TWI498993B - Method for automatically positioning first die on wafer - Google Patents

Description

Automatic positioning method of the first die

The invention relates to a method for automatically positioning a first die, in particular to a method for quickly and accurately finding a first die on a wafer by automated step movement and image positioning.

Nowadays, in order to meet the needs of various high-density packages, the semiconductor packaging industry has gradually developed various types of package designs, in which a package carrier commonly used to carry semiconductor wafers includes a package substrate having a plurality of printed circuits and A leadframe stamped or etched from a metal sheet. Furthermore, the semiconductor wafer for packaging is from a wafer manufactured by a fab having a semiconductor substrate and having a plurality of IC circuit layouts formed on the surface thereof. Before being packaged, the wafer is usually first fixed on a tape, followed by wafer sawing to cut a number of dies (die/chip). Not yet separated from each other. The cut wafer is then shipped to the test facility for testing to obtain a map of the map to record the location of the good and defective products. Subsequently, the tested wafers are transported to the packaging factory, and the wafer map is used to take the good die one by one with the robot arm and die attach to the wafer carrying area on the package substrate or the lead frame. Then, after the post-packaging operation such as wire bonding, sealing, and single separation, the semiconductor package product can be obtained.

Before the step of sucking the good grain by the robot arm, the operator usually needs to find out in advance the position of the first die according to each wafer product, so that the robot arm starts the suction operation from the first die. Referring to FIG. 1 , it discloses a schematic diagram of a conventional method for positioning a first die on a wafer. The method mainly firstly visually judges one of the wafers 10 having a missing groove (V notch). The position of the slab die 11 is followed by a counterclockwise (or clockwise) sequential calculation of the number of crystal grains along the circumference of the wafer 10. After accumulating a predetermined number, a crystal grain can be visually found. At the position of 12, the exact position of the first die 12 can be known by marking the two invalid dies 13, 14 next to the first die 12. Finally, as long as the control computer of the robot arm reads the wafer map and the robot arm starts to suck the crystal grains from the first die 12, the entire action of sucking the crystal grains does not cause the problem of erroneously sucking the crystal grains in the incorrect position.

However, the above-mentioned conventional method of positioning the first die on the wafer still has the following problems in practical operation. For example, when the grain size is large, although the operator visually searches for the crystal grain, the misjudgment problem is not caused, but Manual positioning operations take more time. Furthermore, when the grain size is miniaturized and less than 10×10 mm, it is easy for the operator to look for the crystal grains to be too small and the number of crystal grains is too large, and it is easy to misjudge the position of the first crystal grain 12. Once the position of the first die 12 is misjudged, the entire sucking die action of the subsequent robot arm will absorb the die at the incorrect position, thus causing all the semi-finished products after the whole batch of solid crystals to be reworked or destroyed, thereby greatly reducing Overall package yield.

Therefore, it is necessary to provide an automatic positioning method for the first die to solve the problems of the conventional technology.

The main purpose of the present invention is to provide an automatic positioning method for a first die, which uses a mobile carrier, an image capturing unit, and an image processing device, and the mobile carrier automatically moves the wafer step by step; the image capturing unit On the wafer, the die images of the predetermined number of cells are sequentially taken along the X-axis by the vacant die, and then the predetermined number of grain images are sequentially captured along the Y-axis; the image processing device is Each grain image is analyzed and coordinated to find the correct position of the first die by using this fast and accurate positioning, which is beneficial to improve the accuracy of positioning the first die and accelerate the positioning operation.

A secondary object of the present invention is to provide an automatic positioning method for a first die, which is to automatically capture an image of each die by using an image capturing unit during stepwise movement of the wafer by the mobile carrier. Image analysis is used to define the coordinate position of each grain, and at the same time, the position compensation action can be performed when it is judged that the coordinate position is wrong, which is beneficial to ensure the correctness of each moving operation.

