TWI553640B - Nonvolatile memory device, memory system including the same, and electronic device - Google Patents

Nonvolatile memory device, memory system including the same, and electronic device Download PDF

Info

Publication number
TWI553640B
TWI553640B TW101105494A TW101105494A TWI553640B TW I553640 B TWI553640 B TW I553640B TW 101105494 A TW101105494 A TW 101105494A TW 101105494 A TW101105494 A TW 101105494A TW I553640 B TWI553640 B TW I553640B
Authority
TW
Taiwan
Prior art keywords
voltage
high voltage
volatile memory
external
power supply
Prior art date
Application number
TW101105494A
Other languages
Chinese (zh)
Other versions
TW201239887A (en
Inventor
姜相喆
權錫千
李秀雄
Original Assignee
三星電子股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/342,239 external-priority patent/US8867278B2/en
Application filed by 三星電子股份有限公司 filed Critical 三星電子股份有限公司
Publication of TW201239887A publication Critical patent/TW201239887A/en
Application granted granted Critical
Publication of TWI553640B publication Critical patent/TWI553640B/en

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/08Address circuits; Decoders; Word-line control circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/30Power supply circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/14Power supply arrangements, e.g. power down, chip selection or deselection, layout of wirings or power grids, or multiple supply levels
    • G11C5/145Applications of charge pumps; Boosted voltage circuits; Clamp circuits therefor
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C7/00Arrangements for writing information into, or reading information out from, a digital store
    • G11C7/10Input/output [I/O] data interface arrangements, e.g. I/O data control circuits, I/O data buffers
    • G11C7/1078Data input circuits, e.g. write amplifiers, data input buffers, data input registers, data input level conversion circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C8/00Arrangements for selecting an address in a digital store
    • G11C8/08Word line control circuits, e.g. drivers, boosters, pull-up circuits, pull-down circuits, precharging circuits, for word lines

Landscapes

  • Read Only Memory (AREA)

Description

非揮發性記憶體裝置、包含該裝置的記憶體系統以及電子裝置 Non-volatile memory device, memory system including the device, and electronic device 【相關專利申請案之交叉參考】 [Cross-Reference to Related Patent Applications]

本申請案主張2011年4月20日申請之韓國專利申請案第10-2011-0036943號及2011年2月28日申請之美國暫時專利申請案第61/447,133號在美國法典第35篇第119節(35 U.S.C § 119)下之優先權,兩專利申請案之全部揭露內容以引用方式併入本案。 The present application claims the Korean Patent Application No. 10-2011-0036943, filed on Apr. 20, 2011, and the U.S. Provisional Patent Application No. 61/447,133, filed on Feb. 28, 2011, in the s. The entire disclosure of both patent applications is hereby incorporated by reference.

本發明是有關於非揮發性記憶體裝置及系統(non-volatile memory devicess and systems),且特別是有關於非揮發性記憶體裝置及系統所使用的各種電壓的產生。 This invention relates to non-volatile memory devices and systems, and more particularly to the generation of various voltages used in non-volatile memory devices and systems.

半導體記憶體裝置通常區分為揮發性半導體記憶體裝置(volatile semiconductor memory devices)或非揮發性記憶體裝置。如果電源供應器(power supply)發生中斷則揮發性半導體記憶體裝置將失去所儲存的資料,反之如果電源供應器發生中斷則非揮發性記憶體裝置將保留所儲存的資料。 Semiconductor memory devices are generally classified as volatile semiconductor memory devices or non-volatile memory devices. If the power supply is interrupted, the volatile semiconductor memory device will lose the stored data, whereas if the power supply is interrupted, the non-volatile memory device will retain the stored data.

非揮發性半導體記憶體裝置的例子包括罩幕式唯讀記憶體(mask read-only memories,MROM)、可程式唯讀記憶體(programmable read-only memories,PROM)、可抹除可程式唯讀記憶體(erasable programmable read only memories,EPROM)、電性可抹除可程式唯讀記憶體(electrically erasable programmable read only memories,EEPROM)等等。 Examples of non-volatile semiconductor memory devices include mask read-only memories (MROMs), programmable read-only memories (PROMs), and erasable programmable read-only Erasable programmable read only memories (EPROM), electrically erasable programmable read only memories (EEPROM), and the like.

發展自電性可抹除可程式唯讀記憶體(EEPROM)技術,反及閘快閃記憶體裝置(NAND flash memory device)已經被廣泛採用於非揮發性大量資料儲存應用。例如,反及閘快閃記憶體裝置通常用以儲存音訊、影像及/或視訊資料於無數不同類型的主機(host)裝置,例如電腦、行動電話、個人數位助理(personal digital assistants,PDAs)、數位相機、攝錄機(camcorders)、錄音機、MP3播放器、手持式個人電腦(PCs)、遊戲機、傳真機、掃描器、印表機等等。 The development of self-power erasable programmable read-only memory (EEPROM) technology, NAND flash memory device has been widely used in non-volatile large-scale data storage applications. For example, anti-gate flash memory devices are commonly used to store audio, video and/or video data in a myriad of different types of host devices, such as computers, mobile phones, personal digital assistants (PDAs), Digital cameras, camcorders, tape recorders, MP3 players, handheld personal computers (PCs), game consoles, fax machines, scanners, printers, and more.

根據每個記憶胞(memory cell)所儲存的位元的數目,例如反及閘快閃記憶體裝置之非揮發性記憶體裝置通常區分為單階記憶胞(single level cell,SLC)裝置或多階記憶胞(multi-level cells,MLC)裝置。單階記憶胞(SLC)裝置儲存單一位元的資料於每一個非揮發性記憶胞,反之多階記憶胞(MLC)裝置儲存2個或更多個位元的資料於每一個非揮發性記憶胞。 According to the number of bits stored in each memory cell, for example, the non-volatile memory device of the anti-gate flash memory device is usually classified into a single level cell (SLC) device or more. A multi-level cell (MLC) device. A single-stage memory cell (SLC) device stores a single bit of data in each non-volatile memory cell, whereas a multi-level memory cell (MLC) device stores two or more bits of data in each non-volatile memory. Cell.

工業上增加半導體裝置的整合密度之需求持續存在,特別是例如反及閘快閃記憶體裝置之高容量儲存裝置。就此而言,例如多階記憶胞(MLC)裝置在市場上變得更普遍。然而,增加裝置整合度的努力遭遇一些重大的設計挑戰,包括最小化耗電量及維持操作穩定度。 There is a continuing need in the industry to increase the integrated density of semiconductor devices, particularly high capacity storage devices such as anti-gate flash memory devices. In this regard, for example, multi-level memory cell (MLC) devices have become more common on the market. However, efforts to increase device integration have encountered some major design challenges, including minimizing power consumption and maintaining operational stability.

根據發明概念的一方面,提供一種非揮發性記憶體裝置,包括:非揮發性記憶胞陣列(non-volatile memory cell array),包含多條字元線(word lines);電壓產生器,用以產 生使用電源電壓的第一高電壓及使用高於電源電壓之外部電壓的第二高電壓;以及字元線選擇電路(word-line selection circuit),用以在記憶胞陣列的程式操作期間施加第一高電壓至多條字元線當中選取的字元線,且施加第二高電壓至多條字元線當中未選取的字元線。 According to an aspect of the inventive concept, a non-volatile memory cell array includes: a non-volatile memory cell array including a plurality of word lines; a voltage generator for Production Generating a first high voltage of the power supply voltage and a second high voltage using an external voltage higher than the power supply voltage; and a word-line selection circuit for applying the first time during the program operation of the memory cell array A high voltage to a selected one of the plurality of word lines, and applying a second high voltage to the unselected word lines of the plurality of word lines.

根據發明概念的另一方面,提供一種記憶體系統,包括:記憶體控制器(memory controller);以及非揮發性記憶體裝置,用以受記憶體控制器控制。上述之非揮發性記憶體裝置包括:電壓產生器,用以產生使用電源電壓的第一高電壓及使用高於電源電壓之外部電壓的第二高電壓;以及字元線選擇電路,用以在記憶胞陣列的程式操作期間施加第一高電壓至多條字元線當中選取的字元線,且施加第二高電壓至多條字元線當中未選取的字元線。 According to another aspect of the inventive concept, a memory system is provided, including: a memory controller; and a non-volatile memory device for being controlled by a memory controller. The non-volatile memory device includes: a voltage generator for generating a first high voltage using a power supply voltage and a second high voltage using an external voltage higher than a power supply voltage; and a word line selection circuit for The first high voltage is applied to the selected word line among the plurality of word lines during the program operation of the memory cell array, and the second high voltage is applied to the unselected word lines among the plurality of word lines.

根據發明概念的又另一方面,提供一種操作非揮發性記憶體裝置的方法,包括:從電源電壓產生第一高電壓;從高於電源電壓之外部電壓產生第二高電壓;以及在非揮發性記憶體裝置的程式化操作期間施加第一高電壓至非揮發性記憶體裝置之選取的字元線且施加第二高電壓至非揮發性記憶體裝置之未選取的字元線。 According to still another aspect of the inventive concept, a method of operating a non-volatile memory device includes: generating a first high voltage from a power supply voltage; generating a second high voltage from an external voltage higher than a power supply voltage; and non-volatile The first high voltage is applied to the selected word line of the non-volatile memory device during the stylized operation of the memory device and the second high voltage is applied to the unselected word line of the non-volatile memory device.

為讓本發明之上述及其他方面及特徵能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above and other aspects and features of the present invention will become more apparent from the following description.

以下將參考附圖更完整地說明本發明,圖中繪示本發明的實施例。然而,本發明可能以許多不同的形式來實施, 因此不應視為侷限於在此所述之實施例。更確切地說,提供這些實施例是為了使本發明的揭露更齊全,以及更完整地傳達本發明的觀念給任何所屬技術領域中具有通常知識者。在圖中,為了清楚起見可能誇大圖中分層及區域的尺寸及相對大小。所有圖式中的相同參考符號表示相同元件。 The invention will now be described more fully hereinafter with reference to the accompanying drawings in which FIG. However, the invention may be embodied in many different forms. Therefore, it should not be construed as being limited to the embodiments described herein. Rather, these embodiments are provided so that this disclosure will be more complete, and the concept of the invention will be more fully conveyed to those of ordinary skill in the art. In the figures, the size and relative sizes of layers and regions in the drawings may be exaggerated for clarity. The same reference symbols in the drawings denote the same elements.

須知雖然術語第一、第二、第三等等在此可用以說明各種元件、組件、區域、分層及/或區段,但是這些元件、組件、區域、分層及/或區段不應該受限於這些術語。這些術語僅用以區分某一元件、組件、區域、分層或區段與另一元件、組件、區域、分層或區段。因此,在不脫離本發明的原理的情況下,以下所述之第一元件、組件、區域、分層或區段應當可稱為第二元件、組件、區域、分層或區段。 It is to be understood that the terms first, second, third, etc. may be used herein to describe various elements, components, regions, layers and/or sections, but these elements, components, regions, layers and/or sections should not Limited by these terms. The terms are only used to distinguish one element, component, region, layer, or section from another element, component, region, layer, or section. Therefore, a first element, component, region, layer, or section described below may be referred to as a second element, component, region, layer, or section, without departing from the principles of the invention.

為了便於說明圖中所繪示之某一元件或特徵與另一元件或特徵之間的關係,在此可能使用例如「底下」、「低於」、「較低的」、「下方」、「高於」、「較高的」等等之空間關係術語。須知除了圖中所指的方位以外,這些空間關係術語想要包含使用或操作中的裝置的不同方位。例如,若翻轉圖中的裝置,則原本描述為「低於」其他的元件或特徵之元件將轉變成「高於」其他的元件或特徵。因此,所述之術語「低於」可包含高於及低於兩種方位。上述裝置也可指向不同方位(旋轉90度或其他的方向),並且在此所使用的空間關係描述語將相對應地解釋。此外,也須知當一分層稱為「介於」兩分層之間時,其可能是此 兩分層之間的唯一分層,或者也可能存在一層或多層中介分層。 In order to facilitate the description of the relationship between one element or feature and another element or feature in the figures, it is possible to use, for example, "below", "below", "lower", "below", " Spatial terminology higher than "higher" and so on. It should be understood that these spatially relative terms are intended to encompass different orientations of the device in use or operation. For example, if the device in the figures is turned over, the elements that are described as "below" other elements or features will be converted "above" other elements or features. Thus, the term "below" can encompass both the above and below. The above described devices may also point to different orientations (rotated 90 degrees or other directions), and the spatial relationship descriptors used herein will be interpreted accordingly. In addition, it should be noted that when a layer is called "between" two layers, it may be this A unique layering between two layers, or there may be one or more layers of mediation.

在此所使用的術語只是為了說明特定的實施例,而非用以限制本發明。當在此使用時,除非上下文清楚地指出,否則單數形式的「一」及「所述」也會包含複數形式。並且須知術語「包括」及/或「包含」在此說明書中使用時,將指示存在所述之特徵、整數、步驟、操作、元件及/或組件,但不排除存在或附加一個或多個其他的特徵、整數、步驟、操作、元件、組件及/或其組合。當在此使用時,術語「及/或」包括相關的列舉項目當中一個或多個之任一個及所有的組合。 The terminology used herein is for the purpose of illustration and description of the embodiments. As used herein, the singular """ And the use of the terms "including" and / or "comprising", when used in this specification, is intended to indicate the presence of the described features, integers, steps, operations, components and/or components, but does not exclude the presence or addition of one or more other Features, integers, steps, operations, components, components, and/or combinations thereof. The term "and/or" when used herein includes any and all combinations of one or more of the associated listed items.

須知當一元件或分層稱為「位於」、「連接」、「耦合」或「鄰接」另一元件或分層時,其可能直接位於、連接、耦合或鄰接此另一元件或分層,或者可能存在中介的元件或分層。相對地,當一元件或分層稱為「直接位於」、「直接連接」、「直接耦合」或「直接鄰接」另一元件或分層時,不存在中介的元件或分層。 It should be understood that when a component or layer is referred to as "located," "connected," "coupled," or "adjoining" another element or layer, it may be directly located, connected, coupled, or contiguous. Or there may be an intermediary component or layering. In contrast, when a component or layer is referred to as "directly," "directly connected," "directly coupled," or "directly adjoining" another element or layer, there are no intervening elements or layers.

除非另有定義,否則在此所使用的所有術語(包含技術及科學術語)都具有如同本發明所屬技術領域中任何具有通常知識者所了解的一般意義。並且須知術語(例如通用字典所定義的術語)的意義解釋應該符合其依據相關技術領域及/或本說明書的意義,而不應該以理想化或過於形式化的意義來解釋,除非在此特別如此定義。 Unless otherwise defined, all terms (including technical and scientific terms, <RTI ID=0.0>&quot; </ RTI> used herein have the ordinary meaning as understood by one of ordinary skill in the art to which the invention pertains. It should also be understood that the meaning of the terms (such as the terms defined in the general dictionary) should be interpreted in accordance with the relevant technical field and/or the meaning of the specification, and should not be interpreted in an idealized or overly formalized meaning, unless otherwise definition.

按本發明範疇之慣例,實施例的元件可利用以方塊圖 繪示的功能單元來說明。本發明所屬技術領域中任何具有通常知識者將明瞭這些功能單元實際上是藉由具有或不具有控制軟體的電子電路予以實施。 In accordance with the conventions of the present invention, the elements of the embodiments can be utilized in block diagrams. The functional unit is shown to illustrate. Anyone having ordinary skill in the art to which the invention pertains will appreciate that these functional units are actually implemented by electronic circuitry with or without control software.

下列實施例採用反及閘快閃記憶體作為本發明之非揮發性記憶體裝置的記憶體技術。然而,本發明並未侷限於此。本發明可應用的非揮發性記憶體裝置的其他例子包括垂直式反及閘快閃記憶體(vertical NAND flash memories)、反或閘快閃記憶體(NOR flash memories)、電阻式隨機存取記憶體(resistive random access memories,RRAM)、相位變化隨機存取記憶體(phase-change random access memories,PRAM)、磁阻式隨機存取記憶體(magnetroresistive random access memories,MRAM)、鐵電隨機存取記憶體(ferroelectric random access memories,FRAM)、自旋轉移力矩隨機存取記憶體(spin transfer torque random access memories,STT-RAM)等等。 The following examples employ a reverse gate flash memory as the memory technology of the non-volatile memory device of the present invention. However, the invention is not limited thereto. Other examples of non-volatile memory devices to which the present invention is applicable include vertical NAND flash memories, NOR flash memories, and resistive random access memories. Resistive random access memories (RRAM), phase-change random access memories (PRAM), magnetoresistive random access memories (MRAM), ferroelectric random access Ferroelectric random access memories (FRAM), spin transfer torque random access memories (STT-RAM), and the like.

圖1是依照本發明之實施例之一種電子裝置的方塊圖。 1 is a block diagram of an electronic device in accordance with an embodiment of the present invention.

參照圖1,電子裝置1000包括主機1100及記憶體系統(或儲存裝置)1200。此例之主機1100包括外部電源管理單元(external power managing unit)1110。此例之記憶體系統1200包括記憶體控制器1210、非揮發性記憶體1220、及外部電源切換單元(external power switching unit)1230。 Referring to FIG. 1, the electronic device 1000 includes a host 1100 and a memory system (or storage device) 1200. The host 1100 of this example includes an external power managing unit 1110. The memory system 1200 of this example includes a memory controller 1210, a non-volatile memory 1220, and an external power switching unit 1230.

主機1100的例子包括手持式電子裝置,例如個人/手持式電腦、個人數位助理(PDA)、可攜式媒體播放器 (portable media player,PMP)、MP3播放器等等。記憶體系統1200的一例子是固態硬碟(solid state disk/drive,SSD)。記憶體系統1200的其他例子包括個人電腦記憶卡國際協會(Personal Computer Memory Card International Association,PCMCIA)卡、小型快閃(compact flash,CF)卡、智慧型媒體卡(smart media card,SM,SMC)、隨身碟(memory stick)、多媒體卡(multimedia card,MMC、RS-MMC、MMC-micro)、安全數位卡(security card,SD,miniSD,microSD,SDHC)、通用快閃儲存(universal flash storage,UFS)裝置等等。記憶體系統1200的一範例揭露於美國專利申請案公告第2010-0082890號,該專利申請案之全部揭露內容以引用方式併入本案。 Examples of host 1100 include handheld electronic devices such as personal/handheld computers, personal digital assistants (PDAs), portable media players (portable media player, PMP), MP3 player, etc. An example of a memory system 1200 is a solid state disk/drive (SSD). Other examples of the memory system 1200 include a Personal Computer Memory Card International Association (PCMCIA) card, a compact flash (CF) card, and a smart media card (SM, SMC). , memory stick, multimedia card (MMC, RS-MMC, MMC-micro), security card (SD, miniSD, microSD, SDHC), universal flash storage (universal flash storage, UFS) devices and so on. An example of a memory system 1200 is disclosed in U.S. Patent Application Publication No. 2010-0082, the entire disclosure of which is incorporated herein by reference.

主機1100與記憶體系統1200可利用各種標準化介面的任一種予以有效地連接,其例子包括對等網路(PPN)、通用串列匯流排(USB)、小型電腦系統介面(SCSI)、增強型小型裝置介面(ESDI)、串列先進技術連接(SATA)、串列連接小型電腦系統介面(SAS)、快速週邊元件互連(PCI-express)、及整合式電子裝置(IDE)介面。本發明並未侷限於主機1100與記憶體系統1200之間的介面結構。 The host 1100 and the memory system 1200 can be effectively connected using any of a variety of standardized interfaces, examples of which include a peer-to-peer network (PPN), a universal serial bus (USB), a small computer system interface (SCSI), and an enhanced type. Small Device Interface (ESDI), Serial Advanced Technology Connectivity (SATA), Serial Attached Small Computer System Interface (SAS), PCI-express, and Integrated Electronics (IDE) interface. The present invention is not limited to the interface structure between the host 1100 and the memory system 1200.

在操作中,記憶體系統1200產生各種施加至非揮發性記憶體1220的字元線之操作電壓。例如,在程式化操作中,所產生的字元線電壓包括施加至非揮發性記憶體1220的選取的字元線之程式電壓以及施加至非揮發性記憶體1220的未選取的字元線之通過電壓(pass voltage)。在讀取 驗證操作(其形成部分的程式化操作且用以驗證程式化結果)中,所產生的字元線電壓包括提供給非揮發性記憶體1220的選取的字元線之讀取驗證電壓以及施加至非揮發性記憶體1220的未選取的字元線之驗證通過電壓。在讀取操作中,所產生的字元線電壓包括提供給非揮發性記憶體1220的選取的字元線之讀取電壓(read voltage),以及施加至非揮發性記憶體1220的未選取的字元線之讀取通過電壓。須知驗證通過電壓的電壓準位可能與讀取通過電壓的電壓準位相同。 In operation, memory system 1200 produces various operating voltages applied to word lines of non-volatile memory 1220. For example, in a stylized operation, the resulting word line voltage includes a program voltage applied to the selected word line of non-volatile memory 1220 and an unselected word line applied to non-volatile memory 1220. Pass voltage. Reading The verify word operation (which forms part of the stylization operation and used to verify the stylized result), the generated word line voltage includes the read verify voltage supplied to the selected word line of the non-volatile memory 1220 and applied to The verification of the unselected word lines of the non-volatile memory 1220 passes the voltage. In a read operation, the resulting word line voltage includes a read voltage of the selected word line provided to the non-volatile memory 1220, and an unselected voltage applied to the non-volatile memory 1220. The word line is read through the voltage. It should be noted that the voltage level of the verification pass voltage may be the same as the voltage level of the read pass voltage.

