TWI505357B - - Google Patents

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Publication number
TWI505357B
TWI505357B TW103108223A TW103108223A TWI505357B TW I505357 B TWI505357 B TW I505357B TW 103108223 A TW103108223 A TW 103108223A TW 103108223 A TW103108223 A TW 103108223A TW I505357 B TWI505357 B TW I505357B
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TW
Taiwan
Application number
TW103108223A
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TW201448028A (zh
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Publication date
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Publication of TW201448028A publication Critical patent/TW201448028A/zh
Application granted granted Critical
Publication of TWI505357B publication Critical patent/TWI505357B/zh

Links

TW103108223A 2013-03-12 2014-03-10 一種減少門效應的等離子體處理裝置 TW201448028A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201310077322.1A CN104051210B (zh) 2013-03-12 2013-03-12 一种减少门效应的等离子体处理装置

Publications (2)

Publication Number Publication Date
TW201448028A TW201448028A (zh) 2014-12-16
TWI505357B true TWI505357B (zh) 2015-10-21

Family

ID=51503905

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103108223A TW201448028A (zh) 2013-03-12 2014-03-10 一種減少門效應的等離子體處理裝置

Country Status (2)

Country Link
CN (1) CN104051210B (zh)
TW (1) TW201448028A (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105225914B (zh) * 2015-08-25 2018-01-23 沈阳拓荆科技有限公司 一种改善晶圆表面薄膜形貌的半导体等离子处理装置
CN110610841B (zh) * 2018-06-14 2022-01-28 中微半导体设备(上海)股份有限公司 一种等离子体约束组件及其所在的处理装置
CN111326391B (zh) * 2018-12-17 2023-01-24 中微半导体设备(上海)股份有限公司 等离子体处理装置
CN112447474B (zh) * 2019-09-04 2022-11-04 中微半导体设备(上海)股份有限公司 一种具有可移动环的等离子体处理器
CN112802729B (zh) * 2019-11-13 2024-05-10 中微半导体设备(上海)股份有限公司 带温度维持装置的隔离环
CN113972124B (zh) * 2020-07-23 2023-09-29 中微半导体设备(上海)股份有限公司 一种接地组件及其等离子体处理装置与工作方法
CN114068272B (zh) * 2020-07-31 2023-09-29 中微半导体设备(上海)股份有限公司 一种气体流量调节装置和调节方法及等离子体处理装置
CN114664622A (zh) * 2020-12-23 2022-06-24 中微半导体设备(上海)股份有限公司 一种等离子体处理装置及调节方法
CN116288279B (zh) * 2023-05-23 2023-08-18 中微半导体设备(上海)股份有限公司 一种气相沉积装置及基片处理方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI223327B (en) * 2001-08-28 2004-11-01 Nec Lcd Technologies Ltd Substrate processing system for performing exposure process in gas atmosphere
TW200908136A (en) * 2007-03-16 2009-02-16 Sosul Co Ltd Apparatus for plasma processing and method for plasma processing
TWI358509B (en) * 2007-09-07 2012-02-21 Applied Materials Inc An apparatus for controlling the flow of process g
CN102522305A (zh) * 2011-12-27 2012-06-27 中微半导体设备(上海)有限公司 等离子体处理装置及聚焦环组件
US20130008605A1 (en) * 2005-08-05 2013-01-10 Gerald Yin Multi-station decoupled reactive ion etch chamber

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6287435B1 (en) * 1998-05-06 2001-09-11 Tokyo Electron Limited Method and apparatus for ionized physical vapor deposition
WO2008041601A1 (fr) * 2006-09-29 2008-04-10 Tokyo Electron Limited Procédé d'oxydation par plasma, appareil d'oxydation par plasma et support de stockage
US20090025879A1 (en) * 2007-07-26 2009-01-29 Shahid Rauf Plasma reactor with reduced electrical skew using a conductive baffle
JP6054314B2 (ja) * 2011-03-01 2016-12-27 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 基板搬送及びラジカル閉じ込めのための方法及び装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI223327B (en) * 2001-08-28 2004-11-01 Nec Lcd Technologies Ltd Substrate processing system for performing exposure process in gas atmosphere
US20130008605A1 (en) * 2005-08-05 2013-01-10 Gerald Yin Multi-station decoupled reactive ion etch chamber
TW200908136A (en) * 2007-03-16 2009-02-16 Sosul Co Ltd Apparatus for plasma processing and method for plasma processing
TWI358509B (en) * 2007-09-07 2012-02-21 Applied Materials Inc An apparatus for controlling the flow of process g
CN102522305A (zh) * 2011-12-27 2012-06-27 中微半导体设备(上海)有限公司 等离子体处理装置及聚焦环组件

Also Published As

Publication number Publication date
TW201448028A (zh) 2014-12-16
CN104051210B (zh) 2016-05-11
CN104051210A (zh) 2014-09-17

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