TWI540182B - A hardened silicone resin composition and a hardened product react, and a light-cured semiconductor device - Google Patents

A hardened silicone resin composition and a hardened product react, and a light-cured semiconductor device Download PDF

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TWI540182B
TWI540182B TW104124159A TW104124159A TWI540182B TW I540182 B TWI540182 B TW I540182B TW 104124159 A TW104124159 A TW 104124159A TW 104124159 A TW104124159 A TW 104124159A TW I540182 B TWI540182 B TW I540182B
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sio
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resin
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TW201609977A (en
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Wataru Kawai
Katsuhiro Akiyama
Yu Matsuno
Junya Nakatsuji
Makoto Seino
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Central Glass Co Ltd
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    • C09K3/00Materials not provided for elsewhere
    • C09K3/10Materials in mouldable or extrudable form for sealing or packing joints or covers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52Encapsulations
    • H01L33/56Materials, e.g. epoxy or silicone resin
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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Description

硬化性聚矽氧樹脂組合物及其硬化物、以及使用彼等之光半導體裝置 Curable polyoxynoxy resin composition and cured product thereof, and optical semiconductor device using same

本發明係關於一種可較佳地用作發光二極體等光半導體元件之密封材之原料、接著劑之原料的硬化性聚矽氧樹脂組合物及其硬化物,以及使用彼等之光半導體裝置。 The present invention relates to a curable polyoxyxene resin composition which can be preferably used as a raw material of a sealing material for an optical semiconductor element such as a light-emitting diode, and a cured material thereof, and a cured product thereof, and an optical semiconductor using the same Device.

利用發光二極體(簡稱:LED)等光半導體元件之發光裝置之密封材中使用有環氧樹脂組合物或聚矽氧樹脂組合物等之硬化物。對於彼等密封材,要求即使於高溫下長時間暴露亦可維持透明性,即要求「耐熱透明性」優異。 A cured product such as an epoxy resin composition or a polyoxyxylene resin composition is used for a sealing material of a light-emitting device using an optical semiconductor element such as a light-emitting diode (abbreviation: LED). For their sealing materials, it is required to maintain transparency even when exposed to high temperatures for a long period of time, that is, it is required to have excellent "heat-resistant transparency".

通常環氧樹脂組合物之硬化物之硬度較高,故而操作性優異,例如於低輸出之白色LED用密封用途中可獲得所需之耐久性,因此較多用於低輸出用途中。 In general, the cured product of the epoxy resin composition has a high hardness, and therefore has excellent handleability. For example, in a low-output white LED sealing application, the desired durability can be obtained, and therefore it is often used for low-output applications.

然而,已知,伴隨近年來LED逐漸高亮度化、高輸出化,對先前之透明環氧樹脂組合物之硬化物而言,用於功率半導體、高亮度發光元件(例如汽車之頭燈或液晶電視之背光裝置用高亮度LED)或藍光雷射等短波長半導體雷射之密封材時耐熱性不充分,會產生因高溫劣化引起之電流洩漏或黃變等。 However, it is known that, in recent years, LEDs have been gradually increased in brightness and output, and have been used for power semiconductors, high-intensity light-emitting elements (such as automobile headlights or liquid crystals) for cured products of the prior transparent epoxy resin composition. When a short-wavelength semiconductor laser such as a high-brightness LED for a television backlight or a blue laser is used, the heat resistance is insufficient, and current leakage or yellowing due to high-temperature deterioration may occur.

最近,為解決彼等問題,開始將以耐熱性優異之聚矽氧樹脂代替環氧樹脂作為基礎之樹脂組合物之硬化物用於LED之密封材。例如,於專利文獻1中,作為保護密封光學裝置或半導體裝置之材料, 報告有利用SiH基與烯基之加成反應(矽氫化反應)之加成硬化型聚矽氧樹脂組合物。 Recently, in order to solve the problems, a cured product of a resin composition based on an epoxy resin having excellent heat resistance instead of an epoxy resin has been used for a sealing material for LEDs. For example, in Patent Document 1, as a material for protecting a sealing optical device or a semiconductor device, An addition-curable polydecane resin composition using an addition reaction (hydrogenation reaction) of a SiH group and an alkenyl group has been reported.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2000-198930號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2000-198930

於多數之加成硬化型聚矽氧樹脂組合物中,含有鉑系金屬觸媒,尤其鉑觸媒作為硬化觸媒。然而,含有鉑觸媒之聚矽氧樹脂組合物若長時間暴露於高溫下則存在黃變之情形。其結果,對含有鉑觸媒之聚矽氧樹脂組合物之硬化物而言,存在若長時間暴露於高溫下則透明性受損之問題。伴隨近年來之高亮度化LED之開發,期望開發一種可提供解決此種問題,即使長時間暴露於高溫下亦具有充分之透明性,即耐熱透明性優異之硬化物的聚矽氧樹脂組合物。 Most of the addition-hardening polyoxynoxy resin compositions contain a platinum-based metal catalyst, particularly a platinum catalyst, as a hardening catalyst. However, the polyoxynoxy resin composition containing a platinum catalyst may be yellowed if exposed to a high temperature for a long period of time. As a result, in the cured product of the platinum-containing catalyst-containing polyoxyxene resin composition, there is a problem that transparency is impaired when exposed to a high temperature for a long period of time. With the development of high-luminance LEDs in recent years, it has been desired to develop a polyoxyxylene resin composition which can provide such a cured product which has sufficient transparency, that is, a heat-resistant transparency, which is excellent in heat resistance even when exposed to a high temperature for a long period of time. .

本發明係鑒於上述情形而完成者,其目的在於提供一種可提供耐熱透明性優異之硬化物的加成硬化型之硬化性聚矽氧樹脂組合物及其硬化物、以及使用彼等之光半導體裝置。 The present invention has been made in view of the above circumstances, and an object of the invention is to provide an addition-curable curable polyoxynoxy resin composition capable of providing a cured product excellent in heat-resistant transparency, a cured product thereof, and an optical semiconductor using the same. Device.

本發明者等人為達成上述目的而進行潛心研究,結果發現藉由使用至少含有(A)成分:下述式[1]所示且含有與矽原子鍵結之氫原子(SiH基)之聚矽氧樹脂、(B)成分:下述式[2]所示且含有與矽原子鍵結之乙烯基(Si-CH=CH2基)之聚矽氧樹脂、及(C)成分:鉑觸媒,且(A)成分與(B)成分中之矽烷醇基(Si-OH基)之總含量為0.5~5.0 mmol/g,(C)成分中之鉑原子之含量相對於(A)成分與(B)成分與(C)成分之合計質量,以質量單位計為0.003~3.0ppm的硬化性聚矽氧樹脂組合物,可達成上述課題,從而實現耐熱透明性優異之加成硬化型之硬化性聚矽氧樹脂組合物。 The present inventors have conducted intensive studies to achieve the above object, and as a result, it has been found that by using a polyfluorene containing at least the component (A): a hydrogen atom (SiH group) bonded to a ruthenium atom, which is represented by the following formula [1] Oxygen resin and component (B): a polyfluorene oxide resin having a vinyl group (Si-CH=CH 2 group) bonded to a ruthenium atom and a component (C): a platinum catalyst And the total content of the stanol group (Si-OH group) in the component (A) and the component (B) is 0.5 to 5.0 mmol/g, and the content of the platinum atom in the component (C) is relative to the component (A) (C) The total mass of the component (C) and the curable polyoxynene resin composition of 0.003 to 3.0 ppm by mass, which achieves the above-mentioned problems, and achieves hardening and hardening of the heat-resistant transparency. Polyoxygenated resin composition.

[化1](H-SiR1 2O1/2)a(SiR2 2O2/2)b(R3SiO3/2)c(SiO4/2)d [1] (H-SiR 1 2 O 1/2 ) a (SiR 2 2 O 2/2 ) b (R 3 SiO 3/2 ) c (SiO 4/2 ) d [1]

(式中,R1為碳數1~3之烷基,2個R1可為相同或相互不同之種類,R2為碳數1~3之烷基,2個R2可為相同或相互不同之種類,R3為碳數1~3之烷基或碳數6~10之芳香族烴基,a、b及c分別為超過0且未達1之數,d為0以上且未達1之數,滿足a+b+c+d=1,(SiR2 2O2/2)、(R3SiO3/2)及(SiO4/2)所表示之結構單元中之氧原子分別表示形成矽氧烷鍵之氧原子或形成矽烷醇基之氧原子) (wherein R 1 is an alkyl group having 1 to 3 carbon atoms, 2 R 1 may be the same or different from each other, and R 2 is an alkyl group having 1 to 3 carbon atoms, and 2 R 2 may be the same or mutually In different types, R 3 is an alkyl group having 1 to 3 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, and a, b, and c are each more than 0 and not up to 1, and d is 0 or more and less than 1 The number of oxygen atoms in the structural unit represented by a+b+c+d=1, (SiR 2 2 O 2/2 ), (R 3 SiO 3/2 ), and (SiO 4/2 ) respectively Forming an oxygen atom of a siloxane chain or forming an oxygen atom of a stanol group)

[化2](CH2=CH-SiR4 2O1/2)e(SiR5 2O2/2)f(R6SiO3/2)g(SiO4/2)h [2] (CH 2 =CH-SiR 4 2 O 1/2 ) e (SiR 5 2 O 2/2 ) f (R 6 SiO 3/2 ) g (SiO 4/2 ) h [2]

(式中,R4為碳數1~3之烷基,2個R4可為相同或相互不同之種類,R5為碳數1~3之烷基,2個R5可為相同或相互不同之種類,R6為碳數1~3之烷基或碳數6~10之芳香族烴基,e、f及g分別為超過0且未達1之數,h為0以上且未達1之數,滿足e+f+g+h=1,(SiR5 2O2/2)、(R6SiO3/2)及(SiO4/2)所表示之結構單元中之氧原子分別表示形成矽氧烷鍵之氧原子或形成矽烷醇基之氧原子) (wherein R 4 is an alkyl group having 1 to 3 carbon atoms, 2 R 4 may be the same or different from each other, and R 5 is an alkyl group having 1 to 3 carbon atoms, and 2 R 5 may be the same or mutually In different types, R 6 is an alkyl group having 1 to 3 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, and e, f, and g are each more than 0 and less than 1, and h is 0 or more and less than 1 The number of oxygen atoms in the structural unit represented by e+f+g+h=1, (SiR 5 2 O 2/2 ), (R 6 SiO 3/2 ), and (SiO 4/2 ) Forming an oxygen atom of a siloxane chain or forming an oxygen atom of a stanol group)

即,本發明包含以下發明1~發明15。 That is, the present invention includes the following Inventions 1 to 15.

[發明1] [Invention 1]

一種硬化性聚矽氧樹脂組合物,其至少含有(A)成分:下述式[1]所示且含有與矽原子鍵結之氫原子(SiH基)之聚矽氧樹脂、(B)成分:下述式[2]所示且含有與矽原子鍵結之乙烯基(Si- CH=CH2基)之聚矽氧樹脂、及(C)成分:鉑觸媒,且(A)成分與(B)成分中之矽烷醇基(Si-OH基)之總含量為0.5~5.0mmol/g,(C)成分中之鉑原子之含量相對於(A)成分與(B)成分與(C)成分之合計質量,以質量單位計為0.003~3.0ppm,[化3](H-SiR1 2O1/2)a(SiR2 2O2/2)b(R3SiO3/2)c(SiO4/2)d [1] A curable polyoxyxene resin composition containing at least (A) a component: a polyoxyxylene resin having a hydrogen atom (SiH group) bonded to a ruthenium atom and a component (B) represented by the following formula [1] a polyfluorene oxy-resin represented by the following formula [2] and having a vinyl group (Si-CH=CH 2 group) bonded to a ruthenium atom, and a component (C): a platinum catalyst, and the component (A) The total content of the stanol group (Si-OH group) in the component (B) is 0.5 to 5.0 mmol/g, and the content of the platinum atom in the component (C) is relative to the component (A) and the component (B) and (C). The total mass of the components, in terms of mass units, is 0.003 to 3.0 ppm, [Chemical 3] (H-SiR 1 2 O 1/2 ) a (SiR 2 2 O 2/2 ) b (R 3 SiO 3/2 ) c (SiO 4/2 ) d [1]

(式中,R1為碳數1~3之烷基,2個R1可為相同或相互不同之種類,R2為碳數1~3之烷基,2個R2可為相同或相互不同之種類,R3為碳數1~3之烷基或碳數6~10之芳香族烴基,a、b及c分別為超過0且未達1之數,d為0以上且未達1之數,滿足a+b+c+d=1,(SiR2 2O2/2)、(R3SiO3/2)及(SiO4/2)所表示之結構單元中之氧原子分別表示形成矽氧烷鍵之氧原子或形成矽烷醇基之氧原子) (wherein R 1 is an alkyl group having 1 to 3 carbon atoms, 2 R 1 may be the same or different from each other, and R 2 is an alkyl group having 1 to 3 carbon atoms, and 2 R 2 may be the same or mutually In different types, R 3 is an alkyl group having 1 to 3 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, and a, b, and c are each more than 0 and not up to 1, and d is 0 or more and less than 1 The number of oxygen atoms in the structural unit represented by a+b+c+d=1, (SiR 2 2 O 2/2 ), (R 3 SiO 3/2 ), and (SiO 4/2 ) respectively Forming an oxygen atom of a siloxane chain or forming an oxygen atom of a stanol group)

[化4](CH2=CH-SiR4 2O1/2)e(SiR5 2O2/2)f(R6SiO3/2)g(SiO4/2)h [2] (CH 2 =CH-SiR 4 2 O 1/2 ) e (SiR 5 2 O 2/2 ) f (R 6 SiO 3/2 ) g (SiO 4/2 ) h [2]

(式中,R4為碳數1~3之烷基,2個R4可為相同或相互不同之種類,R5為碳數1~3之烷基,2個R5可為相同或相互不同之種類,R6為碳數1~3之烷基或碳數6~10之芳香族烴基,e、f及g分別為超過0且未達1之數,h為0以上且未達1之數,滿足e+f+g+h=1,(SiR5 2O2/2)、(R6SiO3/2)及(SiO4/2)所表示之結構單元中之氧原子分別表示形成矽氧烷鍵之氧原子或形成矽烷醇基之氧原子)。 (wherein R 4 is an alkyl group having 1 to 3 carbon atoms, 2 R 4 may be the same or different from each other, and R 5 is an alkyl group having 1 to 3 carbon atoms, and 2 R 5 may be the same or mutually In different types, R 6 is an alkyl group having 1 to 3 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, and e, f, and g are each more than 0 and less than 1, and h is 0 or more and less than 1 The number of oxygen atoms in the structural unit represented by e+f+g+h=1, (SiR 5 2 O 2/2 ), (R 6 SiO 3/2 ), and (SiO 4/2 ) An oxygen atom forming a siloxane chain or an oxygen atom forming a stanol group).

[發明2] [Invention 2]

如發明1之硬化性聚矽氧樹脂組合物,其中(A)成分中之與矽原子鍵結之氫原子之莫耳數:(B)成分中之與矽原子鍵結之乙烯基之莫耳數為0.8:0.2~0.5:0.5。 The curable polyoxyxene resin composition according to Invention 1, wherein the number of moles of the hydrogen atom bonded to the ruthenium atom in the component (A): the mole of the vinyl group bonded to the ruthenium atom in the component (B) The number is 0.8:0.2~0.5:0.5.

[發明3] [Invention 3]

如發明1或2之硬化性聚矽氧樹脂組合物,其中於(A)成分中,a、b、c及d為a:b:c:d=0.10~0.40:0.10~0.80:0.10~0.80:0~0.70,於(B)成分中,e、f、g及h為e:f:g:h=0.10~0.40:0.10~0.80:0.10~0.80:0~0.70。 The curable polyoxyxene resin composition according to Invention 1 or 2, wherein, in the component (A), a, b, c and d are a: b: c: d = 0.10 to 0.40: 0.10 to 0.80: 0.10 to 0.80. :0~0.70, in the component (B), e, f, g, and h are e:f:g:h=0.10~0.40:0.10~0.80:0.10~0.80:0~0.70.

[發明4] [Invention 4]

如發明1至3中任一項之硬化性聚矽氧樹脂組合物,其中於(A)成分中,a、b、c及d為a:b:c:d=0.20~0.40:0.10~0.40:0.30~0.60:0.10~0.30,於(B)成分中,e、f、g及h為e:f:g:h=0.20~0.40:0.10~0.40:0.30~0.60:0.10~0.30。 The curable polyoxyxene resin composition according to any one of Inventions 1 to 3, wherein, in the component (A), a, b, c and d are a: b: c: d = 0.20 to 0.40: 0.10 to 0.40. : 0.30~0.60: 0.10~0.30. In the component (B), e, f, g, and h are e:f:g:h=0.20~0.40:0.10~0.40:0.30~0.60:0.10~0.30.

[發明5] [Invention 5]

如發明1或2之硬化性聚矽氧樹脂組合物,其中於(A)成分中,d=0,a、b及c為a:b:c=0.05~0.40:0.10~0.80:0.10~0.80,於(B)成分中,h=0,e、f及g為e:f:g=0.05~0.40:0.10~0.80:0.10~0.80。 The curable polyoxyxene resin composition according to Invention 1 or 2, wherein in the component (A), d = 0, a, b and c are a: b: c = 0.05 to 0.40: 0.10 to 0.80: 0.10 to 0.80. In the component (B), h=0, e, f, and g are e:f:g=0.05~0.40:0.10~0.80:0.10~0.80.

[發明6] [Invention 6]

如發明1至5中任一項之硬化性聚矽氧樹脂組合物,其中進而含有硬化延遲劑。 The curable polydecane resin composition according to any one of Inventions 1 to 5, which further contains a hardening retarder.

[發明7] [Invention 7]

如發明1至6中任一項之硬化性聚矽氧樹脂組合物,其中進而含有抗氧化劑或光穩定劑。 The curable polyoxyxene resin composition according to any one of Inventions 1 to 6, which further contains an antioxidant or a light stabilizer.

[發明8] [Invention 8]

如發明1至7中任一項之硬化性聚矽氧樹脂組合物,其中進而含有選自由接著賦予劑、螢光體及無機粒子所組成之群中之一種以上。 The curable polyoxyxene resin composition according to any one of the first to seventh aspects of the present invention, further comprising one or more selected from the group consisting of a subsequent imparting agent, a phosphor, and inorganic particles.

[發明9] [Invention 9]

如發明1至8中任一項之硬化性聚矽氧樹脂組合物,其中進而含有選自由脫模劑、樹脂改質劑、著色劑、稀釋劑、抗菌劑、防黴劑、 調平劑、防垂流劑所組成之群中之一種以上。 The curable polyoxyxene resin composition according to any one of Inventions 1 to 8, which further comprises a release agent, a resin modifier, a colorant, a diluent, an antibacterial agent, an antifungal agent, One or more of the group consisting of a leveling agent and an anti-sagging agent.

[發明10] [Invention 10]

一種硬化物,其係使如發明1至9中任一項之硬化性聚矽氧樹脂組合物硬化而成者。 A cured product obtained by hardening the curable polyoxyxene resin composition according to any one of Inventions 1 to 9.

[發明11] [Invention 11]

一種密封材,其係包含如發明1至9中任一項之硬化性聚矽氧樹脂組合物之硬化物者。 A sealing material comprising the cured product of the curable polyoxynoxy resin composition according to any one of Inventions 1 to 9.

[發明12] [Invention 12]

一種硬化性聚矽氧樹脂組合物之硬化物之製造方法,其係將如發明1至9中任一項之硬化性聚矽氧樹脂組合物於45℃以上、300℃以下進行加熱而使之硬化。 A method for producing a cured product of a curable polyanthracene resin composition, which comprises heating the curable polyanthracene resin composition according to any one of Inventions 1 to 9 at 45 ° C or higher and 300 ° C or lower. hardening.

[發明13] [Invention 13]

一種光半導體裝置,其係以如發明1至9中任一項之硬化性聚矽氧樹脂組合物之硬化物至少將光半導體元件密封而成者。 An optical semiconductor device obtained by sealing at least an optical semiconductor element with a cured product of the curable polyoxyxene resin composition according to any one of Inventions 1 to 9.

[發明14] [Invention 14]

一種半導體用接著劑,其係包含如發明1至9中任一項之硬化性聚矽氧樹脂組合物之硬化物者。 An adhesive for a semiconductor comprising the cured product of the curable polyoxyxene resin composition according to any one of Inventions 1 to 9.

[發明15] [Invention 15]

一種光半導體裝置,其係使用有如發明14之半導體用接著劑者。 An optical semiconductor device using the semiconductor adhesive of Invention 14.

於本說明書中,作為碳數1~3之烷基之具體例,可列舉:甲基、乙基、丙基、異丙基。碳數6~10之芳香族烴基可為經取代或未經取代之芳香族烴基,氫原子之一部分或全部可經氟原子取代。作為具體例,可列舉:苯基、萘基、甲苯基、二甲苯基、3-三氟甲基苯基、4-三氟甲基苯基、3,5-二(三氟甲基苯基)基等。 In the present specification, specific examples of the alkyl group having 1 to 3 carbon atoms include a methyl group, an ethyl group, a propyl group, and an isopropyl group. The aromatic hydrocarbon group having 6 to 10 carbon atoms may be a substituted or unsubstituted aromatic hydrocarbon group, and part or all of the hydrogen atom may be substituted with a fluorine atom. Specific examples include phenyl, naphthyl, tolyl, xylyl, 3-trifluoromethylphenyl, 4-trifluoromethylphenyl, and 3,5-di(trifluoromethylphenyl). ) base.

根據本發明,可提供一種可提供耐熱透明性優異之硬化物之硬 化性聚矽氧樹脂組合物及其硬化物、以及使用彼等之光半導體裝置。 According to the present invention, it is possible to provide a hardened material which can provide excellent heat resistance and transparency. A chemical polyoxymethylene resin composition and a cured product thereof, and an optical semiconductor device using the same.

1‧‧‧密封材 1‧‧‧ sealing material

2‧‧‧光半導體元件 2‧‧‧Optical semiconductor components

3‧‧‧接合線 3‧‧‧bonding line

4‧‧‧反射材 4‧‧‧Reflecting material

5‧‧‧引線框架 5‧‧‧ lead frame

6‧‧‧光半導體基板 6‧‧‧Optical semiconductor substrate

10‧‧‧光半導體裝置 10‧‧‧Optical semiconductor devices

圖1係表示本發明之光半導體裝置之一例之概略剖面圖。 Fig. 1 is a schematic cross-sectional view showing an example of an optical semiconductor device of the present invention.

圖2係表示實施例及比較例中製備之組合物(組合物1-1~組合物1-5、比較用組合物1-1)之剪切黏度與溫度之關係之圖。 Fig. 2 is a graph showing the relationship between the shear viscosity and the temperature of the compositions (composition 1-1 to composition 1-5, comparative composition 1-1) prepared in the examples and the comparative examples.

圖3係表示實施例及比較例中製備之組合物(組合物4-1~組合物4-3、比較用組合物4-1)之剪切黏度與溫度之關係之圖。 Fig. 3 is a graph showing the relationship between the shear viscosity and the temperature of the compositions (composition 4-1 to composition 4-3, comparative composition 4-1) prepared in the examples and the comparative examples.

圖4係表示實施例中製備之組合物(組合物1-1、組合物1-6~組合物1-9)之剪切黏度與時間之關係之圖。 Fig. 4 is a graph showing the relationship between shear viscosity and time of the compositions (composition 1-1, composition 1-6 to composition 1-9) prepared in the examples.

以下,進而詳細說明本發明,但本發明不限定於此。 Hereinafter, the present invention will be described in detail, but the present invention is not limited thereto.

[硬化性聚矽氧樹脂組合物] [Sclerosing Polyoxymethylene Resin Composition]

本發明之硬化性聚矽氧樹脂組合物(以下,有時僅稱為「本發明之組合物」)至少含有特定量之(A)~(C)成分,加熱該組合物而獲得之硬化物可較佳用作光半導體裝置之密封材。以下,對本發明之組合物中所含之各成分加以說明。 The curable polyanthracene resin composition of the present invention (hereinafter sometimes referred to simply as "the composition of the present invention") contains at least a specific amount of the components (A) to (C), and the cured product obtained by heating the composition is obtained. It can be preferably used as a sealing material for an optical semiconductor device. Hereinafter, each component contained in the composition of the present invention will be described.

<(A)成分> <(A) component>

(A)成分係下述式[1]所示且含有與矽原子鍵結之氫原子(SiH基)之聚矽氧樹脂。(A)成分可僅使用一種,亦可併用兩種以上。 The component (A) is a polyfluorene oxide resin represented by the following formula [1] and containing a hydrogen atom (SiH group) bonded to a ruthenium atom. The component (A) may be used alone or in combination of two or more.

[化5](H-SiR1 2O1/2)a(SiR2 2O2/2)b(R3SiO3/2)c(SiO4/2)d [1] (H-SiR 1 2 O 1/2 ) a (SiR 2 2 O 2/2 ) b (R 3 SiO 3/2 ) c (SiO 4/2 ) d [1]

上述式[1]係表示平均組成式。式[1]中,R1為碳數1~3之烷基,2個R1可為相同或相互不同之種類。R2為碳數1~3之烷基,2個R2可為相同或相互不同之種類。R3為碳數1~3之烷基或碳數6~10之芳香族烴基。a、b及c分別為超過0且未達1之範圍內之數,d為0以上且未達1之範圍內之數,滿足a+b+c+d=1。(SiR2 2O2/2)、(R3SiO3/2)及 (SiO4/2)所表示之結構單元中之氧原子分別表示形成矽氧烷鍵之氧原子或形成矽烷醇基之氧原子。 The above formula [1] represents an average composition formula. In the formula [1], R 1 is an alkyl group having 1 to 3 carbon atoms, and two R 1 's may be the same or different from each other. R 2 is an alkyl group having 1 to 3 carbon atoms, and two R 2 's may be the same or different from each other. R 3 is an alkyl group having 1 to 3 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms. a, b, and c are respectively in the range of more than 0 and not up to 1, and d is a number in the range of 0 or more and less than 1, satisfying a+b+c+d=1. The oxygen atoms in the structural unit represented by (SiR 2 2 O 2/2 ), (R 3 SiO 3/2 ), and (SiO 4/2 ) respectively represent an oxygen atom forming a siloxane chain or forming a stanol group. Oxygen atom.

作為R1之碳數1~3之烷基,較佳為甲基、乙基,尤佳為甲基。 The alkyl group having 1 to 3 carbon atoms of R 1 is preferably a methyl group or an ethyl group, and particularly preferably a methyl group.

作為R2之碳數1~3之烷基,較佳為甲基、乙基,尤佳為甲基。 The alkyl group having 1 to 3 carbon atoms of R 2 is preferably a methyl group or an ethyl group, and particularly preferably a methyl group.

作為R3之碳數1~3之烷基,較佳為甲基、乙基,尤佳為甲基。 The alkyl group having 1 to 3 carbon atoms of R 3 is preferably a methyl group or an ethyl group, and particularly preferably a methyl group.

作為R3之碳數6~10之芳香族烴基,較佳為苯基、3-三氟甲基苯基、4-三氟甲基苯基、3,5-二(三氟甲基苯基)基,尤佳為苯基。 The aromatic hydrocarbon group having 6 to 10 carbon atoms of R 3 is preferably a phenyl group, a 3-trifluoromethylphenyl group, a 4-trifluoromethylphenyl group or a 3,5-di(trifluoromethylphenyl group). Base, especially phenyl.

R1、R2及R3之組合並無特別限定。其中,較佳為R1為甲基或乙基,R2為甲基或乙基,R3為甲基、乙基、苯基、3-三氟甲基苯基、4-三氟甲基苯基或3,5-二(三氟甲基苯基)基之任一者,尤佳為R1為甲基,R2為甲基,R3為苯基。 The combination of R 1 , R 2 and R 3 is not particularly limited. Wherein R 1 is methyl or ethyl, R 2 is methyl or ethyl, and R 3 is methyl, ethyl, phenyl, 3-trifluoromethylphenyl, 4-trifluoromethyl Any of a phenyl group or a 3,5-bis(trifluoromethylphenyl) group, particularly preferably R 1 is a methyl group, R 2 is a methyl group, and R 3 is a phenyl group.

a之值若為超過0且未達1之範圍內且滿足a+b+c+d=1,則並無特別限定。a之值較佳為0.05~0.40,尤佳為0.20~0.40。a之值若為0.05以上,則本發明之組合物具有良好之成形性,若為0.40以下,則本發明之硬化物具有良好之機械強度。 The value of a is not particularly limited as long as it exceeds 0 and does not reach the range of 1 and satisfies a+b+c+d=1. The value of a is preferably 0.05 to 0.40, and particularly preferably 0.20 to 0.40. When the value of a is 0.05 or more, the composition of the present invention has good moldability, and if it is 0.40 or less, the cured product of the present invention has good mechanical strength.

b之值若為超過0且未達1之範圍內且滿足a+b+c+d=1,則並無特別限定。b之值較佳為0.10~0.80,尤佳為0.10~0.40。b之值若為0.10以上,則本發明之組合物具有良好之成形性,若為0.80以下,則本發明之硬化物具有良好之機械強度。 The value of b is not particularly limited as long as it exceeds 0 and does not reach the range of 1 and satisfies a+b+c+d=1. The value of b is preferably 0.10 to 0.80, and particularly preferably 0.10 to 0.40. When the value of b is 0.10 or more, the composition of the present invention has good formability, and if it is 0.80 or less, the cured product of the present invention has good mechanical strength.

c之值若為超過0且未達1之範圍內且滿足a+b+c+d=1,則並無特別限定。c之值較佳為0.10~0.80,尤佳為0.30~0.60。c之值若為0.10以上,則本發明之硬化物具有良好之機械強度,若為0.80以下,則本發明之組合物具有良好之成形性。 The value of c is not particularly limited as long as it exceeds 0 and does not reach the range of 1 and satisfies a+b+c+d=1. The value of c is preferably from 0.10 to 0.80, and more preferably from 0.30 to 0.60. When the value of c is 0.10 or more, the cured product of the present invention has good mechanical strength, and if it is 0.80 or less, the composition of the present invention has good formability.

d之值若為0以上且未達1之範圍內且滿足a+b+c+d=1,則並無特別限定。d之值較佳為0~0.70。其中,就本發明之硬化物表現良好之接著強度且表現良好之硬度而言,d之值尤佳為0.10~0.30。再者, 於d之值為0之情形時,上述式[1]中之(SiO4/2)之結構單元不存在。 The value of d is not particularly limited as long as it is 0 or more and does not reach the range of 1 and satisfies a+b+c+d=1. The value of d is preferably from 0 to 0.70. Among them, in the case where the cured product of the present invention exhibits a good bonding strength and a good hardness, the value of d is particularly preferably from 0.10 to 0.30. Further, in the case where the value of d is 0, the structural unit of (SiO 4/2 ) in the above formula [1] does not exist.

a、b、c及d之值較佳為a:b:c:d=0.05~0.40:0.10~0.80:0.10~0.80:0~0.70,尤佳為a:b:c:d=0.20~0.40:0.10~0.40:0.30~0.60:0.10~0.30。 The values of a, b, c and d are preferably a: b: c: d = 0.05 to 0.40: 0.10 to 0.80: 0.10 to 0.80: 0 to 0.70, and more preferably a: b: c: d = 0.20 to 0.40. : 0.10~0.40: 0.30~0.60: 0.10~0.30.

d之值為0時,a、b及c之值較佳為a:b:c=0.05~0.40:0.10~0.80:0.10~0.80。 When the value of d is 0, the values of a, b, and c are preferably a: b: c = 0.05 to 0.40: 0.10 to 0.80: 0.10 to 0.80.

a、b、c及d之值可使用核磁共振裝置測定(A)成分之29Si-NMR譜與1H-NMR譜,互補組合使用彼等而算出。 The values of a, b, c, and d can be calculated by using a nuclear magnetic resonance apparatus to measure the 29 Si-NMR spectrum of the component (A) and the 1 H-NMR spectrum, and using them in a complementary combination.

上述式[1]中,(SiR2 2O2/2)所表示之結構單元可包含下述式[1-2]所表示之結構,即(SiR2 2O2/2)所表示之結構單元中之矽原子所鍵結之氧原子之1個形成矽烷醇基之結構。 In the above formula [1], the structural unit represented by (SiR 2 2 O 2/2 ) may include a structure represented by the following formula [1-2], that is, a structure represented by (SiR 2 2 O 2/2 ) One of the oxygen atoms bonded to the germanium atom in the unit forms a structure of a stanol group.

[化6](R2SiXO1/2) [1-2] [6] (R 2 SiXO 1/2 ) [1-2]

上述式[1-2]中,R2與上述式[1]中之R2含義相同,X表示羥基。 The above formula [1-2], R 2 is the above formula [1] in the same meaning as R 2, X represents a hydroxyl group.

(SiR2 2O2/2)所表示之結構單元包含下述式[1-b]所表示之結構單元中以虛線包圍之部分,進而可包含下述式[1-2-b]所表示之結構單元中以虛線包圍之部分。即,具有R2所表示之基且羥基於末端殘存而形成矽烷醇基之結構單元亦包含於(SiR2 2O2/2)所表示之結構單元中。又,下述式[1-b]、[1-2-b]所表示之結構單元中,Si-O-Si鍵中之氧原子與鄰接之矽原子形成矽氧烷鍵,與鄰接之結構單元共有氧原子。因此,Si-O-Si鍵中之1個氧原子為「O1/2」。 The structural unit represented by (SiR 2 2 O 2/2 ) includes a portion surrounded by a broken line in the structural unit represented by the following formula [1-b], and may further include a formula represented by the following formula [1-2-b] The portion of the structural unit that is surrounded by a dotted line. That is, a structural unit having a group represented by R 2 and having a hydroxyl group remaining at the terminal to form a stanol group is also included in the structural unit represented by (SiR 2 2 O 2/2 ). Further, in the structural unit represented by the following formulas [1-b] and [1-2-b], the oxygen atom in the Si-O-Si bond forms a decane bond with the adjacent ruthenium atom, and the adjacent structure The unit shares an oxygen atom. Therefore, one of the Si-O-Si bonds is "O 1/2 ".

[化7] [Chemistry 7]

上述式[1-b]及[1-2-b]中,R2與上述式[1]中之R2含義相同。上述式[1-2-b]中,X表示羥基。 The above formula [1-b] and [1-2-b], R 2 is the above formula [1] in the same meaning as R 2. In the above formula [1-2-b], X represents a hydroxyl group.

(R3SiO3/2)所表示之結構單元可包含下述式[1-3]或[1-4]所表示之結構,即,(R3SiO3/2)所表示之結構單元中之矽原子所鍵結之氧原子之2個分別形成矽烷醇基之結構或(R3SiO3/2)所表示之結構單元中之矽原子所鍵結之氧原子之1個形成矽烷醇基之結構。 The structural unit represented by (R 3 SiO 3/2 ) may include a structure represented by the following formula [1-3] or [1-4], that is, a structural unit represented by (R 3 SiO 3/2 ) The two oxygen atoms bonded to the atom respectively form a structure of a stanol group or one of the oxygen atoms bonded to the ruthenium atom in the structural unit represented by (R 3 SiO 3/2 ) to form a decyl alcohol group. The structure.

[化8](R3SiX2O1/2) [1-3] (R3SiXO2/2) [1-4] (R 3 SiX 2 O 1/2 ) [1-3] (R 3 SiXO 2/2 ) [1-4]

上述式[1-3]及式[1-4]中,R3與上述式[1]中之R3含義相同,X表示羥基。 The above formula [1-3] and the formula [1-4], R 3 of the above formula [1] in the same meaning as R 3, X represents a hydroxyl group.

(R3SiO3/2)所表示之結構單元包含下述式[1-c]所表示之結構單元中以虛線包圍之部分,進而可包含下述式[1-3-c]或[1-4-c]所表示之結構單元中以虛線包圍之部分。即,具有R3所表示之基且羥基於末端殘存而形成矽烷醇基之結構單元亦包含於(R3SiO3/2)所表示之結構單元中。 The structural unit represented by (R 3 SiO 3/2 ) includes a portion surrounded by a broken line in the structural unit represented by the following formula [1-c], and may further include the following formula [1-3-c] or [1] -4-c] The portion of the structural unit represented by a dotted line. That is, a structural unit having a group represented by R 3 and having a hydroxyl group remaining at the terminal to form a stanol group is also included in the structural unit represented by (R 3 SiO 3/2 ).

[化9] [Chemistry 9]

上述式[1-c]、[1-3-c]及[1-4-c]中之R3與上述式[1]中之R3含義相同。上述式[1-3-c]及[1-4-c]中,X表示羥基。 The above formula [1-c], [1-3 -c] and [1-4-c] R 3 in the above formula [1] in the same meaning as R 3. In the above formulas [1-3-c] and [1-4-c], X represents a hydroxyl group.

上述式[1]中,(SiO4/2)所表示之結構單元可包含下述式[1-5]、[1-5]或[1-7]所表示之結構,即,(SiO4/2)所表示之結構單元中之矽原子所鍵結之氧原子之3個或2個分別形成矽烷醇基之結構或(SiO4/2)所表示之結構單元中之矽原子所鍵結之氧原子之1個形成矽烷醇基之結構。 In the above formula [1], the structural unit represented by (SiO 4/2 ) may include a structure represented by the following formula [1-5], [1-5] or [1-7], that is, (SiO 4 /2 ) three or two oxygen atoms bonded to a ruthenium atom in the structural unit represented by the structure, or a bond of a ruthenium atom in a structural unit represented by (SiO 4/2 ) One of the oxygen atoms forms a structure of a stanol group.

