TWI520295B - Substrate having pillar group and via group and semiconductor package having pillar group and via group - Google Patents

Substrate having pillar group and via group and semiconductor package having pillar group and via group Download PDF

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Publication number
TWI520295B
TWI520295B TW102121206A TW102121206A TWI520295B TW I520295 B TWI520295 B TW I520295B TW 102121206 A TW102121206 A TW 102121206A TW 102121206 A TW102121206 A TW 102121206A TW I520295 B TWI520295 B TW I520295B
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Taiwan
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conductive
group
substrate
pads
metal
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TW102121206A
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Chinese (zh)
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TW201448155A (en
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田雲翔
丁一權
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日月光半導體製造股份有限公司
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具金屬柱組及導電孔組之基板及具金屬柱組及導電孔組之封裝結構 Substrate with metal column group and conductive hole group and package structure with metal column group and conductive hole group

本發明係關於一種基板及封裝結構。詳言之,本發明係關於一種具金屬柱組及導電孔組之基板及具金屬柱組及導電孔組之封裝結構。 The present invention relates to a substrate and a package structure. In particular, the present invention relates to a substrate having a metal pillar group and a conductive hole group, and a package structure having a metal pillar group and a conductive hole group.

習知金屬柱設置於基板之周邊,且圍繞基板上之晶片,以做為與其他基板互連(interconnect)之輸入/輸出(I/O)連接點。然而,依據目前習知金屬柱之結構,難以再提高在該基板上之習知金屬柱數量,故不能提高互連的I/O數量。再者,即使利用導電孔(Via)結構,一個導電孔僅能電性連接一個金屬柱,仍難以再提高在該基板上之習知金屬柱數量及不能提高互連的I/O數量。 Conventional metal posts are placed around the substrate and surround the wafer on the substrate as an input/output (I/O) connection point for interconnection with other substrates. However, according to the structure of the conventional metal column, it is difficult to increase the number of conventional metal pillars on the substrate, so the number of interconnected I/Os cannot be increased. Moreover, even with a conductive via (Via) structure, one conductive via can only be electrically connected to one metal pillar, and it is still difficult to increase the number of conventional metal pillars on the substrate and the number of I/Os that cannot be interconnected.

本揭露之一方面係關於一種具金屬柱組及導電孔組之基板。在一實施例中,該具金屬柱組及導電孔組之基板包括:一基板本體、複數個第一導電墊、複數個第一金屬柱、至少一導電墊組、至少一金屬柱組及至少一第一導電孔組。該基板本體具有一第一表面、一第一中間層、一第一線路層及一第二線路層,該第一線路層包括複數條第一 導線,設置於該第一表面,該第二線路層包括複數條第二導線,設置於該基板本體之該第一中間層。該等第一導電墊設置於該第一表面,分別電性連接該等第一導線。該等第一金屬柱分別形成於該等第一導電墊上。該至少一導電墊組設置於該第一表面,每一個導電墊組包括複數個第二導電墊,每一個第二導電墊具有至少一內側邊及至少一外側邊,在導電墊組內之一第二導電墊之該內側邊與相鄰第二導電墊之該內側邊彼此相對且其之間具有一狹長間隔區。該至少一金屬柱組形成於部分該至少一導電墊組上,每一個金屬柱組包括複數個第二金屬柱,分別對應形成於部分該等第二導電墊上。每一個第一導電孔組包括一第一通孔及複數個第一導體區段,該第一通孔通過該第一表面及該第一中間層,該等第一導體區段設置於該第一通孔內,且對應該導電墊組之該等第二導電墊,該等第一導體區段分別電性連接該等第二導電墊及該等第二導線。 One aspect of the disclosure relates to a substrate having a set of metal pillars and a set of conductive holes. In one embodiment, the substrate having the metal pillar group and the conductive hole group includes: a substrate body, a plurality of first conductive pads, a plurality of first metal pillars, at least one conductive pad group, at least one metal pillar group, and at least a first set of conductive holes. The substrate body has a first surface, a first intermediate layer, a first circuit layer and a second circuit layer, and the first circuit layer includes a plurality of first lines The wire is disposed on the first surface, and the second circuit layer includes a plurality of second wires disposed on the first intermediate layer of the substrate body. The first conductive pads are disposed on the first surface and electrically connected to the first wires. The first metal pillars are respectively formed on the first conductive pads. The at least one conductive pad set is disposed on the first surface, each of the conductive pad sets includes a plurality of second conductive pads, each of the second conductive pads having at least one inner side and at least one outer side in the conductive pad set The inner side of one of the second conductive pads and the inner side of the adjacent second conductive pad are opposite each other with an elongated spacer therebetween. The at least one metal pillar group is formed on a portion of the at least one conductive pad group, and each of the metal pillar groups includes a plurality of second metal pillars respectively formed on a portion of the second conductive pads. Each of the first conductive hole groups includes a first through hole and a plurality of first conductive segments, the first through hole passes through the first surface and the first intermediate layer, and the first conductive segments are disposed on the first conductive layer The first conductive segments are electrically connected to the second conductive pads and the second conductive wires respectively in a through hole and corresponding to the second conductive pads of the conductive pad group.

本揭露之另一方面係關於一種具金屬柱組及導電孔組之封裝結構。在一實施例中,該具金屬柱組及導電孔組之封裝結構包括:一第一基板、一第二基板、一晶片及封膠。該第一基板包括一第一基板本體、複數個第一導電墊、複數個第一金屬柱、至少一導電墊組、至少一金屬柱組及至少一第一導電孔組。該第一基板本體具有一第一表面、一第一中間層、一第一線路層及一第二線路層,該第一線路層包括複數條第一導線,設置於該第一表面,該第二線路層包括複數條第二導線,設置於該基板本體之該第一中間層。該等第一導電墊設置於該第一表面,分別電性連接該等第一導線。該等第一金屬柱,分別形成於該等第一導電墊上。該至少一導電墊組設置於該第一表面,每一個導電墊組包括複數個第二導電墊,每一個第二導電墊具有至少一內側邊及至少一外側邊,在導電墊組內之一第二導電墊之該內側邊與相鄰第二導電墊之該內側邊彼此相對且其之間具有一狹長間隔區。該至 少一金屬柱組形成於部分該至少一導電墊組上,每一個金屬柱組包括複數個第二金屬柱,分別對應形成於部分該等第二導電墊上;每一個第一導電孔組包括一第一通孔及複數個第一導體區段,該第一通孔通過該第一表面及該第一中間層,該等第一導體區段設置於該第一通孔內,且對應該導電墊組之該等第二導電墊,該等第一導體區段分別電性連接該等第二導電墊及該等第二導線。該第二基板包括一第二基板本體及複數個導電端點,該第二基板本體具有一第二表面,係面對該第一基板之該第一表面。該第二基板之該等導電端點電性連接該第一基板之該等第一金屬柱及該至少一金屬柱組。該晶片設置於該第一基板,並與第一基板的至少一個該等第一導線或第二導線電性連結。封膠設置於該第一基板及該第二基板之間。 Another aspect of the disclosure relates to a package structure having a metal pillar group and a conductive hole group. In one embodiment, the package structure having the metal pillar group and the conductive hole group includes: a first substrate, a second substrate, a wafer, and a sealant. The first substrate includes a first substrate body, a plurality of first conductive pads, a plurality of first metal pillars, at least one conductive pad set, at least one metal pillar set, and at least one first conductive hole set. The first substrate body has a first surface, a first intermediate layer, a first circuit layer and a second circuit layer. The first circuit layer includes a plurality of first wires disposed on the first surface. The two circuit layers include a plurality of second wires disposed on the first intermediate layer of the substrate body. The first conductive pads are disposed on the first surface and electrically connected to the first wires. The first metal pillars are respectively formed on the first conductive pads. The at least one conductive pad set is disposed on the first surface, each of the conductive pad sets includes a plurality of second conductive pads, each of the second conductive pads having at least one inner side and at least one outer side in the conductive pad set The inner side of one of the second conductive pads and the inner side of the adjacent second conductive pad are opposite each other with an elongated spacer therebetween. The to a plurality of metal pillars are formed on a portion of the at least one conductive pad group, each of the metal pillar groups includes a plurality of second metal pillars respectively formed on a portion of the second conductive pads; each of the first conductive via groups includes a a first through hole and a plurality of first conductor segments, the first through hole passing through the first surface and the first intermediate layer, wherein the first conductive segments are disposed in the first through hole and corresponding to the conductive The second conductive pads of the pad group are electrically connected to the second conductive pads and the second wires, respectively. The second substrate includes a second substrate body and a plurality of conductive terminals, and the second substrate body has a second surface facing the first surface of the first substrate. The conductive terminals of the second substrate are electrically connected to the first metal pillars of the first substrate and the at least one metal pillar group. The wafer is disposed on the first substrate and electrically coupled to at least one of the first wires or the second wires of the first substrate. The sealant is disposed between the first substrate and the second substrate.

