TWI498291B - A glass substrate manufacturing method and a glass substrate manufacturing apparatus - Google Patents

A glass substrate manufacturing method and a glass substrate manufacturing apparatus Download PDF

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Publication number
TWI498291B
TWI498291B TW102135230A TW102135230A TWI498291B TW I498291 B TWI498291 B TW I498291B TW 102135230 A TW102135230 A TW 102135230A TW 102135230 A TW102135230 A TW 102135230A TW I498291 B TWI498291 B TW I498291B
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glass
temperature
flat glass
cooling
flat
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TW102135230A
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Chinese (zh)
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TW201429889A (en
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Nobuhiro Maeda
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Avanstrate Inc
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B17/00Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
    • C03B17/06Forming glass sheets
    • C03B17/064Forming glass sheets by the overflow downdraw fusion process; Isopipes therefor
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B17/00Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
    • C03B17/06Forming glass sheets
    • C03B17/067Forming glass sheets combined with thermal conditioning of the sheets

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)

Description

玻璃基板之製造方法及玻璃基板製造裝置Glass substrate manufacturing method and glass substrate manufacturing device

本發明係關於一種製造玻璃基板之玻璃基板之製造方法及玻璃基板製造裝置。The present invention relates to a method for producing a glass substrate for producing a glass substrate and a glass substrate manufacturing apparatus.

自先前,一直使用藉由使用成形體之溢流下拉法而製造玻璃基板之方法。一般而言,於成形體中,若將熔融玻璃之溫度長時間保持於液相溫度附近,則熔融玻璃中析出結晶,產生失透。Since the prior art, a method of manufacturing a glass substrate by using an overflow down-draw method of a formed body has been used. In general, when the temperature of the molten glass is maintained in the vicinity of the liquidus temperature for a long period of time in the molded body, crystals are precipitated in the molten glass to cause devitrification.

已知一種技術(專利文獻1),其係為了防止成形時之玻璃之失透,而使成形體供給時之熔融玻璃之溫度低於先前,且使成形體下端之熔融玻璃之溫度高於先前,使對成形體供給時之熔融玻璃之溫度與通過成形體下端時之熔融玻璃之溫度之差小於90℃。A technique (Patent Document 1) is known in which the temperature of the molten glass at the time of supplying the molded body is lower than the previous one in order to prevent devitrification of the glass during molding, and the temperature of the molten glass at the lower end of the formed body is higher than that of the prior art. The difference between the temperature of the molten glass when the molded body is supplied and the temperature of the molten glass when passing through the lower end of the molded body is less than 90 °C.

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1]日本專利第4511187號公報[Patent Document 1] Japanese Patent No. 4511187

然而,上述技術係使成形體之最下端部之熔融玻璃之溫度高於先前。進而,上述技術係使成形中之熔融玻璃之溫度充分地高於液相溫度而防止失透。如此般,上述技術為了使玻璃不產生失透,而必須使通過成形體之熔融玻璃之溫度高於先前。因此,成形體之最下端部之熔融玻璃之溫度變得高於先前,且玻璃之黏度變低,故無法抑制因自成形體分離而產生之平板玻璃於寬度方向上欲收縮之力,從而與先前相比,平板玻璃之收縮變大。進而,由於成形體之最下端部之熔融 玻璃之溫度變得高於先前,故較成形體為下方之空間之溫度因來自熔融玻璃之熱傳遞而上升,從而無法使較成形體為下方之空間中之平板玻璃之寬度方向之兩端部之黏度充分地上升。其結果,導致平板玻璃之寬度收縮之問題變得顯著。However, the above technique is such that the temperature of the molten glass at the lowermost end portion of the formed body is higher than that of the prior art. Further, in the above technique, the temperature of the molten glass during molding is sufficiently higher than the liquidus temperature to prevent devitrification. As such, in order to prevent devitrification of the glass, the above technique must make the temperature of the molten glass passing through the formed body higher than before. Therefore, the temperature of the molten glass at the lowermost end portion of the molded body becomes higher than that of the prior art, and the viscosity of the glass becomes low, so that the force of the flat glass generated by the separation of the molded body in the width direction cannot be suppressed, thereby The shrinkage of the flat glass has become larger than before. Further, due to the melting of the lowermost end portion of the formed body Since the temperature of the glass becomes higher than the previous one, the temperature of the space below the molded body rises due to heat transfer from the molten glass, so that the both ends of the flat glass in the space below the molded body cannot be formed. The viscosity is raised sufficiently. As a result, the problem of shrinkage of the width of the flat glass becomes remarkable.

因此,本發明之目的在於提供一種玻璃基板之製造方法及玻璃基板製造裝置,其可抑制使用成形體而成形之玻璃平板之寬度於自成形體分離時進行收縮,從而確保作為目標之平板玻璃之寬度。Therefore, an object of the present invention is to provide a method for producing a glass substrate and a glass substrate manufacturing apparatus which can suppress shrinkage of a glass flat plate formed by using a molded body when being separated from a molded body, thereby securing a target flat glass. width.

本發明包含以下之態樣。The present invention encompasses the following aspects.

本發明之一態樣係一種玻璃基板之製造方法。One aspect of the present invention is a method of manufacturing a glass substrate.

[態樣1][Scenario 1]

一種玻璃基板之製造方法,該製造方法包含以下步驟:於由爐壁包圍之成形爐室之上部空間中,使熔融玻璃自成形體溢流,成形平板玻璃;使上述平板玻璃通過藉由將上述成形爐室分隔為上部空間與下部空間之隔熱構件而形成之狹縫狀之間隙;及於上述下部空間中,使上述平板玻璃之兩端部冷卻;上述隔熱構件係使用具有隔熱性之材料,以使(1)於上述成形平板玻璃之步驟中,上述熔融玻璃通過上述成形體時之上述熔融玻璃之溫度為液相溫度以上,且上述熔融玻璃通過上述成形體之最下端部時之上述熔融玻璃之兩端部之黏度成為104.3 ~106 dPa.秒,且(2)於冷卻上述平板玻璃之步驟中,當上述平板玻璃之中央部之溫度處於自高於軟化點之溫度變為退火點附近為止之溫度區域時,使 上述平板玻璃之兩端部之黏度成為109.0 ~1014.5 dPa.秒。A method for producing a glass substrate, comprising: forming a flat glass by overflowing molten glass from a molded body in an upper space of a forming furnace chamber surrounded by a furnace wall; The forming furnace chamber is partitioned into a slit-like gap formed by the heat insulating members of the upper space and the lower space; and the both ends of the flat glass are cooled in the lower space; the heat insulating member is insulated In the step of forming the flat glass (1), the temperature of the molten glass when the molten glass passes through the molded body is equal to or higher than a liquidus temperature, and the molten glass passes through the lowermost end portion of the molded body. The viscosity of the two ends of the molten glass is 10 4.3 ~ 10 6 dPa. And (2) in the step of cooling the flat glass, when the temperature of the central portion of the flat glass is in a temperature region from a temperature higher than a softening point to a vicinity of the annealing point, the both ends of the flat glass are made The viscosity of the part becomes 10 9.0 ~ 10 14.5 dPa. second.

[態樣2][Surface 2]

如態樣1之玻璃基板之製造方法,其中上述隔熱構件之上述上部空間與上述下部空間之間之熱阻係於上述上部空間之環境溫度下為0.2m2 .K/W以上。A method of producing a glass substrate according to aspect 1, wherein a thermal resistance between the upper space of the heat insulating member and the lower space is 0.2 m 2 at an ambient temperature of the upper space. K/W or above.

[態樣3][Surface 3]

如態樣1或2之玻璃基板之製造方法,其中於上述下部空間中包含以下步驟:使上述平板玻璃之上述中央部之寬度方向之溫度分佈均勻,且使上述平板玻璃之兩端部之溫度低於上述中央部之溫度;及使上述兩端部及上述中央部之溫度相較使上述平板玻璃之兩端部之溫度低於上述中央部之溫度之步驟中之上述兩端部及上述中央部之溫度成為低溫,且自上述中央部之寬度方向之中心朝向上述兩端部,在上述平板玻璃之寬度方向上形成溫度梯度。The method for producing a glass substrate according to aspect 1 or 2, wherein the lower space includes a step of uniformly making a temperature distribution in a width direction of the central portion of the flat glass and a temperature of both end portions of the flat glass a temperature lower than a temperature of the central portion; and a temperature at which the temperature of the both end portions and the central portion are lower than a temperature at which both ends of the flat glass are lower than a temperature of the central portion The temperature of the portion is low, and a temperature gradient is formed in the width direction of the flat glass from the center in the width direction of the central portion toward the both end portions.

[態樣4][Surface 4]

如態樣1至3中任一項之玻璃基板之製造方法,其中上述玻璃基板之液相黏度為104.3 dPa.秒~106.7 dPa.秒。The method for producing a glass substrate according to any one of the aspects 1 to 3, wherein the glass substrate has a liquid viscosity of 10 4.3 dPa. Seconds ~ 10 6.7 dPa. second.

[態樣5][Surface 5]

如態樣1至4中任一項玻璃基板之製造方法,其中上述玻璃基板之應變點為670℃以上。The method for producing a glass substrate according to any one of the aspects 1 to 4, wherein the glass substrate has a strain point of 670 ° C or higher.

[態樣6][Figure 6]

一種玻璃基板製造裝置,其包含:成形爐室,其係由爐壁圍成;隔熱構件,其將上述成形爐室分隔為上部空間與下部空間,且形成上述平板玻璃所通過之狹縫狀之間隙;成形體,其設置於上述成形爐室之上述上部空間,且使熔融玻 璃溢流,成形平板玻璃;及冷卻構件,其於上述下部空間,使上述平板玻璃之兩端部冷卻;上述隔熱構件使用具有隔熱性之材料,以使(1)於上述成形平板玻璃之步驟中,上述熔融玻璃通過上述成形體時之上述熔融玻璃之溫度為液相溫度以上,且上述熔融玻璃通過上述成形體之最下端部時之上述熔融玻璃之兩端部之黏度成為104.3 ~106 dPa.秒,且(2)於冷卻上述平板玻璃之步驟中,當上述平板玻璃之中央部之溫度處於自高於軟化點之溫度變為退火點附近為止之溫度區域時,上述平板玻璃之兩端部之黏度成為109.0 ~1014.5 dPa.秒。A glass substrate manufacturing apparatus comprising: a molding furnace chamber surrounded by a furnace wall; and a heat insulating member that divides the forming furnace chamber into an upper space and a lower space, and forms a slit shape through which the flat glass passes a gap formed in the upper space of the forming furnace chamber and overflowing the molten glass to form a flat glass; and a cooling member that cools both end portions of the flat glass in the lower space; In the step of forming the flat glass, the temperature of the molten glass when the molten glass passes through the molded body is at a liquidus temperature or higher, and the molten glass passes through the heat insulating member. The viscosity of the both ends of the molten glass at the lowermost end of the molded body is 10 4.3 to 10 6 dPa. And (2) in the step of cooling the flat glass, when the temperature of the central portion of the flat glass is in a temperature region from a temperature higher than a softening point to a vicinity of an annealing point, both ends of the flat glass The viscosity becomes 10 9.0 ~ 10 14.5 dPa. second.

於上述玻璃基板中,可使用具有下述特性之玻璃。In the above glass substrate, glass having the following characteristics can be used.

[態樣7][Stage 7]

如態樣1至6中任一項之玻璃基板之製造方法或玻璃基板製造裝置,其中上述玻璃基板之玻璃之液相黏度為104.3 dPa.秒~106.7 dPa.秒。The aspect of producing a glass substrate according to any one of methods 1 to 6 or a glass substrate manufacturing apparatus, wherein the liquid phase of the glass substrate of the glass viscosity of 10 4.3 dPa. Seconds ~ 10 6.7 dPa. second.

[態樣8][Surface 8]

如態樣1至7中任一項之玻璃基板之製造方法或玻璃基板製造裝置,其中上述玻璃基板含有氧化鋯。The method for producing a glass substrate according to any one of aspects 1 to 7, wherein the glass substrate contains zirconia.

[態樣9][Surface 9]

如態樣1至8中任一項之玻璃基板之製造方法或玻璃基板製造裝置,其中上述玻璃基板含有氧化錫。The method for producing a glass substrate according to any one of aspects 1 to 8, wherein the glass substrate contains tin oxide.

[態樣10][Surface 10]

如態樣1至9中任一項之玻璃基板之製造方法或玻璃基板製造裝置,其中上述玻璃基板包含實質上不含鹼金屬氧化物之無鹼玻璃。The method for producing a glass substrate according to any one of aspects 1 to 9, wherein the glass substrate comprises an alkali-free glass substantially free of an alkali metal oxide.

[態樣11][Stage 11]

又,如態樣1至9中任一項之玻璃基板之製造方法或玻璃基板製造裝置,其中上述玻璃基板包含含有0.05~2.0質量%之鹼金屬氧化物之含微量鹼之玻璃。The glass substrate manufacturing method or the glass substrate manufacturing apparatus according to any one of the aspects 1 to 9, wherein the glass substrate comprises a glass containing a trace amount of alkali containing 0.05 to 2.0% by mass of an alkali metal oxide.

[態樣12][Surface 12]

如態樣1至11中任一項之玻璃基板之製造方法或玻璃基板製造裝置,其中上述熔融玻璃係藉由使玻璃原料於含有高氧化鋯系耐火物所構成之熔解槽中電熔融而生成。The method for producing a glass substrate according to any one of aspects 1 to 11, wherein the molten glass is produced by electrically melting a glass raw material in a melting tank comprising a high zirconia refractory. .

根據上述態樣之玻璃基板之製造方法及玻璃基板製造裝置,可抑制使用成形體成形之玻璃平板之寬度於自成形體分離時進行收縮,從而可確保作為目標之平板玻璃之寬度。According to the method for producing a glass substrate and the glass substrate manufacturing apparatus of the above aspect, it is possible to suppress shrinkage of the width of the glass flat plate formed by using the molded body when separating from the molded body, and to secure the width of the target flat glass.

10a、10d‧‧‧直線10a, 10d‧‧‧ straight line

10b、10c、10e、10f‧‧‧曲線10b, 10c, 10e, 10f‧‧‧ curves

11‧‧‧熔解裝置11‧‧‧melting device

12‧‧‧澄清裝置12‧‧‧Clarification device

20a‧‧‧第1溫度分佈20a‧‧‧1st temperature distribution

20b‧‧‧第2溫度分佈20b‧‧‧2nd temperature distribution

20c‧‧‧第3溫度分佈20c‧‧‧3rd temperature distribution

23‧‧‧上游導管23‧‧‧Upstream catheter

24‧‧‧下游導管24‧‧‧Downstream catheter

32‧‧‧溫度控制單元32‧‧‧ Temperature Control Unit

40‧‧‧成形裝置40‧‧‧Forming device

41‧‧‧成形體41‧‧‧Formed body

41a‧‧‧成形體之下端部41a‧‧‧ Lower end of the formed body

41b‧‧‧成形體之頂部41b‧‧‧Top of the formed body

41c‧‧‧成形體之側面41c‧‧‧ Side of the formed body

50‧‧‧分隔構件50‧‧‧Parts

51‧‧‧冷卻輥51‧‧‧Cooling roller

60‧‧‧冷卻單元60‧‧‧Cooling unit

61‧‧‧中央部冷卻單元61‧‧‧Central cooling unit

62‧‧‧中央上部冷卻單元62‧‧‧Central upper cooling unit

63a、63b‧‧‧中央下部冷卻單元63a, 63b‧‧‧ central lower cooling unit

71‧‧‧端部冷卻單元71‧‧‧End cooling unit

72‧‧‧端上部冷卻單元72‧‧‧End upper cooling unit

73‧‧‧端下部冷卻單元73‧‧‧Lower cooling unit

80‧‧‧退火爐80‧‧‧ Annealing furnace

80a‧‧‧頂板80a‧‧‧ top board

81‧‧‧下拉輥81‧‧‧ Pull down roller

90‧‧‧切斷裝置90‧‧‧cutting device

91‧‧‧控制裝置91‧‧‧Control device

100‧‧‧玻璃基板之製造裝置100‧‧‧Manufacturing device for glass substrates

FG‧‧‧熔融玻璃FG‧‧‧ molten glass

SG‧‧‧平板玻璃SG‧‧ ‧ flat glass

X‧‧‧第1溫度差X‧‧‧1st temperature difference

Y1‧‧‧第2溫度差Y1‧‧‧2nd temperature difference

Y2‧‧‧第3溫度差Y2‧‧‧3rd temperature difference

圖1係表示本實施形態之玻璃基板之製造方法之流程之一例之圖。Fig. 1 is a view showing an example of a flow of a method for producing a glass substrate of the present embodiment.

圖2係實施本實施形態之玻璃基板之製造方法之玻璃基板製造裝置之一例之概略構成圖。FIG. 2 is a schematic configuration diagram showing an example of a glass substrate manufacturing apparatus for carrying out the method for producing a glass substrate of the present embodiment.

圖3係本實施形態之玻璃基板之製造方法中使用之成形裝置之一例之概略構成圖(剖面圖)。Fig. 3 is a schematic configuration view (cross-sectional view) showing an example of a molding apparatus used in the method for producing a glass substrate of the embodiment.

圖4係圖3所示之成形裝置之概略構成圖(側視圖)。Fig. 4 is a schematic configuration view (side view) of the molding apparatus shown in Fig. 3.

圖5係表示本實施形態之玻璃基板之製造方法中使用之控制裝置及與控制裝置連接之各機構之一例之圖。Fig. 5 is a view showing an example of a control device used in the method for producing a glass substrate of the embodiment and each mechanism connected to the control device.

圖6係表示基於以本實施形態之玻璃基板之製造方法進行之複數個溫度分佈,藉由溫度控制所得之環境溫度之圖。Fig. 6 is a view showing the ambient temperature obtained by temperature control based on a plurality of temperature distributions performed by the method for producing a glass substrate of the present embodiment.