Another object of the present invention is to provide a method for automatically positioning a first die, which has a standard positioning mode and a fast positioning mode, so that when processing a plurality of wafers of the same specification, a fast positioning mode can be utilized. Accelerate the processing of the second or subsequent wafers to quickly and automatically locate the position of the first die on each wafer, thus facilitating accelerated positioning operation.

To achieve the above objective, the present invention provides a method for automatically positioning a first die, comprising the steps of: (S01), fixing a wafer on a mobile carrier, wherein the wafer comprises a plurality of crystal grains And a plurality of dicing trenches, wherein the dies have a length and width dimension of less than 10×10 mm (mm), and the dies include a slab die d ₀ ; (S02), and an image capturing unit is located ₀ d grains notched groove of the wafer, with which the image capturing unit captures d ₀ of missing video slot die, and by an image processing apparatus for image analysis and position of the slot die lack d ₀ The coordinate position (0, 0) is defined as (S03), and the distance between the movable carrier and the wafer relative to the image capturing unit is stepwise shifted along the X axis by a die, and the image capturing unit is used to capture Adjacent to an image of a die d ₁ under the vacant die d ₀ , and image analysis by the image processing device and defining a coordinate position of the die d ₁ as (1, 0); (S04 If the total number m of crystal grains to be moved along the X axis is equal to 1, proceed to the next step (S05); if the total number m of crystal grains to be moved along the X axis is 2 or more Integer embodiment, similar places step (S03) of sequentially capturing the X-axis the number of dies D ... d _{m 2} of the image, so that the more the grain D ₂ ... d _m of position coordinates are defined (2,0)...(m,0); (S05), using the image by shifting the movable carrier and the wafer relative to the image capturing unit by a step along the Y axis. The capturing unit captures an image of another die d _m+1 adjacent to the die d _m , and performs image analysis by the image processing device and defines a coordinate position of the die d _m+1 as (m, 1); (S06), if the total number of grains n to be moved along the Y axis is equal to 1, proceed to the next step (S07); if the total number of grains n to be moved along the Y axis is 2 Or an integer above, in the similar step (S05), sequentially capture images of several crystal grains d _m+2 ... d _m+n along the Y-axis to form the crystal grains d _m+2 . The coordinate positions of ..d _m+n are defined as (m, 2)...(m,n); and (S07), and the crystal grain d _m+n whose coordinate position is (m,n) is defined as A first die is marked with an auxiliary positioning mark on two invalid crystal grains on the side of the first die.

As an embodiment of the present invention, the wafer of the step (S01) is first attached to a carrier tape of a support frame, and then fixed on the mobile platform together with the support frame and the carrier tape.

In an embodiment of the present invention, in steps (S03) to (S06), when the mobile carrier and the wafer are stepped and displaced relative to the image capturing unit, the mobile carrier is moved by the mobile carrier. The wafer is held while the image capturing unit is stationary; or the mobile carrier and the wafer are held stationary while the image capturing unit is moved.

As an embodiment of the present invention, in steps (S03) to (S06), each time an image of a die is captured by the image capturing unit, the image is transmitted to the image processing device. The image processing device automatically omits the analysis of one of the intermediate block regions of the image, and analyzes only one of the peripheral frame regions of the image, wherein: if the peripheral frame region includes four intersecting rows of the cutting trenches The image is judged to be correct and the action of defining the coordinate position of the die is ended; or if the peripheral frame region does not include the complete image of the four intersecting grooves, the crystal is judged The image of the particle is not correct. At this time, the mobile carrier and the wafer are slightly moved relative to the image capturing unit for position compensation, and the image capturing unit is used to retrieve the image of the die until the image is captured. The processing device analyzes and determines that the image of the die is correct.

As an embodiment of the present invention, after the step (S07), the method further includes the following steps: (S08), aligning a robot arm to the first die of the wafer, and starting from the first die The action of sucking the crystal grains.

