TWI525225B - Electrolyte for electrodepositing molybdenum and method for forming molybdenum-containing layer - Google Patents

Electrolyte for electrodepositing molybdenum and method for forming molybdenum-containing layer Download PDF

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TWI525225B
TWI525225B TW102141462A TW102141462A TWI525225B TW I525225 B TWI525225 B TW I525225B TW 102141462 A TW102141462 A TW 102141462A TW 102141462 A TW102141462 A TW 102141462A TW I525225 B TWI525225 B TW I525225B
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molybdenum
electrolyte
forming
zinc chloride
plating layer
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TW201518560A (en
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楊肇政
江亞承
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國立雲林科技大學
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鍍鉬電解質及形成含鉬鍍層方法 Molybdenum-plated electrolyte and method for forming molybdenum-containing coating

本發明是有關於一種鍍鉬電解質及形成含鉬鍍層方法,且特別是有關於一種非水溶液鍍鉬電解質及使用此非水溶液鍍鉬電解質的形成含鉬鍍層方法。 The invention relates to a molybdenum-plated electrolyte and a method for forming a molybdenum-containing plating layer, and in particular to a non-aqueous solution molybdenum-plating electrolyte and a method for forming a molybdenum-containing plating layer using the non-aqueous solution molybdenum-plating electrolyte.

鉬金屬為高熔點耐火金屬之一,其具有良好的導電性、導熱性、低的熱膨脹係數(與電子管用玻璃相近)、高硬度等。在零組件方面,鉬及鉬合金還擁有較鎢易於加工的優勢,因此常用添加於板、帶、箔、管、棒、線和型材等在電子管(柵極和陽極)、電光源(支撐材料)零件,金屬加工工具(壓鑄和擠壓模、鍛模、穿孔頂頭、液態金屬濾篩)及渦輪盤等部件的生產。在航太方面,鉬合金可發揮耐壓及耐腐蝕之特點,可作為太空梭與飛機之零組件。 Molybdenum metal is one of high melting point refractory metals, which has good electrical conductivity, thermal conductivity, low coefficient of thermal expansion (similar to glass for electron tubes), high hardness, and the like. In terms of components, molybdenum and molybdenum alloys have advantages over tungsten, so they are often added to plates, strips, foils, tubes, rods, wires and profiles in tubes (gates and anodes), and electric sources (support materials). ) Production of parts, metalworking tools (die-casting and extrusion dies, forging dies, perforated plugs, liquid metal screens) and turbine discs. In terms of aerospace, molybdenum alloys can withstand pressure and corrosion resistance and can be used as components for space shuttles and aircraft.

另外在半導體方面可應用於光刻電鑄模造(德文為Lithographie Galvanoformung Abformung,LIGA)製程,雖然此製程已工業化許多商品,但都局限於以水溶液電沉積出的金屬如銅、金、鎳和鎳鐵合金。近年來耐火金屬被 期望應用在此製程上面,有助於提高微機電系統的性能和可靠性。 In addition, it can be applied to the lithography electroforming (German Lithographie Galvanoformung Abformung, LIGA) process. Although this process has been industrialized, it is limited to metals deposited by aqueous solution such as copper, gold, nickel and Nickel-iron alloy. Refractory metal has been It is expected that the application will be applied to this process to help improve the performance and reliability of the MEMS.

目前沉積鉬之技術包括電化學沉積、氣相沉積 (PVD、CVD)、蒸鍍、濺鍍、離子注入、噴塗、無電電鍍及熔膠一凝膠等方法,其中,電化學沉積因具有簡單的設備、沉積溫度低、沉積速率高、設備價格低、操作學習易等優點,並可適用於工業上大面積製作,而引起廣泛研究。 Current techniques for depositing molybdenum include electrochemical deposition, vapor deposition (PVD, CVD), evaporation, sputtering, ion implantation, spray coating, electroless plating, and melt-gel, among which electrochemical deposition has simple equipment, low deposition temperature, high deposition rate, and low equipment cost. It is easy to operate and learn, and can be applied to large-scale production in the industry, which has led to extensive research.

電化學沉積技術可依其所使用的電解質種類區分為水溶液電解及非水溶液電解,水溶液電解易在電解過程中產生有毒物質如氰化物等,此外,許多金屬在水溶液中的還原電位小於氫標準電位,而無法以水溶液電解進行沉積,例如鉬、鎢等高熔點金屬。非水溶液電解大多以熔融鹽作為電解質,相較於水溶液電解質,熔融鹽電解質具有高電解效率與高沉積率,且可形成耐蝕性良好的鍍層。 Electrochemical deposition technology can be divided into aqueous solution electrolysis and non-aqueous solution electrolysis according to the type of electrolyte used. Electrolyte electrolysis is easy to produce toxic substances such as cyanide in the electrolysis process. In addition, the reduction potential of many metals in aqueous solution is less than the hydrogen standard potential. It is impossible to deposit by aqueous solution electrolysis, such as a high melting point metal such as molybdenum or tungsten. In the non-aqueous solution electrolysis, a molten salt is often used as an electrolyte, and the molten salt electrolyte has a high electrolysis efficiency and a high deposition rate as compared with the aqueous solution electrolyte, and a plating layer having good corrosion resistance can be formed.

