TWI506098B - Photo-curable ink composition for ink jet - Google Patents

Photo-curable ink composition for ink jet Download PDF

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TWI506098B
TWI506098B TW100133443A TW100133443A TWI506098B TW I506098 B TWI506098 B TW I506098B TW 100133443 A TW100133443 A TW 100133443A TW 100133443 A TW100133443 A TW 100133443A TW I506098 B TWI506098 B TW I506098B
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ink composition
compound
group
inkjet
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TW100133443A
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TW201213452A (en
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Takayuki Hirota
Katsuyuki Sugihara
Taisei Kurata
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Jnc Corp
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/38Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • C08K5/3415Five-membered rings
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/36Inkjet printing inks based on non-aqueous solvents
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Ink Jet (AREA)
  • Epoxy Resins (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

噴墨用光硬化性墨水組成物Photocurable ink composition for inkjet

本發明是有關於一種為了製造例如液晶顯示元件或者電激發光(electroluminescence,EL)顯示元件等顯示元件、或印刷配線板及可撓性配線板等電子電路基板而適宜使用的噴墨用光硬化性墨水組成物。更詳細而言,本發明是有關於一種適合於對形成規定電路圖案的金屬配線表面加以保護的覆蓋膜等的噴墨用光硬化性墨水組成物。The present invention relates to an inkjet photocuring suitable for use in the production of a display element such as a liquid crystal display element or an electroluminescence (EL) display element, or an electronic circuit board such as a printed wiring board or a flexible wiring board. Sexual ink composition. More specifically, the present invention relates to an inkjet photocurable ink composition suitable for a cover film or the like which protects a surface of a metal wiring forming a predetermined circuit pattern.

先前,當製造印刷配線板、可撓性配線板及半導體封裝基板等電子電路基板時,使用高分子系覆蓋膜來作為對形成規定電路圖案的金屬配線等的導體面加以保護的保護膜。對覆蓋膜通常要求耐鍍敷性、耐熱性、與基板的密著性及阻燃性。When an electronic circuit board such as a printed wiring board, a flexible wiring board, or a semiconductor package substrate is manufactured, a polymer-based cover film is used as a protective film for protecting a conductor surface such as a metal wiring forming a predetermined circuit pattern. The coating film is generally required to have plating resistance, heat resistance, adhesion to a substrate, and flame retardancy.

將該覆蓋膜黏著於導體面的方法通常是如下方法:將覆蓋膜的一表面加工成規定的形狀,於該經加工的表面塗上黏著劑,將該膜重疊於電子電路基板上並對準後,以壓製等進行熱壓著。The method of adhering the cover film to the conductor surface is generally as follows: a surface of the cover film is processed into a predetermined shape, an adhesive is applied to the processed surface, and the film is overlaid on the electronic circuit substrate and aligned. After that, it is heat-pressed by pressing or the like.

上述方法中,在對覆蓋膜進行加工、於加工表面塗上黏著劑、然後進行對準等的操作方面,作業性或位置精度成為問題。In the above method, workability or positional accuracy is a problem in processing the cover film, applying an adhesive to the processed surface, and then performing alignment.

因此,先前以改善該些問題為目的,而提出有將感光性覆蓋劑塗佈於導體面而形成保護層的方法(例如,參照日本專利特開昭45-115541號公報(專利文獻1)、日本專利特開昭51-40922號公報(專利文獻2)、日本專利特開2004-156012號公報(專利文獻3))。Therefore, in order to improve the above-mentioned problems, a method of forming a protective layer by applying a photosensitive coating agent to a conductor surface has been proposed (for example, refer to Japanese Laid-Open Patent Publication No. SHO45-115541 (Patent Document 1), Japanese Patent Laid-Open No. 51-40922 (Patent Document 2), and Japanese Patent Laid-Open No. 2004-156012 (Patent Document 3)).

另外,形成保護層後,亦進行下述步驟:藉由進行使用光阻劑的蝕刻處理及顯影,形成構成規定的微細圖案的保護膜。Further, after the protective layer is formed, a protective film which constitutes a predetermined fine pattern is formed by performing etching treatment and development using a photoresist.

但是,為了使用此種感光性覆蓋膜來形成保護膜,而進行藉由圖案曝光的膜的圖案化、如上所述膜的蝕刻及光阻劑的顯影,需要很多步驟。進而,上述圖案曝光所需的光罩的製作需花費長時間及很多費用。However, in order to form a protective film using such a photosensitive cover film, patterning of a film exposed by a pattern, etching of the film as described above, and development of a photoresist are required, and many steps are required. Further, the production of the photomask required for the above pattern exposure takes a long time and a lot of cost.

為了解決該些問題,開發出使用噴墨方式而將感光性材料直接塗佈於基板上來形成圖案的方法(例如,參照日本專利特開2008-239926號公報(專利文獻4)、日本專利特開2008-239927號公報(專利文獻5)、日本專利特開2009-13269號公報(專利文獻6)、日本專利特開2009-13286號公報(專利文獻7)、日本專利特開2009-102498號公報(專利文獻8)、日本專利特開2009-102499號公報(專利文獻9)、日本專利特開2007-106892號公報(專利文獻10)、日本專利特開2007-106893號公報(專利文獻11))。該方法中,由於不需要先前所必需的圖案曝光、蝕刻處理及顯影,故而上述方法作為具有設備投資金額少,並且材料的損失少等優點的方法而備受期待。In order to solve such problems, a method of forming a pattern by directly applying a photosensitive material to a substrate by using an inkjet method has been developed (for example, refer to JP-A-2008-239926 (Patent Document 4), Japanese Patent Laid-Open Japanese Patent Publication No. 2009-13269 (Patent Document 6), Japanese Patent Laid-Open Publication No. 2009-13286 (Patent Document 7), Japanese Patent Laid-Open Publication No. 2009-102498 (Patent Document 8), JP-A-2009-102499 (Patent Document 9), JP-A-2007-106892 (Patent Document 10), and JP-A-2007-106893 (Patent Document 11) ). In this method, since the pattern exposure, etching treatment, and development which were previously necessary are not required, the above method is expected as a method having an advantage that the amount of equipment investment is small and the loss of material is small.

但是,上述專利文獻4~專利文獻9中記載的噴墨用感光性材料由於是以利用熱方式(亦稱為噴泡(Bubble Jet,註冊商標)方式)來噴射為前提,故而感光成分必需可溶於水中,因此上述感光性材料所使用的原料產生限制,材料設計變得困難。另外,由於噴射時利用加熱器使墨水溫度局部地上升,故而存在導致墨水變質的可能性高的擔憂,或由於感光性材料為水性,故而由該感光性材料所獲得的覆蓋膜存在對鍍敷水溶液不穩定,即耐鍍敷性不充分的擔憂。However, the photosensitive material for inkjet described in the above-mentioned Patent Documents 4 to 9 is premised on the use of a thermal method (also referred to as "Bubble Jet (registered trademark)), and therefore, a photosensitive component is required. Since it is soluble in water, the raw materials used for the above-mentioned photosensitive materials are limited, and material design becomes difficult. Further, since the temperature of the ink is locally raised by the heater during the ejection, there is a fear that the ink may be deteriorated, or the photosensitive material is aqueous, so that the coating film obtained from the photosensitive material is plated. The aqueous solution is unstable, that is, the plating resistance is insufficient.

另外,上述專利文獻10及專利文獻11中記載的噴墨用感光性材料是以壓電方式來噴射,但為了確保噴射性(降低感光性材料的黏度),有機溶劑向感光性材料中的添加為必需條件,該有機溶劑存在侵入所使用的噴墨裝置或電子電路基板製造機器的構件的危險性。進而,目前為了減少環境負荷,而期望儘量不添加溶劑而使用的噴墨用墨水。In addition, the photosensitive material for inkjet described in the above-mentioned Patent Document 10 and Patent Document 11 is piezoelectrically sprayed, but in order to ensure the ejection property (reducing the viscosity of the photosensitive material), the organic solvent is added to the photosensitive material. The organic solvent has a risk of invading the member of the inkjet apparatus or the electronic circuit board manufacturing apparatus used for the necessary conditions. Further, in order to reduce the environmental load, inkjet inks which are used as much as possible without adding a solvent are desired.

如上所述,目前尚未獲得不需要水、有機溶劑,可以噴墨方式塗佈,且可形成耐鍍敷性、耐熱性、與基板的密著性及阻燃性的平衡優異的覆蓋膜的光硬化性組成物。As described above, there is no need to obtain water or an organic solvent, and it is possible to apply an inkjet method, and it is possible to form a coating film having excellent plating resistance, heat resistance, and adhesion to a substrate and flame retardancy. A hardening composition.

[先前技術文獻][Previous Technical Literature]

[專利文獻][Patent Literature]

[專利文獻1]日本專利特開昭45-115541號公報[Patent Document 1] Japanese Patent Laid-Open No. 45-115541

[專利文獻2]日本專利特開昭51-40922號公報[Patent Document 2] Japanese Patent Laid-Open No. 51-40922

[專利文獻3]日本專利特開2004-156012號公報[Patent Document 3] Japanese Patent Laid-Open Publication No. 2004-156012

[專利文獻4]日本專利特開2008-239926號公報[Patent Document 4] Japanese Patent Laid-Open Publication No. 2008-239926

[專利文獻5]日本專利特開2008-239927號公報[Patent Document 5] Japanese Patent Laid-Open Publication No. 2008-239927

[專利文獻6]日本專利特開2009-13269號公報[Patent Document 6] Japanese Patent Laid-Open Publication No. 2009-13269

[專利文獻7]日本專利特開2009-13286號公報[Patent Document 7] Japanese Patent Laid-Open Publication No. 2009-13286

[專利文獻8]日本專利特開2009-102498號公報[Patent Document 8] Japanese Patent Laid-Open Publication No. 2009-102498

[專利文獻9]日本專利特開2009-102499號公報[Patent Document 9] Japanese Patent Laid-Open Publication No. 2009-102499

[專利文獻10]日本專利特開2007-106892號公報[Patent Document 10] Japanese Patent Laid-Open Publication No. 2007-106892

[專利文獻11]日本專利特開2007-106893號公報[Patent Document 11] Japanese Patent Laid-Open Publication No. 2007-106893

於上述狀況下,本發明的目的在於提供一種噴墨用光硬化性墨水組成物,其以高水準具備通常對覆蓋膜所要求的耐鍍敷性、耐熱性、與基板的密著性及阻燃性,可形成密著性特別優異的硬化膜,且噴射性及光硬化性優異。In view of the above circumstances, an object of the present invention is to provide a photocurable ink composition for inkjet which has high plating resistance, heat resistance, adhesion to a substrate, and resistance at a high level. The flammability can form a cured film which is particularly excellent in adhesion, and is excellent in sprayability and photocurability.

進而,本發明的目的在於提供一種不需要添加水或有機溶劑,材料設計容易且環境負荷亦少的噴墨用光硬化性墨水。Further, an object of the present invention is to provide a photocurable ink for inkjet which does not require the addition of water or an organic solvent, has a simple material design, and has a small environmental load.

本發明者等人發現,包含特定的化合物且黏度在固定範圍內的噴墨用光硬化性墨水組成物可解決上述問題,且基於該發現而完成本發明。The present inventors have found that a photocurable ink composition for inkjet containing a specific compound and having a viscosity within a fixed range can solve the above problems, and the present invention has been completed based on the findings.

進而,本發明除了提供如上所述的噴墨用光硬化性墨水組成物以外,還提供一種具有由該組成物所獲得的硬化膜的電子電路基板等。Further, in addition to the above-described photocurable ink composition for inkjet, the present invention provides an electronic circuit board or the like having a cured film obtained from the composition.

即,本發明的要旨為如下所述。That is, the gist of the present invention is as follows.

[1] 一種噴墨用光硬化性墨水組成物,其特徵在於,包括:[1] A photocurable ink composition for inkjet, comprising:

下述通式(1)所表示的化合物(A):Compound (A) represented by the following formula (1):

(通式(1)中,R為碳數1~100的二價有機基);及具有選自由環氧乙烷基、氧雜環丁基、烷氧基矽烷基及羥基所組成組群中的至少1種官能基的化合物(B);其中噴墨用光硬化性墨水組成物在25℃下的黏度為200 mPa‧s以下。(in the formula (1), R is a divalent organic group having 1 to 100 carbon atoms); and has a group selected from the group consisting of an oxiranyl group, an oxetanyl group, an alkoxyalkyl group, and a hydroxyl group. The compound (B) having at least one functional group; wherein the photocurable ink composition for inkjet has a viscosity at 25 ° C of 200 mPa‧s or less.

[2] 如[1]記載之噴墨用光硬化性墨水組成物,其中上述通式(1)中,R為碳數1~50的二價有機基。[2] The photocurable ink composition for inkjet according to [1], wherein, in the above formula (1), R is a divalent organic group having 1 to 50 carbon atoms.

[3] 如[1]或[2]記載之噴墨用光硬化性墨水組成物,其中上述通式(1)中,R為任意的不連續的-CH2 -可經醚鍵、酯鍵、醯胺鍵、胺基甲酸酯鍵或者羰基所取代的碳數1~50的伸烷基、碳數3~50的伸環烷基或者碳數6~50的伸芳基。[3] The photocurable ink composition for inkjet according to [1] or [2] wherein, in the above formula (1), R is an arbitrary discontinuous -CH 2 - may be an ether bond or an ester bond And a decyl bond, a urethane bond or a carbonyl group substituted with an alkyl group having 1 to 50 carbon atoms, a cycloalkyl group having 3 to 50 carbon atoms or an extended aryl group having 6 to 50 carbon atoms.

[4] 如[3]記載之噴墨用光硬化性墨水組成物,其中上述通式(1)中,R為碳數1~50的伸烷基。[4] The photocurable ink composition for inkjet according to [3], wherein, in the above formula (1), R is an alkylene group having 1 to 50 carbon atoms.

[5] 如[1]至[4]中任一項記載之噴墨用光硬化性墨水組成物,其中上述化合物(B)具有環氧乙烷基及/或氧雜環丁基。[5] The photocurable ink composition for inkjet according to any one of [1] to [4] wherein the compound (B) has an oxiranyl group and/or an oxetanyl group.

[6] 如[5]記載之噴墨用光硬化性墨水組成物,其中上述化合物(B)具有環氧乙烷基。[6] The photocurable ink composition for inkjet according to [5], wherein the compound (B) has an oxirane group.

[7] 如[6]記載之噴墨用光硬化性墨水組成物,其中上述化合物(B)為環氧化合物,上述環氧化合物具有選自由苯酚酚醛型、甲酚酚醛型、雙酚A型、雙酚F型、氫化雙酚A型、氫化雙酚F型、雙酚S型、雙酚A酚醛型、三苯酚甲烷型、四苯酚乙烷型、聯二甲酚型、聯苯酚型、脂環型、雜環型、二環戊二烯型、或者萘型的結構所組成組群中的至少1種結構。[7] The photocurable ink composition for inkjet according to [6] wherein the compound (B) is an epoxy compound, and the epoxy compound is selected from the group consisting of a phenol novolak type, a cresol novolac type, and a bisphenol A type. , bisphenol F type, hydrogenated bisphenol A type, hydrogenated bisphenol F type, bisphenol S type, bisphenol A phenol type, trisphenol methane type, tetraphenol ethane type, bisphenol type, biphenol type, At least one of a group consisting of an alicyclic, heterocyclic, dicyclopentadiene or naphthalene type structure.

[8] 如[1]至[7]中任一項記載之噴墨用光硬化性墨水組成物,其中更包含上述化合物(B)以外的化合物(C),上述化合物(C)具有選自由(甲基)丙烯醯基、烯丙基及乙烯基所組成組群中的至少1種聚合性基。[8] The photocurable ink composition for inkjet according to any one of [1], wherein the compound (C) other than the compound (B) is further contained, and the compound (C) is selected from the group consisting of At least one polymerizable group of the group consisting of (meth)acryloyl group, allyl group and vinyl group.

[9] 如[8]記載之噴墨用光硬化性墨水組成物,其中上述化合物(C)具有(甲基)丙烯醯基。[9] The photocurable ink composition for inkjet according to [8], wherein the compound (C) has a (meth) acrylonitrile group.

[10] 如[1]至[9]中任一項記載之噴墨用光硬化性墨水組成物,其中更包含光聚合起始劑(D)。[10] The photocurable ink composition for inkjet according to any one of [1] to [9], further comprising a photopolymerization initiator (D).

[11] 如[1]至[10]中任一項記載之噴墨用光硬化性墨水組成物,其中更包含阻燃劑(E)。[11] The photocurable ink composition for inkjet according to any one of [1] to [10] further comprising a flame retardant (E).

[12] 如[1]至[11]中任一項記載之噴墨用光硬化性墨水組成物,其中更包含上述化合物(A)以外的化合物(F),上述化合物(F)選自由環氧硬化劑、三聚氰胺樹脂及苯酚樹脂所組成組群中的至少1種。[12] The photocurable ink composition for inkjet according to any one of [1], wherein the compound (F) other than the compound (A) is further contained, and the compound (F) is selected from the ring. At least one of the group consisting of an oxygen hardener, a melamine resin, and a phenol resin.

[13]一種電子電路基板,其特徵在於:於基板表面形成電路,且於該基板及電路上的至少一部分形成硬化膜而成,上述硬化膜是使如[1]至[12]中任一項記載之噴墨用光硬化性墨水組成物硬化而獲得。[13] An electronic circuit board comprising: a circuit formed on a surface of the substrate; and a cured film formed on at least a part of the substrate and the circuit, wherein the cured film is one of [1] to [12] The inkjet photocurable ink composition described in the section is obtained by curing.

[發明的效果][Effects of the Invention]

本發明的噴墨用光硬化性墨水組成物的噴射性及光硬化性優異,可形成耐鍍敷性、耐熱性、與基板的密著性及阻燃性同時優異的硬化膜。The photocurable ink composition for inkjet according to the present invention is excellent in ejectability and photocurability, and can form a cured film which is excellent in plating resistance, heat resistance, adhesion to a substrate, and flame retardancy.