As an embodiment of the present invention, after the step (S08), the method further comprises the steps of: (S09), removing the wafer, and placing a second wafer of the same specification on the same mobile carrier; (S10), wherein two of the cutting grooves extending along the X-axis on both sides of the slab die d _{0 of the} step (S02) are defined as two X-axis moving reference lines to directly make the mobile stage and the wafer not be accurately along the X axis of the image capturing unit moving distance m grid grains; wherein the two cutting trenches defined (S11), the crystal grains extending step (S05) of D _m on both sides of the Y-axis as Y The second axis moves the reference line to directly move the mobile carrier and the wafer relative to the image capturing unit to the n-grain distance along the Y-axis; and (S12), moving along the X and Y axes Then, the image dm _+n which is aligned to and captured by the image capturing unit is directly defined as a first crystal grain, and one of the two invalid crystal grains on the side of the first crystal grain is respectively marked with one Auxiliary positioning mark.

As an embodiment of the present invention, the step (S07) or (S12) marks the auxiliary positioning mark on the invalid crystal by means of laser lithography, ink stamping, ink pen or knife cutting.

As an embodiment of the present invention, the wafer is a wafer for producing a semiconductor or a photovoltaic element, for example, the wafer is selected from a germanium wafer, a gallium arsenide wafer, or a sapphire wafer.

The above and other objects, features and advantages of the present invention will become more <RTIgt; Furthermore, the directional terms mentioned in the present invention, such as "upper", "lower", "before", "after", "left", "right", "inside", "outside" or "side", etc. Just refer to the direction of the additional schema. Therefore, the directional terminology used is for the purpose of illustration and understanding of the invention.

The present invention will provide an automatic positioning method for the first die in the following preferred embodiment, which is performed after the wafer is tested and before the die is sucked by the robot arm, so as to automatically locate the wafer to find the first one. The position of the die, so that the control computer of the robot arm can start reading the wafer map, and the robot arm picks up the die sequentially from the first die. For subsequent die attach operations. The present invention will be described in detail below with reference to Figures 2 through 8 in detail detailing the implementation of the above-described steps of the preferred embodiment and its principles.

Referring to FIGS. 2, 3, and 3A, the first step (S01) of the method for automatically positioning the first die of the preferred embodiment of the present invention is to fix a wafer 20 on a mobile carrier 30. In this step, the wafer 20 generally refers to a wafer used to produce semiconductor components (such as various ICs) or photovoltaic components (such as solar cells or LEDs), such as germanium wafers, gallium arsenide wafers or sapphire. Wafer, but not limited to this. When the size of the length x width of the die included in the wafer 20 is less than 10 x 10 millimeters (mm), the present invention is particularly suitable for automatically positioning the first die on the wafer 20. Moreover, the wafer 20 includes a plurality of dies and a plurality of dicing trenches 21 and 22, wherein the dicing trenches 21 and 22 respectively refer to trenches cut along the X-axis and the Y-axis of the wafer 20, respectively. cutting grooves 21, 22 can be intersected, and to define many regions of the die, and die system contains a notched groove d ₀ in the plurality of grains. The vacant die d ₀ refers to a die located on the periphery of the wafer 20 and having a V-notch (V notch), which can be used as a reference point for locating the position of each die.

In addition, in this step, the mobile carrier 30 has at least a two-dimensional moving mechanism that moves along the X-axis and the Y-axis, and usually the wafer 20 is first attached to one of the supporting frames 32 on the carrying tape 31. Then, it is fixed to the mobile platform 30 together with the support frame 32 and the carrier tape 31. It should be noted that the X-axis and the Y-axis referred to in the present invention refer only to two mutually perpendicular directions, and preferably refer to the respective cutting grooves. The grooves 21, 22 are parallel or approximately parallel to the two extending directions, and the X-axis and the Y-axis can also be expressed as a lateral direction and a longitudinal direction, or a horizontal direction and a vertical direction.

