TWI531095B - Light emitting diode device - Google Patents

Light emitting diode device Download PDF

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TWI531095B
TWI531095B TW103121020A TW103121020A TWI531095B TW I531095 B TWI531095 B TW I531095B TW 103121020 A TW103121020 A TW 103121020A TW 103121020 A TW103121020 A TW 103121020A TW I531095 B TWI531095 B TW I531095B
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wafer
light
diode device
sub
regions
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TW103121020A
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TW201503427A (en
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劉軍廷
胡鴻烈
蔡欣芸
高智偉
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財團法人工業技術研究院
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發光二極體裝置 Light-emitting diode device

本揭露是有關於一種發光二極體裝置,且是有關於使所發出的光形成一橢圓形光形之發光二極體裝置。 The present disclosure relates to a light emitting diode device and to a light emitting diode device for forming an emitted light into an elliptical light shape.

隨著薄型化、高畫素照相手機大行其道,高亮度LED閃光燈已是照相手機的標準配備,用以彌補在光線不足的室內拍攝,成像品質不佳的問題。然而,由於目前照相手機所搭配之LED閃光燈的色溫係為單一色溫,在特定光源環境(例如是暖色系光源)下使用,拍攝出的照片往往使目標物偏白而背景偏黃,因此常需使用後製軟體調整白平衡來彌補色溫差異。 With the popularity of thin, high-resolution camera phones, high-brightness LED flashlights are standard equipment for camera phones to compensate for poor image quality in low-light indoors. However, since the color temperature of the LED flashlight used in the current camera phone is a single color temperature, and is used under a specific light source environment (for example, a warm color light source), the photograph taken often makes the target white and the background is yellowish, so it is often necessary Use the post-software to adjust the white balance to compensate for the difference in color temperature.

為了彌補上述缺點,提供可變色溫之LED閃光燈,用以模擬自然的室內光源。 In order to compensate for the above shortcomings, a color-changing LED flash lamp is provided to simulate a natural indoor light source.

本揭露係有關於一種可變色溫之發光二極體裝置,藉由發光二極體裝置中的透鏡以及晶片的設計,使由晶片所發出 的光形成一橢圓形光形。此外,依據本揭露實施例之發光二極體裝置具有更平均的光分布,同時也能以現有的製程方式進行製造,無需增加額外的製程。 The present disclosure relates to a color-changeable light-emitting diode device, which is provided by a wafer by a lens and a wafer design in a light-emitting diode device. The light forms an elliptical shape. In addition, the light-emitting diode device according to the embodiment of the present disclosure has a more uniform light distribution, and can also be manufactured in an existing process manner without adding an additional process.

根據本揭露,提出一種發光二極體裝置,包括一基板、一第一晶片與一第二晶片以及一透鏡組。第一晶片與第二晶片設置於基板上,分別發出一第一色溫與一第二色溫的光。透鏡組設置於第一晶片與第二晶片上方,且可包括至少兩個透鏡分別對應第一晶片與第二晶片。透鏡包括一曲面,曲面在一第一平面上的曲率半徑為m,曲面在一第二平面上的曲率半徑為n。第一平面垂直於第二平面,且m不等於n。 According to the disclosure, a light emitting diode device includes a substrate, a first wafer and a second wafer, and a lens group. The first wafer and the second wafer are disposed on the substrate to respectively emit light of a first color temperature and a second color temperature. The lens group is disposed above the first wafer and the second wafer, and may include at least two lenses respectively corresponding to the first wafer and the second wafer. The lens includes a curved surface having a radius of curvature m on a first plane and a radius of curvature of the curved surface on a second plane. The first plane is perpendicular to the second plane and m is not equal to n.

根據本揭露,提出一種發光二極體裝置,包括一第一晶片以及一透鏡組。第一晶片具有複數個第一子區域。第一子區域發出至少兩種色溫的光。透鏡組設置於第一晶片上。第一晶片發出的光線經透鏡組於一目標區域形成一橢圓形光形。 According to the present disclosure, a light emitting diode device is provided, including a first wafer and a lens group. The first wafer has a plurality of first sub-regions. The first sub-region emits light of at least two color temperatures. The lens group is disposed on the first wafer. The light emitted by the first wafer forms an elliptical shape through a lens group in a target area.

為了對本發明之上述及其他方面有更佳的瞭解,下文特舉實施例,並配合所附圖式,作詳細說明如下: In order to provide a better understanding of the above and other aspects of the present invention, the following detailed description of the embodiments and the accompanying drawings

100、200、300‧‧‧發光二極體裝置 100, 200, 300‧‧‧Lighting diode devices

10‧‧‧基板 10‧‧‧Substrate

21、61‧‧‧第一晶片 21, 61‧‧‧ first chip

22、62‧‧‧第二晶片 22, 62‧‧‧ second chip

30、70‧‧‧透鏡組 30, 70‧ ‧ lens group

301、302‧‧‧透鏡 301, 302‧‧‧ lens

303‧‧‧支撐部 303‧‧‧Support

35‧‧‧容置空間 35‧‧‧ accommodating space

40‧‧‧凹部 40‧‧‧ recess

50‧‧‧反射結構 50‧‧‧Reflective structure

611、612、613、614‧‧‧第一子區域 611, 612, 613, 614‧‧‧ first subregion

621、622、623、624‧‧‧第二子區域 621, 622, 623, 624‧‧‧ second subregion

63‧‧‧晶片 63‧‧‧ wafer

631、632、633、634‧‧‧子區域 631, 632, 633, 634‧‧ sub-areas

80‧‧‧遮蔽物 80‧‧‧ Shield

90‧‧‧目標物 90‧‧‧ Targets

A-A’、B-B’、D-D’‧‧‧剖面線 A-A’, B-B’, D-D’‧‧‧ hatching

C1‧‧‧曲面 C1‧‧‧ surface

E1、E2‧‧‧區域 E1, E2‧‧‧ area

m、n‧‧‧曲率半徑 m, n‧‧‧ radius of curvature

R‧‧‧曲率半徑n與曲率半徑m的比值 R‧‧‧The ratio of the radius of curvature n to the radius of curvature m

X、Y、Z‧‧‧座標軸 X, Y, Z‧‧‧ coordinate axis

第1圖繪示本揭露實施例之發光二極體裝置的立體示意圖。 FIG. 1 is a perspective view of a light emitting diode device according to an embodiment of the present disclosure.

