TWI503922B - Lifting mechanism - Google Patents

Lifting mechanism Download PDF

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Publication number
TWI503922B
TWI503922B TW101145805A TW101145805A TWI503922B TW I503922 B TWI503922 B TW I503922B TW 101145805 A TW101145805 A TW 101145805A TW 101145805 A TW101145805 A TW 101145805A TW I503922 B TWI503922 B TW I503922B
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Taiwan
Prior art keywords
lifting mechanism
sleeve
segment
magnetic element
passage
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TW101145805A
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Chinese (zh)
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TW201423897A (en
Inventor
Po An Hsu
Yu Hsiang Cheng
Cheng Hao Tai
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Taiwan Semiconductor Mfg Co Ltd
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Priority to TW101145805A priority Critical patent/TWI503922B/en
Publication of TW201423897A publication Critical patent/TW201423897A/en
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Publication of TWI503922B publication Critical patent/TWI503922B/en

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Description

升降機構Lifting mechanism

本發明係有關於一種升降機構,且特別係有關於一種用以抬升基板的升降機構。The present invention relates to a lifting mechanism, and more particularly to a lifting mechanism for lifting a substrate.

一般而言,應用於IC生產製造之薄膜沉積機台內均會包含有一用以承載及抬升基板的升降機構,以便進行基板的沉積製程。其中,升降機構的穩定性經常是影響薄膜沉積品質的主要因素之一。In general, a thin film deposition machine used in IC manufacturing includes a lifting mechanism for carrying and lifting a substrate for performing a substrate deposition process. Among them, the stability of the lifting mechanism is often one of the main factors affecting the quality of film deposition.

在薄膜沉積之反應過程中,伴隨產生之微粒經常容易堆積於升降機構之管壁,導致升降機構中之滑動單元無法順利地移動,其將影響薄膜沉積製程的品質;此外,產生於滑動單元與導引管壁間之經常性摩耗,亦會影響滑動單元之垂直定向能力,進而使基板發生傾斜及造成生產製造上之異常,故如何改善升降機構的穩定性並解決上述的問題,實值得相關人員所深思。During the reaction of film deposition, the accompanying particles are often easily deposited on the wall of the lifting mechanism, resulting in the sliding unit in the lifting mechanism not moving smoothly, which will affect the quality of the film deposition process; in addition, it is generated in the sliding unit and The frequent friction between the walls of the guiding tube also affects the vertical orientation of the sliding unit, which causes the substrate to tilt and cause abnormalities in manufacturing. Therefore, how to improve the stability of the lifting mechanism and solve the above problems is worthy of correlation. Thoughtful thinking.

本發明提供一種升降機構,能夠改善傳統滑動單元與導引管間之磨損問題,並可減少反應物堆積於管壁之機會,進而可提高升降機構穩定性以及薄膜沉積製程之品質。The invention provides a lifting mechanism, which can improve the wear problem between the traditional sliding unit and the guiding tube, and can reduce the chance of the reactants accumulating on the tube wall, thereby improving the stability of the lifting mechanism and the quality of the film deposition process.

本發明之一實施例提供一種升降機構,用以移動一基板,前述升降機構包括一承載台,用以承載基板,且承載台具有一第一通道;一導引管,與承載台相互連接,且導引管具有一第二通道,前述第二通道連接第一通道;一第一套管,設置於導引管內且形成有一光滑表面;一滑動單 元,設置於第一套管內且可相對光滑表面滑動,滑動單元具有一磁性元件及一桿體,其中桿體固定於磁性元件上,並由第二通道朝第一通道之方向延伸;一套環,設置於磁性元件上,並抵接於磁性元件與光滑表面之間;以及一環狀構件,套設於導引管外側且可相對導引管滑動,環狀構件具有一磁鐵環,且磁鐵環作用一磁力予磁性元件,藉以帶動桿體穿過第一通道並升降基板。An embodiment of the present invention provides a lifting mechanism for moving a substrate. The lifting mechanism includes a loading platform for carrying a substrate, and the loading platform has a first passage; and a guiding tube is connected to the loading platform. And the guiding tube has a second passage, the second passage is connected to the first passage; a first sleeve is disposed in the guiding tube and formed with a smooth surface; And disposed in the first sleeve and slidable relative to the smooth surface, the sliding unit has a magnetic element and a rod body, wherein the rod body is fixed on the magnetic element and extends from the second passage toward the first passage; a collar disposed on the magnetic member and abutting between the magnetic member and the smooth surface; and an annular member sleeved on the outside of the guiding tube and slidable relative to the guiding tube, the annular member having a magnet ring And the magnet ring acts a magnetic force on the magnetic element to drive the rod through the first passage and lift the substrate.

