TWI522318B - Titanium oxide particles and methods for producing the same - Google Patents
Titanium oxide particles and methods for producing the same Download PDFInfo
- Publication number
- TWI522318B TWI522318B TW103115801A TW103115801A TWI522318B TW I522318 B TWI522318 B TW I522318B TW 103115801 A TW103115801 A TW 103115801A TW 103115801 A TW103115801 A TW 103115801A TW I522318 B TWI522318 B TW I522318B
- Authority
- TW
- Taiwan
- Prior art keywords
- titanium oxide
- gas
- oxide particles
- less
- mol
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Description
本發明係關於氧化鈦粒子及其製造方法、以及包含氧化鈦粒子之漿料、分散體、組成物及介電質原料。 The present invention relates to a titanium oxide particle, a method for producing the same, and a slurry, a dispersion, a composition, and a dielectric material comprising titanium oxide particles.
氧化鈦之工業上應用領域極為廣泛,將對化妝品、紫外線遮蔽材、矽氧橡膠的添加劑作為代表,近年來被廣泛應用在光觸媒、太陽能電池、介電質原料、Li離子電池用電極材原料等用途。尚且,「氧化鈦」於日本工業規格(JIS)雖記載為二氧化鈦,但由於一般名稱廣泛使用氧化鈦,故於本說明書簡稱為氧化鈦。 Titanium oxide is widely used in industrial applications. It has been widely used in photocatalysts, solar cells, dielectric materials, electrode materials for Li-ion batteries, etc., as a representative of cosmetics, ultraviolet shielding materials, and antimony rubber additives. use. Further, "titanium oxide" is described as titanium dioxide in Japanese Industrial Standards (JIS). However, since titanium oxide is widely used as a general name, it is abbreviated as titanium oxide in the present specification.
最近,氧化鈦尤其是作為高性能之介電質原料,例如BaTiO3的原料而受到矚目。BaTiO3於加熱下可藉由以下之反應而獲得。 Recently, titanium oxide has attracted attention as a raw material for high-performance dielectric materials such as BaTiO 3 . BaTiO 3 can be obtained by the following reaction under heating.
BaCO3+TiO2 → BaTiO3+CO2 BaCO 3 +TiO 2 → BaTiO 3 +CO 2
上述之反應為固相反應,當時首先於高溫分解BaCO3 以生成BaO,BaO被稱為被擴散固溶TiO2粒子中而成為BaTiO3。據此BaTiO3粒子的大小變成支配TiO2粒子的大小。近年來,伴隨層合陶瓷電容器的小型化,介電層之薄層化已成為課題,因此BaTiO3粒子的微粒化及均勻化成為不可欠缺。據此,為了該均勻化,有必要係BaTiO3原料之TiO2的微粒化及均勻化。 The above reaction is a solid phase reaction, in which BaCO 3 is first decomposed at a high temperature to form BaO, and BaO is referred to as a dispersed solid solution TiO 2 particle to become BaTiO 3 . Accordingly, the size of the BaTiO 3 particles becomes the size of the TiO 2 particles. In recent years, with the miniaturization of laminated ceramic capacitors, thinning of a dielectric layer has been a problem, and therefore, atomization and homogenization of BaTiO 3 particles have become indispensable. Accordingly, in order to achieve uniformization, it is necessary to atomize and homogenize the TiO 2 of the BaTiO 3 raw material.
氧化鈦的製造法大致上有水解四氯化鈦或硫酸鈦之液相法、與將四氯化鈦與氧或水蒸氣於高溫下進行反應之氣相法。 The method for producing titanium oxide generally has a liquid phase method of hydrolyzing titanium tetrachloride or titanium sulfate, and a gas phase method in which titanium tetrachloride is reacted with oxygen or water vapor at a high temperature.
液相法雖有可於比較溫和之條件下製造氧化鈦的優點,但為了使氧化鈦以溶膠或漿料的狀態獲得,以此狀態使用時,有用途被限定的問題。 Although the liquid phase method has an advantage that titanium oxide can be produced under relatively mild conditions, in order to obtain titanium oxide in a state of a sol or a slurry, when it is used in this state, there is a problem that the use is limited.
又,為了將該溶膠或漿料作為氧化鈦粒子使用有必要使其乾燥,乾燥後一般凝聚會變為激烈。如此凝聚激烈之氧化鈦粒子有粒徑變成不均勻的問題。又,將該氧化鈦粒子分散於溶劑時亦有分散性惡化的問題。分散性惡化時,為了上述之BaTiO3的生成而混合原料時,氧化鈦粒子與其他原料無法充分混合,於原料成分產生偏在,反應時引起不均勻成長,造成強度低下等之性能低落、品質的變異等。又,為了提高分散性而解碎及粉碎氧化鈦時,有引起來自粉碎等處理之磨耗物的混入或粒度分布之不均勻化等問題。 Further, in order to use the sol or the slurry as the titanium oxide particles, it is necessary to dry them, and after drying, the aggregation generally becomes intense. Such a highly condensed titanium oxide particle has a problem that the particle diameter becomes uneven. Further, when the titanium oxide particles are dispersed in a solvent, the dispersibility is also deteriorated. When the dispersibility is deteriorated, when the raw materials are mixed for the formation of the above-mentioned BaTiO 3 , the titanium oxide particles are not sufficiently mixed with other raw materials, and the raw material components are biased, causing uneven growth during the reaction, resulting in poor performance such as low strength and quality. Variations, etc. Moreover, when the titanium oxide is pulverized and pulverized in order to improve the dispersibility, there is a problem that the abrasion of the treatment such as pulverization or the unevenness of the particle size distribution is caused.
另外,藉由氣相法時,氧化鈦以粉末獲得,又於氣相法由於未使用溶劑,故產生以液相法所列舉的問 題少。然而,藉由氣相法時,於原料為了使用四氯化鈦,故於所得之氧化鈦粒子有導致包含Cl的問題。 In addition, in the gas phase method, titanium oxide is obtained as a powder, and in the gas phase method, since a solvent is not used, a problem enumerated in a liquid phase method is generated. Less questions. However, in the gas phase method, in order to use titanium tetrachloride in the raw material, the obtained titanium oxide particles have a problem of causing inclusion of Cl.
例如,將包含此Cl之氧化鈦粒子作為BaTiO3的原料使用時,混合包含此Cl之氧化鈦粒子與BaCO3並進行加熱時生成BaO,Cl與此BaO反應而生成BaCl2。生成之BaCl2進行熔融成為助焊劑之作用,引起TiO2粒子或BaTiO3粒子的凝聚。又熔融之助焊劑容易局部化,於其局部化部分凝聚增多,與其他部分之間產生品質變異。粒子進行凝聚時,BaTiO3粒子之結晶成長而成為異常粒子,使BaTiO3之介電特性降低。上述之問題由於無論氧化鈦中之Cl的存在狀態為何皆有引起的可能性,故粒子表面及粒子內部的任一種之Cl皆有減低的必要。 For example, when the titanium oxide particles containing the Cl are used as a raw material of BaTiO 3 , BaO is formed by mixing the titanium oxide particles containing the Cl and BaCO 3 and heating, and Cl reacts with the BaO to form BaCl 2 . The resulting BaCl 2 is melted to function as a flux, causing agglomeration of TiO 2 particles or BaTiO 3 particles. Further, the molten flux is easily localized, and aggregation is increased in the localized portion, and quality variation occurs between the other portions. When the particles are agglomerated, the crystals of the BaTiO 3 particles grow to become abnormal particles, and the dielectric properties of BaTiO 3 are lowered. The above problem is caused by the fact that the presence or absence of Cl in the titanium oxide is likely to occur, so that the surface of the particles and the Cl inside the particles are all reduced.
專利文獻1中,記載有一種低鹵素氧化鈦粒子之製造方法,其特徵為將Cl等鹵素含量少之氧化鈦粒子藉由氣相法而獲得作為目的,於氣相中,將鹵素化鈦氣體進行水解或氧化反應而得之粗氧化鈦粒子,與含有醇及水蒸氣之混合氣體進行接觸。 Patent Document 1 describes a method for producing a low-halogen titanium oxide particle, which is characterized in that a titanium oxide particle having a low halogen content such as Cl is obtained by a vapor phase method, and a titanium halide gas is used in a gas phase. The coarse titanium oxide particles obtained by the hydrolysis or oxidation reaction are brought into contact with a mixed gas containing an alcohol and water vapor.
[專利文獻1]WO09/017212號 [Patent Document 1] WO09/017212
如上述,期望Cl含量少且均勻性及分散性優異之氧化鈦粒子。然而,藉由液相法所得之氧化鈦粒子均勻性及分散性不佳。又藉由氣相法所得之氧化鈦粒子Cl含量多。尚且,藉由專利文獻1所得之氧化鈦粒子亦未充分減低Cl含量。 As described above, titanium oxide particles having a small Cl content and excellent uniformity and dispersibility are desired. However, the uniformity and dispersibility of the titanium oxide particles obtained by the liquid phase method are not good. Further, the titanium oxide particles obtained by the vapor phase method have a large Cl content. Further, the titanium oxide particles obtained by Patent Document 1 did not sufficiently reduce the Cl content.
本發明係為了解決上述之問題點而完成者,本發明之課題係提供一種Cl含量低,且均勻性及分散性優異之氧化鈦粒子及其製造方法、以及包含該氧化鈦之漿料、分散體、組成物及介電質原料。 The present invention has been made to solve the above problems, and an object of the present invention is to provide a titanium oxide particle having a low Cl content and excellent uniformity and dispersibility, a method for producing the same, and a slurry and dispersion containing the titanium oxide. Body, composition and dielectric material.