第2A圖繪示第1圖之發光二極體裝置的俯視圖。 Fig. 2A is a plan view showing the light emitting diode device of Fig. 1.

第2B圖為第2A圖之發光二極體裝置沿A-A’剖面線繪示的 剖面圖。 Figure 2B is a cross-sectional view taken along the line A-A' of the light-emitting diode device of Figure 2A. Sectional view.

第2C圖為第2A圖之發光二極體裝置沿B-B’剖面線繪示的剖面圖。 Fig. 2C is a cross-sectional view of the light-emitting diode device of Fig. 2A taken along line B-B'.

第3圖繪示本揭露另一實施例之發光二極體裝置在Y-Z平面的剖面圖。 FIG. 3 is a cross-sectional view of the light emitting diode device according to another embodiment of the present invention in a Y-Z plane.

第4A、5A圖繪示本揭露實施例之發光二極體裝置投射至一目標物之長邊的亮度分佈圖。 4A and 5A are diagrams showing the luminance distribution of the light-emitting diode device of the embodiment of the present invention projected onto the long side of an object.

第4B、5B圖繪示本揭露實施例之發光二極體裝置投射至一目標物之短邊的亮度分佈圖。 4B and 5B are diagrams showing the luminance distribution of the short side of a target projected by the light-emitting diode device of the embodiment of the present disclosure.

第6A圖繪示一比較例之發光二極體裝置投射至一目標物之長邊的亮度分佈圖。 FIG. 6A is a diagram showing a luminance distribution of a light emitting diode device of a comparative example projected onto a long side of an object.

第6B圖繪示一比較例之發光二極體裝置投射至一目標物之短邊的亮度分佈圖。 FIG. 6B is a diagram showing a luminance distribution of a light-emitting diode device of a comparative example projected onto a short side of an object.

第7圖繪示本揭露實施例之發光二極體裝置的立體示意圖。 FIG. 7 is a schematic perspective view of a light emitting diode device according to an embodiment of the present disclosure.

第8A圖繪示第7圖之發光二極體裝置的俯視圖。 Fig. 8A is a plan view showing the light emitting diode device of Fig. 7.

第8B圖為第8A圖之發光二極體裝置沿D-D’剖面線繪示的剖面圖。 Figure 8B is a cross-sectional view of the light-emitting diode device of Figure 8A taken along line D-D'.

第9圖繪示本揭露實施例之第一晶片與第二晶片投射光線至一目標物的示意圖。 FIG. 9 is a schematic view showing the first wafer and the second wafer of the embodiment of the present invention projecting light onto a target.

第10圖繪示本揭露實施例之另一晶片的示意圖。 FIG. 10 is a schematic view of another wafer of the disclosed embodiment.

第11A圖繪示本揭露實施例之發光二極體裝置投射至一目標物之長邊的亮度分佈圖。 FIG. 11A is a diagram showing a luminance distribution of a light emitting diode device of the embodiment of the present disclosure projected onto a long side of an object.

第11B圖繪示本揭露實施例之發光二極體裝置投射至一目標物之短邊的亮度分佈圖。 FIG. 11B is a diagram showing the brightness distribution of the short side of a target projected by the light emitting diode device of the embodiment.

以下係參照所附圖式詳細敘述本發明之實施例。圖式中相同的標號係用以標示相同或類似之部分。需注意的是,圖式係已簡化以利清楚說明實施例之內容,圖式上的尺寸比例並非按照實際產品等比例繪製,因此並非作為限縮本發明保護範圍之用。 Embodiments of the present invention will be described in detail below with reference to the drawings. The same reference numerals are used to designate the same or similar parts. It is to be noted that the drawings have been simplified to clearly illustrate the contents of the embodiments, and the dimensional ratios in the drawings are not drawn to the scale of the actual products, and thus are not intended to limit the scope of the present invention.

第1圖繪示本揭露實施例之發光二極體裝置100的立體示意圖。第2A圖繪示第1圖之發光二極體裝置100的俯視圖。第2B圖為第2A圖之發光二極體裝置100沿A-A’剖面線繪示的剖面圖。第2C圖為第2A圖之發光二極體裝置100沿B-B’剖面線繪示的剖面圖。 FIG. 1 is a perspective view of a light emitting diode device 100 according to an embodiment of the present disclosure. FIG. 2A is a plan view showing the light-emitting diode device 100 of FIG. 1 . Fig. 2B is a cross-sectional view of the light-emitting diode device 100 of Fig. 2A taken along line A-A'. Fig. 2C is a cross-sectional view of the light-emitting diode device 100 of Fig. 2A taken along line B-B'.

