1)表示。 Under such conditions, the flow conductance unit 28, via the thin film holding chamber 10, flows out to the flow rate of the gas measuring portion 41 of the vacuum Q s (Pa.m 3 / s) represented by the following formula based (1).
另，上述式(1)中，PR表示自壓力測定部30之計測值減去零點之壓力，Cs表示預先測定之電導部28之代表性之氣體(此處為氮氣)之分子流電導，MN2表示氮之分子量，M表示上述測定用氣體(水蒸氣)之分子量，T0表示Cs測定時之溫度，T表示上述測定用氣體供給時之氣體供給部21之溫度。 Further, in the above formula (1), P R represents the pressure from the measured value of the pressure measuring unit 30 minus the zero point, and C s represents the molecular flow conductance of the representative gas (here, nitrogen) of the electric conducting portion 28 measured in advance. M N2 represents the molecular weight of nitrogen, M represents the molecular weight of the measurement gas (water vapor), T 0 represents the temperature at the time of measurement of C s , and T represents the temperature of the gas supply unit 21 at the time of supply of the measurement gas.
又，上述式(1)表示之流量Qs(Pa．m3/s)可使用氣體之狀態方程式，單位轉換成以下述式(2)、(3)表示之流量Qs’(mol/s)、流量Qs”(g/s)，此處，求出以下述式(3)表示之流量Qs”(g/s)。 Further, the flow rate Q s (Pa.m 3 /s) expressed by the above formula (1) can be converted into a flow rate Q s ' expressed by the following formulas (2) and (3) using the equation of state of the gas (mol/s). ), the flow rate Q s "(g / s), here, the flow rate Q s "(g / s) expressed by the following formula (3) is obtained.
[數2]
另，使用混合氣體作為上述測定用氣體之情形時，若為電導部28滿足分子流條件者，則可藉由上述式(1)~(3)以每個氣體種類獨立求出流量。該情形時，作為PR，使用藉由對自壓力測定部30之計測值減去零點之壓力乘以混合氣體之組成而求出之、電導部28上游之校正對象之氣體種類之分壓，作為M，使用校正對象之氣體種類之分子量。 In the case where the mixed gas is used as the gas for measurement, if the conductance portion 28 satisfies the molecular flow condition, the flow rate can be independently obtained for each gas type by the above formulas (1) to (3). In this case, as the PR, the partial pressure of the gas type to be corrected upstream of the conductance portion 28 obtained by multiplying the pressure from the measured value of the pressure measuring unit 30 by the zero point by the composition of the mixed gas is used as the PR. M, the molecular weight of the gas type of the calibration object is used.
將以上述式(3)求出之自電導部28流出之上述測定用氣體之流量Qs”(g/s)設為流出至真空部41內之上述測定用氣體之流量，根據該流量(換算成g/day)、與作為氣體透過度測定部43之電離真空計(Pa)及四極質譜儀(A)之減去零點之計測值之相關關係獲得校正用之檢量線。圖2中顯示實施例之檢量線圖表。 The flow rate Q s "(g/s) of the measurement gas flowing out from the conductance portion 28 obtained by the above formula (3) is the flow rate of the measurement gas flowing out into the vacuum portion 41, based on the flow rate ( The calibration curve for calibration is obtained by converting the relationship between g/day and the ionization vacuum gauge (Pa) of the gas permeability measuring unit 43 and the measured value of the quadrupole mass spectrometer (A) minus the zero point. A chart of the calibration curve of the embodiment is shown.
接著，以保持有阻氣薄膜2之狀態(參照圖1(b))，測定阻氣薄膜2之氣體透過度。另，作為阻氣薄膜2，使用以聚萘二甲酸乙二醇酯(PEN)作為主要材料之高阻隔性之薄膜(試料直徑；Φ 50mm，透過部直徑；Φ 40mm)。 Next, the gas permeability of the gas barrier film 2 was measured in a state in which the gas barrier film 2 was held (see FIG. 1(b)). Further, as the gas barrier film 2, a film having high barrier properties using polyethylene naphthalate (PEN) as a main material (sample diameter; Φ 50 mm, transmission portion diameter; Φ 40 mm) was used.