[1. 本發明的噴墨用光硬化性墨水組成物][1. Photocurable ink composition for inkjet according to the present invention]

本發明的噴墨用光硬化性墨水組成物(以下亦僅稱為「本發明的墨水組成物」)如上所述,包含上述通式(1)所表示的化合物(A)(以下亦僅稱為「化合物(A)」),及具有選自由環氧乙烷基、氧雜環丁基、烷氧基矽烷基及羥基所組成組群中的至少1種官能基的化合物(B)(以下亦僅稱為「化合物(B)」)。The photocurable ink composition for inkjet according to the present invention (hereinafter also referred to simply as "the ink composition of the present invention") contains the compound (A) represented by the above formula (1) as described above (hereinafter also referred to as only And "compound (A)") and a compound (B) having at least one functional group selected from the group consisting of an oxiranyl group, an oxetanyl group, an alkoxyalkyl group, and a hydroxyl group (hereinafter) Also known as "compound (B)").

另外,本發明的墨水組成物亦可包含後述除化合物(B)以外的具有選自由(甲基)丙烯醯基、烯丙基及乙烯基所組成組群中的至少1種聚合性基的化合物(C)、光聚合起始劑(D)、阻燃劑(E)及化合物(F),進而視需要可包含著色劑、溶劑、界面活性劑、聚合抑制劑等。此外,本發明的墨水組成物可為無色,亦可為有色。In addition, the ink composition of the present invention may contain a compound having at least one polymerizable group selected from the group consisting of a (meth) acrylonitrile group, an allyl group, and a vinyl group, other than the compound (B), which will be described later. (C), a photopolymerization initiator (D), a flame retardant (E), and a compound (F) may further contain a coloring agent, a solvent, a surfactant, a polymerization inhibitor, etc., if necessary. Further, the ink composition of the present invention may be colorless or colored.

〈1.1通式(1)所表示的化合物(A)〉<1.1 Compound (A) represented by the formula (1)>

上述化合物(A)是以下述通式(1)所表示,其自身以碳-碳雙鍵部分進行光聚合,使來自化合物(A)的結構單元形成鍵結成鏈狀的硬化物,而且,與後述化合物(B)進行反應,形成剛直的結構,形成耐熱性及耐鍍敷性優異的硬化物。The compound (A) is represented by the following formula (1), which itself is photopolymerized by a carbon-carbon double bond moiety, and the structural unit derived from the compound (A) is formed into a chain-shaped cured product, and The compound (B) described later is reacted to form a rigid structure, and a cured product excellent in heat resistance and plating resistance is formed.

上述式中,R為碳數1~100的二價有機基。就形成耐熱性及耐鍍敷性優異的硬化物的觀點而言,R較佳為碳數1~50的二價有機基。In the above formula, R is a divalent organic group having 1 to 100 carbon atoms. From the viewpoint of forming a cured product excellent in heat resistance and plating resistance, R is preferably a divalent organic group having 1 to 50 carbon atoms.

上述碳數1~50的二價有機基的例子可列舉任意的不連續的-CH2 -可經醚鍵、酯鍵、醯胺鍵、胺基甲酸酯鍵或者羰基所取代的碳數1~50的伸烷基、或碳數3~50的伸環烷基及碳數6~50的伸芳基。Examples of the above-mentioned divalent organic group having 1 to 50 carbon atoms include any discontinuous -CH 2 - carbon number which may be substituted by an ether bond, an ester bond, a guanamine bond, a urethane bond or a carbonyl group. ~50 alkylene, or a cycloalkylene group having 3 to 50 carbon atoms and an extended aryl group having 6 to 50 carbon atoms.

上述R的具體例可列舉亞甲基、伸乙基、伸丙基、伸丁基、伸乙基氧基亞甲基及伸苯基等,較佳為亞甲基、伸乙基及伸丙基等伸烷基。Specific examples of the above R include a methylene group, an exoethyl group, a propyl group, a butyl group, an ethyloxymethylene group, and a phenyl group. Preferred examples are a methylene group, an exoethyl group and a propylene group. The base is an alkyl group.

就由本發明的墨水組成物所獲得的硬化物的耐熱性、耐鍍敷性及與基板的密著性的特性的平衡的觀點而言,R更佳為碳數1~50的伸烷基。From the viewpoint of balance between heat resistance, plating resistance, and adhesion properties of the cured product obtained from the ink composition of the present invention, R is more preferably an alkylene group having 1 to 50 carbon atoms.

此種通式(1)所表示的化合物(A)在本發明的墨水組成物中,可單獨使用1種,亦可將2種以上組合使用。The compound (A) represented by the above formula (1) may be used singly or in combination of two or more kinds in the ink composition of the present invention.

若本發明的墨水組成物中的上述化合物(A)的含量為該墨水組成物總量的15重量百分比(wt%)~50 wt%,則由於由該墨水組成物所獲得的硬化膜表現出高的耐鍍敷性及耐熱性,故而較佳。就上述耐鍍敷性及耐熱性與墨水組成物的噴射性的平衡而言,上述含量更佳為15 wt%~45 wt%,尤佳為15 wt%~40 wt%。If the content of the above compound (A) in the ink composition of the present invention is 15% by weight (% by weight) to 50% by weight based on the total amount of the ink composition, the cured film obtained from the ink composition exhibits It is preferred because of its high plating resistance and heat resistance. The above content is more preferably 15% by weight to 45% by weight, and particularly preferably 15% by weight to 40% by weight, in terms of the balance between the plating resistance and the heat resistance and the sprayability of the ink composition.

另外,化合物(A)可藉由使下述通式所表示的化合物(a1)、與甲基順丁烯二酸酐進行反應而獲得。Further, the compound (A) can be obtained by reacting the compound (a1) represented by the following formula with methyl maleic anhydride.

上述式中,R與通式(1)中的R為相同的含義。藉由化合物(a1)、與甲基順丁烯二酸酐的反應,形成醯亞胺,獲得化合物(A)。該反應中可採用公知的條件作為醯亞胺形成反應中的反應條件。In the above formula, R has the same meaning as R in the formula (1). The compound (A) is obtained by reacting the compound (a1) with methyl maleic anhydride to form a quinone imine. Known conditions can be employed in the reaction as the reaction conditions in the quinone imine formation reaction.

本發明中使用的化合物(A)具有以上述方式形成的甲基順丁烯二醯亞胺結構,與具有順丁烯二醯亞胺結構的化合物相比,於構成本發明的墨水組成物的其他成分中的溶解性優異。具有順丁烯二醯亞胺結構的化合物大多對上述其他成分不溶,不可用於本發明的墨水組成物中。The compound (A) used in the present invention has a methyl maleimide structure formed in the above manner, and constitutes an ink composition of the present invention as compared with a compound having a maleimide structure. The solubility in other components is excellent. The compound having a maleimide structure is mostly insoluble to the above other components and is not used in the ink composition of the present invention.

〈1.2. 具有選自由環氧乙烷基、氧雜環丁基、烷氧基矽烷基及羥基所組成組群中的至少1種官能基的化合物(B)〉<1.2. A compound (B) having at least one functional group selected from the group consisting of an oxiranyl group, an oxetanyl group, an alkoxyalkyl group, and a hydroxyl group.

本發明的噴墨用光硬化性墨水組成物包含上述化合物(B)。The photocurable ink composition for inkjet according to the present invention contains the above compound (B).

化合物(B)只要具有選自由環氧乙烷基、氧雜環丁基、烷氧基矽烷基及羥基所組成組群中的至少1種官能基,則並無特別限定。The compound (B) is not particularly limited as long as it has at least one functional group selected from the group consisting of an oxiranyl group, an oxetanyl group, an alkoxyalkyl group, and a hydroxyl group.

本發明的墨水組成物中,化合物(B)所具有的上述官能基與化合物(A)的羧基進行反應,形成硬化物。In the ink composition of the present invention, the functional group of the compound (B) reacts with the carboxyl group of the compound (A) to form a cured product.

若化合物(B)具有2個以上的上述官能基,則本發明的墨水組成物的硬化性優異。另外,如上所述,化合物(A)藉由光聚合而連結成鏈狀,若化合物(B)中的官能基為2個以上,則期待來自由多個鏈形成的化合物(A)的游離羧基與上述化合物(B)中的官能基進行反應,多個鏈由化合物(B)所連結(交聯),而形成更牢固的網眼結構的耐鍍敷性、耐熱性及與基板的密著性優異的硬化膜,因此較佳。此外,化合物(B)中的上述官能基的數量通常為6個以下。When the compound (B) has two or more of the above functional groups, the ink composition of the present invention is excellent in curability. In addition, as described above, the compound (A) is linked to form a chain by photopolymerization, and when the number of the functional groups in the compound (B) is two or more, the free carboxyl group derived from the compound (A) formed of a plurality of chains is expected. Reacts with a functional group in the above compound (B), and a plurality of chains are linked (crosslinked) by the compound (B) to form a plate structure having better firmness, heat resistance, and adhesion to a substrate. A cured film excellent in properties is preferred. Further, the number of the above functional groups in the compound (B) is usually 6 or less.

就上述硬化膜的耐鍍敷性、耐熱性及與基板的密著性的觀點而言,化合物(B)較佳為具有環氧乙烷基及/或氧雜環丁基,更佳為具有環氧乙烷基。The compound (B) preferably has an oxirane group and/or an oxetanyl group, and more preferably has a plating resistability, heat resistance and adhesion to the substrate. Ethylene oxide based.

具有環氧乙烷基的化合物(B)的具體例可列舉具有選自由苯酚酚醛型、甲酚酚醛型、雙酚A型、雙酚F型、氫化雙酚A型、氫化雙酚F型、雙酚S型、雙酚A酚醛型、三苯酚甲烷型、四苯酚乙烷型、聯二甲酚型、聯苯酚型、脂環型、雜環型、二環戊二烯型、或者萘型的結構所組成組群中的至少1種結構的環氧化合物。Specific examples of the compound (B) having an oxirane group include a phenol novolak type, a cresol novolac type, a bisphenol A type, a bisphenol F type, a hydrogenated bisphenol A type, and a hydrogenated bisphenol F type. Bisphenol S type, bisphenol A phenol type, trisphenol methane type, tetraphenol ethane type, bisphenol type, biphenol type, alicyclic type, heterocyclic type, dicyclopentadiene type, or naphthalene type The structure constitutes an epoxy compound of at least one structure in the group.

上述化合物中,就由本發明的墨水組成物所獲得的硬化膜的耐鍍敷性、耐熱性及與基板的密著性的觀點而言,較佳為苯酚酚醛型、甲酚酚醛型、雙酚A型及雙酚F型的環氧化合物,其中尤佳為雙酚A型及雙酚F型的環氧化合物。Among the above-mentioned compounds, from the viewpoints of plating resistance, heat resistance and adhesion to a substrate of the cured film obtained from the ink composition of the present invention, a phenol novolak type, a cresol novolak type, and a bisphenol are preferable. A type and bisphenol F type epoxy compound, among which bisphenol A type and bisphenol F type epoxy compound are especially preferable.

以上所例示的環氧化合物的市售品可列舉:Epikote 828、Epikote 834、Epikote 1001、Epikote 1004(商品名,三菱化學(股)製造),Epicron 840、Epicron 850、Epicron 1050、Epicron 2055(商品名,迪愛生(DIC)(股)製造),Epotohto YD-011、Epotohto YD-013、Epotohto YD-127、Epotohto YD-128(商品名,東都化成(股)製造),D.E.R.317、D.E.R.331、D.E.R.661、D.E.R.664(商品名,陶氏化學日本(Dow Chemical Japan)(股)製造),Araldite 6071、Araldite 6084、Araldite GY250、Araldite GY260(商品名,巴斯夫日本(BASF Japan)(股)製造),Sumi-Epoxy ESA-011、Sumi-Epoxy ESA-014、Sumi-Epoxy ELA-115、Sumi-Epoxy ELA-128(商品名,住友化學工業(股)製造),及A.E.R.330、A.E.R.331、A.E.R.661、A.E.R.664(商品名,旭化成電子材料(Asahi Kasei E-Materials)(股)製造)等雙酚A型環氧化合物;Epikote 152、Epikote 154(商品名,三菱化學(股)製造),Dow Epoxy DEN-431、Dow Epoxy DEN-438、Dow Epoxy DEN-439、Dow Epoxy DEN-485(商品名,Dow Chemical Japan(股)製造),Araldite EPN-1138、Araldite EPN-1139(商品名,BASF Japan(股)製造),Epicron N-730、Epicron N-738、Epicron N-740(商品名,DIC(股)製造)等苯酚酚醛型環氧化合物;Epicron N-660、Epicron N-665、Epicron N-670、Epicron N-673、Epicron N-695(商品名,DIC(股)製造),EOCN-1020、EOCN-102S、EOCN-104S(商品名,日本化藥(股)製造)等甲酚酚醛型環氧化合物;Epicron 830(商品名,DIC(股)製造),JER807(商品名,三菱化學(股)製造),Epotohto YDF-170(商品名,東都化成(股)製造),及YDF-175、YDF-2001、YDF-2004、Araldite XPY306(商品名,BASF Japan(股)製造)等雙酚F型環氧化合物;Epotohto ST-2004、Epotohto ST-2007、Epotohto ST-3000(商品名,東都化成(股)製造)等氫化雙酚A型環氧化合物;Celloxide 2021(商品名,戴西爾(Daicel)化學工業(股)製造),及Araldite CY175、Araldite CY179(商品名,BASF Japan(股)製造)等脂環型環氧化合物;YL-933(商品名,三菱化學(股)製造),EPPN-501、EPPN-502(商品名,Dow Chemical Japan(股)製造),Tecmoa VG3101L(三井化學(股)製造)等三苯酚甲烷型環氧化合物;YL-6056、YX-4000、YL-6121(商品名,三菱化學(股)製造)等聯二甲酚型或聯苯酚型環氧化合物或者它們的混合物;EBPS-200(商品名,日本化藥(股)製造),EPX-30(商品名,(股)ADEKA製造)及EXA-1514(商品名,DIC(股)製造)等雙酚S型環氧化合物;JER157S(商品名,三菱化學(股)製造)等雙酚A酚醛型環氧化合物;YL-931(商品名,三菱化學(股)製造)及Araldite 163(商品名,BASF Japan(股)製造)等四苯酚乙烷型環氧化合物;Araldite PT810(商品名,BASF Japan(股)製造)及TEPIC(商品名,日產化學工業(股)製造)等雜環型環氧化合物;HP-4032、EXA-4750、EXA-4700(商品名,DIC(股)製造)等萘型環氧化合物;HP-7200、HP-7200H、HP-7200HH(商品名,DIC(股)製造)等二環戊二烯型環氧化合物。Commercial products of the epoxy compound exemplified above include Epikote 828, Epikote 834, Epikote 1001, Epikote 1004 (trade name, manufactured by Mitsubishi Chemical Corporation), Epicor 840, Epicron 850, Epicron 1050, and Epicron 2055 (products). Name, Di Ai Sheng (DIC) (manufactured), Epotohto YD-011, Epotohto YD-013, Epotohto YD-127, Epotohto YD-128 (trade name, manufactured by Dongdu Chemical Co., Ltd.), DER317, DER331, DER661, DER664 (trade name, manufactured by Dow Chemical Japan), Araldite 6071, Araldite 6084, Araldite GY250, Araldite GY260 (trade name, manufactured by BASF Japan) , Sumi-Epoxy ESA-011, Sumi-Epoxy ESA-014, Sumi-Epoxy ELA-115, Sumi-Epoxy ELA-128 (trade name, manufactured by Sumitomo Chemical Industries Co., Ltd.), and AER330, AER331, AER661 , AER664 (trade name, manufactured by Asahi Kasei E-Materials), bisphenol A type epoxy compound; Epikote 152, Epikote 154 (trade name, manufactured by Mitsubishi Chemical Corporation), Dow Epoxy DEN-431, Dow Epoxy DEN-438, Dow Epoxy DEN-439, Dow Epoxy D EN-485 (trade name, manufactured by Dow Chemical Japan), Araldite EPN-1138, Araldite EPN-1139 (trade name, manufactured by BASF Japan), Epicron N-730, Epicron N-738, Epicron N- Phenolic novolac type epoxy compound such as 740 (trade name, manufactured by DIC); Epicron N-660, Epicron N-665, Epicron N-670, Epicron N-673, Epicron N-695 (trade name, DIC) )) cresol novolac type epoxy compound such as EOCN-1020, EOCN-102S, EOCN-104S (trade name, manufactured by Nippon Chemical Co., Ltd.); Epicron 830 (trade name, manufactured by DIC), JER807 (trade name, manufactured by Mitsubishi Chemical Co., Ltd.), Epotohto YDF-170 (trade name, manufactured by Tohto Kasei Co., Ltd.), and YDF-175, YDF-2001, YDF-2004, Araldite XPY306 (trade name, BASF Japan ( Bisphenol F-type epoxy compound; Epotohto ST-2004, Epotohto ST-2007, Epotohto ST-3000 (trade name, manufactured by Tosho Kasei Co., Ltd.), etc. Hydrogenated bisphenol A epoxy compound; Celloxide 2021 (trade name, manufactured by Daicel Chemical Industry Co., Ltd.), and alicyclic epoxidation such as Araldite CY175 and Araldite CY179 (trade name, manufactured by BASF Japan) YL-933 (trade name, manufactured by Mitsubishi Chemical Corporation), EPPN-501, EPPN-502 (trade name, manufactured by Dow Chemical Japan), Tecmoa VG3101L (manufactured by Mitsui Chemicals Co., Ltd.) Methane type epoxy compound; YL-6056, YX-4000, YL-6121 (trade name, manufactured by Mitsubishi Chemical Corporation), etc., such as bisphenol type or biphenol type epoxy compound or a mixture thereof; EBPS-200 ( Trade name, manufactured by Nippon Kayaku Co., Ltd., bisphenol S-type epoxy compound such as EPX-30 (trade name, manufactured by ADEKA) and EXA-1514 (trade name, manufactured by DIC); JER157S ( Trade name, manufactured by Mitsubishi Chemical Co., Ltd.), bisphenol A phenolic epoxy compound; YL-931 (trade name, manufactured by Mitsubishi Chemical Corporation) and Araldite 163 (trade name, manufactured by BASF Japan) Phenolethane type epoxy compound; Araldite PT810 (trade name, manufactured by BASF Japan) and TEPIC (trade name, manufactured by Nissan Chemical Industries Co., Ltd.); heterocyclic epoxy compounds; HP-4032, EXA-4750 , a naphthalene type epoxy compound such as EXA-4700 (trade name, manufactured by DIC); a dicyclopentadiene type ring such as HP-7200, HP-7200H, HP-7200HH (trade name, manufactured by DIC) Compound.

