TWI506649B - Memory array plane select - Google Patents
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Description
本發明大體上係關於半導體裝置及方法,且更特定言之係關於用於記憶體陣列平面選擇之設備及方法。The present invention is generally directed to semiconductor devices and methods, and more particularly to apparatus and methods for memory array plane selection.
記憶體裝置通常提供作為電腦或其他電子裝置中之內部、半導體、積體電路。存在許多不同類型之記憶體,尤其包含隨機存取記憶體(RAM)、唯讀記憶體(ROM)、動態隨機存取記憶體(DRAM)、同步動態隨機存取記憶體(SDRAM)、電阻可變記憶體及快閃記憶體。電阻可變記憶體之類型尤其包含相變記憶體、可程式化導體記憶體及電阻性隨機存取記憶體(RRAM)。Memory devices are typically provided as internal, semiconductor, integrated circuits in computers or other electronic devices. There are many different types of memory, including random access memory (RAM), read only memory (ROM), dynamic random access memory (DRAM), synchronous dynamic random access memory (SDRAM), and resistors. Variable memory and flash memory. Types of resistive variable memory include, inter alia, phase change memory, programmable conductor memory, and resistive random access memory (RRAM).
利用記憶體裝置作為用於需要高記憶體密度、高可靠性及無需電力之資料保留之一廣泛電子應用範圍之非揮發性記憶體。非揮發性記憶體可用於(例如)個人電腦、可攜式記憶卡、固態硬碟(SSD)、數位相機、蜂巢式電話、可攜式音樂播放器(諸如MP3播放器)、電影播放器及其他電子裝置中。The memory device is used as a non-volatile memory for a wide range of electronic applications requiring high memory density, high reliability, and data retention without power. Non-volatile memory can be used, for example, in personal computers, portable memory cards, solid state drives (SSDs), digital cameras, cellular phones, portable music players (such as MP3 players), movie players, and In other electronic devices.
各種記憶體裝置可包含一記憶體陣列。該記憶體陣列可包含複數個記憶體單元。該複數個記憶體單元可配置於一或多個平面中,各平面具有組織於一交叉點架構中之記憶體單元。在此等架構中,記憶體單元可配置於列及行之一矩陣中。記憶體單元可定位於導線之交點處。記憶體裝置可包含複數個垂直堆疊平面。即,該等平面可在彼此 不同之高度處形成。Various memory devices can include a memory array. The memory array can include a plurality of memory cells. The plurality of memory cells can be arranged in one or more planes, each plane having a memory unit organized in a cross-point architecture. In such architectures, memory cells can be arranged in a matrix of columns and rows. The memory unit can be positioned at the intersection of the wires. The memory device can include a plurality of vertical stacking planes. That is, the planes can be in each other Formed at different heights.
與該(等)記憶體陣列相關聯之解碼邏輯(例如,一或多個解碼器)可具有在記憶體陣列下方形成於基板材料中之元件(諸如電晶體)。然而,隨著記憶體單元之密度在一給定區域中歸因於記憶體單元及/或堆疊在彼此頂部上之記憶體單元之平面之尺寸降低而增加,解碼邏輯之佔據面積可超過記憶體陣列之佔據面積。Decoding logic (e.g., one or more decoders) associated with the (etc.) memory array can have elements (such as transistors) formed in the substrate material below the memory array. However, as the density of the memory cells increases due to a decrease in the size of the memory cells and/or the planes of the memory cells stacked on top of each other in a given region, the footprint of the decoding logic can exceed the memory. The footprint of the array.
100‧‧‧記憶體陣列100‧‧‧ memory array
102‧‧‧記憶體單元102‧‧‧ memory unit
104‧‧‧字線104‧‧‧Word line
106‧‧‧位元線106‧‧‧ bit line
108‧‧‧電極108‧‧‧Electrode
110‧‧‧電阻可變儲存元件材料110‧‧‧Resistive variable storage element materials
112‧‧‧電極112‧‧‧ electrodes
114‧‧‧單元選擇裝置材料114‧‧‧Unit selection device materials
116‧‧‧電極116‧‧‧electrode
202‧‧‧記憶體單元202‧‧‧ memory unit
204‧‧‧局部字線204‧‧‧Local word line
206‧‧‧局部位元線206‧‧‧Local bit line
218‧‧‧記憶體陣列218‧‧‧ memory array
219‧‧‧記憶體陣列219‧‧‧ memory array
220‧‧‧第一平面220‧‧‧ first plane
221‧‧‧第一平面221‧‧‧ first plane
222‧‧‧第二平面222‧‧‧ second plane
223‧‧‧第二平面223‧‧‧ second plane
224‧‧‧列解碼邏輯224‧‧‧ column decoding logic
226‧‧‧行解碼邏輯226‧‧‧Decoding logic
228‧‧‧電阻228‧‧‧resistance
230‧‧‧電阻230‧‧‧resistance
236‧‧‧平面選擇裝置236‧‧‧ Plane selection device
238‧‧‧平面選擇裝置238‧‧‧Plane selection device
240‧‧‧平面啟用240‧‧‧ Plane activation
242‧‧‧平面啟用242‧‧‧ Plane activation
244‧‧‧平面啟用244‧‧‧ Plane activation
246‧‧‧平面啟用246‧‧‧ Plane activation
248‧‧‧平面字線248‧‧‧ flat word line
250‧‧‧平面字線250‧‧‧ flat word line
252‧‧‧共同字線252‧‧‧Common word line
254‧‧‧平面位元線254‧‧‧ flat bit line
256‧‧‧平面位元線256‧‧‧ flat bit line
258‧‧‧共同位元線258‧‧‧Common bit line
302‧‧‧記憶體單元302‧‧‧ memory unit
304‧‧‧局部字線304‧‧‧Local word line
306‧‧‧局部位元線306‧‧‧Local bit line
318‧‧‧記憶體陣列318‧‧‧ memory array
320‧‧‧第一平面320‧‧‧ first plane
322‧‧‧第二平面322‧‧‧ second plane
328‧‧‧電阻328‧‧‧resistance
330‧‧‧電阻330‧‧‧resistance
336‧‧‧平面選擇裝置336‧‧‧Plane selection device
338‧‧‧平面選擇裝置338‧‧‧Plane selection device
340‧‧‧平面啟用340‧‧‧ Plane activation
342‧‧‧平面啟用342‧‧‧ Plane activation
344‧‧‧平面啟用344‧‧‧ Plane activation
346‧‧‧平面啟用346‧‧‧ Plane activation
348‧‧‧平面字線348‧‧‧ flat word line
350‧‧‧平面字線350‧‧‧ flat word line
352‧‧‧共同字線352‧‧‧Common word line
354‧‧‧平面位元線354‧‧‧ flat bit line
356‧‧‧平面位元線356‧‧‧ flat bit line
358‧‧‧共同位元線358‧‧‧Common bit line
Vcc‧‧‧供應電壓Vcc‧‧‧ supply voltage
圖1繪示根據本發明之許多實施例之一記憶體陣列之一部分之一透視圖。1 is a perspective view of a portion of a memory array in accordance with many embodiments of the present invention.
圖2A係根據本發明之許多實施例所形成之具有呈平面隔離之一「共基」組態之三終端平面選擇裝置之一記憶體陣列之一部分之一示意圖代表。2A is a schematic representation of one of a portion of a memory array of a three-terminal planar selection device having a "co-based" configuration in a planar isolation formed in accordance with many embodiments of the present invention.
圖2B係根據本發明之許多實施例所形成之具有呈平面隔離之一「共集」組態之三終端平面選擇裝置之一記憶體陣列之一部分之一示意圖代表。2B is a schematic representation of one of a portion of a memory array formed by a three terminal plane selection device having a "collective" configuration in a planar isolation formed in accordance with many embodiments of the present invention.
圖3繪示根據本發明之許多實施例所形成之具有平面隔離之一「共基」組態之一記憶體陣列之一部分之一透視圖。3 is a perspective view of one of a portion of a memory array having a planar "isolated" configuration formed in accordance with many embodiments of the present invention.