在這些各種字元線電壓當中,有些因為在超過電源電壓(Vdd)的電壓準位產生而被描述成「高電壓」。例如,上述之程式電壓、通過電壓、驗證通過電壓、及讀取通過電壓都可能超過電源電壓Vdd。在此須知一種利用外部供應的高電壓來產生字元線電壓之技術被揭露於美國專利第7,672,170號,該專利之全部揭露內容以引用方式併入本案。 Some of these various word line voltages are described as "high voltage" because they are generated at a voltage level exceeding the power supply voltage (Vdd). For example, the program voltage, the pass voltage, the verify pass voltage, and the read pass voltage may exceed the power supply voltage Vdd. A technique for generating a word line voltage using an externally supplied high voltage is disclosed in U.S. Patent No. 7,672,170, the entire disclosure of which is incorporated herein by reference.

仍舊參照圖1的例子,主機1100的外部電源管理單元1110產生外部高電壓Ext_Vpp及外部電源致能訊號(external power enable signal)EPM_en,稍後將說明這些訊號將在記憶體系統1200內予以使用。在一實施例中,外部高電壓Ext_Vpp處於從11伏特(V)到16伏特(V)之間的範圍。然而,本發明並未侷限於此特殊電壓範圍。 Still referring to the example of FIG. 1, the external power management unit 1110 of the host 1100 generates an external high voltage Ext_Vpp and an external power enable signal EPM_en, which will be described later to be used in the memory system 1200. In an embodiment, the external high voltage Ext_Vpp is in a range from 11 volts (V) to 16 volts (V). However, the invention is not limited to this particular voltage range.

記憶體系統1200的記憶體控制器1210控制非揮發性記憶體1220的讀取操作、程式操作、及抹除操作以響應於 從主機1100轉移作為控制訊號(control signals)CTRL之要求/命令。 The memory controller 1210 of the memory system 1200 controls the read operation, the program operation, and the erase operation of the non-volatile memory 1220 in response to The request/command as a control signal CTRL is transferred from the host 1100.

外部電源切換單元1230從主機1100接收外部高電壓Ext_Vpp,且在記憶體控制器1210的控制下轉移外部高電壓Ext_Vpp至非揮發性記憶體1220。外部電源切換單元1230可構成記憶體系統1200內的獨立電路,或者可構成記憶體控制器1210的一部分及/或包含於其中。 The external power source switching unit 1230 receives the external high voltage Ext_Vpp from the host 1100, and transfers the external high voltage Ext_Vpp to the non-volatile memory 1220 under the control of the memory controller 1210. The external power switching unit 1230 may constitute a separate circuit within the memory system 1200 or may form part of and/or be included in the memory controller 1210.

圖1之實例之非揮發性記憶體1220包括多個非揮發性記憶體裝置1221、1222、1223、及1224,其可由相同類型的非揮發性記憶體或不同類型的非揮發性記憶體組成。在本實施例的特殊例子中,每一個非揮發性記憶體裝置1221~1224都是反及閘快閃記憶體晶片。記憶體控制器1210分別在各自的資料輸入/輸出(I/O)通道上與非揮發性記憶體裝置1221~1224通訊。並且,本發明並未侷限於非揮發性記憶體1220包含複數個記憶體裝置之規定。亦即,非揮發性記憶體1220也可包含單一的非揮發性記憶體裝置。 The non-volatile memory 1220 of the example of FIG. 1 includes a plurality of non-volatile memory devices 1221, 1222, 1223, and 1224 that may be comprised of the same type of non-volatile memory or different types of non-volatile memory. In the particular example of this embodiment, each of the non-volatile memory devices 1221-1224 is a reverse gate flash memory chip. The memory controller 1210 communicates with the non-volatile memory devices 1221-1224 on respective data input/output (I/O) channels. Moreover, the invention is not limited to the specification that the non-volatile memory 1220 includes a plurality of memory devices. That is, the non-volatile memory 1220 can also include a single non-volatile memory device.

依照與圖1有關的實施例,記憶體系統1200根據外部電源致能訊號EPM_en的狀態以至少兩種電源模式操作。第一模式稱為一般模式(在此也稱為第一電源模式),而第二模式則稱為外部電壓模式OVM(在此也稱為第二電源模式)。當主機1100之外部電源致能訊號EPM_en處於無作用狀態(或OFF)時,記憶體系統1200將以一般模式操作。當主機1100之外部電源致能訊號EPM_en處於作用狀 態(或ON)時,記憶體系統1200將以外部電壓模式OVM操作。 According to the embodiment associated with FIG. 1, the memory system 1200 operates in at least two power modes in accordance with the state of the external power enable signal EPM_en. The first mode is referred to as the general mode (also referred to herein as the first power mode) and the second mode is referred to as the external voltage mode OVM (also referred to herein as the second power mode). When the external power enable signal EPM_en of the host 1100 is in an inactive state (or OFF), the memory system 1200 will operate in the normal mode. When the external power supply enable signal EPM_en of the host 1100 is in effect At the state (or ON), the memory system 1200 will operate in an external voltage mode OVM.

在一般操作模式中,非揮發性記憶體1220從電源電壓Vdd產生操作用字元線電壓。例如,可利用電荷泵(charge pump)從電源電壓Vdd產生必要的高電壓字元線電壓。須知可從主機1100、記憶體控制器1210、或穩壓器(voltage regulator)(未繪示)供應電源電壓Vdd給非揮發性記憶體1220。 In the normal mode of operation, non-volatile memory 1220 generates an operating word line voltage from supply voltage Vdd. For example, a charge pump can be used to generate the necessary high voltage word line voltage from the supply voltage Vdd. It should be noted that the power supply voltage Vdd can be supplied to the non-volatile memory 1220 from the host 1100, the memory controller 1210, or a voltage regulator (not shown).

在外部電壓模式OVM中,記憶體控制器1210控制外部電源切換單元1230以轉移外部高電壓Ext_Vpp至非揮發性記憶體1220,並且非揮發性記憶體1220從外部高電壓Ext_Vpp產生至少一些操作用字元線電壓。在這種情況下,在圖1的例子中,非揮發性記憶體裝置1221至1224之至少一個用以支援外部電壓模式OVM。若任何非揮發性記憶體裝置1221至1224都不用以支援外部電壓模式OVM,則此種裝置將以一般模式操作,而支援外部電壓模式OVM的裝置將以外部電壓模式OVM操作。在下列解釋的至少一部分中,假設圖1的第一非揮發性記憶體裝置1221支援外部電壓模式OVM。 In the external voltage mode OVM, the memory controller 1210 controls the external power switching unit 1230 to transfer the external high voltage Ext_Vpp to the non-volatile memory 1220, and the non-volatile memory 1220 generates at least some operational words from the external high voltage Ext_Vpp. Yuan line voltage. In this case, in the example of FIG. 1, at least one of the non-volatile memory devices 1221 through 1224 is used to support the external voltage mode OVM. If any of the non-volatile memory devices 1221 through 1224 are not used to support the external voltage mode OVM, such devices will operate in the normal mode, while devices that support the external voltage mode OVM will operate in the external voltage mode OVM. In at least a portion of the following explanation, it is assumed that the first non-volatile memory device 1221 of FIG. 1 supports the external voltage mode OVM.

因此須知,在圖1的修改例子中,將省略外部電源切換單元1230,並且直接提供外部高電壓Ext_Vpp給非揮發性記憶體1220。這種修改及其他修改稍後將參照本發明的其他實施例予以說明。 Therefore, it should be noted that in the modified example of FIG. 1, the external power supply switching unit 1230 will be omitted, and the external high voltage Ext_Vpp is directly supplied to the non-volatile memory 1220. Such modifications and other modifications will be described later with reference to other embodiments of the invention.

在圖1的本例中,記憶體控制器1210根據主機1100 之外部電源致能訊號EPM_en設定非揮發性記憶體裝置1221至1224之每一個的電源模式。然而,本發明並未侷限於此。例如,非揮發性記憶體裝置1221至1224可直接接收外部電源致能訊號EPM_en,且據以設定其各自的電源模式。在另一例中,可省略外部電源致能訊號EPM_en,因而非揮發性記憶體裝置1221至1224可偵測外部高電壓Ext_Vpp是否出現,且據以設定其各自的電源模式。並且,如上所述,非揮發性記憶體裝置1221至1224所設定的電源模式可彼此相同或不同。 In the example of FIG. 1, the memory controller 1210 is based on the host 1100. The external power enable signal EPM_en sets the power mode of each of the non-volatile memory devices 1221 to 1224. However, the invention is not limited thereto. For example, the non-volatile memory devices 1221 through 1224 can directly receive the external power enable signal EPM_en and accordingly set their respective power modes. In another example, the external power enable signal EPM_en may be omitted, and thus the non-volatile memory devices 1221 through 1224 may detect whether an external high voltage Ext_Vpp is present and accordingly set their respective power modes. Also, as described above, the power modes set by the non-volatile memory devices 1221 to 1224 may be the same or different from each other.

圖2是圖1所示之記憶體控制器1210及非揮發性記憶體裝置1221的例子的方塊圖。如上所述,假設非揮發性記憶體裝置1221支援外部電壓模式OVM。 2 is a block diagram of an example of the memory controller 1210 and the non-volatile memory device 1221 shown in FIG. 1. As described above, it is assumed that the non-volatile memory device 1221 supports the external voltage mode OVM.

參照圖2,此例之記憶體控制器1210包括至少一個中央處理器(CPU)1211、主機介面1212、揮發性記憶體裝置1213、及非揮發性記憶體介面1214。 Referring to FIG. 2, the memory controller 1210 of this example includes at least one central processing unit (CPU) 1211, a host interface 1212, a volatile memory device 1213, and a non-volatile memory interface 1214.

中央處理器1211用以分析及處理從圖1所示之主機1100輸入的訊號。中央處理器1211經由非揮發性記憶體介面1214控制非揮發性記憶體裝置1221。中央處理器1211根據為了這用途所安裝的韌體(firmware)控制非揮發性記憶體裝置1221的整體操作。 The central processing unit 1211 is configured to analyze and process signals input from the host 1100 shown in FIG. 1. The central processor 1211 controls the non-volatile memory device 1221 via the non-volatile memory interface 1214. The central processing unit 1211 controls the overall operation of the non-volatile memory device 1221 in accordance with firmware installed for this purpose.

主機介面1212包括與圖1所示之記憶體系統1200耦合之主機1100的資料交換通訊協定(data exchange protocol)。主機介面1212根據主機1100的資料交換通訊協定提供主機1100之操作介面。 The host interface 1212 includes a data exchange protocol for the host 1100 coupled to the memory system 1200 of FIG. The host interface 1212 provides an operational interface for the host 1100 in accordance with the data exchange protocol of the host 1100.

揮發性記憶體裝置1213暫時儲存從主機1100寫入的資料或從非揮發性記憶體裝置1221讀取的資料。揮發性記憶體裝置1213用以儲存要儲存於非揮發性記憶體裝置1221之詮釋資料(meta data)或快取(cache)資料。揮發性記憶體裝置1213可包括動態隨機存取記憶體(DRAM)、靜態隨機存取記憶體(SRAM)等等。 The volatile memory device 1213 temporarily stores data written from the host 1100 or data read from the non-volatile memory device 1221. The volatile memory device 1213 is configured to store meta data or cache data to be stored in the non-volatile memory device 1221. The volatile memory device 1213 may include dynamic random access memory (DRAM), static random access memory (SRAM), and the like.

非揮發性記憶體介面1214提供非揮發性記憶體裝置1221之介面。非揮發性記憶體介面1214轉移揮發性記憶體裝置1213所提供的輸入/輸出(I/O)資料至非揮發性記憶體裝置1221,並且轉移從非揮發性記憶體裝置1221讀取的輸入/輸出資料至揮發性記憶體裝置1213。此外,非揮發性記憶體介面1214提供用以控制非揮發性記憶體裝置1221的整體操作之控制訊號CTRL給非揮發性記憶體裝置1221,以響應於中央處理器1211的控制。 The non-volatile memory interface 1214 provides an interface to the non-volatile memory device 1221. The non-volatile memory interface 1214 transfers the input/output (I/O) data provided by the volatile memory device 1213 to the non-volatile memory device 1221 and transfers the input read from the non-volatile memory device 1221. The data is output to the volatile memory device 1213. In addition, the non-volatile memory interface 1214 provides a control signal CTRL for controlling the overall operation of the non-volatile memory device 1221 to the non-volatile memory device 1221 in response to control by the central processing unit 1211.

在本發明的一實施例中,主機介面1212從主機1100的外部電源管理單元1110接收外部電源致能訊號EPM_en。在這種情況下,中央處理器1211響應外部電源致能訊號EPM_en而經由非揮發性記憶體介面1214提供控制訊號及輸入/輸出資料給非揮發性記憶體裝置1221。並且,中央處理器1211控制圖1所示之外部電源切換單元1230以便提供外部高電壓Ext_Vpp給非揮發性記憶體裝置1221。 In an embodiment of the invention, the host interface 1212 receives the external power enable signal EPM_en from the external power management unit 1110 of the host 1100. In this case, the central processing unit 1211 provides control signals and input/output data to the non-volatile memory device 1221 via the non-volatile memory interface 1214 in response to the external power enable signal EPM_en. Also, the central processing unit 1211 controls the external power supply switching unit 1230 shown in FIG. 1 to supply an external high voltage Ext_Vpp to the non-volatile memory device 1221.

非揮發性記憶體裝置1221選擇性設定成上述之一般模式或外部電壓模式OVM。這可藉由例如設定非揮發性 記憶體裝置1221的設定暫存器(set register)1225的數值予以達成,以響應於記憶體控制器1210所提供的控制訊號CTRL。與設定一般模式或外部電壓模式OVM有關的控制訊號CTRL(例如外部電源致能訊號EPM_en)在此稱為「電源控制資訊」。例如,在外部電源致能訊號EPM_en處於作用狀態(或ON)的情況下,記憶體控制器1210可控制非揮發性記憶體裝置1221以便在設定暫存器1225中設定對應於外部電壓模式OVM的數值。這可藉由傳送電源控制資訊到稍後將參照圖3一起說明之非揮發性記憶體裝置1221的控制邏輯(control logic)160且控制邏輯160響應此電源控制資訊而適當地設定設定暫存器1225的數值予以達成。 The non-volatile memory device 1221 is selectively set to the above-described general mode or external voltage mode OVM. This can be done, for example, by setting a non-volatile The value of the set register 1225 of the memory device 1221 is achieved in response to the control signal CTRL provided by the memory controller 1210. The control signal CTRL (for example, the external power enable signal EPM_en) related to the setting of the normal mode or the external voltage mode OVM is referred to herein as "power control information". For example, in the case where the external power enable signal EPM_en is in the active state (or ON), the memory controller 1210 can control the non-volatile memory device 1221 to set the corresponding external voltage mode OVM in the setting register 1225. Value. This can be set by appropriately transmitting the power control information to the control logic 160 of the non-volatile memory device 1221, which will be described later with reference to FIG. 3, and the control logic 160 responds to the power control information. The value of 1225 is reached.

在本發明的外部電壓模式OVM的一個例子中,非揮發性記憶體裝置1221從外部高電壓Ext_Vpp產生一些字元線電壓,且使用電源電壓Vdd產生其他的字元線電壓。例如,在程式化操作中,可從外部高電壓Ext_Vpp產生將施加至未選取的字元線之通過電壓Vpass及讀取驗證通過電壓Vread,而且可從電源電壓Vdd產生將施加至選取的字元線之程式電壓Vpgm。外部電壓模式OVM的此例及其他例子將參照下列實施例予以說明。 In one example of the external voltage mode OVM of the present invention, the non-volatile memory device 1221 generates some word line voltages from the external high voltage Ext_Vpp and uses the power supply voltage Vdd to generate other word line voltages. For example, in the stylization operation, the pass voltage Vpass to be applied to the unselected word line and the read verify pass voltage Vread may be generated from the external high voltage Ext_Vpp, and may be generated from the power supply voltage Vdd to be applied to the selected character. The line program voltage Vpgm. This and other examples of the external voltage mode OVM will be described with reference to the following embodiments.

圖3是依照本發明之一個或多個實施例之圖2所示之非揮發性記憶體裝置1221的方塊圖。 3 is a block diagram of the non-volatile memory device 1221 of FIG. 2 in accordance with one or more embodiments of the present invention.

參照圖3,非揮發性記憶體裝置1221包括電壓產生電路(voltage generation circuit)110、列選擇電路(row selection circuit)120、記憶胞陣列130、讀寫電路(read and write circuit)140、資料輸入/輸出電路(data input/output circuit)150、及控制邏輯160。 Referring to FIG. 3, the non-volatile memory device 1221 includes a voltage generation circuit 110 and a column selection circuit (row A selection circuit 120, a memory cell array 130, a read and write circuit 140, a data input/output circuit 150, and a control logic 160.

控制邏輯160控制非揮發性記憶體裝置1221的整體操作。例如,控制邏輯160響應圖1所示之記憶體控制器1210的程式要求或讀取要求,並且控制非揮發性記憶體裝置1221的整體操作以便執行程式操作或讀取操作。 Control logic 160 controls the overall operation of non-volatile memory device 1221. For example, control logic 160 is responsive to the program requirements or read requirements of memory controller 1210 shown in FIG. 1, and controls the overall operation of non-volatile memory device 1221 to perform program operations or read operations.

在此假設從圖1所示之主機1100提供外部高電壓Ext_Vpp給圖1所示之記憶體系統1200,亦即將對應於外部電壓模式OVM的數值儲存於以上參照圖2所述之設定暫存器1225。響應於設定暫存器1225所儲存的外部電壓模式OVM數值,控制邏輯160將提供外部電壓模式訊號(outside voltage mode signal)OVMS給電壓產生電路110。如此,將建立外部電壓模式OVM。 It is assumed here that the external high voltage Ext_Vpp is supplied from the host 1100 shown in FIG. 1 to the memory system 1200 shown in FIG. 1, that is, the value corresponding to the external voltage mode OVM is stored in the setting register described above with reference to FIG. 1225. In response to setting the external voltage mode OVM value stored by the register 1225, the control logic 160 will provide an external voltage mode signal OVMS to the voltage generating circuit 110. As such, an external voltage mode OVM will be established.

電壓產生電路110產生要提供給記憶胞陣列130的字元線WL之電壓(亦即字元線電壓)。此電壓將根據外部電壓模式OVM產生以響應於控制邏輯160之外部電壓模式訊號OVMS。 The voltage generating circuit 110 generates a voltage (i.e., a word line voltage) to be supplied to the word line WL of the memory cell array 130. This voltage will be generated in response to external voltage mode signal OVMS of control logic 160 in accordance with external voltage mode OVM.

如圖3所示,此例之電壓產生電路110包括高電壓(HV)產生器111及低電壓(LV)產生器112。 As shown in FIG. 3, the voltage generating circuit 110 of this example includes a high voltage (HV) generator 111 and a low voltage (LV) generator 112.

高電壓產生器(high voltage generator)111包括一般高電壓產生器111_a及選擇性高電壓產生器111_b。一般高電壓產生器111_a在程式操作期間產生要供應給選取的字元線之程式電壓Vpgm,以響應於控制邏輯160的控制。 在此特定實施例中,一般高電壓產生器111_a從電源電壓Vdd產生程式電壓Vpgm,例如藉由電源電壓Vdd的電荷泵。 The high voltage generator 111 includes a general high voltage generator 111_a and a selective high voltage generator 111_b. The general high voltage generator 111_a generates a program voltage Vpgm to be supplied to the selected word line during program operation in response to control by the control logic 160. In this particular embodiment, the general high voltage generator 111_a generates a program voltage Vpgm from the supply voltage Vdd, such as a charge pump by the supply voltage Vdd.

選擇性高電壓產生器111_b響應控制邏輯160的控制,並且在程式操作期間產生要供應給未選取的字元線之通過電壓Vpass,或在讀取操作期間產生要供應給未選取的字元線之讀取通過電壓Vread。 The selective high voltage generator 111_b is responsive to control of the control logic 160 and generates a pass voltage Vpass to be supplied to the unselected word line during program operation or a supply to the unselected word line during the read operation. The read voltage Vread is read.

