TWI490362B - Window having self-cleaning of the vapor deposition apparatus - Google Patents
Window having self-cleaning of the vapor deposition apparatus Download PDFInfo
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- TWI490362B TWI490362B TW102104271A TW102104271A TWI490362B TW I490362 B TWI490362 B TW I490362B TW 102104271 A TW102104271 A TW 102104271A TW 102104271 A TW102104271 A TW 102104271A TW I490362 B TWI490362 B TW I490362B
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Description
本發明與蒸鍍設備有關，特別是指一種具有自潔式視窗之蒸鍍設備。The invention relates to an evaporation apparatus, and in particular to an evaporation apparatus having a self-cleaning window.
簡單來說，所謂的真空鍍膜是將一待鍍物(例如基板)放到一真空腔體內，接著將一蒸鍍源(例如硒)加熱至汽化昇華的狀態，使蒸鍍源之氣體附著至待鍍物之表面而形成一層薄膜。Briefly, the so-called vacuum coating is to put a material to be plated (for example, a substrate) into a vacuum chamber, and then heat a vapor deposition source (for example, selenium) to a state of vaporization and sublimation, so that the vapor deposition source gas adheres to A film is formed on the surface of the object to be plated.
然而在整個製程中，操作人員通常需要等到製程結束將待鍍物從真空腔體內取出之後，才能夠進一步確認待鍍物的蒸鍍品質，對操作人員來說實在相當的耗費時間，為了方便操作人員在製程中進行觀察，有些真空腔體之表面會設置一透明視窗，但是某些蒸鍍源所產生的氣體會因為本身之氣體特性而沉積在透明視窗之內表面，以至於操作人員無法經由透明視窗觀察待鍍物的蒸鍍情形，如此同樣難以掌控待鍍物的蒸鍍品質。However, in the entire process, the operator usually needs to wait until the end of the process to remove the object to be plated from the vacuum chamber before further confirming the vapor deposition quality of the object to be plated, which is quite time consuming for the operator, for the convenience of operation. During the process of observation, some transparent chambers are provided with a transparent window, but the gas generated by some evaporation sources is deposited on the inner surface of the transparent window due to its own gas characteristics, so that the operator cannot The transparent window observes the evaporation of the object to be plated, and it is also difficult to control the evaporation quality of the object to be plated.
本發明之主要目的在於提供一種具有自潔式視窗之蒸鍍設備，其能方便操作人員隨時觀察待鍍物的鍍膜情形，以確實掌控待鍍物的鍍膜品質。The main object of the present invention is to provide an evaporation device having a self-cleaning window, which can facilitate the operator to observe the coating condition of the object to be plated at any time, so as to accurately control the coating quality of the object to be plated.
為了達成上述目的，本發明之蒸鍍設備包含有一腔 體、一支撐座、一透明視窗板，以及一加熱器。該腔體具有一內部腔室及一視窗口，該內部腔室用以容置一待鍍物，該視窗口貫穿該腔體之內、外壁面，使該內部腔室經由該視窗口與外界相通；該支撐座固定於該腔體之外壁面且具有一安裝槽，該安裝槽連通該腔體之視窗口；該透明視窗板固定於該支撐座之安裝槽且正對該腔體之視窗口，用以使光線能夠自外界穿透至該內部腔室；該加熱器設於透明視窗板，用以對該透明視窗板進行加熱，使加熱後之蒸鍍源所產生的氣體不會沉積在該透明視窗板之內表面，如此便能方便操作人員經由該透明視窗板觀察該待鍍物的蒸鍍情形。In order to achieve the above object, the vapor deposition apparatus of the present invention comprises a cavity Body, a support base, a transparent window panel, and a heater. The cavity has an internal chamber and a viewing window for accommodating a to-be-plated object. The viewing window extends through the inner and outer wall surfaces of the cavity, so that the internal chamber passes through the viewing window and the outside. The support base is fixed to the outer wall surface of the cavity and has a mounting groove, the mounting groove communicates with the viewing window of the cavity; the transparent window plate is fixed to the mounting groove of the support seat and is facing the cavity a window for allowing light to penetrate from the outside to the internal chamber; the heater is disposed on the transparent window plate for heating the transparent window plate so that gas generated by the heated evaporation source is not deposited On the inner surface of the transparent window panel, it is convenient for the operator to observe the evaporation condition of the object to be plated through the transparent window panel.
