TWI533042B - Manufacturing method of optical part, and optical part, transparent part for formation of optical part, optical waveguide , optical module and transparent member for forming optical waveguide core pattern - Google Patents

Manufacturing method of optical part, and optical part, transparent part for formation of optical part, optical waveguide , optical module and transparent member for forming optical waveguide core pattern Download PDF

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TWI533042B
TWI533042B TW102131161A TW102131161A TWI533042B TW I533042 B TWI533042 B TW I533042B TW 102131161 A TW102131161 A TW 102131161A TW 102131161 A TW102131161 A TW 102131161A TW I533042 B TWI533042 B TW I533042B
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refractive index
optical
transparent member
core pattern
transparent
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TW201508359A (en
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酒井大地
內之崎雅夫
黒田敏裕
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日立化成股份有限公司
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光學構件的製造方法及光學構件、光學構件形成用透明構件、光波導、光模組及光波導芯圖案形成用透明構件 Method for producing optical member, optical member, transparent member for forming optical member, optical waveguide, optical module, and transparent member for forming optical waveguide core pattern

本發明是有關於一種光學構件的製造方法及光學構件、光學構件形成用透明構件、光波導及光模組。 The present invention relates to a method for producing an optical member, an optical member, a transparent member for forming an optical member, an optical waveguide, and an optical module.

抗反射構件可於各種用途中使用,特別是於顯示器等元件本體或構件中貼附膜狀之抗反射構件而使用。一般情況下,抗反射功能可藉由於透明基材上包含含有金屬氧化物等透明材料之高折射率部位與低折射率部位,製成包含該些重複結構之多層結構而形成抗反射膜。該些多層結構一般可藉由物理蒸鍍(Physical Vapor Deposition,PVD)法或化學蒸鍍(Chemical Vapor Deposition,CVD)法等乾式成膜法而形成。於上述方法中具有可精密地控制低折射率部位及高折射率部位之膜厚的優點。 The antireflection member can be used in various applications, and is particularly used by attaching a film-shaped antireflection member to an element body or a member such as a display. In general, the antireflection function can form an antireflection film by forming a multilayer structure including the repeating structures by a high refractive index portion and a low refractive index portion containing a transparent material such as a metal oxide on a transparent substrate. These multilayer structures can be generally formed by a dry film formation method such as a physical vapor deposition (PVD) method or a chemical vapor deposition (CVD) method. Among the above methods, there is an advantage that the film thickness of the low refractive index portion and the high refractive index portion can be precisely controlled.

而且,隨著信息容量之增大,不僅僅於中繼線(trunk line)或存取(access)系統等通訊領域中,於路由器(router)或伺服器(server)內之信息處理中亦進行使用光信號之光互連(light interconnection)技術之開發。具體而言,為了於路由器或伺服器裝置內之板(board)間或板內之短距離信號傳輸中使用光,進行了於電氣配線板上複合有光傳輸線路之光電複合基板之開發。作為光傳輸線路,理想的是使用與光纖相比而言配線之自由度高,且可高密度化之光波導,其中,使用加工性或經濟性優異之聚合物材料的光波導大有前途。 Moreover, as the capacity of information increases, not only trunks (trunks) In the communication field such as line) or access system, the development of light interconnection technology using optical signals is also performed in information processing in a router or a server. Specifically, in order to use light for short-distance signal transmission between routers or boards in a server device or in a board, development of a photovoltaic composite substrate in which an optical transmission line is combined on an electric wiring board has been developed. As the optical transmission line, it is preferable to use an optical waveguide having a high degree of freedom in wiring and a high density compared with an optical fiber. Among them, an optical waveguide using a polymer material excellent in workability or economy is promising.

作為該光波導,例如於專利文獻1中記載了於承載膜上硬化形成下部包覆層之後,於下部包覆層上形成芯圖案形成用樹脂,藉由進行曝光與蝕刻而形成圖案化之芯圖案,且積層有上部包覆層之光波導。 In the optical waveguide, for example, Patent Document 1 discloses that after forming a lower cladding layer on a carrier film, a resin for forming a core pattern is formed on the lower cladding layer, and a patterned core is formed by exposure and etching. A pattern and an optical waveguide with an upper cladding layer laminated.

[專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2003-195081號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2003-195081

然而,於使用上述乾式成膜法而形成抗反射構件之情形時,必須於真空中進行成膜,因此存在生產性低之問題,若由於暴露於真空中則有可能對透明構件造成損傷、或於膜形狀彎曲之情形(亦包含於製造中彎曲之情形)中、或於複雜之情形中、或為錯綜複雜之形狀之透明構件時,則有產生折射率之位置的不均一之虞。 However, when the anti-reflection member is formed by the above-described dry film formation method, film formation must be performed in a vacuum, and thus there is a problem that productivity is low, and if it is exposed to a vacuum, damage to the transparent member may occur, or In the case where the film shape is curved (also included in the case of bending in manufacturing), or in a complicated case, or a transparent member having an intricate shape, there is a non-uniformity in the position at which the refractive index is generated.

而且,於如專利文獻1所記載那樣藉由蝕刻而形成芯圖 案之光波導之情形時,由於包覆-芯圖案間之界面粗糙度、或由於蝕刻液所造成之芯圖案內之折射率之不均一性等,而有傳播過芯圖案之光損耗惡化之虞。 Further, a core pattern is formed by etching as described in Patent Document 1. In the case of the optical waveguide of the case, the optical loss of the propagated core pattern is deteriorated due to the interface roughness between the cladding-core patterns or the inhomogeneity of the refractive index in the core pattern due to the etching liquid. Hey.

本發明是為了解決上述問題而成者,其目的在於提供量產性優異、可於位置上高精度地進行透明構件之表層部位附近及中心部之折射率之控制的光學構件的製造方法;以及藉由將其用於包含下部包覆層、芯圖案、上部包覆層之光波導的芯圖案中而提供光損耗低之光波導。 The present invention has been made to solve the above problems, and an object of the invention is to provide a method for producing an optical member which is excellent in mass productivity and capable of controlling the refractive index of a vicinity of a surface layer portion and a center portion of a transparent member with high precision in position; An optical waveguide having low optical loss is provided by being used in a core pattern of an optical waveguide including a lower cladding layer, a core pattern, and an upper cladding layer.

本發明者等人為了解決上述課題而進行了努力研究,結果發現藉由如下方式可解決上述課題:使所使用之透明構件具有特徵,其中一例是具有如下步驟A之光學構件的製造方法:將透明構件暴露於溶液中,使所述透明構件之所暴露之暴露部位之折射率實質性低於所述透明構件之並非暴露部位之透明構件中心部之折射率;而且,設為如下之光波導,所述光波導將呈現此種特徵之該光學構件形成用透明構件作為芯圖案形成用構件。本發明是基於該發現而完成者。 The inventors of the present invention have made an effort to solve the above problems, and as a result, have found that the above-described problem can be solved by making the transparent member used characteristic, and an example thereof is a method for producing an optical member having the following step A: The transparent member is exposed to the solution such that the refractive index of the exposed portion of the transparent member is substantially lower than the refractive index of the central portion of the transparent member that is not the exposed portion of the transparent member; The optical waveguide exhibits the optical member forming transparent member having such a feature as a core pattern forming member. The present invention has been completed based on this finding.

亦即,本發明有關於如下之各項。 That is, the present invention relates to the following items.

(1)一種光學構件的製造方法,其包含步驟A:將透明構件暴露於溶液中,使暴露於所述溶液中之所述透明構件之表層部位之折射率實質性地低於未暴露於所述溶液中之所述透明構件之中心部之折射率。 (1) A method of producing an optical member, comprising the step A: exposing the transparent member to a solution such that a refractive index of a surface portion of the transparent member exposed to the solution is substantially lower than that not exposed to the The refractive index of the central portion of the transparent member in the solution.

(2)如上述(1)所述之光學構件的製造方法,其中,於所 述步驟A中,將所述透明構件暴露於溶液中時,使所述溶液含浸於所述透明構件中。 (2) The method of producing an optical member according to (1) above, wherein In the step A, when the transparent member is exposed to the solution, the solution is impregnated into the transparent member.

(3)如上述(1)或(2)所述之光學構件的製造方法,其中,所述溶液含有折射率控制劑,所述折射率控制劑表現出藉由含有於所述透明構件之表層部位而使所述表層部位之折射率實質性降低之功能。 (3) The method of producing an optical member according to the above (1), wherein the solution contains a refractive index controlling agent, and the refractive index controlling agent is expressed by being contained on a surface layer of the transparent member The function of substantially reducing the refractive index of the surface layer portion.

(4)一種光學構件的製造方法,其包含步驟A':於透明構件中,使所述透明構件之表層部位含有使所述透明構件之折射率實質性降低之折射率控制劑,從而使含有所述折射率控制劑之表層部位之折射率實質性低於不含折射率控制劑之所述透明構件之中心部之折射率。 (4) A method for producing an optical member, comprising the step A' of: in a transparent member, a surface layer portion of the transparent member is provided with a refractive index controlling agent that substantially reduces a refractive index of the transparent member, thereby containing The refractive index of the surface layer portion of the refractive index controlling agent is substantially lower than the refractive index of the central portion of the transparent member not including the refractive index controlling agent.

(5)如上述(1)~(4)中任一項所述之光學構件的製造方法,其中,所述透明構件是可藉由蝕刻液進行蝕刻之透明構件,且所述光學構件的製造方法包含藉由蝕刻進行圖案化的步驟B,所述步驟B可與所述步驟A或所述步驟A'同時進行,或者於所述步驟A或所述步驟A'之前進行。 (5) The method of producing an optical member according to any one of the above-mentioned, wherein the transparent member is a transparent member etchable by an etching solution, and the optical member is manufactured The method comprises a step B of patterning by etching, which step B can be carried out simultaneously with said step A or said step A', or before said step A or said step A'.

(6)如上述(1)~(5)中任一項所述之光學構件的製造方法,其中,所述透明構件是透明樹脂,所述折射率控制劑是1價陽離子。 (6) The method of producing an optical member according to any one of the above aspects, wherein the transparent member is a transparent resin, and the refractive index controlling agent is a monovalent cation.

(7)如(6)所述之光學構件的製造方法,其中,所述溶液是鹼溶液。 (7) The method of producing an optical member according to (6), wherein the solution is an alkali solution.

(8)如上述(6)或(7)所述之光學構件的製造方法,其中, 所述1價陽離子是鉀離子及鈉離子之至少任一者。 (8) The method of producing an optical member according to the above (6) or (7), wherein The monovalent cation is at least one of a potassium ion and a sodium ion.

(9)如上述(6)~(8)中任一項所述之光學構件的製造方法,其中,所述透明樹脂是感光性透明樹脂,於所述步驟A或所述步驟A'之前、或/及所述步驟B之前包含步驟C:照射可使所述感光性透明樹脂光硬化之光化射線。 (9) The method of producing an optical member according to any one of the above-mentioned, wherein the transparent resin is a photosensitive transparent resin, before the step A or the step A', Or / and before the step B, the step C: irradiating the actinic ray which can photoharden the photosensitive transparent resin.

(10)如上述(6)~(9)中任一項所述之光學構件的製造方法,其中,於所述步驟A或所述步驟A'之後包含步驟D':對所述透明樹脂進行熱硬化。 (10) The method for producing an optical member according to any one of the above-mentioned (6), wherein, after the step A or the step A', the step D' is included: performing the transparent resin Heat hardened.

(11)一種光學構件的製造方法,其包含步驟D:對透明樹脂進行熱硬化,使所述透明樹脂之表層部位附近之折射率實質性地低於所述透明樹脂之中心部之折射率。 (11) A method of producing an optical member, comprising the step of: thermally curing a transparent resin such that a refractive index in the vicinity of a surface portion of the transparent resin is substantially lower than a refractive index in a central portion of the transparent resin.

(12)如上述(10)或(11)所述之光學構件的製造方法,其中,所述透明樹脂至少包含(A)具有熱聚合性官能基之基質樹脂、(B)熱聚合性化合物。 The method for producing an optical member according to the above aspect, wherein the transparent resin contains at least (A) a matrix resin having a thermally polymerizable functional group, and (B) a thermally polymerizable compound.

(13)一種光學構件形成用透明構件,其用於如上述(1)~(12)中任一項所述之光學構件的製造方法中。 (13) A transparent member for forming an optical member, which is used in the method for producing an optical member according to any one of the above (1) to (12).

(14)一種光學構件,其藉由如上述(1)~(12)中任一項所述之光學構件的製造方法而獲得。 (14) An optical member obtained by the method for producing an optical member according to any one of the above (1) to (12).

(15)一種光波導,其是包含芯部及包覆部之光波導,於形成所述芯部之芯圖案中,所述芯圖案之至少周圍之一部分包含具有比所述芯圖案之中心部低之折射率的表層部位。 (15) An optical waveguide comprising an optical waveguide including a core portion and a cladding portion, wherein at least a portion of the periphery of the core pattern includes a central portion of the core pattern in a core pattern forming the core portion The surface portion of the low refractive index.

(16)一種光波導,如上述(15)所述之光波導是積層有下 部包覆層、芯圖案、上部包覆層之光波導,且於具有低折射率之所述表層部位之外側包含折射率更低之下部包覆層或/及上部包覆層。 (16) An optical waveguide, wherein the optical waveguide according to (15) above is laminated The optical waveguide of the cladding layer, the core pattern, and the upper cladding layer includes a lower cladding layer or/and an upper cladding layer on the outer side of the surface layer portion having a low refractive index.

(17)如上述(15)或(16)所述之光波導,其中,具有2邊以上之周圍的所述芯圖案是至少包含兩個側壁之2邊的芯圖案。 (17) The optical waveguide according to the above (15) or (16), wherein the core pattern having two or more sides is a core pattern including at least two sides of the two side walls.

(18)如上述(16)或(17)所述之光波導,其中,相較於所述芯圖案中心與芯圖案之周圍之低折射率部位的折射率差,所述低折射率部位與所述下部包覆層或/及上部包覆層的折射率差更大。 (18) The optical waveguide according to (16) or (17) above, wherein the low refractive index portion is different from a refractive index difference between a center of the core pattern and a low refractive index portion around the core pattern The difference in refractive index between the lower cladding layer and/or the upper cladding layer is greater.

(19)一種光波導,其是如上述(15)~(18)中任一項所述之光波導,所述芯圖案是藉由如上述(13)所述之光學構件形成用透明構件而形成。 (19) The optical waveguide according to any one of the above (15), wherein the core pattern is a transparent member for forming an optical member according to (13) above. form.

(20)如上述(15)~(19)中任一項所述之光波導,所述表層部位包含用以低折射率化之折射率控制劑。 (20) The optical waveguide according to any one of the above (15), wherein the surface layer portion includes a refractive index controlling agent for lowering the refractive index.

(21)一種光模組,其使用如上述(15)~(20)中任一項所述之光波導。 (21) An optical module using the optical waveguide according to any one of (15) to (20) above.

(22)一種光波導芯圖案形成用透明構件,其是用於積層有下部包覆層、芯圖案、上部包覆層之光波導中的芯圖案形成用透明構件,於形成所述芯圖案時,2邊以上之周圍可實質性形成折射率低於所述芯圖案之中心部之表層部位。 (22) A transparent member for forming an optical waveguide core pattern, which is a transparent member for forming a core pattern in an optical waveguide in which a lower cladding layer, a core pattern, and an upper cladding layer are laminated, when the core pattern is formed The periphery of the two sides or more may substantially form a surface layer portion having a refractive index lower than a central portion of the core pattern.

本發明之光學構件的製造方法由於量產性優異、可於位 置上高精度地對透明構件之芯圖案之表層部位附近及中心部之折射率進行控制,因此是適於光波導之光學構件的製造方法。而且,本發明之光波導由於使用特定之芯圖案而具有低光傳播損耗。 The method for producing an optical member of the present invention is excellent in mass productivity and can be placed in position The refractive index of the vicinity of the surface layer portion of the core pattern of the transparent member and the central portion is controlled with high precision, and therefore, it is a method for manufacturing an optical member suitable for the optical waveguide. Moreover, the optical waveguide of the present invention has low light propagation loss due to the use of a specific core pattern.

1‧‧‧基板 1‧‧‧Substrate

2‧‧‧下部包覆層 2‧‧‧Lower coating

3‧‧‧芯圖案 3‧‧‧ core pattern

4‧‧‧芯圖案中心部 4‧‧‧ core pattern center

5‧‧‧低折射率部位 5‧‧‧Low refractive index

6‧‧‧上部包覆層 6‧‧‧Upper cladding

圖1(a)及圖1(b)是本發明之光波導之剖面圖。 1(a) and 1(b) are cross-sectional views of an optical waveguide of the present invention.

本發明之光學構件的製造方法之一包含步驟A,亦即將透明構件暴露於溶液中,使透明構件之所暴露之暴露部位之折射率實質性低於透明構件之並非暴露部位之透明構件中心部之折射率。藉此可形成具有折射率不同之部位的透明構件,因此可用於抗反射構件或後述之光波導之芯圖案等中。本發明中之所謂「透明」是指相對於本發明之光學構件中所使用之光之波長的透明性,若具有不對光之傳播造成不良影響之程度的透明性即可。而且,本發明中之所謂「可使折射率實質性降低」不僅僅是指藉由將透明構件暴露於溶液中,使暴露於溶液中之部位低折射率化,而且是指藉由經過其後之步驟而最終產生折射率差,而使折射率相對變低。產生折射率差之步驟可為本步驟A之不久後,而且亦可為後述之圖案化之步驟B或熱硬化之步驟D之後。 One of the manufacturing methods of the optical member of the present invention comprises the step A, that is, exposing the transparent member to the solution, so that the refractive index of the exposed portion exposed by the transparent member is substantially lower than the central portion of the transparent member which is not the exposed portion of the transparent member. Refractive index. Thereby, a transparent member having a portion having a different refractive index can be formed, and thus it can be used in an anti-reflection member or a core pattern of an optical waveguide to be described later. The term "transparent" in the present invention means transparency with respect to the wavelength of light used in the optical member of the present invention, and may have transparency to the extent that it does not adversely affect the propagation of light. Further, the term "substantially lowering the refractive index" in the present invention means not only the exposure of the transparent member to the solution, but also the low refractive index of the portion exposed to the solution, and means that it is passed through The step of producing a refractive index difference eventually makes the refractive index relatively low. The step of generating the refractive index difference may be shortly after the step A, and may be followed by the step B of patterning or the step D of thermal hardening described later.

於本發明中,藉由使用溶液而實質性地低折射率化,因此具有可於均一之條件下對光學構件之暴露部位進行折射率控制之優點。而且,為了使暴露面低折射率化,例如於將透明構件積 層於被寫體上之後,可藉由進行步驟A使該被寫體與相反面之折射率差降低。 In the present invention, since the refractive index is substantially lowered by using a solution, there is an advantage that the refractive index of the exposed portion of the optical member can be controlled under uniform conditions. Moreover, in order to lower the refractive index of the exposed surface, for example, to form a transparent component After the layer is placed on the object, the refractive index difference between the object and the opposite surface can be lowered by performing step A.

透明構件之種類並無特別限定,若為可產生折射率差之材料即可。作為使用溶液而產生該透明樹脂之折射率差之方法,例如存在有(a)使用溶液於透明構件之暴露部位作出密度小的部分,藉此產生折射率差之方法;(b)預先於透明構件中含有可溶於溶液之高折射率成分,藉由溶液使該高折射率可溶成分溶解而產生折射率差之方法;(c)使包含折射率低於透明構件之成分的溶液暴露、含浸於該透明構件中,使低折射率成分作為折射率控制劑而固定於透明構件中,從而產生折射率差之方法。除此以外,亦可列舉如後所述地(d)暴露、含浸可使分子結構、分子網狀形式變化之折射率控制劑,於所暴露、含浸之部位與除此以外之部位之間產生折射率差之方法等。藉由該(d)之方式,可經過其後製程而使分子結構、分子網狀形式變化。上述產生折射率差之方法可使用任一方法,於本發明中重要的是藉由溶液而使暴露、含浸之部位之折射率實質性降低。 The type of the transparent member is not particularly limited, and may be any material that can cause a difference in refractive index. As a method of producing a refractive index difference of the transparent resin using a solution, for example, there is a method in which (a) a portion where a density is small at an exposed portion of a transparent member using a solution, thereby producing a refractive index difference; (b) a transparent a method comprising: a high refractive index component soluble in a solution, a solution of the high refractive index soluble component dissolved by the solution to produce a refractive index difference; (c) exposing the solution containing the component having a lower refractive index than the transparent member, A method of immersing in the transparent member to fix a low refractive index component as a refractive index controlling agent in a transparent member to generate a refractive index difference. In addition, as described later, (d) exposure, impregnation may change the molecular structure, molecular network form of the refractive index control agent, between the exposed, impregnated and other parts A method of refractive index difference, and the like. By the method of (d), the molecular structure and the molecular network form can be changed by the subsequent process. Any of the above methods for producing a refractive index difference may be used. In the present invention, it is important that the refractive index of the exposed and impregnated portions is substantially lowered by the solution.

而且,若所得之光學構件透明,且不產生所透過之光之擴散或散射即可,例如若於透明構件內儘可能地並不固有對所使用之光具有吸收帶之物質(透過率降低之因素)或空隙(擴散、散射之因素),則透明性、霧度等變得良好,因此較佳。特別是若具有空隙,則空隙周圍之折射率控制變得困難,因此較佳的是並不固有。 Further, if the obtained optical member is transparent and does not cause diffusion or scattering of the transmitted light, for example, if the transparent member does not inherently have an absorption band for the light used (the transmittance is lowered) The factor) or the void (a factor of diffusion or scattering) is preferable because transparency, haze, and the like are good. In particular, if there is a void, the refractive index control around the void becomes difficult, and therefore it is preferably not inherent.