學者Senderoff及Mellors以鹼金屬氧化物於700℃至850℃下沉積鉬,Girginov、Tzvetkoff及Bojinov以氟氯化物於500℃下沉積金屬鉬,近年來更有學者以200℃至350℃的溫度沉積出金屬鉬,惟前述電化學沉積所需之溫度仍偏高,導致電化學沉積所耗費的能源無法有效降低,而致使沉積鉬的成本高居不下。 Scholars Senderoff and Mellors deposited molybdenum with alkali metal oxide at 700 ° C to 850 ° C. Girginov, Tzvetkoff and Bojinov deposited metal molybdenum with fluorochloride at 500 ° C. In recent years, scholars have deposited at temperatures between 200 ° C and 350 ° C. The metal molybdenum is formed, but the temperature required for the electrochemical deposition is still high, and the energy consumed by the electrochemical deposition cannot be effectively reduced, so that the cost of depositing molybdenum is high.

因此,本發明之一目的是提供一種鍍鉬電解質,其為非水溶液電解質,且可在溫度小於、等於130℃條件下進 行電化學反應以形成含鉬鍍層,藉此,可節省能源、避免高溫腐蝕,以及可避免基材受熱變形或損壞。 Accordingly, it is an object of the present invention to provide a molybdenum-plated electrolyte which is a non-aqueous electrolyte and which can be subjected to a temperature of less than or equal to 130 ° C. An electrochemical reaction is performed to form a molybdenum-containing coating, thereby saving energy, avoiding high temperature corrosion, and avoiding thermal deformation or damage of the substrate.

本發明之另一目的是提供一種形成含鉬鍍層方法,此形成含鉬鍍層方法係採用前述的鍍鉬電解質,藉此,除了可節省能源、避免高溫腐蝕、可操作性強與避免基材受熱變形或損壞,並可提升含鉬鍍層的品質。 Another object of the present invention is to provide a method for forming a molybdenum-containing plating layer, wherein the method for forming a molybdenum-containing plating layer uses the aforementioned molybdenum-plated electrolyte, thereby saving energy, avoiding high temperature corrosion, being highly operable, and avoiding heat of the substrate. Deformed or damaged, and can improve the quality of the molybdenum-containing coating.

依據本發明之一態樣之一實施方式是在提供一種鍍鉬電解質,排除含氟鹽類,鍍鉬電解質包含0.01莫耳百分比至1莫耳百分比的五氯化鉬(MoCl5)、0.01莫耳百分比至25莫耳百分比的氯化鋅(ZnCl2)以及剩餘量的二甲基碸(C2H6O2S,DMSO2)。 One embodiment according to an aspect of the present invention provides a molybdenum-plated electrolyte that excludes fluorine-containing salts, and the molybdenum-plated electrolyte contains 0.01 mol% to 1 mol% of molybdenum pentachloride (MoCl 5 ), 0.01 mol. The percentage of ears is up to 25 mole percent zinc chloride (ZnCl 2 ) and the remaining amount of dimethyl hydrazine (C 2 H 6 O 2 S, DMSO 2 ).

依據本發明之另一態樣之一實施方式是在提供一種形成含鉬鍍層方法,包含以下步驟:提供五氯化鉬、氯化鋅與二甲基碸、進行一除水步驟、形成一鍍鉬電解質與進行一電化學反應。進行除水步驟係將五氯化鉬、氯化鋅與二甲基碸置於真空環境下,持續加熱一段時間,使五氯化鉬、氯化鋅與二甲基碸的水份含量在2wt%以下。形成一鍍鉬電解質係將五氯化鉬、氯化鋅與二甲基碸均勻混合,其中鍍鉬電解質排除含氟鹽類,鍍鉬電解質包含0.01莫耳百分比至1莫耳百分比的五氯化鉬、0.01莫耳百分比至25莫耳百分比的氯化鋅以及剩餘量的二甲基碸。進行電化學反應係用以形成一含鉬鍍層。 According to another embodiment of the present invention, there is provided a method of forming a molybdenum-containing plating layer comprising the steps of: providing molybdenum pentachloride, zinc chloride and dimethyl hydrazine, performing a water removal step, forming a plating The molybdenum electrolyte is subjected to an electrochemical reaction. The water removal step is carried out by placing molybdenum pentachloride, zinc chloride and dimethyl hydrazine in a vacuum environment for a period of time, so that the moisture content of molybdenum pentachloride, zinc chloride and dimethyl hydrazine is 2 wt. %the following. Forming a molybdenum-plated electrolyte system uniformly mixing molybdenum pentachloride, zinc chloride and dimethyl ruthenium, wherein the molybdenum-plated electrolyte excludes fluorine-containing salts, and the molybdenum-plated electrolyte contains 0.01 mol% to 1 mol% of pentachlorinated Molybdenum, 0.01 mole percent to 25 mole percent zinc chloride and the remaining amount of dimethylhydrazine. The electrochemical reaction is performed to form a molybdenum-containing coating.

依據前述之形成含鉬鍍層方法,除水步驟可於25℃至120℃進行12小時至72小時。形成鍍鉬電解質的步驟 可於氮氣氛圍下以110℃至150℃進行。進行電化學反應的步驟可於氮氣氛圍下以115℃至130℃進行。 According to the foregoing method for forming a molybdenum-containing plating layer, the water removal step can be carried out at 25 ° C to 120 ° C for 12 hours to 72 hours. Step of forming a molybdenum-plated electrolyte It can be carried out at 110 ° C to 150 ° C under a nitrogen atmosphere. The step of performing the electrochemical reaction can be carried out at 115 ° C to 130 ° C under a nitrogen atmosphere.