本發明提供記憶體陣列及形成該等記憶體陣列之方法。一例示性記憶體陣列可包含具有配置於一矩陣中之複數個記憶體單元及複數個平面選擇裝置之至少一平面。該複數個記憶體單元之群組以通信方式耦合至複數個平面選擇裝置之一各自平面選擇裝置。具有元件之一解碼邏輯形成於一基板材料中且以通信方式耦合至該複數個平面選擇裝置。該複數個記憶體單元及該複數個平面選擇裝置並不形成於該基板材料中。The present invention provides memory arrays and methods of forming such memory arrays. An exemplary memory array can include at least one plane having a plurality of memory cells and a plurality of planar selection devices disposed in a matrix. The plurality of groups of memory cells are communicatively coupled to respective planar selection devices of one of a plurality of planar selection devices. A decoding logic having a component is formed in a substrate material and communicatively coupled to the plurality of planar selection devices. The plurality of memory cells and the plurality of planar selection devices are not formed in the substrate material.
本發明之實施例可提供諸如減少形成於基板材料中之與一記憶 體陣列相關聯之元件(諸如包括解碼電路之電晶體)之數量之益處。減少形成於基板材料中之與一記憶體陣列相關聯之元件之數量可減少解碼邏輯及定位於一記憶體陣列下方之與該記憶體陣列相關聯之其他電路之實體佔據面積且因此增加記憶體單元密度。Embodiments of the present invention can provide, for example, reducing the formation of a memory in a substrate material The benefit of the number of components associated with a volume array, such as a transistor including a decoding circuit. Reducing the number of components associated with a memory array formed in the substrate material reduces the physical footprint of the decoding logic and other circuitry associated with the memory array positioned below a memory array and thus increases memory Cell density.
根據本發明之各種實施例,用於選擇記憶體單元之個別平面之選擇裝置可形成於與記憶體裝置相同之平面上。在與記憶體裝置相同之平面上形成平面選擇裝置允許多工化形成於基板材料中且與記憶體陣列相關聯之電路。因為可選擇個別平面,所以記憶體陣列之各平面不需要(例如)其自身專用解碼電路。即,解碼電路不需要唯一與記憶體陣列之各平面相關聯且記憶體單元之多個平面可透過平面選擇裝置以通信方式並聯耦合至一相同解碼電路。在與記憶體裝置相同之平面上形成平面選擇裝置減少具有藉由不必形成於基板材料中之平面選擇裝置而形成於該基板材料中之元件之與記憶體陣列相關聯之電路之佔據面積。In accordance with various embodiments of the present invention, selection means for selecting individual planes of the memory cells can be formed on the same plane as the memory device. Forming a planar selection device on the same plane as the memory device allows for multiplexing of circuitry formed in the substrate material and associated with the memory array. Because individual planes can be selected, the planes of the memory array do not require, for example, their own dedicated decoding circuitry. That is, the decoding circuit need not be uniquely associated with each plane of the memory array and the plurality of planes of the memory unit can be communicatively coupled in parallel to a same decoding circuit through the plane selection device. Forming a planar selection device on the same plane as the memory device reduces the footprint of circuitry associated with the memory array of components formed in the substrate material by planar selection devices that are not necessarily formed in the substrate material.
在本發明之以下詳細描述中,參考形成該詳細描述之一部分之附圖且在附圖中藉由圖解展示可如何實踐本發明之一或多個實施例。詳細描述此等實施例以足以使一般技術者能夠實踐本發明之實施例,且應理解,可利用其它實施例且可在不脫離本發明之範疇之情況下作出程序、電及/或結構之改變。In the following detailed description of the invention, reference to the drawings The embodiments are described in sufficient detail to enable those of ordinary skill in the art to practice the embodiments of the invention. change.
本文中之圖依循其中第一數位或若干數位對應於圖式數字且剩餘數位識別圖式中之一元件或組件之一編號慣例。可藉由使用類似數位識別不同圖之間之類似元件或組件。例如,102可參考圖1中之元件「02」且一類似元件可參考為圖2中之202。又,如本文中所使用般,「許多」一特定元件及/或特徵可指代此等元件及/或特徵之一或多者。The figures herein follow the first digit or digits corresponding to the schema number and the remaining digits identify one of the components or components in the drawing numbering convention. Similar components or components between different figures can be identified by using similar digits. For example, 102 can refer to component "02" in FIG. 1 and a similar component can be referred to as 202 in FIG. Also, as used herein, "a plurality" of a particular element and/or feature may refer to one or more of such elements and/or features.
圖1繪示根據本發明之許多實施例之一記憶體陣列100之一部分 之一透視圖。該記憶體陣列100可具有一交叉點架構,該交叉點架構具有定位於可在本文中稱為字線之許多導線104(例如,存取線)及可在本文中稱為位元線之許多導線106(例如,資料/感測線)之交點處之記憶體單元102。如所繪示般,該等字線104實質上彼此平行且實質上正交於實質上彼此平行之該等位元線106。然而,實施例並不限於一平行/正交組態。1 illustrates a portion of a memory array 100 in accordance with many embodiments of the present invention. One perspective. The memory array 100 can have a cross-point architecture having a plurality of wires 104 (e.g., access lines) that can be referred to herein as word lines and many of which can be referred to herein as bit lines. The memory unit 102 at the intersection of the wires 106 (eg, data/sensing lines). As depicted, the word lines 104 are substantially parallel to each other and substantially orthogonal to the bit lines 106 that are substantially parallel to each other. However, embodiments are not limited to a parallel/orthogonal configuration.
如本文中所使用般,術語「實質上」意指所修改特性不需要係絕對的,但係足夠接近以便達成該特性之優點。例如,「實質上平行」不限於絕對平行且可包含比一垂直定向至少更接近於一平行定向之定向。類似地,「實質上正交」不限於絕對正交且可包含比一平行定向至少更接近於一垂直定向之定向。As used herein, the term "substantially" means that the modified characteristics need not be absolute, but are close enough to achieve the advantages of the characteristic. For example, "substantially parallel" is not limited to being absolutely parallel and may include an orientation that is at least closer to a parallel orientation than a vertical orientation. Similarly, "substantially orthogonal" is not limited to being absolutely orthogonal and may include an orientation that is at least closer to a vertical orientation than a parallel orientation.
在各種實施例中,記憶體單元102可具有一「堆疊」結構。各記憶體單元102可包含形成於字線104與位元線106之間之與一各自單元選擇裝置串聯連接之一儲存元件,例如,單元存取裝置。該儲存元件可為一電阻可變儲存元件。該電阻可變儲存元件可包含形成於一對電極(例如,108及112)之間之一電阻可變儲存元件材料110。單元選擇裝置可包含形成於一對電極(例如,112及116)之間之一單元選擇裝置材料114。In various embodiments, memory unit 102 can have a "stacked" structure. Each memory cell 102 can include a storage element, such as a cell access device, formed between word line 104 and bit line 106 in series with a respective cell selection device. The storage element can be a variable resistance storage element. The resistive variable storage element can include a resistive variable storage element material 110 formed between a pair of electrodes (eg, 108 and 112). The cell selection device can include a cell selection device material 114 formed between a pair of electrodes (eg, 112 and 116).
記憶體陣列100之記憶體單元102可包括與一相變材料串聯之單元選擇裝置使得該記憶體陣列100可稱為相變材料及開關(PCMS)陣列。在許多實施例中,單元選擇裝置可為(例如)一兩終端雙向臨限開關(OTS)。一OTS可包含(例如)形成於一對導電材料(例如,導電電極)之間之一硫屬化物材料。回應於跨該OTS之小於一臨限值電壓之一所施加電壓,該OTS可保持在一「關閉」狀態(例如,一非導電狀態)中。或者,回應於跨該OTS之大於該臨限值電壓之一所施加電壓,該OTS突返至一「開啟」狀態。在該「開啟」狀態中OTS裝置可攜載具 有在其終端處之幾乎保持恒定於所謂「固持(holding)電壓」位準之一電壓之大量電流。The memory unit 102 of the memory array 100 can include cell selection means in series with a phase change material such that the memory array 100 can be referred to as a phase change material and switch (PCMS) array. In many embodiments, the unit selection device can be, for example, one or two terminal two-way threshold switches (OTS). An OTS can comprise, for example, a chalcogenide material formed between a pair of electrically conductive materials (eg, conductive electrodes). In response to a voltage applied across one of the OTSs that is less than one threshold voltage, the OTS can remain in an "off" state (eg, a non-conducting state). Alternatively, the OTS rushes back to an "on" state in response to a voltage applied across the OTS that is greater than one of the threshold voltages. OTS device portable carrier in this "on" state There is a large amount of current at its terminal that remains almost constant at one of the so-called "holding voltage" levels.