Referring to FIG. 2, FIG. 3 and FIG. 3A, the step (S02) of the method for automatically positioning the first die of the preferred embodiment of the present invention is: causing an image capturing unit 40 to face the missing slot of the wafer 20. d ₀ grains, using the image capturing unit 40 fetches the missing video slot die d ₀ of 41, 50 and image analysis by an image processing apparatus and the position of the slot die of d ₀ is defined as the lack of coordinates Position (0,0). In this step, the image capturing unit 40 is located above the wafer 20 and maintained at a predetermined distance (for example, 1 to 50 cm), and as shown in FIGS. 3 and 3A, this step is first performed by an operation. The position of the mobile carrier 30 or the image capturing unit 40 is manually adjusted so that the image capturing unit 40 pairs the missing die d ₀ of the wafer 20, and then the image is captured. The unit 40 captures the image 41 of the slotted die d ₀ (and its adjacent area), and then includes the image 41 by the image processing device 50 (for example, a personal computer, a notebook computer, or a server computer). The grain area of the V-shaped notch image feature is defined as the slab die d ₀ , and the position of the vacant grain d ₀ (for example, its center point position) is defined as a coordinate position (0, 0).

Referring to FIGS. 2, 4, 4A and 4B, the step (S03) of the method for automatically positioning the first die of the preferred embodiment of the present invention is: making the mobile carrier 30 and the wafer 20 face the image. The capturing unit 40 is stepped along the X-axis by a distance of a die, and the image capturing unit 40 captures an image of a die d ₁ adjacent to the inner side of the missing die d ₀ , and by using the image The image processing device 50 performs image analysis and defines the coordinate position of the crystal grain d ₁ as (1, 0). In this step, the die d _{1 is} the first die after the first movement of the missing die d ₀ , and the present invention moves the wafer 20 by the mobile carrier 30 . At the same time, the image capturing unit 40 is kept stationary; but in another embodiment, it is also possible to keep the mobile carrier 30 and the wafer 20 fixed, but move the image capturing unit 40. The crystal grain d ₁ refers to the closest one crystal grain adjacent to the radially inner side of the vacant crystal grain d ₀ . After the step displacement, the image capturing window of the image capturing unit 40 is stepped along the X axis by a distance of a grain (for example, 10 mm), that is, the image capturing window is aligned to the adjacent die. A region of the grain d _{1 below} the inner side of d ₀ . At this time, the image 41 of the die d ₁ (and its adjacent region) can be captured, wherein the detailed steps of defining the coordinate position of the die d ₁ as (1, 0) are as follows: First, The image 41 of the die d ₁ (and its adjacent region) is transmitted to the image processing device 50, and then the image processing device 50 automatically omits the analysis of one of the intermediate block regions 43 of the image (as shown in FIG. 4B), and only A peripheral block area 42 of the image is analyzed, wherein: (1) if the peripheral block area 42 includes images of the four intersecting rows of the cutting grooves 21, 22, it is determined that the image of the die d ₁ is correct. And ending the action of defining the coordinate position of the die d ₁ as (1, 0); or (2) determining if the peripheral block region 42 does not include the complete image of the four intersecting rows of the cutting grooves 21, 22 The image 41 of the die d ₁ is incorrect. At this time, the mobile carrier 30 and the wafer 20 are slightly moved relative to the image capturing unit 40 for position compensation, and then the image capturing unit 40 is used again. The image 41 of the die d ₁ is captured until the image processing device 50 analyzes and determines the shadow of the die d ₁ Like 41 is correct enough to define the coordinate position as (1,0). Furthermore, the above-mentioned automatic omitting of the intermediate block area 43 of the image is intended to directly omit the meaningless central area where the cutting groove is less likely to exist, so as to relatively reduce the workload of image analysis and relatively accelerate the speed of image analysis. .