在外部高電壓Ext_Vpp處於作用狀態(ON)的情況下,選擇性高電壓產生器111_b根據從控制邏輯160接收之外部電壓模式訊號OVMS來操作。亦即,在外部電壓模式OVM中,選擇性高電壓產生器111_b從外部高電壓Ext_Vpp產生通過電壓Vpass及讀取通過電壓Vread,例如藉由降低外部高電壓Ext_Vpp的電壓準位。 In the case where the external high voltage Ext_Vpp is in the active state (ON), the selective high voltage generator 111_b operates in accordance with the external voltage mode signal OVMS received from the control logic 160. That is, in the external voltage mode OVM, the selective high voltage generator 111_b generates the pass voltage Vpass and the read pass voltage Vread from the external high voltage Ext_Vpp, for example, by lowering the voltage level of the external high voltage Ext_Vpp.

在外部高電壓Ext_Vpp處於無作用狀態(OFF)的情況下,選擇性高電壓產生器111_b將根據一般模式來操作。亦即,在一般模式中,選擇性高電壓產生器111_b從電源電壓Vdd產生通過電壓Vpass及讀取通過電壓Vread,例如藉由電源電壓Vdd的電荷泵。 In the case where the external high voltage Ext_Vpp is in an inactive state (OFF), the selective high voltage generator 111_b will operate according to the general mode. That is, in the normal mode, the selective high voltage generator 111_b generates a pass voltage Vpass and a read pass voltage Vread from the power supply voltage Vdd, for example, a charge pump by the power supply voltage Vdd.

在控制邏輯160的控制下,低電壓產生器(low voltage generator)112在包含於程式操作之驗證讀取操作期間產生要提供給選取的字元線之驗證讀取電壓(verification read voltage)Vvfy,或者在讀取操作期間產生要提供給選取的字元線之讀取電壓Vrd。在這實施例的此例中,低電壓產生器112利用高電壓Vpp來產生驗證讀取電壓Vvfy 及讀取電壓Vrd。在此,高電壓Vpp可以是一般高電壓產生器111_a或選擇性高電壓產生器111_b所產生的高電壓。在這實施例的另一例中,驗證讀取電壓Vvfy及/或讀取電壓Vrd低於電源電壓Vdd,並且低電壓產生器112利用電源電壓Vdd來產生驗證讀取電壓Vvfy及/或讀取電壓Vrd。 Under the control of control logic 160, a low voltage generator 112 generates a verification read voltage Vvfy to be supplied to the selected word line during a verify read operation included in the program operation. Alternatively, a read voltage Vrd to be supplied to the selected word line is generated during the read operation. In this example of this embodiment, the low voltage generator 112 generates a verify read voltage Vvfy using the high voltage Vpp. And reading voltage Vrd. Here, the high voltage Vpp may be a high voltage generated by the general high voltage generator 111_a or the selective high voltage generator 111_b. In another example of this embodiment, the verify read voltage Vvfy and/or the read voltage Vrd are lower than the power supply voltage Vdd, and the low voltage generator 112 utilizes the power supply voltage Vdd to generate the verify read voltage Vvfy and/or the read voltage. Vrd.

列選擇電路120從電壓產生電路110獲得字元線電壓Vpgm、Vpass、Vread、Vvfy、及Vrd,並且提供相對應的電壓給指定的字元線WL以響應於列位址(row address)RA。此例之列選擇電路120包括電壓選擇開關(voltage selection switch)121、第一列解碼器(row decoder)122、及第二列解碼器123。 The column selection circuit 120 obtains the word line voltages Vpgm, Vpass, Vread, Vvfy, and Vrd from the voltage generation circuit 110, and supplies a corresponding voltage to the specified word line WL in response to the row address RA. The column selection circuit 120 of this example includes a voltage selection switch 121, a first column decoder 122, and a second column decoder 123.

電壓選擇開關121產生要提供給字元線WL之選擇訊號(selection signals)S<1>至S<n>以響應於列位址RA的位址部分RAi。 The voltage selection switch 121 generates selection signals S<1> to S<n> to be supplied to the word line WL in response to the address portion RAi of the column address RA.

例如,在程式操作的程式化週期,電壓選擇開關121啟動選擇訊號S<1>至S<n>之一以響應於列位址RAi且關閉其餘的選擇訊號。電壓選擇開關121轉移程式電壓Vpgm至所啟動的選擇訊號且轉移通過電壓Vpass至所關閉的選擇訊號。 For example, during a stylized cycle of program operation, voltage select switch 121 activates one of select signals S<1> through S<n> in response to column address RAi and turns off the remaining select signals. The voltage selection switch 121 shifts the program voltage Vpgm to the activated selection signal and shifts the pass voltage Vpass to the closed selection signal.

在另一例中,在程式操作的驗證讀取週期,電壓選擇開關121轉移驗證讀取電壓Vvfy到在程式執行週期啟動的選擇訊號且轉移驗證通過電壓Vread到在程式執行週期關閉的選擇訊號。 In another example, during the verify read cycle of the program operation, the voltage select switch 121 transfers the verify read voltage Vvfy to the select signal initiated during the program execution cycle and transfers the verify pass voltage Vread to the select signal that is turned off during the program execution cycle.

在又另一例中,在讀取操作期間,電壓選擇開關121啟動選擇訊號S<1>至S<n>之一以響應於列位址RAi。在此時間,其餘的選擇訊號將關閉。電壓選擇開關121轉移讀取電壓Vrd至所啟動的選擇訊號且轉移讀取通過電壓Vread至所關閉的選擇訊號。 In still another example, during the read operation, the voltage selection switch 121 activates one of the selection signals S<1> to S<n> in response to the column address RAi. At this time, the remaining selection signals will be turned off. The voltage selection switch 121 shifts the read voltage Vrd to the activated select signal and shifts the read pass voltage Vread to the turned-off select signal.

第一列解碼器122及第二列解碼器123之每一個以相對應的字元線電壓驅動字元線WL以響應於選擇訊號S<1>至S<n>及列位址RA的其餘部分RAj。在這實施例的此例中,列位址部分RAj是用以選擇記憶體區塊(memory block)131或132(亦即記憶體區塊BLK1或BLK2)之位址。也根據此例,第一列解碼器122選擇第一記憶體區塊131以響應於列位址RAj,並且第二列解碼器123選擇第二記憶體區塊132以響應於列位址RAj。 Each of the first column decoder 122 and the second column decoder 123 drives the word line WL with a corresponding word line voltage in response to the selection signals S<1> to S<n> and the rest of the column address RA Part of RAj. In this example of this embodiment, the column address portion RAj is an address for selecting a memory block 131 or 132 (i.e., memory block BLK1 or BLK2). Also according to this example, the first column decoder 122 selects the first memory block 131 in response to the column address RAj, and the second column decoder 123 selects the second memory block 132 in response to the column address RAj.

第一列解碼器122及第二列解碼器123之每一個轉移經由選擇訊號S<1>至S<n>供應的字元線電壓至所選取的記憶體區塊的字元線WL。在程式操作的程式執行週期,分別施加程式電壓Vpgm至所選取的字元線且施加通過電壓Vpass至未選取的字元線。並且,在讀取操作期間,分別施加讀取電壓Vrd至所選取的字元線且施加讀取通過電壓Vread至未選取的字元線。 Each of the first column decoder 122 and the second column decoder 123 transfers the word line voltage supplied via the selection signals S<1> to S<n> to the word line WL of the selected memory block. During the program execution cycle of the program operation, the program voltage Vpgm is applied to the selected word line and the pass voltage Vpass is applied to the unselected word line. Also, during the read operation, the read voltage Vrd is applied to the selected word line, respectively, and the read pass voltage Vread is applied to the unselected word line.

如上所述,記憶胞陣列130經由字元線WL連接至列選擇電路120。並且,記憶胞陣列130經由位元線(bit lines)BL連接至讀寫電路140。如上所述,記憶胞陣列130包括第一記憶體區塊131及第二記憶體區塊132。第一記憶體 區塊131及第二記憶體區塊132之每一個包括多個皆儲存資料之記憶胞。為了便於說明,繪示兩個記憶體區塊131及132於圖3。然而,本發明並未侷限於記憶胞陣列130的記憶體區塊數目。換言之,記憶胞陣列130可具有單一的記憶體區塊,或者具有兩個或更多個記憶體區塊。 As described above, the memory cell array 130 is connected to the column selection circuit 120 via the word line WL. Further, the memory cell array 130 is connected to the read/write circuit 140 via bit lines BL. As described above, the memory cell array 130 includes a first memory block 131 and a second memory block 132. First memory Each of the block 131 and the second memory block 132 includes a plurality of memory cells that store data. For convenience of explanation, two memory blocks 131 and 132 are shown in FIG. However, the present invention is not limited to the number of memory blocks of the memory cell array 130. In other words, the memory cell array 130 can have a single memory block or have two or more memory blocks.

本發明也未侷限於每一個記憶胞所儲存的位元數目。例如,記憶胞陣列130的每一個記憶胞可儲存單一位元的資料,其通常稱為單階記憶胞(SLC)或單位元記憶胞(single bit cell,SBC)。另一方面,記憶胞陣列130的每一個記憶胞可儲存兩個或更多個位元的資料,其通常稱為多階記憶胞(MLC)或多位元記憶胞(multi bit cell,MBC)。並且,記憶胞陣列130可包括單階記憶胞(SLC)/單位元記憶胞(SBC)及多階記憶胞(MLC)/單位元記憶胞(MBC)兩者。 The invention is also not limited to the number of bits stored in each memory cell. For example, each memory cell of memory cell array 130 can store a single bit of data, which is commonly referred to as a single-order memory cell (SLC) or a single bit cell (SBC). On the other hand, each memory cell of the memory cell array 130 can store data of two or more bits, which is commonly referred to as a multi-order memory cell (MLC) or a multi-bit cell (MBC). . Also, the memory cell array 130 may include both a single-order memory cell (SLC)/unit cell memory cell (SBC) and a multi-order memory cell (MLC)/unit cell memory cell (MBC).

讀寫電路140經由位元線BL連接至記憶胞陣列130且經由資料線(data lines)DL連接至資料輸入/輸出電路150,並在操作上響應於控制邏輯160。在程式化操作中,讀寫電路140從資料輸入/輸出電路150接收資料以便儲存所接收的資料於記憶胞陣列130。在讀取操作中,讀寫電路140從記憶胞陣列130讀取資料以便轉移所讀取的資料至資料輸入/輸出電路150。例如,讀寫電路140可包括:用以執行資料的讀取及寫入之構成元件,例如頁緩衝器(page buffer)(或頁暫存器(page register));用以選擇位元線BL之行選擇器電路(column selector circuit);以及其他元件。 Read and write circuit 140 is coupled to memory cell array 130 via bit line BL and to data input/output circuit 150 via data lines DL and is operatively responsive to control logic 160. In the stylized operation, the read and write circuit 140 receives data from the data input/output circuit 150 to store the received data in the memory cell array 130. In the read operation, the read/write circuit 140 reads data from the memory cell array 130 to transfer the read data to the data input/output circuit 150. For example, the read/write circuit 140 may include: constituent elements for performing reading and writing of data, such as a page buffer (or page register); for selecting a bit line BL a column selector circuit; and other components.

資料輸入/輸出電路150經由資料線DL連接至讀寫電路140。資料輸入/輸出電路150在操作上響應於控制邏輯160,且用以與外部裝置交換輸入/輸出資料。在程式操作中,資料輸入/輸出電路150經由資料線DL轉移外部裝置所提供的輸入/輸出資料至讀寫電路140。在讀取操作中,資料輸入/輸出電路150經由資料線DL轉移讀寫電路140所提供的輸入/輸出資料至外部裝置。 The data input/output circuit 150 is connected to the read/write circuit 140 via the data line DL. The data input/output circuit 150 is operatively responsive to the control logic 160 and is used to exchange input/output data with an external device. In the program operation, the data input/output circuit 150 transfers the input/output data supplied from the external device to the read/write circuit 140 via the data line DL. In the read operation, the data input/output circuit 150 transfers the input/output data supplied from the read/write circuit 140 to the external device via the data line DL.

如以上參考圖3所述,非揮發性記憶體裝置1221支援外部電壓模式OVM,並且利用外部高電壓Ext_Vpp來產生將提供給未選取的字元線之高字元線電壓(亦即通過電壓Vpass或讀取通過電壓Vread)。相對地,在藉由電源電壓Vdd之電荷泵來產生高字元線電壓的情況下,可能發生過量的瞬間峰值電流(excessive transient peak current)。這可能導致不穩定的字元線電壓的產生,其接著可能導致非揮發性記憶體裝置的操作故障。上述實施例可避免這缺點,這是因為電壓產生電路110藉由降低外部高電壓Ext_Vpp產生未選取的字元線之高字元線電壓,因而避免瞬間峰值電流。此外,因為同時自外部電壓Ext_Vpp施加至許多未選取的字元線之高字元線電壓源,所以可降低非揮發性記憶體裝置內的耗電量。 As described above with reference to FIG. 3, the non-volatile memory device 1221 supports the external voltage mode OVM and utilizes the external high voltage Ext_Vpp to generate a high word line voltage to be supplied to the unselected word line (ie, through the voltage Vpass). Or read through voltage Vread). In contrast, in the case where a high word line voltage is generated by a charge pump of the power supply voltage Vdd, an excessive transient peak current may occur. This may result in the generation of unstable word line voltages, which in turn may cause operational failure of the non-volatile memory device. The above embodiment can avoid this disadvantage because the voltage generating circuit 110 generates a high word line voltage of an unselected word line by lowering the external high voltage Ext_Vpp, thereby avoiding an instantaneous peak current. In addition, since the high-character line voltage source is applied from the external voltage Ext_Vpp to many unselected word lines at the same time, the power consumption in the non-volatile memory device can be reduced.

圖4是可用於圖3的實施例之一般高電壓產生器111_a的一例子的方塊圖。尤其,如上所述,一般高電壓產生器111_a產生程式電壓Vpgm以響應於圖3的控制邏輯160的控制。 4 is a block diagram of an example of a general high voltage generator 111_a that can be used in the embodiment of FIG. In particular, as described above, the general high voltage generator 111_a generates the program voltage Vpgm in response to the control of the control logic 160 of FIG.

參照圖4,一般高電壓產生器111_a包括振盪器(oscillator)111_a1、穩壓器111_a2、及電荷泵111_a3。 Referring to FIG. 4, the general high voltage generator 111_a includes an oscillator 111_a1, a voltage regulator 111_a2, and a charge pump 111_a3.

振盪器111_a1產生振盪訊號(oscillation signal)OSC。穩壓器111_a2根據電荷泵111_a3的輸出電壓的準位是否高於目標電壓TV的準位輸出振盪訊號OSC作為時脈(clock)CLK。電荷泵111_a3執行升壓操作以響應於時脈CLK。電荷泵111_a3藉由以電源電壓Vdd充電多個串列連接的電容器(未繪示)來升壓輸出電壓的電壓準位到達程式電壓Vpgm的電壓準位。 The oscillator 111_a1 generates an oscillation signal OSC. The regulator 111_a2 outputs the oscillation signal OSC as the clock CLK according to whether the level of the output voltage of the charge pump 111_a3 is higher than the level of the target voltage TV. The charge pump 111_a3 performs a boosting operation in response to the clock CLK. The charge pump 111_a3 boosts the voltage level of the output voltage to the voltage level of the program voltage Vpgm by charging a plurality of serially connected capacitors (not shown) with the power supply voltage Vdd.

圖5是可用於圖3的實施例之選擇性高電壓產生器111-b的一例子的方塊圖,而圖6則是用以說明圖5所示之轉移路徑的相對電壓的時序圖。 5 is a block diagram of an example of a selective high voltage generator 111-b that can be used in the embodiment of FIG. 3, and FIG. 6 is a timing diagram for explaining the relative voltage of the transfer path shown in FIG.

如上所述,在程式化期間,選擇性高電壓產生器111_b產生通過電壓Vpass以響應於圖3所示之控制邏輯160的控制。在讀取期間,選擇性高電壓產生器111_b產生讀取通過電壓Vread以響應於圖3所示之控制邏輯160的控制。這些高電壓Vpass及Vread將施加至未選取的字元線WL。圖3繪示產生通過電壓Vpass的例子。 As described above, during stylization, the selective high voltage generator 111_b generates a pass voltage Vpass in response to the control of the control logic 160 shown in FIG. During reading, the selective high voltage generator 111_b generates a read pass voltage Vread in response to the control of the control logic 160 shown in FIG. These high voltages Vpass and Vread will be applied to the unselected word line WL. FIG. 3 illustrates an example of generating a pass voltage Vpass.

參照圖5,選擇性高電壓產生器111_b包括振盪器111_b1、穩壓器111_b2、電荷泵111_b3、切換電路(switching circuit)111_b5、及分壓電路(voltage division circuit)111_b6。振盪器111_b1、穩壓器111_b2、及電荷泵111_b3實質上等同於參照圖4所說明的那些元件,並且其全體在此稱為升壓電路(pumping circuit)111_b4。 Referring to FIG. 5, the selective high voltage generator 111_b includes an oscillator 111_b1, a voltage regulator 111_b2, a charge pump 111_b3, a switching circuit 111_b5, and a voltage division circuit 111_b6. The oscillator 111_b1, the regulator 111_b2, and the charge pump 111_b3 are substantially identical to those described with reference to FIG. 4, and are collectively referred to herein as a pumping circuit 111_b4.

選擇性高電壓產生器111_b根據裝置是否以上述之一般模式或上述之外部電壓模式OVM操作而以兩種方式之一產生通過電壓Vpass。尤其,在外部電壓模式OVM中,選擇性高電壓產生器111_b利用外部高電壓Ext_Vpp產生通過電壓Vpass。另一方面,在一般模式中,選擇性高電壓產生器111_b利用電源電壓Vdd產生通過電壓Vpass。 The selective high voltage generator 111_b generates the pass voltage Vpass in one of two ways depending on whether the device operates in the above-described general mode or the above-described external voltage mode OVM. In particular, in the external voltage mode OVM, the selective high voltage generator 111_b generates the pass voltage Vpass using the external high voltage Ext_Vpp. On the other hand, in the normal mode, the selective high voltage generator 111_b generates the pass voltage Vpass using the power supply voltage Vdd.

參照圖5及圖6,假設至少在外部電壓模式訊號OVMS處於作用狀態(例如邏輯高準位)之時間週期轉移外部高電壓Ext_Vpp至選擇性高電壓產生器111_b。 Referring to FIGS. 5 and 6, it is assumed that the external high voltage Ext_Vpp is transferred to the selective high voltage generator 111_b at least for a time period in which the external voltage mode signal OVMS is in an active state (eg, a logic high level).

在時間t1,外部電壓模式訊號OVMS變成作用狀態(例如邏輯高準位),例如根據設定暫存器1225(圖2)的設定值。結果,切換電路111_b5切換成開啟(亦即閉路)以便沿著第一路徑耦合外部高電壓Ext_Vpp與分壓電路111_b6。同時,將關閉(或斷開)升壓電路111_b4的振盪器111_b1,因而停止升壓電路111_b4的功能。因此,在第一時間週期T1,將沿著第一路徑供應具有Vpp電壓準位之外部高電壓Ext_Vpp給分壓電路111_b6,並且藉由外部高電壓Ext_Vpp的分壓產生通過電壓Vpass。 At time t1, the external voltage mode signal OVMS becomes active (eg, a logic high level), such as according to a set value of the set register 1225 (FIG. 2). As a result, the switching circuit 111_b5 is switched to be turned on (i.e., closed) to couple the external high voltage Ext_Vpp and the voltage dividing circuit 111_b6 along the first path. At the same time, the oscillator 111_b1 of the boosting circuit 111_b4 is turned off (or turned off), thereby stopping the function of the boosting circuit 111_b4. Therefore, in the first time period T1, the external high voltage Ext_Vpp having the Vpp voltage level is supplied to the voltage dividing circuit 111_b6 along the first path, and the pass voltage Vpass is generated by the divided voltage of the external high voltage Ext_Vpp.

在時間t2,外部電壓模式訊號OVMS變成無作用狀態(例如邏輯低準位),例如根據設定暫存器1225(圖2)的設定值。結果,切換電路111_b5切換成關閉(亦即開路)以便解除外部高電壓Ext_Vpp與分壓電路111_b6沿著第一路徑之耦合。同時,將啟動(或導通)升壓電路111_b4的振盪器111_b1,因而啟動升壓電路111_b4。因此,在第二時間 週期T2,將沿著第二路徑供應具有Vpp電壓準位之內部高電壓Int_Vpp給分壓電路111_b6,並且藉由內部高電壓Int_Vpp的分壓產生通過電壓Vpass。 At time t2, the external voltage mode signal OVMS becomes inactive (eg, a logic low level), such as according to a set value of the set register 1225 (FIG. 2). As a result, the switching circuit 111_b5 is switched to be turned off (i.e., open) to release the coupling of the external high voltage Ext_Vpp and the voltage dividing circuit 111_b6 along the first path. At the same time, the oscillator 111_b1 of the boosting circuit 111_b4 is activated (or turned on), thereby starting the boosting circuit 111_b4. So in the second time In the period T2, the internal high voltage Int_Vpp having the Vpp voltage level is supplied to the voltage dividing circuit 111_b6 along the second path, and the pass voltage Vpass is generated by the divided voltage of the internal high voltage Int_Vpp.