參照第1~2C圖,本揭露實施例之發光二極體裝置100包括一基板10、一第一晶片21與一第二晶片22以及一透鏡組30。第一晶片21與第二晶片22設置於基板10上,且第一晶片21與第二晶片22可分別發出一第一色溫與一第二色溫的光。透鏡組30設置於第一晶片21與第二晶片22上方,且透鏡組30包括至少兩個透鏡301、302分別對應第一晶片21與第二晶片22。 Referring to FIGS. 1 to 2C, the LED device 100 of the present disclosure includes a substrate 10, a first wafer 21 and a second wafer 22, and a lens group 30. The first wafer 21 and the second wafer 22 are disposed on the substrate 10, and the first wafer 21 and the second wafer 22 respectively emit light of a first color temperature and a second color temperature. The lens group 30 is disposed above the first wafer 21 and the second wafer 22, and the lens group 30 includes at least two lenses 301, 302 corresponding to the first wafer 21 and the second wafer 22, respectively.

透鏡301、302包括一曲面C1。曲面C1在一第一平面上(例如是第2B圖之Y-Z平面)的曲率半徑為m;曲面C1在一第二平面上(例如是第2C圖之X-Z平面)的曲率半徑為n。此外,m不等於n,使第一晶片21或第二晶片22發出的光線,形成一橢圓形光形。 The lenses 301, 302 include a curved surface C1. The radius of curvature of the curved surface C1 on a first plane (for example, the Y-Z plane of FIG. 2B) is m; the radius of curvature of the curved surface C1 on a second plane (for example, the X-Z plane of FIG. 2C) is n. Further, m is not equal to n, and the light emitted from the first wafer 21 or the second wafer 22 is formed into an elliptical shape.

參照第2A圖,在本實施例中,由於第一晶片21與第二晶片22係為陣列方式彼此交叉排列,上方對應於第一晶片21與第二晶片22 的透鏡301與302也呈陣列方式排列。因此,第2B圖與第2C圖之差異,係在於第2B圖之曲面C1與第2C圖之曲面C1的曲率半徑不同。 Referring to FIG. 2A, in the present embodiment, since the first wafer 21 and the second wafer 22 are arranged in an array manner with each other, the upper portion corresponds to the first wafer 21 and the second wafer 22 The lenses 301 and 302 are also arranged in an array. Therefore, the difference between FIG. 2B and FIG. 2C is that the curved surface C1 of FIG. 2B and the curved surface C1 of FIG. 2C have different curvature radii.

在一實施例中,曲面C1在第二平面上(例如是第2C圖之X-Z平面)的曲率半徑n與在第一平面上(例如是第2B圖之Y-Z平面)的曲率半徑m的比值為R(即n/m=R),且R介於1.2~20。 In one embodiment, the ratio of the radius of curvature n of the curved surface C1 on the second plane (eg, the XZ plane of FIG. 2C) to the radius of curvature m of the first plane (eg, the YZ plane of FIG. 2B) R (ie, n/m = R), and R is between 1.2 and 20.

此外,第一晶片21所發出具有第一色溫的光線例如為一暖白光(Warm White),第二晶片22所發出具有第二色溫的光線例如為一冷白光(Cool White)。在一實施例中,暖白光例如是3,000K,冷白光例如是6,000K或6,500K。 In addition, the light having the first color temperature emitted by the first wafer 21 is, for example, a warm white light (Warm White), and the light emitted by the second wafer 22 having the second color temperature is, for example, a cool white light (Cool White). In an embodiment, the warm white light is, for example, 3,000 K, and the cool white light is, for example, 6,000 K or 6,500 K.

由於本揭露實施例之透鏡301與302之曲面C1,在兩個互相垂直之平面(X-Z平面與Y-Z平面)上具有不同的曲率半徑,使得第一晶片21或第二晶片22或其組合所發出的光線可呈現橢圓形光形。也就是說,第一晶片21或第二晶片22或其組合所發出的光線可經過透鏡組30(例如包括透鏡301與302)於一目標區域呈橢圓形光形。再者,第一晶片21與第二晶片22所發出的光線具有不同的色溫,因此,可藉由調控第一晶片21與第二晶片22進行混光,達到最適合拍攝環境的色溫。 Since the curved surface C1 of the lenses 301 and 302 of the embodiment of the present disclosure has different radii of curvature in two mutually perpendicular planes (XZ plane and YZ plane), the first wafer 21 or the second wafer 22 or a combination thereof is emitted. The light can appear in an elliptical shape. That is, the light emitted by the first wafer 21 or the second wafer 22, or a combination thereof, may pass through the lens group 30 (including, for example, the lenses 301 and 302) in an elliptical shape in a target region. Furthermore, the light emitted by the first wafer 21 and the second wafer 22 has different color temperatures. Therefore, the first wafer 21 and the second wafer 22 can be mixed to achieve a color temperature optimum for the shooting environment.

一般而言,拍攝之相片的尺寸係以矩形為主,舉例來說為4:3、5:4或16:9,皆為常用的拍攝尺寸。因此,本揭露實施例之發光二極體裝置100所發出之橢圓形光形,光線分布更加地平均,可有效避免拍攝之照片的邊緣處,由於光線不足造成拍攝細節的流失。 In general, the size of the photographs taken is mainly rectangular, for example, 4:3, 5:4 or 16:9, which are common shooting sizes. Therefore, the elliptical shape of the light emitting diode device 100 of the embodiment of the present disclosure has a lighter distribution, and the light distribution is more evenly distributed, which can effectively avoid the loss of the shooting details due to insufficient light.

再者,由於一般晶片所發出之光線,其中心處往往較周圍更強,因此,在本揭露實施例中,發光二極體裝置100之透鏡301、302更可 包括一散光結構,散光結構可對應於第一晶片21與第二晶片22的中心。 In addition, in the embodiment of the present disclosure, the lenses 301 and 302 of the LED device 100 are more suitable because the light emitted by the wafer is generally stronger at the center. Including an astigmatism structure, the astigmatism structure may correspond to the centers of the first wafer 21 and the second wafer 22.