[化10](SiX3O1/2) [1-5] (SiX2O2/2) [1-6] (SiXO3/2) [1-7] (SiX 3 O 1/2 ) [1-5] (SiX 2 O 2/2 ) [1-6] (SiXO 3/2 ) [1-7]

上述式[1-5]、[1-6]及[1-7]中,X表示羥基。 In the above formulas [1-5], [1-6] and [1-7], X represents a hydroxyl group.

(SiO4/2)所表示之結構單元包含下述式[1-d]所表示之結構單元中以虛線包圍之部分,進而可包含下述式[1-5-d]、[1-6-d]或[1-7-d]所表示之結構單元中以虛線包圍之部分。即,羥基於末端殘存而形成矽烷醇基之結構單元亦包含於(SiO4/2)所表示之結構單元中。 The structural unit represented by (SiO 4/2 ) includes a portion surrounded by a broken line in the structural unit represented by the following formula [1-d], and may further include the following formula [1-5-d], [1-6 -d] or a portion surrounded by a broken line in the structural unit represented by [1-7-d]. That is, a structural unit in which a hydroxyl group remains at the terminal to form a stanol group is also included in the structural unit represented by (SiO 4/2 ).

[化11] [11]

上述式[1-5-d]、[1-6-d]及[1-7-d]中,X表示羥基。 In the above formulas [1-5-d], [1-6-d] and [1-7-d], X represents a hydroxyl group.

(A)成分至少含有與矽原子鍵結之氫原子(SiH基),其個數並無特別限定。較佳為於一分子中含有2個以上。就獲得良好之硬化體而言,(A)成分中之與矽原子鍵結之氫原子(SiH基)之含量尤佳為1.0mmol/g~4.0mmol/g。 The component (A) contains at least a hydrogen atom (SiH group) bonded to a ruthenium atom, and the number thereof is not particularly limited. It is preferable to contain two or more in one molecule. In the case of obtaining a good hardened body, the content of the hydrogen atom (SiH group) bonded to the ruthenium atom in the component (A) is preferably from 1.0 mmol/g to 4.0 mmol/g.

(A)成分之質量平均分子量並無特別限定。較佳為500~10,000,進而較佳為800~7,000。若質量平均分子量為500以上則本發明之硬化物具有良好之樹脂強度,若為10,000以下則本發明之組合物具有良好之成形性。其中,d=0時,本發明之硬化物具有優異之機械強度,因此尤佳為3,500~7,000。此處,質量平均分子量係藉由凝膠滲透層析(簡稱:GPC)法而測定,藉由標準聚苯乙烯校準曲線而換算所得之值(於本說明書中,以下相同)。 The mass average molecular weight of the component (A) is not particularly limited. It is preferably 500 to 10,000, and more preferably 800 to 7,000. When the mass average molecular weight is 500 or more, the cured product of the present invention has good resin strength, and if it is 10,000 or less, the composition of the present invention has good formability. Among them, when d = 0, the cured product of the present invention has excellent mechanical strength, and therefore it is particularly preferably from 3,500 to 7,000. Here, the mass average molecular weight is measured by a gel permeation chromatography (abbreviation: GPC) method, and the value obtained by a standard polystyrene calibration curve is converted (in the present specification, the same applies hereinafter).

(A)成分之黏度並無特別限定。就操作作業性之觀點而言,較佳為25℃下之黏度為0.001~10,000,000cP(厘泊),進而較佳為0.01~500,000cP。黏度若超過10,000,000cP則存在成形性劣化之情形,但亦可進行加溫而降低黏度之處置。此處,(A)成分之黏度可藉由旋轉黏度計等而測定。 The viscosity of the component (A) is not particularly limited. From the viewpoint of handling workability, the viscosity at 25 ° C is preferably 0.001 to 10,000,000 cP (centipoise), and more preferably 0.01 to 500,000 cP. If the viscosity exceeds 10,000,000 cP, the formability may be deteriorated, but the treatment may be performed by heating to lower the viscosity. Here, the viscosity of the component (A) can be measured by a rotary viscometer or the like.

(A)成分中含有之Si-OH基之量並無特別限定。較佳為0.5~4.5mmol/g,尤佳為1.0~3.5mmol/g。若Si-OH基之含量超過4.5mmol/g,則存在硬化物中觀察到氣泡之情形。 The amount of the Si-OH group contained in the component (A) is not particularly limited. It is preferably 0.5 to 4.5 mmol/g, and more preferably 1.0 to 3.5 mmol/g. When the content of the Si-OH group exceeds 4.5 mmol/g, bubbles are observed in the cured product.

<(B)成分> <(B) component>

(B)成分係下述式[2]所示且含有與矽原子鍵結之乙烯基(Si-CH=CH2基)之聚矽氧樹脂。(B)成分可僅使用一種,亦可併用兩種以上。 The component (B) is a polyfluorene oxide resin represented by the following formula [2] and containing a vinyl group (Si-CH=CH 2 group) bonded to a ruthenium atom. The component (B) may be used alone or in combination of two or more.

[化12](CH2=CH-SiR4 2O1/2)e(SiR5 2O2/2)f(R6SiO3/2)g(SiO4/2)h [2] (CH 2 =CH-SiR 4 2 O 1/2 ) e (SiR 5 2 O 2/2 ) f (R 6 SiO 3/2 ) g (SiO 4/2 ) h [2]

上述式[2]係表示平均組成式。式[2]中,R4為碳數1~3之烷基,2個R4可為相同或相互不同之種類。R5為碳數1~3之烷基,2個R5可為相同或相互不同之種類。R6為碳數1~3之烷基或碳數6~10之芳香族烴基。e、f及g分別為超過0且未達1之範圍內之數,h為0以上且未達1之範圍內之數,滿足e+f+g+h=1。(SiR5 2O2/2)、(R6SiO3/2)及(SiO4/2)所表示之結構單元中之氧原子分別表示形成矽氧烷鍵之氧原子或形成矽烷醇基之氧原子。 The above formula [2] represents an average composition formula. In the formula [2], R 4 is an alkyl group having 1 to 3 carbon atoms, and two R 4 's may be the same or different from each other. R 5 is an alkyl group having 1 to 3 carbon atoms, and two R 5 's may be the same or different from each other. R 6 is an alkyl group having 1 to 3 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms. e, f, and g are respectively in the range of more than 0 and not up to 1, and h is a number in the range of 0 or more and less than 1, and satisfies e+f+g+h=1. The oxygen atoms in the structural unit represented by (SiR 5 2 O 2/2 ), (R 6 SiO 3/2 ), and (SiO 4/2 ) respectively represent an oxygen atom forming a siloxane chain or forming a stanol group. Oxygen atom.

作為R4之碳數1~3之烷基,較佳為甲基、乙基,尤佳為甲基。 The alkyl group having 1 to 3 carbon atoms of R 4 is preferably a methyl group or an ethyl group, and particularly preferably a methyl group.

作為R5之碳數1~3之烷基,較佳為甲基、乙基,尤佳為甲基。 The alkyl group having 1 to 3 carbon atoms of R 5 is preferably a methyl group or an ethyl group, and particularly preferably a methyl group.

作為R6之碳數1~3之烷基,較佳為甲基、乙基,尤佳為甲基。 The alkyl group having 1 to 3 carbon atoms of R 6 is preferably a methyl group or an ethyl group, and particularly preferably a methyl group.

作為R6之碳數6~10之芳香族烴基,較佳為苯基、3-三氟甲基苯基、4-三氟甲基苯基、3,5-二(三氟甲基苯基)基,尤佳為苯基。 The aromatic hydrocarbon group having 6 to 10 carbon atoms of R 6 is preferably a phenyl group, a 3-trifluoromethylphenyl group, a 4-trifluoromethylphenyl group or a 3,5-di(trifluoromethylphenyl group). Base, especially phenyl.

R4、R5及R6之組合並無特別限定。其中,較佳為R4為甲基或乙基,R5為甲基或乙基,R6為甲基、乙基、苯基、3-三氟甲基苯基、4-三氟甲基苯基或3,5-二(三氟甲基苯基)基之任一者,尤佳為R4為甲基,R5為甲基,R6為甲基或苯基。 The combination of R 4 , R 5 and R 6 is not particularly limited. Wherein R 4 is preferably methyl or ethyl, R 5 is methyl or ethyl, and R 6 is methyl, ethyl, phenyl, 3-trifluoromethylphenyl, 4-trifluoromethyl Any of a phenyl group or a 3,5-bis(trifluoromethylphenyl) group, particularly preferably R 4 is a methyl group, R 5 is a methyl group, and R 6 is a methyl group or a phenyl group.

e之值若為超過0且未達1之範圍內且滿足e+f+g+h=1,則並無特別限定。e之值較佳為0.05~0.40,尤佳為0.15~0.30。若e之值為0.05以上,則本發明之組合物具有良好之成形性,若為0.40以下,則本發明之硬化物具有良好之機械強度。 The value of e is not particularly limited as long as it exceeds 0 and does not reach the range of 1 and satisfies e+f+g+h=1. The value of e is preferably 0.05 to 0.40, and particularly preferably 0.15 to 0.30. When the value of e is 0.05 or more, the composition of the present invention has good formability, and if it is 0.40 or less, the cured product of the present invention has good mechanical strength.

f之值若為超過0且未達1之範圍內且滿足e+f+g+h=1,則並無特別限定。f之值較佳為0.10~0.80,尤佳為0.20~0.70。若f之值為0.10以上,則本發明之組合物具有良好之成形性,若無0.80以下,則本發明之硬化物具有良好之機械強度。 The value of f is not particularly limited as long as it exceeds 0 and does not reach the range of 1 and satisfies e+f+g+h=1. The value of f is preferably 0.10 to 0.80, and particularly preferably 0.20 to 0.70. When the value of f is 0.10 or more, the composition of the present invention has good formability, and if it is not more than 0.80, the cured product of the present invention has good mechanical strength.

g之值若為超過0且未達1之範圍內且滿足e+f+g+h=1,則並無特別限定。g之值較佳為0.10~0.80,尤佳為0.20~0.70。若g之值為0.10以上,則本發明之硬化物具有良好之機械強度,若為0.80以下,則本發明之組合物具有良好之成形性。 The value of g is not particularly limited as long as it exceeds 0 and does not reach the range of 1 and satisfies e+f+g+h=1. The value of g is preferably from 0.10 to 0.80, and particularly preferably from 0.20 to 0.70. When the value of g is 0.10 or more, the cured product of the present invention has good mechanical strength, and if it is 0.80 or less, the composition of the present invention has good formability.

h之值若為超過0且未達1之範圍內且滿足e+f+g+h=1,則並無特別限定。h之值較佳為0~0.70。其中,就本發明之硬化物表現良好之接著強度且表現良好之硬度而言,h之值尤佳為0.10~0.30。再者,於h之值為0之情形時,上述式[2]中之(SiO4/2)之結構單元不存在。 The value of h is not particularly limited as long as it exceeds 0 and does not reach the range of 1 and satisfies e+f+g+h=1. The value of h is preferably from 0 to 0.70. Among them, the value of h is particularly preferably 0.10 to 0.30 in terms of the hardness of the cured product of the present invention which exhibits good adhesion strength and good performance. Further, when the value of h is 0, the structural unit of (SiO 4/2 ) in the above formula [2] does not exist.

e、f、g及h之值較佳為e:f:g:h=0.05~0.40:0.10~0.80:0.10~0.80:0~0.70,尤佳為e:f:g:h=0.20~0.40:0.10~0.40:0.30~0.60:0.10~0.30。 The values of e, f, g, and h are preferably e:f:g:h=0.05~0.40:0.10~0.80:0.10~0.80:0~0.70, especially preferably e:f:g:h=0.20~0.40 : 0.10~0.40: 0.30~0.60: 0.10~0.30.

h之值為0時,e、f及g之值較佳為e:f:g=0.05~0.40:0.10~0.80:0.10~0.80。 When the value of h is 0, the values of e, f, and g are preferably e:f:g=0.05~0.40:0.10~0.80:0.10~0.80.

e、f、g及h之值可使用核磁共振裝置測定(B)成分之29Si-NMR譜與1H-NMR譜,並互補組合使用彼等而算出。 The values of e, f, g, and h can be calculated by using a nuclear magnetic resonance apparatus to measure the 29 Si-NMR spectrum and the 1 H-NMR spectrum of the component (B), and using them in a complementary combination.

上述式[2]中,(SiR5 2O2/2)所表示之結構單元可包含下述式[2-2]所表示之結構,即(SiR5 2O2/2)所表示之結構單元中之矽原子所鍵結之氧原子之1個形成矽烷醇基之結構。 In the above formula [2], the structural unit represented by (SiR 5 2 O 2/2 ) may include a structure represented by the following formula [2-2], that is, a structure represented by (SiR 5 2 O 2/2 ) One of the oxygen atoms bonded to the germanium atom in the unit forms a structure of a stanol group.

[化13](R5SiXO1/2) [2-2] [13] (R 5 SiXO 1/2 ) [2-2]

上述式[2-2]中,R5與上述式[2]中之R5含義相同,X表示羥基。 The above formula [2-2], R 5 is of the formula [2] in the same meaning as R 5, X represents a hydroxyl group.

(SiR5 2O2/2)所表示之結構單元包含下述式[2-b]所表示之結構單元 中以虛線包圍之部分,進而可包含下述式[2-2-b]所表示之結構單元中以虛線包圍之部分。即,具有R5所表示之基且羥基於末端殘存而形成矽烷醇基之結構單元亦包含於(SiR5 2O2/2)所表示之結構單元中。又,下述式[2-b]及[2-2-b]所表示之結構單元中,Si-O-Si鍵中之氧原子與鄰接之矽原子形成矽氧烷鍵,與鄰接之結構單元共有氧原子。因此,Si-O-Si鍵中之1個氧原子為「O1/2」。 The structural unit represented by (SiR 5 2 O 2/2 ) includes a portion surrounded by a broken line in the structural unit represented by the following formula [2-b], and may further include a formula represented by the following formula [2-2-b] The portion of the structural unit that is surrounded by a dotted line. That is, a structural unit having a group represented by R 5 and having a hydroxyl group remaining at the terminal to form a stanol group is also included in the structural unit represented by (SiR 5 2 O 2/2 ). Further, in the structural unit represented by the following formulas [2-b] and [2-2-b], the oxygen atom in the Si-O-Si bond forms a decane bond with the adjacent ruthenium atom, and the adjacent structure The unit shares an oxygen atom. Therefore, one of the Si-O-Si bonds is "O 1/2 ".

上述式[2-b]及[2-2-b]中,R5與上述式[2]中之R5含有相同。上述式[2-2-b]中,X表示羥基。 Formula [2-b] and [2-2-b], R 5 is of the formula [2] R 5 containing the same. In the above formula [2-2-b], X represents a hydroxyl group.

上述式[2]中,(R6SiO3/2)所表示之結構單元可包含下述式[2-3]或[2-4]所表示之結構,即(R6SiO3/2)所表示之結構單元中之矽原子所鍵結之氧原子之2個分別形成矽烷醇基之結構、或(R6SiO3/2)所表示之結構單元中之矽原子所鍵結之氧原子之1個形成矽烷醇基之結構。 In the above formula [2], the structural unit represented by (R 6 SiO 3/2 ) may include a structure represented by the following formula [2-3] or [2-4], that is, (R 6 SiO 3/2 ) Two of the oxygen atoms bonded to the argon atoms in the structural unit to be formed form a stanol group structure, or an oxygen atom bonded to a ruthenium atom in the structural unit represented by (R 6 SiO 3/2 ) One of the structures forming a stanol group.

[化15](R6SiX2O1/2) [2-3] (R5SiXO2/2) [2-4] (R 6 SiX 2 O 1/2 ) [2-3] (R 5 SiXO 2/2 ) [2-4]

上述式[2-3]及[2-4]中,R6與上述式[2]中之R6含有相同,X表示羥基。 The above formula [2-3] and [2-4], R 6 is and [2] of the formula R 6 containing the same, X represents a hydroxyl group.

(R6SiO3/2)所表示之結構單元包含下述式[2-c]所表示之結構單元中以虛線包圍之部分,進而可包含下述式[2-3-c]或[2-4-c]所表示之結 構單元中以虛線包圍之部分。即,具有R6所表示之基且羥基於末端殘存而形成矽烷醇基之結構單元亦包含於(R6SiO3/2)所表示之結構單元中。 The structural unit represented by (R 6 SiO 3/2 ) includes a portion surrounded by a broken line in the structural unit represented by the following formula [2- c ], and may further include the following formula [2-3-c] or [2] -4-c] The portion of the structural unit represented by a dotted line. That is, a structural unit having a group represented by R 6 and having a hydroxyl group remaining at the terminal to form a stanol group is also included in the structural unit represented by (R 6 SiO 3/2 ).

上述式[2-c]、[2-3-c]及[2-4-c]中,R6與上述式[2]中之R6含義相同。上述式[2-3-c]及[2-4-c]中,X表示羥基。 Formula [2-c], [2-3 -c] and [2-4-c], R 6 is of the formula [2] in the same meaning as R 6. In the above formulas [2-3-c] and [2-4-c], X represents a hydroxyl group.

(SiO4/2)所表示之結構單元可包含下述式[2-5]、[2-6]或[2-7]所表示之結構,即(SiO4/2)所表示之結構單元中之矽原子所鍵結之氧原子之3個或2個分別形成矽烷醇基之結構、或(SiO4/2)所表示之結構單元中之矽原子所鍵結之氧原子之1個形成矽烷醇基之結構。 The structural unit represented by (SiO 4/2 ) may include a structure represented by the following formula [2-5], [2-6] or [2-7], that is, a structural unit represented by (SiO 4/2 ) One or two oxygen atoms bonded to a ruthenium atom are formed into a structure of a decyl alcohol group, or one of oxygen atoms bonded to a ruthenium atom in a structural unit represented by (SiO 4/2 ) The structure of the stanol group.

[化17](SiX3O1/2) [2-5] (SiX2O2/2) [2-6] (SiXO3/2) [2-7] (SiX 3 O 1/2 ) [2-5] (SiX 2 O 2/2 ) [2-6] (SiXO 3/2 ) [2-7]

上述式[2-5]、[2-6]及[2-7]中,X表示羥基。 In the above formulas [2-5], [2-6] and [2-7], X represents a hydroxyl group.

(SiO4/2)所表示之結構單元包含下述式[2-d]所表示之結構單元中以虛線包圍之部分,進而可包含下述式[2-5-d]、[2-6-d]或[2-7-d]所表示之結構單元中以虛線包圍之部分。即,羥基於末端殘存而形成矽烷醇基之結構單元亦包含於(SiO4/2)所表示之結構單元中。 The structural unit represented by (SiO 4/2 ) includes a portion surrounded by a broken line in the structural unit represented by the following formula [2-d], and further may include the following formula [2-5-d], [2-6] -d] or a portion surrounded by a broken line in the structural unit represented by [2-7-d]. That is, a structural unit in which a hydroxyl group remains at the terminal to form a stanol group is also included in the structural unit represented by (SiO 4/2 ).

上述式[2-5-d]、[2-6-d]及[2-7-d]中,X表示羥基。 In the above formulas [2-5-d], [2-6-d] and [2-7-d], X represents a hydroxyl group.

(B)成分至少含有與矽原子鍵結之乙烯基(Si-CH=CH2基),其個數並無特別限定。較佳為於一分子中含有2個以上。就獲得良好之硬化體而言,(B)成分中之與矽原子鍵結之乙烯基(Si-CH=CH2基)之含量尤佳為0.5mmol/g~4.0mmol/g。 The component (B) contains at least a vinyl group (Si-CH=CH 2 group) bonded to a ruthenium atom, and the number thereof is not particularly limited. It is preferable to contain two or more in one molecule. In the case of obtaining a good hardened body, the content of the vinyl group (Si-CH=CH 2 group) bonded to the ruthenium atom in the component (B) is preferably from 0.5 mmol/g to 4.0 mmol/g.

(B)成分之質量平均分子量並無特別限定。較佳為500~10,000,進而較佳為800~7,000。若質量平均分子量為500以上則本發明之硬化物具有良好之樹脂強度,若為10,000以下則本發明之組合物具有良好之成形性。其中,h=0時,本發明之硬化物具有優異之機械強度,因此尤佳為3,500~7,000。 The mass average molecular weight of the component (B) is not particularly limited. It is preferably 500 to 10,000, and more preferably 800 to 7,000. When the mass average molecular weight is 500 or more, the cured product of the present invention has good resin strength, and if it is 10,000 or less, the composition of the present invention has good formability. Among them, when h = 0, the cured product of the present invention has excellent mechanical strength, and therefore it is particularly preferably from 3,500 to 7,000.

(B)成分之黏度並無特別限定。就操作作業性之觀點而言,25℃下之黏度較佳為0.001~10,000,000cP,進而較佳為0.001~500,000cP。若黏度超過10,000,000cP則存在成形性劣化之情形,但亦可進行加溫而降低黏度之處置。此處,(B)成分之黏度可藉由旋轉黏度計等而測定。 The viscosity of the component (B) is not particularly limited. The viscosity at 25 ° C is preferably 0.001 to 10,000,000 cP, and more preferably 0.001 to 500,000 cP from the viewpoint of handling workability. If the viscosity exceeds 10,000,000 cP, the formability may be deteriorated, but the treatment may be performed by heating to lower the viscosity. Here, the viscosity of the component (B) can be measured by a rotary viscometer or the like.

(B)成分中含有之Si-OH基之量並無特別限定。Si-OH基之含量較佳為0.5~6.0mmol/g,尤佳為1.0~3.5mmol/g。若Si-OH基之含量超過6.0mmol/g則存在硬化物中觀察到氣泡之虞。 The amount of the Si-OH group contained in the component (B) is not particularly limited. The content of the Si-OH group is preferably from 0.5 to 6.0 mmol/g, particularly preferably from 1.0 to 3.5 mmol/g. If the content of the Si-OH group exceeds 6.0 mmol/g, there is a possibility that bubbles are observed in the cured product.

<(C)成分> <(C) component>

(C)成分係為了促進下述(A)成分中之SiH基與(B)成分中之Si-CH=CH2基之加成硬化反應而調配。(C)成分可單獨使用一種亦可併用兩種以上。(C)成分之種類並無特別限定。具體而言,可例示:氯鉑酸、醇改性氯鉑酸、鉑-羰基乙烯基甲基錯合物、鉑-二乙烯基四甲基二矽氧烷錯合物(卡斯特觸媒(Karstedt's catalyst))、鉑-環乙烯基甲基矽氧烷錯合物、或鉑-辛醛錯合物等。其中,較佳為鉑-二乙烯基四甲基二矽氧烷錯合物(卡斯特觸媒)、鉑-環乙烯基甲基矽氧烷錯合物。 The component (C) is prepared in order to promote the addition hardening reaction of the SiH-CH=CH 2 group in the component (B) and the component (B). The component (C) may be used alone or in combination of two or more. The type of the component (C) is not particularly limited. Specifically, chloroplatinic acid, alcohol-modified chloroplatinic acid, platinum-carbonylvinylmethyl complex, and platinum-divinyltetramethyldioxane complex (Castel catalyst) can be exemplified. (Karstedt's catalyst)), a platinum-cyclovinylmethyl oxime complex, or a platinum-octanal complex. Among them, a platinum-divinyltetramethyldioxane complex (caster catalyst) and a platinum-cyclovinylmethyloxane complex are preferable.

<其他添加物> <Other Additives>

本發明之組合物中,除上述(A)~(C)成分以外,亦可以提高該組合物之保存穩定性、操作作業性,調整硬化過程中之矽氫化反應性為目的而調配硬化延遲劑。本發明之組合物可於較低之溫度下成為硬化物,故而可較佳用於向對熱較弱之光半導體構件之塗佈、密封。另一方面,根據塗佈、密封之作業環境,就本發明之組合物之保存經時穩定性或操作作業性之觀點而言,有時亦較佳為為了調整硬化速度而調配硬化延遲劑。作為硬化延遲劑之種類,若為對(C)成分具有硬化延遲效果之化合物則並無特別限定,亦可使用先前公知者。例如,可列舉:含有脂肪族不飽和鍵之化合物、有機磷化合物、含氮化合物、有機硫化合物、有機過氧化物等。彼等化合物可使用單一種類,亦可併用複數種。 In the composition of the present invention, in addition to the above components (A) to (C), it is also possible to improve the storage stability and handling workability of the composition, and to adjust the hardening retardant for the purpose of adjusting the hydrogenation reactivity during the hardening process. . The composition of the present invention can be used as a cured product at a relatively low temperature, so that it can be preferably used for coating and sealing of a relatively weak thermal semiconductor member. On the other hand, from the viewpoint of the storage stability and handling workability of the composition of the present invention from the viewpoint of the coating and sealing work environment, it is also preferred to adjust the hardening retarder in order to adjust the curing rate. The type of the hardening retarder is not particularly limited as long as it has a curing retarding effect on the component (C), and a conventionally known one can also be used. For example, a compound containing an aliphatic unsaturated bond, an organic phosphorus compound, a nitrogen-containing compound, an organic sulfur compound, an organic peroxide, or the like can be given. These compounds may be used in a single species or in combination.

作為含有脂肪族不飽和鍵之化合物,具體可列舉:2-甲基-3-丁炔-2-醇、2-苯基-3-丁炔-2-醇、3,5-二甲基-1-己炔-3-醇、1-乙炔基-1-環己醇等丙炔醇類,烯-炔化合物類,順丁烯二酸酐,順丁烯二酸二甲酯等順丁烯二酸酯類等。 Specific examples of the compound containing an aliphatic unsaturated bond include 2-methyl-3-butyn-2-ol, 2-phenyl-3-butyn-2-ol, and 3,5-dimethyl- Propargyl alcohols such as 1-hexyn-3-ol, 1-ethynyl-1-cyclohexanol, ene-yne compounds, maleic anhydride, dimethyl maleate, etc. Acid esters, etc.

作為有機磷化合物,具體可列舉:三有機膦類、二有機膦類、有機膦類、三有機亞磷酸酯類等。 Specific examples of the organophosphorus compound include triorganophosphines, diorganophosphines, organophosphines, and triorganophosphites.

作為含氮化合物,具體可列舉:N,N,N',N'-四甲基乙二胺、N,N,N',N'-四乙基乙二胺等N,N,N',N'-四取代伸烷基二胺類,N,N-二甲基乙二胺、N,N-二乙基乙二胺、N,N-二丁基乙二胺、N,N-二丁基-1,3-丙二胺、N,N-二甲基-1,3-丙二胺、N,N-二丁基-1,4-丁二胺等N,N-二取代伸烷基二胺類,三丁胺等三取代胺,苯并三唑、2,2'-聯吡啶等。 Specific examples of the nitrogen-containing compound include N, N, N', N'-tetramethylethylenediamine, N, N, N', N'-tetraethylethylenediamine, and the like, N, N, N', N'-tetrasubstituted alkylenediamines, N,N-dimethylethylenediamine, N,N-diethylethylenediamine, N,N-dibutylethylenediamine, N,N-di N,N-disubstituted extensions such as butyl-1,3-propanediamine, N,N-dimethyl-1,3-propanediamine, N,N-dibutyl-1,4-butanediamine Alkyldiamines, trisubstituted amines such as tributylamine, benzotriazole, 2,2'-bipyridine, and the like.

作為有機硫化合物,具體可列舉:有機硫醇類、二有機硫醚類、硫化氫、苯并噻唑、噻唑、苯并噻唑二硫醚等。 Specific examples of the organic sulfur compound include organic mercaptans, diorganosulfides, hydrogen sulfide, benzothiazole, thiazole, and benzothiazole disulfide.

作為有機過氧化物,具體可列舉:過氧化二第三丁基、過氧化二異丙苯、過氧化苯甲醯、過苯甲酸第三丁酯等。彼等氧化延遲劑中,較佳為含有脂肪族不飽和鍵之化合物、含氮化合物,較佳為順丁烯二酸酯類、丙炔醇類、N,N,N',N'-四取代伸烷基二胺類,尤佳為順丁烯二酸二甲酯、2-甲基-3-丁炔-2-醇、1-乙炔基-1-環己醇、N,N,N',N'-四甲基乙二胺。 Specific examples of the organic peroxide include ditributyl peroxide, dicumyl peroxide, benzammonium peroxide, and tert-butyl perbenzoate. Among the oxidative retarders, preferred are compounds containing an aliphatic unsaturated bond, nitrogen-containing compounds, preferably maleic esters, propynols, N, N, N', N'-four. Substituted alkylenediamines, especially dimethyl maleate, 2-methyl-3-butyn-2-ol, 1-ethynyl-1-cyclohexanol, N, N, N ', N'-tetramethylethylenediamine.

本發明之組合物中之硬化延遲劑之含量並無特別限定。通常,相對於組合物中含有之(C)成分中之鉑原子1當量,添加硬化延遲劑20~200當量即可,但並不限於此。藉由硬化延遲劑獲得之硬化延遲效果之程度根據該硬化延遲劑之化學結構而有所不同。因此,較佳為根據所使用之硬化延遲劑之種類,將其調配量調整為最適量。藉由添加最適量之硬化延遲劑,本發明之組合物成為室溫(尤其指未加熱或冷卻之環境溫度,通常為15~30℃;以下相同)下之長期儲存穩定性及加熱硬化性優異者。 The content of the hardening retarder in the composition of the present invention is not particularly limited. Usually, the hardening retarder may be added in an amount of 20 to 200 equivalents per equivalent of the platinum atom in the component (C) contained in the composition, but is not limited thereto. The degree of hardening retardation effect obtained by hardening the retarder varies depending on the chemical structure of the hardening retarder. Therefore, it is preferred to adjust the blending amount to an optimum amount depending on the type of the hardening retarder to be used. By adding an optimum amount of the hardening retarder, the composition of the present invention is excellent in long-term storage stability and heat hardenability at room temperature (especially at an ambient temperature of unheated or cooled, usually 15 to 30 ° C; the same below) By.

本發明之組合物中,以提高其接著性為目的,除上述(A)~(C)成分以外亦可調配接著賦予劑。作為該接著賦予劑,可例示矽烷偶合劑或其水解縮合物等。作為矽烷偶合劑,可例示:γ-縮水甘油氧基丙基三甲氧基矽烷等含有環氧基之矽烷偶合劑、含有(甲基)丙烯醯基之矽烷偶合劑、含有異氰酸酯基之矽烷偶合劑、含有異氰尿酸酯基之矽烷 偶合劑、含有胺基之矽烷偶合劑、含有巰基之矽烷偶合劑等公知者。本發明之組合物中之該接著賦予劑之含量並無特別限定。本發明之組合物中,較佳為1~20質量%之範圍內,尤佳為5~15質量%之範圍內。 In the composition of the present invention, in addition to the above components (A) to (C), a subsequent addition agent may be added for the purpose of improving the adhesion. Examples of the adhesion-imparting agent include a decane coupling agent or a hydrolysis-condensation product thereof. Examples of the decane coupling agent include an epoxy group-containing decane coupling agent such as γ-glycidoxypropyltrimethoxy decane, a (meth)acryl fluorenyl group-containing decane coupling agent, and an isocyanate group-containing decane coupling agent. Isocyanurate-containing decane A known coupling agent, an amine group-containing decane coupling agent, and a mercapto group-containing decane coupling agent are known. The content of the adhesion-imparting agent in the composition of the present invention is not particularly limited. The composition of the present invention is preferably in the range of 1 to 20% by mass, particularly preferably in the range of 5 to 15% by mass.

為抑制硬化物之著色、氧化劣化等之發生,可於本發明之組合物中添加先前公知之抗氧化劑。作為此種抗氧化劑,可列舉:酚系抗氧化劑、硫醚系抗氧化劑、磷系抗氧化劑等。其中,較佳為酚系抗氧化劑、硫醚系抗氧化劑,尤佳為硫醚系抗氧化劑。彼等抗氧化劑可單獨使用一種,亦可併用兩種以上。 In order to suppress the occurrence of coloration, oxidative degradation, and the like of the cured product, a previously known antioxidant may be added to the composition of the present invention. Examples of such an antioxidant include a phenolic antioxidant, a thioether antioxidant, and a phosphorus antioxidant. Among them, a phenol-based antioxidant or a thioether-based antioxidant is preferred, and a thioether-based antioxidant is particularly preferred. These antioxidants may be used alone or in combination of two or more.

作為酚系抗氧化劑,可列舉:1,3,5-三(3,5-二-第三丁基-4-羥基苄基)-1,3,5-三-2,4,6-(1H,3H,5H)-三酮、4,4',4'-(1-甲基丙基-3-亞基)三(6-第三丁基-間甲酚、6,6'-二-第三丁基-4,4'-亞丁基-二-間甲酚、十八烷基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯、季戊四醇四[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、3,9-雙{2-[3-(3-第三丁基-4-羥基-5-甲基苯基)丙醯氧基]-1,1-二甲基乙基}-2,4,8,10-四氧雜螺[5.5]十一烯、1,3,5-三(3,5-二-第三丁基-4-羥基苯基甲基)-2,4,6-三甲基苯等。 As the phenolic antioxidant, 1,3,5-tris(3,5-di-t-butyl-4-hydroxybenzyl)-1,3,5-three can be mentioned. -2,4,6-(1H,3H,5H)-Trione, 4,4',4'-(1-methylpropyl-3-ylidene)tris(6-tert-butyl-intermediate Phenol, 6,6'-di-tert-butyl-4,4'-butylidene-di-m-cresol, octadecyl-3-(3,5-di-t-butyl-4-hydroxyl Phenyl)propionate, pentaerythritol tetrakis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 3,9-double {2-[3-(3- Tributyl-4-hydroxy-5-methylphenyl)propanoxy]-1,1-dimethylethyl}-2,4,8,10-tetraoxaspiro[5.5]undecene 1,3,5-tris(3,5-di-t-butyl-4-hydroxyphenylmethyl)-2,4,6-trimethylbenzene, and the like.

作為硫醚系抗氧化劑,可列舉:2,2-雙({[3-(十二烷基硫基)丙醯基]氧基}甲基)-1,3-丙二基=雙[3-(十二烷基硫基)丙酸酯]、二(十三烷基)3,3'-硫基二丙酸酯等。作為磷系抗氧化劑,可列舉:3,9-雙(十八烷氧基)-2,4,8,10-四氧-3,9-二磷螺環[5,5]十一烯、3,9-雙(2,6-二-第三丁基-4-甲基苯氧基)-2,4,8,10-四氧-3,9-二磷螺環[5,5]十一烯、2,2'-亞甲基雙(4,6-二-第三丁基苯基)-2-乙基己基亞磷酸酯、亞磷酸三(2,4-二第三丁基苯基)酯、亞磷酸三(壬基苯基)酯、四-C12-15-烷基(丙-2,2-二基雙(4,1-伸苯基))雙(亞磷酸酯)、亞磷酸2-乙基己基二苯酯、亞磷酸異癸基二苯酯、亞磷酸三異癸酯、亞磷酸三苯酯等。 Examples of the thioether-based antioxidant include 2,2-bis({[3-(dodecylthio)propenyl)oxy}methyl)-1,3-propanediyl=bis[3] -(dodecylthio)propionate], di(tridecyl)3,3'-thiodipropionate, and the like. Examples of the phosphorus-based antioxidant include 3,9-bis(octadecyloxy)-2,4,8,10-tetraoxy-3,9-diphosphorylcyclo[5,5]undecene. 3,9-bis(2,6-di-t-butyl-4-methylphenoxy)-2,4,8,10-tetraoxa-3,9-diphosphine spiro[5,5] Undecene, 2,2'-methylenebis(4,6-di-t-butylphenyl)-2-ethylhexylphosphite, tris(2,4-di-t-butyl) Phenyl) ester, tris(nonylphenyl) phosphite, tetra-C 12-15 -alkyl (propane-2,2-diylbis(4,1-phenylene)) bis(phosphite) ), 2-ethylhexyl diphenyl phosphite, isodecyl diphenyl phosphite, triisodecyl phosphite, triphenyl phosphite, and the like.

該抗氧化劑可使用市售品,亦可使用合成者。作為市售品,可 例示:Adekastab(ADEKA公司製造):AO-20、AO-30、AO-40、AO-50、AO-50F、AO-60、AO-60G、AO-80、AO-330、AO-412S、AO-503、PEP-8、PEP-8W、PEP-36、PEP-36A、HP-10、2112、2112RG、1178、1500、C、135A、3010、TPP等。 Commercially available products can be used as the antioxidant, and a synthesizer can also be used. As a commercial item, Example: Adekastab (made by ADEKA): AO-20, AO-30, AO-40, AO-50, AO-50F, AO-60, AO-60G, AO-80, AO-330, AO-412S, AO -503, PEP-8, PEP-8W, PEP-36, PEP-36A, HP-10, 2112, 2112 RG, 1178, 1500, C, 135A, 3010, TPP, and the like.

作為使用該抗氧化劑之情形時之調配量,若為不損害本發明之硬化物之透明性等特徵之範圍且為作為抗氧化劑之有效量,則並無特別限定。相對於本發明之組合物之合計質量,可調配0.001~2質量%,較佳為調配0.01~1質量%。若為上述範圍內之調配量,則可充分發揮抗氧化能力,故而可抑制著色、白濁、氧化劣化等之發生,且可獲得工學性特性優異之硬化物。 The blending amount in the case of using the antioxidant is not particularly limited as long as it does not impair the range of characteristics such as transparency of the cured product of the present invention and is an effective amount as an antioxidant. The total mass of the composition of the present invention can be adjusted to 0.001 to 2% by mass, preferably 0.01 to 1% by mass. When the amount is within the above range, the antioxidant ability can be sufficiently exhibited, so that occurrence of coloring, white turbidity, oxidative degradation, and the like can be suppressed, and a cured product excellent in workability can be obtained.