本發明者們,鑑於上述課題進行努力研究之結果,發現藉由經過使特定量含有四氯化鈦及惰性氣體之氣體及含有特定之氧化性氣體之氣體進行反應以製造粗氧化鈦粒子之第1步驟、與將該粉末以乾式脫氯法進行脫氯之第2步驟,可製造Cl含量少,且均勻性及分散性優異之氧化鈦粒子。 As a result of intensive studies in view of the above-mentioned problems, the inventors of the present invention have found that the raw titanium oxide particles are produced by reacting a gas containing a specific amount of titanium tetrachloride and an inert gas and a gas containing a specific oxidizing gas. In the first step and the second step of dechlorinating the powder by the dry dechlorination method, titanium oxide particles having a small Cl content and excellent uniformity and dispersibility can be produced.
亦即,本發明係提供以下之[1]~[13]者。 That is, the present invention provides the following [1] to [13].
[1]一種氧化鈦粒子之製造方法,其係具有:將含有四氯化鈦及惰性氣體之氣體G1,與含有氧及水蒸氣之至少1種以及惰性氣體之氣體G2,導入反應管並使其反應,製造粗氧化鈦粒子之第1步驟,與將該粗氧化鈦粒子以乾式脫氯法進行脫氯之第2步驟,其特徵為導入第1步驟之反應管之惰性氣體的總量(氣體G1與 氣體G2中惰性氣體的合計量),相對於四氯化鈦1莫耳為1莫耳以上且50莫耳以下,氣體G2中惰性氣體量相對於氣體G1中惰性氣體1莫耳為5莫耳以上。 [1] A method for producing titanium oxide particles, comprising: introducing a gas G1 containing titanium tetrachloride and an inert gas, and a gas G2 containing at least one of oxygen and water vapor and an inert gas into a reaction tube; The first step of producing the crude titanium oxide particles and the second step of dechlorinating the coarse titanium oxide particles by the dry dechlorination method, which is characterized by the total amount of inert gas introduced into the reaction tube of the first step ( Gas G1 and The total amount of inert gas in the gas G2 is 1 mA or more and 50 mA or less with respect to 1 mol of titanium tetrachloride, and the amount of inert gas in the gas G2 is 5 m with respect to 1 mol of the inert gas in the gas G1. the above.
[2]如[1]之氧化鈦粒子之製造方法,其中,第1步驟中,將氣體G1及氣體G2導入溫度為900℃以上且未滿1,200℃之反應管內並使其反應。 [2] The method for producing titanium oxide particles according to [1], wherein in the first step, the gas G1 and the gas G2 are introduced into a reaction tube having a temperature of 900 ° C or higher and less than 1,200 ° C and reacted.
[3]如[1]或[2]之氧化鈦粒子之製造方法,其中,第1步驟中,相對於四氯化鈦1莫耳,在氣體G2中之氧及水蒸氣的總量以成為1莫耳以上且50莫耳以下的方式,將氣體G1及氣體G2導入反應管。 [3] The method for producing titanium oxide particles according to [1] or [2], wherein, in the first step, the total amount of oxygen and water vapor in the gas G2 is made with respect to 1 mol of titanium tetrachloride. The gas G1 and the gas G2 are introduced into the reaction tube in a manner of 1 mol or more and 50 mol or less.
[4]如[1]~[3]中任一項之氧化鈦粒子之製造方法,其中,第1步驟中,相對於四氯化鈦1莫耳,在氣體G1中之惰性氣體量以成為未滿3莫耳的方式,將氣體G1及氣體G2導入反應管。 [4] The method for producing a titanium oxide particle according to any one of [1] to [3] wherein, in the first step, the amount of the inert gas in the gas G1 is increased with respect to 1 mol of titanium tetrachloride. The gas G1 and the gas G2 are introduced into the reaction tube in a manner of less than 3 moles.
[5]一種氧化鈦粒子,其係全Cl含量a為200質量ppm以下,其特徵為將藉由雷射繞射散射分析法測定之D90/D50定為X,將由藉由氮氣吸附之BET法測定之BET比表面積定為Y(m2/g)時,X/Y為0.060以下。 [5] A titanium oxide particle having a total Cl content a of 200 ppm by mass or less, characterized in that D 90 /D 50 determined by a laser diffraction scattering analysis method is defined as X, which is adsorbed by nitrogen gas. When the BET specific surface area measured by the BET method is Y (m 2 /g), X/Y is 0.060 or less.
[6]如請求項5之氧化鈦粒子,其中,從在氧化鈦粒子中全Cl含量a(質量ppm),減去由硝酸銀電位差滴定法所測定氧化鈦粒子之表面Cl含量b(質量ppm)所得之氧化鈦粒子內部Cl含量c為200質量ppm以下。 [6] The titanium oxide particle according to claim 5, wherein a surface Cl content (mass ppm) of the titanium oxide particle measured by a silver nitrate potential difference titration is subtracted from a total Cl content a (mass ppm) in the titanium oxide particle The content of the internal Cl content c of the obtained titanium oxide particles is 200 ppm by mass or less.
[7]如[5]或[6]之氧化鈦粒子,其中,BET比表面積 Y為20~200m2/g。 [7] The titanium oxide particles according to [5] or [6], wherein the BET specific surface area Y is from 20 to 200 m 2 /g.
[8]如[5]~[7]中任一項之氧化鈦粒子,其中,氧化鈦的含量為99.9質量%以上。 [8] The titanium oxide particles according to any one of [5] to [7] wherein the content of the titanium oxide is 99.9% by mass or more.
[9]如[5]~[8]中任一項之氧化鈦粒子,其中,Na、Al、S、Fe、Ni、Cr、Nb及Zr的含量分別為10質量ppm以下,Si及C的含量分別為100質量ppm以下。 [9] The titanium oxide particles according to any one of [5] to [8], wherein the contents of Na, Al, S, Fe, Ni, Cr, Nb, and Zr are each 10 mass ppm or less, and Si and C are respectively The content is 100 ppm by mass or less.
[10]一種漿料,其係包含如[5]~[9]中任一項之氧化鈦粒子。 [10] A slurry comprising the titanium oxide particles according to any one of [5] to [9].
[11]一種分散體,其係包含如[5]~[9]中任一項之氧化鈦粒子。 [11] A dispersion comprising the titanium oxide particles according to any one of [5] to [9].
[12]一種組成物,其係包含如[5]~[9]中任一項之氧化鈦粒子。 [12] A composition comprising the titanium oxide particles according to any one of [5] to [9].
[13]一種介電質原料,其係由如[5]~[9]中任一項之氧化鈦粒子所獲得。 [13] A dielectric material obtained by the titanium oxide particles according to any one of [5] to [9].
根據本發明,可提供一種全Cl含量a少,且均勻性及分散性優異之氧化鈦粒子及其製造方法、以及包含該氧化鈦之漿料、分散體、組成物及介電質原料。 According to the present invention, it is possible to provide a titanium oxide particle having a small total Cl content a and excellent uniformity and dispersibility, a method for producing the same, and a slurry, a dispersion, a composition, and a dielectric material comprising the titanium oxide.
1‧‧‧反應管 1‧‧‧Reaction tube
2‧‧‧冷卻管 2‧‧‧Cooling tube
3‧‧‧冷卻介質(空氣、氮氣、水等) 3‧‧‧ Cooling medium (air, nitrogen, water, etc.)
4‧‧‧粗氧化鈦粒子 4‧‧‧ coarse titanium oxide particles
5‧‧‧第2步驟 5‧‧‧Step 2
G1‧‧‧氣體G1 G1‧‧‧ gas G1
G2‧‧‧氣體G2 G2‧‧‧ gas G2
Z‧‧‧反應區 Z‧‧‧Reaction zone
[圖1]說明在本發明之氧化鈦粒子之製造方法之第1步驟之合適例之模式圖。 Fig. 1 is a schematic view showing a suitable example of the first step of the method for producing titanium oxide particles of the present invention.
本發明之氧化鈦粒子係全Cl含量a為200質量ppm以下,將由雷射繞射散射分析法測定之D90/D50作為X,將由藉由氮氣吸附之BET法測定之BET比表面積定為Y(m2/g)時,X/Y為0.060以下之氧化鈦粒子。本發明之氧化鈦粒子係全Cl含量a少,且均勻性及分散性優異。該本發明之氧化鈦粒子可由後述之本發明之氧化鈦粒子之製造方法,適當製造。 The titanium oxide particle of the present invention has a total Cl content a of 200 ppm by mass or less, D 90 /D 50 measured by a laser diffraction scattering analysis method as X, and a BET specific surface area measured by a BET method by nitrogen adsorption. In the case of Y (m 2 /g), X/Y is a titanium oxide particle of 0.060 or less. The titanium oxide particles of the present invention have a small total a content of a, and are excellent in uniformity and dispersibility. The titanium oxide particles of the present invention can be suitably produced by the method for producing titanium oxide particles of the present invention to be described later.
本發明之氧化鈦粒子係全Cl含量a為200質量ppm以下。 The titanium oxide particles of the present invention have a total Cl content a of 200 ppm by mass or less.
所謂全Cl含量a係指在氧化鈦粒子中之Cl的總含量,藉由於氧化鈦加入氫氟酸進行微波照射而溶解,於該溶液滴下硝酸銀溶液,由測定電位差之硝酸銀電位差滴定法所測定之值。 The total Cl content a refers to the total content of Cl in the titanium oxide particles, which is dissolved by the addition of hydrofluoric acid to the titanium oxide, and the silver nitrate solution is dropped into the solution, and the silver nitrate potential difference titration method for measuring the potential difference is used. value.