本發明之實施例不限於PCMS交叉點陣列或一特定單元選擇開關。例如,本發明之方法及設備可應用於其他交叉點陣列,諸如利用除其他類型之記憶體單元外之(例如)電阻性隨機存取記憶體(RRAM)單元、導電橋接隨機存取記憶體(CBRAM)單元及/或自旋轉移扭矩隨機存取記憶體(STT-RAM)單元之陣列。Embodiments of the invention are not limited to PCMS crosspoint arrays or a particular cell selection switch. For example, the method and apparatus of the present invention can be applied to other cross-point arrays, such as, for example, resistive random access memory (RRAM) cells, conductive bridged random access memory (other than other types of memory cells). An array of CBRAM) cells and/or spin transfer torque random access memory (STT-RAM) cells.
在其中電阻可變儲存元件包括一PCM之實施例中,除其他相變材料外,相變材料可為硫屬合金,諸如銦(In)-銻(Sb)-碲(Te)(IST)材料(例如,In2 Sb2 Te5 、In1 Sb2 Te4 、In1 Sb4 Te7 等)或鍺(Ge)-銻(Sb)-碲(Te)(GST)材料(例如,Ge8 Sb5 Te8 、Ge2 Sb2 Te5 、Ge1 Sb2 Te4 、Ge1 Sb4 Te7 、Ge4 Sb4 Te7 或等)。如本文中所使用般之用連字符連接之化學成分符號指示包含於一特定混合物或化合物中之元素且意指表示涉及所指示元素之全部理想配比。其他相變材料可包含(例如)Ge-Te、In-Se、Sb-Te、Ga-Sb、In-Sb、As-Te、Al-Te、Ge-Sb-Te、Te-Ge-As、In-Sb-Te、Te-Sn-Se、Ge-Se-Ga、Bi-Se-Sb、Ga-Se-Te、Sn-Sb-Te、In-Sb-Ge、Te-Ge-Sb-S、Te-Ge-Sn-O、Te-Ge-Sn-Au、Pd-Te-Ge-Sn、In-Se-Ti-Co、Ge-Sb-Te-Pd、Ge-Sb-Te-Co、Sb-Te-Bi-Se、Ag-In-Sb-Te、Ge-Sb-Se-Te、Ge-Sn-Sb-Te、Ge-Te-Sn-Ni、Ge-Te-Sn-Pd及Ge-Te-Sn-Pt。電阻可變材料之其他實例包含過渡金屬氧化物材料或包含兩個或兩個以上金屬(例如,過渡金屬、鹼土金屬及/或稀土金屬)之合金。實施例不限於一特定電阻性可變材料或與記憶體單元102之儲存元件相關聯之材料。例如,電阻性可變材料中可用於形成儲存元件之其他實例尤其包含二元金屬氧化物材料、巨磁阻材料及/或各種以聚合物為基之電阻可變材料。In embodiments in which the variable resistance storage element comprises a PCM, the phase change material may be a chalcogenide alloy such as indium (In)-bismuth (Sb)-tellurium (Te) (IST) material, among other phase change materials. (for example, In 2 Sb 2 Te 5 , In 1 Sb 2 Te 4 , In 1 Sb 4 Te 7 , etc.) or germanium (Ge)-germanium (Sb)-tellurium (Te) (GST) material (for example, Ge 8 Sb) 5 Te 8 , Ge 2 Sb 2 Te 5 , Ge 1 Sb 2 Te 4 , Ge 1 Sb 4 Te 7 , Ge 4 Sb 4 Te 7 or the like). As used herein, a chemical symbol attached by a hyphen indicates an element contained in a particular mixture or compound and is meant to refer to all stoichiometric ratios of the indicated elements. Other phase change materials may include, for example, Ge-Te, In-Se, Sb-Te, Ga-Sb, In-Sb, As-Te, Al-Te, Ge-Sb-Te, Te-Ge-As, In -Sb-Te, Te-Sn-Se, Ge-Se-Ga, Bi-Se-Sb, Ga-Se-Te, Sn-Sb-Te, In-Sb-Ge, Te-Ge-Sb-S, Te -Ge-Sn-O, Te-Ge-Sn-Au, Pd-Te-Ge-Sn, In-Se-Ti-Co, Ge-Sb-Te-Pd, Ge-Sb-Te-Co, Sb-Te -Bi-Se, Ag-In-Sb-Te, Ge-Sb-Se-Te, Ge-Sn-Sb-Te, Ge-Te-Sn-Ni, Ge-Te-Sn-Pd, and Ge-Te-Sn -Pt. Other examples of resistance variable materials include transition metal oxide materials or alloys comprising two or more metals (eg, transition metals, alkaline earth metals, and/or rare earth metals). Embodiments are not limited to a particular resistive variable material or material associated with a storage element of memory unit 102. For example, other examples of resistively variable materials that can be used to form the storage element include, inter alia, binary metal oxide materials, giant magnetoresistive materials, and/or various polymer-based resistance variable materials.
在許多實施例中,可在記憶體單元102之單元選擇裝置與儲存元 件之間共用一電極。又,在許多實施例中,字線104及位元線106可用作對應於記憶體單元102之頂部電極或底部電極。In many embodiments, the unit and storage unit can be selected in the unit of the memory unit 102. An electrode is shared between the pieces. Again, in many embodiments, word line 104 and bit line 106 can be used as the top or bottom electrode corresponding to memory cell 102.
在許多實施例中,電阻可變儲存元件材料110可包括與單元選擇裝置材料114相同之材料之一或多者。然而,實施例並不如此限制。例如,電阻可變儲存元件材料110及單元選擇裝置材料114可包括不同材料。根據本發明之各種實施例,電阻性儲存元件材料110與單元選擇裝置材料114之相對定位可與圖1中所展示之相對定位反向。In many embodiments, the resistance variable storage element material 110 can include one or more of the same materials as the unit selection device material 114. However, the embodiments are not so limited. For example, the resistance variable storage element material 110 and the unit selection device material 114 can comprise different materials. In accordance with various embodiments of the present invention, the relative positioning of resistive storage element material 110 and unit selection device material 114 may be reversed relative to the relative orientation shown in FIG.
可藉由各種薄膜技術形成本文中所描述之材料,該等薄膜技術尤其包含(但不限於):旋塗、毯覆式塗佈、化學氣相沈積(CVD)(諸如低壓CVD)、電漿輔助化學氣相沈積(PECVD)、原子層沈積(ALD)、電漿輔助ALD、物理氣相沈積(PVD)、熱分解及/或熱生長。或者,材料可就地生長。雖然本文中所描述及繪示之材料可形成為層,但該等材料並不限於此且可以其他三維組態形成。The materials described herein can be formed by a variety of thin film techniques including, but not limited to, spin coating, blanket coating, chemical vapor deposition (CVD) (such as low pressure CVD), plasma Auxiliary chemical vapor deposition (PECVD), atomic layer deposition (ALD), plasma assisted ALD, physical vapor deposition (PVD), thermal decomposition, and/or thermal growth. Alternatively, the material can grow in situ. Although the materials described and illustrated herein may be formed as layers, the materials are not limited thereto and may be formed in other three-dimensional configurations.
儘管圖1中並未繪示,然在許多實施例中記憶體陣列100可為具有垂直堆疊在彼此上之許多平面(例如,瓦片、卡片)之一三維(3D)架構之部分。在此等實施例中,例如,導線104及106可以通信方式耦合至該3D陣列之一平面之記憶體單元。此外,記憶體陣列100可(例如)經由導線104及106連接至與該記憶體陣列相關聯之電路(例如,在與操作記憶體陣列100相關聯之各種其他電路中之解碼電路)。例如,可形成與記憶體陣列100相關聯之此電路之元件(例如,電晶體等)以構成記憶體陣列100之基礎。Although not shown in FIG. 1, in many embodiments memory array 100 can be part of a three-dimensional (3D) architecture having a plurality of planes (eg, tiles, cards) stacked vertically on each other. In such embodiments, for example, wires 104 and 106 can be communicatively coupled to a memory unit on one of the planes of the 3D array. Moreover, memory array 100 can be coupled, for example, via wires 104 and 106 to circuitry associated with the memory array (eg, in various other circuits associated with operating memory array 100). For example, elements of such circuitry (eg, transistors, etc.) associated with memory array 100 can be formed to form the basis of memory array 100.
