TWI488237B - - Google Patents
Info
- Publication number
- TWI488237B TWI488237B TW101143726A TW101143726A TWI488237B TW I488237 B TWI488237 B TW I488237B TW 101143726 A TW101143726 A TW 101143726A TW 101143726 A TW101143726 A TW 101143726A TW I488237 B TWI488237 B TW I488237B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110448622.7A CN103187232B (zh) | 2011-12-28 | 2011-12-28 | 一种减少晶片背面生成聚合物的聚焦环 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201332013A TW201332013A (zh) | 2013-08-01 |
| TWI488237B true TWI488237B (enExample) | 2015-06-11 |
Family
ID=48678343
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101143726A TW201332013A (zh) | 2011-12-28 | 2012-11-22 | 一種減少晶片背面生成聚合物的聚焦環 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103187232B (enExample) |
| TW (1) | TW201332013A (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102136790B1 (ko) * | 2013-11-15 | 2020-07-23 | 삼성디스플레이 주식회사 | 플렉서블 디스플레이 장치와, 이의 제조 방법 |
| CN104008946B (zh) * | 2014-06-12 | 2016-09-07 | 上海华力微电子有限公司 | 铝刻蚀工艺用聚焦环、铝刻蚀工艺 |
| CN109423606A (zh) * | 2017-08-24 | 2019-03-05 | 中微半导体设备(上海)有限公司 | 聚焦环及其耐腐蚀防护方法 |
| JP7370228B2 (ja) * | 2019-11-22 | 2023-10-27 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| CN113097038B (zh) * | 2021-02-25 | 2022-07-15 | 长江存储科技有限责任公司 | 刻蚀装置 |
| US20250357171A1 (en) * | 2022-06-08 | 2025-11-20 | Lam Research Corporation | Chucking system with silane coupling agent |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200416801A (en) * | 2003-01-07 | 2004-09-01 | Tokyo Electron Ltd | Plasma processing apparatus and focus ring |
| TW200829720A (en) * | 2006-10-06 | 2008-07-16 | Asahi Tech Co Ltd | Corrosion-resisting member and method for making the same |
| US20110126984A1 (en) * | 2009-12-01 | 2011-06-02 | Lam Research Corporation | Edge ring assembly for plasma etching chambers |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6464843B1 (en) * | 1998-03-31 | 2002-10-15 | Lam Research Corporation | Contamination controlling method and apparatus for a plasma processing chamber |
| US20070032081A1 (en) * | 2005-08-08 | 2007-02-08 | Jeremy Chang | Edge ring assembly with dielectric spacer ring |
| CN101552182B (zh) * | 2008-03-31 | 2010-11-03 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种用于半导体制造工艺中的边缘环机构 |
-
2011
- 2011-12-28 CN CN201110448622.7A patent/CN103187232B/zh active Active
-
2012
- 2012-11-22 TW TW101143726A patent/TW201332013A/zh unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200416801A (en) * | 2003-01-07 | 2004-09-01 | Tokyo Electron Ltd | Plasma processing apparatus and focus ring |
| TW200829720A (en) * | 2006-10-06 | 2008-07-16 | Asahi Tech Co Ltd | Corrosion-resisting member and method for making the same |
| US20110126984A1 (en) * | 2009-12-01 | 2011-06-02 | Lam Research Corporation | Edge ring assembly for plasma etching chambers |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201332013A (zh) | 2013-08-01 |
| CN103187232A (zh) | 2013-07-03 |
| CN103187232B (zh) | 2015-09-16 |