另外,作為化合物(B),具有氧雜環丁基的化合物的例子可列舉:3-乙基-3-(羥基甲基)氧雜環丁烷(3-ethyl-3-(hydroxymethyl) oxetane)、3-乙基-3-[(苯氧基)甲基]氧雜環丁烷、3-乙基-3-(己氧基甲基)氧雜環丁烷、3-乙基-3-(2-乙基己氧基甲基)氧雜環丁烷、3-乙基-3-(氯甲基)氧雜環丁烷、1,4-雙[(3-乙基-3-氧雜環丁基甲氧基)甲基]苯及雙{[1-乙基(3-氧雜環丁基)]甲基}醚等。Further, examples of the compound having an oxetanyl group as the compound (B) include 3-ethyl-3-(hydroxymethyl)oxetane (3-ethyl-3-(hydroxymethyl)oxetane). , 3-ethyl-3-[(phenoxy)methyl]oxetane, 3-ethyl-3-(hexyloxymethyl)oxetane, 3-ethyl-3- (2-ethylhexyloxymethyl)oxetane, 3-ethyl-3-(chloromethyl)oxetane, 1,4-bis[(3-ethyl-3-oxo) Heterocyclic butylmethoxy)methyl]benzene and bis{[1-ethyl(3-oxetanyl)]methyl}ether and the like.

作為化合物(B),具有烷氧基矽烷基的化合物的例子可列舉:甲基三甲氧基矽烷、乙基三甲氧基矽烷、丁基三甲氧基矽烷、四甲氧基矽烷、四乙氧基矽烷等的烷氧基矽烷、N-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-胺基丙基三甲氧基矽烷等。As the compound (B), examples of the compound having an alkoxyalkylalkyl group include methyltrimethoxydecane, ethyltrimethoxydecane, butyltrimethoxydecane, tetramethoxydecane, and tetraethoxy. Alkoxydecane such as decane, N-(2-aminoethyl)-3-aminopropylmethyldimethoxydecane, 3-aminopropyltriethoxydecane, 3-aminopropyl Trimethoxy decane and the like.

作為化合物(B),具有羥基的化合物的例子可列舉:戊醇(amyl alcohol)、辛醇(octyl alcohol)、月桂醇(lauryl alcohol)、肉豆蔻醇(myristyl alcohol)、硬脂醇(stearyl alcohol)、山萮醇(behenyl alcohol)、油醇(oleyl alcohol)、己二醇(hexanediol)、甘油(glycerin)、單乙醇胺(monoethanolamine)、二乙醇胺(diethanolamine)、三乙醇胺(triethanolamine)、苄醇(benzyl alcohol)、苯乙醇(phenethyl alcohol)等。As the compound (B), examples of the compound having a hydroxyl group include amyl alcohol, octyl alcohol, lauryl alcohol, myristyl alcohol, and stearyl alcohol. ), behenyl alcohol, oleyl alcohol, hexanediol, glycerin, monoethanolamine, diethanolamine, triethanolamine, benzyl alcohol Benzyl alcohol, phenethyl alcohol, and the like.

以上所說明的化合物(B)在本發明的墨水組成物中,可單獨使用1種,亦可將2種以上組合使用。The compound (B) described above may be used singly or in combination of two or more kinds in the ink composition of the present invention.

另外,若化合物(B)的含量為本發明的墨水組成物總量的15 wt%~50 wt%,則由該組成物所獲得的硬化膜的耐鍍敷性、耐熱性及與基板的密著性提高,故而較佳,更佳為15 wt%~45 wt%,尤佳為15 wt%~40 wt%。Further, when the content of the compound (B) is 15% by weight to 50% by weight based on the total amount of the ink composition of the present invention, the plating resistability, heat resistance and adhesion to the substrate of the cured film obtained from the composition are excellent. The affinity is improved, so it is preferably 15 wt% to 45 wt%, more preferably 15 wt% to 40 wt%.

〈1.3. 具有選自由(甲基)丙烯醯基、烯丙基及乙烯基所組成組群中的至少1種聚合性基的化合物(C)〉<1.3. Compound (C) having at least one polymerizable group selected from the group consisting of (meth) acryloyl group, allyl group and vinyl group>

如上所述,本發明的噴墨用光硬化性墨水組成物可包含化合物(C)。As described above, the photocurable ink composition for inkjet according to the present invention may contain the compound (C).

化合物(C)為上述化合物(B)以外的化合物,只要是具有選自由(甲基)丙烯醯基、烯丙基及乙烯基所組成組群中的至少1種聚合性基的化合物,則並無特別限定。The compound (C) is a compound other than the above compound (B), and is a compound having at least one polymerizable group selected from the group consisting of a (meth) acryl fluorenyl group, an allyl group, and a vinyl group. There is no special limit.

若使本發明的墨水組成物中含有化合物(C),則該墨水組成物的光硬化性提高,另外,墨水組成物的黏度降低,墨水組成物的噴射性提高。因此,化合物(C)可用作本發明的墨水組成物中的光硬化性稀釋單體。When the compound (C) is contained in the ink composition of the present invention, the photocurability of the ink composition is improved, and the viscosity of the ink composition is lowered, and the ejection property of the ink composition is improved. Therefore, the compound (C) can be used as a photocurable diluted monomer in the ink composition of the present invention.

若上述化合物(C)中的聚合性基的數量多,則於使本發明的墨水組成物進行光硬化而獲得的硬化膜中,交聯密度提高,硬化膜的耐熱性及耐鍍敷性提高。化合物(C)中的聚合性基的數量通常為6個以下。When the amount of the polymerizable group in the compound (C) is large, the crosslinking density is improved in the cured film obtained by photocuring the ink composition of the present invention, and the heat resistance and plating resistance of the cured film are improved. . The number of the polymerizable groups in the compound (C) is usually 6 or less.

另外,關於上述聚合性基,就光聚合性的觀點而言,上述3種聚合性基中,特佳為(甲基)丙烯醯基。In addition, among the above-mentioned polymerizable groups, among the three kinds of polymerizable groups, a (meth)acryl fluorenyl group is particularly preferable.

具有(甲基)丙烯醯基的化合物的具體例可列舉:異三聚氰酸環氧乙烷改質二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯單硬脂酸酯、季戊四醇三(甲基)丙烯酸酯、三羥甲基丙烷二(甲基)丙烯酸酯、二季戊四醇二(甲基)丙烯酸酯、二季戊四醇三(甲基)丙烯酸酯、二季戊四醇四(甲基)丙烯酸酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸3,4-環氧環己酯、(甲基)丙烯酸甲基縮水甘油酯、(甲基)丙烯酸、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸二環戊烯氧基乙酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸苯酯、甘油單(甲基)丙烯酸酯、雙酚F型環氧乙烷改質二丙烯酸酯、雙酚A型環氧乙烷改質二丙烯酸酯、二丙二醇二丙烯酸酯、聚乙二醇二丙烯酸酯、聚丙二醇二丙烯酸酯、1,4-丁二醇二丙烯酸酯、1,6-己二醇二丙烯酸酯、1,9-壬二醇二丙烯酸酯、1,4-環己烷二甲醇二丙烯酸酯、2-正丁基-2-乙基-1,3-丙二醇二丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、環氧乙烷改質三羥甲基丙烷三(甲基)丙烯酸酯、環氧丙烷改質三羥甲基丙烷三(甲基)丙烯酸酯、表氯醇(epichlorohydrin)改質三羥甲基丙烷三(甲基)丙烯酸酯、二-三羥甲基丙烷四(甲基)丙烯酸酯、甘油三(甲基)丙烯酸酯、表氯醇改質甘油三(甲基)丙烯酸酯、二甘油四(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、己內酯改質二季戊四醇六(甲基)丙烯酸酯、環氧乙烷改質磷酸三(甲基)丙烯酸酯及胺基甲酸酯(甲基)丙烯酸酯等。Specific examples of the compound having a (meth) acrylonitrile group include isomeric cyanuric acid ethylene oxide modified di(meth)acrylate, pentaerythritol di(meth)acrylate, and pentaerythritol di(methyl). Acrylate monostearate, pentaerythritol tri(meth)acrylate, trimethylolpropane di(meth)acrylate, dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylate, Dipentaerythritol tetra(meth)acrylate, glycidyl (meth)acrylate, 3,4-epoxycyclohexyl (meth)acrylate, methyl glycidyl (meth)acrylate, (meth)acrylic acid , methyl (meth) acrylate, ethyl (meth) acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, third (meth) acrylate Butyl ester, 2-hydroxyethyl (meth)acrylate, cyclohexyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, benzyl (meth)acrylate, dicyclopentene (meth)acrylate Oxyethyl ester, isobornyl (meth)acrylate, phenyl (meth)acrylate, glycerol mono(meth)acrylate, bisphenol F-type ethylene oxide Diacrylate, bisphenol A type ethylene oxide modified diacrylate, dipropylene glycol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, 1,9-nonanediol diacrylate, 1,4-cyclohexanedimethanol diacrylate, 2-n-butyl-2-ethyl-1,3- Propylene glycol diacrylate, trimethylolpropane tri(meth)acrylate, ethylene oxide modified trimethylolpropane tri(meth)acrylate, propylene oxide modified trimethylolpropane tris(A) Acrylate, epichlorohydrin modified trimethylolpropane tri(meth)acrylate, di-trimethylolpropane tetra(meth)acrylate, tris(meth)acrylate, Epichlorohydrin modified triglyceride (meth) acrylate, diglycerin tetra (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, caprolactone modified dipentaerythritol Hexa(meth)acrylate, ethylene oxide modified tris(meth)acrylate, and urethane (meth)acrylate.

本發明的墨水組成物中,化合物(C)可單獨使用1種,亦可將2種以上組合使用。In the ink composition of the present invention, the compound (C) may be used alone or in combination of two or more.

另外,若本發明的墨水組成物中的化合物(C)的含量為該墨水組成物總量的20 wt%~70 wt%,則該墨水組成物的光硬化性及噴射性提高,若考慮到與其他特性的平衡,則更佳為20 wt%~65 wt%,尤佳為20 wt%~60 wt%。In addition, when the content of the compound (C) in the ink composition of the present invention is from 20% by weight to 70% by weight based on the total amount of the ink composition, the photocurability and the jettability of the ink composition are improved. The balance with other characteristics is more preferably 20 wt% to 65 wt%, and particularly preferably 20 wt% to 60 wt%.

〈1.4. 光聚合起始劑(D)〉<1.4. Photopolymerization initiator (D)>

為了進一步提高光硬化性,本發明的噴墨用光硬化性墨水組成物亦可包含光聚合起始劑(D)。光聚合起始劑(D)只要是可藉由紫外線或可見光線的照射而產生自由基的化合物,則並無特別限定,較佳為苯烷基酮(alkylphenone)系、醯基氧化膦(acyl phosphine oxide)系或者二茂鈦(titanocene)系光聚合化合物,其中就光硬化性的觀點而言,特佳為醯基氧化膦系光聚合起始劑。In order to further improve photocurability, the photocurable ink composition for inkjet according to the present invention may further contain a photopolymerization initiator (D). The photopolymerization initiator (D) is not particularly limited as long as it can generate a radical by irradiation with ultraviolet light or visible light, and is preferably an alkylphenone or a decylphosphine oxide (acyl). A phosphine oxide-based or titanocene-based photopolymerizable compound is particularly preferably a fluorenylphosphine oxide-based photopolymerization initiator from the viewpoint of photocurability.

光聚合起始劑(D)的具體例可列舉:二苯甲酮(benzophenone)、米其勒酮(Michler's ketone)、4,4'-雙(二乙基胺基)二苯甲酮、氧雜蒽酮(xanthone)、噻噸酮(thioxanthone)、異丙基氧雜蒽酮、2,4-二乙基噻噸酮、2-乙基蒽醌(2-ethyl anthraquinone)、苯乙酮(acetophenone)、2-羥基-2-甲基苯丙酮(2-hydroxy-2-methyl propiophenone)、2-羥基-2-甲基-4'-異丙基苯丙酮、1-羥基環己基苯基酮、異丙基安息香醚(isopropyl benzoin ether)、異丁基安息香醚、2,2-二乙氧基苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、樟腦醌(camphorquinone)、苯并蒽酮(benzanthrone)、2-甲基-1-[4-(甲基硫基)苯基]-2-嗎啉基丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮-1、4-二甲基胺基苯甲酸乙酯、4-二甲基胺基苯甲酸異戊酯、4,4'-二(第三丁基過氧化羰基)二苯甲酮、3,4,4'-三(第三丁基過氧化羰基)二苯甲酮、3,3',4,4'-四(第三丁基過氧化羰基)二苯甲酮、3,3',4,4'-四(第三己基過氧化羰基)二苯甲酮、3,3'-二(甲氧基羰基)-4,4'-二(第三丁基過氧化羰基)二苯甲酮、3,4'-二(甲氧基羰基)-4,3'-二(第三丁基過氧化羰基)二苯甲酮、4,4'-二(甲氧基羰基)-3,3'-二(第三丁基過氧化羰基)二苯甲酮、2-(4'-甲氧基苯乙烯基)-4,6-雙(三氯甲基)-均三嗪、2-(3',4'-二甲氧基苯乙烯基)-4,6-雙(三氯甲基)-均三嗪、2-(2',4'-二甲氧基苯乙烯基)-4,6-雙(三氯甲基)-均三嗪、2-(2'-甲氧基苯乙烯基)-4,6-雙(三氯甲基)-均三嗪、2-(4'-戊氧基苯乙烯基)-4,6-雙(三氯甲基)-均三嗪、4-[對-N,N-二(乙氧基羰基甲基)]-2,6-二(三氯甲基)-均三嗪、1,3-雙(三氯甲基)-5-(2'-氯苯基)-均三嗪、1,3-雙(三氯甲基)-5-(4'-甲氧基苯基)-均三嗪、2-(對二甲基胺基苯乙烯基)苯并噁唑、2-(對二甲基胺基苯乙烯基)苯并噻唑、2-巰基苯并噻唑、3,3'-羰基雙(7-二乙基胺基香豆素)、2-(鄰氯苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑、2,2'-雙(2-氯苯基)-4,4',5,5'-四(4-乙氧基羰基苯基)-1,2'-聯咪唑、2,2'-雙(2,4-二氯苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑、2,2'-雙(2,4-二溴苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑、2,2'-雙(2,4,6-三氯苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑、3-(2-甲基-2-二甲基胺基丙醯基)咔唑、3,6-雙(2-甲基-2-嗎啉基丙醯基)-9-正十二烷基咔唑、1-羥基環己基苯基酮、雙(η5 -2,4-環戊二烯-1-基)-雙(2,6-二氟-3-(1H-吡咯-1-基)-苯基)鈦、雙(2,4,6-三甲基苯甲醯基)苯基氧化膦、2,4,6-三甲基苯甲醯基二苯基氧化膦、氧基苯基乙酸、2-[2-側氧-2-苯基乙醯氧基乙氧基]乙酯、2-(2-羥基乙氧基)乙酯、2-(二甲基胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-嗎啉基)苯基]-1-丁酮、1,2-辛二酮,1-[4-(苯硫基)-,2-(O-苯甲醯基肟)]、乙酮,1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-,1-(O-乙醯基肟)、2-羥基-1-{4-[4-(2-羥基-2-甲基-丙醯基)-苄基]苯基}-2-甲基-丙烷-1-酮、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、及苯基乙醛酸甲酯等。Specific examples of the photopolymerization initiator (D) include benzophenone, Michler's ketone, 4,4'-bis(diethylamino)benzophenone, and oxygen. Xanthone, thioxanthone, isopropyl oxazinone, 2,4-diethylthioxanthone, 2-ethyl anthraquinone, acetophenone Acetphenone), 2-hydroxy-2-methylpropiophenone, 2-hydroxy-2-methyl-4'-isopropylpropiophenone, 1-hydroxycyclohexyl phenyl ketone , isopropyl benzoin ether, isobutyl benzoin ether, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, camphorquinone ( Camphorquinone), benzantrone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one, 2-benzyl-2-di Methylamino-1-(4-morpholinylphenyl)-butanone-1,4-dimethylaminobenzoic acid ethyl ester, 4-dimethylaminobenzoic acid isoamyl ester, 4,4 '-Di(t-butylperoxycarbonyl)benzophenone, 3,4,4'-tris(t-butylperoxycarbonyl)benzophenone, 3,3',4,4'-four (t-butylperoxycarbonyl)benzophenone, 3,3',4,4'-tetra(trihexylperoxycarbonyl)benzophenone, 3,3'-bis(methoxycarbonyl)-4,4'-di(t-butylperoxide) Carbonyl)benzophenone, 3,4'-bis(methoxycarbonyl)-4,3'-bis(t-butylperoxycarbonyl)benzophenone, 4,4'-di(methoxy Carbonyl)-3,3'-bis(t-butylperoxycarbonyl)benzophenone, 2-(4'-methoxystyryl)-4,6-bis(trichloromethyl)- Triazine, 2-(3',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(2',4'-dimethoxy Styryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(2'-methoxystyryl)-4,6-bis(trichloromethyl)-s-triazine , 2-(4'-pentyloxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 4-[p-N,N-di(ethoxycarbonylmethyl)] -2,6-bis(trichloromethyl)-s-triazine, 1,3-bis(trichloromethyl)-5-(2'-chlorophenyl)-s-triazine, 1,3-double ( Trichloromethyl)-5-(4'-methoxyphenyl)-s-triazine, 2-(p-dimethylaminostyryl)benzoxazole, 2-(p-dimethylamino) Styryl)benzothiazole, 2-mercaptobenzothiazole, 3,3'-carbonylbis(7-diethylaminocoumarin), 2-(o-chlorophenyl)-4,4',5 , 5'-tetraphenyl -1,2'-biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonylphenyl)-1,2'- Biimidazole, 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis (2 ,4-dibromophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4,6-trichlorophenyl)- 4,4',5,5'-tetraphenyl-1,2'-biimidazole, 3-(2-methyl-2-dimethylaminopropionyl)carbazole, 3,6-bis ( 2-methyl-2-morpholinylpropanyl)-9-n-dodecylcarbazole, 1-hydroxycyclohexyl phenyl ketone, bis(η 5 -2,4-cyclopentadiene-1- Bis(2,6-difluoro-3-(1H-pyrrol-1-yl)-phenyl)titanium, bis(2,4,6-trimethylbenzylidene)phenylphosphine oxide, 2,4,6-trimethylbenzimidyldiphenylphosphine oxide, oxyphenylacetic acid, 2-[2-oxo-2-phenylethenyloxyethoxy]ethyl ester, 2- (2-hydroxyethoxy)ethyl ester, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl ]-1-butanone, 1,2-octanedione, 1-[4-(phenylthio)-, 2-(O-benzylidenehydrazine), ethyl ketone, 1-[9-ethyl -6-(2-methylbenzhydryl)-9H-indazol-3-yl]-,1-(O-ethylindenyl), 2-hydroxy-1-{4-[4-(2 -hydroxy-2-methyl-propenyl)-benzyl]phenyl} 2-methyl-propan-1-one, 2,2-dimethoxy-1,2-diphenylethane-1-one, and methyl phenylglyoxylate.