(定義)(definition)

本說明書中之下述語句係以如下方式規定。The following statements in this specification are defined as follows.

所謂平板玻璃之端部係指與平板玻璃之寬度方向之緣相距150mm以內之範圍。The end portion of the flat glass refers to a range within 150 mm from the edge of the flat glass in the width direction.

所謂平板玻璃之中央部係指將平板玻璃之端部去除後之部分。The central portion of the flat glass refers to the portion where the end portion of the flat glass is removed.

所謂應變點係指玻璃黏度成為1014.5 dPa.秒時之玻璃之溫度。The so-called strain point means that the glass viscosity becomes 10 14.5 dPa. The temperature of the glass in seconds.

所謂退火點係指玻璃黏度成為1013 dPa.秒時之玻璃之溫度。The so-called annealing point means that the glass viscosity is 10 13 dPa. The temperature of the glass in seconds.

所謂退火點附近之溫度區域係指玻璃退火點加上100℃所得之溫度(玻璃退火點+100℃)與玻璃應變點和玻璃退火點相加後除以2後所得之溫度((玻璃應變點+玻璃退火點)/2)之間的區域。The temperature zone near the annealing point refers to the temperature obtained by adding the glass annealing point plus 100 ° C (glass annealing point + 100 ° C) to the glass strain point and the glass annealing point and dividing by 2 (the glass strain point). + glass annealing point) / 2) between the areas.

所謂軟化點係指玻璃黏度成為107.6 dPa.秒時之玻璃之溫度。The so-called softening point means that the glass viscosity becomes 10 7.6 dPa. The temperature of the glass in seconds.

(整體構成)(overall)

本實施形態之玻璃基板之製造方法係製造液晶電視、電漿電視、及筆記型電腦等之平板顯示器用之玻璃基板。玻璃基板係使用下拉法而製造。The method for producing a glass substrate of the present embodiment is to manufacture a glass substrate for a flat panel display such as a liquid crystal television, a plasma TV, or a notebook computer. The glass substrate is manufactured using a down-draw method.

參照圖1及圖2,對製造出玻璃基板之前之複數個步驟(玻璃基板之製造方法)及用於複數個步驟之玻璃基板之製造裝置100進行說明。A plurality of steps (a method of manufacturing a glass substrate) and a manufacturing apparatus 100 for a glass substrate for a plurality of steps will be described with reference to FIGS. 1 and 2 .

複數個步驟中,包含熔解步驟S1、澄清步驟S2、成形步驟S3、冷卻步驟S4、及切斷步驟S5。The plurality of steps include a melting step S1, a clarifying step S2, a forming step S3, a cooling step S4, and a cutting step S5.

熔解步驟S1係使玻璃之原料熔解之步驟。如圖2所示,將玻璃之原料投入至配置於上游之熔解裝置11。玻璃之原料係於熔解裝置11之熔解槽中熔解,而成為熔融玻璃FG。熔融玻璃FG係通過上游導管23而傳送至澄清裝置12。The melting step S1 is a step of melting the raw material of the glass. As shown in Fig. 2, the raw material of the glass is introduced into the melting device 11 disposed upstream. The raw material of the glass is melted in the melting tank of the melting device 11 to become molten glass FG. The molten glass FG is sent to the clarification device 12 through the upstream conduit 23.

澄清步驟S2係進行熔融玻璃FG中之氣泡去除之步驟。於澄清裝置12內去除氣泡所得之熔融玻璃FG其後通過下游導管24而傳送至成形裝置40。The clarification step S2 is a step of removing bubbles in the molten glass FG. The molten glass FG obtained by removing bubbles in the clarification device 12 is then conveyed to the forming device 40 through the downstream conduit 24.

成形步驟S3係將熔融玻璃FG成形為平板狀之玻璃(平板玻璃)SG之步驟。具體而言,熔融玻璃FG係傳送至成形裝置40中包含之成形 體41之後,自成形體41溢流。經溢流之熔融玻璃FG係沿成形體41之表面流下。熔融玻璃FG係於其後在成形體41之最下端部合流而成為平板玻璃SG。此時,平板玻璃SG通過藉由分隔構件(隔熱構件)50所形成之狹縫狀之間隙,自成形爐室之上部空間移動至下方空間。分隔構件(隔熱構件)50係將具有成形體41(參照圖3)之成形爐室分隔為上部空間與下部空間。The forming step S3 is a step of forming the molten glass FG into a flat glass (plate glass) SG. Specifically, the molten glass FG is transferred to the forming included in the forming device 40. After the body 41, the molded body 41 overflows. The overflowed molten glass FG flows down the surface of the formed body 41. The molten glass FG is then merged at the lowermost end portion of the molded body 41 to become the sheet glass SG. At this time, the sheet glass SG moves from the upper space of the forming furnace chamber to the lower space by the slit-like gap formed by the partition member (heat insulating member) 50. The partition member (heat insulating member) 50 divides the forming furnace chamber having the molded body 41 (see FIG. 3) into an upper space and a lower space.

冷卻步驟S4係將平板玻璃SG退火之步驟。玻璃平板係經由冷卻步驟S4而被冷卻至接近於室溫之溫度。再者,根據成形步驟S1及冷卻步驟S4中之冷卻之狀態,決定玻璃基板之厚度(板厚)、玻璃基板之翹曲量、及玻璃基板之應變量。The cooling step S4 is a step of annealing the sheet glass SG. The glass plate is cooled to a temperature close to room temperature via a cooling step S4. Further, the thickness (thickness) of the glass substrate, the amount of warpage of the glass substrate, and the amount of strain of the glass substrate are determined according to the state of cooling in the forming step S1 and the cooling step S4.

切斷步驟S5係將成為接近於室溫之溫度之平板玻璃SG切斷成特定之大小之步驟。The cutting step S5 is a step of cutting the sheet glass SG which is a temperature close to room temperature into a specific size.

再者,切斷成特定之大小之平板玻璃SG(玻璃片)係於其後經由端面加工等步驟而成為玻璃基板。Further, the sheet glass SG (glass sheet) cut into a specific size is then subjected to a step such as end surface processing to form a glass substrate.

以下說明之實施形態中,使用平板玻璃SG之玻璃之應變點為640℃以上之玻璃。In the embodiment described below, the glass having the flat glass SG has a strain point of 640 ° C or higher.

以下,參照圖3及圖4,說明成形裝置40之構成。再者,於本實施形態中,所謂平板玻璃SG之寬度方向係指與平板玻璃SG流下之方向(流下方向或流下方向)交叉之方向、即水平方向。Hereinafter, the configuration of the molding apparatus 40 will be described with reference to Figs. 3 and 4 . In the present embodiment, the width direction of the sheet glass SG refers to a direction intersecting the direction in which the sheet glass SG flows down (downflow direction or downflow direction), that is, a horizontal direction.

(成形裝置之構成)(Composition of forming device)

首先,圖3及圖4係表示成形裝置40之概略構成。圖3係成形裝置40之剖面圖。圖4係成形裝置40之側視圖。成形裝置40係主要包含成形體41、分隔構件50、冷卻輥51、冷卻單元60、下拉輥81、及切斷裝置90。進而,成形裝置40包含控制裝置91(參照圖9)。控制裝置91係控制成形裝置40中所包含之各構成之驅動部。First, FIG. 3 and FIG. 4 show the schematic configuration of the molding apparatus 40. 3 is a cross-sectional view of the forming device 40. 4 is a side view of the forming device 40. The molding apparatus 40 mainly includes a molded body 41, a partition member 50, a cooling roller 51, a cooling unit 60, a pull-down roller 81, and a cutting device 90. Further, the molding device 40 includes a control device 91 (see FIG. 9). The control device 91 controls the drive units of the respective configurations included in the molding device 40.

以下,對成形裝置40中所含之各構成進行說明。Hereinafter, each configuration included in the molding apparatus 40 will be described.

(成形體)(formed body)

成形體41係藉由使熔融玻璃FG溢流,而將熔融玻璃FG成形為平板狀之玻璃(平板玻璃SG)。In the molded body 41, the molten glass FG is formed into a flat glass (flat glass SG) by overflowing the molten glass FG.

如圖3所示,成形體41係具有剖面形狀為大致五邊形之形狀(類似於楔形之形狀)。大致五邊形之前端相當於成形體41之最下端部41a。As shown in FIG. 3, the formed body 41 has a shape in which the cross-sectional shape is a substantially pentagonal shape (similar to the shape of a wedge shape). The front end of the substantially pentagon corresponds to the lowermost end portion 41a of the formed body 41.

流入至成形體41中之熔融玻璃FG係自成形體41之一對頂部41b溢流,且一面沿著成形體41之一對側面(表面)41c一面流下。其後,熔融玻璃FG於成形體41之最下端部41a合流而成為平板玻璃SG。再者,熔融玻璃通過成形體41之最下端部41a時之熔融玻璃之兩端部之黏度為104.3 ~106 dPa.秒,較佳為104.4 ~105.4 dPa.秒,更佳為104.6 ~105.2 dPa.秒。The molten glass FG that has flowed into the molded body 41 overflows from the one of the molded bodies 41 to the top portion 41b, and flows down along one side of the molded body 41 to the side surface (surface) 41c. Thereafter, the molten glass FG merges at the lowermost end portion 41a of the molded body 41 to become the sheet glass SG. Further, the viscosity of the both ends of the molten glass when the molten glass passes through the lowermost end portion 41a of the molded body 41 is 10 4.3 to 10 6 dPa. Seconds, preferably 10 4.4 ~ 10 5.4 dPa. Seconds, more preferably 10 4.6 ~ 10 5.2 dPa. second.

(分隔構件)(separating member)

分隔構件50係配置於熔融玻璃FG之合流點之附近。又,如圖3所示,將分隔構件50配置於在合流點合流之熔融玻璃FG(平板玻璃SG)之厚度方向之兩側。分隔構件50係隔熱構件。分隔構件50藉由分隔為位於分隔構件50之上方之成形爐室之上部空間與位於下方之成形爐室之下部空間,即,藉由分隔為熔融玻璃FG之合流點之上側環境及下側環境,而阻隔熱自分隔構件50之上側朝向下側之傳遞。平板玻璃SG係通過藉由位於平板玻璃SG之厚度方向兩側之一對分隔構件(隔熱構件)50所形成之狹縫狀之間隙,移動至下部空間。The partition member 50 is disposed in the vicinity of the junction point of the molten glass FG. Moreover, as shown in FIG. 3, the partition member 50 is arrange|positioned on the both sides of the thickness direction of the molten glass FG (flat glass SG) which joins the junction point. The partition member 50 is a heat insulating member. The partition member 50 is partitioned into an upper space of the forming furnace chamber located above the partitioning member 50 and a lower space of the forming furnace chamber located below, that is, by separating the upper side environment and the lower side environment of the merged point of the molten glass FG And the heat insulation is transmitted from the upper side of the partition member 50 toward the lower side. The sheet glass SG is moved to the lower space by a slit-like gap formed by the partition member (heat insulating member) 50 on one of the two sides in the thickness direction of the sheet glass SG.

(冷卻輥)(cooling roll)

冷卻輥51係設置於成形爐室之下部空間,且對平板玻璃SG之寬度方向之兩端部進行熱處理之單元。又,將成對之冷卻輥51配置於平板玻璃SG之厚度方向之兩側且平板玻璃SG之寬度方向之兩端部。即,冷卻輥51將自成形體41分離之平板玻璃SG之寬度方向之兩端部藉由夾入而利用熱傳導進行冷卻(淬火步驟)。冷卻輥51例如亦可藉由 通達內部之空冷管而進行空冷。The cooling roller 51 is a unit that is provided in the lower space of the forming furnace chamber and heat-treats both ends of the flat glass SG in the width direction. Further, the pair of cooling rolls 51 are disposed on both sides in the thickness direction of the sheet glass SG and at both end portions in the width direction of the sheet glass SG. In other words, the cooling roller 51 cools both ends in the width direction of the sheet glass SG separated from the molded body 41 by heat conduction (quenching step). The cooling roller 51 can also be used, for example, by Air cooling is carried out through the internal air-cooling pipe.

冷卻輥51係以使平板玻璃SG之兩端部之黏度成為109.0 ~1014.5 dPa.秒之方式,對平板玻璃SG之兩端部進行淬火。再者,可藉由冷卻輥51對平板玻璃SG之兩端部之冷卻,而減少平板玻璃SG之寬度方向之收縮,從而可使平板玻璃SG之厚度均勻化。又,可保持平板玻璃SG之平坦度。The cooling roller 51 is such that the viscosity of the both ends of the flat glass SG is 10 9.0 ~ 10 14.5 dPa. In the second mode, both ends of the flat glass SG are quenched. Further, by cooling the both ends of the sheet glass SG by the cooling rolls 51, the shrinkage in the width direction of the sheet glass SG can be reduced, and the thickness of the sheet glass SG can be made uniform. Moreover, the flatness of the sheet glass SG can be maintained.

(冷卻單元)(cooling unit)

冷卻單元60係設置於成形爐室之下部空間,且進行平板玻璃SG之熱處理之單元。具體而言,冷卻單元60係將平板玻璃SG冷卻至退火點附近之溫度區域為止之單元。冷卻單元60係配置於分隔構件50之下方且退火爐80之頂板80a之上。冷卻單元60係將平板玻璃SG之上游區域冷卻(上游區域冷卻步驟)。所謂平板玻璃SG之上游區域係指平板玻璃SG之中央部之溫度高於退火點之平板玻璃SG之區域。平板玻璃SG之中央部係被平板玻璃SG之兩端部夾持之部分。具體而言,於上游區域中,包含第1溫度區域與第2溫度區域。第1溫度區域係自成形體41之最下端部41a之正下方起,至平板玻璃SG之中央部之溫度成為軟化點附近(軟化點±15℃之範圍)為止之平板玻璃SG之區域。又,所謂第2溫度區域係指平板玻璃SG之中央部之溫度自軟化點附近變為退火點附近為止之溫度區域。即,冷卻單元60以平板玻璃SG之中央部之溫度接近於退火點之方式,將平板玻璃SG冷卻。平板玻璃SG之中央部係於其後,在下述之退火爐80內,經由應變點冷卻至室溫附近之溫度為止(下游區域冷卻步驟(退火步驟))。The cooling unit 60 is a unit that is disposed in the lower space of the forming furnace chamber and performs heat treatment of the flat glass SG. Specifically, the cooling unit 60 is a unit that cools the sheet glass SG to a temperature region near the annealing point. The cooling unit 60 is disposed below the partition member 50 and above the top plate 80a of the annealing furnace 80. The cooling unit 60 cools the upstream region of the sheet glass SG (upstream region cooling step). The upstream region of the flat glass SG refers to a region in which the temperature of the central portion of the flat glass SG is higher than that of the flat glass SG at the annealing point. The central portion of the sheet glass SG is a portion sandwiched by both end portions of the sheet glass SG. Specifically, the first temperature region and the second temperature region are included in the upstream region. The first temperature region is a region of the sheet glass SG from the immediately below the lowermost end portion 41a of the molded body 41 to the temperature at the central portion of the sheet glass SG to the vicinity of the softening point (the softening point is within a range of ±15 ° C). In addition, the second temperature region refers to a temperature region in which the temperature in the central portion of the sheet glass SG is changed from the vicinity of the softening point to the vicinity of the annealing point. That is, the cooling unit 60 cools the sheet glass SG such that the temperature of the central portion of the sheet glass SG approaches the annealing point. The center portion of the sheet glass SG is thereafter cooled in the annealing furnace 80 described below to a temperature near room temperature via a strain point (downstream region cooling step (annealing step)).

冷卻單元60係以平板玻璃SG之厚度及翹曲量成為所需之值之方式,基於複數個溫度分佈,將平板玻璃SG冷卻。即,於上游區域,沿平板玻璃SG之流下方向而設定複數個溫度分佈。此處,所謂溫度分佈係沿平板玻璃SG之寬度方向之溫度分佈。換言之,溫度分佈係 成為目標之環境溫度之分佈。上述冷卻輥51及冷卻單元60係以實現溫度分佈之方式,控制環境溫度。The cooling unit 60 cools the sheet glass SG based on a plurality of temperature distributions such that the thickness and the amount of warpage of the sheet glass SG become desired values. That is, in the upstream region, a plurality of temperature distributions are set along the downward flow direction of the sheet glass SG. Here, the temperature distribution is a temperature distribution along the width direction of the sheet glass SG. In other words, the temperature distribution system The distribution of the ambient temperature to be the target. The cooling roller 51 and the cooling unit 60 control the ambient temperature so as to achieve a temperature distribution.

冷卻單元60包含複數個冷卻用之單元。平板玻璃SG之溫度分佈係藉由獨立地控制複數個單元而實現複數個溫度分佈。例如,冷卻單元60包含中央部冷卻單元61、及兩個端部冷卻單元71、71。如圖4所示,中央部冷卻單元61係配置於成形裝置40之寬度方向中央,將平板玻璃SG之中央部進行冷卻(中央部冷卻步驟)。中央部冷卻單元61係配置於平板玻璃SG之厚度方向之兩側。端部冷卻單元71係分別配置於與中央部冷卻單元61鄰接之位置上。即,端部冷卻單元71係配置成於平板玻璃SG之厚度方向之兩側,夾隔平板玻璃SG而對向,且將平板玻璃SG之兩端部及兩端部周邊進行冷卻(端部冷卻步驟)。又,中央部冷卻單元61及端部冷卻單元71係分別配置於近接於平板玻璃SG之位置。The cooling unit 60 includes a plurality of units for cooling. The temperature distribution of the sheet glass SG achieves a plurality of temperature distributions by independently controlling a plurality of cells. For example, the cooling unit 60 includes a central portion cooling unit 61 and two end portion cooling units 71, 71. As shown in FIG. 4, the central portion cooling unit 61 is disposed at the center in the width direction of the molding apparatus 40, and cools the central portion of the sheet glass SG (central portion cooling step). The central portion cooling unit 61 is disposed on both sides in the thickness direction of the sheet glass SG. The end portion cooling units 71 are disposed at positions adjacent to the central portion cooling unit 61, respectively. In other words, the end portion cooling unit 71 is disposed on both sides in the thickness direction of the sheet glass SG, and is opposed to the sheet glass SG, and cools both end portions and both end portions of the sheet glass SG (end portion cooling) step). Further, the central portion cooling unit 61 and the end portion cooling unit 71 are disposed at positions close to the sheet glass SG, respectively.

