TWI547344B - Positioning tool and processing device - Google Patents

Positioning tool and processing device Download PDF

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Publication number
TWI547344B
TWI547344B TW103116488A TW103116488A TWI547344B TW I547344 B TWI547344 B TW I547344B TW 103116488 A TW103116488 A TW 103116488A TW 103116488 A TW103116488 A TW 103116488A TW I547344 B TWI547344 B TW I547344B
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Taiwan
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brushing
sliding portion
positioning block
positioning
extension
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TW103116488A
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Chinese (zh)
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TW201542312A (en
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胡良友
葉聿華
王育宗
謝南河
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旺宏電子股份有限公司
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Priority to TW103116488A priority Critical patent/TWI547344B/en
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Publication of TWI547344B publication Critical patent/TWI547344B/en

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Description

定位治具與製程機台Positioning fixture and process machine

本發明是有關於一種定位治具與製程機台,且特別是有關於一種可調式定位治具與應用此可調式定位治具的製程機台。 The invention relates to a positioning fixture and a processing machine, and in particular to an adjustable positioning fixture and a processing machine using the adjustable positioning fixture.

在現有的半導體製程中,隨著製程線寬的縮減與元件積集度(density)的提高,平坦化技術的更顯重要。其中,化學機械拋光(Chemical Mechanical Planarization,CMP)即為目前半導體製程中可達到全域平坦化最有效的技術之一。通常而言,化學機械拋光係將基材直接與旋轉拋光墊接觸,並用載重物在基材之背面施加壓力。在拋光期間,旋轉拋光墊與操作臺旋轉,同時在基材之背面保持向下的力,並將磨料和化學活性溶液(通常稱為研磨液)塗佈於墊片上,通過研磨液與正在拋光的薄膜發生化學反應而開始進行拋光過程。 In the existing semiconductor process, as the process line width is reduced and the component accumulation is increased, the planarization technique is more important. Among them, Chemical Mechanical Planarization (CMP) is one of the most effective techniques for achieving planar planarization in semiconductor processes. Generally, chemical mechanical polishing involves contacting the substrate directly with a rotating polishing pad and applying a load to the back side of the substrate with a load. During polishing, the polishing pad rotates with the table while maintaining a downward force on the back side of the substrate, and the abrasive and chemically active solution (commonly referred to as the slurry) is applied to the gasket through the slurry and The polished film undergoes a chemical reaction to begin the polishing process.

由於研磨液是高黏稠性(high viscosity)之化學品且通常含有大量的研磨颗粒,因此在進行化學機械拋光製程後必須立即清洗矽晶片,否則容易在矽晶片之表面上凝結成固態殘餘物。一般 而言,清洗步驟可使用刷洗(brush cleaning)、噴洗(spray cleaning)及超音波清洗(ultrasonic cleaning)等方式來進行,目前較普遍之清洗方式是使用稀釋之氨水(ammonia)以去除研磨後殘留之粒子污染物,或者是稀釋後的氫氟酸(hydrofluoric acid)去除微量的金屬污染物。 Since the slurry is a high viscosity chemical and usually contains a large amount of abrasive particles, the tantalum wafer must be cleaned immediately after the chemical mechanical polishing process, otherwise it is easy to condense on the surface of the tantalum wafer into a solid residue. general For example, the cleaning step can be performed by brush cleaning, spray cleaning, and ultrasonic cleaning. The most common cleaning method is to use diluted ammonia to remove the grinding. Residual particulate contaminants, or diluted hydrofluoric acid, remove traces of metallic contaminants.

然而,強酸與強鹼極易造成銅導線及低介電(low dielectric)材料的損壞,因此在銅製程(copper metallization)中,通常會選用較為溫和的有機酸(organic acid)或是有機鹼(organic basic),輔以添加的介面活性劑(surfactant)及螯合劑(chelating agents),來去除研磨液的微粒子及金屬不純物(metal impurity)。在刷洗過程中,通常會使用兩個並列的刷洗件(brusher)來刷洗矽晶片之表面,其中兩個並列的刷洗件之間的距離將會影響實際清洗矽晶片的效果。而在兩個並列的刷洗件之間的距離調整不當的情況下,便容易造成矽晶片的損傷,並使得製程良率下滑。 However, strong acids and strong bases can easily cause damage to copper wires and low dielectric materials. Therefore, in copper metallization, mild organic acids or organic bases are usually used. Organic basic), supplemented by added surfactants and chelating agents, to remove fine particles and metal impurities from the slurry. During the brushing process, two side-by-side brushers are typically used to scrub the surface of the wafer, and the distance between the two side-by-side brushes will affect the actual cleaning of the wafer. In the case where the distance between the two parallel brushing members is improperly adjusted, the damage of the silicon wafer is easily caused, and the process yield is degraded.

本發明提供一種定位治具,可具有較佳的使用靈活度。 The invention provides a positioning fixture, which can have better flexibility of use.

本發明提供一種製程機台,可具有較佳的製程彈性,並有助於提高製程良率。 The invention provides a process machine, which can have better process flexibility and help to improve the process yield.