在操作中,可藉由經由選定字線104及位元線106跨記憶體單元102施加一電壓(例如,一寫入電壓)而程式化記憶體陣列100之記憶體單元102。可(例如)藉由調整儲存元件之電阻位準而調整(例如,改變)跨記憶體單元102之電壓脈衝之寬度及/或量值以將記憶體單元102程式化至特定資料狀態。In operation, the memory cell 102 of the memory array 100 can be programmed by applying a voltage (eg, a write voltage) across the memory cell 102 via the selected word line 104 and the bit line 106. The memory cell 102 can be programmed to a particular data state, for example, by adjusting the resistance level of the storage element to adjust (eg, change) the width and/or magnitude of the voltage pulse across the memory unit 102.
一感測(例如,讀取)操作可用於決定一記憶體單元102之邏輯狀態。例如,特定電壓可施加至對應於一選定記憶體單元102之一位元線106及字線104且可感測回應於一所得電壓差之通過該單元之電流。感測操作亦可包含在特定電壓處偏壓未選定字線104及位元線106(例如,連接至未選定單元之字線及位元線)以感測一選定單元102之資料狀態。A sense (eg, read) operation can be used to determine the logic state of a memory unit 102. For example, a particular voltage can be applied to one of the bit lines 106 and word lines 104 corresponding to a selected memory cell 102 and can sense the current through the cell in response to a resulting voltage difference. The sensing operation can also include biasing unselected word lines 104 and bit lines 106 (eg, word lines and bit lines connected to unselected cells) at a particular voltage to sense the data state of a selected cell 102.
來自記憶體單元之各平面之字線104及位元線106可連接至在記憶體陣列下方形成於基板材料中且用於解釋各種信號(例如,字線104及位元線106上之電壓及/或電流)之解碼電路。該等解碼電路可包含用於解碼字線104上之信號之列解碼電路及用於解碼位元線106上之信號之行解碼電路。Word lines 104 and bit lines 106 from the planes of the memory cells can be connected to the substrate material under the memory array and used to interpret various signals (eg, voltages on word lines 104 and bit lines 106 and / or current) decoding circuit. The decoding circuits may include a column decoding circuit for decoding signals on word line 104 and a row decoding circuit for decoding signals on bit line 106.
如本發明中所使用般,術語「基板」材料可包含絕緣體上矽(SOI)或藍寶石上矽(SOS)技術、摻雜及未摻雜之半導體、由一基底半導體基座支撐之磊晶矽層、習知金屬氧化物半導體(CMOS)(例如,具有一金屬後端之一CMOS前端)及/或其他半導體結構及技術。可諸如經由處理步驟於基板材料中/上形成各種元件(例如,電晶體)及/或電路(舉例而言,諸如與操作記憶體陣列100相關聯之解碼電路)以在該基底半導體結構或基座中形成區域或接面。As used in the present invention, the term "substrate" material may include silicon-on-insulator (SOI) or sapphire-on-the-spot (SOS) technology, doped and undoped semiconductors, and epitaxial germanium supported by a base semiconductor pedestal. Layer, conventional metal oxide semiconductor (CMOS) (eg, having a CMOS front end of a metal back end) and/or other semiconductor structures and techniques. Various elements (eg, transistors) and/or circuits (eg, such as decoding circuits associated with operating memory array 100) may be formed in/on the substrate material, such as via processing steps, at the base semiconductor structure or base. A region or junction is formed in the seat.
圖2A係根據本發明之許多實施例所形成之具有呈平面隔離之一「共基」組態之三終端平面選擇裝置236/238之一記憶體陣列218之一部分之一示意圖代表。根據許多實施例,該等三終端平面選擇裝置236及238可為類似於上文關於單元選擇裝置所論述之兩終端OTS之一雙向臨限開關(OTS),但藉由增加一第三終端以控制該OTS之「啟動」。透過該第三終端控制該OTS裝置。一三終端OTS係處於一高電阻性非導電「關閉」狀態中直至一脈衝施加至該第三終端,該脈衝開啟該三終端OTS(例如,該三終端OTS係處於一導電「開啟」狀態 中)。只要一最小固持電流流經三終端OTS(例如,只要一最小固持電壓跨該三終端OTS而存在),則在移除控制脈衝之後該三終端OTS保持開啟。2A is a schematic representation of one of a portion of a memory array 218 of a three terminal plane selection device 236/238 having a "co-based" configuration in a planar isolation formed in accordance with many embodiments of the present invention. According to many embodiments, the three terminal plane selection devices 236 and 238 may be one-way threshold switch (OTS) similar to the two terminal OTS discussed above with respect to the unit selection device, but by adding a third terminal Control the "start" of the OTS. The OTS device is controlled by the third terminal. The three-terminal OTS is in a high-resistance non-conductive "off" state until a pulse is applied to the third terminal, the pulse turning on the three-terminal OTS (eg, the three-terminal OTS is in a conductive "on" state in). As long as a minimum holding current flows through the three-terminal OTS (eg, as long as a minimum holding voltage exists across the three-terminal OTS), the three-terminal OTS remains on after the control pulse is removed.
(例如)藉由使第三終端接觸(例如,一兩終端裝置之)主動硫屬化物切換區域之一部分而形成三終端OTS。一旦超過臨限值電壓,電流即流經該第三終端至較低電極。存在較少回溯或不存在回溯,此係因為第三終端實體上非常接近於該較低電極且係電阻性的。三終端OTS平面選擇裝置236及238可以與兩終端單元選擇裝置形成於一PCMS陣列之平面中所藉由之方式類似之一方式形成於記憶體陣列218之平面中。A three-terminal OTS is formed, for example, by contacting a third terminal with a portion of an active chalcogenide switching region (e.g., one or two terminal devices). Once the threshold voltage is exceeded, current flows through the third terminal to the lower electrode. There is less backtracking or no backtracking, since the third terminal is physically close to the lower electrode and is resistive. The three-terminal OTS plane selecting means 236 and 238 can be formed in the plane of the memory array 218 in a manner similar to the manner in which the two terminal unit selecting means are formed in the plane of a PCMS array.
記憶體陣列218包含複數個記憶體單元202。將該記憶體陣列218展示為具有包含一第一平面220及一第二平面222之複數個平面。平面220及222可形成為一垂直堆疊組態,例如,其中平面220形成於與形成平面222所處之高度不同之一高度處。在許多其他實施例中,可於一基板材料上方之相同高度處形成平面220及222。Memory array 218 includes a plurality of memory cells 202. The memory array 218 is shown as having a plurality of planes including a first plane 220 and a second plane 222. The planes 220 and 222 can be formed in a vertically stacked configuration, for example, wherein the plane 220 is formed at a height different from the height at which the plane 222 is formed. In many other embodiments, planes 220 and 222 can be formed at the same height above a substrate material.
儘管圖2A中展示兩個平面,然本發明之實施例並不限於此數量之平面。本發明之實施例可實施為其中記憶體單元配置於更多或更少平面中。為簡單起見,將有限數目個記憶體單元202展示於記憶體陣列218之各平面中。然而,本發明之實施例並不限於特定數量之記憶體單元且可對於具有更多或更少記憶體單元之一記憶體陣列而實施。Although two planes are shown in Figure 2A, embodiments of the invention are not limited to this number of planes. Embodiments of the invention may be practiced where the memory cells are configured in more or fewer planes. For simplicity, a limited number of memory cells 202 are shown in the various planes of memory array 218. However, embodiments of the invention are not limited to a particular number of memory cells and may be implemented for a memory array having one or more memory cells.