依據前述之形成含鉬鍍層方法,其中進行電化學反應的步驟可使用交流電、直流電或脈衝電,電壓範圍可為10V至-10V、電流密度範圍可為±0.1mA/cm2至±200mA/cm2,且通電量範圍可為1C/cm2至250C/cm2According to the foregoing method for forming a molybdenum-containing plating layer, wherein the step of performing the electrochemical reaction may use alternating current, direct current or pulsed electricity, the voltage may range from 10V to -10V, and the current density may range from ±0.1mA/cm 2 to ±200mA/cm. 2, and the energization amount may range from 1C / cm 2 to 250C / cm 2.

依據前述之形成含鉬鍍層方法,其中進行電化學反應的步驟係使用脈衝電,且脈衝電的操作條件可為Ton/(Ton+Toff)=0.1至0.9。 According to the foregoing method for forming a molybdenum-containing plating layer, the step of performing the electrochemical reaction is pulsed electricity, and the operating condition of the pulsed electricity may be T on /(T on +T off )=0.1 to 0.9.

110‧‧‧步驟 110‧‧‧Steps

120‧‧‧步驟 120‧‧‧Steps

130‧‧‧步驟 130‧‧‧Steps

140‧‧‧步驟 140‧‧‧Steps

210‧‧‧鍍鉬電解質 210‧‧‧Molybdenum-plated electrolyte

220‧‧‧陰極 220‧‧‧ cathode

230‧‧‧陽極 230‧‧‧Anode

240‧‧‧參考電極 240‧‧‧ reference electrode

241‧‧‧鋅線 241‧‧‧Zinc wire

242‧‧‧含鋅電解質 242‧‧‧Zinc-containing electrolyte

243‧‧‧玻璃管 243‧‧‧ glass tube

250‧‧‧熱電偶溫度計 250‧‧‧ Thermocouple Thermometer

260‧‧‧氣體填充口 260‧‧‧ gas filling port

270‧‧‧氣體排出口 270‧‧‧ gas discharge

280‧‧‧反應槽 280‧‧‧Reaction tank

第1圖係繪示依照本發明一實施方式的形成含鉬鍍層方法的步驟流程圖。 1 is a flow chart showing the steps of forming a molybdenum-containing plating layer according to an embodiment of the present invention.

第2圖係繪示依照本發明一實施方式的形成含鉬鍍層方法所使用的電化學系統示意圖。 2 is a schematic view showing an electrochemical system used in a method of forming a molybdenum-containing plating layer according to an embodiment of the present invention.

第3圖係依照本發明的實施例1的SEM圖。 Figure 3 is an SEM image of Example 1 in accordance with the present invention.

第4圖係依照本發明的實施例2的SEM圖。 Figure 4 is an SEM image of Example 2 in accordance with the present invention.

第5圖係比較例1的SEM圖。 Fig. 5 is an SEM image of Comparative Example 1.

第6圖係比較例2的SEM圖。 Fig. 6 is an SEM image of Comparative Example 2.

第7圖係比較例3的SEM圖。 Fig. 7 is an SEM image of Comparative Example 3.

鍍鉬電解質Molybdenum plating electrolyte

鍍鉬電解質包含五氯化鉬、氯化鋅以及剩餘量的二甲基碸。 The molybdenum-plated electrolyte contains molybdenum pentachloride, zinc chloride, and the remaining amount of dimethylhydrazine.

具體言之,鍍鉬電解質係以二甲基碸作為溶劑,此外,二甲基碸的含量會隨鍍鉬電解質中其他成分的含量總和而改變,在其他成分存在的情況下,添加二甲基碸使鍍鉬電解質的含量為100莫耳百分比。 Specifically, the molybdenum-plated electrolyte uses dimethylhydrazine as a solvent, and the content of dimethylhydrazine varies depending on the total content of other components in the molybdenum-plated electrolyte. In the presence of other components, dimethyl group is added. The content of the molybdenum-plated electrolyte is 100% by mole.

鍍鉬電解質中,五氯化鉬的含量為0.01莫耳百分比至1莫耳百分比。當五氯化鉬的含量小於0.01莫耳百分比,鍍鉬電解質中的鉬離子濃度過低,將造成反應速率下降,不利含鉬鍍層的生成。當鉬離子濃度越高,溶液導電度將越高,有利於鉬離子在溶液中傳導,進而加快反應速率,理論上應於當下溫度添加五氯化鉬達到飽和作為最佳之含量,然而,五氯化鉬的添加量越高,所需溶解時間將越長。考量到溶解量與溶解時間之效益比,最後選擇溶解時間≦1hr(磁石攪拌≧215rpm)內之最大濃度作為鍍鉬電解質中五氯化鉬的含量。 In the molybdenum-plated electrolyte, the content of molybdenum pentachloride is from 0.01 mol% to 1 mol%. When the content of molybdenum pentachloride is less than 0.01 mol%, the concentration of molybdenum ions in the molybdenum-plated electrolyte is too low, which will cause a decrease in the reaction rate, which is disadvantageous for the formation of the molybdenum-containing coating. When the concentration of molybdenum ions is higher, the conductivity of the solution will be higher, which is beneficial to the conduction of molybdenum ions in the solution, thereby accelerating the reaction rate. Theoretically, it is necessary to add molybdenum pentachloride to the current temperature to achieve the optimum content. However, The higher the amount of molybdenum chloride added, the longer the required dissolution time will be. Considering the benefit ratio of dissolution amount to dissolution time, the maximum concentration in the dissolution time ≦1 hr (magnet stirring ≧215 rpm) was selected as the content of molybdenum pentachloride in the molybdenum-plated electrolyte.