全Cl含量a超過200質量ppm時,使得將該氧化鈦粒子用在BaTiO3等原料時,於燒成時成為助焊劑(Flux)的原因。熔融之助焊劑容易局部化,該局部化部分凝聚增多,於與其他部分之間品質上產生變異。又,凝聚粒子時,BaTiO3粒子的結晶成長而成為異常粒子,亦變成使BaTiO3之介電特性降低。從該觀點來看,在氧化鈦粒子中之全Cl含量a較佳為180質量ppm以下,更佳為150 質量ppm以下,再更佳為120質量ppm以下,又再更佳為100質量ppm以下,進一步更佳為40ppm以下。尚且,40ppm係在本測定方法之測定限界值。 When the total Cl content a exceeds 200 ppm by mass, when the titanium oxide particles are used as a raw material such as BaTiO 3 , they become a flux (Flux) at the time of firing. The molten flux is easily localized, and the localized portion is coagulated and the quality is mutated with other portions. Further, when the particles are agglomerated, the crystals of the BaTiO 3 particles grow to become abnormal particles, and the dielectric properties of BaTiO 3 also decrease. From this viewpoint, the total Cl content a in the titanium oxide particles is preferably 180 ppm by mass or less, more preferably 150 ppm by mass or less, still more preferably 120 ppm by mass or less, still more preferably 100 ppm by mass or less. Further, it is more preferably 40 ppm or less. Further, 40 ppm is the measurement limit value of the measurement method.
所謂表面Cl含量b係在氧化鈦粒子表面之Cl含量,由同樣的觀點來看,較佳為200質量ppm以下,更佳為180質量ppm以下,再更佳為150質量ppm以下,又再更佳為120質量ppm以下,進一步更佳為100質量ppm以下。 The surface Cl content b is a Cl content on the surface of the titanium oxide particles, and from the same viewpoint, it is preferably 200 ppm by mass or less, more preferably 180 ppm by mass or less, still more preferably 150 ppm by mass or less, and still more It is preferably 120 ppm by mass or less, and more preferably 100 ppm by mass or less.
本發明中,所謂表面Cl含量b,係指將氧化鈦分散於水並滴下硝酸銀溶液於其溶液,由測定電位差之硝酸銀電位差滴定法所測定之值。 In the present invention, the surface Cl content b means a value measured by dispersing titanium oxide in water and dropping a silver nitrate solution in the solution, and measuring the potential difference by a silver nitrate potential difference titration method.
在本測定方法之定量下限為40ppm,將所測之值比定量下限更低的情況定為0ppm以上且未滿40ppm。 In the present measurement method, the lower limit of quantification is 40 ppm, and the case where the measured value is lower than the lower limit of quantification is set to be 0 ppm or more and less than 40 ppm.
又,於粒子內部製造將含有Cl之氧化鈦粒子作為原料之BaTiO3層等時,該Cl隨著時間擴散至該層的表面,產生使形成有該層之基材腐蝕、變質之問題。又,存在於此氧化鈦粒子內部之Cl以水洗或乾燥等簡單之脫Cl處理難以去除。因此,期望不僅在氧化鈦粒子表面,也在粒子內部不存在Cl。 Further, when a BaTiO 3 layer or the like containing a titanium oxide particle containing Cl as a raw material is produced inside the particle, the Cl diffuses to the surface of the layer over time, causing a problem of corrosion and deterioration of the substrate on which the layer is formed. Further, Cl which is present inside the titanium oxide particles is difficult to remove by a simple de-Cl treatment such as washing with water or drying. Therefore, it is desirable not only to have Cl on the surface of the titanium oxide particles but also inside the particles.
從該觀點來看,所謂內部Cl含量c係在氧化鈦粒子內部之Cl含量c,較佳為200質量ppm以下,更佳為120質量ppm以下,再更佳為100質量ppm以下。 From this point of view, the internal Cl content c is a Cl content c inside the titanium oxide particles, preferably 200 ppm by mass or less, more preferably 120 ppm by mass or less, still more preferably 100 ppm by mass or less.
尚且,本發明中,所謂內部Cl含量c係指從上述之(在氧化鈦粒子中之Cl總含量)全Cl含量a,減去(在粒子 表面之Cl含量)表面Cl含量b之值。 Further, in the present invention, the internal Cl content c means the total Cl content a from the above (total content of Cl in the titanium oxide particles), minus (in the particle The Cl content of the surface) is the value of the surface Cl content b.
本發明之氧化鈦粒子較佳為Na、Al、S、Fe、Ni、Cr、Nb及Zr的含量分別為10質量ppm以下。又,本發明之氧化鈦粒子較佳為Si及C的含量分別為100質量ppm以下。如此,當雜質少時,將該氧化鈦粒子作為原料而得到介電質時,抑制由於雜質的存在導致介電特性惡化。又,將該氧化鈦粒子用在光觸媒或太陽能電池的用途時,防止或抑制因為Fe之著色所致之透明性的降低,又,防止或抑制起因於Al、S等之格子缺陷所致之作為光觸媒或太陽能電池之機能的降低。 The titanium oxide particles of the present invention preferably have a content of Na, Al, S, Fe, Ni, Cr, Nb and Zr of 10 ppm by mass or less. Further, the titanium oxide particles of the present invention preferably have a content of Si and C of 100 ppm by mass or less. As described above, when the amount of impurities is small, when the titanium oxide particles are used as a raw material to obtain a dielectric, it is suppressed that the dielectric properties are deteriorated due to the presence of impurities. Further, when the titanium oxide particles are used in a photocatalyst or a solar cell, the transparency due to the coloring of Fe is prevented or suppressed, and the occurrence of lattice defects due to Al or S is prevented or suppressed. The performance of photocatalyst or solar cell is reduced.
本發明之氧化鈦粒子較佳係氧化鈦的含量為99.9質量%以上,藉此純度提高,故如上述之雜質導致的影響小。尚且,此等雜質及氧化鈦的含量係藉由實施例之項次所記載之測定方法。 The titanium oxide particles of the present invention preferably have a content of titanium oxide of 99.9% by mass or more, whereby the purity is improved, so that the influence by the above impurities is small. Further, the contents of such impurities and titanium oxide are determined by the measurement methods described in the examples.
本發明之氧化鈦粒子將由雷射繞射散射分析法所測定之D90/D50定為X,將由藉由氮氣吸附之BET法所測定之BET比表面積定為Y(m2/g)時,X/Y為0.060以下。 The titanium oxide particles of the present invention have a D 90 /D 50 determined by a laser diffraction scattering analysis method as X, and a BET specific surface area measured by a BET method by nitrogen adsorption is determined to be Y (m 2 /g). , X / Y is below 0.060.
一般而言,由於BET比表面積Y粒子越大,表面能量越提高越容易凝聚,粒徑變成不均勻,X(D90/D50)的值易增大。將此值X(D90/D50)除以BET比表面積Y之值X/Y,可作為去除BET比表面積影響之均勻性的指標,可以說是此X/Y的值越小,均勻性越優異。 In general, as the BET specific surface area Y particles are larger, the surface energy is more likely to aggregate and the particle diameter becomes uneven, and the value of X (D 90 /D 50 ) tends to increase. Dividing this value X(D 90 /D 50 ) by the value X/Y of the BET specific surface area Y can be used as an index for removing the uniformity of the influence of the BET specific surface area. It can be said that the smaller the value of X/Y, the uniformity The more excellent.
從提昇均勻性的觀點來看,此X/Y的值,較佳為 0.055以下,更佳為0.050以下,再更佳為0.045以下,又再更佳為0.040以下,進一步更佳為0.035以下。 From the viewpoint of improving uniformity, the value of this X/Y is preferably It is 0.055 or less, more preferably 0.050 or less, still more preferably 0.045 or less, still more preferably 0.040 or less, still more preferably 0.035 or less.
尚且,粒子之粒度分布的測定法中,藉由「超微粒子手冊」齋藤進六監修,Fuji.Techno System,p93,(1990)時,雖有沉澱法、顯微鏡法、雷射繞射散射分析法(光散射法)、直接計數法等,當中沉澱法、直接計數法可測定之粒徑為數百nm以上,不適合測定粒徑為100nm以下之微粒子的粒度分布。又,顯微鏡法亦有藉由對象試料之取樣或試料之前處理而變動測定值,無法說是較佳之測定法。對於此,雷射繞射散射分析法(光散射法)可以數nm~數μm之範圍測定粒徑,適合於微粒子之測定。針對藉由雷射繞射散射分析法(光散射法)之粒度分布的測定順序說明如下。 In addition, in the measurement method of the particle size distribution of particles, by the "Ultrafine Particles Handbook" Saito Into six supervision, Fuji. In Techno System, p93, (1990), there are sedimentation method, microscopic method, laser diffraction scattering analysis method (light scattering method), direct counting method, etc., among which the particle size measured by the precipitation method and the direct counting method is Above 100 nm, it is not suitable for measuring the particle size distribution of fine particles having a particle diameter of 100 nm or less. Further, the microscopic method also has a measurement method in which the sample sample is sampled or the sample is processed beforehand, and it cannot be said that it is a preferable measurement method. In this regard, the laser diffraction scattering analysis method (light scattering method) can measure the particle diameter in the range of several nm to several μm , and is suitable for the measurement of fine particles. The order of measurement for the particle size distribution by the laser diffraction scattering analysis method (light scattering method) will be described below.