本發明的定位治具適用於製程機台,並可用以標定並排設置的兩刷洗件之間的距離。定位治具包括主體以及定位塊。主體具有多個刻度標記。主體包括延伸部。延伸部具有相對的兩側 邊以及對應於此兩側邊的寬度,其中靠近延伸部的尾端的位置上的寬度小於相對遠離尾端的位置上的寬度。定位塊滑設於主體。定位塊具有承靠面,延伸部適於插入此兩刷洗件之間,其中當承靠面與延伸部的此兩側邊共同承靠此兩刷洗件時,定位塊對應於這些刻度標記中的一個,且被對應的刻度標記指示此兩刷洗件之間的距離。 The positioning fixture of the present invention is suitable for a processing machine and can be used to calibrate the distance between two brushing members arranged side by side. The positioning fixture includes a body and a positioning block. The body has a plurality of tick marks. The body includes an extension. The extension has opposite sides The sides and the widths corresponding to the sides thereof, wherein the width at a position near the trailing end of the extension is smaller than the width at a position relatively far from the trailing end. The positioning block is slid on the main body. The positioning block has a bearing surface, and the extending portion is adapted to be inserted between the two brushing members, wherein when the bearing surface and the two side edges of the extending portion bear the two brushing members together, the positioning block corresponds to the marking marks One, and the corresponding tick marks indicate the distance between the two scrubbing members.

在本發明的一實施例中,上述的主體具有第一滑動部,且定位塊具有與第一滑動部相配合的第二滑動部。 In an embodiment of the invention, the main body has a first sliding portion, and the positioning block has a second sliding portion that cooperates with the first sliding portion.

在本發明的一實施例中,上述的第一滑動部為鳩形凸塊,且第二滑動部為鳩形凹槽。 In an embodiment of the invention, the first sliding portion is a 凸-shaped protrusion, and the second sliding portion is a 鸠-shaped groove.

在本發明的一實施例中,上述的第一滑動部為鳩形凹槽,且第二滑動部為鳩形凸塊。 In an embodiment of the invention, the first sliding portion is a 鸠-shaped groove, and the second sliding portion is a 凸-shaped convex portion.

在本發明的一實施例中,上述的定位塊具有平行於這些刻度標記的端面。當定位塊對應於這些刻度標記中的一個時,端面與被對應的刻度標記切齊。 In an embodiment of the invention, the positioning block has an end face that is parallel to the tick marks. When the positioning block corresponds to one of the tick marks, the end face is aligned with the corresponding tick mark.

本發明的製程機台包括製程設備以及前述定位治具。製程設備包括容槽與兩刷洗件,其中此兩刷洗件並列設置於容槽內。 The process machine of the present invention includes a process device and the aforementioned positioning fixture. The process equipment includes a receiving tank and two brushing parts, wherein the two brushing parts are juxtaposed in the receiving tank.

在本發明的一實施例中,上述的製程設備更包括至少一調整機構。調整機構設置於容槽,並連接此兩刷洗件中的一個。當延伸部插入此兩刷洗件之間,且定位塊對應於這些刻度標記中的一個時,調整機構帶動連接調整機構的刷洗件,以使此兩刷洗 件分別抵靠承靠面與延伸部的此兩側邊。 In an embodiment of the invention, the process device further includes at least one adjustment mechanism. The adjustment mechanism is disposed in the pocket and connects one of the two scrubbing members. When the extension portion is inserted between the two brushing members, and the positioning block corresponds to one of the scale marks, the adjusting mechanism drives the brushing member connected to the adjustment mechanism to make the two brushing The pieces abut against the abutment surface and the two sides of the extension.

基於上述,本發明的定位治具的主體具有錐度(taper),也就是說,靠近主體的延伸部的尾端的位置上的寬度小於相對遠離尾端的位置上的寬度。並且,定位治具的定位塊可相對於主體滑移,故在定位治具的定位基準可調變的情況下,可具有較佳的使用靈活度。而本發明的製程機台可透過前述定位治具適度地調整兩刷洗件之間的距離,從而具有較佳的製程彈性,並在刷洗待拋光物件的過程中,避免造成待拋光物件的損傷,藉以提高製程良率。 Based on the above, the body of the positioning jig of the present invention has a taper, that is, a width at a position close to the trailing end of the extension of the main body is smaller than a width at a position relatively far from the trailing end. Moreover, the positioning block of the positioning fixture can be slid relative to the main body, so that the positioning flexibility of the positioning fixture can be adjusted to have better flexibility of use. The process machine of the present invention can appropriately adjust the distance between the two brushing members through the positioning fixture, thereby having better process flexibility, and avoiding damage to the object to be polished during the process of brushing the object to be polished. In order to improve the process yield.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above described features and advantages of the invention will be apparent from the following description.