首先，使真空泵17、42分別作動，而將氣體透過度測定裝置1內真空排氣。接著，以打開測定用流道25之開關閥26，且關閉校正用流道27之開關閥29之狀態，打開氣體供給部21之開關閥23，而自氣體供給部21開始上述測定用氣體(水蒸氣)之供給。水蒸氣之暴露條件係1氣壓之大氣、40℃、90%濕度。上述測定用氣體係經由測定用流道25自氣體暴露側保持部11側流入至氣體暴露室A，一部分透過阻氣薄膜 2流出至氣體透過室B中，進而自上述測定用氣體透過側保持部13側流出至真空部41。等待氣體透過度測定部43之計測值成為特定，而計測關於流出至真空部41內之上述測定用氣體之流量之資訊。 First, the vacuum pumps 17 and 42 are respectively operated to evacuate the inside of the gas permeability measuring device 1. Then, the on-off valve 26 of the measurement flow path 25 is opened, and the on-off valve 29 of the correction flow path 27 is closed, the on-off valve 23 of the gas supply unit 21 is opened, and the measurement gas is started from the gas supply unit 21 ( Supply of water vapor). The exposure conditions of water vapor are 1 atmosphere of air, 40 ° C, and 90% humidity. The measurement gas system flows into the gas exposure chamber A from the gas exposure side holding portion 11 side via the measurement flow path 25, and a part of the gas barrier film is transmitted through the gas barrier film. 2 flows out into the gas permeation chamber B, and flows out from the side of the measurement gas permeation side holding portion 13 to the vacuum portion 41. The measurement value of the gas permeability measuring unit 43 is made specific, and information on the flow rate of the measurement gas flowing out into the vacuum unit 41 is measured.
此處，基於氣體透過度測定部43之計測值，使用上述校正用之檢量線，將透過阻氣薄膜2之上述測定用氣體之流量定量化，藉此決定阻氣薄膜2之氣體透過度。 Here, based on the measured value of the gas permeability measuring unit 43, the flow rate of the measuring gas that has passed through the gas barrier film 2 is quantified using the calibration curve for calibration, thereby determining the gas permeability of the gas barrier film 2. .
此處，如本實施例般，於作為阻氣薄膜2將高阻隔性之薄膜設為測定對象之情形時，由於上述測定用氣體之透過量為極微量，產生於裝置內之略微之氣體釋放等其影響亦較大，故使不鏽鋼板等之可無視上述測定用氣體之透過量之試材替代阻氣薄膜2而保持於薄膜保持室10，且取得此時之氣體透過度測定部43之計測值，藉由獲得兩者之差，可更正確地決定阻氣薄膜2之氣體透過度。 In the case where the film having high barrier properties is used as the gas barrier film 2 as the measurement target, the amount of permeation of the measurement gas is extremely small, and a slight gas release occurs in the device. In addition, the influence of the above-mentioned gas permeability measuring unit 43 is obtained by replacing the gas barrier film 2 with a test material in which the amount of the gas for measurement is ignored, etc., in a stainless steel plate or the like. By measuring the difference between the two, the gas permeability of the gas barrier film 2 can be more accurately determined.
此處，使用不鏽鋼板作為上述試材，獲得作為氣體透過度測定部43之電離真空計之阻氣薄膜2與上述試材之各計測值之差(△P)，而決定阻氣薄膜2之氣體透過度。圖3中顯示關於實施例之氣體透過度之測定圖表。 Here, a stainless steel plate is used as the test material, and the difference (ΔP) between the gas barrier film 2 of the ionization vacuum gauge of the gas permeability measuring unit 43 and each of the measured materials is obtained, and the gas barrier film 2 is determined. Gas permeability. A graph for measuring the gas permeability of the examples is shown in FIG.
另，於圖3中，△P係1.04×10-6Pa，與該△P對應之自上述校正用之檢量線獲得之氣體透過量(水蒸氣透過量)係8.06×10-6(g/day)，其氣體透過度(水蒸氣透過度)係6.41×10-3(g/day/m2)。 Further, in Fig. 3, ΔP is 1.04 × 10 -6 Pa, and the gas permeation amount (water vapor transmission amount) obtained from the calibration curve for calibration corresponding to the ΔP is 8.06 × 10 -6 (g). /day), the gas permeability (water vapor permeability) is 6.41 × 10 -3 (g / day / m 2 ).