本發明的墨水組成物中,光聚合起始劑(D)可單獨使用1種,亦可將2種以上組合使用。In the ink composition of the present invention, the photopolymerization initiator (D) may be used singly or in combination of two or more.

若本發明的墨水組成物中的光聚合起始劑(D)的含量為該墨水組成物總量的0.5 wt%~20 wt%,則該墨水組成物對紫外線為高感度,故而較佳,更佳為1 wt%~15 wt%,尤佳為2 wt%~10 wt%。When the content of the photopolymerization initiator (D) in the ink composition of the present invention is from 0.5% by weight to 20% by weight based on the total amount of the ink composition, the ink composition is highly sensitive to ultraviolet rays, and thus it is preferable. More preferably, it is 1 wt% to 15 wt%, and particularly preferably 2 wt% to 10 wt%.

〈1.5. 阻燃劑(E)〉<1.5. Flame Retardant (E)>

本發明的噴墨用光硬化性墨水組成物可包含阻燃劑(E)。本說明書中,所謂阻燃劑(E),只要是可賦予阻燃性的化合物,則並無特別限定,就低有毒性、低公害性、安全性的觀點而言,較佳為將有機磷系阻燃劑用作阻燃劑(E)。另外,阻燃劑中亦存在具有(甲基)丙烯醯基的化合物,此種阻燃劑在本說明書中,並不符合上述化合物(C),而是符合阻燃劑(E)。The photocurable ink composition for inkjet according to the present invention may contain a flame retardant (E). In the present specification, the flame retardant (E) is not particularly limited as long as it is a compound capable of imparting flame retardancy, and is preferably organic phosphorus from the viewpoint of low toxicity, low pollution, and safety. A flame retardant is used as the flame retardant (E). Further, a compound having a (meth) acrylonitrile group is also present in the flame retardant, and such a flame retardant does not conform to the above compound (C) in the present specification, but conforms to the flame retardant (E).

上述有機磷系阻燃劑的具體例可列舉:磷酸三苯酯、磷酸三甲苯酯、磷酸三(二甲苯)酯、磷酸甲苯基苯酯、磷酸2-乙基己基二苯酯、9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物(9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide)、10-(2,5-二羥基苯基)-10H-9-氧雜-10-磷雜菲-10-氧化物及縮合9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物。Specific examples of the organic phosphorus-based flame retardant include triphenyl phosphate, tricresyl phosphate, tris(xylylene) phosphate, tolylphenyl phosphate, 2-ethylhexyl diphenyl phosphate, and 9,10. -1,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10-(2,5-dihydroxyphenyl) -10H-9-oxa-10-phosphaphenanthrene-10-oxide and condensed 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide.

該些阻燃劑中,尤其是若使用下述式(E-1)所表示的縮合9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物HFA-3003(商品名,昭和電工(股)製造),則即便於使由本發明的墨水組成物所獲得的硬化膜曝露於高溫狀態下的情況,亦無阻燃劑(E)滲出,故而較佳。Among these flame retardants, in particular, the condensed 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide HFA-3003 represented by the following formula (E-1) is used. In the case where the cured film obtained from the ink composition of the present invention is exposed to a high temperature, the flame retardant (E) does not bleed out, which is preferable.

本發明的墨水組成物中,阻燃劑(E)可單獨使用1種,亦可將2種以上組合使用。In the ink composition of the present invention, the flame retardant (E) may be used singly or in combination of two or more.

以上所說明的阻燃劑(E)可利用公知的方法製造,另外,如上述昭和電工(股)製造的HFA-3003那樣,亦有市售。The flame retardant (E) described above can be produced by a known method, and is also commercially available as HFA-3003 manufactured by Showa Denko Electric Co., Ltd. as described above.

本發明的墨水組成物中,若上述阻燃劑(E)的含量為該墨水組成物總量的5 wt%~25 wt%,則由該墨水組成物所獲得的硬化膜的耐鍍敷性及耐熱性與噴射性的平衡良好,且阻燃性優異,因此較佳,更佳為7 wt%~20 wt%,尤佳為10 wt%~20 wt%,特佳為12 wt%~20 wt%。In the ink composition of the present invention, when the content of the flame retardant (E) is 5 wt% to 25 wt% of the total amount of the ink composition, the plating resistance of the cured film obtained from the ink composition And a good balance of heat resistance and sprayability, and excellent in flame retardancy, and therefore more preferably, it is 7 wt% to 20 wt%, particularly preferably 10 wt% to 20 wt%, and particularly preferably 12 wt% to 20 wt%. Wt%.

〈1.6. 化合物(A)以外的選自由環氧硬化劑、三聚氰胺樹脂及苯酚樹脂所組成組群中的至少1種化合物(F)〉<1.6. At least one compound (F) selected from the group consisting of an epoxy hardener, a melamine resin, and a phenol resin other than the compound (A)

如上所述,本發明的噴墨用光硬化性墨水組成物亦可包含化合物(A)以外的選自由環氧硬化劑、三聚氰胺樹脂及苯酚樹脂所組成組群中的至少1種化合物(F)。As described above, the photocurable ink composition for inkjet according to the present invention may further contain at least one compound (F) selected from the group consisting of epoxy hardeners, melamine resins, and phenol resins other than the compound (A). .

(1.6.1. 環氧硬化劑)(1.6.1. Epoxy hardener)

於本發明的墨水組成物包含環氧化合物作為化合物(B)等的情況,為了進一步提高由上述墨水組成物所獲得的硬化膜的耐鍍敷及耐熱性,可使上述墨水組成物中更包含化合物(A)以外的環氧硬化劑。In the case where the ink composition of the present invention contains an epoxy compound as the compound (B) or the like, in order to further improve the plating resistance and heat resistance of the cured film obtained from the ink composition, the ink composition may be further included. An epoxy curing agent other than the compound (A).

上述環氧硬化劑的具體例可列舉:順丁烯二酸酐、甲基順丁烯二酸酐、四氫鄰苯二甲酸酐、六氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、六氫偏苯三甲酸酐、鄰苯二甲酸酐、偏苯三甲酸酐、苯乙烯-順丁烯二酸酐共聚物、二伸乙基三胺、三伸乙基四胺、四伸乙基五胺、二氰二胺、聚醯胺胺(聚醯胺樹脂)、酮亞胺化合物、異佛爾酮二胺、間二甲苯二胺、間伸苯基二胺、1,3-雙(胺基甲基)環己烷、N-胺基乙基哌嗪、4,4'-二胺基二苯基甲烷、4,4'-二胺基-3,3'-二乙基二苯基甲烷、二胺基二苯基碸、鄰苯二甲酸酐、均苯四甲酸酐、甲基四氫鄰苯二甲酸酐、3,6-內亞甲基四氫鄰苯二甲酸酐、六氯內亞甲基四氫鄰苯二甲酸酐及甲基-3,6-內亞甲基四氫鄰苯二甲酸酐。Specific examples of the epoxy curing agent include maleic anhydride, methyl maleic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, and methylhexahydrophthalic anhydride. , hexahydrotrimellitic anhydride, phthalic anhydride, trimellitic anhydride, styrene-maleic anhydride copolymer, di-ethyltriamine, tri-ethyltetramine, tetraethylidene pentaamine , dicyandiamide, polyamidamine (polyamide resin), ketimine compound, isophorone diamine, m-xylene diamine, meta-phenylenediamine, 1,3-bis (amino group) Methyl)cyclohexane, N-aminoethylpiperazine, 4,4'-diaminodiphenylmethane, 4,4'-diamino-3,3'-diethyldiphenylmethane , diaminodiphenyl hydrazine, phthalic anhydride, pyromellitic anhydride, methyltetrahydrophthalic anhydride, 3,6-endomethylenetetrahydrophthalic anhydride, hexachloro Methylenetetrahydrophthalic anhydride and methyl-3,6-endomethylenetetrahydrophthalic anhydride.

本發明的墨水組成物中,上述環氧硬化劑可單獨使用1種,亦可將2種以上組合使用。In the ink composition of the present invention, the epoxy curing agent may be used singly or in combination of two or more kinds.

若本發明的墨水組成物中的環氧硬化劑的含量為該墨水組成物總量的0.5 wt%~50 wt%,則由該墨水組成物所獲得的硬化膜的耐鍍敷性及耐熱性提高,因此較佳,若考慮到與其他特性的平衡,則更佳為0.5 wt%~40 wt%,尤佳為0.5 wt%~30 wt%。When the content of the epoxy curing agent in the ink composition of the present invention is from 0.5% by weight to 50% by weight based on the total amount of the ink composition, the plating resistance and heat resistance of the cured film obtained from the ink composition It is preferable to increase, and it is more preferably 0.5 wt% to 40 wt%, and particularly preferably 0.5 wt% to 30 wt%, in consideration of balance with other characteristics.

(1.6.2. 三聚氰胺樹脂)(1.6.2. Melamine resin)

本發明的噴墨用光硬化性墨水組成物中,為了提高耐鍍敷性及耐熱性,亦可包含三聚氰胺樹脂。The photocurable ink composition for inkjet according to the present invention may contain a melamine resin in order to improve plating resistance and heat resistance.

三聚氰胺樹脂只要是藉由三聚氰胺與甲醛的聚縮合而製造的樹脂,則並無特別限定,其具體例可列舉:羥甲基三聚氰胺、醚化羥甲基三聚氰胺、苯并胍胺、羥甲基苯并胍胺、醚化羥甲基苯并胍胺、及它們的縮合物。該些具體例中,若含有醚化羥甲基三聚氰胺,則由本發明的墨水組成物可獲得耐鍍敷性良好的硬化膜,因此較佳。The melamine resin is not particularly limited as long as it is a resin produced by polycondensation of melamine and formaldehyde, and specific examples thereof include methylol melamine, etherified methylol melamine, benzoguanamine, and hydroxymethylbenzene. And decylamine, etherified methylol benzoguanamine, and condensates thereof. In the specific examples, when the etherified methylol melamine is contained, the cured ink film having good plating resistance can be obtained from the ink composition of the present invention.

此外,三聚氰胺樹脂的市售品的具體例可列舉:Nikalac MW-30、Nikalac MW-30HM、Nikalac MW-390、Nikalac MW-100LM及Nikalac MX-750LM(商品名,三和化學(Sanwa Chemical)(股)製造)。Further, specific examples of commercially available melamine resins include Nikalac MW-30, Nikalac MW-30HM, Nikalac MW-390, Nikalac MW-100LM, and Nikalac MX-750LM (trade name, Sanwa Chemical (Sanwa Chemical) ( Stock) manufacturing).

本發明的墨水組成物中,三聚氰胺樹脂可單獨使用1種,亦可將2種以上組合使用。In the ink composition of the present invention, the melamine resin may be used singly or in combination of two or more.

若本發明的墨水組成物中的三聚氰胺樹脂的含量為該墨水組成物總量的0.5 wt%~25 wt%,則由該墨水組成物所獲得的硬化膜的耐鍍敷性及耐熱性提高,因此較佳,若考慮到與其他特性的平衡,則更佳為1.0 wt%~20 wt%,尤佳為1.5 wt%~20 wt%。When the content of the melamine resin in the ink composition of the present invention is from 0.5% by weight to 255% by weight based on the total amount of the ink composition, the plating resistance and heat resistance of the cured film obtained from the ink composition are improved. Therefore, it is preferably from 1.0 wt% to 20 wt%, more preferably from 1.5 wt% to 20 wt%, in consideration of balance with other characteristics.

(1.6.3. 苯酚樹脂)(1.6.3. Phenol resin)

為了提高由該墨水組成物所獲得的硬化膜的耐鍍敷性及耐熱性,本發明的噴墨用光硬化性墨水組成物可包含苯酚樹脂。The photocurable ink composition for inkjet according to the present invention may contain a phenol resin in order to improve the plating resistance and heat resistance of the cured film obtained from the ink composition.

上述苯酚樹脂較佳為使用藉由具有酚性羥基的芳香族化合物與醛類的縮合反應而獲得的酚醛樹脂、乙烯基苯酚的均聚物(包含氫化物)、或者乙烯基苯酚和可與其共聚合的化合物的乙烯基苯酚系共聚物(包含氫化物)等。The phenol resin is preferably a phenol resin obtained by a condensation reaction of an aromatic compound having a phenolic hydroxyl group with an aldehyde, a homopolymer of a vinyl phenol (including a hydride), or a vinyl phenol and may be co-polymerized therewith. A vinyl phenol-based copolymer (including a hydride) of a polymerized compound or the like.

上述具有酚性羥基的芳香族化合物的具體例可列舉:苯酚、鄰甲酚、間甲酚、對甲酚、鄰乙基苯酚、間乙基苯酚、對乙基苯酚、鄰丁基苯酚、間丁基苯酚、對丁基苯酚、鄰二甲酚、2,3-二甲酚、2,4-二甲酚、2,5-二甲酚、3,4-二甲酚、3,5-二甲酚、2,3,5-三甲基苯酚、3,4,5-三甲基苯酚、對苯基苯酚、間苯二酚(resorcinol)、對苯二酚、對苯二酚單甲醚(hydroquinone monomethylether)、鄰苯三酚(pyrogallol)、雙酚A、雙酚F、含萜烯(terpene)骨架的二苯酚、沒食子酸、沒食子酸酯、α-萘酚及β-萘酚。Specific examples of the aromatic compound having a phenolic hydroxyl group include phenol, o-cresol, m-cresol, p-cresol, o-ethylphenol, m-ethylphenol, p-ethylphenol, o-butylphenol, and Butyl phenol, p-butyl phenol, o-xylenol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 3,4-xylenol, 3,5- Xylenol, 2,3,5-trimethylphenol, 3,4,5-trimethylphenol, p-phenylphenol, resorcinol, hydroquinone, hydroquinone monomethyl Hydroquinone monomethylether, pyrogallol, bisphenol A, bisphenol F, terpene-containing diphenol, gallic acid, gallic acid ester, alpha-naphthol and beta - Naphthol.

同樣,上述醛類可列舉甲醛、對甲醛、糠醛(furfural)、苯甲醛、硝基苯甲醛及乙醛等。Similarly, examples of the aldehydes include formaldehyde, para-formaldehyde, furfural, benzaldehyde, nitrobenzaldehyde, and acetaldehyde.

上述可與乙烯基苯酚共聚合的化合物的具體例可列舉:(甲基)丙烯酸或者其衍生物、苯乙烯或者其衍生物、順丁烯二酸酐、乙酸乙烯酯及丙烯腈。Specific examples of the compound copolymerizable with the vinyl phenol include (meth)acrylic acid or a derivative thereof, styrene or a derivative thereof, maleic anhydride, vinyl acetate, and acrylonitrile.

以上所說明的苯酚樹脂的市售品的具體例可列舉:Resitop PSM-6200(商品名,群榮化學(股)製造),Shonol BRG-555(商品名,昭和電工(股)製造),Maruka Lyncur MS-2P、Maruka Lyncur CST70及Maruka Lyncur PHM-C(商品名,丸善石油化學(股)製造)。Specific examples of the commercial product of the phenol resin described above include Resitop PSM-6200 (trade name, manufactured by Kyoei Chemical Co., Ltd.), Shonol BRG-555 (trade name, manufactured by Showa Denko), Maruka Lyncur MS-2P, Maruka Lyncur CST70 and Maruka Lyncur PHM-C (trade name, manufactured by Maruzen Petrochemical Co., Ltd.).

本發明的墨水組成物中,上述苯酚樹脂可單獨使用1種,亦可將2種以上組合使用。In the ink composition of the present invention, the phenol resin may be used singly or in combination of two or more kinds.

若本發明的墨水組成物中的苯酚樹脂的含量為該墨水組成物總量的0.5 wt%~20 wt%,則由該墨水組成物所獲得的硬化膜的耐鍍敷性及耐熱性提高,因此較佳,若考慮到與其他特性的平衡,則更佳為0.5 wt%~10 wt%,尤佳為0.5 wt%~7 wt%。When the content of the phenol resin in the ink composition of the present invention is from 0.5% by weight to 20% by weight based on the total amount of the ink composition, the plating resistance and heat resistance of the cured film obtained from the ink composition are improved. Therefore, it is preferably from 0.5 wt% to 10 wt%, more preferably from 0.5 wt% to 7 wt%, in consideration of balance with other characteristics.