將各平面之記憶體單元202展示為配置於列及行之一交叉點架構(例如,一4x4矩陣)中。將一列中之各記憶體單元202之一終端展示為以通信方式耦合至一局部導線(例如,一局部字線204)。在圖2A中將該局部字線204之一端展示為連接至一電阻230且將該局部字線204之另一端展示為連接至一對應平面選擇裝置236之一第一終端(例如,一三終端OTS之一射極終端)。The memory cells 202 of each plane are shown as being arranged in a column and row intersection structure (eg, a 4x4 matrix). One of the terminals of each of the memory cells 202 in a column is shown as being communicatively coupled to a local conductor (e.g., a local wordline 204). One end of the local word line 204 is shown in FIG. 2A as being coupled to a resistor 230 and the other end of the local word line 204 is shown as being coupled to a first terminal of a corresponding plane selection device 236 (eg, a three terminal One of the OTS emitter terminals).
然而,本發明之實施例並不限於圖2A中所繪示之特定組態,特定言之係關於電阻230及/或平面選擇裝置236之定位。即,電阻230不需要定位於局部字線204之與對應平面選擇裝置236相對之一端處且可更接近於該對應平面選擇裝置236而定位及/或可為分散式電阻(例如,體現於與局部字線204串聯定位之複數個離散電阻性元件及/或用於形成該局部字線204之材料所引起之電阻中)。在一些組態中,平面選擇裝置236亦可與圖2A中所展示不同而定位。例如,平面選擇裝置236及/或電阻230可遠離局部字線204之端部而定位(除其他定位外,諸如接近該局部字線204之中心)。在另一實例中,平面選擇裝置236及電阻230可相對於圖2A中所展示之定位而互換。However, embodiments of the present invention are not limited to the particular configuration depicted in FIG. 2A, particularly with respect to the positioning of resistor 230 and/or plane selection device 236. That is, the resistor 230 need not be positioned at one end of the local word line 204 opposite the corresponding plane selection device 236 and may be positioned closer to the corresponding plane selection device 236 and/or may be a distributed resistor (eg, embodied in The plurality of discrete resistive elements positioned in series with the local word lines 204 and/or the resistors caused by the material used to form the local word lines 204). In some configurations, the plane selection device 236 can also be positioned differently than that shown in Figure 2A. For example, plane selection device 236 and/or resistor 230 can be positioned away from the end of local word line 204 (such as near the center of local word line 204, among other locations). In another example, plane selection device 236 and resistor 230 can be interchanged with respect to the orientation shown in Figure 2A.
對應平面選擇裝置236之一第二終端(例如,一集極終端)連接至一平面字線248,該平面字線248繼而連接至一共同字線252。將該共同字線252展示為以通信方式耦合至列解碼邏輯224。雖然圖2A繪示定位於各局部字線204與一對應平面字線248/250之間之一對應平面選擇裝置236,但本發明之實施例並不如此限制。一平面選擇裝置可定位於並非全部字線與對應平面字線之間,及/或相對於一些平面而存在且並不相對於其他平面而存在等。例如,本發明之實施例可包含介於(一或多個平面之)一或多個局部字線204與一對應平面字線之間之一平面選擇裝置。A second terminal (e.g., a collector terminal) of one of the corresponding plane selection devices 236 is coupled to a planar word line 248, which in turn is coupled to a common word line 252. The common word line 252 is shown as being communicatively coupled to the column decode logic 224. Although FIG. 2A illustrates one of the corresponding planar selection devices 236 positioned between each of the local wordlines 204 and a corresponding planar wordline 248/250, embodiments of the present invention are not so limited. A planar selection device can be positioned between not all of the word lines and corresponding planar word lines, and/or existing with respect to some of the planes and not present relative to other planes, and the like. For example, embodiments of the invention may include a plane selection device between one or more local word lines 204 (one or more planes) and a corresponding planar word line.
將一行中之各記憶體單元202之一終端展示為以通信方式耦合至一局部位元線206。將該局部位元線206之一端展示為連接至一電阻228且將該局部位元線206之另一端展示為連接至一對應平面選擇裝置238之一第一終端(例如,一三終端OTS之一射極終端)。One of the terminals of each memory unit 202 in a row is shown as being communicatively coupled to a local bit line 206. One end of the local bit line 206 is shown coupled to a resistor 228 and the other end of the local bit line 206 is shown as being connected to a first terminal of a corresponding plane selection device 238 (eg, a three terminal OTS An emitter terminal).
然而,本發明之實施例並不限於圖2A中所繪示之特定組態,特定言之係關於電阻228及/或平面選擇裝置238之定位。即,電阻228不需要定位於局部位元線206之與對應平面選擇裝置238相對之一端處且 可更接近於該對應平面選擇裝置238而定位及/或為分散式電阻(例如,體現於與局部位元線206串聯定位之複數個離散電阻性元件及/或用於形成該局部位元線206之材料所引起之電阻中)。在一些組態中平面選擇裝置238亦可與圖2A中所展示不同而定位。例如,平面選擇裝置238及/或電阻228可遠離局部位元線206之端部而定位(除其他定位外,諸如接近該局部位元線206之中心)。在另一實例中,平面選擇裝置238及電阻228可相對於圖2A中所展示之定位而互換。However, embodiments of the present invention are not limited to the particular configuration depicted in FIG. 2A, particularly with respect to the positioning of resistor 228 and/or plane selection device 238. That is, the resistor 228 need not be positioned at one end of the local bit line 206 opposite the corresponding plane selection device 238 and The plurality of discrete resistive elements positioned in series with the local bit line 206 and/or used to form the local bit line may be located closer to the corresponding plane selection device 238 and/or being a distributed resistor (eg, embodied in series with the local bit line 206) The resistance caused by the material of 206). In some configurations the plane selection device 238 can also be positioned differently than that shown in Figure 2A. For example, plane selection device 238 and/or resistor 228 can be located away from the end of local bit line 206 (such as near the center of the local bit line 206, among other locations). In another example, plane selection device 238 and resistor 228 can be interchanged with respect to the orientation shown in Figure 2A.
對應平面選擇裝置238之一第二終端(例如,一集極終端)連接至一平面位元線256,該平面位元線256繼而連接至一共同位元線258。將該共同位元線258展示為以通信方式耦合至行解碼邏輯226。雖然圖2A繪示定位於各局部位元線206與一對應平面位元線254/256之間之一對應平面選擇裝置238,但本發明之實施例並不如此限制。一平面選擇裝置可定位於並非全部位元線與對應平面位元線之間,及/或相對於一些平面而存在且並不相對於其他平面而存在等。例如,本發明之實施例可包含介於(一或多個平面之)一或多個局部位元線206與一對應平面位元線之間之一平面選擇裝置。此外,可相對於局部字線且非局部位元線,或局部位元線且非局部字線,或全部平面中各平面之一些或各平面之全部(如圖2A所展示),或僅在一些平面中且非其他平面而使用(定位於平面自身中之)平面選擇裝置。A second terminal (e.g., a collector terminal) of one of the corresponding plane selection devices 238 is coupled to a planar bit line 256, which in turn is coupled to a common bit line 258. The common bit line 258 is shown as being communicatively coupled to the row decode logic 226. Although FIG. 2A illustrates one of the corresponding plane selection devices 238 positioned between each of the local bit lines 206 and a corresponding planar bit line 254/256, embodiments of the present invention are not so limited. A plane selection device can be positioned between not all of the bit lines and corresponding plane bit lines, and/or existing relative to some planes and not present relative to other planes, and the like. For example, embodiments of the invention may include a plane selection device between one or more local bit lines 206 (one or more planes) and a corresponding planar bit line. Furthermore, it may be relative to a local word line and a non-local bit line, or a local bit line and a non-local word line, or some or all of the planes in all planes (as shown in Figure 2A), or only A planar selection device (located in the plane itself) is used in some planes and not in other planes.
如圖2A中所展示,未連接至記憶體單元202之電阻228及230之終端可連接至一供應電壓(例如,Vcc)。可選擇電阻228及230之大小以限制通過平面選擇裝置236及238之電流及/或跨平面選擇裝置236及238之電壓至與該等平面選擇裝置236及238相關聯之操作位準。電阻228之大小可與電阻230之大小相同或不同。As shown in FIG. 2A, the terminals of resistors 228 and 230 that are not connected to memory unit 202 can be connected to a supply voltage (eg, Vcc). The resistors 228 and 230 can be sized to limit the current through the plane selection devices 236 and 238 and/or the voltage across the plane selection devices 236 and 238 to the operational levels associated with the plane selection devices 236 and 238. The size of the resistor 228 can be the same or different than the size of the resistor 230.
