TWI546880B - - Google Patents
Info
- Publication number
- TWI546880B TWI546880B TW103123871A TW103123871A TWI546880B TW I546880 B TWI546880 B TW I546880B TW 103123871 A TW103123871 A TW 103123871A TW 103123871 A TW103123871 A TW 103123871A TW I546880 B TWI546880 B TW I546880B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310627145.XA CN104674190B (en) | 2013-11-28 | 2013-11-28 | A kind of semiconductor processing device and the gas distribution grid applied to semiconductor processing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201521136A TW201521136A (en) | 2015-06-01 |
| TWI546880B true TWI546880B (en) | 2016-08-21 |
Family
ID=53309761
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103123871A TW201521136A (en) | 2013-11-28 | 2014-07-10 | Semiconductor processing apparatus and gas distribution board applicable to semiconductor processing apparatus |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN104674190B (en) |
| TW (1) | TW201521136A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI579404B (en) * | 2015-08-14 | 2017-04-21 | 精曜有限公司 | Gas distribution plate |
| JP6240695B2 (en) * | 2016-03-02 | 2017-11-29 | 株式会社日立国際電気 | Substrate processing apparatus, semiconductor device manufacturing method, and program |
| CN106591805B (en) * | 2016-11-23 | 2019-01-15 | 佛山市中山大学研究院 | A kind of MOCVD device spray head and MOCVD device and intake method comprising it |
| CN110195215A (en) * | 2019-06-28 | 2019-09-03 | 云谷（固安）科技有限公司 | Gas spray and film forming chamber |
| CN117612977B (en) * | 2024-01-23 | 2024-04-05 | 上海邦芯半导体科技有限公司 | Air inlet device and air inlet method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101110635B1 (en) * | 2005-03-10 | 2012-02-15 | 삼성전자주식회사 | Device for making semiconductor |
| US7976631B2 (en) * | 2007-10-16 | 2011-07-12 | Applied Materials, Inc. | Multi-gas straight channel showerhead |
| CN101339895B (en) * | 2008-08-22 | 2010-06-02 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Gas distribution device and plasma processing apparatus applying the same |
| CN100568453C (en) * | 2008-08-22 | 2009-12-09 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Apparatus for processing plasma, gas distributing device and gas delivery method |
| CN201785486U (en) * | 2010-08-17 | 2011-04-06 | 彭继忠 | Novel spray header device of MOCVD equipment |
-
2013
- 2013-11-28 CN CN201310627145.XA patent/CN104674190B/en active Active
-
2014
- 2014-07-10 TW TW103123871A patent/TW201521136A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW201521136A (en) | 2015-06-01 |
| CN104674190B (en) | 2017-10-20 |
| CN104674190A (en) | 2015-06-03 |