〈1.7. 其他的成分〉<1.7. Other ingredients>

為了進一步提高各種特性,本發明的噴墨用光硬化性墨水組成物可包含著色劑、溶劑、界面活性劑及聚合抑制劑等。In order to further improve various characteristics, the photocurable ink composition for inkjet according to the present invention may contain a colorant, a solvent, a surfactant, a polymerization inhibitor, and the like.

(1.7.1. 著色劑)(1.7.1. Colorants)

例如為了於基板上由該墨水組成物形成硬化膜,且當檢查該硬化膜的狀態時容易與基板辨別,本發明的噴墨用光硬化性墨水組成物可包含著色劑。著色劑較佳為染料及顏料。For example, in order to form a cured film from the ink composition on the substrate and to easily distinguish the substrate from the substrate when the cured film is inspected, the inkjet photocurable ink composition of the present invention may contain a colorant. The colorant is preferably a dye and a pigment.

本發明的墨水組成物中,著色劑可單獨使用1種,亦可將2種以上組合使用。In the ink composition of the present invention, the coloring agent may be used singly or in combination of two or more.

若本發明的墨水組成物中的上述著色劑的含量為該墨水組成物總量的0.1 wt%~5 wt%,則上述硬化膜的檢查容易,因此較佳,若考慮到與其他特性的平衡,則更佳為0.1 wt%~1 wt%,尤佳為0.1 wt%~0.5 wt%。When the content of the coloring agent in the ink composition of the present invention is from 0.1% by weight to 5% by weight based on the total amount of the ink composition, the cured film is easily inspected, so that it is preferable to consider the balance with other characteristics. More preferably, it is 0.1 wt% to 1 wt%, and particularly preferably 0.1 wt% to 0.5 wt%.

(1.7.2. 溶劑)(1.7.2. Solvents)

本發明的噴墨用光硬化性墨水組成物即便不含溶劑(水或有機溶劑),亦具有充分的噴射性,因此是材料設計容易且環境負荷小的墨水組成物,為了進一步提高噴射性,可包含溶劑。The photocurable ink composition for inkjet according to the present invention has sufficient ejection properties even if it does not contain a solvent (water or an organic solvent), and therefore is an ink composition which is easy to design and has a low environmental load, and in order to further improve the ejection property, A solvent may be included.

關於上述溶劑,當噴射本發明的墨水組成物時,於加溫噴墨頭的情況,若墨水組成物中包含低沸點的溶劑,則存在溶劑揮發,墨水組成物的黏度上升,導致噴墨頭的噴嘴口堵塞的情況。因此,較佳為沸點為100℃~300℃的溶劑。With regard to the above solvent, when the ink composition of the present invention is sprayed, in the case of heating the ink jet head, if the ink composition contains a solvent having a low boiling point, the solvent is volatilized, and the viscosity of the ink composition rises, resulting in an ink jet head. The condition of the nozzle opening is blocked. Therefore, a solvent having a boiling point of from 100 ° C to 300 ° C is preferred.

沸點為100℃~300℃的溶劑的具體例可列舉:乙酸丁酯、丙酸丁酯、乳酸乙酯、氧乙酸甲酯、氧乙酸乙酯、氧乙酸丁酯、甲氧基乙酸甲酯、甲氧基乙酸乙酯、甲氧基乙酸丁酯、乙氧基乙酸甲酯、乙氧基乙酸乙酯、3-氧丙酸甲酯、3-氧丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、2-氧丙酸甲酯、2-氧丙酸乙酯、2-氧丙酸丙酯、2-甲氧基丙酸甲酯、2-甲氧基丙酸乙酯、2-甲氧基丙酸丙酯、2-乙氧基丙酸甲酯、2-乙氧基丙酸乙酯、2-氧基-2-甲基丙酸甲酯、2-氧基-2-甲基丙酸乙酯、2-甲氧基-2-甲基丙酸甲酯、2-乙氧基-2-甲基丙酸乙酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-側氧丁酸甲酯、2-側氧丁酸乙酯、二噁烷、乙二醇、二乙二醇、三乙二醇、丙二醇、二丙二醇、三丙二醇、1,4-丁二醇、乙二醇單異丙醚、乙二醇單丁醚、丙二醇單甲醚、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙二醇單丙醚乙酸酯、二丙二醇單乙醚乙酸酯、二丙二醇單丁醚乙酸酯、乙二醇單丁醚乙酸酯、環己酮、環戊酮、二乙二醇單甲醚、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚、二乙二醇單乙醚乙酸酯、二乙二醇單丁醚、乙酸酯、二乙二醇二甲醚、二乙二醇二乙醚、二乙二醇甲基乙醚、二乙二醇單丁醚乙酸酯、γ-丁內酯、N,N-二甲基乙醯胺、N-甲基-2-吡咯啶酮及二甲基咪唑啶酮。Specific examples of the solvent having a boiling point of 100 ° C to 300 ° C include butyl acetate, butyl propionate, ethyl lactate, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, Ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, methyl 3-oxopropionate, ethyl 3-oxopropionate, 3-methoxypropane Methyl ester, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 2-oxopropionate, ethyl 2-oxopropionate, Propyl 2-oxopropionate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, 2- Ethyl ethoxypropionate, methyl 2-oxy-2-methylpropanoate, ethyl 2-oxy-2-methylpropionate, methyl 2-methoxy-2-methylpropionate , 2-ethoxy-2-methylpropionic acid ethyl ester, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetate, ethyl acetate, 2-butoxybutyric acid Ester, ethyl 2-oxobutanoate, dioxane, ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 1,4-butanediol, Glycol monoisopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, dipropylene glycol monoethyl ether acetate, Dipropylene glycol monobutyl ether acetate, ethylene glycol monobutyl ether acetate, cyclohexanone, cyclopentanone, diethylene glycol monomethyl ether, diethylene glycol monomethyl ether acetate, diethylene glycol Monoethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether, acetate, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ether, diethyl Glycol monobutyl ether acetate, γ-butyrolactone, N,N-dimethylacetamide, N-methyl-2-pyrrolidone and dimethylimidazolidinone.

該些溶劑可單獨使用1種,亦可將2種以上組合使用。These solvents may be used alone or in combination of two or more.

若本發明的墨水組成物中的溶劑的含量為該墨水組成物總量的0 wt%~60 wt%,則噴射性與其他特性的平衡良好,更佳為0 wt%~50 wt%,尤佳為0 wt%~40 wt%。When the content of the solvent in the ink composition of the present invention is from 0 wt% to 60 wt% of the total amount of the ink composition, the balance between the sprayability and other characteristics is good, and more preferably from 0 wt% to 50 wt%. Preferably, it is 0 wt% to 40 wt%.

(1.7.3. 界面活性劑)(1.7.3. Surfactant)

為了提高對基底基板的潤濕性、或由上述墨水組成物所獲得的硬化膜的膜面均勻性,本發明的噴墨用光硬化性墨水組成物可包含界面活性劑。本發明中,上述界面活性劑是使用矽系界面活性劑、丙烯酸系界面活性劑及氟系界面活性劑等。The inkjet photocurable ink composition of the present invention may contain a surfactant in order to improve the wettability to the base substrate or the film surface uniformity of the cured film obtained from the ink composition. In the present invention, the surfactant is a ruthenium-based surfactant, an acrylic surfactant, a fluorine-based surfactant, or the like.

上述矽系界面活性劑的具體例可列舉Byk-300、Byk-306、Byk-335、Byk-310、Byk-341、Byk-344及Byk-370(商品名,BYK-化學日本(BYK-Chemie Japan)(股)製造);上述丙烯酸系界面活性劑的具體例可列舉Byk-354、Byk-358及Byk-361(商品名,BYK-Chemie Japan(股)製造);上述氟系界面活性劑的具體例可列舉DFX-18、Ftergent 250及Ftergent 251(商品名,Neos(股)製造),以及Megafac F-477、Megafac 479、Megafac 553、Megafac 554、RS-72-K、RS-211(商品名,DIC(股)製造)。Specific examples of the above-mentioned lanthanoid surfactants include Byk-300, Byk-306, Byk-335, Byk-310, Byk-341, Byk-344, and Byk-370 (trade name, BYK-Chemical Japan (BYK-Chemie) Japan) (manufactured by the company); specific examples of the acrylic surfactant described above include Byk-354, Byk-358, and Byk-361 (trade name, manufactured by BYK-Chemie Japan Co., Ltd.); the above-mentioned fluorine-based surfactant Specific examples thereof include DFX-18, Ftergent 250, and Ftergent 251 (trade name, manufactured by Neos), and Megafac F-477, Megafac 479, Megafac 553, Megafac 554, RS-72-K, and RS-211 ( Trade name, DIC (share) manufacturing).

本發明的墨水組成物中,上述界面活性劑可單獨使用1種,亦可將2種以上組合使用。In the ink composition of the present invention, the surfactant may be used singly or in combination of two or more.

若本發明的墨水組成物中的界面活性劑的含量為該墨水組成物總量的0.001 wt%~1 wt%,則由該墨水組成物所獲得的硬化膜的膜面均勻性提高,因此較佳,若考慮到與其他特性的平衡,則更佳為0.001 wt%~0.1 wt%,尤佳為0.001 wt%~0.05 wt%。When the content of the surfactant in the ink composition of the present invention is from 0.001% by weight to 1% by weight based on the total amount of the ink composition, the uniformity of the film surface of the cured film obtained from the ink composition is improved, so Preferably, it is more preferably from 0.001 wt% to 0.1 wt%, particularly preferably from 0.001 wt% to 0.05 wt%, in consideration of balance with other characteristics.

(1.7.4. 聚合抑制劑)(1.7.4. Polymerization inhibitors)

為了提高保存穩定性,本發明的噴墨用光硬化性墨水組成物可包含聚合抑制劑。In order to improve storage stability, the photocurable ink composition for inkjet according to the present invention may contain a polymerization inhibitor.

上述聚合抑制劑的具體例可列舉4-甲氧基苯酚、對苯二酚及吩噻嗪(phenothiazine)。該些例子中,若包含吩噻嗪,則本發明的墨水組成物在長期的保存中,黏度的變化亦小,因此較佳。Specific examples of the polymerization inhibitor include 4-methoxyphenol, hydroquinone, and phenothiazine. In these examples, when phenothiazine is contained, the ink composition of the present invention preferably has a small change in viscosity during long-term storage.

本發明的墨水組成物中,上述聚合抑制劑可單獨使用1種,亦可將2種以上組合使用。In the ink composition of the present invention, the polymerization inhibitor may be used singly or in combination of two or more kinds.

若本發明的墨水組成物中的聚合抑制劑的含量為該墨水組成物總量的0.01 wt%~1 wt%,則該墨水組成物在長期的保存中,黏度的變化亦小,因此較佳,若考慮到與其他特性的平衡,則更佳為0.01 wt%~0.5 wt%。If the content of the polymerization inhibitor in the ink composition of the present invention is from 0.01% by weight to 1% by weight based on the total amount of the ink composition, the change in viscosity of the ink composition during long-term storage is small, so that it is preferred. If it considers the balance with other characteristics, it is more preferably 0.01 wt% to 0.5 wt%.

〈1.8. 噴墨用光硬化性墨水組成物的黏度〉<1.8. Viscosity of Photocurable Ink Composition for Inkjet>

本發明的噴墨用光硬化性墨水組成物的黏度是使用E型黏度計在25℃下測定,為200 mPa‧s以下。因此,本發明的墨水組成物即便不含溶劑,亦具有優異的噴射性。此外,上述墨水組成物視需要可包含溶劑的情況如上所述。The viscosity of the photocurable ink composition for inkjet according to the present invention is measured at 25 ° C using an E-type viscometer and is 200 mPa ‧ s or less. Therefore, the ink composition of the present invention has excellent ejection properties even without a solvent. Further, the above ink composition may contain a solvent as needed, as described above.

就噴射性的觀點而言,本發明的墨水組成物的黏度較佳為2 mPa‧s~200 mPa‧s,更佳為10 mPa‧s~180 mPa‧s,尤佳為20 mPa‧s~150 mPa‧s。From the viewpoint of ejectability, the viscosity of the ink composition of the present invention is preferably from 2 mPa ‧ to 200 mPa ‧ , more preferably from 10 mPa ‧ to 180 mPa ‧ , and particularly preferably from 20 mPa ‧ s 150 mPa‧s.

另外,於使用25℃下的黏度超過30 mPa‧s的墨水組成物的情況,若加溫噴墨頭而降低噴出時的黏度,則可更穩定地噴出。於加熱噴墨頭而進行噴射的情況,加熱溫度(較佳為40℃~120℃)下的本發明的墨水組成物的黏度較佳為1 mPa‧s~30 mPa‧s,尤佳為2 mPa‧s~25 mPa‧s,特佳為3 mPa‧s~20 mPa‧s。Further, in the case of using an ink composition having a viscosity at 25 ° C of more than 30 mPa ‧ s, if the ink jet head is heated to lower the viscosity at the time of discharge, it can be ejected more stably. In the case of spraying by heating the ink jet head, the viscosity of the ink composition of the present invention at a heating temperature (preferably 40 ° C to 120 ° C) is preferably from 1 mPa ‧ to 30 mPa ‧ s, particularly preferably 2 mPa‧s ~ 25 mPa‧s, especially 3 mPa‧s ~ 20 mPa‧s.

於加溫噴墨頭的情況,較佳為使用不含溶劑的墨水組成物作為本發明的墨水組成物。於此情況,墨水組成物的黏度較佳為藉由適當選擇稀釋劑(化合物(C))的種類及含量來調整。另外,於包含溶劑的情況,較佳為使用沸點為100℃~300℃的溶劑的情況如上所述。In the case of warming the ink jet head, it is preferred to use a solvent-free ink composition as the ink composition of the present invention. In this case, the viscosity of the ink composition is preferably adjusted by appropriately selecting the type and content of the diluent (compound (C)). Further, in the case where a solvent is contained, it is preferred to use a solvent having a boiling point of from 100 ° C to 300 ° C as described above.

另一方面,於不加溫噴墨頭的情況,墨水組成物的黏度可以溶劑的量成為墨水組成物總量的60 wt%以下的方式,添加溶劑來調整。On the other hand, in the case where the ink jet head is not heated, the viscosity of the ink composition can be adjusted by adding a solvent so that the amount of the solvent is 60 wt% or less of the total amount of the ink composition.

〈1.9. 本發明的噴墨用光硬化性墨水組成物的製備方法〉<1.9. Preparation method of photocurable ink composition for inkjet according to the present invention>

本發明的噴墨用光硬化性墨水組成物可藉由利用公知的方法將成為原料的各成分進行混合來製備。尤其,本發明的墨水組成物較佳為藉由將上述(A)成分、(B)成分及視需要的上述(C)成分~(F)成分或其他的成分進行混合,將所得的溶液過濾並脫氣來製備。The photocurable ink composition for inkjet according to the present invention can be produced by mixing the components which are raw materials by a known method. In particular, the ink composition of the present invention preferably has the above-mentioned (A) component, (B) component, and optionally the above-mentioned (C) component to (F) component or other components, and the resulting solution is filtered. And degassed to prepare.

例如以上述方式製備的本發明的墨水組成物的噴射性及光硬化性優異,可形成耐鍍敷性、耐熱性、與基板的密著性及阻燃性同時優異的硬化膜。此外,上述過濾時例如使用氟樹脂製的薄膜過濾器等。For example, the ink composition of the present invention prepared as described above is excellent in ejectability and photocurability, and can form a cured film which is excellent in plating resistance, heat resistance, adhesion to a substrate, and flame retardancy. Further, for the above filtration, for example, a membrane filter made of a fluororesin or the like is used.

〈1.10. 本發明的噴墨用光硬化性墨水組成物的保存〉<1.10. Preservation of the photocurable ink composition for inkjet according to the present invention>

本發明的噴墨用墨水若在-20℃~25℃下保存,則保存中的黏度變化(增加)小,保存穩定性良好。When the inkjet ink of the present invention is stored at -20 ° C to 25 ° C, the viscosity change (increased) during storage is small, and the storage stability is good.

[2. 利用噴墨方法的本發明的噴墨用光硬化性墨水組成物的塗佈][2. Coating of photocurable ink composition for inkjet of the present invention by an inkjet method]

本發明的噴墨用光硬化性墨水組成物可使用公知的噴墨塗佈方法來塗佈。噴墨塗佈方法例如有:使力學能量作用於墨水組成物而自噴墨頭噴出(塗佈)墨水組成物的方法(所謂壓電方式);及使熱能量作用於墨水組成物來噴出墨水組成物的方法(所謂噴泡(註冊商標)方式)。The photocurable ink composition for inkjet according to the present invention can be applied by a known inkjet coating method. The inkjet coating method includes, for example, a method in which mechanical energy is applied to an ink composition to eject (coat) an ink composition from an inkjet head (so-called piezoelectric method); and thermal energy is applied to the ink composition to eject ink. Method of composition (so-called bubble (registered trademark) method).

藉由使用噴墨塗佈方法,可將本發明的噴墨用光硬化性墨水組成物預先塗佈成規定的圖案狀。藉此,可僅於必需的部位塗佈墨水,與光微影法相比,成本削減。The inkjet photocurable ink composition of the present invention can be applied in advance to a predetermined pattern by using an inkjet coating method. Thereby, the ink can be applied only to the necessary portions, and the cost is reduced as compared with the photolithography method.