於氧化鈦粒子0.05g加入純水100ml及10%六偏磷酸鈉水溶液100μl之漿料,進行3分鐘超音波照射(50KHz、100W)。將此漿料放在雷射繞射式粒度分布測定裝置(島津SALD 2000J),測定粒度分布。根據該測定,求得D50(以在體積累積粒度分布之累積粒度為50%之粒徑(μm))、D90(以在體積累積粒度分布之累積粒度為90%之粒徑(μm))、X(D90/D50)。 To 100 g of the titanium oxide particles, 100 ml of pure water and 100 μl of a 10% aqueous sodium hexametaphosphate solution were added, and ultrasonic irradiation (50 kHz, 100 W) was performed for 3 minutes. This slurry was placed in a laser diffraction type particle size distribution measuring apparatus (Shimadzu SALD 2000J), and the particle size distribution was measured. According to the measurement, D 50 (particle diameter (μm) having a cumulative particle size of 50% in volume cumulative particle size distribution), D 90 (particle diameter (μm) having a cumulative particle size of 90% in volume cumulative particle size distribution) was obtained. ), X (D 90 / D 50 ).
判斷如此進行在所測定之粒度分布之D90值越小,越對於親水性溶劑顯示良好之分散性,D90之值較佳為8μm以下,更佳為5μm以下,再更佳為3.5μm以下,又再更佳為1μm以下。 It is judged that the smaller the D 90 value in the particle size distribution measured, the better the dispersibility with respect to the hydrophilic solvent, and the value of D 90 is preferably 8 μm or less, more preferably 5 μm or less, still more preferably 3.5 μm or less. More preferably, it is 1 μm or less.
在本發明之氧化鈦粒子之上述值X(D90/D50),從提昇氧化鈦粒子之均勻性觀點來看為6.00以下,較佳為5.50以下,更佳為5.00以下,再更佳為2.00以下,又再更佳為1.50以下,進一步更佳為1.40以下。 The above-mentioned value X (D 90 /D 50 ) of the titanium oxide particles of the present invention is 6.00 or less, preferably 5.50 or less, more preferably 5.00 or less, more preferably 5.00 or less, from the viewpoint of improving the uniformity of the titanium oxide particles. Below 2.00, it is more preferably 1.50 or less, further preferably 1.40 or less.
又,在本發明之氧化鈦粒子之上述BET比表面積Y(m2/g),從得到雜質少且均勻性及分散性優異之氧化鈦粒子觀點來看,較佳為20~200m2/g,更佳為20~190m2/g,再更佳為20~150m2/g,又再更佳為20~100m2/g,又再更佳為20~50m2/g。 In addition, the BET specific surface area Y (m 2 /g) of the titanium oxide particles of the present invention is preferably from 20 to 200 m 2 /g from the viewpoint of obtaining titanium oxide particles having less impurities and excellent uniformity and dispersibility. , more preferably 20 ~ 190m 2 / g, and still more preferably 20 ~ 150m 2 / g, again more preferably 20 ~ 100m 2 / g, again more preferably 20 ~ 50m 2 / g.
在本發明之氧化鈦粒子之金紅石化率雖可幅度廣泛調控,但在紫外線遮蔽性或光觸媒活性,一般而言較佳為金紅石型,較佳為3~95%,更佳為6~95%,再更佳為30~95%,又再更佳為50~95%,最佳為50~90%。 Although the gold-red petrochemical rate of the titanium oxide particles of the present invention can be widely controlled, the ultraviolet shielding property or the photocatalytic activity is generally preferably rutile type, preferably 3 to 95%, more preferably 6~. 95%, more preferably 30 to 95%, and even more preferably 50 to 95%, and most preferably 50 to 90%.
於此,所謂金紅石化率係指在氧化鈦中之金紅石型氧化鈦的含量。 Here, the term "red sap" refers to the content of rutile-type titanium oxide in titanium oxide.
本發明之漿料、分散體、組成物及介電質原料係包含前述之氧化鈦粒子。本發明之漿料、分散體、組成物及介電質原料適合於光觸媒用途或太陽能電池用途、介電質用途等。 The slurry, the dispersion, the composition, and the dielectric material of the present invention comprise the titanium oxide particles described above. The slurry, dispersion, composition, and dielectric material of the present invention are suitable for photocatalytic use, solar cell use, dielectric use, and the like.
本發明之氧化鈦粒子之製造方法係具有:將含有四氯 化鈦及惰性氣體之氣體G1、與含有氧及水蒸氣之至少1種以及惰性氣體之氣體G2導入反應管使其進行反應,以製造粗氧化鈦粒子之第1步驟、與將該粗氧化鈦粒子以乾式脫氯法進行脫氯之第2步驟,其中,第1步驟之導入反應管之惰性氣體的總量,相對於四氯化鈦1莫耳為1莫耳以上且50莫耳以下,氣體G2中之惰性氣體量,相對於氣體G1中之惰性氣體1莫耳為5莫耳以上之氧化鈦粒子之製造方法。 The method for producing titanium oxide particles of the present invention has a method of: containing tetrachlorine The first step of producing the crude titanium oxide particles and the crude titanium oxide by introducing a gas G1 of titanium and an inert gas, and a gas G2 containing at least one of oxygen and water vapor and an inert gas into the reaction tube a second step of dechlorination of the particles by a dry dechlorination method, wherein the total amount of the inert gas introduced into the reaction tube in the first step is 1 mol or more and 50 mol or less with respect to 1 mol of titanium tetrachloride. The method of producing the titanium oxide particles having a molar amount of 5 m or more with respect to the inert gas 1 mol in the gas G2.
藉由本發明時,可得到全Cl含量a低,且均勻性及分散性優異之氧化鈦粒子。 According to the present invention, titanium oxide particles having a low total Cl content a and excellent uniformity and dispersibility can be obtained.
亦即,由氣相法製造氧化鈦粒子時,試圖減少氧化鈦粒子中之全Cl含量a以充分進行反應時,促進粒子之燒結或凝聚,降低比表面積,又,降低粒徑之均勻性及粒子的分散性。另外,反應不夠充分時,氧化鈦粒子中之全Cl含量a增多。 That is, when the titanium oxide particles are produced by a vapor phase method, when attempting to reduce the total Cl content a in the titanium oxide particles to sufficiently carry out the reaction, the sintering or aggregation of the particles is promoted, the specific surface area is lowered, and the uniformity of the particle diameter is reduced. The dispersion of particles. Further, when the reaction is insufficient, the total Cl content a in the titanium oxide particles increases.
本發明者們發現藉由將第1步驟之導入反應管之惰性氣體的總量,相對於四氯化鈦1莫耳定為1莫耳以上且50莫耳以下,且將氣體G2中之惰性氣體量相對於氣體G1中之惰性氣體1莫耳,定為5莫耳以上,可得到Cl含量低,且均勻性及分散性優異之氧化鈦粒子,而完成本發明。 The present inventors have found that the total amount of the inert gas introduced into the reaction tube by the first step is 1 mol or more and 50 mol or less with respect to titanium tetrachloride 1 and is inert in the gas G2. The amount of gas is set to 5 m or more with respect to 1 mol of the inert gas in the gas G1, and titanium oxide particles having a low Cl content and excellent uniformity and dispersibility can be obtained, and the present invention has been completed.
於第1步驟,係將含有四氯化鈦及惰性氣體之氣體 G1、與含有氧及水蒸氣之至少1種以及惰性氣體之氣體G2導入反應管使其進行反應,以製造粗氧化鈦粒子。 In the first step, a gas containing titanium tetrachloride and an inert gas G1 and a gas G2 containing at least one of oxygen and water vapor and an inert gas are introduced into a reaction tube to carry out a reaction to produce coarse titanium oxide particles.
此第1步驟中,導入反應管之惰性氣體的總量,亦即,氣體G1中之惰性氣體與氣體G2中之惰性氣體的合計量,相對於四氯化鈦1莫耳為1莫耳以上且50莫耳以下,且氣體G2中之惰性氣體量,相對於氣體G1中之惰性氣體1莫耳為5莫耳以上。藉此,可得到當減低全Cl含量a,而提昇粒徑的均勻性及粒子的分散性之相反的效果。 In the first step, the total amount of the inert gas introduced into the reaction tube, that is, the total amount of the inert gas in the gas G1 and the inert gas in the gas G2 is 1 mol or more relative to the titanium tetrachloride. And 50 m or less, and the amount of inert gas in the gas G2 is 5 m or more with respect to the inert gas 1 mol in the gas G1. Thereby, the effect of reducing the uniformity of the particle diameter a and improving the uniformity of the particle diameter and the dispersibility of the particles can be obtained.
導入反應管之惰性氣體的總量如上述,相對於四氯化鈦1莫耳為1莫耳以上且50莫耳以下。惰性氣體的總量較該範圍更少時,在反應區之氧化鈦粒子密度提高,凝聚、燒結變為容易。於此,所謂「反應區」係指從原料合流部,藉由冷卻空氣的導入至反應結束為止的區域。 The total amount of the inert gas introduced into the reaction tube is as described above, and is 1 mol or more and 50 mol or less with respect to 1 mol of titanium tetrachloride. When the total amount of the inert gas is less than the range, the density of the titanium oxide particles in the reaction zone is increased, and aggregation and sintering become easy. Here, the "reaction zone" refers to a region from the raw material merging portion by the introduction of the cooling air to the end of the reaction.