在時間t3,在時間t1,外部電壓模式訊號OVMS再度變成作用狀態(例如邏輯高準位),切換電路111_b5切換成開啟(亦即閉路)以便沿著第一路徑耦合外部高電壓Ext_Vpp與分壓電路111_b6,並且關閉(或斷開)升壓電路111_b4的振盪器111_b1。因此,藉由外部高電壓Ext_Vpp的分壓產生通過電壓Vpass。 At time t3, at time t1, the external voltage mode signal OVMS again becomes active (for example, a logic high level), and the switching circuit 111_b5 is switched to be turned on (ie, closed) to couple the external high voltage Ext_Vpp and the voltage divider along the first path. The circuit 111_b6, and turns off (or turns off) the oscillator 111_b1 of the boosting circuit 111_b4. Therefore, the pass voltage Vpass is generated by the partial voltage of the external high voltage Ext_Vpp.

圖7是圖5所示之分壓電路111_b6的一例子的電路圖。參照圖7,分壓電路111_b6包括電源供應單元(power supplying unit)1、分壓單元(voltage dividing unit)2、偏壓電流單元(bias current unit)3、及比較單元(comparison unit)4。 Fig. 7 is a circuit diagram showing an example of the voltage dividing circuit 111_b6 shown in Fig. 5. Referring to FIG. 7, the voltage dividing circuit 111_b6 includes a power supply unit 1, a voltage dividing unit 2, a bias current unit 3, and a comparison unit 4.

電源供應單元1接收經由第一路徑或第二路徑(參照圖5)提供之Vpp準位的電壓(亦即外部高電壓Ext_Vpp或內部高電壓Int_Vpp)。此例之電源供應單元1包括P通道金屬氧化物半導體電晶體(PMOS transistor)PM_L。 The power supply unit 1 receives the voltage of the Vpp level (that is, the external high voltage Ext_Vpp or the internal high voltage Int_Vpp) supplied via the first path or the second path (refer to FIG. 5). The power supply unit 1 of this example includes a P-channel MOS transistor PM_L.

分壓單元2連接在輸出節點(output node)NO_L與比較節點(comparison node)NC_L之間,並且藉由根據修整碼(trim code)TRMi_L分壓Vpp電壓來輸出通過電壓Vpass。 The voltage dividing unit 2 is connected between the output node NO_L and the comparison node NC_L, and outputs the pass voltage Vpass by dividing the Vpp voltage according to the trim code TRMi_L.

此例之分壓單元2包括:串列連接在輸出節點NO_L與比較節點NC_L之間的多個電阻器R2_L至R4_L;分別 與相對應的電阻器R4_L至R2_L平行連接之電晶體M0_L至M2_L;以及分別連接至相對應的電晶體M0_L至M2_L的閘極(gates)之開關SW0_L~SW2_L。電阻器R4_L至R2_L之每一個可根據修整碼TRM0_L至TRM2_L予以短路或開路。在圖7中,繪示能夠根據修整碼TRM0_L至TRM2_L予以短路之三個電阻器R4_L至R2_L。然而,本發明並未侷限於此。亦即,分壓單元2可包括能夠根據至少一個修整碼予以短路之一個或多個電阻器。 The voltage dividing unit 2 of this example includes: a plurality of resistors R2_L to R4_L connected in series between the output node NO_L and the comparison node NC_L; The transistors M0_L to M2_L connected in parallel with the corresponding resistors R4_L to R2_L; and the switches SW0_L to SW2_L connected to the gates of the corresponding transistors M0_L to M2_L, respectively. Each of the resistors R4_L to R2_L may be short-circuited or open circuited according to the trimming codes TRM0_L to TRM2_L. In FIG. 7, three resistors R4_L to R2_L capable of being short-circuited according to the trimming codes TRM0_L to TRM2_L are illustrated. However, the invention is not limited thereto. That is, the voltage dividing unit 2 may include one or more resistors that can be short-circuited according to at least one trimming code.

開關SW0_L~SW2_L之每一個接收高電壓Vpp及修整碼TRM0_L至TRM2_L之相對應的那一個,並且根據相對應的修整碼供應高電壓Vpp給相對應的電晶體的閘極。 Each of the switches SW0_L~SW2_L receives the corresponding one of the high voltage Vpp and the trimming codes TRM0_L to TRM2_L, and supplies the high voltage Vpp to the gate of the corresponding transistor according to the corresponding trimming code.

偏壓電流單元3連接在比較節點NC_L與接地端子(ground terminal)之間,並且根據分壓電路111_b6的啟動流出固定電流。此例之偏壓電流單元3包括電阻器R1_L。 The bias current unit 3 is connected between the comparison node NC_L and the ground terminal, and flows out a fixed current according to the startup of the voltage dividing circuit 111_b6. The bias current unit 3 of this example includes a resistor R1_L.

比較單元4藉由比較比較節點NC_L的電壓與低電壓之參考電壓(reference voltage)Vref_LV來控制電源供應單元1的啟動。例如,當比較節點NC_L的電壓不等於低電壓之參考電壓Vref_LV時比較單元4將持續啟動電源供應單元1。此例之比較單元4包括接收比較節點NC_L的電壓之正輸入端子及接收低電壓之參考電壓Vref_LV之負輸入端子。 The comparison unit 4 controls the startup of the power supply unit 1 by comparing the voltage of the comparison node NC_L with the reference voltage Vref_LV of the low voltage. For example, the comparison unit 4 will continue to activate the power supply unit 1 when the voltage of the comparison node NC_L is not equal to the reference voltage Vref_LV of the low voltage. The comparison unit 4 of this example includes a positive input terminal that receives the voltage of the comparison node NC_L and a negative input terminal that receives the reference voltage Vref_LV of the low voltage.

圖8是修整碼產生器(trim code generator)5的一例子的方塊圖。修整碼產生器5產生將施加至圖7之分壓電路111_b6之修整碼。此例之修整碼產生器5包括第一資料閂 鎖器(data latch)5_a及第二資料閂鎖器5_b。 FIG. 8 is a block diagram showing an example of a trim code generator 5. The trimming code generator 5 generates a trimming code to be applied to the voltage dividing circuit 111_b6 of Fig. 7. The trimming code generator 5 of this example includes the first data latch A data latch 5_a and a second data latch 5_b.

為了便於解釋,假設第一資料閂鎖器5_a閂鎖通過電壓Vpass上的資料且第二資料閂鎖器5_b閂鎖讀取通過電壓Vread上的資料。為了從圖7之分壓電路111_b6獲得目標通過電壓Vpass,第一資料閂鎖器5_a輸出所閂鎖的資料作為第i個修整碼TRMi_L(i是1或更大的整數)以響應於第一修整碼致能訊號(trim code enable signal)TEN1。另一方面,為了從圖7之分壓電路111_b6獲得目標讀取通過電壓Vread,第二資料閂鎖器5_b輸出所閂鎖的資料作為第i個修整碼TRMi_L以響應於第二修整碼致能訊號TEN2。 For ease of explanation, it is assumed that the first data latch 5_a latches the data on the voltage Vpass and the second data latch 5_b latches the data on the read voltage Vread. In order to obtain the target pass voltage Vpass from the voltage dividing circuit 111_b6 of FIG. 7, the first data latch 5_a outputs the latched data as the i-th trimming code TRMi_L (i is an integer of 1 or more) in response to the A trim code enable signal TEN1. On the other hand, in order to obtain the target read pass voltage Vread from the voltage dividing circuit 111_b6 of FIG. 7, the second data latch 5_b outputs the latched data as the i-th trimming code TRMi_L in response to the second trimming code. Can signal TEN2.

圖9是修整碼產生器6的另一例的方塊圖。修整碼產生器6產生將施加至圖7之分壓電路111_b6之修整碼。參照圖9,此例之修整碼產生器6包括第一電熔絲(E-fuse)6_a、第二電熔絲6_b、及開關6_c。 FIG. 9 is a block diagram showing another example of the trimming code generator 6. The trimming code generator 6 generates a trimming code to be applied to the voltage dividing circuit 111_b6 of Fig. 7. Referring to Fig. 9, the trimming code generator 6 of this example includes a first electric fuse (E-fuse) 6_a, a second electric fuse 6_b, and a switch 6_c.

為了便於解釋,假設第一電熔絲6_a包括對應於通過電壓Vpass之電熔絲值且第二電熔絲6_b包括對應於讀取通過電壓Vread之電熔絲值。為了從圖7之分壓電路111_b6獲得目標通過電壓Vpass,開關6_c輸出對應於第一電熔絲6_a的電熔絲值之資料作為第i個修整碼TRMi_L(i是1或更大的整數)。另一方面,為了從圖7之分壓電路111_b6獲得目標讀取通過電壓Vread,開關6_c輸出對應於第二電熔絲6_b的電熔絲值之資料作為第i個修整碼TRMi_L。 For convenience of explanation, it is assumed that the first electric fuse 6_a includes an electric fuse value corresponding to the pass voltage Vpass and the second electric fuse 6_b includes an electric fuse value corresponding to the read pass voltage Vread. In order to obtain the target pass voltage Vpass from the voltage dividing circuit 111_b6 of FIG. 7, the switch 6_c outputs the data of the electric fuse value corresponding to the first electric fuse 6_a as the i-th trimming code TRMi_L (i is an integer of 1 or more ). On the other hand, in order to obtain the target read pass voltage Vread from the voltage dividing circuit 111_b6 of FIG. 7, the switch 6_c outputs the material of the electric fuse value corresponding to the second electric fuse 6_b as the i-th trimming code TRMi_L.

圖10是圖7所示之開關SW0_L之一的一例子的電路圖。參照圖10,此例之開關SW0_L包括第一P通道金屬氧化物半導體(PMOS)電晶體PM1、第二P通道金屬氧化物半導體(PMOS)電晶體PM2、第一N通道金屬氧化物半導體電晶體(NMOS transistor)NM1、第二N通道金屬氧化物半導體(NMOS)電晶體NM2、第一反相器(inverter)INV1、及第二反相器INV2。開關SW0_L是將修整碼TRM0_L的準位轉換成高電壓Vpp的準位之電位轉換器(level shifter)。在此,修整碼TRM0_L具有電源電壓Vdd的準位,其低於高電壓Vpp的準位。圖7所示之其餘的開關SW1_L及SW2_L可實質上等同圖10所示之開關。 Fig. 10 is a circuit diagram showing an example of one of the switches SW0_L shown in Fig. 7. Referring to FIG. 10, the switch SW0_L of this example includes a first P-channel metal oxide semiconductor (PMOS) transistor PM1, a second P-channel metal oxide semiconductor (PMOS) transistor PM2, and a first N-channel metal oxide semiconductor transistor. (NMOS transistor) NM1, a second N-channel metal oxide semiconductor (NMOS) transistor NM2, a first inverter INV1, and a second inverter INV2. The switch SW0_L is a level shifter that converts the level of the trimming code TRM0_L into a level of the high voltage Vpp. Here, the trimming code TRM0_L has a level of the power supply voltage Vdd which is lower than the level of the high voltage Vpp. The remaining switches SW1_L and SW2_L shown in FIG. 7 can be substantially identical to the switches shown in FIG.

以上參照圖5至圖10所述之選擇性高電壓產生器111_b(圖3)僅用以說明,並且在不脫離本發明的原理的情況下當可予以修改或重新設計。舉例來說,現在將參考圖11說明選擇性高電壓產生器111_b的另一個實施例。 The selective high voltage generator 111_b (Fig. 3) described above with reference to Figures 5 through 10 is for illustration only and may be modified or redesigned without departing from the principles of the invention. For example, another embodiment of the selective high voltage generator 111_b will now be described with reference to FIG.

圖11是選擇性高電壓產生器111_b’的另一例的電路圖。顯然圖11所示之選擇性高電壓產生器111_b’類似於圖5所示之選擇性高電壓產生器,除了第一路徑電壓是藉由分壓外部高電壓Ext_VPP所獲得的Ext_Vpass,以及切換電路111_b5在具有Ext_Vpass的第一路徑與具有Int_Vpass的第二路徑之間作選擇。在圖11的說明中,等同於圖5的構成元件將以相同的參考數字表示且其操作說明因此予以省略。 Fig. 11 is a circuit diagram showing another example of the selective high voltage generator 111_b'. It is apparent that the selective high voltage generator 111_b' shown in FIG. 11 is similar to the selective high voltage generator shown in FIG. 5 except that the first path voltage is Ext_Vpass obtained by dividing the external high voltage Ext_VPP, and the switching circuit. 111_b5 selects between a first path with Ext_Vpass and a second path with Int_Vpass. In the description of Fig. 11, constituent elements equivalent to those of Fig. 5 will be denoted by the same reference numerals and their operation will be omitted.

參照圖11,選擇性高電壓產生器111_b’包括振盪器 111_b1、穩壓器111_b2、電荷泵111_b3、切換電路111_b5、及分壓電路111_b6。振盪器111_b1、穩壓器111_b2、及電荷泵111_b3構成升壓電路111_b4。在此例中,升壓電路111_b4更可包括用以在電荷泵111_b3的輸出級產生內部通過電壓Int_Vpass之分壓電路(未繪示)。 Referring to FIG. 11, the selective high voltage generator 111_b' includes an oscillator. 111_b1, a voltage regulator 111_b2, a charge pump 111_b3, a switching circuit 111_b5, and a voltage dividing circuit 111_b6. The oscillator 111_b1, the regulator 111_b2, and the charge pump 111_b3 constitute a booster circuit 111_b4. In this example, the boosting circuit 111_b4 may further include a voltage dividing circuit (not shown) for generating an internal pass voltage Int_Vpass at the output stage of the charge pump 111_b3.

在外部電壓模式OVM中,外部電壓模式訊號OVMS處於作用狀態,因此切換電路111_b5將耦合輸出與第一路徑,藉以輸出Ext_Vpass作為通過電壓Vpass。在此期間,可關閉振盪器111_b1,藉以關閉電荷泵111_b3。在一般模式中,外部電壓模式訊號OVMS處於無作用狀態,因此切換電路111_b5將耦合輸出與第二路徑,藉以輸出Int_Vpass作為通過電壓Vpass。在此期間,將啟動振盪器111_b1,藉以啟動電荷泵111_b3。 In the external voltage mode OVM, the external voltage mode signal OVMS is in an active state, so the switching circuit 111_b5 will couple the output to the first path, thereby outputting Ext_Vpass as the pass voltage Vpass. During this time, the oscillator 111_b1 can be turned off to turn off the charge pump 111_b3. In the normal mode, the external voltage mode signal OVMS is in an inactive state, so the switching circuit 111_b5 will couple the output to the second path, thereby outputting Int_Vpass as the pass voltage Vpass. During this time, the oscillator 111_b1 will be activated to activate the charge pump 111_b3.

圖12是圖3所示之電壓選擇開關121的一例子的方塊圖。參照圖12,此例之電壓選擇開關121包括解碼單元(decoding unit)121_a及多個驅動單元(driving units)121_b1至121_bn。 FIG. 12 is a block diagram showing an example of the voltage selection switch 121 shown in FIG. Referring to Fig. 12, the voltage selection switch 121 of this example includes a decoding unit 121_a and a plurality of driving units 121_b1 to 121_bn.

解碼單元121_a解碼列位址RAi以產生已解碼的列位址DRA_1至DRA_n。解碼單元121_a分別轉移已解碼的列位址DRA_1至DRA_n至多個驅動單元121_b1至121_bn當中的相對應驅動單元。 The decoding unit 121_a decodes the column address RAi to generate decoded column addresses DRA_1 to DRA_n. The decoding unit 121_a transfers the decoded column address addresses DRA_1 to DRA_n to the corresponding ones of the plurality of driving units 121_b1 to 121_bn, respectively.

在程式操作的程式執行週期,多個驅動單元121_b1至121_bn從圖3的電壓產生電路110接收程式電壓Vpgm及通過電壓Vpass。多個驅動單元121_b1至121_bn啟動 選擇訊號S<1>至S<n>之一以響應於已解碼的列位址。多個驅動單元121_b1至121_bn當中一個對應於所啟動的選擇訊號之驅動單元以程式電壓Vpgm驅動所啟動的選擇訊號。其餘的驅動單元分別以通過電壓Vpass驅動未啟動的(或其餘的)選擇訊號。 During the program execution cycle of the program operation, the plurality of driving units 121_b1 to 121_bn receive the program voltage Vpgm and the pass voltage Vpass from the voltage generating circuit 110 of FIG. A plurality of driving units 121_b1 to 121_bn are activated One of the signals S<1> to S<n> is selected in response to the decoded column address. One of the plurality of driving units 121_b1 to 121_bn corresponding to the driving signal of the activated selection signal drives the selected selection signal with the program voltage Vpgm. The remaining drive units drive the unactivated (or remaining) selection signals with the pass voltage Vpass, respectively.

在程式操作的驗證讀取操作期間或在讀取操作期間,多個驅動單元121_b1至121_bn從電壓產生電路110接收驗證讀取電壓Vvfy、讀取通過電壓Vread、及讀取電壓Vrd。多個驅動單元121_b1至121_bn啟動選擇訊號S<1>至S<n>之一以響應於已解碼的列位址。多個驅動單元121_b1至121_bn當中一個對應於所啟動的選擇訊號之驅動單元以讀取電壓Vrd或驗證讀取電壓Vvfy驅動所啟動的選擇訊號。其餘的驅動單元分別以讀取通過電壓Vread驅動未啟動的(或其餘的)選擇訊號。 The plurality of driving units 121_b1 to 121_bn receive the verification read voltage Vvfy, the read pass voltage Vread, and the read voltage Vrd from the voltage generating circuit 110 during the verify read operation of the program operation or during the read operation. The plurality of driving units 121_b1 to 121_bn activate one of the selection signals S<1> to S<n> in response to the decoded column address. One of the plurality of driving units 121_b1 to 121_bn corresponds to the driving signal of the activated selection signal to drive the selected selection signal with the read voltage Vrd or the verify read voltage Vvfy. The remaining drive units drive the unactivated (or remaining) selection signals with the read pass voltage Vread, respectively.

同時,電壓選擇開關121所產生的選擇訊號S<1>至S<n>將提供給列解碼器122及123。這將參考圖13更完整地予以說明。 At the same time, the selection signals S<1> to S<n> generated by the voltage selection switch 121 are supplied to the column decoders 122 and 123. This will be explained more fully with reference to FIG.

圖13是圖3所示之列解碼器122及記憶胞陣列130的例子的方塊圖。記憶胞陣列130包括多個記憶體區塊。為了便於解釋,圖13繪示一個記憶體區塊及對應於此記憶體區塊之列解碼器122。 FIG. 13 is a block diagram showing an example of the column decoder 122 and the memory cell array 130 shown in FIG. The memory cell array 130 includes a plurality of memory blocks. For ease of explanation, FIG. 13 illustrates a memory block and a column decoder 122 corresponding to the memory block.

參照圖13,列解碼器122選擇記憶體區塊以響應於列位址RAj。,亦即,列解碼器122啟動對應於列位址RAj之區塊控制訊號(block control signal)BS,並且藉由區塊控制 訊號BS導通或斷開電壓轉移電晶體(voltage transfer transistors)BS0至BSn+1。當導通電壓轉移電晶體BS0至BSn+1時,選擇訊號線(selection signal lines)SL1至SLn將分別與字元線WL1至WLn電性連接。因此,選擇訊號S<1>至S<n>的電壓將分別提供給字元線WL1至WLn。 Referring to Figure 13, column decoder 122 selects a memory block in response to column address RAj. That is, the column decoder 122 activates a block control signal BS corresponding to the column address RAj and is controlled by the block. The signal BS turns on or off voltage transfer transistors BS0 to BSn+1. When the voltage transfer transistors BS0 to BSn+1 are turned on, the selection signal lines SL1 to SLn are electrically connected to the word lines WL1 to WLn, respectively. Therefore, the voltages of the selection signals S<1> to S<n> are supplied to the word lines WL1 to WLn, respectively.

例如,在程式操作的程式執行週期,啟動的選擇訊號的程式電壓Vpgm將提供給選取的字元線,並且關閉的選擇訊號的通過電壓Vpass將分別提供給未選取的字元線。在另一例中,在讀取操作期間或在程式操作的驗證讀取週期,啟動的選擇訊號的讀取電壓Vrd或驗證讀取電壓Vvfy將提供給選取的字元線,並且關閉的選擇訊號的讀取通過電壓Vread將分別提供給未選取的字元線。 For example, during the program execution cycle of the program operation, the program voltage Vpgm of the selected selection signal is supplied to the selected word line, and the pass voltage Vpass of the selected selection signal is respectively supplied to the unselected word line. In another example, during the read operation or during the verify read cycle of the program operation, the read voltage Vrd of the selected select signal or the verify read voltage Vvfy will be supplied to the selected word line, and the selected select signal is turned off. The read pass voltage Vread will be provided to the unselected word lines, respectively.