利用導電墊組具有複數個第二導電墊,及可對應設置複數個第二金屬柱,且導電孔組具有複數個導體區段,電性連接該等第二導電墊,故可大幅提高金屬柱之數量,進而提高I/O數量,且可縮小導電墊、金屬柱及導電孔組所佔之面積。 The conductive pad set has a plurality of second conductive pads, and a plurality of second metal pillars are correspondingly arranged, and the conductive hole group has a plurality of conductor segments electrically connected to the second conductive pads, so that the metal pillars can be greatly improved The number of I/Os is increased, and the area occupied by the conductive pads, the metal posts, and the conductive hole groups can be reduced.

10‧‧‧具金屬柱組及導電孔組之基板、第一基板 10‧‧‧substrate and first substrate with metal column group and conductive hole group

11‧‧‧基板本體、第一基板本體 11‧‧‧Substrate body, first substrate body

12‧‧‧第一導電墊 12‧‧‧First conductive pad

13‧‧‧第一金屬柱 13‧‧‧First metal column

14‧‧‧導電墊組 14‧‧‧Electrical mat group

15‧‧‧金屬柱組 15‧‧‧Metal column group

16‧‧‧第一導電孔組 16‧‧‧First conductive hole group

17‧‧‧第一中間層導電墊組 17‧‧‧First intermediate layer conductive pad set

111‧‧‧第一表面 111‧‧‧ first surface

112‧‧‧第一中間層 112‧‧‧First intermediate layer

113‧‧‧第一線路層 113‧‧‧First circuit layer

114‧‧‧第二線路層 114‧‧‧Second circuit layer

115‧‧‧第一導線 115‧‧‧First wire

116‧‧‧第二導線 116‧‧‧second wire

141、142‧‧‧第二導電墊 141, 142‧‧‧second conductive pad

145、147‧‧‧導電墊之內側邊 145, 147‧‧‧ the inner side of the conductive pad

146、148‧‧‧導電墊之外側邊 146, 148‧‧‧ outside the conductive pad

149‧‧‧狹長間隔區 149‧‧‧Slong interval

151、152‧‧‧第二金屬柱 151, 152‧‧‧ second metal column

161‧‧‧第一通孔 161‧‧‧ first through hole

162、163‧‧‧第一導體區段 162, 163‧‧‧ first conductor section

171、172‧‧‧第三導電墊 171, 172‧‧‧ third conductive pad

20‧‧‧具金屬柱組及導電孔組之基板 20‧‧‧Substrate with metal column group and conductive hole group

24‧‧‧導電墊組 24‧‧‧Electrical mat set

25‧‧‧金屬柱組 25‧‧‧Metal column group

27‧‧‧第一中間層導電墊組 27‧‧‧First intermediate layer conductive pad set

241、242、243、244‧‧‧第二導電墊 241, 242, 243, 244‧‧‧ second conductive pads

251、252、253、254‧‧‧第二金屬柱 251, 252, 253, 254‧‧‧ second metal column

271、272、273、274‧‧‧第三導電墊 271, 272, 273, 274‧‧‧ third conductive pads

30‧‧‧具金屬柱組及導電孔組之基板 30‧‧‧Substrate with metal column group and conductive hole group

34‧‧‧導電墊組 34‧‧‧Electrical mat set

35‧‧‧金屬柱組 35‧‧‧Metal column group

37‧‧‧第一中間層導電墊組 37‧‧‧First intermediate layer conductive pad set

341、342、343、344、345、346‧‧‧第二導電墊 341, 342, 343, 344, 345, 346‧‧‧ second conductive pads

351、352、353、354、355、356‧‧‧第二金屬柱 351, 352, 353, 354, 355, 356‧‧‧ second metal column

371、372、373、374、375、376‧‧‧第三導電墊 371, 372, 373, 374, 375, 376‧‧‧ third conductive pads

40‧‧‧具金屬柱組及導電孔組之基板 40‧‧‧Substrate with metal column group and conductive hole group

41‧‧‧基板本體 41‧‧‧Substrate body

411‧‧‧第一表面 411‧‧‧ first surface

112‧‧‧第一中間層 112‧‧‧First intermediate layer

414‧‧‧第三線路層 414‧‧‧ third circuit layer

415‧‧‧第二中間層 415‧‧‧Second intermediate layer

416‧‧‧第三導線 416‧‧‧ Third wire

47‧‧‧導電墊組 47‧‧‧Electrical mat set

471、472、473、474‧‧‧第二導電墊 471, 472, 473, 474‧‧‧ second conductive pads

49‧‧‧第二導電孔組 49‧‧‧Second conductive hole group

491‧‧‧第二通孔 491‧‧‧Second through hole

492、493‧‧‧第二導體區段 492, 493‧‧‧second conductor section

52‧‧‧第一中間層導電墊組 52‧‧‧First intermediate layer conductive pad set

521、522、523、524‧‧‧第四導電墊 521, 522, 523, 524‧‧‧4th conductive pad

53‧‧‧第二中間層導電墊組 53‧‧‧Second intermediate layer conductive pad set

531、532、533、534‧‧‧第五導電墊 531, 532, 533, 534‧‧‧ fifth conductive pad

611、612、613、614‧‧‧第二導電墊 611, 612, 613, 614‧‧‧ second conductive pads

62‧‧‧第六導電墊 62‧‧‧6th conductive pad

63‧‧‧第三金屬柱 63‧‧‧ Third metal column

70‧‧‧具金屬柱組及導電孔組之封裝結構 70‧‧‧Package structure with metal column group and conductive hole group