Referring to FIGS. 2 and 5, the first step (S04) of the method for automatically positioning the first die of the preferred embodiment of the present invention is: if the total number of grains m to be moved along the X axis is equal to 1, then proceeding The next step (S05); if the total number m of crystal grains to be moved along the X axis is an integer of 2 or more, a plurality of crystal grains d _{2 are} sequentially drawn along the X axis in a similar step (S03). ..d image of _m, the more grain to d ₂ ... D _m of position coordinates are defined as (2,0) ... (m, 0 ). In this step, the crystal grains d ₂ ... d _m are the second ... m crystal grains after the second ... m movement of the missing groove crystal d ₀ , the crystal to be moved The total number m of particles is set based on the x value of the coordinate position (x, y) of the first crystal grain preset by the wafer 20. In the case of the first case (m is equal to 1), the step (S05) can be directly performed after the completion of the step (S03); if the second case (m is an integer of 2 or more), the step (S03) is completed. Then, the steps of stepping displacement, image positioning and position compensation of the similar step (S03) are continued. For example, after the step (S03), the mobile platform 30 and the wafer 20 are then moved relative to the image capturing unit 40. And further moving the distance of a die (for example, 10 mm) along the X axis, and using the image capturing unit 40 to capture an image of a die d ₂ adjacent to the inner side of the die d ₁ , and by using the image The image processing device 50 performs image analysis and defines a coordinate position of the crystal grain d ₂ as (2, 0); and then sequentially extracts a plurality of crystal grains d ₃ and d ₄ along the X axis in a manner similar to the above steps. ... d _m of the image, so that the d 50 of these grains by the image processing apparatus _3, d ₄ ... d _m of position coordinates are defined as (3,0), (4,0) .. (m, 0), where m is, for example, a positive integer of 3 or more.

Referring to FIGS. 2 and 6, the step (S05) of the method for automatically positioning the first die of the preferred embodiment of the present invention is: making the mobile carrier 30 and the wafer 20 opposite to the image capturing unit 40. The image capturing unit 40 is used to capture the image of another die d _m+1 adjacent to the die d _m , and the image processing device is used. Image analysis was performed and the coordinate position of the grain d _m+1 was defined as (m, 1). In this step, the die d _m+1 is the m+1th die after the m+1th movement of the missing die d ₀ , and the die d _{m+1 is} adjacent to The closest one of the crystal grains d _{m on} one side (such as the lower side or the upper side of the crystal grains d _m of Fig. 6). In addition to moving along the Y axis, the steps and principles of step displacement, image positioning and position compensation are similar to the steps (S03), and therefore will not be described in detail herein.

Referring to FIGS. 2 and 7, the step (S06) of the method for automatically positioning the first die of the preferred embodiment of the present invention is: if the total number of grains n to be moved along the Y axis is equal to 1, then proceeding The next step (S07); if the total number n of crystal grains to be moved along the Y-axis is an integer of 2 or more, sequentially picking a plurality of crystal grains d _m+ along the Y-axis in a similar step (S05) ₂ ... d _{m + n} of images, some of the grains to _{d m + 2 ... d m +} n are defined as the coordinate position (m, 2) ... (m , n). In this step, the crystal grains d _m+2 ... d _m+n are the m+2 after the m+2...m+n movement of the missing groove crystal d ₀ . .m+n grains, the total number of grains n to be moved is set according to the y value of the coordinate position (x, y) of the first grain of the wafer 20 preset. In the case of the first case (n is equal to 1), the step (S07) can be directly performed after the completion of the step (S05); if the second case (n is an integer of 2 or more), the step (S05) is completed. Then, the steps of stepping displacement, image positioning, and position compensation in a similar step (S05) are continued. For example, after the step (S05), the mobile carrier 30 and the wafer 20 are then opposed to the image capturing unit 40. then a stepping movement distance of the Y-axis lattice crystal (e.g. 10mm), and using the image capturing unit 40 to retrieve the next adjacent grain in the die d _m d _{m + 1} the lower side (or upper side) of the ₊₂ image, and image analysis by the image processing device 50 and defining the coordinate position of the die d _m+2 as (m, 2); and then sequentially following the Y-axis in a manner similar to the above steps Extracting images of a plurality of crystal grains d _m+3 , d _m+4 ... d _m+n , so that the crystal grains d _m+3 , d _m+4 ... The coordinate positions of d _m+n are defined as (m, 3), (m, 4), ... (m, n), respectively, where m is, for example, a positive integer of 3 or more.

