TWI513854B - - Google Patents

Info

Publication number
TWI513854B
TWI513854B TW103123867A TW103123867A TWI513854B TW I513854 B TWI513854 B TW I513854B TW 103123867 A TW103123867 A TW 103123867A TW 103123867 A TW103123867 A TW 103123867A TW I513854 B TWI513854 B TW I513854B
Authority
TW
Taiwan
Application number
TW103123867A
Other languages
Chinese (zh)
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TW201534758A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of TW201534758A publication Critical patent/TW201534758A/en
Application granted granted Critical
Publication of TWI513854B publication Critical patent/TWI513854B/zh

Links

TW103123867A 2014-03-11 2014-07-10 Chemical vapor deposition apparatus TW201534758A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410087591.0A CN104911565B (en) 2014-03-11 2014-03-11 A kind of chemical vapor deposition unit

Publications (2)

Publication Number Publication Date
TW201534758A TW201534758A (en) 2015-09-16
TWI513854B true TWI513854B (en) 2015-12-21

Family

ID=54080998

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103123867A TW201534758A (en) 2014-03-11 2014-07-10 Chemical vapor deposition apparatus

Country Status (2)

Country Link
CN (1) CN104911565B (en)
TW (1) TW201534758A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106544639B (en) * 2015-09-21 2019-03-05 中微半导体设备(上海)有限公司 It prevents the gas extraction arrangement of blocking and the MOCVD device of the device is set
CN107761077B (en) * 2017-10-20 2019-12-03 京东方科技集团股份有限公司 A kind of film plating process, device and PECVD device
CN109750279A (en) * 2017-11-07 2019-05-14 中微半导体设备(上海)股份有限公司 A kind of substrate tray and reactor for thermal chemical vapor deposition
CN109239168B (en) * 2018-09-12 2020-06-16 太原科技大学 Electrochemical deposition device
CN111254487B (en) * 2020-01-20 2022-03-22 北京北方华创微电子装备有限公司 Temperature measuring device of epitaxial equipment and epitaxial equipment
CN113622022A (en) * 2021-09-02 2021-11-09 河南微米光学科技有限公司 Cavity airflow field adjusting device for MPCVD equipment and using method
TWI790061B (en) * 2021-12-24 2023-01-11 天虹科技股份有限公司 Thin film deposition machine for improving temperature distribution of substrate
CN115261820B (en) * 2022-09-20 2023-01-20 拓荆科技(上海)有限公司 Reaction cavity structure and semiconductor equipment thereof

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW415970B (en) * 1997-01-08 2000-12-21 Ebara Corp Vapor-phase film growth apparatus and gas ejection head
TW200304956A (en) * 2002-04-01 2003-10-16 Ans Inc Vapor organic material deposition method and vapor organic material deposition apparatus using the same
US20050054198A1 (en) * 2001-11-05 2005-03-10 Um Pyung Yong Apparatus of chemical vapor deposition
US20060269671A1 (en) * 2005-05-24 2006-11-30 Han-Ki Kim Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure
TW200946713A (en) * 2008-01-31 2009-11-16 Applied Materials Inc CVD apparatus
WO2010016852A1 (en) * 2008-08-08 2010-02-11 International Solar Electric Technology, Inc. Chemical vapor deposition method and system for semiconductor devices
TW201037100A (en) * 2009-03-16 2010-10-16 Alta Devices Inc Vapor deposition reactor system and methods thereof
US20120174866A1 (en) * 2011-01-11 2012-07-12 Snt. Co., Ltd. Apparatus for chemical vapor deposition
TW201340252A (en) * 2012-03-19 2013-10-01 Pinecone Material Inc Chemical vapor deposition apparatus and system

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CN1082100C (en) * 1999-12-29 2002-04-03 西安交通大学 Industrial pulse or DC plasma and chemical gas-phase deposition equipment for strenthening surface of tool or mould
CN101303998B (en) * 2003-04-24 2011-02-02 东京毅力科创株式会社 Plasma processing apparatus, focus ring, and susceptor
JP5238688B2 (en) * 2007-03-28 2013-07-17 東京エレクトロン株式会社 CVD deposition system
JP4918452B2 (en) * 2007-10-11 2012-04-18 東京エレクトロン株式会社 Thin film forming apparatus cleaning method, thin film forming method, thin film forming apparatus, and program
JP4959733B2 (en) * 2008-02-01 2012-06-27 東京エレクトロン株式会社 Thin film forming method, thin film forming apparatus, and program
US20120171377A1 (en) * 2010-12-30 2012-07-05 Veeco Instruments Inc. Wafer carrier with selective control of emissivity
CN202063992U (en) * 2011-04-19 2011-12-07 西安电炉研究所有限公司 Chemical vapor deposition furnace
CN102181845B (en) * 2011-04-19 2012-06-27 西安电炉研究所有限公司 Chemical vapor deposition furnace
CN102634776B (en) * 2012-05-03 2014-03-12 徐明生 Chemical vapor deposition device for continuously preparing two-dimensional nanofilm
CN103074595A (en) * 2012-09-07 2013-05-01 光达光电设备科技（嘉兴）有限公司 Reaction chamber for vapor deposition process

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW415970B (en) * 1997-01-08 2000-12-21 Ebara Corp Vapor-phase film growth apparatus and gas ejection head
US20050054198A1 (en) * 2001-11-05 2005-03-10 Um Pyung Yong Apparatus of chemical vapor deposition
TW200304956A (en) * 2002-04-01 2003-10-16 Ans Inc Vapor organic material deposition method and vapor organic material deposition apparatus using the same
US20060269671A1 (en) * 2005-05-24 2006-11-30 Han-Ki Kim Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure
TW200946713A (en) * 2008-01-31 2009-11-16 Applied Materials Inc CVD apparatus
WO2010016852A1 (en) * 2008-08-08 2010-02-11 International Solar Electric Technology, Inc. Chemical vapor deposition method and system for semiconductor devices
TW201037100A (en) * 2009-03-16 2010-10-16 Alta Devices Inc Vapor deposition reactor system and methods thereof
US20120174866A1 (en) * 2011-01-11 2012-07-12 Snt. Co., Ltd. Apparatus for chemical vapor deposition
TW201340252A (en) * 2012-03-19 2013-10-01 Pinecone Material Inc Chemical vapor deposition apparatus and system

Also Published As

Publication number Publication date
CN104911565B (en) 2017-12-22
CN104911565A (en) 2015-09-16
TW201534758A (en) 2015-09-16

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