為了對太陽光線、螢光燈等光能導致之光劣化賦予抵抗性,可於本發明之組合物中添加先前公知之光穩定劑。作為該光穩定劑,可較佳使用捕捉光氧化(光劣化)所生成之自由基之受阻胺系穩定劑,亦可藉由與上述抗氧化劑併用而進一步提高抗氧化效果。作為該光穩定劑之具體例,可列舉:癸二酸雙(2,2,6,6-四甲基-4-哌啶基)酯、4-苯甲醯基-2,2,6,6-四甲基哌啶、四(1,2,2,6,6-五甲基-4-哌啶基)丁烷-1,2,3,4-四羧酸酯、碳酸雙(1-十一烷氧基-2,2,6,6-四甲基哌啶-4-基)酯等。其中,較佳為癸二酸雙(2,2,6,6-四甲基-4-哌啶基)酯。 In order to impart resistance to photodegradation caused by light energy such as sunlight or fluorescent lamps, a previously known light stabilizer may be added to the composition of the present invention. As the light stabilizer, a hindered amine-based stabilizer capable of capturing a radical generated by photooxidation (photodegradation) can be preferably used, and the antioxidant effect can be further enhanced by using it together with the above-mentioned antioxidant. Specific examples of the light stabilizer include bis(2,2,6,6-tetramethyl-4-piperidyl) sebacate and 4-benzylidene-2,2,6. 6-Tetramethylpiperidine, tetrakis(1,2,2,6,6-pentamethyl-4-piperidinyl)butane-1,2,3,4-tetracarboxylate, carbonic acid double (1 - undecyloxy-2,2,6,6-tetramethylpiperidin-4-yl)ester and the like. Among them, bis(2,2,6,6-tetramethyl-4-piperidyl) sebacate is preferred.

該光穩定劑可使用市售品,亦可使用合成者。作為市售品,可例示:Adekastab(ADEKA公司製造):LA-77Y、LA-77G、LA-82等。 Commercially available products can be used as the light stabilizer, and a synthesizer can also be used. As a commercial item, Adekastab (made by Adeka Corporation): LA-77Y, LA-77G, LA-82, etc. are illustrated.

作為使用該光穩定劑之情形時之調配量,若為不損害本發明之硬化物之透明性等特徵之範圍且為作為光穩定劑之有效量,則並無特別限定。相對於本發明之硬化性聚矽氧樹脂組合物之合計質量,可調配0.01~5質量%,較佳為調配0.05~0.5質量%。 The blending amount in the case of using the light stabilizer is not particularly limited as long as it does not impair the range of characteristics such as transparency of the cured product of the present invention and is an effective amount as a light stabilizer. The total mass of the curable polyoxyxene resin composition of the present invention can be adjusted to 0.01 to 5% by mass, preferably 0.05 to 0.5% by mass.

可於本發明之組合物中調配作為任意成分之螢光體。該螢光體之種類並無特別限定。例如可列舉:發光二極體(LED)中廣泛利用之 包含氧化物系螢光體、氮氧化物系螢光體、氮化物系螢光體、硫化物系螢光體、氧硫化物系螢光體等之黃色、紅色、綠色、藍色發光螢光體。 A phosphor as an optional component can be formulated in the composition of the present invention. The type of the phosphor is not particularly limited. For example, it can be cited that it is widely used in light-emitting diodes (LEDs). Yellow, red, green, and blue luminescent fluorescent light including an oxide-based phosphor, an oxynitride-based phosphor, a nitride-based phosphor, a sulfide-based phosphor, and an oxysulfide-based phosphor body.

作為氧化物系螢光體,可列舉:包含鈰離子之釔、鋁、石榴石系之YAG(Yttrium Aluminum Garnet)系綠色~黃色發光螢光體,包含鈰離子之鋱、鋁、石榴石系之TAG(terbium aluminum garnet)系黃色發光螢光體,包含鈰或銪離子之矽酸鹽系綠色~黃色發光螢光體等。作為氮氧化物螢光體,可列舉:包含銪離子之矽、鋁、氧、氮系之矽鋁氮氧化物(sialon)系紅色~綠色發光螢光體等。作為氮化物系螢光體,可列舉:包含銪離子之鈣、總、鋁、矽、氮系之CASN(AlSiN3:Eu)系紅色發光螢光體等。作為硫化物系,可列舉:包含銅離子或鋁離子之ZnS系綠色發色螢光體等。作為氧硫化物系螢光體,可列舉:包含銪離子之Y2O2S系紅色發光螢光體等。彼等螢光體可單獨使用一種,亦可使用兩種以上之混合物。 Examples of the oxide-based phosphor include a YAG (Yttrium Aluminum Garnet)-based green-yellow luminescent phosphor containing cerium ions, aluminum, and garnet, and a cerium-containing cerium, aluminum, or garnet system. TAG (terbium aluminum garnet) is a yellow-emitting phosphor, and includes a bismuth or strontium ion citrate-based green-yellow luminescent phosphor. Examples of the oxynitride phosphor include cerium ions containing cerium ions, aluminum, oxygen, and nitrogen-based sialon-based red-green luminescent phosphors. Examples of the nitride-based phosphor include a calcium-containing cerium ion, a total of aluminum, cerium, and a nitrogen-based CASN (AlSiN 3 :Eu)-based red luminescent phosphor. Examples of the sulfide system include a ZnS-based green color-emitting phosphor containing copper ions or aluminum ions. Examples of the oxysulfide-based phosphor include a Y 2 O 2 S-based red light-emitting phosphor containing cerium ions. These phosphors may be used singly or in combination of two or more.

該螢光體之調配量並無特別限定。本發明之組合物中,較佳為10~70質量%之範圍內,尤佳為20~50質量%之範圍內。 The blending amount of the phosphor is not particularly limited. The composition of the present invention is preferably in the range of 10 to 70% by mass, particularly preferably in the range of 20 to 50% by mass.

本發明之組合物中,為提高其硬化物之光學特性或作業性、機械特性、物理化學特性,可調配無機粒子。 In the composition of the present invention, inorganic particles may be blended in order to improve the optical properties, workability, mechanical properties, and physicochemical properties of the cured product.

上述無機粒子之種類可根據目的而選擇,又,可調配單一種類,亦可組合複數種而調配。又,為改善分散性,無機粒子可藉由矽烷偶合劑等表面處理劑進行表面處理。 The type of the above inorganic particles may be selected according to the purpose, and a single type may be added, or a plurality of types may be combined and formulated. Further, in order to improve the dispersibility, the inorganic particles may be surface-treated with a surface treatment agent such as a decane coupling agent.

作為上述無機粒子之種類,可例示:二氧化矽、鈦酸鋇、氧化鈦、氧化鋯、氧化鈮、氧化鋁、氧化鈰、氧化釔等無機氧化物粒子或氮化矽、氮化硼、碳化矽、氮化鋁等氮化物粒子或碳化合物粒子、金剛石粒子等,亦可根據目的而選擇其他物質,並不限定於彼等。 Examples of the type of the inorganic particles include inorganic oxide particles such as cerium oxide, barium titanate, titanium oxide, zirconium oxide, cerium oxide, aluminum oxide, cerium oxide, and cerium oxide, or cerium nitride, boron nitride, and carbonization. Nitride particles such as ruthenium or aluminum nitride, carbon compound particles, diamond particles, and the like may be selected depending on the purpose, and are not limited thereto.

上述無機粒子之形態可為粉體狀、漿料狀等根據目的而決定之 任意形態。較佳為根據所要求之透明性,與本發明之硬化物之折射率相同或作為水系、溶劑系之透明溶膠而調配於本發明之組合物中。 The form of the inorganic particles may be determined according to the purpose such as a powder form or a slurry form. Any form. It is preferably formulated in the composition of the present invention in accordance with the desired transparency, the refractive index of the cured product of the present invention, or as a water-based or solvent-based transparent sol.

調配之上述無機粒子之平均粒徑並無特別限定,可使用根據目的而決定之平均粒徑者。通常為下述螢光體之粒子之1/10以下左右。再者,無機粒子之平均粒徑係指藉由掃描式電子顯微鏡(簡稱:SEM)觀察,自50個以上之粒子中選擇任意20個粒子測定長徑時之算術平均值。 The average particle diameter of the inorganic particles to be blended is not particularly limited, and those having an average particle diameter determined according to the purpose can be used. Usually, it is about 1/10 or less of the particles of the following phosphor. In addition, the average particle diameter of the inorganic particles means an arithmetic mean value when a long diameter is measured by selecting any 20 particles from 50 or more particles as observed by a scanning electron microscope (abbreviation: SEM).

上述無機粒子之調配量若不損害本發明之硬化物之耐熱透明性等特徵,則為任意。若無機粒子之調配量過少,則有時無法獲得所期望之效果,若過多則有時對硬化物之耐熱透明性、密接性、透明性、成形性、硬度等諸特性產生不良影響。可調配1~50質量%左右,較佳為調配5~35質量%左右。 The amount of the inorganic particles to be blended is arbitrary unless the heat-resistant transparency of the cured product of the present invention is not impaired. When the amount of the inorganic particles is too small, the desired effect may not be obtained, and if it is too large, the properties such as heat-resistant transparency, adhesion, transparency, moldability, and hardness of the cured product may be adversely affected. It can be adjusted to about 1~50% by mass, preferably about 5~35质量%.

除彼等之外,本發明之組合物亦可於不損害硬化物之透明性等特徵之範圍內含有脫模劑、樹脂改質劑、著色劑、稀釋劑、抗菌劑、防黴劑、調平劑、防垂流劑等。 In addition to these, the composition of the present invention may contain a release agent, a resin modifier, a colorant, a diluent, an antibacterial agent, an antifungal agent, and a tune within a range that does not impair the transparency of the cured product. Flat agent, anti-sagging agent, etc.

<(A)成分、(B)成分及(C)成分之調配量> <Formation amount of (A) component, (B) component, and (C) component>

本發明之組合物中之(A)成分與(B)成分之調配比並無特別限定。基本以(A)成分之分子中含有之SiH基與(B)成分之分子中含有之Si-CH=CH2基之莫耳比為基準進行調配。具體而言,較佳為(A)成分之分子中含有之SiH基之莫耳數:(B)成分之分子中含有之Si-CH=CH2基之莫耳數為0.8:0.2~0.5:0.5之範圍。若SiH基之莫耳數相對於Si-CH=CH2基之莫耳數之比為0.8以下,則本發明之組合物具有良好之成形性,若為0.5以上,則本發明之硬化物具有良好之耐熱透明性。 The compounding ratio of the component (A) to the component (B) in the composition of the present invention is not particularly limited. The preparation is carried out based on the molar ratio of the Si—CH=CH 2 group contained in the molecule of the (H) component and the Si—CH=CH 2 group. Specifically, the number of moles of the SiH group contained in the molecule of the component (A) is preferably: the number of moles of the Si—CH=CH 2 group contained in the molecule of the component (B) is 0.8: 0.2 to 0.5: The range of 0.5. When the ratio of the number of moles of the SiH group to the number of moles of the Si—CH=CH 2 group is 0.8 or less, the composition of the present invention has good formability, and if it is 0.5 or more, the cured product of the present invention has Good heat and transparency.

本發明之組合物中之(C)成分之調配量係基於(A)成分與(B)成分與(C)成分之合計質量,(C)成分中之鉑原子以質量單位計較佳為0.003~3.0ppm之範圍內之量,更佳為0.003~2.0ppm。若(C)成分之調配 量為0.003ppm以上,則(A)成分與(B)成分之加成硬化反應順利進行,若為3.0ppm以下,則所得硬化物具有優異之耐熱透明性,故而可抑制長時間加熱所導致之硬化物之變色。於上述範圍內,(C)成分之調配量越少則存在本發明之硬化物具有越優異之耐熱透明性之傾向,因此(C)成分之調配量越少越好。 The compounding amount of the component (C) in the composition of the present invention is based on the total mass of the component (A) and the component (B) and the component (C), and the platinum atom in the component (C) is preferably 0.003 in mass units. The amount in the range of 3.0 ppm is more preferably 0.003 to 2.0 ppm. If the (C) component is blended When the amount is 0.003 ppm or more, the addition hardening reaction of the component (A) and the component (B) proceeds smoothly. When the amount is 3.0 ppm or less, the obtained cured product has excellent heat-resistant transparency, so that heating due to prolonged heating can be suppressed. The discoloration of the hardened material. When the amount of the component (C) is less than the above, the cured product of the present invention tends to have excellent heat-resistant transparency. Therefore, the amount of the component (C) is preferably as small as possible.

本發明之組合物中之(A)成分與(B)成分中之矽烷醇基(Si-OH基)之總含量可為0.5~5.0mmol/g,較佳為1.0~3.0mmol/g,尤佳為1.5~3.0mmol/g。於超過5.0mmol/g之情形時,有時自該組合物製作之硬化物中產生氣泡。該氣泡之產生成為硬化物之透明性或耐熱透明性下降之原因之一。又,於超過5.0mmol/g之情形時,存在該組合物之硬化未充分進行,無法獲得所期望之硬化物之虞。 The total content of the stanol group (Si-OH group) in the component (A) and the component (B) in the composition of the present invention may be 0.5 to 5.0 mmol/g, preferably 1.0 to 3.0 mmol/g, particularly Good is 1.5~3.0mmol/g. When it exceeds 5.0 mmol/g, bubbles may be generated from the hardened material produced by the composition. The generation of the bubble is one of the causes of the decrease in transparency or heat-resistant transparency of the cured product. Further, when it exceeds 5.0 mmol/g, the curing of the composition is not sufficiently performed, and the desired cured product cannot be obtained.

其中,於(A)成分中d=0,質量平均分子量為3,500~7,000,(B)成分中h=0,質量平均分子量為3,500~7,000之情形時,(A)成分與(B)成分中之矽烷醇基(Si-OH基)之總含量可為1.5~5.0mmol/g,較佳為1.7~3.0mmol/g,因可獲得對各種尺寸之封裝體均顯示優異之密接性之硬化體,故而尤佳為1.9~2.7mmol/g。 Among them, in the component (A), d=0, the mass average molecular weight is 3,500 to 7,000, the component (B) has h=0, and the mass average molecular weight is 3,500 to 7,000, in the components (A) and (B). The total content of the stanol group (Si-OH group) may be from 1.5 to 5.0 mmol/g, preferably from 1.7 to 3.0 mmol/g, since a hardened body exhibiting excellent adhesion to a package of various sizes can be obtained. Therefore, it is especially preferred to be 1.9~2.7mmol/g.

(A)成分與(B)成分中之矽烷醇基(Si-OH基)之含量可對各成分使用核磁共振裝置測定29Si-NMR譜與1H-NMR譜,互補組合使用彼等而算出。 The content of the stanol group (Si-OH group) in the component (A) and the component (B) can be measured by using a nuclear magnetic resonance apparatus for 29 Si-NMR spectrum and 1 H-NMR spectrum, and the complementary combination is used to calculate the content of each component. .

本發明之組合物之黏度並無特別限定。就操作作業性之觀點而言,25℃下之黏度較佳為0.001~10,000,000cP,進而較佳為0.001~500,000cP。若黏度超過10,000,000cP則存在成形性劣化之情形,但亦可進行加溫而降低黏度之處置。本發明之組合物之黏度可藉由旋轉黏度計等而測定。 The viscosity of the composition of the present invention is not particularly limited. The viscosity at 25 ° C is preferably 0.001 to 10,000,000 cP, and more preferably 0.001 to 500,000 cP from the viewpoint of handling workability. If the viscosity exceeds 10,000,000 cP, the formability may be deteriorated, but the treatment may be performed by heating to lower the viscosity. The viscosity of the composition of the present invention can be measured by a rotary viscometer or the like.

<硬化性聚矽氧樹脂組合物之製備> <Preparation of Curable Polyoxynoxy Resin Composition>

本發明之組合物可藉由調配(A)成分與(B)成分與(C)成分及視需 要之其他添加物而製備。較佳為(A)成分、(B)成分、(C)成分、視需要添加之添加物藉由混合而實質均勻分散。混合方法並無特別限定。例如可採用萬能混練機、捏合機等混合方法。又,(C)成分可預先與(A)成分及/或(B)成分混合。又,為了穩定地長時間儲存,將(B)成分與(C)成分保持於另外之容器中,例如可預先將含有(A)成分之一部分及(C)成分之第一組合物與含有(A)成分之殘留部分及(B)成分之第二組合物,分別保存於不同之容器中,於使用前混合而成為本發明之組合物,藉由減壓而脫泡從而供給使用。 The composition of the present invention can be formulated by (A) component and (B) component and (C) component and as needed Prepared with other additives. It is preferred that the component (A), the component (B), the component (C), and the additive to be added as needed are substantially uniformly dispersed by mixing. The mixing method is not particularly limited. For example, a mixing method such as a universal kneader or a kneader can be employed. Further, the component (C) may be mixed with the component (A) and/or the component (B) in advance. Further, in order to stably store for a long period of time, the component (B) and the component (C) are held in another container, and for example, the first composition containing the component (A) and the component (C) may be contained in advance (for example). The residue of the component A and the second component of the component (B) are separately stored in different containers, and are mixed into the composition of the present invention before use, and are defoamed under reduced pressure to be used.

((A)成分之製造方法) (Method of manufacturing component (A))

(A)成分之製造方法並無特別限定。例如,可藉由使使以下通式[3]所表示之二烷氧基矽烷化合物、通式[4]所表示之三烷氧基矽烷化合物及通式[5]所表示之四烷氧基矽烷化合物進行水解縮聚而獲得之縮合物(以下有時表示為「水解縮聚物[I]」)與以下通式[9-1]、[9-2]、[9-3]或[9-4]所表示之矽烷化合物進行反應而製造。 The method for producing the component (A) is not particularly limited. For example, a dialkoxy decane compound represented by the following general formula [3], a trialkoxy decane compound represented by the general formula [4], and a tetraalkoxy group represented by the general formula [5] can be used. A condensate obtained by hydrolyzing polycondensation of a decane compound (hereinafter sometimes referred to as "hydrolysis polycondensate [I]") and the following general formula [9-1], [9-2], [9-3] or [9- 4] The decane compound represented by the reaction is produced.

[化19]R2 2Si(OR7)2 [3] R3Si(OR8)3 [4] Si(OR9)4 [5] R 2 2 Si(OR 7 ) 2 [3] R 3 Si(OR 8 ) 3 [4] Si(OR 9 ) 4 [5]

通式[3]中之R2與式[1]之R2含義相同,R7表示碳數1~3之烷基,2個R7可為相同或相互不同之種類。通式[4]中之R3與上述式[1]之R3含義相同,R8表示碳數1~3之烷基,3個R8可為相同或相互不同之種類。通式[5]中之R9表示碳數1~3之烷基,4個R9可為相同或相互不同之種類。 General formula [3] is the same as R 2 in the formula [1] The meaning of R 2, R 7 represents an alkyl group having 1 to 3 carbon atoms, the two R 7 may be the same or different from each other species. Of the general formula [4] R 3 in the above formula [1] of the same meaning as R 3, R 8 represents an alkyl group having 1 to 3 carbon atoms, the three R 8 may be the same or different from each other species. R 9 in the general formula [5] represents an alkyl group having 1 to 3 carbon atoms, and the four R 9 groups may be the same or different from each other.

[化20]H-SiR1 2Cl [9-1] H-SiR1 2(OH) [9-2] H-SiR1 2(OR13) [9-3] (H-SiR1 2)2O [9-4] H-SiR 1 2 Cl [9-1] H-SiR 1 2 (OH) [9-2] H-SiR 1 2 (OR 13 ) [9-3] (H-SiR 1 2 ) 2 O [9-4]

通式[9-1]、[9-2]、[9-3]及[9-4]中之R1與式[1]之R1含義相同。通式[9-3]中之R13表示碳數1~3之烷基。 Formula [9-1], [9-2], the same [9-3] and [9-4] in the R 1 is of formula [1] The R & lt one meaning. R 13 in the formula [9-3] represents an alkyl group having 1 to 3 carbon atoms.

以下,有時將通式[3]所表示之二烷氧基矽烷化合物、通式[4]所表示之三烷氧基矽烷化合物、通式[5]所表示之四烷氧基矽烷化合物分別表示為「二烷氧基矽烷[3]」、「三烷氧基矽烷[4]」、「四烷氧基矽烷[5]」。又,有時將通式[9-1]、[9-2]、[9-3]及[9-4]所表示之矽烷化合物分別表示為「氯矽烷化合物[9-1]」、「矽烷醇化合物[9-2]」、「單烷氧基矽烷化合物[9-3]」、「二矽氧烷化合物[9-4]」,於不區分彼等而總稱時有時表示為「矽烷化合物[9]」。 In the following, the dialkoxy decane compound represented by the general formula [3], the trialkoxy decane compound represented by the general formula [4], and the tetraalkoxy decane compound represented by the general formula [5] may be respectively It is represented by "dialkoxydecane [3]", "trialkoxydecane [4]", and "tetraalkoxydecane [5]". Further, the decane compounds represented by the general formulae [9-1], [9-2], [9-3], and [9-4] are respectively referred to as "chloromethane compounds [9-1]" and " The stanol compound [9-2]", the "monoalkoxy decane compound [9-3]", and the "dioxane compound [9-4]" are sometimes referred to as "when they are not distinguished from each other". Decane compound [9]".

二烷氧基矽烷[3]具體可列舉以下化合物,但並不限定於彼等: Specific examples of the dialkoxydecane [3] include the following compounds, but are not limited to them:

二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二乙基二甲氧基矽烷、二乙基二乙氧基矽烷。 Dimethyldimethoxydecane, dimethyldiethoxydecane, diethyldimethoxydecane, diethyldiethoxydecane.

彼等中作為較佳化合物,可列舉:二甲基二甲氧基矽烷、二甲基二乙氧基矽烷。 Among them, preferred examples of the compound include dimethyldimethoxydecane and dimethyldiethoxydecane.

三烷氧基矽烷[4]具體可列舉以下化合物,但並不限定於彼等: Specific examples of the trialkoxydecane [4] include, but are not limited to, the following compounds:

甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、3-(三氟甲基)苯基三甲氧基矽烷、3-(三氟甲基)苯基三乙氧基矽烷、4-(三氟甲基)苯基三甲氧基矽烷、4-(三氟甲基)苯基三乙氧基矽烷、3,5-(二-三氟甲基)苯基三甲氧基矽烷、3,5-(二-三氟甲基)苯基三乙氧基矽烷、萘基三甲氧基矽烷、萘基三乙氧基矽烷。 Methyl trimethoxy decane, methyl triethoxy decane, ethyl trimethoxy decane, ethyl triethoxy decane, vinyl trimethoxy decane, vinyl triethoxy decane, phenyl trimethoxy Decane, phenyltriethoxydecane, 3-(trifluoromethyl)phenyltrimethoxydecane, 3-(trifluoromethyl)phenyltriethoxydecane, 4-(trifluoromethyl)benzene Trimethoxy decane, 4-(trifluoromethyl)phenyltriethoxy decane, 3,5-(di-trifluoromethyl)phenyltrimethoxydecane, 3,5-(di-trifluoro Methyl)phenyltriethoxydecane, naphthyltrimethoxydecane, naphthyltriethoxydecane.

彼等中作為較佳化合物,可列舉:甲基三甲氧基矽烷、甲基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、3-(三氟甲基) 苯基三甲氧基矽烷、3-(三氟甲基)苯基三乙氧基矽烷、4-(三氟甲基)苯基三甲氧基矽烷、4-(三氟甲基)苯基三乙氧基矽烷、3,5-(二-三氟甲基)苯基三甲氧基矽烷、3,5-(二-三氟甲基)苯基三乙氧基矽烷,作為尤佳化合物,可列舉:甲基三甲氧基矽烷、甲基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷。 Preferred examples of such compounds include methyltrimethoxydecane, methyltriethoxydecane, phenyltrimethoxydecane, phenyltriethoxydecane, and 3-(trifluoromethyl). Phenyltrimethoxydecane, 3-(trifluoromethyl)phenyltriethoxydecane, 4-(trifluoromethyl)phenyltrimethoxydecane, 4-(trifluoromethyl)phenyltriethyl Oxydecane, 3,5-(di-trifluoromethyl)phenyltrimethoxydecane, 3,5-(di-trifluoromethyl)phenyltriethoxydecane, as a preferred compound, Methyl trimethoxy decane, methyl triethoxy decane, phenyl trimethoxy decane, phenyl triethoxy decane.

四烷氧基矽烷[5]具體可列舉以下化合物,但並不限定於彼等: Specific examples of the tetraalkoxydecane [5] include the following compounds, but are not limited to them:

四甲氧基矽烷、四乙氧基矽烷、四正丙氧基矽烷、四異丙氧基矽烷。 Tetramethoxydecane, tetraethoxydecane, tetra-n-propoxydecane, tetraisopropoxydecane.

彼等中作為較佳化合物,可列舉:四甲氧基矽烷、四乙氧基矽烷。 Among them, preferred examples thereof include tetramethoxynonane and tetraethoxydecane.

(A)成分之製造中所使用之二烷氧基矽烷[3]、三烷氧基矽烷[4]及四烷氧基矽烷[5]之組合並無特別限定。二烷氧基矽烷[3]、三烷氧基矽烷[4]及四烷氧基矽烷[5]可分別使用單一種類,亦可併用複數種。作為較佳之組合,二烷氧基矽烷[3]可自由二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二乙基二甲氧基矽烷及二乙基二乙氧基矽烷所組成之群中選擇一種以上,三烷氧基矽烷[4]可自由甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、3-(三氟甲基)苯基三甲氧基矽烷、3-(三氟甲基)苯基三乙氧基矽烷、4-(三氟甲基)苯基三甲氧基矽烷、4-(三氟甲基)苯基三乙氧基矽烷、3,5-(二-三氟甲基)苯基三甲氧基矽烷及3,5-(二-三氟甲基)苯基三乙氧基矽烷所組成之群中選擇一種以上,四烷氧基矽烷[5]可自由四甲氧基矽烷、四乙氧基矽烷及四異丙氧基矽烷所組成之群中選擇一種以上。其中,作為尤佳之組合,二烷氧基矽烷[4]可自由二甲基二甲氧基矽烷及二甲基二乙氧基矽烷所組成之群中選擇一種以上,三烷氧基矽烷[5]可自由甲基三甲氧基矽烷、甲基三乙氧基矽 烷、苯基三甲氧基矽烷及苯基三乙氧基矽烷所組成之群中選擇一種以上,四烷氧基矽烷[6]可自由四甲氧基矽烷及四乙氧基矽烷所組成之群中選擇一種以上。 The combination of the dialkoxy decane [3], the trialkoxy decane [4], and the tetraalkoxy decane [5] used in the production of the component (A) is not particularly limited. The dialkoxy decane [3], the trialkoxy decane [4], and the tetraalkoxy decane [5] may be used alone or in combination of plural kinds. As a preferred combination, the dialkoxy decane [3] is free from dimethyl dimethoxy decane, dimethyl diethoxy decane, diethyl dimethoxy decane and diethyl diethoxy decane. One or more selected from the group consisting of, the trialkoxydecane [4] is free of methyltrimethoxydecane, methyltriethoxydecane, ethyltrimethoxydecane, ethyltriethoxydecane, ethylene. Trimethoxy decane, vinyl triethoxy decane, phenyl trimethoxy decane, phenyl triethoxy decane, 3-(trifluoromethyl)phenyl trimethoxy decane, 3-(trifluoromethyl) Phenyltriethoxydecane, 4-(trifluoromethyl)phenyltrimethoxydecane, 4-(trifluoromethyl)phenyltriethoxydecane, 3,5-(di-trifluoro One or more selected from the group consisting of methyl)phenyltrimethoxydecane and 3,5-(di-trifluoromethyl)phenyltriethoxynonane, tetraalkoxydecane [5] is free One or more selected from the group consisting of oxydecane, tetraethoxysilane, and tetraisopropoxy decane. Among them, as a preferred combination, the dialkoxy decane [4] may be selected from the group consisting of dimethyl dimethoxy decane and dimethyl diethoxy decane, and a trialkoxy decane [ 5] Free methyltrimethoxydecane, methyltriethoxysulfonium One or more selected from the group consisting of an alkane, a phenyltrimethoxydecane and a phenyltriethoxynonane, and the tetraalkoxydecane [6] is a group of free tetramethoxynonane and tetraethoxynonane. Choose more than one.

氯矽烷化合物[9-1]具體可列舉以下化合物,但並不限定於彼等:氯二甲基矽烷、氯二乙基矽烷。 Specific examples of the chlorosilane compound [9-1] include the following compounds, but are not limited thereto: chlorodimethyl decane and chlorodiethyl decane.

彼等中作為較佳化合物,可列舉:氯二甲基矽烷。 Among them, preferred examples of the compound include chlorodimethyl decane.

矽烷醇化合物[9-2]具體可列舉以下化合物,但並不限定於彼等:二甲基矽烷醇、二乙基矽烷醇。 Specific examples of the stanol compound [9-2] include the following compounds, but are not limited thereto: dimethyl stanol or diethyl stanol.

彼等中作為較佳化合物,可列舉:二甲基矽烷醇。 Among them, preferred examples thereof include dimethyl stanol.

單烷氧基矽烷化合物[9-3]具體可列舉以下化合物,但並不限定於彼等:二甲基甲氧基矽烷、二甲基乙氧基矽烷、二乙基甲氧基矽烷、二乙基乙氧基矽烷。 Specific examples of the monoalkoxydecane compound [9-3] include, but are not limited to, dimethyl methoxy decane, dimethyl ethoxy decane, diethyl methoxy decane, and the like. Ethyl ethoxy decane.

彼等中作為較佳化合物,可列舉:二甲基甲氧基矽烷、二甲基乙氧基矽烷。 Among them, preferred examples thereof include dimethylmethoxydecane and dimethylethoxydecane.

二矽氧烷化合物[9-4]具體可列舉以下化合物,但並不限定於彼等:1,1,3,3-四甲基二矽氧烷、1,1,3,3-四乙基二矽氧烷。 Specific examples of the dioxantane compound [9-4] include, but are not limited to, 1,1,3,3-tetramethyldioxane, 1,1,3,3-tetraethyl Dioxane.

彼等中作為較佳化合物,可列舉:1,1,3,3-四甲基二矽氧烷。 Among them, preferred examples thereof include 1,1,3,3-tetramethyldioxane.

關於水解縮聚物[I]之製造方法,以下列舉其一例。 The production method of the hydrolysis polycondensate [I] is exemplified below.

首先,將特定量之二烷氧基矽烷[3]及三烷氧基矽烷[4]、根據期望之四烷氧基矽烷[5]於室溫下裝入反應容器內後,添加用以使各個烷氧基矽烷化合物水解縮聚之水及視需要之反應溶劑,根據期望亦添加用以使縮合反應進行之觸媒,製為反應溶液。此時之投入順序並不 限定於此,可以任意之順序投入而製為反應溶液。繼而,一面攪拌該反應溶液一面於特定時間、特定溫度下進行反應,藉此可獲得水解縮合物[I]。此時,為防止反應系統中之未反應原料之烷氧基矽烷化合物、水、反應溶劑及/或觸媒蒸餾至反應系統外,較佳為反應容器中具備回流裝置。 First, a specific amount of a dialkoxy decane [3] and a trialkoxy decane [4] are added to the reaction vessel at room temperature according to the desired amount, and then added to make Each alkoxydecane compound hydrolyzes the polycondensed water and, if necessary, a reaction solvent, and a catalyst for carrying out a condensation reaction is added as needed to prepare a reaction solution. The order of input at this time is not In this case, it can be prepared as a reaction solution in any order. Then, the reaction solution is stirred at a specific temperature and a specific temperature while stirring, whereby a hydrolysis condensate [I] can be obtained. In this case, in order to prevent the alkoxydecane compound, water, reaction solvent and/or catalyst which are unreacted raw materials in the reaction system from being distilled out of the reaction system, it is preferred to provide a reflux device in the reaction vessel.

於水解縮聚物[I]之製造中,二烷氧基矽烷[3]、三烷氧基矽烷[4]及四烷氧基矽烷[5]之使用量並無特別限定。就(A)成分之物性之觀點而言,較佳為以二烷氧基矽烷[3]:三烷氧基矽烷[4]以莫耳比表示為85:15~15:85進行調配,尤佳為以85:15~30:70進行調配。若二烷氧基矽烷[3]之莫耳比低於15,則存在高於所期望之分子量之情形,若超過85,則存在水解縮聚反應難以進行,低於所期望之分子量之情形。又,作為使用四烷氧基矽烷[5]之情形時之量,相對於二烷氧基矽烷[3]、三烷氧基矽烷[4]及四烷氧基矽烷[5]之合計100莫耳,較佳為1~80莫耳,尤佳為1~60莫耳。 In the production of the hydrolysis polycondensate [I], the amount of the dialkoxydecane [3], the trialkoxydecane [4], and the tetraalkoxydecane [5] is not particularly limited. From the viewpoint of the physical properties of the component (A), it is preferred to formulate the dialkoxy decane [3]: trialkoxy decane [4] in a molar ratio of 85: 15 to 15:85, in particular Jia is equipped with 85:15~30:70. If the molar ratio of the dialkoxysilane [3] is less than 15, there is a case where the molecular weight is higher than the desired molecular weight. If it exceeds 85, the hydrolysis polycondensation reaction is difficult to proceed and is lower than the desired molecular weight. Further, as the amount in the case of using the tetraalkoxydecane [5], the total amount is 100 mol with respect to the dialkoxydecane [3], the trialkoxydecane [4], and the tetraalkoxydecane [5]. The ear is preferably 1 to 80 moles, and more preferably 1 to 60 moles.

於水解縮聚物[I]之製造中,水之使用量並無特別限定。就反應效率之觀點而言,相對於原料化合物之烷氧基矽烷化合物中含有之烷氧基之合計莫耳當量,即,二烷氧基矽烷[3]、三烷氧基矽烷[4]及四烷氧基矽烷[5]中含有之烷氧基之合計莫耳當量,較佳為1.5倍以上、5倍以下。若為1.5倍莫耳當量以上,則烷氧基矽烷化合物之水解有效進行,又,不需要添加多於5倍莫耳當量。 In the production of the hydrolysis polycondensate [I], the amount of water used is not particularly limited. From the viewpoint of reaction efficiency, the molar equivalent of the alkoxy group contained in the alkoxydecane compound of the starting compound, that is, dialkoxydecane [3], trialkoxydecane [4] and The molar equivalent of the alkoxy group contained in the tetraalkoxydecane [5] is preferably 1.5 times or more and 5 times or less. If it is 1.5 times the molar equivalent or more, the hydrolysis of the alkoxydecane compound proceeds efficiently, and it is not necessary to add more than 5 times the molar equivalent.

於水解縮聚物[I]之製造中,亦可於無溶劑條件下進行反應,但亦可使用反應溶劑。作為反應溶劑之種類,若不妨礙用以製造加水反應縮聚物[I]之反應,則並無特別限定。其中,較佳為醇類等親水性之有機溶劑。作為該醇類,具體可例示:甲醇、乙醇、正丙醇、異丙醇、丁醇等,但並不限定於彼等。反應溶劑之使用量相對於所使用之烷氧基矽烷化合物總量,較佳為0.1~1000質量%,尤佳為1~300質量 %。再者,反應過程中自反應原料之烷氧基矽烷化合物生成之醇類可作為反應溶劑而發揮功能,故而有時並非必須添加。 In the production of the hydrolysis polycondensate [I], the reaction can also be carried out without a solvent, but a reaction solvent can also be used. The type of the reaction solvent is not particularly limited as long as it does not inhibit the reaction for producing the water-reactioned polycondensate [I]. Among them, a hydrophilic organic solvent such as an alcohol is preferred. Specific examples of the alcohol include methanol, ethanol, n-propanol, isopropanol, butanol, and the like, but are not limited thereto. The amount of the reaction solvent used is preferably from 0.1 to 1,000% by mass, particularly preferably from 1 to 300% by mass based on the total amount of the alkoxydecane compound to be used. %. Further, the alcohol formed from the alkoxysilane compound of the reaction raw material during the reaction can function as a reaction solvent, and thus it is not necessary to add it.

作為於水解縮聚物[I]之製造中所使用之觸媒之種類,可使用酸性觸媒或鹼性觸媒。由於易於控制水解縮聚物[I]之分子量,故而較佳為使用酸性觸媒。該酸性觸媒之種類並無特別限定。例如可列舉:乙酸、鹽酸、硝酸、硫酸、氫氟酸、三氟甲磺酸、對甲苯磺酸、三氟乙酸等。其中,由於反應結束後之酸觸媒之去除處理較容易,故而較佳為乙酸、鹽酸、硝酸、硫酸、氫氟酸,更佳為乙酸。又,鹼性觸媒之種類並無特別限定。例如可列舉:氫氧化鈉、氫氧化鉀、氫氧化鋰、氫氧化鎂、碳酸鈉、碳酸鉀、碳酸銫、三乙胺、吡啶等。 As the kind of the catalyst used in the production of the hydrolysis polycondensate [I], an acidic catalyst or an alkaline catalyst can be used. Since it is easy to control the molecular weight of the hydrolyzed polycondensate [I], it is preferred to use an acidic catalyst. The type of the acidic catalyst is not particularly limited. For example, acetic acid, hydrochloric acid, nitric acid, sulfuric acid, hydrofluoric acid, trifluoromethanesulfonic acid, p-toluenesulfonic acid, trifluoroacetic acid, etc. are mentioned. Among them, acetic acid, hydrochloric acid, nitric acid, sulfuric acid, hydrofluoric acid, and more preferably acetic acid are preferred because the removal of the acid catalyst after the completion of the reaction is relatively easy. Further, the type of the alkaline catalyst is not particularly limited. For example, sodium hydroxide, potassium hydroxide, lithium hydroxide, magnesium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, triethylamine, pyridine, etc. are mentioned.

水解縮聚物[I]之製造中之觸媒之使用量相對於所使用之烷氧基矽烷化合物、溶劑及水之總量,較佳為0.001~5質量%,尤佳為0.005~1質量%。 The amount of the catalyst used in the production of the hydrolyzed polycondensate [I] is preferably 0.001 to 5% by mass, particularly preferably 0.005 to 1% by mass, based on the total amount of the alkoxydecane compound, solvent and water to be used. .