(中央部冷卻單元)(central cooling unit)

中央部冷卻單元61係將平板玻璃SG之中央部沿平板玻璃SG之流下方向階段性地冷卻(中央部冷卻步驟)。中央部冷卻單元61包含中央上部冷卻單元62、及中央下部冷卻單元63a、63b。中央上部冷卻單元62及兩個中央下部冷卻單元63a、63b係沿平板玻璃SG之流下方向而配置。中央上部冷卻單元62及各中央下部冷卻單元63a、63b之溫度係分別獨立地進行調整。The central portion cooling unit 61 cools the central portion of the sheet glass SG stepwise in the downward direction of the sheet glass SG (central portion cooling step). The central portion cooling unit 61 includes a central upper cooling unit 62 and central lower cooling units 63a and 63b. The center upper cooling unit 62 and the two center lower cooling units 63a and 63b are disposed along the downward flow direction of the sheet glass SG. The temperatures of the central upper cooling unit 62 and each of the central lower cooling units 63a and 63b are independently adjusted.

(中央上部冷卻單元)(central upper cooling unit)

中央上部冷卻單元62係位於上述分隔構件50之正下方。中央上部冷卻單元62係用以實現決定平板玻璃SG之厚度之區域的溫度分佈之單元。決定平板玻璃SG之厚度之區域相當於上述第1溫度區域。中央上部冷卻單元62係以使平板玻璃SG之厚度於寬度方向上均勻之方式受到控制(第1中央部冷卻步驟)。The central upper cooling unit 62 is located directly below the partition member 50. The central upper cooling unit 62 is a unit for realizing a temperature distribution of a region determining the thickness of the sheet glass SG. The region determining the thickness of the sheet glass SG corresponds to the first temperature region described above. The center upper cooling unit 62 is controlled such that the thickness of the sheet glass SG is uniform in the width direction (first central portion cooling step).

中央下部冷卻單元63a、63b係如上所述配置於中央上部冷卻單元62之下方。中央下部冷卻單元63a、63b係用以實現開始控制平板玻璃SG之翹曲量之區域之溫度分佈之單元。此處,開始控制平板玻璃SG之翹曲量之區域相當於上述第2溫度區域。The center lower cooling units 63a and 63b are disposed below the center upper cooling unit 62 as described above. The central lower cooling units 63a, 63b are means for realizing the temperature distribution of the region where the amount of warpage of the sheet glass SG is controlled. Here, the region in which the amount of warpage of the sheet glass SG is controlled is controlled to correspond to the second temperature region.

中央下部冷卻單元63a係於第2溫度區域之上游側,進行平板玻璃SG之溫度控制(第2中央部冷卻步驟)。中央下部冷卻單元63b係於第2溫度區域之下游側,進行平板玻璃SG之溫度控制(第3中央部冷卻步驟)。較佳為使中央下部冷卻單元63a與中央下部冷卻單元63b具有相同之構成。The center lower cooling unit 63a is on the upstream side of the second temperature region, and performs temperature control of the sheet glass SG (second center portion cooling step). The center lower cooling unit 63b is on the downstream side of the second temperature region, and performs temperature control of the sheet glass SG (third center portion cooling step). It is preferable that the central lower cooling unit 63a and the central lower cooling unit 63b have the same configuration.

(端部冷卻單元)(end cooling unit)

端部冷卻單元71係將經冷卻輥51淬火之平板玻璃SG之兩端部沿平板玻璃SG之流下方向連續性地或階段性地進行冷卻(端部冷卻步驟)。端部冷卻單元71係以低於冷卻輥51之冷卻能力進行動作。換言之,與被冷卻輥51自平板玻璃SG之側部剝奪之熱量相比,被端部冷卻單元71自平板玻璃SG之端部剝奪之熱量較少。端部冷卻單元71係如上所述分別配置於中央部冷卻單元61之兩側(參照圖4)。端部冷卻單元71係與平板玻璃SG之表面接近地配置。端部冷卻單元71係以將平板玻璃SG之兩端部之黏度維持於109.0 ~1014.5 dPa.秒之範圍內之方式,冷卻平板玻璃SG之兩端部。再者,端部冷卻單元71較佳為以將平板玻璃SG之兩端部之黏度維持於1010.5 ~1014.5 dPa.秒之範圍內之方式,冷卻平板玻璃之兩端部。The end portion cooling unit 71 continuously or stepwise cools both end portions of the sheet glass SG quenched by the cooling rolls 51 in the flow direction of the sheet glass SG (end portion cooling step). The end portion cooling unit 71 operates at a lower cooling capacity than the cooling roll 51. In other words, the amount of heat deprived by the end portion cooling unit 71 from the end portion of the sheet glass SG is less than the amount of heat deprived by the cooling roller 51 from the side portion of the sheet glass SG. The end portion cooling units 71 are disposed on both sides of the central portion cooling unit 61 as described above (see FIG. 4). The end portion cooling unit 71 is disposed close to the surface of the sheet glass SG. The end cooling unit 71 is configured to maintain the viscosity of both ends of the flat glass SG at 10 9.0 ~ 10 14.5 dPa. In the range of seconds, both ends of the flat glass SG are cooled. Furthermore, the end cooling unit 71 preferably maintains the viscosity of the two ends of the flat glass SG at 10 10.5 ~ 10 14.5 dPa. In the range of seconds, the ends of the flat glass are cooled.

若端部冷卻單元71之冷卻量較少,則平板玻璃SG之兩端部之溫度再次上升,導致平板玻璃SG於寬度方向收縮。When the amount of cooling of the end portion cooling unit 71 is small, the temperature at both end portions of the sheet glass SG rises again, causing the sheet glass SG to contract in the width direction.

如圖4所示,端部冷卻單元71例如包含端上部冷卻單元72、及端下部冷卻單元73。端上部冷卻單元72及端下部冷卻單元73係沿平板玻璃SG之流下方向而配置。又,端上部冷卻單元72及端下部冷卻單元 73之溫度係分別獨立地進行調整。As shown in FIG. 4, the end cooling unit 71 includes, for example, an end upper cooling unit 72 and an end lower cooling unit 73. The end upper cooling unit 72 and the end lower cooling unit 73 are disposed along the downward flow direction of the sheet glass SG. Moreover, the upper end cooling unit 72 and the lower end cooling unit The temperature of 73 is adjusted independently.

端上部冷卻單元72係用以實現對平板玻璃SG之厚度及/或翹曲量之調整賦予影響之區域之溫度分佈之單元(第1端部冷卻步驟)。端上部冷卻單元72係如圖4所示,位於上述冷卻輥51之正下方。平板玻璃SG主要藉由端上部冷卻單元72之輻射熱傳遞而以所需之冷卻速度被冷卻。此處,所謂所需之冷卻速度係指抑制通過冷卻輥51之玻璃SG之板寬之收縮,且於端下部冷卻單元73以後之冷卻過程中平板玻璃SG不產生裂痕之冷卻速度。即,端上部冷卻單元72於對平板玻璃SG不造成惡劣影響之範圍內最大限度地冷卻玻璃SG。The end upper cooling unit 72 is a unit for realizing the temperature distribution of the region affected by the adjustment of the thickness and/or the amount of warpage of the sheet glass SG (first end portion cooling step). The end upper cooling unit 72 is located directly below the cooling roller 51 as shown in FIG. The flat glass SG is primarily cooled by the radiant heat transfer of the upper end cooling unit 72 at a desired cooling rate. Here, the required cooling rate refers to a cooling rate at which the shrinkage of the sheet width of the glass SG passing through the cooling roll 51 is suppressed, and the flat glass SG is not cracked during the cooling process after the end lower cooling unit 73. That is, the end upper portion cooling unit 72 maximizes the cooling of the glass SG within a range that does not adversely affect the sheet glass SG.

(下拉輥)(pull down roller)

下拉輥81係配置於退火爐80之內部。退火爐80係配置於冷卻單元60之正下方之空間。於退火爐80中,將平板玻璃SG之溫度自退火點附近之溫度冷卻至室溫附近之溫度為止(下游區域冷卻步驟(退火步驟))。The pull-down roller 81 is disposed inside the annealing furnace 80. The annealing furnace 80 is disposed in a space directly below the cooling unit 60. In the annealing furnace 80, the temperature of the sheet glass SG is cooled from the temperature near the annealing point to a temperature near the room temperature (downstream region cooling step (annealing step)).

(切斷裝置)(cutting device)

切斷裝置90係將通過退火爐80而被冷卻至室溫附近之溫度為止之平板玻璃SG切斷成特定之尺寸。The cutting device 90 cuts the sheet glass SG that has been cooled to a temperature near room temperature by the annealing furnace 80 to a specific size.

(控制裝置)(control device)

控制裝置91係例如控制冷卻輥51、中央上部冷卻單元62、端上部冷卻單元72、端下部冷卻單元73、及中央下部冷卻單元63a、63b之溫度。如以下所說明,可藉由該溫度之控制而使平板玻璃SG之溫度分佈與特定之溫度分佈一致。The control device 91 controls, for example, the temperatures of the cooling roller 51, the center upper cooling unit 62, the end upper cooling unit 72, the end lower cooling unit 73, and the center lower cooling units 63a and 63b. As explained below, the temperature distribution of the sheet glass SG can be made to coincide with a specific temperature distribution by the control of the temperature.

(溫度分佈)(Temperature Distribution)

其次,參照圖6,對本實施形態之玻璃基板之製造方法中使用之溫度分佈、與實現該溫度分佈之冷卻用之各單元之控制進行說明。Next, the temperature distribution used in the method for producing a glass substrate of the present embodiment and the control of each unit for cooling the temperature distribution will be described with reference to Fig. 6 .

圖6中,以虛線區分之區域表示冷卻輥51及冷卻單元中包含之各 單元62、63a、63b、72、73之配置。又,以虛線區分之區域中包含之曲線10b、10c、10e、10f及直線10a、10d係藉由冷卻輥51或各單元62、63a、63b、72、73而實現之溫度分佈20a、20b、20c中包含之子分佈。In Fig. 6, the area indicated by the broken line indicates each of the cooling roller 51 and the cooling unit. Configuration of units 62, 63a, 63b, 72, 73. Further, the curves 10b, 10c, 10e, 10f and the straight lines 10a, 10d included in the area divided by the broken lines are temperature distributions 20a, 20b realized by the cooling rolls 51 or the respective units 62, 63a, 63b, 72, 73, The distribution of the children contained in 20c.

本實施形態係如上所述於平板玻璃SG之流下方向,控制裝置91獨立地進行基於複數個溫度分佈之環境溫度之控制。當平板玻璃SG之溫度處於特定之溫度區域時,以沿平板玻璃SG之寬度方向朝向平板玻璃SG之側部施加張力之方式,將平板玻璃SG冷卻。所謂特定之溫度區域係指平板玻璃SG自成形體41分離之後,平板玻璃SG之溫度自高於軟化點之溫度變為退火點附近為止之溫度區域。即,所謂特定之溫度區域係指上述之平板玻璃SG之上游區域。In the present embodiment, as described above, the control device 91 independently controls the ambient temperature based on the plurality of temperature distributions in the downward flow direction of the sheet glass SG. When the temperature of the sheet glass SG is in a specific temperature region, the sheet glass SG is cooled by applying tension to the side portion of the sheet glass SG in the width direction of the sheet glass SG. The specific temperature region refers to a temperature region in which the temperature of the sheet glass SG changes from a temperature higher than the softening point to a vicinity of the annealing point after the sheet glass SG is separated from the molded body 41. That is, the specific temperature region refers to the upstream region of the above-described sheet glass SG.

將成形體41分離後之平板玻璃SG具有105.7 ~107.5 dPa.秒之黏度。平板玻璃SG因被冷卻輥51及冷卻單元60冷卻而黏度變高。即,平板玻璃SG之黏度(中央部及兩端部之黏度)沿平板玻璃SG之流下方向變高。換言之,平板玻璃SG之黏度係隨著朝向平板玻璃SG之下游側而越高。本實施形態係於上游區域,藉由冷卻輥51及端部冷卻單元71而將平板玻璃SG之兩端部冷卻。具體而言,平板玻璃SG之兩端部係以將黏度維持於109.0 ~1014.5 dPa.秒之範圍內之方式而冷卻。更具體而言,冷卻輥51以平板玻璃SG之側部之黏度成為109.0 ~1010.5 dPa.秒之範圍內之方式,將平板玻璃之兩端部進行淬火,端部冷卻單元71以經冷卻輥51淬火之平板玻璃SG之兩端部之黏度成為1010.5 ~1014.5 dPa.秒之範圍內之方式,將平板玻璃之兩端部冷卻。The flat glass SG after separating the formed body 41 has 10 5.7 ~ 10 7.5 dPa. The viscosity of seconds. The sheet glass SG is cooled by the cooling roller 51 and the cooling unit 60 to have a high viscosity. That is, the viscosity (the viscosity of the center portion and the both end portions) of the sheet glass SG becomes higher in the downward direction of the sheet glass SG. In other words, the viscosity of the sheet glass SG is higher as it goes toward the downstream side of the sheet glass SG. This embodiment is in the upstream region, and both ends of the sheet glass SG are cooled by the cooling roller 51 and the end portion cooling unit 71. Specifically, the two ends of the flat glass SG are maintained at a viscosity of 10 9.0 ~ 10 14.5 dPa. Cool down in the range of seconds. More specifically, the viscosity of the cooling roller 51 at the side of the flat glass SG is 10 9.0 ~ 10 10.5 dPa. In the range of seconds, both ends of the flat glass are quenched, and the viscosity of the end portions of the flat glass SG quenched by the cooling fins 51 is 10 10.5 ~ 10 14.5 dPa. The ends of the flat glass are cooled in a range of seconds.

於本實施形態之平板玻璃SG之溫度之控制下,將複數個溫度分佈分別設定於平板玻璃SG之寬度方向及平板玻璃SG之流下方向(溫度分佈設定步驟)。具體而言,如圖6所示,複數個溫度分佈中包含第1溫度分佈20a、第2溫度分佈20b、及第3溫度分佈20c。第1溫度分佈 20a係較第2溫度分佈20b於流下方向位於高溫側。又,第2溫度分佈20b係較第3溫度分佈20c於流下方向位於高溫側。Under the control of the temperature of the sheet glass SG of the present embodiment, a plurality of temperature distributions are set in the width direction of the sheet glass SG and the flow direction of the sheet glass SG (temperature distribution setting step). Specifically, as shown in FIG. 6, the plurality of temperature distributions include the first temperature distribution 20a, the second temperature distribution 20b, and the third temperature distribution 20c. First temperature distribution The 20a system is located on the high temperature side in the downflow direction compared to the second temperature distribution 20b. Further, the second temperature distribution 20b is located on the high temperature side in the downflow direction from the third temperature distribution 20c.

第1溫度分佈20a係平板玻璃SG之寬度方向之中央部之寬度方向之溫度分佈均勻,且平板玻璃SG之寬度方向兩端部(兩側部)之溫度低於平板玻璃SG之中央部之溫度。此處,所謂寬度方向之溫度分佈均勻係指寬度方向之溫度分佈為相對於特定之基準值(溫度)±0℃~10℃之範圍之值。即,基於第1溫度分佈20a,將平板玻璃SG之兩端部進行淬火,從而將平板玻璃SG之中央部之溫度控制成為較平板玻璃SG之兩端部之溫度高之溫度,且於寬度方向變得均勻之溫度(板厚均勻化步驟)。再者,將第1溫度分佈20a設定為平板玻璃SG之中央部之溫度(平均溫度)與平板玻璃SG之兩端部之溫度成為第1溫度差X。於板厚均勻化步驟中,使平板玻璃SG之中央部之寬度方向之溫度分佈均勻,且使平板玻璃SG之兩端部之溫度低於中央部之溫度。藉此,將平板玻璃SG之兩端部以寬度方向之收縮受到抑制之方式進行冷卻,且將平板玻璃SG之中央部以板厚變得均勻之方式進行冷卻,故而,平板玻璃SG之板厚偏差變小。The temperature distribution in the width direction of the center portion in the width direction of the sheet glass SG in the first temperature distribution 20a is uniform, and the temperature at both end portions (both sides) of the flat glass SG in the width direction is lower than the temperature in the central portion of the sheet glass SG. . Here, the uniform temperature distribution in the width direction means that the temperature distribution in the width direction is a value within a range of ±0° C. to 10° C. with respect to a specific reference value (temperature). In other words, the both ends of the sheet glass SG are quenched based on the first temperature distribution 20a, and the temperature in the central portion of the sheet glass SG is controlled to be higher than the temperature at both end portions of the sheet glass SG, and in the width direction. The temperature becomes uniform (the thickness uniformization step). Further, the first temperature distribution 20a is set such that the temperature (average temperature) at the central portion of the sheet glass SG and the temperature at both end portions of the sheet glass SG become the first temperature difference X. In the step of equalizing the thickness of the sheet, the temperature distribution in the width direction of the central portion of the sheet glass SG is made uniform, and the temperature at both end portions of the sheet glass SG is lower than the temperature at the central portion. In this way, the end portions of the sheet glass SG are cooled so as to be contracted in the width direction, and the central portion of the sheet glass SG is cooled so that the thickness of the sheet glass SG is uniform. Therefore, the thickness of the sheet glass SG is reduced. The deviation becomes smaller.

