TWI496167B - A conductive plate having a plurity of conductive films - Google Patents

A conductive plate having a plurity of conductive films Download PDF

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TWI496167B
TWI496167B TW098128206A TW98128206A TWI496167B TW I496167 B TWI496167 B TW I496167B TW 098128206 A TW098128206 A TW 098128206A TW 98128206 A TW98128206 A TW 98128206A TW I496167 B TWI496167 B TW I496167B
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conductive
substrate
conductive films
nano
colloid
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TW201108252A (en
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Chih Chieh Chang
Jeah Sheng Wu
Chih Han Chao
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Innolux Corp
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Description

具複數導電膜之導電板 Conductive plate with multiple conductive films

本發明係關於一種導電板,特別是一種具複數導電膜之導電板。 The present invention relates to a conductive plate, and more particularly to a conductive plate having a plurality of conductive films.

奈米碳管(carbon nanotube,CNT)係一種由碳原子組成、直徑為奈米等級之中空管狀物,隨著奈米碳管之長度、直徑及螺旋方式之變化,奈米碳管可呈現出金屬性質或半導體性質,由於奈米碳管之優異特性,因此可望在許多不同技術領域中發揮重要作用。 Carbon nanotube (CNT) is a hollow tube composed of carbon atoms and having a diameter of nanometer. With the change of the length, diameter and spiral mode of the carbon nanotubes, the carbon nanotubes can be presented. Metallic or semiconducting properties are expected to play an important role in many different technical fields due to their excellent properties.

由於CNT具有導電性,因此陸續有人嘗試以CNT製作成導電膜。以CNT所製作的導電膜而言,其製作條件相對製作銦錫氧化物(Indium Tin Oxide,ITO)等透明導電膜要來的容易,且製作成本相對其他透明導電膜來的低廉。因為透明導電膜其光學級穿透度上的需求,因此以CNT所製作成的透明導電膜需要把CNT本身的密度降低,以達成較高的穿透度。 Since CNTs are electrically conductive, attempts have been made to fabricate conductive films from CNTs. In the conductive film produced by CNT, the production conditions are relatively easy to produce a transparent conductive film such as indium tin oxide (ITO), and the production cost is lower than that of other transparent conductive films. Because of the optical grade penetration requirement of the transparent conductive film, the transparent conductive film made of CNT needs to reduce the density of the CNT itself to achieve higher penetration.

目前所使用的方式為:將生長於晶圓(或其他基材)上的CNT叢集,藉由機械力量來將晶圓(或其他基材)上的CNT叢集懸空拉伸成一透明狀導電膜。最後將CNT透明導電膜以微速小心貼到已上膠的基板上,用以將CNT透明導電膜固定於基板上以形成具導電功能的導電板。 The current method is to use a CNT cluster grown on a wafer (or other substrate) to mechanically force the CNT clusters on the wafer (or other substrate) to be suspended into a transparent conductive film. Finally, the CNT transparent conductive film is carefully attached to the sized substrate at a slight speed to fix the CNT transparent conductive film on the substrate to form a conductive plate having a conductive function.

目前隨著液晶顯示器等的發展,對於大面積的導電板需求也越來越重要,但是這種將CNT由晶圓(或其他基材)上拉伸成的透明 狀導電膜則會受限於晶圓(或其他基材)的尺寸而使得寬度受限,無法製作出大面積的導電板。 With the development of liquid crystal displays and the like, the demand for large-area conductive plates is becoming more and more important, but the CNTs are stretched from wafers (or other substrates). The conductive film is limited by the size of the wafer (or other substrate) so that the width is limited, and a large-area conductive plate cannot be fabricated.

本發明提供一種具複數導電膜之導電板,以解決習知之問題。 The present invention provides a conductive plate having a plurality of conductive films to solve the conventional problems.

本發明的其他目的和優點可以從本發明所揭露的技術特徵中得到進一步的了解。 Other objects and advantages of the present invention will become apparent from the technical features disclosed herein.

為了達到上述的目的,本發明之較佳實施例揭露一種具複數導電膜之導電板。具複數導電膜之導電板包含基板、複數導電膜與膠體。其中各導電膜具有複數奈米單元,且膠體用以使導電膜承載於基板上。 In order to achieve the above object, a preferred embodiment of the present invention discloses a conductive plate having a plurality of conductive films. The conductive plate with the plurality of conductive films comprises a substrate, a plurality of conductive films and a colloid. Each of the conductive films has a plurality of nano cells, and the colloid is used to carry the conductive film on the substrate.