另外,惰性氣體較前述範圍更多時,原料之反應性降低,四氯化鈦之氧化反應無法完成,氧化鈦粒子內部之內部Cl含量c增加,結果使全Cl含量a增加。因此,製造全Cl含量a少之氧化鈦粒子,必需使四氯化鈦之氧化反應完成,且抑制如凝聚、燒結般之反應條件,導入反應管內之惰性氣體的總量,相對於四氯化鈦氣體1莫耳,較佳為1莫耳以上且30莫耳以下,更佳為1莫耳以上且20莫耳以下,再更佳為1莫耳以上且10莫耳以下,又再更佳 為1莫耳以上且5莫耳以下。 Further, when the inert gas is more than the above range, the reactivity of the raw material is lowered, the oxidation reaction of titanium tetrachloride cannot be completed, and the internal Cl content c inside the titanium oxide particles is increased, and as a result, the total Cl content a is increased. Therefore, in order to produce titanium oxide particles having a small total Cl content a, it is necessary to complete the oxidation reaction of titanium tetrachloride, and to suppress reaction conditions such as aggregation and sintering, and the total amount of inert gas introduced into the reaction tube relative to tetrachloroethylene. Titanium gas 1 mole, preferably 1 mole or more and 30 moles or less, more preferably 1 mole or more and 20 moles or less, more preferably 1 mole or more and 10 moles or less, and still more good It is 1 mole or more and 5 moles or less.
圖1係表示第1步驟之合適實施形態之模式圖。 Fig. 1 is a schematic view showing a suitable embodiment of the first step.
首先,於反應管1內導入氣體G1及氣體G2。此時,較佳為對反應管1內之氣體G1及氣體G2之導入後的反應管1內溫度以成為預定溫度範圍內之方式,預先加熱反應管1。於此反應管1內將原料氣體(氣體G1及氣體G2)滯留預定時間。此反應管1內成為反應區Z。 First, the gas G1 and the gas G2 are introduced into the reaction tube 1. In this case, it is preferable that the reaction tube 1 is heated in advance so that the temperature in the reaction tube 1 after introduction of the gas G1 and the gas G2 in the reaction tube 1 is within a predetermined temperature range. The material gas (gas G1 and gas G2) is retained in the reaction tube 1 for a predetermined time. The inside of the reaction tube 1 becomes the reaction zone Z.
其次,作為冷卻介質3,將上述氣體或水導入反應管1與冷卻管2之間,急速冷卻原料氣體,將反應生成物之粗氧化鈦粒子4與冷卻介質3一起從冷卻管2流出。藉此,可適當製造粗氧化鈦粒子4。所得之粗氧化鈦粒子送至第2步驟5。 Next, as the cooling medium 3, the gas or water is introduced between the reaction tube 1 and the cooling tube 2, and the material gas is rapidly cooled, and the coarse titanium oxide particles 4 of the reaction product are discharged from the cooling tube 2 together with the cooling medium 3. Thereby, the coarse titanium oxide particles 4 can be suitably produced. The obtained coarse titanium oxide particles are sent to the second step 5.
氣體G1含有四氯化鈦及惰性氣體。 The gas G1 contains titanium tetrachloride and an inert gas.
氣體G1中,相對於四氯化鈦1莫耳之惰性氣體的含量,從抑制所得之氧化鈦粒子的粒徑為小的觀點來看,較佳為0.1莫耳以上,更佳為0.5莫耳以上,再更佳為1莫耳以上,又再更佳為1.5莫耳以上,進一步更佳為2莫耳以上。又,從促進反應觀點來看,較佳為50莫耳以下,更佳為20莫耳以下,再更佳為10莫耳以下,又再更佳為5莫耳以下,進一步更佳為3莫耳以下。 In the gas G1, the content of the inert gas of 1 mol of titanium tetrachloride is preferably 0.1 mol or more, more preferably 0.5 mol, from the viewpoint of suppressing the particle diameter of the titanium oxide particles obtained. More preferably, it is more than 1 mole, and more preferably 1.5 moles or more, and still more preferably 2 moles or more. Further, from the viewpoint of promoting the reaction, it is preferably 50 m or less, more preferably 20 m or less, still more preferably 10 m or less, still more preferably 5 m or less, and further preferably 3 m. Below the ear.
作為此惰性氣體,雖可列舉氮氣、氦氣、氬氣等,但 從經濟性觀點來看較佳為氮氣。在氣體G1中之上述四氯化鈦及上述惰性氣體的合計含量,從得到全Cl含量a低,且均勻性及分散性優異之氧化鈦粒子之觀點來看,較佳為80莫耳%以上,更佳為90莫耳%以上,再更佳為95莫耳%以上,又再更佳為99莫耳%以上。 Examples of the inert gas include nitrogen gas, helium gas, argon gas, and the like. From the economical point of view, it is preferably nitrogen. The total content of the titanium tetrachloride and the inert gas in the gas G1 is preferably 80 mol% or more from the viewpoint of obtaining a titanium oxide particle having a low total Cl content a and excellent uniformity and dispersibility. More preferably, it is 90% by mole or more, more preferably 95% by mole or more, and even more preferably 99% by mole or more.
氣體G2含有氧及水蒸氣之至少1種以及惰性氣體。 The gas G2 contains at least one of oxygen and water vapor and an inert gas.
氣體G2中,相對於氧及水蒸氣的總量1莫耳之惰性氣體的含量,較佳為0.1莫耳以上且50莫耳以下。為50莫耳以下時,由於反應管內之原料濃度高,而促進反應,可減低全Cl含量a及內部Cl含量c。又,為0.1莫耳以上時,可得到內部Cl含量c及全Cl含量a少之氧化鈦粒子。從該觀點來看,相對於氧及水蒸氣的總量1莫耳之惰性氣體的含量,更佳為0.1莫耳以上且30莫耳以下,再更佳為0.1莫耳以上且20莫耳以下,又再更佳為0.1莫耳以上且10莫耳以下,進一步更佳為0.1莫耳以上且5莫耳以下。 In the gas G2, the content of the inert gas of 1 mol with respect to the total amount of oxygen and water vapor is preferably 0.1 mol or more and 50 mol or less. When the concentration is 50 mol or less, since the concentration of the raw material in the reaction tube is high, the reaction is promoted, and the total Cl content a and the internal Cl content c can be reduced. Further, when it is 0.1 mol or more, titanium oxide particles having a small internal Cl content c and a low total Cl content a can be obtained. From this point of view, the content of the inert gas of 1 mol with respect to the total amount of oxygen and water vapor is more preferably 0.1 mol or more and 30 mol or less, still more preferably 0.1 mol or more and 20 mol or less. More preferably, it is 0.1 mol or more and 10 mol or less, and further more preferably 0.1 mol or more and 5 mol or less.
作為此惰性氣體,雖可列舉氮氣、氦氣、氬氣等,但從經濟性觀點來看較佳為氮氣。氣體G2中之惰性氣體雖可與氣體G1中之惰性氣體相同或相異,但從經濟性觀點來看較佳係同時為氮氣。 Examples of the inert gas include nitrogen gas, helium gas, and argon gas. From the viewpoint of economy, nitrogen gas is preferred. Although the inert gas in the gas G2 may be the same as or different from the inert gas in the gas G1, it is preferably nitrogen gas from the viewpoint of economy.
此氣體G2雖可含有氧及水蒸氣之至少1種,但從得到Cl含量低,且均勻性及分散性優異之氧化鈦粒子之觀 點來看,較佳為含有兩者。 Although the gas G2 may contain at least one of oxygen and water vapor, the viewpoint of obtaining a titanium oxide particle having a low Cl content and excellent uniformity and dispersibility is obtained. In terms of point, it is preferable to contain both.
從相同的觀點來看,相對於氧1莫耳。水蒸氣較佳為1莫耳以上,更佳為4莫耳以上,再更佳為10莫耳以上,又再更佳為30莫耳以上、進一步更佳為40莫耳以上,又,較佳為150莫耳以下,更佳為100莫耳以下,再更佳為80莫耳以下,又再更佳為70莫耳以下,進一步更佳為60莫耳以下。 From the same point of view, it is 1 mole relative to oxygen. The water vapor is preferably 1 mole or more, more preferably 4 moles or more, still more preferably 10 moles or more, still more preferably 30 moles or more, still more preferably 40 moles or more, and further preferably. It is 150 m or less, more preferably 100 m or less, even more preferably 80 m or less, and even more preferably 70 m or less, and further preferably 60 m or less.
在氣體G2中之上述氧、水蒸氣及惰性氣體的合計含量,從得到全Cl含量a為低,且均勻性及分散性優異之氧化鈦粒子之觀點來看,較佳為80莫耳%以上,更佳為90莫耳%以上,再更佳為95莫耳%以上,又再更佳為99莫耳%以上。 The total content of the oxygen, the water vapor, and the inert gas in the gas G2 is preferably 80 mol% or more from the viewpoint of obtaining a titanium oxide particle having a low total Cl content a and excellent uniformity and dispersibility. More preferably, it is 90% by mole or more, more preferably 95% by mole or more, and even more preferably 99% by mole or more.
從防止防礙氧化反應的進行,且得到內部Cl含量c及全Cl含量a少之氧化鈦粒子之觀點來看,導入氣體G2之惰性氣體量,相對於導入氣體G1之惰性氣體1莫耳,為5莫耳以上,較佳為10莫耳以上,更佳為20莫耳以上,再更佳為30莫耳以上,又,較佳為100莫耳以下,更佳為80莫耳以下,再更佳為70莫耳以下,又再更佳為60莫耳以下。 From the viewpoint of preventing the progress of the oxidation reaction and obtaining the titanium oxide particles having an internal Cl content c and a total Cl content a, the amount of the inert gas introduced into the gas G2 is 1 mol with respect to the inert gas introduced into the gas G1. 5 mol or more, preferably 10 mol or more, more preferably 20 m or more, still more preferably 30 m or more, and more preferably 100 m or less, more preferably 80 m or less, and then More preferably, it is 70 m or less, and even more preferably 60 m or less.