於步驟A中,若於透明構件中含浸可使折射率實質性降低之溶液即可。所謂含浸是表示滲透至任意之深度方向,藉由適宜調整所暴露之溶液之濃度、量、時間、溫度、壓力等,可進行深度方向之折射率調變。於本發明之光學構件的製造方法中,一般情況下自光學構件表面向中心部方向(暴露方向)之折射率以產生漸變之方式而形成,但亦可直至一定深度地使折射率均勻地變化。特別是後述之透明構件為樹脂之情形時,由於溶液之暴露所造成之滲透深度與溶液之滲透量容易變為反比例傾向,因此容易成為前者。另外,本發明中所謂之「可使折射率實質性降低之溶液」並非是指於折射率分佈型光學零件等之製作中所使用之於室溫下為液狀且於透明構件之表層部附近所殘存之僅僅包含低折射率單體群組之液體。於本發明中,是指即使經過其後之步驟亦不殘存於透明構件之表層部附近的作為溶劑之水或有機溶劑或該些之混合液等、或於該些中混合有其他成分(例如鹼成分、酸成分、溶液調整用添加成分或後述之折射率控制劑等)之液體。 In the step A, if the transparent member is impregnated, the solution having a substantially reduced refractive index can be used. The impregnation means that the penetration is in any depth direction, and the refractive index modulation in the depth direction can be performed by appropriately adjusting the concentration, amount, time, temperature, pressure, and the like of the exposed solution. In the method for producing an optical member according to the present invention, the refractive index from the surface of the optical member toward the center portion (exposed direction) is generally formed in a gradual manner, but the refractive index may be uniformly changed until a certain depth. . In particular, when the transparent member to be described later is a resin, the penetration depth due to the exposure of the solution and the amount of penetration of the solution tend to be inversely proportional, and thus it is easy to become the former. In the present invention, the "solution which can substantially reduce the refractive index" is not used in the production of a refractive index distribution type optical component or the like, and is liquid at room temperature and is in the vicinity of the surface layer portion of the transparent member. The remaining liquid contains only the liquid of the low refractive index monomer group. In the present invention, it means that water or an organic solvent as a solvent or a mixture of these or the like does not remain in the vicinity of the surface layer portion of the transparent member even after the subsequent step, or other components are mixed therein (for example, A liquid of an alkali component, an acid component, an additive component for solution adjustment, or a refractive index controlling agent to be described later.

本發明於步驟A中使用以水為主成分之溶液,藉此避免由於透明構件之溶解或膨潤所產生之不良影響,因此具有可於充分保持透明構件之形狀的狀態下進行表層部位之低折射率化的優點。另外,亦可藉由所述水溶液對後述之圖案化之步驟B中所形成的圖案形狀進行處理而高精度地獲得所述圖案形狀。 In the present invention, the solution containing water as a main component is used in the step A, thereby avoiding the adverse effect due to dissolution or swelling of the transparent member, and therefore having low refraction of the surface portion in a state where the shape of the transparent member can be sufficiently maintained. The advantages of rate. Further, the pattern shape can be obtained with high precision by processing the pattern shape formed in the step B of patterning described later by the aqueous solution.

於本發明中,藉由於透明構件之一部分中含有折射率控制劑,可調變任意部位之折射率。本發明於表現出如下功能之方 面具有特徵:藉由使特別是透明構件之表層部位含有該折射率控制劑,使所述表層部位之折射率實質性變低。而且,自透明性、霧度之觀點考慮,折射率控制劑較佳的是並非對所使用之光具有吸收帶之物質(透過率降低之因素)或空隙(擴散、散射之因素)者。 In the present invention, the refractive index of any portion can be adjusted by virtue of the fact that a refractive index controlling agent is contained in one of the transparent members. The present invention is in the form of the following functions The surface has a feature that the refractive index of the surface layer portion is substantially lowered by including the refractive index controlling agent in a surface portion of the transparent member. Further, from the viewpoints of transparency and haze, the refractive index controlling agent is preferably one which does not have an absorption band for light to be used (a factor of a decrease in transmittance) or a void (a factor of diffusion or scattering).

於溶液中若含有具有可使透明構件之折射率實質性降低之效果的折射率控制劑即可。由於預先含有該折射率控制劑,因此藉由溶液之暴露、含浸,折射率控制劑同時暴露、含浸於透明構件中,容易有效率地形成折射率相對變低之部位。 The refractive index controlling agent having an effect of substantially reducing the refractive index of the transparent member may be contained in the solution. Since the refractive index controlling agent is contained in advance, the refractive index controlling agent is simultaneously exposed and impregnated into the transparent member by exposure or impregnation of the solution, and it is easy to efficiently form a portion where the refractive index is relatively low.

本發明之其他的光學構件的製造方法包含步驟A',亦即於透明構件中,使透明構件之表層部位含有使透明構件之折射率實質性降低之折射率控制劑,從而使含有折射率控制劑之表層部位之折射率實質性低於不含折射率控制劑之透明構件之中心部之折射率。步驟A'中包含於製作透明構件之階段使透明構件之表面層預先含有折射率控制劑之方法、與製作透明構件後進行暴露或含浸於溶液中等而使其表層含有折射率控制劑之方法之兩者。於後者之情形時,例如亦可藉由經過熱硬化等後製程,其結果使表層部位之折射率相對變低。 The method for producing another optical member according to the present invention includes the step A', that is, in the transparent member, the surface layer portion of the transparent member contains a refractive index controlling agent which substantially reduces the refractive index of the transparent member, thereby allowing the refractive index control to be contained. The refractive index of the surface portion of the agent is substantially lower than the refractive index of the central portion of the transparent member containing no refractive index controlling agent. The step A' includes a method of preparing a transparent member at a stage where the surface layer of the transparent member is previously contained with a refractive index controlling agent, and a method of exposing or impregnating the transparent member to a solution and containing the refractive index controlling agent on the surface layer thereof. Both. In the latter case, for example, it may be subjected to a post-curing process such as thermal hardening, and as a result, the refractive index of the surface layer portion is relatively lowered.

藉此可與上述步驟A同樣地形成具有折射率不同之部位的透明構件,因此可於抗反射膜構件或後述之光波導之芯圖案等中使用。 Thereby, a transparent member having a portion having a different refractive index can be formed in the same manner as in the above-described step A. Therefore, it can be used in an anti-reflection film member or a core pattern of an optical waveguide to be described later.

透明構件是可藉由蝕刻液而蝕刻之透明構件,若包含藉 由蝕刻進行圖案化之步驟B,則可將該透明構件加工為任意形狀。另外,藉由與對透明構件進行圖案化之步驟B同時或於步驟B之後進行上述步驟A或步驟A',可使經圖案化之透明構件之側壁表層部位附近之折射率降低。而且,若為可蝕刻之透明構件,則亦可總括地形成多個透明構件,生產性優異。 The transparent member is a transparent member that can be etched by an etching solution, if included The step B of patterning by etching can process the transparent member into an arbitrary shape. Further, by performing the above step A or step A' simultaneously with the step B of patterning the transparent member or after the step B, the refractive index in the vicinity of the surface layer portion of the sidewall of the patterned transparent member can be lowered. Further, in the case of an etchable transparent member, a plurality of transparent members can be collectively formed, and the productivity is excellent.

作為透明構件之種類,若為可藉由溶液之暴露或含有折射率控制劑而使折射率實質性降低之材料則並無特別限制,若透明構件為透明樹脂,則自加工容易之觀點考慮較佳,若上述折射率控制劑為陽離子,則容易暴露、含浸,若使透明構件暴露之溶液為鹼溶液,則操作性較佳,若為上述該些之組合,則容易表現出上述的製造方法之效果,因此較佳。 The type of the transparent member is not particularly limited as long as it can be substantially reduced in refractive index by exposure of a solution or a refractive index controlling agent. If the transparent member is a transparent resin, it is easy to process from the viewpoint of easy processing. Preferably, if the refractive index controlling agent is a cation, it is easily exposed and impregnated, and if the solution exposed to the transparent member is an alkali solution, the handleability is better, and if the combination is the above, the above-described production method is easily exhibited. The effect is therefore preferred.

若為上述組合,則於包含該陽離子作為折射率控制劑發揮功能之樹脂組成的透明構件中,使用包含陽離子之溶液作為鹼溶液,進行暴露而於該透明構件中含浸陽離子,藉此可容易且有效率地製造光學構件。可達成本發明之具體的樹脂組成之一例如後所述。 In the above-described combination, in a transparent member containing a resin composition in which the cation functions as a refractive index controlling agent, a solution containing a cation is used as an alkali solution, and the cation is impregnated into the transparent member, whereby the cation can be easily and easily The optical member is efficiently manufactured. One of the specific resin compositions of the invention can be found, for example, as described later.

上述陽離子若為帶正電荷之離子,則容易暴露、含浸於透明樹脂內,並容易於透明樹脂內藉由離子鍵結等而固定,因此較佳。另外,若為1價陽離子,則抑制由於透明樹脂內之離子鍵結性交聯而造成之密度上升,容易進行實質性之低折射率化。若為2價以上之陽離子,則存在由於離子交聯或生成多價陽離子之反應物而造成密度上升之現象,因此難以進行實質性之低折射率 化。於1價陽離子中,特別是若為鉀離子或/及鈉離子,則操作性容易,且成為一般比其他鹼金屬離子之吸濕性低的透明樹脂,因此更佳。 When the cation is a positively charged ion, it is easily exposed and impregnated into the transparent resin, and is easily fixed by ionic bonding or the like in the transparent resin, which is preferable. Further, when it is a monovalent cation, the density due to ionic bonding crosslinking in the transparent resin is suppressed from increasing, and it is easy to substantially reduce the refractive index. If it is a cation of two or more valences, there is a phenomenon that the density increases due to the ion crosslinking or the reaction product of the polyvalent cation, and thus it is difficult to perform a substantial low refractive index. Chemical. Among the monovalent cations, particularly potassium ions and/or sodium ions are preferable because they are easy to handle, and generally have a hygroscopic property lower than that of other alkali metal ions.

於本發明中,作為具有與所述陽離子相同功能的折射率控制劑,可使用單官能性化合物(單體)或具有硬化反應較所述透明構件之中心部慢之聚合性官能基的化合物(單體)。例如藉由於包含有機溶劑(所述有機溶劑包含單官能性化合物(單體))之溶液中暴露透明構件,單官能性化合物(單體)吸附或含浸於透明構件之表層。藉由其後之光硬化或熱硬化等處理,透明構件之表層部位之交聯密度降低,因此與未含浸之部位相比而言,折射率相對變低。同樣地,於使用含有硬化反應較透明構件之中心部慢之聚合性官能基的化合物(單體)之情形時,亦於透明構件之表層部位使硬化變慢而抑制交聯反應,因此可形成與透明構件之中心部相比而言,折射率相對低之部位。 In the present invention, as the refractive index controlling agent having the same function as the cation, a monofunctional compound (monomer) or a compound having a polymerizable functional group having a hardening reaction slower than a central portion of the transparent member can be used ( monomer). The monofunctional compound (monomer) is adsorbed or impregnated on the surface layer of the transparent member, for example, by exposing the transparent member in a solution containing an organic solvent containing the monofunctional compound (monomer). By the subsequent photohardening or thermal hardening treatment, the crosslinking density of the surface layer portion of the transparent member is lowered, so that the refractive index is relatively lower than that of the unimpregnated portion. Similarly, when a compound (monomer) containing a polymerizable functional group having a slow central portion of the transparent member is used, the hardening is slowed at the surface layer portion of the transparent member to suppress the crosslinking reaction, so that it can be formed. A portion having a relatively low refractive index as compared with the central portion of the transparent member.

作為所述單官能性化合物(單體),例如可列舉丙烯酸酯或甲基丙烯酸酯等於1分子中具有1個乙烯性不飽和鍵的化合物,或具有1個環氧基之環氧化合物等。作為含有硬化反應較透明構件之中心部慢之聚合性官能基的化合物(單體),於本發明中所使用之透明構件至少包含具有2個以上乙烯性不飽和鍵之多官能性丙烯酸酯或甲基丙烯酸酯等之情形時,可使用僅僅具有選自如下基之群組的任意一個基的化合物等:較乙烯性不飽和鍵反應慢之加成聚合性芳基、環氧基及形成胺基甲酸酯鍵之異氰酸基。 而且,該些化合物若為低折射率之材料,則於用作折射率控制劑時,使折射率實質性變低之效果進一步變大。作為具有此種功能之化合物,例如可列舉不含芳香族環或脂環式環之單官能性化合物(單體)或含有硬化反應慢之聚合性官能基的化合物(單體)。除此以外,亦可使用包含氟元素之化合物。 Examples of the monofunctional compound (monomer) include an acrylate or a methacrylate having a compound having one ethylenically unsaturated bond in one molecule, or an epoxy compound having one epoxy group. The transparent member used in the present invention contains at least a polyfunctional acrylate having two or more ethylenically unsaturated bonds, as a compound (monomer) containing a slow polymerizable functional group at a central portion of the relatively transparent member. In the case of methacrylate or the like, a compound having only one group selected from the group of the following groups, or the like: an addition polymerization aryl group which is slower than the ethylenically unsaturated bond, an epoxy group, and an amine formation can be used. Isocyanate group of a urethane bond. Further, when these compounds are materials having a low refractive index, the effect of substantially lowering the refractive index when used as a refractive index controlling agent is further increased. Examples of the compound having such a function include a monofunctional compound (monomer) containing no aromatic ring or alicyclic ring, or a compound (monomer) containing a polymerizable functional group having a slow curing reaction. In addition to this, a compound containing a fluorine element can also be used.

於透明構件為透明樹脂之情形時,該透明樹脂更佳為感光性透明樹脂。另外,若於上述步驟A或步驟A'之前、或/及步驟B之前,包含對感光性透明樹脂照射可使其光硬化之光化射線的步驟C則較佳。藉此,即使所述透明樹脂暴露於溶液(水溶液、鹼溶液或有機溶劑)中,亦可藉由光化射線進行光硬化而使其耐溶液性提高。另外,藉由蝕刻進行圖案化時之對蝕刻液之耐蝕刻液性提高。若使溶液與蝕刻液為同一液體(亦可為混合液),則可同時進行步驟A與步驟B,因此作業性、量產性提高。 When the transparent member is a transparent resin, the transparent resin is more preferably a photosensitive transparent resin. Further, it is preferable to include the step C of irradiating the photosensitive transparent resin with an actinic ray which can be photocured before the step A or the step A' or before the step B'. Thereby, even if the transparent resin is exposed to a solution (an aqueous solution, an alkali solution or an organic solvent), it can be photohardened by actinic rays to improve the solution resistance. Further, the etching resistance to the etching liquid is improved when patterning by etching. When the solution and the etching liquid are the same liquid (may be a mixed liquid), the steps A and B can be simultaneously performed, and workability and mass productivity are improved.

本發明之其他的光學構件的製造方法中,於透明構件為透明樹脂,該透明構件可藉由熱而硬化之情形時,包含步驟D,亦即對透明樹脂進行加熱硬化,使熱硬化後之該透明樹脂之表層部位附近之折射率實質性低於熱硬化後之透明樹脂之中心部之折射率。作為此時所使用之透明樹脂之材料,若選擇可藉由熱硬化而使硬化後之表層部位附近之折射率相對性低於中心部之折射率的透明樹脂即可。折射率差可藉由抑制透明樹脂表層之熱硬化(例如利用氧之阻礙硬化之功能等)而產生,亦可如上所述地使折射率控制劑預先暴露、含浸於透明樹脂表層而產生。於前者之情形 時,於透明樹脂之熱硬化時,可僅僅藉由調整周圍之氣體環境而抑制透明樹脂之表層部位附近之硬化,因此表層部位附近之折射率變得低於其中心部之折射率。於後者之情形時,若使用折射率控制劑而抑制交聯反應即可,所述折射率控制劑可使由於熱而交聯之網狀結構變為比中心部疏鬆之狀態。於本發明中,交聯網狀結構之變化或交聯反應之抑制設為廣義上的硬化抑制,若藉由該硬化抑制而產生折射率差,則不僅容易控制折射率,而且可於位置上高精度地進行折射率控制,因此較佳的是後者之方法。可表現出此種現象之材料組成例如後所述。 In another method for producing an optical member according to the present invention, when the transparent member is a transparent resin and the transparent member can be cured by heat, the step D is included, that is, the transparent resin is heat-hardened to be thermally cured. The refractive index in the vicinity of the surface portion of the transparent resin is substantially lower than the refractive index in the central portion of the transparent resin after the heat curing. As a material of the transparent resin to be used at this time, a transparent resin which can be thermally cured to have a refractive index in the vicinity of the surface layer portion after curing which is lower than the refractive index of the central portion can be selected. The difference in refractive index can be produced by suppressing thermal hardening of the surface layer of the transparent resin (for example, a function of hardening by oxygen), or by subjecting the refractive index controlling agent to a prior exposure and impregnation to the surface layer of the transparent resin. In the former case At the time of thermal hardening of the transparent resin, the hardening in the vicinity of the surface layer portion of the transparent resin can be suppressed only by adjusting the surrounding gas atmosphere, so that the refractive index in the vicinity of the surface layer portion becomes lower than the refractive index at the center portion. In the latter case, if a crosslinking reaction agent is used to suppress the crosslinking reaction, the refractive index controlling agent can make the network structure crosslinked by heat become looser than the center portion. In the present invention, the change of the cross-linking structure or the suppression of the cross-linking reaction is set to the hardening suppression in a broad sense, and if the refractive index difference is generated by the hardening suppression, not only the refractive index is easily controlled but also the position is high. The refractive index control is performed with precision, so the latter method is preferred. The material composition which can exhibit such a phenomenon is as described later.

若藉由熱硬化產生折射率差,則即使是在於其後之步驟中得到加熱之此種構件中,亦可穩定地保持折射率差。而且,於步驟D之前產生折射率差之情形時,亦與前者相同,即使是在於加熱步驟(步驟D)之後的步驟中得到再加熱之此種構件中,亦可穩定地保持折射率差。另外,若藉由熱硬化而產生折射率差,則容易確保折射率差,因此更佳。自上述觀點考慮,若為由折射率差引起前述之交聯網狀結構變化之材料組成則更佳。 When the refractive index difference is generated by thermal hardening, even in such a member which is heated in the subsequent step, the refractive index difference can be stably maintained. Further, in the case where the refractive index difference is generated before the step D, the same as the former, even in such a member which is reheated in the step after the heating step (step D), the refractive index difference can be stably maintained. Further, when the refractive index difference is generated by thermal hardening, it is easy to ensure a difference in refractive index, which is more preferable. From the above viewpoints, it is more preferable if it is a material composition which causes a change in the aforementioned network structure by the difference in refractive index.

作為步驟D',若於步驟A或步驟A'之後包含對透明樹脂進行熱硬化之步驟即可。若進行熱硬化,則可藉由熱使未反應之光硬化成分、熱硬化成分硬化,且使暴露、含浸之折射率降低劑得到某種程度地固定。步驟D'亦可為上述之步驟D。 As the step D', the step of thermally hardening the transparent resin may be included after the step A or the step A'. When the thermal curing is performed, the unreacted photohardening component and the thermosetting component can be hardened by heat, and the exposed and impregnated refractive index reducing agent can be fixed to some extent. Step D' may also be step D above.

作為本發明之透明構件中所使用之一例的透明樹脂,若為至少包含(A)具有熱聚合性官能基之基質樹脂、(B)熱聚合性 化合物的透明樹脂即可。於此情形時,作為所述折射率控制劑,例如可藉由暴露、含浸抑制(A)與(B)之交聯反應的物質而產生折射率差。特佳的是(A)於分子內具有羧基,(B)於分子內具有與該羧基熱交聯之環氧基等,折射率控制劑為抑制該羧基與環氧基之交聯反應的物質。更具體而言,藉由將上述陽離子設為該羧基與羧基鹽,可抑制羧基-環氧基間之交聯反應。藉由抑制該交聯反應,所暴露、含浸之表層部位成為(A)、與(B)之交聯體之2成分系,未受到交聯反應之抑制的中心部成為(A)與(B)交聯而成之1成分系。該些成分系之數目的不同對材料密度造成影響,一般存在成分系之數目越增多則密度越降低之傾向。因此,中心部之折射率變高,表層之折射率變低。另外,一般情況下若含有陽離子等離子,則存在極化變大,折射率上升(折射率與材料密度及極化大體存在線性之關係)之傾向,若設為上述交聯密度支配性地有助於折射率的樹脂組成,則即使含有陽離子等離子,亦可使折射率降低。該效果於使用1價陽離子作為陽離子時變顯著。 The transparent resin used as an example of the transparent member of the present invention contains at least (A) a matrix resin having a thermally polymerizable functional group, and (B) a thermal polymerizable property. The transparent resin of the compound can be used. In this case, as the refractive index controlling agent, for example, a refractive index difference can be produced by exposure or impregnation of a substance which inhibits the crosslinking reaction of (A) and (B). Particularly preferred is (A) a carboxyl group in the molecule, (B) an epoxy group which is thermally crosslinked with the carboxyl group in the molecule, and a refractive index controlling agent which is a substance which inhibits crosslinking reaction between the carboxyl group and the epoxy group. . More specifically, by using the above cation as the carboxyl group and the carboxyl group salt, the crosslinking reaction between the carboxyl group and the epoxy group can be suppressed. By suppressing the crosslinking reaction, the exposed and impregnated surface layer portion becomes a two-component system of the crosslinked body of (A) and (B), and the center portion which is not inhibited by the crosslinking reaction becomes (A) and (B). ) Cross-linked into one component. The difference in the number of these component systems affects the material density, and generally the tendency to decrease the density of the component system increases. Therefore, the refractive index of the center portion becomes high, and the refractive index of the surface layer becomes low. Further, in general, when a cation plasma is contained, the polarization tends to increase, and the refractive index rises (the relationship between the refractive index and the material density and the polarization generally has a linear relationship), and the above-mentioned crosslinking density is dominantly helpful. The resin composition having a refractive index lowers the refractive index even if it contains a cationic plasma. This effect becomes remarkable when a monovalent cation is used as a cation.