於一實施例中,前述第一套管具有鐵氟龍材質。In an embodiment, the first sleeve has a Teflon material.

於一實施例中,前述升降機構更包括一底座及一墊片,前述底座以可拆卸的方式連接導引管,並封閉第二通道之一端,且前述墊片抵接於第一套管與底座之間。In one embodiment, the lifting mechanism further includes a base and a gasket, the base is detachably connected to the guiding tube, and closes one end of the second passage, and the gasket abuts against the first sleeve and Between the bases.

於一實施例中,前述墊片具有鐵氟龍材質。In an embodiment, the spacer has a Teflon material.

於一實施例中,前述套環具有鐵氟龍材質。In an embodiment, the collar has a Teflon material.

於一實施例中,前述磁性元件形成有一凹槽以及複數個凸出部,該些凸出部朝第一套管方向延伸,且桿體結合於凹槽內。In one embodiment, the magnetic element is formed with a recess and a plurality of projections extending toward the first sleeve and the rod is coupled to the recess.

於一實施例中,前述環狀構件更具有複數個磁鐵環,且該些磁鐵環分別對應於前述凸出部。In an embodiment, the annular member further has a plurality of magnet rings, and the magnet rings respectively correspond to the protruding portions.

於一實施例中,前述第一通道包括一第一段部及一第二段部,第一段部形成於第一通道中鄰近基板之一側,且第二段部與第一段部相通,其中第二段部較第一段部具有更大的外徑。In one embodiment, the first channel includes a first segment and a second segment. The first segment is formed on one side of the first channel adjacent to the substrate, and the second segment is in communication with the first segment. Wherein the second section has a larger outer diameter than the first section.

於一實施例中,前述升降機構更包括一第二套管及一支撐環,其中第二套管及支撐環設置於第二段部內,支撐環固定於前述承載台,且第二套管位於第一段部與支撐環 之間。In one embodiment, the lifting mechanism further includes a second sleeve and a support ring, wherein the second sleeve and the support ring are disposed in the second section, the support ring is fixed to the carrying platform, and the second sleeve is located First section and support ring between.

於一實施例中,前述第二套管具有陶瓷材質,且前述支撐環具有鋁材質。In an embodiment, the second sleeve has a ceramic material, and the support ring has an aluminum material.

為使本發明之上述目的、特徵、和優點能更明顯易懂,下文特舉較佳實施例並配合所附圖式做詳細說明。The above described objects, features, and advantages of the invention will be apparent from the description and appended claims

第1圖表示本發明一實施例之升降機構剖視圖,如圖中所示,升降機構10可用於一半導體製程機台(例如薄膜沉積機台),其主要包括一承載台100、一導引管200、一第一套管300、一滑動單元400、至少一套環500以及一環狀構件600。其中,承載台100係用以承載一基板W,並具有一第一通道101;導引管200連接於承載台100下方,並且具有與第一通道101相互連接之一第二通道201;第一套管300設置於導引管200內且形成有一光滑表面S;滑動單元400設置於第一套管300內,並可沿著前述光滑表面S滑動,其中滑動單元400包括一磁性元件401及一桿體402,桿體402係固定於磁性元件401上,並且由第二通道201朝第一通道101之方向延伸;套環500套設於磁性元件401外側,並且抵接於磁性元件401及前述光滑表面S之間。於本實施例中,前述磁性元件401之上、下端各設有一套環500。1 is a cross-sectional view of an elevating mechanism according to an embodiment of the present invention. As shown in the drawing, the elevating mechanism 10 can be used in a semiconductor processing machine (for example, a thin film deposition machine), which mainly includes a carrying platform 100 and a guiding tube. 200. A first sleeve 300, a sliding unit 400, at least one set of rings 500, and an annular member 600. The carrying platform 100 is configured to carry a substrate W and has a first channel 101. The guiding tube 200 is connected to the lower side of the carrying platform 100 and has a second channel 201 interconnected with the first channel 101. The sleeve 300 is disposed in the guiding tube 200 and formed with a smooth surface S. The sliding unit 400 is disposed in the first sleeve 300 and slidable along the smooth surface S, wherein the sliding unit 400 includes a magnetic element 401 and a The rod body 402 is fixed to the magnetic element 401 and extends from the second passage 201 toward the first passage 101; the collar 500 is sleeved on the outer side of the magnetic element 401 and abuts against the magnetic element 401 and the foregoing Smooth surface S between. In the embodiment, a set of rings 500 is disposed on each of the upper and lower ends of the magnetic element 401.

