TWI485513B - A photohardenable composition and a hardened product thereof - Google Patents

A photohardenable composition and a hardened product thereof Download PDF

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TWI485513B
TWI485513B TW103122265A TW103122265A TWI485513B TW I485513 B TWI485513 B TW I485513B TW 103122265 A TW103122265 A TW 103122265A TW 103122265 A TW103122265 A TW 103122265A TW I485513 B TWI485513 B TW I485513B
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photopolymerization initiator
photocurable composition
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resin
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TW201504755A (en
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Masato Yoshida
Akio Norikoshi
Shinobu Kondo
Shigeru Matsumoto
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Taiyo Ink Mfg Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • H05K3/287Photosensitive compositions

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  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
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  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)

Description

光硬化性組成物及其硬化物Photocurable composition and cured product thereof

本發明為關於光硬化性組成物及其硬化物。The present invention relates to a photocurable composition and a cured product thereof.

包含將光聚合起始劑作為成分,且藉由照射紫外線等之活性能量線而硬化之光硬化性組成物,因為具有速硬化性優越等優點,故被利用於塗料、樹脂絕緣層、阻焊劑、電極形成用糊膏等之廣泛的領域中(例如,專利文獻1、2)。A photocurable composition containing a photopolymerization initiator as a component and hardened by irradiation with an active energy ray such as ultraviolet rays is used for a coating material, a resin insulating layer, and a solder resist because it has advantages such as excellent rapid curing property. A wide range of fields such as pastes for electrode formation (for example, Patent Documents 1 and 2).

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1]日本特開2000-214584號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2000-214584

[專利文獻2]日本特開2001-075281號公報[Patent Document 2] Japanese Patent Laid-Open Publication No. 2001-075281

近年,就生產性或作業性等之觀點而言,更 進而要求光硬化性組成物之硬化性的改良。將例如消耗電力或運轉成本之降低等作為目的,替代以往的UV燈,而使用LED-UV燈作為光源之硬化方法為備受矚目。然而,由於來自於該光源所照射之光為長波長,故硬化能為低,與使用以往的UV燈之情形相比較時,無法充分地使光硬化性組成物硬化。In recent years, in terms of productivity or workability, etc. Further, improvement in the hardenability of the photocurable composition is required. For the purpose of, for example, reduction in power consumption and running cost, etc., a conventional method of using an LED-UV lamp as a light source has been attracting attention. However, since the light emitted from the light source has a long wavelength, the hardening energy is low, and when compared with the case of using a conventional UV lamp, the photocurable composition cannot be sufficiently cured.

因此,本發明之目的係提供硬化性優越之光硬化性組成物、及將此者硬化而成之硬化物。Therefore, an object of the present invention is to provide a photocurable composition excellent in curability and a cured product obtained by curing the same.

本發明團隊有鑑於上述課題並經深入研究的結果,發現藉由使用組合特定的光聚合起始劑能夠解決上述課題,進而完成本發明。In view of the above problems and intensive studies, the present inventors have found that the above problems can be solved by using a combination of a specific photopolymerization initiator, and the present invention has been completed.

即,本發明之印刷配線板用光硬化性組成物,其特徵係含有選自由肟酯系光聚合起始劑、烷基苯酮系光聚合起始劑、醯基膦氧化物系光聚合起始劑、及二茂鈦系光聚合起始劑所成之群之至少1種的光聚合起始劑,與下述一般式(I)所示的光聚合起始劑; (式中,R係表示下述式(II)所示之構造,l1 係表示2~4之整數,m1 係表示1以上之整數)In other words, the photocurable composition for a printed wiring board of the present invention contains a photopolymerization initiator selected from the group consisting of an oxime ester photopolymerization initiator, an alkylphenone photopolymerization initiator, and a mercaptophosphine oxide. a photopolymerization initiator of at least one of the group of the initiator and the titanocene photopolymerization initiator; and a photopolymerization initiator represented by the following general formula (I); (In the formula, R represents a structure represented by the following formula (II), and l 1 represents an integer of 2 to 4, and m 1 represents an integer of 1 or more)

本發明之印刷配線板用光硬化性組成物係以進而含有感光性(甲基)丙烯酸酯化合物為較佳。The photocurable composition for a printed wiring board of the present invention preferably further contains a photosensitive (meth) acrylate compound.