而且,於藉由步驟D,且藉由熱硬化產生折射率差之情形時,若為熱硬化後之折射率(相當於中心部之折射率)比曝光後(熱硬化前)之折射率高0.003以上之樹脂、更佳的是高0.005以上之樹脂、進一步更佳的是高0.008以上之樹脂,則由於熱所產生之硬化阻礙對折射率所造成之影響變大,因此較佳。 Further, when the refractive index difference is generated by thermal hardening by the step D, the refractive index after the thermosetting (corresponding to the refractive index of the central portion) is higher than that after the exposure (before the thermal curing) More preferably, the resin of 0.003 or more, more preferably a resin having a height of 0.005 or more, and still more preferably a resin having a height of 0.008 or more, is preferable because the hardening by heat is inhibited from affecting the refractive index.

其次,對作為所述光學構件之具體例而言較佳之光波導 加以詳述。 Next, an optical waveguide which is preferable as a specific example of the optical member To be detailed.

將本發明之光波導示於圖1(a)及圖1(b)中。圖1(a)是示意性表示光波導之剖面圖的圖,圖1(b)是對光波導上所形成之芯部之一剖面(以虛線所圍之部分)進行放大攝影之相片。本發明之光波導是如圖1(a)及圖1(b)所示那樣包含於基板1上所形成之下部包覆層2、芯圖案3、上部包覆層6之光波導,芯圖案3之周圍中的2邊以上(亦即作為芯圖案之剖面形狀的四邊形之4邊中的2邊以上)具有折射率低於芯圖案之中心部4之低折射率部位5,於低折射率部位5之外側具有折射率進一步低的下部包覆層2或/及上部包覆層6。 The optical waveguide of the present invention is shown in Fig. 1 (a) and Fig. 1 (b). Fig. 1(a) is a view schematically showing a cross-sectional view of an optical waveguide, and Fig. 1(b) is a photograph showing a cross-sectional view (a portion surrounded by a broken line) of a core portion formed on the optical waveguide. The optical waveguide of the present invention is an optical waveguide including a lower cladding layer 2, a core pattern 3, and an upper cladding layer 6 which are formed on the substrate 1 as shown in Figs. 1(a) and 1(b), and a core pattern. Two or more of the circumferences of 3 (i.e., two or more of the four sides of the quadrilateral as the cross-sectional shape of the core pattern) have a low refractive index portion 5 having a refractive index lower than the central portion 4 of the core pattern, at a low refractive index The outer side of the portion 5 has a lower cladding layer 2 or/and an upper cladding layer 6 having a further lower refractive index.

於本發明中,所謂芯圖案3之周圍是指芯圖案3「內」之周邊部位。藉由使至少2邊以上之周圍具有折射率低於芯圖案中心部4之低折射率部位5,傳播過芯圖案之光變得容易傳播過芯圖案中心部4,可減低光損耗。另外,藉由於低折射率部位5之外側配置折射率更低的下部包覆層2或上部包覆層6,可將傳播過芯圖案3之光中的本應漏出至低折射率部位5之外側的成分有效率地限制於芯圖案3內。若為此種光波導,則例如傳播過直線狀之芯圖案3的光容易傳播過芯圖案中心部4而光損耗低,由於芯圖案3之彎曲等而本應漏出至芯圖案3之外側的光,於折射率差更大之下部包覆層2或上部包覆層6與芯圖案3之界面被全反射,因此變得難以產生光損耗。 In the present invention, the periphery of the core pattern 3 means a peripheral portion of the "inner" of the core pattern 3. By having at least two sides or more having a lower refractive index portion 5 having a lower refractive index than the central portion 4 of the core pattern, light propagating through the core pattern is easily propagated through the core pattern center portion 4, and optical loss can be reduced. In addition, by disposing the lower cladding layer 2 or the upper cladding layer 6 having a lower refractive index on the outer side of the low refractive index portion 5, the light propagating through the core pattern 3 should be leaked to the low refractive index portion 5 The outer components are efficiently confined within the core pattern 3. In the case of such an optical waveguide, for example, light that has propagated through the linear core pattern 3 easily propagates through the core pattern center portion 4, and light loss is low, and the core pattern 3 should be leaked to the outside of the core pattern 3 due to bending or the like. The light is totally reflected at the interface between the cladding layer 2 or the upper cladding layer 6 and the core pattern 3 at a lower refractive index difference, and thus it becomes difficult to generate light loss.

根據上述可知,所謂2邊較佳的是芯圖案3之兩個側 壁,若為3邊以上,則於3邊以上進行上述效果,因此可實現更低光損耗化因而更佳。 According to the above, it is preferable that the two sides are the two sides of the core pattern 3 When the wall is three or more, the above effects are performed on three or more sides, so that lower light loss can be achieved, which is more preferable.

另外,若相較於芯圖案中心部4與芯圖案之周圍之低折射率部位5的藉由以下之式所表示之折射率差,低折射率部位5與下部包覆層2或/及上部包覆層6之折射率差更大,則可將本應自低折射率部位5漏出之光成分更有效率地限制於芯圖案3內,因此較佳。 Further, the low refractive index portion 5 and the lower cladding layer 2 and/or the upper portion are compared with the refractive index difference represented by the following formula in the low refractive index portion 5 around the central portion 4 of the core pattern and the core pattern. When the difference in refractive index of the coating layer 6 is larger, the light component which should be leaked from the low refractive index portion 5 can be more effectively confined in the core pattern 3, which is preferable.

[式1](折射率差)=(n1 2-n2 2)1/2/(2×n1 2) [Formula 1] (refractive index difference) = (n 1 2 - n 2 2 ) 1/2 / (2 × n 1 2 )

此處,n1及n2分別為高折射率部位之折射率及低折射率部位之折射率。 Here, n 1 and n 2 are the refractive index of the high refractive index portion and the refractive index of the low refractive index portion, respectively.

作為用以獲得上述光波導之芯圖案的形成方法,並無特別限定,可藉由上述本發明之光學構件及光學構件的製造方法而形成。特別是若使溶液為與蝕刻液相同之液體,則可於藉由蝕刻形成芯圖案同時,形成上述之實質上具有折射率差之芯圖案。 The method for forming the core pattern of the optical waveguide is not particularly limited, and can be formed by the above-described optical member and optical member manufacturing method of the present invention. In particular, if the solution is made of the same liquid as the etching liquid, the core pattern having substantially the refractive index difference described above can be formed while forming the core pattern by etching.

該形成中所使用之芯圖案形成用透明構件是於形成芯圖案時,2邊以上之周圍表層可實質性形成折射率低於所述芯圖案之中心的低折射率部位者,例如可列舉前述之至少包含(A)具有熱聚合性官能基之基質樹脂、(B)熱聚合性化合物的透明樹脂之乾膜等。 When the core pattern is formed by the transparent member for forming a core pattern used in the formation, the peripheral surface layer of two or more sides can substantially form a low refractive index portion having a refractive index lower than the center of the core pattern, and for example, the above-mentioned At least (A) a matrix resin having a thermopolymerizable functional group, (B) a dry film of a transparent polymer of a thermally polymerizable compound, or the like.

圖1(a)及圖1(b)是表示本發明之代表性光波導之例子的圖,但本發明之光波導並不僅僅限定於圖1(a)及圖1(b)中所示之膜形狀之例子。例如,亦可適用於通常之光纖狀之包含芯部及包覆部之光波導中,可設為於形成所述芯部之芯圖案中,所述芯圖案之至少周圍之一部分包含具有比所述芯圖案之中心部低的折射率的表層部位的光波導。而且,於圖1(a)及圖1(b)所示之光波導中,亦可設為不具下部包覆層2之膜狀光波導。於此情形時,基板1兼作為下部包覆層,基板1不僅僅可使用矽基板、玻璃基板或玻璃環氧樹脂基板等硬基板,亦可使用膜基材。 1(a) and 1(b) are diagrams showing an example of a representative optical waveguide of the present invention, but the optical waveguide of the present invention is not limited to only shown in Figs. 1(a) and 1(b). An example of the shape of the film. For example, it can also be applied to a general optical fiber-shaped optical waveguide including a core portion and a cladding portion, and can be set in a core pattern forming the core portion, and at least one portion of the core pattern includes a ratio An optical waveguide of a surface portion having a low refractive index at a central portion of the core pattern. Further, in the optical waveguide shown in FIGS. 1(a) and 1(b), a film-shaped optical waveguide having no lower cladding layer 2 may be used. In this case, the substrate 1 also serves as a lower cladding layer, and the substrate 1 can use not only a hard substrate such as a ruthenium substrate, a glass substrate or a glass epoxy substrate, but also a film substrate.

本發明之光波導可用作與光纖或發光元件或光接收元件進行光學結合之光模組。 The optical waveguide of the present invention can be used as an optical module optically coupled to an optical fiber or a light-emitting element or a light-receiving element.

以下,對本發明中所使用之各構件及材料加以詳細說明。 Hereinafter, each member and material used in the present invention will be described in detail.

[透明構件] [transparent member]

作為本發明中所使用之透明構件之種類,若為透明構件之表層部位附近之折射率可實質性降低之材料,且相對於所使用之光之波長而言於不造成不良影響之範圍內具有透明性即可,若為石英、玻璃、樹脂等即可。自折射率之調變、控制之容易性之觀點考慮,較佳的是透明樹脂。而且,透明構件之中心部之折射率若為構件其自身之折射率,則容易保持折射率之穩定性、透過性,因此較佳。 The type of the transparent member used in the present invention is a material which is substantially reduced in refractive index in the vicinity of the surface layer portion of the transparent member, and has a range which does not adversely affect the wavelength of light used. The transparency is sufficient, and it may be quartz, glass, resin, or the like. From the viewpoint of the modulation of the refractive index and the easiness of control, a transparent resin is preferred. Further, since the refractive index of the central portion of the transparent member is the refractive index of the member itself, it is easy to maintain the stability and permeability of the refractive index, which is preferable.

[透明樹脂] [Transparent resin]

本發明中所使用之透明樹脂若為具有上述透明構件之性能的透明樹脂則並無限制。作為本發明之透明構件中所使用之一例的透明樹脂,若為至少含有(A)具有熱聚合性官能基之基質樹脂、(B)熱聚合性化合物的透明樹脂即可。藉由暴露、含浸、含有抑制(A)與(B)之交聯反應的物質,可產生折射率差。特別是若(A)於分子內具有羧基,(B)於分子內具有與該羧基熱交聯之環氧基等,則可抑制羧基與環氧基之交聯反應,具體而言藉由將上述陽離子設為該羧基與羧酸鹽,可抑制羧基-環氧基間之交聯反應,因此較佳。藉由抑制該交聯反應,所暴露、含浸、含有之表層部位成為(A)、與(B)之交聯體之2成分系,未受到交聯反應之抑制的中心部成為(A)與(B)交聯而成之1成分系。該些成分系之數目的不同對材料密度造成影響,一般存在成分系之數目越增多則密度越降低之傾向。因此,中心部之折射率變高,表層之折射率變低。另外,一般情況下若含有陽離子等離子,則存在極化變大,折射率上升(折射率與材料密度及極化大體存在線性之關係)之傾向,若設為上述交聯密度支配性地有助於折射率的樹脂組成,則即使含有陽離子等離子,亦可使折射率降低。如上所述對本發明之一例的產生透明樹脂之折射率差的機構加以詳細說明,其中重要的方面是產生折射率差,且表層部位附近之折射率變得小於中心部之折射率。 The transparent resin used in the present invention is not limited as long as it is a transparent resin having the properties of the above transparent member. The transparent resin which is an example of the transparent member of the present invention may be a transparent resin containing at least (A) a matrix resin having a thermopolymerizable functional group and (B) a thermally polymerizable compound. The refractive index difference can be produced by exposure, impregnation, and a substance containing a crosslinking reaction that inhibits (A) and (B). In particular, when (A) has a carboxyl group in the molecule and (B) has an epoxy group or the like which is thermally crosslinked with the carboxyl group in the molecule, the crosslinking reaction between the carboxyl group and the epoxy group can be suppressed, specifically The cation is preferably a carboxyl group and a carboxylate, and is capable of inhibiting a crosslinking reaction between a carboxyl group and an epoxy group. By suppressing the crosslinking reaction, the exposed, impregnated, and contained surface layer portion is a two-component system of the crosslinked body of (A) and (B), and the center portion which is not inhibited by the crosslinking reaction is (A) and (B) One component system which is crosslinked. The difference in the number of these component systems affects the material density, and generally the tendency to decrease the density of the component system increases. Therefore, the refractive index of the center portion becomes high, and the refractive index of the surface layer becomes low. Further, in general, when a cation plasma is contained, the polarization tends to increase, and the refractive index rises (the relationship between the refractive index and the material density and the polarization generally has a linear relationship), and the above-mentioned crosslinking density is dominantly helpful. The resin composition having a refractive index lowers the refractive index even if it contains a cationic plasma. The mechanism for producing a refractive index difference of a transparent resin according to an example of the present invention will be described in detail as described above, and an important aspect is that a refractive index difference is generated, and the refractive index in the vicinity of the surface layer portion becomes smaller than the refractive index of the central portion.

而且,上述透明樹脂中若含有(C)光聚合性化合物,且進一步含有(D)光聚合起始劑則較佳。藉由含有(C)或(D), 可藉由步驟C之曝光而進行光硬化,且可賦予對於溶液或蝕刻液之耐受性。另外,藉由經過步驟B之蝕刻步驟,變得容易加工為任意之形狀。另外,於包含(C)且(C)並不與(A)或(B)交聯之情形時,上述之成分系的數目於表層部位附近成為3成分系,中心部成為2成分系,可與上述同樣地產生折射率差。 Further, it is preferable that the transparent resin contains (C) a photopolymerizable compound and further contains (D) a photopolymerization initiator. By containing (C) or (D), Photohardening can be carried out by exposure of step C, and can impart resistance to a solution or an etchant. Further, it is easy to process into an arbitrary shape by the etching step of the step B. Further, when (C) is contained and (C) is not crosslinked with (A) or (B), the number of the above-mentioned component systems is a three-component system in the vicinity of the surface layer portion, and the center portion is a two-component system. The refractive index difference is generated in the same manner as described above.

以下,對所述(A)~(D)之化合物加以詳細說明。 Hereinafter, the compounds (A) to (D) will be described in detail.

作為(A)成分,例如可列舉具有熱聚合性官能基之基質樹脂(聚合物),較佳例可列舉含羧基之聚合物。該聚合物並無特別限制,例如可列舉下述(1)~(6)所表示之聚合物等。 The (A) component is, for example, a matrix resin (polymer) having a thermopolymerizable functional group, and a carboxyl group-containing polymer is preferred. The polymer is not particularly limited, and examples thereof include the polymers represented by the following (1) to (6).

(1)使於分子中具有羧基與乙烯性不飽和基之化合物與除此以外之具有乙烯性不飽和基之化合物共聚而所得之含有羧基之鹼可溶性聚合物。 (1) A carboxyl-containing alkali-soluble polymer obtained by copolymerizing a compound having a carboxyl group and an ethylenically unsaturated group in a molecule with a compound having an ethylenically unsaturated group.

(2)於分子中具有羧基與乙烯性不飽和基之化合物與除此以外之具有乙烯性不飽和基之化合物的共聚物之側鏈中部分性導入乙烯性不飽和基而所得之含有羧基之鹼可溶性聚合物。 (2) a carboxyl group-containing group obtained by partially introducing an ethylenically unsaturated group into a side chain of a copolymer having a carboxyl group and an ethylenically unsaturated group in a molecule and a compound having an ethylenically unsaturated group Alkali soluble polymer.

(3)使於分子中具有環氧基與乙烯性不飽和基之化合物與除此以外之具有乙烯性不飽和基之化合物之共聚物,與於分子中具有羧基與乙烯性不飽和基之化合物反應,並使所生成之羥基與多元酸酐反應而所得之含有羧基之鹼可溶性聚合物。 (3) a copolymer having a compound having an epoxy group and an ethylenically unsaturated group in the molecule and a compound having an ethylenically unsaturated group, and a compound having a carboxyl group and an ethylenically unsaturated group in the molecule The reaction is carried out, and the resulting hydroxyl group is reacted with a polybasic acid anhydride to obtain a carboxyl group-containing alkali-soluble polymer.

(4)使具有乙烯性不飽和基之酸酐與除此以外之具有乙烯性不飽和基之化合物的共聚物,與於分子中具有羥基與乙烯性不飽和基之化合物反應而所得之含有羧基之鹼可溶性聚合物。 (4) a copolymer obtained by reacting an acid anhydride having an ethylenically unsaturated group with a compound having an ethylenically unsaturated group, and a compound having a hydroxyl group and an ethylenically unsaturated group in the molecule, and having a carboxyl group Alkali soluble polymer.

(5)使2官能環氧樹脂與二羧酸或2官能酚化合物之加成聚合物,與多元酸酐反應而所得之含有羧基之鹼可溶性聚合物。 (5) An alkali-soluble polymer containing a carboxyl group obtained by reacting a bifunctional epoxy resin with an addition polymer of a dicarboxylic acid or a bifunctional phenol compound with a polybasic acid anhydride.

(6)使2官能環氧丙烷化合物與二羧酸或2官能酚化合物之加成聚合物之羥基,與多元酸酐反應而所得之含有羧基之鹼可溶性聚合物。 (6) An alkali-soluble polymer containing a carboxyl group obtained by reacting a hydroxyl group of a difunctional propylene oxide compound with an addition polymer of a dicarboxylic acid or a bifunctional phenol compound with a polybasic acid anhydride.

自透明性、蝕刻液中使用鹼溶液之情形時的於鹼溶液中之溶解性之觀點考慮,該些中較佳的是上述(1)~(4)所表示之含有羧基之鹼可溶性聚合物。另外,所述聚合物較佳的是具有(甲基)丙烯醯基之(甲基)丙烯酸聚合物。此處,所謂(甲基)丙烯醯基是指丙烯醯基及/或甲基丙烯醯基,所謂(甲基)丙烯酸聚合物是指以丙烯酸、丙烯酸酯、甲基丙烯酸、甲基丙烯酸酯、及該些之衍生物為單體,將其聚合而成之聚合物。該(甲基)丙烯酸聚合物可為上述單體之均聚物,而且亦可為使該些單體之2種以上聚合而成之共聚物。另外,亦可為於不阻礙本發明之效果之範圍內,包含上述單體、視需要之具有(甲基)丙烯醯基以外之乙烯性不飽和基的上述以外之單體的共聚物。而且,亦可為多種(甲基)丙烯酸聚合物之混合物。 From the viewpoints of the solubility in the alkali solution in the case where the alkali solution is used in the etching solution, the alkali-soluble polymer having a carboxyl group represented by the above (1) to (4) is preferred. . Further, the polymer is preferably a (meth)acrylic acid polymer having a (meth)acrylonitrile group. Here, the (meth)acryl fluorenyl group means an acryl fluorenyl group and/or a methacryl fluorenyl group, and the so-called (meth)acrylic acid polymer means acrylic acid, acrylate, methacrylic acid, methacrylic acid ester, And the derivatives are monomers which are polymerized by polymerization. The (meth)acrylic polymer may be a homopolymer of the above monomers, or may be a copolymer obtained by polymerizing two or more of these monomers. In addition, a copolymer of the above monomer other than the above-mentioned monomer and, if necessary, an ethylenically unsaturated group other than the (meth) acrylonitrile group may be contained in the range which does not inhibit the effect of this invention. Further, it may be a mixture of a plurality of (meth)acrylic polymers.

(A)成分之聚合物之重量平均分子量較佳的是1,000~3,000,000。若為1,000以上則分子量大,因此製成樹脂組成物之情形時的硬化物之強度充分;若為3,000,000以下,則相對於包含鹼溶液之蝕刻液的溶解性或與(B)聚合性化合物之相容性良好。 The weight average molecular weight of the polymer of the component (A) is preferably from 1,000 to 3,000,000. When it is 1,000 or more, the molecular weight is large, so that the strength of the cured product when the resin composition is formed is sufficient; when it is 3,000,000 or less, the solubility with respect to the etching solution containing the alkali solution or (B) the polymerizable compound Good compatibility.

自以上觀點考慮,(A)成分之重量平均分子量更佳的是 3,000~2,000,000,特佳的是5,000~1,000,000。 From the above point of view, the weight average molecular weight of the component (A) is better. 3,000~2,000,000, especially 5,000~1,000,000.

另外,本發明中之重量平均分子量是藉由凝膠滲透層析法(Gel Permeation Chromatography,GPC)而測定,並進行標準聚苯乙烯換算之值。 Further, the weight average molecular weight in the present invention is measured by gel permeation chromatography (GPC) and is converted to a value in terms of standard polystyrene.