另外,一環狀構件600套設於導引管200之外側,並可相對導引管200滑動,其中環狀構件600係透過一升降驅動裝置來帶動,且該升降驅動裝置可包括一汽缸或是步進馬達。如第1圖所示,環狀構件600具有至少一磁鐵環 601,可作用一磁力予前述磁性元件401,藉此可帶動磁性元件401及桿體402沿第二通道201上下滑動,並使得桿體402能夠穿過第一通道101以抬升基板W。In addition, an annular member 600 is sleeved on the outer side of the guiding tube 200 and slidable relative to the guiding tube 200. The annular member 600 is driven by a lifting drive device, and the lifting and lowering driving device may include a cylinder or It is a stepper motor. As shown in FIG. 1, the annular member 600 has at least one magnet ring 601, a magnetic force can be applied to the magnetic element 401, thereby driving the magnetic element 401 and the rod 402 to slide up and down along the second passage 201, and the rod 402 can pass through the first passage 101 to lift the substrate W.

特別說明的是,前述第一套管300及套環500可含有鐵氟龍材質並且相互接觸,據此可減少第一套管300及套環500間之摩擦力,以改善傳統滑動單元400(磁性元件401)與導引管200間之磨損問題。此外,本實施例之第一套管300係可置換地設置於導引管200內,並於長時間使用之後能夠進行更換,以避免因磁性元件401磨損造成基板之傾斜,同時可降低機構保養上之成本。Specifically, the first sleeve 300 and the collar 500 may contain a Teflon material and are in contact with each other, thereby reducing the friction between the first sleeve 300 and the collar 500 to improve the conventional sliding unit 400 ( The problem of wear between the magnetic element 401) and the guide tube 200. In addition, the first sleeve 300 of the embodiment is replaceably disposed in the guiding tube 200, and can be replaced after being used for a long time to avoid tilting of the substrate due to wear of the magnetic member 401, and at the same time reducing the maintenance of the mechanism. The cost.

請繼續參閱第1圖,本實施例中之升降機構10更包括有一底座700,設置於導引管200之相對承載台100的另一側,用以封閉第二通道201之一端,據此可維持製程機台內部腔體之壓力。需要強調的是,本實施例中之底座700係以可拆卸之方式(例如利用圖中所示之螺紋結構702)連接導引管200,故可使得保養導引管200以及更換前述第一套管300之工作更為方便進行。Continuing to refer to FIG. 1 , the lifting mechanism 10 of the present embodiment further includes a base 700 disposed on the other side of the guiding tube 200 opposite to the loading platform 100 for closing one end of the second channel 201. Maintain the pressure inside the internal cavity of the process machine. It should be emphasized that the base 700 in this embodiment is connected to the guiding tube 200 in a detachable manner (for example, by using the thread structure 702 shown in the drawing), so that the guiding tube 200 can be maintained and the first set can be replaced. The work of the tube 300 is more convenient.

在本實施例中,底座700之底部更設置有一墊片701,其中,墊片701與第一套管300同樣可具有鐵氟龍材質,並且墊片701抵接於第一套管300以及底座700之間,據此能夠使底座700及導引管200間之氣密性更佳。應了解的是,前述第一套管300、套環500及墊片701亦可採用其他材質,其僅需具有低摩擦係數及耐高/低溫等特性即可。In the embodiment, the bottom of the base 700 is further provided with a gasket 701. The gasket 701 can have a Teflon material like the first sleeve 300, and the gasket 701 abuts the first sleeve 300 and the base. Between 700, the airtightness between the base 700 and the guide tube 200 can be improved accordingly. It should be understood that the first sleeve 300, the collar 500 and the gasket 701 may be made of other materials, and only need to have low friction coefficient and high/low temperature resistance.