本發明之印刷配線板用光硬化性組成物係以進而含有有機黏結劑為較佳。It is preferable that the photocurable composition for a printed wiring board of the present invention further contains an organic binder.

本發明之硬化物,其特徵係將前述印刷配線板用光硬化性組成物硬化而成。The cured product of the present invention is characterized in that the printed wiring board is cured with a photocurable composition.

依據本發明,可提供硬化性優越光硬化性組成物、及將此者硬化而成之硬化物。According to the invention, it is possible to provide a curable superior photocurable composition and a cured product obtained by curing the same.

[圖1]係表示將用於參考例之光聚合起始劑藉由示差熱-熱重量同時測定(TG/DTA測定)所得到的加熱減量曲線的圖譜。橫軸係表示溫度(Cel:攝氏溫度),縱軸係表示熱重量之減少比例(%)。Fig. 1 is a graph showing a heating decrement curve obtained by simultaneous measurement of differential photothermal-thermal weight (TG/DTA measurement) of a photopolymerization initiator used in Reference Example. The horizontal axis represents the temperature (Cel: Celsius temperature), and the vertical axis represents the reduction ratio (%) of the thermal weight.

[實施發明之的最佳形態][Best Mode for Carrying Out the Invention]

以下,對於本發明之光硬化性組成物來詳細地說明。Hereinafter, the photocurable composition of the present invention will be described in detail.

[光聚合起始劑][Photopolymerization initiator]

本發明之光硬化性組成物,其係含有選自由肟酯系光聚合起始劑、烷基苯酮系光聚合起始劑、醯基膦氧化物系光聚合起始劑、及二茂鈦系光聚合起始劑所成之群之至少1種的光聚合起始劑。The photocurable composition of the present invention contains a photopolymerization initiator selected from the group consisting of an oxime ester photopolymerization initiator, an alkylphenone photopolymerization initiator, a mercaptophosphine oxide photopolymerization initiator, and titanocene A photopolymerization initiator which is at least one selected from the group consisting of photopolymerization initiators.

作為肟酯系光聚合起始劑,可舉例作為市售品之BASF Japan公司製的CGI-325、Irgacure OXE01、Irgacure OXE02、ADEKA公司製的N-1919等。As the oxime ester photopolymerization initiator, CGI-325, Irgacure OXE01, Irgacure OXE02, manufactured by BASF Japan Co., Ltd., N-1919 manufactured by ADEKA Co., Ltd., and the like can be exemplified.

又,亦可適合使用分子內具有2個肟酯基之光聚合起始劑,具體而言,可舉例具有下述一般式(2)所示的咔唑構造之肟酯化合物。In addition, a photopolymerization initiator having two oxime ester groups in the molecule can be suitably used. Specifically, an oxime ester compound having the carbazole structure represented by the following general formula (2) can be exemplified.