於使用含有羧基之鹼可溶性聚合物作為(A)成分之情形時,於藉由蝕刻形成圖案之步驟中,能以可藉由鹼溶液進行蝕刻之方式規定酸值。例如於使用後述之鹼溶液之情形時,酸值較佳的是20mgKOH/g~300mgKOH/g。 In the case where an alkali-soluble polymer having a carboxyl group is used as the component (A), the acid value can be specified by etching in an alkali solution in the step of patterning by etching. For example, in the case of using an alkali solution described later, the acid value is preferably from 20 mgKOH/g to 300 mgKOH/g.

若為20mgKOH/g以上,則容易蝕刻,若為300mgKOH/g以下,則耐蝕刻液性並不降低。自以上觀點考慮,酸值更佳的是30mgKOH/g~250mgKOH/g,特佳的是40mgKOH/g~200mgKOH/g。 When it is 20 mgKOH/g or more, it is easy to etch, and if it is 300 mgKOH/g or less, the etching liquid resistance does not fall. From the above viewpoints, the acid value is more preferably from 30 mgKOH/g to 250 mgKOH/g, particularly preferably from 40 mgKOH/g to 200 mgKOH/g.

另外,所謂耐蝕刻液性是指並不藉由蝕刻除去而成為圖案之部分不會被蝕刻液侵蝕之性質。 In addition, the etching resistance is a property in which a portion which is not patterned by etching and is not eroded by an etching liquid.

而且,於使用包含鹼性水溶液與1種以上有機溶劑之鹼性半水系蝕刻液作為鹼溶液之情形時,酸值較佳的是10mgKOH/g~260mgKOH/g。酸值若為10mgKOH/g以上,則顯影容易,若為260mgKOH/g以下,則耐蝕刻液性(並不藉由蝕刻除去而成為圖案之部分不會被蝕刻液侵蝕之性質)並不降低。自以上觀點考慮,酸值更佳的是20mgKOH/g~250mgKOH/g,特佳的是30mgKOH/g~200mgKOH/g。 Further, when an alkaline semi-aqueous etching solution containing an alkaline aqueous solution and one or more organic solvents is used as the alkali solution, the acid value is preferably from 10 mgKOH/g to 260 mgKOH/g. When the acid value is 10 mgKOH/g or more, the development is easy. When the acid value is 260 mgKOH/g or less, the etching liquid resistance (the property in which the pattern is not etched by the etching liquid without being removed by etching) does not decrease. From the above viewpoints, the acid value is more preferably from 20 mgKOH/g to 250 mgKOH/g, particularly preferably from 30 mgKOH/g to 200 mgKOH/g.

(A)成分之調配量較佳的是相對於(A)成分及(B) 成分之總量而言為10質量%~85質量%。若為10質量%以上,則透明樹脂之硬化物之強度或可撓性充分,若為85質量%以下,則於曝光時由於(B)成分繞入而容易地硬化,耐蝕刻液性不會不足。自以上觀點考慮,(A)成分之調配量更佳的是20質量%~80質量%,特佳的是25質量%~75質量%。 The blending amount of the component (A) is preferably relative to the component (A) and (B) The total amount of the components is 10% by mass to 85% by mass. When the content is 10% by mass or more, the strength and flexibility of the cured product of the transparent resin are sufficient. When the content is 85% by mass or less, the component (B) is easily cured during the exposure, and the etching resistance is not improved. insufficient. From the above viewpoints, the blending amount of the component (A) is more preferably 20% by mass to 80% by mass, particularly preferably 25% by mass to 75% by mass.

作為(B)成分之熱聚合性化合物,若為可藉由熱而交聯之化合物即可,例如可適宜列舉具有環氧基等熱聚合性取代基之化合物等。 The thermally polymerizable compound of the component (B) may be a compound which can be crosslinked by heat, and examples thereof include a compound having a thermally polymerizable substituent such as an epoxy group.

具體而言可列舉:2官能酚縮水甘油醚型環氧樹脂;氫化2官能酚縮水甘油醚型環氧樹脂;3官能以上之多官能酚縮水甘油醚型環氧樹脂;2官能脂肪族醇縮水甘油醚型環氧樹脂;2官能脂環式醇縮水甘油醚型環氧樹脂;3官能以上之多官能脂肪族醇縮水甘油醚型環氧樹脂;2官能芳香族縮水甘油酯;2官能脂環式縮水甘油酯;2官能芳香族縮水甘油胺;3官能以上之多官能芳香族縮水甘油胺;2官能脂環式環氧樹脂;3官能以上之多官能脂環式環氧樹脂;3官能以上之多官能雜環式環氧樹脂;含有矽之2官能或3官能以上之多官能環氧樹脂等。 Specific examples thereof include a bifunctional phenol glycidyl ether type epoxy resin; a hydrogenated bifunctional phenol glycidyl ether type epoxy resin; a trifunctional or higher polyfunctional phenol glycidyl ether type epoxy resin; and a bifunctional aliphatic alcohol shrinkage Glycidyl ether type epoxy resin; 2-functional alicyclic alcohol glycidyl ether type epoxy resin; polyfunctional aliphatic alcohol glycidyl ether type epoxy resin having 3 or more functions; 2 functional aromatic glycidyl ester; 2 functional alicyclic ring Glycidyl ester; bifunctional aromatic glycidylamine; polyfunctional aromatic glycidylamine having more than 3 functional groups; 2-functional alicyclic epoxy resin; polyfunctional alicyclic epoxy resin having 3 or more functional groups; A polyfunctional heterocyclic epoxy resin; a bifunctional or trifunctional or higher polyfunctional epoxy resin containing fluorene.

以上化合物可單獨使用或者將2種以上組合使用,亦可進一步與其他聚合性化合物組合使用。 These compounds may be used singly or in combination of two or more kinds thereof, or may be further used in combination with other polymerizable compounds.

作為(C)成分之光聚合性化合物,若為可藉由光而交聯之化合物即可,例如可適宜列舉具有乙烯性不飽和基等光聚合性取代基之化合物等。 The photopolymerizable compound as the component (C) may be a compound which can be crosslinked by light, and examples thereof include a compound having a photopolymerizable substituent such as an ethylenically unsaturated group.

具體而言可列舉(甲基)丙烯酸酯、偏二鹵乙烯、乙烯醚、乙烯酯、乙烯基吡啶、乙烯基醯胺、芳基化乙烯基等,自透明性之觀點考慮,該些中較佳的是(甲基)丙烯酸酯或芳基化乙烯基。作為(甲基)丙烯酸酯,亦可使用單官能者、2官能者或多官能者之任一者。 Specific examples thereof include (meth) acrylate, vinylidene halide, vinyl ether, vinyl ester, vinyl pyridine, vinyl decylamine, aryl vinyl, and the like, and from the viewpoint of transparency, Preferred are (meth) acrylate or arylated vinyl. As the (meth) acrylate, any of a monofunctional group, a bifunctional group, or a polyfunctional group can also be used.

作為單官能(甲基)丙烯酸酯,並無特別限制,例如可列舉各種(甲基)丙烯酸烷基酯、各種(甲基)丙烯酸羥基烷基酯等脂肪族(甲基)丙烯酸酯;脂環式(甲基)丙烯酸酯;芳香族(甲基)丙烯酸酯;雜環式(甲基)丙烯酸酯;該些之乙氧基化物;該些之丙氧基化物;該些之乙氧基化丙氧基化物;該些之己內酯改性物等。 The monofunctional (meth) acrylate is not particularly limited, and examples thereof include various (meth)acrylic acid alkyl esters and various aliphatic (meth) acrylates such as hydroxyalkyl (meth) acrylates; and alicyclic rings; a (meth) acrylate; an aromatic (meth) acrylate; a heterocyclic (meth) acrylate; ethoxylates thereof; the propoxylates; ethoxylated Propoxylates; such caprolactone modifiers and the like.

作為2官能(甲基)丙烯酸酯,並無特別限制,例如可列舉乙二醇二(甲基)丙烯酸酯等各種脂肪族二(甲基)丙烯酸酯;環己烷二甲醇二(甲基)丙烯酸酯等各種脂環式二(甲基)丙烯酸酯;雙酚A二(甲基)丙烯酸酯等各種芳香族(甲基)丙烯酸酯;異三聚氰酸二(甲基)丙烯酸酯等各種雜環式二(甲基)丙烯酸酯;該些之乙氧基化物;該些之丙氧基化物;該些之乙氧基化丙氧基化物;該些之己內酯改性物;新戊二醇型環氧二(甲基)丙烯酸酯等各種脂肪族環氧二(甲基)丙烯酸酯;氫化雙酚A型環氧(甲基)丙烯酸酯等各種脂環式環氧二(甲基)丙烯酸酯;雙酚A型環氧二(甲基)丙烯酸酯等各種芳香族環氧二(甲基)丙烯酸酯等。 The bifunctional (meth) acrylate is not particularly limited, and examples thereof include various aliphatic di(meth)acrylates such as ethylene glycol di(meth)acrylate; and cyclohexane dimethanol di(methyl). Various alicyclic di(meth)acrylates such as acrylate; various aromatic (meth)acrylates such as bisphenol A di(meth)acrylate; and various (meth)acrylates of isocyanuric acid Heterocyclic di(meth)acrylates; ethoxylates thereof; such propoxylates; ethoxylated propoxylates; caprolactone modifications; Various aliphatic epoxy di(meth)acrylates such as pentanediol type epoxy di(meth)acrylate; hydrogenated bisphenol A type epoxy (meth)acrylate and various alicyclic epoxy di(A) Base) acrylate; various aromatic epoxy di(meth)acrylates such as bisphenol A type epoxy di(meth)acrylate.

作為3官能以上之多官能(甲基)丙烯酸酯,並無特別限制,例如可列舉三羥甲基丙烷三(甲基)丙烯酸酯等各種脂肪族(甲 基)丙烯酸酯;異三聚氰酸三(甲基)丙烯酸酯等各種雜環式(甲基)丙烯酸酯;該些之乙氧基化物;該些之丙氧基化物;該些之乙氧基化丙氧基化物;該些之己內酯改性物;酚系酚醛清漆型環氧(甲基)丙烯酸酯、甲酚酚醛清漆型環氧(甲基)丙烯酸酯等各種芳香族環氧(甲基)丙烯酸酯等。 The trifunctional or higher polyfunctional (meth) acrylate is not particularly limited, and examples thereof include various aliphatics such as trimethylolpropane tri(meth)acrylate. Any of various heterocyclic (meth) acrylates such as tris (meth) acrylate such as isomeric isocyanate; ethoxylates thereof; and propoxylates thereof; a propoxylate; a caprolactone modified product; a phenolic novolac type epoxy (meth) acrylate, a cresol novolak type epoxy (meth) acrylate, and the like, various aromatic epoxy resins (Meth) acrylate, etc.

上述單官能(甲基)丙烯酸酯、2官能(甲基)丙烯酸酯、3官能以上之多官能(甲基)丙烯酸酯可分別單獨使用或者將2種以上組合使用。而且,亦可將官能基數不同之(甲基)丙烯酸酯組合使用。另外,亦可與其他聚合性化合物組合使用。 The monofunctional (meth) acrylate, the bifunctional (meth) acrylate, and the trifunctional or higher polyfunctional (meth) acrylate may be used alone or in combination of two or more. Further, a (meth) acrylate having a different number of functional groups may be used in combination. Further, it can also be used in combination with other polymerizable compounds.

作為(D)成分之光聚合起始劑,使用光自由基聚合起始劑或光陽離子聚合起始劑等,為了產生由於阻礙熱硬化所造成之折射率差,若減少步驟B中之光硬化所造成之交聯數,或抑制由於光硬化所造成之折射率之上升即可。藉此,透明樹脂之折射率上升行程成為熱硬化步驟,容易受到對於如上所述之交聯阻礙之折射率所產生之影響,從而容易使透明樹脂之表層部位附近之折射率降低。自上述觀點考慮,與光陽離子硬化劑相比而言,較佳的是使用光自由基硬化劑。具體而言可列舉安息香縮酮(benzoin ketal);α-羥基酮;乙醛酸酯;α-胺基酮;膦氧化物;2,4,5-三芳基咪唑二聚體;二苯甲酮化合物;醌化合物;安息香化合物;苄基化合物;吖啶化合物;N-苯甘胺酸、香豆素等。 As the photopolymerization initiator of the component (D), a photoradical polymerization initiator or a photocationic polymerization initiator or the like is used, in order to reduce the refractive index difference caused by the inhibition of thermal hardening, if the photohardening in the step B is reduced The number of crosslinks caused, or the increase in the refractive index due to photohardening. Thereby, the refractive index rising stroke of the transparent resin becomes a thermal curing step, and is easily affected by the refractive index which is inhibited by the crosslinking as described above, and the refractive index in the vicinity of the surface layer portion of the transparent resin is easily lowered. From the above viewpoints, it is preferred to use a photoradical hardener as compared with the photocationic hardener. Specific examples thereof include benzoin ketal; α-hydroxyketone; glyoxylate; α-amino ketone; phosphine oxide; 2,4,5-triarylimidazole dimer; benzophenone a compound; an anthraquinone compound; a benzoin compound; a benzyl compound; an acridine compound; N-phenylglycine, coumarin, and the like.

而且,於所述2,4,5-三芳基咪唑二聚體中,2個三芳基咪唑部位之芳基之取代基可相同而提供對稱之化合物,亦可不同 而提供不對稱之化合物。 Moreover, in the 2,4,5-triarylimidazole dimer, the substituents of the aryl groups of the two triarylimidazole sites may be the same to provide a symmetric compound, or may be different An asymmetric compound is provided.

自硬化性、透明性、及耐熱性之觀點考慮,該些中較佳的是上述α-羥基酮;上述乙醛酸酯;上述膦氧化物。 From the viewpoints of self-hardening property, transparency, and heat resistance, preferred are the above-mentioned α-hydroxyketones; the above-mentioned glyoxylic acid esters; and the above-mentioned phosphine oxides.

以上光自由基聚合起始劑可單獨使用或者將2種以上組合使用。另外,亦可與適宜之增感劑組合使用。 The above photoradical polymerization initiators may be used singly or in combination of two or more. Alternatively, it may be used in combination with a suitable sensitizer.

本發明中所使用之(B)成分、(C)成分若為於一個分子內一併含有光聚合性之乙烯性不飽和基及熱聚合性之環氧基的混在型化合物則更佳。於本發明中,於此情形時,可視為於1種成分中一併含有(B)成分及(C)成分。 The component (B) and the component (C) used in the present invention are more preferably a mixed compound containing a photopolymerizable ethylenically unsaturated group and a thermally polymerizable epoxy group in one molecule. In the present invention, in this case, it is considered that the component (B) and the component (C) are contained in one component.

藉由含有混在型化合物,即使含有(A)、(B)、(C)這3種成分,作為如上所述之熱硬化後之如上所述之成分系之數目,表層部位附近成為2成分系,中心部成為1成分系,且可與上述同樣地產生折射率差。另外,乙烯性不飽和基之交聯數變少,因此作為透明樹脂之折射率,較光硬化引起之折射率上升度,熱硬化引起之折射率上升度變大。藉此,若抑制熱硬化,則變得容易產生折射率差。 By containing the compound of the type, even if the three components (A), (B), and (C) are contained, the number of the component systems as described above after thermal curing as described above becomes a two-component system in the vicinity of the surface layer portion. The center portion is a one-component system, and a refractive index difference can be generated in the same manner as described above. Further, since the number of crosslinks of the ethylenically unsaturated group is small, the refractive index of the transparent resin is higher than the degree of increase in refractive index due to photohardening, and the degree of increase in refractive index due to thermal hardening. Thereby, if thermal hardening is suppressed, it becomes easy to generate a refractive index difference.

作為混在型聚合性化合物,是使於分子內具有2個以上縮水甘油基之環氧樹脂與(甲基)丙烯酸化合物反應而所得之環氧(甲基)丙烯酸酯等,較佳的是相對於環氧基而言使0.1當量~0.9當量之(甲基)丙烯酸化合物反應而成者,更佳的是0.2當量~0.8當量。特佳的是0.4當量~0.6當量。 The mixed polymerizable compound is an epoxy (meth) acrylate obtained by reacting an epoxy resin having two or more glycidyl groups in a molecule with a (meth)acrylic compound, and is preferably relative to The epoxy group is reacted with 0.1 to 0.9 equivalents of a (meth)acrylic acid compound, more preferably 0.2 to 0.8 equivalents. Particularly preferred is 0.4 equivalents to 0.6 equivalents.

具體而言可列舉雙酚A型環氧(甲基)丙烯酸酯等2官能 酚縮水甘油醚;氫化雙酚A型環氧(甲基)丙烯酸酯等源自氫化2官能酚縮水甘油醚者、酚系酚醛清漆型環氧(甲基)丙烯酸酯等源自多官能酚縮水甘油醚者;聚乙二醇型環氧(甲基)丙烯酸酯等源自2官能脂肪族醇縮水甘油醚者;環己烷二甲醇型環氧(甲基)丙烯酸酯等源自2官能脂環式醇縮水甘油醚者;三羥甲基丙烷型環氧(甲基)丙烯酸酯等源自多官能脂肪族醇縮水甘油醚者;鄰苯二甲酸二縮水甘油酯等源自2官能芳香族縮水甘油酯者;四氫鄰苯二甲酸二縮水甘油酯等源自2官能脂環式縮水甘油酯之環氧(甲基)丙烯酸酯等。 Specific examples include a bisphenol A type epoxy (meth) acrylate and the like. Phenol glycidyl ether; hydrogenated bisphenol A type epoxy (meth) acrylate, etc. derived from hydrogenated bifunctional phenol glycidyl ether, phenolic novolak type epoxy (meth) acrylate, etc. derived from polyfunctional phenol shrinkage Glyceryl ether; polyethylene glycol type epoxy (meth) acrylate derived from difunctional aliphatic alcohol glycidyl ether; cyclohexane dimethanol type epoxy (meth) acrylate derived from 2 functional lipid a cyclic alcohol glycidyl ether; a trimethylolpropane type epoxy (meth) acrylate derived from a polyfunctional aliphatic alcohol glycidyl ether; a phthalic acid diglycidyl ester derived from a bifunctional aromatic An example of a glycidyl ester; an epoxy (meth) acrylate derived from a bifunctional alicyclic glycidyl ester, etc., such as tetrahydrophthalic acid diglycidyl ester.

自透明性及高折射率、耐熱性之觀點考慮,該些中較佳的是雙酚A型環氧(甲基)丙烯酸酯、雙酚F型環氧(甲基)丙烯酸酯、雙酚AF型環氧(甲基)丙烯酸酯、雙酚AD型環氧(甲基)丙烯酸酯、聯苯型環氧(甲基)丙烯酸酯、萘型環氧(甲基)丙烯酸酯、茀型環氧(甲基)丙烯酸酯、酚系酚醛清漆型環氧(甲基)丙烯酸酯、甲酚酚醛清漆型環氧(甲基)丙烯酸酯等環氧(甲基)丙烯酸酯。 Preferred from the viewpoints of transparency, high refractive index, and heat resistance, bisphenol A type epoxy (meth) acrylate, bisphenol F type epoxy (meth) acrylate, bisphenol AF Epoxy (meth) acrylate, bisphenol AD epoxy (meth) acrylate, biphenyl epoxy (meth) acrylate, naphthalene epoxy (meth) acrylate, fluorene epoxy An epoxy (meth) acrylate such as a (meth) acrylate, a phenol novolak type epoxy (meth) acrylate or a cresol novolak type epoxy (meth) acrylate.

[表層部位附近] [near the surface layer]

於本發明光學構件中,透明構件之經暴露而成之暴露部位、含浸部位、含有折射率降低劑之部位是透明構件之表層部位附近,藉由調整暴露、含浸之量或時間,或者藉由任意選擇所含有之深度,可形成折射率於任意之深度方向實質性降低之層。 In the optical member of the present invention, the exposed portion, the impregnated portion, and the portion containing the refractive index reducing agent of the transparent member are in the vicinity of the surface portion of the transparent member, by adjusting the amount of exposure, impregnation or time, or by The depth contained in any depth can be selected arbitrarily to form a layer whose refractive index is substantially reduced in any depth direction.

所述深度(表層部位附近之厚度)並無限制,若為0.01μm~5mm即可,若為0.05μm~1mm,則深度控制變得比較容易, 因此更佳,若為0.1μm~100μm,則深度控制變得更容易,因此進一步更佳。於光波導之芯圖案中使用之情形時,若進一步為0.1μm~30μm,則可實現低光損耗化,因此較佳。 The depth (the thickness in the vicinity of the surface layer portion) is not limited, and may be 0.01 μm to 5 mm, and if it is 0.05 μm to 1 mm, the depth control becomes relatively easy. Therefore, it is more preferable that if it is 0.1 μm to 100 μm, the depth control becomes easier, and therefore it is further preferable. When it is used in the core pattern of the optical waveguide, if it is further 0.1 μm to 30 μm, low light loss can be achieved, which is preferable.

於使用溶液使折射率實質性降低之情形時,暴露於溶液中之所有面於上述深度方向中折射率降低。於光波導之芯圖案之情形時,至少於兩個側面、以及上表面形成低折射率之層。 In the case where the solution is used to substantially lower the refractive index, all of the faces exposed to the solution have a lower refractive index in the above-described depth direction. In the case of the core pattern of the optical waveguide, a layer of low refractive index is formed on at least two sides and the upper surface.