第2溫度分佈20b及第3溫度分佈20c係相較第1溫度分佈20a為低溫。又,第2溫度分佈20b及第3溫度分佈20c於平板玻璃SG之中央部在寬度方向上具有溫度梯度。具體而言,第2溫度分佈20b及第3溫度分佈20c係平板玻璃SG之寬度方向之中心之溫度最高,平板玻璃SG之兩端部之溫度最低。更具體而言,第2溫度分佈20b及第3溫度分佈20c係隨著自平板玻璃SG之寬度方向之中心朝向平板玻璃SG之兩端部而溫度緩緩變低。即,基於第2溫度分佈20b及第3溫度分佈20c,將平板玻璃SG之寬度方向之溫度分佈以成為山形(具有朝上凸起之曲線)之方式進行控制(翹曲減少步驟)。即,翹曲減少步驟係一面維持溫度梯度(具有朝上凸起之曲線)一面冷卻平板玻璃SG。換言之,翹曲減少步驟 係以溫度分佈連續地維持具有朝上凸起之曲線之形狀之方式,將平板玻璃SG冷卻。The second temperature distribution 20b and the third temperature distribution 20c are lower than the first temperature distribution 20a. Further, the second temperature distribution 20b and the third temperature distribution 20c have a temperature gradient in the width direction at the central portion of the sheet glass SG. Specifically, the second temperature distribution 20b and the third temperature distribution 20c are the highest temperatures in the center of the width direction of the sheet glass SG, and the temperatures of the both ends of the sheet glass SG are the lowest. More specifically, the second temperature distribution 20b and the third temperature distribution 20c gradually decrease in temperature as the center of the flat glass SG is oriented toward the both ends of the sheet glass SG. In other words, based on the second temperature distribution 20b and the third temperature distribution 20c, the temperature distribution in the width direction of the sheet glass SG is controlled so as to have a mountain shape (a curve having an upward convex shape) (warpage reduction step). That is, the warpage reduction step cools the sheet glass SG while maintaining a temperature gradient (having a curve convex upward). In other words, the warpage reduction step The sheet glass SG is cooled in such a manner that the temperature distribution continuously maintains the shape of the curve having the upward convex shape.

再者,基於第2溫度分佈20b之溫度之控制係相對於平板玻璃SG之流下方向而於第2溫度區域之上游側執行。又,基於第3溫度分佈20c之控制係相對於平板玻璃SG之流下方向而於第2溫度區域之下游側執行。此處,較佳為將第3溫度分佈20c設定為梯度大於第2溫度分佈20b。具體而言,將第2溫度分佈20b設定為平板玻璃SG之中心之溫度與平板玻璃SG之端部之溫度成為第2溫度差Y1。又,將第3溫度分佈20c設定為平板玻璃SG之中心部之溫度與平板玻璃SG之端部之溫度成為第3溫度差Y2。第3溫度差Y2係大於第2溫度差Y1。再者,第2溫度差Y1係大於第1溫度差X。即,溫度分佈20a~20c係沿平板玻璃SG之流下方向,中央部與端部之溫度差或中央部與端部之溫度差變大(X<Y1<Y2)。Further, the control based on the temperature of the second temperature distribution 20b is performed on the upstream side of the second temperature region with respect to the downward flow direction of the sheet glass SG. Further, the control system based on the third temperature distribution 20c is executed on the downstream side of the second temperature region with respect to the downward flow direction of the sheet glass SG. Here, it is preferable to set the third temperature distribution 20c to be larger than the second temperature distribution 20b. Specifically, the second temperature distribution 20b is set such that the temperature of the center of the sheet glass SG and the temperature of the end portion of the sheet glass SG become the second temperature difference Y1. Further, the third temperature distribution 20c is set such that the temperature of the central portion of the sheet glass SG and the temperature of the end portion of the sheet glass SG become the third temperature difference Y2. The third temperature difference Y2 is greater than the second temperature difference Y1. Furthermore, the second temperature difference Y1 is greater than the first temperature difference X. That is, the temperature distributions 20a to 20c are in the downward flow direction of the sheet glass SG, and the temperature difference between the center portion and the end portion or the temperature difference between the center portion and the end portion is increased (X < Y1 < Y2).

再者,翹曲減少步驟係於較第3溫度分佈20c為低溫之溫度區域,以平板玻璃SG之寬度方向之溫度梯度隨著平板玻璃SG之溫度趨向於應變點附近而減少之方式,冷卻平板玻璃SG。Further, the warpage reduction step is performed in a temperature region in which the third temperature distribution 20c is lower than the temperature, and the temperature gradient in the width direction of the flat glass SG decreases as the temperature of the flat glass SG approaches the vicinity of the strain point, and the flat plate is cooled. Glass SG.

以下,對各單元之溫度控制詳細地進行說明。Hereinafter, the temperature control of each unit will be described in detail.

(中央上部冷卻單元之溫度控制)(temperature control of the central upper cooling unit)

中央上部冷卻單元62係如上所述地實現決定平板玻璃SG之厚度之區域之溫度分佈(第1中央部冷卻步驟)。具體而言,由於與平板玻璃SG對向之中央上部冷卻單元62之寬度方向之溫度分佈變得均勻,故而平板玻璃SG之寬度方向之溫度變得均勻(子分佈10a)。The center upper cooling unit 62 realizes the temperature distribution of the region in which the thickness of the sheet glass SG is determined as described above (first central portion cooling step). Specifically, since the temperature distribution in the width direction of the center upper cooling unit 62 opposed to the sheet glass SG is uniform, the temperature in the width direction of the sheet glass SG becomes uniform (sub-distribution 10a).

中央下部冷卻單元63a、63b係如上所述地實現開始調整平板玻璃SG之翹曲量之區域之溫度分佈(第2中央部冷卻步驟及第3中央部冷卻步驟)。具體而言,中央下部冷卻單元63a、63b係將平板玻璃SG之寬度方向之溫度以成為山形(具有朝上凸起之曲線)之方式進行調整。具 體而言,使中央下部冷卻單元63a、63b之長度方向中心之溫度成為最高之溫度。又,使中央下部冷卻單元63a、63b之長度方向之兩端部之溫度成為最低之溫度。進而,將溫度以自中心朝兩端部緩緩變低之方式進行控制。以此方式,平板玻璃SG之寬度方向之溫度成為山形(子分佈10b、子分佈10c)。The central lower cooling units 63a and 63b realize the temperature distribution of the region in which the amount of warpage of the sheet glass SG is adjusted as described above (the second central portion cooling step and the third central portion cooling step). Specifically, the central lower cooling units 63a and 63b adjust the temperature in the width direction of the sheet glass SG so as to have a mountain shape (having a curve convex upward). With The body has the highest temperature at the center in the longitudinal direction of the central lower cooling units 63a and 63b. Further, the temperatures of both end portions in the longitudinal direction of the central lower cooling units 63a and 63b are set to the lowest temperatures. Further, the temperature is controlled so as to gradually decrease from the center toward both ends. In this way, the temperature in the width direction of the sheet glass SG becomes a mountain shape (sub-distribution 10b, sub-distribution 10c).

再者,本實施形態係沿平板玻璃SG之流下方向,配置有兩個中央下部冷卻單元63a、63b。以配置於平板玻璃SG之流下方向下方之中央下部冷卻單元63b形成較配置於上方之中央下部冷卻單元63a大之曲線之溫度分佈之方式進行控制。具體而言,如上所述,使藉由中央下部冷卻單元63b而實現之溫度分佈10c之溫度梯度(參照圖6之Y2)大於藉由中央下部冷卻單元63a而實現之分佈10b之溫度梯度(中心部與端部之溫度梯度)(參照圖6之Y1)(Y1<Y2)。Further, in the present embodiment, two central lower cooling units 63a and 63b are disposed along the downward flow direction of the sheet glass SG. The central lower cooling unit 63b disposed below the flow direction of the sheet glass SG is controlled so as to form a temperature distribution larger than the curve of the upper central cooling unit 63a disposed above. Specifically, as described above, the temperature gradient (refer to Y2 of FIG. 6) of the temperature distribution 10c realized by the central lower cooling unit 63b is larger than the temperature gradient (center of the distribution 10b realized by the central lower cooling unit 63a) Temperature gradient between the part and the end) (refer to Y1 of Fig. 6) (Y1 < Y2).

如上所述,冷卻輥51係實現對平板玻璃SG之厚度之均勻化賦予影響之區域之溫度分佈(淬火步驟)。冷卻輥51係將在成形體41之最下端部41a合流之玻璃之兩端部進行淬火。即,平板玻璃SG之兩端部及兩端部周邊之環境溫度成為比平板玻璃SG之中央部周邊之環境溫度低的溫度(子分佈10d)。As described above, the cooling roller 51 realizes the temperature distribution (quenching step) of the region that affects the uniformity of the thickness of the sheet glass SG. The cooling roller 51 quenches both end portions of the glass that joins the lowermost end portion 41a of the molded body 41. In other words, the ambient temperature at both end portions and both end portions of the sheet glass SG is a temperature lower than the ambient temperature around the central portion of the sheet glass SG (sub-distribution 10d).

端上部冷卻單元72係如上所述地實現對平板玻璃SG之厚度及/或翹曲量之調整賦予影響之區域之溫度分佈(第1端部冷卻步驟)。端上部冷卻單元72將較中央上部冷卻單元62及中央下部冷卻單元63a賦予平板玻璃SG之溫度低之溫度賦予平板玻璃SG。即,平板玻璃SG之兩端部及兩端部周邊之環境溫度成為比平板玻璃SG之中央部周邊之環境溫度低的溫度(子分佈10e)。The end upper cooling unit 72 realizes the temperature distribution of the region that affects the thickness and/or the amount of warpage of the sheet glass SG as described above (first end portion cooling step). The end upper cooling unit 72 supplies the sheet glass SG with a temperature lower than the temperature at which the center upper cooling unit 62 and the central lower cooling unit 63a are applied to the sheet glass SG. In other words, the ambient temperature at both end portions and both end portions of the sheet glass SG is a temperature lower than the ambient temperature around the central portion of the sheet glass SG (sub-distribution 10e).

端下部冷卻單元73係如上所述地實現對平板玻璃SG之翹曲量之調整賦予影響之區域之溫度分佈(第2側部冷卻步驟)。端下部冷卻單元73係將較中央下部冷卻單元63a、63b賦予平板玻璃SG之溫度低之 溫度賦予平板玻璃SG。即,平板玻璃SG之兩端部之環境溫度成為比平板玻璃SG之中央部之環境溫度低的溫度(子分佈10f)。The end lower cooling unit 73 realizes the temperature distribution of the region that affects the adjustment of the amount of warpage of the sheet glass SG as described above (the second side portion cooling step). The lower end cooling unit 73 applies lower temperature to the sheet glass SG than the central lower cooling units 63a, 63b. The temperature is imparted to the sheet glass SG. In other words, the ambient temperature at both end portions of the sheet glass SG is lower than the ambient temperature of the central portion of the sheet glass SG (sub-distribution 10f).

如此之平板玻璃SG之溫度控制係經由控制裝置91、冷卻輥51及各單元而進行。於成形體41所在之成形爐室之上部空間中,以將熔融玻璃保持著特定之黏度進行成形之方式維持高溫之溫度環境。另一方面,於藉由分隔構件(隔熱構件)50而自上部空間劃分之成形爐室之下部空間中,將藉由成形而自熔融玻璃生成之平板玻璃SG進行冷卻。因此,分隔構件50中使用隔熱性優異之隔熱構件,以使自上部空間至下部空間難以產生熱傳遞。具體而言,將具有隔熱性之材料用於隔熱構件,以使(1)於將平板玻璃SG成形時,熔融玻璃FG通過成形體41時之熔融玻璃FG之溫度為液相溫度以上,且熔融玻璃FG通過成形體41之最下端部時之熔融玻璃FG之兩端部之黏度成為104.3 ~106 dPa.秒,且(2)於冷卻平板玻璃SG時,當平板玻璃SG之中央部之溫度處於自高於軟化點之溫度變為退火點附近為止之溫度區域時,平板玻璃SG之兩端部之黏度成為109.0 ~1014.5 dPa.秒。The temperature control of the sheet glass SG is performed via the control device 91, the cooling roller 51, and each unit. In the upper space of the forming furnace chamber in which the molded body 41 is located, a high temperature temperature environment is maintained so that the molten glass is formed at a specific viscosity. On the other hand, in the lower space of the forming furnace chamber which is partitioned from the upper space by the partition member (heat insulating member) 50, the sheet glass SG which is formed from the molten glass by the forming is cooled. Therefore, a heat insulating member having excellent heat insulating properties is used for the partition member 50 so that heat transfer from the upper space to the lower space is less likely to occur. Specifically, a material having heat insulating properties is used for the heat insulating member so that (1) when the flat glass SG is molded, the temperature of the molten glass FG when the molten glass FG passes through the molded body 41 is equal to or higher than the liquidus temperature. The viscosity of both ends of the molten glass FG when the molten glass FG passes through the lowermost end portion of the molded body 41 becomes 10 4.3 to 10 6 dPa. Second, and (2) when cooling the flat glass SG, when the temperature of the central portion of the flat glass SG is in a temperature region from the temperature higher than the softening point to the vicinity of the annealing point, the viscosity of the both ends of the flat glass SG Become 10 9.0 ~ 10 14.5 dPa. second.

此時,分隔構件(隔熱構件)50之與分隔構件50相接之上部空間之環境溫度之上部空間與下部空間之間的熱阻較佳為0.2m2 .K/W以上。可藉由使用包含此種熱阻之分隔構件50,而實現可抑制下部空間中之平板玻璃SG之收縮之溫度分佈。具體而言,於分隔構件50之熱阻未達0.2m2 .K/W時,經冷卻輥51及端部冷卻單元71淬火之平板玻璃SG之兩端部受到自上部空間朝向下部空間傳遞之熱之影響而使溫度之下降受到抑制,從而無法變大至所需之黏度。於該情形時,由於平板玻璃SG之兩端部之黏度不高,故而,因自成形體41分離而成形平板玻璃SG時之表面張力之作用,平板玻璃SG於寬度方向上容易收縮。因此,難以確保平板玻璃SG之作為目標之寬度。然而,可藉由將分隔 構件(隔熱構件)50之熱阻設為0.2m2 .K/W以上,而使經淬火之平板玻璃SG之兩端部減少自上部空間朝向下部空間傳遞之熱之影響,從而沿特定之溫度分佈進行冷卻。分隔構件50之熱阻較佳為0.3m2 .K/W以上,更佳為0.4m2 .K/W以上。再者,為使熱阻變得極大,而必須例如使分隔構件50之厚度變得極厚,故而欠佳。因此,分隔構件50之熱阻較佳為0.2~2m2 .K/W,更佳為0.4~2m2 .K/W。At this time, the thermal resistance between the upper space and the lower space of the ambient temperature of the upper space of the partition member (heat insulating member) 50 and the partition member 50 is preferably 0.2 m 2 . K/W or above. The temperature distribution which can suppress the shrinkage of the sheet glass SG in the lower space can be achieved by using the partition member 50 including such a heat resistance. Specifically, the thermal resistance of the partition member 50 is less than 0.2 m 2 . At the time of K/W, both ends of the plate glass SG quenched by the cooling roll 51 and the end portion cooling unit 71 are affected by the heat transmitted from the upper space toward the lower space, so that the temperature drop is suppressed, and the temperature cannot be increased. Viscosity required. In this case, since the viscosity of the both ends of the sheet glass SG is not high, the sheet glass SG is easily contracted in the width direction by the surface tension when the sheet glass SG is formed by the separation of the molded body 41. Therefore, it is difficult to ensure the target width of the sheet glass SG. However, the thermal resistance of the partition member (heat insulating member) 50 can be set to 0.2 m 2 . Above K/W, the both ends of the quenched flat glass SG are reduced in heat from the upper space toward the lower space, and are cooled along a specific temperature distribution. The thermal resistance of the partition member 50 is preferably 0.3 m 2 . Above K/W, more preferably 0.4m 2 . K/W or above. Further, in order to make the thermal resistance extremely large, it is necessary to make the thickness of the partition member 50 extremely thick, for example, which is not preferable. Therefore, the thermal resistance of the partition member 50 is preferably 0.2 to 2 m 2 . K/W, more preferably 0.4~2m 2 . K/W.

具有此種熱阻之分隔構件(隔熱構件)50中,使用熱導率為0.1~0.4W/m.K、更佳為0.1~0.25W/m.K之素材。作為分隔構件(隔熱構件)50,例如使用氧化鋁含有率較高之陶瓷纖維板。In the partition member (insulation member) 50 having such thermal resistance, the thermal conductivity is 0.1 to 0.4 W/m. K, more preferably 0.1~0.25W/m. K material. As the partition member (heat insulating member) 50, for example, a ceramic fiber board having a high alumina content is used.

作為分隔構件50之較佳之形態,與平板玻璃SG自成形爐室之上部空間移動至下部空間時所通過之狹縫狀之間隙相接之分隔構件50之面之素材之熱導率(上部空間之環境溫度之熱導率)較佳為0.5W/m.K以下。尤佳為,分隔構件50包含熱導率(上部空間之環境溫度之熱導率)為0.25W/m.K以下之1個素材。因該構成,可不必過度地增厚分隔構件50之板厚而將熱阻設為0.2m2 .K/W以上。As a preferred form of the partition member 50, the thermal conductivity (the upper space) of the material of the partition member 50 which is in contact with the slit-like gap through which the flat glass SG moves from the upper space of the forming furnace chamber to the lower space The thermal conductivity of the ambient temperature is preferably 0.5 W/m. Below K. More preferably, the partition member 50 includes a thermal conductivity (thermal conductivity of the ambient temperature of the upper space) of 0.25 W/m. 1 material below K. With this configuration, it is not necessary to excessively thicken the thickness of the partition member 50 to set the thermal resistance to 0.2 m 2 . K/W or above.