平面選擇裝置236之各者之一第三終端(例如,一基極終端)可連接至一控制信號(例如,平面啟用240)。圖2A中所展示之具有平面選 擇裝置之連接至一平面啟用之基極終端之組態稱為一「共基」組態,此係因為該等基極終端聚集在一起。在平面啟用240上藉此施加至平面選擇裝置236之基極終端之一適當信號可引起平面選擇裝置236之各者在射極終端與集極終端之間傳導,藉此將局部字線204經由平面字線248以通信方式耦合至共同字線252使得解碼邏輯可操作(例如,程式化/讀取)第一平面220之字線。只要平面啟用240上存在適當信號及/或通過平面選擇裝置236之電流及/或跨平面選擇裝置236之電壓保持於OTS固持臨限值之上,則平面選擇裝置236可繼續傳導。A third terminal (e.g., a base terminal) of each of the plane selection devices 236 can be coupled to a control signal (e.g., plane enable 240). Plane selection shown in Figure 2A The configuration of the device connected to a planar enabled base terminal is referred to as a "co-base" configuration because the base terminals are grouped together. Appropriate signals on the plane enablement 240 thereby applied to one of the base terminals of the plane selection device 236 may cause each of the plane selection devices 236 to conduct between the emitter terminal and the collector terminal, thereby passing the local word line 204 via The planar word line 248 is communicatively coupled to the common word line 252 such that the decode logic can operate (e.g., program/read) the word line of the first plane 220. The plane selection device 236 may continue to conduct as long as there is an appropriate signal on the plane enable 240 and/or the current through the plane selection device 236 and/or the voltage across the plane selection device 236 remains above the OTS hold threshold.
平面選擇裝置238之各者之一第三終端(例如,一基極終端)可連接至第一平面220之一平面啟用242。在該平面啟用242上藉此施加至平面選擇裝置238之基極終端之一適當信號可引起平面選擇裝置238之各者在射極終端與集極終端之間傳導,藉此將局部位元線206經由平面位元線254以通信方式耦合至共同字線252使得解碼邏輯可操作(例如,程式化/讀取)第一平面220之位元線。A third terminal (e.g., a base terminal) of each of the planar selection devices 238 can be coupled to one of the plane openings 242 of the first plane 220. An appropriate signal on the plane enable 242 thereby applied to one of the base terminals of the plane selection device 238 can cause each of the plane selection devices 238 to conduct between the emitter terminal and the collector terminal, thereby localizing the local bit line 206 is communicatively coupled to common word line 252 via planar bit line 254 such that the decode logic can operate (eg, program/read) the bit line of first plane 220.
若未將平面啟用240及平面啟用242連接在一起,則可獨立地操作其等以獨立地啟用第一平面220之字線204及/或位元線206之連續性。或者,可連接平面啟用240及平面啟用242使得一信號可同時啟用字線204及位元線206兩者之連續性。以此方式,一單一平面啟用可用於啟用第一平面220之操作/訊問(例如,選擇該第一平面220)。If plane enable 240 and plane enable 242 are not connected together, they can be independently operated to independently enable continuity of word line 204 and/or bit line 206 of first plane 220. Alternatively, connectable plane enable 240 and plane enable 242 enable a signal to simultaneously enable continuity of both word line 204 and bit line 206. In this manner, a single plane enable can be used to enable operation/interrogation of the first plane 220 (e.g., select the first plane 220).
關於第二平面222,介於記憶體單元202、局部字線204、局部位元線206、選擇裝置236及238、平面字線250、平面位元線254、共同字線252、共同位元線258、電阻228及230與供應電壓Vcc之間之連接可全部與關於第一平面220之類似特徵所描述及圖2A中所展示相同。然而,關於第二平面222,平面選擇裝置236之基極終端可連接至平面啟用244且平面選擇裝置238之基極終端可連接至平面啟用246。Regarding the second plane 222, between the memory unit 202, the local word line 204, the local bit line 206, the selection devices 236 and 238, the planar word line 250, the planar bit line 254, the common word line 252, the common bit line 258. The connections between resistors 228 and 230 and supply voltage Vcc may all be the same as described for similar features with respect to first plane 220 and as shown in FIG. 2A. Regarding the second plane 222, however, the base terminal of the plane selection device 236 can be coupled to the plane enable 244 and the base terminal of the plane selection device 238 can be coupled to the plane enable 246.
若未將平面啟用244及平面啟用246連接在一起,則可獨立地操 作其等以獨立地啟用第二平面222之字線204及/或位元線206之連續性。或者,可連接平面啟用244及平面啟用246使得一信號可同時啟用第二平面222之字線204及位元線206兩者之連續性。以此方式,一單一平面啟用可用於啟用第二平面222之操作/訊問(例如,選擇該第二平面222)。If the plane enable 244 and the plane enable 246 are not connected together, they can operate independently The continuity of the word line 204 and/or the bit line 206 of the second plane 222 is independently enabled. Alternatively, connectable plane enable 244 and plane enable 246 enable a signal to simultaneously enable continuity of both word line 204 and bit line 206 of second plane 222. In this manner, a single plane enable can be used to enable operation/interrogation of the second plane 222 (e.g., select the second plane 222).
圖2A展示複數個平面之字線(例如,平面字線248及250)並聯連接至引導至列解碼邏輯224之共同字線252。類似地,複數個平面之位元線(例如,平面位元線256及254)並聯連接至引導至行解碼邏輯226之共同位元線258。因為可獨立地選擇每一各自平面(例如,使用平面啟用240及242選擇第一平面220或使用平面啟用244及246選擇第二平面222),所以列解碼邏輯224及/或行解碼邏輯226可用於兩個平面。如此一來,個別專用列224解碼邏輯及行226解碼邏輯並不為各平面所需要。因為該列224解碼邏輯及該行226解碼邏輯具有形成於一基板材料中之元件,所以共用一單一列224解碼邏輯及行226解碼邏輯減少整合至半導體基板材料中之電路之佔據面積。2A shows that a plurality of planar word lines (eg, planar word lines 248 and 250) are connected in parallel to a common word line 252 leading to column decode logic 224. Similarly, a plurality of planar bit lines (e.g., planar bit lines 256 and 254) are connected in parallel to a common bit line 258 that is directed to row decode logic 226. Column decoding logic 224 and/or row decoding logic 226 may be used because each respective plane may be selected independently (eg, using plane enable 240 and 242 to select first plane 220 or using plane enable 244 and 246 to select second plane 222) In two planes. As such, the individual dedicated column 224 decoding logic and the row 226 decoding logic are not required for each plane. Because the column 224 decode logic and the row 226 decode logic have elements formed in a substrate material, sharing a single column 224 decode logic and row 226 decode logic reduces the footprint of circuitry integrated into the semiconductor substrate material.
當待存取(例如,與一程式化或讀取操作相關聯)一特定平面中之一記憶體單元202時,僅啟動該平面上之平面選擇裝置236及/或238。當並未操作平面選擇裝置236及/或238之任一者以傳導時,該等平面選擇裝置236及/或238可提供電隔離。在未選定平面中,導線(例如,局部字線及局部位元線)與平面內部之記憶體元件係藉由未選定之關閉狀態之平面選擇裝置236及/或238(例如,三終端OTS裝置)而與周邊上之信號絕緣。以此方式,平面選擇裝置236及/或238可用於多工化個別平面之導線至共同字線252及共同位元線258。When one of the memory cells 202 in a particular plane is to be accessed (e.g., associated with a stylized or read operation), only plane selection devices 236 and/or 238 on the plane are activated. The planar selection devices 236 and/or 238 can provide electrical isolation when either of the planar selection devices 236 and/or 238 are not being operated to conduct. In an unselected plane, the wires (eg, local word lines and local bit lines) and the memory elements within the plane are planar selection devices 236 and/or 238 by unselected closed states (eg, three-terminal OTS devices) ) and insulated from the signals on the perimeter. In this manner, plane selection devices 236 and/or 238 can be used to multiplex individual planar conductors to common word line 252 and common bit line 258.