鍍鉬電解質中,氯化鋅的含量為0.01莫耳百分比至25莫耳百分比,藉由添加氯化鋅有助於改善含鉬鍍層的品質,例如,可提升含鉬鍍層的平整性、鉬含量、厚度、沉積速率與耐腐蝕性(保護效率較高)。當氯化鋅的含量小於0.01莫耳百分比,則改善含鉬鍍層品質的效果有限,當氯化鋅的含量大於25莫耳百分,則會使含鉬鍍層中的鋅含量大幅提高(生成Zn-W合金)。 In the molybdenum-plated electrolyte, the content of zinc chloride is from 0.01 mol% to 25 mol%, and the addition of zinc chloride helps to improve the quality of the molybdenum-containing coating, for example, improves the flatness and molybdenum content of the molybdenum-containing coating. , thickness, deposition rate and corrosion resistance (higher protection efficiency). When the content of zinc chloride is less than 0.01 mol%, the effect of improving the quality of the molybdenum-containing coating is limited. When the content of zinc chloride is more than 25 mol%, the zinc content in the molybdenum-containing coating is greatly increased (formation of Zn) -W alloy).

形成含銅鍍層方法Method for forming a copper-containing plating layer

請參照第1圖,其係繪示依照本發明一實施方式的形成含鉬鍍層方法的步驟流程圖。 Please refer to FIG. 1 , which is a flow chart showing the steps of forming a molybdenum-containing plating layer according to an embodiment of the present invention.

步驟110為提供五氯化鉬、氯化鋅與二甲基碸。 Step 110 is to provide molybdenum pentachloride, zinc chloride and dimethyl hydrazine.

步驟120為進行一除水步驟,係將五氯化鉬、氯化鋅與二甲基碸置於真空環境下,持續加熱一段時間,使五氯化鉬、氯化鋅與二甲基碸的水份含量在2wt%以下。具體言之,進行步驟120,係將五氯化鉬、氯化鋅與二甲基碸置於真空環境中,在真空度為1Pa,於25℃至120℃進行12小時至72小時,使五氯化鉬、氯化鋅與二甲基碸的水份含量在2wt%以下。前述水份含量測定可使用卡式水分測定儀(Karl-Fischer Titrator,購自瑞士商梅特勒托利多公司(Mettler-Toledo Pac Rim AG),型號為DL 31/38)。 Step 120 is a water removal step of placing molybdenum pentachloride, zinc chloride and dimethyl hydrazine in a vacuum environment for a period of time to make molybdenum pentachloride, zinc chloride and dimethyl hydrazine. The moisture content is below 2% by weight. Specifically, in step 120, molybdenum pentachloride, zinc chloride and dimethyl hydrazine are placed in a vacuum environment at a vacuum of 1 Pa at 25 ° C to 120 ° C for 12 hours to 72 hours to make five The moisture content of molybdenum chloride, zinc chloride and dimethylhydrazine is 2% by weight or less. The aforementioned moisture content measurement can be carried out using a card type moisture analyzer (Karl-Fischer Titrator, available from Mettler-Toledo Pac Rim AG, model DL 31/38).

步驟130為形成一鍍鉬電解質,係將前述除過水的五氯化鉬、氯化鋅與二甲基碸均勻混合,以形成鍍鉬電解質。關於鍍鉬電解質的成份請參照前文,在此不予贅述。具體言之,步驟130可在氮氣氛圍下,例如可在抽真空並填充氮氣的手套箱中進行,將二甲基碸置放於電磁攪拌加熱器上加熱熔化,再將五氯化鉬與氯化鋅加入二甲基碸中並置放於電磁攪拌加熱器上加熱,以磁石攪拌,待均勻混合即可。依據本發明一實施例係將溫度設定為110℃至150℃,加熱0.01小時至12小時。 Step 130 is to form a molybdenum-plated electrolyte by uniformly mixing the above-mentioned water-containing molybdenum pentachloride, zinc chloride and dimethyl hydrazine to form a molybdenum-plated electrolyte. Please refer to the above for the composition of the molybdenum-plated electrolyte, and will not be repeated here. Specifically, the step 130 can be carried out under a nitrogen atmosphere, for example, in a glove box which is evacuated and filled with nitrogen, and the dimethyl hydrazine is placed on an electromagnetic stirring heater to be heated and melted, and then molybdenum pentoxide and chlorine are added. The zinc is added to the dimethyl hydrazine and placed on an electromagnetic stirring heater to be heated, stirred by a magnet, and uniformly mixed. According to an embodiment of the invention, the temperature is set to 110 ° C to 150 ° C and heated for 0.01 to 12 hours.

步驟140為進行電化學反應,藉此可形成一含鉬鍍層。 Step 140 is to carry out an electrochemical reaction whereby a molybdenum-containing coating can be formed.

請同時參照第2圖,其係繪示依照本發明一實施方式的形成含鉬鍍層方法所使用的電化學系統示意圖。第2圖中,電化學系統包含陰極220、陽極230、參考電極240、熱電偶溫度計250、氣體填充口260、氣體排出口270、反應槽280以及鍍鉬電解質210。 Please also refer to FIG. 2, which is a schematic diagram showing an electrochemical system used in the method of forming a molybdenum-containing plating layer according to an embodiment of the present invention. In the second diagram, the electrochemical system includes a cathode 220, an anode 230, a reference electrode 240, a thermocouple thermometer 250, a gas filling port 260, a gas discharge port 270, a reaction tank 280, and a molybdenum-plated electrolyte 210.