[溶液] [solution]

作為本發明之光學構件的製造方法中所使用之溶液,若為於透明構件中暴露溶液後,使該透明構件之表層部位附近之折射率實質性低於透明構件之中心部之折射率之溶液即可。藉由使用溶液而使透明構件之表層部位附近之折射率實質性降低,可抑制折射率降低之位置上的不均一,即使透明構件為複雜之形狀或錯綜複雜之形狀,亦可使折射率實質性降低。 The solution used in the method for producing an optical member of the present invention is a solution in which the refractive index in the vicinity of the surface portion of the transparent member is substantially lower than the refractive index in the central portion of the transparent member after the solution is exposed in the transparent member. Just fine. By using the solution, the refractive index in the vicinity of the surface layer portion of the transparent member is substantially lowered, and the unevenness at the position where the refractive index is lowered can be suppressed, and even if the transparent member has a complicated shape or an intricate shape, the refractive index can be substantially reduce.

作為溶液之種類,可利用水、有機溶劑、鹼溶液、酸性溶液等。例如於使用如上所述地藉由溶液於透明構件之暴露部位作出密度小的部分,藉此而產生折射率差之方法之情形時,若使用可使暴露部位之至少一部分溶解之溶液即可。而且,於使用於透明構件中含有高折射率之可溶於溶液中之成分,藉由溶液使該高折射率之可溶成分溶解而產生折射率差之方法之情形時,若使用特別是可選擇性溶解高折射率之可溶成分的溶液即可。而且,於使包含折射率低於透明構件之成分的溶液暴露、含浸於該透明構件中,使低折射率成分固定於透明構件中而產生折射率差之方 法之情形時,若使用可溶解該低折射率成分、並使其滲透於透明樹脂中之溶液即可。於如後所述地使用暴露、含浸可使分子結構、分子網狀形式變化之折射率控制劑而產生折射率差之方法之情形時,若使用可溶解該折射率控制劑、並使其滲透於透明樹脂中之溶液即可。於所述溶液中,若使用以水為主成分之溶液,則避免由於透明構件之溶解或膨潤所造成之不良影響,因此可於高精度地維持透明構件之形狀或透明構件上所形成之圖案形狀的狀態下進行折射率之控制。 As the kind of the solution, water, an organic solvent, an alkali solution, an acidic solution or the like can be used. For example, in the case of using a method in which a portion having a small density is formed by a solution at a portion exposed to a transparent member as described above, thereby producing a difference in refractive index, a solution which can dissolve at least a part of the exposed portion can be used. Further, in the case where a component having a high refractive index and a solution soluble in a transparent member is used in a transparent member to dissolve a high refractive index soluble component to produce a refractive index difference, if it is used in particular, A solution which selectively dissolves a soluble component having a high refractive index may be used. Further, a solution containing a component having a refractive index lower than that of the transparent member is exposed and impregnated into the transparent member, and a low refractive index component is fixed in the transparent member to cause a refractive index difference. In the case of the method, a solution which can dissolve the low refractive index component and permeate it into the transparent resin can be used. When a method of producing a refractive index difference by exposing or impregnating a refractive index controlling agent which changes a molecular structure or a molecular network form as described later, if it is used, the refractive index controlling agent can be dissolved and infiltrated. The solution in the transparent resin can be used. When a solution containing water as a main component is used in the solution, adverse effects due to dissolution or swelling of the transparent member are avoided, so that the shape of the transparent member or the pattern formed on the transparent member can be maintained with high precision. The refractive index is controlled in the shape of the shape.

作為有機溶劑之種類,若選擇可達成如上所述之目的的有機溶劑即可,例如可列舉甲苯、二甲苯、均三甲苯、枯烯(cumene)、對異丙基甲苯(p-cymene)等芳香族烴;二乙醚、第三丁基甲基醚、環戊基甲基醚、二丁醚等鏈狀醚;四氫呋喃、1,4-二噁烷等環狀醚;甲醇、乙醇、異丙醇、丁醇、乙二醇、丙二醇等醇;丙酮、甲基乙基酮、甲基異丁基酮、環己酮、4-羥基-4-甲基-2-戊酮等酮;乙酸甲酯、乙酸乙酯、乙酸丁酯、乳酸甲酯、乳酸乙酯、γ-丁內酯等酯;碳酸乙二酯、碳酸丙二酯等碳酸酯;乙二醇單甲醚、乙二醇單乙醚、乙二醇單丁醚、乙二醇二甲醚、乙二醇二乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇二甲醚、丙二醇二乙醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單丁醚、二乙二醇二甲醚、二乙二醇二乙醚等多元醇烷基醚;乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、乙二醇單丁醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、二乙二醇單甲醚乙酸酯、 二乙二醇單乙醚乙酸酯等多元醇烷基醚乙酸酯;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮等醯胺等。 As the type of the organic solvent, an organic solvent which can achieve the above object can be selected, and examples thereof include toluene, xylene, mesitylene, cumene, p-cymene, and the like. Aromatic hydrocarbon; chain ether such as diethyl ether, tert-butyl methyl ether, cyclopentyl methyl ether, dibutyl ether; cyclic ether such as tetrahydrofuran or 1,4-dioxane; methanol, ethanol, isopropanol, An alcohol such as butanol, ethylene glycol or propylene glycol; a ketone such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone or 4-hydroxy-4-methyl-2-pentanone; methyl acetate, Ethyl acetate, butyl acetate, methyl lactate, ethyl lactate, γ-butyrolactone, etc.; carbonate such as ethylene carbonate or propylene carbonate; ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, Ethylene glycol monobutyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol monomethyl ether, diethylene glycol Polyol alkyl ethers such as monoethyl ether, diethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether; ethylene glycol monomethyl ether acetate, Glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, Polyol alkyl ether acetate such as diethylene glycol monoethyl ether acetate; N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, etc. Amines, etc.

該些有機溶劑可單獨使用或者將2種以上組合使用。 These organic solvents may be used singly or in combination of two or more.

作為鹼溶液之種類,若選擇可達成如上所述之目的之鹼溶液即可,可列舉使如下之鹼溶解而成之溶液:氫氧化鋰、氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物;碳酸鋰、碳酸鈉、碳酸鉀等鹼金屬碳酸鹽;碳酸氫鋰、碳酸氫鈉、碳酸氫鉀等鹼金屬碳酸氫鹽;磷酸鉀、磷酸鈉等鹼金屬磷酸鹽;焦磷酸鈉、焦磷酸鉀等鹼金屬焦磷酸塩;四硼酸鈉、偏矽酸鈉等鈉鹽;碳酸銨、碳酸氫銨等銨鹽;四甲基氫氧化銨、三乙醇胺、乙二胺、二乙三胺、2-胺基-2-羥基甲基-1,3-丙二醇、1,3-二胺基丙醇-2-嗎啉等有機鹼等鹼。 As the type of the alkali solution, an alkali solution which can achieve the above-mentioned object can be selected, and a solution obtained by dissolving an alkali metal hydroxide such as lithium hydroxide, sodium hydroxide or potassium hydroxide can be mentioned. Alkali metal carbonate such as lithium carbonate, sodium carbonate or potassium carbonate; alkali metal hydrogencarbonate such as lithium hydrogencarbonate, sodium hydrogencarbonate or potassium hydrogencarbonate; alkali metal phosphate such as potassium phosphate or sodium phosphate; sodium pyrophosphate and pyrophosphoric acid Alkali metal pyrophosphate such as potassium; sodium salt such as sodium tetraborate or sodium metasilicate; ammonium salt such as ammonium carbonate or ammonium hydrogencarbonate; tetramethylammonium hydroxide, triethanolamine, ethylenediamine, diethylenetriamine, 2 a base such as an organic base such as amino-2-hydroxymethyl-1,3-propanediol or 1,3-diaminopropanol-2-morpholine.

該些鹼可單獨使用或者將2種以上組合使用。 These bases may be used singly or in combination of two or more.

作為酸性溶液之種類,若選擇可達成如上所述之目的之酸性溶液即可,例如可列舉:鹽酸、氫溴酸、氫碘酸、次氯酸、亞氯酸、氯酸、過氯酸、次溴酸、亞溴酸、溴酸、過溴酸、次碘酸、亞碘酸、碘酸、過碘酸、硫酸、氟磺酸、硝酸、磷酸、六氟銻酸、四氟磷酸、鉻酸、硼酸、甲磺酸、乙磺酸、苯磺酸、三氟甲磺酸、甲酸、乙酸、檸檬酸、葡萄糖酸、乳酸、草酸、酒石酸、抗壞血酸、米氏酸(Meldrum's acid)等酸、將該些之2種以上混合而成之溶液等。 As the type of the acidic solution, an acidic solution which can achieve the above object can be selected, and examples thereof include hydrochloric acid, hydrobromic acid, hydroiodic acid, hypochlorous acid, chlorous acid, chloric acid, and perchloric acid. Hypobromous acid, bromic acid, bromic acid, perbromic acid, hypoiodous acid, iodic acid, iodic acid, periodic acid, sulfuric acid, fluorosulfonic acid, nitric acid, phosphoric acid, hexafluoroantimonic acid, tetrafluorophosphoric acid, chromium Acid, boric acid, methanesulfonic acid, ethanesulfonic acid, benzenesulfonic acid, trifluoromethanesulfonic acid, formic acid, acetic acid, citric acid, gluconic acid, lactic acid, oxalic acid, tartaric acid, ascorbic acid, Meldrum's acid, etc. A solution obtained by mixing two or more of these.

而且,於上述水、有機溶劑、鹼溶液、酸性溶液中,亦可視需要含有可使透明樹脂之折射率降低的折射率降低劑。 Further, in the above water, an organic solvent, an alkali solution, or an acidic solution, a refractive index reducing agent which can lower the refractive index of the transparent resin may be contained as needed.

[折射率控制劑] [Refractive Index Control Agent]

於本發明中,作為可使透明構件之表層部位附近之折射率實質性降低之折射率控制劑,若為可使折射率實質性降低之材料則並無特別限制,例如為折射率低於透明樹脂,且藉由暴露、含浸、含有而固定於透明樹脂之表面之材料,或如後所述地設定透明構件為透明樹脂,將具有抑制交聯反應之功能的物質作為折射率控制劑而使其暴露、含浸、含有於透明樹脂表面而減低折射率即可。如上所述,本發明於如下之方面具有大的特徵:藉由於透明構件之表層部位含有折射率控制劑,表現出使所述表層部位之折射率實質性變低之功能。於上述之樹脂組成物之情形時,折射率控制劑若為陽離子,則可有效率地使折射率實質性降低,因此較佳,若為正的1價金屬離子,則離子交聯受到抑制,另一方面容易使用離子鍵等而進行固定,因此更佳,若為鉀離子或鈉離子則進一步較佳。因此,可將前述之鹼溶液用作折射率控制劑。 In the present invention, the refractive index controlling agent which can substantially reduce the refractive index in the vicinity of the surface layer portion of the transparent member is not particularly limited as long as it can substantially reduce the refractive index, for example, the refractive index is lower than that of the transparent one. a resin, which is fixed to the surface of the transparent resin by exposure, impregnation, or inclusion, or a transparent member as a transparent resin as described later, and a substance having a function of suppressing the crosslinking reaction as a refractive index controlling agent It is exposed, impregnated, and contained on the surface of the transparent resin to reduce the refractive index. As described above, the present invention has a large feature in that the surface layer portion of the transparent member contains a refractive index controlling agent, and exhibits a function of substantially lowering the refractive index of the surface layer portion. In the case of the above-mentioned resin composition, if the refractive index controlling agent is a cation, the refractive index can be effectively lowered, so that it is preferable, and if it is a positive monovalent metal ion, ion crosslinking is suppressed. On the other hand, it is more preferable to fix it by using an ionic bond or the like, and it is more preferable, and it is more preferable if it is a potassium ion or a sodium ion. Therefore, the aforementioned alkali solution can be used as a refractive index controlling agent.

而且,於本發明中,使用單官能性化合物(單體)或含有硬化反應較所述透明構件之中心部慢之聚合性官能基的化合物(單體)代替1價金屬離子作為折射率控制劑之情形時,亦可獲得抑制交聯反應之效果,使透明構件之表層部位附近之折射率實質性變低。 Further, in the present invention, a monofunctional compound (monomer) or a compound (monomer) containing a polymerizable functional group having a slower reaction than a central portion of the transparent member is used instead of the monovalent metal ion as a refractive index controlling agent. In the case of the same, the effect of suppressing the crosslinking reaction can be obtained, and the refractive index in the vicinity of the surface layer portion of the transparent member is substantially lowered.

[光波導] [optical waveguide]

本發明之光波導是包含下部包覆層、芯圖案及上部包覆層之光波導,於芯圖案之剖面形狀之四邊形中,其4邊中之2邊以上 之周圍包含折射率低於芯圖案之中心之低折射率部位,於低折射率部位之外側包含折射率更低的下部包覆層或/及上部包覆層。上述所謂2邊,較佳的是芯圖案之兩個側壁,更佳的是3邊以上。 The optical waveguide of the present invention is an optical waveguide including a lower cladding layer, a core pattern, and an upper cladding layer, and two or more of the four sides of the four-sided shape of the cross-sectional shape of the core pattern The periphery includes a low refractive index portion having a refractive index lower than the center of the core pattern, and a lower cladding layer or/and an upper cladding layer having a lower refractive index on the outer side of the low refractive index portion. The above-mentioned two sides are preferably two side walls of the core pattern, more preferably three or more sides.

另外,較佳的是相較於芯圖案中心與芯圖案之周圍之低折射率部位之折射率差(由上述式所算出之值),使低折射率部位與下部包覆層或/及上部包覆層之折射率差變大。藉此可將本應自低折射率部位漏出之光成分更有效率地限制於芯圖案內。 Further, it is preferable that the low refractive index portion and the lower cladding layer and/or the upper portion are compared with the refractive index difference (the value calculated by the above formula) of the low refractive index portion around the center of the core pattern and the core pattern. The difference in refractive index of the cladding layer becomes large. Thereby, the light component which should be leaked from the low refractive index portion can be more effectively confined in the core pattern.

芯圖案中心與芯圖案之周圍之低折射率部位之折射率差若為0.01%~2.0%(式子之值乘以100)則較佳,自材料之折射率控制之容易性之觀點考慮,若為0.02%~2.0%則更佳,若為0.03%~1.0%則進一步更佳。 It is preferable that the refractive index difference between the center of the core pattern and the low refractive index portion around the core pattern is 0.01% to 2.0% (the value of the equation is multiplied by 100), and from the viewpoint of the easiness of controlling the refractive index of the material, If it is 0.02% to 2.0%, it is more preferable, and if it is 0.03% to 1.0%, it is further preferable.

低折射率部位與下部包覆層或/及上部包覆層之折射率差為大於芯圖案中心與芯圖案之周圍之低折射率部位之折射率差的範圍,若為0.1%~6.0%則較佳,自光侷限性之觀點及材料之折射率控制之容易性之觀點考慮,若為1.0%~5.0%則更佳,若為2.0%~5.0%則進一步更佳。 The difference in refractive index between the low refractive index portion and the lower cladding layer or/and the upper cladding layer is greater than the refractive index difference between the center of the core pattern and the low refractive index portion around the core pattern, and is 0.1% to 6.0%. Preferably, from the viewpoint of optical limitation and the easiness of refractive index control of the material, it is preferably 1.0% to 5.0%, and further preferably 2.0% to 5.0%.

而且,若芯圖案3之中心部4之折射率為芯圖案形成用樹脂硬化物自身之折射率,則容易保持折射率之穩定性、透過性,因此較佳。 Further, when the refractive index of the central portion 4 of the core pattern 3 is the refractive index of the cured resin for forming the core pattern, it is easy to maintain the stability and permeability of the refractive index, which is preferable.

而且,本發明之光波導中亦可設置在芯圖案之光軸上將光路轉換為約90°方向之光路轉換鏡,亦可製成與各種電氣配線板複合而成之光電複合基板,亦可用作經由連接器等與光纖接合而 成之光纜。 Further, the optical waveguide of the present invention may be provided with an optical path conversion mirror that converts the optical path into an optical axis of about 90° on the optical axis of the core pattern, and may also be a composite optical composite substrate formed by combining various electrical wiring boards. Used to bond to an optical fiber via a connector or the like Into the cable.

[下部包覆層.上部包覆層] [The lower cladding layer. Upper cladding layer]

本發明之光波導中所使用之下部包覆層及上部包覆層以至少覆蓋芯圖案之下表面及上表面之方式進行配置,若以進一步覆蓋兩個側壁之方式進行配置則更佳。 The lower cladding layer and the upper cladding layer used in the optical waveguide of the present invention are disposed so as to cover at least the lower surface and the upper surface of the core pattern, and are preferably disposed so as to further cover the two side walls.

作為下部包覆層及上部包覆層之形成方法,並無特別限定,例如可列舉塗佈清漆狀之包覆層形成用樹脂層,或者利用層壓或壓製膜狀包覆層形成用樹脂層等而使其積層於被寫體上,從而製成下部包覆層之方法。自於塗佈或積層之後進行硬化之觀點考慮,較佳的是熱硬化性樹脂、光硬化性樹脂、光/熱併用硬化性樹脂等。 The method for forming the lower cladding layer and the upper cladding layer is not particularly limited, and examples thereof include a resin layer for forming a coating layer in which a varnish is applied, or a resin layer for forming a coating layer for laminating or pressing a coating layer. A method of forming a lower cladding layer by laminating it on the object to be written. From the viewpoint of curing after coating or lamination, a thermosetting resin, a photocurable resin, a photocurable resin, and the like are preferably used.

作為下部包覆層之厚度,並無特別限定,自芯圖案之光侷限性之觀點考慮,若為5μm以上則較佳,自厚的樹脂層之形成性之觀點考慮,若為200μm以下則較佳。自厚度之控制之觀點考慮,若為10μm以上、150μm以下則更佳,自低背化之觀點考慮,若為10μm以上、100μm以下則進一步更佳。 The thickness of the lower cladding layer is not particularly limited, and is preferably 5 μm or more from the viewpoint of optical limitations of the core pattern, and is preferably 200 μm or less from the viewpoint of formation of a thick resin layer. good. From the viewpoint of the control of the thickness, it is more preferably 10 μm or more and 150 μm or less, and further preferably 10 μm or more and 100 μm or less from the viewpoint of low-profile.

另外,下部包覆層可為單層,亦可包含多層,可為與後述之上部包覆層相同之材料亦可為不同之材料。 Further, the lower cladding layer may be a single layer or a plurality of layers, and may be the same material as the upper cladding layer described later or may be a different material.

作為上部包覆層之厚度,並無特別限定,若自芯圖案上表面之厚度為5μm以上,則自光侷限性之觀點考慮較佳,作為所使用之包覆層形成用樹脂層之厚度,自厚的樹脂層之形成性之觀點考慮,若為200μm以下則較佳。自厚度之控制之觀點考慮,若 為10μm以上、150μm以下則更佳,自低背化之觀點考慮,若為10μm以上、100μm以下則進一步更佳。 The thickness of the upper cladding layer is not particularly limited. When the thickness of the upper surface of the core pattern is 5 μm or more, it is preferable from the viewpoint of optical limitations, and the thickness of the resin layer for forming a cladding layer to be used is From the viewpoint of the formability of the thick resin layer, it is preferably 200 μm or less. From the point of view of the control of thickness, if It is more preferably 10 μm or more and 150 μm or less, and further preferably 10 μm or more and 100 μm or less from the viewpoint of low-profile.

[芯圖案] [core pattern]

本發明之光波導中所使用之芯圖案3之折射率高於下部包覆層2及上部包覆層6,是傳播光之主要部位。 The core pattern 3 used in the optical waveguide of the present invention has a higher refractive index than the lower cladding layer 2 and the upper cladding layer 6, and is a main portion of the propagating light.

自上述之觀點考慮,若相對於所傳播之光之波長,具有不對光之傳播造成不良影響之程度的透明性即可。 From the above viewpoints, it is sufficient to have transparency to the extent that the propagation of light does not adversely affect the propagation of light.

芯圖案之材料若為滿足上述之石英、玻璃、樹脂等,則並無特別限定,於形成為圖案之情形時,自密接性之觀點、形成性之觀點考慮,較佳的是使用透明樹脂。作為芯圖案之形成方法,可於被寫體(下部包覆層)上塗佈清漆狀芯圖案形成用樹脂;或者藉由層壓、壓製等而積層膜狀之芯圖案形成用樹脂之後,利用進行曝光、蝕刻之光微影加工或異向性蝕刻(乾式蝕刻)等而形成圖案;或者藉由僅僅於所期望之位置塗佈膜狀或清漆狀之芯圖案形成用樹脂等而形成圖案。自可高精度地定位之方面考慮,可適宜列舉光微影加工,自該觀點考慮,芯圖案形成用樹脂較佳的是可蝕刻之樹脂層,更佳的是感光性樹脂層。 The material of the core pattern is not particularly limited as long as it satisfies the above-mentioned quartz, glass, resin, etc., and when it is formed into a pattern, it is preferable to use a transparent resin from the viewpoint of adhesion and formability. As a method of forming a core pattern, a resin for forming a varnish-like core pattern can be applied to a target (lower cladding layer); or a resin for forming a core pattern of a film can be laminated by lamination, pressing, or the like, and then used. A pattern is formed by performing photolithography or etching (dry etching) of exposure, etching, or the like, or by coating a film or varnish-like core pattern forming resin or the like only at a desired position. From the viewpoint of the high-precision positioning, the photolithography process is preferably exemplified. From this viewpoint, the resin for forming the core pattern is preferably an etchable resin layer, and more preferably a photosensitive resin layer.