第2圖表示第1圖中滑動單元400之磁性元件401示 意圖,如圖中所示,磁性元件401形成有一凹槽401a以及複數個凸出部401b,其中前述桿體402係結合於凹槽401a內(請參閱第1圖所示),而凸出部401b則朝第一套管300之方向延伸並與第一套管300之間相隔有一距離(如第1圖所示),據此可避免磁性元件401和第一套管300間發生磨損。Fig. 2 is a view showing the magnetic member 401 of the sliding unit 400 in Fig. 1 It is intended that, as shown in the figure, the magnetic member 401 is formed with a recess 401a and a plurality of projections 401b, wherein the rod 402 is coupled to the recess 401a (see FIG. 1), and the projection is formed. The 401b extends in the direction of the first sleeve 300 and is spaced apart from the first sleeve 300 (as shown in Fig. 1), whereby wear between the magnetic member 401 and the first sleeve 300 can be avoided.

在本實施例中,磁性元件401為一體成型並含有鐵材質,其中凸出部401b分別對應於前述環狀構件600上的磁鐵環601(請參閱第1圖所示),透過此結構設計,磁鐵環601可作用適當之磁力予磁性元件401,進而可帶動連接於磁性元件401上之桿體402穿過第一通道101以抬升基板W。In this embodiment, the magnetic element 401 is integrally formed and contains an iron material, wherein the protruding portions 401b respectively correspond to the magnet rings 601 (refer to FIG. 1) on the annular member 600, and are designed through the structure. The magnet ring 601 can apply a suitable magnetic force to the magnetic element 401, thereby driving the rod 402 connected to the magnetic element 401 through the first passage 101 to lift the substrate W.

第3圖表示第1圖中承載台100之第一通道101剖視圖,其中第一通道101包括有一第一段部101a及一第二段部101b,第一段部101a係形成於第一通道101中且鄰近於基板(圖中未示)之一側,第二段部101b與第一段部101a相互連通,且第二段部101b較第一段部101a具有更大的外徑,用以容置一第二套管102及一支撐環103。其中,支撐環103係以可拆卸的方式固定於承載台100之底側,且第二套管102係連接第一段部101a並且抵接支撐環103,藉以固定在第二段部101b內。於本實施例中,第二套管102係具有陶瓷材質,而支撐環則具有鋁材質。由於第二套管102係具有一體成型之長條狀結構,故可使薄膜沉積反應中生成之微粒不易經過第一通道101而掉落至導引管200中,據此能夠避免滑動單元400於運動過程中遭 沉積物卡住,以提高升降機構之穩定性及製程之品質。3 is a cross-sectional view of the first channel 101 of the carrier 100 in FIG. 1, wherein the first channel 101 includes a first segment 101a and a second segment 101b, and the first segment 101a is formed in the first channel 101. And adjacent to one side of the substrate (not shown), the second segment portion 101b and the first segment portion 101a communicate with each other, and the second segment portion 101b has a larger outer diameter than the first segment portion 101a for A second sleeve 102 and a support ring 103 are received. The support ring 103 is detachably fixed to the bottom side of the carrier 100, and the second sleeve 102 is connected to the first segment 101a and abuts the support ring 103, thereby being fixed in the second segment 101b. In this embodiment, the second sleeve 102 has a ceramic material, and the support ring has an aluminum material. Since the second sleeve 102 has an integrally formed strip-like structure, the particles generated in the thin film deposition reaction can be easily dropped into the guiding tube 200 through the first passage 101, thereby preventing the sliding unit 400 from being Suffered during exercise Sediment is stuck to improve the stability of the lifting mechanism and the quality of the process.