舉例來說,如第2B、2C圖所示,在本實例中,發光二極體裝置100之散光結構係為一凹部40,凹部40位於透鏡相對於曲面C1之位置。也就是說,曲面C1係位於透鏡301、302靠近第一晶片21與第二晶片22之一側,而凹部40係位於透鏡301、302遠離第一晶片21與第二晶片22之一側。 For example, as shown in FIGS. 2B and 2C, in the present example, the astigmatism structure of the light-emitting diode device 100 is a recess 40, and the recess 40 is located at a position of the lens with respect to the curved surface C1. That is, the curved surface C1 is located on one side of the lenses 301, 302 near the first wafer 21 and the second wafer 22, and the concave portion 40 is located on the side of the lenses 301, 302 away from the first wafer 21 and the second wafer 22.

然而,本揭露並未限定散光結構為凹部40。在某些實施例中,散光結構也可透過一遮蔽物,例如是黑色矩陣設置於透鏡中,以達到對中心遮光或散光的效果。此外,也可於透鏡301、302添加一些特殊材質或顆粒,例如是二氧化鈦(TiO2)、二氧化矽(SiO2),同樣可以達到散光的效果。 However, the present disclosure does not limit the astigmatism structure to the recess 40. In some embodiments, the astigmatism structure can also be disposed in the lens through a mask, such as a black matrix, to achieve a central shading or astigmatism effect. In addition, some special materials or particles may be added to the lenses 301 and 302, such as titanium dioxide (TiO 2 ) and cerium oxide (SiO 2 ), and the astigmatism effect can also be achieved.

在一實施例中,本揭露實施例之發光二極體裝置100的透鏡組更包括一支撐部303。支撐部303可使基板10與透鏡組30之間形成一容置空間35。如第2B、2C圖所示,第一晶片21與第二晶片22可設置於容置空間35中。 In one embodiment, the lens group of the LED device 100 of the present disclosure further includes a support portion 303. The support portion 303 can form an accommodation space 35 between the substrate 10 and the lens group 30. As shown in FIGS. 2B and 2C, the first wafer 21 and the second wafer 22 may be disposed in the accommodating space 35.

然而,本揭露並未限定於此。第3圖繪示本揭露另一實施例之發光二極體裝置200在Y-Z平面的剖面圖。如圖所示,發光二極體裝置200更可包括一反射結構50。反射結構50設置於基板10與透鏡組30之間,且第一晶片21與第二晶片22係設置於反射結構50中。在此實施例中,反射結構50不僅提供了容置第一晶片21與第二晶片22的空間,同時也能反射由第一晶片21與第二晶片22所發出的光線,以提升出光效率。 However, the disclosure is not limited thereto. FIG. 3 is a cross-sectional view of the light emitting diode device 200 of the other embodiment in the Y-Z plane. As shown, the LED device 200 can further include a reflective structure 50. The reflective structure 50 is disposed between the substrate 10 and the lens group 30 , and the first wafer 21 and the second wafer 22 are disposed in the reflective structure 50 . In this embodiment, the reflective structure 50 not only provides a space for accommodating the first wafer 21 and the second wafer 22, but also reflects light emitted by the first wafer 21 and the second wafer 22 to enhance light extraction efficiency.

第4A、5A圖繪示本揭露實施例之發光二極體裝置100投射 至一目標物之長邊的亮度分佈圖,第4B、5B圖繪示本揭露實施例之發光二極體裝置100投射至一目標物之短邊的亮度分佈圖。第6A圖繪示一比較例之發光二極體裝置投射至一目標物之長邊的亮度分佈圖,第6B圖繪示一比較例之發光二極體裝置投射至一目標物之短邊的亮度分佈圖。 4A, 5A illustrate the projection of the LED device 100 of the disclosed embodiment The brightness distribution map to the long side of the target object, and FIGS. 4B and 5B are diagrams showing the brightness distribution of the short side of the object to which the light-emitting diode device 100 of the embodiment of the present invention is projected. 6A is a brightness distribution diagram of a light emitting diode device of a comparative example projected onto a long side of a target object, and FIG. 6B is a view showing a light emitting diode device of a comparative example projected onto a short side of a target object. Brightness distribution map.

在此,目標物係為一矩形,具有長邊與短邊,且長邊垂直於短邊。舉例來說,目標物例如是一長邊:短邊為4:3之矩形。此外,目標物與發光二極體之間的距離約為1公尺,也就是說,發光二極體之投射距離約為1公尺。 Here, the target is a rectangle having a long side and a short side, and the long side is perpendicular to the short side. For example, the target is, for example, a long side: a rectangle with a short side of 4:3. In addition, the distance between the target and the light-emitting diode is about 1 meter, that is, the projection distance of the light-emitting diode is about 1 meter.

第4A、4B圖之發光二極體裝置100,其曲面C1在第二平面上(例如是第2C圖之X-Z平面)的曲率半徑n與在第一平面上(例如是第2B圖之Y-Z平面)的曲率半徑m的比值R(=n/m)為4/3。第5A、5B圖之發光二極體裝置100,其曲面C1在第二平面上(例如是第2C圖之X-Z平面)的曲率半徑n與在第一平面上(例如是第2B圖之Y-Z平面)的曲率半徑m的比值R(=n/m)為5/3。第6A、6B圖之發光二極體裝置係使用傳統的透鏡組進行量測。 In the light-emitting diode device 100 of FIGS. 4A and 4B, the curvature radius n of the curved surface C1 on the second plane (for example, the XZ plane of FIG. 2C) is on the first plane (for example, the YZ plane of FIG. 2B). The ratio R (=n/m) of the radius of curvature m is 4/3. In the light-emitting diode device 100 of FIGS. 5A and 5B, the curvature radius n of the curved surface C1 on the second plane (for example, the XZ plane of FIG. 2C) is on the first plane (for example, the YZ plane of FIG. 2B). The ratio R (=n/m) of the radius of curvature m is 5/3. The light-emitting diode devices of Figs. 6A and 6B are measured using a conventional lens group.