71‧‧‧晶片 71‧‧‧ wafer

72‧‧‧封膠 72‧‧‧Packing

80‧‧‧第二基板 80‧‧‧second substrate

81‧‧‧第二基板本體 81‧‧‧Second substrate body

82‧‧‧導電端點 82‧‧‧Electrical end points

811‧‧‧第二表面 811‧‧‧ second surface

821‧‧‧金屬凸塊 821‧‧‧Metal bumps

822‧‧‧焊料 822‧‧‧ solder

圖1顯示本發明具金屬柱組及導電孔組之基板之第一實施例之剖視示意圖;圖2顯示本發明具金屬柱組及導電孔組之基板之第一實施例由第一表面之上視示意圖;圖3顯示本發明具金屬柱組及導電孔組之基板之第一實施例由第一中間層之示意圖;圖4顯示本發明具金屬柱組及導電孔組之基板之第二實施例由第一表面之上視示意圖;圖5顯示本發明具金屬柱組及導電孔組之基板之第二實施例由第一中間層之示意圖; 圖6顯示本發明具金屬柱組及導電孔組之基板之第三實施例由第一表面之上視示意圖;圖7顯示本發明具金屬柱組及導電孔組之基板之第三實施例由第一中間層之示意圖;圖8顯示本發明具金屬柱組及導電孔組之基板之第四實施例之剖視示意圖;圖9顯示本發明具金屬柱組及導電孔組之基板之第四實施例由第一表面之上視示意圖;圖10顯示本發明具金屬柱組及導電孔組之基板之第四實施例由第一中間層之示意圖;圖11顯示本發明具金屬柱組及導電孔組之基板之第四實施例由第二中間層之示意圖;圖12顯示本發明具金屬柱組及導電孔組之基板之第五實施例之剖視示意圖;圖13顯示本發明具金屬柱組及導電孔組之基板之第五實施例由第一表面之上視示意圖;圖14顯示本發明具金屬柱組及導電孔組之封裝結構之剖視示意圖;及圖15顯示本發明具金屬柱組及導電孔組之基板之一實施例由第一表面之上視示意圖。 1 is a cross-sectional view showing a first embodiment of a substrate having a metal pillar group and a conductive hole group according to the present invention; and FIG. 2 is a view showing a first embodiment of the substrate having a metal pillar group and a conductive hole group according to the present invention. FIG. 3 is a schematic view showing a first embodiment of a substrate having a metal pillar group and a conductive hole group according to the present invention; FIG. 4 is a second embodiment of the substrate having a metal pillar group and a conductive hole group according to the present invention; The embodiment is a schematic view from the top of the first surface; FIG. 5 is a schematic view showing the second embodiment of the substrate with the metal pillar group and the conductive hole group of the present invention; 6 is a top plan view showing a third embodiment of a substrate having a metal pillar group and a conductive hole group according to the present invention; FIG. 7 is a view showing a third embodiment of the substrate having the metal pillar group and the conductive hole group of the present invention. FIG. 8 is a cross-sectional view showing a fourth embodiment of a substrate having a metal pillar group and a conductive hole group according to the present invention; and FIG. 9 is a fourth embodiment of the substrate having a metal pillar group and a conductive hole group according to the present invention; The embodiment is shown in the top view of the first surface; FIG. 10 is a schematic view showing the fourth embodiment of the substrate with the metal pillar group and the conductive hole group of the present invention, and FIG. 11 shows the metal pillar group and the conductive layer of the present invention. The fourth embodiment of the substrate of the hole group is a schematic view of the second intermediate layer; FIG. 12 is a schematic cross-sectional view showing the fifth embodiment of the substrate with the metal column group and the conductive hole group of the present invention; FIG. 13 shows the metal column of the present invention. The fifth embodiment of the substrate of the group and the conductive hole group is viewed from the top of the first surface; FIG. 14 is a schematic cross-sectional view showing the package structure of the metal column group and the conductive hole group of the present invention; and FIG. 15 shows the metal of the present invention. Column group and conductive hole group One embodiment of the substrate is viewed from above the first surface.

圖1顯示本發明具金屬柱組及導電孔組之基板之第一實施例之剖視示意圖。圖2顯示本發明具金屬柱組及導電孔組之基板之第一實施例由第一表面之上視示意圖。圖3顯示本發明具金屬柱組及導電孔組之基板之第一實施例由第一中間層之示意圖。配合參考圖1至圖3,該具金屬柱組及導電孔組之基板10包括:一基板本體11、複數個第一導 電墊12、複數個第一金屬柱13、至少一導電墊組14、至少一金屬柱組15及至少一第一導電孔組16。 1 is a cross-sectional view showing a first embodiment of a substrate having a metal pillar group and a conductive hole group according to the present invention. 2 shows a top view of a first embodiment of a substrate having a metal pillar set and a conductive via set of the present invention. 3 is a schematic view showing a first embodiment of a substrate having a metal pillar group and a conductive hole group according to the present invention. Referring to FIG. 1 to FIG. 3, the substrate 10 having the metal pillar group and the conductive hole group includes: a substrate body 11 and a plurality of first guides The electric pad 12, the plurality of first metal posts 13, the at least one conductive pad set 14, the at least one metal post set 15 and the at least one first conductive hole set 16.

該基板本體11具有一第一表面111、一第一中間層112、一第一線路層113及一第二線路層114,該第一線路層113包括複數條第一導線115,設置於該第一表面111。該第二線路層114包括複數條第二導線116,設置於該基板本體11之該第一中間層112。 The substrate body 11 has a first surface 111, a first intermediate layer 112, a first circuit layer 113 and a second circuit layer 114. The first circuit layer 113 includes a plurality of first wires 115 disposed on the substrate A surface 111. The second circuit layer 114 includes a plurality of second wires 116 disposed on the first intermediate layer 112 of the substrate body 11.

該等第一導電墊12設置於該第一表面111,分別電性連接該等第一導線115。該等第一金屬柱13分別形成於該等第一導電墊12上。該至少一導電墊組14設置於該第一表面111,每一個導電墊組包括複數個第二導電墊,在本實施例中,該導電墊組14包括二個第二導電墊141、142。每一個第二導電墊具有至少一內側邊及至少一外側邊,其中該第二導電墊141具有一內側邊145及一外側邊146,該第二導電墊142具有一內側邊147及一外側邊148。在導電墊組14內之該第二導電墊141之該內側邊145與相鄰第二導電墊142之該內側邊147彼此相對且其之間具有一狹長間隔區149。在本實施例中,該第二導電墊141之該內側邊145與相鄰第二導電墊142之該內側邊147平行,亦即,該狹長間隔區149為平行間隔區149。在本發明另一實施例中,第二導電墊為橢圓形結構,長邊半徑定義出橢圓形的內側邊及外側邊,該第二導電墊之該內側邊與相鄰第二導電墊之該內側邊皆為圓弧結構,間隔區為由中間窄往外漸寬的結構。參考圖15,該第二導電墊之該至少一內側邊與相鄰第二導電墊的內側邊具有一最短距離S及一最遠距離L,在該等第二導電墊的最短距離S的位置與最遠距離L的位置兩者距離為X1,最短距離S與最遠距離L的差為X2,其中2X1大於X2。 The first conductive pads 12 are disposed on the first surface 111 and electrically connected to the first conductive lines 115, respectively. The first metal pillars 13 are formed on the first conductive pads 12, respectively. The at least one conductive pad set 14 is disposed on the first surface 111, and each of the conductive pad sets includes a plurality of second conductive pads. In the embodiment, the conductive pad set 14 includes two second conductive pads 141, 142. Each of the second conductive pads 141 has an inner side 145 and an outer side 146, and the second conductive pad 142 has an inner side. 147 and an outer side 148. The inner side 145 of the second conductive pad 141 in the conductive pad set 14 and the inner side 147 of the adjacent second conductive pad 142 are opposite each other with an elongated spacer 149 therebetween. In this embodiment, the inner side 145 of the second conductive pad 141 is parallel to the inner side 147 of the adjacent second conductive pad 142, that is, the elongated spacer 149 is a parallel spacer 149. In another embodiment of the present invention, the second conductive pad has an elliptical structure, and the long side radius defines an inner side and an outer side of the elliptical shape, and the inner side of the second conductive pad and the adjacent second conductive The inner side of the pad is a circular arc structure, and the spacing area is a structure that is gradually widened from the middle to the outside. Referring to FIG. 15, the at least one inner side of the second conductive pad has a shortest distance S and a farthest distance L from the inner side of the adjacent second conductive pad, and the shortest distance S of the second conductive pads The distance between the position of the farthest distance L and the position of the farthest distance L is X1, and the difference between the shortest distance S and the farthest distance L is X2, where 2X1 is greater than X2.