較佳地，本發明之蒸鍍設備更具有一壓板及一隔熱材，該壓板位於該加熱器的上方，該隔熱材設於該壓板與該加熱器之間，如此即可提高加熱效果。Preferably, the vapor deposition apparatus of the present invention further has a pressing plate and a heat insulating material, the pressing plate is located above the heater, and the heat insulating material is disposed between the pressing plate and the heater, so that the heating effect can be improved. .
較佳地，本發明之蒸鍍設備更具有一密封圈，該密封圈設於該腔體與該支撐座之間，用以確保該內部腔室處於密閉的狀態。Preferably, the vapor deposition apparatus of the present invention further has a sealing ring disposed between the cavity and the support base to ensure that the internal chamber is in a sealed state.
為了詳細說明本發明之結構、特徵及功效所在，茲列舉一較佳實施例並配合下列圖式說明如後。For a detailed description of the structure, features, and advantages of the present invention, a preferred embodiment is illustrated and described in conjunction with the following drawings.
請參閱第一及二圖，為本發明一較佳實施例所提供之蒸鍍設備10，包含有一腔體20、一支撐座30、一透明視窗板40，以及一加熱器50。Referring to FIGS. 1 and 2, an evaporation apparatus 10 according to a preferred embodiment of the present invention includes a cavity 20, a support base 30, a transparent window panel 40, and a heater 50.
腔體20具有一內部腔室21，用以供一待鍍物(圖中未示)進行真空鍍膜製程。腔體20具有一視窗口22，視窗口22貫穿腔體20之內、外壁面，使內部腔室21能夠經由視窗口22與外界相通。The cavity 20 has an internal chamber 21 for performing a vacuum coating process on a material to be plated (not shown). The cavity 20 has a viewing window 22 that extends through the inner and outer wall surfaces of the cavity 20 to enable the interior chamber 21 to communicate with the outside via the viewing window 22.
支撐座30之外周緣藉由一對固定片34固定於腔體20之外壁面，且支撐座30之中央具有一安裝槽32，安裝槽32連通腔體20之視窗口22。The outer periphery of the support base 30 is fixed to the outer wall surface of the cavity 20 by a pair of fixing pieces 34, and the support base 30 has a mounting groove 32 at the center thereof, and the mounting groove 32 communicates with the viewing window 22 of the cavity 20.
透明視窗板40設置於支撐座30之安裝槽32內，並以焊接方式與支撐座30固定在一起，使透明視窗板40正對於腔體20之視窗口22。The transparent window panel 40 is disposed in the mounting groove 32 of the support base 30 and is fixed to the support base 30 by welding so that the transparent window panel 40 faces the viewing window 22 of the cavity 20.
加熱器50貼設於透明視窗板40之外表面，用以對透明視窗板40進行加熱。The heater 50 is attached to the outer surface of the transparent window panel 40 for heating the transparent window panel 40.
在此需要補充說明的是，腔體20與支撐座30之間可以設置由耐高溫材料所製成之一密封圈60，用以確保腔體20之內部腔室21處於真空密閉的狀態。此外，支撐座30的頂面可以設置一壓板52，壓板52及加熱器50之間再設置一隔熱材54，如此便能藉由壓板52的壓力及隔熱材54之隔熱功能而提高加熱器50對透明視窗板40的加熱效果，然而為了能夠承受加熱器50所產生的高溫，支撐座30需要選用耐高溫材料，其中以金屬為最佳材質。It should be additionally noted that a sealing ring 60 made of a refractory material may be disposed between the cavity 20 and the support base 30 to ensure that the internal chamber 21 of the cavity 20 is in a vacuum sealed state. In addition, a pressure plate 52 may be disposed on the top surface of the support base 30, and a heat insulating material 54 is disposed between the pressure plate 52 and the heater 50, so that the pressure of the pressure plate 52 and the heat insulation function of the heat insulating material 54 can be improved. The heating effect of the heater 50 on the transparent window panel 40, however, in order to withstand the high temperature generated by the heater 50, the support base 30 needs to be made of a high temperature resistant material, wherein metal is the best material.