Referring to FIGS. 2 and 8, the first step (S07) of the method for automatically positioning the first die of the preferred embodiment of the present invention is: defining the die d _{m+n with a} coordinate position of (m, n) It is a die, and an auxiliary positioning mark is respectively marked on the two invalid crystal grains d _x1 and d _x2 on the side of the first die. In this step, when the mobile carrier 30 and the wafer 20 have been sequentially moved along the X-axis and the Y-axis along the X-axis and the Y-axis, respectively, the m- and n-grain distances are sequentially shifted. Correspondingly, the automatic actions of "step displacement and image positioning" of m times and n times are completed, and each of the automatic actions may or may not include the selective action of position compensation. Finally, in this step, the auxiliary positioning marks can be marked on the two invalid crystal grains d _x1 , d _x2 by means of laser lithography, ink stamping, ink pen or knife engraving (for example, a pen using oily ink). Marking actions can be done using automated tools or manually.

After the step (S07), the method further includes the following steps: (S08), aligning a robot arm (not shown) to the first die of the wafer 20, and starting from the first die The action of the grain. It should be noted that the above steps (S01) to (S07) of the present invention belong to a standard positioning mode flow operation mode, and the present invention also provides a fast positioning mode to be selected for processing a plurality of wafers of the same specification. At 20 o'clock, the fast positioning mode can be used to accelerate the processing of the second or subsequent wafers 20 to quickly and automatically locate the position of the first die on each wafer 20, thereby facilitating the acceleration of the positioning operation.

The quick positioning mode further includes the following steps after the step (S08): (S09), removing the wafer 20, and placing a second wafer 20 of the same specification on the same mobile carrier; (S10) And two of the cutting grooves 21 extending along the X-axis on both sides of the slab die d _{0 of the} step (S02) are defined as two X-axis moving reference lines to directly make the mobile stage 30 and the wafer 20 m grid moving die 40 relatively accurate distance along the X axis of the image capturing unit; (S11), the extension of the die step (S05) of D _m on both sides along the Y axis wherein the two cutting grooves 22 Defined as a moving reference line of the Y axis, so as to directly move the mobile carrier 30 and the wafer 20 relative to the image capturing unit 40 along the Y axis by n grain distance; and (S12), After moving along the X and Y axes, the image dm _+n that is aligned to and captured by the image capturing unit 40 is directly defined as a first crystal grain, and two of the first side of the first crystal grain. An auxiliary positioning mark is respectively indicated on the invalid crystal grains d _x1 and d _x2 .

As described above, the method of locating the first die on the wafer by manual visual inspection is time consuming and is prone to misjudgment of the first die position due to the small size and excessive number of crystal grains. The present invention uses the mobile carrier 30, the image capturing unit 40, and the image processing device 50. The mobile carrier 30 automatically moves a wafer 20 stepwise; the image capturing unit 40 is in the crystal On the circle 20, a die image of a predetermined number of cells is sequentially taken along the X axis by a slotted die d ₀ , and then a predetermined number of grain images are sequentially captured along the Y axis; the image processing device 50, the image analysis and coordinate positioning of each grain image, in order to quickly and accurately locate the correct position of the first die, thereby improving the accuracy of positioning the first die and speeding up the positioning operation. Furthermore, in the present invention, during the step of moving the wafer 20 by the mobile carrier 30, the image capturing unit 40 is used to capture images of the respective crystal grains for automatic image analysis to define each The coordinate position of the grid and the position compensation action can be performed when it is judged that the coordinate position is wrong, which is beneficial to ensure the correctness of each movement operation. In addition, the present invention has a standard positioning mode and a fast positioning mode to select, so that when processing a plurality of wafers 20 of the same specification, the fast positioning mode can be utilized to accelerate the processing of the second or subsequent wafers 20 to quickly The position of the first die on each wafer 20 is automatically located, thereby facilitating the acceleration of the positioning operation.