(式中,X係表示氫原子、碳數1~17之烷基、碳數1~8之烷氧基、苯基、苯基(其係藉由具有碳數1~17之烷基、碳數1~8之烷氧基、胺基、碳數1~8之烷基之烷基胺基或二烷基胺基所取代者)、萘基(其係藉由具有碳數1~17之烷基、碳數1~8之烷氧基、胺基、碳數1~8之烷基之烷基胺基或二烷基胺基所取代者);Y、Z係分別表示為氫原子、碳數1~17之烷基、碳數1~8之烷氧基、鹵素基、苯基、苯基(其係藉由具有碳數1~17之烷基、碳數1~8之烷氧基、胺基、碳數1~8之烷基之烷基胺基或二烷基胺基所取代者)、萘基(其係藉由具有碳數1~17之 烷基、碳數1~8之烷氧基、胺基、碳數1~8之烷基之烷基胺基或二烷基胺基所取代者)、蒽基、吡啶基、苯并呋喃基、苯并噻吩基;Ar係表示碳數1~10之伸烷基、伸乙烯基、伸苯基、伸聯苯基、伸吡啶基、伸萘基、噻吩基、伸蒽基、伸噻吩基、伸呋喃基、2,5-吡咯-二基、4,4’-茋-二基、4,2’-苯乙烯-二基;n係0或1之整數)。 (wherein X represents a hydrogen atom, an alkyl group having 1 to 17 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, a phenyl group, or a phenyl group (which is an alkyl group having a carbon number of 1 to 17 and carbon) a group of 1 to 8 alkoxy groups, an amine group, an alkylamino group having a carbon number of 1 to 8 or a dialkylamino group, and a naphthyl group (having a carbon number of 1 to 17) An alkyl group, an alkoxy group having 1 to 8 carbon atoms, an amine group, an alkylamino group having a carbon number of 1 to 8 or a dialkylamino group; wherein Y and Z are each represented as a hydrogen atom; An alkyl group having 1 to 17 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, a halogen group, a phenyl group, and a phenyl group (having an alkyl group having 1 to 17 carbon atoms and an alkoxy group having 1 to 8 carbon atoms) a group, an amine group, an alkylamino group having a carbon number of 1 to 8 or a dialkylamino group, or a naphthyl group (having an alkyl group having a carbon number of 1 to 17 and a carbon number of 1~) Alkoxy, alkoxy, alkylamino or dialkylamino group of a C 1-8 alkyl group, fluorenyl, pyridyl, benzofuranyl, benzothienyl; Ar Is an alkylene group having a carbon number of 1 to 10, a vinyl group, a phenyl group, a phenyl group, a pyridine group, a naphthyl group, a thienyl group, a thiol group, a thienyl group, a furyl group, and 2, 5-pyridyl R-diyl, 4,4'-fluorene-diyl, 4,2'-styrene-diyl; n is an integer of 0 or 1.)

特別是上述式中,以X、Y分別為甲基或乙基,Z為甲基或苯基,n為0,Ar為伸苯基、伸萘基、噻吩基或伸噻吩基之肟酯系光聚合起始劑為較佳。In particular, in the above formula, X and Y are each a methyl group or an ethyl group, Z is a methyl group or a phenyl group, n is 0, and Ar is an oxime ester group of a stretching phenyl group, a stretching naphthyl group, a thienyl group or a thienyl group. A photopolymerization initiator is preferred.

肟酯系光聚合起始劑係可單獨使用1種,亦可組合2種以上來使用。使用肟酯系光聚合起始劑時之調合量,以固形分換算,於光硬化性組成物中較佳為0.1~25質量%,又較佳為5~15質量%。若為25質量%以下時,塗膜形成將為良好。又,若為0.1質量%以上時,可得到充分的光硬化性,且圖型形成性將為良好。The oxime ester photopolymerization initiator may be used singly or in combination of two or more. The blending amount in the case of using the oxime ester photopolymerization initiator is preferably from 0.1 to 25% by mass, and more preferably from 5 to 15% by mass, based on the solid content of the photocurable composition. When it is 25% by mass or less, the coating film formation will be good. Moreover, when it is 0.1 mass % or more, sufficient photocurability can be obtained, and pattern formation property will be favorable.