如以上所述般，本發明之氣體透過度測定裝置由於不需要拆卸氣體透過度測定部，而可簡化其校正作業，且可正確測定氣體透過度，故可廣泛使用於因用途不同而具有多種特性之阻氣薄膜之氣體透過度之測定。 As described above, the gas permeability measuring device of the present invention can simplify the calibration operation and accurately measure the gas permeability because the gas permeability measuring unit does not need to be disassembled, so that it can be widely used for various applications. Determination of the gas permeability of a gas barrier film of a characteristic.
1‧‧‧氣體透過度測定裝置 1‧‧‧Gas permeability measuring device
2‧‧‧阻氣薄膜 2‧‧‧ gas barrier film
10‧‧‧薄膜保持室 10‧‧‧film holding room
11‧‧‧氣體暴露側保持部 11‧‧‧ Gas exposed side retention
12‧‧‧密封構件 12‧‧‧ Sealing members
13‧‧‧氣體透過側保持部 13‧‧‧ gas transmission side holding section
14‧‧‧密封構件 14‧‧‧ Sealing member
15‧‧‧排氣部 15‧‧‧Exhaust Department
16‧‧‧開關閥 16‧‧‧ switch valve
17‧‧‧真空泵 17‧‧‧Vacuum pump
20‧‧‧氣體上游部 20‧‧‧ gas upstream
21‧‧‧氣體供給部 21‧‧‧Gas Supply Department
22‧‧‧氣體供給部 22‧‧‧Gas Supply Department
23‧‧‧開關閥 23‧‧‧Switching valve
24‧‧‧開關閥 24‧‧‧ switch valve
25‧‧‧測定用流道 25‧‧‧Measurement flow path
26‧‧‧開關閥 26‧‧‧Switching valve
27‧‧‧校正用流道 27‧‧‧Calibration flow path
28‧‧‧電導部 28‧‧‧ Conductance Department
29‧‧‧開關閥 29‧‧‧Switching valve
30‧‧‧壓力測定部 30‧‧‧Pressure Measurement Department
40‧‧‧氣體下游部 40‧‧‧ gas downstream
41‧‧‧真空部 41‧‧‧ Vacuum Department
42‧‧‧真空泵 42‧‧‧vacuum pump
43‧‧‧氣體透過度測定部 43‧‧‧Gas permeability measurement department
A‧‧‧氣體暴露室 A‧‧‧ gas exposure room
B‧‧‧氣體透過室 B‧‧‧ gas passage
C‧‧‧排氣室 C‧‧‧Exhaust chamber
Claims (4)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013193878 | 2013-09-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201518706A TW201518706A (en) | 2015-05-16 |
| TWI555974B true TWI555974B (en) | 2016-11-01 |
Family
ID=52688766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103131965A TWI555974B (en) | 2013-09-19 | 2014-09-16 | Gas permeability measuring device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6281915B2 (en) |
| TW (1) | TWI555974B (en) |
| WO (1) | WO2015041115A1 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102219619B1 (en) | 2016-02-03 | 2021-02-23 | 내셔날 인스티튜트 오브 어드밴스드 인더스트리얼 사이언스 앤드 테크놀로지 | Standard gas barrier film |
| CN106290117B (en) * | 2016-10-19 | 2023-11-03 | 中国科学院光电研究院 | Device and method for testing radiation induced gas permeation of material |
| CN110140041B (en) | 2017-02-27 | 2022-07-15 | 国立研究开发法人产业技术综合研究所 | Gas barrier property evaluation device and gas barrier property evaluation method |
| CN107167399A (en) * | 2017-07-07 | 2017-09-15 | 金华职业技术学院 | A kind of device for measuring methane transmitance |
| CN107402166B (en) * | 2017-07-07 | 2023-07-11 | 金华职业技术学院 | Method for measuring carbon monoxide transmittance |
| CN107219149A (en) * | 2017-07-07 | 2017-09-29 | 金华职业技术学院 | A kind of device for measuring carbon monoxide transmitance |
| CN114441379A (en) * | 2022-01-13 | 2022-05-06 | 中国乐凯集团有限公司 | Dehumidification capacity testing device and testing method for gas dehumidification film |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM457175U (en) * | 2013-02-05 | 2013-07-11 | Univ Fooyin | Positive pressure gas supply device capable of controlling temperature and humidity |
| US20140230647A1 (en) * | 2011-10-07 | 2014-08-21 | Alstom Technology Ltd | Method of controlling a wet scrubber useful for removing sulphur dioxide from a process gas |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3264458B2 (en) * | 1993-02-17 | 2002-03-11 | 三井化学株式会社 | Gas permeability measuring device for film |