水解縮聚物[I]之製造之反應時間並無特別限定,可為3小時以上、15小時以下。反應溫度並無特別限定,可為60℃以上、120℃以下,較佳為80℃以上、100℃以下。 The reaction time for the production of the hydrolysis polycondensate [I] is not particularly limited, and may be 3 hours or longer and 15 hours or shorter. The reaction temperature is not particularly limited, and may be 60 ° C or higher and 120 ° C or lower, preferably 80 ° C or higher and 100 ° C or lower.

反應後,就水解縮聚物[I]之處理性之觀點而言,較佳為自反應系統內分離水解縮聚物[I]進行精製。該分離方法並無特別限定。作為分離方法,例如可列舉萃取方法。具體而言,將上述反應後之反應溶液降溫至室溫後,使之與作為萃取溶劑之非水性有機溶劑接觸,藉此萃取反應系統中存在之水解縮聚物[I]。繼而,將萃取後之溶液中所含之觸媒去除。觸媒之去除方法並無特別限定。例如,若使用之觸媒(例如乙酸)為水溶性,則可藉由以水清洗萃取後之溶液而去除該觸媒。繼而,於去除觸媒後之溶液中添加乾燥劑,去除系統中溶解之水。進而,藉由經歷乾燥劑之去除、萃取溶劑之減壓去除,可分離高純度之水解縮聚物[I]。此時,亦可不使用乾燥劑,而於自去除觸媒後 之溶液減壓去除萃取溶劑之過程中將水同時減壓去除。 After the reaction, from the viewpoint of the rationality of the hydrolysis of the polycondensate [I], it is preferred to separate the hydrolyzed polycondensate [I] from the reaction system for purification. This separation method is not particularly limited. As a separation method, the extraction method is mentioned, for example. Specifically, after the reaction solution after the above reaction is cooled to room temperature, it is brought into contact with a non-aqueous organic solvent as an extraction solvent, whereby the hydrolyzed polycondensate [I] present in the reaction system is extracted. Then, the catalyst contained in the extracted solution is removed. The method of removing the catalyst is not particularly limited. For example, if the catalyst (e.g., acetic acid) used is water soluble, the catalyst can be removed by washing the extracted solution with water. Then, a desiccant is added to the solution after removing the catalyst to remove dissolved water in the system. Further, the high-purity hydrolysis polycondensate [I] can be separated by undergoing removal of a desiccant and removal of the extraction solvent under reduced pressure. At this time, the desiccant may not be used, but after the catalyst is removed. The solution is simultaneously removed under reduced pressure during the removal of the extraction solvent under reduced pressure.

作為上述萃取溶劑,可使用非水性有機溶劑。該非水性有機溶劑之種類並無特別限定。例如可列舉:芳香族烴類、醚類等。具體可列舉:甲苯、二乙醚、異丙醚、二丁醚等,但並不限定於彼等。 As the above extraction solvent, a non-aqueous organic solvent can be used. The type of the nonaqueous organic solvent is not particularly limited. For example, an aromatic hydrocarbon, an ether, etc. are mentioned. Specific examples thereof include toluene, diethyl ether, isopropyl ether, and dibutyl ether, but are not limited thereto.

作為上述乾燥劑,若為可自系統中去除水,與水解縮聚物[I]分離者則並無特別限定。作為此種乾燥劑,較佳為使用固體乾燥劑。具體可列舉硫酸鎂等,但並不限定於此。 The desiccant is not particularly limited as long as it can remove water from the system and is separated from the hydrolyzed polycondensate [I]. As such a desiccant, a solid desiccant is preferably used. Specific examples thereof include magnesium sulfate and the like, but are not limited thereto.

分離、精製之水解縮聚物[I]可藉由於溶劑中加熱回流或於無溶劑下加熱攪拌而進而進行縮合反應。藉此,可增加水解縮聚物[I]之分子量。於使用溶劑之情形時,於可進行加熱回流之反應容器中投入水解縮聚物[I]與溶劑,製為溶解液。將該溶解液加熱回流,於進行縮合之同時與系統中生成之水共沸。此時,亦可於溶解液中添加對甲苯磺酸等而進行加熱回流。作為使用之溶劑之種類,若可溶解水解縮合物[I]且為可加熱回流之溶劑則並無特別限定。具體可列舉:甲苯、二甲苯、苯等芳香族烴類,二乙醚、二異丙醚等醚類,乙酸乙酯等酯類。 The separated and purified hydrolyzed polycondensate [I] can be further subjected to a condensation reaction by heating under reflux in a solvent or heating and stirring without a solvent. Thereby, the molecular weight of the hydrolyzed polycondensate [I] can be increased. When a solvent is used, the hydrolyzed polycondensate [I] and a solvent are introduced into a reaction vessel which can be heated and refluxed to prepare a solution. The solution is heated to reflux and azeotroped with the water formed in the system while being condensed. In this case, p-toluenesulfonic acid or the like may be added to the solution to be heated and refluxed. The type of the solvent to be used is not particularly limited as long as it can dissolve the hydrolysis-condensation product [I] and is a solvent that can be heated to reflux. Specific examples thereof include aromatic hydrocarbons such as toluene, xylene, and benzene; ethers such as diethyl ether and diisopropyl ether; and esters such as ethyl acetate.

又,於無溶劑下之情形時,於可進行加熱攪拌之反應容器中投入水解縮聚物[I],於100℃以上、150℃以下進行加熱並攪拌6~18小時。此時,為抑制水解縮聚物[I]之組成比之變化,較佳為反應容器中具備回流裝置(例如冷凝器)。加熱攪拌後將內容液降溫至室溫。彼等一連串之操作可重複進行,重複次數並無特別限定。較佳為進行1~4次。 Further, in the case of no solvent, the hydrolyzed polycondensate [I] is introduced into a reaction vessel which can be heated and stirred, and heated at 100 ° C or higher and 150 ° C or lower for 6 to 18 hours. In this case, in order to suppress the change in the composition ratio of the hydrolysis polycondensate [I], it is preferred to provide a reflux device (for example, a condenser) in the reaction container. After heating and stirring, the content liquid was cooled to room temperature. A series of operations can be repeated, and the number of repetitions is not particularly limited. It is preferably carried out 1 to 4 times.

其次,對使水解縮聚物[I]與矽烷化合物[9]反應而製造(A)成分之方法加以說明。該方法若可製造(A)成分則並無特別限定。例如可列舉下述第一方法與第二方法之兩種方法。所謂第一方法,係指使水解縮聚物(I)與作為矽烷化合物[9]之一種之氯矽烷化合物[9-1],於非水溶性有機溶劑中進行反應而製造(A)成分的方法。所謂第二方法,係指使水解縮聚物(I)與作為矽烷化合物[9]之一種之矽烷醇化合物[9- 2]、單烷氧基矽烷化合物[9-3]或二矽氧烷化合物[9-4],於酸存在下,於非水溶性有機溶劑與醇性溶劑之混合溶劑中進行反應而製造(A)成分的方法。該兩種方法於以下具體說明。 Next, a method of producing the component (A) by reacting the hydrolyzed polycondensate [I] with a decane compound [9] will be described. This method is not particularly limited as long as the component (A) can be produced. For example, two methods of the first method and the second method described below can be cited. The first method is a method in which a hydrolyzed polycondensate (I) and a chlorodecane compound [9-1] which is one of the decane compounds [9] are reacted in a water-insoluble organic solvent to produce the component (A). The second method refers to the hydrolysis of the polycondensate (I) with a stanol compound which is one of the decane compounds [9] [9- 2] a monoalkoxydecane compound [9-3] or a dioxoxane compound [9-4], which is produced by reacting a solvent in a solvent mixture of a water-insoluble organic solvent and an alcohol solvent in the presence of an acid ( A) Method of ingredients. The two methods are specifically described below.

(第一方法) (first method)

於第一方法中,首先,將特定量之水解縮聚物(I)與非水性有機溶劑投入反應容器內,使水解縮聚物(I)溶解。繼而對該溶解液,一面於約0~約10℃下攪拌,一面添加特定量之氯矽烷化合物[9-1]。添加方法並無特別限定,較佳為滴加。添加結束後,一面維持為0℃~室溫一面攪拌0.5~18小時使之進行反應。其後,使反應結束,藉此可獲得(A)成分。 In the first method, first, a specific amount of the hydrolyzed polycondensate (I) and a non-aqueous organic solvent are introduced into a reaction vessel to dissolve the hydrolyzed polycondensate (I). Then, the solution is stirred at about 0 to about 10 ° C while adding a specific amount of the chlorodecane compound [9-1]. The addition method is not particularly limited, and is preferably dropwise. After the completion of the addition, the mixture was stirred at 0 ° C to room temperature for 0.5 to 18 hours to cause a reaction. Thereafter, the reaction is terminated, whereby the component (A) can be obtained.

於第一方法中,水解縮聚物(I)與氯矽烷化合物[9-1]之使用量並無特別限定。就(A)成分之物性之觀點而言,相對於水解縮聚物(I)1g,較佳為使用氯矽烷化合物[9-1]0.2~10mmol。 In the first method, the amount of the hydrolysis polycondensate (I) and the chlorodecane compound [9-1] used is not particularly limited. From the viewpoint of the physical properties of the component (A), it is preferred to use 0.2 to 10 mmol of the chlorodecane compound [9-1] with respect to 1 g of the hydrolysis polycondensate (I).

於第一方法中,作為所使用之非水溶性有機溶劑之種類,若為非水溶性且不妨礙用以製造(A)成分之反應,則並無特別限定。其中,較佳為芳香族烴類、醚類等。具體可例示:甲苯、二乙醚、四氫呋喃、二異丙醚等,但並不限定於彼等。作為非水溶性有機溶劑之使用量,相對於水解縮聚物(I)1g,較佳為50~1000質量%,尤佳為300~700質量%。 In the first method, the type of the water-insoluble organic solvent to be used is not particularly limited as long as it is water-insoluble and does not inhibit the reaction for producing the component (A). Among them, aromatic hydrocarbons, ethers and the like are preferred. Specific examples thereof include toluene, diethyl ether, tetrahydrofuran, diisopropyl ether, and the like, but are not limited thereto. The amount of the water-insoluble organic solvent to be used is preferably from 50 to 1,000% by mass, particularly preferably from 300 to 700% by mass, based on 1 g of the hydrolyzed polycondensate (I).

於第一方法中,結束反應之方法並無特別限定。通常藉由於反應系統中滴加水(較佳為離子交換水)而使反應結束。反應後,就(A)成分之處理性之觀點而言,較佳為自反應系統內分離(A)成分進行精製。該分離精製方法並無特別限定。例如可列舉萃取方法。具體而言,自上述反應後之反應溶液分取有機層,繼而,將該有機層以酸進行清洗,進而以水進行清洗。繼而,於清洗後之有機層中添加乾燥劑,去除系統中溶解之水。進而,藉由經歷乾燥劑之去除、非水性有 機溶劑之減壓去除,可將(A)成分以高純度分離。此時,亦可不使用乾燥劑,而於減壓去除非水性有機溶劑之過程中同時將水減壓去除。分離後之(A)成分較佳為藉由於無溶劑、減壓下進行加熱攪拌,進而去除(A)成分中所含之水分。此時之加熱溫度並無特別限定,通常為100~130℃。 In the first method, the method of terminating the reaction is not particularly limited. The reaction is usually terminated by the dropwise addition of water (preferably ion-exchanged water) to the reaction system. After the reaction, from the viewpoint of the rationality of the component (A), it is preferred to separate the component (A) from the reaction system for purification. The separation and purification method is not particularly limited. For example, an extraction method can be cited. Specifically, the organic layer is separated from the reaction solution after the above reaction, and then the organic layer is washed with an acid and further washed with water. Then, a desiccant is added to the washed organic layer to remove dissolved water from the system. Furthermore, by undergoing removal of the desiccant, there is The solvent of the machine is removed under reduced pressure, and the component (A) can be separated in high purity. At this time, it is also possible to simultaneously remove the water under reduced pressure while removing the non-aqueous organic solvent under reduced pressure without using a desiccant. It is preferable that the component (A) after separation is heated and stirred under reduced pressure to remove water contained in the component (A). The heating temperature at this time is not particularly limited, but is usually 100 to 130 °C.

(第二方法) (second method)

於第二方法中,首先,將特定量之水解縮聚物(I)與非水性有機溶劑與根據期望之醇性溶劑投入反應容器內,使水解縮聚物(I)溶解。繼而,於該溶解液中添加特定量之矽烷醇化合物[9-2]、單烷氧基矽烷化合物[9-3]或二矽氧烷化合物[9-4]。進而,於反應系統中添加用以進行水解及脫水縮合反應之觸媒,將反應系統於1~48小時、室溫下進行攪拌而使反應進行。其後,使反應結束,藉此可獲得(A)成分。 In the second method, first, a specific amount of the hydrolyzed polycondensate (I) and a non-aqueous organic solvent are introduced into a reaction vessel according to a desired alcoholic solvent to dissolve the hydrolyzed polycondensate (I). Then, a specific amount of the stanol compound [9-2], the monoalkoxydecane compound [9-3] or the dioxantane compound [9-4] is added to the solution. Further, a catalyst for performing hydrolysis and dehydration condensation reaction is added to the reaction system, and the reaction is carried out by stirring the reaction system at room temperature for 1 to 48 hours. Thereafter, the reaction is terminated, whereby the component (A) can be obtained.

於第二方法中,水解縮聚物(I)與矽烷醇化合物[9-2]、單烷氧基矽烷化合物[9-3]或二矽氧烷化合物[9-4]之使用量並無特別限定。就(A)成分之物性之觀點而言,相對於水解縮聚物(I)1g,較佳為於矽烷醇化合物[9-2]、單烷氧基矽烷化合物[9-3]或二矽氧烷化合物[9-4]中之SiH基成為0.2mmol~10mmol之範圍內使用。 In the second method, the amount of the hydrolysis polycondensate (I) and the stanol compound [9-2], the monoalkoxydecane compound [9-3] or the dioxane compound [9-4] is not particularly limited. limited. From the viewpoint of the physical properties of the component (A), it is preferably a stanol compound [9-2], a monoalkoxydecane compound [9-3] or a dioxane relative to 1 g of the hydrolyzed polycondensate (I). The SiH group in the alkane compound [9-4] is used in the range of 0.2 mmol to 10 mmol.

於第二方法中,作為所使用之非水溶性有機溶劑之種類,若不妨礙用以製造(A)成分之反應,則並無特別限定。其中,較佳為芳香族烴類、醚類等。具體可例示:甲苯、二乙醚、四氫呋喃、二異丙醚等,但並不限定於彼等。非水溶性有機溶劑之使用量相對於水解縮聚物(I)1g,較佳為50~1000質量%,尤佳為100~500質量%。 In the second method, the type of the water-insoluble organic solvent to be used is not particularly limited as long as it does not inhibit the reaction for producing the component (A). Among them, aromatic hydrocarbons, ethers and the like are preferred. Specific examples thereof include toluene, diethyl ether, tetrahydrofuran, diisopropyl ether, and the like, but are not limited thereto. The amount of the water-insoluble organic solvent to be used is preferably from 50 to 1,000% by mass, particularly preferably from 100 to 500% by mass, based on 1 g of the hydrolyzed polycondensate (I).

於第二方法中,作為所使用之醇系溶劑之種類,若不妨礙用以製造(A)成分之反應,則並無特別限定。其中,較佳為碳數1~4之醇。具體可例示:甲醇、乙醇、1-丙醇、2-丙醇、丁醇等,但並不限定於彼等。醇系溶劑之使用量相對於水解縮聚物(I)1g,較佳為10~ 500質量%,尤佳為50~300質量%。 In the second method, the type of the alcohol-based solvent to be used is not particularly limited as long as it does not inhibit the reaction for producing the component (A). Among them, an alcohol having 1 to 4 carbon atoms is preferred. Specific examples thereof include methanol, ethanol, 1-propanol, 2-propanol, butanol, and the like, but are not limited thereto. The amount of the alcohol-based solvent used is preferably 10% based on 1 g of the hydrolyzed polycondensate (I). 500% by mass, particularly preferably 50 to 300% by mass.

於第二方法中,較佳為根據所使用之觸媒之種類,使用非水溶性有機溶劑與醇系溶劑之混合溶劑。於使用質子酸觸媒之情形時,藉由使用該混合溶劑,可提高反應性。 In the second method, it is preferred to use a mixed solvent of a water-insoluble organic solvent and an alcohol-based solvent depending on the kind of the catalyst to be used. In the case of using a protic acid catalyst, the reactivity can be improved by using the mixed solvent.

於第二方法中,作為所使用之觸媒之種類,若具有促進用以製造(A)成分之反應之作用,則並無特別限定。其中,較佳為無機酸。具體可例示:硝酸、鹽酸、硫酸等,但並不限定於彼等。觸媒之使用量相對於水解縮聚物(I)1g,較佳為0.0001~10mmol%,尤佳為0.005~5mmol%。 In the second method, the type of the catalyst to be used is not particularly limited as long as it has an action of promoting the reaction for producing the component (A). Among them, a mineral acid is preferred. Specific examples thereof include nitric acid, hydrochloric acid, sulfuric acid, and the like, but are not limited thereto. The amount of the catalyst used is preferably 0.0001 to 10 mmol%, particularly preferably 0.005 to 5 mmol%, based on 1 g of the hydrolysis polycondensate (I).

於第二方法中,結束反應之方法並無特別限定。通常藉由於反應系統中添加水(較佳為離子交換水)進行攪拌而使反應結束。反應後,就(A)成分之處理性之觀點而言,較佳為自反應系統內分離(A)成分進行精製。該分離精製方法並無特別限定。例如可列舉萃取方法。具體而言,自上述反應後之溶液分取有機層,繼而,將該有機層以水(較佳為離子交換水)進行清洗,進而添加乾燥劑,去除系統中溶解之水。其後,藉由經歷自有機層中去除乾燥劑、非水性有機溶劑之減壓去除,可將(A)成分以高純度分離。此時,亦可不使用乾燥劑,而於減壓去除非水性有機溶劑之過程中同時將水減壓去除。分離後之(A)成分較佳為藉由於無溶劑、減壓下進行加熱攪拌,進而去除(A)成分中所含之水分。此時之加熱溫度並無特別限定,通常為100~130℃。 In the second method, the method of terminating the reaction is not particularly limited. The reaction is usually terminated by stirring with the addition of water (preferably ion-exchanged water) to the reaction system. After the reaction, from the viewpoint of the rationality of the component (A), it is preferred to separate the component (A) from the reaction system for purification. The separation and purification method is not particularly limited. For example, an extraction method can be cited. Specifically, the organic layer is separated from the solution after the above reaction, and then the organic layer is washed with water (preferably ion-exchanged water), and a desiccant is further added to remove the dissolved water in the system. Thereafter, the component (A) can be separated in high purity by undergoing pressure-removal removal from the organic layer to remove the desiccant and the non-aqueous organic solvent. At this time, it is also possible to simultaneously remove the water under reduced pressure while removing the non-aqueous organic solvent under reduced pressure without using a desiccant. It is preferable that the component (A) after separation is heated and stirred under reduced pressure to remove water contained in the component (A). The heating temperature at this time is not particularly limited, but is usually 100 to 130 °C.

((B)成分之製造方法) (Method of manufacturing component (B))

(B)成分之製造方法並無特別限定。例如可使使以下通式[6]所表示之二烷氧基矽烷化合物、通式[7]所表示之三烷氧基矽烷化合物及通式[8]所表示之四烷氧基矽烷化合物進行水解縮聚而獲得之縮合物(以下有時表示為「水解縮聚物[II]」)與通式[10-1]、[10-2]、[10-3]或[10-4]所表示之乙烯基矽烷化合物進行反應而製造。 The method for producing the component (B) is not particularly limited. For example, a dialkoxy decane compound represented by the following formula [6], a trialkoxy decane compound represented by the general formula [7], and a tetraalkoxy decane compound represented by the general formula [8] can be subjected to a reaction. The condensate obtained by hydrolysis polycondensation (hereinafter sometimes referred to as "hydrolysis polycondensate [II]") and represented by the general formula [10-1], [10-2], [10-3] or [10-4] The vinyl decane compound is produced by reacting.

[化21]R5 2Si(OR10)2 [6] R6Si(OR11)3 [7] Si(OR12)4 [8] [Formula 21] R 5 2 Si (OR 10) 2 [6] R 6 Si (OR 11) 3 [7] Si (OR 12) 4 [8]

通式[6]中之R5與式[2]之R5含義相同,R10表示碳數1~3之烷基,2個R10可為相同或相互不同之種類。通式[7]中之R6與式[2]之R6含義相同,R11表示碳數1~3之烷基,3個R11可為相同或相互不同之種類。通式[8]中之R12表示碳數1~3之烷基,4個R12可為相同或相互不同之種類。 R 5 is the same as Formula Formula [2] of [6] The meaning of R 5, R 10 represents an alkyl group having 1 to 3 carbon atoms, the two R 10 may be the same or different from each other species. General formula [7] is the same as R 6 in the formula [2] the meaning of R 6, R 11 represents an alkyl group having 1 to 3 carbon atoms, the three R 11 may be the same or different from each other species. R 12 in the general formula [8] represents an alkyl group having 1 to 3 carbon atoms, and the four R 12 groups may be the same or different from each other.

[化22]CH2=CH-SiR4 2Cl [10-1] CH2=CH-SiR4 2(OH) [10-2] CH2=CH-SiR4 2(OR14) [10-3] (CH2-CH=SiR4 2)2O [10-4] CH 2 =CH-SiR 4 2 Cl [10-1] CH 2 =CH-SiR 4 2 (OH) [10-2] CH 2 =CH-SiR 4 2 (OR 14 ) [10-3 ] (CH 2 -CH=SiR 4 2 ) 2 O [10-4]

通式[10-1]、[10-2]、[10-3]及[10-4]中之R4與式[2]之R4含義相同。通式[10-3]中之R14表示碳數1~3之烷基。 Of the general formula [10-1], [10-2], [10-3] and [10-4] are the same as R 4 in the formula [2] the meaning of R 4. R 14 in the formula [10-3] represents an alkyl group having 1 to 3 carbon atoms.

以下,有時將通式[6]所表示之二烷氧基矽烷化合物、通式[7]所表示之三烷氧基矽烷化合物、通式[8]所表示之四烷氧基矽烷化合物分別表示為「二烷氧基矽烷[6]、「三烷氧基矽烷[7]」、「四烷氧基矽烷[8]」。又,有時將通式[10-1]、[10-2]、[10-3]及[10-4]所表示之乙烯基矽烷化合物分別表示為「氯乙烯基矽烷化合物[10-1]」、「乙烯基矽烷醇化合物[10-2]」、「單烷氧基乙烯基矽烷化合物[10-3]」、「二乙烯基二矽氧烷化合物[10-4]」,於不區分彼等而總稱時有時表示為「乙烯基矽烷化合物[10]」。 In the following, the dialkoxy decane compound represented by the general formula [6], the trialkoxy decane compound represented by the general formula [7], and the tetraalkoxy decane compound represented by the general formula [8] may be respectively used. It is represented by "dialkoxydecane [6], "trialkoxydecane [7]", "tetraalkoxydecane [8]". Further, the vinyl decane compounds represented by the general formulas [10-1], [10-2], [10-3], and [10-4] are sometimes referred to as "chlorovinyl decane compounds [10-1] ]", "vinyl stanol compound [10-2]", "monoalkoxy vinyl decane compound [10-3]", "divinyl dioxane compound [10-4]", When it is distinguished from each other, it is sometimes expressed as "vinyl decane compound [10]".

二烷氧基矽烷[6]具體可列舉以下化合物,但並不限定於彼等:二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、乙基二乙氧基矽 烷、二乙基二甲氧基矽烷、二乙基二乙氧基矽烷。 Specific examples of the dialkoxydecane [6] include, but are not limited to, dimethyldimethoxydecane, dimethyldiethoxydecane, and ethyldiethoxyanthracene. Alkyl, diethyldimethoxydecane, diethyldiethoxydecane.

彼等中作為較佳化合物,可列舉:二甲基二甲氧基矽烷、二甲基二乙氧基矽烷。 Among them, preferred examples of the compound include dimethyldimethoxydecane and dimethyldiethoxydecane.

三烷氧基矽烷[7]具體可列舉以下化合物,但並不限定於彼等:甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、3-(三氟甲基)苯基三甲氧基矽烷、3-(三氟甲基)苯基三乙氧基矽烷、4-(三氟甲基)苯基三甲氧基矽烷、4-(三氟甲基)苯基三乙氧基矽烷、3,5-(二-三氟甲基)苯基三甲氧基矽烷、3,5-(二-三氟甲基)苯基三乙氧基矽烷、萘基三甲氧基矽烷、萘基三乙氧基矽烷。 Specific examples of the trialkoxydecane [7] include, but are not limited to, methyltrimethoxydecane, methyltriethoxydecane, ethyltrimethoxydecane, and ethyltriethoxylate. Decane, vinyltrimethoxydecane, vinyltriethoxydecane, phenyltrimethoxydecane, phenyltriethoxydecane, 3-(trifluoromethyl)phenyltrimethoxydecane, 3-( Trifluoromethyl)phenyltriethoxydecane, 4-(trifluoromethyl)phenyltrimethoxydecane, 4-(trifluoromethyl)phenyltriethoxydecane, 3,5-(two -Trifluoromethyl)phenyltrimethoxydecane, 3,5-(di-trifluoromethyl)phenyltriethoxydecane, naphthyltrimethoxydecane, naphthyltriethoxydecane.

彼等中作為較佳化合物,可列舉:甲基三甲氧基矽烷、甲基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、3-(三氟甲基)苯基三甲氧基矽烷、3-(三氟甲基)苯基三乙氧基矽烷、4-(三氟甲基)苯基三甲氧基矽烷、4-(三氟甲基)苯基三乙氧基矽烷、3,5-(二-三氟甲基)苯基三甲氧基矽烷、3,5-(二-三氟甲基)苯基三乙氧基矽烷,作為尤佳化合物,可列舉:甲基三甲氧基矽烷、甲基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷。 Preferred examples of these compounds include methyltrimethoxydecane, methyltriethoxydecane, phenyltrimethoxydecane, phenyltriethoxydecane, and 3-(trifluoromethyl)benzene. Trimethoxy decane, 3-(trifluoromethyl)phenyltriethoxydecane, 4-(trifluoromethyl)phenyltrimethoxydecane, 4-(trifluoromethyl)phenyltriethoxy Pyridin, 3,5-(di-trifluoromethyl)phenyltrimethoxydecane, 3,5-(di-trifluoromethyl)phenyltriethoxydecane, as a preferred compound, Methyltrimethoxydecane, methyltriethoxydecane, phenyltrimethoxydecane, phenyltriethoxydecane.

四烷氧基矽烷[8]具體可列舉以下化合物,但並不限定於彼等:四甲氧基矽烷、四乙氧基矽烷、四正丙氧基矽烷、四異丙氧基矽烷。 Specific examples of the tetraalkoxydecane [8] include, but are not limited to, tetramethoxy decane, tetraethoxy decane, tetra-n-propoxy decane, and tetraisopropoxy decane.

彼等中作為較佳化合物,可列舉:四甲氧基矽烷、四乙氧基矽烷。 Among them, preferred examples thereof include tetramethoxynonane and tetraethoxydecane.

(B)成分之製造中所使用之二烷氧基矽烷[6]、三烷氧基矽烷[7]及四烷氧基矽烷[8]之組合並無特別限定。二烷氧基矽烷[6]、三烷氧基矽烷[7]及四烷氧基矽烷[8]可分別使用單一種類,亦可併用複數種。 作為較佳之組合,二烷氧基矽烷[6]可自由二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二乙基二甲氧基矽烷及二乙基二乙氧基矽烷所組成之群中選擇一種以上,三烷氧基矽烷[7]可自由甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、3-(三氟甲基)苯基三甲氧基矽烷、3-(三氟甲基)苯基三乙氧基矽烷、4-(三氟甲基)苯基三甲氧基矽烷、4-(三氟甲基)苯基三乙氧基矽烷、3,5-(二-三氟甲基)苯基三甲氧基矽烷及3,5-(二-三氟甲基)苯基三乙氧基矽烷所組成之群中選擇一種以上,四烷氧基矽烷[8]可自由四甲氧基矽烷、四乙氧基矽烷及四異丙氧基矽烷所組成之群中選擇一種以上。其中,作為尤佳之組合,二烷氧基矽烷[6]可自由二甲基二甲氧基矽烷及二甲基二乙氧基矽烷所組成之群中選擇一種以上,三烷氧基矽烷[7]可自由甲基三甲氧基矽烷、甲基三乙氧基矽烷、苯基三甲氧基矽烷及苯基三乙氧基矽烷所組成之群中選擇一種以上,四烷氧基矽烷[8]可自由四甲氧基矽烷及四乙氧基矽烷所組成之群中選擇一種以上。 The combination of the dialkoxy decane [6], the trialkoxy decane [7], and the tetraalkoxy decane [8] used in the production of the component (B) is not particularly limited. The dialkoxy decane [6], the trialkoxy decane [7], and the tetraalkoxy decane [8] may be used singly or in combination of plural kinds. As a preferred combination, the dialkoxy decane [6] is free from dimethyl dimethoxy decane, dimethyl diethoxy decane, diethyl dimethoxy decane and diethyl diethoxy decane. One or more selected from the group consisting of, the trialkoxydecane [7] is free of methyltrimethoxydecane, methyltriethoxydecane, ethyltrimethoxydecane, ethyltriethoxydecane, benzene. Trimethoxy decane, phenyl triethoxy decane, 3-(trifluoromethyl)phenyltrimethoxy decane, 3-(trifluoromethyl)phenyltriethoxy decane, 4-(trifluoro Methyl)phenyltrimethoxydecane, 4-(trifluoromethyl)phenyltriethoxydecane, 3,5-(di-trifluoromethyl)phenyltrimethoxynonane and 3,5-( More than one selected from the group consisting of di-trifluoromethyl)phenyltriethoxydecane, tetraalkoxydecane [8] free tetramethoxynonane, tetraethoxydecane and tetraisopropoxy One or more of the groups consisting of decane are selected. Among them, as a preferred combination, the dialkoxy decane [6] may be selected from the group consisting of dimethyl dimethoxy decane and dimethyl diethoxy decane, and a trialkoxy decane [ 7] one or more selected from the group consisting of free methyltrimethoxydecane, methyltriethoxydecane, phenyltrimethoxydecane and phenyltriethoxydecane, tetraalkoxydecane [8] One or more selected from the group consisting of tetramethoxy decane and tetraethoxy decane.

氯乙烯基矽烷化合物[10-1]具體可列舉以下化合物,但並不限定於彼等:氯二甲基乙烯基矽烷、氯二乙基乙烯基矽烷。 Specific examples of the chlorovinyl decane compound [10-1] include the following compounds, but are not limited thereto: chlorodimethyl vinyl decane and chlorodiethyl vinyl decane.

彼等中作為較佳化合物,可列舉:氯二甲基乙烯基矽烷。 Among them, preferred examples of the compound include chlorodimethylvinyl decane.

乙烯基矽烷醇化合物[10-2]具體可列舉以下化合物,但並不限定於彼等:二甲基乙烯基矽烷醇、二乙基乙烯基矽烷醇。 Specific examples of the vinyl stanol compound [10-2] include the following compounds, but are not limited thereto: dimethylvinyl stanol or diethyl vinyl stanol.

彼等中作為較佳化合物,可列舉:二甲基乙烯基矽烷醇。 Among them, preferred examples thereof include dimethylvinylstanol.

單烷氧基乙烯基矽烷化合物[10-3]具體可列舉以下化合物,但並不限定於彼等:二甲基甲氧基乙烯基矽烷、二甲基乙氧基乙烯基矽烷、二乙基 甲氧基乙烯基矽烷、二乙基乙氧基乙烯基矽烷。 Specific examples of the monoalkoxyvinyl decane compound [10-3] include, but are not limited to, dimethyl methoxy vinyl decane, dimethyl ethoxy vinyl decane, diethyl Methoxyvinyl decane, diethyl ethoxy vinyl decane.

彼等中作為較佳化合物,可列舉:二甲基甲氧基乙烯基矽烷、二甲基乙氧基乙烯基矽烷。 Preferred examples of these include dimethylmethoxyvinyl decane and dimethyl ethoxy vinyl decane.

二乙烯基二矽氧烷化合物[10-4]具體可列舉以下化合物,但並不限定於彼等:1,1,3,3-四甲基-1,3-二乙烯基二矽氧烷、1,1,3,3-四乙基-1,3-二乙烯基二矽氧烷。 Specific examples of the divinyldioxanane compound [10-4] include, but are not limited to, 1,1,3,3-tetramethyl-1,3-divinyldioxane. 1,1,3,3-tetraethyl-1,3-divinyldioxane.

彼等中作為較佳化合物,可列舉:1,1,3,3-四甲基-1,3-二乙烯基二矽氧烷。 Among them, preferred examples thereof include 1,1,3,3-tetramethyl-1,3-divinyldioxane.

水解縮聚物[II]可適用上述水解縮聚物[I]之製造方法而製造。即,藉由將上述水解縮聚物[I]之製造方法中之二烷氧基矽烷[3]、三烷氧基矽烷[4]、四烷氧基矽烷[5]分別置換為二烷氧基矽烷[6]、三烷氧基矽烷[7]、四烷氧基矽烷[8],將水解縮聚物[I]置換為水解縮聚物[II],可說明水解縮聚物[II]之製造方法。 The hydrolysis polycondensate [II] can be produced by applying the above-described method for producing the hydrolysis polycondensate [I]. That is, the dialkoxy decane [3], the trialkoxy decane [4], the tetraalkoxy decane [5] in the production method of the above-mentioned hydrolysis polycondensate [I] is replaced with a dialkoxy group, respectively. Hydrane [6], trialkoxydecane [7], tetraalkoxydecane [8], hydrolyzed polycondensate [I] substituted with hydrolyzed polycondensate [II], method for producing hydrolyzed polycondensate [II] .

其次,對使水解縮聚物[II]與乙烯基矽烷化合物[10]進行反應而製造(B)成分之方法加以說明。(B)成分可適用自上述水解縮聚物[I]製造(A)成分之方法而製造。即,藉由將上述水解縮聚物[II]之製造方法中之矽烷化合物[9]、氯矽烷化合物[9-1]、矽烷醇化合物[9-2]、單烷氧基矽烷化合物[9-3]、二矽氧烷化合物[9-4]分別置換為乙烯基矽烷化合物[10]、氯乙烯基矽烷化合物[10-1]、乙烯基矽烷醇化合物[10-2]、單烷氧基乙烯基矽烷化合物[10-3]、二乙烯基二矽氧烷化合物[10-4],將SiH基、水解縮聚物[I]、(A)成分分別置換為Si-CH=CH2基、水解縮聚物[II]、(B)成分,可說明自水解縮聚物[II]製造(B)成分之方法。 Next, a method of producing the component (B) by reacting the hydrolyzed polycondensate [II] with a vinyl decane compound [10] will be described. The component (B) can be produced by a method in which the component (A) is produced by hydrolyzing the polycondensate [I]. That is, the decane compound [9], the chlorodecane compound [9-1], the stanol compound [9-2], the monoalkoxydecane compound [9- in the production method of the above hydrolysis polycondensate [II]. 3], the dioxantane compound [9-4] is substituted with a vinyl decane compound [10], a chlorovinyl decane compound [10-1], a vinyl stanol compound [10-2], a monoalkoxy group, respectively. a vinyl decane compound [10-3], a divinyl dioxane compound [10-4], and a SiH group, a hydrolyzed polycondensate [I], and (A) component are respectively substituted with a Si-CH=CH 2 group, The method of producing the component (B) from the hydrolyzed polycondensate [II] can be explained by hydrolyzing the polycondensate [II] and (B) components.

((C)成分之獲取方法) (Method of obtaining (C) component)

(C)成分可使用市售品,亦可使用合成者。(C)成分可藉由先前已 知之方法而合成。 A commercially available product can be used as the component (C), and a synthesizer can also be used. (C) component can be previously Synthesize by knowing the method.

[硬化性聚矽氧樹脂組合物之硬化物] [The cured product of the curable polyoxynoxy resin composition]

本發明之硬化物可藉由加熱本發明之組合物而獲得。 The cured product of the present invention can be obtained by heating the composition of the present invention.

本發明之硬化物可用作半導體裝置用之密封材,其中較佳為用作光半導體裝置用、功率半導體裝置用之密封材。作為光半導體裝置用之密封材,可較佳用作LED用光學構件之密封材或半導體雷射用光學構件之密封材等,其中,尤佳為用作LED用光學構件之密封材。 The cured product of the present invention can be used as a sealing material for a semiconductor device, and is preferably used as a sealing material for an optical semiconductor device or a power semiconductor device. The sealing material for an optical semiconductor device can be preferably used as a sealing material for an optical member for an LED or a sealing member for an optical member for a semiconductor laser. Among them, a sealing material for an optical member for an LED is particularly preferable.

通常,光半導體裝置可藉由各種技術而提高其光提取效率,但若光半導體元件之密封材之透明度較低,則該密封材會吸收光,使用其之光半導體裝置之光提取效率下降。其結果,存在難以獲得高亮度之光半導體裝置製品之傾向。進而,光提取效率下降所相當之能量轉變為熱,成為光半導體裝置之熱劣化之原因,故而欠佳。 In general, the optical semiconductor device can improve its light extraction efficiency by various techniques. However, if the transparency of the sealing material of the optical semiconductor element is low, the sealing material absorbs light, and the light extraction efficiency of the optical semiconductor device using the same is lowered. As a result, there is a tendency that it is difficult to obtain a high-intensity optical semiconductor device product. Further, the energy corresponding to the decrease in the light extraction efficiency is converted into heat, which is a cause of thermal deterioration of the optical semiconductor device, which is not preferable.