其中複數導電膜可係並排設置於基板上,亦可係推疊於基板上,又或可部分重疊設置於基板上。 The plurality of conductive films may be disposed side by side on the substrate, may be stacked on the substrate, or may be partially overlapped on the substrate.

根據本發明所揭露之一種具複數導電膜之導電板係將複數導電膜藉由並排或堆疊等方式置於基材上,於此可製作出大面積的導電板,亦可降低阻抗以增加最大傳輸電流值。 A conductive plate with a plurality of conductive films according to the present invention places a plurality of conductive films on a substrate by side by side or stacking, etc., thereby forming a large-area conductive plate, and reducing impedance to increase maximum Transmit current value.

有關本發明的特徵與實作,茲配合圖示作最佳實施例詳細說明如下。 The features and implementations of the present invention are described in detail below with reference to the preferred embodiments.

請參照「第1圖」,「第1圖」係為本發明具複數導電膜之導電板的第一具體實施例示意圖。 Please refer to FIG. 1 and FIG. 1 is a schematic view showing a first embodiment of a conductive plate having a plurality of conductive films according to the present invention.

於本實施例中,具複數導電膜之導電板100包含有基板10、膠體20與複數導電膜30。其中複數導電膜30並排設置於基板10上,且膠體20用以使複數導電膜30承載於基板10 上。 In the present embodiment, the conductive plate 100 having a plurality of conductive films includes a substrate 10, a colloid 20, and a plurality of conductive films 30. The plurality of conductive films 30 are disposed side by side on the substrate 10, and the colloid 20 is used to carry the plurality of conductive films 30 on the substrate 10. on.

基板10可為一透明材質基板。透明材質基板可包含玻璃基板、高分子透明材質基板。其中高分子透明材質基板可為包含有聚甲基丙烯酸甲酯(Polymethylmethacrylate,PMMA)、聚對苯二甲酸乙二酯(Polyethylene terephthalate,PET)或聚碳酸酯樹脂(Polycarbonate,P C)之基板。然,在本發明之基板為高分子透明材質基板之情況下,高分子透明材質並不以上述例為限,亦可為其他高分子透明材質。 The substrate 10 can be a transparent substrate. The transparent material substrate may include a glass substrate or a polymer transparent material substrate. The polymer transparent material substrate may be a substrate comprising polymethylmethacrylate (PMMA), polyethylene terephthalate (PET) or polycarbonate resin (P C). However, in the case where the substrate of the present invention is a polymer transparent material substrate, the polymer transparent material is not limited to the above examples, and may be other polymer transparent materials.

基板10亦可為一不透明材質基板,例如:金屬基板、半導體基板、印刷電路板與塑膠基板等。其中塑膠基板可為本身具色彩之塑膠基板或係在透明基板外塗布色彩來形成。 The substrate 10 may also be an opaque substrate such as a metal substrate, a semiconductor substrate, a printed circuit board, a plastic substrate, or the like. The plastic substrate can be formed by a plastic substrate having a color or a color applied outside the transparent substrate.

導電膜30的形成可係先行於晶圓(或其他基材)上生長奈米單元叢集,再藉由機械力量來將晶圓(或其他基材)上的奈米單元叢集懸空拉伸成一透明狀導電膜。其中於晶圓(或其他基材)上生長奈米單元叢集的方式可透過電弧放電法(arc discharge)、雷射蒸發法(laser vaporization)或有機氣相沉積法(chemical vapor deposition)等。上述之基材可以為晶圓、石墨等。上述之奈米單元可以為非等向性形狀之奈米單元,所謂非等向性形狀之奈米單元係形狀上長度與寬度相異之奈米單元,例如是奈米碳管等。上數之奈米單元亦可為大致呈等向性形狀致奈米單元,例如是奈米粒子等。 The conductive film 30 can be formed by growing a cluster of nano-cells on a wafer (or other substrate), and then mechanically stretching the nano-cell clusters on the wafer (or other substrate) into a transparent Conductive film. The manner in which the nanocell clusters are grown on the wafer (or other substrate) can be transmitted by an arc discharge, a laser vaporization, or a chemical vapor deposition. The above substrate may be a wafer, graphite or the like. The nano unit described above may be a nano unit of an anisotropic shape, and the nano unit having a length and a width different in the shape of the nano unit of the anisotropic shape is, for example, a carbon nanotube or the like. The nano unit of the upper number may also be a substantially isotropic shape-forming nano unit, such as a nano particle.