The present invention has been disclosed in its preferred embodiments, and is not intended to limit the invention, and the present invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application.

10‧‧‧ wafer

11‧‧‧Slotted grains

12‧‧‧First grain

13‧‧‧Invalid grain

14‧‧‧Invalid grain

20‧‧‧ wafer

21‧‧‧ cutting trench

22‧‧‧Cutting trench

30‧‧‧Mobile carrier

31‧‧‧ Carrying tape

32‧‧‧Support frame

40‧‧‧Image capture unit

41‧‧‧Image

42‧‧‧ perimeter box area

43‧‧‧Intermediate square area

50‧‧‧Image processing device

d ₀ ‧‧‧ vacant grains

d ₁ , d _m , d _m+1 , d _m+n ‧‧‧ grains

d _x1 , d _x2 ‧‧‧ invalid grain

Figure 1: Schematic diagram of a conventional method of locating the first die on a wafer.

Fig. 2 is a schematic view showing the steps (S01) of the apparatus for automatically positioning the first die of the preferred embodiment of the present invention.

Figure 3 is a schematic illustration of the operation of the step (S02) of the preferred embodiment of the present invention.

FIG. 3A is a schematic diagram showing the image of the missing groove crystal obtained by the step (S02) of the preferred embodiment of the present invention.

Figure 4 is a schematic illustration of the operation of the step (S03) of the preferred embodiment of the present invention.

Figure 4A is a schematic diagram showing the acquisition of a grain image under the step (S03) of the preferred embodiment of the present invention.

FIG. 4B is a schematic diagram showing the processing of the grain image processing of FIG. 4A in the preferred embodiment of the present invention.

Figures 5, 6, 7, and 8 are schematic views of the operations of steps (S04), (S05), (S06), and (S07) of the preferred embodiment of the present invention.

20‧‧‧ wafer

d ₀ ‧‧‧ vacant grains

d _m+n ‧‧‧ grain

d _x1 ‧‧‧Invalid grain

d _x2 ‧‧‧Invalid grain

Claims (9)