本發明之硬化物之透明性優異。具體而言,本發明之硬化物於通常300nm以上,較佳為350nm以上,又通常900nm以下,較佳為500nm以下之區域之波長中具有良好之透光率。因此,若於該區域內具有發光波長之光半導體裝置上使用本發明之硬化物作為上述密封材,則可獲得高亮度之光半導體裝置,故而較佳。再者,其不妨礙於上述區域外具有發光波長之光半導體裝置上使用本發明之硬化物作為密封材。再者,上述透光率可藉由利用紫外/可見分光光度計之透過率測定而測定。 The cured product of the present invention is excellent in transparency. Specifically, the cured product of the present invention has a good light transmittance in a wavelength of usually 300 nm or more, preferably 350 nm or more, and usually 900 nm or less, preferably 500 nm or less. Therefore, if the cured product of the present invention is used as the sealing material on the optical semiconductor device having the emission wavelength in the region, an optical semiconductor device having high luminance can be obtained, which is preferable. Further, it is not hindered from using the cured product of the present invention as a sealing material on an optical semiconductor device having an emission wavelength outside the above region. Furthermore, the above light transmittance can be measured by transmittance measurement using an ultraviolet/visible spectrophotometer.

又,本發明之硬化物之耐熱透明性優異。即,本發明之硬化物具有即使於高溫條件下長時間放置之情形下,具有特定波長之光之透過率亦難以變動之性質。具體而言,本發明之硬化物於200℃下放置100小時之前後,對於通常300nm以上,較佳為350nm以上,又通常900nm以下,較佳為500nm以下之區域之波長之光之透過率具有良好之維持率。因此,若於該區域內具有發光波長之光半導體裝置上使用 本發明之硬化物作為密封材,則可獲得高亮度之光半導體裝置,且難以熱劣化,故而較佳。再者,其不妨礙於上述區域外具有發光波長之光半導體裝置上使用本發明之硬化物作為密封材。再者,透過率之變動比可藉由利用紫外/可見分光光度計之透過率測定而測定。 Further, the cured product of the present invention is excellent in heat-resistant transparency. That is, the cured product of the present invention has a property that the transmittance of light having a specific wavelength hardly changes even when it is left for a long period of time under high temperature conditions. Specifically, the cured product of the present invention has a transmittance of light having a wavelength of usually 300 nm or more, preferably 350 nm or more, and usually 900 nm or less, preferably 500 nm or less, after being left at 200 ° C for 100 hours. Good maintenance rate. Therefore, if it is used in an optical semiconductor device having an emission wavelength in the region The cured product of the present invention is preferably used as a sealing material to obtain a high-intensity optical semiconductor device and is difficult to thermally deteriorate. Further, it is not hindered from using the cured product of the present invention as a sealing material on an optical semiconductor device having an emission wavelength outside the above region. Furthermore, the variation ratio of the transmittance can be measured by the transmittance measurement using an ultraviolet/visible spectrophotometer.

使本發明之組合物硬化之方法並無特別限定。例如,可藉由將本發明之組合物向應使用之部位注入、滴加、流延、澆鑄成型、自容器擠出等之方法,或藉由轉移成形或射出成形之一體成形,而與如LED之密封對象物組合,通常藉由於45~300℃,較佳為60~200℃下加熱,可使該組合物硬化而成為硬化物,從而密封該密封對象物。若加熱溫度為45℃以上,則所得硬化物中難以觀測到黏著性,若為300℃以下,則所得硬化物中難以觀測到發泡,具有實用性。加熱時間並無特別限定,可為0.5小時~12小時左右,較佳為1小時~10小時左右。若加熱時間為0.5小時以上,則硬化充分進行,但於LED密封用等要求精度之情形時,較佳為延長硬化時間。 The method of hardening the composition of the present invention is not particularly limited. For example, by injecting, dropping, casting, casting, extruding from a container, etc., or by a transfer molding or injection molding, the composition of the present invention may be formed by, for example, transfer molding or injection molding. The LED sealing object combination is usually heated at 45 to 300 ° C, preferably 60 to 200 ° C, to cure the composition to a cured product, thereby sealing the sealing object. When the heating temperature is 45° C. or more, adhesion is hard to be observed in the obtained cured product, and when it is 300° C. or less, foaming is hardly observed in the obtained cured product, and it is practical. The heating time is not particularly limited and may be from about 0.5 hours to about 12 hours, preferably from about 1 hour to about 10 hours. When the heating time is 0.5 hours or more, the hardening is sufficiently performed. However, in the case where the precision for LED sealing or the like is required, the curing time is preferably extended.

[密封材] [sealing material]

本發明之硬化物可用作半導體裝置用之密封材,尤其適合用作光半導體裝置用、功率半導體裝置用等之密封材。包含本發明之硬化物之密封材如上所述耐熱透明性優異。又,通常與先前之加成硬化性聚矽氧樹脂組合物之硬化物相同,耐熱性、耐寒性、電氣絕緣性優異。 The cured product of the present invention can be used as a sealing material for a semiconductor device, and is particularly suitably used as a sealing material for an optical semiconductor device or a power semiconductor device. The sealing material containing the cured product of the present invention is excellent in heat-resistant transparency as described above. Moreover, it is generally excellent in heat resistance, cold resistance, and electrical insulation properties similarly to the cured product of the prior addition-hardening polyoxyxene resin composition.

[光半導體裝置] [Optical semiconductor device]

本發明之光半導體裝置係至少具備光半導體元件之光半導體裝置,藉由本發明之硬化物而至少密封該光半導體元件。本發明之光半導體裝置中之其他構成並無特別限定,光半導體元件外亦可具備其他構件。作為此種構件之一例,例如可列舉:基底基板、引出配線、導線配線、控制元件、絕緣基板、反射材、散熱器、導電構件、黏晶 材、接合墊等。又,除光半導體元件外,構件之一部分或全部可經本發明之硬化物密封。 The optical semiconductor device of the present invention is an optical semiconductor device including at least an optical semiconductor element, and at least the optical semiconductor element is sealed by the cured product of the present invention. The other configuration of the optical semiconductor device of the present invention is not particularly limited, and other members may be provided in addition to the optical semiconductor element. Examples of such a member include a base substrate, lead wires, wire harnesses, control elements, insulating substrates, reflective materials, heat sinks, conductive members, and die-bonding crystals. Materials, bonding pads, etc. Further, in addition to the optical semiconductor element, part or all of the member may be sealed by the cured product of the present invention.

作為本發明之光半導體裝置,具體可列舉:發光二極體(LED)裝置、半導體雷射裝置及光電耦合器等,但並不限定於彼等。本發明之光半導體裝置例如可較佳用於:液晶顯示器等之背光裝置,照明,各種感測器、印表機及影印機等之光源,車輛用計測器光源,信號燈、顯示燈、顯示裝置、面狀發光體之光源,顯示器、裝飾、各種燈以及開關元件等。 Specific examples of the optical semiconductor device of the present invention include a light-emitting diode (LED) device, a semiconductor laser device, and a photocoupler, but are not limited thereto. The optical semiconductor device of the present invention can be preferably used, for example, for a backlight device such as a liquid crystal display, illumination, a light source for various sensors, printers, and photocopiers, a vehicle light source, a signal lamp, a display lamp, and a display device. Light source for a planar illuminator, display, decoration, various lamps, and switching elements.

本發明之光半導體裝置之一例示於圖1。如圖1所例示,光半導體裝置10係於光半導體基板6上至少具備密封材1、光半導體元件2、接合線3。光半導體基板6具有包括包含引線框架5之底面與包含反射材4之內周側面之凹部。 An example of the optical semiconductor device of the present invention is shown in Fig. 1. As illustrated in FIG. 1 , the optical semiconductor device 10 includes at least the sealing material 1 , the optical semiconductor element 2 , and the bonding wires 3 on the optical semiconductor substrate 6 . The optical semiconductor substrate 6 has a concave portion including a bottom surface of the lead frame 5 and an inner peripheral side surface including the reflective material 4.

光半導體元件2係使用黏晶材(未圖示)而連接於引線框架5上。光半導體元件2所具備之接合墊(未圖示)與引線框架5係藉由接合線3而電性連接。反射材4具有使自光半導體元件2之光於特定方向反射之作用。於光半導體基板6所具有之上述凹部之區域內,以至少密封光半導體元件2之方式填充有密封材1。此時,可以亦密封接合線3之方式而填充密封材1。密封材1包含本發明之硬化物。密封材1之內部可含有上述螢光體(未圖示)。藉由密封材1,可保護光半導體元件2不受濕氣、塵埃等影響,可長時間維持可靠性。進而,藉由使密封材1亦密封接合線3,可同時防止因接合線3脫線、切斷、短路而產生之電性不良。 The optical semiconductor element 2 is connected to the lead frame 5 by using a die bond (not shown). A bonding pad (not shown) provided in the optical semiconductor element 2 and the lead frame 5 are electrically connected by a bonding wire 3 . The reflective material 4 has a function of reflecting light from the optical semiconductor element 2 in a specific direction. The sealing material 1 is filled in the region of the concave portion of the optical semiconductor substrate 6 so as to at least seal the optical semiconductor element 2. At this time, the sealing material 1 can be filled in such a manner that the bonding wire 3 is also sealed. The sealing material 1 contains the cured product of the present invention. The inside of the sealing material 1 may contain the above-mentioned phosphor (not shown). By the sealing material 1, the optical semiconductor element 2 can be protected from moisture, dust, and the like, and reliability can be maintained for a long period of time. Further, by sealing the bonding wire 3 also with the sealing material 1, it is possible to prevent electrical defects caused by the wire, the cutting, and the short circuit of the bonding wire 3 at the same time.

本發明之硬化物如下所述可用作半導體用接著劑。因此,亦可用作上述黏晶材等。 The cured product of the present invention can be used as an adhesive for a semiconductor as described below. Therefore, it can also be used as the above-mentioned cement crystal material or the like.

於光半導體裝置10中,作為經包含本發明之硬化物之密封材1而密封之光半導體元件2,例如可列舉:LED、半導體雷射、光電二極 體、光電晶體、太陽電池、CCD(電荷藕合元件)等。再者,圖1所示之結構僅為本發明之光半導體裝置之一例,反射材之結構、引線框架之結構、光半導體元件之安裝結構等可適宜變形。 In the optical semiconductor device 10, the optical semiconductor element 2 sealed by the sealing material 1 including the cured product of the present invention includes, for example, an LED, a semiconductor laser, and a photodiode. Body, photoelectric crystal, solar cell, CCD (charge matching element), etc. Further, the structure shown in Fig. 1 is only an example of the optical semiconductor device of the present invention, and the structure of the reflective material, the structure of the lead frame, the mounting structure of the optical semiconductor element, and the like can be suitably modified.

製造圖1所示之光半導體裝置10之方法並無特別限定。例如可列舉以下方法:於具備反射材4之引線框架5上晶片接合光半導體元件2,將該光半導體元件2與引線框架5藉由接合線3進行打線接合,繼而,於光半導體元件之周圍設置之反射材之內側(包括引線框架與反射材之凹部)填充本發明之組合物後,於50~250℃下加熱而使之硬化從而製為密封材1。 The method of manufacturing the optical semiconductor device 10 shown in FIG. 1 is not particularly limited. For example, a method in which the optical semiconductor element 2 is bonded to the lead frame 5 including the reflective material 4, and the optical semiconductor element 2 and the lead frame 5 are bonded by a bonding wire 3, and then around the optical semiconductor element The inside of the reflective material (including the lead frame and the concave portion of the reflective material) is filled with the composition of the present invention, and then heated at 50 to 250 ° C to be hardened to obtain a sealing material 1.

[半導體裝置用接著劑] [Binder for Semiconductor Device]

本發明之組合物具有良好之密接性,故而可用作半導體裝置用接著劑。具體而言,例如於接著半導體元件與封裝體之情形時、於接著半導體元件與子安裝基板之情形時、於接著封裝體構成元件彼此之情形時、於接著半導體裝置與外部光學構件之情形時等,可藉由塗佈、印刷、灌封等而使用本發明之組合物。本發明之組合物之耐熱性優異,故而於用作長時間暴露於高溫或紫外光下之高輸出之光半導體裝置用接著劑之情形時,可提供具有可耐受長期使用之高可靠性之光半導體裝置。 The composition of the present invention has good adhesion and can be used as an adhesive for semiconductor devices. Specifically, for example, in the case of the semiconductor element and the package, in the case of the semiconductor element and the sub-mount substrate, and then in the case where the package constitutes the elements, in the case of the semiconductor device and the external optical member Alternatively, the composition of the present invention can be used by coating, printing, potting, or the like. Since the composition of the present invention is excellent in heat resistance, it can provide high reliability which can withstand long-term use when it is used as an adhesive for an optical semiconductor device having a high output exposed to high temperature or ultraviolet light for a long period of time. Optical semiconductor device.

[實施例] [Examples]

以下,藉由實施例具體說明本發明,但本發明並不限定於彼等實施例。 Hereinafter, the present invention will be specifically described by examples, but the present invention is not limited to the examples.

以下之合成例、比較合成例中合成之聚矽氧樹脂之物性可依據下述方法而測定、評價。 The physical properties of the polyanthracene resin synthesized in the following synthesis examples and comparative synthesis examples can be measured and evaluated according to the following methods.

[SiH基及Si-CH=CH2基之定量] [Quantification of SiH-based and Si-CH=CH 2 groups]

於6mL之樣品管中稱量聚矽氧樹脂20~30mg,添加0.8mL之氘代二氯甲烷,使聚矽氧樹脂溶解。以微量注射器於該溶液中添加2.0 μL之二甲基亞碸(0.0282mmol),關閉樣品管,攪拌溶液使之變得均勻而成為測定試料。將該試料以1H-NMR進行測定,算出二甲基亞碸之質子比與H-Si基或CH2=CH-Si基之質子比,決定測定試料中之H-Si基或CH2=CH-Si基之莫耳數。繼而,依據下式,算出測定試料1g中之各官能基之含量:聚矽氧樹脂中之官能基之莫耳數(mmol)/測定試料量(mg)×1000=測定試料1g中之官能基量(mmol/g)。 20 to 30 mg of polyfluorene oxide resin was weighed in a 6 mL sample tube, and 0.8 mL of deuterated dichloromethane was added to dissolve the polyoxynoxy resin. 2.0 μL of dimethyl hydrazine (0.0282 mmol) was added to the solution with a micro syringe, the sample tube was closed, and the solution was stirred to make it uniform and became a measurement sample. The sample was measured in 1 H-NMR, dimethyl sulfoxide calculating the ratio of the proton and the proton H-Si group or CH 2 = CH-Si group ratio, measured in a sample determines the H-Si group or CH 2 = The number of moles of CH-Si. Then, the content of each functional group in the measurement sample 1 g was calculated according to the following formula: the number of moles of the functional group in the polyoxynoxy resin (mmol) / the amount of the measurement sample (mg) × 1000 = the functional group in the measurement sample 1 g Amount (mmol/g).

再者,聚矽氧樹脂之1H-NMR測定中使用共振頻率400MHz之核磁共振裝置(日本電子股份有限公司製造,型號:ECA-400)。聚矽氧樹脂中之各官能基之化學位移示於以下:Me-Si:0.0~0.5ppm(3 H),H-Si:4.0~5.0ppm(1 H),CH2=CH-Si:5.5~6.5ppm(3 H),Ph-Si:7.0~8.0ppm(5 H)。 Further, in the 1 H-NMR measurement of the polyoxyxylene resin, a nuclear magnetic resonance apparatus (manufactured by JEOL Ltd., model: ECA-400) having a resonance frequency of 400 MHz was used. The chemical shift of each functional group in the polyoxyxene resin is shown below: Me-Si: 0.0 to 0.5 ppm (3 H), H-Si: 4.0 to 5.0 ppm (1 H), CH 2 = CH-Si: 5.5 ~6.5 ppm (3 H), Ph-Si: 7.0 to 8.0 ppm (5 H).

[甲苯之定量] [Quantification of toluene]

於6mL之樣品管中稱量聚矽氧樹脂20~30mg,添加0.8mL之氘代二氯甲烷,使聚矽氧樹脂溶解。關閉樣品管,攪拌溶液使之變得均勻而成為測定試料。將該試料以1H-NMR進行測定,算出聚矽氧樹脂中之Me基及Ph基之質子比與甲苯之Me基之質子比,決定測定試料中之甲苯量。繼而,依據下式,算出聚矽氧樹脂中之甲苯之含量:(甲苯之分子量(mol/g)×Me(甲苯)之面積/3)/(((PhSiO1.5之分子量(mol/g))×((Ph之面積-(Me(甲苯)之面積×5/3))/5))+((Me2SiO之分子量(mol/g))×Me之面積×6)+(甲苯之分子量(mol/g)×Me(甲苯)之面積/3))=含有甲苯量(wt%) 20 to 30 mg of polyfluorene oxide resin was weighed in a 6 mL sample tube, and 0.8 mL of deuterated dichloromethane was added to dissolve the polyoxynoxy resin. The sample tube was closed, and the solution was stirred to make it uniform and became a measurement sample. The sample was measured by 1 H-NMR, and the proton ratio of the Me group and the Ph group in the polyoxynoxy resin to the Me group of toluene was calculated, and the amount of toluene in the measurement sample was determined. Then, the content of toluene in the polyfluorene oxide resin was calculated according to the following formula: (molecular weight of toluene (mol/g) × area of Me (toluene) / 3) / ((( molecular weight (mol/g) of (PhSiO 1.5 )) ×((the area of Ph - (area of Me (toluene) × 5 / 3)) / 5)) + ((molecular weight of Me 2 SiO (mol / g)) × area of Me × 6) + (molecular weight of toluene (mol/g) × area of Me (toluene) / 3)) = amount of toluene (wt%)

再者,聚矽氧樹脂之1H-NMR測定中使用共振頻率400MHz之核磁共振裝置(日本電子股份有限公司製造,型號:ECA-400)。聚矽氧 樹脂中之各官能基之化學位移示於以下:Me:0.0~0.5ppm(3 H),Me(甲苯):2.2~2.4ppm(3 H),Ph:7.0~8.0ppm(5 H)。 Further, in the 1 H-NMR measurement of the polyoxyxylene resin, a nuclear magnetic resonance apparatus (manufactured by JEOL Ltd., model: ECA-400) having a resonance frequency of 400 MHz was used. The chemical shift of each functional group in the polyoxyxene resin is shown below: Me: 0.0 to 0.5 ppm (3 H), Me (toluene): 2.2 to 2.4 ppm (3 H), and Ph: 7.0 to 8.0 ppm (5 H) ).

[HO-Si基之定量] [Quantification of HO-Si based]

於聚矽氧樹脂200mg中添加0.5mL之氘氯仿使之溶解,添加作為緩和劑之乙醯丙酮鉻(III)錯合物10mg。將藉此製備之溶液以29Si-NMR進行測定。將檢測出之訊號如表1所示分類為波峰(a)~(p),將各個波峰自總積分值之和作為百分率(積分比)而算出。再者,聚矽氧樹脂之29Si-NMR測定中使用共振頻率400MHz之核磁共振裝置(日本電子股份有限公司製造,型號:JNM-AL400)。 To 200 mg of the polyoxyxylene resin, 0.5 mL of chloroform was added to dissolve it, and 10 mg of an acetaminoacetate chromium (III) complex as a moderator was added. The solution thus prepared was measured by 29 Si-NMR. The detected signals are classified into peaks (a) to (p) as shown in Table 1, and the sum of the respective peaks from the total integrated value is calculated as a percentage (integral ratio). Further, in the 29 Si-NMR measurement of the polyoxyxylene resin, a nuclear magnetic resonance apparatus (manufactured by JEOL Ltd., model: JNM-AL400) having a resonance frequency of 400 MHz was used.

[化23] (H-SiR1 2O1/2)a(SiR2 2O2/2)b(R3SiO3/2)c(SiO4/2)d [1] (H-SiR 1 2 O 1/2 ) a (SiR 2 2 O 2/2 ) b (R 3 SiO 3/2 ) c (SiO 4/2 ) d [1]

上述式[1]中之a、b、c、d之值可藉由自下式算出而決定:a=波峰(i)面積/總波峰面積之和,b=(波峰(a)面積+波峰(b)面積)/總波峰面積之和,c=(波峰(c)面積+波峰(d)面積+波峰(e)面積)/總波峰面積之和,d=(波峰(f)面積+波峰(g)面積+波峰(h)面積)/總波峰面積之和。 The values of a, b, c, and d in the above formula [1] can be determined by the following equation: a = peak (i) area / total peak area sum, b = (peak (a) area + peak (b) area) / total peak area sum, c = (peak (c) area + peak (d) area + peak (e) area) / total peak area sum, d = (peak (f) area + peak (g) area + peak (h) area) / total peak area sum.

[化24](CH2=CH-SiR4 2O1/2)e(SiR5 2O2/2)f(R6SiO3/2)g(SiO4/2)h [2] (CH 2 =CH-SiR 4 2 O 1/2 ) e (SiR 5 2 O 2/2 ) f (R 6 SiO 3/2 ) g (SiO 4/2 ) h [2]

上述式[2]中之e、f、g、h之值可藉由自下式算出而決定:e=波峰(j)面積/總波峰面積之和,f=(波峰(a)面積+波峰(b)面積)/總波峰面積之和,g=(波峰(c)面積+波峰(d)面積+波峰(e)面積)/總波峰面積之和,h=(波峰(f)面積+波峰(g)面積+波峰(h)面積)/總波峰面積之和。 The values of e, f, g, and h in the above formula [2] can be determined by calculating from the following equation: e = sum of peak (j) area / total peak area, f = (peak (a) area + peak (b) area) / total peak area sum, g = (peak (c) area + peak (d) area + peak (e) area) / total peak area sum, h = (peak (f) area + peak (g) area + peak (h) area) / total peak area sum.

29Si-NMR中,於Me-Si基、Ph-Si基、H-Si基、CH2=CH-Si基或其他基之波峰重疊之情形時,基於1H-NMR中之Me-Si基、Ph-Si基、H-Si基、CH2=CH-Si基或其他基之波峰之積分面積而算出。 In the case of 29 Si-NMR, when the peaks of Me-Si group, Ph-Si group, H-Si group, CH 2 =CH-Si group or other groups overlap, the Me-Si group based on 1 H-NMR The integrated area of the peaks of the Ph-Si group, the H-Si group, the CH 2 =CH-Si group or other groups is calculated.

比較合成例中合成之聚矽氧樹脂(DA1)及(DB1)中,進而基於下式而分別決定組成比:(H-SiO3/2)之組成比=(波峰(k)面積+波峰(l)面積+波峰(m)面積)/總波峰面積之和,(CH2=CHSiO3/2)之組成比=(波峰(n)面積+波峰(o)面積+波峰(p)面積)/總波峰面積之和。 Comparing the polyfluorene oxide resins (DA1) and (DB1) synthesized in the synthesis examples, the composition ratio was determined based on the following formula: composition ratio of (H-SiO 3/2 ) = (peak (k) area + peak ( l) area + peak (m) area) / total peak area sum, composition ratio of (CH 2 =CHSiO 3/2 ) = (peak (n) area + peak (o) area + peak (p) area) / The sum of the total peak areas.

HO-Si基之含量(mmol/g)係自上述方法算出之積分比依據下式而決定:[A]=波峰(a)積分比+2×波峰(c)積分比+波峰(d)積分比+2×波 峰(f)積分比+波峰(g)積分比+2×波峰(k)積分比+波峰(l)積分比+2×波峰(n)積分比+波峰(o)積分比,[B]=波峰(a)積分比×83.16+波峰(b)積分比×74.15+波峰(c)積分比×147.2+波峰(d)積分比×138.2+波峰(e)積分比×129.2+波峰(f)積分比×78.10+波峰(g)積分比×69.09+波峰(h)積分比×60.08+波峰(i)積分比×67.16+波峰(j)積分比×93.20+波峰(k)積分比×71.11+波峰(l)積分比×62.10+波峰(m)積分比×53.09+波峰(n)積分比×97.15+波峰(o)積分比×88.14+波峰(p)積分比×79.13,HO-Si基之含量(mmol/g)=([A]/[B])×1000。 The content of HO-Si group (mmol/g) is determined by the above method and is determined according to the following formula: [A] = peak (a) integral ratio + 2 × peak (c) integral ratio + peak (d) integral Than +2× wave Peak (f) integral ratio + peak (g) integral ratio + 2 × peak (k) integral ratio + peak (l) integral ratio + 2 × peak (n) integral ratio + peak (o) integral ratio, [B] = Peak (a) integral ratio × 83.16 + peak (b) integral ratio × 74.15 + peak (c) integral ratio × 147. 2 peak (d) integral ratio × 138. 2 peak (e) integral ratio × 129. 2 + peak (f) integral Ratio × 78.10 + peak (g) integral ratio × 69.09 + peak (h) integral ratio × 60.08 + peak (i) integral ratio × 67.16 + peak (j) integral ratio × 93.20 + peak (k) integral ratio × 71.11 + peak (l) integral ratio × 62.10 + peak (m) integral ratio × 53.09 + peak (n) integral ratio × 97.15 + peak (o) integral ratio × 88.14 + peak (p) integral ratio × 79.13, content of HO-Si base (mmol/g) = ([A] / [B]) × 1000.

29Si-NMR之測定中,波峰(i)及波峰(j)與波峰(a)重疊時,藉由1H-NMR之測定分別求出Ph-Si與H-Si之積分比及Ph-Si與CH=CH2-Si,若有其他波峰則與其他波峰之積分比之百分率,算出29Si-NMR之波峰(c)積分比+波峰(d)積分比+波峰(e)積分比,自1H-NMR之積分比求出波峰(i)及波峰(j)之29Si-NMR之積分比,減去自波峰(a)與波峰(i)及波峰(j)重疊之積分值算出之波峰(i)及波峰(j)之積分比,算出波峰(a)之積分值。其他情況下29Si-NMR之波峰重疊之情形時,以與上述方法相同之方式以1H-NMR之積分比為基礎而算出。 In the measurement of 29 Si-NMR, when the peak (i) and the peak (j) overlap with the peak (a), the integral ratio of Ph-Si to H-Si and Ph-Si were determined by 1 H-NMR measurement. And CH=CH 2 -Si, if there are other peaks, the percentage of the integral ratio of the other peaks, calculate the 29 Si-NMR peak (c) integral ratio + peak (d) integral ratio + peak (e) integral ratio, since The integral ratio of 1 H-NMR is calculated as the integral ratio of the 29 Si-NMR of the peak (i) and the peak (j), and the integral value of the overlap between the peak (a) and the peak (i) and the peak (j) is subtracted. The integral ratio of the peak (i) and the peak (j) is calculated as the integral value of the peak (a). In the case where the peaks of 29 Si-NMR overlap in other cases, the calculation is based on the integral ratio of 1 H-NMR in the same manner as the above method.

[質量平均分子量(Mw)測定] [Measurement of mass average molecular weight (Mw)]

聚矽氧樹脂之質量平均分子量(Mw)係藉由下述條件之凝膠滲透層析(簡稱:GPC)法,以聚苯乙烯為基準物質製作校準曲線而算出值:裝置:Tosoh股份有限公司製造,製品名:HLC-8320GPC,管柱:Tosoh股份有限公司製造,製品名:TSK gel Super HZ 2000×4,3000×2,洗提液:四氫呋喃。 The mass average molecular weight (Mw) of the polyoxyxene resin is calculated by a gel permeation chromatography (abbreviation: GPC) method using the following conditions, and a calibration curve is prepared using polystyrene as a reference material: Device: Tosoh Co., Ltd. Manufactured, product name: HLC-8320GPC, pipe column: manufactured by Tosoh Co., Ltd., product name: TSK gel Super HZ 2000×4, 3000×2, eluent: tetrahydrofuran.

又,關於質量平均分子量(Mw)超過1500者,係藉由下述條件之 凝膠滲透層析(簡稱:GPC)法,以聚苯乙烯為基準物質製作校準曲線而算出值:裝置:Tosoh股份有限公司製造,製品名:HLC-8320GPC,管柱:Tosoh股份有限公司製造,製品名:TSK gel Super HZM-H×2洗提液:四氫呋喃。 Further, regarding the mass average molecular weight (Mw) exceeding 1,500, the following conditions are employed. Gel permeation chromatography (abbreviation: GPC) method, using a polystyrene as a reference material to prepare a calibration curve and calculating the value: device: manufactured by Tosoh Co., Ltd., product name: HLC-8320GPC, column: manufactured by Tosoh Co., Ltd. Product name: TSK gel Super HZM-H×2 eluent: tetrahydrofuran.

[折射率] [refractive index]

聚矽氧樹脂之折射率係使用折射率計(京都電子工業股份有限公司製造,型號:RA-600)而測定。 The refractive index of the polyoxyxene resin was measured using a refractometer (manufactured by Kyoto Electronics Manufacturing Co., Ltd., model: RA-600).

[黏度測定] [Viscosity measurement]

關於聚矽氧樹脂之黏度,係使用旋轉黏度計(Brookfield.Engineering.Laboratories.Inc製造,品名:DV-II+PRO)與溫度控制單元(Brookfield.Engineering.Laboratories.Inc製造,品名:THERMOSEL),測定25℃下之值。 Regarding the viscosity of the polyoxyxene resin, a rotary viscometer (manufactured by Brookfield. Engineering. Laboratories. Inc., product name: DV-II+PRO) and a temperature control unit (manufactured by Brookfield. Engineering. Laboratories. Inc., product name: THERMOSEL) are used. The value at 25 ° C was measured.

[合成例1-1] [Synthesis Example 1-1]

<聚矽氧樹脂(I-1)之合成> <Synthesis of polyoxyl resin (I-1)>

於具備氟樹脂製之攪拌葉、戴氏回流器之容積2L之三口燒瓶中採取120.2g(1.0mol)之Me2Si(OMe)2、198.3g(1.0mol)之PhSi(OMe)3。繼而,將239.6g之2-丙醇、185.0g之水及0.12g之乙酸添加至該燒瓶內,對該燒瓶內於100℃下進行6小時連續加溫,進行水解及縮合反應。其後,使反應液返回至室溫,移至2L之分液漏斗中,添加400mL之甲苯及400mL之水,進行分液操作後,去除水層。繼而,藉由400mL之水進行2次有機層之清洗操作。其後,回收有機層,藉由蒸發器,減壓蒸餾去除甲苯,獲得作為無色黏性液體之聚矽氧樹脂(I-1)。 120.2 g (1.0 mol) of Me 2 Si(OMe) 2 and 198.3 g (1.0 mol) of PhSi(OMe) 3 were taken in a three-necked flask having a volume of 2 L of a fluororesin stirring blade and a Dairy reflux. Then, 239.6 g of 2-propanol, 185.0 g of water, and 0.12 g of acetic acid were added to the flask, and the flask was continuously heated at 100 ° C for 6 hours to carry out hydrolysis and condensation reaction. Thereafter, the reaction solution was returned to room temperature, transferred to a 2 L separatory funnel, and 400 mL of toluene and 400 mL of water were added to carry out a liquid separation operation, and then the aqueous layer was removed. Then, the organic layer was washed twice with 400 mL of water. Thereafter, the organic layer was recovered, and toluene was distilled off under reduced pressure by an evaporator to obtain a polyfluorene oxide resin (I-1) as a colorless viscous liquid.

聚矽氧樹脂(I-1)之產量為160.8g,質量平均分子量(Mw)為 1,000,組成比為(Me2SiO2/2)0.43(PhSiO3/2)0.57,HO-Si基之含量為7.8mmol/g(13質量%)。 The yield of the polyoxyxylene resin (I-1) was 160.8 g, the mass average molecular weight (Mw) was 1,000, and the composition ratio was (Me 2 SiO 2/2 ) 0.43 (PhSiO 3/2 ) 0.57 , and the content of the HO-Si group was It was 7.8 mmol/g (13 mass%).

[合成例1-2] [Synthesis Example 1-2]

<聚矽氧樹脂(A1)之合成> <Synthesis of polyoxyl resin (A1)>

將39.7g之聚矽氧樹脂(I-1)、119g之甲苯、39.7g之甲醇、8.3g之1,1,3,3-四甲基二矽氧烷及0.20mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加119g之水,進行萃取操作後,回收有機層。重複四次同樣之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由加熱之減壓蒸餾去除(130℃,2小時),獲得作為無色透明之黏性液體之聚矽氧樹脂(A1)。 39.7 g of polyoxynoxy resin (I-1), 119 g of toluene, 39.7 g of methanol, 8.3 g of 1,1,3,3-tetramethyldioxane and 0.20 mL of 70% concentrated nitric acid were added. The flask was stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 119 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated four times to wash the organic layer. Toluene was removed by distillation from an organic layer by an evaporator, and then distilled under reduced pressure by heating (130 ° C, 2 hours) to obtain a polyoxyl resin (A1) as a colorless transparent viscous liquid.

聚矽氧樹脂(A1)之產量為42.5g,質量平均分子量(Mw)為1,900,黏度為200cP,組成比為(Me2SiO2/2)0.31(PhSiO3/2)0.42(H(Me)2SiO1/2)0.27,H-Si基之含量為2.8mmol/g,HO-Si基之含量為2.0mmol/g(3.4質量%)。 The yield of polyoxyxylene resin (A1) was 42.5 g, the mass average molecular weight (Mw) was 1,900, the viscosity was 200 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.31 (PhSiO 3/2 ) 0.42 (H(Me) 2 SiO 1/2 ) 0.27 , the content of the H-Si group was 2.8 mmol/g, and the content of the HO-Si group was 2.0 mmol/g (3.4% by mass).

[合成例1-3] [Synthesis Example 1-3]

<聚矽氧樹脂(B1)之合成> <Synthesis of polyoxyl resin (B1)>

將19.9g之聚矽氧樹脂(I-1)、59.7g之甲苯、19.9g之甲醇、5.76g之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷及1.98mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加59.7g之水,進行萃取操作後,回收有機層。重複四次同樣之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由加熱之減壓蒸餾去除(130℃,2小時),獲得作為無色透明之黏性液體之聚矽氧樹脂(B1)。 19.9 g of polydecane resin (I-1), 59.7 g of toluene, 19.9 g of methanol, 5.76 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane And 1.98 mL of 70% concentrated nitric acid was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 59.7 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated four times to wash the organic layer. Toluene was removed by distillation from an organic layer by an evaporator, and then subjected to distillation under reduced pressure by heating (130 ° C, 2 hours) to obtain a polyoxyl resin (B1) as a colorless transparent viscous liquid.

聚矽氧樹脂(B1)之產量為20.6g,質量平均分子量(Mw)為1,800,黏度為350cP,組成比為 (Me2SiO2/2)0.32(PhSiO3/2)0.45(CH2=CH(Me)2SiO1/2)0.23,CH2=CH-Si基之含量為2.3mmol/g,HO-Si基之含量為2.1mmol/g(3.6質量%)。 The yield of the polyoxyxylene resin (B1) was 20.6 g, the mass average molecular weight (Mw) was 1,800, the viscosity was 350 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.32 (PhSiO 3/2 ) 0.45 (CH 2 =CH). (Me) 2 SiO 1/2 ) 0.23 , a CH 2 =CH-Si group content of 2.3 mmol/g, and a HO-Si group content of 2.1 mmol/g (3.6 mass%).

[合成例2-1] [Synthesis Example 2-1]

<聚矽氧樹脂(I-2)之合成> <Synthesis of polyoxyl resin (I-2)>

除使用114.2g(0.95mol)之Me2Si(OMe)2、188.4g(0.95mol)之PhSi(OMe)3及13.0g(0.063mol)之Si(OEt)4代替120.2g(1.0mol)之Me2Si(OMe)2及198.3g(1.0mol)之PhSi(OMe)3以外,進行與合成例1-1相同之操作。其結果,獲得作為無色黏性液體之聚矽氧樹脂(I-2)。 In addition to using 114.2 g (0.95 mol) of Me 2 Si(OMe) 2 , 188.4 g (0.95 mol) of PhSi(OMe) 3 and 13.0 g (0.063 mol) of Si(OEt) 4 instead of 120.2 g (1.0 mol) The same operation as in Synthesis Example 1-1 was carried out except for Me 2 Si(OMe) 2 and 198.3 g (1.0 mol) of PhSi(OMe) 3 . As a result, a polyfluorene oxide resin (I-2) as a colorless viscous liquid was obtained.

聚矽氧樹脂(I-2)之產量為163.0g,質量平均分子量(Mw)為900,生成物之組成比為(Me2SiO2/2)0.41(PhSiO3/2)0.52(SiO4/2)0.06,HO-Si基之含量為8.5mmol/g(14質量%)。 The yield of the polyoxyxylene resin (I-2) was 163.0 g, the mass average molecular weight (Mw) was 900, and the composition ratio of the product was (Me 2 SiO 2/2 ) 0.41 (PhSiO 3/2 ) 0.52 (SiO 4/). 2 ) 0.06 , and the content of the HO-Si group was 8.5 mmol/g (14% by mass).

[合成例2-2] [Synthesis Example 2-2]

<聚矽氧樹脂(A2)之合成> <Synthesis of polyoxyl resin (A2)>

將55.8g之聚矽氧樹脂(I-2)、167.4g之甲苯、55.8g之甲醇、12.7g之1,1,3,3-四甲基二矽氧烷及0.30mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加167.4g之水,進行萃取操作後,回收有機層。重複四次同樣之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由加熱之減壓蒸餾去除(130℃,2小時),獲得作為無色透明之黏性液體之聚矽氧樹脂(A2)。 55.8 g of polyoxynoxy resin (I-2), 167.4 g of toluene, 55.8 g of methanol, 12.7 g of 1,1,3,3-tetramethyldioxane and 0.30 mL of 70% concentrated nitric acid It was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 167.4 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated four times to wash the organic layer. Toluene was removed by distillation from an organic layer by an evaporator, and then subjected to distillation under reduced pressure by heating (130 ° C, 2 hours) to obtain a polyoxyl resin (A2) as a colorless transparent viscous liquid.