1‧‧‧待拋光物件 1‧‧‧ items to be polished

10‧‧‧製程機台 10‧‧‧Processing machine

100‧‧‧製程設備 100‧‧‧Processing equipment

110‧‧‧容槽 110‧‧‧ 容容

120a‧‧‧第一刷洗件 120a‧‧‧First brushing parts

120b‧‧‧第二刷洗件 120b‧‧‧Second brushing parts

130‧‧‧噴洗件 130‧‧‧Spray parts

140‧‧‧調整機構 140‧‧‧Adjustment agency

141‧‧‧制動件 141‧‧‧Brakes

142‧‧‧軸桿 142‧‧‧ shaft

143‧‧‧驅動件 143‧‧‧ drive parts

200‧‧‧定位治具 200‧‧‧ positioning fixture

210、210a‧‧‧主體 210, 210a‧‧‧ subjects

211‧‧‧刻度標記 211‧‧‧ tick marks

212‧‧‧延伸部 212‧‧‧Extension

212a‧‧‧側邊 212a‧‧‧ side

212b‧‧‧尾端 212b‧‧‧ tail

213‧‧‧第一滑動部 213‧‧‧First sliding part

220、220a‧‧‧定位塊 220, 220a‧‧‧ positioning block

221‧‧‧承靠面 221‧‧‧ bearing surface

222‧‧‧第二滑動部 222‧‧‧Second sliding part

223‧‧‧端面 223‧‧‧ end face

W1、W2‧‧‧寬度 W1, W2‧‧‧ width

圖1A是本發明一實施例的製程機台的示意圖。 1A is a schematic view of a process machine according to an embodiment of the present invention.

圖1B是圖1A的製程設備進行化學機械拋光的示意圖。 Figure 1B is a schematic illustration of the chemical mechanical polishing of the process apparatus of Figure 1A.

圖2是圖1A的製程設備與應用於此製程設備的定位治具的示意圖。 2 is a schematic diagram of the process device of FIG. 1A and a positioning fixture applied to the process device.

圖3是圖2的定位治具的示意圖。 3 is a schematic view of the positioning fixture of FIG. 2.

圖4是圖1A的製程設備的局部示意圖。 4 is a partial schematic view of the process apparatus of FIG. 1A.

圖5是本發明另一實施例的定位治具。 Fig. 5 is a positioning jig according to another embodiment of the present invention.

圖1A是本發明一實施例的製程機台的示意圖。圖1B是圖1A的製程設備進行化學機械拋光的示意圖。圖2是圖1A的製程設備與應用於此製程設備的定位治具的示意圖,其中為求清楚表示與說明,圖2省略繪示調整機構140。請參考圖1A、圖1B與圖2,在本實施例中,製程機台10包括製程設備100以及定位治具200,其中製程設備100例如是應用於半導體製程的化學機械拋光設備,但本發明不限於此。 1A is a schematic view of a process machine according to an embodiment of the present invention. Figure 1B is a schematic illustration of the chemical mechanical polishing of the process apparatus of Figure 1A. 2 is a schematic diagram of the process device of FIG. 1A and a positioning fixture applied to the process device. For clarity and illustration, FIG. 2 omits the adjustment mechanism 140. Referring to FIG. 1A , FIG. 1B and FIG. 2 , in the embodiment, the process machine 10 includes a process device 100 and a positioning fixture 200 , wherein the process device 100 is, for example, a chemical mechanical polishing device applied to a semiconductor process, but the present invention Not limited to this.

製程設備100包括容槽110、第一刷洗件120a以及第二刷洗件120b,其中第一刷洗件120a以及第二刷洗件120b並列設置於容槽100內,且第一刷洗件120a以及第二刷洗件120b之間的距離可因應待拋光物件1(例如晶圓)的不同厚度來加以調整,以使此第一刷洗件120a以及第二刷洗件120b可分別與待拋光物件1相對的兩表面接觸。並且,第一刷洗件120a以及第二刷洗件120b與待拋光物件1相對的兩表面之間接觸狀態,是以進行刷洗步驟時,可將待拋光物件1相對的兩表面上的不規則輪廓拋光,以使拋光物件1相對的兩表面平坦化且不損及待拋光物件1本體與其相對的兩表面上的佈線為原則。 The process device 100 includes a housing 110, a first brushing member 120a, and a second brushing member 120b, wherein the first brushing member 120a and the second brushing member 120b are juxtaposed in the housing 100, and the first brushing member 120a and the second brushing unit The distance between the pieces 120b can be adjusted according to different thicknesses of the object 1 to be polished (for example, a wafer), so that the first brushing part 120a and the second brushing part 120b can respectively contact the two surfaces opposite to the object 1 to be polished. . Moreover, the contact state between the first surface of the first brushing member 120a and the second brushing member 120b opposite to the object to be polished 1 is such that the irregular contour on the opposite surfaces of the object to be polished 1 can be polished when the brushing step is performed. The principle is to flatten the opposite surfaces of the polishing article 1 without damaging the wiring on the opposite surfaces of the body of the article to be polished 1 .