對使用本發明的噴墨用光硬化性墨水組成物進行塗佈而言較佳的塗佈組件例如可列舉具備收納該些墨水組成物的墨水收納部、及噴墨頭的噴墨組件。噴墨組件例如可列舉如下噴墨組件:使與塗佈信號對應的熱能量作用於墨水組成物,一邊利用上述能量來產生墨水組成物的液滴,一邊進行與上述塗佈信號對應的塗佈(描畫)。The coating unit which is preferably used for coating the photocurable ink composition for inkjet according to the present invention is, for example, an ink jet unit including an ink containing portion for storing the ink compositions and an ink jet head. For example, the inkjet module may be an inkjet module that applies thermal energy corresponding to a coating signal to the ink composition, and performs coating corresponding to the coating signal while generating droplets of the ink composition using the energy. (draw).

上述噴墨頭例如可列舉具有包含金屬及/或金屬氧化物的發熱部接液面的噴墨頭。上述金屬及/或金屬氧化物的具體例例如可列舉Ta、Zr、Ti、Ni、Al等金屬及該些金屬的氧化物等。The ink jet head may, for example, be an ink jet head having a liquid contact surface of a heat generating portion containing a metal and/or a metal oxide. Specific examples of the metal and/or metal oxide include metals such as Ta, Zr, Ti, Ni, and Al, and oxides of these metals.

對使用本發明的墨水組成物進行塗佈而言,較佳的塗佈裝置例如可列舉如下裝置:對具有收納墨水組成物的墨水收納部的噴墨頭的室內的墨水組成物,賦予與塗佈信號對應的能量,一邊利用上述能量產生墨水組成物的液滴,一邊進行與上述塗佈信號對應的塗佈(描畫)。For the application of the ink composition of the present invention, a preferred coating apparatus includes, for example, an ink composition in an ink jet head having an ink containing portion that accommodates an ink composition, and a coating composition. The energy corresponding to the cloth signal is applied (painting) corresponding to the coating signal while generating droplets of the ink composition by the energy.

噴墨塗佈裝置並不限定於噴墨頭與墨水收納部分離的裝置,亦可使用上述噴墨頭與墨水收納部不可分離地成為一體的裝置。另外,墨水收納部除了對噴墨頭可分離地搭載於托架上或者不可分離地一體化而搭載於托架上的墨水收納部以外,亦可為設置於裝置的固定部位,經由墨水供給構件例如管向噴墨頭供給墨水組成物的形態。The inkjet coating device is not limited to a device in which the inkjet head is separated from the ink containing portion, and an apparatus in which the inkjet head is inseparably integrated with the ink containing portion may be used. In addition, the ink accommodating portion may be attached to the ink accommodating portion of the cradle in addition to the ink accommodating portion that is detachably integrated with the ink jet head or integrated in the cradle, and may be provided at a fixed portion of the device via the ink supply member. For example, the tube supplies the ink composition to the ink jet head in the form of an ink composition.

另外,噴墨用光硬化性墨水組成物的加熱溫度較佳為40℃~120℃,該加熱溫度下的上述墨水組成物的黏度較佳為1 mPa‧s~30 mPa‧s。Further, the heating temperature of the photocurable ink composition for inkjet is preferably from 40 ° C to 120 ° C, and the viscosity of the ink composition at the heating temperature is preferably from 1 mPa ‧ to 30 mPa ‧ s.

〈2.1. 硬化膜的形成〉<2.1. Formation of hardened film>

將上述本發明的噴墨用光硬化性墨水組成物利用噴墨法而塗佈於基板表面後,對該墨水組成物照射紫外線或可見光線等光而使塗膜硬化,藉此獲得硬化膜。After the photocurable ink composition for inkjet according to the present invention is applied onto the surface of the substrate by an inkjet method, the ink composition is irradiated with light such as ultraviolet rays or visible light to cure the coating film, thereby obtaining a cured film.

於照射紫外線或可見光線等的情況,所照射的曝光量雖依存於上述墨水組成物的組成,利用安裝有牛尾(Ushio)電機(股)製造的受光器UVD-365PD的累計光量計UIT-201進行測定,較佳為10 mJ/cm2 ~1,000 mJ/cm2 左右,更佳為20 mJ/cm2 ~800 mJ/cm2 左右,尤佳為40 mJ/cm2 ~500 mJ/cm2 左右。另外,所照射的紫外線或可見光線等的波長較佳為250 nm~500 nm,更佳為300 nm~450 nm。In the case of irradiating ultraviolet rays, visible light rays, etc., the amount of exposure to be irradiated depends on the composition of the ink composition, and the integrated light meter UIT-201 of the light-receiver UVD-365PD manufactured by the Ushio motor (unit) is mounted. The measurement is preferably from about 10 mJ/cm 2 to about 1,000 mJ/cm 2 , more preferably from about 20 mJ/cm 2 to about 800 mJ/cm 2 , and more preferably from about 40 mJ/cm 2 to about 500 mJ/cm 2 . . Further, the wavelength of the ultraviolet ray or the visible ray to be irradiated is preferably from 250 nm to 500 nm, more preferably from 300 nm to 450 nm.

此外,曝光機只要是搭載高壓水銀燈、超高壓水銀燈、金屬鹵化物燈、鹵素燈等,以250 nm~500 nm的範圍照射紫外線或可見光等的裝置,則並無特別限定。In addition, the exposure apparatus is not particularly limited as long as it is a device that emits ultraviolet light or visible light in a range of 250 nm to 500 nm, such as a high-pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, or a halogen lamp.

另外,視需要,亦可對藉由光的照射而硬化的上述硬化膜進一步加熱、煅燒,尤其較佳為於100℃~250℃下加熱10分鐘~60分鐘,更佳為於120℃~230℃下加熱10分鐘~60分鐘,尤佳為於150℃~200℃下加熱10分鐘~60分鐘。藉由進行加熱、煅燒,可使硬化膜更牢固地硬化。具體而言,認為藉由該加熱、煅燒,化合物(A)與化合物(B)進行反應,藉此認為,形成上述化合物(A)聚合而成的多個鏈以化合物(B)連結的牢固網眼結構。Further, the cured film which is hardened by irradiation with light may be further heated and calcined as needed, and it is particularly preferably heated at 100 ° C to 250 ° C for 10 minutes to 60 minutes, more preferably at 120 ° C to 230 ° The mixture is heated at ° C for 10 minutes to 60 minutes, and more preferably at 150 ° C to 200 ° C for 10 minutes to 60 minutes. The cured film can be hardened more firmly by heating and calcining. Specifically, it is considered that the compound (A) and the compound (B) are reacted by heating or calcination, and it is considered that a solid network in which a plurality of chains obtained by polymerizing the above compound (A) are linked by a compound (B) is considered. Eye structure.

本發明可使用的塗佈本發明墨水組成物的「基板」只要是可成為塗佈本發明墨水組成物的對象的基板,則並無特別限定,其形狀並不限定於平板狀,亦可為曲面狀。The "substrate" to which the ink composition of the present invention can be applied in the present invention is not particularly limited as long as it can be a target to which the ink composition of the present invention is applied, and the shape thereof is not limited to a flat plate shape, and may be Curved.

另外,基板的材質並無特別限定,例如可列舉:聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)及聚對苯二甲酸丁二酯(polybutylene terephthalate,PBT)等聚酯系樹脂,聚乙烯及聚丙烯等聚烯烴樹脂,聚氯乙烯、氟樹脂、丙烯酸系樹脂、聚醯胺、聚碳酸酯及聚醯亞胺等塑膠膜,玻璃紙(cellophane)、乙酸酯、金屬箔、聚醯亞胺與金屬箔的積層膜,具有填充效果的透明紙(glassine paper)、羊皮紙(parchment paper),以及以聚乙烯、黏結料(clay binder)、聚乙烯基醇、澱粉或者羧基甲基纖維素(carboxy methyl cellulose,CMC)等進行填充處理的紙及玻璃。Further, the material of the substrate is not particularly limited, and examples thereof include polyester resins such as polyethylene terephthalate (PET) and polybutylene terephthalate (PBT). Polyolefin resin such as ethylene and polypropylene, plastic film such as polyvinyl chloride, fluororesin, acrylic resin, polyamide, polycarbonate and polyimine, cellophane, acetate, metal foil, polyfluorene A laminate film of imine and metal foil, a glasse paper with a filling effect, a parchment paper, and a polyethylene, a clay binder, a polyvinyl alcohol, a starch or a carboxymethyl cellulose. Paper and glass subjected to filling treatment such as (carboxy methyl cellulose, CMC).

該些構成基板的物質中,可於不對本發明的效果造成不良影響的範圍內,進一步含有顏料、染料、抗氧化劑、抗劣化劑、填充劑、紫外線吸收劑、抗靜電劑及/或抗電磁波劑等添加劑。另外,亦可於基板的表面的一部分形成與基板不同材質的覆蓋層或阻焊膜。Among the substances constituting the substrate, pigments, dyes, antioxidants, anti-deterioration agents, fillers, ultraviolet absorbers, antistatic agents, and/or anti-electromagnetic waves may be further contained within a range that does not adversely affect the effects of the present invention. Additives such as agents. Further, a coating layer or a solder resist film of a material different from the substrate may be formed on a part of the surface of the substrate.

基板的厚度並無特別限定,通常為10 μm~2 mm左右,是根據所使用的目的來適當調整,較佳為15 μm~500 μm,尤佳為20 μm~200 μm。The thickness of the substrate is not particularly limited, but is usually about 10 μm to 2 mm, and is appropriately adjusted depending on the purpose to be used, and is preferably 15 μm to 500 μm, and particularly preferably 20 μm to 200 μm.

當於基板上形成硬化膜時,視需要於上述硬化膜形成前,在上述基板面上實施撥水處理、電暈處理、電漿處理、或者噴砂處理等易黏著處理,亦可於表面設置易黏著層或彩色濾光片用保護膜。When the cured film is formed on the substrate, the water-repellent treatment, the corona treatment, the plasma treatment, or the sandblasting treatment may be performed on the surface of the substrate before the formation of the cured film as needed, and the surface may be easily disposed. Protective film for adhesive layer or color filter.

上述基板的用途並無特別限定,由本發明的噴墨用光硬化性墨水組成物所獲得的硬化膜由於耐鍍敷性、耐熱性、與基板的密著性及阻燃性優異,故而較佳為用於製造於在基板表面具有金屬製電路的電子電路基板上安裝IC晶片等而成的電子零件等。The use of the substrate is not particularly limited, and the cured film obtained from the photocurable ink composition for inkjet according to the present invention is excellent in plating resistance, heat resistance, adhesion to a substrate, and flame retardancy. An electronic component or the like obtained by mounting an IC wafer or the like on an electronic circuit board having a metal circuit on the surface of the substrate.

形成上述電路的金屬並無特別限定,較佳為金、銀、銅、鋁或氧化銦錫(indium tin oxide,ITO)。於包含該些金屬的配線所形成的基板上,利用噴墨裝置將本發明的墨水組成物塗佈成規定的圖案狀,並使其硬化,如此獲得的硬化膜具有作為上述配線的覆蓋膜的功能。The metal forming the above circuit is not particularly limited, and is preferably gold, silver, copper, aluminum or indium tin oxide (ITO). The ink composition of the present invention is applied to a predetermined pattern by an inkjet device on a substrate formed of a wiring including the metal, and is cured. The cured film thus obtained has a cover film as the wiring. Features.

此種於基板表面形成電路,且於該基板及電路上的至少一部分形成上述硬化膜而成的電子電路基板亦包含於本發明的範圍內。另外,作為覆蓋膜等而發揮功能的上述硬化膜的厚度並無特別限定,通常為5 μm~50 μm。Such an electronic circuit board in which a circuit is formed on the surface of the substrate and at least a part of the substrate and the circuit are formed with the cured film is also included in the scope of the present invention. Further, the thickness of the cured film which functions as a cover film or the like is not particularly limited, but is usually 5 μm to 50 μm.

藉由在以上述方式製造的本發明的電子電路基板上安裝IC晶片、電容器、電阻、保險絲等,可製作例如液晶顯示元件或者EL顯示元件用電子零件。By mounting an IC chip, a capacitor, a resistor, a fuse, or the like on the electronic circuit board of the present invention manufactured as described above, for example, a liquid crystal display element or an electronic component for an EL display element can be produced.

[實例][Example]

以下,藉由實例對本發明進一步進行說明,但本發明不受該些實例的限定。Hereinafter, the present invention will be further illustrated by examples, but the present invention is not limited by the examples.

首先,對實例1~實例4以及比較例2、比較例3及比較例5中使用的化合物的合成方法進行說明,接著對使用該化合物的噴墨用光硬化性墨水組成物的製備以及使用其而獲得的硬化膜圖案形成基板進行說明。First, a method of synthesizing the compounds used in Examples 1 to 4 and Comparative Example 2, Comparative Example 3, and Comparative Example 5 will be described. Next, preparation and use of the photocurable ink composition for inkjet using the compound will be described. The obtained cured film pattern forming substrate will be described.

〈通式(1)所表示的化合物(A)的合成〉<Synthesis of Compound (A) Represented by General Formula (1)>

[合成例][Synthesis example]

向50 mL茄型燒瓶中,添加β-丙胺酸0.15 mol(13.29 g)(東京化成工業(股)製造)及甲基順丁烯二酸酐0.15 mol(16.72 g)(東京化成工業(股)製造),於150℃下攪拌3小時。攪拌後,向50 mL茄型燒瓶中添加甲苯,一邊去除反應所產生的水一邊回流1小時。To a 50 mL eggplant type flask, 0.15 mol (13.29 g) of β-alanine (manufactured by Tokyo Chemical Industry Co., Ltd.) and 0.15 mol (16.72 g) of methyl maleic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.) were added. ), stirring at 150 ° C for 3 hours. After stirring, toluene was added to a 50 mL eggplant type flask, and the water generated by the reaction was removed while refluxing for 1 hour.

去除水後,使用旋轉蒸發器自反應液中去除甲苯,藉此獲得下述式所表示的化合物(以下稱為「化合物A1」)27.37 g。After the water was removed, toluene was removed from the reaction liquid using a rotary evaporator, whereby 27.37 g of a compound represented by the following formula (hereinafter referred to as "compound A1") was obtained.

〈下述式(2)所表示的化合物的合成〉<Synthesis of a compound represented by the following formula (2)>

[比較合成例][Comparative Synthesis Example]

於N,N-二甲基甲醯胺320 ml中,溶解順丁烯二酸酐1.0 mol(98.1 g)(東京化成工業(股)製造)及對胺基苯甲酸1.0 mol(137.1 g)(東京化成工業(股)製造),於氮氣環境下,將所得的溶液於室溫下攪拌5小時。攪拌後,將上述溶液添加於大量的水中,使反應生成物沈澱。將該沈澱物過濾、乾燥,於水中進行再結晶而純化。Dissolved maleic anhydride 1.0 mol (98.1 g) (manufactured by Tokyo Chemical Industry Co., Ltd.) and p-aminobenzoic acid 1.0 mol (137.1 g) in 320 ml of N,N-dimethylformamide Chemical Industry Co., Ltd.), the resulting solution was stirred at room temperature for 5 hours under a nitrogen atmosphere. After stirring, the above solution was added to a large amount of water to precipitate a reaction product. The precipitate was filtered, dried, and purified by recrystallization in water.

接著,向該純化物0.2 mol(43.5 g)中添加乙酸酐100 mL、乙酸鈉2.5 g,將所得的混合液於55℃~60℃下攪拌2小時。攪拌後,將上述混合液添加於大量的水中,使反應生成物沈澱。將所得的沈澱物過濾、水洗、乾燥,於甲醇-水(V/V=6/1)的混合溶液中進行再結晶,獲得作為目標的化合物(下述式(2)所表示的化合物,以下稱為「化合物MI」)37.0 g。Next, 100 mL of acetic anhydride and 2.5 g of sodium acetate were added to 0.2 mol (43.5 g) of the purified product, and the resulting mixed solution was stirred at 55 ° C to 60 ° C for 2 hours. After stirring, the above mixture was added to a large amount of water to precipitate a reaction product. The obtained precipitate was filtered, washed with water, dried, and recrystallized in a mixed solution of methanol-water (V/V = 6/1) to obtain the target compound (the compound represented by the following formula (2), the following Called "Compound MI" 37.0 g.

〈噴墨用光硬化性墨水組成物及硬化膜圖案形成基板的製作〉<Production of Photocurable Ink Composition for Inkjet and Cured Film Pattern Forming Substrate>

接著,對實例1~實例4及比較例1~比較例6中製作的噴墨用光硬化性墨水組成物以及使用其而獲得的硬化膜圖案形成基板進行說明。Next, the photocurable ink composition for inkjet produced in Examples 1 to 4 and Comparative Examples 1 to 6 and the cured film pattern forming substrate obtained using the same will be described.

[實例1][Example 1]

將作為化合物(A)的上述合成例中合成的化合物A1、作為化合物(B)的雙酚A型環氧化合物Epikote 828(商品名,三菱化學(股)製造)、作為化合物(C)的甲基丙烯酸2-羥基乙酯(商品名:東京化成(股)製造,以下稱為HEMA)、作為光聚合起始劑(D)的2,4,6-三甲基苯甲醯基二苯基氧化膦DAROCUR TPO(商品名,BASF Japan(股)製造)、作為聚合抑制劑的吩噻嗪,以下述組成比例混合、溶解後,將所得的組成物利用1 μm的PTFE製薄膜過濾器進行過濾,製備噴墨用光硬化性墨水組成物1。Compound A1 synthesized in the above synthesis example of the compound (A), bisphenol A type epoxy compound Epikote 828 (trade name, manufactured by Mitsubishi Chemical Corporation) as the compound (B), and A as the compound (C) 2-hydroxyethyl acrylate (trade name: manufactured by Tokyo Chemical Industry Co., Ltd., hereinafter referred to as HEMA), 2,4,6-trimethylbenzimidyl diphenyl as photopolymerization initiator (D) Phosphine oxide DAROCUR TPO (trade name, manufactured by BASF Japan Co., Ltd.) and phenothiazine as a polymerization inhibitor were mixed and dissolved in the following composition ratio, and the obtained composition was filtered through a 1 μm PTFE membrane filter. A photocurable ink composition 1 for inkjet was prepared.