聚矽氧樹脂(A2)之產量為55.1g,質量平均分子量(Mw)為1,000,黏度為140cP,組成比為(Me2SiO2/2)0.21(PhSiO3/2)0.45(SiO4/2)0.06(H(Me)2SiO1/2)0.28,H-Si基之含量為2.6mmol/g,HO-Si基之含量為2.9mmol/g(4.9質量%)。 The yield of polyoxyxylene resin (A2) was 55.1 g, the mass average molecular weight (Mw) was 1,000, the viscosity was 140 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.21 (PhSiO 3/2 ) 0.45 (SiO 4/2). 0.06 (H(Me) 2 SiO 1/2 ) 0.28 , the content of the H-Si group was 2.6 mmol/g, and the content of the HO-Si group was 2.9 mmol/g (4.9% by mass).

[合成例2-3] [Synthesis Example 2-3]

<聚矽氧樹脂(B2)之合成> <Synthesis of polyoxyl resin (B2)>

將27.9g之聚矽氧樹脂(I-2)、83.7g之甲苯、27.9g之甲醇、8.81g之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷及3.03mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加83.7g之水,進行萃取操作後,回收有機層。重複四次同樣之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由加熱之減壓蒸餾去除(130℃,2小時),獲得作為無色透明之黏性液體之聚矽氧樹脂(B2)。 27.9 g of polyoxynoxy resin (I-2), 83.7 g of toluene, 27.9 g of methanol, and 8.81 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane And 3.03 mL of 70% concentrated nitric acid was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 83.7 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated four times to wash the organic layer. Toluene was removed by distillation from an organic layer by an evaporator, and then subjected to distillation under reduced pressure by heating (130 ° C, 2 hours) to obtain a polyoxyl resin (B2) as a colorless transparent viscous liquid.

聚矽氧樹脂(B2)之產量為29.5g,質量平均分子量(Mw)為1,100,黏度為200cP,組成比為(Me2SiO2/2)0.26(PhSiO3/2)0.42(SiO4/2)0.05(CH2=CH(Me)2SiO1/2)0.27,CH2=CH-Si基之含量為2.7mmol/g,HO-Si基之含量為1.7mmol/g(2.9質量%)。 The yield of the polyoxyxylene resin (B2) was 29.5 g, the mass average molecular weight (Mw) was 1,100, the viscosity was 200 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.26 (PhSiO 3/2 ) 0.42 (SiO 4/2). 0.05 (CH 2 =CH(Me) 2 SiO 1/2 ) 0.27 , the content of CH 2 =CH-Si group was 2.7 mmol/g, and the content of HO-Si group was 1.7 mmol/g (2.9% by mass).

[合成例3-1] [Synthesis Example 3-1]

<聚矽氧樹脂(I-3)之合成> <Synthesis of polyoxyl resin (I-3)>

除使用108.2g(0.90mol)之Me2Si(OMe)2、178.5g(0.90mol)之PhSi(OMe)3及26.0g(0.125mol)之Si(OEt)4代替120.2g(1.0mol)之Me2Si(OMe)2及198.3g(1.0mol)之PhSi(OMe)3以外,進行與合成例1-1相同之操作。其結果,獲得作為無色透明之黏性液體之聚矽氧樹脂(I-3)。 In place of 100.2 g (0.90 mol) of Me 2 Si(OMe) 2 , 178.5 g (0.90 mol) of PhSi(OMe) 3 and 26.0 g (0.125 mol) of Si(OEt) 4 instead of 120.2 g (1.0 mol) The same operation as in Synthesis Example 1-1 was carried out except for Me 2 Si(OMe) 2 and 198.3 g (1.0 mol) of PhSi(OMe) 3 . As a result, a polyfluorene oxide resin (I-3) which is a colorless transparent viscous liquid was obtained.

聚矽氧樹脂(I-3)之產量為154.2g,質量平均分子量(Mw)為900,組成比為(Me2SiO2/2)0.35(PhSiO3/2)0.56(SiO4/2)0.10,HO-Si基之含量為8.5mmol/g(14質量%)。 The yield of the polyoxyxylene resin (I-3) was 154.2 g, the mass average molecular weight (Mw) was 900, and the composition ratio was (Me 2 SiO 2/2 ) 0.35 (PhSiO 3/2 ) 0.56 (SiO 4/2 ) 0.10. The content of the HO-Si group was 8.5 mmol/g (14% by mass).

[合成例3-2] [Synthesis Example 3-2]

<聚矽氧樹脂(A3)之合成> <Synthesis of polyoxyl resin (A3)>

將57.4g之聚矽氧樹脂(I-3)、172.2g之甲苯、57.4g之甲醇、16.4g之1,1,3,3-四甲基二矽氧烷及0.39mL之70%濃硝酸添加至燒瓶內,於 室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加172.2g之水,進行萃取操作後,回收有機層。重複四次同樣之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由加熱之減壓蒸餾去除(130℃,2小時),獲得作為無色透明之黏性液體之聚矽氧樹脂(A3)。 57.4 g of polyoxynoxy resin (I-3), 172.2 g of toluene, 57.4 g of methanol, 16.4 g of 1,1,3,3-tetramethyldioxane and 0.39 mL of 70% concentrated nitric acid Add to the flask, at Stir at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 172.2 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated four times to wash the organic layer. Toluene was removed by distillation from an organic layer by an evaporator, and then subjected to distillation under reduced pressure by heating (130 ° C, 2 hours) to obtain a polyoxyl resin (A3) as a colorless transparent viscous liquid.

聚矽氧樹脂(A3)之產量為58.4g,質量平均分子量(Mw)為1,100,黏度為180cP,組成比為(Me2SiO2/2)0.15(PhSiO3/2)0.46(SiO4/2)0.07(H(Me)2SiO1/2)0.33,H-Si基之含量為3.2mmol/g,HO-Si基之含量為2.7mmol/g(4.6質量%)。 The yield of polyoxyxylene resin (A3) was 58.4 g, the mass average molecular weight (Mw) was 1,100, the viscosity was 180 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.15 (PhSiO 3/2 ) 0.46 (SiO 4/2). 0.07 (H(Me) 2 SiO 1/2 ) 0.33 , the content of the H-Si group was 3.2 mmol/g, and the content of the HO-Si group was 2.7 mmol/g (4.6% by mass).

[合成例3-3] [Synthesis Example 3-3]

<聚矽氧樹脂(B3)之合成> <Synthesis of polyoxyl resin (B3)>

將28.7g之聚矽氧樹脂(I-3)、86.1g之甲苯、28.7g之甲醇、11.4g之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷及3.92mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加86.1g之水,進行萃取操作後,回收有機層。重複四次同樣之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由加熱之減壓蒸餾去除(130℃,2小時),獲得作為無色透明之黏性液體之聚矽氧樹脂(B3)。 28.7 g of polyoxynoxy resin (I-3), 86.1 g of toluene, 28.7 g of methanol, and 11.4 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane And 3.92 mL of 70% concentrated nitric acid was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 86.1 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated four times to wash the organic layer. Toluene was removed by distillation from an organic layer by an evaporator, and then subjected to distillation under reduced pressure by heating (130 ° C, 2 hours) to obtain a polyoxyl resin (B3) as a colorless transparent viscous liquid.

聚矽氧樹脂(B3)之產量為32.7g,質量平均分子量(Mw)為1,300,黏度為230cP,組成比為(Me2SiO2/2)0.20(PhSiO3/2)0.43(SiO4/2)0.07(CH2=CH(Me)2SiO1/2)0.30,CH2=CH-Si基之含量為2.8mmol/g,HO-Si基之含量為1.7mmol/g(2.9質量%)。 The yield of polyoxyxylene resin (B3) was 32.7 g, the mass average molecular weight (Mw) was 1,300, the viscosity was 230 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.20 (PhSiO 3/2 ) 0.43 (SiO 4/2). 0.07 (CH 2 =CH(Me) 2 SiO 1/2 ) 0.30 , the content of CH 2 =CH-Si group was 2.8 mmol/g, and the content of HO-Si group was 1.7 mmol/g (2.9% by mass).

[合成例4-1] [Synthesis Example 4-1]

<聚矽氧樹脂(I-4)之合成> <Synthesis of polyoxyl resin (I-4)>

除使用96.2g(0.80mol)之Me2Si(OMe)2、158.6g(0.80mol)之 PhSi(OMe)3及52.1g(0.25mol)之Si(OEt)4代替120.2g(1.0mol)之Me2Si(OMe)2及198.3g(1.0mol)之PhSi(OMe)3以外,進行與合成例1-1相同之操作。其結果,獲得作為無色透明之黏性液體之聚矽氧樹脂(I-4)。 In place of 90.2 g (0.80 mol) of Me 2 Si(OMe) 2 , 158.6 g (0.80 mol) of PhSi(OMe) 3 and 52.1 g (0.25 mol) of Si(OEt) 4 instead of 120.2 g (1.0 mol) The same operation as in Synthesis Example 1-1 was carried out except for Me 2 Si(OMe) 2 and 198.3 g (1.0 mol) of PhSi(OMe) 3 . As a result, a polyfluorene oxide resin (I-4) which is a colorless transparent viscous liquid was obtained.

聚矽氧樹脂(I-4)之產量為143.4g,質量平均分子量(Mw)為1,100,組成比為(Me2SiO2/2)0.34(PhSiO3/2)0.51(SiO4/2)0.15,HO-Si基之含量為7.7mmol/g(13質量%)。 The yield of the polyoxyxylene resin (I-4) was 143.4 g, the mass average molecular weight (Mw) was 1,100, and the composition ratio was (Me 2 SiO 2/2 ) 0.34 (PhSiO 3/2 ) 0.51 (SiO 4/2 ) 0.15. The content of the HO-Si group was 7.7 mmol/g (13% by mass).

[合成例4-2] [Synthesis Example 4-2]

<聚矽氧樹脂(A4)之合成> <Synthesis of polyoxyl resin (A4)>

將173.7g之聚矽氧樹脂(I-4)、521.1g之甲苯、173.7g之甲醇、31.4g之1,1,3,3-四甲基二矽氧烷及0.75mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加521.1g之水,進行萃取操作後,回收有機層。重複四次同樣之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由加熱之減壓蒸餾去除(130℃,2小時),獲得作為無色透明之黏性液體之聚矽氧樹脂(A4)。 173.7 g of polyoxynoxy resin (I-4), 521.1 g of toluene, 173.7 g of methanol, 31.4 g of 1,1,3,3-tetramethyldioxane and 0.75 mL of 70% concentrated nitric acid It was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 521.1 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated four times to wash the organic layer. Toluene was removed by distillation from an organic layer by an evaporator, and then subjected to distillation under reduced pressure by heating (130 ° C, 2 hours) to obtain a polyoxyl resin (A4) as a colorless transparent viscous liquid.

聚矽氧樹脂(A4)之產量為165.7g,質量平均分子量(Mw)為1,500,黏度為4,000cP,組成比為(Me2SiO2/2)0.16(PhSiO3/2)0.45(SiO4/2)0.15(H(Me)2SiO1/2)0.24,H-Si基之含量為2.2mmol/g,HO-Si基之含量為3.1mmol/g(5.3質量%)。 The yield of polyoxyxylene resin (A4) was 165.7 g, the mass average molecular weight (Mw) was 1,500, the viscosity was 4,000 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.16 (PhSiO 3/2 ) 0.45 (SiO 4/ 2 ) 0.15 (H(Me) 2 SiO 1/2 ) 0.24 , the content of the H-Si group was 2.2 mmol/g, and the content of the HO-Si group was 3.1 mmol/g (5.3 mass%).

[合成例4-3] [Synthesis Example 4-3]

<聚矽氧樹脂(B4)之合成> <Synthesis of polyoxyl resin (B4)>

將91.4g之聚矽氧樹脂(I-4)、274.2g之甲苯、91.4g之甲醇、23.0g之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷及7.90mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加274.2g之水,進行萃取操作後,回收有機層。重複四次同樣 之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由加熱之減壓蒸餾去除(130℃,2小時),獲得作為無色透明之黏性液體之聚矽氧樹脂(B4)。 91.4 g of polyoxynoxy resin (I-4), 274.2 g of toluene, 91.4 g of methanol, 23.0 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane 7.90 mL of 70% concentrated nitric acid was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 274.2 g of water was added thereto, and after the extraction operation, the organic layer was recovered. Repeat the same four times The operation is performed thereby cleaning the organic layer. Toluene was removed by distillation from an organic layer by an evaporator, and then subjected to distillation under reduced pressure by heating (130 ° C, 2 hours) to obtain a polyoxyl resin (B4) as a colorless transparent viscous liquid.

聚矽氧樹脂(B4)之產量為99.2g,質量平均分子量(Mw)為1,400,黏度為2,500cP,組成比為(Me2SiO2/2)0.23(PhSiO3/2)0.41(SiO4/2)0.13(CH2=CH(Me)2SiO1/2)0.23,CH2=CH-Si基之含量為2.2mmol/g,HO-Si基之含量為1.9mmol/g(3.2質量%)。 The yield of polyoxyxylene resin (B4) was 99.2 g, the mass average molecular weight (Mw) was 1,400, the viscosity was 2,500 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.23 (PhSiO 3/2 ) 0.41 (SiO 4/ 2 ) 0.13 (CH 2 =CH(Me) 2 SiO 1/2 ) 0.23 , the content of CH 2 =CH-Si group is 2.2 mmol/g, and the content of HO-Si group is 1.9 mmol/g (3.2% by mass) .

[合成例5-1] [Synthesis Example 5-1]

<聚矽氧樹脂(I-5)之合成> <Synthesis of polyoxyl resin (I-5)>

除使用90.2g(0.75mol)之Me2Si(OMe)2、148.7g(0.75mol)之PhSi(OMe)3及65.1g(0.313mol)之Si(OEt)4代替120.2g(1.0mol)之Me2Si(OMe)2及198.3g(1.0mol)之PhSi(OMe)3以外,進行與合成例1-1相同之操作。其結果,獲得作為無色透明之黏性液體之聚矽氧樹脂(I-5)。 In place of 90.2 g (0.75 mol) of Me 2 Si(OMe) 2 , 148.7 g (0.75 mol) of PhSi(OMe) 3 and 65.1 g (0.313 mol) of Si(OEt) 4 instead of 120.2 g (1.0 mol) The same operation as in Synthesis Example 1-1 was carried out except for Me2Si(OMe) 2 and 198.3 g (1.0 mol) of PhSi(OMe) 3 . As a result, a polyfluorene oxide resin (I-5) which is a colorless transparent viscous liquid was obtained.

聚矽氧樹脂(I-5)之產量為137.7g,質量平均分子量(Mw)為1,300,組成比為(Me2SiO2/2)0.28(PhSiO3/2)0.53(SiO4/2)0.19,HO-Si基之含量為7.4mmol/g(13質量%)。 The yield of the polyoxyxylene resin (I-5) was 137.7 g, the mass average molecular weight (Mw) was 1,300, and the composition ratio was (Me 2 SiO 2/2 ) 0.28 (PhSiO 3/2 ) 0.53 (SiO 4/2 ) 0.19 The content of the HO-Si group was 7.4 mmol/g (13% by mass).

<聚矽氧樹脂(A5)之合成> <Synthesis of polyoxyl resin (A5)>

將28.6g之聚矽氧樹脂(I-5)、85.8g之甲苯、28.6g之甲醇、5.69g之1,1,3,3-四甲基二矽氧烷及0.14mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加85.8g之水,進行萃取操作後,回收有機層。重複四次同樣之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由加熱之減壓蒸餾去除(130℃,2小時),獲得作為無色透明之黏性液體之聚矽氧樹脂(A5)。 28.6 g of polyoxynoxy resin (I-5), 85.8 g of toluene, 28.6 g of methanol, 5.69 g of 1,1,3,3-tetramethyldioxane and 0.14 mL of 70% concentrated nitric acid It was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 85.8 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated four times to wash the organic layer. Toluene was removed by distillation from an organic layer by an evaporator, and then subjected to distillation under reduced pressure by heating (130 ° C, 2 hours) to obtain a polyoxyl resin (A5) as a colorless transparent viscous liquid.

聚矽氧樹脂(A5)之產量為27.5g,質量平均分子量(Mw)為1,600,黏度為15,000cP,組成比為(Me2SiO2/2)0.13(PhSiO3/2)0.43(SiO4/2)0.21(H(Me)2SiO1/2)0.23,H-Si基之含量為2.1mmol/g,HO-Si基之含量為2.7mmol/g(4.6質量%)。 The yield of polyoxyxylene resin (A5) was 27.5 g, the mass average molecular weight (Mw) was 1,600, the viscosity was 15,000 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.13 (PhSiO 3/2 ) 0.43 (SiO 4/ 2 ) 0.21 (H(Me) 2 SiO 1/2 ) 0.23 , the content of the H-Si group was 2.1 mmol/g, and the content of the HO-Si group was 2.7 mmol/g (4.6% by mass).

<聚矽氧樹脂(B5)之合成> <Synthesis of polyoxyl resin (B5)>

將14.3g之聚矽氧樹脂(I-5)、42.9g之甲苯、14.3g之甲醇、3.95g之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷及1.36mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加42.9g之水,進行萃取操作後,回收有機層。重複四次同樣之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由加熱之減壓蒸餾去除(130℃,2小時),獲得作為無色透明之黏性液體之聚矽氧樹脂(B5)。 14.3 g of polyoxynoxy resin (I-5), 42.9 g of toluene, 14.3 g of methanol, 3.95 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane And 1.36 mL of 70% concentrated nitric acid was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 42.9 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated four times to wash the organic layer. Toluene was removed by distillation from an organic layer by an evaporator, and then subjected to distillation under reduced pressure by heating (130 ° C, 2 hours) to obtain a polyoxyl resin (B5) as a colorless transparent viscous liquid.

聚矽氧樹脂(B5)之產量為15.2g,質量平均分子量(Mw)為1,500,黏度為23,000cP,組成比為(Me2SiO2/2)0.18(PhSiO3/2)0.40(SiO4/2)0.19(CH2=CH(Me)2SiO1/2)0.23,CH2=CH-Si基之含量為2.3mmol/g,Si-OH基之含量為1.7mmol/g(2.9質量%)。 The yield of the polyoxyxylene resin (B5) was 15.2 g, the mass average molecular weight (Mw) was 1,500, the viscosity was 23,000 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.18 (PhSiO 3/2 ) 0.40 (SiO 4/ 2 ) 0.19 (CH 2 =CH(Me) 2 SiO 1/2 ) 0.23 , the content of CH 2 =CH-Si group is 2.3 mmol/g, and the content of Si-OH group is 1.7 mmol/g (2.9% by mass) .

[合成例6-1] [Synthesis Example 6-1]

<聚矽氧樹脂(I-6)之合成> <Synthesis of polyoxyl resin (I-6)>

除使用84.2g(0.70mol)之Me2Si(OMe)2、138.8g(0.70mol)之PhSi(OMe)3及78.1g(0.375mol)之Si(OEt)4代替120.2g(1.0mol)之Me2Si(OMe)2及198.3g(1.0mol)之PhSi(OMe)3以外,進行與合成例1-1相同之操作。其結果,獲得作為無色透明之黏性液體之聚矽氧樹脂(I-6)。 In place of 80.2 g (0.70 mol) of Me 2 Si(OMe) 2 , 138.8 g (0.70 mol) of PhSi(OMe) 3 and 78.1 g (0.375 mol) of Si(OEt) 4 instead of 120.2 g (1.0 mol) The same operation as in Synthesis Example 1-1 was carried out except for Me 2 Si(OMe) 2 and 198.3 g (1.0 mol) of PhSi(OMe) 3 . As a result, a polyfluorene oxide resin (I-6) which is a colorless transparent viscous liquid was obtained.

聚矽氧樹脂(I-6)之產量為140.8g,質量平均分子量(Mw)為1,500,組成比為(Me2SiO2/2)0.29(PhSiO3/2)0.44(SiO4/2)0.27,HO-Si基之 含量為6.8mmol/g(12質量%)。 The yield of polyoxyxylene resin (I-6) was 140.8 g, the mass average molecular weight (Mw) was 1,500, and the composition ratio was (Me 2 SiO 2/2 ) 0.29 (PhSiO 3/2 ) 0.44 (SiO 4/2 ) 0.27. The content of the HO-Si group was 6.8 mmol/g (12% by mass).

[合成例6-2] [Synthesis Example 6-2]

<聚矽氧樹脂(A6)之合成> <Synthesis of polyoxyl resin (A6)>

將47.9g之聚矽氧樹脂(I-6)、143.7g之甲苯、47.9g之甲醇、10.9g之1,1,3,3-四甲基二矽氧烷及0.26mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加143.7g之水,進行萃取操作後,回收有機層。重複四次同樣之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由加熱之減壓蒸餾去除(130℃,2小時),獲得作為無色透明之黏性液體之聚矽氧樹脂(A6)。 47.9 g of polyoxynoxy resin (I-6), 143.7 g of toluene, 47.9 g of methanol, 10.9 g of 1,1,3,3-tetramethyldioxane and 0.26 mL of 70% concentrated nitric acid It was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 143.7 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated four times to wash the organic layer. Toluene was removed by distillation from an organic layer by an evaporator, and then distilled under reduced pressure by heating (130 ° C, 2 hours) to obtain a polyoxyl resin (A6) as a colorless transparent viscous liquid.

聚矽氧樹脂(A6)之產量為59.3g,質量平均分子量(Mw)為1,900,黏度為280,000cP,組成比為(Me2SiO2/2)0.15(PhSiO3/2)0.40(SiO4/2)0.22(H(Me)2SiO1/2)0.23,H-Si基之含量為1.6mmol/g,HO-Si基之含量為2.5mmol/g(4.3質量%)。 The yield of polyoxyxylene resin (A6) was 59.3 g, the mass average molecular weight (Mw) was 1,900, the viscosity was 280,000 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.15 (PhSiO 3/2 ) 0.40 (SiO 4/ 2 ) 0.22 (H(Me) 2 SiO 1/2 ) 0.23 , the content of the H-Si group was 1.6 mmol/g, and the content of the HO-Si group was 2.5 mmol/g (4.3% by mass).

[合成例6-3] [Synthesis Example 6-3]

<聚矽氧樹脂(B6)之合成> <Synthesis of polyoxyl resin (B6)>

將23.9g之聚矽氧樹脂(I-6)、71.7g之甲苯、23.9g之甲醇、7.55g之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷及2.60mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加71.7g之水,進行萃取操作後,回收有機層。重複四次同樣之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由加熱之減壓蒸餾去除(130℃,2小時),獲得作為無色透明之黏性液體之聚矽氧樹脂(B6)。 23.9 g of polyoxynoxy resin (I-6), 71.7 g of toluene, 23.9 g of methanol, and 7.55 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane 2.60 mL of 70% concentrated nitric acid was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 71.7 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated four times to wash the organic layer. Toluene was removed by distillation from an organic layer by an evaporator, and then subjected to distillation under reduced pressure by heating (130 ° C, 2 hours) to obtain a polyoxyl resin (B6) as a colorless transparent viscous liquid.

聚矽氧樹脂(B6)之產量為32.0g,質量平均分子量(Mw)為1,900,黏度為280,000cP,組成比為(Me2SiO2/2)0.19(PhSiO3/2)0.39(SiO4/2)0.21(CH2=CH(Me)2SiO1/2)0.21, CH2=CH-Si基之含量為1.9mmol/g,HO-Si基之含量為1.6mmol/g(2.7質量%)。 The yield of polyoxyxylene resin (B6) was 32.0 g, the mass average molecular weight (Mw) was 1,900, the viscosity was 280,000 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.19 (PhSiO 3/2 ) 0.39 (SiO 4/ 2 ) 0.21 (CH 2 =CH(Me) 2 SiO 1/2 ) 0.21 , the content of CH 2 =CH-Si group is 1.9 mmol/g, and the content of HO-Si group is 1.6 mmol/g (2.7% by mass) .

[比較合成例] [Comparative Synthesis Example]

<聚矽氧樹脂(DA1)之合成> <Synthesis of polyoxyl resin (DA1)>

除使用92.57g(0.77mol)之Me2Si(OMe)2、152.68g(0.77mol)之PhSi(OMe)3及47.05g(0.385mol)之HSi(OMe)3代替120.2g(1.0mol)之Me2Si(OMe)2及198.3g(1.0mol)之PhSi(OMe)3以外,進行與合成例1-1相同之操作。其結果,獲得作為無色透明之黏性液體之聚矽氧樹脂(DA1)。 In place of 92.57 g (0.77 mol) of Me 2 Si(OMe) 2 , 152.68 g (0.77 mol) of PhSi(OMe) 3 and 47.05 g (0.385 mol) of HSi(OMe) 3 instead of 120.2 g (1.0 mol) The same operation as in Synthesis Example 1-1 was carried out except for Me 2 Si(OMe) 2 and 198.3 g (1.0 mol) of PhSi(OMe) 3 . As a result, a polyfluorene oxide resin (DA1) which is a colorless transparent viscous liquid was obtained.

聚矽氧樹脂(DA1)之產量為144.2g,質量平均分子量(Mw)為1,400,黏度為34,000cP,組成比為(Me2SiO2/2)0.34(PhSiO3/2)0.42(HSiO3/2)0.24,H-Si基之含量為1.5mmol/g,HO-Si基之含量為7.2mmol/g(12質量%)。 The yield of polyoxyxylene resin (DA1) was 144.2 g, the mass average molecular weight (Mw) was 1,400, the viscosity was 34,000 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.34 (PhSiO 3/2 ) 0.42 (HSiO 3/ 2 ) 0.24 , the content of the H-Si group was 1.5 mmol/g, and the content of the HO-Si group was 7.2 mmol/g (12% by mass).

<聚矽氧樹脂(DA2)之合成> <Synthesis of polyoxyl resin (DA2)>

於具備氟樹脂製之攪拌葉、戴氏回流器之容積2L之三口燒瓶中採取48.1g(0.40mol)之Me2Si(OMe)2、79.3g(0.40mol)之PhSi(OMe)3及13.4g(0.10mol)之1,1,3,3-四甲基二矽氧烷。繼而,將106g之2-丙醇、79.3g之水及0.06g之乙酸添加至該燒瓶內,對該燒瓶內於100℃下進行6小時連續加溫,進行水解及縮合反應。其後,使反應液返回至室溫,移至1L之分液漏斗中,添加200mL之甲苯及200mL之水,進行分液操作後,去除水層。繼而藉由200mL之水進行2次有機層之清洗操作。其後,回收有機層,藉由蒸發器,減壓蒸餾去除甲苯,獲得作為無色黏性液體之聚矽氧樹脂(DA2)。 48.1 g (0.40 mol) of Me 2 Si(OMe) 2 , 79.3 g (0.40 mol) of PhSi(OMe) 3 and 13.4 were taken in a three-necked flask having a volume of 2 L of a fluororesin stirring blade and a Dy's reflux vessel. g (0.10 mol) of 1,1,3,3-tetramethyldioxane. Then, 106 g of 2-propanol, 79.3 g of water, and 0.06 g of acetic acid were added to the flask, and the flask was continuously heated at 100 ° C for 6 hours to carry out hydrolysis and condensation reaction. Thereafter, the reaction liquid was returned to room temperature, transferred to a 1 L separatory funnel, and 200 mL of toluene and 200 mL of water were added to carry out a liquid separation operation, and then the aqueous layer was removed. The organic layer was then washed twice with 200 mL of water. Thereafter, the organic layer was recovered, and toluene was distilled off under reduced pressure by an evaporator to obtain a polyfluorene oxide resin (DA2) as a colorless viscous liquid.

聚矽氧樹脂(DA2)之產量為81.6g,質量平均分子量(Mw)為650,黏度為300cP,組成比為(Me2SiO2/2)0.38(PhSiO3/2)0.40(H(Me)2SiO1/2)0.22,H-Si基之含量為1.55 mmol/g,HO-Si基之含量為4.7mmol/g(8.0質量%)。 The yield of polyoxyxylene resin (DA2) was 81.6 g, the mass average molecular weight (Mw) was 650, the viscosity was 300 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.38 (PhSiO 3/2 ) 0.40 (H(Me) 2 SiO 1/2 ) 0.22 , the content of the H-Si group was 1.55 mmol/g, and the content of the HO-Si group was 4.7 mmol/g (8.0% by mass).

<聚矽氧樹脂(DB1)之合成> <Synthesis of polyoxyl resin (DB1)>

除使用92.57g(0.77mol)之Me2Si(OMe)2、152.68g(0.77mol)之PhSi(OMe)3及57.07g(0.385mol)之CH2=CH-Si(OMe)3代替120.2g(1.0mol)之Me2Si(OMe)2及198.3g(1.0mol)之PhSi(OMe)3以外,進行與合成例1-1相同之操作。其結果,獲得作為無色透明之黏性液體之聚矽氧樹脂(DB1)。 In place of 92.57 g (0.77 mol) of Me 2 Si(OMe) 2 , 152.68 g (0.77 mol) of PhSi(OMe) 3 and 57.07 g (0.385 mol) of CH 2 =CH-Si(OMe) 3 instead of 120.2 g The same operation as in Synthesis Example 1-1 was carried out except for (1.0 mol) of Me 2 Si(OMe) 2 and 198.3 g (1.0 mol) of PhSi(OMe) 3 . As a result, a polyfluorene oxide resin (DB1) which is a colorless transparent viscous liquid was obtained.

聚矽氧樹脂(DB1)之產量為122.3g,質量平均分子量(Mw)為1,200,黏度為3,700cP,組成比為(Me2SiO2/2)0.33(PhSiO3/2)0.47(CH2=CHSiO3/2)0.20,CH2=CH-Si基之含量為1.7mmol/g,HO-Si基之含量為10.7mmol/g(18質量%)。 The yield of polyoxyxylene resin (DB1) was 122.3 g, the mass average molecular weight (Mw) was 1,200, the viscosity was 3,700 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.33 (PhSiO 3/2 ) 0.47 (CH 2 = The content of CHSiO 3/2 ) 0.20 , CH 2 =CH-Si group was 1.7 mmol/g, and the content of HO-Si group was 10.7 mmol/g (18% by mass).

<聚矽氧樹脂(DB2)之合成> <Synthesis of polyoxyl resin (DB2)>

於具備氟樹脂製之攪拌葉、戴氏回流器之容積2L之三口燒瓶中採取30.1g(0.25mol)之Me2Si(OMe)2、49.6g(0.25mol)之PhSi(OMe)3及11.7g(0.063mol)之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷。繼而,將59.9g之2-丙醇、46.3g之水及0.03g之乙酸添加至該燒瓶內,對該燒瓶內於100℃下進行6小時連續加溫,進行水解及縮合反應。其後,使反應液返回至室溫,移至1L之分液漏斗中,添加100mL之甲苯及100mL之水,進行分液操作後,去除水層。繼而藉由100mL之水進行2次有機層之清洗操作。其後,回收有機層,藉由蒸發器,減壓蒸餾去除甲苯,獲得作為無色黏性液體之聚矽氧樹脂(DB2)。 30.1 g (0.25 mol) of Me 2 Si(OMe) 2 , 49.6 g (0.25 mol) of PhSi(OMe) 3 and 11.7 were taken in a three-necked flask having a volume of 2 L of a fluororesin stirring blade and a Dy's reflux vessel. g (0.063 mol) of 1,3-divinyl-1,1,3,3-tetramethyldioxane. Then, 59.9 g of 2-propanol, 46.3 g of water, and 0.03 g of acetic acid were added to the flask, and the flask was continuously heated at 100 ° C for 6 hours to carry out hydrolysis and condensation reaction. Thereafter, the reaction solution was returned to room temperature, transferred to a 1 L separatory funnel, and 100 mL of toluene and 100 mL of water were added to carry out a liquid separation operation, and then the aqueous layer was removed. Then, the organic layer was washed twice by 100 mL of water. Thereafter, the organic layer was recovered, and toluene was distilled off under reduced pressure by an evaporator to obtain a polyoxyl resin (DB2) as a colorless viscous liquid.

聚矽氧樹脂(DB2)之產量為39.8g,質量平均分子量(Mw)為1,000,黏度為12,000cP,組成比為(Me2SiO2/2)0.42(PhSiO3/2)0.54(CH2=CH(Me)2)0.03,CH2=CH-Si基之含量為0.05mmol/g,HO-Si基之含量為8.6mmol/g(15質量%)。 The yield of polyoxyxylene resin (DB2) was 39.8 g, the mass average molecular weight (Mw) was 1,000, the viscosity was 12,000 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.42 (PhSiO 3/2 ) 0.54 (CH 2 = CH(Me) 2 ) 0.03 , CH 2 =CH-Si group content was 0.05 mmol/g, and HO-Si group content was 8.6 mmol/g (15 mass%).

<聚矽氧樹脂(DB3)之合成> <Synthesis of polyoxyl resin (DB3)>

除使用48.1g(0.40mol)之Me2Si(OMe)2、79.3g(0.40mol)之PhSi(OMe)3及23.2g(0.20mol)之二甲基乙烯基甲氧基矽烷代替48.1g(0.40mol)之Me2Si(OMe)2、79.3g(0.40mol)之PhSi(OMe)3及13.4g(0.10mol)之1,1,3,3-四甲基二矽氧烷,及於100℃下連續加溫15小時代替於100℃下連續加溫6小時以外,進行與上述<聚矽氧樹脂(DA2)之合成>相同之操作。其結果,獲得作為無色黏性液體之聚矽氧樹脂(DB3)。 In place of 48.1 g (48.1 g (0.40 mol) of Me 2 Si(OMe) 2 , 79.3 g (0.40 mol) of PhSi(OMe) 3 and 23.2 g (0.20 mol) of dimethylvinylmethoxy decane) 0.40 mol) of Me 2 Si(OMe) 2 , 79.3 g (0.40 mol) of PhSi(OMe) 3 and 13.4 g (0.10 mol) of 1,1,3,3-tetramethyldioxane, and The same operation as the above <synthesis of poly(oxygen oxide resin (DA2)> was carried out except that the heating was continued for 15 hours at 100 ° C instead of continuously heating at 100 ° C for 6 hours. As a result, a polyfluorene oxide resin (DB3) as a colorless viscous liquid was obtained.

聚矽氧樹脂(DB3)之產量為89.3g,質量平均分子量(Mw)為630,黏度為300cP,組成比為(Me2SiO2/2)0.37(PhSiO3/2)0.47(CH2=CH(Me)2SiO1/2)0.16,CH2=CH-Si基之含量為1.30mmol/g,HO-Si基之含量為6.8mmol/g(12質量%)。 The yield of polyoxyxylene resin (DB3) was 89.3 g, the mass average molecular weight (Mw) was 630, the viscosity was 300 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.37 (PhSiO 3/2 ) 0.47 (CH 2 =CH). (Me) 2 SiO 1/2 ) 0.16 , a CH 2 =CH-Si group content of 1.30 mmol/g, and a HO-Si group content of 6.8 mmol/g (12 mass%).

合成之聚矽氧樹脂(A1)~(A6)、聚矽氧樹脂(B1)~(B6)及聚矽氧樹脂(DA1)~(DA2)、(DB1)~(DB3)之組成比及各物性值(HO-Si基之含量、SiH基或Si-CH=CH2基之含量、質量平均分子量、黏度、折射率、透明性)示於表2。表2中,Vi表示乙烯基(CH2=CH-基)。 The composition ratios of the synthesized polyoxynoxy resins (A1) to (A6), polyoxyxylene resins (B1) to (B6), and polyoxyxylene resins (DA1) to (DA2) and (DB1) to (DB3) The physical property values (the content of the HO-Si group, the content of the SiH group or the Si-CH=CH 2 group, the mass average molecular weight, the viscosity, the refractive index, and the transparency) are shown in Table 2. In Table 2, Vi represents a vinyl group (CH 2 =CH- group).

<硬化性聚矽氧樹脂組合物及其硬化物> <Curable polyoxyn resin composition and cured product thereof>

製備之組合物之黏度、自該組合物獲得之硬化物之物理特性(硬度、密接性、耐熱性、透明性、耐熱透明性、線熱膨脹係數、5%重量減少溫度、接著強度)、硬化起始溫度及硬化時之外觀係如以下方式測定。再者,測定中所使用之組合物係將(A)成分之聚矽氧樹脂[聚矽氧樹脂(A1)~(A6)、(DA1)~(DA2)]與(B)成分之聚矽氧樹脂[聚矽氧樹脂(B1)~(B6)、(DB1)~(DB3)]以2:1之質量比調配,與(C)成分之鉑觸媒混合而製備實施例1~6及比較例1~3之組合物。此處,作為鉑觸媒,係以相對於組合物總量,鉑原子之含量以質量單位計成為0.03ppm之方式使用鉑-二乙烯基四甲基二矽氧烷錯合物。 The viscosity of the prepared composition, the physical properties of the cured product obtained from the composition (hardness, adhesion, heat resistance, transparency, heat-resistant transparency, linear thermal expansion coefficient, 5% weight reduction temperature, adhesion strength), hardening The initial temperature and the appearance at the time of hardening were measured as follows. Further, the composition used in the measurement is a polyfluorene resin of the component (A) [polyoxygen resin (A1) to (A6), (DA1) to (DA2)] and (B). Oxygen resins [polyoxynoxy resins (B1) to (B6), (DB1) to (DB3)] are prepared in a mass ratio of 2:1, and are mixed with a platinum catalyst of the component (C) to prepare Examples 1 to 6 and The compositions of Comparative Examples 1 to 3 were used. Here, as the platinum catalyst, a platinum-divinyltetramethyldioxane complex is used in such a manner that the content of platinum atoms is 0.03 ppm by mass based on the total amount of the composition.