詳言之,當上述之奈米單元中之一受到外部拉力而離開晶圓(或其他基材)時,與該奈米單元鄰近的另一奈米單元會因為與該奈米單元之間的凡得瓦力的作用而一併被帶離晶圓(或其他基材)。於此,當晶圓(或其他基材)上的多個奈米單元中受到 外部拉力而離開晶圓(或其他基材)時,其中每一受到外部拉力的奈米單元會串接起複數個奈米單元以形成一奈米單元束(圖中未示),因此可將晶圓(或其他基材)上的複數個奈米單元以拉伸處理的方式形成具複數個奈米單元束的導電膜30,且導電膜30內之複數奈米單元束係以一特定方向X排列配置,亦即導電膜30內之複數奈米單元係大致朝向一特定方向X排列。 In detail, when one of the above-mentioned nano-cells is subjected to external pulling force to leave the wafer (or other substrate), another nano-cell adjacent to the nano-unit may be between the nano-unit and the nano-unit The van der Waals force is taken away from the wafer (or other substrate). Here, when a plurality of nano cells on a wafer (or other substrate) are subjected to When the external tension pulls away from the wafer (or other substrate), each of the nano-units subjected to the external tensile force will cascade a plurality of nano-units to form a nano-unit bundle (not shown), so The plurality of nano cells on the wafer (or other substrate) form a conductive film 30 having a plurality of nano cell bundles in a stretching process, and the plurality of nano cell bundles in the conductive film 30 are in a specific direction The X array arrangement, that is, the plurality of nano cell units in the conductive film 30 are arranged substantially in a specific direction X.

其中每一奈米單元束上會有複數個觸鬚延伸連接其他奈米單元束。因此當電流流經導電膜30時,沿著特定方向X的方向能流通較大的電流,而當電流沿著相異於特定方向X的方向則僅能流通較小的電流,故所形成之導電膜200具電異向性。在此,所謂的電異向性又稱導電異向性或稱電阻抗異向性,係不同方向上具有不同的導電性質或電阻抗性質之謂。 Each of the nanocell bundles has a plurality of tentacles extending to connect the other nanocell bundles. Therefore, when a current flows through the conductive film 30, a large current can flow in a direction along a specific direction X, and when a current flows in a direction different from a specific direction X, only a small current can flow, so that a current is formed. The conductive film 200 has electrical anisotropy. Here, the so-called electrical anisotropy, also known as conductive anisotropy or electrical anisotropy, has different conductive properties or electrical impedance properties in different directions.

其中膠體20可依固化方式之不同選擇用光固化膠、熱固化膠或光-熱固化膠。所謂的光固化膠指會受特定波段的光線照射而固化的膠體,例如是紫外線硬化膠(Ultraviolet glue),而所謂的熱固化膠則指會在某特定溫度範圍以上的環境中而固化的膠體,而所謂的光-熱固化膠則指需要在某特定溫度範圍以上的環境中,同時受特定波長的光線照射而固化的膠體。此外,膠體20亦可選用具導電性之膠體,例如是導電高分子膠。 The colloid 20 can be selected from a photocurable adhesive, a thermosetting adhesive or a photo-thermosetting adhesive depending on the curing method. The so-called photocurable gel refers to a colloid that is cured by irradiation of light of a specific wavelength band, such as an ultraviolet curing glue, and a so-called thermosetting gel refers to a colloid that solidifies in an environment above a certain temperature range. The so-called photo-thermosetting glue refers to a colloid that needs to be cured in a certain temperature range and is irradiated by light of a specific wavelength. In addition, the colloid 20 may also be provided with a conductive colloid, such as a conductive polymer glue.