該至少一金屬柱組15形成於部分該至少一導電墊組14上,每一個金屬柱組包括複數個第二金屬柱,在本實施例中,該金屬柱組15包括二個第二金屬柱151、152,分別對應形成於該等第二導電墊141、 142上。且該導電墊組14為圓形,二個第二導電墊141、142為半圓形,二個第二金屬柱151、152為圓形。本發明另一實施例中,第二金屬柱可以是橢圓形。 The at least one metal pillar group 15 is formed on a portion of the at least one conductive pad group 14, each of the metal pillar groups includes a plurality of second metal pillars. In the embodiment, the metal pillar group 15 includes two second metal pillars. 151, 152, respectively corresponding to the second conductive pads 141, On 142. The conductive pad group 14 is circular, the two second conductive pads 141, 142 are semi-circular, and the two second metal posts 151, 152 are circular. In another embodiment of the invention, the second metal post may be elliptical.

每一個第一導電孔組16包括一第一通孔161及複數個第一導體區段162、163,在本實施例中,該第一導電孔組16包括該第一通孔161及二個第一導體區段162、163。該第一通孔161通過該第一表面111及該第一中間層112,該等第一導體區段162、163設置於該第一通孔161內,且對應該導電墊組14之該等第二導電墊141、142。對應於半圓形之第二導電墊141、142,該等第一導體區段162、163可為半圓柱形。該等第一導體區段162、163分別電性連接該等第二導電墊141、142及該等第二導線116。該等第一導體區段162、163之間可具有介電材料以避免導電區段內短路。 Each of the first conductive vias 16 includes a first via 161 and a plurality of first conductor segments 162 and 163. In this embodiment, the first conductive via 16 includes the first via 161 and two First conductor segments 162, 163. The first through hole 161 passes through the first surface 111 and the first intermediate layer 112. The first conductor segments 162 and 163 are disposed in the first through hole 161, and corresponding to the conductive pad group 14 Second conductive pads 141, 142. Corresponding to the semi-circular second conductive pads 141, 142, the first conductor segments 162, 163 may be semi-cylindrical. The first conductor segments 162 and 163 are electrically connected to the second conductive pads 141 and 142 and the second wires 116 respectively. A dielectric material may be present between the first conductor segments 162, 163 to avoid shorting within the conductive segments.

該具金屬柱組及導電孔組之基板10另包括至少一第一中間層導電墊組17,設置於該第一中間層112,每一個第一中間層導電墊組包括複數個第三導電墊,在本實施例中,該第一中間層導電墊組17包括二個第三導電墊171、172。每一個第三導電墊具有至少一內側邊及至少一外側邊。該等第三導電墊171、172對應該等第二導電墊141、142,亦即,二個第三導電墊171、172亦為半圓形。該等第三導電墊分別電性連接該等第一導體區段及該等第二導線,其中第三導電墊171電性連接第一導體區段161及該第二導線116。 The substrate 10 having the metal pillar group and the conductive hole group further includes at least one first intermediate layer conductive pad group 17 disposed on the first intermediate layer 112, and each of the first intermediate layer conductive pad groups includes a plurality of third conductive pads In the embodiment, the first intermediate layer conductive pad set 17 includes two third conductive pads 171, 172. Each of the third conductive pads has at least one inner side and at least one outer side. The third conductive pads 171, 172 correspond to the second conductive pads 141, 142, that is, the two third conductive pads 171, 172 are also semi-circular. The third conductive pads are electrically connected to the first conductor segments and the second wires, wherein the third conductive pads 171 are electrically connected to the first conductor segments 161 and the second wires 116.

該等第一金屬柱13與第二金屬柱151、152的體積、形狀視需要可為相同或不同,該等第一金屬柱13與第二金屬柱151、152之間的間距可為相同或不同。 The volume and shape of the first metal pillars 13 and the second metal pillars 151 and 152 may be the same or different, and the spacing between the first metal pillars 13 and the second metal pillars 151 and 152 may be the same or different.

本例中,基板10本身為非主動元件,即,基板10不包含任何主動元件(如主動晶片或主動線路),例如一印刷電路板(Printed Circuit Board)。另一例中,基板10可包含主動線路或主動晶片而成為主動元 件。 In this example, the substrate 10 itself is an inactive component, ie, the substrate 10 does not contain any active components (such as active wafers or active circuitry), such as a printed circuit board. In another example, the substrate 10 can include an active line or an active chip to become an active element. Pieces.

第一導電孔組16的形成方式,於本發明一實施例中,先以雷射鑽孔形成第一通孔161後再電鍍形成一導電通道(conductive channel),再以雷射切割該導電通道形成第一導電區段162、163,視需要可於導電區段間填入介電材料。 In one embodiment of the present invention, the first through hole 161 is formed by laser drilling, and then a conductive channel is formed by electroplating, and the conductive channel is cut by laser. The first conductive segments 162, 163 are formed, and a dielectric material can be filled between the conductive segments as needed.

形成該等第一導電墊12、該等第二導電墊141,142及導電跡線115的方法,於本發明一實施例中,先以乾膜用曝光顯影方式定義出圖案後,再以蝕刻(etching)方式同時形成該等第一導電墊12、該等第二導電墊141,142及導電跡線115。於本發明另一實施例是該等第二導電墊141,142先形成一個較大的導電墊之後再以雷射切割方式將一個導電墊切割成多個較小的導電墊而形成一個導電墊組12。 In the embodiment of the invention, the first conductive pad 12, the second conductive pads 141, 142 and the conductive traces 115 are formed. In an embodiment of the invention, the pattern is defined by exposure and development of the dry film, and then etching is performed. The first conductive pads 12, the second conductive pads 141, 142 and the conductive traces 115 are formed simultaneously. In another embodiment of the present invention, the second conductive pads 141, 142 first form a large conductive pad, and then cut a conductive pad into a plurality of smaller conductive pads by laser cutting to form a conductive pad group 12. .

形成該等第一金屬柱13與第二金屬柱151、152的方法,於本發明一實施例中,先於導電墊組之上形成一種子層(seed layer)後,再以電鍍(plating)方式形成該等第一金屬柱13與第二金屬柱151、152。本發明另一實施例是以導電膏(conductive paste)填入圖案化的乾膜後形成金屬柱,再移除乾膜。 A method of forming the first metal pillars 13 and the second metal pillars 151 and 152. In an embodiment of the invention, a seed layer is formed on the conductive pad group, and then plated. The first metal pillars 13 and the second metal pillars 151, 152 are formed in a manner. Another embodiment of the present invention forms a metal pillar by filling a patterned dry film with a conductive paste, and then removing the dry film.

利用導電墊組具有複數個第二導電墊,及可對應設置複數個第二金屬柱,且導電孔組具有複數個導體區段,電性連接該等第二導電墊,故可大幅提高金屬柱之數量,進而提高I/O數量,且可縮小導電墊、金屬柱及導電孔組所佔之面積。此外,配合導電孔組的設計可提高導線設計的彈性且藉由導電孔組的設計可減少一平面上導線的數目,在提高I/O數量同時又可縮小基板的面積。 The conductive pad set has a plurality of second conductive pads, and a plurality of second metal pillars are correspondingly arranged, and the conductive hole group has a plurality of conductor segments electrically connected to the second conductive pads, so that the metal pillars can be greatly improved The number of I/Os is increased, and the area occupied by the conductive pads, the metal posts, and the conductive hole groups can be reduced. In addition, the design of the conductive hole group can improve the flexibility of the wire design and the design of the conductive hole group can reduce the number of wires on one plane, and increase the I/O quantity while reducing the area of the substrate.