於上述範圍中進一步重要的是芯圖案之2邊以上之周圍為可形成折射率低於芯圖案之中心的低折射率部位的材料。 Further important in the above range is that the periphery of the two sides of the core pattern is a material which can form a low refractive index portion having a refractive index lower than the center of the core pattern.

作為芯圖案之剖面形狀,若為可傳播光之形狀即可,可列舉矩形(四邊形)、多邊形、圓、橢圓等。於矩形以外之多邊形之情形時,較佳的是其2邊以上之周圍可形成低折射率部位,較 佳的是儘可能多邊之周圍可形成低的低折射率部位,於圓形或橢圓之情形時,較佳的是其周圍之一半以上為低折射率部位,更佳的是所有周圍均為低折射率部位。於藉由上述光微影加工而形成芯圖案之情形時,若為矩形則容易形成,因此較佳。 The cross-sectional shape of the core pattern may be a rectangular shape (quadrilateral shape), a polygon, a circle, an ellipse or the like. In the case of a polygon other than a rectangle, it is preferable that a low refractive index portion is formed around the two sides or more. It is preferable to form a low low refractive index portion as far as possible around the polygon. In the case of a circle or an ellipse, it is preferable that one or more of the surrounding portions are low refractive index portions, and more preferably all of the surrounding portions are low. Refractive index part. In the case where the core pattern is formed by the above-described photolithography, it is preferable because it is formed in a rectangular shape.

關於芯圖案之厚度,並無特別限定,形成後之芯圖案之厚度若為10μm以上,則具有如下之優點:於光學元件形成後,與受發光元件或光纖或光學元件之結合中可擴大定位容差,若為160μm以下,則具有如下之優點:於光學元件形成後,與受發光元件或光纖或光學元件之結合中,結合效率提高,而且具有可使由於全反射所產生之傳播光之相位差變小的效果,可減低光傳播損耗。自以上觀點考慮,芯圖案之厚度若為10μm~160μm則較佳,若為20μm~100μm則更佳,進一步更佳的是30μm~80μm之範圍。 The thickness of the core pattern is not particularly limited, and if the thickness of the core pattern after formation is 10 μm or more, there is an advantage that the positioning can be expanded in combination with the light-receiving element or the optical fiber or the optical element after the optical element is formed. The tolerance, if it is 160 μm or less, has the advantage that after the formation of the optical element, in combination with the light-receiving element or the optical fiber or the optical element, the bonding efficiency is improved, and the propagation light which can be generated by total reflection is provided. The effect of reducing the phase difference reduces the light propagation loss. From the above viewpoints, the thickness of the core pattern is preferably from 10 μm to 160 μm, more preferably from 20 μm to 100 μm, still more preferably from 30 μm to 80 μm.

[蝕刻液] [etching solution]

作為蝕刻液,並無特別限制,可列舉有機溶劑或包含有機溶劑與水之半水系蝕刻液等有機溶劑系蝕刻液;鹼性水溶液、包含鹼性水溶液與1種以上有機溶劑之鹼性半水系蝕刻液等鹼性蝕刻液等。而且,蝕刻溫度可根據芯圖案形成用樹脂層之蝕刻性而調節。 The etching solution is not particularly limited, and examples thereof include an organic solvent-based etching solution such as an organic solvent or a semi-aqueous etching solution containing an organic solvent and water, an alkaline aqueous solution, and an alkaline semi-aqueous system containing an alkaline aqueous solution and one or more organic solvents. An alkaline etching solution such as an etching solution. Further, the etching temperature can be adjusted in accordance with the etching property of the resin layer for forming a core pattern.

作為有機溶劑,並無特別限制,可列舉上述溶液中所列舉之有機溶劑等。 The organic solvent is not particularly limited, and examples thereof include organic solvents and the like listed in the above solution.

該些有機溶劑可單獨使用或者將2種以上組合使用。而 且,於有機溶劑中亦可混入表面活性劑、消泡劑、折射率降低劑等。 These organic solvents may be used singly or in combination of two or more. and Further, a surfactant, an antifoaming agent, a refractive index reducing agent, or the like may be mixed in the organic solvent.

作為鹼性水溶液之鹼,並無特別限制,可列舉上述所列舉之鹼等。 The base of the basic aqueous solution is not particularly limited, and examples thereof include the above-mentioned bases and the like.

該些鹼可單獨使用或者將2種以上組合使用。 These bases may be used singly or in combination of two or more.

蝕刻中所使用之鹼性水溶液之pH較佳的是9~14。而且,於鹼性水溶液中亦可混入表面活性劑、消泡劑、折射率降低劑等。 The pH of the alkaline aqueous solution used in the etching is preferably 9 to 14. Further, a surfactant, an antifoaming agent, a refractive index reducing agent, or the like may be mixed in the alkaline aqueous solution.

作為鹼性半水系蝕刻液,若為包含鹼性水溶液與1種以上所述有機溶劑者,則並無特別限制。鹼性半水系蝕刻液之pH較佳的是於可充分進行蝕刻之範圍內儘可能地小,較佳的是pH為8~13,更佳的是pH為9~12。 The alkaline semi-aqueous etching solution is not particularly limited as long as it contains an alkaline aqueous solution and one or more organic solvents. The pH of the alkaline semi-aqueous etching solution is preferably as small as possible within a range in which etching can be sufficiently performed, preferably pH 8 to 13, more preferably pH 9 to 12.

有機溶劑之濃度通常較佳的是2質量%~90質量%。而且,於鹼性半水系蝕刻液中可少量混入界面活性劑、消泡劑等,亦可混入折射率降低劑等。 The concentration of the organic solvent is usually preferably from 2% by mass to 90% by mass. Further, a small amount of a surfactant, an antifoaming agent, or the like may be mixed in the alkaline semi-aqueous etching solution, and a refractive index reducing agent or the like may be mixed.

作為蝕刻後之處理,可視需要使用所述有機溶劑、包含所述有機溶劑與水之半水系清洗液、或水、酸性溶液而進行清洗。亦可藉由該清洗,將過量地含浸於透明樹脂中之折射率降低劑某種程度地除去。 The treatment after the etching may be carried out by using the organic solvent, a semi-aqueous cleaning solution containing the organic solvent and water, or water or an acidic solution. The refractive index reducing agent excessively impregnated into the transparent resin can also be removed to some extent by the cleaning.

於上述透明樹脂之情形時,若藉由酸性溶液對透明樹脂進行清洗,則可除去過量之鉀離子或鈉離子,進一步可除去最表層部分之鉀離子或鈉離子(羧酸鹽若藉由酸性溶液而成為羧酸, 則疏水性提高,鉀或鈉之取代並不進行至內部),因此可於透明樹脂之表層部位附近實質性殘存鉀離子或鈉離子,因此較佳。 In the case of the above transparent resin, if the transparent resin is washed by an acidic solution, excess potassium ions or sodium ions can be removed, and potassium ions or sodium ions in the outermost layer portion can be further removed (if the carboxylate is acidified) The solution becomes a carboxylic acid, Further, since the hydrophobicity is improved and the substitution of potassium or sodium is not carried out to the inside, it is preferable because potassium ions or sodium ions are substantially retained in the vicinity of the surface layer portion of the transparent resin.

以下,對本發明之光學構件的製造方法中所使用之各步驟加以詳細說明。 Hereinafter, each step used in the method for producing an optical member of the present invention will be described in detail.

[步驟A、步驟A'] [Step A, Step A']

作為本發明之光學構件的製造方法中所使用之步驟A,將透明構件暴露於溶液中,可使透明構件之所暴露之暴露部位之折射率實質性低於透明構件之並非暴露部位之透明構件中心部之折射率。作為暴露溶液之方法,並無特別限定,可列舉噴霧法、浸漬法、覆液法、旋塗法、刷塗法、刮削法等。而且,亦可視需要併用該些方法。 As step A used in the method for producing an optical member of the present invention, the transparent member is exposed to the solution so that the refractive index of the exposed portion of the transparent member exposed is substantially lower than the transparent member of the transparent member which is not the exposed portion. The refractive index of the center. The method of exposing the solution is not particularly limited, and examples thereof include a spray method, a dipping method, a liquid coating method, a spin coating method, a brush coating method, and a scraping method. Moreover, the methods can also be used in combination as needed.

藉此可大致均一地形成暴露於溶液中之折射率不同之部位。而且,藉由使用溶液,具有即使是於複雜之形狀或錯綜複雜之形狀的透明構件之暴露面,亦可使折射率實質性減低之優點,亦可使光波導之芯圖案等之側面的表層部位附近之折射率實質性降低。 Thereby, a portion having a different refractive index exposed to the solution can be formed substantially uniformly. Moreover, by using the solution, the exposed surface of the transparent member having a complicated shape or an intricate shape can also substantially reduce the refractive index, and can also make the surface portion of the side of the core pattern of the optical waveguide or the like. The refractive index in the vicinity is substantially reduced.

作為本發明之其他的光學構件的製造方法之步驟A',於透明構件中,使透明構件之表層部位含有使透明構件之折射率實質性降低之折射率控制劑,從而可使含有折射率控制劑之表層部位之折射率實質性低於透明構件中心部之折射率。作為折射率控制劑之添加方法,可列舉:使透明構件之表層部位附近預先含有折射率控制劑之方法;藉由各種已知之方法(例如濺鍍等)於透 明構件中埋入折射率控制劑之方法;或如上述步驟A所示那樣將液狀之折射率控制劑或溶解於溶液中之折射率控制劑暴露於透明構件中,於透明構件之表層部位附近含有該折射率控制劑之方法。 In the step A' of the method for producing another optical member of the present invention, in the transparent member, the surface layer portion of the transparent member contains a refractive index controlling agent which substantially reduces the refractive index of the transparent member, so that the refractive index control can be contained. The refractive index of the surface portion of the agent is substantially lower than the refractive index of the central portion of the transparent member. The method of adding the refractive index controlling agent includes a method of previously including a refractive index controlling agent in the vicinity of a surface layer portion of the transparent member, and is transparent to various known methods (for example, sputtering). a method of embedding a refractive index controlling agent in the member; or exposing the liquid refractive index controlling agent or the refractive index controlling agent dissolved in the solution to the transparent member as shown in the above step A, at the surface portion of the transparent member A method of containing the refractive index controlling agent in the vicinity.

若為預先含有之方法,則自控制任意位置之折射率之觀點考慮較佳,自於均一之條件下使透明構件之表層的折射率降低之觀點考慮,適宜的是將液狀之折射率控制劑或者溶解於溶液中之折射率控制劑暴露於透明構件中之方法。 If it is a method contained in advance, it is preferable from the viewpoint of controlling the refractive index at an arbitrary position, and it is preferable to control the refractive index of the liquid layer from the viewpoint of lowering the refractive index of the surface layer of the transparent member under uniform conditions. The method of exposing the agent or the refractive index controlling agent dissolved in the solution to the transparent member.

[步驟B] [Step B]

作為本發明之光學構件的製造方法中所使用之步驟B,可藉由蝕刻液而蝕刻透明構件,包含藉由蝕刻而進行圖案化之步驟B。由於包含藉由蝕刻進行圖案化之步驟,容易獲得任意形狀之透明構件,可總括地進行形狀加工,因此較佳。蝕刻之方法並無特別限定,若預先製作可藉由蝕刻液進行蝕刻之部位與不能進行蝕刻之部位,藉由蝕刻液將可蝕刻之部位除去即可,例如可藉由如下方式而進行:於透明構件上形成圖案狀之蝕刻抗蝕劑,藉由蝕刻將並無蝕刻抗蝕劑之部位除去的方法;或者使用光或熱,對透明構件製作出未硬化部及硬化部(亦包含光硬化),然後藉由蝕刻液將未硬化部除去。而且,蝕刻液之浸漬方法並無特別限定,可列舉噴霧法、浸漬法、覆液法、旋塗法、刷塗法、刮削法等。而且亦可視需要併用該些方法。 As the step B used in the method for producing an optical member of the present invention, the transparent member can be etched by the etching liquid, and the step B of patterning by etching can be included. Since the step of patterning by etching is included, it is easy to obtain a transparent member having an arbitrary shape, and the shape processing can be collectively performed, which is preferable. The etching method is not particularly limited. If a portion which can be etched by the etching liquid and a portion which cannot be etched are prepared in advance, the etchable portion can be removed by the etching liquid, for example, by performing the following method: a pattern-shaped etching resist is formed on the transparent member, and a portion where the resist is not etched is removed by etching; or an uncured portion and a hardened portion (including photohardening) are formed on the transparent member by using light or heat. Then, the uncured portion is removed by an etching solution. Further, the method of immersing the etching liquid is not particularly limited, and examples thereof include a spray method, a dipping method, a liquid coating method, a spin coating method, a brush coating method, and a scraping method. And these methods can also be used together as needed.

上述步驟A或步驟A'若與步驟B同時進行或者於步驟B之後進行即可,藉此可使經圖案化之透明構件之側壁表層之折射 率實質性降低。步驟A或步驟A'於步驟B之後進行之情形時,若連續進行蝕刻處理與暴露溶液之處理,則可有效率地製造本發明之光學構件;但若步驟A或步驟A'與步驟B同時進行,則可藉由削減步驟數而使作業效率提高,因此更佳。自上述觀點考慮,於與步驟A或步驟A'同時進行步驟B之情形時,蝕刻液若與上述可使折射率實質性降低之溶液相同或者該些之混合液即可。 The above step A or step A' may be performed simultaneously with step B or after step B, whereby the surface layer of the patterned transparent member may be refracted The rate is substantially reduced. When the step A or the step A' is performed after the step B, if the etching treatment and the exposure solution are continuously performed, the optical member of the present invention can be efficiently produced; but if the step A or the step A' is the same as the step B If it is carried out, the work efficiency can be improved by reducing the number of steps, which is preferable. From the above viewpoints, in the case where the step B is carried out simultaneously with the step A or the step A', the etching liquid may be the same as the above-mentioned solution which can substantially reduce the refractive index or a mixture of the above.

[步驟C] [Step C]

作為本發明之光學構件的製造方法中所使用之步驟C,於透明構件為感光性透明樹脂之情形時,於上述步驟A或步驟A'之前、或/及步驟B之前包含步驟C,亦即照射可進行光硬化之光化射線。藉此,即使暴露於溶液中,亦可藉由光化射線進行光硬化而提高耐溶液性。另外,藉由蝕刻進行圖案化時的對蝕刻液之耐蝕刻液性提高。藉由使溶液與蝕刻液為同一液體(亦可為混合液),可同時進行步驟A與步驟B,因此作業性提高。 In the step C used in the method for producing an optical member of the present invention, when the transparent member is a photosensitive transparent resin, the step C is included before the step A or the step A' or before the step B, that is, The actinic radiation that can be photohardened is irradiated. Thereby, even if it is exposed to a solution, it can improve the solution resistance by photohardening by photochemical ray. Further, the etching resistance to the etching liquid at the time of patterning by etching is improved. By making the solution and the etching liquid the same liquid (may also be a mixed liquid), the steps A and B can be simultaneously performed, so that the workability is improved.

感光性透明樹脂之光硬化中所使用之光化射線若為可使該感光性透明樹脂硬化之波長的光即可,可適宜列舉紫外線、可見光線、紅外線等。若為紫外線,則可有效率地進行光硬化,因此較佳。光化射線之照射量並無特別限制,若為10mJ/cm2~10000mJ/cm2則較佳,若為30mJ/cm2~5000mJ/cm2則更佳,若為40mJ/cm2~4000mJ/cm2則進一步更佳。而且,於藉由蝕刻進行圖案化之情形時,於圖案化之後,亦可進一步照射光化射線而進行光硬化。此時之照射量並無特別限制,若為100mJ/cm2~ 10000mJ/cm2則較佳,若為300mJ/cm2~5000mJ/cm2則更佳,若為400mJ/cm2~4000mJ/cm2則進一步更佳。藉由圖案化後之曝光,可提高圖案之密接性等。 The actinic ray used for photohardening of the photosensitive transparent resin may be light having a wavelength at which the photosensitive transparent resin can be cured, and examples thereof include ultraviolet light, visible light, and infrared light. If it is an ultraviolet ray, photohardening can be performed efficiently, and it is preferable. The amount of irradiation of the actinic ray is not particularly limited, and is preferably 10 mJ/cm 2 to 10000 mJ/cm 2 , more preferably 30 mJ/cm 2 to 5000 mJ/cm 2 , and is 40 mJ/cm 2 to 4000 mJ/ Cm 2 is even better. Further, in the case of patterning by etching, after patterning, the actinic ray may be further irradiated to perform photocuring. The amount of irradiation at this time is not particularly limited, and is preferably 100 mJ/cm 2 to 10000 mJ/cm 2 , more preferably 300 mJ/cm 2 to 5000 mJ/cm 2 , and is 400 mJ/cm 2 to 4000 mJ/cm. 2 is even better. By patterning and exposure, the adhesion of the pattern and the like can be improved.

[步驟D] [Step D]

作為本發明之其他的光學構件的製造方法中所使用之步驟D,於透明構件為透明樹脂,該透明構件可藉由熱而硬化之情形時,包含對透明樹脂進行加熱硬化,使熱硬化後之該透明樹脂之表層部位附近之折射率實質性低於熱硬化後之透明樹脂之中心部之折射率的步驟。 In the step D used in the method for producing another optical member of the present invention, when the transparent member is a transparent resin, and the transparent member can be cured by heat, the transparent resin is heat-hardened to be thermally cured. The refractive index in the vicinity of the surface layer portion of the transparent resin is substantially lower than the refractive index in the central portion of the transparent resin after the heat curing.

而且,作為步驟D',若於步驟A或步驟A'之後包含對透明樹脂進行熱硬化之步驟即可。若進行熱硬化,則可藉由熱使未反應之光硬化成分、熱硬化成分硬化,且使暴露、含浸之折射率降低劑得到某種程度地固定。 Further, as the step D', the step of thermally hardening the transparent resin may be included after the step A or the step A'. When the thermal curing is performed, the unreacted photohardening component and the thermosetting component can be hardened by heat, and the exposed and impregnated refractive index reducing agent can be fixed to some extent.

步驟D或步驟D'熱硬化之溫度並無特別限制,若為40℃~280℃,則容易維持樹脂之透明性,若為80℃~200℃則更佳,若為100℃~190℃則進一步更佳。若加熱時間為5分鐘~5小時,則可熱硬化,若為20分鐘~3小時則更佳,若為30分鐘~2小時則進一步更佳。 The temperature of the step D or the heat curing of the step D' is not particularly limited. If it is 40 ° C to 280 ° C, the transparency of the resin is easily maintained. If it is 80 ° C to 200 ° C, it is more preferably 100 ° C to 190 ° C. Further better. If the heating time is 5 minutes to 5 hours, it may be thermally hardened, and it is more preferably 20 minutes to 3 hours, and further preferably 30 minutes to 2 hours.

本發明之透明構件之折射率的測定方法並無特別限制,若藉由以下之方法進行測定即可。首先,折射率測定用樣品可藉由以下(1)~(3)之任一方法而製作。 The method for measuring the refractive index of the transparent member of the present invention is not particularly limited, and the measurement may be carried out by the following method. First, the sample for refractive index measurement can be produced by any of the following methods (1) to (3).

(1)分別製作未實施低折射率化處理(暴露、含浸溶液,含 有折射率降低劑)之透明構件、實施了低折射率化處理之樣品,測定各個之折射率。 (1) separately produced low refractive index treatment (exposure, impregnation solution, including A transparent member having a refractive index reducing agent, a sample subjected to a low refractive index treatment, and each refractive index was measured.

(2)包覆透明構件之一部分表面之後,實施低折射率化處理,分別測定未包覆之透明構件之折射率、除去了包覆之透明構件之折射率。 (2) After covering a part of the surface of the transparent member, a low refractive index treatment is performed, and the refractive index of the uncoated transparent member is measured, and the refractive index of the coated transparent member is removed.

(3)對透明構件進行低折射率化處理後,破壞透明構件,分別測定表層部位附近及中心部之透明構件之折射率。 (3) After the transparent member was subjected to a low refractive index treatment, the transparent member was broken, and the refractive index of the transparent member in the vicinity of the surface layer portion and the center portion was measured.

作為折射率之測定方法,若藉由已知之方法進行測定即可,若使用最小偏角法、臨界角法、干涉法(低相干性干涉法、相移干涉法等)等即可。 The measurement method of the refractive index may be carried out by a known method, and a minimum declination method, a critical angle method, an interference method (low coherence interference method, phase shift interference method, or the like) may be used.

[實施例] [Examples]

以下,藉由實施例對本發明加以更詳細之說明,但並不限定於該些實施例。 Hereinafter, the present invention will be described in more detail by way of examples, but not limited to these examples.