第4A、4B圖之發光二極體裝置100(R=n/m=4/3),其均勻度>63%。第5A、5B圖之發光二極體裝置100(R=n/m=5/3)其均勻度>61%。相對地,第6A、6B圖之發光二極體裝置,由於使用傳統的透鏡組,因此其亮度在周圍部分明顯較中央部分為弱,因此第6A、6B圖之中央部分皆產生了一峰值。也就是說,第4A、4B圖與第5A、5B圖之發光二極體裝置,其射出之光線的均勻度皆明顯大於第6A、6B圖之發光二極體裝置。 The light-emitting diode device 100 of FIGS. 4A and 4B (R=n/m=4/3) has a uniformity of >63%. The light-emitting diode device 100 of FIGS. 5A and 5B (R=n/m=5/3) has a uniformity of >61%. In contrast, in the light-emitting diode device of FIGS. 6A and 6B, since the conventional lens group is used, the brightness is significantly weaker in the peripheral portion than in the central portion, and thus the central portion of the sixth and sixth images has a peak. That is to say, in the light-emitting diode devices of FIGS. 4A and 4B and FIGS. 5A and 5B, the uniformity of the emitted light is significantly larger than that of the light-emitting diode device of FIGS. 6A and 6B.

第7圖繪示本揭露實施例之發光二極體裝置300的立體示意 圖。第8A圖繪示第7圖之發光二極體裝置300的俯視圖。第8B圖為第8A圖之發光二極體裝置100沿D-D’線繪示的剖面圖。 FIG. 7 is a perspective view of a light emitting diode device 300 according to an embodiment of the present disclosure. Figure. FIG. 8A is a plan view showing the light-emitting diode device 300 of FIG. 7. Figure 8B is a cross-sectional view of the light-emitting diode device 100 of Figure 8A taken along line D-D'.

參照第7~8B圖,本揭露實施例之發光二極體裝置300包括一第一晶片61以及一透鏡組70。第一晶片61具有複數個第一子區域,且這些第一子區域可發出至少兩種色溫的光,第一晶片61所發出之光線可混光形成一橢圓型光線。 Referring to FIGS. 7-8B, the LED device 300 of the present disclosure includes a first wafer 61 and a lens group 70. The first wafer 61 has a plurality of first sub-regions, and the first sub-regions can emit light of at least two color temperatures, and the light emitted by the first wafer 61 can be mixed to form an elliptical light.

舉例來說,如第8A圖所示,第一晶片61具有四個第一子區域611、612、613與614,且第一子區域611、612、613與614係呈陣列排列。第一子區域611、612、613與614所發出的光線至少包括一冷白光與一暖白光,例如第一子區域611、614可發出冷白光,第一子區域612、613可發出暖白光。在一實施例中,暖白光例如是3,000K,冷白光例如是6,000K或6,500K。 For example, as shown in FIG. 8A, the first wafer 61 has four first sub-regions 611, 612, 613, and 614, and the first sub-regions 611, 612, 613, and 614 are arranged in an array. The light emitted by the first sub-regions 611, 612, 613 and 614 includes at least a cool white light and a warm white light. For example, the first sub-regions 611, 614 can emit cool white light, and the first sub-regions 612, 613 can emit warm white light. In an embodiment, the warm white light is, for example, 3,000 K, and the cool white light is, for example, 6,000 K or 6,500 K.

然而,本揭露並未限定於此。在其他實施例中,第一子區域611、612、613與614可分別發出紅光(Red)、綠光(Green)、藍光(Blue)與白光(White),或者第一子區域611、612、613與614也可分別發出紅光、綠光、藍光與黃光(Yellow)。在另一實施例中,第一子區域611、612、613與614可分別發出紅光、綠光、暖白光與冷白光。 However, the disclosure is not limited thereto. In other embodiments, the first sub-regions 611, 612, 613, and 614 can respectively emit red, green, blue, and white, or the first sub-regions 611, 612. 613 and 614 can also emit red, green, blue and yellow, respectively. In another embodiment, the first sub-regions 611, 612, 613, and 614 can emit red, green, warm white, and cool white light, respectively.

此外,第一子區域之數量也並未限定於四個。在一實施例中,第一晶片61可具有六個第一子區域,排列成3 x 2的陣列。這些第一子區域可具有兩個第一子區域發出紅光,兩個第一子區域發出綠光,兩個第一子區域發出藍光或白光。 In addition, the number of the first sub-areas is not limited to four. In an embodiment, the first wafer 61 may have six first sub-regions arranged in an array of 3 x 2 . These first sub-regions may have two first sub-regions emitting red light, two first sub-regions emitting green light, and two first sub-regions emitting blue or white light.

本揭露實施例之發光二極體裝置300也可包括一第二晶片 62,第二晶片62具有複數個第二子區域,且這些第二子區域同樣可發出至少兩種色溫的光。 The LED device 300 of the embodiment may also include a second chip. 62. The second wafer 62 has a plurality of second sub-regions, and the second sub-regions can also emit light of at least two color temperatures.