圖4顯示本發明具金屬柱組及導電孔組之基板之第二實施例由第一表面之上視示意圖。圖5顯示本發明具金屬柱組及導電孔組之基板之第二實施例由第一中間層之示意圖。配合參考圖4及圖5,相較於第一實施例,在第二實施例中相同之元件予以相同元件編號。在該具金 屬柱組及導電孔組之基板20中,每一導電墊組為圓形,且每一導電墊組包括四個第二導電墊,其中該導電墊組24包括四個第二導電墊241、242、243、244,該等第二導電墊241、242、243、244為四分之一圓形。並且,每一個金屬柱組包括四個第二金屬柱,其中該金屬柱組25包括四個第二金屬柱251、252、253、254,分別對應形成於該等第二導電墊241、242、243、244上,四個第二金屬柱251、252、253、254為圓形。 4 is a top plan view showing a second embodiment of a substrate having a metal pillar group and a conductive hole group according to the present invention. FIG. 5 is a schematic view showing a second embodiment of a substrate having a metal pillar group and a conductive hole group according to the present invention. 4 and FIG. 5, the same components are given the same component numbers in the second embodiment as compared with the first embodiment. In the gold In the substrate 20 of the column group and the conductive hole group, each of the conductive pad sets is circular, and each of the conductive pad sets includes four second conductive pads, wherein the conductive pad set 24 includes four second conductive pads 241, 242, 243, and 244, the second conductive pads 241, 242, 243, and 244 are quarter-circular. Moreover, each of the metal pillar groups includes four second metal pillars, wherein the metal pillar group 25 includes four second metal pillars 251, 252, 253, and 254 respectively formed corresponding to the second conductive pads 241, 242, At 243, 244, the four second metal posts 251, 252, 253, 254 are circular.

同樣地,每一個第一中間層導電墊組包括四個第三導電墊,其中該第一中間層導電墊組27包括四個第三導電墊271、272、273、274。四個第三導電墊271、272、273、274亦為四分之一圓形。 Likewise, each of the first intermediate layer conductive pad sets includes four third conductive pads, wherein the first intermediate layer conductive pad set 27 includes four third conductive pads 271, 272, 273, 274. The four third conductive pads 271, 272, 273, 274 are also quarter-circular.

圖6顯示本發明具金屬柱組及導電孔組之基板之第三實施例由第一表面之上視示意圖。圖7顯示本發明具金屬柱組及導電孔組之基板之第三實施例由第一中間層之示意圖。配合參考圖6及圖7,相較於第一實施例,在第三實施例中相同之元件予以相同元件編號。在該具金屬柱組及導電孔組之基板30中,每一導電墊組為圓形,且每一導電墊組包括六個第二導電墊,其中該導電墊組34包括六個第二導電墊341、342、343、344、345、346,該等第二導電墊341、342、343、344、345、346為六分之一圓形。並且,每一個金屬柱組包括六個第二金屬柱,其中該金屬柱組35包括六個第二金屬柱351、352、353、354、355、356,分別對應形成於該等第二導電墊341、342、343、344、345、346上,六個第二金屬柱351、352、353、354、355、356為圓形。 6 is a top plan view showing a third embodiment of a substrate having a metal pillar group and a conductive hole group according to the present invention. FIG. 7 is a schematic view showing a third embodiment of a substrate having a metal pillar group and a conductive hole group according to the present invention. 6 and 7, with reference to the first embodiment, the same elements are given the same component numbers in the third embodiment. In the substrate 30 with the metal pillar group and the conductive hole group, each conductive pad group is circular, and each conductive pad group includes six second conductive pads, wherein the conductive pad group 34 includes six second conductive layers. Pads 341, 342, 343, 344, 345, 346, the second conductive pads 341, 342, 343, 344, 345, 346 are one-sixth round. Moreover, each of the metal pillar groups includes six second metal pillars, wherein the metal pillar group 35 includes six second metal pillars 351, 352, 353, 354, 355, and 356 respectively corresponding to the second conductive pads. On the 341, 342, 343, 344, 345, 346, the six second metal posts 351, 352, 353, 354, 355, 356 are circular.

同樣地,每一個第一中間層導電墊組包括六個第三導電墊,其中該第一中間層導電墊組37包括六個第三導電墊371、372、373、374、375、376。六個第三導電墊371、372、373、374、375、376亦為六分之一圓形。 Likewise, each of the first intermediate layer conductive pad sets includes six third conductive pads, wherein the first intermediate layer conductive pad set 37 includes six third conductive pads 371, 372, 373, 374, 375, 376. The six third conductive pads 371, 372, 373, 374, 375, 376 are also one-sixth round.

圖8顯示本發明具金屬柱組及導電孔組之基板之第四實施例之剖視示意圖。圖9顯示本發明具金屬柱組及導電孔組之基板之第四實施例由第一表面之上視示意圖。圖10顯示本發明具金屬柱組及導電孔組之基板之第四實施例由第一中間層之示意圖。圖11顯示本發明具金屬柱組及導電孔組之基板之第四實施例由第二中間層之示意圖。相較於第二實施例,在第四實施例中相同之元件予以相同元件編號。配合參考圖8至圖11,該具金屬柱組及導電孔組之基板40之基板本體41另包括一第三線路層414及一第二中間層415,該第三線路層414包括複數條第三導線416,設置於該基板本體41之該第二中間層415。 8 is a cross-sectional view showing a fourth embodiment of a substrate having a metal pillar group and a conductive hole group according to the present invention. FIG. 9 is a top plan view showing a fourth embodiment of a substrate having a metal pillar group and a conductive hole group according to the present invention. FIG. 10 is a schematic view showing a fourth embodiment of a substrate having a metal pillar group and a conductive hole group according to the present invention. Figure 11 is a schematic view showing a fourth embodiment of the substrate of the present invention having a metal pillar group and a conductive via group. In the fourth embodiment, the same elements are given the same element numbers as compared with the second embodiment. Referring to FIG. 8 to FIG. 11 , the substrate body 41 of the substrate 40 having the metal pillar group and the conductive hole group further includes a third circuit layer 414 and a second intermediate layer 415. The third circuit layer 414 includes a plurality of strips. The three wires 416 are disposed on the second intermediate layer 415 of the substrate body 41.

該基板40另包括至少一第二導電孔組49,每一個第二導電孔組包括一第二通孔及複數個第二導體區段,在本實施例中,該第二導電孔組49包括一第二通孔491及四個第二導體區段492、493等。該第二通孔491通過該第一表面411、該第一中間層412及該第二中間層415,四個第二導體區段492、493設置於該第二通孔491內,且對應該導電墊組47之四個第二導電墊471、472、473、474,該等第二導體區段492、493分別電性連接該等第二導電墊471、472、473、474及該等第三導線416。 The substrate 40 further includes at least one second conductive hole group 49. Each of the second conductive hole groups includes a second through hole and a plurality of second conductive segments. In this embodiment, the second conductive hole group 49 includes A second through hole 491 and four second conductor segments 492, 493 and the like. The second through hole 491 passes through the first surface 411, the first intermediate layer 412 and the second intermediate layer 415, and the four second conductor segments 492, 493 are disposed in the second through hole 491, and correspondingly The second conductive pads 471, 472, 473, and 474 of the conductive pad group 47 are electrically connected to the second conductive pads 471, 472, 473, and 474, respectively. Three wires 416.

在該第一中間層412,除了上述第二實施例之第一中間層導電墊組27之外,該基板40另包括至少一第一中間層導電墊組52,設置於該第一中間層412,每一個第一中間層導電墊組包括複數個第四導電墊,其中該第一中間層導電墊組52包括四個第四導電墊521、522、523、524,每一個第四導電墊具有至少一內側邊及至少一外側邊,對應該等第二導電墊471、472、473、474,四個第四導電墊521、522、523、524亦為四分之一圓形。該等第四導電墊521、522、523、524分別電性連接該等第二導體區段492、493等,但未連接第二導線116。 In the first intermediate layer 412, in addition to the first intermediate layer conductive pad group 27 of the second embodiment, the substrate 40 further includes at least one first intermediate layer conductive pad group 52 disposed on the first intermediate layer 412. Each of the first intermediate layer conductive pad sets includes a plurality of fourth conductive pads, wherein the first intermediate layer conductive pad set 52 includes four fourth conductive pads 521, 522, 523, 524, each of the fourth conductive pads having At least one inner side and at least one outer side correspond to the second conductive pads 471, 472, 473, 474, and the four fourth conductive pads 521, 522, 523, 524 are also quarter-circular. The fourth conductive pads 521, 522, 523, and 524 are electrically connected to the second conductor segments 492, 493 and the like, respectively, but the second wires 116 are not connected.