氣體排出口270可包含氣體冷凝裝置(圖未揭示)。反應槽280的材料可為派熱克司(Pyrex)玻璃或坩鍋等容器。陰極220可為不銹鋼、銅及鎳等金屬,在本實施例中是使用不銹鋼線(SS304,直徑0.6mm)。參考電極240包含鋅線241、含鋅電解質242與玻璃管243,玻璃管243的底部塞有多孔玻璃(圖未揭示),可將含鋅電解質242與鍍鉬電解質210隔開。參考電極240的組裝方式如下:先於手套箱中配製含鋅電解質242,含鋅電解質242的成份為DMSO2:ZnCl2=50mole%:50mole%,將含鋅電解質242放入玻璃管243中,再將鋅線241的一端放入玻璃管243中並浸泡入含鋅電解質242中,鋅線241浸泡入含鋅電解質242的一端可捲曲為螺旋狀(圖未揭示),藉此可增加鋅線241與含鋅電解質242的接觸面積。陽極230可為鉬棒或鉑金等惰性電極,在本實施例中採用鉬棒(直徑6mm)。 The gas discharge port 270 may include a gas condensing device (not shown). The material of the reaction tank 280 may be a container such as Pyrex glass or a crucible. The cathode 220 may be a metal such as stainless steel, copper or nickel, and in the present embodiment, a stainless steel wire (SS304, diameter 0.6 mm) is used. The reference electrode 240 includes a zinc wire 241, a zinc-containing electrolyte 242, and a glass tube 243. The bottom of the glass tube 243 is filled with porous glass (not shown) to separate the zinc-containing electrolyte 242 from the molybdenum-plated electrolyte 210. The reference electrode 240 is assembled in the following manner: a zinc-containing electrolyte 242 is prepared in a glove box. The composition of the zinc-containing electrolyte 242 is DMSO 2 : ZnCl 2 = 50 mole%: 50 mole%, and the zinc-containing electrolyte 242 is placed in the glass tube 243. Then, one end of the zinc wire 241 is placed in the glass tube 243 and immersed in the zinc-containing electrolyte 242, and one end of the zinc wire 241 soaked into the zinc-containing electrolyte 242 can be curled into a spiral shape (not shown), thereby increasing the zinc wire. The contact area of 241 with the zinc-containing electrolyte 242. The anode 230 may be an inert electrode such as a molybdenum rod or platinum, and a molybdenum rod (diameter: 6 mm) is used in this embodiment.

具體言之,進行步驟140時,首先進行電化學系統的組裝:將鍍鉬電解質210加入反應槽280中,並插入陰極220、陽極230、參考電極240、熱電偶溫度計250,再由氣體填充口260填充氮氣至鍍鉬電解質210中,以去除水份及氧氣,而陰極220即為電解鍍鉬之基材。 Specifically, when step 140 is performed, the electrochemical system is first assembled: the molybdenum-doped electrolyte 210 is added to the reaction tank 280, and the cathode 220, the anode 230, the reference electrode 240, the thermocouple thermometer 250, and the gas filling port are inserted. 260 is filled with nitrogen into the molybdenum-doped electrolyte 210 to remove moisture and oxygen, and the cathode 220 is a substrate for electrolytically molybdenum plating.

完成電化學系統的組裝後,將陰極220、陽極230、參考電極240接上電源後,便可藉由電化學反應於陰極220上形成含鉬鍍層。 After the assembly of the electrochemical system is completed, after the cathode 220, the anode 230, and the reference electrode 240 are connected to the power source, a molybdenum-containing plating layer can be formed on the cathode 220 by electrochemical reaction.

前述電源可提供交流電、直流電或脈衝電,較佳為直流電,更佳為脈衝電。 The foregoing power source can provide alternating current, direct current or pulsed electric power, preferably direct current, more preferably pulsed electric.

進行電化學反應的溫度可為115℃至130℃。 The temperature at which the electrochemical reaction is carried out may be from 115 ° C to 130 ° C.

進行電化學反應的電壓範圍可為10V至-10V,較佳為-0.5V。 The voltage for performing the electrochemical reaction may range from 10V to -10V, preferably -0.5V.

進行電化學反應的電流密度範圍可為±0.1mA/cm2至±200mA/cm2,較佳為±5mA/cm2至±20mA/cm2The current density for performing the electrochemical reaction may range from ±0.1 mA/cm 2 to ±200 mA/cm 2 , preferably from ±5 mA/cm 2 to ±20 mA/cm 2 .

進行電化學反應的通電量範圍可為1C/cm2至250C/cm2,較佳為10C/cm2至225C/cm2,更佳為25C/cm2Through an electrochemical reaction amount may range from 1C / cm 2 to 250C / cm 2, preferably 10C / cm 2 to 225C / cm 2, more preferably 25C / cm 2.

當進行電化學反應使用脈衝電時,脈衝電的操作條件可為Ton/(Ton+Toff)=0.1至0.9,較佳為Ton/(Ton+Toff)=0.25至0.75,更佳為Ton/(Ton+Toff)=0.75。 When the electrochemical reaction is performed using pulsed electricity, the operating condition of the pulsed electricity may be T on /(T on +T off )=0.1 to 0.9, preferably Ton /(T on +T off )=0.25 to 0.75, More preferably, T on /(T on +T off ) = 0.75.

根據上述實施方式,以下提出具體實施例與對照例予以詳細說明。 According to the above embodiment, specific examples and comparative examples will be described in detail below.