(A) 化合物Al 0.6000 g(A) Compound Al 0.6000 g

(B) Epikote 828 0.6000 g(B) Epikote 828 0.6000 g

(C) HEMA 0.8000 g(C) HEMA 0.8000 g

(D) TPO 0.1000 g(D) TPO 0.1000 g

其他 吩噻嗪 0.0010 gOther phenothiazine 0.0010 g

使用E型黏度計(東機產業(股)製造的TV-22,以下相同),測定25℃下的上述墨水組成物1的黏度,結果黏度為111 mPa‧s。The viscosity of the above ink composition 1 at 25 ° C was measured using an E-type viscometer (TV-22 manufactured by Toki Sangyo Co., Ltd., the same applies hereinafter), and the viscosity was 111 mPa·s.

將墨水組成物1注入至噴墨盒中,將噴墨盒安裝於噴墨裝置(FUJI FILM Dimatix公司製造的DMP-2831)上,使用10 pl用噴頭,以噴出電壓(壓電電壓)為16 V、噴頭溫度為70℃、驅動頻率為5 kHz、塗佈次數為1次的噴出條件,於在聚醯亞胺上積層有銅箔的厚度為35 μm的覆銅積層板Veloflex(商品名,東洋紡織(股)製造)的銅表面上形成規定的圖案。The ink composition 1 was injected into an ink jet cartridge, and the ink jet cartridge was mounted on an ink jet apparatus (DMP-2831 manufactured by FUJI FILM Dimatix Co., Ltd.), and a discharge voltage (piezoelectric voltage) was 16 using a 10 pl nozzle. V, the nozzle temperature is 70 ° C, the driving frequency is 5 kHz, the number of coating times is 1 time, and the copper-clad laminate Veloflex (trade name, having a copper foil thickness of 35 μm) is laminated on the polyimide. A predetermined pattern is formed on the copper surface of Toyobo Co., Ltd.

於使用墨水組成物1而形成圖案的基板上,以250 mJ/cm2 的UV曝光量照射波長為365 nm的紫外線後,於190℃下加熱硬化30分鐘,藉此獲得形成有厚度為13 μm的硬化膜圖案的基板1。On the substrate patterned using the ink composition 1, ultraviolet rays having a wavelength of 365 nm were irradiated with a UV exposure amount of 250 mJ/cm 2 , and then heat-hardened at 190 ° C for 30 minutes, thereby obtaining a thickness of 13 μm. The cured film pattern of the substrate 1.

[實例2][Example 2]

實例1中,除了進一步添加二丙二醇二丙烯酸酯SR508(商品名,Sartomer Japan(股)製造)作為化合物(C)而成為下述組成比例以外,以與實例1相同的方法製備噴墨用光硬化性墨水組成物2。In Example 1, except that dipropylene glycol diacrylate SR508 (trade name, manufactured by Sartomer Japan Co., Ltd.) was further added as the compound (C) to have the following composition ratio, photohardening for inkjet was prepared in the same manner as in Example 1. Ink composition 2.

(A) 化合物A1 0.6000 g(A) Compound A1 0.6000 g

(B) Epikote 828 0.6000 g(B) Epikote 828 0.6000 g

(C) HEMA 0.8000 g(C) HEMA 0.8000 g

(C) SR508 0.4000 g(C) SR508 0.4000 g

(D) TPO 0.1200 g(D) TPO 0.1200 g

其他 吩噻嗪 0.0012 gOther phenothiazine 0.0012 g

使用E型黏度計來測定25℃下的上述墨水組成物2的黏度,結果黏度為85 mPa‧s。The viscosity of the above ink composition 2 at 25 ° C was measured using an E-type viscometer, and as a result, the viscosity was 85 mPa ‧ s.

使用墨水組成物2,以與實例1相同的方法獲得形成有厚度為12 μm的硬化膜圖案的基板2。Using the ink composition 2, a substrate 2 formed with a cured film pattern having a thickness of 12 μm was obtained in the same manner as in Example 1.

[實例3][Example 3]

實例1中,除了添加縮合9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物HFA-3003(昭和電工(股)製造)作為阻燃劑(E)而成為下述組成比例以外,以與實例1相同的方法製備噴墨用光硬化性墨水組成物3。In Example 1, except that the condensed 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide HFA-3003 (manufactured by Showa Denko Co., Ltd.) was added as a flame retardant (E) A photocurable ink composition 3 for inkjet was prepared in the same manner as in Example 1 except for the composition ratio.

(A) 化合物A1 0.6000 g(A) Compound A1 0.6000 g

(B) Epikote 828 0.6000 g(B) Epikote 828 0.6000 g

(C) HEMA 0.8000 g(C) HEMA 0.8000 g

(D) TPO 0.1200 g(D) TPO 0.1200 g

(E) HFA-3003 0.4000 g(E) HFA-3003 0.4000 g

其他 吩噻嗪 0.0012 gOther phenothiazine 0.0012 g

使用E型黏度計來測定25℃下的上述墨水組成物3的黏度,結果黏度為135 mPa‧s。The viscosity of the above ink composition 3 at 25 ° C was measured using an E-type viscometer, and as a result, the viscosity was 135 mPa ‧ s.

使用墨水組成物3,以與實例1相同的方法獲得形成有厚度為15 μm的硬化膜圖案的基板3。Using the ink composition 3, a substrate 3 formed with a cured film pattern having a thickness of 15 μm was obtained in the same manner as in Example 1.

[實例4][Example 4]

實例1中,除了添加羥甲基三聚氰胺樹脂Nikalac MW-30(商品名,Sanwa Chemical(股)製造)作為化合物(F)而成為下述組成比例以外,以與實例1相同的方法製備噴墨用光硬化性墨水組成物4。In Example 1, an inkjet was prepared in the same manner as in Example 1 except that the methylol melamine resin Nikalac MW-30 (trade name, manufactured by Sanwa Chemical Co., Ltd.) was added as the compound (F) to have the following composition ratio. Photocurable ink composition 4.

(A) 化合物A1 0.6000 g(A) Compound A1 0.6000 g

(B) Epikote 828 0.6000 g(B) Epikote 828 0.6000 g

(C) HEMA 0.8000 g(C) HEMA 0.8000 g

(D) TPO 0.1200 g(D) TPO 0.1200 g

(F) Nikalac MW-30 0.4000 g(F) Nikalac MW-30 0.4000 g

其他 吩噻嗪 0.0012 gOther phenothiazine 0.0012 g

使用E型黏度計來測定25℃下的墨水組成物4的黏度,結果黏度為125 mPa‧s。The viscosity of the ink composition 4 at 25 ° C was measured using an E-type viscometer, and as a result, the viscosity was 125 mPa ‧ s.

使用墨水組成物4,以與實例1相同的方法獲得形成有厚度為13 μm的硬化膜圖案的基板4。Using the ink composition 4, a substrate 4 formed with a cured film pattern having a thickness of 13 μm was obtained in the same manner as in Example 1.

[比較例1][Comparative Example 1]

實例1中,除了不使用化合物A1而成為下述組成比例以外,以與實例1相同的方法製備噴墨用光硬化性墨水組成物5。In Example 1, a photocurable ink composition 5 for inkjet was prepared in the same manner as in Example 1 except that the compound A1 was used instead of the following composition ratio.

(B) Epikote 828 0.6000 g(B) Epikote 828 0.6000 g

(C) HEMA 0.8000 g(C) HEMA 0.8000 g

(D) TPO 0.0700 g(D) TPO 0.0700 g

其他 吩噻嗪 0.0007 gOther phenothiazine 0.0007 g

使用E型黏度計來測定25℃下的墨水組成物5的黏度,結果黏度為61 mPa‧s。The viscosity of the ink composition 5 at 25 ° C was measured using an E-type viscometer, and as a result, the viscosity was 61 mPa ‧ s.

使用墨水組成物5,以與實例1相同的方法獲得形成有厚度為11 μm的硬化膜圖案的基板5。Using the ink composition 5, a substrate 5 formed with a cured film pattern having a thickness of 11 μm was obtained in the same manner as in Example 1.

[比較例2][Comparative Example 2]

實例1中,除了不使用Epikote 828而成為下述組成比例以外,以與實例1相同的方法製備噴墨用光硬化性墨水組成物6。In Example 1, a photocurable ink composition 6 for inkjet was prepared in the same manner as in Example 1 except that the following composition ratio was used without using Epikote 828.

(A) 化合物A1 0.6000 g(A) Compound A1 0.6000 g

(C) HEMA 0.8000 g(C) HEMA 0.8000 g

(D) TPO 0.0700 g(D) TPO 0.0700 g

其他 吩噻嗪 0.0007 gOther phenothiazine 0.0007 g

使用E型黏度計來測定25℃下的墨水組成物6的黏度,結果黏度為73 mPa‧s。The viscosity of the ink composition 6 at 25 ° C was measured using an E-type viscometer, and as a result, the viscosity was 73 mPa·s.

使用墨水組成物6,以與實例1相同的方法獲得形成有厚度為12 μm的硬化膜圖案的基板6。Using the ink composition 6, a substrate 6 formed with a cured film pattern having a thickness of 12 μm was obtained in the same manner as in Example 1.

[比較例3][Comparative Example 3]

實例1中,除了將各成分的調配比例設為下述組成比例以外,以與實例1相同的方法製備噴墨用光硬化性墨水組成物7。In Example 1, a photocurable ink composition for inkjet 7 was prepared in the same manner as in Example 1 except that the blending ratio of each component was set to the following composition ratio.

(A) 化合物A1 0.6000 g(A) Compound A1 0.6000 g

(B) Epikote 828 0.6000 g(B) Epikote 828 0.6000 g

(C) HEMA 0.2000 g(C) HEMA 0.2000 g

(D) TPO 0.0700 g(D) TPO 0.0700 g

其他 吩噻嗪 0.0007 gOther phenothiazine 0.0007 g

使用E型黏度計來測定25℃下的墨水組成物7的黏度,結果黏度為255 mPa‧s。The viscosity of the ink composition 7 at 25 ° C was measured using an E-type viscometer, and as a result, the viscosity was 255 mPa ‧ s.

使用墨水組成物7,以與實例1相同的方法嘗試進行噴墨印刷,但噴射性差,無法形成規定的圖案,因此後述的其後試驗中斷。Using the ink composition 7, inkjet printing was attempted in the same manner as in Example 1, but the ejection property was poor, and a predetermined pattern could not be formed. Therefore, the subsequent test described later was interrupted.

[比較例4][Comparative Example 4]

實例1中,除了使用2-甲基丙烯醯氧基乙基鄰苯二甲酸CB-1(商品名,新中村化學工業(股)製造)作為化合物A1的代替物而成為下述組成比例以外,以與實例1相同的方法製備噴墨用光硬化性墨水組成物8。In the example 1, except that 2-methylpropenyloxyethylphthalic acid CB-1 (trade name, manufactured by Shin-Nakamura Chemical Co., Ltd.) was used as a substitute for the compound A1, the following composition ratio was obtained. A photocurable ink composition 8 for inkjet was prepared in the same manner as in Example 1.

CB-1 0.6000 gCB-1 0.6000 g

(B) Epikote 828 0.6000 g(B) Epikote 828 0.6000 g

(C) HEMA 0.8000 g(C) HEMA 0.8000 g

(D) TPO 0.1200 g(D) TPO 0.1200 g

其他 吩噻嗪 0.0012 gOther phenothiazine 0.0012 g

使用E型黏度計來測定25℃下的墨水組成物8的黏度,結果黏度為89 mPa‧s。The viscosity of the ink composition 8 at 25 ° C was measured using an E-type viscometer, and as a result, the viscosity was 89 mPa·s.

使用墨水組成物8,以與實例1相同的方法獲得形成有厚度為12 μm的硬化膜圖案的基板8。Using the ink composition 8, a substrate 8 formed with a cured film pattern having a thickness of 12 μm was obtained in the same manner as in Example 1.

[比較例5][Comparative Example 5]

實例1中,使用上述比較合成例中合成的化合物MI作為化合物A1的代替物,但MI不溶解於其他成分中,無法獲得墨水組成物,因此後述的其後試驗中斷。In Example 1, the compound MI synthesized in the above comparative synthesis example was used as a substitute for the compound A1. However, MI was not dissolved in other components, and the ink composition could not be obtained. Therefore, the subsequent test described later was interrupted.

[比較例6][Comparative Example 6]

實例1中,除了使用N-環己基順丁烯二醯亞胺Imilex-C(商品名,(股)日本觸媒製造)作為化合物A1的代替物而成為下述組成比例以外,以與實例1相同的方法製備噴墨用光硬化性墨水組成物10。In Example 1, except that N-cyclohexylmethyleneimineimine Imilex-C (trade name, manufactured by Nippon Shokubai Co., Ltd.) was used as a substitute for the compound A1 to have the following composition ratio, The photocurable ink composition 10 for inkjet was prepared in the same manner.

Imilex-C 0.6000 gImilex-C 0.6000 g

(B) Epikote 828 0.6000 g(B) Epikote 828 0.6000 g

(C) HEMA 0.8000 g(C) HEMA 0.8000 g

(D) TPO 0.1200 g(D) TPO 0.1200 g

其他 吩噻嗪 0.0012 gOther phenothiazine 0.0012 g

使用E型黏度計來測定25℃下的墨水組成物10的黏度,結果黏度為92 mPa‧s。The viscosity of the ink composition 10 at 25 ° C was measured using an E-type viscometer, and as a result, the viscosity was 92 mPa ‧ s.

使用墨水組成物10,以與實例1相同的方法獲得形成有厚度為12 μm的硬化膜圖案的基板10。Using the ink composition 10, a substrate 10 formed with a cured film pattern having a thickness of 12 μm was obtained in the same manner as in Example 1.

〈噴墨用光硬化性墨水組成物及圖案狀硬化膜的評價〉<Evaluation of Photocurable Ink Composition and Patterned Cured Film for Inkjet>

於上述硬化膜圖案形成基板的製作時、及製作後,對噴墨用光硬化性墨水組成物的噴射性及光硬化性,以及硬化膜的耐鍍敷性、與基板的密著性、阻燃性及耐熱性進行評價。各試驗方法如下所述,將評價結果示於後述表1。In the production of the cured film pattern forming substrate, and after the production, the inkjet photocurable ink composition is sprayable and photocurable, and the cured film is resistant to plating, adhesion to the substrate, and resistance. Evaluation of flammability and heat resistance. Each test method is as follows, and the evaluation results are shown in Table 1 below.

(墨水組成物的噴射性的評價)(Evaluation of the ejection properties of the ink composition)

觀察各實例及比較例中獲得的(比較例5除外)基板上的圖案的混亂、印刷的飛白,評價墨水組成物的噴射性。評價基準如下所述。The disorder of the pattern on the substrate (except Comparative Example 5) obtained in each of the examples and the comparative examples and the whitening of the printing were observed, and the ejection properties of the ink composition were evaluated. The evaluation criteria are as follows.

○:圖案的混亂、印刷的飛白完全未產生。○: The disorder of the pattern and the whiteness of the printing were not produced at all.

△:圖案的混亂、印刷的飛白產生少量。△: The pattern is confusing, and the whiteness of printing is small.

×:圖案的混亂、印刷的飛白多。×: The pattern is confusing, and the printing is white.

(墨水的光硬化性的評價)(Evaluation of light hardenability of ink)

對各實例及比較例中獲得的基板(基板1~基板6、基板8、基板10)進行UV曝光(500 mJ/cm2 )後,以手指觸摸表面,對硬化膜的表面狀態進行顯微鏡觀察。評價基準如下所述。此外,UV曝光所使用的光源為Harison Toshiba Lighting(股)公司製造的金屬鹵化物燈MJ-1500L,曝光量是利用安裝有Ushio電機(股)製造的受光器UVD-365PD的累計光量計UIT-201來測定。After UV exposure (500 mJ/cm 2 ) of the substrate (substrate 1 to substrate 6, substrate 8 and substrate 10) obtained in each of the examples and the comparative examples, the surface was touched with a finger, and the surface state of the cured film was observed under a microscope. The evaluation criteria are as follows. In addition, the light source used for UV exposure was a metal halide lamp MJ-1500L manufactured by Harison Toshiba Lighting Co., Ltd., and the exposure amount was a cumulative light meter UIT- using a light receiver UVD-365PD manufactured by Ushio motor (stock). 201 to determine.

◎:硬化膜表面完全未殘留手指觸摸痕跡。◎: There is no fingerprint touch on the surface of the cured film at all.

○:硬化膜表面僅殘留少許手指觸摸痕跡。○: Only a small amount of finger touch marks remained on the surface of the cured film.

△:硬化膜表面完全殘留手指觸摸痕跡。△: Finger touch marks were completely left on the surface of the cured film.

×:完全未硬化。×: Not hardened at all.

(耐鍍敷性的評價)(Evaluation of plating resistance)

將各實例及比較例中獲得的(比較例3及比較例5除外)硬化膜圖案形成基板,於30℃的鈀水溶液(商品名:KA'T-450,Pd濃度為12 mg/L,上村工業(股)製造)中浸漬1分鐘進行水洗後,於80℃的無電解鍍鎳液(商品名:Nimuden NPR-4,Ni濃度為4.5 g/L,上村工業(股)製造)中浸漬30分鐘進行水洗,然後對硬化膜的表面狀態進行顯微鏡觀察。The cured film pattern forming substrate obtained in each of the examples and the comparative examples (excluding Comparative Example 3 and Comparative Example 5) was poured into a palladium aqueous solution at 30 ° C (trade name: KA'T-450, Pd concentration was 12 mg/L, Shangcun After immersing for 1 minute in industrial (manufactured), it was immersed in an electroless nickel plating solution (trade name: Nimuden NPR-4, Ni concentration: 4.5 g/L, manufactured by Uemura Industrial Co., Ltd.) at 80 ° C for 30 minutes. The water was washed in minutes, and then the surface state of the cured film was observed under a microscope.