在該第二中間層4l5,該基板40另包括至少一第二中間層導電墊 組53,設置於該第二中間層415,每一個第二中間層導電墊組包括複數個第五導電墊,其中第二中間層導電墊組53包括四個第五導電墊531、532、533、534。每一個第五導電墊具有至少一內側邊及至少一外側邊,對應該等第二導電墊471、472、473、474及該等第四導電墊521、522、523、524,四個第五導電墊531、532、533、534亦為四分之一圓形。該等第五導電墊531、532、533、534分別電性連接該等第二導體區段492、493及該等第三導線416。 In the second intermediate layer 415, the substrate 40 further includes at least one second intermediate layer conductive pad The group 53 is disposed on the second intermediate layer 415, and each of the second intermediate layer conductive pad sets includes a plurality of fifth conductive pads, wherein the second intermediate layer conductive pad set 53 includes four fifth conductive pads 531, 532, 533 , 534. Each of the fifth conductive pads has at least one inner side and at least one outer side, corresponding to the second conductive pads 471, 472, 473, 474 and the fourth conductive pads 521, 522, 523, 524, four The fifth conductive pads 531, 532, 533, 534 are also quarter-circular. The fifth conductive pads 531, 532, 533, 534 are electrically connected to the second conductor segments 492, 493 and the third wires 416, respectively.

圖12顯示本發明具金屬柱組及導電孔組之基板之第五實施例之剖視示意圖。圖13顯示本發明具金屬柱組及導電孔組之基板之第五實施例由第一表面之上視示意圖。相較於第四實施例,在第五實施例中相同之元件予以相同元件編號。配合參考圖12至圖13,該具金屬柱組及導電孔組之基板60另包括複數個第二導電墊611、612、613、614、複數個第六導電墊62及複數個第三金屬柱63,在本實施例中,該等第二導電墊611、612、613、614上沒有金屬柱,係以第一導線115電性連接該等第六導電墊62,該等第六導電墊62設置於該第一表面411,分別電性連接部分該等第二導電墊,亦即該等第六導電墊62電性連接第二導電墊611、612、613、614,但未電性連接第二導電墊241、242、243、244。該等第三金屬柱63分別形成於該等第六導電墊62上,使得該等第三金屬柱63之位置可以彈性調整,不須侷限於該等第二導電墊611、612、613、614上。 Figure 12 is a cross-sectional view showing a fifth embodiment of the substrate having the metal pillar group and the conductive hole group of the present invention. Figure 13 is a top plan view showing the fifth embodiment of the substrate with the metal pillar group and the conductive hole group of the present invention. In the fifth embodiment, the same elements are given the same element numbers as compared with the fourth embodiment. Referring to FIG. 12 to FIG. 13 , the substrate 60 with the metal pillar group and the conductive hole group further includes a plurality of second conductive pads 611 , 612 , 613 , 614 , a plurality of sixth conductive pads 62 , and a plurality of third metal pillars . 63. In this embodiment, the second conductive pads 611, 612, 613, and 614 have no metal pillars, and the first conductive wires 115 are electrically connected to the sixth conductive pads 62, and the sixth conductive pads 62. The second conductive pads are electrically connected to the second conductive pads, that is, the sixth conductive pads 62 are electrically connected to the second conductive pads 611, 612, 613, and 614, but are not electrically connected. Two conductive pads 241, 242, 243, 244. The third metal pillars 63 are respectively formed on the sixth conductive pads 62 such that the positions of the third metal pillars 63 can be elastically adjusted, and are not limited to the second conductive pads 611, 612, 613, and 614. on.

圖14顯示本發明具金屬柱組及導電孔組之封裝結構之剖視示意圖。在一實施例中,該具金屬柱組及導電孔組之封裝結構70包括:一第一基板10、一第二基板80、一晶片71及封膠72。該第一基板10可參考上述圖1至圖3第一實施例之基板10,相同之元件予以相同元件編號。請配合參考圖1至圖3及圖14,該第一基板10包括一第一基板本體11、複數個第一導電墊12、複數個第一金屬柱13、至少一導電墊組 14、至少一金屬柱組15及至少一第一導電孔組16。 14 is a cross-sectional view showing a package structure of a metal pillar group and a conductive hole group of the present invention. In one embodiment, the package structure 70 having the metal pillar group and the conductive hole group includes a first substrate 10, a second substrate 80, a wafer 71, and a sealant 72. For the first substrate 10, reference may be made to the substrate 10 of the first embodiment of FIGS. 1 to 3, and the same components are given the same component numbers. Referring to FIG. 1 to FIG. 3 and FIG. 14 , the first substrate 10 includes a first substrate body 11 , a plurality of first conductive pads 12 , a plurality of first metal pillars 13 , and at least one conductive pad set . 14. At least one metal pillar group 15 and at least one first conductive hole group 16.

該第一基板本體11具有一第一表面111、一第一中間層112、一第一線路層113及一第二線路層114,該第一線路層113包括複數條第一導線115,設置於該第一表面111,該第二線路層114包括複數條第二導線116,設置於該基板本體11之該第一中間層112。該等第一導電墊12設置於該第一表面111,分別電性連接該等第一導線115。該等第一金屬柱13,分別形成於該等第一導電墊12上。 The first substrate body 11 has a first surface 111, a first intermediate layer 112, a first circuit layer 113 and a second circuit layer 114. The first circuit layer 113 includes a plurality of first wires 115 disposed on the first substrate The first surface 111 includes a plurality of second wires 116 disposed on the first intermediate layer 112 of the substrate body 11. The first conductive pads 12 are disposed on the first surface 111 and electrically connected to the first conductive lines 115, respectively. The first metal pillars 13 are formed on the first conductive pads 12, respectively.

該至少一導電墊組14設置於該第一表面111,每一個導電墊組包括複數個第二導電墊,其中該導電墊組14包括二個第二導電墊141、142。每一個第二導電墊具有至少一內側邊及至少一外側邊,在導電墊組14內之一第二導電墊141之該內側邊145與相鄰第二導電墊142之該內側邊147彼此相對且其之間具有一狹長間隔區149。該至少一金屬柱組15形成於該至少一導電墊組14上,每一個金屬柱組包括複數個第二金屬柱,其中該金屬柱組15包括二個第二金屬柱151、152,分別對應形成於該等第二導電墊141、142上。 The at least one conductive pad set 14 is disposed on the first surface 111, and each of the conductive pad sets includes a plurality of second conductive pads, wherein the conductive pad set 14 includes two second conductive pads 141, 142. Each of the second conductive pads has at least one inner side and at least one outer side, and the inner side 145 of the second conductive pad 141 and the inner side of the adjacent second conductive pad 142 in the conductive pad set 14 The sides 147 are opposite each other with an elongated spacer 149 therebetween. The at least one metal pillar group 15 is formed on the at least one conductive pad group 14, each metal pillar group includes a plurality of second metal pillars, wherein the metal pillar group 15 includes two second metal pillars 151, 152, respectively corresponding to Formed on the second conductive pads 141, 142.