舉例來說,第二晶片62具有四個第二子區域621、622、623與624,且第二子區域621、622、623與624係呈陣列排列。與第一子區域類似,第二子區域621、622、623與624所發出的光線至少包括一冷白光與一暖白光,例如第二子區域621、624可發出暖白光,第二子區域622、623可發出冷白光。在一實施例中,暖白光例如是3,000K,冷白光例如是6,000K或6,500K。 For example, the second wafer 62 has four second sub-regions 621, 622, 623, and 624, and the second sub-regions 621, 622, 623, and 624 are arranged in an array. Similar to the first sub-area, the light emitted by the second sub-areas 621, 622, 623 and 624 includes at least a cool white light and a warm white light, for example, the second sub-areas 621, 624 can emit warm white light, and the second sub-area 622 623 can emit cool white light. In an embodiment, the warm white light is, for example, 3,000 K, and the cool white light is, for example, 6,000 K or 6,500 K.

第9圖繪示本揭露實施例之第一晶片61與第二晶片62投射光線至一目標物90的示意圖。如第9圖所示,目標物90可包括區域E1與區域E2,分別由第一晶片61與第二晶片62之不同的子區域進行投射。在本實施例中,第二子區域621、622、623與624的其中之一係對應於第一子區域611、612、613與614的其中之一,並投射光線至目標物90的相同區域。 FIG. 9 is a schematic view showing the first wafer 61 and the second wafer 62 of the embodiment of the present invention projecting light onto a target 90. As shown in FIG. 9, the object 90 may include a region E1 and a region E2 projected by different sub-regions of the first wafer 61 and the second wafer 62, respectively. In the present embodiment, one of the second sub-regions 621, 622, 623 and 624 corresponds to one of the first sub-regions 611, 612, 613 and 614, and projects light to the same region of the object 90. .

舉例來說,第一子區域611與第二子區域621係投射光線至目標物90的區域E1,而第一子區域612與第二子區域622係投射光線至目標物90的區域E2。在本實施例中,第一子區域612與第二子區域621係發出暖白光,第一子區域611與第二子區域622係發出冷白光。 For example, the first sub-region 611 and the second sub-region 621 project light to the region E1 of the object 90, and the first sub-region 612 and the second sub-region 622 project light to the region E2 of the target 90. In this embodiment, the first sub-region 612 and the second sub-region 621 emit warm white light, and the first sub-region 611 and the second sub-region 622 emit cool white light.

此外,第一晶片61中的各第一子區域611、612、613與614以及第二晶片62中的各第二子區域621、622、623與624係被獨立調控。也就是說,目標物90的區域E1可透過第一子區域611與第二子區域621之調控,達到理想的亮度與色溫,目標物90的區域E2可透過第一子區域 612與第二子區域622之調控,達到理想的亮度與色溫。 In addition, each of the first sub-regions 611, 612, 613, and 614 in the first wafer 61 and each of the second sub-regions 621, 622, 623, and 624 in the second wafer 62 are independently regulated. That is, the region E1 of the target 90 can be adjusted by the first sub-region 611 and the second sub-region 621 to achieve a desired brightness and color temperature, and the region E2 of the target 90 can pass through the first sub-region. The adjustment of 612 and the second sub-region 622 achieves the desired brightness and color temperature.

由於本揭露實施例之發光二極體裝置300的結構設計,使得運用發光二極體裝置300的閃光燈,可對目標(拍攝)物進行分區控制光線。也就是說,透過分區域調光使拍攝之照片達到更接近真實的色彩。 Due to the structural design of the light-emitting diode device 300 of the embodiment of the present disclosure, the target (photographing) object can be used to control the light by using the flash of the light-emitting diode device 300. In other words, through sub-regional dimming, the captured photos are brought closer to the true color.

此外,本揭露實施例之發光二極體裝置300可藉由薄膜發光二極體封裝(Thin Film LED Packaging,TFP)製程調整晶片的形狀,可簡單地將晶片分成複數個子區域。再者,由於同一晶片(例如第一晶片61)中不只發出單一色溫的光線,因此更能進一步地增加拍攝色彩的豐富性。 In addition, the LED device 300 of the embodiment of the present disclosure can adjust the shape of the wafer by a Thin Film LED Packaging (TFP) process, and can simply divide the wafer into a plurality of sub-regions. Moreover, since not only a single color temperature light is emitted from the same wafer (for example, the first wafer 61), the richness of the photographing color can be further increased.

在本揭露實施例中,發光二極體裝置300之第一晶片61中的各第一子區域611、612、613與614中央可具有一間隔區域65(如第8A圖所示)。第一子區域611、612、613與614係為L型,以形成間隔區域65。同樣地,第二晶片62中的各第二子區域621、622、623與624也可為L型,使中央具有間隔區域65。在此處,間隔區域65的形成係防止晶片的中央區域亮度較強,而周圍區域亮度較低,造成投射至目標物的光線亮度不均勻的現象。 In the disclosed embodiment, the center of each of the first sub-regions 611, 612, 613 and 614 in the first wafer 61 of the LED device 300 may have a spacer region 65 (as shown in FIG. 8A). The first sub-regions 611, 612, 613 and 614 are L-shaped to form a spacer region 65. Similarly, each of the second sub-regions 621, 622, 623, and 624 in the second wafer 62 may also be L-shaped with a spacer region 65 in the center. Here, the formation of the spacer region 65 prevents the central region of the wafer from being bright, and the surrounding region is low in brightness, resulting in a phenomenon in which the brightness of the light projected onto the object is not uniform.