An automatic positioning method for a first die, comprising the steps of: (S01), fixing a wafer on a mobile loading platform, wherein the wafer comprises a plurality of crystal grains and a plurality of cutting grooves, the crystals The grain has a length and width dimension of less than 10×10 mm, and the die includes a slab die d ₀ ; (S02), and an image capturing unit pair is located on the slab die d ₀ of the wafer, and the The image capturing unit captures the image of the missing die d ₀ , and performs image analysis by an image processing device and defines the position of the missing die d ₀ as a coordinate position (0, 0); (S03) And moving the mobile carrier and the wafer to the image capturing unit along the X-axis by a distance of one crystal grain, and the image capturing unit is used to draw adjacent to the inner side of the missing die d ₀ d of die image _1, and image processing performed by the image analysis apparatus and the die d is defined as _position coordinate of (1,0); (S04), if the die to be moved along the X axis the total grid If the number m is equal to 1, the next step (S05) is performed; if the total number m of crystal grains to be moved along the X axis is an integer of 2 or more, along the X in a similar step (S03) Sequentially capturing images the number of dies D ... d _m of _2, so that the more the grain D ₂ ... d _m of position coordinates are defined as (2,0) ... (m, 0 ) (S05), the distance between the movable carrier and the wafer relative to the image capturing unit is stepwise displaced along the Y axis by a lattice, and the image capturing unit is used to draw adjacent to the side of the die d _m An image of another die d _m+1 and image analysis by the image processing device and defining a coordinate position of the die d _m+1 as (m, 1); (S06), if along the Y axis If the total number of grains n to be moved is equal to 1, the next step (S07) is performed; if the total number n of crystal grains to be moved along the Y axis is an integer of 2 or more, the method is similar (S05). sequentially fetching the Y-axis the number of dies d _{m 2} ... d _{m + + n} of the image, so that the some grains _{d m + 2 ... d m +} n are defined as the coordinate position (m , 2)...(m,n); and (S07), the crystal grain d _m+n whose coordinate position is (m,n) is defined as a first crystal grain, and is next to the first crystal grain An auxiliary positioning mark is respectively indicated on the two invalid crystal grains on the side; wherein in the steps (S03) to (S06), each of the image capturing units is used to take a crystal grain When the image is imaged, the image is transmitted to the image processing device, and the image processing device automatically omits the analysis of one of the middle block regions of the image, and analyzes only one of the surrounding frame regions of the image, wherein: if the peripheral box region contains Intersecting the four images of the cutting groove, determining that the image of the die is correct, and ending the action of defining the coordinate position of the die; or if the peripheral box region does not include four intersecting rows of the cutting trench The image of the die is determined to be incorrect, and the mobile carrier and the wafer are slightly moved relative to the image capturing unit for position compensation, and the image capturing unit is used to retrieve the image. The image of the die is until the image processing device analyzes and determines that the image of the die is correct. The method for automatically positioning a first die according to claim 1, wherein the wafer of the step (S01) is first attached to a carrier tape of a support frame, and then together with the support frame and the carrier tape It is fixed on the mobile platform. The method for automatically positioning a first die according to claim 1, wherein in the steps (S03) to (S06), the mobile carrier and the wafer are stepped relative to the image capturing unit. When the wafer is moved by the mobile carrier, the image capturing unit is kept stationary. The method for automatically positioning a first die according to claim 1, wherein in the steps (S03) to (S06), the mobile carrier and the wafer are stepped relative to the image capturing unit. When the mobile carrier and the wafer are fixed, the image capturing unit is moved. The method for automatically positioning the first die according to claim 1, wherein after the step (S07), the method further comprises: (S08), aligning a robot arm to the first die of the wafer, And the action of sucking the crystal grains is started by the first crystal grain. The method for automatically positioning a first die according to claim 5, wherein after the step (S08), the method further comprises the steps of: (S09), removing the wafer, and placing the same on the mobile platform; a second wafer of the same specification; (S10), wherein two of the cutting grooves extending along the X-axis on both sides of the missing die d _{0 of the} step (S02) are defined as two moving reference lines of the X-axis, so as to be directly And moving the mobile carrier and the wafer to the image capturing unit to accurately move the m-grain distance along the X-axis; (S11), extending the two sides of the die d _{m of the} step (S05) along the Y-axis Two of the cutting grooves are defined as two moving reference lines of the Y axis, so as to directly move the mobile loading platform and the wafer relative to the image capturing unit along the Y axis by n grain distance; and (S12 After moving along the X and Y axes, the image dm _+n that is aligned to and captured by the image capturing unit is directly defined as a first crystal grain, and is adjacent to the first crystal grain. An auxiliary positioning mark is respectively indicated on the two invalid crystal grains. For the automatic positioning method of the first die as described in claim 1, wherein the step (S07) marks the auxiliary crystal on the invalid crystal by laser lithography, ink stamping, ink pen or knife etching. Positioning token. For the automatic positioning method of the first die as described in claim 6, wherein the step (S12) marks the auxiliary crystal on the invalid crystal by laser lithography, ink stamping, ink pen or knife etching. Positioning token. The method for automatically positioning a first die according to claim 1, wherein the wafer is selected from the group consisting of a germanium wafer, a gallium arsenide wafer, or a sapphire wafer.