如圖6所示,本實施形態之平板玻璃之冷卻包含以下步驟:使平板玻璃SG之寬度方向之中央部之寬度方向之溫度分佈均勻,且使平板玻璃SG之兩端部之溫度低於平板玻璃SG之寬度方向之中央部之溫度(板厚均勻化步驟);及與該步驟中之兩端部及中央部之溫度相比,使平板玻璃SG之兩端部及中央部之溫度成為低溫,且自平板玻璃SG之寬度方向之中心朝向兩端部,在平板玻璃SG之寬度方向上形成溫度梯度。為實現該兩個步驟,控制裝置91可使用各單元及冷卻輥51等,控制平板玻璃SG之溫度。本實施形態係藉由設置上述分隔構件50,而充分地抑制成形爐室之上部空間與成形爐室之下部空間之熱傳遞,故而,於成形爐室之下部空間可進行上述平板玻璃SG之溫度之控制。As shown in FIG. 6, the cooling of the flat glass of the present embodiment includes the steps of uniformizing the temperature distribution in the width direction of the central portion in the width direction of the sheet glass SG, and lowering the temperature of both ends of the flat glass SG to be lower than that of the flat plate glass SG. Temperature of the central portion in the width direction of the glass SG (step of equalizing the thickness); and lowering the temperature of both end portions and the central portion of the sheet glass SG compared with the temperatures of the both end portions and the central portion in the step The temperature gradient is formed in the width direction of the sheet glass SG from the center of the width direction of the sheet glass SG toward both end portions. To achieve the two steps, the control unit 91 can control the temperature of the sheet glass SG using each unit, the cooling roller 51, and the like. In the present embodiment, by providing the partition member 50, the heat transfer between the upper space of the forming furnace chamber and the space below the forming furnace chamber is sufficiently suppressed, so that the temperature of the flat glass SG can be performed in the lower space of the forming furnace chamber. Control.

上述平板玻璃SG之溫度之控制係於最初之步驟中,使平板玻璃SG之中央部之寬度方向之溫度分佈均勻,故而不僅可抑制平板玻璃SG之寬度方向之收縮,而且可抑制由平板玻璃SG製作之玻璃基板之板厚偏差。The temperature control of the sheet glass SG is performed in the first step to make the temperature distribution in the width direction of the central portion of the sheet glass SG uniform, so that not only the shrinkage in the width direction of the sheet glass SG but also the sheet glass SG can be suppressed. The thickness deviation of the produced glass substrate.

進而,於其次之步驟中,與最初之步驟相比,使平板玻璃SG之寬度方向之溫度分佈成為低溫,且自平板玻璃SG之寬度方向之中心朝向兩端部,在平板玻璃SG之寬度方向上形成溫度梯度。此時,平板玻璃SG之寬度方向之中央部之冷卻量變得大於平板玻璃SG之寬度方向之兩端部之冷卻量。藉此,平板玻璃SG之體積收縮率自寬度方向之兩端部朝向中央部變大,故而,於平板玻璃SG之中央部拉伸應力進行作用。尤其於平板玻璃SG之中央部,在平板玻璃SG之流下方向及寬度方向上拉伸應力進行作用。再者,於提昇玻璃板之翹曲方面,較佳為在平板玻璃SG之流下方向上進行作用之拉伸應力大於在平板玻璃SG之寬度方向上進行作用之拉伸應力。可藉由該拉伸應力,而一面維持平板玻璃SG之平面度一面進行冷卻,故而,可減少平板玻璃SG、甚至玻璃板之翹曲量。Further, in the next step, the temperature distribution in the width direction of the sheet glass SG is made lower than that in the first step, and the center of the width direction of the sheet glass SG is directed toward both end portions in the width direction of the sheet glass SG. A temperature gradient is formed on it. At this time, the amount of cooling in the central portion in the width direction of the sheet glass SG is larger than the amount of cooling at both end portions in the width direction of the sheet glass SG. As a result, the volume shrinkage ratio of the sheet glass SG increases from the both end portions in the width direction toward the center portion, so that the tensile stress acts on the center portion of the sheet glass SG. In particular, in the central portion of the sheet glass SG, tensile stress acts in the downward direction and the width direction of the sheet glass SG. Further, in terms of lifting the warpage of the glass sheet, it is preferable that the tensile stress acting upward in the downward direction of the flat glass SG is larger than the tensile stress acting in the width direction of the flat glass SG. By the tensile stress, the flatness of the sheet glass SG can be maintained while cooling, so that the amount of warpage of the sheet glass SG or even the glass sheet can be reduced.

再者,於玻璃之液相溫度較高之情形時,可藉由使用溫度充分地高於該玻璃之液相溫度之熔融玻璃進行成形,而防止玻璃之失透。然而,為適用溢流下拉法,成形體41之最下端部41a之熔融玻璃之黏度於中央部及兩端部較佳為104.3 dPa.秒以上。該黏度更佳為104.4 dPa.秒以上,進而更佳為104.6 dPa.秒以上。確保如此之黏度係取決於以下之原因。即,自最下端部41a分離之平板玻璃SG因自重而欲墜落至由冷卻輥51夾持之區域。其原因在於,此時之墜落速度因成形體41之最下端部41a之熔融玻璃之黏度而不同。於最下端部41a之熔融玻璃之黏度小於上述範圍之情形時,與冷卻輥51所進行之平板玻璃SG之拉伸速度相比,平板玻璃SG之因自重而欲墜落之速度更大,最終存在於 冷卻輥51上平板玻璃SG鬆弛之虞。因此,成形體41之最下端部41a之熔融玻璃之黏度較佳為104.3 dPa.秒以上。再者,若使冷卻輥51及較冷卻輥51位於下游之下拉輥81之圓周速度充分地變快,則可使玻璃帶之自由墜落速度慢於冷卻輥51及下拉輥81之圓周速度。然而,於該情形時,通常,不僅要預先決定於特定之玻璃流量之條件下需要獲得之平板玻璃SG之厚度,而且為了實現於下游之退火步驟中進行之玻璃帶之溫度控制,亦要過度地加速冷卻輥51及下拉輥81之圓周速度,此情形於實用方面欠佳。Further, in the case where the temperature of the liquid phase of the glass is high, it is possible to prevent the devitrification of the glass by forming the molten glass having a temperature sufficiently higher than the liquidus temperature of the glass. However, for the application of overflow down draw method, the viscosity of the molten glass into the most compact portion 41 of the lower end 41a of the central portion and the both end portions is preferably 10 4.3 dPa. More than two seconds. The viscosity is preferably 10 4.4 dPa. More than second, and more preferably 10 4.6 dPa. More than two seconds. Ensuring this viscosity depends on the following reasons. That is, the sheet glass SG separated from the lowermost end portion 41a is intended to fall to the region sandwiched by the cooling roller 51 due to its own weight. The reason for this is that the falling speed at this time differs depending on the viscosity of the molten glass of the lowermost end portion 41a of the molded body 41. When the viscosity of the molten glass at the lowermost end portion 41a is smaller than the above range, the flat glass SG is more likely to fall due to its own weight than the stretching speed of the flat glass SG by the cooling roller 51, and finally exists. The flat glass SG is relaxed on the cooling roll 51. Therefore, the viscosity of the molten glass of the lowermost end portion 41a of the formed body 41 is preferably 10 4.3 dPa. More than two seconds. Further, if the circumferential speed of the cooling roller 51 and the lower cooling roller 51 located downstream of the downstream pulling roller 81 is sufficiently increased, the free fall speed of the glass ribbon can be made slower than the peripheral speed of the cooling roller 51 and the lowering roller 81. However, in this case, generally, not only the thickness of the sheet glass SG to be obtained under the condition of a specific glass flow rate but also the temperature control of the glass ribbon to be carried out in the downstream annealing step is excessively determined. The circumferential speed of the cooling roller 51 and the pull-down roller 81 is accelerated, which is not preferable in practical use.

又,若為了以較上述熔融玻璃之黏度之數值範圍低之黏度進行成形而欲使成形體41之最下端部41a之熔融玻璃溫度上升,則相較成形體41為下游側之環境溫度上升。因此,無法於成形體41之最下端部41a,使在成形體之兩側之各個壁面流動之熔融玻璃合流所形成之平板玻璃SG之寬度方向之兩端部的黏度充分地上升。因此,導致平板玻璃SG之寬度收縮。若導致平板玻璃SG之寬度收縮,則產生無法確保即將切斷前之平板玻璃SG之寬度或製品寬度之類的問題。該問題係玻璃之液相溫度越高(液相黏度越小)則越顯著。In addition, in order to increase the temperature of the molten glass of the lowermost end portion 41a of the molded article 41 in order to form a viscosity lower than the numerical range of the viscosity of the molten glass, the ambient temperature of the downstream side of the molded article 41 rises. Therefore, the viscosity at both end portions in the width direction of the sheet glass SG formed by the joining of the molten glass flowing on the respective wall surfaces on both sides of the molded body is not sufficiently increased at the lowermost end portion 41a of the molded body 41. Therefore, the width of the sheet glass SG is contracted. If the width of the sheet glass SG is contracted, there is a problem that the width of the sheet glass SG immediately before cutting or the width of the product cannot be ensured. The problem is that the higher the liquid phase temperature of the glass (the smaller the liquid phase viscosity), the more significant.

本實施形態係藉由將分隔構件(隔熱構件)50之熱阻設為0.2m2 .K/W以上,而抑制自成形爐室之上部空間朝向下部空間之熱傳遞,故而,即便因玻璃之液相溫度較高而較高地設定成形爐室之上部空間之環境溫度,經淬火之平板玻璃SG之兩端部亦可不受自上部空間朝向下部空間傳遞之熱之影響地確保特定之黏度。因此,可抑制平板玻璃SG之寬度縮小。In the present embodiment, the thermal resistance of the partition member (heat insulating member) 50 is set to 0.2 m 2 . K/W or more, and suppresses the heat transfer from the upper space of the forming furnace chamber toward the lower space. Therefore, even if the liquidus temperature of the glass is high, the ambient temperature of the upper space of the forming furnace chamber is set high, and the quenched flat plate is set. Both ends of the glass SG may be protected from a specific viscosity by the heat transmitted from the upper space toward the lower space. Therefore, the reduction in the width of the sheet glass SG can be suppressed.

即,於使用玻璃之液相溫度較高(液相黏度較小)之玻璃之情形時,本實施形態之效果顯著。於該情形時,使用熱阻為0.2m2 .K/W以上之隔熱構件50,一面朝向平板玻璃SG兩端部施加拉伸張力,一面以使平板玻璃SG之兩端部之黏度成為109.0 ~1014.5 dPa.秒之方式,冷 卻平板玻璃SG,藉此可確保製品寬度。That is, when the glass having a high liquidus temperature (the liquid phase viscosity is small) is used, the effect of the present embodiment is remarkable. In this case, the thermal resistance is 0.2 m 2 . The heat insulating member 50 of K/W or more is applied with tensile tension to both end portions of the flat glass SG so that the viscosity of both end portions of the flat glass SG is 10 9.0 to 10 14.5 dPa. In the second mode, the flat glass SG is cooled, thereby ensuring the width of the product.

(玻璃之特性)(characteristics of glass)

以本實施形態製作之玻璃基板適宜用於平板顯示器用玻璃基板。又,玻璃基板亦可用於尤其要求熱收縮率小之形成LTPS(Low Temperature Poly Silicon,低溫多晶矽)、TFT(Thin Film Transistor,薄膜電晶體)或氧化物半導體而進行高溫處理之玻璃基板。進而,可用於顯示裝置等之防護罩玻璃、磁碟用玻璃基板、太陽電池用玻璃基板等。The glass substrate produced by this embodiment is suitably used for the glass substrate for flat panel displays. Further, the glass substrate can also be used for a glass substrate which is required to form a LTPS (Low Temperature Poly Silicon), a TFT (Thin Film Transistor) or an oxide semiconductor, and which is subjected to high temperature treatment, which has a small heat shrinkage ratio. Further, it can be used for a cover glass such as a display device, a glass substrate for a magnetic disk, a glass substrate for a solar cell, or the like.

又,本實施形態之玻璃基板之液相黏度較佳為104.3 dPa.秒~106.7 dPa.秒。在成形步驟中,為了避免產生玻璃之失透而必須使成形體41之最下端部41a之黏度小於液相黏度,因此,將成形爐室之上部空間之環境溫度設定為高於下部空間。因此,成形爐室之上部空間與下部空間之間存在較大之熱之階差,從而熱之傳遞容易變大。本實施形態係抑制自成形爐室之上部空間朝向下部空間之熱之傳遞,故而可抑制成形爐室之下部空間中之平板玻璃SG之寬度方向之收縮。液相黏度越高之玻璃,越可提高成形體41之最下端部41a之黏度,故而,可抑制上述平板玻璃SG之寬度方向之收縮。因此,本實施形態之玻璃基板之液相黏度較佳為104.7 dPa.秒~106.7 dPa.秒,更佳為105 dPa.秒~106.7 dPa.秒。又,本實施形態之玻璃基板之液相黏度亦可為105.3 dPa.秒以下。玻璃之液相黏度越小則成形爐室之上部空間之環境溫度設定得越高,故而,如上所述平板玻璃SG之寬度方向之收縮容易變大。亦即,於使用液相黏度為105.3 dPa.秒以下之玻璃之情形時,本實施形態之效果變得顯著,若為104.3 ~105.3 dPa.秒,則效果更顯著,若為104.3 dPa.秒~105.0 dPa.秒,則效果變得更顯著,若為104.3 dPa.秒~104.9 dPa.秒,則效果變得進一步更顯著,於上述方面均為較佳。於液相黏度未達104.3 dPa.秒之玻璃之情形時,溢流下拉法之使用變得 困難。Moreover, the liquidus viscosity of the glass substrate of the present embodiment is preferably 10 4.3 dPa. Seconds ~ 10 6.7 dPa. second. In the forming step, in order to avoid devitrification of the glass, the viscosity of the lowermost end portion 41a of the molded body 41 must be made smaller than the liquidus viscosity, and therefore, the ambient temperature of the upper space of the forming furnace chamber is set higher than that of the lower space. Therefore, there is a large thermal step difference between the upper space and the lower space of the forming furnace chamber, so that heat transfer is likely to become large. In the present embodiment, the heat transfer from the upper space of the forming furnace chamber toward the lower space is suppressed, so that the shrinkage in the width direction of the sheet glass SG in the lower space of the forming furnace chamber can be suppressed. The glass having a higher liquidus viscosity can increase the viscosity of the lowermost end portion 41a of the molded body 41, so that the shrinkage of the flat glass SG in the width direction can be suppressed. Therefore, the liquidus viscosity of the glass substrate of the present embodiment is preferably 10 4.7 dPa. Seconds ~ 10 6.7 dPa. Seconds, more preferably 10 5 dPa. Seconds ~ 10 6.7 dPa. second. Moreover, the liquidus viscosity of the glass substrate of the embodiment may also be 10 5.3 dPa. Less than seconds. The smaller the liquid phase viscosity of the glass, the higher the ambient temperature of the upper space of the forming furnace chamber is set. Therefore, the shrinkage in the width direction of the flat glass SG tends to be large as described above. That is, the liquid viscosity is 10 5.3 dPa. In the case of glass of a second or less, the effect of this embodiment becomes remarkable, if it is 10 4.3 ~ 10 5.3 dPa. Seconds, the effect is more significant, if it is 10 4.3 dPa. Seconds ~ 10 5.0 dPa. In seconds, the effect becomes more pronounced, if it is 10 4.3 dPa. Seconds ~ 10 4.9 dPa. In seconds, the effect becomes more significant, which is preferable in the above aspects. The viscosity in the liquid phase is less than 10 4.3 dPa. In the case of a second glass, the use of the overflow down-draw method becomes difficult.

又,本實施形態之玻璃基板之液相溫度較佳為1000℃~1250℃。玻璃之液相溫度越高,則為避免產生玻璃之失透而必須越高地設定成形爐室之上部空間之環境溫度。因此,成形爐室之上部空間與下部空間之間之熱之階差較大,從而熱之傳遞容易變大。本實施形態係抑制自成形爐室之上部空間朝向下部空間之熱之傳遞,故而可抑制成形爐室之下部空間中之平板玻璃SG之寬度方向之收縮。即,自減少自成形爐室之上部空間朝向下部空間之熱之傳遞量,使平板玻璃SG之寬度方向之收縮降低之觀點而言,玻璃基板之液相溫度較佳為1250℃以下,更佳為1200℃以下,進而更佳為1105℃以下。又,本實施形態之玻璃基板之液相溫度亦可為1150℃~1250℃。玻璃之液相溫度越高,則為避免產生玻璃之失透而必須越高地設定成形爐室之上部空間之環境溫度。即,將玻璃之液相溫度為1150℃以上之玻璃用於平板玻璃SG之情形時,本實施形態之效果變得更顯著。再者,玻璃之液相溫度之上限設為1250℃之原因在於當玻璃之液相溫度超過1250℃時,存在容易產生成形體41之潛變現象等問題之虞。即,本實施形態係因玻璃之液相溫度為1150℃~1250℃而本實施形態之效果變得顯著,且若為1170℃~1250℃,則效果變得更顯著,若為1180℃~1250℃,則效果變得進一步顯著,若為1200℃~1250℃,則效果變得進一步更顯著,於上述方面均為較佳。Further, the liquidus temperature of the glass substrate of the present embodiment is preferably from 1000 ° C to 1,250 ° C. The higher the liquidus temperature of the glass, the higher the ambient temperature of the upper space of the forming furnace chamber must be set to avoid the devitrification of the glass. Therefore, the step of heat between the upper space and the lower space of the forming furnace chamber is large, so that heat transfer is likely to become large. In the present embodiment, the heat transfer from the upper space of the forming furnace chamber toward the lower space is suppressed, so that the shrinkage in the width direction of the sheet glass SG in the lower space of the forming furnace chamber can be suppressed. In other words, from the viewpoint of reducing the amount of heat transfer from the upper space of the forming furnace chamber toward the lower space and reducing the shrinkage in the width direction of the sheet glass SG, the liquidus temperature of the glass substrate is preferably 1250 ° C or less, more preferably It is 1200 ° C or less, and more preferably 1105 ° C or less. Further, the liquid phase temperature of the glass substrate of the present embodiment may be 1150 ° C to 1250 ° C. The higher the liquidus temperature of the glass, the higher the ambient temperature of the upper space of the forming furnace chamber must be set to avoid the devitrification of the glass. In other words, when the glass having a liquid phase temperature of 1150 ° C or higher is used for the sheet glass SG, the effects of the embodiment are more remarkable. Further, the reason why the upper limit of the liquidus temperature of the glass is set to 1,250 ° C is that when the liquid phase temperature of the glass exceeds 1,250 ° C, there is a problem that the latent phenomenon of the molded body 41 is likely to occur. That is, in the present embodiment, since the liquidus temperature of the glass is from 1150 ° C to 1250 ° C, the effect of the present embodiment is remarkable, and if it is 1170 ° C to 1250 ° C, the effect becomes more remarkable, and if it is 1180 ° C to 1250 At °C, the effect becomes more remarkable. If it is 1200 ° C to 1250 ° C, the effect becomes more remarkable, and it is preferable in the above aspects.