然而,本揭露之晶片並未限定於上述形狀。第10圖繪示本發明實施例之另一晶片63的示意圖。如第10圖所示,晶片63包括子區域631、632、633與634,在本實施例中,子區域631、632、633與634係為矩形,且成陣列排列。此外,晶片63之子區域631、632、633與634的中央更包括一遮蔽物80。 However, the wafer of the present disclosure is not limited to the above shape. FIG. 10 is a schematic view of another wafer 63 in accordance with an embodiment of the present invention. As shown in Fig. 10, the wafer 63 includes sub-regions 631, 632, 633 and 634. In the present embodiment, the sub-regions 631, 632, 633 and 634 are rectangular and arranged in an array. In addition, the center of the sub-regions 631, 632, 633 and 634 of the wafer 63 further includes a shield 80.

在一實施例中,遮蔽物80可例如是一反射式擴散片或黑色膜片,且遮蔽物的形狀與結構係依據晶片之形狀以及透鏡組之位置關係而 有所不同,本揭露並未對此加以限定。 In one embodiment, the mask 80 can be, for example, a reflective diffuser or a black patch, and the shape and structure of the mask are based on the shape of the wafer and the positional relationship of the lens groups. This is not the same as this disclosure.

在本揭露實施例中,可藉由塗佈的方式將不同色溫之螢光塗料精確地塗佈於晶片的上方。在一實施例中,也可採用噴霧螢光塗料進行塗佈。 In the disclosed embodiments, different color temperature fluorescent coatings can be accurately applied over the wafer by coating. In one embodiment, the coating can also be applied using a spray phosphor coating.

要注意的是,本揭露實施例之發光二極體裝置將晶片分為複數個子區域,這些子區域係由不同的驅動器(driver)所控制。此外,雖然也可透過設置複數個體積較小的晶片達到類似的成效,然而,體積較小的晶片在製程上較為困難,且容易發生例如是打線斷裂等問題。 It is to be noted that the light emitting diode device of the disclosed embodiment divides the wafer into a plurality of sub-regions which are controlled by different drivers. In addition, although a similar effect can be achieved by providing a plurality of smaller-sized wafers, a smaller-sized wafer is difficult in the manufacturing process, and problems such as wire breakage are liable to occur.

第11A圖繪示本揭露實施例之發光二極體裝置(例如是第8A圖之發光二極體裝置300)投射至一目標物之長邊的亮度分佈圖,第11B圖繪示本揭露實施例之發光二極體裝置(例如是第8A圖之發光二極體裝置300)投射至一目標物之短邊的亮度分佈圖。同樣地,目標物係為一矩形,具有長邊與短邊,且長邊垂直於短邊。舉例來說,目標物例如是一長邊:短邊為4:3之矩形。此外,目標物與發光二極體之間的距離約為1公尺,也就是說,發光二極體之投射距離約為1公尺。 FIG. 11A is a diagram showing a luminance distribution of a light-emitting diode device (for example, the light-emitting diode device 300 of FIG. 8A) projected onto a long side of a target object, and FIG. 11B is a view showing the implementation of the present disclosure. An example of a light-emitting diode device (for example, the light-emitting diode device 300 of FIG. 8A) is projected onto a short-side luminance distribution map of a target. Similarly, the target system is a rectangle having long and short sides, and the long sides are perpendicular to the short sides. For example, the target is, for example, a long side: a rectangle with a short side of 4:3. In addition, the distance between the target and the light-emitting diode is about 1 meter, that is, the projection distance of the light-emitting diode is about 1 meter.

第11A、11B圖之發光二極體裝置300具有一第一晶片61及一第二晶片62,且分別具有可獨立調控之第一子區域611、612、613與614及第二子區域621、622、623與624。 The LED device 300 of FIGS. 11A and 11B has a first wafer 61 and a second wafer 62, and has first sub-regions 611, 612, 613 and 614 and a second sub-region 621 which are independently adjustable. 622, 623 and 624.

相較於第6A、6B圖之傳統的發光二極體裝置,由於其晶片不具有間隔區域,因此其亮度在周圍部分明顯較中央部分為弱,因此第6A、6B圖之中央部分皆產生了一峰值。也就是說,第11A、11B圖之發光二極體裝置,其射出之光線的均勻度皆明顯大於第6A、6B圖之發光二極體裝置。 Compared with the conventional light-emitting diode device of FIGS. 6A and 6B, since the wafer does not have a spacer region, the brightness thereof is significantly weaker in the surrounding portion than in the central portion, so that the central portions of the 6A and 6B images are generated. A peak. That is to say, in the light-emitting diode device of FIGS. 11A and 11B, the uniformity of the emitted light is significantly larger than that of the light-emitting diode device of FIGS. 6A and 6B.

承上述說明,本揭露實施例之發光二極體裝置,由於其結構設計可發出具有橢圓形光形的光線,相較於傳統的發光二極體裝置所發出之圓形光形,光線分布更加地平均。此外,在本揭露之發光二極體可發出不同色溫之光線,在一實施例中,更可對目標拍攝物進行分區控制光線。也就是說,透過分區域調光使拍攝之照片達到更接近真實的色彩。 According to the above description, the light-emitting diode device of the embodiment of the present invention can emit light having an elliptical shape due to its structural design, and the light distribution is more than that of the conventional light-emitting diode device. Average. In addition, in the light emitting diode of the present disclosure, light of different color temperatures can be emitted. In an embodiment, the target subject can be partitioned to control light. In other words, through sub-regional dimming, the captured photos are brought closer to the true color.

綜上所述,雖然本揭露已以實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。因此,本揭露之保護範圍當視後附之申請專利範圍所界定者為準。 In summary, although the disclosure has been disclosed in the above embodiments, it is not intended to limit the invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of protection of this disclosure is subject to the definition of the scope of the appended claims.