作為烷基苯酮系光聚合起始劑,可舉例如2,2-二甲氧基-1,2-二苯基乙烷-1-酮等之苄基二甲基縮酮系光聚合起始劑;1-羥基-環己烷-苯基-酮、2-羥基-2-甲基-1-苯基-丙烷-1-酮、1-[4-(2-羥基乙氧基)-苯基]-2-羥基-2-甲基-1-丙烷-1-酮、2-羥基-1-{4-[4-(2-羥基-2-甲基-丙醯基)-苄基]苯基}-2-甲基-丙烷-1-酮等之α-羥基烷基苯酮系光聚合起始劑;2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙酮-1,2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁烷-1-酮、2-(二甲基胺基)-2-[(4-甲基苯基)甲基]-1-[4- (4-嗎咻基)苯基]-1-丁酮、N,N-二甲基胺基苯乙酮等之α-胺基苯乙酮系光聚合起始劑。作為苄基二甲基縮酮系光聚合起始劑之市售品,可舉例BASF Japan公司製的Irgacure 651等。作為α-羥基烷基苯酮系光聚合起始劑之市售品,可舉例BASF Japan公司製的Irgacure 184、Darocur 1173、Irgacure 2959、Irgacure 127等。作為α-胺基苯乙酮系光聚合起始劑之市售品,可舉例BASF Japan公司製的Irgacure 907、Irgacure 369、Irgacure 379等。The alkylphenone-based photopolymerization initiator may, for example, be a benzyldimethylketal photopolymerization such as 2,2-dimethoxy-1,2-diphenylethane-1-one. Starting agent; 1-hydroxy-cyclohexane-phenyl-ketone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, 1-[4-(2-hydroxyethoxy)- Phenyl]-2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1-{4-[4-(2-hydroxy-2-methyl-propenyl)-benzyl Α-hydroxyalkylphenone photopolymerization initiator such as phenyl}-2-methyl-propan-1-one; 2-methyl-1-[4-(methylthio)phenyl]- 2-morpholinylacetone-1,2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butan-1-one, 2-(dimethylamino) -2-[(4-methylphenyl)methyl]-1-[4- An α-aminoacetophenone photopolymerization initiator such as (4-m-decyl)phenyl]-1-butanone or N,N-dimethylaminoacetophenone. As a commercial item of the benzyl dimethyl ketal-based photopolymerization initiator, Irgacure 651 manufactured by BASF Japan Co., Ltd., etc. can be mentioned. As a commercial item of the α-hydroxyalkylphenone-based photopolymerization initiator, Irgacure 184, Darocur 1173, Irgacure 2959, Irgacure 127, etc., manufactured by BASF Japan Co., Ltd., may be mentioned. As a commercial item of the α-amino acetophenone-based photopolymerization initiator, Irgacure 907, Irgacure 369, Irgacure 379, etc. by BASF Japan Co., Ltd. are mentioned.

作為醯基膦氧化物系光聚合起始劑,可舉例如2,4,6-三甲基苯甲醯基二苯基膦氧化物、雙(2,4,6-三甲基苯甲醯基)-苯基膦氧化物、雙(2,6-二甲氧基苯甲醯基)-2,4,4-三甲基-戊基膦氧化物等。作為市售品,可舉例BASF Japan公司製的Lucirin TPO、Irgacure 819等。The mercaptophosphine oxide photopolymerization initiator may, for example, be 2,4,6-trimethylbenzimidyldiphenylphosphine oxide or bis(2,4,6-trimethylbenzhydrazide). Phenylphosphine oxide, bis(2,6-dimethoxybenzylidene)-2,4,4-trimethyl-pentylphosphine oxide, and the like. As a commercial item, Lucirin TPO, Irgacure 819, etc. by BASF Japan company are mentioned.

作為二茂鈦系光聚合起始劑,可舉例雙(環戊二烯基)-二-苯基-鈦、雙(環戊二烯基)-二-氯-鈦、雙(環戊二烯基)-雙(2,3,4,5,6五氟苯基)鈦、雙(環戊二烯基)-雙(2,6-二氟-3-(吡咯-1-基)苯基)鈦等。作為市售品,可舉例BASF Japan公司製的Irgacure 784等。As the titanocene-based photopolymerization initiator, bis(cyclopentadienyl)-di-phenyl-titanium, bis(cyclopentadienyl)-di-chloro-titanium, bis(cyclopentadiene) can be exemplified. Bis(2,3,4,5,6 pentafluorophenyl)titanium, bis(cyclopentadienyl)-bis(2,6-difluoro-3-(pyrrol-1-yl)phenyl ) Titanium, etc. As a commercial item, Irgacure 784 by BASF Japan company, etc. are mentioned.

烷基苯酮系光聚合起始劑、醯基膦氧化物系光聚合起始劑及二茂鈦系光聚合起始劑,可各自單獨使用1種,亦可組合2種以上來使用。使用前述各光聚合起始劑時之調合量,以固形分換算,於光硬化性組成物中較佳 為2~25質量%,又較佳為5~15質量%。若為25質量%以下之情形時,塗膜形成將為良好。又,若為2質量%以上時,可得到充分的光硬化性、且圖型形成性亦為優越。The alkylphenone-based photopolymerization initiator, the mercaptophosphine oxide-based photopolymerization initiator, and the titanocene-based photopolymerization initiator may be used singly or in combination of two or more. The blending amount in the case of using each of the above photopolymerization initiators is preferably in a photocurable composition in terms of solid content. It is 2 to 25% by mass, and preferably 5 to 15% by mass. When it is 25% by mass or less, the coating film formation will be good. In addition, when it is 2% by mass or more, sufficient photocurability is obtained and pattern formability is also excellent.