通常而言,製程設備100還包括並列設置的兩噴洗件130,這些噴洗件130可提供稀釋之氨水(ammonia)以去除第一刷洗件120a以及第二刷洗件120b研磨待拋光物件1後殘留之粒 子污染物,或者是稀釋後的氫氟酸(hydrofluoric acid)以去除微量的金屬污染物。由於第一刷洗件120a以及第二刷洗件120b之間的距離可因應待拋光物件1(例如晶圓)的不同厚度來加以調整,因此當第一刷洗件120a以及第二刷洗件120b旋轉時,第一刷洗件120a以及第二刷洗件120b分別施加於待拋光物件上的力矩(torque)的大小可控制得宜,故不易造成待拋光物件1的損傷,以提高製程良率。 Generally, the process equipment 100 further includes two spray parts 130 arranged side by side. The spray parts 130 can provide diluted ammonia to remove the first brushing part 120a and the second brushing part 120b to grind the object 1 to be polished. Residual grain Sub-contaminants, or diluted hydrofluoric acid to remove traces of metal contaminants. Since the distance between the first brushing member 120a and the second brushing member 120b can be adjusted according to different thicknesses of the object to be polished 1, such as a wafer, when the first brushing member 120a and the second brushing member 120b are rotated, The magnitude of the torque applied to the object to be polished by the first brushing member 120a and the second brushing member 120b can be controlled appropriately, so that damage to the object to be polished 1 is not easily caused to improve the process yield.

圖3是圖2的定位治具的示意圖。請參考圖2與圖3,在本實施例中,定位治具200適用於標定第一刷洗件120a以及第二刷洗件120b之間的距離,以使第一刷洗件120a以及第二刷洗件120b與待拋光物件相對的兩表面之間接觸狀態可控制得宜。定位治具200包括主體210以及定位塊220,其中主體210具有多個刻度標記211,而這些刻度標記211例如是沿著主體210的長度方向等間距地排列,但本發明不限於此。在其它實施例中,亦可因應微調(fine adjustment)或粗調(coarse adjustment)等不同操作需求,而將刻度標記211設計為不等間距排列之態樣,也就是說,主體210上的刻度標記211可有疏密之分。 3 is a schematic view of the positioning fixture of FIG. 2. Referring to FIG. 2 and FIG. 3, in the embodiment, the positioning fixture 200 is adapted to calibrate the distance between the first brushing member 120a and the second brushing member 120b, so that the first brushing member 120a and the second brushing member 120b The contact state between the two surfaces opposite to the object to be polished can be controlled. The positioning jig 200 includes a main body 210 and a positioning block 220, wherein the main body 210 has a plurality of tick marks 211, and the tick marks 211 are, for example, equally spaced along the length direction of the main body 210, but the present invention is not limited thereto. In other embodiments, the tick marks 211 may also be designed in an unequal arrangement according to different operational requirements such as fine adjustment or coarse adjustment, that is, the scale on the main body 210. The mark 211 can be classified as sparse.

主體210可包括延伸部212,其中延伸部212具有相對的兩側邊212a以及對應於此兩側邊212a的寬度,並且在延伸部212的不同位置上對應於此兩側邊212a的寬度各不相同。舉例而言,在靠近延伸部212的尾端212b的位置上的寬度W1小於相對遠離 尾端212b的位置上的寬度W2,也就是說,延伸部212實質上具有錐度(taper),故對應於此兩側邊212a的寬度在越靠近尾端212b時越小。 The body 210 may include an extension portion 212, wherein the extension portion 212 has opposite side edges 212a and a width corresponding to the two side edges 212a, and the width corresponding to the two side edges 212a at different positions of the extension portion 212 the same. For example, the width W1 at a position near the trailing end 212b of the extension 212 is less than relatively far The width W2 at the position of the trailing end 212b, that is, the extension portion 212 has substantially a taper, so the width corresponding to the side edges 212a is smaller as it is closer to the trailing end 212b.

定位塊220滑設於主體210,且定位塊220具有承靠面221。延伸部212適於置入容槽110內並插入第一刷洗件120a以及第二刷洗件120b之間,其中當承靠面221與延伸部212的此兩側邊212a共同承靠第一刷洗件120a以及第二刷洗件120b時,定位塊220對應於這些刻度標記211中的一個,且被對應的刻度標記211指示第一刷洗件120a以及第二刷洗件120b之間的距離。舉例而言,前述距離可以是指第一刷洗件120a的軸心以及第二刷洗件120b的軸心之間的距離,或者是第一刷洗件120a以及第二刷洗件120b分別承靠此兩側邊212a時的接觸點之間的距離,本發明對此不加以限制。 The positioning block 220 is slidably disposed on the main body 210 , and the positioning block 220 has a bearing surface 221 . The extending portion 212 is adapted to be inserted into the cavity 110 and inserted between the first brushing member 120a and the second brushing member 120b, wherein the bearing surface 221 and the two side edges 212a of the extending portion 212 bear together with the first brushing member When the 120a and the second brushing member 120b are located, the positioning block 220 corresponds to one of the scale marks 211, and the corresponding scale mark 211 indicates the distance between the first brushing member 120a and the second brushing member 120b. For example, the distance may be the distance between the axis of the first brushing member 120a and the axis of the second brushing member 120b, or the first brushing member 120a and the second brushing member 120b respectively support the two sides. The distance between the contact points at the side 212a is not limited by the present invention.