此外,如圖2A中所繪示,平面選擇裝置236及238定位於各自平面上。即,例如,平面選擇裝置236及238可形成於與PCMS交叉點陣列相同之平面上。因此,平面選擇裝置(例如,電晶體)不需要形成於 基板材料中,藉此減小整合至半導體基板材料中之電路之佔據面積。Additionally, as depicted in Figure 2A, plane selection devices 236 and 238 are positioned on respective planes. That is, for example, plane selection devices 236 and 238 can be formed on the same plane as the PCMS intersection array. Therefore, a planar selection device (eg, a transistor) does not need to be formed in In the substrate material, thereby reducing the footprint of the circuitry integrated into the semiconductor substrate material.
根據一些實施例,利用形成於基板材料中之平面選擇裝置(例如,電晶體)實施本發明之平面選擇及平面字/位元線多工技術。例如,在記憶體陣列下方及在該記憶體陣列之邊界內存在足以容納形成於基板材料中之平面選擇裝置之區域之地方,該等平面選擇裝置之一些或全部可形成於基板材料中以便實現對多個平面中經由多工化平面字/位元線之共用解碼邏輯之佔據面積之節省。In accordance with some embodiments, the planar selection and planar word/bit line multiplexing techniques of the present invention are implemented using planar selection devices (e.g., transistors) formed in a substrate material. For example, some or all of the planar selection means may be formed in the substrate material below the memory array and at the boundary of the memory array sufficient to accommodate regions of the planar selection device formed in the substrate material. Savings in area occupied by shared decoding logic in multiple planes via multiplexed planar word/bit lines.
儘管圖2A展示對應於局部字線204及局部位元線206之平面選擇裝置,然本發明之實施例並不如此限制。可利用平面選擇裝置以連接及隔離與一特定平面相關聯之其他導線(諸如其他信號線)。此外,一特定平面220/222中之記憶體單元202之矩陣可進一步分成(例如)頁、區塊或其他實體或邏輯群組,且平面選擇裝置經配置及經組態以便提供(例如)獨立地選擇該特定平面之部分之能力。儘管圖2A僅展示每導線一平面選擇裝置,然實施例並不如此限制且一或多個平面選擇裝置可用於進一步隔離導線及/或特定記憶體單元及/或其他控制電路之部分。實施方案不限於平面選擇裝置之定位、數量、定向或組態且採用達成個別平面選擇以促進信號多工化以減少在一記憶體陣列下方形成於基板材料中之平面選擇裝置之重複電路及元件之其他配置及組態。Although FIG. 2A shows a plane selection device corresponding to local word line 204 and local bit line 206, embodiments of the invention are not so limited. Planar selection means can be utilized to connect and isolate other conductors (such as other signal lines) associated with a particular plane. Moreover, the matrix of memory cells 202 in a particular plane 220/222 can be further divided into, for example, pages, blocks, or other entities or logical groups, and the plane selection device is configured and configured to provide, for example, independence. The ability to select portions of that particular plane. Although FIG. 2A shows only one plane selection device per wire, embodiments are not so limited and one or more plane selection devices can be used to further isolate portions of the wires and/or particular memory cells and/or other control circuitry. Embodiments are not limited to the positioning, number, orientation, or configuration of the planar selection device and employ repeating circuits and components that achieve individual planar selection to facilitate signal multiplexing to reduce planar selection devices formed in the substrate material under a memory array. Other configurations and configurations.
圖2B係根據本發明之許多實施例所形成之具有呈平面隔離之一「共集」組態之三終端平面選擇裝置236/238之一記憶體陣列219之一部分之一示意圖代表。將該記憶體陣列219展示為具有包含一第一平面221及一第二平面223之複數個平面。如圖2B中所展示,連接係與圖2A中所展示之連接相同,除了記憶體陣列219之平面選擇裝置236/238係以一「共集」組態互連。即,平面選擇裝置236之一終端(例如,一三終端OTS之一射極終端)連接至局部字線204。對應平面選擇裝置236之第二終端(例如,一集極終端)連接至平面啟用240(而非如 圖2A所展示般連接至一平面字線248)。平面選擇裝置236之第三終端(例如,一基極終端)連接至平面字線248。在平面啟用240上藉此施加至平面選擇裝置236之集極終端之一適當信號可引起平面選擇裝置236之各者在射極終端與基極終端之間傳導,藉此將局部字線204經由平面字線248以通信方式耦合至共同字線252。2B is a schematic representation of one of a portion of a memory array 219 of one of three terminal plane selection devices 236/238 having a "collective" configuration in a planar isolation formed in accordance with many embodiments of the present invention. The memory array 219 is shown as having a plurality of planes including a first plane 221 and a second plane 223. As shown in Figure 2B, the connections are the same as those shown in Figure 2A, except that the plane selection devices 236/238 of the memory array 219 are interconnected in a "co-set" configuration. That is, one of the plane selection devices 236 (e.g., one of the three terminal OTS emitter terminals) is coupled to the local word line 204. A second terminal (eg, a collector terminal) corresponding to plane selection device 236 is coupled to plane enable 240 (rather than Connected to a planar word line 248) as shown in Figure 2A. A third terminal (e.g., a base terminal) of plane selection device 236 is coupled to planar word line 248. An appropriate signal on planar enable 240 whereby one of the collector terminals applied to plane select device 236 can cause each of plane select devices 236 to conduct between the emitter terminal and the base terminal, thereby passing local word line 204 via The planar word line 248 is communicatively coupled to a common word line 252.
類似地,平面選擇裝置238之一終端(例如,一射極終端)連接至局部位元線206。對應平面選擇裝置238之第二終端(例如,一集極終端)連接至平面啟用242(而非如圖2A所展示般連接至一平面位元線256)。平面選擇裝置238之第三終端(例如,一基極終端)連接至平面位元線256。在平面啟用242上藉此施加至平面選擇裝置238之集極終端之一適當信號可引起平面選擇裝置238之各者在射極終端與基極終端之間傳導,藉此將局部位元線206經由平面字線256以通信方式耦合至共同位元線258。第二平面223之平面選擇裝置236及238同樣係以一共集組態分別連接至平面啟用244及246。Similarly, one of the plane selection devices 238 (e.g., an emitter terminal) is coupled to the local bit line 206. A second terminal (e.g., a collector terminal) of the corresponding plane selection device 238 is coupled to the plane enable 242 (rather than to a planar bit line 256 as shown in Figure 2A). A third terminal (e.g., a base terminal) of plane selection device 238 is coupled to planar bit line 256. An appropriate signal on the plane enable 242 thereby applied to one of the collector terminals of the plane selection device 238 can cause each of the plane selection devices 238 to conduct between the emitter terminal and the base terminal, thereby placing the local bit line 206 The common bit line 258 is communicatively coupled via a planar word line 256. The plane selection devices 236 and 238 of the second plane 223 are also coupled to the plane enablers 244 and 246, respectively, in a common set configuration.
圖3繪示根據本發明之許多實施例所形成之具有平面隔離之一「共基」組態之一記憶體陣列之一部分之一透視圖。圖3係示意性地展示於圖2A中之記憶體陣列218之一例示性實施方案之一透視圖。圖3展示包含複數個記憶體單元302之一記憶體陣列318。將該記憶體陣列318展示為具有包含一第一平面320(例如,上平面)及一第二平面322(例如,下平面)之複數個平面。3 is a perspective view of one of a portion of a memory array having a planar "isolated" configuration formed in accordance with many embodiments of the present invention. 3 is a perspective view of one exemplary embodiment of a memory array 218 that is schematically illustrated in FIG. 2A. FIG. 3 shows a memory array 318 comprising a plurality of memory cells 302. The memory array 318 is shown as having a plurality of planes including a first plane 320 (eg, an upper plane) and a second plane 322 (eg, a lower plane).