此例之記憶胞陣列130的記憶體區塊包括多個字串(strings),其中每一個對應於多條位元線BL1至BLm。每一個字串包括字串選擇電晶體(string selection transistor)SST、接地選擇電晶體(ground selection transistor)GST、及串列連接在選擇電晶體GST與SST之間的記憶胞M1至Mn。每一個字串的記憶胞M1至Mn分別連接相對應的字元線WL1至WLn。亦即,同一列的記憶胞(例如M1)共同連接相對應的字元線(例如WL1)。 The memory block of the memory cell array 130 of this example includes a plurality of strings, each of which corresponds to a plurality of bit lines BL1 to BLm. Each of the strings includes a string selection transistor SST, a ground selection transistor GST, and memory cells M1 to Mn connected in series between the selection transistors GST and SST. The memory cells M1 to Mn of each string are connected to the corresponding word lines WL1 to WLn, respectively. That is, the memory cells of the same column (eg, M1) are connected in common to the corresponding word line (eg, WL1).

在程式操作的程式執行週期,將經由選取的字元線供應程式電壓Vpgm給連接選取的字元線之記憶胞,並且將經由未選取的字元線供應通過電壓Vpass給連接未選取的字元線之記憶胞。在讀取操作期間或在程式操作的驗證 讀取週期,將經由選取的字元線供應讀取電壓Vrd或驗證讀取電壓Vvfy給連接選取的字元線之記憶胞,並且將經由未選取的字元線供應讀取通過電壓Vread給連接未選取的字元線之記憶胞。 During the program execution cycle of the program operation, the program voltage Vpgm is supplied to the memory cells of the selected word line via the selected word line, and the unselected character characters are supplied via the unselected word line through the voltage Vpass. The memory of the line. Verification during a read operation or during program operation The read cycle will supply the read voltage Vrd or the verify read voltage Vvfy to the memory cells of the selected word line via the selected word line, and will supply the read pass voltage Vread to the connection via the unselected word line supply. Memory cells of unselected word lines.

現在將參考圖14至圖17說明本發明的其他實施例。 Other embodiments of the present invention will now be described with reference to Figs.

圖14是依照本發明之另一實施例之非揮發性記憶體裝置的方塊圖。圖14所示之非揮發性記憶體裝置1221’支援外部電壓模式OVM,並且利用外部高電壓Ext_Vpp產生要供應給選取的字元線之低電壓(例如讀取電壓Vrd或驗證讀取電壓Vvfy)。 Figure 14 is a block diagram of a non-volatile memory device in accordance with another embodiment of the present invention. The non-volatile memory device 1221' shown in FIG. 14 supports the external voltage mode OVM, and generates a low voltage (for example, the read voltage Vrd or the verify read voltage Vvfy) to be supplied to the selected word line by using the external high voltage Ext_Vpp. .

除了電壓產生電路210之外,圖14所示之非揮發性記憶體裝置1221’包括上述圖3所示之同名元件,因此以下將省略那些元件的詳細說明以避免多餘的說明。 The non-volatile memory device 1221' shown in Fig. 14 includes the same-named elements as those shown in Fig. 3 except for the voltage generating circuit 210, and thus detailed description of those elements will be omitted below to avoid redundant description.

參照圖14,非揮發性記憶體裝置1221’包括電壓產生電路210、列選擇電路220、記憶胞陣列230、讀寫電路240、資料輸入/輸出電路250、及控制邏輯260。 Referring to Fig. 14, the non-volatile memory device 1221' includes a voltage generating circuit 210, a column selecting circuit 220, a memory cell array 230, a read/write circuit 240, a data input/output circuit 250, and control logic 260.

電壓產生電路210產生要提供給記憶胞陣列230的字元線WL之電壓(亦即字元線電壓)。圖14的實施例的至少一部分特性是電壓產生電路210利用外部高電壓Ext_Vpp產生要供應給選取的字元線之讀取電壓Vrd及/或驗證讀取電壓Vvfy以響應於外部電壓模式訊號OVMS。電壓產生電路210包括高電壓產生器211及低電壓產生器212。 The voltage generating circuit 210 generates a voltage (i.e., a word line voltage) to be supplied to the word line WL of the memory cell array 230. At least a portion of the characteristics of the embodiment of FIG. 14 is that the voltage generating circuit 210 generates the read voltage Vrd to be supplied to the selected word line and/or the verify read voltage Vvfy using the external high voltage Ext_Vpp in response to the external voltage mode signal OVMS. The voltage generating circuit 210 includes a high voltage generator 211 and a low voltage generator 212.

高電壓產生器211產生程式電壓Vpgm、通過電壓Vpass、及讀取通過電壓Vread以響應於控制邏輯260的控 制。在這實施例的此例中,不論是否供應外部高電壓Ext_Vpp,高電壓產生器211都將利用電源電壓Vdd產生程式電壓Vpgm、通過電壓Vpass、及讀取通過電壓Vread。這可藉由例如電源電壓Vdd的電荷泵予以達成。 The high voltage generator 211 generates the program voltage Vpgm, the pass voltage Vpass, and the read pass voltage Vread in response to the control logic 260. system. In this example of this embodiment, the high voltage generator 211 generates the program voltage Vpgm, the pass voltage Vpass, and the read pass voltage Vread using the power supply voltage Vdd regardless of whether or not the external high voltage Ext_Vpp is supplied. This can be achieved by a charge pump such as supply voltage Vdd.

低電壓產生器212包括第一低電壓產生器212_a及第二低電壓產生器212_b。第一低電壓產生器212_a及第二低電壓產生器212_b之每一個產生讀取電壓Vrd或驗證讀取電壓Vvfy以響應於控制邏輯260的控制。 The low voltage generator 212 includes a first low voltage generator 212_a and a second low voltage generator 212_b. Each of the first low voltage generator 212_a and the second low voltage generator 212_b generates a read voltage Vrd or a verify read voltage Vvfy in response to control of the control logic 260.

第一低電壓產生器212_a利用電源電壓Vdd產生讀取電壓Vrd或驗證讀取電壓Vvfy。為了便於解釋,假設第一低電壓產生器212_a產生第一讀取電壓Vrd1或第一驗證讀取電壓Vvfy1。第一讀取電壓Vrd1及第一驗證讀取電壓Vvfy1的準位等於或低於例如電源電壓Vdd的準位。 The first low voltage generator 212_a generates the read voltage Vrd or the verify read voltage Vvfy using the power supply voltage Vdd. For convenience of explanation, it is assumed that the first low voltage generator 212_a generates the first read voltage Vrd1 or the first verify read voltage Vvfy1. The level of the first read voltage Vrd1 and the first verify read voltage Vvfy1 is equal to or lower than the level of, for example, the power supply voltage Vdd.

第二低電壓產生器212_b產生其準位高於一預定電壓(例如電源電壓Vdd)之讀取電壓Vrd2至Vrdn或驗證讀取電壓Vvfy2至Vvfyn以響應於控制邏輯260的控制。第二低電壓產生器212_b藉由在外部電壓模式中降低外部高電壓Ext_Vpp或在一般模式中降低內部高電壓Int_Vpp來產生讀取電壓Vrd2至Vrdn或驗證讀取電壓Vvfy2至Vvfyn。 The second low voltage generator 212_b generates the read voltages Vrd2 to Vrdn whose levels are higher than a predetermined voltage (for example, the power supply voltage Vdd) or verifies the read voltages Vvfy2 to Vvfyn in response to the control of the control logic 260. The second low voltage generator 212_b generates the read voltages Vrd2 to Vrdn or verify the read voltages Vvfy2 to Vvfyn by lowering the external high voltage Ext_Vpp in the external voltage mode or lowering the internal high voltage Int_Vpp in the normal mode.

尤其,若供應外部高電壓Ext_Vpp,則第二低電壓產生器212_b將降低外部高電壓Ext_Vpp來產生要供應給選取的字元線之讀取電壓Vrd2至Vrdn或驗證讀取電壓Vvfy2至Vvfyn以響應於外部電壓模式訊號OVMS。在這種情況下,讀取電壓Vrd2至Vrdn及驗證讀取電壓Vvfy2 至Vvfyn的準位高於電源電壓Vdd的準位。 In particular, if the external high voltage Ext_Vpp is supplied, the second low voltage generator 212_b will lower the external high voltage Ext_Vpp to generate the read voltages Vrd2 to Vrdn to be supplied to the selected word line or verify the read voltages Vvfy2 to Vvfyn in response. For external voltage mode signal OVMS. In this case, the read voltages Vrd2 to Vrdn and the verify read voltage Vvfy2 The level to Vvfyn is higher than the level of the power supply voltage Vdd.

如果不供應外部高電壓Ext_Vpp,則第二低電壓產生器212_b將分壓內部高電壓Int_Vpp(參照圖5)以產生讀取電壓Vrd2至Vrdn或驗證讀取電壓Vvfy2至Vvfyn。在這種情況下,內部高電壓Int_Vpp將從高電壓產生器211予以轉移,並且具有與外部高電壓Ext_Vpp相同的Vpp電壓準位。用以產生內部高電壓Int_Vpp之高電壓產生器211可以與上述圖4所示之一般高電壓產生器111_a及上述圖5所示之升壓電路111_b4相同。 If the external high voltage Ext_Vpp is not supplied, the second low voltage generator 212_b will divide the internal high voltage Int_Vpp (refer to FIG. 5) to generate the read voltages Vrd2 to Vrdn or verify the read voltages Vvfy2 to Vvfyn. In this case, the internal high voltage Int_Vpp is transferred from the high voltage generator 211 and has the same Vpp voltage level as the external high voltage Ext_Vpp. The high voltage generator 211 for generating the internal high voltage Int_Vpp may be the same as the general high voltage generator 111_a shown in FIG. 4 described above and the booster circuit 111_b4 shown in FIG. 5 described above.

圖15及圖16是用以說明圖14所示之電壓產生電路的操作的示意圖。圖15繪示在程式操作期間執行的驗證讀取週期之驗證讀取電壓Vvfy1至Vvfy3的電壓準位,而圖16則繪示根據記憶胞的臨界電壓(threshold voltage)分佈之讀取電壓Vrd1至Vrd3的電壓準位。 15 and 16 are schematic views for explaining the operation of the voltage generating circuit shown in Fig. 14. 15 illustrates the voltage levels of the verify read voltages Vvfy1 to Vvfy3 of the verify read cycle performed during the program operation, and FIG. 16 shows the read voltages Vrd1 to the threshold voltage distribution according to the memory cells. The voltage level of Vrd3.

參照圖15,圖14所示之非揮發性記憶體裝置1221’根據遞增階躍脈衝程式化(incremental step pulse programming,ISPP)技術執行程式操作。在範例中,使用三個驗證讀取電壓Vvfy1至Vvfy3進行驗證讀取週期。然而,驗證讀取電壓的數目並未侷限於此,並且可多樣地設定,特別是根據每一個記憶胞所儲存的位元數目。 Referring to Figure 15, the non-volatile memory device 1221' shown in Figure 14 performs program operations in accordance with incremental step pulse programming (ISPP) techniques. In the example, the verify read cycle is performed using three verify read voltages Vvfy1 through Vvfy3. However, the number of verified read voltages is not limited thereto, and can be variously set, particularly according to the number of bits stored in each memory cell.

如果使用三個驗證讀取電壓Vvfy1至Vvfy3進行驗證讀取週期,如圖15的例子所繪示,則第一驗證讀取電壓Vvfy1的準位低於參考電壓Vref的準位,且第二驗證讀取電壓Vvfy2及第三驗證讀取電壓Vvfy3的準位高於參考電 壓Vref的準位。在此例中,參考電壓Vref等於或類似於電源電壓Vdd。 If the verify read cycle is performed using the three verify read voltages Vvfy1 to Vvfy3, as illustrated in the example of FIG. 15, the level of the first verify read voltage Vvfy1 is lower than the level of the reference voltage Vref, and the second verification The reading voltage Vvfy2 and the third verification reading voltage Vvfy3 are higher than the reference power Press the level of Vref. In this example, the reference voltage Vref is equal to or similar to the power supply voltage Vdd.

在這種情況下,圖14之低電壓產生器212利用電源電壓Vdd產生低於參考電壓Vref之驗證讀取電壓Vvfy1,並且利用外部高電壓Ext_Vpp產生高於參考電壓Vref之驗證讀取電壓Vvfy2及Vvfy3。 In this case, the low voltage generator 212 of FIG. 14 generates the verify read voltage Vvfy1 lower than the reference voltage Vref using the power supply voltage Vdd, and generates the verify read voltage Vvfy2 higher than the reference voltage Vref by using the external high voltage Ext_Vpp and Vvfy3.

例如,低電壓產生器212的第一低電壓產生器212_a藉由輸出電源電壓Vdd作為第一驗證讀取電壓Vvfy1來產生第一驗證讀取電壓Vvfy1。低電壓產生器212的第二低電壓產生器212_b藉由降低外部高電壓Ext_Vpp來產生第二驗證讀取電壓Vvfy2及第三驗證讀取電壓Vvfy3。若不供應外部高電壓Ext_Vpp,則低電壓產生器212的第二低電壓產生器212_b將藉由降低內部高電壓Int_Vpp來產生第二驗證讀取電壓Vvfy2及第三驗證讀取電壓Vvfy3。 For example, the first low voltage generator 212_a of the low voltage generator 212 generates the first verification read voltage Vvfy1 by the output power supply voltage Vdd as the first verification read voltage Vvfy1. The second low voltage generator 212_b of the low voltage generator 212 generates the second verification read voltage Vvfy2 and the third verification read voltage Vvfy3 by lowering the external high voltage Ext_Vpp. If the external high voltage Ext_Vpp is not supplied, the second low voltage generator 212_b of the low voltage generator 212 will generate the second verify read voltage Vvfy2 and the third verify read voltage Vvfy3 by lowering the internal high voltage Int_Vpp.

參照圖16,圖4之記憶胞陣列230的記憶胞具有四種臨界電壓分佈之一。亦即,記憶胞的臨界電壓分佈對應於抹除狀態(erase state)ST0、第一程式狀態(program state)ST1、第二程式狀態ST2、及第三程式狀態ST3之一。記憶胞的邏輯狀態ST0至ST3及邏輯狀態ST0至ST3的數目並未侷限於此例。 Referring to Figure 16, the memory cell of memory cell array 230 of Figure 4 has one of four threshold voltage distributions. That is, the threshold voltage distribution of the memory cell corresponds to one of an erase state ST0, a first program state ST1, a second program state ST2, and a third program state ST3. The number of logic states ST0 to ST3 and logic states ST0 to ST3 of the memory cell is not limited to this example.

如果每一個記憶胞有四種可能的臨界電壓分佈,則讀取操作需要三種讀取電壓Vrd1、Vrd2、及Vrd3。在這種情況下,如圖16的例子所繪示,第一讀取電壓Vrd1的準位低於參考電壓Vref的準位,且第二讀取電壓Vrd2及第 三讀取電壓Vrd3的準位高於參考電壓Vref的準位。在此例中,參考電壓Vref等於或類似於電源電壓Vdd。 If there are four possible threshold voltage distributions for each memory cell, the read operation requires three read voltages Vrd1, Vrd2, and Vrd3. In this case, as shown in the example of FIG. 16, the level of the first read voltage Vrd1 is lower than the level of the reference voltage Vref, and the second read voltage Vrd2 and the The level of the three read voltages Vrd3 is higher than the level of the reference voltage Vref. In this example, the reference voltage Vref is equal to or similar to the power supply voltage Vdd.

在這種情況下,低電壓產生器212產生讀取電壓的方式類似於上述之產生驗證讀取電壓的操作。亦即,低電壓產生器212的第一低電壓產生器212_a產生讀取電壓Vrd1,其準位低於使用電源電壓Vdd之參考電壓Vref的準位。低電壓產生器212的第二低電壓產生器212_b產生讀取電壓Vrd2及Vrd3,其準位高於使用外部高電壓Ext_Vpp之參考電壓Vref的準位。若不供應外部高電壓Ext_Vpp,則低電壓產生器212的第二低電壓產生器212_b將藉由降低內部高電壓Int_Vpp來產生第二讀取電壓Vrd2及第三讀取電壓Vrd3。 In this case, the manner in which the low voltage generator 212 generates the read voltage is similar to the operation described above for generating the verify read voltage. That is, the first low voltage generator 212_a of the low voltage generator 212 generates the read voltage Vrd1 whose level is lower than the level of the reference voltage Vref using the power supply voltage Vdd. The second low voltage generator 212_b of the low voltage generator 212 generates the read voltages Vrd2 and Vrd3 which are higher than the level of the reference voltage Vref using the external high voltage Ext_Vpp. If the external high voltage Ext_Vpp is not supplied, the second low voltage generator 212_b of the low voltage generator 212 will generate the second read voltage Vrd2 and the third read voltage Vrd3 by lowering the internal high voltage Int_Vpp.

圖17是圖14所示之第二低電壓產生器212_b的例子的方塊圖。如以上參考圖14至圖16所述,若供應外部高電壓Ext_Vpp,則第二低電壓產生器212_b將利用外部高電壓Ext_Vpp產生驗證讀取電壓或讀取電壓(其準位高於參考電壓Vref的準位)。否則,第二低電壓產生器212_b將利用內部高電壓Int_Vpp產生驗證讀取電壓或讀取電壓(其準位高於參考電壓Vref的準位)。 Figure 17 is a block diagram showing an example of the second low voltage generator 212_b shown in Figure 14. As described above with reference to FIGS. 14 to 16, if the external high voltage Ext_Vpp is supplied, the second low voltage generator 212_b will generate the verify read voltage or the read voltage using the external high voltage Ext_Vpp (the level thereof is higher than the reference voltage Vref). Level). Otherwise, the second low voltage generator 212_b will generate a verify read voltage or a read voltage (the level of which is higher than the reference voltage Vref) using the internal high voltage Int_Vpp.

如圖17所繪示,此例之第二低電壓產生器212_b包括切換電路212_b1及分壓電路212_b2。 As shown in FIG. 17, the second low voltage generator 212_b of this example includes a switching circuit 212_b1 and a voltage dividing circuit 212_b2.

切換電路212_b1經由第一路徑接收外部高電壓Ext_Vpp且經由第二路徑接收內部高電壓Int_Vpp。切換電路212_b1將外部高電壓Ext_Vpp與內部高電壓Int_Vpp 之一轉移至分壓電路212_b2以響應於外部電壓模式訊號OVMS。 The switching circuit 212_b1 receives the external high voltage Ext_Vpp via the first path and receives the internal high voltage Int_Vpp via the second path. The switching circuit 212_b1 sets the external high voltage Ext_Vpp and the internal high voltage Int_Vpp One of them is transferred to the voltage dividing circuit 212_b2 in response to the external voltage mode signal OVMS.

例如,當外部電壓模式訊號OVMS處於作用狀態時,切換電路212_b1將經由第一路徑接收外部高電壓Ext_Vpp且予以轉移至分壓電路212_b2。另一方面,當外部電壓模式訊號OVMS處於無作用狀態時,切換電路212_b1將經由第二路徑接收內部高電壓Int_Vpp且予以轉移至分壓電路212_b2。圖17所示之分壓電路212_b2可類似於先前參照圖7至圖10所說明之分壓電路,因此將省略其說明。 For example, when the external voltage mode signal OVMS is in the active state, the switching circuit 212_b1 will receive the external high voltage Ext_Vpp via the first path and transfer it to the voltage dividing circuit 212_b2. On the other hand, when the external voltage mode signal OVMS is in an inactive state, the switching circuit 212_b1 will receive the internal high voltage Int_Vpp via the second path and transfer it to the voltage dividing circuit 212_b2. The voltage dividing circuit 212_b2 shown in Fig. 17 can be similar to the voltage dividing circuit previously explained with reference to Figs. 7 to 10, and thus the description thereof will be omitted.

如上所述,可由圖14所示之高電壓產生器211提供內部高電壓Int_Vpp。高電壓產生器211可類似於圖4所示之一般高電壓產生器111_a及圖5所示之升壓電路111_b4,因此將省略其說明。 As described above, the internal high voltage Int_Vpp can be supplied from the high voltage generator 211 shown in FIG. The high voltage generator 211 can be similar to the general high voltage generator 111_a shown in FIG. 4 and the booster circuit 111_b4 shown in FIG. 5, and thus the description thereof will be omitted.