又,本發明之光硬化性組成物係含有下述一般式(I)所示的光聚合起始劑。Further, the photocurable composition of the present invention contains the photopolymerization initiator represented by the following general formula (I).

(式中,R係表示下述式(II)所示之構造,l1 係表示2~4之整數,m1 係表示1以上之整數) (In the formula, R represents a structure represented by the following formula (II), and l 1 represents an integer of 2 to 4, and m 1 represents an integer of 1 or more)

上述一般式(I)中之l1 係較佳為2或4;m1 係較佳為1~5,又較佳為1~3,特佳為1。The l 1 in the above general formula (I) is preferably 2 or 4; the m 1 is preferably 1 to 5, more preferably 1 to 3, and particularly preferably 1.

上述一般式(I)所示的光聚合起始劑係以在室溫下呈液狀為較佳。於此,所謂在室溫下呈液狀,係指在10~40℃之任何的溫度下,於內徑30mm的試管中加入樣品至高度55mm處並將試管呈水平時,自底部通過到85mm的部分為90秒以內之狀態。The photopolymerization initiator represented by the above general formula (I) is preferably liquid at room temperature. Here, the term "liquid at room temperature" means that a sample is added to a test tube having an inner diameter of 30 mm to a height of 55 mm at any temperature of 10 to 40 ° C, and the test tube is horizontally passed from the bottom to 85 mm. The part is within 90 seconds.

上述一般式(I)所示的光聚合起始劑係以5%減量溫度為260℃以上為較佳。又,作為上限係較佳為500℃以下。於本說明書中,所謂5%減量溫度係指於藉由示差熱-熱重量同時測定(TG/DTA測定)所得到的加熱減量曲線中,熱重量為減少5%時之溫度(測定條件:10℃/分鐘)。The photopolymerization initiator represented by the above general formula (I) is preferably a 5% reduction temperature of 260 ° C or higher. Further, the upper limit is preferably 500 ° C or lower. In the present specification, the 5% reduction temperature refers to a temperature at which the thermal weight is reduced by 5% in the heating loss curve obtained by simultaneous measurement of differential heat-heat weight (TG/DTA measurement) (measurement condition: 10 °C/min).

作為上述一般式(I)所示的光聚合起始劑之例,可舉例羧基甲氧基噻吨酮與聚四亞甲基二醇250之二酯等。As an example of the photopolymerization initiator represented by the above general formula (I), a diester of carboxymethoxythioxanthone and polytetramethylene glycol 250 can be exemplified.

記載上述一般式(I)所示的光聚合起始劑之具體例之化學式。但,本發明並不因以下之化合物而受限制。The chemical formula of a specific example of the photopolymerization initiator represented by the above general formula (I) is described. However, the present invention is not limited by the following compounds.

(式中,n係表示1以上之整數)。 (wherein n represents an integer of 1 or more).

作為上述一般式(I)所示的光聚合起始劑之市售品之例,可舉例IHT公司製的Omnipol TX等。As an example of a commercial product of the photopolymerization initiator represented by the above general formula (I), Omnipol TX manufactured by IHT Co., Ltd., or the like can be exemplified.

上述一般式(I)所示的光聚合起始劑係可單獨使用1種,亦可組合2種以上來使用。上述一般式(I)所示的光聚合起始劑之調合量,以固形分換算,於光硬化性組成物中較佳為0.01~15質量%,又較佳為0.1~15質量%。若為15質量%以下時,塗膜形成將為容易。又,若為0.01質量%以上時,可得到充分的光硬化性,且圖型形成性將為良好。The photopolymerization initiators of the above formula (I) may be used singly or in combination of two or more. The blending amount of the photopolymerization initiator represented by the above formula (I) is preferably from 0.01 to 15% by mass, and more preferably from 0.1 to 15% by mass, based on the solid content of the photocurable composition. When it is 15 mass% or less, formation of a coating film will become easy. In addition, when it is 0.01% by mass or more, sufficient photocurability can be obtained, and pattern formability will be good.