具體而言,主體210具有第一滑動部213,且定位塊220具有與第一滑動部213相配合的第二滑動部222,也就是說,第一滑動部213的輪廓實質上與第二滑動部222的輪廓互補。在此,第一滑動部213可以是鳩形凸塊,而第二滑動部222可以是與前述鳩形凸塊相配合的鳩形凹槽。藉此,定位塊220可沿著主體210的長度方向來回移動,以對應於這些刻度標記211中的一個,從而在延伸部212插入第一刷洗件120a以及第二刷洗件120b之間,且承靠面221與延伸部212的此兩側邊212a共同承靠第一刷洗件 120a以及第二刷洗件120b時,透過被對應的刻度標記211指示此第一刷洗件120a以及第二刷洗件120b之間的距離。 Specifically, the main body 210 has a first sliding portion 213, and the positioning block 220 has a second sliding portion 222 that cooperates with the first sliding portion 213, that is, the contour of the first sliding portion 213 is substantially the same as the second sliding portion. The contours of the portions 222 are complementary. Here, the first sliding portion 213 may be a 鸠-shaped protrusion, and the second sliding portion 222 may be a 鸠-shaped groove that cooperates with the aforementioned 鸠-shaped protrusion. Thereby, the positioning block 220 can be moved back and forth along the length direction of the body 210 to correspond to one of the scale marks 211, so that the extension portion 212 is inserted between the first brushing member 120a and the second brushing member 120b, and The abutting surface 221 and the two side edges 212a of the extending portion 212 bear together with the first brushing member In the case of 120a and the second brushing member 120b, the distance between the first brushing member 120a and the second brushing member 120b is indicated by the corresponding scale mark 211.

在本實施例中,這些刻度標記211例如是刻畫於第一滑動部213上,但本發明不限於此。在其他實施例中,這些刻度標記211也可以是刻畫於相對於第一滑動部213的表面214上,或者是刻畫於此兩側邊212a中的一個上,抑或是同時刻畫於主體210的多個面向上。 In the present embodiment, these scale marks 211 are, for example, depicted on the first sliding portion 213, but the present invention is not limited thereto. In other embodiments, the tick marks 211 may also be depicted on the surface 214 relative to the first sliding portion 213, or depicted on one of the two sides 212a, or simultaneously engraved on the body 210. Face up.

另一方面,定位塊220可具有平行於這些刻度標記211的端面223,當定位塊220對應於這些刻度標記211中的一個時,端面223可與被對應的刻度標記211切齊,以在承靠面221與延伸部212的此兩側邊212a共同承靠第一刷洗件120a以及第二刷洗件120b時,明確指示出第一刷洗件120a以及第二刷洗件120b之間的距離。需說明的是,圖3中所標示之端面223僅用以舉例說明,故在其他實施例中,端面223的實際位置當視設計需求而有所調整,本發明對此不加以限制。舉例而言,端面223亦可為承靠面221。 On the other hand, the positioning block 220 may have an end surface 223 parallel to the scale marks 211. When the positioning block 220 corresponds to one of the scale marks 211, the end surface 223 may be aligned with the corresponding scale mark 211 for bearing When the facing surface 221 and the two side edges 212a of the extending portion 212 bear together against the first brushing member 120a and the second brushing member 120b, the distance between the first brushing member 120a and the second brushing member 120b is clearly indicated. It should be noted that the end surface 223 indicated in FIG. 3 is only for illustration. Therefore, in other embodiments, the actual position of the end surface 223 is adjusted according to design requirements, and the present invention does not limit this. For example, the end surface 223 can also be the bearing surface 221 .

由於第一刷洗件120a以及第二刷洗件120b之間的距離可因應待拋光物件的不同厚度來加以調整,而第一刷洗件120a以及第二刷洗件120b之間的距離可由定位治具200所標定,因此當定位塊220對應於這些刻度標記211中的一個,可將延伸部212插入第一刷洗件120a以及第二刷洗件120b之間。此時,承靠面 221與延伸部212的此兩側邊212a可能尚未共同承靠第一刷洗件120a以及第二刷洗件120b,故需進一步調整此兩刷洗件120之間的距離,以使承靠面221與延伸部212的此兩側邊212a共同承靠第一刷洗件120a以及第二刷洗件120b。以下將針對調整第一刷洗件120a以及第二刷洗件120b之間的相對位置的作動機制作進一步的說明。 Since the distance between the first brushing member 120a and the second brushing member 120b can be adjusted according to different thicknesses of the object to be polished, the distance between the first brushing member 120a and the second brushing member 120b can be determined by the positioning fixture 200. Calibration, so that when the positioning block 220 corresponds to one of the scale marks 211, the extension 212 can be inserted between the first brushing member 120a and the second brushing member 120b. At this time, the bearing surface The two sides 212a of the extension portion 212 and the extension portion 212 may not bear the first brushing member 120a and the second brushing member 120b together, so the distance between the two brushing members 120 needs to be further adjusted to make the bearing surface 221 and the extension. The two side edges 212a of the portion 212 collectively bear against the first brushing member 120a and the second brushing member 120b. Further explanation will be made below regarding the operation of adjusting the relative position between the first brushing member 120a and the second brushing member 120b.