每一個第一導電孔組包括一第一通孔及複數個第一導體區段,該第一導電孔組16包括一第一通孔161及二個第一導體區段162、163。該第一通孔161通過該第一表面111及該第一中間層112,該等第一導體區段162、163設置於該第一通孔161內,且對應該導電墊組14之該等第二導電墊141、142,該等第一導體區段162、163分別電性連接該等第二導電墊141、142及該等第二導線116。 Each of the first conductive via groups includes a first via and a plurality of first conductor segments. The first conductive via 16 includes a first via 161 and two first conductor segments 162, 163. The first through hole 161 passes through the first surface 111 and the first intermediate layer 112. The first conductor segments 162 and 163 are disposed in the first through hole 161, and corresponding to the conductive pad group 14 The second conductive pads 141 and 142 are electrically connected to the second conductive pads 141 and 142 and the second conductive lines 116 respectively.

該第二基板80包括一第二基板本體81及複數個導電端點82,該第二基板本體81具有一第二表面811,係面對該第一基板10之該第一表面111。該第二基板80之該等導電端點82電性連接該第一基板10之該等第一金屬柱13或該至少一金屬柱組15。在本實施例中,該導電端點82包含一金屬凸塊821及一焊料822,該焊料822與該金屬柱151物理 連結。 The second substrate 80 includes a second substrate body 81 and a plurality of conductive terminals 82. The second substrate body 81 has a second surface 811 facing the first surface 111 of the first substrate 10. The conductive terminals 82 of the second substrate 80 are electrically connected to the first metal pillars 13 or the at least one metal pillar group 15 of the first substrate 10 . In this embodiment, the conductive terminal 82 includes a metal bump 821 and a solder 822. The solder 822 and the metal pillar 151 are physically link.

該晶片71設置於該第一基板10,並與第一基板10的至少一個該等第一導線115或第二導線116電性連結。封膠72設置於該第一基板10及該第二基板80之間。 The wafer 71 is disposed on the first substrate 10 and electrically connected to at least one of the first wires 115 or the second wires 116 of the first substrate 10 . The sealant 72 is disposed between the first substrate 10 and the second substrate 80.

利用導電墊組具有複數個第二導電墊,及可對應設置複數個第二金屬柱,且導電孔組具有複數個導體區段,電性連接該等第二導電墊,故可大幅提高封裝結構金屬柱之數量,進而提高I/O數量,且可縮小封裝結構導電墊、金屬柱及導電孔組所佔之面積,以提高互連密度(interconnect density)。此外,配合導電孔組的設計可提高導線設計的彈性且藉由導電孔組的設計可減少一平面上導線的數目,在提高I/O數量同時又可縮小基板的面積。 The conductive pad set has a plurality of second conductive pads, and a plurality of second metal posts are correspondingly disposed, and the conductive hole group has a plurality of conductor segments electrically connected to the second conductive pads, thereby greatly improving the package structure The number of metal pillars, in turn, increases the number of I/Os, and can reduce the area occupied by the conductive pads, metal pillars, and conductive hole groups of the package structure to increase the interconnect density. In addition, the design of the conductive hole group can improve the flexibility of the wire design and the design of the conductive hole group can reduce the number of wires on one plane, and increase the I/O quantity while reducing the area of the substrate.

惟上述實施例僅為說明本發明之原理及其功效,而非用以限制本發明。因此,習於此技術之人士對上述實施例進行修改及變化仍不脫本發明之精神。本發明之權利範圍應如後述之申請專利範圍所列。 However, the above embodiments are merely illustrative of the principles and effects of the invention and are not intended to limit the invention. Therefore, those skilled in the art can make modifications and changes to the above embodiments without departing from the spirit of the invention. The scope of the invention should be as set forth in the appended claims.

10‧‧‧具金屬柱組及導電孔組之基板 10‧‧‧Substrate with metal column group and conductive hole group

11‧‧‧基板本體 11‧‧‧Substrate body

12‧‧‧第一導電墊 12‧‧‧First conductive pad

13‧‧‧第一金屬柱 13‧‧‧First metal column

16‧‧‧第一導電孔組 16‧‧‧First conductive hole group

111‧‧‧第一表面 111‧‧‧ first surface

112‧‧‧第一中間層 112‧‧‧First intermediate layer

115‧‧‧第一導線 115‧‧‧First wire

116‧‧‧第二導線 116‧‧‧second wire

141、142‧‧‧第二導電墊 141, 142‧‧‧second conductive pad

151、152‧‧‧第二金屬柱 151, 152‧‧‧ second metal column

161‧‧‧第一通孔 161‧‧‧ first through hole

162、163‧‧‧第一導體區段 162, 163‧‧‧ first conductor section

171、172‧‧‧第三導電墊 171, 172‧‧‧ third conductive pad

Claims (12)