[組合物之黏度] [Viscosity of composition]

關於製備之組合物之黏度,係使用旋轉黏度計(Brookfield.Engineering.Laboratories.Inc製造,品名:DV-II+PRO)與溫度控制單元(Brookfield.Engineering.Laboratories.Inc製造,品名:THERMOSEL),以剪切速度30[1/s],測定25℃下之值。 Regarding the viscosity of the prepared composition, a rotational viscometer (manufactured by Brookfield. Engineering. Laboratories. Inc., product name: DV-II+PRO) and a temperature control unit (manufactured by Brookfield. Engineering. Laboratories. Inc., product name: THERMOSEL) were used. The value at 25 ° C was measured at a shear rate of 30 [1/s].

[硬化物之硬度] [hardness of hardened material]

將製備之組合物流入模具(25mm )中,於空氣中於90℃下加熱1 小時,進而於150℃下加熱4小時製作厚度為4~5mm之硬化物。使用硬度計(durometer)(Teclock股份有限公司製造,型號:GS-719R,GS-720R),依據JIS K 7215「塑膠之硬度計硬度試驗方法」中規定之方法而測定該硬化物之蕭氏A或蕭氏D之硬度。再者,比較例2及比較例3中,組合物未硬化,故而未進行測定。 The prepared mixture is transferred into the mold (25mm In the air, it was heated at 90 ° C for 1 hour in the air, and further heated at 150 ° C for 4 hours to prepare a cured product having a thickness of 4 to 5 mm. The hardness of the cured product was measured using a durometer (manufactured by Teclock Co., Ltd., model: GS-719R, GS-720R) in accordance with the method specified in JIS K 7215 "Testing methods for hardness of plastics". Or the hardness of Xiao's D. Further, in Comparative Example 2 and Comparative Example 3, the composition was not cured, and thus the measurement was not performed.

[硬化物之密接性] [Adhesiveness of hardened material]

將製備之組合物流入3528SMD型PPA樹脂封裝體(3528表面安裝型聚鄰苯二甲醯胺樹脂封裝體)(3.5mm×2.8mm×0.9mm)中,於空氣中於90℃下加熱1小時,進而於150℃下加熱4小時而製作16個作為硬化物之檢體。以光學顯微鏡確認彼等檢體,將硬化物自封裝體剝離者評價為「剝離」,將未剝離者評價為「密接」。將16個檢體中評價為「密接」之檢體之個數列為「合格數」。再者,比較例2及比較例3中,組合物未硬化,故而未進行測定。 The prepared composition was transferred into a 3528 SMD type PPA resin package (3528 surface mount type polyphthalamide resin package) (3.5 mm × 2.8 mm × 0.9 mm), and heated at 90 ° C for 1 hour in the air. Further, the sample was heated at 150 ° C for 4 hours to prepare 16 samples as a cured product. The specimens were confirmed by an optical microscope, and the cured product was evaluated as "peeling" from the package, and the unpeeled was evaluated as "close contact". The number of samples evaluated as "closed" among the 16 samples was listed as "qualified number". Further, in Comparative Example 2 and Comparative Example 3, the composition was not cured, and thus the measurement was not performed.

[硬化物之透明性] [Transparency of hardened material]

將製備之組合物流入模具(22mm )中,於空氣中於90℃下加熱1小時,進而於150℃下加熱4小時製作22mm ,2mm厚之硬化物。使用紫外可見分光光度計(島津製作所股份有限公司製造,型號:UV-3150),測定該硬化物於405nm、365nm波長區域下之透過率。再者,比較例2及比較例3中,組合物未硬化,故而未進行測定。 The prepared mixture is transferred into the mold (22mm In the air, it is heated at 90 ° C for 1 hour in the air, and further heated at 150 ° C for 4 hours to make 22 mm. , 2mm thick hardened material. The transmittance of the cured product in the wavelength region of 405 nm and 365 nm was measured using an ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corporation, model: UV-3150). Further, in Comparative Example 2 and Comparative Example 3, the composition was not cured, and thus the measurement was not performed.

[硬化物之耐熱透明性] [heat-resistant transparency of hardened materials]

將製備之組合物流入模具(22mm )中,於空氣中於90℃下加熱1小時,進而於150℃下加熱4小時製作22mm ,2mm厚之硬化物。將該硬化物於200℃下加熱100小時後,使用紫外可見分光光度計(島津製作所股份有限公司製造,型號:UV-3150),測定405nm、365nm波長區域下之透過率。再者,比較例2及比較例3中,組合物未硬化,故而未進行測定。 The prepared mixture is transferred into the mold (22mm In the air, it is heated at 90 ° C for 1 hour in the air, and further heated at 150 ° C for 4 hours to make 22 mm. , 2mm thick hardened material. After the cured product was heated at 200 ° C for 100 hours, the transmittance in the wavelength region of 405 nm and 365 nm was measured using an ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corporation, model: UV-3150). Further, in Comparative Example 2 and Comparative Example 3, the composition was not cured, and thus the measurement was not performed.

[硬化物之線熱膨脹係數] [Linear thermal expansion coefficient of hardened material]

將製備之組合物0.7g添加至氟樹脂製之管(內徑:5.8mm ,高度:1.8mm)中於空氣中於90℃下加熱1小時,進而於150℃下加熱4小時製作硬化物。使用ThermoPlusTMA8310(RIGAKU股份有限公司製造),將硬化物於空氣中,以5℃/分鐘之升溫速度自25℃加熱至200℃而測定該硬化物之線熱膨脹係數。該測定進行2次,測定值採用第二次之值。再者,比較例2及比較例3中,組合物未硬化,故而未進行測定。 0.7 g of the prepared composition was added to a tube made of fluororesin (inner diameter: 5.8 mm) The height: 1.8 mm) was heated in air at 90 ° C for 1 hour, and further heated at 150 ° C for 4 hours to produce a cured product. Using a ThermoPlusTM A8310 (manufactured by RIGAKU Co., Ltd.), the cured product was heated in air at a heating rate of 5 ° C / min from 25 ° C to 200 ° C to measure the linear thermal expansion coefficient of the cured product. The measurement was carried out twice, and the measured value was the second value. Further, in Comparative Example 2 and Comparative Example 3, the composition was not cured, and thus the measurement was not performed.

[5%重量減少溫度(Td5)] [5% weight loss temperature (T d5 )]

將製備之組合物於空氣中於90℃下加熱1小時,進而於150℃下加熱4小時製作硬化物。使用作為熱重量-示差熱同步測定裝置(Thermogravimetric/Differential Thermal Analysis,簡稱:TG-DTA)之ThermoPlusTG8120(RIGAKU股份有限公司製造),將該硬化物於空氣中,以5℃/分鐘之升溫速度自25℃加熱至500℃,測定5%重量減少時之溫度(Td5)。再者,比較例2及比較例3中,組合物未硬化,故而未進行測定。 The prepared composition was heated in air at 90 ° C for 1 hour, and further heated at 150 ° C for 4 hours to prepare a cured product. Using ThermoPlus TG8120 (manufactured by RIGAKU Co., Ltd.) as a thermogravimetric/differential thermal analysis device (TG-DTA), the cured product was heated in air at a heating rate of 5 ° C / min. The mixture was heated to 500 ° C at 25 ° C, and the temperature (T d5 ) at which 5% weight loss was measured was measured. Further, in Comparative Example 2 and Comparative Example 3, the composition was not cured, and thus the measurement was not performed.

[硬化物之接著強度] [Continuity of hardened material]

於將混合有製備之組合物與直徑50μm之氧化鋯球者夾持於玻璃晶片(5.0mm×5.0mm×1.1mm)與玻璃基板(50mm×50mm×3.0mm)或氧化鋁基板(50mm×50mm×2.0mm)之間之狀態下,於空氣中於90℃下加熱1小時,進而於150℃下加熱4小時使之硬化。藉由黏結強度試驗機(Dage Japan股份有限公司製造,型號:Dage4000Plus)測定製作之試料之接著力(接著強度)。將測定時硬化物遭破壞而未獲得接著強度之值者記為「凝集破壞」。再者,比較例2及比較例3中,組合物未硬化,故而未進行測定。 The mixture of the prepared composition and the zirconia ball having a diameter of 50 μm was sandwiched between a glass wafer (5.0 mm × 5.0 mm × 1.1 mm) and a glass substrate (50 mm × 50 mm × 3.0 mm) or an alumina substrate (50 mm × 50 mm). In the state between ×2.0 mm), it was heated at 90 ° C for 1 hour in the air, and further heated at 150 ° C for 4 hours to be hardened. The adhesion (adequate strength) of the produced sample was measured by a bond strength tester (manufactured by Dage Japan Co., Ltd., model: Dage 4000 Plus). The case where the hardened material was destroyed at the time of measurement and the value of the subsequent strength was not obtained was referred to as "agglomeration destruction". Further, in Comparative Example 2 and Comparative Example 3, the composition was not cured, and thus the measurement was not performed.

[硬化起始溫度] [hardening initiation temperature]

對製備後靜置10分鐘之組合物,使用旋轉黏度計(Brookfield.Engineering.Laboratories.Inc製造,品名:DV-II+PRO)與溫度控制單元(Brookfield.Engineering.Laboratories.Inc製造,品名:THERMOSEL),以剪切速度30[1/s],測定以2.09℃/分鐘之升溫速度自25℃固定升溫至150℃時之黏度之經時變化。將黏度超過30,000cP時之溫度評價為硬化起始溫度。 The composition which was allowed to stand for 10 minutes after preparation was subjected to a rotational viscometer (manufactured by Brookfield. Engineering. Laboratories. Inc., product name: DV-II+PRO) and a temperature control unit (manufactured by Brookfield. Engineering. Laboratories. Inc., product name: THERMOSEL The change in viscosity at a temperature of 2.09 ° C / min from 25 ° C to 150 ° C was measured at a shear rate of 30 [1/s]. The temperature at which the viscosity exceeded 30,000 cP was evaluated as the hardening onset temperature.

[硬化時之外觀] [Appearance when hardened]

將製備之組合物1g薄薄地展開於玻璃模(22mm )中。其後,於空氣中於90℃下加熱1小時,進而於150℃下加熱4小時製作硬化物。將製作之硬化物自然冷卻至25℃。以同樣之方式製作3個試驗體。以目視確認試驗體之概觀,將所有試驗體中,透明且未觀察到發泡及裂痕之產生之狀態評價為「良好」,將任何試驗體中,於硬化物中觀察到氣泡之狀態評價為「發泡」,將任何試驗體中,組合物未硬化而仍處於黏性液體之狀態評價為「未硬化」。 1 g of the prepared composition was thinly spread on a glass mold (22 mm) )in. Thereafter, the mixture was heated in air at 90 ° C for 1 hour, and further heated at 150 ° C for 4 hours to prepare a cured product. The hardened material produced was naturally cooled to 25 °C. Three test bodies were produced in the same manner. The state of the test body was visually confirmed, and the state in which the foaming and cracking were not observed was evaluated as "good" in all the test bodies, and the state of the bubble observed in the hardened body in any test body was evaluated as "Foaming" was evaluated as "unhardened" in the state in which the composition was not cured and remained in a viscous liquid in any of the test bodies.

實施例1~6及比較例1~3之組合物及硬化物之評價結果示於表3。 The evaluation results of the compositions and cured products of Examples 1 to 6 and Comparative Examples 1 to 3 are shown in Table 3.

(A)成分或(B)成分之聚矽氧樹脂中之(SiO)4/2之組成比為0.1以上之實施例4~6中,蕭氏A硬度超過70,蕭氏D硬度超過10。 In Examples 4 to 6 in which the composition ratio of (SiO) 4/2 in the (A) component or the (B) component polyoxyxylene resin was 0.1 or more, the Shore A hardness exceeded 70, and the Shore D hardness exceeded 10.

(A)成分或(B)成分之聚矽氧樹脂中之(SiO)4/2之組成比為0.1以上之實施例4~6中,接著強度超過100N。實施例1~3中觀察到樹脂之破壞(凝集破壞),無法檢測出測定值。另一方面,比較例1中接著強度未達50N。 In the examples 4 to 6 in which the composition ratio of (SiO) 4/2 in the (A) component or the (B) component polyoxyxylene resin was 0.1 or more, the strength exceeded 100 N. In Examples 1 to 3, destruction of the resin (aggregation failure) was observed, and the measured value could not be detected. On the other hand, in Comparative Example 1, the subsequent strength was less than 50N.

又,於密接性試驗中,比較例1中硬化物「發泡」,無封裝體經良好密封之檢體,相對於此實施例1~6中觀測到密接之檢體。尤其於實施例1~5中於一半以上之檢體中觀測到「密接」,實施例1及實施例3~5中所有16個檢體中均觀測到「密接」。 Further, in the adhesion test, in Comparative Example 1, the cured product was "foamed", and the sample in which the package was well sealed was not observed, and the adhered samples were observed in the above Examples 1 to 6. In particular, in Examples 1 to 5, "close contact" was observed in more than half of the samples, and "close contact" was observed in all of the 16 samples in Example 1 and Examples 3 to 5.

於硬化物之透明性試驗中,實施例1~6之硬化物於波長365nm下顯示88%以上,波長405nm下顯示90%以上之高透明性。相對於此,比較例1之硬化物中透過率為45%以下。其原因可認為係硬化物之發泡所引起。又,關於將硬化物於200℃下連續加熱100小時後之透明性(耐熱透明性),實施例1~6之硬化物於波長405nm下維持為88%以上,波長365nm下維持為79%以上之高透過率。 In the transparency test of the cured product, the cured products of Examples 1 to 6 showed 88% or more at a wavelength of 365 nm and a high transparency of 90% or more at a wavelength of 405 nm. On the other hand, in the cured product of Comparative Example 1, the transmittance was 45% or less. The reason for this is considered to be caused by foaming of the cured product. Further, regarding the transparency (heat-resistant transparency) after continuously heating the cured product at 200 ° C for 100 hours, the cured products of Examples 1 to 6 were maintained at a wavelength of 405 nm of 88% or more, and maintained at a wavelength of 365 nm of 79% or more. High transmittance.

關於硬化物之耐熱性,實施例1~6之硬化物顯示285℃以上之Td5,尤其於實施例3~6之硬化物中,顯示395℃以上之高Td5Regarding the heat resistance of the cured product, the cured products of Examples 1 to 6 showed T d5 of 285 ° C or higher, and particularly the cured products of Examples 3 to 6, showing a high T d5 of 395 ° C or higher.

關於線熱膨脹係數,實施例1~6之硬化物顯示未達300體積ppm,尤其實施例1及3~6之硬化物顯示未達250體積ppm,實施例4~6之硬化物中顯示未達215體積ppm之良好之線熱膨脹係數。若線熱膨脹係數較低,則熱循環下之體積膨脹、收縮較小,難以自模具剝離,故而較佳為線熱膨脹係數較低。 Regarding the linear thermal expansion coefficient, the cured products of Examples 1 to 6 showed less than 300 ppm by volume, and in particular, the cured products of Examples 1 and 3 to 6 showed less than 250 ppm by volume, and the cured products of Examples 4 to 6 were not shown. A good linear thermal expansion coefficient of 215 vol. If the linear thermal expansion coefficient is low, the volume expansion and shrinkage under thermal cycling are small, and it is difficult to peel off from the mold. Therefore, it is preferred that the linear thermal expansion coefficient is low.

實施例1~6之組合物之硬化起始溫度為較低之58~79℃,具有良好之硬化性。另一方面,比較例1~3中即使升溫至150℃亦未開始硬化。 The compositions of Examples 1 to 6 had a hardening onset temperature of 58 to 79 ° C and had good hardenability. On the other hand, in Comparative Examples 1 to 3, curing did not start even if the temperature was raised to 150 °C.

根據以上內容顯示:處於本發明之範疇之實施例1~6組合物具有良好之硬化性,其硬化物具有較高之耐熱透明性。又,密接性亦良好。尤其,實施例3~6之硬化物中,耐熱性、蕭氏硬度亦顯示為優異。又,實施例4~6之硬化物中,顯示具有較高之接著強度。 According to the above content, the embodiments 1 to 6 in the scope of the present invention The composition has good hardenability and the cured product has high heat-resistant transparency. Moreover, the adhesion is also good. In particular, in the cured products of Examples 3 to 6, heat resistance and Shore hardness were also excellent. Further, in the cured products of Examples 4 to 6, it was shown to have a high bonding strength.

<鉑量與耐熱透明性之評價> <Evaluation of Platinum Amount and Heat Resistance Transparency>

其次,將作為(A)成分之聚矽氧樹脂(A1)與作為(B)成分之聚矽氧樹脂(B1)以2:1之質量比調配,與(C)成分之鉑觸媒混合而製備組合物1-1~組合物1-5。又,不調配(C)成分之鉑觸媒,製備僅將聚矽氧樹脂(A1)與聚矽氧樹脂(B1)以2:1之質量比調配之比較用組合物1-1。此處,作為鉑觸媒,係以相對於硬化性聚矽氧樹脂組合物總量,鉑原子之含量以質量單位計成為特定量之方式使用鉑-二乙烯基四甲基二矽氧烷錯合物。 Next, the polyoxynoxy resin (A1) as the component (A) and the polyoxynoxy resin (B1) as the component (B) are blended in a mass ratio of 2:1, and are mixed with the platinum catalyst of the component (C). Compositions 1-1 to 1-5 were prepared. Further, a platinum catalyst having a component (C) was not prepared, and a comparative composition 1-1 in which only the polyfluorene oxide resin (A1) and the polyoxyxylene resin (B1) were blended in a mass ratio of 2:1 was prepared. Here, as the platinum catalyst, platinum-divinyltetramethyldioxane is used in such a manner that the content of platinum atoms is a specific amount in terms of mass units with respect to the total amount of the curable polyoxyxene resin composition. Compound.

又,使用聚矽氧樹脂(A4)代替聚矽氧樹脂(A1),使用聚矽氧樹脂(B4)代替聚矽氧樹脂(B1),以相同之方法製備組合物4-1~組合物4-3及比較用組合物4-1。依據上述[硬化物之透明性]、[硬化物之耐熱透明性]、[硬化起始溫度]及[硬化時之外觀]中記載之方法,使用彼等組合物及比較用組合物,評價其硬化物之物理特性(透明性及耐熱透明性)、硬化起始溫度及硬化物之外觀。彼等結果示於表4、圖2及圖3。 Further, a composition of the composition 4-1 to the composition 4 was prepared in the same manner by using a polyoxyxylene resin (A4) instead of the polyoxynoxy resin (A1) and a polyoxyxylene resin (B4) instead of the polyoxynoxy resin (B1). -3 and comparative composition 4-1. According to the methods described in the above [Transparency of cured product], [heat-resistant transparency of cured product], [hardening initiation temperature], and [appearance at the time of hardening], the composition and the comparative composition were used to evaluate the composition. The physical properties (transparency and heat-resistant transparency) of the cured product, the curing initiation temperature, and the appearance of the cured product. The results are shown in Table 4, Figure 2 and Figure 3.

如表4所示,組合物1-1~組合物1-5、組合物4-1~組合物4-3及比較用組合物4-1之硬化物均未觀察到發泡及裂痕,外觀為「良好」。尤其於相對於組合物總量,鉑原子之含量為0.003質量ppm之組合物1-5、4-3中外觀亦為「良好」,因此顯示彼等組合物之(A)成分及(B)成分具有良好之硬化性。另一方面,於不含鉑觸媒之比較用組合物1-1中為「未硬化」,未獲得硬化物。故而,比較用組合物1-1中硬化物之各種物性未評價。 As shown in Table 4, no foaming or cracking was observed in the cured products of Composition 1-1 to Composition 1-5, Composition 4-1 to Composition 4-3, and Comparative Composition 4-1, and the appearance was observed. It is "good". In particular, the appearances of the compositions 1-5 and 4-3 having a platinum atom content of 0.003 mass ppm are also "good" with respect to the total amount of the composition, and thus the components (A) and (B) of the compositions are shown. The ingredients have good hardenability. On the other hand, in the comparative composition 1-1 containing no platinum catalyst, it was "unhardened", and no cured product was obtained. Therefore, various physical properties of the cured product in the comparative composition 1-1 were not evaluated.

又,關於硬化起始溫度,伴隨鉑原子之含量變少,硬化起始溫度變高。組合物1-5之硬化起始溫度高於150℃,但於硬化條件(於90℃下加熱1小時,進而於150℃下加熱4小時)下可順利地獲得硬化物。 Further, regarding the curing initiation temperature, the content of the platinum atom decreases, and the curing initiation temperature becomes high. The curing initiation temperature of the composition 1-5 was higher than 150 ° C, but the cured product was smoothly obtained under the curing conditions (heating at 90 ° C for 1 hour and further heating at 150 ° C for 4 hours).

所有硬化物之透過率於波長405nm下為88~91%之範圍,於波長365nm下為89~91%之範圍,顯示較高之透明性。另一方面,關於將硬化物於200℃下連續加熱100小時後之透明性(耐熱透明性),於波長405nm下所有硬化物維持為85%以上之高透過率,但於波長365nm下比較用組合物4-1之硬化物之透過率為70%,可見透明性之下降。相對於此,組合物1-1~組合物1-5及組合物4-1~組合物4-4之硬化物維持為75%以上之透明性。 The transmittance of all hardened materials is in the range of 88 to 91% at a wavelength of 405 nm, and is in the range of 89 to 91% at a wavelength of 365 nm, showing high transparency. On the other hand, regarding the transparency (heat-resistant transparency) after continuously heating the cured product at 200 ° C for 100 hours, all the cured products maintained a high transmittance of 85% or more at a wavelength of 405 nm, but were used for comparison at a wavelength of 365 nm. The transmittance of the cured product of the composition 4-1 was 70%, and the decrease in transparency was observed. On the other hand, the cured products of the composition 1-1 to the composition 1-5 and the composition 4-1 to the composition 4-4 were maintained at a transparency of 75% or more.

根據以上內容顯示:處於本發明之範疇之組合物1-1~組合物1-5及組合物4-1~組合物4-4具有良好之硬化性,且具有較高之耐熱透明性。 According to the above, it is shown that the compositions 1-1 to 1-5 and the compositions 4-1 to 4-4 in the scope of the present invention have good hardenability and high heat-resistant transparency.

<硬化延遲劑與耐熱透明性之評價> <Evaluation of hardening retarder and heat-resistant transparency>

將作為(A)成分之聚矽氧樹脂(A1)與作為(B)成分之聚矽氧樹脂(B1)以2:1之質量比調配,混合(C)成分之鉑觸媒,進而調配各種硬化延遲劑而製備組合物1-6~組合物1-9。此處,作為鉑觸媒,係以相對於(A)~(C)成分之合計質量,鉑原子之含量以質量單位計成為2.0ppm之方式使用鉑-二乙烯基四甲基二矽氧烷錯合物。對硬化延遲劑而 言,將鉑原子之含量2.0質量ppm設為1當量時,於70~80當量之範圍內添加。具體而言,於組合物1-6之製備中,相對於組合物總量1g添加作為硬化延遲劑之順丁烯二酸二甲酯118μg,於組合物1-7之製備中,相對於組合物總量1g添加3-丁炔-2-醇-2-甲基67μg,於組合物1-8之製備中相對於組合物總量1g添加1-乙炔基-1-環己醇94μg,於組合物1-9中相對於組合物總量1g添加四甲基乙二胺86μg。 The polyanthracene resin (A1) as the component (A) and the polyoxynoxy resin (B1) as the component (B) are blended in a mass ratio of 2:1, and the platinum catalyst of the component (C) is mixed to prepare various kinds. Compositions 1-6 to 1-9 were prepared by hardening the retarder. Here, as the platinum catalyst, platinum-divinyltetramethyldioxane is used in such a manner that the content of platinum atoms is 2.0 ppm by mass based on the total mass of the components (A) to (C). Complex compound. For hardening retarders In the case where the content of the platinum atom is 2.0 ppm by mass, it is added in an amount of 70 to 80 equivalents. Specifically, in the preparation of the composition 1-6, 118 μg of dimethyl maleate as a hardening retarder was added to 1 g of the total amount of the composition, in the preparation of the composition 1-7, relative to the combination. To a total amount of 1 g, 67 μg of 3-butyn-2-ol-2-methyl group was added, and in the preparation of the composition 1-8, 94 μg of 1-ethynyl-1-cyclohexanol was added to 1 g of the total amount of the composition, 86 μg of tetramethylethylenediamine was added to the composition 1-9 in an amount of 1 g based on the total amount of the composition.

依據上述[硬化物之透明性]、[硬化物之耐熱透明性]、[硬化時之外觀]及下述[硬化起始時間]中記載之方法,使用彼等組合物1-6~組合物1-9與作為未調配硬化延遲劑之組合物之一例之組合物1-1,評價該等之硬化物之物理特性(透明性及耐熱透明性)、硬化物之外觀及硬化起始時間。彼等結果示於表5、圖4。 According to the above-mentioned [transparency of cured product], [heat-resistant transparency of cured product], [appearance at the time of hardening], and the method described in the following [hardening start time], the compositions 1-6 to the composition are used. Composition 1-1 of 1-9, which is an example of a composition which is an unbonded hardening retarder, was evaluated for physical properties (transparency and heat-resistant transparency) of the cured product, appearance of the cured product, and curing start time. The results are shown in Table 5 and Figure 4.

[硬化起始時間] [hardening start time]

對製備後靜置10分鐘之組合物,使用旋轉黏度計(Brookfield.Engineering.Laboratories.Inc製造,品名:DV-II+PRO)與溫度控制單元(Brookfield.Engineering.Laboratories.Inc製造,品名:THERMOSEL),以剪切速度30[1/s],於25℃下於3小時之期間內每1分鐘測定一次其黏度。將自測定開始時黏度超過30,000cP時之時間評價為硬化起始時間。 The composition which was allowed to stand for 10 minutes after preparation was subjected to a rotational viscometer (manufactured by Brookfield. Engineering. Laboratories. Inc., product name: DV-II+PRO) and a temperature control unit (manufactured by Brookfield. Engineering. Laboratories. Inc., product name: THERMOSEL The viscosity was measured every 1 minute at a shear rate of 30 [1/s] at 25 ° C for a period of 3 hours. The time when the viscosity at the start of the measurement exceeded 30,000 cP was evaluated as the hardening start time.

如表5所示,組合物1-1及組合物1-6~組合物1-9之硬化物均未觀察到發泡及裂痕,外觀為「良好」。作為硬化起始時間,組合物1-1中為26分鐘後,添加有硬化延遲劑之組合物1-6~組合物1-9中為超過2小時後,因此可知可藉由添加硬化延遲劑而控制硬化性。又,作為組合物1-6~1-9之硬化物之透過率,於波長405nm下均為89%以上,於波長365nm下均為87%以上,可知並未因硬化延遲劑而損害透明性。進而,關於將硬化物於200℃下連續加熱100小時後之透明性(耐熱透明性),於波長405nm下均為85%以上,於波長365nm下均為74%以上。因此,可知組合物1-6~組合物1-9之硬化物均顯示與未添加硬化延遲劑之組合物1-1之硬化物幾乎同等之耐熱透明性。 As shown in Table 5, no foaming or cracking was observed in the cured products of Composition 1-1 and Composition 1-6 to Composition 1-9, and the appearance was "good". As the curing start time, after 26 minutes in the composition 1-1, the composition 1-6 to the composition 1-9 to which the hardening retarder is added is more than 2 hours, and thus it is known that the hardening retardant can be added by adding And control hardenability. Further, the transmittance of the cured product of the composition 1-6 to 1-9 was 89% or more at a wavelength of 405 nm, and was 87% or more at a wavelength of 365 nm, and it was found that the transparency was not impaired by the hardening retarder. . Further, the transparency (heat-resistant transparency) after continuously heating the cured product at 200 ° C for 100 hours is 85% or more at a wavelength of 405 nm and 74% or more at a wavelength of 365 nm. Therefore, it is understood that the cured products of the compositions 1-6 to 1-9 exhibit almost the same heat resistance and transparency as the cured product of the composition 1-1 to which the hardening retarder is not added.

<光穩定劑及抗氧化劑與耐熱透明性之評價> <Evaluation of light stabilizers and antioxidants and heat-resistant transparency>

將作為(A)成分之聚矽氧樹脂(A4)與作為(B)成分之聚矽氧樹脂(B4)以2:1之質量比調配,混合(C)成分之鉑觸媒,進而調配各種光穩定劑或抗氧化劑而製備組合物4-4~組合物4-6。此處,作為鉑觸媒,係以相對於(A)~(C)成分之合計質量,鉑原子之含量以質量單位 計成為0.2ppm之方式使用鉑-二乙烯基四甲基二矽氧烷錯合物。光穩定劑及抗氧化劑係相對於(A)~(C)成分之合計質量,於0.05~0.2質量%之範圍內添加。具體而言,於組合物4-4之製備中,相對於組合物總量1g添加作為光穩定劑之癸二酸雙(2,2,6,6-四甲基-4-哌啶基)酯0.5mg。於組合物4-5之製備中,相對於組合物總量1g添加作為光穩定劑之癸二酸雙(2,2,6,6-四甲基-4-哌啶基)酯1.0mg。於組合物4-6之製備中,相對於組合物總量1g分別添加作為抗氧化劑之1,3,5-三(3,5-二-第三丁基-4-羥基苄基)-1,3,5-三-2,4,6-(1H,3H,5H)-三酮1.5mg與2,2-雙({[3-(十二烷基硫基)丙醯基]氧基}甲基)-1,3-丙二基=雙[3-(十二烷基硫基)丙酸酯]0.5mg。 The polyoxynoxy resin (A4) as the component (A) and the polyoxynoxy resin (B4) as the component (B) are blended in a mass ratio of 2:1, and the platinum catalyst of the component (C) is mixed, thereby preparing various kinds. Composition 4-4 to Composition 4-6 were prepared as a light stabilizer or an antioxidant. Here, as the platinum catalyst, platinum-divinyltetramethyldioxane is used in such a manner that the content of platinum atoms is 0.2 ppm by mass based on the total mass of the components (A) to (C). Complex compound. The light stabilizer and the antioxidant are added in an amount of 0.05 to 0.2% by mass based on the total mass of the components (A) to (C). Specifically, in the preparation of the composition 4-4, bis(2,2,6,6-tetramethyl-4-piperidinyl) sebacate as a light stabilizer is added in an amount of 1 g based on the total amount of the composition. Ester 0.5 mg. In the preparation of the composition 4-5, 1.0 mg of bis(2,2,6,6-tetramethyl-4-piperidyl) sebacate as a light stabilizer was added to 1 g of the total amount of the composition. In the preparation of the compositions 4-6, 1,3,5-tris(3,5-di-t-butyl-4-hydroxybenzyl)-1 as an antioxidant was separately added to 1 g of the total amount of the composition. , 3,5-three -2,4,6-(1H,3H,5H)-trione 1.5 mg and 2,2-bis({[3-(dodecylthio)propenyl)oxy}methyl)-1 3-propyldiyl=bis[3-(dodecylthio)propionate] 0.5 mg.

使用彼等組合物4-4~組合物4-6與作為未調配光穩定劑及抗氧化劑之組合物之一例之組合物4-1,依據上述[硬化時之外觀]及下述[含有抗氧化劑之硬化物之耐熱透明性]中記載之方法,評價該等硬化物之物理特性(透明性及耐熱透明性)、硬化物之外觀。 Using the composition 4-4 to the composition 4-6 and the composition 4-1 as an example of the composition of the unadjusted light stabilizer and the antioxidant, according to the above [appearance at the time of hardening] and the following [containing an anti- The method described in the heat-resistant transparency of the cured product of the oxidizing agent is used to evaluate the physical properties (transparency and heat-resistant transparency) of the cured product and the appearance of the cured product.

[含有抗氧化劑之硬化物之耐熱透明性] [Heat-resistant transparency of hardened materials containing antioxidants]

將製備之組合物於空氣中於90℃下加熱1小時,進而於150℃下加熱4小時而製作22mm ,2mm厚之硬化物。使用紫外可見分光光度計(島津製作所股份有限公司製造,型號:UV-3150),測定該硬化物於405nm、365nm波長區域下之透過率。將該硬化物於200℃下進而加熱,於經過100小時及200小時之時點暫時降溫至室溫。對降溫後之硬化物同樣進行透過率之測定。自彼等測定結果,以進一步加熱前之硬化物之透過率為基準,算出進一步加熱後之硬化物之透過率之變動比。 The prepared composition was heated in air at 90 ° C for 1 hour, and further heated at 150 ° C for 4 hours to make 22 mm. , 2mm thick hardened material. The transmittance of the cured product in the wavelength region of 405 nm and 365 nm was measured using an ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corporation, model: UV-3150). The cured product was further heated at 200 ° C, and temporarily cooled to room temperature over the period of 100 hours and 200 hours. The transmittance of the cured product after cooling was also measured. From the results of the measurement, the ratio of the transmittance of the cured product after further heating was calculated based on the transmittance of the cured product before further heating.

組合物4-1及組合物4-4~組合物4-6之硬化物之評價結果示於表6。 The evaluation results of the cured product of the composition 4-1 and the composition 4-4 to the composition 4-6 are shown in Table 6.

如表6所示,組合物4-1及組合物4-4~組合物4-6之硬化物均未觀察到發泡及裂痕,外觀為「良好」。所有組合物之硬化物中,藉由200℃下之進一步之加熱,100小時後、200小時後之透過率以0小時後之透過率(進一步硬化前之硬化物於405nm、365nm波長區域下之透過率)為基準可見稍許下降,但於添加有光穩定劑或抗氧化劑之組合物4-4~4-6中,較之組合物4-1,透過率之變動比較小。於添加有抗氧化劑之組合物4-6中,透過率之變動比尤其小。自彼等結果顯示:光穩定劑或抗氧化劑之添加有助於硬化物之耐熱透明性之提高。 As shown in Table 6, no foaming or cracking was observed in the cured product of the composition 4-1 and the composition 4-4 to the composition 4-6, and the appearance was "good". The cured product of all the compositions was further heated at 200 ° C, and the transmittance after 100 hours and after 200 hours was 0 hours later (the cured product before further hardening was in the wavelength region of 405 nm and 365 nm). The transmittance was slightly decreased on the basis of the standard, but in the composition 4-4 to 4-6 to which the light stabilizer or the antioxidant was added, the change in transmittance was smaller than that of the composition 4-1. In the composition 4-6 to which the antioxidant was added, the variation ratio of the transmittance was particularly small. From their results, it has been shown that the addition of a light stabilizer or an antioxidant contributes to an improvement in the heat-resistant transparency of the cured product.

[合成例7-1] [Synthesis Example 7-1]

<聚矽氧樹脂(I-1)之高分子量化> <Polymerization of polyoxyl resin (I-1)>

於具備氟樹脂製之攪拌葉、迪安-斯塔克裝置、戴氏回流器之容 積4口2L燒瓶中採取以合成例1-1中記載之聚矽氧樹脂(I-1)為準之1,000g之聚矽氧樹脂。繼而,添加250g之甲苯,對該燒瓶內於130℃下連續加溫24小時,進行水解及縮合反應。其後,將反應液返回至室溫,製備含有甲苯之聚矽氧樹脂(II)。 With fluororesin mixing blade, Dean-Stark device, Daisy reflow device In a 4-liter 2-liter flask, 1,000 g of a polyoxyxylene resin based on the polyfluorene oxide resin (I-1) described in Synthesis Example 1-1 was used. Then, 250 g of toluene was added, and the flask was continuously heated at 130 ° C for 24 hours to carry out hydrolysis and condensation reaction. Thereafter, the reaction liquid was returned to room temperature to prepare a polyoxyxylene resin (II) containing toluene.

聚矽氧樹脂(II)之質量平均分子量(Mw)為5,200,組成比為(Me2SiO2/2)0.50(PhSiO3/2)0.50,HO-Si基之含量為4.5mmol/g(6.7質量%),甲苯含量為20.49質量%。 The polyoxymethylene resin (II) has a mass average molecular weight (Mw) of 5,200, a composition ratio of (Me 2 SiO 2/2 ) 0.50 (PhSiO 3/2 ) 0.50 , and a HO-Si group content of 4.5 mmol/g (6.7). Mass%), the toluene content was 20.49 mass%.

[合成例7-2] [Synthesis Example 7-2]

<聚矽氧樹脂(A7)之合成> <Synthesis of polyoxyl resin (A7)>

將130.00g之聚矽氧樹脂(II)、288.91g之甲苯、103.36g之甲醇、10.25g之1,1,3,3-四甲基二矽氧烷及0.24mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加310g之水,進行萃取操作後,回收有機層。重複4次相同之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由150℃、1小時之加熱之減壓蒸餾去除後,進行2次藉由170℃、1小時之加熱之減壓蒸餾去除,獲得作為無色透明之黏性液體之聚矽氧樹脂(A7)。 130.00 g of polyoxyl resin (II), 288.91 g of toluene, 103.36 g of methanol, 10.25 g of 1,1,3,3-tetramethyldioxane and 0.24 mL of 70% concentrated nitric acid were added to The flask was stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 310 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated 4 times, thereby washing the organic layer. Toluene was distilled off from the organic layer by an evaporator, and then distilled under reduced pressure by heating at 150 ° C for 1 hour, and then distilled under reduced pressure by heating at 170 ° C for 1 hour to obtain colorlessness. A transparent viscous liquid polyoxyl resin (A7).

聚矽氧樹脂(A7)之產量為103.23g,質量平均分子量(Mw)為6,100,黏度為5,100cP,組成比為(Me2SiO2/2)0.39(PhSiO3/2)0.47(H(Me)2SiO1/2)0.14,H-Si基之含量為1.26mmol/g,HO-Si基之含量為2.66mmol/g(4.5質量%)。 The yield of polyoxyxylene resin (A7) was 103.23 g, the mass average molecular weight (Mw) was 6,100, the viscosity was 5,100 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.39 (PhSiO 3/2 ) 0.47 (H(Me). 2 SiO 1/2 ) 0.14 , the content of the H-Si group was 1.26 mmol/g, and the content of the HO-Si group was 2.66 mmol/g (4.5% by mass).