| JP2004157035A (en) * | 2002-11-07 | 2004-06-03 | Mitsubishi Heavy Ind Ltd | Gas permeation speed measuring device of barrier film-coated plastic container, gas permeation speed measuring method of barrier film-coated plastic container, gas permeation speed measuring device of barrier film-coated plastic sheet, and gas pearmeation speed measuring method of barrier film-coated plastic sheet |
| JP5419082B2 (en) * | 2009-08-28 | 2014-02-19 | 独立行政法人産業技術総合研究所 | Calibration method and calibration device for standard mixed gas leak micropore filter |
-
2014
- 2014-09-10 WO PCT/JP2014/073925 patent/WO2015041115A1/en active Application Filing
- 2014-09-10 JP JP2015537875A patent/JP6281915B2/en active Active
- 2014-09-16 TW TW103131965A patent/TWI555974B/en active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20140230647A1 (en) * | 2011-10-07 | 2014-08-21 | Alstom Technology Ltd | Method of controlling a wet scrubber useful for removing sulphur dioxide from a process gas |
| TWM457175U (en) * | 2013-02-05 | 2013-07-11 | Univ Fooyin | Positive pressure gas supply device capable of controlling temperature and humidity |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6281915B2 (en) | 2018-02-21 |
| WO2015041115A1 (en) | 2015-03-26 |
| TW201518706A (en) | 2015-05-16 |
| JPWO2015041115A1 (en) | 2017-03-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI555974B (en) | Gas permeability measuring device | |
| CN108700485B (en) | Leak inspection device and method | |
| JP5990172B2 (en) | Leak detector | |
| US20200402783A1 (en) | Novel partial-pressure mass spectrometer calibration device and method | |
| JP5553287B2 (en) | Water vapor permeability measuring device and measuring method | |
| US11874199B2 (en) | Device and process for determining the size of a leak hole in a sample | |
| JP2010190751A (en) | Gas permeability measuring device and gas permeability measuring method for film material | |
| CN105004479B (en) | Ion gauge and mass spectrograph calibrating installation and method based on normal pressure measurement | |
| CN105547956A (en) | Device and method for measuring gas permeability of thin film by using vacuometer | |
| CN103759906B (en) | Device and method based on static expanding method vacuum standard calibration vacuum leak | |
| JP2012132911A (en) | Apparatus and method for leak detection using hydrogen as tracer gas | |
| JP2011047855A (en) | Calibration method and calibration device of microporous filter for standard mixed gas leak | |
| JP6508674B2 (en) | Flow calibration device | |
| CN114624319B (en) | Method for quantitatively obtaining ppm-level hydrogen isotope content in material based on thermal analysis-quadrupole mass spectrometry measurement principle | |
| CN106679897A (en) | Leakage hole's leakage rate measuring apparatus | |
| CN106289666B (en) | Calibration device and method for vacuum leak at ambient temperature | |
| JP2011043386A (en) | Transmission quantity measuring instrument having freezing trap | |
| JP6002404B2 (en) | Mass spectrometer, method of using the same, and method of measuring gas permeation characteristics | |
| JP5734109B2 (en) | Measuring apparatus and measuring method | |
| CN110987718A (en) | Test system for testing air suction performance of air suction material by constant pressure method | |
| Hudoklin et al. | Uncertainty evaluation of the new setup for measurement of water-vapor permeation rate by a dew-point sensor | |
| CN108444855B (en) | Device and method for rapidly analyzing content of methane in air | |
| CN112147282A (en) | Concentration sensor calibration device and calibration method | |
| JP5963204B2 (en) | Pre-calibrated micro leak filter for gas leak | |
| Hara et al. | 76‐4: Development of Gas‐Barrier‐Property Evaluation System for High Sensitivity and Short Evaluation Time |