其後,繼而使硬化膜圖案形成基板在80℃的無電解鍍金液(商品名:Goblite TAM-55,Au濃度為1 g/L,上村工業(股)製造)中浸漬10分鐘而進行水洗後,進行同樣的觀察。評價基準如下所述。Thereafter, the cured film pattern forming substrate was immersed in an electroless gold plating solution (trade name: Goblite TAM-55, Au concentration: 1 g/L, manufactured by Uemura Industrial Co., Ltd.) at 80 ° C for 10 minutes, and then washed with water. , do the same observation. The evaluation criteria are as follows.

◎:硬化膜上完全未看到鼓起或剝落、變色。◎: No swelling or discoloration or discoloration was observed on the cured film.

○:硬化膜上雖看到少許變色,但完全無鼓起或剝落。○: Although a little discoloration was observed on the cured film, there was no swelling or peeling at all.

△:硬化膜上看到很多鼓起或剝落、變色。△: Many bulging or peeling and discoloration were observed on the cured film.

×:硬化膜完全剝落。×: The cured film was completely peeled off.

(密著性的評價)(evaluation of adhesion)

為了對各實例及比較例中獲得的(比較例3及比較例5除外)硬化膜圖案形成基板評價硬化膜的與覆銅積層板的密著性,而實施網格法(JIS K 5400(1990)),調查硬化膜是否產生剝離。該試驗是於溫度為25℃、濕度為65%的條件下進行。評價基準如下所述。In order to evaluate the adhesion of the cured film to the copper-clad laminate in the cured film pattern forming substrate obtained in each of the examples and the comparative examples (excluding Comparative Example 3 and Comparative Example 5), the mesh method was carried out (JIS K 5400 (1990). )), investigate whether the cured film is peeled off. The test was carried out under the conditions of a temperature of 25 ° C and a humidity of 65%. The evaluation criteria are as follows.

◎:100個中1個也未剝落。◎: One of the 100 was not peeled off.

○:100個中1個~20個剝落。○: One to 20 of 100 were peeled off.

△:100個中21個~50個剝落。△: 21 to 50 of 100 were peeled off.

×:100個中51個~100個剝落。×: 51 to 100 peeling off of 100.

(阻燃性的評價)(evaluation of flame retardancy)

為了對由噴墨用光硬化性墨水組成物所獲得的硬化膜評價阻燃性,於作為聚醯亞胺膜(厚度為50 μm)的Kapton 200H(Toray DuPont(股)製造)上,使用敷料器以膜厚成為25 μm的方式將各實例及比較例中獲得的(比較例3及比較例5除外)墨水組成物塗佈於表面,以500 mJ/cm2 的曝光量照射波長為365 nm的紫外線,於200℃下煅燒30分鐘,製成硬化膜。In order to evaluate the flame retardancy of the cured film obtained from the photocurable ink composition for inkjet, a dressing was used on a Kapton 200H (manufactured by Toray DuPont Co., Ltd.) as a polyimide film (thickness: 50 μm). The ink composition obtained in each of the examples and the comparative examples (excluding Comparative Example 3 and Comparative Example 5) was applied to the surface so that the film thickness was 25 μm, and the irradiation wavelength was 365 nm at an exposure amount of 500 mJ/cm 2 . The ultraviolet rays were calcined at 200 ° C for 30 minutes to form a cured film.

進而,於聚醯亞胺膜的背面亦與表面同樣地製成硬化膜,製成試驗片。將該製成的試驗片切取成寬50 mm、長200 mm的大小,依據UL-94的VTM試驗將試驗片捲成筒狀,製成燃燒試驗用樣品。Further, a cured film was formed on the back surface of the polyimide film in the same manner as the surface to prepare a test piece. The prepared test piece was cut into a size of 50 mm in width and 200 mm in length, and the test piece was wound into a cylindrical shape in accordance with the VTM test of UL-94 to prepare a sample for combustion test.

使高度為20 mm的火焰與該燃燒試驗用樣品接近3秒,將離開火焰後在5秒以內熄滅,火焰未達到125 mm高度的情況記作「◎」,將不符合◎評價,離開火焰後在10秒以內熄滅,火焰未達到125 mm高度的情況記作「○」,將不符合○評價,離開火焰後至熄滅為止花費10秒~1分鐘、或火焰達到125 mm高度的情況記作「△」,將不符合△評價,離開火焰後即便經過1分鐘亦不熄滅、或者即便經過1分鐘亦不熄滅且火焰達到125 mm高度的情況記作「×」。The flame with a height of 20 mm is made close to the sample for the combustion test for 3 seconds, and will be extinguished within 5 seconds after leaving the flame. The case where the flame does not reach the height of 125 mm is recorded as "◎", which will not meet the evaluation of ◎, after leaving the flame If it is extinguished within 10 seconds and the flame does not reach the height of 125 mm, it is marked as "○". It will not meet the ○ evaluation. It takes 10 seconds to 1 minute after the flame is extinguished, and the flame reaches the height of 125 mm. △", which does not meet the △ evaluation, does not extinguish even after one minute after leaving the flame, or does not extinguish even after one minute, and the flame reaches a height of 125 mm, which is called "X".

此外,該評價是依據UL-94的薄壁材料的垂直燃燒試驗進行評價,「◎」或「○」的情況相當於VTM-0。In addition, this evaluation was evaluated based on the vertical burning test of the thin-walled material of UL-94, and the case of "◎" or "○" corresponded to VTM-0.

(耐熱性的評價)(Evaluation of heat resistance)

將各實例及比較例(比較例3及比較例5除外)中獲得的基板的硬化膜分別切取10 mg,對其利用熱重/差熱分析(thermogravimetry/differential thermal analysis,TG/DTA)裝置(TG/DTA6200,SII Nanotechnology(股)製造)進行熱重量的測定。耐熱性的評價結果是以5%重量減少時的溫度來表示。The cured film of the substrate obtained in each of the examples and the comparative examples (excluding Comparative Example 3 and Comparative Example 5) was cut out to 10 mg, respectively, and subjected to a thermogravimetry/differential thermal analysis (TG/DTA) apparatus ( TG/DTA6200, manufactured by SII Nanotechnology Co., Ltd.) The measurement of the thermal weight was carried out. The evaluation result of heat resistance is represented by the temperature at which 5% weight is reduced.

此外,於將上述硬化膜用作覆蓋膜的情況,要求5%重量減少時溫度僅成為300℃以上的耐熱性。Further, in the case where the above-mentioned cured film is used as a cover film, it is required that the temperature is only 300 ° C or higher when the weight is reduced by 5%.

將以上的評價試驗的結果示於表1。The results of the above evaluation tests are shown in Table 1.

由表1所示的結果所明示,使用本發明的噴墨用光硬化性墨水組成物而獲得的基板1~基板4、以及使用比較例的噴墨用光硬化性墨水組成物而獲得的基板5、基板6、基板8、基板10上,完全未看到圖案的混亂、印刷的飛白,噴射性良好。The substrate 1 to the substrate 4 obtained by using the photocurable ink composition for inkjet of the present invention and the substrate obtained by using the photocurable ink composition for inkjet of the comparative example are shown by the results shown in Table 1. 5. On the substrate 6, the substrate 8, and the substrate 10, no disorder of the pattern and whitening of the printing were observed at all, and the ejection property was good.

另一方面,化合物(C)的添加量少且25℃下的黏度高至255 mPa‧s的比較例3的噴墨用光硬化性墨水組成物7,其噴出性差,印刷圖案的混亂、飛白多,未獲得均勻的膜。因此,噴射性以外的評價中斷。On the other hand, the inkjet photocurable ink composition 7 of Comparative Example 3 in which the amount of the compound (C) is small and the viscosity at 25 ° C is as high as 255 mPa ‧ is poor in discharge property, and the printing pattern is disordered and whitened. More, no uniform film was obtained. Therefore, the evaluation other than the ejection property is interrupted.

接著,對基板1~基板4、基板5、基板6、基板8、基板10的光硬化性、耐鍍鎳性、耐鍍金性進行評價,結果為基板1~基板4良好。與此相對,基板5、基板6在鍍Ni處理後,硬化膜完全剝離,基板8、基板10在鍍Au處理後,硬化膜上看到很多鼓起、變色。Then, the photocurability, the nickel plating resistance, and the gold plating resistance of the substrate 1 to the substrate 4, the substrate 5, the substrate 6, the substrate 8, and the substrate 10 were evaluated. As a result, the substrate 1 to the substrate 4 were good. On the other hand, after the Ni plating treatment on the substrate 5 and the substrate 6, the cured film was completely peeled off, and after the Au plating treatment on the substrate 8 and the substrate 10, a lot of swelling and discoloration were observed on the cured film.

密著性試驗亦是同樣地對基板1~基板4、基板5、基板6、基板8、基板10進行評價,結果為關於基板1~基板4的硬化膜,均未看到自覆銅積層板上的剝離,但基板5、基板6、基板8、基板10均為全部或者一部分剝離。In the adhesion test, the substrate 1 to the substrate 4, the substrate 5, the substrate 6, the substrate 8, and the substrate 10 were evaluated in the same manner. As a result, no self-clad copper laminate was observed for the cured films of the substrates 1 to 4. The upper layer is peeled off, but all of the substrate 5, the substrate 6, the substrate 8, and the substrate 10 are peeled off.

作為阻燃性試驗,使用噴墨用光硬化性墨水組成物1~噴墨用光硬化性墨水組成物4、噴墨用光硬化性墨水組成物5、噴墨用光硬化性墨水組成物6、噴墨用光硬化性墨水組成物8、噴墨用光硬化性墨水組成物10進行評價,結果為,墨水組成物1~墨水組成物4在離開火焰後10秒以內熄滅,火焰未達到125 mm高度。尤其是墨水組成物3在5秒以內熄滅,阻燃性非常良好。但是,墨水組成物5、墨水組成物6、墨水組成物8、墨水組成物10在接觸火焰後3秒以內,火焰達到125 mm以上的高度。進而,墨水組成物8、墨水組成物10在其後離開火焰後1分鐘以內熄滅,但墨水組成物5、墨水組成物6即便經過1分鐘以上亦不熄滅。As the flame retardancy test, the photocurable ink composition for inkjet 1 to the photocurable ink composition for inkjet 4, the photocurable ink composition for inkjet 5, and the photocurable ink composition for inkjet 6 are used. The photocurable ink composition 8 for inkjet and the photocurable ink composition 10 for inkjet were evaluated. As a result, the ink composition 1 to the ink composition 4 were extinguished within 10 seconds after leaving the flame, and the flame did not reach 125. Mm height. In particular, the ink composition 3 was extinguished within 5 seconds, and the flame retardancy was very good. However, the ink composition 5, the ink composition 6, the ink composition 8, and the ink composition 10 have a height of 125 mm or more within 3 seconds after contact with the flame. Further, the ink composition 8 and the ink composition 10 are extinguished within one minute after leaving the flame, but the ink composition 5 and the ink composition 6 are not extinguished even after one minute or more.

最後,作為耐熱性試驗,測定由基板1~基板4、基板5、基板6、基板8、基板10所獲得的硬化膜的5%重量減少時溫度,結果為由基板1~基板4所獲得的硬化膜均超過300℃,成為良好的結果。Finally, as a heat resistance test, the temperature at which the cured film obtained from the substrate 1 to the substrate 4, the substrate 5, the substrate 6, the substrate 8, and the substrate 10 was reduced by 5% was measured, and as a result, the substrate 1 to the substrate 4 were obtained. The cured film exceeded 300 ° C, which was a good result.

另一方面,由基板5、基板6、基板8、基板10所獲得的硬化膜,其5%重量減少時溫度無法達到300℃。On the other hand, the cured film obtained from the substrate 5, the substrate 6, the substrate 8, and the substrate 10 could not reach a temperature of 300 ° C when the weight was reduced by 5%.

如以上所說明,依據本發明,提供一種噴射性及光硬化性優異,可形成耐鍍敷性、對基板的密著性、阻燃性及耐熱性優異的硬化膜的噴墨用光硬化性墨水組成物。該組成物即便不添加水或有機溶劑,亦可噴射,因此作為材料設計容易且環境負荷小的墨水組成物有用。As described above, according to the present invention, it is possible to provide an inkjet photocurability of a cured film which is excellent in ejectability and photocurability and which is excellent in plating resistance, adhesion to a substrate, flame retardancy, and heat resistance. Ink composition. Since this composition can be ejected without adding water or an organic solvent, it is useful as an ink composition which is easy to design and has a small environmental load.

Claims (12)

一種噴墨用光硬化性墨水組成物,其特徵在於,包括:化合物(A),其以通式(1)表示: (通式(1)中,R為碳數1~100的二價有機基);以及化合物(B),其具有選自由環氧乙烷基及氧雜環丁基所組成組群中的至少1種官能基,並且上述噴墨用光硬化性墨水組成物於25℃下的黏度為200mPa‧s以下。A photocurable ink composition for inkjet, comprising: a compound (A) represented by the formula (1): (in the formula (1), R is a divalent organic group having 1 to 100 carbon atoms); and the compound (B) having at least one selected from the group consisting of an oxiranyl group and an oxetanyl group. One type of functional group, and the viscosity of the inkjet photocurable ink composition at 25 ° C is 200 mPa ‧ s or less. 如申請專利範圍第1項所述之噴墨用光硬化性墨水組成物,其中上述通式(1)中,R為碳數1~50的二價有機基。 The photocurable ink composition for inkjet according to claim 1, wherein in the above formula (1), R is a divalent organic group having 1 to 50 carbon atoms. 如申請專利範圍第2項所述之噴墨用光硬化性墨水組成物,其中上述通式(1)中,R為任意的不連續的-CH2 -可經醚鍵、酯鍵、醯胺鍵、胺基甲酸酯鍵或者羰基所取代的碳數1~50的伸烷基、碳數3~50的伸環烷基或者碳數6~50的伸芳基。The photocurable ink composition for inkjet according to claim 2, wherein in the above formula (1), R is an arbitrary discontinuous -CH 2 - may be an ether bond, an ester bond, or a guanamine The alkyl group having 1 to 50 carbon atoms, the alkylene group having 3 to 50 carbon atoms or the aryl group having 6 to 50 carbon atoms which are substituted by a bond, a urethane bond or a carbonyl group. 如申請專利範圍第3項所述之噴墨用光硬化性墨水 組成物,其中上述通式(1)中,R為碳數1~50的伸烷基。 Photocurable ink for inkjet according to item 3 of the patent application scope In the composition, in the above formula (1), R is an alkylene group having 1 to 50 carbon atoms. 如申請專利範圍第1項所述之噴墨用光硬化性墨水組成物,其中上述化合物(B)具有環氧乙烷基。 The photocurable ink composition for inkjet according to claim 1, wherein the compound (B) has an oxiranyl group. 如申請專利範圍第5項所述之噴墨用光硬化性墨水組成物,其中上述化合物(B)為環氧化合物,上述環氧化合物具有選自由苯酚酚醛型、甲酚酚醛型、雙酚A型、雙酚F型、氫化雙酚A型、氫化雙酚F型、雙酚S型、雙酚A酚醛型、三苯酚甲烷型、四苯酚乙烷型、聯二甲酚型、聯苯酚型、脂環型、雜環型、二環戊二烯型、或者萘型的結構所組成組群中的至少1種結構。 The photocurable ink composition for inkjet according to claim 5, wherein the compound (B) is an epoxy compound, and the epoxy compound has a phenol novolak type, a cresol novolac type, and a bisphenol A. Type, bisphenol F type, hydrogenated bisphenol A type, hydrogenated bisphenol F type, bisphenol S type, bisphenol A phenol type, trisphenol methane type, tetraphenol ethane type, bisphenol type, biphenol type At least one of the group consisting of an alicyclic, heterocyclic, dicyclopentadiene or naphthalene type structure. 如申請專利範圍第1項所述之噴墨用光硬化性墨水組成物,其中更包含上述化合物(B)以外的化合物(C),上述化合物(C)具有選自由(甲基)丙烯醯基、烯丙基及乙烯基所組成組群中的至少1種聚合性基。 The photocurable ink composition for inkjet according to claim 1, further comprising a compound (C) other than the above compound (B), wherein the compound (C) has a (meth) acrylonitrile group selected from the group consisting of At least one polymerizable group in the group consisting of allyl groups and vinyl groups. 如申請專利範圍第7項所述之噴墨用光硬化性墨水組成物,其中上述化合物(C)具有(甲基)丙烯醯基。 The photocurable ink composition for inkjet according to claim 7, wherein the compound (C) has a (meth) acrylonitrile group. 如申請專利範圍第1項所述之噴墨用光硬化性墨水組成物,其中更包含光聚合起始劑(D)。 The photocurable ink composition for inkjet according to claim 1, which further comprises a photopolymerization initiator (D). 如申請專利範圍第1項所述之噴墨用光硬化性墨水組成物,其中更包含阻燃劑(E)。 The photocurable ink composition for inkjet according to claim 1, which further comprises a flame retardant (E). 如申請專利範圍第1項所述之噴墨用光硬化性墨水組成物,其中更包含上述化合物(A)以外的化合物(F),上述化合物(F)選自由環氧硬化劑、三聚氰胺樹脂及苯酚樹脂所組成組群中的至少1種。 The photocurable ink composition for inkjet according to claim 1, further comprising a compound (F) other than the compound (A), wherein the compound (F) is selected from the group consisting of an epoxy hardener and a melamine resin. At least one of the groups consisting of phenol resins. 一種電子電路基板,其特徵在於:於基板表面形成電路,且於該基板及電路上的至少一部分形成硬化膜而成,上述硬化膜是使如申請專利範圍第1項至第11項中任一項所述之噴墨用光硬化性墨水組成物硬化而獲得。An electronic circuit board characterized in that a circuit is formed on a surface of a substrate, and at least a part of the substrate and the circuit are formed with a cured film, and the cured film is made according to any one of items 1 to 11 of the patent application scope. The inkjet photocurable ink composition according to the item is obtained by curing.
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