氧及水蒸氣之對反應管的總導入量,相對於四氯化鈦 之對反應管的導入量1莫耳,較佳為1莫耳以上且50莫耳以下,更佳為1莫耳以上且20莫耳以下。增加氧及水蒸氣的導入量時,增加氧化鈦之成核數之微粒子雖變成易於獲得,但即使超過50莫耳,亦幾乎沒有增加成核數之效果。氧及水蒸氣的導入量即使超過50莫耳,雖對氧化鈦的特性無影響,但從經濟性觀點來看而設定上限。另外,為1莫耳以上時,可得到氧缺陷少且無著色之氧化鈦。 The total amount of oxygen and water vapor to the reaction tube, relative to titanium tetrachloride The introduction amount of the reaction tube is 1 mol, preferably 1 mol or more and 50 mol or less, more preferably 1 mol or more and 20 mol or less. When the introduction amount of oxygen and water vapor is increased, the number of fine particles which increase the number of nucleation of titanium oxide is easily obtained, but even if it exceeds 50 mol, the effect of increasing the number of nucleation is hardly obtained. The introduction amount of oxygen and water vapor does not affect the characteristics of titanium oxide even if it exceeds 50 mol, but the upper limit is set from the viewpoint of economy. Further, when it is 1 mol or more, titanium oxide having little oxygen deficiency and no coloration can be obtained.
氣體G2之對反應管的導入量,相對於氣體G1之對反應管的導入量1莫耳,較佳為1莫耳以上且50莫耳以下,更佳為1莫耳以上且20莫耳以下。增加氣體G2之氣體量時,增加氧化鈦之成核數之微粒子雖變成易於獲得,但即使超過50莫耳,亦幾乎沒有增加成核數之效果。氣體G2即使超過50莫耳,雖對氧化鈦的特性無影響,但從經濟性觀點來看因而設定上限。另外,為1莫耳以上時,可得到氧缺陷少且無著色之氧化鈦。 The introduction amount of the gas G2 to the reaction tube is preferably 1 mol or more and 50 mol or less, more preferably 1 mol or more and 20 mol or less with respect to the introduction amount of the gas G1 to the reaction tube. . When the amount of gas of the gas G2 is increased, the number of fine particles which increase the number of nucleation of titanium oxide is easily obtained, but even if it exceeds 50 m, the effect of increasing the number of nucleation is hardly obtained. Even if the gas G2 exceeds 50 mol, it does not affect the characteristics of titanium oxide, but the upper limit is set from the viewpoint of economy. Further, when it is 1 mol or more, titanium oxide having little oxygen deficiency and no coloration can be obtained.
導入氣體G1及氣體G2之反應管內的溫度,較佳為900℃以上且未滿1,200℃,更佳為900℃以上且未滿1,100℃。藉由提高反應管內溫度,與混合同時完成反應,增進均勻成核,且可縮小反應區。反應管內溫度為 900℃以上時,反應進行良好,氧化鈦粒子之內部Cl含量c減少。另外,反應管內溫度未滿1,200℃時,抑制粒子成長,而得到微粒子。 The temperature in the reaction tube into which the gas G1 and the gas G2 are introduced is preferably 900 ° C or more and less than 1,200 ° C, more preferably 900 ° C or more and less than 1,100 ° C. By increasing the temperature inside the reaction tube, the reaction is completed simultaneously with the mixing, the uniform nucleation is enhanced, and the reaction zone can be narrowed. The temperature inside the reaction tube is When the temperature is 900 ° C or higher, the reaction proceeds well, and the internal Cl content c of the titanium oxide particles decreases. Further, when the temperature inside the reaction tube was less than 1,200 ° C, the growth of the particles was suppressed to obtain fine particles.
原料氣體導入反應管時,只要不實施急速冷卻,即可使氧化鈦粒子晶粒成長,又,已進行粒子的燒結。因此,900℃以上且未滿1,200℃之高溫滯留時間,較佳為0.1秒以下,更佳為0.03秒以下,再更佳為0.02秒以下。 When the raw material gas is introduced into the reaction tube, the titanium oxide particles may be grown without rapid cooling, and the particles may be sintered. Therefore, the high temperature residence time of 900 ° C or more and less than 1,200 ° C is preferably 0.1 second or less, more preferably 0.03 second or less, still more preferably 0.02 second or less.
作為急速冷卻之手段,例如適合採用於反應混合物導入多量之冷卻空氣或氮氣等氣體之方法、或進行水噴霧之方法等。 As means for rapid cooling, for example, a method of introducing a large amount of a gas such as cooling air or nitrogen into the reaction mixture, or a method of performing water spraying, or the like is suitable.
於第2步驟,將於第1步驟所得之粗氧化鈦粒子以乾式脫氯法進行脫氯。 In the second step, the coarse titanium oxide particles obtained in the first step are dechlorinated by a dry dechlorination method.
於此,所謂「乾式脫氯法」係指使用圓筒形回轉式加熱爐、熱風循環式加熱爐、流動乾燥爐、攪拌乾燥爐等加熱裝置,於水蒸氣存在下,加熱粗氧化鈦粒子,去除Cl之方法。此加熱裝置較佳為圓筒形回轉式加熱爐。 Here, the "dry dechlorination method" refers to heating a coarse titanium oxide particle in the presence of water vapor using a heating device such as a cylindrical rotary heating furnace, a hot air circulation type heating furnace, a flow drying furnace, or a stirring drying furnace. The method of removing Cl. This heating device is preferably a cylindrical rotary heating furnace.
尚且,脫氯法中雖亦有濕式脫氯法,但由於必需伴隨乾燥步驟,故凝聚氧化鈦粒子,而減低分散性。 Further, although the dechlorination method also has a wet dechlorination method, it is necessary to carry out the drying step, so that the titanium oxide particles are aggregated to reduce the dispersibility.
藉由粗氧化鈦粒子加熱之脫氯,較佳為水蒸氣與粗氧化鈦粒子的質量比(=水蒸氣之質量/粗氧化鈦粒子之質量。以下相同)以成為0.01以上的方式,一邊使氧化鈦粒子與水蒸氣接觸一邊進行加熱,更佳為0.03以 上,再更佳為0.1以上。 The dechlorination by the heating of the coarse titanium oxide particles is preferably such that the mass ratio of the water vapor to the coarse titanium oxide particles (=the mass of the water vapor/the mass of the coarse titanium oxide particles, the same applies hereinafter) is 0.01 or more. The titanium oxide particles are heated while being in contact with water vapor, more preferably 0.03 Above, it is more preferably 0.1 or more.
脫氯係藉由氧化鈦表面之Cl與粒子附近之水或相鄰粒子之表面羥基進行取代反應予以進行。氧化鈦粒子表面之Cl,被水取代時,雖晶粒無法成長被脫氯化,但被相鄰粒子之表面羥基取代時,變成與脫氯同時進行晶粒成長。亦即,認為為了實現一邊抑制晶粒成長一邊脫氯化,水蒸氣與氧化鈦的質量比亦重要,但若水蒸氣與氧化鈦的質量比為0.01以上,有抑制晶粒成長之效果。 The dechlorination is carried out by subjecting Cl on the surface of the titanium oxide to substitution reaction with water in the vicinity of the particles or surface hydroxyl groups of adjacent particles. When Cl on the surface of the titanium oxide particles is substituted by water, the crystal grains cannot be dechlorinated when they are grown, but when they are substituted by the surface hydroxyl groups of the adjacent particles, the crystal grains are grown simultaneously with dechlorination. In other words, it is considered that the mass ratio of water vapor to titanium oxide is important for dechlorination while suppressing grain growth. However, when the mass ratio of water vapor to titanium oxide is 0.01 or more, the effect of suppressing grain growth is suppressed.
加熱溫度較佳為200℃以上550℃以下,更佳為400℃以上且550℃以下。為550℃以下時,抑制氧化鈦粒子之燒結,並抑制晶粒成長。加熱溫度為200℃以上時,能提高脫氯效率。 The heating temperature is preferably 200 ° C or more and 550 ° C or less, more preferably 400 ° C or more and 550 ° C or less. When it is 550 ° C or less, sintering of titanium oxide particles is suppressed, and grain growth is suppressed. When the heating temperature is 200 ° C or higher, the dechlorination efficiency can be improved.
與氧化鈦接觸之水蒸氣較佳為與空氣混合使用。空氣具有從氧化鈦有效率地將已分離之Cl移動至系統外之功能。又,包含水蒸氣之空氣較佳為於200℃以上且1,000℃以下先進行加熱。 The water vapor in contact with the titanium oxide is preferably used in combination with air. The air has a function of efficiently moving the separated Cl from the titanium oxide to the outside of the system. Further, the air containing water vapor is preferably heated at 200 ° C or more and 1,000 ° C or less.
以下雖針對實施例及比較例進行具體說明,但本發明並非被限定於此等者。 Hereinafter, the examples and comparative examples will be specifically described, but the present invention is not limited thereto.
尚且,對於氧化鈦粒子之物性測定方法係如以下所述。 Further, the method for measuring the physical properties of titanium oxide particles is as follows.
在氧化鈦粒子中之金紅石型氧化鈦的含量(金紅石化率)係藉由粉末X光繞射法進行測定。 The content of the rutile-type titanium oxide in the titanium oxide particles (the ratio of the rutile ratio) was measured by a powder X-ray diffraction method.