{實施例1} {Example 1}

<透明構件形成用樹脂膜之製作> <Production of Resin Film for Forming Transparent Member>

[透明構件形成用基質聚合物:(甲基)丙烯酸聚合物(P-1)之製作] [Matrix Polymer for Forming Transparent Member: Production of (Meth)Acrylic Polymer (P-1)]

於具有攪拌機、冷凝管、導氣管、滴液漏斗、及溫度計之燒瓶中秤量丙二醇單甲醚乙酸酯42質量份及乳酸甲酯21質量份,一面導入氮氣一面進行攪拌。使液溫上升至65℃,以3小時滴加N-環己基馬來醯亞胺14.5質量份、丙烯酸苄酯20質量份、鄰苯基苯酚1.5質量份、丙烯酸酯39質量份、甲基丙烯酸-2-羥基 乙酯14質量份、甲基丙烯酸12.5質量份、2,2'-偶氮雙(2,4-二甲基戊腈)4質量份、丙二醇單甲醚乙酸酯37質量份、及乳酸甲酯21質量份之混合物,然後於65℃下進行3小時之攪拌,進一步於95℃下繼續攪拌1小時,獲得(甲基)丙烯酸聚合物(P-1)溶液(固體成分為45質量%)。 42 parts by mass of propylene glycol monomethyl ether acetate and 21 parts by mass of methyl lactate were weighed in a flask equipped with a stirrer, a condenser, an air tube, a dropping funnel, and a thermometer, and stirred while introducing nitrogen gas. The liquid temperature was raised to 65 ° C, and 14.5 parts by mass of N-cyclohexylmaleimide, 20 parts by mass of benzyl acrylate, 1.5 parts by mass of o-phenylphenol, 39 parts by mass of acrylate, and methacrylic acid were added dropwise over 3 hours. -2-hydroxyl 14 parts by mass of ethyl ester, 12.5 parts by mass of methacrylic acid, 4 parts by mass of 2,2'-azobis(2,4-dimethylvaleronitrile), 37 parts by mass of propylene glycol monomethyl ether acetate, and lactate A A mixture of 21 parts by mass of the ester was stirred at 65 ° C for 3 hours, and further stirred at 95 ° C for 1 hour to obtain a (meth)acrylic polymer (P-1) solution (solid content: 45 mass%). .

[酸值之測定] [Measurement of acid value]

測定P-1之酸值之結果是80mgKOH/g。另外,酸值是根據中和P-1溶液所需要之0.1mol/L氫氧化鉀水溶液量而算出。此時,將作為指示劑而添加之酚酞自無色變色為粉紅色之點作為中和點。 The result of measuring the acid value of P-1 was 80 mgKOH/g. Further, the acid value was calculated from the amount of 0.1 mol/L potassium hydroxide aqueous solution required for neutralizing the P-1 solution. At this time, the point at which the phenolphthalein added as an indicator was changed from colorless to pink was used as a neutralization point.

[重量平均分子量之測定] [Measurement of Weight Average Molecular Weight]

使用GPC(東曹(Tosoh)股份有限公司製造之「SD-8022」、「DP-8020」、及「RI-8020」)測定P-1之重量平均分子量(標準聚苯乙烯換算)之結果是3.2×104。另外,管柱使用日立化成股份有限公司製造之「Gelpack GL-A150-S」及「Gelpack GL-A160-S」。溶離液使用四氫呋喃,將樣品濃度設為0.5mg/ml,將溶出速度設為1ml/min而進行測定。其結果為32,000。 The result of measuring the weight average molecular weight of P-1 (standard polystyrene conversion) using GPC ("SD-8022", "DP-8020", and "RI-8020" manufactured by Tosoh Co., Ltd.) is 3.2 × 10 4 . In addition, "Gelpack GL-A150-S" and "Gelpack GL-A160-S" manufactured by Hitachi Chemical Co., Ltd. are used for the pipe string. The elution liquid was measured using tetrahydrofuran, the sample concentration was set to 0.5 mg/ml, and the dissolution rate was set to 1 ml/min. The result is 32,000.

[透明構件形成用樹脂清漆之調配] [Preparation of resin varnish for forming transparent members]

於廣口之塑膠瓶中秤量作為(A)於主鏈中包含馬來醯亞胺骨架之鹼可溶性(甲基)丙烯酸聚合物的所述P-1溶液(固體成分為45質量%)60質量份、作為(B)聚合性化合物之雙酚A型環氧丙烯酸酯(新中村化學工業股份有限公司製造之EA-1010N)(環 氧當量為518g/eq)40質量份、 The P-1 solution (solid content: 45 mass%) of the (A) alkali-soluble (meth)acrylic polymer containing a maleic imine skeleton in the main chain was weighed in a plastic bottle of a wide mouth. And 40 parts by mass of bisphenol A type epoxy acrylate (EA-1010N manufactured by Shin-Nakamura Chemical Co., Ltd.) (epoxy equivalent: 518 g/eq) as (B) polymerizable compound,

作為(D)聚合起始劑之1-[4-(2-羥基乙氧基)苯基]-2-羥基-2-甲基-1-丙烷-1-酮(汽巴精化(Ciba Specialty Chemicals)股份有限公司製造之Irgacure 2959)1質量份、雙(2,4,6-三甲基苯甲醯基)苯基氧化膦(汽巴精化股份有限公司製造之Irgacure 819)1質量份,使用攪拌機,於溫度為25℃、轉速為400rpm之條件下進行6小時之攪拌,調配芯部形成用樹脂清漆。其後,使用孔徑為2μm之聚四氟乙烯過濾器(愛多邦得科東洋(Advantec Toyo)股份有限公司製造之PF020)及孔徑為0.5μm之膜濾器(愛多邦得科東洋股份有限公司製造之J050A),於溫度為25℃、壓力為0.4MPa之條件下進行加壓過濾。繼而,使用真空泵及鐘罩於減壓度為50mmHg之條件下進行15分鐘之減壓消泡,獲得透明構件形成用樹脂清漆。 1-[4-(2-Hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-1-propan-1-one as (D) polymerization initiator (Ciba Specialty) 1 part by mass of Irgacure 2959) manufactured by Chemicals Co., Ltd., bis(2,4,6-trimethylbenzylidene)phenylphosphine oxide (Irgacure 819 manufactured by Ciba Specialty Chemicals Co., Ltd.) 1 part by mass The mixture was stirred for 6 hours at a temperature of 25 ° C and a number of revolutions of 400 rpm using a stirrer to prepare a resin varnish for core formation. Thereafter, a polytetrafluoroethylene filter having a pore size of 2 μm (PF020 manufactured by Advantec Toyo Co., Ltd.) and a membrane filter having a pore size of 0.5 μm were used (Aiduobang Deco Co., Ltd.) The manufactured J050A) was subjected to pressure filtration under the conditions of a temperature of 25 ° C and a pressure of 0.4 MPa. Then, vacuum defoaming was performed for 15 minutes under the conditions of a reduced pressure of 50 mmHg using a vacuum pump and a bell jar to obtain a resin varnish for forming a transparent member.

[透明構件形成用樹脂膜之製作] [Production of Resin Film for Forming Transparent Member]

使用塗佈機(HIRANO TECSEED股份有限公司製造之Multicoater TM-MC)將上述透明構件形成用樹脂清漆塗佈於PET膜(東洋紡績股份有限公司製造之A1517、厚度為16μm)之非處 理面上,於100℃下進行20分鐘之乾燥,其次貼附作為保護膜之脫模PET膜(帝人杜邦薄膜(Teijin DuPont Films)股份有限公司製造之A31、厚度為25μm),獲得透明構件形成用樹脂膜。此時,樹脂層之厚度可藉由調節塗佈機之間隙而任意地調整,於本實施例中以硬化後之膜厚成為50μm之方式進行調節。 The resin varnish for forming a transparent member was applied to a PET film (A1517 manufactured by Toyobo Co., Ltd., thickness: 16 μm) by using a coater (Multicoater TM-MC manufactured by HIRANO TECSEED Co., Ltd.). On the surface, drying was carried out at 100 ° C for 20 minutes, and then a release film as a protective film (A31 manufactured by Teijin DuPont Films Co., Ltd., thickness: 25 μm) was attached to obtain a transparent member. A resin film is used. At this time, the thickness of the resin layer can be arbitrarily adjusted by adjusting the gap of the coater, and in the present embodiment, the film thickness after curing is adjusted to 50 μm.

[折射率之測定] [Measurement of Refractive Index]

將所得之透明構件形成用樹脂膜裁斷為100mm×100mm,自支撐膜側使用紫外線曝光機(奧克(ORC)製作所股份有限公司製造、EXM-1172),以3500mJ/cm2照射紫外線(波長365nm)。其後,將支撐膜剝離,浸漬於1.0質量%之碳酸鉀水溶液(液溫為30℃)中3分鐘,其後藉由純水進行水洗。其次,於160℃下進行1小時之加熱乾燥及硬化,將保護膜剝離而形成光學構件。 The obtained resin film for forming a transparent member was cut into a size of 100 mm × 100 mm, and an ultraviolet exposure machine (manufactured by ORC Co., Ltd., EXM-1172) was used for the self-supporting film side, and ultraviolet rays were irradiated at 3,500 mJ/cm 2 (wavelength: 365 nm). ). Thereafter, the support film was peeled off, immersed in a 1.0% by mass aqueous potassium carbonate solution (liquid temperature: 30 ° C) for 3 minutes, and then washed with pure water. Next, heat drying and hardening were performed at 160 ° C for 1 hour, and the protective film was peeled off to form an optical member.

使用稜鏡結合式折射率計(美家(Metricon)公司製造、商品名為Model2020)測定該光學構件之支撐膜面(碳酸鉀水溶液浸漬面)之波長830nm之折射率,結果折射率為1.556,測定20處任意位置(每隔約1cm而隔開之位置)亦為相同之折射率,並無位置上之不均一。進行表面之紅外線(InfraRed,IR)測定,結果是觀測到羧酸陰離子之峰值,進行能量色散X射線分析(energy dispersive X-ray analysis,EDX)測定,結果是檢測出鉀。保護膜面(碳酸鉀水溶液非浸漬面)之折射率為1.558,測定20處任意位置(每隔約1cm而隔開之位置)亦為相同之折射率,並無位置上之不均一。進行表面之IR測定,結果並無羧酸陰離子之 峰值,進行EDX測定,結果並未檢測出鉀。於深度方向進行EDX分析,結果自表面起直至5μm之位置檢測出鉀。另外,於160℃下進行2小時之加熱,使用與上述同樣之方法對其他任意位置測定折射率,結果是支撐膜面側為1.556,保護膜面側為1.558,並無變化。 The refractive index at a wavelength of 830 nm of the support film surface (the potassium carbonate aqueous solution impregnation surface) of the optical member was measured using a tantalum-coupled refractometer (manufactured by Metricon Co., Ltd., trade name: Model 2020), and the refractive index was 1.556. The measurement of any position at 20 (the position separated by about 1 cm) is also the same refractive index, and there is no positional inhomogeneity. Infrared (IR) measurement of the surface was carried out, and as a result, the peak of the carboxylate anion was observed, and energy dispersive X-ray analysis (EDX) was measured, and as a result, potassium was detected. The refractive index of the protective film surface (non-impregnated surface of the aqueous solution of potassium carbonate) was 1.558, and the same refractive index was measured at any of 20 positions (positions separated by about 1 cm), and there was no positional unevenness. The surface IR measurement was carried out, and as a result, there was no carboxylate anion. The peak value was measured by EDX, and no potassium was detected as a result. EDX analysis was carried out in the depth direction, and potassium was detected from the surface up to 5 μm. Further, the film was heated at 160 ° C for 2 hours, and the refractive index was measured at any other position by the same method as described above. As a result, the support film surface side was 1.556, and the protective film surface side was 1.558, which did not change.

另外,除了未進行熱硬化以外,與上述同樣地製作透明構件形成用樹脂膜,將保護膜剝離而形成光學構件。藉由與上述同樣之方法測定支撐膜面(碳酸鉀水溶液浸漬面)之波長830nm之折射率,結果是1.552,保護膜面之折射率為1.549。 In addition, a resin film for forming a transparent member was produced in the same manner as described above except that the heat treatment was not performed, and the protective film was peeled off to form an optical member. The refractive index of the support film surface (the potassium carbonate aqueous solution impregnation surface) at a wavelength of 830 nm was measured by the same method as above, and as a result, it was 1.552, and the refractive index of the protective film surface was 1.549.

{實施例2} {Example 2}

於實施例1中,將1.0質量%碳酸鉀水溶液改設為1.0質量%碳酸鈉水溶液,除此以外藉由同樣之方法製作光學構件。 In the first embodiment, an optical member was produced by the same method except that a 1.0 mass% potassium carbonate aqueous solution was changed to a 1.0 mass% sodium carbonate aqueous solution.

使用稜鏡結合式折射率計(Metricon公司製造、商品名為Model2020)測定該光學構件之支撐膜面(碳酸鈉水溶液浸漬面)之波長830nm之折射率,結果折射率為1.556,測定20處任意位置(每隔約1cm而隔開之位置)亦為相同之折射率,並無位置上之不均一。進行表面之IR測定,結果是觀測到羧酸陰離子之峰值,進行EDX測定,結果是檢測出鈉。保護膜面(碳酸鈉水溶液非浸漬面)之折射率為1.558,測定20處任意位置(每隔約1cm而隔開之位置)亦為相同之折射率,並無位置上之不均一。進行表面之IR測定,結果並無羧酸陰離子之峰值,進行EDX測定,結果並未檢測出鈉。於深度方向進行EDX分析,結果自表面起直 至5μm之位置檢測出鈉。另外,於160℃下進行2小時之加熱,使用與上述同樣之方法對其他任意位置測定折射率,結果是支撐膜面側為1.556,保護膜面側為1.558,並無變化。 The refractive index at a wavelength of 830 nm of the support film surface (the sodium carbonate aqueous solution impregnation surface) of the optical member was measured using a 稜鏡-type refractometer (manufactured by Metricon Co., Ltd., trade name: Model 2020), and the refractive index was 1.556. The position (position separated by about 1 cm) is also the same refractive index, and there is no positional inhomogeneity. When the surface IR measurement was performed, the peak of the carboxylic acid anion was observed, and EDX measurement was performed, and as a result, sodium was detected. The refractive index of the protective film surface (non-impregnated surface of the aqueous sodium carbonate solution) was 1.558, and the same refractive index was measured at any of the 20 positions (the positions separated by about 1 cm), and there was no positional unevenness. When the surface IR measurement was performed, the peak of the carboxylate anion was not observed, and the EDX measurement was performed, and no sodium was detected. EDX analysis in the depth direction, the result is straight from the surface Sodium was detected to a position of 5 μm. Further, the film was heated at 160 ° C for 2 hours, and the refractive index was measured at any other position by the same method as described above. As a result, the support film surface side was 1.556, and the protective film surface side was 1.558, which did not change.

另外,除了未進行熱硬化以外,與上述同樣地製作透明構件形成用樹脂膜,將保護膜剝離而形成光學構件。藉由與上述同樣之方法測定支撐膜面(碳酸鈉水溶液浸漬面)之波長830nm之折射率,結果是1.552,保護膜面之折射率為1.549。 In addition, a resin film for forming a transparent member was produced in the same manner as described above except that the heat treatment was not performed, and the protective film was peeled off to form an optical member. The refractive index at a wavelength of 830 nm of the support film surface (the sodium carbonate aqueous solution impregnation surface) was measured by the same method as above, and as a result, it was 1.552, and the refractive index of the protective film surface was 1.549.

{實施例3} {Example 3}

<包覆層形成用樹脂膜之製作> <Preparation of resin film for forming a cladding layer>

[(A)基質聚合物:(甲基)丙烯酸聚合物(A-1)之製作] [(A) Matrix Polymer: Production of (Meth)acrylic Polymer (A-1)]

於具有攪拌機、冷凝管、導氣管、滴液漏斗、及溫度計之燒瓶中秤量丙二醇單甲醚乙酸酯46質量份及乳酸甲酯23質量份,一面導入氮氣一面進行攪拌。使液溫上升至65℃,以3小時滴加甲基丙烯酸甲酯47質量份、丙烯酸丁酯33質量份、甲基丙烯酸-2-羥基乙酯16質量份、甲基丙烯酸14質量份、2,2'-偶氮雙(2,4-二甲基戊腈)3質量份、丙二醇單甲醚乙酸酯46質量份、及乳酸甲酯23質量份之混合物,然後於65℃下進行3小時之攪拌,進一步於95℃下繼續攪拌1小時,獲得(甲基)丙烯酸聚合物(A-1)溶液(固體成分為45質量%)。 In a flask equipped with a stirrer, a condenser, an air guide tube, a dropping funnel, and a thermometer, 46 parts by mass of propylene glycol monomethyl ether acetate and 23 parts by mass of methyl lactate were weighed and stirred while introducing nitrogen gas. The liquid temperature was raised to 65 ° C, and 47 parts by mass of methyl methacrylate, 33 parts by mass of butyl acrylate, 16 parts by mass of 2-hydroxyethyl methacrylate, and 14 parts by mass of methacrylic acid were added dropwise over 3 hours. 3 parts by mass of 2'-azobis(2,4-dimethylvaleronitrile), 46 parts by mass of propylene glycol monomethyl ether acetate, and 23 parts by mass of methyl lactate, and then carried out at 65 ° C After stirring for an hour, the stirring was further continued at 95 ° C for 1 hour to obtain a (meth)acrylic polymer (A-1) solution (solid content: 45 mass%).

[重量平均分子量之測定] [Measurement of Weight Average Molecular Weight]

使用GPC(東曹股份有限公司製造之「SD-8022」、「DP-8020」、及「RI-8020」)測定(A-1)之重量平均分子量(標準聚苯乙烯換 算)之結果是3.9×104。另外,管柱使用日立化成股份有限公司製造之「Gelpack GL-A150-S」及「Gelpack GL-A160-S」。 The weight average molecular weight (standard polystyrene conversion) of (A-1) measured by GPC ("SD-8022", "DP-8020", and "RI-8020" manufactured by Tosoh Corporation) was 3.9. ×10 4 . In addition, "Gelpack GL-A150-S" and "Gelpack GL-A160-S" manufactured by Hitachi Chemical Co., Ltd. are used for the pipe string.

[酸值之測定] [Measurement of acid value]

測定(A-1)之酸值之結果是79mgKOH/g。另外,酸值是根據中和A-1溶液所需要之0.1mol/L氫氧化鉀水溶液量而算出。此時,將作為指示劑而添加之酚酞自無色變色為粉紅色之點作為中和點。 The result of measuring the acid value of (A-1) was 79 mgKOH/g. Further, the acid value was calculated from the amount of 0.1 mol/L potassium hydroxide aqueous solution required for neutralizing the A-1 solution. At this time, the point at which the phenolphthalein added as an indicator was changed from colorless to pink was used as a neutralization point.

[包覆層形成用樹脂清漆之調配] [Preparation of resin varnish for coating layer formation]

將作為(A)基質聚合物之所述(A-1)溶液(固體成分為45質量%)84質量份(固體成分為38質量份)、作為(B)光硬化成分之具有聚酯骨架之(甲基)丙烯酸胺基甲酸酯(新中村化學工業股份有限公司製造之「U-200AX」)33質量份及具有聚丙二醇骨架之(甲基)丙烯酸胺基甲酸酯(新中村化學工業股份有限公司製造之「UA-4200」)15質量份、作為(C)熱硬化成分之藉由甲基乙基酮肟保護六亞甲基二異氰酸酯之異三聚氰酸酯型三聚物而成之多官能嵌段異氰酸酯溶液(固體成分為75質量%)(住化拜耳胺基甲酸酯(Sumika Bayer Urethane)股份有限公司製造之「Sumidur BL3175」)20質量份(固體成分為15質量份)、作為(D)光聚合起始劑之1-[4-(2-羥基乙氧基)苯基]-2-羥基-2-甲基-1-丙烷-1-酮(汽巴日本股份有限公司(Ciba Japan K.K.)製造之「Irgacure 2959」)1質量份、雙(2,4,6-三甲基苯甲醯基)苯基氧化膦(汽巴日本股份有限公司製造之「Irgacure 819」)1質量份、及作為稀釋用 有機溶劑之丙二醇單甲醚乙酸酯23質量份一面攪拌一面加以混合。使用孔徑為2μm之聚四氟乙烯過濾器(愛多邦得科東洋股份有限公司製造之「PF020」)進行加壓過濾後,進行減壓消泡,獲得包覆層形成用樹脂清漆。 84 parts by mass of the (A-1) solution (solid content: 45 mass%) as the (A) matrix polymer (solid content: 38 parts by mass), and (B) photohardenable component having a polyester skeleton 33 parts by mass of (meth)acrylic acid urethane ("U-200AX" manufactured by Shin-Nakamura Chemical Co., Ltd.) and (meth)acrylic acid urethane having a polypropylene glycol skeleton (Xinzhongcun Chemical Industry) 15 parts by mass of "UA-4200" manufactured by the company, and the isocyanurate type terpolymer which protects hexamethylene diisocyanate by methyl ethyl ketone oxime as (C) thermosetting component 20 parts by mass of a polyfunctional block isocyanate solution (solid content: 75% by mass) ("Sumidur BL3175" manufactured by Sumika Bayer Urethane Co., Ltd.) (solid content: 15 parts by mass) ), 1-[4-(2-hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-1-propan-1-one as (D) photopolymerization initiator (Ciba Japan shares) "Irgacure 2959" manufactured by Ciba Japan KK), 1 part by mass of bis(2,4,6-trimethylbenzylidene)phenylphosphine oxide (manufactured by Ciba Japan Co., Ltd.) The "Irgacure 819") 1 part by mass, and as diluted with 23 parts by mass of propylene glycol monomethyl ether acetate of an organic solvent was mixed while stirring. After pressure filtration using a polytetrafluoroethylene filter ("PF020" manufactured by Aibangbond Co., Ltd.) having a pore size of 2 μm, pressure reduction and defoaming were carried out to obtain a resin varnish for forming a coating layer.