100‧‧‧發光二極體裝置 100‧‧‧Lighting diode device

10‧‧‧基板 10‧‧‧Substrate

21‧‧‧第一晶片 21‧‧‧First chip

22‧‧‧第二晶片 22‧‧‧second chip

30‧‧‧透鏡組 30‧‧‧ lens group

40‧‧‧凹部 40‧‧‧ recess

X、Y、Z‧‧‧座標軸 X, Y, Z‧‧‧ coordinate axis

Claims (14)

一種發光二極體裝置,包括:一基板;一第一晶片與一第二晶片,設置於該基板上,分別發出一第一色溫與一第二色溫的光;以及一透鏡組,設置於該第一晶片與該第二晶片上方,該透鏡組包括至少兩個透鏡分別對應該第一晶片與該第二晶片,該透鏡包括:一曲面,該曲面在一第一平面上的曲率半徑為m,該曲面在一第二平面上的曲率半徑為n,其中該第一平面垂直於該第二平面,且m不等於n。 An LED device includes: a substrate; a first wafer and a second wafer disposed on the substrate to respectively emit a first color temperature and a second color temperature; and a lens group disposed on the substrate Above the first wafer and the second wafer, the lens group includes at least two lenses respectively corresponding to the first wafer and the second wafer, the lens comprising: a curved surface having a radius of curvature in a first plane The curved surface has a radius of curvature n on a second plane, wherein the first plane is perpendicular to the second plane, and m is not equal to n. 如申請專利範圍第1項所述之發光二極體裝置,其中該透鏡更包括:一散光結構,對應於該第一晶片與該第二晶片的中心。 The illuminating diode device of claim 1, wherein the lens further comprises: an astigmatism structure corresponding to a center of the first wafer and the second wafer. 如申請專利範圍第2項所述之發光二極體裝置,其中該散光結構為一凹部,該凹部相對於該曲面。 The illuminating diode device of claim 2, wherein the astigmatism structure is a recess, the recess being opposite to the curved surface. 如申請專利範圍第1項所述之發光二極體裝置,其中n/m=R,且R介於1.2~20。 The light-emitting diode device according to claim 1, wherein n/m=R and R is between 1.2 and 20. 如申請專利範圍第1項所述之發光二極體裝置,其中該透鏡組更包括:一支撐部,用以在該基板與該透鏡組之間形成一容置空間,使該第一晶片與該第二晶片設置於該容置空間。 The illuminating diode device of claim 1, wherein the lens group further comprises: a supporting portion for forming an accommodating space between the substrate and the lens group, so that the first wafer and the first wafer The second wafer is disposed in the accommodating space. 如申請專利範圍第1項所述之發光二極體裝置,更包括:一反射結構,設置於該基板與該透鏡組之間,其中該第一晶片與該第二晶片係設置於該反射結構中。 The illuminating diode device of claim 1, further comprising: a reflective structure disposed between the substrate and the lens group, wherein the first wafer and the second wafer are disposed on the reflective structure in. 如申請專利範圍第1項所述之發光二極體裝置,其中該第一色溫為一暖白光,該第二色溫為一冷白光。 The illuminating diode device of claim 1, wherein the first color temperature is a warm white light, and the second color temperature is a cool white light. 如申請專利範圍第1項所述之發光二極體裝置,該第一晶片或該第二晶片或其組合所發出的光,經過該透鏡組於一目標區域呈橢圓形光形。 The light-emitting diode device according to claim 1, wherein the light emitted by the first wafer or the second wafer or a combination thereof passes through the lens group in an elliptical shape in a target region. 一種發光二極體裝置,包括:一第一晶片,具有複數個第一子區域,該些第一子區域發出至少兩種色溫的光;以及一透鏡組,設置於該第一晶片上;其中該第一晶片發出的光線經該透鏡組於一目標區域形成一橢圓形光形。 A light emitting diode device comprising: a first wafer having a plurality of first sub-regions, the first sub-regions emitting light of at least two color temperatures; and a lens group disposed on the first wafer; wherein The light emitted by the first wafer forms an elliptical shape through a lens group in a target area. 如申請專利範圍第9項所述之發光二極體裝置,更包括:一第二晶片,具有複數個第二子區域,該些第二子區域發出至少兩種色溫的光;其中該些第二子區域的其中之一係對應於該些第一子區域的其中之一,並投射光線至一相同區域。 The illuminating diode device of claim 9, further comprising: a second wafer having a plurality of second sub-regions emitting at least two color temperature lights; wherein the plurality of One of the two sub-regions corresponds to one of the first sub-regions and projects light to a same region. 如申請專利範圍第9項所述之發光二極體裝置,其中該些第一子區域係呈陣列排列。 The illuminating diode device of claim 9, wherein the first sub-regions are arranged in an array. 如申請專利範圍第9項所述之發光二極體裝置,其中該 些第一子區域之中央具有一間隔區域。 The illuminating diode device of claim 9, wherein the The center of the first sub-regions has a spacing region. 如申請專利範圍第12項所述之發光二極體裝置,其中該些第一子區域為L型,以形成該間隔區域。 The illuminating diode device of claim 12, wherein the first sub-regions are L-shaped to form the spacer region. 如申請專利範圍第9項所述之發光二極體裝置,更包括:一遮蔽物,設置於該些第一子區域的中央。 The illuminating diode device of claim 9, further comprising: a shielding disposed at a center of the first sub-regions.
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TWI610470B (en) * 2016-06-13 2018-01-01 隆達電子股份有限公司 Light emitting diode chip scale packaging structure, direct type backlight module, and method for manufacturing light emitting device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI610470B (en) * 2016-06-13 2018-01-01 隆達電子股份有限公司 Light emitting diode chip scale packaging structure, direct type backlight module, and method for manufacturing light emitting device

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