雖然本發明以前述之實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可做些許之更動與潤飾。因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed above in the foregoing embodiments, it is not intended to limit the invention. Those skilled in the art having the ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

10‧‧‧升降機構10‧‧‧ Lifting mechanism

100‧‧‧承載台100‧‧‧Loading station

101‧‧‧第一通道101‧‧‧First Passage

101a‧‧‧第一段部101a‧‧‧The first paragraph

101b‧‧‧第二段部101b‧‧‧second section

102‧‧‧第二套管102‧‧‧second casing

103‧‧‧支撐環103‧‧‧Support ring

200‧‧‧導引管200‧‧‧ Guide tube

201‧‧‧第二通道201‧‧‧second channel

300‧‧‧第一套管300‧‧‧First casing

400‧‧‧滑動單元400‧‧‧Sliding unit

401‧‧‧磁性元件401‧‧‧Magnetic components

401a‧‧‧凹槽401a‧‧‧ Groove

401b‧‧‧凸出部401b‧‧‧protrusion

402‧‧‧桿體402‧‧‧ rod body

500‧‧‧套環500‧‧‧ collar

600‧‧‧環狀構件600‧‧‧ ring members

601‧‧‧磁鐵環601‧‧‧ magnet ring

700‧‧‧底座700‧‧‧Base

701‧‧‧墊片701‧‧‧shims

702‧‧‧螺紋結構702‧‧‧Thread structure

S‧‧‧光滑表面S‧‧‧Smooth surface

W‧‧‧基板W‧‧‧Substrate

第1圖表示本發明一實施例之升降機構剖視圖;第2圖表示第1圖中滑動單元之磁性元件示意圖;以及第3圖表示第1圖中承載台之第一通道剖視圖。1 is a cross-sectional view showing an elevating mechanism according to an embodiment of the present invention; FIG. 2 is a view showing a magnetic element of the sliding unit in FIG. 1; and FIG. 3 is a cross-sectional view showing a first passage of the stage in FIG.

10‧‧‧升降機構10‧‧‧ Lifting mechanism

100‧‧‧承載台100‧‧‧Loading station

101‧‧‧第一通道101‧‧‧First Passage

200‧‧‧導引管200‧‧‧ Guide tube

201‧‧‧第二通道201‧‧‧second channel

300‧‧‧第一套管300‧‧‧First casing

400‧‧‧滑動單元400‧‧‧Sliding unit

401‧‧‧磁性元件401‧‧‧Magnetic components

402‧‧‧桿體402‧‧‧ rod body

500‧‧‧套環500‧‧‧ collar

600‧‧‧環狀構件600‧‧‧ ring members

601‧‧‧磁鐵環601‧‧‧ magnet ring

700‧‧‧底座700‧‧‧Base

701‧‧‧墊片701‧‧‧shims

702‧‧‧螺紋結構702‧‧‧Thread structure

S‧‧‧光滑表面S‧‧‧Smooth surface

W‧‧‧基板W‧‧‧Substrate

Claims (10)