於本實施例,先行提供一基材10、膠體20與複數導電膜30。接著將膠體20形成於基板10上,其中將膠體20形成於基板10上的方法可透過印刷塗佈、旋轉塗佈或滴定等方式將膠體20形成於基板10上。最後利用膠體20使複數導電膜30承載於基板10上。詳言之,將複數導電薄膜30並排設置於膠 體20背對於基板10的一側表面附近,藉由將複數導電薄膜30並排設置於基板10上可得到大面積的導電板。因而,當複數導電膜30承載於基板10上時,膠體20係存在於導電膜30與基板10之間。其中複數導電膜30之間係沿著大致平行特定方向X並排設置且串接於基板10上。 In the present embodiment, a substrate 10, a colloid 20, and a plurality of conductive films 30 are provided first. Next, the colloid 20 is formed on the substrate 10, and the method of forming the colloid 20 on the substrate 10 can form the colloid 20 on the substrate 10 by means of printing coating, spin coating or titration. Finally, the plurality of conductive films 30 are carried on the substrate 10 by the colloid 20. In detail, the plurality of conductive films 30 are arranged side by side in the glue The body 20 is disposed opposite to the side surface of the substrate 10, and a large-area conductive plate can be obtained by arranging the plurality of conductive films 30 side by side on the substrate 10. Therefore, when the plurality of conductive films 30 are carried on the substrate 10, the colloid 20 is present between the conductive film 30 and the substrate 10. The plurality of conductive films 30 are arranged side by side along a substantially parallel specific direction X and are serially connected to the substrate 10.

於本實施例,在將複數導電膜30之間以並排且串接的方式設置於基材10上後,可先行對複數導電膜30進行雷射處理。其中對複數導電膜30進行雷射處理的方式可利用雷射以大致平行於特定方向來回處理複數導電膜30,用以增加其電異向性與透明度,亦可利用雷射以大致垂直於特定方向來回處理複數導電膜30,用以增加其透明度。接著再對膠體20進行固化處理。詳言之,當膠體20為光固化膠時,則以特定波段的光線照射使膠體20固化;當膠體20為熱固化膠時,則將膠體20放置於某特定溫度範圍以上的環境使膠體20固化;當膠體20為光-熱固化膠時,則將膠體20放置於某特定溫度範圍以上的環境並以特定波段的光線照射之,使膠體20固化。 In the present embodiment, after the plurality of conductive films 30 are disposed side by side and in series on the substrate 10, the plurality of conductive films 30 may be subjected to laser treatment. The method of performing laser processing on the plurality of conductive films 30 may utilize a laser to process the plurality of conductive films 30 back and forth substantially parallel to a specific direction for increasing electrical anisotropy and transparency, and may also utilize lasers to be substantially perpendicular to a specific The plurality of conductive films 30 are processed back and forth to increase their transparency. The colloid 20 is then cured. In detail, when the colloid 20 is a photocurable adhesive, the colloid 20 is cured by irradiation with light of a specific wavelength band; when the colloid 20 is a thermosetting adhesive, the colloid 20 is placed in an environment above a certain temperature range to make the colloid 20 When the colloid 20 is a photo-thermosetting glue, the colloid 20 is placed in an environment above a certain temperature range and irradiated with light of a specific wavelength band to cure the colloid 20.

根據本實施例所揭露之一種具複數導電膜之導電板100藉由將複數導電膜30之間以並排且串接的方式設置於基材10上,於此可製作出大面積的導電板。 A conductive plate 100 having a plurality of conductive films according to the present embodiment is provided on the substrate 10 by placing the plurality of conductive films 30 side by side and in series, whereby a large-area conductive plate can be fabricated.

「第2圖」係為本發明具複數導電膜之導電板的第二具體實施例示意圖。 Fig. 2 is a schematic view showing a second embodiment of the conductive plate having a plurality of conductive films of the present invention.

請參照「第2圖」,並合併參照前述實施例。本實施例與前述實施例的差別在於複數導電膜30係沿著一異於該特定方向X的第二特定方向Y部分重疊並排設置於基板10上。各導電膜30具有沿著該第二特定方向Y間隔設置的一第一端部31 及一第二端部32,且各導電膜30的第一端部32是與相鄰的導電膜30的第二端部32相互重疊。 Please refer to "Fig. 2" and refer to the foregoing embodiment in combination. The difference between this embodiment and the foregoing embodiment is that the plurality of conductive films 30 are partially overlapped and arranged on the substrate 10 along a second specific direction Y different from the specific direction X. Each of the conductive films 30 has a first end portion 31 spaced apart along the second specific direction Y And a second end portion 32, and the first end portion 32 of each of the conductive films 30 overlaps with the second end portion 32 of the adjacent conductive film 30.