本實施形態之玻璃基板之應變點較佳為670℃以上。於玻璃基板之應變點為670℃以上之情形時,該玻璃存在液相溫度變高之傾向,且存在於成形步驟中產生失透之虞。因此,於使用應變點為670℃以上之玻璃之情形時,為抑制成形步驟中之失透之產生,而與製造不易產生失透之玻璃之情形相比,必須提高成形時之熔融玻璃之溫度,從而亦較高地設定成形體41所在之成形爐室之上部空間之環境溫度。因 此,成形爐室之上部空間與下部空間之間存在較大之熱之階差,熱之傳遞容易變大。本實施形態係使用熱阻為0.2m2 .K/W以上之分隔構件50,抑制成形爐室之上部空間朝向下部空間之熱之傳遞,故而可抑制成形爐室之下部空間中之平板玻璃SG之寬度方向之收縮。即,於玻璃基板之應變點為670℃以上之情形時,本實施形態之效果較為顯著。The strain point of the glass substrate of the present embodiment is preferably 670 ° C or higher. When the strain point of the glass substrate is 670 ° C or more, the glass tends to have a high liquidus temperature, and there is a flaw in devitrification during the forming step. Therefore, in the case of using a glass having a strain point of 670 ° C or more, in order to suppress the occurrence of devitrification in the forming step, it is necessary to increase the temperature of the molten glass during molding as compared with the case of producing a glass which is less likely to cause devitrification. Therefore, the ambient temperature of the upper space of the forming furnace chamber in which the molded body 41 is located is also set high. Therefore, there is a large heat difference between the upper space and the lower space of the forming furnace chamber, and the heat transfer is likely to become large. In this embodiment, the thermal resistance is 0.2 m 2 . The partition member 50 of K/W or more suppresses the heat transfer from the upper space of the forming furnace chamber toward the lower space, so that the shrinkage in the width direction of the sheet glass SG in the lower space of the forming furnace chamber can be suppressed. That is, when the strain point of the glass substrate is 670 ° C or more, the effect of the present embodiment is remarkable.

本實施形態可使用玻璃基板之應變點為670℃以上之玻璃,且即便使用應變點為675℃以上、應變點為680以上之玻璃、進而應變點為690℃以上之玻璃,亦可確保平板玻璃SG之寬度、及製品寬度,就該方面而言,本實施形態之效果較為顯著。作為形成LTPS、TFT或氧化物半導體之玻璃基板,較佳為使用應變點為675℃以上之玻璃,更佳為使用應變點為680℃以上之玻璃,故而,以本實施形態製造之玻璃基板作為形成LTPS、TFT或氧化物半導體之玻璃基板而言較佳。In the present embodiment, glass having a strain point of 670 ° C or higher can be used, and even a glass having a strain point of 675 ° C or higher, a strain point of 680 or more, and a glass having a strain point of 690 ° C or higher can be used to secure the flat glass. The width of the SG and the width of the product are significant in this respect. As the glass substrate forming the LTPS, the TFT, or the oxide semiconductor, it is preferable to use a glass having a strain point of 675 ° C or higher, and more preferably a glass having a strain point of 680 ° C or higher. Therefore, the glass substrate produced in the present embodiment is used as the glass substrate. A glass substrate forming an LTPS, a TFT or an oxide semiconductor is preferable.

又,於玻璃基板之熱收縮率為75ppm以下之情形時,該玻璃之應變點一般而言較高,從而存在液相溫度較高之傾向。即便需要製造熱收縮率為75ppm以下之玻璃基板,亦使用熱阻為0.2m2 .K/W以上之分隔構件50,抑制自成形爐室之上部空間朝向下部空間之熱之傳遞,故而,可抑制成形爐室之下部空間中之平板玻璃SG之寬度方向之收縮。因此,平板玻璃SG可抑制自成形體41分離時產生之平板玻璃SG之寬度方向之寬度之收縮,確保平板玻璃SG之寬度。於使用熱收縮率為75ppm以下之玻璃之玻璃基板之情形時,即便為了圖像顯示裝置之製作,而於該玻璃基板上形成LTPS、TFT或氧化物半導體,進行高溫處理,亦可抑制圖像顯示裝置中之像素之間距偏移等問題。Further, when the heat shrinkage rate of the glass substrate is 75 ppm or less, the strain point of the glass is generally high, and the liquidus temperature tends to be high. Even if it is necessary to manufacture a glass substrate having a heat shrinkage ratio of 75 ppm or less, a thermal resistance of 0.2 m 2 is used . The partition member 50 of K/W or more suppresses the heat transfer from the upper space of the forming furnace chamber toward the lower space, so that the shrinkage in the width direction of the sheet glass SG in the lower space of the forming furnace chamber can be suppressed. Therefore, the sheet glass SG can suppress the shrinkage of the width of the sheet glass SG which is generated when the molded body 41 is separated, and ensures the width of the sheet glass SG. When a glass substrate having a glass having a heat shrinkage ratio of 75 ppm or less is used, an LTPS, a TFT, or an oxide semiconductor is formed on the glass substrate for the production of an image display device, and high temperature processing is performed to suppress an image. A problem such as a shift in the distance between pixels in the display device.

再者,所謂熱收縮率係指使用經實施升降溫速度為10/分鐘且於550℃下保持2小時之熱處理後之玻璃基板之收縮量,根據下式而求得之值。In addition, the heat shrinkage ratio is a value obtained by the following formula using the shrinkage amount of the glass substrate after heat treatment at a temperature rise and fall rate of 10/min and holding at 550 ° C for 2 hours.

熱收縮率(ppm)={熱處理後之玻璃基板之收縮量/熱處理前之玻璃基板之長度}×106 Heat shrinkage ratio (ppm) = {shrinkage amount of glass substrate after heat treatment / length of glass substrate before heat treatment} × 10 6

又,本實施形態之玻璃基板亦可含有氧化鋯。於製作平板玻璃SG,進而由該平板玻璃SG而製作之玻璃基板含有氧化鋯之情形時,玻璃之液相溫度上升,故而,為了避免產生玻璃之失透,而亦必須減小成形體41、尤其最下端部41a附近之黏度(以不產生失透之程度使熔融玻璃溫度上升)。本實施形態係即便成形體41之最下端部41a之熔融玻璃之黏度較小,且上部空間中之環境溫度較高,亦使用熱阻為0.2m2 .K/W以上之分隔構件50,抑制自上部空間朝向下部空間之熱之傳遞,故而,可抑制成形爐室之下部空間中之板寬之收縮。因此,於使用此種玻璃之情形時,本實施形態之效果變得顯著。Further, the glass substrate of the present embodiment may contain zirconia. When the flat glass SG is produced and the glass substrate produced by the flat glass SG contains zirconia, the liquidus temperature of the glass rises. Therefore, in order to avoid devitrification of the glass, the molded body 41 must be reduced. In particular, the viscosity in the vicinity of the lowermost end portion 41a (the temperature of the molten glass is increased to such an extent that devitrification does not occur). In the present embodiment, even if the viscosity of the molten glass of the lowermost end portion 41a of the molded body 41 is small and the ambient temperature in the upper space is high, the thermal resistance is 0.2 m 2 . The partition member 50 of K/W or more suppresses the heat transfer from the upper space toward the lower space, so that the shrinkage of the plate width in the lower space of the forming furnace chamber can be suppressed. Therefore, when such a glass is used, the effect of this embodiment becomes remarkable.

又,本實施形態之玻璃基板較佳為含有氧化錫。氧化錫容易結晶產生失透。因此,於製造含有氧化錫之玻璃之情形時,為避免產生失透,而必須減小成形體41、尤其最下端部41a附近之熔融玻璃之黏度(以不產生失透之程度使熔融玻璃溫度上升)。本實施形態係抑制自上部空間朝向下部空間之熱之傳遞,故而可抑制成形爐室之下部空間中之板寬之收縮。Moreover, it is preferable that the glass substrate of this embodiment contains tin oxide. Tin oxide is easily crystallized to cause devitrification. Therefore, in the case of producing a glass containing tin oxide, in order to avoid devitrification, it is necessary to reduce the viscosity of the molten glass in the vicinity of the molded body 41, particularly the lowermost end portion 41a (the molten glass temperature is such that no devitrification occurs) rise). In the present embodiment, the heat transfer from the upper space toward the lower space is suppressed, so that the shrinkage of the plate width in the lower space of the forming furnace chamber can be suppressed.

再者,於圖2中所示之熔解裝置11之熔解槽包含高氧化鋯系耐火物等之爐材而構成之情形時,存在於熔解步驟中氧化鋯自高氧化鋯系耐火物熔析至熔融玻璃中之情形。於該情形時,熔融玻璃中之氧化鋯濃度上升,液相溫度上升。因此,必須較高地保持成形時之熔融玻璃之溫度。本實施形態係抑制自上部空間朝向下部空間之熱之傳遞,故而可抑制成形爐室之下部空間中之板寬之收縮。因此,於使用此種玻璃之情形時,本實施形態之效果變得顯著。Further, when the melting tank of the melting apparatus 11 shown in Fig. 2 is composed of a furnace material such as a high zirconia refractory, the zirconia is melted from the high zirconia refractory in the melting step. The situation in molten glass. In this case, the concentration of zirconium oxide in the molten glass rises and the temperature of the liquid phase rises. Therefore, it is necessary to maintain the temperature of the molten glass at the time of molding at a high level. In the present embodiment, the heat transfer from the upper space toward the lower space is suppressed, so that the shrinkage of the plate width in the lower space of the forming furnace chamber can be suppressed. Therefore, when such a glass is used, the effect of this embodiment becomes remarkable.

(玻璃組成)(glass composition)

以本實施形態製作之玻璃基板可適宜用於平板顯示器,尤其液晶顯示器用玻璃基板。此種玻璃基板係例如以質量%表示而含有50~70%之SiO2 、5~25%之Al2 O3 、0~15%之B2 O3 、0~10%之MgO、0~20%之CaO、0~20%之SrO、0~10%之BaO、及0~10%之ZrO2The glass substrate produced by this embodiment can be suitably used for a flat panel display, especially a glass substrate for liquid crystal displays. Such a glass substrate is, for example, represented by mass % and contains 50 to 70% of SiO 2 , 5 to 25% of Al 2 O 3 , 0 to 15% of B 2 O 3 , 0 to 10% of MgO, and 0 to 20 % CaO, 0 to 20% SrO, 0 to 10% BaO, and 0 to 10% ZrO 2 .

又,以本實施形態製作之玻璃基板可適宜用於在玻璃表面上形成有LTPS、TFT或氧化物半導體之玻璃基板。此種玻璃基板係例如以質量%表示時而含有58~75%之SiO2 、15~23%之Al2 O3 、1~12%之B2 O3 、及6~17%之RO(其中,RO係MgO、CaO、SrO及BaO中之玻璃板所含之總成分之總量),且應變點為680℃以上。Further, the glass substrate produced in the present embodiment can be suitably used for a glass substrate in which an LTPS, a TFT or an oxide semiconductor is formed on the surface of the glass. Such a glass substrate is, for example, represented by mass %, containing 58 to 75% of SiO 2 , 15 to 23% of Al 2 O 3 , 1 to 12% of B 2 O 3 , and 6 to 17% of RO (wherein , RO is the total amount of the total components contained in the glass plate of MgO, CaO, SrO, and BaO, and the strain point is 680 ° C or higher.

此時,若使滿足以下數式之任一個或複數個,則因LTPS、TFT用玻璃板而較佳。In this case, it is preferable to use a glass plate for LTPS or TFT if one or more of the following formulas are satisfied.

.為使應變點進一步上升,而必須設為(SiO2 +Al2 O3 )/B2 O2 :8~50及/或使SiO2 +Al2 O3 :75%以上。. In order to further increase the strain point, it is necessary to set (SiO 2 + Al 2 O 3 ) / B 2 O 2 : 8 to 50 and/or to make SiO 2 + Al 2 O 3 : 75% or more.

.為使應變點進一步上升,而必須使質量比(SiO2 +Al2 O3 )/RO為7.5以上。. In order to further increase the strain point, it is necessary to make the mass ratio (SiO 2 + Al 2 O 3 )/RO 7.5 or more.

.為使玻璃之比電阻降低,而必須含有0.01~1質量%之Fe2 O3. In order to lower the specific resistance of the glass, it is necessary to contain 0.01 to 1% by mass of Fe 2 O 3 .

.為實現玻璃之較高之應變點,同時防止液相溫度之上升,而必須使CaO/RO為0.65以上。. In order to achieve a higher strain point of the glass while preventing an increase in the liquidus temperature, CaO/RO must be made 0.65 or more.

又,若考慮應用於如移動通訊終端之類之移動機器等,則就輕量化之觀點而言,SrO及BaO之合計含有率較佳為0~5質量%,更佳為0~3.3質量%。Further, when it is considered to be applied to a mobile device such as a mobile communication terminal, the total content of SrO and BaO is preferably 0 to 5% by mass, more preferably 0 to 3.3% by mass, from the viewpoint of weight reduction. .

再者,玻璃基板亦可為如上所述實質上不含鹼金屬氧化物(Na2 O、K2 O、Li2 O)之無鹼玻璃,或含有0.05~2.0質量%之鹼金屬氧化物(Na2 O、K2 O、Li2 O)之含微量鹼之玻璃。平板顯示器用之玻璃基板係若於面板製造步驟中自玻璃基板熔析鹼金屬,則存在使TFT特性或半導體特性劣化之虞,故而,較佳為實質上不含鹼金屬氧化物,或 者即便含有,亦含有0.05~2.0質量%。Further, the glass substrate may be an alkali-free glass substantially free of an alkali metal oxide (Na 2 O, K 2 O, Li 2 O) as described above, or an alkali metal oxide containing 0.05 to 2.0% by mass ( A glass containing a small amount of alkali of Na 2 O, K 2 O, and Li 2 O). In the glass substrate for a flat panel display, if the alkali metal is eluted from the glass substrate in the panel manufacturing step, the TFT characteristics or the semiconductor characteristics are deteriorated. Therefore, it is preferable that the glass substrate does not substantially contain an alkali metal oxide or even contains It also contains 0.05 to 2.0% by mass.

再者,可如含微量鹼之玻璃般,藉由儘量微量地含有鹼金屬,而於固定範圍內抑制TFT特性或半導體特性之劣化或玻璃之熱膨張,同時使熔解性及澄清性提昇。又,含微量鹼之玻璃可使熔融玻璃之比電阻有效地降低,故而認為於電熔融中容易對熔融玻璃進行通電,相對地對構成高氧化鋯系耐火物等之熔解槽之壁面之爐材難以進行通電。其結果,可抑制爐材之侵蝕。又,可減少氧化鋯熔析至熔融玻璃中,故而可改善玻璃之失透。於該點方面而言,使用含微量鹼之玻璃較為有效。Further, as long as the alkali metal is contained as much as possible, the deterioration of the TFT characteristics or the semiconductor characteristics or the thermal expansion of the glass can be suppressed in a fixed range, and the meltability and the clarification property can be improved. In addition, the glass containing a small amount of alkali can effectively reduce the specific resistance of the molten glass. Therefore, it is considered that the molten glass is easily energized during the electric melting, and the furnace material which constitutes the wall surface of the melting tank of the high zirconia-based refractory or the like is relatively opposed. It is difficult to energize. As a result, corrosion of the furnace material can be suppressed. Further, since zirconia can be reduced to be melted into the molten glass, the devitrification of the glass can be improved. From this point of view, it is more effective to use a glass containing a small amount of alkali.