[合成例7-3] [Synthesis Example 7-3]

<聚矽氧樹脂(B7)之合成> <Synthesis of polyoxyl resin (B7)>

將65.00g之聚矽氧樹脂(II)、144.45g之甲苯、51.68g之甲醇、6.50g之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷及2.24mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液 漏斗中,添加155g之水,進行萃取操作後,回收有機層。重複4次相同之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由150℃、1小時之加熱之減壓蒸餾去除後,進行2次藉由170℃、1小時之加熱之減壓蒸餾去除,獲得作為無色透明之黏性液體之聚矽氧樹脂(B7)。 65.00 g of polyoxyl resin (II), 144.45 g of toluene, 51.68 g of methanol, 6.50 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane and 2.24 70% concentrated nitric acid in mL was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was moved to liquid separation. In the funnel, 155 g of water was added, and after the extraction operation, the organic layer was recovered. The same operation was repeated 4 times, thereby washing the organic layer. Toluene was distilled off from the organic layer by an evaporator, and then distilled under reduced pressure by heating at 150 ° C for 1 hour, and then distilled under reduced pressure by heating at 170 ° C for 1 hour to obtain colorlessness. Transparent viscous liquid polyoxyl resin (B7).

聚矽氧樹脂(B7)之產量為49.34g,質量平均分子量(Mw)為4,800,黏度為6,500cP,組成比為(Me2SiO2/2)0.42(PhSiO3/2)0.49(CH2=CH(Me)2SiO1/2)0.9,CH2=CH-Si基之含量為0.87mmol/g,HO-Si基之含量為2.6mmol/g(4.3質量%)。 The yield of polyoxyxylene resin (B7) was 49.34 g, the mass average molecular weight (Mw) was 4,800, the viscosity was 6,500 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.42 (PhSiO 3/2 ) 0.49 (CH 2 = The content of CH(Me) 2 SiO 1/2 ) 0.9 , CH 2 =CH-Si group was 0.87 mmol/g, and the content of HO-Si group was 2.6 mmol/g (4.3% by mass).

[合成例8-1] [Synthesis Example 8-1]

<聚矽氧樹脂(A8)之合成> <Synthesis of polyoxyl resin (A8)>

將130.00g之聚矽氧樹脂(II)、288.91g之甲苯、103.36g之甲醇、12.49g之1,1,3,3-四甲基二矽氧烷及0.30mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加310g之水,進行萃取操作後,回收有機層。重複4次相同之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由150℃、1小時之加熱之減壓蒸餾去除後,進行2次藉由170℃、1小時之加熱之減壓蒸餾去除,獲得作為無色透明之黏性液體之聚矽氧樹脂(A8)。 130.00 g of polyoxyl resin (II), 288.91 g of toluene, 103.36 g of methanol, 12.49 g of 1,1,3,3-tetramethyldioxane and 0.30 mL of 70% concentrated nitric acid were added to The flask was stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 310 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated 4 times, thereby washing the organic layer. Toluene was distilled off from the organic layer by an evaporator, and then distilled under reduced pressure by heating at 150 ° C for 1 hour, and then distilled under reduced pressure by heating at 170 ° C for 1 hour to obtain colorlessness. A transparent viscous liquid polyoxyl resin (A8).

聚矽氧樹脂(A8)之產量為107.48g,質量平均分子量(Mw)為5,600,黏度為2,800cP,組成比為(Me2SiO2/2)0.40(PhSiO3/2)0.48(H(Me)2SiO1/2)0.12,H-Si基之含量為1.40mmol/g,HO-Si基之含量為2.1mmol/g(3.6質量%)。 The yield of the polyoxyxylene resin (A8) was 107.48 g, the mass average molecular weight (Mw) was 5,600, the viscosity was 2,800 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.40 (PhSiO 3/2 ) 0.48 (H (Me). 2 SiO 1/2 ) 0.12 , the content of the H-Si group was 1.40 mmol/g, and the content of the HO-Si group was 2.1 mmol/g (3.6% by mass).

[合成例8-2] [Synthesis Example 8-2]

<聚矽氧樹脂(B8)之合成> <Synthesis of polyoxyl resin (B8)>

將65.00g之聚矽氧樹脂(II)、144.45g之甲苯、51.68g之甲醇、 8.67g之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷及2.98mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加155g之水,進行萃取操作後,回收有機層。重複4次相同之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由150℃、1小時之加熱之減壓蒸餾去除後,進行2次藉由170℃、1小時之加熱之減壓蒸餾去除,獲得作為無色透明之黏性液體之聚矽氧樹脂(B8)。 65.00 g of polyoxyl resin (II), 144.45 g of toluene, 51.68 g of methanol, 8.67 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane and 2.98 mL of 70% concentrated nitric acid were added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 155 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated 4 times, thereby washing the organic layer. Toluene was distilled off from the organic layer by an evaporator, and then distilled under reduced pressure by heating at 150 ° C for 1 hour, and then distilled under reduced pressure by heating at 170 ° C for 1 hour to obtain colorlessness. A transparent viscous liquid polyoxyl resin (B8).

聚矽氧樹脂(B8)之產量為51.78g,質量平均分子量(Mw)為5,300,黏度為5,000cP,組成比為(Me2SiO2/2)0.39(PhSiO3/2)0.44(CH2=CH(Me)2SiO1/2)0.17,CH2=CH-Si基之含量為1.05mmol/g,HO-Si基之含量為2.3mmol/g(4.0質量%)。 The yield of polyoxyxylene resin (B8) was 51.78 g, the mass average molecular weight (Mw) was 5,300, the viscosity was 5,000 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.39 (PhSiO 3/2 ) 0.44 (CH 2 = CH(Me) 2 SiO 1/2 ) 0.17 , the content of CH 2 =CH-Si group was 1.05 mmol/g, and the content of HO-Si group was 2.3 mmol/g (4.0% by mass).

[合成例9-1] [Synthesis Example 9-1]

<聚矽氧樹脂(A9)之合成> <Synthesis of polyoxyl resin (A9)>

將130.00g之聚矽氧樹脂(II)、288.91g之甲苯、103.36g之甲醇、15.62g之1,1,3,3-四甲基二矽氧烷及0.37mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加310g之水,進行萃取操作後,回收有機層。重複4次相同之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由150℃、1小時之加熱之減壓蒸餾去除後,進行2次藉由170℃、1小時之加熱之減壓蒸餾去除,獲得作為無色透明之黏性液體之聚矽氧樹脂(A9)。 130.00 g of polyoxyl resin (II), 288.91 g of toluene, 103.36 g of methanol, 15.62 g of 1,1,3,3-tetramethyldioxane and 0.37 mL of 70% concentrated nitric acid were added to The flask was stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 310 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated 4 times, thereby washing the organic layer. Toluene was distilled off from the organic layer by an evaporator, and then distilled under reduced pressure by heating at 150 ° C for 1 hour, and then distilled under reduced pressure by heating at 170 ° C for 1 hour to obtain colorlessness. Transparent viscous liquid polyoxyl resin (A9).

聚矽氧樹脂(A9)之產量為106.52g,質量平均分子量(Mw)為5,800,黏度為2,100cP,組成比為(Me2SiO2/2)0.38(PhSiO3/2)0.42(H(Me)2SiO1/2)0.20,H-Si基之含量為1.81mmol/g,HO-Si基之含量為1.7mmol/g(2.9質量%)。 The yield of the polyoxyxylene resin (A9) was 106.52 g, the mass average molecular weight (Mw) was 5,800, the viscosity was 2,100 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.38 (PhSiO 3/2 ) 0.42 (H (Me) 2 SiO 1/2 ) 0.20 , the content of the H-Si group was 1.81 mmol/g, and the content of the HO-Si group was 1.7 mmol/g (2.9% by mass).

[合成例9-2] [Synthesis Example 9-2]

<聚矽氧樹脂(B9)之合成> <Synthesis of polyoxyl resin (B9)>

將65.00g之聚矽氧樹脂(II)、144.45g之甲苯、51.68g之甲醇、10.84g之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷及3.73mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加155g之水,進行萃取操作後,回收有機層。重複4次相同之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由150℃、1小時之加熱之減壓蒸餾去除後,進行2次藉由170℃、1小時之加熱之減壓蒸餾去除,獲得作為無色透明之黏性液體之聚矽氧樹脂(B9)。 65.00 g of polyoxyl resin (II), 144.45 g of toluene, 51.68 g of methanol, 10.84 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane and 3.73 70% concentrated nitric acid in mL was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 155 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated 4 times, thereby washing the organic layer. Toluene was distilled off from the organic layer by an evaporator, and then distilled under reduced pressure by heating at 150 ° C for 1 hour, and then distilled under reduced pressure by heating at 170 ° C for 1 hour to obtain colorlessness. Transparent viscous liquid polyoxyl resin (B9).

聚矽氧樹脂(B9)之產量為49.16g,質量平均分子量(Mw)為5,200,黏度為3,900cP,組成比為(Me2SiO2/2)0.39(PhSiO3/2)0.48(CH2=CH(Me)2SiO1/2)0.13,CH2=CH-Si基之含量為1.17mmol/g,HO-Si基之含量為2.2mmol/g(3.7質量%)。 The yield of polyoxyxylene resin (B9) was 49.16 g, the mass average molecular weight (Mw) was 5,200, the viscosity was 3,900 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.39 (PhSiO 3/2 ) 0.48 (CH 2 = The content of CH(Me) 2 SiO 1/2 ) 0.13 , CH 2 =CH-Si group was 1.17 mmol/g, and the content of HO-Si group was 2.2 mmol/g (3.7 mass%).

[合成例10-1] [Synthesis Example 10-1]

<聚矽氧樹脂(A10)之合成> <Synthesis of polyoxyl resin (A10)>

將120.00g之聚矽氧樹脂(II)、306.93g之甲苯、106.34g之甲醇、24.59g之1,1,3,3-四甲基二矽氧烷及0.59mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加320g之水,進行萃取操作後,回收有機層。重複4次相同之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由150℃、1小時之加熱之減壓蒸餾去除後,進行2次藉由170℃、1小時之加熱之減壓蒸餾去除,獲得作為無色透明之黏性液體之聚矽氧樹脂(A10)。 120.00 g of polyoxyl resin (II), 306.93 g of toluene, 106.34 g of methanol, 24.59 g of 1,1,3,3-tetramethyldioxane and 0.59 mL of 70% concentrated nitric acid were added to The flask was stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 320 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated 4 times, thereby washing the organic layer. Toluene was distilled off from the organic layer by an evaporator, and then distilled under reduced pressure by heating at 150 ° C for 1 hour, and then distilled under reduced pressure by heating at 170 ° C for 1 hour to obtain colorlessness. Transparent viscous liquid polyoxyl resin (A10).

聚矽氧樹脂(A10)之產量為110.66g,質量平均分子量(Mw)為5,700,黏度為1,600cP,組成比為(Me2SiO2/2)0.35(PhSiO3/2)0.41(H(Me)2SiO1/2)0.24,H-Si基之含量為2.25 mmol/g,HO-Si基之含量為1.18mmol/g(2.0質量%)。 The yield of the polyoxyxylene resin (A10) was 110.66 g, the mass average molecular weight (Mw) was 5,700, the viscosity was 1,600 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.35 (PhSiO 3/2 ) 0.41 (H (Me). 2 SiO 1/2 ) 0.24 , the content of the H-Si group was 2.25 mmol/g, and the content of the HO-Si group was 1.18 mmol/g (2.0% by mass).

[合成例10-2] [Synthesis Example 10-2]

<聚矽氧樹脂(B10)之合成> <Synthesis of polyoxyl resin (B10)>

將60.00g之聚矽氧樹脂(II)、153.47g之甲苯、53.17g之甲醇、17.07g之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷及5.87mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加160g之水,進行萃取操作後,回收有機層。重複4次相同之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由150℃、1小時之加熱之減壓蒸餾去除後,進行2次藉由170℃、1小時之加熱之減壓蒸餾去除,獲得作為無色透明之黏性液體之聚矽氧樹脂(B10)。 60.00 g of polyoxyl resin (II), 153.47 g of toluene, 53.17 g of methanol, 17.07 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane and 5.87 70% concentrated nitric acid in mL was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 160 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated 4 times, thereby washing the organic layer. Toluene was distilled off from the organic layer by an evaporator, and then distilled under reduced pressure by heating at 150 ° C for 1 hour, and then distilled under reduced pressure by heating at 170 ° C for 1 hour to obtain colorlessness. A transparent viscous liquid polyoxyl resin (B10).

聚矽氧樹脂(B10)之產量為55.70g,質量平均分子量(Mw)為4,800,黏度為3,000cP,組成比為(Me2SiO2/2)0.40(PhSiO3/2)0.45(CH2=CH(Me)2SiO1/2)0.15,CH2=CH-Si基之含量為1.43mmol/g,HO-Si基之含量為1.9mmol/g(3.0質量%)。 The yield of polyoxyxylene resin (B10) was 55.70 g, the mass average molecular weight (Mw) was 4,800, the viscosity was 3,000 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.40 (PhSiO 3/2 ) 0.45 (CH 2 = The content of CH(Me) 2 SiO 1/2 ) 0.15 , CH 2 =CH-Si group was 1.43 mmol/g, and the content of HO-Si group was 1.9 mmol/g (3.0% by mass).

[合成例11-1] [Synthesis Example 11-1]

<聚矽氧樹脂(A11)之合成> <Synthesis of polyoxyl resin (A11)>

將130.00g之聚矽氧樹脂(II)、288.91g之甲苯、103.36g之甲醇、31.23g之1,1,3,3-四甲基二矽氧烷及0.75mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加310g之水,進行萃取操作後,回收有機層。重複4次相同之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由150℃、1小時之加熱之減壓蒸餾去除後,進行2次藉由170℃、1小時之加熱之減壓蒸餾去除,獲得作為無色透明之黏性液體之聚矽氧樹脂(A11)。 130.00 g of polyoxyl resin (II), 288.91 g of toluene, 103.36 g of methanol, 31.23 g of 1,1,3,3-tetramethyldioxane and 0.75 mL of 70% concentrated nitric acid were added to The flask was stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 310 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated 4 times, thereby washing the organic layer. Toluene was distilled off from the organic layer by an evaporator, and then distilled under reduced pressure by heating at 150 ° C for 1 hour, and then distilled under reduced pressure by heating at 170 ° C for 1 hour to obtain colorlessness. Transparent viscous liquid polyoxyl resin (A11).

聚矽氧樹脂(A11)之產量為113.15g,質量平均分子量(Mw)為 5,700,黏度為1,000cP,組成比為(Me2SiO2/2)0.36(PhSiO3/2)0.38(H(Me)2SiO1/2)0.26,H-Si基之含量為2.7mmol/g,HO-Si基之含量為0.86mmol/g(1.5質量%)。 The yield of the polyoxyxylene resin (A11) was 113.15 g, the mass average molecular weight (Mw) was 5,700, the viscosity was 1,000 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.36 (PhSiO 3/2 ) 0.38 (H (Me). 2 SiO 1/2 ) 0.26 , the content of the H-Si group was 2.7 mmol/g, and the content of the HO-Si group was 0.86 mmol/g (1.5% by mass).

[合成例11-2] [Synthesis Example 11-2]

<聚矽氧樹脂(B11)之合成> <Synthesis of polyoxyl resin (B11)>

將65.00g之聚矽氧樹脂(II)、144.45g之甲苯、51.68g之甲醇、21.68g之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷及7.45mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加155g之水,進行萃取操作後,回收有機層。重複4次相同之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由150℃、1小時之加熱之減壓蒸餾去除後,進行2次藉由170℃、1小時之加熱之減壓蒸餾去除,獲得作為無色透明之黏性液體之聚矽氧樹脂(B11)。 65.00 g of polyoxyl resin (II), 144.45 g of toluene, 51.68 g of methanol, 21.68 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane and 7.45 70% concentrated nitric acid in mL was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 155 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated 4 times, thereby washing the organic layer. Toluene was distilled off from the organic layer by an evaporator, and then distilled under reduced pressure by heating at 150 ° C for 1 hour, and then distilled under reduced pressure by heating at 170 ° C for 1 hour to obtain colorlessness. A transparent viscous liquid polyoxyl resin (B11).

聚矽氧樹脂(B11)之產量為53.64g,質量平均分子量(Mw)為5,200,黏度為2,500cP,組成比為(Me2SiO2/2)0.38(PhSiO3/2)0.45(CH2=CH(Me)2SiO1/2)0.17,CH2=CH-Si基之含量為1.6mmol/g,HO-Si基之含量為1.8mmol/g(3.0質量%)。 The yield of polyoxyxylene resin (B11) was 53.64 g, the mass average molecular weight (Mw) was 5,200, the viscosity was 2,500 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.38 (PhSiO 3/2 ) 0.45 (CH 2 = CH(Me) 2 SiO 1/2 ) 0.17 , the content of CH 2 =CH-Si group was 1.6 mmol/g, and the content of HO-Si group was 1.8 mmol/g (3.0% by mass).

[合成例12-1] [Synthesis Example 12-1]

<聚矽氧樹脂(A12)之合成> <Synthesis of polyoxyl resin (A12)>

將39.7g之聚矽氧樹脂(I-1)、119g之甲苯、39.7g之甲醇、8.3g之1,1,3,3-四甲基二矽氧烷及0.20mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加119g之水,進行萃取操作後,回收有機層。重複4次相同之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由150℃、1小時之加熱之減壓蒸餾去除後,進行2次藉由170℃、1小時之加熱之減壓蒸餾去除,獲得作為無色透明之黏性液體之聚矽氧樹脂(A12)。 39.7 g of polyoxynoxy resin (I-1), 119 g of toluene, 39.7 g of methanol, 8.3 g of 1,1,3,3-tetramethyldioxane and 0.20 mL of 70% concentrated nitric acid were added. The flask was stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 119 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated 4 times, thereby washing the organic layer. Toluene was distilled off from the organic layer by an evaporator, and then distilled under reduced pressure by heating at 150 ° C for 1 hour, and then distilled under reduced pressure by heating at 170 ° C for 1 hour to obtain colorlessness. Transparent viscous liquid polyoxyl resin (A12).

聚矽氧樹脂(A12)之產量為42.5g,質量平均分子量(Mw)為1,900,黏度為200cP,組成比為(Me2SiO2/2)0.31(PhSiO3/2)0.42(H(Me)2SiO1/2)0.27,H-Si基之含量為2.8mmol/g,HO-Si基之含量為2.0mmol/g(3.4質量%)。 The yield of polyoxyxylene resin (A12) was 42.5 g, the mass average molecular weight (Mw) was 1,900, the viscosity was 200 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.31 (PhSiO 3/2 ) 0.42 (H(Me) 2 SiO 1/2 ) 0.27 , the content of the H-Si group was 2.8 mmol/g, and the content of the HO-Si group was 2.0 mmol/g (3.4% by mass).

[合成例12-2] [Synthesis Example 12-2]

<聚矽氧樹脂(B12)之合成> <Synthesis of polyoxyl resin (B12)>

將19.9g之聚矽氧樹脂(I-1)、59.7g之甲苯、19.9g之甲醇、5.76g之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷及1.98mL之70%濃硝酸添加至燒瓶內,於室溫下進行攪拌。4小時後,將反應溶液移至分液漏斗中,添加59.7g之水,進行萃取操作後,回收有機層。重複4次相同之操作,藉此清洗有機層。藉由蒸發器自有機層蒸餾去除甲苯後,進行藉由150℃、1小時之加熱之減壓蒸餾去除後,進行2次藉由170℃、1小時之加熱之減壓蒸餾去除,獲得作為無色透明之黏性液體之聚矽氧樹脂(B12)。 19.9 g of polydecane resin (I-1), 59.7 g of toluene, 19.9 g of methanol, 5.76 g of 1,3-divinyl-1,1,3,3-tetramethyldioxane And 1.98 mL of 70% concentrated nitric acid was added to the flask and stirred at room temperature. After 4 hours, the reaction solution was transferred to a separatory funnel, and 59.7 g of water was added thereto, and after the extraction operation, the organic layer was recovered. The same operation was repeated 4 times, thereby washing the organic layer. Toluene was distilled off from the organic layer by an evaporator, and then distilled under reduced pressure by heating at 150 ° C for 1 hour, and then distilled under reduced pressure by heating at 170 ° C for 1 hour to obtain colorlessness. Transparent viscous liquid polyoxyl resin (B12).

聚矽氧樹脂(B12)之產量為20.6g,質量平均分子量(Mw)為1,800,黏度為350cP,組成比為(Me2SiO2/2)0.32(PhSiO3/2)0.45(CH2=CH(Me)2SiO1/2)0.23,CH2=CH-Si基之含量為2.3mmol/g,HO-Si基之含量為2.1mmol/g(3.6質量%)。 The yield of polyoxyxylene resin (B12) was 20.6 g, the mass average molecular weight (Mw) was 1,800, the viscosity was 350 cP, and the composition ratio was (Me 2 SiO 2/2 ) 0.32 (PhSiO 3/2 ) 0.45 (CH 2 =CH). (Me) 2 SiO 1/2 ) 0.23 , a CH 2 =CH-Si group content of 2.3 mmol/g, and a HO-Si group content of 2.1 mmol/g (3.6 mass%).

合成之聚矽氧樹脂(A7)~(A12)及聚矽氧樹脂(B7)~(B12)之組成比及各物性值(HO-Si基之含量、SiH基或Si-CH=CH2基之含量、質量平均分子量、黏度、折射率、透明性)係示於表7。表7中,Vi表示乙烯基(CH2=CH-基)。 The composition ratio and the physical property values of the synthesized polyoxynoxy resin (A7)~(A12) and polyoxyxylene resin (B7)~(B12) (the content of HO-Si group, SiH group or Si-CH=CH 2 group) The content, mass average molecular weight, viscosity, refractive index, and transparency are shown in Table 7. In Table 7, Vi represents a vinyl group (CH 2 =CH- group).

<硬化性聚矽氧樹脂組合物及其硬化物> <Curable polyoxyn resin composition and cured product thereof>

製備之組合物之黏度、自該組合物獲得之硬化物之物理特性(硬度、密接性、透明性、線熱膨脹係數、5%重量減少溫度、接著強度)、硬化時之外觀係依據上述實施例1~6及比較例1~3之測定方法而測定。又,關於硬化物之密接性,對使用6050SMD型PPA樹脂封裝體代替3528SMD型PPA樹脂封裝體之情形亦加以測定,其測定方法如以下所示。硬化物之打孔(punching)成形性係如以下之測定方法所示。再者,測定中所使用之組合物係將(A)成分之聚矽氧樹脂[聚矽氧樹脂(A7)~(A12)]與(B)成分之聚矽氧樹脂[聚矽氧樹脂(B7)~(B12)]以2:1之質量比進行調配,與(C)成分之鉑觸媒混合而製備實施例7~12 之組合物。此處,作為鉑觸媒,係以相對於組合物總量,鉑原子之含量以質量單位計成為0.03ppm之方式使用鉑-二乙烯基四甲基二矽氧烷錯合物。 The viscosity of the prepared composition, the physical properties (hardness, adhesion, transparency, linear thermal expansion coefficient, 5% weight reduction temperature, adhesion strength) of the cured product obtained from the composition, and the appearance at the time of hardening according to the above examples The measurement methods of 1 to 6 and Comparative Examples 1 to 3 were measured. Further, the adhesion of the cured product was measured by using a 6050 SMD type PPA resin package instead of the 3528 SMD type PPA resin package, and the measurement method is as follows. The punching formability of the cured product is as shown in the following measurement method. Further, the composition used in the measurement is a polyfluorene oxide resin (polyoxygen resin (A7) to (A12)] of the component (A) and a polyoxyl resin (polyoxyl resin) of the component (B). B7)~(B12)] was prepared by mixing with a mass ratio of 2:1 and mixing with a platinum catalyst of the component (C) to prepare Examples 7 to 12 Composition. Here, as the platinum catalyst, a platinum-divinyltetramethyldioxane complex is used in such a manner that the content of platinum atoms is 0.03 ppm by mass based on the total amount of the composition.

[硬化物之密接性(6050SMD型PPA樹脂封裝體)] [Adhesiveness of hardened material (6050SMD type PPA resin package)]

將製備之組合物流入6050SMD型PPA(6.0mm×5.0mm×2.0mm)中,於空氣中於90℃下加熱1小時,進而於150℃下加熱4小時而製作9個作為硬化物之檢體。以光學顯微鏡確認彼等檢體,將硬化物自封裝體剝離者評價為「剝離」,將未剝離者評價為「密接」。9個檢體中,將評價為「密接」之檢體之個數列為「合格數」。 The prepared mixture was poured into a 6050 SMD type PPA (6.0 mm × 5.0 mm × 2.0 mm), heated in air at 90 ° C for 1 hour, and further heated at 150 ° C for 4 hours to prepare 9 samples as hardened materials. . The specimens were confirmed by an optical microscope, and the cured product was evaluated as "peeling" from the package, and the unpeeled was evaluated as "close contact". Among the nine samples, the number of samples evaluated as "closed" was listed as "qualified number".

[打孔成形性試驗] [Pore forming test]

將製備之組合物流入模具(90mm×90mm×2mm)中,於空氣中於90℃下加熱1小時,進而於150℃下加熱4小時而製作板狀硬化物。依據JIS K 6251將該板狀硬化物打孔成形為啞鈴狀8號形。將硬化體之打孔時未發生龜裂或樹脂缺漏而可打孔成形者評價為「良好」。其以外之情形為「不良」。 The prepared composition was poured into a mold (90 mm × 90 mm × 2 mm), heated in air at 90 ° C for 1 hour, and further heated at 150 ° C for 4 hours to prepare a plate-like cured product. The plate-shaped cured product was perforated into a dumbbell-shaped No. 8 shape in accordance with JIS K 6251. When the hardened body was punched, no cracking or resin leakage occurred, and the punched product was evaluated as "good". The situation other than this is "bad".

實施例7~12之組合物及硬化物之評價結果示於表8。 The evaluation results of the compositions and cured products of Examples 7 to 12 are shown in Table 8.

如表8所示,實施例7~12中製作之硬化物均具有優異之耐熱透明性。又,於密接性試驗中,於任一硬化物中均對3528SMD型PPA樹脂封裝體基板顯示優異之密接性。尤其,與實施例10~12之硬化物相比較,質量平均分子量較高且Si-OH基之含量較高之實施例7~9之硬化物中,對較之3528SMD型PPA樹脂封裝體更大型之6050SMD型PPA樹脂封裝體亦顯示優異之密接性。進而,於打孔成形性試驗中,質量平均分子量較低之實施例12之硬化物中,樹脂強度不足而無法將試驗片打孔,相對於此質量平均分子量較高之實施例7~11之硬化物中,可無問題地將硬化體打孔。 As shown in Table 8, the cured products produced in Examples 7 to 12 all had excellent heat-resistant transparency. Further, in the adhesion test, excellent adhesion was exhibited to the 3528 SMD type PPA resin package substrate in any of the cured products. In particular, the cured products of Examples 7 to 9 having a higher mass average molecular weight and a higher Si-OH group content than the cured products of Examples 10 to 12 were larger than the 3528 SMD type PPA resin package. The 6050SMD type PPA resin package also exhibits excellent adhesion. Further, in the punched formability test, in the cured product of Example 12 having a low mass average molecular weight, the resin strength was insufficient and the test piece could not be perforated, and Examples 7 to 11 having a higher mass average molecular weight were used. In the hardened material, the hardened body can be perforated without problems.

1‧‧‧密封材 1‧‧‧ sealing material

2‧‧‧光半導體元件 2‧‧‧Optical semiconductor components

3‧‧‧接合線 3‧‧‧bonding line

4‧‧‧反射材 4‧‧‧Reflecting material

5‧‧‧引線框架 5‧‧‧ lead frame

6‧‧‧光半導體基板 6‧‧‧Optical semiconductor substrate

10‧‧‧光半導體裝置 10‧‧‧Optical semiconductor devices

Claims (15)

一種硬化性聚矽氧樹脂組合物,其至少含有(A)成分:下述式[1]所示且含有與矽原子鍵結之氫原子(SiH基)之聚矽氧樹脂、(B)成分:下述式[2]所示且含有與矽原子鍵結之乙烯基(Si-CH=CH2基)之聚矽氧樹脂、及(C)成分:鉑觸媒,且(A)成分與(B)成分中之矽烷醇基(Si-OH基)之總含量為0.5~5.0mmol/g,(C)成分中之鉑原子之含量相對於(A)成分與(B)成分與(C)成分之合計質量,以質量單位計為0.003~3.0ppm,[化25](H-SiR1 2O1/2)a(SiR2 2O2/2)b(R3SiO3/2)c(SiO4/2)d [1](式中,R1為碳數1~3之烷基,2個R1可為相同或相互不同之種類,R2為碳數1~3之烷基,2個R2可為相同或相互不同之種類,R3為碳數1~3之烷基或碳數6~10之芳香族烴基,a、b及c分別為超過0且未達1之數,d為0以上且未達1之數,滿足a+b+c+d=1,(SiR2 2O2/2)、(R3SiO3/2)及(SiO4/2)所表示之結構單元中之氧原子分別表示形成矽氧烷鍵之氧原子或形成矽烷醇基之氧原子)[化26](CH2=CH-SiR4 2O1/2)e(SiR5 2O2/2)f(R6SiO3/2)g(SiO4/2)h [2](式中,R4為碳數1~3之烷基,2個R4可為相同或相互不同之種類,R5為碳數1~3之烷基,2個R5可為相同或相互不同之種類,R6為碳數1~3之烷基或碳數6~10之芳香族烴基,e、f及g分別為超過0且未達1之數,h為0以上且未達1之數,滿足e+f+g+h=1,(SiR5 2O2/2)、(R6SiO3/2)及(SiO4/2)所表示之結構單元中之氧原 子分別表示形成矽氧烷鍵之氧原子或形成矽烷醇基之氧原子)。 A curable polyoxyxene resin composition containing at least (A) a component: a polyoxyxylene resin having a hydrogen atom (SiH group) bonded to a ruthenium atom and a component (B) represented by the following formula [1] a polyfluorene oxide resin having a vinyl group (Si-CH=CH 2 group) bonded to a ruthenium atom and a component (C): a platinum catalyst, and a component (A) and a compound represented by the following formula [2] The total content of the stanol group (Si-OH group) in the component (B) is 0.5 to 5.0 mmol/g, and the content of the platinum atom in the component (C) is relative to the component (A) and the component (B) and (C). The total mass of the components, in terms of mass units, is 0.003 to 3.0 ppm, [25] (H-SiR 1 2 O 1/2 ) a (SiR 2 2 O 2/2 ) b (R 3 SiO 3/2 ) c (SiO 4/2 ) d [1] (wherein R 1 is an alkyl group having 1 to 3 carbon atoms, two R 1 's may be the same or different from each other, and R 2 is an alkane having 1 to 3 carbon atoms; The two R 2 groups may be the same or different from each other, and R 3 is an alkyl group having 1 to 3 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, and a, b and c are each more than 0 and not up to 1 The number of d is 0 or more and less than 1, satisfying a+b+c+d=1, (SiR 2 2 O 2/2 ), (R 3 SiO 3/2 ), and (SiO 4/2 ) The oxygen atoms in the structural unit represented represent the formation of a decane bond Oxygen atom or oxygen atom forming a stanol group) (CH 2 =CH-SiR 4 2 O 1/2 ) e (SiR 5 2 O 2/2 ) f (R 6 SiO 3/2 ) g (SiO 4/2 ) h [2] (wherein R 4 is an alkyl group having 1 to 3 carbon atoms, 2 R 4 may be the same or different from each other, and R 5 is an alkyl group having 1 to 3 carbon atoms 2 R 5 may be the same or different types, and R 6 is an alkyl group having 1 to 3 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, and e, f and g are each more than 0 and not up to 1 Number, h is 0 or more and less than 1, satisfying e+f+g+h=1, (SiR 5 2 O 2/2 ), (R 6 SiO 3/2 ), and (SiO 4/2 ) The oxygen atom in the structural unit represented represents an oxygen atom forming a siloxane chain or an oxygen atom forming a stanol group, respectively. 如請求項1之硬化性聚矽氧樹脂組合物,其中(A)成分中之與矽原子鍵結之氫原子之莫耳數:(B)成分中之與矽原子鍵結之乙烯基之莫耳數為0.8:0.2~0.5:0.5。 The hardenable polyoxyxene resin composition of claim 1, wherein the number of moles of the hydrogen atom bonded to the ruthenium atom in the component (A): the vinyl group bonded to the ruthenium atom in the component (B) The number of ears is 0.8:0.2~0.5:0.5. 如請求項1或2之硬化性聚矽氧樹脂組合物,其中於(A)成分中,a、b、c及d為a:b:c:d=0.10~0.40:0.10~0.80:0.10~0.80:0~0.70,於(B)成分中,e、f、g及h為e:f:g:h=0.10~0.40:0.10~0.80:0.10~0.80:0~0.70。 The hardened polyoxyxene resin composition according to claim 1 or 2, wherein among the components (A), a, b, c and d are a: b: c: d = 0.10 to 0.40: 0.10 to 0.80: 0.10 0.80:0~0.70, in the component (B), e, f, g, and h are e:f:g:h=0.10~0.40:0.10~0.80:0.10~0.80:0~0.70. 如請求項3之硬化性聚矽氧樹脂組合物,其中於(A)成分中,a、b、c及d為a:b:c:d=0.20~0.40:0.10~0.40:0.30~0.60:0.10~0.30,於(B)成分中,e、f、g及h為e:f:g:h=0.20~0.40:0.10~0.40:0.30~0.60:0.10~0.30。 The sclerosing polyoxymethylene resin composition of claim 3, wherein in the component (A), a, b, c and d are a: b: c: d = 0.20 to 0.40: 0.10 to 0.40: 0.30 to 0.60: 0.10~0.30, in the component (B), e, f, g and h are e:f:g:h=0.20~0.40:0.10~0.40:0.30~0.60:0.10~0.30. 如請求項1或2之硬化性聚矽氧樹脂組合物,其中於(A)成分中,d=0,a、b及c為a:b:c=0.05~0.40:0.10~0.80:0.10~0.80,於(B)成分中,h=0,e、f及g為e:f:g=0.05~0.40:0.10~0.80:0.10~0.80。 The sclerosing polyoxymethylene resin composition of claim 1 or 2, wherein in the component (A), d = 0, a, b and c are a: b: c = 0.05 to 0.40: 0.10 to 0.80: 0.10 0.80, in the component (B), h=0, e, f, and g are e:f:g=0.05~0.40:0.10~0.80:0.10~0.80. 如請求項1或2之硬化性聚矽氧樹脂組合物,其中進而含有硬化延遲劑。 The curable polyoxyxene resin composition of claim 1 or 2, which further contains a hardening retarder. 如請求項1或2之硬化性聚矽氧樹脂組合物,其中進而含有抗氧化劑或光穩定劑。 The curable polyoxyxylene resin composition of claim 1 or 2, which further contains an antioxidant or a light stabilizer. 如請求項1或2之硬化性聚矽氧樹脂組合物,其中進而含有選自由接著賦予劑、螢光體及無機粒子所組成之群中之一種以上。 The curable polyoxyxene resin composition according to claim 1 or 2, further comprising one or more selected from the group consisting of a subsequent imparting agent, a phosphor, and inorganic particles. 如請求項1或2之硬化性聚矽氧樹脂組合物,其中進而含有選自由脫模劑、樹脂改質劑、著色劑、稀釋劑、抗菌劑、防黴劑、調平劑及防垂流劑所組成之群中之一種以上。 The curable polyoxyxene resin composition of claim 1 or 2, which further comprises a release agent, a resin modifier, a colorant, a diluent, an antibacterial agent, an antifungal agent, a leveling agent, and an anti-sagging agent. One or more of the group consisting of agents. 一種硬化物,其係使如請求項1至9中任一項之硬化性聚矽氧樹 脂組合物硬化而成者。 A hardened material which is a hardenable polyoxygen tree as claimed in any one of claims 1 to 9. The lipid composition is hardened. 一種密封材,其係包含如請求項1至9中任一項之硬化性聚矽氧樹脂組合物之硬化物者。 A sealant comprising the hardener of the curable polyoxyxene resin composition according to any one of claims 1 to 9. 一種硬化性聚矽氧樹脂組合物之硬化物之製造方法,其係將如請求項1至9中任一項之硬化性聚矽氧樹脂組合物於45℃以上、300℃以下進行加熱而使之硬化。 A method for producing a cured product of a curable polyoxynene resin composition, which comprises heating the curable polyanthracene resin composition according to any one of claims 1 to 9 at 45 ° C or higher and 300 ° C or lower. Hardening. 一種光半導體裝置,其係以如請求項1至9中任一項之硬化性聚矽氧樹脂組合物之硬化物至少將光半導體元件密封而成者。 An optical semiconductor device obtained by sealing at least an optical semiconductor element with a cured product of the curable polyoxyxene resin composition according to any one of claims 1 to 9. 一種半導體用接著劑,其係包含如請求項1至9中任一項之硬化性聚矽氧樹脂組合物之硬化物者。 An adhesive for a semiconductor comprising the cured product of the curable polyoxyxene resin composition according to any one of claims 1 to 9. 一種光半導體裝置,其係使用如請求項14之半導體用接著劑者。 An optical semiconductor device using the semiconductor adhesive of claim 14.
TW104124159A 2014-07-24 2015-07-24 A hardened silicone resin composition and a hardened product react, and a light-cured semiconductor device TWI540182B (en)

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