實施例1~2與比較例1~3Examples 1 to 2 and Comparative Examples 1 to 3

依照表一之成份與用量,將五氯化鉬、氯化鋅與二甲基碸置於真空環境下,持續加熱一段時間,使五氯化鉬、氯化鋅與二甲基碸的水份含量在2wt%以下,再將前述除過水的五氯化鉬、氯化鋅與二甲基碸均勻混合,以形成實施例1~2以及比較例1~3的鍍鉬電解質。 According to the composition and dosage of Table 1, the molybdenum pentachloride, zinc chloride and dimethyl hydrazine are placed in a vacuum environment and heated for a period of time to make the moisture of molybdenum pentachloride, zinc chloride and dimethylhydrazine. The content was 2 wt% or less, and the above-described water-removed molybdenum pentachloride, zinc chloride and dimethyl hydrazine were uniformly mixed to form the molybdenum-plated electrolytes of Examples 1 to 2 and Comparative Examples 1 to 3.

將實施例1、實施例2與比較例2的鍍鉬電解質放入前述的電化學系統,以脈衝電進行電化學反應以形成含鉬鍍層,其中電化學反應的操作溫度為130℃、還原電壓為-0.5V且Ton/(Ton+Toff)=0.75。 The molybdenum-plated electrolytes of Example 1, Example 2 and Comparative Example 2 were placed in the aforementioned electrochemical system, and electrochemically reacted by pulsed electricity to form a molybdenum-containing plating layer, wherein the electrochemical reaction was operated at a temperature of 130 ° C and a reduction voltage. It is -0.5 V and T on /(T on +T off ) = 0.75.

將比較例1的鍍鉬電解質放入前述的電化學系統,以脈衝電進行電化學反應以形成含鉬鍍層,其中電化學反應的操作溫度為130℃、還原電壓為-0.5V且Ton/(Ton+Toff)=0.5。 The molybdenum-plated electrolyte of Comparative Example 1 was placed in the aforementioned electrochemical system, and electrochemically reacted by pulsed electricity to form a molybdenum-containing plating layer, wherein the electrochemical reaction was operated at a temperature of 130 ° C, a reduction voltage of -0.5 V, and Ton / (T on +T off )=0.5.

將比較例3的鍍鉬電解質放入前述的電化學系統,以脈衝電進行電化學反應以形成含鉬鍍層,其中電化學反應的操作溫度為110℃、還原電壓為-0.5V且Ton/(Ton+Toff)=0.75。 The molybdenum-plated electrolyte of Comparative Example 3 was placed in the aforementioned electrochemical system, and electrochemically reacted by pulsed electricity to form a molybdenum-containing plating layer in which the operating temperature of the electrochemical reaction was 110 ° C, the reduction voltage was -0.5 V, and Ton / (T on +T off ) = 0.75.

SEM結果SEM results

使用SEM(型號為Jeol JSM-6700F)分別觀察實施例1~2與比較例1~3含鉬鍍層的表面型態,結果如第3圖至第7圖所示,第3圖與第4圖係分別為依照本發明的實施例1 與實施例2的SEM圖,第5圖至第7圖係分別為比較例1、比較例2與比較例3的SEM圖,其中,第3圖至第7圖中的(a)圖,放大倍率為10000倍,第3圖至第7圖中的(b)圖,放大倍率為50000。 The surface morphology of the molybdenum-containing coating layers of Examples 1 and 2 and Comparative Examples 1 to 3 was observed using an SEM (Model: Jeol JSM-6700F), and the results are shown in Figs. 3 to 7 and Figs. 3 and 4 Is respectively according to embodiment 1 of the present invention With respect to the SEM image of Example 2, FIGS. 5 to 7 are SEM images of Comparative Example 1, Comparative Example 2, and Comparative Example 3, respectively, wherein (a) of FIG. 3 to FIG. 7 are enlarged. The magnification is 10,000 times, and the figure (b) in FIGS. 3 to 7 has a magnification of 50,000.

由第3圖至第6圖可知,當鍍鉬電解質中添加適量的氯化鋅時,所形成的含鉬鍍層無裂痕,具有較佳的平整性,且可形成晶粒,由第3圖可看出實施例1的晶粒粒徑為0.1μm至0.2μm,由第4圖可看出實施例2的晶粒粒徑為0.15μm至0.3μm。當鍍鉬電解質中未添加氯化鋅時,含鉬鍍層的表面易產生裂痕,且晶粒不明顯。當鍍鉬電解質中的氯化鋅添加過量時,含鉬鍍層的表面粗糙且不均勻,無晶粒產生。 It can be seen from Fig. 3 to Fig. 6 that when an appropriate amount of zinc chloride is added to the molybdenum-plated electrolyte, the formed molybdenum-containing coating has no cracks, has good flatness, and can form crystal grains, which can be formed by Fig. 3 It is seen that the grain size of Example 1 is from 0.1 μm to 0.2 μm, and it can be seen from Fig. 4 that the grain size of Example 2 is from 0.15 μm to 0.3 μm. When zinc chloride is not added to the molybdenum-plated electrolyte, the surface of the molybdenum-containing coating is liable to be cracked and the crystal grains are not conspicuous. When the zinc chloride in the molybdenum-plated electrolyte is excessively added, the surface of the molybdenum-containing plating layer is rough and uneven, and no crystal grains are generated.

請同時比較實施例2與比較例3,當電化學反應的操作溫度為130℃,所形成的含鉬鍍層無裂痕,具有較佳的平整性,且可形成晶粒,當電化學反應的操作溫度為110℃,所形成的含鉬鍍層表面不平整且裂痕變多。 Please compare Example 2 with Comparative Example 3 at the same time. When the operating temperature of the electrochemical reaction is 130 ° C, the formed molybdenum-containing coating has no cracks, has good flatness, and can form crystal grains when the operation of electrochemical reaction At a temperature of 110 ° C, the surface of the molybdenum-containing coating formed is uneven and the cracks are increased.