圖4是圖1A的製程設備的局部示意圖。請參考圖2至圖4,在本實施例中,製程設備100更包括至少一調整機構140(圖2僅是示意地繪示出一個),調整機構140設置於容槽,並連接第一刷洗件120a。當延伸部212插入此第一刷洗件120a以及第二刷洗件120b之間,且定位塊220對應於這些刻度標記221中的一個時,調整機構140可帶動第一刷洗件120a相對於第二刷洗件120b移動,以改變第一刷洗件120a以及第二刷洗件120b之間的相對位置,使得此第一刷洗件120a以及第二刷洗件120b可分別抵靠承靠面221與延伸部212的此兩側邊212a。 4 is a partial schematic view of the process apparatus of FIG. 1A. Referring to FIG. 2 to FIG. 4 , in the embodiment, the process device 100 further includes at least one adjusting mechanism 140 (only one is schematically illustrated in FIG. 2 ). The adjusting mechanism 140 is disposed in the receiving slot and connected to the first brushing. Piece 120a. When the extending portion 212 is inserted between the first brushing member 120a and the second brushing member 120b, and the positioning block 220 corresponds to one of the scale marks 221, the adjusting mechanism 140 can drive the first brushing member 120a relative to the second brushing. The piece 120b is moved to change the relative position between the first brushing member 120a and the second brushing member 120b such that the first brushing member 120a and the second brushing member 120b can abut against the bearing surface 221 and the extension portion 212, respectively. Both sides 212a.

雖然在上述實施例中,是以調整機構140連接第一刷洗件120a做介紹,但在其他實施例中,調整機構140亦可以是連接第二刷洗件120b,或者是在調整機構140的數量為兩個的情況下,將此兩調整機構140分別連接第一刷洗件120a以及第二刷洗件120b,本發明對此不加以限制。 Although in the above embodiment, the adjustment mechanism 140 is connected to the first brushing member 120a, in other embodiments, the adjustment mechanism 140 may be connected to the second brushing member 120b, or the number of the adjusting mechanism 140 is In the case of the two, the two adjustment mechanisms 140 are respectively connected to the first brushing member 120a and the second brushing member 120b, which is not limited in the present invention.

更進一步而言,調整機構140可包括位於容槽110內側 的制動件141、軸桿142以及驅動件143。軸桿142分別穿過制動件141、驅動件143與容槽110的側壁,且制動件141與驅動件143分別位於容槽110的側壁的相對兩側。當施加驅動力於驅動件143以帶動驅動件143轉動時,驅動件143同時帶動軸桿142轉動,並使得制動件141朝靠近或遠離容槽110的方向移動,藉以改變第一刷洗件120a以及第二刷洗件120b之間的相對位置。 Furthermore, the adjustment mechanism 140 can be located inside the pocket 110 The brake member 141, the shaft 142 and the driving member 143. The shaft 142 passes through the braking member 141, the driving member 143 and the side wall of the receiving slot 110, respectively, and the braking member 141 and the driving member 143 are respectively located on opposite sides of the side wall of the receiving slot 110. When the driving force is applied to the driving member 143 to drive the driving member 143 to rotate, the driving member 143 simultaneously drives the shaft 142 to rotate, and causes the braking member 141 to move toward or away from the pocket 110, thereby changing the first brushing member 120a and The relative position between the second brushing members 120b.

以上是針對定位治具200的其中一種標定方法做介紹,亦即將定位塊220對應於這些刻度標記211中的一個後加以固定於主體210上,接著將延伸部212插入第一刷洗件120a以及第二刷洗件120b之間,並透過調整機構140調整第一刷洗件120a以及第二刷洗件120b之間的相對位置,使得第一刷洗件120a以及第二刷洗件120b可分別抵靠承靠面221與延伸部212的此兩側邊212a,進而決定第一刷洗件120a以及第二刷洗件120b之間的距離,而前述距離例如是與被定位塊220所對應的刻度標記211的數值相符。然而,定位治具200的標定方法並不限定於上述,以下將舉出另一種標定方法加以說明。 The above is a description of one of the calibration methods of the positioning fixture 200, that is, the positioning block 220 is fixed to the main body 210 corresponding to one of the scale marks 211, and then the extension portion 212 is inserted into the first brushing member 120a and the Between the two brushing members 120b, and adjusting the relative position between the first brushing member 120a and the second brushing member 120b through the adjusting mechanism 140, so that the first brushing member 120a and the second brushing member 120b can respectively abut the bearing surface 221 The distance between the first brushing member 120a and the second brushing member 120b is determined by the two side edges 212a of the extending portion 212, and the distance is, for example, coincident with the value of the scale mark 211 corresponding to the positioned block 220. However, the calibration method of the positioning jig 200 is not limited to the above, and another calibration method will be described below.