亦即,對於使其乾燥之氧化鈦粒子,作為測定裝置使用PANalytical公司製「X’pertPRO」,使用銅靶,使用Cu-Kα1線,以管電壓45kV、管電流40mA、測定範圍2θ=10~80deg、取樣幅度0.0167deg,掃瞄速度0.0192deg/s之條件進行X光繞射測定。 In other words, for the titanium oxide particles to be dried, "X'pertPRO" manufactured by PANalytical Co., Ltd. was used as a measuring device, a copper target was used, and a Cu-Kα1 line was used, with a tube voltage of 45 kV, a tube current of 40 mA, and a measurement range of 2θ = 10~. X-ray diffraction measurement was carried out under the conditions of 80 deg, sampling amplitude of 0.0167 deg, and scanning speed of 0.0192 deg/s.
求得對應金紅石型結晶之最大峰值的峰值高度(Hr)、對應板鈦礦型結晶之最大峰值的峰值高度(Hb)、及對應銳鈦礦型結晶之最大峰值的峰值高度(Ha),並由以下之計算式,求得在氧化鈦粒子中之金紅石型氧化鈦的含量(金紅石化率)。 The peak height (Hr) corresponding to the maximum peak of the rutile crystal, the peak height (Hb) corresponding to the maximum peak of the brookite crystal, and the peak height (Ha) of the maximum peak corresponding to the anatase crystal are obtained. The content of the rutile-type titanium oxide in the titanium oxide particles (the ratio of the rutile ratio) was determined by the following calculation formula.
金紅石化率(%)={Hr/(Ha+Hb+Hr)}×100 Gold red petrochemical rate (%) = {Hr / (Ha + Hb + Hr)} × 100
氧化鈦粒子之BET比表面積Y(m2/g)係以島津製作所製比表面積測定裝置(機種為Flow SorbII,2300)測定。 The BET specific surface area Y (m 2 /g) of the titanium oxide particles was measured by a specific surface area measuring apparatus (model: Flow Sorb II, 2300) manufactured by Shimadzu Corporation.
藉由硝酸銀電位差滴定法,測定氧化鈦粒子中之全Cl含量a。 The total Cl content a in the titanium oxide particles was measured by a silver nitrate potential difference titration method.
亦即,秤量氧化鈦粒子。其次,藉由於此氧化鈦粒子加入氫氟酸進行微波照射而溶解,於該溶液滴下硝酸銀溶 液,藉由測定電位差,求得溶液中氯的質量。而且,從氧化鈦粒子的質量、與溶液中之氯的質量,算出氧化鈦粒子中之全Cl含量a。 That is, the titanium oxide particles are weighed. Secondly, by dissolving the titanium oxide particles by adding hydrofluoric acid to microwave irradiation, the solution is dissolved in silver nitrate. The liquid, by measuring the potential difference, finds the mass of chlorine in the solution. Further, the total Cl content a in the titanium oxide particles was calculated from the mass of the titanium oxide particles and the mass of chlorine in the solution.
由硝酸銀電位差滴定法,測定氧化鈦粒子中之表面Cl含量b。 The surface Cl content b in the titanium oxide particles was measured by a silver nitrate potential difference titration method.
亦即,秤量氧化鈦粒子。其次,藉由將此氧化鈦粒子分散於水並於該溶液滴下硝酸銀溶液,測定電位差,求得溶液中之氯的質量。而且,從氧化鈦粒子的質量、與溶液中之氯的質量,算出氧化鈦粒子中之表面Cl含量b。 That is, the titanium oxide particles are weighed. Next, by dispersing the titanium oxide particles in water and dropping a silver nitrate solution into the solution, the potential difference was measured to determine the mass of chlorine in the solution. Further, the surface Cl content b in the titanium oxide particles was calculated from the mass of the titanium oxide particles and the mass of chlorine in the solution.
從藉由上述(3)及(4)所得之全Cl含量a,並藉由減去表面Cl含量b,算出內部Cl含量c。 From the total Cl content a obtained by the above (3) and (4), and by subtracting the surface Cl content b, the internal Cl content c was calculated.
於氧化鈦粒子0.05g加入純水100ml及10%六偏磷酸鈉水溶液100μl之漿料,進行3分鐘超音波照射(50KHz、100W)。將此漿料放在島津製作所製雷射繞射式粒度分布測定裝置(SALD(註冊商標)-2000J),測定粒度分布。根據該測定,求得D50(以在體積累積粒度分布之累積粒度為50%之粒徑(μm))、D90(以在體積累積粒度分布之累積粒度為90%之粒徑(μm))、X(D90/D50)。又,從此X之值、與前述之BET比表面積Y,算出X/Y。 To 100 g of the titanium oxide particles, 100 ml of pure water and 100 μl of a 10% aqueous sodium hexametaphosphate solution were added, and ultrasonic irradiation (50 kHz, 100 W) was performed for 3 minutes. This slurry was placed in a laser diffraction type particle size distribution measuring apparatus (SALD (registered trademark)-2000J) manufactured by Shimadzu Corporation, and the particle size distribution was measured. According to the measurement, D 50 (particle diameter (μm) having a cumulative particle size of 50% in volume cumulative particle size distribution), D 90 (particle diameter (μm) having a cumulative particle size of 90% in volume cumulative particle size distribution) was obtained. ), X (D 90 / D 50 ). Further, from the value of X and the BET specific surface area Y described above, X/Y is calculated.
在氧化鈦粒子中之氧化鈦的含量係藉由「100-雜質濃度之總和(質量%)」求得。 The content of titanium oxide in the titanium oxide particles is determined by "100-total impurity concentration (% by mass)".
雜質測定方法係如以下所示。 The method of measuring impurities is as follows.
Fe:原子吸光法(日立先端科技公司製原子吸光計Z-2300型) Fe: Atomic Absorption Method (Atom Absorption Meter Z-2300 by Hitachi Advanced Technology Co., Ltd.)
Al,Si:螢光X光分析法(XRF)(理學電機工業公司製Simultix10) Al, Si: Fluorescence X-ray analysis (XRF) (Simultix10, manufactured by Rigaku Motor Co., Ltd.)
C,S:高頻感應爐燃燒紅外線吸收法 C, S: high frequency induction furnace combustion infrared absorption method
Na、Ni、Cr、Nb,Zr:感應耦合電漿質量分析法 Na, Ni, Cr, Nb, Zr: Inductively coupled plasma mass spectrometry
將8.3Nm3/hr(N意味標準狀態,以下相同)之氣體狀四氯化鈦(四氯化鈦之純度≧99.99質量%)以0.5Nm3/hr之氮氣氣體稀釋而得之四氯化鈦稀釋氣體(氣體G1)、與混合18Nm3/hr之惰性氣體於0.5Nm3/hr之氧與36Nm3/hr之水蒸氣而得之氧化性氣體(氣體G2),導入石英玻璃製反應器。將900℃以上且未滿1,200℃之高溫滯留時間以成為0.02秒之方式將冷卻空氣導入反應管後,在聚四氟乙烯製袋式過濾器採集粗氧化鈦粒子。將各種氣體之使用量示於表1。 Tetrachlorination of 8.3 Nm 3 /hr (N means standard state, the same below) of gaseous titanium tetrachloride (purity of titanium tetrachloride ≧ 99.99% by mass) diluted with 0.5 Nm 3 /hr of nitrogen gas A titanium diluent gas (gas G1), an oxidizing gas (gas G2) obtained by mixing 18 Nm 3 /hr of inert gas with 0.5 Nm 3 /hr of oxygen and 36 Nm 3 /hr of water vapor, and introducing it into a quartz glass reactor . The cooling air was introduced into the reaction tube so that the high-temperature residence time of 900 ° C or higher and less than 1,200 ° C was 0.02 seconds, and the coarse titanium oxide particles were collected in a Teflon bag filter. The amounts of various gases used are shown in Table 1.
將所得之粗氧化鈦粒子通過圓筒形回轉式加熱爐,水蒸氣與粗氧化鈦的質量比(水蒸氣的質量/粗氧化鈦粒子的質量)為0.7,於加熱溫度510℃進行脫Cl,得到氧化鈦粒子,測定各種物性。將其測定結果示於表3。 The obtained coarse titanium oxide particles were passed through a cylindrical rotary heating furnace, and the mass ratio of the water vapor to the coarse titanium oxide (mass of water vapor/mass of coarse titanium oxide particles) was 0.7, and de-Cl was performed at a heating temperature of 510 ° C. Titanium oxide particles were obtained, and various physical properties were measured. The measurement results are shown in Table 3.
除了將第1步驟之氣體量、高溫滯留時間如表1或表2所示進行之外,其他與實施例1同樣進行,實施第1步驟。 The first step was carried out in the same manner as in Example 1 except that the amount of gas in the first step and the high-temperature residence time were as shown in Table 1 or Table 2.
其次,除了將第2步驟之水與粗氧化鈦的質量比、加熱溫度如表1或表2所示進行之外,其他與實施例1同樣進行,實施第2步驟。將測定結果示於表3或表4。 Next, the second step was carried out in the same manner as in Example 1 except that the mass ratio of the water of the second step to the coarse titanium oxide and the heating temperature were as shown in Table 1 or Table 2. The measurement results are shown in Table 3 or Table 4.
藉由日本特開2007-314418號公報所記載之製造條件得到氧化鈦粒子。將詳細如以下所示。 Titanium oxide particles are obtained by the production conditions described in JP-A-2007-314418. The details will be as follows.