能量分散光譜儀量測結果Energy dispersive spectrometer measurement results

將實施例1~2與比較例1~3的含鉬鍍層以附設於SEM的能量分散光譜儀(energy dispersive X-ray spectrometer;EDS)進行元素成份分析,所得結果記錄於表二。 The molybdenum-containing plating layers of Examples 1 and 2 and Comparative Examples 1 to 3 were subjected to elemental composition analysis by an energy dispersive X-ray spectrometer (EDS) attached to a SEM, and the results are shown in Table 2.

由表二可知,當電化學反應的操作溫度相同時(實施例1~2與比較例1~2皆為130℃),藉由添加適量的氯化鋅可有效提升含鉬鍍層中的鉬含量,實施例1的鉬含量高達61.34wt%,實施例2的鉬含量高達60.17wt%。當氯化鋅添加過量時,則會導致含鉬鍍層中鋅的含量遠大於鉬。 It can be seen from Table 2 that when the operating temperature of the electrochemical reaction is the same (130°C in both Examples 1-2 and Comparative Examples 1-2), the molybdenum content in the molybdenum-containing coating can be effectively improved by adding an appropriate amount of zinc chloride. The molybdenum content of Example 1 was as high as 61.34 wt%, and the molybdenum content of Example 2 was as high as 60.17 wt%. When the zinc chloride is added in excess, the content of zinc in the molybdenum-containing coating is much larger than that of molybdenum.

另請比較實施例2與比較例3,當電化學反應的操作溫度為130℃,含鉬鍍層中的鉬含量高達60.17wt%,當電化學反應的操作溫度為110℃,含鉬鍍層中的鉬含量僅24.95wt%。 In addition, comparing Example 2 with Comparative Example 3, when the operating temperature of the electrochemical reaction is 130 ° C, the molybdenum content in the molybdenum-containing coating is as high as 60.17 wt%, and when the operating temperature of the electrochemical reaction is 110 ° C, in the molybdenum-containing coating The molybdenum content is only 24.95 wt%.

三維表面輪廓儀量測結果3D surface profiler measurement results

比較例4的鍍鉬電解質成份為0.01莫耳百分比的五氯化鉬與99.99的二甲基碸,將前述成份放入電化學系統,以脈衝電進行電化學反應以形成含鉬鍍層,其中電化學反應的操作溫度為130℃、還原電壓為-0.5V且Ton/(Ton+Toff)=0.75。 The molybdenum-plated electrolyte component of Comparative Example 4 was 0.01 mol% of molybdenum pentachloride and 99.99 of dimethylhydrazine. The foregoing components were placed in an electrochemical system, and electrochemically reacted by pulsed electricity to form a molybdenum-containing plating layer in which electrolysis was performed. The operating temperature of the reaction was 130 ° C, the reduction voltage was -0.5 V and T on /(T on +T off ) = 0.75.

將實施例1~2以及比較例4的含鉬鍍層以三維表面輪廓儀(3D surface profilometer,TM)量測含鉬鍍層(有鍍層與沒鍍層交界)之高低落差,以得到含鉬鍍層的厚度,結果如表三所示。 The molybdenum-containing plating layers of Examples 1 to 2 and Comparative Example 4 were measured by a 3D surface profilometer (TM) to measure the height difference of the molybdenum-containing plating layer (having a boundary between the plating layer and the uncoated layer) to obtain the thickness of the molybdenum-containing plating layer. The results are shown in Table 3.

由表三可知,含鉬鍍層的厚度隨著氯化鋅濃度的增加而提升,顯示藉由適量添加氯化鋅,可提升沉積速率。 It can be seen from Table 3 that the thickness of the molybdenum-containing coating increases as the concentration of zinc chloride increases, indicating that the deposition rate can be increased by adding zinc chloride in an appropriate amount.

耐腐蝕分析Corrosion resistance analysis

將實施例1與比較例4進行耐腐蝕分析,分析方法如下,以3.5wt%的NaCl水溶液作為腐蝕液,以白金線作為對極,以待測物作為工作電極,以Ag/AgCl作為參考電極,參考電極的製作方法如下,先將銀線前端做成螺旋狀(10圈,每圈直徑為0.2cm),再以3M鹽酸水溶液於3V電壓下以白金線為陰極,以銀線為陽極,以二極式方式電鍍15分鐘,即可得到Ag/AgCl電極線,配製飽和氯化鉀水溶液後置入多孔玻璃內,並將Ag/AgCl電極線放置入多孔玻璃內並以一端浸泡入飽和氯化鉀水溶液即可得參考電極。以掃描範圍為-0.7V至1.2V,掃描速率為1mV/s的條件進行,分別得到實施例1與比較例4的塔弗極化曲線圖,再由塔弗極化曲線圖所得到的腐蝕電流進一步計算含鉬鍍層的保護效率,得到實施例1的保護效率為74%,比較例4的保護效率為70%。 The corrosion resistance analysis was carried out in Example 1 and Comparative Example 4, and the analysis method was as follows. A 3.5 wt% NaCl aqueous solution was used as the etching solution, a platinum wire was used as the counter electrode, a test object was used as the working electrode, and Ag/AgCl was used as the reference electrode. The reference electrode is manufactured as follows. The front end of the silver wire is spirally formed (10 turns, 0.2 cm per turn), and the platinum wire is used as a cathode and the silver wire is used as a cathode with a 3 M hydrochloric acid aqueous solution at a voltage of 3 V. After electroplating in a two-pole manner for 15 minutes, an Ag/AgCl electrode wire can be obtained. A saturated potassium chloride aqueous solution is prepared and placed in a porous glass, and the Ag/AgCl electrode wire is placed in the porous glass and saturated with chlorine at one end. A reference electrode can be obtained by using an aqueous solution of potassium. The scanning range was -0.7V to 1.2V, and the scanning rate was 1mV/s. The Taver polarization curves of Example 1 and Comparative Example 4 were obtained, respectively, and the corrosion obtained by the Taver polarization curve was obtained. The current further calculated the protection efficiency of the molybdenum-containing plating layer, and the protection efficiency of Example 1 was 74%, and the protection efficiency of Comparative Example 4 was 70%.