舉例而言,在第一刷洗件120a以及第二刷洗件120b之間的相對位置被固定的情況下,使用者可先將延伸部212插入第一刷洗件120a以及第二刷洗件120b之間,並使第一刷洗件120a以及第二刷洗件120b之間共同承靠延伸部212的此兩側邊212a。接著,朝向第一刷洗件120a以及第二刷洗件120b的所在處移動 定位塊200,以使定位塊200的承靠面221也承靠第一刷洗件120a以及第二刷洗件120b。此時,被定位塊200所對應的刻度標記211即可指示出第一刷洗件120a以及第二刷洗件120b之間的距離。同上所述,前述距離例如是與被定位塊220所對應的刻度標記211的數值相符。 For example, in a case where the relative position between the first brushing member 120a and the second brushing member 120b is fixed, the user may first insert the extending portion 212 between the first brushing member 120a and the second brushing member 120b. The first brushing member 120a and the second brushing member 120b are supported by the two side edges 212a of the extending portion 212. Then, moving toward the first scrubbing member 120a and the second scrubbing member 120b The block 200 is positioned such that the bearing surface 221 of the positioning block 200 also bears against the first brushing member 120a and the second brushing member 120b. At this time, the scale mark 211 corresponding to the positioned block 200 can indicate the distance between the first brushing member 120a and the second brushing member 120b. As described above, the aforementioned distance corresponds, for example, to the value of the scale mark 211 corresponding to the positioned block 220.

以下將列舉其他實施例的定位治具以作為說明。在此必須說明的是,下述實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。 The positioning jig of the other embodiments will be listed below as an illustration. It is to be noted that the following embodiments use the same reference numerals and parts of the above-mentioned embodiments, and the same reference numerals are used to refer to the same or similar elements, and the description of the same technical content is omitted.

圖5是本發明另一實施例的定位治具。請參考圖5,在本實施例中,主體210a的第一滑動部213可以是鳩形凹槽,而定位塊220a的第二滑動部222可以是與前述鳩形凹槽相配合的鳩形凸塊。 Fig. 5 is a positioning jig according to another embodiment of the present invention. Referring to FIG. 5, in the embodiment, the first sliding portion 213 of the main body 210a may be a 凹槽-shaped groove, and the second sliding portion 222 of the positioning block 220a may be a 鸠-shaped convex matching the aforementioned 鸠-shaped groove. Piece.

綜上所述,本發明的定位治具的主體具有錐度(taper),也就是說,靠近主體的延伸部的尾端的位置上的寬度小於相對遠離尾端的位置上的寬度。並且,定位治具的定位塊可相對於主體滑移以對應於主體上的多個刻度標記中的一個,而具有不同的的定位基準。也就是說,在定位治具的定位基準可調變的情況下,其可具有較佳的使用靈活度。 In summary, the main body of the positioning jig of the present invention has a taper, that is, a width at a position close to a trailing end of the extending portion of the main body is smaller than a width at a position relatively far from the trailing end. Also, the positioning block of the positioning fixture can be slid relative to the body to correspond to one of the plurality of tick marks on the body with a different positioning reference. That is to say, in the case where the positioning reference of the positioning jig is adjustable, it can have better flexibility of use.

另一方面,本發明的製程機台可透過前述定位治具適度地調整兩刷洗件之間的距離,其中在定位塊的承靠面與主體的延 伸部的兩側邊共同承靠兩刷洗件時,被對應的該刻度標記即可指示出兩刷洗件之間的距離。如此為之,不僅可使本發明的製程機台具有較佳的製程彈性,亦可在刷洗待拋光物件的過程中,避免造成待拋光物件的損傷,藉以提高製程良率。 In another aspect, the process machine of the present invention can moderately adjust the distance between the two brushing members through the positioning fixture, wherein the bearing surface of the positioning block and the extension of the main body When the two sides of the extension jointly bear against the two brushing members, the corresponding mark of the scale can indicate the distance between the two brushing members. In this way, not only can the process machine of the present invention have better process flexibility, but also the damage of the object to be polished can be avoided during the process of brushing the object to be polished, thereby improving the process yield.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

200‧‧‧定位治具 200‧‧‧ positioning fixture

210‧‧‧主體 210‧‧‧ Subject

211‧‧‧刻度標記 211‧‧‧ tick marks

212‧‧‧延伸部 212‧‧‧Extension

212a‧‧‧側邊 212a‧‧‧ side

212b‧‧‧尾端 212b‧‧‧ tail

213‧‧‧第一滑動部 213‧‧‧First sliding part

220‧‧‧定位塊 220‧‧‧ Positioning block

221‧‧‧承靠面 221‧‧‧ bearing surface

222‧‧‧第二滑動部 222‧‧‧Second sliding part

223‧‧‧端面 223‧‧‧ end face

Claims (10)