為了避免晶圓(或其他基材)上的CNT叢集被懸空拉伸成一透明狀導電膜時,在導電膜的邊緣因為內聚力等作用而使得導電膜邊緣的中間部位會較導電膜邊緣的兩端部位內縮。因此若係將複數導電膜30之間以並排且串接的方式設置於基材10上,在導電膜30與導電膜30之間會因為導電膜邊緣的中間部位內縮而無法相互連接以致形成縫隙。 In order to prevent the CNT cluster on the wafer (or other substrate) from being suspended and stretched into a transparent conductive film, the edge of the edge of the conductive film is more than the two ends of the edge of the conductive film due to the cohesive force or the like at the edge of the conductive film. The site is indented. Therefore, if the plurality of conductive films 30 are disposed side by side and in series on the substrate 10, the intermediate portion of the edge of the conductive film may be rejoined between the conductive film 30 and the conductive film 30 to form a mutual connection. Gap.

因此本發明之較佳實施例係將複數導電薄膜30係部分重疊設置於膠體20背對於基板10的一側表面附近,藉由將複數導電薄膜30部分重疊設置於基板10上可避免導電膜30與導電膜30之間會因為導電膜邊緣的中間部位內縮而無法相互連接以致形成空隙,同時可得到大面積的導電板。其中複數導電膜30之間係沿著大致平行特定方向X部分於基板10上。 Therefore, the preferred embodiment of the present invention partially overlaps the plurality of conductive films 30 in the vicinity of one side surface of the colloid 20 facing the substrate 10, and the conductive film 30 can be avoided by partially overlapping the plurality of conductive films 30 on the substrate 10. Between the conductive film 30 and the conductive film 30, the intermediate portion of the edge of the conductive film is retracted and cannot be connected to each other to form a void, and a large-area conductive plate can be obtained. The plurality of conductive films 30 are partially on the substrate 10 along a substantially parallel specific direction X.

於本實施例,在將複數導電膜30之間以部分重疊且串接的方式設置於基材10上後,可先對複數導電膜30進行雷射處理。其中對複數導電膜30進行雷射處理的方式可參考前述實施例在此不作贅述。由於導電膜30與導電膜30之間係以部分重疊的方式串接,因此在重疊的部分會相較於其他未重疊部分的透明度會較差,因此可對重疊部分進行相較於其他未重疊部分更多的雷射處理過程,以使重疊部分的透明度可大致相近於其他未重疊部分的透明度。接著再對膠體20進行固化處理。其中對複數導電膜30進行固化處理的方式可參考前述實施例在此不作贅述。 In the present embodiment, after the plurality of conductive films 30 are partially overlapped and connected in series to the substrate 10, the plurality of conductive films 30 may be subjected to a laser treatment. The manner in which the plurality of conductive films 30 are subjected to laser processing can be referred to the foregoing embodiments without further reference. Since the conductive film 30 and the conductive film 30 are connected in series in a partially overlapping manner, the overlapping portions may be inferior in transparency to other non-overlapping portions, so that the overlapping portions may be compared with other non-overlapping portions. More laser processing so that the transparency of the overlapping portions can be approximately similar to the transparency of other non-overlapping portions. The colloid 20 is then cured. The manner in which the plurality of conductive films 30 are subjected to the curing treatment can be referred to the foregoing embodiments without further reference.

根據本實施例所揭露之一種具複數導電膜之導電板100藉 由將複數導電膜30之間以部分重疊且串接的方式設置於基材10上,於此可製作出大面積的導電板。 According to the conductive plate 100 with a plurality of conductive films disclosed in this embodiment The plurality of conductive films 30 are partially overlapped and connected in series to the substrate 10, whereby a large-area conductive plate can be produced.

「第3圖」係為本發明具複數導電膜之導電板的第三具體實施例示意圖。 Fig. 3 is a schematic view showing a third embodiment of the conductive plate having a plurality of conductive films of the present invention.