將各平面之記憶體單元302展示為配置於列及行之一交叉點架構(例如,一4x4矩陣)中。將一列中之各記憶體單元302之一終端展示為連接至一局部字線304。將該局部字線304之一端展示為連接至一電阻330且將該局部字線304之另一端展示為連接至一對應平面選擇裝置336之一第一終端(例如,一三終端OTS之一射極終端)。然而,且如參考圖2A所論述般,本發明之實施例並不限於圖3中所繪示之特定組 態,特定言之係關於電阻330之定位,該電阻330可與局部字線304串聯而不同地定位及/或由沿該局部字線304之電阻組成。The memory cells 302 of each plane are shown as being arranged in a column and row intersection architecture (eg, a 4x4 matrix). One of the terminals of each of the memory cells 302 in a column is shown as being connected to a local word line 304. One end of the local word line 304 is shown coupled to a resistor 330 and the other end of the local word line 304 is shown as being connected to a first terminal of a corresponding plane selection device 336 (eg, one of three terminal OTS shots) Extreme terminal). However, as discussed with respect to FIG. 2A, embodiments of the present invention are not limited to the particular group illustrated in FIG. State, in particular, regarding the location of resistor 330, which may be positioned differently in series with local word line 304 and/or by resistors along local word line 304.
平面選擇裝置336之一第二終端(例如,一集極終端)連接至一平面字線348,該平面字線348繼而連接至一共同字線352。展示引導至列解碼邏輯(圖3中未展示)之該共同字線352。A second terminal (e.g., a collector terminal) of one of the plane selection devices 336 is coupled to a planar word line 348, which in turn is coupled to a common word line 352. The common word line 352 leading to column decoding logic (not shown in Figure 3) is shown.
將一行中之各記憶體單元302之一終端展示為以通信方式耦合至一局部位元線306。將該局部位元線306之一端展示為連接至一電阻328且將該局部位元線306之另一端展示為連接至一對應平面選擇裝置338之一第一終端(例如,一射極終端)。然而,且如參考圖2A所論述般,本發明之實施例並不限於圖3中所繪示之特定組態,特定言之關於電阻328之定位,該電阻328可與局部位元線306串聯而不同地定位及/或由該局部位元線306之電阻組成。One of the terminals of each memory unit 302 in a row is shown as being communicatively coupled to a local bit line 306. One end of the local bit line 306 is shown coupled to a resistor 328 and the other end of the local bit line 306 is shown as being coupled to a first terminal of a corresponding plane selection device 338 (eg, an emitter terminal) . However, and as discussed with respect to FIG. 2A, embodiments of the present invention are not limited to the particular configuration illustrated in FIG. 3, particularly with respect to the location of resistor 328, which may be in series with local bit line 306. It is positioned differently and/or consists of the resistance of the local bit line 306.
平面選擇裝置338之一第二終端(例如,一集極終端)連接至一平面位元線356,該平面位元線356繼而連接至一共同位元線358。展示引導至行解碼邏輯(圖3中未展示)之該共同位元線358。電阻328及330之一終端可連接至一供應電壓(例如,Vcc)。A second terminal (e.g., a collector terminal) of one of the plane selection devices 338 is coupled to a planar bit line 356, which in turn is coupled to a common bit line 358. The common bit line 358 leading to row decoding logic (not shown in Figure 3) is shown. One of the terminals of resistors 328 and 330 can be connected to a supply voltage (eg, Vcc).
各平面選擇裝置336之一第三終端(例如,一基極終端)可連接至第一平面320之一平面啟用340。圖3中所展示之組態係一「共基」組態,其中平面選擇裝置336之基極終端連接至該平面啟用340。平面選擇裝置338之各者之一第三終端(例如,一基極終端)可連接至第一平面320之一平面啟用342。該等平面啟用340及342可連接在一起(以選擇整個平面)或彼此隔離(以允許字線及位元線之選擇彼此獨立)。A third terminal (e.g., a base terminal) of each of the plane selection devices 336 can be coupled to one of the plane openings 340 of the first plane 320. The configuration shown in FIG. 3 is a "co-based" configuration in which the base terminal of plane selection device 336 is coupled to the plane enable 340. A third terminal (e.g., a base terminal) of each of the planar selection devices 338 can be coupled to one of the plane openings 342 of the first plane 320. The plane enablers 340 and 342 can be connected together (to select the entire plane) or isolated from each other (to allow the selection of word lines and bit lines to be independent of each other).
關於第二平面322,介於記憶體單元302、局部字線304、局部位元線306、選擇裝置336及338、平面字線350、平面位元線354、共同字線352、共同位元線358、電阻328及330與供應電壓Vcc之間之連接可全部與參考第一平面320之類似特徵所描述及圖3中所展示相同。然 而,關於第二平面322,平面選擇裝置336之基極終端可連接至平面啟用344且平面選擇裝置338之基極終端可連接至平面啟用346。Regarding the second plane 322, there are a memory unit 302, a local word line 304, a local bit line 306, selection devices 336 and 338, a planar word line 350, a planar bit line 354, a common word line 352, and a common bit line. 358. The connections between resistors 328 and 330 and supply voltage Vcc may all be the same as described with reference to similar features of first plane 320 and as shown in FIG. Of course Rather, with respect to the second plane 322, the base terminal of the plane selection device 336 can be coupled to the plane enable 344 and the base terminal of the plane selection device 338 can be coupled to the plane enable 346.
儘管本文中已繪示及描述特定實施例,然一般技術者將理解經計算以達到相同結果之一配置可替代所展示之特定實施例。本發明意指涵蓋本發明之各種實施例之調適及變動。應理解,已以一闡釋性方式且非一限制性方式作出上文描述。熟習此項技術者在檢視上文描述之後將明白本文中並未特定描述之上文實施例及其他實施例之組合。本發明之各種實施例之範疇包含其中使用上文結構及方法之其他應用。因此,本發明之各種實施例之範疇將參考隨附申請專利範圍以及此等申請專利範圍所及之等效物之完整範圍而決定。Although specific embodiments have been illustrated and described herein, it will be understood by those of ordinary skill in The invention is intended to cover adaptations and variations of the various embodiments of the invention. It is to be understood that the above description has been made in an illustrative and non-limiting manner. Combinations of the above embodiments and other embodiments not specifically described herein will be apparent to those skilled in the art. The scope of various embodiments of the invention encompasses other applications in which the above structures and methods are used. Therefore, the scope of the various embodiments of the invention is to be determined by the scope of the appended claims and the scope of the claims.
在前述詳細描述中,在一單一實施例中為簡化本發明而將各種特徵組合在一起。本發明之此方法不應解釋為反映一意向:本發明之所揭示實施例必須使用多於每一請求項中所明確敘述之特徵。而是,如以下申請專利範圍反映,發明標的在於少於一單一所揭示實施例之全部特徵。因此,以下申請專利範圍併入實施方式中,其中每一請求項獨立作為一單獨實施例。In the foregoing Detailed Description, various features are grouped together in a single embodiment to simplify the invention. This method of the invention is not to be interpreted as reflecting the intention that the disclosed embodiments of the invention must use more features than those explicitly recited in each claim. Rather, as the following claims are included, the invention is characterized by less than all features of a single disclosed embodiment. Accordingly, the scope of the following claims is incorporated into the embodiments, in which each claim
202‧‧‧記憶體單元202‧‧‧ memory unit
204‧‧‧局部字線204‧‧‧Local word line
206‧‧‧局部位元線206‧‧‧Local bit line
218‧‧‧記憶體陣列218‧‧‧ memory array
220‧‧‧第一平面220‧‧‧ first plane
222‧‧‧第二平面222‧‧‧ second plane
224‧‧‧列解碼邏輯224‧‧‧ column decoding logic
226‧‧‧行解碼邏輯226‧‧‧Decoding logic
228‧‧‧電阻228‧‧‧resistance
230‧‧‧電阻230‧‧‧resistance
236‧‧‧平面選擇裝置236‧‧‧ Plane selection device
238‧‧‧平面選擇裝置238‧‧‧Plane selection device
240‧‧‧平面啟用240‧‧‧ Plane activation
242‧‧‧平面啟用242‧‧‧ Plane activation
244‧‧‧平面啟用244‧‧‧ Plane activation
246‧‧‧平面啟用246‧‧‧ Plane activation
248‧‧‧平面字線248‧‧‧ flat word line
250‧‧‧平面字線250‧‧‧ flat word line
252‧‧‧共同字線252‧‧‧Common word line
254‧‧‧平面位元線254‧‧‧ flat bit line
256‧‧‧平面位元線256‧‧‧ flat bit line
258‧‧‧共同位元線258‧‧‧Common bit line
Vcc‧‧‧供應電壓Vcc‧‧‧ supply voltage
Claims (26)
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