(感光性(甲基)丙烯酸酯化合物)(Photosensitive (meth) acrylate compound)

本發明之光硬化性組成物係以進而含有感光性(甲基)丙烯酸酯化合物為較佳。感光性(甲基)丙烯酸酯化合物係經由活性能量線照射而進行光硬化後,有助於使上述含羧基的樹脂不溶化、或不溶化於鹼水溶液中。感光性 (甲基)丙烯酸酯化合物亦可使用作為光硬化性組成物之稀釋劑。The photocurable composition of the present invention preferably further contains a photosensitive (meth) acrylate compound. After the photosensitive (meth) acrylate compound is photocured by irradiation with an active energy ray, it contributes to insolubilizing or insolubilizing the carboxyl group-containing resin in an aqueous alkali solution. Sensitivity As the (meth) acrylate compound, a diluent which is a photocurable composition can also be used.

可使用作為上述感光性(甲基)丙烯酸酯化合物之化合物方面,可舉例如慣用習知聚酯(甲基)丙烯酸酯、聚醚(甲基)丙烯酸酯、胺基甲酸酯(甲基)丙烯酸酯、碳酸酯(甲基)丙烯酸酯、環氧(甲基)丙烯酸酯等。具體而言,可舉例如2-羥基乙基丙烯酸酯、2-羥基丙基丙烯酸酯、2-羥基甲基丙烯酸酯等之羥基烷基(甲基)丙烯酸酯類;乙二醇、甲氧基四乙二醇、聚乙二醇、丙二醇、二乙二醇等之二醇的二丙烯酸酯類;N,N-二甲基丙烯醯胺、N-羥甲基丙烯醯胺、N,N-二甲基胺基丙基丙烯醯胺等之丙烯醯胺類;N,N-二甲基胺基乙基丙烯酸酯、N,N-二甲基胺基丙基丙烯酸酯等之胺基烷基丙烯酸酯類;己二醇、三羥甲基丙烷、季戊四醇、二季戊四醇、參-羥基乙基異氰脲酸酯等之多元醇或此等的環氧乙烷加成物、環氧丙烷加成物、或ε-己內酯加成物等之多價丙烯酸酯類;苯氧基丙烯酸酯、雙酚A二丙烯酸酯、及此等的酚類的環氧乙烷加成物或環氧丙烷加成物等之多價丙烯酸酯類;甘油二縮水甘油醚、甘油三縮水甘油醚、三羥甲基丙烷三縮水甘油醚、異氰脲酸三縮水甘油酯等之縮水甘油醚的多價丙烯酸酯類;且不限於上述,將聚醚多醇、聚碳酸酯二醇、羥基末端聚丁二烯、聚醚多醇等之多元醇直接進行丙烯酸酯化、或藉由二異氰酸酯來進行胺基甲酸酯丙烯酸酯化之丙烯酸酯類及三聚氰胺丙烯酸酯、及對應上述丙烯酸 酯之各丙烯酸酯類之至少任何1種等。As the compound of the above-mentioned photosensitive (meth) acrylate compound, for example, conventional polyester (meth) acrylate, polyether (meth) acrylate, urethane (meth) acrylate may be used. , carbonate (meth) acrylate, epoxy (meth) acrylate, and the like. Specific examples thereof include hydroxyalkyl (meth) acrylates such as 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, and 2-hydroxy methacrylate; ethylene glycol and methoxy group; Diacrylates of diols such as tetraethylene glycol, polyethylene glycol, propylene glycol, diethylene glycol, etc.; N,N-dimethyl decylamine, N-methylol acrylamide, N,N- Acrylamines such as dimethylaminopropyl acrylamide; aminoalkyl groups such as N,N-dimethylaminoethyl acrylate and N,N-dimethylaminopropyl acrylate Acrylates; polyhydric alcohols such as hexanediol, trimethylolpropane, pentaerythritol, dipentaerythritol, and para-hydroxyethyl isocyanurate or such ethylene oxide adducts, propylene oxide addition a polyvalent acrylate such as an ε-caprolactone adduct; a phenoxy acrylate, a bisphenol A diacrylate, and an oxirane ethylene oxide adduct of such a phenol or a propylene oxide Multivalent acrylates such as adducts; shrinkage of glycerol diglycidyl ether, glycerol triglycidyl ether, trimethylolpropane triglycidyl ether, triglycidyl isocyanurate, etc. a polyvalent acrylate of a glyceryl ether; and not limited to the above, a polyol such as a polyether polyol, a polycarbonate diol, a hydroxyl terminated polybutadiene, or a polyether polyol is directly acrylated or Diisocyanate for urethane acrylated acrylates and melamine acrylates, and corresponding acrylic acid At least any one of the acrylates of the ester, and the like.