在以上參照圖14至圖17所說明之例子中,第一低電壓產生器212_a產生一驗證電壓Vvfy1及/或一讀取電壓Vrd1。須知這只是用以說明。例如,第一低電壓產生器212_a所產生的驗證讀取電壓或讀取電壓的數目可根據參考電壓Vref的準位予以修改。 In the example explained above with reference to FIGS. 14 to 17, the first low voltage generator 212_a generates a verification voltage Vvfy1 and/or a read voltage Vrd1. It should be noted that this is for illustrative purposes only. For example, the number of verify read voltages or read voltages generated by the first low voltage generator 212_a may be modified according to the level of the reference voltage Vref.

圖18是依照本發明之又另一實施例之非揮發性記憶體裝置的方塊圖。圖18所示之非揮發性記憶體裝置1221”支援外部電壓模式OVM。 Figure 18 is a block diagram of a non-volatile memory device in accordance with yet another embodiment of the present invention. The non-volatile memory device 1221" shown in Fig. 18 supports the external voltage mode OVM.

參照圖18,此例之非揮發性記憶體裝置1221”包括電壓產生電路310、列選擇電路320、記憶胞陣列330、讀寫電路340、資料輸入/輸出電路350、及控制邏輯360。 除了電壓產生電路310之外,圖18所示之非揮發性記憶體裝置1221”包括上述圖3所示之相同的同名元件,因此以下將省略這些元件的詳細說明以避免多餘的說明。 Referring to Fig. 18, the non-volatile memory device 1221" of this example includes a voltage generating circuit 310, a column selecting circuit 320, a memory cell array 330, a read/write circuit 340, a data input/output circuit 350, and control logic 360. The non-volatile memory device 1221" shown in FIG. 18 includes the same elements of the same name as those shown in FIG. 3 except for the voltage generating circuit 310, and thus detailed description of these elements will be omitted below to avoid redundant description.

此例之電壓產生電路310包括高電壓產生器311及低電壓產生器312。高電壓產生器311包括一般高電壓產生器311_a及選擇性高電壓產生器311_b,而低電壓產生器312則包括第一低電壓產生器312_a及第二低電壓產生器312_b。 The voltage generating circuit 310 of this example includes a high voltage generator 311 and a low voltage generator 312. The high voltage generator 311 includes a general high voltage generator 311_a and a selective high voltage generator 311_b, and the low voltage generator 312 includes a first low voltage generator 312_a and a second low voltage generator 312_b.

如果提供外部高電壓Ext_Vpp,則選擇性高電壓產生器311_b將利用外部高電壓Ext_Vpp產生通過電壓Vpass或讀取通過電壓Vread。選擇性高電壓產生器311_b類似於圖3所示之選擇性高電壓產生器,因此將省略其說明。在此同時,一般高電壓產生器311_a從電源電壓Vdd產生程式電壓Vpgm。並且,在提供外部高電壓Ext_Vpp的情況下,第二低電壓產生器312_b將利用外部高電壓Ext_Vpp來產生讀取電壓Vrd2至Vrdn或驗證讀取電壓Vvfy2至Vvfyn。第二低電壓產生器312_b類似於圖14所示之低電壓產生器,因此將省略其說明。在此同時,第一低電壓產生器312_a從電源電壓Vdd產生讀取電壓Vrd1或讀取驗證電壓Vvfy1。 If the external high voltage Ext_Vpp is supplied, the selective high voltage generator 311_b will generate the pass voltage Vpass or the read pass voltage Vread using the external high voltage Ext_Vpp. The selective high voltage generator 311_b is similar to the selective high voltage generator shown in FIG. 3, and thus the description thereof will be omitted. At the same time, the general high voltage generator 311_a generates the program voltage Vpgm from the power supply voltage Vdd. Also, in the case where the external high voltage Ext_Vpp is supplied, the second low voltage generator 312_b will use the external high voltage Ext_Vpp to generate the read voltages Vrd2 to Vrdn or verify the read voltages Vvfy2 to Vvfyn. The second low voltage generator 312_b is similar to the low voltage generator shown in FIG. 14, and thus the description thereof will be omitted. At the same time, the first low voltage generator 312_a generates the read voltage Vrd1 or the read verify voltage Vvfy1 from the power supply voltage Vdd.

在不供應外部高電壓Ext_Vpp的情況下,所有的產生器311_a、311_b、312_a、及312_b從電源電壓Vdd產生其各自的電壓。 In the case where the external high voltage Ext_Vpp is not supplied, all of the generators 311_a, 311_b, 312_a, and 312_b generate their respective voltages from the power supply voltage Vdd.

圖19是用以說明圖1所示之記憶體系統1200的操作 的流程圖。 Figure 19 is a diagram for explaining the operation of the memory system 1200 shown in Figure 1. Flow chart.

於步驟S110,記憶體系統1200從主機1100接收外部電源致能訊號EPM_en。 In step S110, the memory system 1200 receives the external power enable signal EPM_en from the host 1100.

於步驟S120,記憶體系統1200的記憶體控制器1210提供電源控制資訊給非揮發性記憶體(NVM)裝置,亦即設定外部電壓模式OVM之控制訊號及資料,以響應於外部電源致能訊號EPM_en。 In step S120, the memory controller 1210 of the memory system 1200 provides power control information to the non-volatile memory (NVM) device, that is, sets the control signal and data of the external voltage mode OVM in response to the external power enable signal. EPM_en.

於步驟S130,設定成外部電壓模式OVM之非揮發性記憶體裝置從外部高電壓Ext_Vpp產生電壓Vx。電壓Vx可以是:例如在程式操作中要供應給未選取的字元線之通過電壓;在讀取驗證操作中要供應給未選取的字元線之讀取驗證通過電壓;或在讀取操作中要供應給未選取的字元線之讀取通過電壓。並且,電壓Vx可以是高於電源電壓Vdd之讀取電壓或讀取驗證電壓。 In step S130, the non-volatile memory device set to the external voltage mode OVM generates a voltage Vx from the external high voltage Ext_Vpp. The voltage Vx may be, for example, a pass voltage to be supplied to an unselected word line in a program operation; a read verify pass voltage to be supplied to an unselected word line in a read verify operation; or a read operation The read pass voltage to be supplied to the unselected word line. Also, the voltage Vx may be a read voltage higher than the power supply voltage Vdd or a read verify voltage.

在上述例子中,記憶體系統1200從主機1100經由外部電源致能訊號EPM_en獲得有關外部高電壓Ext_Vpp的分壓之資訊。然而,本發明並未侷限於此。例如,主機可能不支援提供外部電源致能訊號EPM_en給記憶體系統之功能。即將說明的下一個實施例適合這種情況。 In the above example, the memory system 1200 obtains information on the voltage division of the external high voltage Ext_Vpp from the host 1100 via the external power enable signal EPM_en. However, the invention is not limited thereto. For example, the host may not support the function of providing an external power enable signal EPM_en to the memory system. The next embodiment to be described is suitable for this case.

圖20是依照本發明之另一實施例之電子裝置的方塊圖。參照圖20,電子裝置2000包括主機2100及記憶體系統2200。圖20所示之電子裝置2000類似於圖1之電子裝置,因此以下只討論兩者之間的差異。 Figure 20 is a block diagram of an electronic device in accordance with another embodiment of the present invention. Referring to FIG. 20, the electronic device 2000 includes a host 2100 and a memory system 2200. The electronic device 2000 shown in FIG. 20 is similar to the electronic device of FIG. 1, so only the difference between the two will be discussed below.

記憶體系統2200包括記憶體控制器2210及非揮發性 記憶體部件2220。不同於圖1所示之主機1100,圖20所示之主機2100不提供外部電源致能訊號EPM_en給記憶體系統2200。就此而言,記憶體系統2200配備用以偵測是否接收外部高電壓Ext_Vpp之外部電源偵測電路(external power detecting circuit)2211。 Memory system 2200 includes memory controller 2210 and non-volatile Memory component 2220. Unlike the host 1100 shown in FIG. 1, the host 2100 shown in FIG. 20 does not provide an external power enable signal EPM_en to the memory system 2200. In this regard, the memory system 2200 is equipped with an external power detecting circuit 2211 for detecting whether or not to receive the external high voltage Ext_Vpp.

記憶體系統2200的腳位(pad)2230從主機2100接收外部高電壓Ext_Vpp。經由腳位2230接收之外部高電壓Ext_Vpp將轉移至非揮發性記憶體裝置2221至2224。 A pad 2230 of the memory system 2200 receives an external high voltage Ext_Vpp from the host 2100. The external high voltage Ext_Vpp received via pin 2230 will be transferred to non-volatile memory devices 2221 through 2224.

外部電源偵測電路2211偵測是否經由腳位2230接收外部高電壓Ext_Vpp。例如,若經由腳位2230接收外部高電壓Ext_Vpp,則外部電源偵測電路2211將偵測外部高電壓Ext_Vpp的輸入以便傳送用以設定外部電壓模式OVM之控制訊號及資料給非揮發性記憶體裝置。這些非揮發性記憶體裝置類似於參照圖3至圖19所說明的非揮發性記憶體裝置,因此將省略其說明。 The external power detecting circuit 2211 detects whether or not the external high voltage Ext_Vpp is received via the pin 2230. For example, if the external high voltage Ext_Vpp is received via the pin 2230, the external power detecting circuit 2211 will detect the input of the external high voltage Ext_Vpp to transmit the control signal and data for setting the external voltage mode OVM to the non-volatile memory device. . These non-volatile memory devices are similar to the non-volatile memory devices explained with reference to FIGS. 3 to 19, and thus the description thereof will be omitted.

在圖20中,外部電源偵測電路2211繪示成包含於記憶體控制器2210。然而,本發明並未侷限於此。例如,外部電源偵測電路2211可配置於記憶體控制器2210的外部或配置於支援外部電壓模式OVM之非揮發性記憶體裝置(例如第一非揮發性記憶體裝置2221)的內部。這種替換將參考圖21及圖22更完整地予以說明。 In FIG. 20, the external power detection circuit 2211 is illustrated as being included in the memory controller 2210. However, the invention is not limited thereto. For example, the external power detecting circuit 2211 can be disposed outside the memory controller 2210 or in a non-volatile memory device (for example, the first non-volatile memory device 2221) that supports the external voltage mode OVM. This replacement will be more fully described with reference to Figures 21 and 22.

圖21是依照本發明之又另一實施例之電子裝置3000的方塊圖。圖22是依照本發明之一實施例之圖21所示之非揮發性記憶體裝置3221的方塊圖。在圖21及圖22中, 外部電源偵測電路3240包含於支援外部電壓模式OVM之第一非揮發性記憶體裝置3221。圖21所示之電子裝置3000類似於圖1及圖20之電子裝置,因此以下只討論兩者之間的差異。此外,除了外部電源偵測電路3240之外,圖22所示之非揮發性記憶體裝置3221包括上述圖3所示之相同的同名元件,因此以下將省略那些元件的詳細說明以避免多餘的說明。 21 is a block diagram of an electronic device 3000 in accordance with still another embodiment of the present invention. Figure 22 is a block diagram of the non-volatile memory device 3221 of Figure 21 in accordance with an embodiment of the present invention. In Figures 21 and 22, The external power detecting circuit 3240 is included in the first non-volatile memory device 3221 that supports the external voltage mode OVM. The electronic device 3000 shown in FIG. 21 is similar to the electronic device of FIGS. 1 and 20, so only the differences between the two will be discussed below. In addition, the non-volatile memory device 3221 shown in FIG. 22 includes the same elements of the same name as those shown in FIG. 3 except for the external power detecting circuit 3240, and thus detailed description of those elements will be omitted below to avoid redundant description. .

參照圖21,腳位3230從主機3100接收外部高電壓Ext_Vpp,並且提供外部高電壓Ext_Vpp給第一非揮發性記憶體裝置3221。在這種情況下,第一非揮發性記憶體裝置3221將支援外部電壓模式OVM,且包括用以偵測外部高電壓Ext_Vpp的輸入之外部電源偵測電路3240。 Referring to FIG. 21, the pin 3230 receives the external high voltage Ext_Vpp from the host 3100, and supplies an external high voltage Ext_Vpp to the first non-volatile memory device 3221. In this case, the first non-volatile memory device 3221 will support the external voltage mode OVM and include an external power detection circuit 3240 for detecting an input of the external high voltage Ext_Vpp.

參照圖22,第一非揮發性記憶體裝置3221的外部電源偵測電路3240偵測是否接收外部高電壓Ext_Vpp。若偵測到外部高電壓Ext_Vpp的輸入,則外部電源偵測電路3240將提供訊號給控制邏輯460以便啟動外部電壓模式OVM。控制邏輯460轉移外部電壓模式訊號OVMS給電壓產生電路410以響應於控制訊號,並且電壓產生電路410利用外部高電壓Ext_Vpp產生通過電壓Vpass或讀取通過電壓Vread。 Referring to FIG. 22, the external power detecting circuit 3240 of the first non-volatile memory device 3221 detects whether or not the external high voltage Ext_Vpp is received. If an input to the external high voltage Ext_Vpp is detected, the external power detection circuit 3240 will provide a signal to the control logic 460 to activate the external voltage mode OVM. The control logic 460 transfers the external voltage mode signal OVMS to the voltage generating circuit 410 in response to the control signal, and the voltage generating circuit 410 generates the pass voltage Vpass or the read pass voltage Vread using the external high voltage Ext_Vpp.

在圖22中,電壓產生電路410繪示成利用外部高電壓Ext_Vpp產生通過電壓Vpass或讀取通過電壓Vread。然而,本發明並未侷限於此。例如,如圖14所繪示,電壓產生電路410可利用外部高電壓Ext_Vpp來產生驗證讀取 電壓Vvfy或讀取電壓Vrd。在另一例中,如圖18所繪示,電壓產生電路410可利用外部高電壓Ext_Vpp來產生通過電壓Vpass、讀取通過電壓Vread、驗證讀取電壓Vvfy、或讀取電壓Vrd。 In FIG. 22, the voltage generating circuit 410 is illustrated to generate the pass voltage Vpass or the read pass voltage Vread using the external high voltage Ext_Vpp. However, the invention is not limited thereto. For example, as shown in FIG. 14, the voltage generating circuit 410 can utilize the external high voltage Ext_Vpp to generate a verification read. Voltage Vvfy or read voltage Vrd. In another example, as shown in FIG. 18, the voltage generating circuit 410 can generate the pass voltage Vpass, the read pass voltage Vread, the verify read voltage Vvfy, or the read voltage Vrd using the external high voltage Ext_Vpp.

圖23是依照本發明之一實施例之用以說明圖20所示之記憶體系統的操作的流程圖。 23 is a flow chart for explaining the operation of the memory system shown in FIG. 20 in accordance with an embodiment of the present invention.

於步驟S310,記憶體系統2200的外部電源偵測電路2211偵測是否經由腳位2230接收外部高電壓Ext_Vpp。 In step S310, the external power detecting circuit 2211 of the memory system 2200 detects whether the external high voltage Ext_Vpp is received via the pin 2230.

於步驟S320,若偵測到外部高電壓Ext_Vpp的輸入,則外部電源偵測電路2211將啟動非揮發性記憶體裝置的外部電壓模式OVM。同時,經由腳位2230接收的外部高電壓Ext_Vpp將提供給設定成外部電壓模式OVM之非揮發性記憶體裝置。 In step S320, if an input of the external high voltage Ext_Vpp is detected, the external power detecting circuit 2211 will activate the external voltage mode OVM of the non-volatile memory device. At the same time, the external high voltage Ext_Vpp received via pin 2230 will be provided to the non-volatile memory device set to the external voltage mode OVM.

於步驟S330,設定成外部電壓模式OVM之非揮發性記憶體裝置利用外部高電壓Ext_Vpp產生字元線電壓Vx。以上已經參照圖19的步驟S130討論過字元線電壓Vx。 In step S330, the non-volatile memory device set to the external voltage mode OVM generates the word line voltage Vx using the external high voltage Ext_Vpp. The word line voltage Vx has been discussed above with reference to step S130 of FIG.

圖24是用以說明圖21及圖22所示之可支援外部電壓模式OVM的非揮發性記憶體裝置的操作的流程圖。 FIG. 24 is a flow chart for explaining the operation of the non-volatile memory device capable of supporting the external voltage mode OVM shown in FIGS. 21 and 22.

於步驟S401,非揮發性記憶體裝置3221的控制邏輯460從記憶體控制器3210接收要產生字元線電壓Vx之要求。 In step S401, the control logic 460 of the non-volatile memory device 3221 receives a request from the memory controller 3210 to generate the word line voltage Vx.

於步驟S420,外部電源偵測電路3240偵測外部高電壓Ext_Vpp的輸入(S420)。 In step S420, the external power detecting circuit 3240 detects the input of the external high voltage Ext_Vpp (S420).

於步驟S430,若偵測到外部高電壓Ext_Vpp,則電壓產生電路410將根據需要產生字元線電壓Vx之要求利用外部高電壓Ext_Vpp產生字元線電壓Vx。在此,需要產生字元線電壓Vx之要求可包括程式命令或讀取命令。 In step S430, if the external high voltage Ext_Vpp is detected, the voltage generating circuit 410 generates the word line voltage Vx using the external high voltage Ext_Vpp as required to generate the word line voltage Vx. Here, the requirement to generate the word line voltage Vx may include a program command or a read command.

於步驟S440,若未偵測到外部高電壓Ext_Vpp,則電壓產生電路410將根據需要產生字元線電壓Vx之要求利用電源電壓Vdd產生字元線電壓Vx。 In step S440, if the external high voltage Ext_Vpp is not detected, the voltage generating circuit 410 generates the word line voltage Vx using the power supply voltage Vdd as required to generate the word line voltage Vx.

於步驟S450,提供字元線電壓給相對應的字元線。以上已經參照圖19的步驟S130討論過字元線電壓Vx。 In step S450, a word line voltage is supplied to the corresponding word line. The word line voltage Vx has been discussed above with reference to step S130 of FIG.

如上所述,本發明的實施例可應用於非揮發性記憶體裝置的程式化及讀取兩者。非揮發性記憶體裝置的程式化方法的一實例詳細揭露於美國專利編號第6,335,881號及第7,064,986號,該些專利之全部揭露內容以引用方式併入本案。非揮發性記憶體裝置的讀取方法的一實例詳細揭露於美國專利申請案公告編號第2010/0039861號,該專利申請案公告之全部揭露內容以引用方式併入本案。 As described above, embodiments of the present invention are applicable to both stylization and reading of non-volatile memory devices. An example of a stylized method of a non-volatile memory device is disclosed in detail in U.S. Patent Nos. 6,335,881 and 7,064,986, the entireties of each of each of An example of a method of reading a non-volatile memory device is disclosed in detail in U.S. Patent Application Serial No. 2010/003986, the entire disclosure of which is incorporated herein by reference.

在上述實施例中,從外部高電壓Ext_Vpp產生字元線電壓。然而,本發明也包含從外部高電壓Ext_Vpp產生其他電壓,例如提供給記憶胞陣列的字串選擇線(string selection line)及/或接地選擇線(ground selection line)之電壓。 In the above embodiment, the word line voltage is generated from the external high voltage Ext_Vpp. However, the present invention also encompasses generating other voltages from the external high voltage Ext_Vpp, such as the voltage supplied to the string selection line and/or the ground selection line of the memory cell array.

依照本發明之實施例之非揮發性記憶體裝置可利用例如具有2維(2D)反及閘快閃記憶體陣列及3維(3D)快閃記憶體陣列(也稱為垂直反及閘快閃記憶體VNAND裝置) 之裝置予以實施。垂直反及閘快閃記憶體裝置的範例揭露於美國專利申請案公告編號第2009/0306583號、第2010/0078701號、第2010/0117141號、第2010/0140685號、第2010/02135527號、第2010/0224929號、第2010/0315875號、第2010/0322000號、第2011/0013458號、及第2011/0018036號,該些專利申請案公告之全部揭露內容以引用方式併入本案。 The non-volatile memory device according to an embodiment of the present invention may utilize, for example, a 2-dimensional (2D) anti-gate flash memory array and a 3-dimensional (3D) flash memory array (also referred to as vertical anti-gate fast Flash memory VNAND device) The device is implemented. An example of a vertical anti-gate flash memory device is disclosed in U.S. Patent Application Publication No. 2009/0306583, No. 2010/0078701, No. 2010/0117141, No. 2010/0140685, No. 2010/02135527, The entire disclosures of these patent application publications are hereby incorporated by reference.

圖25是依照本發明之一實施例之一種包含記憶體系統之固態硬碟(SSD)的方塊圖。參照圖25,固態硬碟系統4000包括主機4100及固態硬碟4200。固態硬碟4200經由訊號連接器(signal connector)4211與主機4100交換訊號,並且經由電源連接器4221接收電力。固態硬碟4200包括多個非揮發性記憶體裝置4201至420n、固態硬碟控制器4210、及電源供應器4220。 25 is a block diagram of a solid state hard disk (SSD) including a memory system in accordance with an embodiment of the present invention. Referring to FIG. 25, the solid state hard disk system 4000 includes a host 4100 and a solid state hard disk 4200. The solid state drive 4200 exchanges signals with the host 4100 via a signal connector 4211 and receives power via the power connector 421. The solid state hard disk 4200 includes a plurality of non-volatile memory devices 4201 to 420n, a solid state hard disk controller 4210, and a power supply 4220.