上述實施形態係藉由中央上部冷卻單元62而沿平板玻璃SG之寬度方向,以環境溫度變得均勻之方式進行控制(板厚均勻化步驟)。藉此,於上述實施形態中,可使平板玻璃SG之厚度(壁厚)均勻。然而,中央上部冷卻單元62亦可使用沿平板玻璃SG之寬度方向可變更溫度之構成。例如,亦可將形成於中央冷卻單元62之內部之空間分成複數個,將每一個空間分別地冷卻,或者設置可於中央冷卻單元62之內部局部地設置保溫材之構成,藉此,可變更寬度方向之環境溫度。藉此,無論平板玻璃SG之中央部之溫度是否均勻,當因某些影響而無法實現平板玻璃SG之寬度方向之壁厚之均勻化之情形時,亦可謀求平板玻璃SG之壁厚之均勻化。In the above embodiment, the central upper cooling unit 62 controls the ambient temperature to be uniform in the width direction of the sheet glass SG (step of equalizing the thickness). Thereby, in the above embodiment, the thickness (wall thickness) of the sheet glass SG can be made uniform. However, the central upper cooling unit 62 may be configured to change the temperature in the width direction of the sheet glass SG. For example, the space formed inside the central cooling unit 62 may be divided into a plurality of spaces, and each space may be separately cooled, or a heat insulating material may be partially disposed inside the central cooling unit 62, thereby being changeable. Ambient temperature in the width direction. Therefore, even if the temperature of the central portion of the sheet glass SG is uniform, when the wall thickness in the width direction of the sheet glass SG cannot be uniformized due to some influence, the wall thickness of the sheet glass SG can be made uniform. Chemical.

[實驗例1][Experimental Example 1]

為確認本實施形態之效果,而變更玻璃基板之製造方法,製作玻璃基板。In order to confirm the effect of the present embodiment, a method of manufacturing a glass substrate was changed to produce a glass substrate.

(實施例1)(Example 1)

以所製造之玻璃基板成為下述組成之方式,於熔解裝置11之熔解槽中,將玻璃原料熔解,製成熔融玻璃。將該熔融玻璃經由鉑合金製之管搬送至澄清裝置12之澄清槽,進行熔融玻璃之澄清。其次,使澄 清後之熔融玻璃均質化之後,將熔融玻璃供給至成形體41,利用溢流下拉法以約2m/分鐘之速度形成平板玻璃SG。此時,將所用之分隔構件(隔熱構件50)之熱阻設為0.4m2 .K/W。在成形體41之最下端部41a中流動之熔融玻璃之兩端部之黏度為105 dPa.秒。此時,當平板玻璃SG之中央部之溫度處於自高於軟化點之溫度變為退火點附近為止之溫度區域時,一面朝向平板玻璃SG之兩端部施加張力,一面以平板玻璃SG之兩端部之黏度成為109.0 ~1014.5 dPa.秒之方式進行冷卻。The glass substrate to be produced is melted in a melting tank of the melting device 11 to form a molten glass in such a manner that the glass substrate to be produced has the following composition. The molten glass was transferred to a clarification tank of the clarification device 12 via a tube made of a platinum alloy, and clarification of the molten glass was performed. Next, after the clarified molten glass was homogenized, the molten glass was supplied to the molded body 41, and the sheet glass SG was formed at a speed of about 2 m/min by an overflow down-draw method. At this time, the thermal resistance of the partition member (heat insulating member 50) used was set to 0.4 m 2 . K/W. The viscosity of the both ends of the molten glass flowing in the lowermost end portion 41a of the formed body 41 is 10 5 dPa. second. At this time, when the temperature of the central portion of the sheet glass SG is in a temperature region from the temperature higher than the softening point to the vicinity of the annealing point, tension is applied to both end portions of the sheet glass SG, and two of the flat glass SG are used. The viscosity of the end becomes 10 9.0 ~ 10 14.5 dPa. Cool down in seconds.

即,將具有隔熱性之材料用於隔熱構件50,以使(1)於成形平板玻璃SG時,熔融玻璃FG通過成形體41時之熔融玻璃FG之溫度為液相溫度以上,且熔融玻璃FG通過成形體41之最下端部時之熔融玻璃FG之兩端部之黏度成為104.3 ~106 dPa.秒,且(2)於冷卻平板玻璃SG時,當平板玻璃SG之中央部之溫度處於自高於軟化點之溫度變為退火點附近為止之溫度區域時,平板玻璃SG之兩端部之黏度成為109.0 ~1014.5 dPa.秒。其後,切斷平板玻璃SG,製造厚度為0.7mm、尺寸為2200mm×2500mm之平板顯示器用玻璃基板。再者,所製造之平板顯示器用玻璃基板之液相溫度為1125℃,應變點為660℃。That is, a material having heat insulating properties is used for the heat insulating member 50 so that (1) when the flat glass SG is formed, the temperature of the molten glass FG when the molten glass FG passes through the molded body 41 is above the liquidus temperature, and is melted. When the glass FG passes through the lowermost end portion of the molded body 41, the viscosity of both ends of the molten glass FG becomes 10 4.3 to 10 6 dPa. Second, and (2) when cooling the flat glass SG, when the temperature of the central portion of the flat glass SG is in a temperature region from the temperature higher than the softening point to the vicinity of the annealing point, the viscosity of the both ends of the flat glass SG Become 10 9.0 ~ 10 14.5 dPa. second. Thereafter, the sheet glass SG was cut, and a glass substrate for a flat panel display having a thickness of 0.7 mm and a size of 2200 mm × 2500 mm was produced. Further, the glass substrate for a flat panel display manufactured had a liquidus temperature of 1,125 ° C and a strain point of 660 ° C.

(實施例1之玻璃組成)(The composition of the glass of Example 1)

SiO2 :60質量%、Al2 O3 :19.5質量%、B2 O3 :10質量%、CaO:5.3質量%、SrO:5質量%、SnO2 :0.2質量%。SiO 2 : 60% by mass, Al 2 O 3 : 19.5% by mass, B 2 O 3 : 10% by mass, CaO: 5.3% by mass, SrO: 5% by mass, and SnO 2 : 0.2% by mass.

(比較例1)(Comparative Example 1)

比較例1中,使用具有與用於實施例1之分隔構件(隔熱材)不同之熱阻之分隔構件(隔熱材)。將分隔構件(隔熱構件)之熱阻設為0.1m2 .K/W。In Comparative Example 1, a partition member (heat insulating material) having a heat resistance different from that of the partition member (heat insulating material) used in Example 1 was used. The thermal resistance of the partition member (insulation member) was set to 0.1 m 2 . K/W.

因此,不滿足以下條件:(1)於成形平板玻璃SG時,熔融玻璃FG通過成形體41時之熔融玻 璃FG之溫度為液相溫度以上,且熔融玻璃FG通過成形體41之最下端部時之熔融玻璃FG之兩端部之黏度成為104.3 ~106 dPa.秒,且(2)於冷卻平板玻璃SG時,當平板玻璃SG之中央部之溫度處於自高於軟化點之溫度變為退火點附近為止之溫度區域時,平板玻璃SG之兩端部之黏度成為109.0 ~1014.5 dPa.秒。Therefore, the following conditions are not satisfied: (1) When the sheet glass SG is formed, when the molten glass FG passes through the molded body 41, the temperature of the molten glass FG is equal to or higher than the liquidus temperature, and when the molten glass FG passes through the lowermost end portion of the molded body 41 The viscosity of the two ends of the molten glass FG is 10 4.3 ~ 10 6 dPa. Second, and (2) when cooling the flat glass SG, when the temperature of the central portion of the flat glass SG is in a temperature region from the temperature higher than the softening point to the vicinity of the annealing point, the viscosity of the both ends of the flat glass SG Become 10 9.0 ~ 10 14.5 dPa. second.

除上述之外,使用與實施例1相同之方法,製造玻璃基板。以比較例1之玻璃組成成為與實施例1之玻璃組成相同之方式,調合玻璃原料,製造平板顯示器用玻璃基板。A glass substrate was produced in the same manner as in Example 1 except for the above. The glass material of Comparative Example 1 was prepared in the same manner as the glass composition of Example 1, and a glass substrate was prepared to produce a glass substrate for a flat panel display.

(平板玻璃之寬度之收縮量)(the amount of shrinkage of the width of the flat glass)

測定實施例1及比較例1之平板玻璃相對於成形體寬度之寬度方向之收縮量。實施例1之收縮量為180mm,相對於此,比較例1之收縮量為230mm。再者,於藉由實施例1及比較例1之製造方法而製造之玻璃基板中,未產生失透。The amount of shrinkage of the flat glass of Example 1 and Comparative Example 1 in the width direction of the width of the molded body was measured. The amount of shrinkage in Example 1 was 180 mm, whereas the amount of shrinkage in Comparative Example 1 was 230 mm. Further, in the glass substrate produced by the production methods of Example 1 and Comparative Example 1, devitrification did not occur.

[實驗例2][Experimental Example 2]

進而,為了以與上述玻璃組成不同之玻璃組成之玻璃確認本實施形態之效果,而變更玻璃基板之製造方法,製造玻璃基板。Furthermore, in order to confirm the effect of this embodiment with the glass of the glass composition different from the said glass composition, the manufacturing method of a glass substrate was changed, and the glass substrate was manufactured.

(實施例2)(Example 2)

所製作之玻璃基板為下述玻璃組成之玻璃,在成形體41之最下端部41a中流動之熔融玻璃之兩端部之黏度為104.6 dPa.秒,玻璃基板之液相溫度為1230℃,應變點為715℃,除上述方面以外,使用與實施例1相同之分隔構件(隔熱構件)之熱阻,以相同方法,製造平板顯示器用玻璃基板。The glass substrate produced is a glass having the following glass composition, and the viscosity of the both ends of the molten glass flowing in the lowermost end portion 41a of the molded body 41 is 10 4.6 dPa. In seconds, the liquidus temperature of the glass substrate was 1230 ° C, and the strain point was 715 ° C. In addition to the above, the glass for flat panel display was produced in the same manner using the same thermal resistance of the partition member (heat insulating member) as in Example 1. Substrate.

(實施例2之玻璃組成)(The composition of the glass of Example 2)

SiO2 :61.5質量%、Al2 O3 :20質量%、B2 O3 :8.4質量%、CaO:10質量%、SnO2 :0.1質量%。SiO 2 : 61.5 mass%, Al 2 O 3 : 20 mass%, B 2 O 3 : 8.4 mass%, CaO: 10 mass%, and SnO 2 : 0.1 mass%.

(比較例2)(Comparative Example 2)

比較例2係使用具有與用於實施例2之分隔構件不同之熱阻之分隔構件。將分隔構件之熱阻設為0.1m2 .K/W。In Comparative Example 2, a partition member having a heat resistance different from that used for the partition member of Example 2 was used. The thermal resistance of the partition member was set to 0.1 m 2 . K/W.

因此,不滿足以下條件:(1)於成形平板玻璃SG時,熔融玻璃FG通過成形體41時之熔融玻璃FG之溫度為液相溫度以上,且熔融玻璃FG通過成形體41之最下端部時之熔融玻璃FG之兩端部之黏度成為104.3 ~106 dPa.秒,且(2)於冷卻平板玻璃SG時,當平板玻璃SG之中央部之溫度處於自高於軟化點之溫度變為退火點附近為止之溫度區域時,平板玻璃SG之兩端部之黏度成為109.0 ~1014.5 dPa.秒。Therefore, the following conditions are not satisfied: (1) When the sheet glass SG is formed, when the molten glass FG passes through the molded body 41, the temperature of the molten glass FG is equal to or higher than the liquidus temperature, and when the molten glass FG passes through the lowermost end portion of the molded body 41 The viscosity of the two ends of the molten glass FG is 10 4.3 ~ 10 6 dPa. Second, and (2) when cooling the flat glass SG, when the temperature of the central portion of the flat glass SG is in a temperature region from the temperature higher than the softening point to the vicinity of the annealing point, the viscosity of the both ends of the flat glass SG Become 10 9.0 ~ 10 14.5 dPa. second.

除上述之外,使用與實施例2相同之方法製造玻璃基板。以比較例2之玻璃成為與實施例2之玻璃相同之組成之方式,調合玻璃原料,製造平板顯示器用玻璃基板。A glass substrate was produced in the same manner as in Example 2 except for the above. The glass material of Comparative Example 2 was blended with the glass of the material of Example 2, and the glass substrate for flat panel display was manufactured.

(實施例3)(Example 3)

實施例3中,所製作之玻璃基板為下述玻璃組成之玻璃,液相溫度為1200℃,應變點為699℃,除上述方面以外,使用與實施例2相同之分隔構件(隔熱構件)之熱阻,以相同方法製造平板顯示器用玻璃基板。In Example 3, the glass substrate produced was a glass having the following glass composition, a liquidus temperature of 1200 ° C, and a strain point of 699 ° C. In addition to the above, the same partition member (heat insulating member) as in Example 2 was used. The thermal resistance was used to manufacture a glass substrate for a flat panel display in the same manner.

(實施例3之玻璃組成)(The composition of the glass of Example 3)

SiO2 :61.2質量%、Al2 O3 :19.5質量%、B2 O3 :9.0質量%、K2 O:0.19質量%、CaO:10質量%、Fe2 O3 :0.01質量%、SnO2 :0.1質量%。SiO 2 : 61.2% by mass, Al 2 O 3 : 19.5% by mass, B 2 O 3 : 9.0% by mass, K 2 O: 0.19% by mass, CaO: 10% by mass, Fe 2 O 3 : 0.01% by mass, SnO 2 : 0.1% by mass.

(實施例4~7)(Examples 4 to 7)

將分隔構件(隔熱構件)之熱阻變更為0.2m2 .K/W(實施例4)、0.6m2 .K/W(實施例5)、1.0m2 .K/W(實施例6)、及1.2m2 .K/W(實施例7),除此以外,使用與實施例3相同之玻璃,以相同之方法製造平板顯示器用玻璃基板。The thermal resistance of the partition member (heat insulating member) was changed to 0.2 m 2 . K/W (Example 4), 0.6 m 2 . K/W (Example 5), 1.0 m 2 . K/W (Example 6), and 1.2 m 2 . A glass substrate for a flat panel display was produced in the same manner as in Example 3 except that K/W (Example 7) was used.

(比較例3)(Comparative Example 3)

比較例3中,使用具有與用於實施例3之分隔構件不同之熱阻之分隔構件。將分隔構件之熱阻設為0.1m2 .K/W。In Comparative Example 3, a partition member having a heat resistance different from that used in the partition member of Example 3 was used. The thermal resistance of the partition member was set to 0.1 m 2 . K/W.

因此,不滿足以下條件:(1)於成形平板玻璃SG時,熔融玻璃FG通過成形體41時之熔融玻璃FG之溫度為液相溫度以上,且熔融玻璃FG通過成形體41之最下端部時之熔融玻璃FG之兩端部之黏度成為104.3 ~106 dPa.秒,且(2)於冷卻平板玻璃SG時,當平板玻璃SG之中央部之溫度處於自高於軟化點之溫度變為退火點附近為止之溫度區域時,平板玻璃SG之兩端部之黏度成為109.0 ~1014.5 dPa.秒。Therefore, the following conditions are not satisfied: (1) When the sheet glass SG is formed, when the molten glass FG passes through the molded body 41, the temperature of the molten glass FG is equal to or higher than the liquidus temperature, and when the molten glass FG passes through the lowermost end portion of the molded body 41 The viscosity of the two ends of the molten glass FG is 10 4.3 ~ 10 6 dPa. Second, and (2) when cooling the flat glass SG, when the temperature of the central portion of the flat glass SG is in a temperature region from the temperature higher than the softening point to the vicinity of the annealing point, the viscosity of the both ends of the flat glass SG Become 10 9.0 ~ 10 14.5 dPa. second.

除上述之外,使用與實施例3相同之方法,製造玻璃基板。以比較例3之玻璃成為與實施例3之玻璃相同玻璃組成之方式,調合玻璃原料,製造平板顯示器用玻璃基板。A glass substrate was produced in the same manner as in Example 3 except for the above. The glass material of Comparative Example 3 was blended with the glass composition of the glass of Example 3, and a glass substrate for flat panel display was produced.

(平板玻璃之寬度之收縮量)(the amount of shrinkage of the width of the flat glass)

測定實施例2~7及比較例2~3之製造方法中之平板玻璃相對於成形體寬度之寬度方向之收縮量。實施例2~4之收縮量為190mm以下,實施例5之收縮量為170mm以下,實施例6之收縮量為160mm以下,實施例7之收縮量為150mm以下,相對於此,比較例2及實施例3之收縮量超過220mm。The amount of shrinkage of the sheet glass in the production methods of Examples 2 to 7 and Comparative Examples 2 to 3 with respect to the width direction of the molded body width was measured. The shrinkage amount of Examples 2 to 4 was 190 mm or less, the shrinkage amount of Example 5 was 170 mm or less, the shrinkage amount of Example 6 was 160 mm or less, and the shrinkage amount of Example 7 was 150 mm or less. In contrast, Comparative Example 2 and The shrinkage amount of Example 3 exceeded 220 mm.

根據以上之實驗例1、2,本實施形態之效果較為明顯。進而,可知使用熱阻為0.2m2 .K/W以上之分隔構件(隔熱材),以平板玻璃之兩端部之黏度成為109.0 ~1014.5 dPa.秒之方式進行冷卻於抑制平板玻璃之收縮量之方面較佳。According to the above Experimental Examples 1 and 2, the effects of the present embodiment are remarkable. Further, it is understood that the heat resistance used is 0.2 m 2 . For the partition member (heat insulation material) of K/W or more, the viscosity at both ends of the flat glass is 10 9.0 ~ 10 14.5 dPa. It is preferable to perform cooling in a second manner to suppress the amount of shrinkage of the flat glass.

以上,對本發明之玻璃基板之製造方法及玻璃基板製造裝置詳細地進行了說明,但本發明並不限定於上述實施形態或實施例,於不脫離本發明之精神之範圍內,當然亦可進行各種改良或變更。In the above, the glass substrate manufacturing method and the glass substrate manufacturing apparatus of the present invention have been described in detail. However, the present invention is not limited to the above-described embodiments or examples, and it is of course possible to carry out the invention without departing from the spirit of the invention. Various improvements or changes.