綜上所陳，當開始對待鍍物進行真空鍍膜製程時，加熱後之蒸鍍源(例如硒)所產生之氣體會逐漸附著於待鍍物之表面，此時的加熱器50會將透明視窗板40之溫度加熱至高於蒸鍍源之熔點，以阻止蒸鍍源之氣體沉積在透明 視窗板40之內表面，使得光線能夠順利經由透明視窗板40穿透至腔體20之內部腔室21，換言之，操作人員可以藉由透明視窗板40隨時觀察待鍍物於內部腔室21的蒸鍍情形，甚至可以配合使用各種適合在蒸鍍環境下操作之光學偵測器，例如紅外線測溫儀或光學定位器，以便掌控待鍍物的鍍膜品質而達到本發明之目的。In summary, when the vacuum coating process is started on the plating material, the gas generated by the heated evaporation source (such as selenium) gradually adheres to the surface of the object to be plated, and the heater 50 at this time will have a transparent window. The temperature of the plate 40 is heated to be higher than the melting point of the evaporation source to prevent the vapor deposition source from being deposited in the transparent The inner surface of the window plate 40 allows light to smoothly penetrate through the transparent window plate 40 to the inner chamber 21 of the cavity 20, in other words, the operator can observe the object to be plated in the inner chamber 21 at any time by the transparent window plate 40. In the case of vapor deposition, it is even possible to use various optical detectors suitable for operation in an evaporation environment, such as an infrared thermometer or an optical positioner, in order to control the coating quality of the object to be plated for the purpose of the present invention.
最後，本發明於前揭實施例中所揭露的構成元件，僅為舉例說明，並非用來限制本案之範圍，其他等效元件的替代或變化，亦應為本案之申請專利範圍所涵蓋。Finally, the constituent elements disclosed in the foregoing embodiments are merely illustrative and are not intended to limit the scope of the present invention. The alternative or variations of other equivalent elements are also covered by the scope of the patent application.
10‧‧‧蒸鍍設備10‧‧‧vapor deposition equipment
20‧‧‧腔體20‧‧‧ cavity
21‧‧‧內部腔室21‧‧‧Internal chamber
22‧‧‧視窗口22‧‧ ‧ view window
30‧‧‧支撐座30‧‧‧ support
32‧‧‧安裝槽32‧‧‧Installation slot
34‧‧‧固定片34‧‧‧Fixed tablets
40‧‧‧透明視窗板40‧‧‧Transparent window board
50‧‧‧加熱器50‧‧‧heater
52‧‧‧壓板52‧‧‧ pressure plate
54‧‧‧隔熱材54‧‧‧Insulation
60‧‧‧密封圈60‧‧‧ sealing ring
第一圖為本發明一較佳實施例之剖面示意圖。The first figure is a schematic cross-sectional view of a preferred embodiment of the invention.
第二圖為本發明一較佳實施例之俯視示意圖。The second figure is a top plan view of a preferred embodiment of the invention.