一種定位治具,適用於一製程機台,以標定並排設置的兩刷洗件之間的距離,該定位治具包括:一主體,具有多個刻度標記,該主體包括一延伸部,該延伸部具有相對的兩側邊以及對應於該兩側邊的寬度,其中靠近該延伸部的一尾端的位置上的該寬度小於相對遠離該尾端的位置上的該寬度;以及一定位塊,滑設於該主體,該定位塊具有一承靠面,該延伸部適於插入該兩刷洗件之間,其中當該承靠面與該延伸部的該兩側邊共同承靠該兩刷洗件時,該定位塊對應於該些刻度標記中的一個,且被對應的該刻度標記指示該兩刷洗件之間的距離。 A positioning fixture is applicable to a processing machine for calibrating the distance between two brushing members arranged side by side. The positioning fixture comprises: a main body having a plurality of tick marks, the main body comprising an extension portion, the extension portion Having opposite side edges and a width corresponding to the two side edges, wherein the width at a position near a trailing end of the extending portion is smaller than the width at a position relatively far from the trailing end; and a positioning block is slidably disposed The main body, the positioning block has a bearing surface, and the extending portion is adapted to be inserted between the two brushing members, wherein when the bearing surface and the two side edges of the extending portion bear the two brushing members together, The positioning block corresponds to one of the tick marks, and the corresponding tick mark indicates the distance between the two brushing members. 如申請專利範圍第1項所述的定位治具,其中該主體具有一第一滑動部,且該定位塊具有與該第一滑動部相配合的一第二滑動部。 The positioning fixture of claim 1, wherein the body has a first sliding portion, and the positioning block has a second sliding portion that cooperates with the first sliding portion. 如申請專利範圍第2項所述的定位治具,其中該第一滑動部為一鳩形凸塊,且該第二滑動部為一鳩形凹槽。 The positioning fixture of claim 2, wherein the first sliding portion is a 凸-shaped protrusion, and the second sliding portion is a 凹槽-shaped groove. 如申請專利範圍第2項所述的定位治具,其中該第一滑動部為一鳩形凹槽,且該第二滑動部為一鳩形凸塊。 The positioning fixture of claim 2, wherein the first sliding portion is a 凹槽-shaped groove, and the second sliding portion is a 凸-shaped convex portion. 如申請專利範圍第1項所述的定位治具,其中該定位塊具有平行於該些刻度標記的一端面,當該定位塊對應於該些刻度標記中的一個時,該端面與被對應的該刻度標記切齊。 The positioning fixture of claim 1, wherein the positioning block has an end surface parallel to the tick marks, and when the positioning block corresponds to one of the tick marks, the end face is corresponding to The scale marks are aligned. 一種製程機台,包括: 一製程設備,包括:一容槽;以及兩刷洗件,並列設置於該容槽內;以及一定位治具,適用於標定該兩刷洗件之間的距離,該定位治具包括:一主體,具有多個刻度標記,該主體包括一延伸部,該延伸部具有相對的兩側邊以及對應於該兩側邊的寬度,其中靠近該延伸部的一尾端的位置上的該寬度小於相對遠離該尾端的位置上的該寬度;以及一定位塊,滑設於該主體,該定位塊具有一承靠面,該延伸部適於插入該兩刷洗件之間,其中當該承靠面與該延伸部的該兩側邊共同承靠該兩刷洗件時,該定位塊對應於該些刻度標記中的一個,且被對應的該刻度標記指示該兩刷洗件之間的距離。 A process machine comprising: a processing device, comprising: a receiving slot; and two brushing members disposed side by side in the receiving slot; and a positioning fixture adapted to calibrate a distance between the two brushing members, the positioning fixture comprising: a main body Having a plurality of tick marks, the body includes an extension having opposite side edges and a width corresponding to the two sides, wherein the width near the end of the extension is less than the distance a width at a position of the trailing end; and a positioning block slidably disposed on the body, the positioning block having a bearing surface adapted to be inserted between the two brushing members, wherein the bearing surface and the extension When the two sides of the portion bear the two brushing members together, the positioning block corresponds to one of the tick marks, and the corresponding tick mark indicates the distance between the two brush members. 如申請專利範圍第6項所述的製程機台,其中該主體具有一第一滑動部,且該定位塊具有與該第一滑動部相配合的一第二滑動部。 The process machine of claim 6, wherein the main body has a first sliding portion, and the positioning block has a second sliding portion that cooperates with the first sliding portion. 如申請專利範圍第7項所述的製程機台,其中該第一滑動部為一鳩形凸塊,且該第二滑動部為一鳩形凹槽。 The process machine of claim 7, wherein the first sliding portion is a 凸-shaped protrusion, and the second sliding portion is a 凹槽-shaped groove. 如申請專利範圍第7項所述的製程機台,其中該第一滑動部為一鳩形凹槽,且該第二滑動部為一鳩形凸塊。 The process machine of claim 7, wherein the first sliding portion is a meandering groove, and the second sliding portion is a meandering bump. 如申請專利範圍第6項所述的製程機台,其中該製程設備更包括:至少一調整機構,設置於該容槽,並連接該兩刷洗件中的一個,當該延伸部插入該兩刷洗件之間,且該定位塊對應於該些刻度標記中的一個時,該至少一調整機構帶動連接該至少一調整機構的該刷洗件,以使該兩刷洗件分別抵靠該承靠面與該延伸部的該兩側邊。 The process machine of claim 6, wherein the process device further comprises: at least one adjustment mechanism disposed in the pocket, and connecting one of the two brushing members, when the extension portion is inserted into the two brushing Between the pieces, and the positioning block corresponds to one of the tick marks, the at least one adjusting mechanism drives the brushing member connected to the at least one adjusting mechanism, so that the two brushing members respectively abut the bearing surface and The two sides of the extension.
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