請參照「第3圖」,並合併參照前述實施例。本實施例與前述實施例的差別在於複數導電膜30係堆疊設置於基板10上。 Please refer to "FIG. 3" and refer to the foregoing embodiment in combination. The difference between this embodiment and the foregoing embodiment is that the plurality of conductive films 30 are stacked on the substrate 10.

本實施例係將複數導電薄膜30堆疊設置於膠體20背對於基板10的一側表面附近,由於導電膜30係由複數奈米單元束所組成,因此膠體20可由複數奈米單元束之間滲透而將複數導電膜30固定於膠體20背對於基板10的一側表面附近。本實施例亦可在導電膜30與導電膜30之間另形成膠體20,以藉由膠體20來固定導電膜30與導電膜30之間的堆疊關係,用以避免形成於基板10上的膠體20無法藉由滲透作用而固定多層堆疊的導電膜。藉由將複數導電薄膜30堆疊設置於基板10上可降低阻抗以增加最大傳輸電流值。其中複數導電膜30係大致朝向同一特定方向X。 In this embodiment, the plurality of conductive films 30 are stacked in the vicinity of one side surface of the colloid 20 facing the substrate 10. Since the conductive film 30 is composed of a plurality of nano cell bundles, the colloid 20 can be infiltrated between the plurality of nano cell bundles. The plurality of conductive films 30 are fixed to the vicinity of one side surface of the colloid 20 facing the substrate 10. In this embodiment, a colloid 20 may be further formed between the conductive film 30 and the conductive film 30 to fix the stacking relationship between the conductive film 30 and the conductive film 30 by the colloid 20 to avoid colloid formed on the substrate 10. 20 The multilayer laminated conductive film cannot be fixed by osmosis. By stacking the plurality of conductive films 30 on the substrate 10, the impedance can be lowered to increase the maximum transfer current value. The plurality of conductive films 30 are oriented substantially in the same specific direction X.

於本實施例,在將複數導電膜30之間以堆疊的方式設置於基材10上後,可先對複數導電膜30進行雷射處理。其中對複數導電膜30進行雷射處理的方式可參考前述實施例在此不作贅述。接著再對膠體20進行固化處理。其中對複數導電膜30進行固化處理的方式可參考前述實施例在此不作贅述。 In the present embodiment, after the plurality of conductive films 30 are stacked on the substrate 10, the plurality of conductive films 30 may be subjected to a laser treatment. The manner in which the plurality of conductive films 30 are subjected to laser processing can be referred to the foregoing embodiments without further reference. The colloid 20 is then cured. The manner in which the plurality of conductive films 30 are subjected to the curing treatment can be referred to the foregoing embodiments without further reference.

根據本實施例所揭露之一種具複數導電膜之導電板100藉由將複數導電膜30之間以堆疊的方式設置於基材10上,於此可降低阻抗以增加最大傳輸電流值。 The conductive plate 100 having a plurality of conductive films according to the present embodiment can reduce the impedance to increase the maximum transfer current value by stacking the plurality of conductive films 30 on the substrate 10 in a stacked manner.

根據本發明所揭露之一種具複數導電膜之導電板係將複數 導電膜藉由並排、部分重疊或堆疊等方式置於基材上,於此可製作出大面積的導電板,亦可降低阻抗以增加最大傳輸電流值。 A conductive plate system having a plurality of conductive films according to the present invention will have plural The conductive film is placed on the substrate by side by side, partially overlapping or stacked, whereby a large-area conductive plate can be fabricated, and the impedance can be lowered to increase the maximum transfer current value.

根據本發明所揭露之一種導電板的製作方法及其製備系統,先行將導電膜置於基材上,再對已置於基材上的導電膜進行雷射等後處理,於此可提升製程的生產速度與良率,且製程參數較易控制,同時導電膜可以不間斷的大面積導入。 According to the method for fabricating a conductive plate and the preparation system thereof, the conductive film is first placed on a substrate, and then the conductive film placed on the substrate is subjected to laser and other post-treatment, thereby improving the process. The production speed and yield, and the process parameters are easier to control, and the conductive film can be introduced in a large area without interruption.

雖然本發明以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。另外,本發明的任一實施例或申請專利範圍不須達成本發明所揭露之全部目的或優點或特點。此外,摘要部分和標題僅是用來輔助專利文件搜尋之用,並非用來限制本發明之權利範圍。 The present invention has been disclosed in the above embodiments, and is not intended to limit the present invention. Any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims. In addition, any of the objects or advantages or features of the present invention are not required to be achieved by any embodiment or application of the invention. In addition, the abstract sections and headings are only used to assist in the search of patent documents and are not intended to limit the scope of the invention.