一種具金屬柱組及導電孔組之基板,包括:一基板本體,具有一第一表面、一第一中間層、一第一線路層及一第二線路層,該第一線路層包括複數條第一導線,設置於該第一表面,該第二線路層包括複數條第二導線,設置於該基板本體之該第一中間層;複數個第一導電墊,設置於該第一表面,分別電性連接該等第一導線;複數個第一金屬柱,分別形成於該等第一導電墊上;至少一導電墊組,設置於該第一表面,每一個導電墊組包括複數個第二導電墊,每一個第二導電墊具有至少一內側邊及至少一外側邊,在導電墊組內之一第二導電墊之該內側邊與相鄰第二導電墊之該內側邊彼此相對且其之間具有一狹長間隔區;至少一金屬柱組,形成於部分該至少一導電墊組上,每一個金屬柱組包括複數個第二金屬柱,分別對應形成於部分該等第二導電墊上;及至少一第一導電孔組,每一個第一導電孔組包括一第一通孔及複數個第一導體區段,該第一通孔通過該第一表面及該第一中間層,該等第一導體區段設置於該第一通孔內,且對應該導電墊組之該等第二導電墊,該等第一導體區段分別電性連接該等第二導電墊及該等第二導線。 A substrate having a metal column group and a conductive hole group, comprising: a substrate body having a first surface, a first intermediate layer, a first circuit layer and a second circuit layer, the first circuit layer comprising a plurality of a first wire disposed on the first surface, the second circuit layer includes a plurality of second wires disposed on the first intermediate layer of the substrate body; a plurality of first conductive pads disposed on the first surface, respectively Electrically connecting the first conductive wires; a plurality of first metal pillars respectively formed on the first conductive pads; at least one conductive pad set disposed on the first surface, each of the conductive pad sets including a plurality of second conductive a pad, each of the second conductive pads having at least one inner side and at least one outer side, wherein the inner side of one of the second conductive pads in the conductive pad group and the inner side of the adjacent second conductive pad are in contact with each other Opposite and having a narrow spacer therebetween; at least one metal pillar group is formed on a portion of the at least one conductive pad group, each metal pillar group includes a plurality of second metal pillars, respectively corresponding to the second portion Conductive pad; and to a first conductive hole group, each of the first conductive hole groups includes a first through hole and a plurality of first conductor segments, the first through hole passing through the first surface and the first intermediate layer, the first The second conductive segments are electrically connected to the second conductive pads and the second conductive wires, respectively, in the first conductive vias. 如請求項1之具金屬柱組及導電孔組之基板,其中每一導電墊組為圓形,且每一導電墊組包括二個第二導電墊,該等第二導電墊為半圓形。 The substrate of the metal pillar group and the conductive hole group of claim 1 , wherein each of the conductive pad sets is circular, and each of the conductive pad sets comprises two second conductive pads, wherein the second conductive pads are semicircular . 如請求項1之具金屬柱組及導電孔組之基板, 其中每一導電墊組為圓形,且每一導電墊組包括四個第二導電墊,該等第二導電墊為四分之一圓形。 The substrate of the metal column group and the conductive hole group of claim 1 is Each of the conductive pad sets is circular, and each of the conductive pad sets includes four second conductive pads, and the second conductive pads are quarter-circular. 如請求項1之具金屬柱組及導電孔組之基板,其中每一導電墊組為圓形,且每一導電墊組包括六個第二導電墊,該等第二導電墊為六分之一圓形。 The substrate of the metal pillar group and the conductive hole group of claim 1, wherein each of the conductive pad sets is circular, and each of the conductive pad sets comprises six second conductive pads, and the second conductive pads are six-pointed. A round shape. 如請求項1之具金屬柱組及導電孔組之基板,另包括至少一第一中間層導電墊組,設置於該第一中間層,每一個第一中間層導電墊組包括複數個第三導電墊,每一個第三導電墊具有至少一內側邊及至少一外側邊,對應該等第二導電墊,該等第三導電墊分別電性連接該等第一導體區段及該等第二導線。 The substrate of the metal pillar group and the conductive hole group of claim 1 further comprising at least one first intermediate layer conductive pad group disposed on the first intermediate layer, each of the first intermediate layer conductive pad groups comprising a plurality of third a conductive pad, each of the third conductive pads having at least one inner side and at least one outer side, corresponding to the second conductive pads, the third conductive pads being electrically connected to the first conductive segments and the The second wire. 如請求項1之具金屬柱組及導電孔組之基板,其中該基板本體另包括一第三線路層及一第二中間層,該第三線路層包括複數條第三導線,設置於該基板本體之該第二中間層;該基板另包括至少一第二導電孔組,每一個第二導電孔組包括一第二通孔及複數個第二導體區段,該第二通孔通過該第一表面及該第二中間層,該等第二導體區段設置於該第二通孔內,且對應該導電墊組之該等第二導電墊,該等第二導體區段分別電性連接該等第二導電墊及該等第三導線。 The substrate of the metal column group and the conductive hole group of claim 1 , wherein the substrate body further comprises a third circuit layer and a second intermediate layer, the third circuit layer comprising a plurality of third wires disposed on the substrate The second intermediate layer of the body; the substrate further includes at least one second conductive hole group, each of the second conductive hole groups includes a second through hole and a plurality of second conductive segments, and the second through hole passes through the first a second conductor segment disposed in the second via hole, and corresponding to the second conductive pads of the conductive pad group, the second conductor segments are respectively electrically connected The second conductive pads and the third wires. 如請求項1之具金屬柱組及導電孔組之基板,其中該第二導電墊之該至少一內側邊與相鄰第二導電墊的內側邊具有一最短距離及一最遠距離,在該等第二導電墊的最短距離的位置與最遠距離的位置兩者距離為X1,最短距離與最遠距離的差為X2,其中2X1大於X2。 The substrate of the metal pillar group and the conductive hole group of claim 1 , wherein the at least one inner side of the second conductive pad has a shortest distance and a farthest distance from an inner side of the adjacent second conductive pad. The distance between the position of the shortest distance of the second conductive pads and the position of the farthest distance is X1, and the difference between the shortest distance and the farthest distance is X2, where 2X1 is greater than X2. 如請求項1之具金屬柱組及導電孔組之基板,其中該第二導電墊之該至少一內側邊與相鄰第二導電墊的內 側邊平行。 The substrate of the metal pillar group and the conductive hole group of claim 1, wherein the at least one inner side of the second conductive pad and the inner side of the adjacent second conductive pad The sides are parallel. 如請求項1之具金屬柱組及導電孔組之基板,另包括複數個第六導電墊及複數個第三金屬柱,該等第六導電墊設置於該第一表面,分別電性連接部分該等第二導電墊;該等第三金屬柱分別形成於該等第六導電墊上。 The substrate of the metal pillar group and the conductive hole group of claim 1 further includes a plurality of sixth conductive pads and a plurality of third metal pillars, wherein the sixth conductive pads are disposed on the first surface, respectively electrically connecting portions The second conductive pads are formed on the sixth conductive pads. 一種具金屬柱組及導電孔組之封裝結構,包括:一第一基板,包括一第一基板本體、複數個第一導電墊、複數個第一金屬柱、至少一導電墊組、至少一金屬柱組及至少一第一導電孔組;該第一基板本體具有一第一表面、一第一中間層、一第一線路層及一第二線路層,該第一線路層包括複數條第一導線,設置於該第一表面,該第二線路層包括複數條第二導線,設置於該基板本體之該第一中間層;該等第一導電墊設置於該第一表面,分別電性連接該等第一導線;該等第一金屬柱,分別形成於該等第一導電墊上;該至少一導電墊組設置於該第一表面,每一個導電墊組包括複數個第二導電墊,每一個第二導電墊具有至少一內側邊及至少一外側邊,在導電墊組內之一第二導電墊之該內側邊與相鄰第二導電墊之該內側邊彼此相對且其之間具有一狹長間隔區;該至少一金屬柱組形成於部分該至少一導電墊組上,每一個金屬柱組包括複數個第二金屬柱,分別對應形成於部分該等第二導電墊上;每一個第一導電孔組包括一第一通孔及複數個第一導體區段,該第一通孔通過該第一表面及該第一中間層,該等第一導體區段設置於該第一通孔內,且對應該導電墊組之該等第二導電墊,該等第一導體區段分別電性連接該等第二導電墊及該等第二導線;一第二基板,包括一第二基板本體及複數個導電端點,該第二基板本體具有一第二表面,係面對該第一基板之該第一表 面;該第二基板之該等導電端點電性連接該第一基板之該等第一金屬柱及該至少一金屬柱組;一晶片,設置於該第一基板,並與第一基板的至少一個該等第一導線或第二導線電性連結;及封膠,設置於該第一基板及該第二基板之間。 A package structure having a metal pillar group and a conductive hole group, comprising: a first substrate, comprising a first substrate body, a plurality of first conductive pads, a plurality of first metal pillars, at least one conductive pad group, at least one metal a column group and at least one first conductive hole group; the first substrate body has a first surface, a first intermediate layer, a first circuit layer and a second circuit layer, the first circuit layer comprising a plurality of first lines a wire disposed on the first surface, the second circuit layer includes a plurality of second wires disposed on the first intermediate layer of the substrate body; the first conductive pads are disposed on the first surface and electrically connected The first metal wires are respectively formed on the first conductive pads; the at least one conductive pad group is disposed on the first surface, and each of the conductive pad groups includes a plurality of second conductive pads, each a second conductive pad has at least one inner side and at least one outer side, and the inner side of one of the second conductive pads in the conductive pad group and the inner side of the adjacent second conductive pad are opposite to each other and There is a narrow interval between the two; a plurality of metal pillars are formed on a portion of the at least one conductive pad group, each of the metal pillar groups includes a plurality of second metal pillars respectively formed on a portion of the second conductive pads; each of the first conductive via groups includes a a first through hole and a plurality of first conductor segments, the first through hole passing through the first surface and the first intermediate layer, wherein the first conductive segments are disposed in the first through hole and corresponding to the conductive The second conductive pads of the pad set are electrically connected to the second conductive pads and the second conductive wires respectively; and the second substrate comprises a second substrate body and a plurality of conductive ends Pointing, the second substrate body has a second surface facing the first surface of the first substrate The first metal pillars of the first substrate and the at least one metal pillar group are electrically connected to the first substrate; a wafer is disposed on the first substrate and is opposite to the first substrate At least one of the first wires or the second wires is electrically connected; and a sealant is disposed between the first substrate and the second substrate. 如請求項10之具金屬柱組及導電孔組之封裝結構,其中該導電端點包含一金屬凸塊及一焊料,該焊料與該金屬柱物理連結。 The package structure of the metal pillar group and the conductive hole group of claim 10, wherein the conductive terminal comprises a metal bump and a solder, and the solder is physically coupled to the metal pillar. 如請求項10之具金屬柱組及導電孔組之封裝結構,其中每一導電墊組為圓形,且每一導電墊組包括二個第二導電墊,該等第二導電墊為半圓形。 The package structure of the metal pillar group and the conductive hole group of claim 10, wherein each of the conductive pad sets is circular, and each of the conductive pad sets includes two second conductive pads, and the second conductive pads are semicircular shape.
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