40‧‧‧成形裝置40‧‧‧Forming device

41‧‧‧成形體41‧‧‧Formed body

41a‧‧‧成形體之下端部41a‧‧‧ Lower end of the formed body

41b‧‧‧成形體之頂部41b‧‧‧Top of the formed body

41c‧‧‧成形體之側面41c‧‧‧ Side of the formed body

50‧‧‧分隔構件50‧‧‧Parts

51‧‧‧冷卻輥51‧‧‧Cooling roller

60‧‧‧冷卻單元60‧‧‧Cooling unit

61‧‧‧中央部冷卻單元61‧‧‧Central cooling unit

62‧‧‧中央上部冷卻單元62‧‧‧Central upper cooling unit

63a、63b‧‧‧中央下部冷卻單元63a, 63b‧‧‧ central lower cooling unit

80‧‧‧退火爐80‧‧‧ Annealing furnace

80a‧‧‧頂板80a‧‧‧ top board

81‧‧‧下拉輥81‧‧‧ Pull down roller

90‧‧‧切斷裝置90‧‧‧cutting device

FG‧‧‧熔融玻璃FG‧‧‧ molten glass

SG‧‧‧平板玻璃SG‧‧ ‧ flat glass

Claims (10)

一種玻璃基板之製造方法,其包含以下步驟:於由爐壁包圍之成形爐室之上部空間中,使熔融玻璃自成形體溢流,成形平板玻璃;使上述平板玻璃通過狹縫狀之間隙,該間隙係由將上述成形爐室分隔為上部空間與下部空間之隔熱構件形成;及於上述下部空間中,使上述平板玻璃之兩端部冷卻;其中上述使平板玻璃之兩端部冷卻之步驟,係包含使上述平板玻璃之兩端部之黏度藉由冷卻輥成為109.0 ~1010.5 dPa.秒之方式進行冷卻者,上述隔熱構件使用具有隔熱性之材料,以使(1)於成形上述平板玻璃之步驟中,上述熔融玻璃通過上述成形體時之上述熔融玻璃之溫度為液相溫度以上,且上述熔融玻璃通過上述成形體之最下端部時之上述熔融玻璃之兩端部之黏度成為104.3 ~106 dPa.秒,且(2)於冷卻上述平板玻璃之步驟中,當上述平板玻璃之中央部之溫度處於自軟化點加上15℃所得之溫度起至玻璃應變點和玻璃退火點相加後除以2所得之溫度為止之溫度區域時,滿足包含藉由上述冷卻輥之上述冷卻且使上述平板玻璃之兩端部之黏度成為109.0 ~1014.5 dPa.秒之冷卻。A method for producing a glass substrate, comprising: forming a flat glass by overflowing molten glass from a molded body in an upper space of a forming furnace chamber surrounded by a furnace wall; and passing the flat glass through a slit-like gap, The gap is formed by a heat insulating member that divides the forming furnace chamber into an upper space and a lower space; and in the lower space, both end portions of the flat glass are cooled; wherein the both ends of the flat glass are cooled The method comprises the steps of making the viscosity of the two ends of the flat glass by a cooling roller of 10 9.0 ~ 10 10.5 dPa. In the case where the cooling member is cooled, the heat insulating member is made of a heat insulating material so that (1) in the step of molding the flat glass, the temperature of the molten glass when the molten glass passes through the molded body is a liquid phase. The viscosity of the both ends of the molten glass when the molten glass passes through the lowermost end portion of the molded body is 10 4.3 to 10 6 dPa. Second, and (2) in the step of cooling the flat glass, when the temperature of the central portion of the flat glass is at a temperature from the softening point plus 15 ° C to the glass strain point and the glass annealing point are added and then divided by 2 when the temperature of the region until the temperature of the resultant, comprising satisfied by the cooling and of the cooling roll and the viscosity of both end portions of the above-described flat glass becomes 10 9.0 ~ 10 14.5 dPa. Cooling in seconds. 如請求項1之玻璃基板之製造方法,其中上述隔熱構件之上述上部空間與上述下部空間之間之熱阻係於上述上部空間之環境溫度中為0.2m2 .K/W以上。The method of manufacturing a glass substrate according to claim 1, wherein the thermal resistance between the upper space of the heat insulating member and the lower space is 0.2 m 2 in an ambient temperature of the upper space. K/W or above. 如請求項1之玻璃基板之製造方法,其中於上述下部空間中包含以下步驟: 使上述平板玻璃之上述中央部之寬度方向之溫度分佈均勻,且使上述平板玻璃之兩端部之溫度低於上述中央部之溫度;及使上述兩端部及上述中央部之溫度相較於上述使平板玻璃之兩端部之溫度低於上述中央部之溫度之步驟中的上述兩端部及上述中央部之溫度更低,且自上述中央部之寬度方向之中心朝向上述兩端部在上述平板玻璃之寬度方向上形成溫度梯度。 A method of manufacturing a glass substrate according to claim 1, wherein the lower space includes the following steps: a temperature distribution in a width direction of the central portion of the flat glass is made uniform, and a temperature of both end portions of the flat glass is lower than a temperature of the central portion; and a temperature of the both end portions and the central portion is compared with The temperature of the both end portions and the central portion in the step of lowering the temperature of the both end portions of the flat glass is lower than the center of the central portion in the width direction toward the both end portions A temperature gradient is formed in the width direction of the flat glass. 如請求項2之玻璃基板之製造方法,其中於上述下部空間中包含以下步驟:使上述平板玻璃之上述中央部之寬度方向之溫度分佈均勻,且使上述平板玻璃之兩端部之溫度低於上述中央部之溫度;及使上述兩端部及上述中央部之溫度相較於上述使述平板玻璃之兩端部之溫度低於上述中央部之溫度之步驟中的上述兩端部及上述中央部之溫度更低,且自上述中央部之寬度方向之中心朝向上述兩端部在上述平板玻璃之寬度方向上形成溫度梯度。 The method for producing a glass substrate according to claim 2, wherein the lower space includes a step of uniformly making a temperature distribution in a width direction of the central portion of the flat glass and lowering a temperature of both end portions of the flat glass a temperature of the central portion; and the both end portions and the center of the step in which the temperature of the both end portions and the central portion are lower than a temperature at which both ends of the flat glass are lower than a temperature of the central portion The temperature of the portion is lower, and a temperature gradient is formed in the width direction of the flat glass from the center in the width direction of the central portion toward the both end portions. 如請求項1至4中任一項之玻璃基板之製造方法,其中上述平板玻璃中之玻璃之液相黏度為104.3 dPa.秒~106.7 dPa.秒。The method for producing a glass substrate according to any one of claims 1 to 4, wherein the liquid phase viscosity of the glass in the flat glass is 10 4.3 dPa. Seconds ~ 10 6.7 dPa. second. 如請求項1至4中任一項之玻璃基板之製造方法,其中上述玻璃基板之應變點為670℃以上。 The method for producing a glass substrate according to any one of claims 1 to 4, wherein the glass substrate has a strain point of 670 ° C or higher. 如請求項5中任一項之玻璃基板之製造方法,其中上述玻璃基板之應變點為670℃以上。 The method for producing a glass substrate according to any one of the preceding claims, wherein the glass substrate has a strain point of 670 ° C or higher. 如請求項1至4中任一項之玻璃基板之製造方法,其中上述使兩端部冷卻之步驟,係包含藉由冷卻輥使上述平板玻璃之兩端部之黏度成為109.0 ~1010.5 dPa.秒之方式進行冷卻,於該冷卻後,藉由相對於上述平板玻璃間隔設置之端部冷卻單元,以相較於上述冷卻輥更低之冷卻能力冷卻上述兩端部,使上述兩端部之黏度成為109.0 ~1014.5 dPa.秒。The method for producing a glass substrate according to any one of claims 1 to 4, wherein the step of cooling the both ends includes the viscosity of both ends of the flat glass being 10 9.0 to 10 10.5 dPa by a cooling roll. . Cooling is performed in a second manner, and after the cooling, the end portions are cooled by a lower cooling capacity than the cooling roller by the end portion cooling unit spaced apart from the flat glass, so that the both end portions are The viscosity becomes 10 9.0 ~ 10 14.5 dPa. second. 一種玻璃基板之製造方法,其包含以下步驟:於由爐壁包圍之成形爐室之上部空間中,使熔融玻璃自成形體溢流,成形平板玻璃;使上述平板玻璃通過狹縫狀之間隙,該間隙係由將上述成形爐室分隔為上部空間與下部空間之隔熱構件形成;及於上述下部空間中,使上述平板玻璃之兩端部冷卻;其中上述隔熱構件使用具有隔熱性之材料,以使(1)於成形上述平板玻璃之步驟中,上述熔融玻璃通過上述成形體時之上述熔融玻璃之溫度為液相溫度以上,且上述熔融玻璃通過上述成形體之最下端部時之上述熔融玻璃之兩端部之黏度成為104.3 ~106 dPa.秒,且(2)於冷卻上述平板玻璃之步驟中,當上述平板玻璃之中央部之溫度處於自軟化點加上15℃所得之溫度起至玻璃應變點和玻璃退火點相加後除以2所得之溫度為止之溫度區域時,上述平板玻璃之兩端部之黏度成為109.0 ~1014.5 dPa.秒,於上述冷卻兩端部之步驟中,上述平板玻璃自上述成形體分離後,在上述平板玻璃之中央部之溫度處於上述溫度區域時,藉由接觸上述平板玻璃而設置之第1熱處理單元對上述平板玻璃之兩端部進行熱處理,之後,藉由離開上述平板玻璃而設置之第2熱處理單元對上述平板玻璃之上述兩端部進行熱處理,朝向上述平板玻璃之上述兩端部施加拉伸張力,同時使上述兩端部之黏度維持在109.0 ~1014.5 dPa.秒之範圍內。A method for producing a glass substrate, comprising: forming a flat glass by overflowing molten glass from a molded body in an upper space of a forming furnace chamber surrounded by a furnace wall; and passing the flat glass through a slit-like gap, The gap is formed by a heat insulating member that partitions the forming furnace chamber into an upper space and a lower space; and in the lower space, both end portions of the flat glass are cooled; wherein the heat insulating member is insulated In the step of molding the flat glass, the temperature of the molten glass when the molten glass passes through the molded body is equal to or higher than a liquidus temperature, and the molten glass passes through the lowermost end portion of the molded body. The viscosity of the two ends of the molten glass is 10 4.3 ~ 10 6 dPa. Second, and (2) in the step of cooling the flat glass, when the temperature of the central portion of the flat glass is at a temperature from the softening point plus 15 ° C to the glass strain point and the glass annealing point are added and then divided by 2 When the temperature is obtained in the temperature range, the viscosity of the both ends of the flat glass is 10 9.0 ~ 10 14.5 dPa. a second heat treatment unit provided by contacting the flat glass when the temperature of the central portion of the flat glass is in the temperature region after the flat glass is separated from the molded body in the step of cooling the both ends of the flat glass Heat treatment is performed on both end portions of the flat glass, and then the two end portions of the flat glass are heat-treated by a second heat treatment unit provided to leave the flat glass, and stretching is applied to the both end portions of the flat glass. Tension, while maintaining the viscosity of the two ends at 10 9.0 ~ 10 14.5 dPa. Within the range of seconds. 一種玻璃基板製造裝置,其包含:成形爐室,其係由爐壁圍成;隔熱構件,其將上述成形爐室分隔為上部空間與下部空間, 形成上述平板玻璃所通過之狹縫狀之間隙;成形體,其設置於上述成形爐室之上述上部空間中,使熔融玻璃溢流,成形平板玻璃;及冷卻構件,其於上述下部空間中使上述平板玻璃之兩端部冷卻;上述冷卻構件包含以使上述平板玻璃之兩端部之黏度成為109.0 ~1010.5 dPa.秒之方式對上述平板玻璃之兩端部進行冷卻之冷卻輥,上述隔熱構件使用具有隔熱性之材料,以使(1)於上述成形平板玻璃之步驟中,上述熔融玻璃通過上述成形體時之上述熔融玻璃之溫度為液相溫度以上,且上述熔融玻璃通過上述成形體之最下端部時之上述熔融玻璃之兩端部之黏度成為104.3 ~106 dPa.秒,且(2)於冷卻上述平板玻璃之步驟中,當上述平板玻璃之中央部之溫度處於自軟化點加上15℃所得之溫度起至玻璃應變點和玻璃退火點相加後除以2所得之溫度為止之溫度區域時,滿足包含藉由上述冷卻輥之上述冷卻且使上述平板玻璃之兩端部之黏度成為109.0 ~1014.5 dPa.秒之冷卻。A glass substrate manufacturing apparatus comprising: a molding furnace chamber surrounded by a furnace wall; and a heat insulating member that divides the forming furnace chamber into an upper space and a lower space to form a slit shape through which the flat glass passes a molded body provided in the upper space of the forming furnace chamber to overflow the molten glass to form a flat glass; and a cooling member that cools both end portions of the flat glass in the lower space; the cooling The member is included such that the viscosity of the two ends of the flat glass is 10 9.0 ~ 10 10.5 dPa. a cooling roll for cooling both end portions of the flat glass, wherein the heat insulating member is made of a heat insulating material, wherein (1) the step of forming the flat glass, the molten glass passes through the molded body The temperature of the molten glass is equal to or higher than the liquidus temperature, and the viscosity of the both ends of the molten glass when the molten glass passes through the lowermost end of the molded body is 10 4.3 to 10 6 dPa. Second, and (2) in the step of cooling the flat glass, when the temperature of the central portion of the flat glass is at a temperature from the softening point plus 15 ° C to the glass strain point and the glass annealing point are added and then divided by 2 when the temperature of the region until the temperature of the resultant, comprising satisfied by the cooling and of the cooling roll and the viscosity of both end portions of the above-described flat glass becomes 10 9.0 ~ 10 14.5 dPa. Cooling in seconds.
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Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102025004B1 (en) * 2015-06-30 2019-09-24 아반스트레이트 가부시키가이샤 Glass substrate manufacturing method and glass substrate manufacturing apparatus
JP2017048102A (en) * 2015-08-31 2017-03-09 AvanStrate株式会社 Manufacturing method of glass substrate, and manufacturing apparatus of glass substrate
JP2017119617A (en) * 2015-12-28 2017-07-06 AvanStrate株式会社 Glass substrate manufacturing method, and glass substrate manufacturing apparatus
JP6861056B2 (en) * 2016-03-31 2021-04-21 AvanStrate株式会社 Glass substrate manufacturing method and glass substrate manufacturing equipment
WO2018098125A1 (en) 2016-11-23 2018-05-31 Corning Incorporated Method and apparatus for glass ribbon thermal control
EP4197978A1 (en) * 2018-10-09 2023-06-21 Corning Incorporated Compositions and method for preventing baggy warp defects
WO2021124801A1 (en) * 2019-12-18 2021-06-24 日本電気硝子株式会社 Glass article manufacturing method and glass article manufacturing device
JP2022097010A (en) * 2020-12-18 2022-06-30 日本電気硝子株式会社 Method for producing glass article

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090226733A1 (en) * 2008-01-21 2009-09-10 Nippon Electric Glass Co.,Ltd. Process for producing glass substrate and glass substrate
JP2011219361A (en) * 2011-07-06 2011-11-04 Nippon Electric Glass Co Ltd Glass sheet and method of forming the same
TW201213250A (en) * 2010-09-30 2012-04-01 Avanstrate Inc Manufacturing method of glass plate

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61257913A (en) * 1985-05-09 1986-11-15 Kao Corp Dentifrice composition
JP3586142B2 (en) * 1999-07-22 2004-11-10 エヌエッチ・テクノグラス株式会社 Glass plate manufacturing method, glass plate manufacturing apparatus, and liquid crystal device
JP4277118B2 (en) * 2001-06-29 2009-06-10 旭硝子株式会社 Method and apparatus for manufacturing thin glass
KR100639848B1 (en) 2001-12-21 2006-10-30 코닝 인코포레이티드 Process for producing sheet glass by the overflow downdraw fusion process
WO2004069757A2 (en) * 2003-02-04 2004-08-19 Pitbladdo Richard B Sheet glass forming apparatus
JP4753067B2 (en) * 2005-08-18 2011-08-17 日本電気硝子株式会社 Sheet glass forming method
JP4826722B2 (en) * 2005-08-18 2011-11-30 日本電気硝子株式会社 Sheet glass forming method
CN101374778B (en) * 2005-12-15 2012-12-12 康宁股份有限公司 Overflow downdraw glass forming method and apparatus
JP4918183B2 (en) * 2006-09-29 2012-04-18 Hoya株式会社 Sheet glass manufacturing apparatus and method, and glass product and liquid crystal display manufacturing method
KR20100032379A (en) * 2007-05-18 2010-03-25 코닝 인코포레이티드 Method and apparatus for minimizing inclusions in a glass making process
JP5375385B2 (en) * 2009-07-13 2013-12-25 日本電気硝子株式会社 Manufacturing method of glass substrate
JP5656080B2 (en) * 2010-03-23 2015-01-21 日本電気硝子株式会社 Manufacturing method of glass substrate
JP2011207720A (en) * 2010-03-30 2011-10-20 Nippon Electric Glass Co Ltd Thin glass plate and method of manufacturing the same
WO2012023136A1 (en) * 2010-08-15 2012-02-23 Airbase Systems Ltd. Device, system and method for personal health monitoring based on multitude-points environmental data
WO2012026136A1 (en) * 2010-08-27 2012-03-01 AvanStrate株式会社 Device for manufacturing glass substrate and method for manufacturing glass substrate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090226733A1 (en) * 2008-01-21 2009-09-10 Nippon Electric Glass Co.,Ltd. Process for producing glass substrate and glass substrate
TW201213250A (en) * 2010-09-30 2012-04-01 Avanstrate Inc Manufacturing method of glass plate
JP2011219361A (en) * 2011-07-06 2011-11-04 Nippon Electric Glass Co Ltd Glass sheet and method of forming the same

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