多個非揮發性記憶體裝置4201至420n將作為儲存媒體。固態硬碟4200首先可利用快閃記憶體予以實施。另一方面,固態硬碟4200可利用其他的非揮發性記憶體予以實施,例如相位變化隨機存取記憶體(PRAM)、磁阻式隨機存取記憶體(MRAM)、鐵電隨機存取記憶體(FRAM)等等。此外,固態硬碟4200可利用不同類型的非揮發性記憶體予以實施。 A plurality of non-volatile memory devices 4201 to 420n will serve as storage media. The solid state hard disk 4200 can first be implemented using flash memory. On the other hand, the solid state hard disk 4200 can be implemented by other non-volatile memory, such as phase change random access memory (PRAM), magnetoresistive random access memory (MRAM), ferroelectric random access memory. Body (FRAM) and so on. In addition, the solid state drive 4200 can be implemented using different types of non-volatile memory.

電源供應器4220提供電力給多個非揮發性記憶體裝置4201至420n。並且,當從主機4100供應外部高電壓Ex_Vpp時,電源供應器4220將提供外部高電壓Ext_Vpp 給非揮發性記憶體裝置4201至420n之一個或多個。在這種情況下,如本發明之先前實施例所述,固態硬碟控制器4210可將一個或多個非揮發性記憶體裝置4201至420n設定成上述之外部電壓模式OVM。 The power supply 4220 provides power to the plurality of non-volatile memory devices 4201 to 420n. And, when the external high voltage Ex_Vpp is supplied from the host 4100, the power supply 4220 will supply an external high voltage Ext_Vpp One or more of the non-volatile memory devices 4201 to 420n are given. In this case, as described in the previous embodiment of the present invention, the solid state hard disk controller 4210 can set one or more non-volatile memory devices 4201 to 420n to the above-described external voltage mode OVM.

固態硬碟控制器4210經由訊號連接器4211傳送訊號SGL到主機4100及從主機4100接收訊號SGL。在此,訊號SGL可包括命令、位址、資料等等。固態硬碟控制器4210根據主機4100之命令寫入資料於相對應的記憶體裝置或從相對應的記憶體裝置讀取資料。固態硬碟控制器4210的結構可如同先前參照圖2所說明之記憶體控制器1210。 The solid state hard disk controller 4210 transmits the signal SGL to the host 4100 via the signal connector 4211 and receives the signal SGL from the host 4100. Here, the signal SGL may include commands, addresses, materials, and the like. The solid state hard disk controller 4210 writes data to or reads data from the corresponding memory device according to the command of the host 4100. The solid state hard disk controller 4210 can be constructed as the memory controller 1210 previously described with reference to FIG.

圖26是依照本發明之一實施例之一種記憶卡(memory card)的示意圖。尤其,圖26是一種安全數位卡的透視圖。參照圖26,安全數位卡包括九個腳位。例如,安全數位卡包括四個資料腳位(例如1、7、8、9)、一個命令腳位(例如2)、一個時脈腳位(例如5)、及三個電源腳位(例如3、4、6)。 Figure 26 is a schematic illustration of a memory card in accordance with an embodiment of the present invention. In particular, Figure 26 is a perspective view of a secure digital card. Referring to Figure 26, the secure digital card includes nine feet. For example, a secure digital card includes four data pins (eg 1, 7, 8, 9), one command pin (eg 2), one clock pin (eg 5), and three power pins (eg 3 , 4, 6).

在此,命令及響應訊號將經由命令腳位2予以轉移。通常,命令將從主機轉移到記憶卡,而響應訊號則從記憶卡轉移到主機。依照本發明之實施例,三個電源腳位當中至少一個用以接收上述之外部高電壓Ext_Vpp,並且命令腳位2用以接收上述之外部電源致能訊號EPM_en。 Here, the command and response signals will be transferred via command pin 2. Usually, the command is transferred from the host to the memory card, and the response signal is transferred from the memory card to the host. According to an embodiment of the invention, at least one of the three power pins is for receiving the external high voltage Ext_Vpp, and the command pin 2 is for receiving the external power enable signal EPM_en.

圖27是圖26所示之記憶卡的方塊圖。記憶卡系統4000包括主機4100及記憶卡4200。主機4100包括主機控 制器(host controller)4110及主機連接單元4120。記憶卡4200包括記憶卡連接單元4210、記憶卡控制器4220、及記憶體4230。 Figure 27 is a block diagram of the memory card shown in Figure 26. The memory card system 4000 includes a host 4100 and a memory card 4200. Host 4100 includes host control A host controller 4110 and a host connection unit 4120. The memory card 4200 includes a memory card connection unit 4210, a memory card controller 4220, and a memory 4230.

主機連接單元4120及記憶卡連接單元4210形成多個腳位,其中可包括命令腳位、資料腳位、時脈腳位、電源腳位等等。腳位的數目可因記憶卡4200的類型而改變。 The host connection unit 4120 and the memory card connection unit 4210 form a plurality of pins, which may include a command pin, a data pin, a clock pin, a power pin, and the like. The number of pins can vary depending on the type of memory card 4200.

主機4100寫入資料於記憶卡4200或從記憶卡4200讀取資料。主機控制器4110經由主機連接單元4120提供命令(例如寫入命令)、主機4100內的時脈產生器(未繪示)所產生的時脈CLK、及資料給記憶卡4200。 The host 4100 writes data to or reads data from the memory card 4200. The host controller 4110 provides commands (such as a write command), a clock CLK generated by a clock generator (not shown) in the host 4100, and data to the memory card 4200 via the host connection unit 4120.

記憶卡控制器4220響應經由記憶卡連接單元4210接收的寫入命令而與記憶卡控制器4220內的時脈產生器(未繪示)所產生的時脈同步地儲存資料於記憶體4230。記憶體4230儲存從主機4100轉移之資料。例如,若主機4100是數位相機,則記憶體4230將儲存影像資料。 The memory card controller 4220 stores data in the memory 4230 in synchronization with a clock generated by a clock generator (not shown) in the memory card controller 4220 in response to a write command received via the memory card connection unit 4210. The memory 4230 stores the material transferred from the host 4100. For example, if the host 4100 is a digital camera, the memory 4230 will store the image data.

在此記憶體4230包括至少一個支援外部電壓模式OVM之非揮發性記憶體裝置(例如圖3的非揮發性記憶體裝置1221)。記憶體4230接收外部高電壓Ext_Vpp以便利用外部高電壓Ext_Vpp產生字元線電壓,如同參照本發明之先前實施例所述。 The memory 4230 includes at least one non-volatile memory device (e.g., the non-volatile memory device 1221 of FIG. 3) that supports the external voltage mode OVM. The memory 4230 receives the external high voltage Ext_Vpp to generate a word line voltage using the external high voltage Ext_Vpp as described with reference to the previous embodiment of the present invention.

圖28是依照本發明之一實施例之包含快閃記憶體裝置之電子裝置5000的方塊圖。電子裝置5000的實施方式可以是例如個人電腦或手持式電子裝置,像是筆記型電腦、行動電話、個人數位助理(PDA)、照相機等等。 28 is a block diagram of an electronic device 5000 including a flash memory device in accordance with an embodiment of the present invention. Embodiments of the electronic device 5000 may be, for example, a personal computer or a handheld electronic device such as a notebook computer, a mobile phone, a personal digital assistant (PDA), a camera, and the like.

參照圖28,電子裝置5000包括半導體記憶體裝置5100、電源供應器5200、輔助電源供應器5250、至少一個中央處理器5300、隨機存取記憶體(RAM)5400、及使用者介面(user interface)5500。半導體記憶體裝置5100包括至少一個非揮發性記憶體5110及記憶體控制器5120。 Referring to FIG. 28, the electronic device 5000 includes a semiconductor memory device 5100, a power supply 5200, an auxiliary power supply 5250, at least one central processing unit 5300, a random access memory (RAM) 5400, and a user interface. 5500. The semiconductor memory device 5100 includes at least one non-volatile memory 5110 and a memory controller 5120.

在圖28中,輔助電源供應器5250或電源供應器5200提供高電壓(亦即外部高電壓Ext_Vpp)給非揮發性記憶體裝置5110。非揮發性記憶體裝置5110利用外部高電壓Ext_Vpp產生字元線電壓,如同參照本發明之先前實施例所述。 In FIG. 28, the auxiliary power supply 5250 or the power supply 5200 supplies a high voltage (ie, an external high voltage Ext_Vpp) to the non-volatile memory device 5110. The non-volatile memory device 5110 generates a word line voltage using the external high voltage Ext_Vpp as described with reference to the previous embodiment of the present invention.

上述揭露內容是用以說明本發明,而非用以限定本發明,所以後附之申請專利範圍應涵蓋在本發明之精神和範圍內的所有此類修改、強化以及其他實施例。因此,考量法律所允許的最大範圍,本發明之保護範圍應取決於下列申請專利範圍及其等效之最廣泛的可允許解釋,而不應侷限於上述詳細說明。 The above disclosure is intended to be illustrative of the invention, and is not intended to limit the scope of the invention. Therefore, the scope of the invention should be construed as being limited by the scope of the invention,

1‧‧‧電源供應單元 1‧‧‧Power supply unit

2‧‧‧分壓單元 2‧‧‧Voltage unit

3‧‧‧偏壓電流單元 3‧‧‧Bias current unit

4‧‧‧比較單元 4‧‧‧Comparative unit

5、6‧‧‧修整碼產生器 5, 6‧‧‧ trimming code generator

5_a、5_b、DL_VF、DL_VR‧‧‧資料閂鎖器 5_a, 5_b, DL_VF, DL_VR‧‧‧ data latch

6_a、6_b、E_FUSE_VF、E_FUSE_VR‧‧‧電熔絲 6_a, 6_b, E_FUSE_VF, E_FUSE_VR‧‧‧ electric fuse

6_c、SW0_L、SW1_L、SW2_L、S/W‧‧‧開關 6_c, SW0_L, SW1_L, SW2_L, S/W‧‧‧ switch

110、210、310、410‧‧‧電壓產生電路 110, 210, 310, 410‧‧‧ voltage generation circuit

111、211、311、411‧‧‧高電壓產生器 111, 211, 311, 411‧‧‧ high voltage generator

111_a、311_a、411_a‧‧‧一般高電壓產生器 111_a, 311_a, 411_a‧‧‧General high voltage generator

111_a1、111_b1‧‧‧振盪器 111_a1, 111_b1‧‧‧ oscillator

111_a2、111_b2‧‧‧穩壓器 111_a2, 111_b2‧‧‧ voltage regulator

111_a3、111_b3‧‧‧電荷泵 111_a3, 111_b3‧‧‧ charge pump

111_b、111_b'、311_b、411_b‧‧‧選擇性高電壓產生器 111_b, 111_b', 311_b, 411_b‧‧‧ selective high voltage generator

111_b4‧‧‧升壓電路 111_b4‧‧‧Boost circuit

111_b5、212_b1‧‧‧切換電路 111_b5, 212_b1‧‧‧ switching circuit

111_b6、212_b2‧‧‧分壓電路 111_b6, 212_b2‧‧‧ voltage divider circuit

112、212、212_a、212_b、312、312_a、312_b、412‧‧‧低電壓產生器 112, 212, 212_a, 212_b, 312, 312_a, 312_b, 412‧‧‧ low voltage generator

120、220、320、420‧‧‧列選擇電路 120, 220, 320, 420‧‧‧ column selection circuit

121、221、321、421‧‧‧電壓選擇開關 121, 221, 321, 421‧‧‧ voltage selection switch

121_a‧‧‧解碼單元 121_a‧‧‧Decoding unit

121_b1、121_bn-1、121_bn‧‧‧驅動單元 121_b1, 121_bn-1, 121_bn‧‧‧ drive unit

122、123、222、223、322、323、422、423‧‧‧列解碼 器 122, 123, 222, 223, 322, 323, 422, 423 ‧ ‧ column decoding Device

130、230、330、430‧‧‧記憶胞陣列 130, 230, 330, 430‧‧‧ memory cell array

131、132、231、232、331、332、431、432‧‧‧記憶體區塊 131, 132, 231, 232, 331, 332, 431, 432‧‧‧ memory blocks

140、240、340、440‧‧‧讀寫電路 140, 240, 340, 440‧‧‧ read and write circuits

150、250、350、450‧‧‧資料輸入/輸出電路 150, 250, 350, 450‧‧‧ data input/output circuits

160、260、360、460‧‧‧控制邏輯 160, 260, 360, 460‧‧‧ control logic

1000、2000、3000、5000‧‧‧電子裝置 1000, 2000, 3000, 5000‧‧‧ electronic devices

1100、2100、3100、4100‧‧‧主機 1100, 2100, 3100, 4100‧‧‧ host

1110‧‧‧外部電源管理單元 1110‧‧‧External Power Management Unit

1200、2200、3200‧‧‧記憶體系統 1200, 2200, 3200‧‧‧ memory system

1210、2210、3210、5120‧‧‧記憶體控制器 1210, 2210, 3210, 5120‧‧‧ memory controller

1211、5300‧‧‧中央處理器 1211, 5300‧‧‧ central processor

1212‧‧‧主機介面 1212‧‧‧Host interface

1213‧‧‧揮發性記憶體裝置 1213‧‧‧Volatile memory device

1214‧‧‧非揮發性記憶體介面 1214‧‧‧ Non-volatile memory interface

1220、2220、3220、5110‧‧‧非揮發性記憶體 1220, 2220, 3220, 5110‧‧‧ non-volatile memory

1221、1221'、1221"、1222、1223、1224、2221、2222、2223、2224、3221、3222、3223、3224、4201、4202、420n‧‧‧非揮發性記憶體裝置 1221, 1221', 1221", 1222, 1223, 1224, 2221, 2222, 2223, 2224, 3221, 3222, 3223, 3224, 4201, 4202, 420n‧‧‧ non-volatile memory devices

1225‧‧‧設定暫存器 1225‧‧‧Setting the register

1230‧‧‧外部電源切換單元 1230‧‧‧External power switching unit

2211、3240‧‧‧外部電源偵測電路 2211, 3240‧‧‧ External power detection circuit

2230、3230‧‧‧腳位 2230, 3230‧‧‧ feet

4000‧‧‧固態硬碟系統/記憶卡系統 4000‧‧‧Solid State Drive System / Memory Card System

4110‧‧‧主機控制器 4110‧‧‧Host Controller

4120‧‧‧主機連接單元 4120‧‧‧Host connection unit

4200‧‧‧固態硬碟/記憶卡 4200‧‧‧ Solid State Drive/Memory Card

4210‧‧‧固態硬碟控制器/記憶卡連接單元 4210‧‧‧Solid State Drive Controller/Memory Card Connection Unit

4211‧‧‧訊號連接器 4211‧‧‧Signal Connector

4220‧‧‧電源供應器/記憶卡控制器 4220‧‧‧Power supply/memory card controller

4221‧‧‧電源連接器 4221‧‧‧Power connector

4230‧‧‧記憶體 4230‧‧‧ memory

5100‧‧‧半導體記憶體裝置 5100‧‧‧Semiconductor memory device

5200‧‧‧電源供應器 5200‧‧‧Power supply

5250‧‧‧輔助電源供應器 5250‧‧‧Auxiliary power supply

5400‧‧‧隨機存取記憶體 5400‧‧‧ Random access memory

5500‧‧‧使用者介面 5500‧‧‧User interface

BL、BL1、BL2、BLm‧‧‧位元線 BL, BL1, BL2, BLm‧‧‧ bit line

BS‧‧‧區塊控制訊號 BS‧‧‧ block control signal

BS0、BS1、BSn-1、BSn、BSn+1‧‧‧電壓轉移電晶體 BS0, BS1, BSn-1, BSn, BSn+1‧‧‧ voltage transfer transistor

CH1、CH2、CHn‧‧‧通道 CH1, CH2, CHn‧‧‧ channels

CLK‧‧‧時脈 CLK‧‧‧ clock

CMD‧‧‧命令 CMD‧‧‧ Order

CTRL‧‧‧控制訊號 CTRL‧‧‧ control signal

DAT‧‧‧資料 DAT‧‧‧Information

DL‧‧‧資料線 DL‧‧‧ data line

DRA_1、DRA_n-1、DRA_n‧‧‧已解碼的列位址 DRA_1, DRA_n-1, DRA_n‧‧‧ Decoded column address

EPM_en‧‧‧外部電源致能訊號 EPM_en‧‧‧External power enable signal

Ext_Vpass‧‧‧外部通過電壓 Ext_Vpass‧‧‧ external pass voltage

Ext_Vpp‧‧‧外部高電壓 Ext_Vpp‧‧‧External high voltage

GS‧‧‧接地選擇訊號 GS‧‧‧Ground selection signal

GSL‧‧‧接地選擇線 GSL‧‧‧ Grounding selection line

GST‧‧‧接地選擇電晶體 GST‧‧‧Ground selection transistor

Int_Vpass‧‧‧內部通過電壓 Int_Vpass‧‧‧ internal pass voltage

Int_Vpp‧‧‧內部高電壓 Int_Vpp‧‧‧Internal high voltage

INV1、INV2‧‧‧反相器 INV1, INV2‧‧‧ inverter

I/O‧‧‧輸入/輸出 I/O‧‧‧ Input/Output

M0_L、M1_L、M2_L‧‧‧電晶體 M0_L, M1_L, M2_L‧‧‧ transistor

M1、Mn-1、Mn‧‧‧記憶胞 M1, Mn-1, Mn‧‧‧ memory cells

NC_L‧‧‧比較節點 NC_L‧‧‧ comparison node

NM1、NM2‧‧‧N通道金屬氧化物半導體電晶體 NM1, NM2‧‧‧N-channel metal oxide semiconductor transistor

NO_L‧‧‧輸出節點 NO_L‧‧‧Output node

OSC‧‧‧振盪訊號 OSC‧‧‧ oscillation signal

OUT‧‧‧輸出 OUT‧‧‧ output

OVMS‧‧‧外部電壓模式訊號 OVMS‧‧‧ external voltage mode signal

PM1、PM2、PM_L‧‧‧P通道金屬氧化物半導體電晶體 PM1, PM2, PM_L‧‧‧P channel metal oxide semiconductor transistor

PWR‧‧‧電源 PWR‧‧‧ power supply

R1_L、R2_L、R3_L、R4_L‧‧‧電阻器 R1_L, R2_L, R3_L, R4_L‧‧‧ resistors

RA、RAi、RAj‧‧‧列位址 RA, RAi, RAj‧‧‧ address

S110、S120、S130、S310、S320、S330、S420、S430、S440、S450‧‧‧步驟 S110, S120, S130, S310, S320, S330, S420, S430, S440, S450‧‧ steps

SGL‧‧‧訊號 SGL‧‧‧ signal

SL1、SLn-1、SLn‧‧‧選擇訊號線 SL1, SLn-1, SLn‧‧‧Select signal line

SS‧‧‧字串選擇訊號 SS‧‧‧ string selection signal

SSD‧‧‧固態硬碟 SSD‧‧‧ Solid State Drive

SSL‧‧‧字串選擇線 SSL‧‧‧ string selection line

SST‧‧‧字串選擇電晶體 SST‧‧‧ string selection transistor

ST0‧‧‧抹除狀態 ST0‧‧‧Erasing status

ST1‧‧‧第一程式狀態 ST1‧‧‧ first program status

ST2‧‧‧第二程式狀態 ST2‧‧‧Second program status

ST3‧‧‧第三程式狀態 ST3‧‧‧ third program status

S<1>、S<n-1>、S<n>、S<n:1>‧‧‧選擇訊號 S<1>, S<n-1>, S<n>, S<n:1>‧‧‧Selection signal

T1、T2‧‧‧時間週期 T1, T2‧‧ ‧ time period

t1、t2、t3‧‧‧時間 T1, t2, t3‧‧‧ time

TEN1、TEN2‧‧‧修整碼致能訊號 TEN1, TEN2‧‧‧ trimming code enable signal

TRM0_L、TRM1_L、TRM2_L、TRMi_L‧‧‧修整碼 TRM0_L, TRM1_L, TRM2_L, TRMi_L‧‧‧ trimming code

TV‧‧‧目標電壓 TV‧‧‧target voltage

Vdd‧‧‧電源電壓 Vdd‧‧‧Power supply voltage

Vpass‧‧‧通過電壓 Vpass‧‧‧ pass voltage

Vpgm、Vpgm1、Vpgm2、VpgmN‧‧‧程式電壓 Vpgm, Vpgm1, Vpgm2, VpgmN‧‧‧ program voltage

Vpp‧‧‧高電壓 Vpp‧‧‧High voltage

Vread‧‧‧讀取通過電壓 Vread‧‧‧ read through voltage

Vrd、Vrd1、Vrd2、Vrd3、Vrdn‧‧‧讀取電壓 Vrd, Vrd1, Vrd2, Vrd3, Vrdn‧‧‧ read voltage

Vref、Vref_LV‧‧‧參考電壓 Vref, Vref_LV‧‧‧ reference voltage

Vvfy、Vvfy1、Vvfy2、Vvfy3、Vvfyn‧‧‧驗證讀取電壓 Vvfy, Vvfy1, Vvfy2, Vvfy3, Vvfyn‧‧‧ verify the read voltage

WL、WL1、WLn-1、WLn‧‧‧字元線 WL, WL1, WLn-1, WLn‧‧‧ character lines

圖1是依照本發明之一個或多個實施例之一種電子裝置的方塊圖。 1 is a block diagram of an electronic device in accordance with one or more embodiments of the present invention.