使用塗佈機(Multicoater TM-MC、HIRANO TECSEED股份有限公司製造)將上述所得之包覆層形成用樹脂組成物塗佈於作為承載膜之PET膜(東洋紡績股份有限公司製造之「COSMOSHINE A4100」、厚度為50μm)之非處理面上,於100℃下進行20分鐘之乾燥後,貼附作為覆蓋膜之表面脫模處理PET膜(帝人杜邦薄膜股份有限公司製造之「Purex A31」、厚度為25μm),獲得包覆層形成用樹脂膜。此時,樹脂層之厚度可藉由調節塗佈機之間隙而任意地調整,關於本實施例中所使用之下部包覆層2及上部包覆層6之厚度,記載於實施例中。而且,下部包覆層2及上部包覆層6之硬化後的膜厚與塗佈後之膜厚相同。 The resin composition for forming a cladding layer obtained above was applied to a PET film as a carrier film (COSMOSHINE A4100 manufactured by Toyobo Co., Ltd.) using a coater (Multicoater TM-MC, manufactured by HIRANO TECSEED Co., Ltd.). The non-treated surface having a thickness of 50 μm was dried at 100 ° C for 20 minutes, and then a surface-release PET film as a cover film (Purex A31 manufactured by Teijin DuPont Film Co., Ltd.) and having a thickness of 25 μm), a resin film for forming a cladding layer was obtained. At this time, the thickness of the resin layer can be arbitrarily adjusted by adjusting the gap of the coater, and the thicknesses of the lower cladding layer 2 and the upper cladding layer 6 used in the present embodiment are described in the examples. Further, the film thickness after curing of the lower cladding layer 2 and the upper cladding layer 6 is the same as the film thickness after coating.

[折射率之測定] [Measurement of Refractive Index]

於矽基板(尺寸為60mm×20mm、厚度為0.6mm)上積層包覆形成用樹脂膜而進行硬化,製作折射率測定用樣品。使用稜鏡結合式折射率計(Metricon公司製造、商品名為Model2020)測定該樣品之波長830nm之折射率。設定為處於15℃~30℃之範圍的規定之固定溫度(例如25℃)而進行測定。硬化後之樹脂層之折射率為1.496。 A resin film for forming a cladding layer was formed on the substrate (having a size of 60 mm × 20 mm and a thickness of 0.6 mm) and cured to prepare a sample for refractive index measurement. The refractive index of the sample at a wavelength of 830 nm was measured using a ruthenium combined refractometer (manufactured by Metricon Co., Ltd., trade name: Model 2020). The measurement is performed at a predetermined fixed temperature (for example, 25 ° C) in the range of 15 ° C to 30 ° C. The resin layer after hardening had a refractive index of 1.496.

<圖1之光波導之製作例> <Example of fabrication of optical waveguide of Fig. 1>

[下部包覆層2之形成] [Formation of lower cladding layer 2]

使用100mm×100mm之聚醯亞胺膜(聚醯亞胺:Kapton EN、厚度:25μm)作為基板1,將上述所得之15μm厚之包覆層形成用樹脂膜之保護膜剝離後,使用真空加壓式貼合機(名機製作所股份有限公司製造、MVLP-500),於抽成500Pa以下之真空後,於壓力為0.4MPa、溫度為90℃、加壓時間為30秒之條件下進行加熱壓接,層壓於基板1之其中一個面上。繼而,使用紫外線曝光機(ORC製作所股份有限公司製造、EXM-1172),自樹脂膜A之支撐膜側以3000mJ/cm2照射紫外線(波長為365nm)。其後,將支撐膜剝離,於170℃下進行1小時之加熱乾燥及硬化,形成下部包覆層2。 A 100 mm × 100 mm polyimine film (polyimine: Kapton EN, thickness: 25 μm) was used as the substrate 1, and the protective film of the resin film for forming a 15 μm-thick coating layer obtained above was peeled off, and vacuum was applied thereto. Pressure laminating machine (manufactured by Nago Seisakusho Co., Ltd., MVLP-500), after being vacuumed at 500 Pa or less, heated at a pressure of 0.4 MPa, a temperature of 90 ° C, and a pressurization time of 30 seconds. Crimp-bonded and laminated on one of the faces of the substrate 1. Then, ultraviolet rays (wavelength: 365 nm) were irradiated from the support film side of the resin film A at 3000 mJ/cm 2 using an ultraviolet exposure machine (manufactured by ORC Co., Ltd., EXM-1172). Thereafter, the support film was peeled off, and dried and hardened at 170 ° C for 1 hour to form a lower cladding layer 2 .

[芯圖案3之形成] [Formation of Core Pattern 3]

將上述所得之50μm厚之透明構件形成用樹脂膜作為芯圖案形成用樹脂膜,將保護膜剝離之後,使用輥貼合機(日立化成工業股份有限公司(Hitachi Plant Techno Co.,Ltd.)製造、HLM-1500),於壓力為0.4MPa、溫度為50℃、層壓速度為0.2m/min之條件下層壓於上述所得之下部包覆層2形成面,使用真空加壓式貼合機(名機製作所股份有限公司製造、MVLP-500),抽成500Pa以下之真空後,於壓力為0.4MPa、溫度為65℃、加壓時間為30秒之條件下進行加熱壓接而進行層壓。繼而,使用紫外線曝光機(ORC製作所股份有限公司製造、EXM-1172),介隔具有50μm×90mm×12根(250μm之間距)之開口部的負型光罩, 以3500mJ/cm2照射紫外線(波長為365nm)。其次,將支撐膜剝離,於1.0質量%之碳酸鉀水溶液(液溫為30℃)中進行3分鐘之蝕刻,將芯圖案形成用樹脂之未硬化部除去,其後藉由1.0%硫酸及純水進行清洗。繼而,於160℃下進行1小時之加熱乾燥及硬化,形成高50μm、寬50μm之芯圖案。 The resin film for forming a transparent member having a thickness of 50 μm obtained as described above was used as a resin film for forming a core pattern, and the protective film was peeled off, and then a roll bonding machine (manufactured by Hitachi Plant Techno Co., Ltd.) was used. , HLM-1500), laminated on the lower cladding layer 2 forming surface under the conditions of a pressure of 0.4 MPa, a temperature of 50 ° C, and a laminating speed of 0.2 m/min, using a vacuum pressurizing laminating machine ( Manufactured by Nago Seiki Co., Ltd., MVLP-500), after vacuuming at 500 Pa or less, it was laminated by heating and pressure bonding under the conditions of a pressure of 0.4 MPa, a temperature of 65 ° C, and a pressurization time of 30 seconds. Then, using a UV exposure machine (manufactured by ORC Co., Ltd., EXM-1172), a negative mask having an opening of 50 μm × 90 mm × 12 (with a distance of 250 μm) was interposed, and ultraviolet rays were irradiated at 3,500 mJ/cm 2 ( The wavelength is 365 nm). Next, the support film was peeled off, and etching was performed for 3 minutes in a 1.0 mass% potassium carbonate aqueous solution (liquid temperature: 30 ° C) to remove the uncured portion of the core pattern forming resin, followed by 1.0% sulfuric acid and pure Wash the water. Then, it was heat-dried and hardened at 160 ° C for 1 hour to form a core pattern having a height of 50 μm and a width of 50 μm.

[上部包覆層6之形成] [Formation of upper cladding layer 6]

自芯圖案形成面側,將上述所得之75μm厚之包覆層形成用樹脂膜之保護膜剝離之後,使用真空加壓式貼合機(名機製作所股份有限公司製造、MVLP-500),抽成500Pa以下之真空後,於壓力為0.4MPa、溫度為90℃、加壓時間為30秒之條件下進行加熱壓接而進行層壓。繼而,使用紫外線曝光機(ORC製作所股份有限公司製造、EXM-1172),自樹脂膜A之支撐膜側以3000mJ/cm2照射紫外線(波長為365nm)。其後,將支撐膜剝離,於170℃下進行1小時之加熱乾燥及硬化,形成上部包覆層6,從而作為光波導。 After the protective film of the resin film for forming a cladding layer having a thickness of 75 μm obtained as described above was peeled off from the side of the core pattern forming surface, a vacuum pressure type laminator (manufactured by Naji Seisakusho Co., Ltd., MVLP-500) was used. After forming a vacuum of 500 Pa or less, lamination was carried out by heating and pressure bonding under the conditions of a pressure of 0.4 MPa, a temperature of 90 ° C, and a press time of 30 seconds. Then, ultraviolet rays (wavelength: 365 nm) were irradiated from the support film side of the resin film A at 3000 mJ/cm 2 using an ultraviolet exposure machine (manufactured by ORC Co., Ltd., EXM-1172). Thereafter, the support film was peeled off, and dried and hardened at 170 ° C for 1 hour to form an upper cladding layer 6 as an optical waveguide.

[外形加工] [shape processing]

使用晶圓切割機(DAC552、迪思科(DISCO)股份有限公司製造),以成為80mm之方式與基板一同切斷上述所得之光波導之芯圖案,進行端面平滑化而製作光波導。 Using a wafer dicing machine (DAC 552, manufactured by DISCO Co., Ltd.), the core pattern of the optical waveguide obtained above was cut together with the substrate so as to be 80 mm, and the end surface was smoothed to produce an optical waveguide.

[光損耗測定] [Light loss measurement]

自所得之光波導之其中一個芯圖案端面,使用GI50之光纖而射入波長850nm之光,使用SI114之光纖接受自另一個端面輸出 之光,製作光波導之光損耗。其結果,平均為0.05dB/cm。自所得之光波導之其中一個面射入白色光,觀察另一個面之芯圖案端面,結果是芯圖案中心之亮度高(上邊及側邊附近(自芯圖案與上部包覆層之界面起5μm之範圍)之芯圖案之亮度低)。進行剖面之EDX測定,結果是自兩側邊、上邊起5μm之位置檢測出鉀,檢測出鉀之位置之折射率為1.556,未檢測出鉀之芯圖案中心部之折射率為1.558。 One of the core pattern end faces of the obtained optical waveguide is irradiated with light of 850 nm using the fiber of GI50, and the optical fiber of SI114 is received from the other end face. Light, the optical loss of the optical waveguide. As a result, the average was 0.05 dB/cm. One side of the obtained optical waveguide is incident on white light, and the end face of the core pattern of the other surface is observed. As a result, the brightness of the center of the core pattern is high (above the upper side and the side (from the interface between the core pattern and the upper cladding layer 5 μm) The range of the core pattern has a low brightness). When the EDX measurement of the cross section was performed, potassium was detected at a position of 5 μm from both sides and the upper side, and the refractive index at the position of the potassium was detected to be 1.556, and the refractive index at the center of the core pattern of the potassium was not detected to be 1.558.

{比較例1} {Comparative example 1}

於實施例3中,藉由蝕刻形成芯圖案後,藉由1.0%之氯化鈣水溶液進行清洗,除此以外藉由同樣之方法而製作光波導。 In Example 3, an optical waveguide was produced by the same method except that the core pattern was formed by etching and then washed with a 1.0% aqueous solution of calcium chloride.

[光損耗測定] [Light loss measurement]

自所得之光波導之其中一個芯圖案端面,使用GI50之光纖而射入波長850nm之光,使用SI114之光纖接受自另一個端面輸出之光,製作光波導之光損耗。其結果,平均為0.42dB/cm。自所得之光波導之其中一個面射入白色光,觀察另一個面之芯圖案端面,結果是芯圖案中心之亮度低(上邊及側邊附近之芯圖案之亮度高)。進行剖面之EDX測定,結果是自兩側邊及上邊起5μm之位置檢測出鈣,檢測出鈣之位置的折射率為1.559,未檢測出鈣之芯圖案中心部之折射率為1.558。如上所述,可確認:包含2價鈣陽離子之部位與中心部相比而言折射率變高,與1價陽離子不同,藉由離子交聯等而促進透明構件之交聯。因此,光波導之光傳播損耗變高,無法起到本發明之效果。 From one of the core pattern end faces of the obtained optical waveguide, light of a wavelength of 850 nm is incident using an optical fiber of GI50, and light output from the other end face is received by an optical fiber of SI114 to produce optical loss of the optical waveguide. As a result, the average was 0.42 dB/cm. One of the faces of the obtained optical waveguide is incident on white light, and the end face of the core pattern of the other face is observed. As a result, the brightness of the center of the core pattern is low (the brightness of the core pattern near the upper side and the side is high). When the EDX measurement of the cross section was performed, calcium was detected at a position of 5 μm from both sides and the upper side, and the refractive index at the position where calcium was detected was 1.559, and the refractive index at the center portion of the core pattern of calcium was not detected to be 1.558. As described above, it was confirmed that the refractive index of the site containing the divalent calcium cation is higher than that of the central portion, and the crosslinking of the transparent member is promoted by ion crosslinking or the like unlike the monovalent cation. Therefore, the light propagation loss of the optical waveguide becomes high, and the effect of the present invention cannot be achieved.

(產業上之可利用性) (industrial availability)

藉由本發明之光學構件的製造方法,可提供透明構件之表層部位附近之折射率之位置上的不均一少的光學構件。而且,藉由本發明可提供光損耗低之光波導。因此,可適用於抗反射構件、抗反射膜、各種光學膜、各種光學裝置、光波導構件、光電複合構件、光纜、光互連等廣泛之領域中。 According to the method for producing an optical member of the present invention, it is possible to provide an optical member having a small unevenness in the position of the refractive index in the vicinity of the surface layer portion of the transparent member. Moreover, the optical waveguide having low optical loss can be provided by the present invention. Therefore, it can be applied to a wide range of fields such as an antireflection member, an antireflection film, various optical films, various optical devices, optical waveguide members, photoelectric composite members, optical cables, and optical interconnections.

1‧‧‧基板 1‧‧‧Substrate

2‧‧‧下部包覆層 2‧‧‧Lower coating

3‧‧‧芯圖案 3‧‧‧ core pattern

4‧‧‧芯圖案中心部 4‧‧‧ core pattern center

5‧‧‧低折射率部位 5‧‧‧Low refractive index

6‧‧‧上部包覆層 6‧‧‧Upper cladding

Claims (19)

一種光學構件的製造方法,其包含步驟A:將包含透明樹脂的透明構件暴露於鹼溶液中,使暴露於所述鹼溶液中之所述透明構件之表層部位之折射率實質性地低於未暴露於所述鹼溶液中之所述透明構件之中心部之折射率。 A method of producing an optical member, comprising the step A: exposing a transparent member comprising a transparent resin to an alkali solution such that a refractive index of a surface portion of the transparent member exposed to the alkali solution is substantially lower than The refractive index of the central portion of the transparent member exposed to the alkali solution. 如申請專利範圍第1項所述之光學構件的製造方法,其中,於所述步驟A中,將所述透明構件暴露於所述鹼溶液中時,使所述鹼溶液含浸於所述透明構件中。 The method for producing an optical member according to claim 1, wherein in the step A, when the transparent member is exposed to the alkali solution, the alkali solution is impregnated into the transparent member. in. 如申請專利範圍第2項所述之光學構件的製造方法,其中,所述鹼溶液含有折射率控制劑,所述折射率控制劑表現出藉由含有於所述透明構件之表層部位而使所述表層部位之折射率實質性降低之功能。 The method for producing an optical member according to claim 2, wherein the alkali solution contains a refractive index controlling agent, and the refractive index controlling agent exhibits a surface layer portion contained in the transparent member. The function of substantially reducing the refractive index of the surface layer portion. 如申請專利範圍第3項所述之光學構件的製造方法,其中,所述折射率控制劑是1價陽離子。 The method of producing an optical member according to claim 3, wherein the refractive index controlling agent is a monovalent cation. 一種光學構件的製造方法,其包含步驟A':於透明構件中,使所述透明構件之表層部位含有使所述透明構件之折射率實質性降低之作為折射率控制劑的1價陽離子,從而使含有所述折射率控制劑之所述表層部位之折射率實質性低於不含所述折射率控制劑之所述透明構件之中心部之折射率。 A method for producing an optical member, comprising the step A' of: in a transparent member, a surface layer portion of the transparent member contains a monovalent cation as a refractive index controlling agent which substantially reduces a refractive index of the transparent member, thereby The refractive index of the surface layer portion containing the refractive index controlling agent is substantially lower than the refractive index of the central portion of the transparent member not containing the refractive index controlling agent. 如申請專利範圍第1項至第5項中任一項所述之光學構件的製造方法,其中,所述透明構件是可藉由蝕刻液進行蝕刻之透明構件,且所述光學構件的製造方法包含藉由蝕刻進行圖案化的 步驟B,所述步驟B與所述步驟A或所述步驟A'同時進行,或者於所述步驟A或所述步驟A'之前進行。 The method for producing an optical member according to any one of the items 1 to 5, wherein the transparent member is a transparent member etchable by an etching solution, and the optical member is manufactured Including patterning by etching Step B, the step B is performed simultaneously with the step A or the step A', or before the step A or the step A'. 如申請專利範圍第4項或第5項所述之光學構件的製造方法,其中,所述1價陽離子是鉀離子及鈉離子之至少任一者。 The method for producing an optical member according to the invention of claim 4, wherein the monovalent cation is at least one of a potassium ion and a sodium ion. 如申請專利範圍第6項所述之光學構件的製造方法,其中,所述透明樹脂是感光性透明樹脂,於所述步驟A或所述步驟A'之前、或/及所述步驟B之前包含步驟C:照射可使所述感光性透明樹脂光硬化之光化射線。 The method for producing an optical member according to claim 6, wherein the transparent resin is a photosensitive transparent resin, which is included before the step A or the step A', or/and before the step B Step C: Irradiating the actinic ray which can photoharden the photosensitive transparent resin. 如申請專利範圍第4項或第5項所述之光學構件的製造方法,其中,於所述步驟A或所述步驟A'之後包含步驟D':對所述透明樹脂進行熱硬化。 The method for producing an optical member according to Item 4 or 5, wherein the step A' is followed by the step D': thermally curing the transparent resin. 如申請專利範圍第9項所述之光學構件的製造方法,其中,所述透明樹脂至少包含(A)具有熱聚合性官能基之基質樹脂、(B)熱聚合性化合物。 The method for producing an optical member according to claim 9, wherein the transparent resin contains at least (A) a matrix resin having a thermally polymerizable functional group, and (B) a thermally polymerizable compound. 一種光學構件形成用透明構件,其用於如申請專利範圍第1項至第10項中任一項所述之光學構件的製造方法中。 A transparent member for forming an optical member, which is used in a method of producing an optical member according to any one of claims 1 to 10. 一種光學構件,其藉由如申請專利範圍第1項至第10項中任一項所述之光學構件的製造方法而獲得。 An optical member obtained by the method for producing an optical member according to any one of claims 1 to 10. 一種光波導,其是包含芯部及包覆部之光波導,且於形成所述芯部之芯圖案中,所述芯圖案之至少周圍之一部分包含表層部位,所述表層部位具有比所述芯圖案之中心部低的折射率,且含有1價陽離子作為折射率控制劑。 An optical waveguide, which is an optical waveguide including a core portion and a cladding portion, and in a core pattern forming the core portion, at least one portion of the periphery of the core pattern includes a surface layer portion, wherein the surface layer portion has a ratio The central portion of the core pattern has a low refractive index and contains a monovalent cation as a refractive index controlling agent. 如申請專利範圍第13項所述之光波導,其是積層有下部包覆層、所述芯圖案、上部包覆層之光波導,且於具有低折射率之所述表層部位之外側包含折射率更低之所述下部包覆層或/及所述上部包覆層。 The optical waveguide according to claim 13, which is an optical waveguide in which a lower cladding layer, the core pattern, and an upper cladding layer are laminated, and includes a refractive index on the outer side of the surface layer portion having a low refractive index. The lower cladding layer or/and the upper cladding layer are lower in rate. 如申請專利範圍第13項所述之光波導,其中,具有2邊以上之周圍的所述芯圖案是至少包含兩個側壁之2邊的芯圖案。 The optical waveguide according to claim 13, wherein the core pattern having two or more sides is a core pattern including at least two side walls. 如申請專利範圍第14項所述之光波導,其中,相較於所述芯圖案之中心與所述芯圖案之周圍之低折射率部位的折射率差,所述低折射率部位與所述下部包覆層或/及所述上部包覆層的折射率差更大。 The optical waveguide according to claim 14, wherein the low refractive index portion and the low refractive index portion are compared with a refractive index difference between a center of the core pattern and a low refractive index portion around the core pattern. The difference in refractive index between the lower cladding layer and/or the upper cladding layer is greater. 如申請專利範圍第13項至第16項中任一項所述之光波導,所述芯圖案是藉由如申請專利範圍第11項所述之光學構件形成用透明構件而形成。 The optical waveguide according to any one of the preceding claims, wherein the core pattern is formed by a transparent member for forming an optical member according to claim 11 of the invention. 一種光模組,其使用如申請專利範圍第13項至第17項中任一項所述之光波導。 An optical module using the optical waveguide according to any one of claims 13 to 17. 一種光波導芯圖案形成用透明構件,其是用於積層有下部包覆層、芯圖案、上部包覆層之光波導中的芯圖案形成用透明構件,於形成所述芯圖案時,藉由在2邊以上之周圍含有1價陽離子作為折射率控制劑,而可實質性形成折射率低於所述芯圖案之中心部之表層部位。 A transparent member for forming an optical waveguide core pattern, which is a transparent member for forming a core pattern in an optical waveguide in which a lower cladding layer, a core pattern, and an upper cladding layer are laminated, by forming the core pattern by A monovalent cation is contained as a refractive index controlling agent around two or more sides, and a surface layer portion having a refractive index lower than a central portion of the core pattern can be substantially formed.
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