將11.8Nm3/hr之氣體狀四氯化鈦以8Nm3/hr之惰性氣體稀釋之四氯化鈦稀釋氣體,於900℃預熱,將混合8Nm3/hr之氧與32Nm3/hr之水蒸氣之氧化性氣體於800℃下預熱,導入石英玻璃製反應器。以將800℃以上且未滿1,000℃之高溫滯留時間成為0.01秒的方式,將冷卻空氣導入反應管後,在聚四氟乙烯製袋式過濾器採集微粒子狀氧化鈦粒子。 The gaseous 11.8Nm 3 / hr of titanium tetrachloride diluted in 8Nm 3 / hr of titanium tetrachloride diluted gas inert gas, preheated at 900 ℃, mixing 8Nm 3 / hr of oxygen to 32Nm 3 / hr of The oxidizing gas of water vapor was preheated at 800 ° C and introduced into a reactor made of quartz glass. The cooling air was introduced into the reaction tube so that the high-temperature residence time of 800 ° C or more and less than 1,000 ° C was 0.01 second, and the fine particle-shaped titanium oxide particles were collected in a polytetrafluoroethylene bag filter.
將所得之氧化鈦粒子通過圓筒形回轉式加熱爐,以水與氧化鈦的質量比為0.02、加熱溫度450℃進行脫Cl,而得到氧化鈦粒子。所得氧化鈦粒子之全Cl含量a已超過200質量ppm,X/Y大於0.060。 The obtained titanium oxide particles were passed through a cylindrical rotary heating furnace, and de-Cl was carried out at a mass ratio of water to titanium oxide of 0.02 and a heating temperature of 450 ° C to obtain titanium oxide particles. The total Cl content a of the obtained titanium oxide particles had exceeded 200 ppm by mass, and X/Y was more than 0.060.
將氣體量示於表2,將氧化鈦粒子物性之測定結果示於表4。 The gas amount is shown in Table 2, and the measurement results of the physical properties of the titanium oxide particles are shown in Table 4.
除了變更為記載於日本特開2007-314418號公報、表2所記載之製造條件之外,其他與比較例3同樣進行而得到氧化鈦粒子。 The titanium oxide particles were obtained in the same manner as in Comparative Example 3 except that the production conditions described in JP-A-2007-314418 and Table 2 were changed.
將氣體量示於表2,將氧化鈦粒子物性之測定結果示於表4。 The gas amount is shown in Table 2, and the measurement results of the physical properties of the titanium oxide particles are shown in Table 4.
除了變更為記載於日本特開2011-57552、表2所記載之製造條件之外,其他與比較例3同樣進行而得到氧化鈦粒子。 The titanium oxide particles were obtained in the same manner as in Comparative Example 3 except that the production conditions described in JP-A-2011-57552 and Table 2 were changed.
將氣體量示於表2,將氧化鈦粒子物性之測定結果示於表4。 The gas amount is shown in Table 2, and the measurement results of the physical properties of the titanium oxide particles are shown in Table 4.
除了變更為記載於日本特開平10-251021、表2所記載之製造條件之外,其他與比較例3同樣進行而得到氧化 鈦粒子。 The oxidation was carried out in the same manner as in Comparative Example 3 except that the production conditions described in JP-A-10-25102, Table 2 were changed. Titanium particles.
將氣體量示於表2,將氧化鈦粒子物性之測定結果示於表4。 The gas amount is shown in Table 2, and the measurement results of the physical properties of the titanium oxide particles are shown in Table 4.
除了變更為記載於日本特開2003-277057、表2所記載之製造條件之外,其他與比較例3同樣進行而得到氧化鈦粒子。 The titanium oxide particles were obtained in the same manner as in Comparative Example 3 except that the production conditions described in JP-A-2003-277057 and Table 2 were changed.
將氣體量示於表2,將氧化鈦粒子物性之測定結果示於表4。 The gas amount is shown in Table 2, and the measurement results of the physical properties of the titanium oxide particles are shown in Table 4.
藉由本發明,提供一種與具有同等BET比表面積之以往之氧化鈦相比較,雜質少且均勻性及分散性優異之氣相法之氧化鈦粒子及此等之製造方法。本發明之氧化鈦係適用在光觸媒用途或太陽能電池用途、介電質用途等,即使作為粉體亦不要解碎步驟等或者以極為輕微之設備即可,係工業上具有非常重大實用價值者。 According to the present invention, there is provided a vapor phase method of titanium oxide particles having less impurities and superior uniformity and dispersibility than conventional titanium oxide having the same BET specific surface area, and a process for producing the same. The titanium oxide of the present invention is suitable for photocatalytic use, solar cell use, dielectric use, etc., and does not require a disintegration step or the like as a powder, or an extremely slight device, and is industrially very valuable.
Claims (13)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013157885A JP6243649B2 (en) | 2013-07-30 | 2013-07-30 | Titanium oxide particles and method for producing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201504155A TW201504155A (en) | 2015-02-01 |
TWI522318B true TWI522318B (en) | 2016-02-21 |
Family
ID=52491930
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103115801A TWI522318B (en) | 2013-07-30 | 2014-05-02 | Titanium oxide particles and methods for producing the same |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6243649B2 (en) |
KR (1) | KR101601752B1 (en) |
CN (1) | CN104341002B (en) |
TW (1) | TWI522318B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113260594B (en) | 2019-02-19 | 2024-01-30 | 株式会社力森诺科 | Method for producing titanium oxide |
US11499930B2 (en) * | 2019-07-25 | 2022-11-15 | Saudi Arabian Oil Company | Measurement of chloride content in catalysts |
WO2022030165A1 (en) * | 2020-08-04 | 2022-02-10 | 大塚化学株式会社 | Friction adjusting material, friction material composition, friction material, and friction member |
JP7016997B1 (en) * | 2020-08-04 | 2022-02-07 | 大塚化学株式会社 | Friction modifiers, friction material compositions, friction materials, and friction members |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3993956B2 (en) * | 1999-11-19 | 2007-10-17 | 東邦チタニウム株式会社 | Method for producing spherical titanium oxide fine particles |
JP2001220141A (en) * | 2000-02-03 | 2001-08-14 | Toho Titanium Co Ltd | Titanium oxide dispersion |
JP4412643B2 (en) * | 2003-10-01 | 2010-02-10 | 東邦チタニウム株式会社 | Method for producing titanium oxide powder |
JP4780635B2 (en) * | 2004-06-16 | 2011-09-28 | 東邦チタニウム株式会社 | Method for producing titanium oxide dispersion |
KR100854984B1 (en) * | 2004-08-11 | 2008-08-28 | 쇼와 덴코 가부시키가이샤 | Fine particulate titanium dioxide, and production process and use thereof |
CN101006015B (en) * | 2004-08-11 | 2012-04-25 | 昭和电工株式会社 | Fine particulate titanium dioxide, and production process and use thereof |
TWI314919B (en) * | 2005-02-28 | 2009-09-21 | Showa Denko Kk | Fine particulate titanium dioxide, and production process and uses thereof |
JP4676877B2 (en) * | 2005-12-28 | 2011-04-27 | 住友大阪セメント株式会社 | High crystalline anatase-type titanium oxide ultrafine particles with controlled particle shape and method for producing the same |
JP5553601B2 (en) | 2007-07-27 | 2014-07-16 | 東邦チタニウム株式会社 | Method for producing titanium oxide powder |
US8178074B2 (en) * | 2008-08-29 | 2012-05-15 | Showa Denko K.K. | Method for producing titanium oxide particles |
TWI487668B (en) * | 2009-02-19 | 2015-06-11 | Sakai Chemical Industry Co | Dispersion of rutile-type titanium oxide particles, method for producing the same, and use thereof |
JP5275090B2 (en) * | 2009-03-06 | 2013-08-28 | 東邦チタニウム株式会社 | Method for producing fine particle titanium oxide powder |
CN102140687B (en) * | 2011-03-08 | 2014-04-09 | 华东理工大学 | Preparation method of single-crystal titanium dioxide |
-
2013
- 2013-07-30 JP JP2013157885A patent/JP6243649B2/en active Active
-
2014
- 2014-05-02 TW TW103115801A patent/TWI522318B/en active
- 2014-06-03 CN CN201410241817.8A patent/CN104341002B/en active Active
- 2014-06-09 KR KR1020140069185A patent/KR101601752B1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP2015027924A (en) | 2015-02-12 |
CN104341002B (en) | 2016-05-04 |
KR20150014845A (en) | 2015-02-09 |
KR101601752B1 (en) | 2016-03-09 |
CN104341002A (en) | 2015-02-11 |
JP6243649B2 (en) | 2017-12-06 |
TW201504155A (en) | 2015-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI503281B (en) | Titanium oxide sol, method for producing the same, ultrafine particulate titanium oxide, method and use thereof | |
TWI522318B (en) | Titanium oxide particles and methods for producing the same | |
JP4027249B2 (en) | Low halogen low rutile ultrafine titanium oxide and method for producing the same | |
JP6149039B2 (en) | Ultrafine titanium dioxide and method for producing the same | |
JP5553601B2 (en) | Method for producing titanium oxide powder | |
JP3993956B2 (en) | Method for producing spherical titanium oxide fine particles | |
JP6423501B2 (en) | Titanium oxide particles and method for producing the same | |
JP2001287996A (en) | Anatase-type titanium oxide single crystal | |
JP4895929B2 (en) | Low halogen low rutile ultrafine titanium oxide and method for producing the same | |
TWI794460B (en) | Titanium oxide particles and method for producing same | |
JP3787254B2 (en) | Method for producing titanium oxide fine particles | |
TWI638777B (en) | Ultrafine titanium dioxide and manufacturing method thereof | |
JP7106770B2 (en) | Highly heat-resistant anatase-type titanium oxide and method for producing the same | |
JP4812213B2 (en) | Fine particulate titanium oxide and method for producing the same | |
CN117295692A (en) | Titanium oxide particles and method for producing same | |
He et al. | Preparation and characterisation of nanosized antimony-doped tin dioxide powders with a novel post-treatment process | |
JP2009013050A (en) | Sulfur-containing titanium oxide and its production method and sulfur-containing titanium oxide dispersion and its production method |