10‧‧‧基板 10‧‧‧Substrate

20‧‧‧膠體 20‧‧‧ colloid

30‧‧‧導電膜 30‧‧‧Electrical film

31‧‧‧第一端部 31‧‧‧ first end

32‧‧‧第二端部 32‧‧‧second end

100‧‧‧具複數導電膜之導電板 100‧‧‧conductive plates with multiple conductive films

X‧‧‧特定方向 X‧‧‧Special direction

Y‧‧‧第二特定方向 Y‧‧‧ second specific direction

第1圖係為本發明具複數導電膜之導電板的第一具體實施例示意圖;第2圖係為本發明具複數導電膜之導電板的第二具體實施例示意圖;以及第3圖係為本發明具複數導電膜之導電板的第三具體實施例示意圖。 1 is a schematic view of a first embodiment of a conductive plate having a plurality of conductive films according to the present invention; and FIG. 2 is a schematic view showing a second embodiment of a conductive plate having a plurality of conductive films according to the present invention; and FIG. A schematic diagram of a third embodiment of a conductive plate having a plurality of conductive films of the present invention.

10‧‧‧基板 10‧‧‧Substrate

20‧‧‧膠體 20‧‧‧ colloid

30‧‧‧導電膜 30‧‧‧Electrical film

31‧‧‧第一端部 31‧‧‧ first end

32‧‧‧第二端部 32‧‧‧second end

100‧‧‧具複數導電膜之導電板 100‧‧‧conductive plates with multiple conductive films

X‧‧‧特定方向 X‧‧‧Special direction

Y‧‧‧第二特定方向 Y‧‧‧ second specific direction

Claims (6)

一種具複數導電膜之導電板,包含:一基板;複數導電膜,分別經由以下步驟所製成:在一基材上形成一由多數奈米單元組成的奈米單元叢集,拉伸該奈米單元叢集,使得該等奈米單元沿著一特定方向X彼此串接形成多數奈米單元束,各導電膜具有分別沿著一異於該特定方向X的第二特定方向Y間隔設置的一第一端部及一第二端部;以及一膠體,使該等導電膜承載於該基板上,其中,該等導電膜是沿著該第二特定方向Y部分重疊並排設置於該基板上,且各導電膜的第一端部與相鄰導電膜的第二端部相互重疊。 A conductive plate having a plurality of conductive films, comprising: a substrate; and a plurality of conductive films respectively formed by forming a cluster of nano cells composed of a plurality of nano units on a substrate, and stretching the nano The cell clusters are arranged such that the nano cell units are connected in series with each other along a specific direction X to form a plurality of nano cell bundles, each of the conductive films having a first interval disposed along a second specific direction Y different from the specific direction X And the first conductive portion is disposed on the substrate, The first end of each of the conductive films overlaps the second end of the adjacent conductive film. 如申請專利範圍第1項所述之具複數導電膜之導電板,其中各該導電膜係具電異向性。 The conductive plate having a plurality of conductive films according to claim 1, wherein each of the conductive films has electrical anisotropy. 如申請專利範圍第1項所述之具複數導電膜之導電板,其中該等奈米單元包含大致呈等向性形狀之奈米單元。 The conductive plate having a plurality of conductive films according to claim 1, wherein the nano cells comprise nano units having a substantially isotropic shape. 如申請專利範圍第1項所述之具複數導電膜之導電板,其中該等奈米單元包含奈米碳管。 The conductive plate having a plurality of conductive films according to claim 1, wherein the nano cells comprise carbon nanotubes. 如申請專利範圍第1項所述之具複數導電膜之導電板,其中該等導電膜之間係沿著大致平行該特定方向X串接於該基板上。 The conductive plate having a plurality of conductive films according to claim 1, wherein the conductive films are serially connected to the substrate along substantially parallel to the specific direction X. 如申請專利範圍第2項所述之具複數導電膜之導電板,其中該等導電膜係經過雷射處理。 A conductive plate having a plurality of conductive films as described in claim 2, wherein the conductive films are subjected to laser treatment.
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