一種升降機構,用以移動一基板,該升降機構包括:一承載台,用以承載該基板,該承載台具有一第一通道;一導引管,連接該承載台並具有一第二通道,該第二通道連接該第一通道;一第一套管,設置於該導引管內且形成有一光滑表面;一滑動單元,設置於該第一套管內且可相對該光滑表面滑動,該滑動單元具有一磁性元件及一桿體,其中該桿體固定於該磁性元件上,並由該第二通道朝該第一通道之方向延伸;一套環,設置於該磁性元件上,並抵接於該磁性元件與該光滑表面之間;以及一環狀構件,套設於該導引管外側且可相對該導引管滑動,該環狀構件具有一磁鐵環,且該磁鐵環作用一磁力予該磁性元件,藉以帶動該桿體穿過該第一通道並升降該基板。An elevating mechanism for moving a substrate, the elevating mechanism comprising: a carrying platform for carrying the substrate, the carrying platform having a first passage; a guiding tube connecting the carrying platform and having a second passage The second channel is connected to the first channel; a first sleeve is disposed in the guiding tube and formed with a smooth surface; a sliding unit is disposed in the first sleeve and slidable relative to the smooth surface, The sliding unit has a magnetic element and a rod body, wherein the rod body is fixed on the magnetic element and extends from the second passage toward the first passage; a set of rings is disposed on the magnetic element Connected between the magnetic element and the smooth surface; and an annular member sleeved on the outside of the guiding tube and slidable relative to the guiding tube, the annular member has a magnet ring, and the magnet ring acts Magnetic force is applied to the magnetic element to drive the rod through the first passage and lift the substrate. 如申請專利範圍第1項所述的升降機構,其中該第一套管具有鐵氟龍材質。The lifting mechanism of claim 1, wherein the first sleeve has a Teflon material. 如申請專利範圍第1項所述的升降機構,其中該升降機構更包括一底座及一墊片,該底座以可拆卸的方式連接該導引管,並封閉該第二通道之一端,且該墊片係抵接於該第一套管與該底座之間。The lifting mechanism of claim 1, wherein the lifting mechanism further comprises a base and a spacer, the base is detachably connected to the guiding tube, and one end of the second channel is closed, and the The gasket is abutted between the first sleeve and the base. 如申請專利範圍第3項所述的升降機構,其中該墊片具有鐵氟龍材質。The lifting mechanism of claim 3, wherein the spacer has a Teflon material. 如申請專利範圍第1項所述的升降機構,其中該套環具有鐵氟龍材質。The lifting mechanism of claim 1, wherein the collar has a Teflon material. 如申請專利範圍第1項所述的升降機構,其中該磁性元件形成有一凹槽以及複數個凸出部,該些凸出部朝該第一套管方向延伸,且該桿體結合於該凹槽內。The lifting mechanism of claim 1, wherein the magnetic element is formed with a groove and a plurality of protrusions, the protrusions extending toward the first sleeve, and the rod is coupled to the recess Inside the slot. 如申請專利範圍第6項所述的升降機構,其中該環狀構件更具有複數個磁鐵環,且該些磁鐵環分別對應於該些凸出部。The lifting mechanism of claim 6, wherein the annular member further has a plurality of magnet rings, and the magnet rings respectively correspond to the protrusions. 如申請專利範圍第1項所述的升降機構,其中該第一通道包括一第一段部及一第二段部,該第一段部形成於該第一通道中鄰近該基板之一側,且該第二段部與該第一段部相通,其中該第二段部較該第一段部具有更大的外徑。The lifting mechanism of claim 1, wherein the first channel comprises a first segment and a second segment, the first segment being formed in the first channel adjacent to one side of the substrate, And the second segment is in communication with the first segment, wherein the second segment has a larger outer diameter than the first segment. 如申請專利範圍第8項所述的升降機構,其中該升降機構更包括一第二套管及一支撐環,該第二套管及該支撐環設置於該第二段部內,該支撐環固定於該承載台,且該第二套管位於該第一段部與該支撐環之間。The lifting mechanism of claim 8, wherein the lifting mechanism further comprises a second sleeve and a support ring, wherein the second sleeve and the support ring are disposed in the second section, the support ring is fixed And the second sleeve is located between the first section and the support ring. 如申請專利範圍第9項所述的升降機構,其中該第二套管具有陶瓷材質,且該支撐環具有鋁材質。The lifting mechanism of claim 9, wherein the second sleeve has a ceramic material, and the support ring has an aluminum material.
TW101145805A 2012-12-06 2012-12-06 Lifting mechanism TWI503922B (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050155710A1 (en) * 2004-01-20 2005-07-21 Taiwan Semiconductor Manufacturing Co., Ltd. Load lock chamber with gas-sealing bellows
TW200934718A (en) * 2008-02-01 2009-08-16 Chao Yi Plastic Co Ltd Lifting type feeding device and stroke thereof
US20090243413A1 (en) * 2007-06-27 2009-10-01 Brooks Automation, Inc. Robot drive with magnetic spindle bearings

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050155710A1 (en) * 2004-01-20 2005-07-21 Taiwan Semiconductor Manufacturing Co., Ltd. Load lock chamber with gas-sealing bellows
US20090243413A1 (en) * 2007-06-27 2009-10-01 Brooks Automation, Inc. Robot drive with magnetic spindle bearings
TW200934718A (en) * 2008-02-01 2009-08-16 Chao Yi Plastic Co Ltd Lifting type feeding device and stroke thereof

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