圖2是依照本發明之一個或多個實施例之圖1所示之記憶體控制器的方塊圖。 2 is a block diagram of the memory controller of FIG. 1 in accordance with one or more embodiments of the present invention.

圖3是依照本發明之一個或多個實施例之圖2所示之非揮發性記憶體裝置的方塊圖。 3 is a block diagram of the non-volatile memory device of FIG. 2 in accordance with one or more embodiments of the present invention.

圖4是圖3所示之高電壓產生器的一例子的方塊圖。 4 is a block diagram showing an example of the high voltage generator shown in FIG.

圖5是依照本發明之一個或多個實施例之圖3所示之選擇性高電壓產生器的方塊圖。 5 is a block diagram of the selective high voltage generator of FIG. 3 in accordance with one or more embodiments of the present invention.

圖6是用以說明提供給圖5所示之選擇性高電壓產生器的分壓電路之電壓的轉移路徑的一例子的時序圖。 Fig. 6 is a timing chart for explaining an example of a transfer path of voltages supplied to a voltage dividing circuit of the selective high voltage generator shown in Fig. 5.

圖7是依照本發明之一個或多個實施例之圖5所示之分壓電路的電路圖。 7 is a circuit diagram of the voltage divider circuit of FIG. 5 in accordance with one or more embodiments of the present invention.

圖8是依照本發明之一個或多個實施例之一種修整碼產生器的方塊圖。 8 is a block diagram of a trim code generator in accordance with one or more embodiments of the present invention.

圖9是依照本發明之一個或多個實施例之另一種修整碼產生器的方塊圖。 9 is a block diagram of another trimming code generator in accordance with one or more embodiments of the present invention.

圖10是依照本發明之一個或多個實施例之圖7所示之開關之一的電路圖。 Figure 10 is a circuit diagram of one of the switches of Figure 7 in accordance with one or more embodiments of the present invention.

圖11是依照本發明之一個或多個實施例之圖3所示之選擇性高電壓產生器的電路圖。 11 is a circuit diagram of the selective high voltage generator of FIG. 3 in accordance with one or more embodiments of the present invention.

圖12是依照本發明之一個或多個實施例之圖3所示之電壓選擇開關的方塊圖。 Figure 12 is a block diagram of the voltage selection switch of Figure 3 in accordance with one or more embodiments of the present invention.

圖13是依照本發明之一個或多個實施例之圖3所示之列解碼器及記憶胞陣列的方塊圖。 13 is a block diagram of the column decoder and memory cell array of FIG. 3 in accordance with one or more embodiments of the present invention.

圖14是依照本發明之一個或多個實施例之一種非揮發性記憶體裝置的方塊圖。 14 is a block diagram of a non-volatile memory device in accordance with one or more embodiments of the present invention.

圖15及圖16是用以說明圖14所示之電壓產生電路的一操作實例的示意圖。 15 and 16 are schematic views for explaining an operation example of the voltage generating circuit shown in Fig. 14.

圖17是依照本發明之一個或多個實施例之圖14所示之第二低電壓產生器的方塊圖。 17 is a block diagram of the second low voltage generator of FIG. 14 in accordance with one or more embodiments of the present invention.

圖18是依照本發明之一個或多個實施例之一種非揮發性記憶體裝置的方塊圖。 18 is a block diagram of a non-volatile memory device in accordance with one or more embodiments of the present invention.

圖19是用以說明圖1所示之記憶體系統的一操作實例的流程圖。 Figure 19 is a flow chart for explaining an operation example of the memory system shown in Figure 1.

圖20是依照本發明之一個或多個實施例之一種電子裝置的方塊圖。 20 is a block diagram of an electronic device in accordance with one or more embodiments of the present invention.

圖21是依照本發明之一個或多個實施例之一種電子裝置的方塊圖。 21 is a block diagram of an electronic device in accordance with one or more embodiments of the present invention.

圖22是依照本發明之一個或多個實施例之圖21所示之非揮發性記憶體裝置的方塊圖。 22 is a block diagram of the non-volatile memory device of FIG. 21 in accordance with one or more embodiments of the present invention.

圖23是依照本發明之一個或多個實施例之用以說明圖20所示之記憶體系統的一操作實例的流程圖。 23 is a flow chart for explaining an example of the operation of the memory system shown in FIG. 20 in accordance with one or more embodiments of the present invention.

圖24是用以說明可支援圖21及圖22所示之外部電壓模式OVM之非揮發性記憶體裝置的一操作實例的流程圖。 FIG. 24 is a flow chart for explaining an operation example of a non-volatile memory device capable of supporting the external voltage mode OVM shown in FIGS. 21 and 22.

圖25是依照本發明之一個或多個實施例之一種包含記憶體系統之固態硬碟的方塊圖。 25 is a block diagram of a solid state hard disk including a memory system in accordance with one or more embodiments of the present invention.

圖26是依照本發明之一個或多個實施例之一種包含記憶體系統之記憶卡的示意圖。 26 is a schematic diagram of a memory card including a memory system in accordance with one or more embodiments of the present invention.

圖27是圖26所示之記憶卡的一例子的方塊圖。 Figure 27 is a block diagram showing an example of the memory card shown in Figure 26.

圖28是依照本發明之一個或多個實施例之一種包含快閃記憶體裝置之電子裝置的方塊圖。 28 is a block diagram of an electronic device including a flash memory device in accordance with one or more embodiments of the present invention.

110‧‧‧電壓產生電路 110‧‧‧Voltage generation circuit

111‧‧‧高電壓產生器 111‧‧‧High voltage generator

111_a‧‧‧一般高電壓產生器 111_a‧‧‧General high voltage generator

111_b‧‧‧選擇性高電壓產生器 111_b‧‧‧Selective high voltage generator

112‧‧‧低電壓產生器 112‧‧‧Low voltage generator

120‧‧‧列選擇電路 120‧‧‧ column selection circuit

121‧‧‧電壓選擇開關 121‧‧‧Voltage selection switch

122、123‧‧‧列解碼器 122, 123‧‧‧ column decoder

130‧‧‧記憶胞陣列 130‧‧‧ memory cell array

131、132‧‧‧記憶體區塊 131, 132‧‧‧ memory blocks

140‧‧‧讀寫電路 140‧‧‧Reading and writing circuit

150‧‧‧資料輸入/輸出電路 150‧‧‧Data input/output circuit

160‧‧‧控制邏輯 160‧‧‧Control logic

1221‧‧‧非揮發性記憶體裝置 1221‧‧‧ Non-volatile memory device

BL‧‧‧位元線 BL‧‧‧ bit line

CTRL‧‧‧控制訊號 CTRL‧‧‧ control signal

DL‧‧‧資料線 DL‧‧‧ data line

Ext_Vpp‧‧‧外部高電壓 Ext_Vpp‧‧‧External high voltage

I/O‧‧‧輸入/輸出 I/O‧‧‧ Input/Output

OVMS‧‧‧外部電壓模式訊號 OVMS‧‧‧ external voltage mode signal

RA、RAi、RAj‧‧‧列位址 RA, RAi, RAj‧‧‧ address

S<n:1>‧‧‧選擇訊號 S<n:1>‧‧‧Selection signal

Vdd‧‧‧電源電壓 Vdd‧‧‧Power supply voltage

Vpass‧‧‧通過電壓 Vpass‧‧‧ pass voltage

Vpgm‧‧‧程式電壓 Vpgm‧‧‧ program voltage

Vread‧‧‧讀取通過電壓 Vread‧‧‧ read through voltage

Vrd‧‧‧讀取電壓 Vrd‧‧‧ reading voltage

Vvfy‧‧‧驗證讀取電壓 Vvfy‧‧‧Verified read voltage

WL‧‧‧字元線 WL‧‧‧ character line

Claims (9)

一種非揮發性記憶體裝置,包括:一非揮發性記憶胞陣列,包括多條字元線;一電壓產生器,用以分別從一外部裝置接收一外部電壓和接收一電源電壓,以及利用所述電源電壓產生第一高電壓及利用高於所述電源電壓之所述外部電壓產生第二高電壓;以及一字元線選擇電路,用以在所述記憶胞陣列的程式操作期間施加所述第一高電壓至所述多條字元線當中選取的字元線,且施加所述第二高電壓至所述多條字元線當中未選取的字元線。 A non-volatile memory device includes: a non-volatile memory cell array including a plurality of word lines; a voltage generator for respectively receiving an external voltage from an external device and receiving a power supply voltage, and utilizing The power supply voltage generates a first high voltage and generates a second high voltage using the external voltage higher than the power supply voltage; and a word line selection circuit for applying the program during operation of the memory cell array And a first high voltage is applied to the selected word line among the plurality of word lines, and the second high voltage is applied to an unselected word line among the plurality of word lines. 如申請專利範圍第1項所述之非揮發性記憶體裝置,其中所述電壓產生器包括一電荷泵,所述電荷泵接收所述電源電壓且受所述電源電壓驅動以產生所述第一高電壓。 The non-volatile memory device of claim 1, wherein the voltage generator comprises a charge pump, the charge pump receiving the power supply voltage and being driven by the power supply voltage to generate the first high voltage. 如申請專利範圍第2項所述之非揮發性記憶體裝置,其中所述電壓產生器包括一分壓器,所述分壓器接收並分壓所述外部電壓且輸出所述第二高電壓。 The non-volatile memory device of claim 2, wherein the voltage generator comprises a voltage divider, the voltage divider receives and divides the external voltage and outputs the second high voltage . 如申請專利範圍第1項所述之非揮發性記憶體裝置,其中所述第一高電壓是一程式電壓Vpgm,且所述第二高電壓是一通過電壓Vpass。 The non-volatile memory device of claim 1, wherein the first high voltage is a program voltage Vpgm, and the second high voltage is a pass voltage Vpass. 如申請專利範圍第1項所述之非揮發性記憶體裝置,更包括一低電壓產生器,所述低電壓產生器產生低於所述第一高電壓及所述第二高電壓之一低電壓。 The non-volatile memory device of claim 1, further comprising a low voltage generator, the low voltage generator generating a lower than the first high voltage and the second high voltage Voltage. 如申請專利範圍第5項所述之非揮發性記憶體裝置,其中所述記憶胞陣列包括第一記憶體區塊及第二記憶體區塊,且其中所述字元線選擇電路包括:一電壓選擇開關,其根據一列位址訊號的第一部分選擇性轉移所述第一高電壓、所述第二高電壓、及所述低電壓至多條訊號線;以及一區塊解碼器,其根據所述列位址訊號的第二部分選擇性轉移所述訊號線的所述電壓至所述第一記憶體區塊及所述第二記憶體區塊的字元線。 The non-volatile memory device of claim 5, wherein the memory cell array comprises a first memory block and a second memory block, and wherein the word line selection circuit comprises: a voltage selection switch that selectively shifts the first high voltage, the second high voltage, and the low voltage to a plurality of signal lines according to a first portion of a column of address signals; and a block decoder according to the The second portion of the address signal selectively shifts the voltage of the signal line to the word line of the first memory block and the second memory block. 如申請專利範圍第1項所述之非揮發性記憶體裝置,其中所述非揮發性記憶胞陣列包括2維反及閘快閃記憶體陣列或3維反及閘快閃記憶體陣列。 The non-volatile memory device of claim 1, wherein the non-volatile memory cell array comprises a 2-dimensional inverse gate flash memory array or a 3-dimensional inverse gate flash memory array. 一種記憶體系統,包括:至少一個非揮發性記憶體裝置;一記憶體控制器,用以控制所述至少一個非揮發性記憶體裝置;以及一電源供應器,用以供應一電源電壓及一高電壓至所述至少一個非揮發性記憶體裝置,所述高電壓高於所述電源電壓;其中所述至少一個非揮發性記憶體裝置之操作受所述記憶體控制器控制,利用所述電源電壓產生一第一高電壓及利用所述高電壓產生一第二高電壓,其中所述第一高電壓是一程式電壓,並且所述第二高電壓是一通過電壓,所述通過電壓低於所述程式電壓。 A memory system comprising: at least one non-volatile memory device; a memory controller for controlling the at least one non-volatile memory device; and a power supply for supplying a power voltage and a High voltage to the at least one non-volatile memory device, the high voltage being higher than the power supply voltage; wherein operation of the at least one non-volatile memory device is controlled by the memory controller, The power supply voltage generates a first high voltage and generates a second high voltage by using the high voltage, wherein the first high voltage is a program voltage, and the second high voltage is a pass voltage, and the pass voltage is low The program voltage. 一種電子裝置,包括:一主機;以及一儲存裝置,用以從所述主機儲存寫入的資料且輸出讀取的資料至所述主機;其中所述儲存裝置包括:多個非揮發性記憶體裝置;一記憶體控制器,用以控制所述多個非揮發性記憶體裝置;以及一電源供應器,用以供應一電源電壓及一高電壓至所述多個非揮發性記憶體裝置,所述高電壓高於所述電源電壓;其中所述多個非揮發性記憶體裝置中的至少一個之操作受所述記憶體控制器控制,利用所述電源電壓產生第一高電壓及利用所述高電壓產生第二高電壓,其中所述第一高電壓是一程式電壓,並且所述第二高電壓是一通過電壓,所述通過電壓低於所述程式電壓。 An electronic device comprising: a host; and a storage device for storing the written data from the host and outputting the read data to the host; wherein the storage device comprises: a plurality of non-volatile memory a memory controller for controlling the plurality of non-volatile memory devices; and a power supply for supplying a power voltage and a high voltage to the plurality of non-volatile memory devices, The high voltage is higher than the power supply voltage; wherein operation of at least one of the plurality of non-volatile memory devices is controlled by the memory controller to generate a first high voltage and utilization by using the power supply voltage The high voltage produces a second high voltage, wherein the first high voltage is a program voltage, and the second high voltage is a pass voltage, the pass voltage being lower than the program voltage.
TW101105494A 2011-02-28 2012-02-20 Nonvolatile memory device, memory system including the same, and electronic device TWI553640B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161447133P 2011-02-28 2011-02-28
KR1020110036943A KR101780421B1 (en) 2011-02-28 2011-04-20 Nonvolatile memory device, wordline voltage generating method, programming method and reading method thereof, memory system and electronic device having the same
US13/342,239 US8867278B2 (en) 2011-02-28 2012-01-03 Nonvolatile memory device, memory system including the same, and method of operating nonvolatile memory device

Publications (2)

Publication Number Publication Date
TW201239887A TW201239887A (en) 2012-10-01
TWI553640B true TWI553640B (en) 2016-10-11

Family

ID=47109435

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101105494A TWI553640B (en) 2011-02-28 2012-02-20 Nonvolatile memory device, memory system including the same, and electronic device

Country Status (2)

Country Link
KR (1) KR101780421B1 (en)
TW (1) TWI553640B (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102084547B1 (en) * 2013-01-18 2020-03-05 삼성전자주식회사 Nonvolatile memory device, memory system having the same, external power controlling method thereof
TWI498898B (en) * 2013-04-30 2015-09-01 Phison Electronics Corp Data writing method, memory controller and memory storage apparatus
KR102293136B1 (en) * 2014-10-22 2021-08-26 삼성전자주식회사 Nonvolatile memory device, storage device having the same, operating method thereof
KR102355580B1 (en) * 2015-03-02 2022-01-28 삼성전자주식회사 Nonvolatile memory device, storage device having the same, and operation method thereof
KR102392665B1 (en) * 2017-11-29 2022-04-29 삼성전자주식회사 Memory devices, system on chips including the same and methods of operating the same
TWI650769B (en) * 2018-05-22 2019-02-11 華邦電子股份有限公司 Memory device and programming method for memory cell array
CN110570891B (en) * 2018-06-06 2021-07-27 华邦电子股份有限公司 Memory device and programming method of memory cell array
JP2020013271A (en) * 2018-07-17 2020-01-23 キオクシア株式会社 Power supply device, power supply control method, and storage device
US10418109B1 (en) 2018-07-26 2019-09-17 Winbond Electronics Corp. Memory device and programming method of memory cell array
TWI717749B (en) * 2019-06-10 2021-02-01 慧榮科技股份有限公司 Data erasing method of memory and storage device using the same
TWI697750B (en) * 2019-08-07 2020-07-01 華邦電子股份有限公司 Voltage regulator device and control method for voltage regulator device
US10845835B1 (en) 2019-09-05 2020-11-24 Winbond Electronics Corp. Voltage regulator device and control method for voltage regulator device
JP2023032169A (en) 2021-08-26 2023-03-09 キオクシア株式会社 Semiconductor storage device and memory system
TWI817328B (en) * 2021-11-02 2023-10-01 南亞科技股份有限公司 Semiconductor device including an electronic fuse control circuit and a method for fabricating the same
US11935605B2 (en) 2021-11-02 2024-03-19 Nanya Technology Corporation Method for preparing semiconductor device including an electronic fuse control circuit

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030090940A1 (en) * 2001-11-06 2003-05-15 Emil Lambrache Dual mode high voltage power supply for providing increased speed in programming during testing of low voltage non-volatile memories
US20050243631A1 (en) * 2001-08-30 2005-11-03 Renesas Technology Corporation Semiconductor memory circuit
US20060146636A1 (en) * 2004-06-04 2006-07-06 Jen-Shou Hsu Internal power management scheme for a memory chip in deep power down mode
US20070076492A1 (en) * 2005-09-30 2007-04-05 Hideki Arakawa Storage device and control method thereof
US20080198657A1 (en) * 2007-02-16 2008-08-21 Jin-Ki Kim Non-volatile semiconductor memory having multiple external power supplies

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6166961A (en) 1999-08-19 2000-12-26 Aplus Flash Technology, Inc. Approach to provide high external voltage for flash memory erase
KR100697284B1 (en) * 2005-05-02 2007-03-20 삼성전자주식회사 Flash memory device and programming method thereof
US7898851B2 (en) * 2007-12-19 2011-03-01 Kabushiki Kaisha Toshiba Semiconductor memory device which includes memory cell having charge accumulation layer and control gate

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050243631A1 (en) * 2001-08-30 2005-11-03 Renesas Technology Corporation Semiconductor memory circuit
US20030090940A1 (en) * 2001-11-06 2003-05-15 Emil Lambrache Dual mode high voltage power supply for providing increased speed in programming during testing of low voltage non-volatile memories
US20060146636A1 (en) * 2004-06-04 2006-07-06 Jen-Shou Hsu Internal power management scheme for a memory chip in deep power down mode
US20070076492A1 (en) * 2005-09-30 2007-04-05 Hideki Arakawa Storage device and control method thereof
US20080198657A1 (en) * 2007-02-16 2008-08-21 Jin-Ki Kim Non-volatile semiconductor memory having multiple external power supplies

Also Published As

Publication number Publication date
KR101780421B1 (en) 2017-09-21
TW201239887A (en) 2012-10-01
KR20120098366A (en) 2012-09-05

Similar Documents

Publication Publication Date Title
TWI553640B (en) Nonvolatile memory device, memory system including the same, and electronic device
CN107256718B (en) Nonvolatile memory device, memory system including the same, and method of operating the same
US10460775B2 (en) Asynchronous/synchronous interface
US10665308B2 (en) Semiconductor memory device
US6912155B2 (en) Non volatile memory
US8238164B2 (en) Method of programming nonvolatile memory device
US8953383B2 (en) Operating circuit controlling device, semiconductor memory device and method of operating the same
US8406062B2 (en) Charge recycling memory system and a charge recycling method thereof
CN106910524B (en) Sense control signal generation circuit and semiconductor memory device including the same
JP2015156251A (en) Non-volatile memory with dynamic multi-mode operation
US20120127791A1 (en) Nonvolatile memory device, memory system comprising same, and method of programming same
US9251901B2 (en) Semiconductor memory device with high threshold voltage distribution reliability method
US20150023108A1 (en) Nonvolatile memory device and related programming method
US8659945B2 (en) Nonvolatile memory device and method of operating same
WO2023093595A1 (en) Device having page buffer, memory system, and method of operating the same
US11776630B2 (en) Memory device performing incremental step pulse program operation and operating method thereof
US20230230639A1 (en) Method and apparatus to reduce power consumption of page buffer circuitry in a non-volatile memory device
US20230168820A1 (en) Device having page buffer, memory system, and method of operating the same
CN114255794A (en) Memory device and operating method thereof