10‧‧‧蒸鍍設備10‧‧‧vapor deposition equipment
20‧‧‧腔體20‧‧‧ cavity
21‧‧‧內部腔室21‧‧‧Internal chamber
22‧‧‧視窗口22‧‧ ‧ view window
30‧‧‧支撐座30‧‧‧ support
32‧‧‧安裝槽32‧‧‧Installation slot
34‧‧‧固定片34‧‧‧Fixed tablets
40‧‧‧透明視窗板40‧‧‧Transparent window board
50‧‧‧加熱器50‧‧‧heater
52‧‧‧壓板52‧‧‧ pressure plate
54‧‧‧隔熱材54‧‧‧Insulation
60‧‧‧密封圈60‧‧‧ sealing ring
Claims (4)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW102104271A TWI490362B (en) | 2013-02-04 | 2013-02-04 | Window having self-cleaning of the vapor deposition apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW102104271A TWI490362B (en) | 2013-02-04 | 2013-02-04 | Window having self-cleaning of the vapor deposition apparatus |
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| Publication Number | Publication Date |
|---|---|
| TW201432082A TW201432082A (en) | 2014-08-16 |
| TWI490362B true TWI490362B (en) | 2015-07-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW102104271A TWI490362B (en) | 2013-02-04 | 2013-02-04 | Window having self-cleaning of the vapor deposition apparatus |
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| Country | Link |
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| CN109269534A (en) * | 2018-10-30 | 2019-01-25 | 中山瑞科新能源有限公司 | A kind of Photoelectric Sensor Device and vacuum coating equipment |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0252667B1 (en) * | 1986-06-30 | 1996-03-27 | Nihon Sinku Gijutsu Kabushiki Kaisha | Chemical vapour deposition methods |
| US5556472A (en) * | 1991-12-09 | 1996-09-17 | Sumitomo Electric Industries, Ltd | Film deposition apparatus |
| WO2003087431A2 (en) * | 2002-04-11 | 2003-10-23 | Micron Technology, Inc. | Deposition methods utilizing phased array microwave excitation, and deposition apparatuses |
| US20040163600A1 (en) * | 2002-11-30 | 2004-08-26 | Uwe Hoffmann | Vapor deposition device |
| TWI280986B (en) * | 2004-04-30 | 2007-05-11 | Hon Hai Prec Ind Co Ltd | Vacuum vapor deposition apparatus |
| US20080254230A1 (en) * | 2006-08-23 | 2008-10-16 | Kabushiki Kaisha Toshiba | Particle deposition apparatus and particle deposition method |
| TWM347406U (en) * | 2008-08-08 | 2008-12-21 | Lai ying fang | Film deposition equipment of ferrite thermal evaporation |
| TW200904998A (en) * | 2007-02-28 | 2009-02-01 | Ulvac Inc | Deposition source, deposition apparatus, and forming method of organic film |
| TW201016868A (en) * | 2008-10-17 | 2010-05-01 | Hon Hai Prec Ind Co Ltd | Film coating device |
-
2013
- 2013-02-04 TW TW102104271A patent/TWI490362B/en not_active IP Right Cessation
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0252667B1 (en) * | 1986-06-30 | 1996-03-27 | Nihon Sinku Gijutsu Kabushiki Kaisha | Chemical vapour deposition methods |
| US5556472A (en) * | 1991-12-09 | 1996-09-17 | Sumitomo Electric Industries, Ltd | Film deposition apparatus |
| WO2003087431A2 (en) * | 2002-04-11 | 2003-10-23 | Micron Technology, Inc. | Deposition methods utilizing phased array microwave excitation, and deposition apparatuses |
| US20040163600A1 (en) * | 2002-11-30 | 2004-08-26 | Uwe Hoffmann | Vapor deposition device |
| TWI297735B (en) * | 2002-11-30 | 2008-06-11 | Applied Materials Gmbh & Co Kg | Vapor-deposition device |
| TWI280986B (en) * | 2004-04-30 | 2007-05-11 | Hon Hai Prec Ind Co Ltd | Vacuum vapor deposition apparatus |
| US20080254230A1 (en) * | 2006-08-23 | 2008-10-16 | Kabushiki Kaisha Toshiba | Particle deposition apparatus and particle deposition method |
| TW200904998A (en) * | 2007-02-28 | 2009-02-01 | Ulvac Inc | Deposition source, deposition apparatus, and forming method of organic film |
| TWM347406U (en) * | 2008-08-08 | 2008-12-21 | Lai ying fang | Film deposition equipment of ferrite thermal evaporation |
| TW201016868A (en) * | 2008-10-17 | 2010-05-01 | Hon Hai Prec Ind Co Ltd | Film coating device |
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| Publication number | Publication date |
|---|---|
| TW201432082A (en) | 2014-08-16 |
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