綜上所述,本發明之鍍鉬電解質藉由添加0.01莫耳百分比至25莫耳百分比的氯化鋅,可提升含鉬鍍層的平整性、鉬含量、厚度、沉積速率與耐腐蝕性(保護效率較高), 此外,與習用鉬的沉積技術相較,本發明形成含鉬鍍層方法中進行電化學反應的溫度為115℃至130℃,所需的溫度明顯較低,而可有效節省能源、避免高溫腐蝕,以及避免基材受熱變形或損壞。 In summary, the molybdenum-plated electrolyte of the present invention can improve the flatness, molybdenum content, thickness, deposition rate and corrosion resistance of the molybdenum-containing coating by adding 0.01 mol% to 25 mol% of zinc chloride. High efficiency), In addition, compared with the conventional molybdenum deposition technology, the temperature of the electrochemical reaction in the method for forming a molybdenum-containing coating of the present invention is 115 ° C to 130 ° C, and the required temperature is significantly lower, which can effectively save energy and avoid high temperature corrosion. And to avoid deformation or damage to the substrate.

雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明的精神和範圍內,當可作各種的更動與潤飾,因此本發明的保護範圍當視後附的申請專利範圍所界定者為準。 While the present invention has been disclosed in the above embodiments, it is not intended to limit the invention, and the invention may be modified and modified in various ways without departing from the spirit and scope of the invention. The scope is subject to the definition of the scope of the patent application.

110‧‧‧步驟 110‧‧‧Steps

120‧‧‧步驟 120‧‧‧Steps

130‧‧‧步驟 130‧‧‧Steps

140‧‧‧步驟 140‧‧‧Steps

Claims (4)

一種鍍鉬電解質,排除含氟鹽類,該鍍鉬電解質包含:0.01莫耳百分比的五氯化鉬(MoCl5);10莫耳百分比至20莫耳百分比的氯化鋅(ZnCl2);以及剩餘量的二甲基碸(C2H6O2S)。 A molybdenum-plated electrolyte, excluding fluorine-containing salts, comprising: 0.01 mole percent of molybdenum pentachloride (MoCl 5 ); 10 mole percent to 20 mole percent of zinc chloride (ZnCl 2 ); The remaining amount of dimethyl hydrazine (C 2 H 6 O 2 S). 一種形成含鉬鍍層方法,包含:提供五氯化鉬、氯化鋅與二甲基碸;進行一除水步驟,係將該五氯化鉬、該氯化鋅與該二甲基碸置於真空環境下,持續加熱一段時間,使該五氯化鉬、該氯化鋅與該二甲基碸的水份含量在2wt%以下;形成一鍍鉬電解質,係將五氯化鉬、該氯化鋅與該二甲基碸均勻混合,其中該鍍鉬電解質排除含氟鹽類且包含0.01莫耳百分比的五氯化鉬、10莫耳百分比至20莫耳百分比的氯化鋅以及剩餘量的二甲基碸;以及進行一電化學反應,以形成一含鉬鍍層,其中該電化學反應係於氮氣氛圍下以130℃使用一脈衝電進行,該脈衝電的還原電壓為-0.5V,且該脈衝電的操作條件為Ton/(Ton+Toff)=0.75。 A method for forming a molybdenum-containing plating layer, comprising: providing molybdenum pentachloride, zinc chloride and dimethyl hydrazine; performing a water removal step of placing the molybdenum pentachloride, the zinc chloride and the dimethyl hydrazine In a vacuum environment, heating is continued for a period of time, so that the moisture content of the molybdenum pentachloride, the zinc chloride and the dimethyl hydrazine is less than 2 wt%; forming a molybdenum-plated electrolyte, which is a molybdenum pentachloride, the chlorine Zinc is uniformly mixed with the dimethylhydrazine, wherein the molybdenum-plated electrolyte excludes fluorine-containing salts and contains 0.01 mol% of molybdenum pentachloride, 10 mol% to 20 mol% of zinc chloride, and the balance Dimethyl hydrazine; and performing an electrochemical reaction to form a molybdenum-containing plating layer, wherein the electrochemical reaction is performed at 130 ° C using a pulsed electric current under a nitrogen atmosphere, and the reduction voltage of the pulse electric current is -0.5 V, and The operating condition of this pulsed electric power is Ton / (Ton + Toff) = 0.75. 如請求項2所述之形成含鉬鍍層方法,其中該進行該除水步驟係於25℃至120℃進行12小時至72小時。 The method of forming a molybdenum-containing plating layer according to claim 2, wherein the step of performing the water removal is carried out at 25 ° C to 120 ° C for 12 hours to 72 hours. 如請求項2所述之形成含鉬鍍層方法,其中該形成該鍍鉬電解質的步驟係於氮氣氛圍下以110℃至150℃進行。 A method of forming a molybdenum-containing plating layer as described in claim 2, wherein the step of forming the molybdenum-plated electrolyte is carried out at 110 ° C to 150 ° C under a nitrogen atmosphere.
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