再者,亦可將下述樹脂作為感光性單體來使用:使甲酚酚醛型環氧樹脂等之多官能環氧樹脂與丙烯酸反應而得到的環氧丙烯酸酯樹脂,或再將該環氧丙烯酸酯樹脂之羥基與季戊四醇三丙烯酸酯等之羥基丙烯酸酯和異佛酮二異氰酸酯等之二異氰酸酯之半胺基甲酸酯化合物反應而得到的環氧胺基甲酸酯丙烯酸酯化合物等。如此般的環氧丙烯酸酯系樹脂,不但不會使沾黏性(指觸乾燥性)降低,且可使硬化性提昇。Further, the following resin may be used as a photosensitive monomer: an epoxy acrylate resin obtained by reacting a polyfunctional epoxy resin such as a cresol novolac epoxy resin with acrylic acid, or the epoxy An epoxy urethane acrylate compound obtained by reacting a hydroxyl group of an acrylate resin with a hydroxy acrylate such as pentaerythritol triacrylate or a diisocyanate compound such as isophorone diisocyanate. Such an epoxy acrylate-based resin not only does not lower the tackiness (touch dryness), but also improves the hardenability.

特別是本發明中,係以多元醇或此等的環氧乙烷加成物、環氧丙烷加成物、或ε-己內酯加成物等之多價丙烯酸酯類、或酚類的環氧乙烷加成物或環氧丙烷加成物等之多價丙烯酸酯類、再者(甲基)丙烯酸酯含有胺基甲酸酯寡聚物類,就低翹曲性、彎折性之觀點而言,可適合使用。In particular, in the present invention, polyvalent acrylates such as polyhydric alcohols or such ethylene oxide adducts, propylene oxide adducts, or ε-caprolactone adducts, or phenols are used. Polyvalent acrylates such as ethylene oxide adducts or propylene oxide adducts, and (meth) acrylates containing urethane oligomers, which are low in warpage and bendability From the viewpoint, it can be suitably used.

上述感光性(甲基)丙烯酸酯化合物係可單獨使用1種,亦可組合2種以上來使用。上述感光性(甲基)丙烯酸酯化合物之調合量,以固形分換算,於光硬化性組成物中較佳為1~30質量%,又較佳為2~20質量%,特佳為5~15質量%。若為30質量%以下時,未產生表面之黏附、且指觸乾燥性為良好。又,若為1質量%以上時,於曝光時可得到充分的光硬化性,且圖型形成性將為良好。The photosensitive (meth) acrylate compound may be used singly or in combination of two or more. The blending amount of the photosensitive (meth) acrylate compound is preferably from 1 to 30% by mass, more preferably from 2 to 20% by mass, particularly preferably from 5 to 20% by mass, based on the solid content. 15% by mass. When the content is 30% by mass or less, adhesion of the surface is not caused, and the dryness of the touch is good. In addition, when it is 1% by mass or more, sufficient photocurability can be obtained at the time of exposure, and pattern formability will be good.

(有機黏結劑)(organic binder)

本發明之光硬化性組成物係以進而含有有機黏結劑樹脂為較佳。作為有機黏結劑樹脂,係使用含羧基的樹脂為較佳,且可將光硬化性組成物作成為可鹼液顯影的光硬化性組成物。此情形時,可得到解像性優越的光硬化性組成物。作為含羧基的樹脂並無特別限定,可採用於阻焊劑用、或層間絕緣層用之光硬化性組成物中所使用的習知含羧基的樹脂。The photocurable composition of the present invention preferably further contains an organic binder resin. As the organic binder resin, a carboxyl group-containing resin is preferably used, and the photocurable composition can be used as an alkali-curable photocurable composition. In this case, a photocurable composition excellent in resolution can be obtained. The carboxyl group-containing resin is not particularly limited, and can be used as a conventional carboxyl group-containing resin used for a solder resist or a photocurable composition for an interlayer insulating layer.

又,就光硬化性或耐顯影性之觀點而言,除了羧基之外,以分子內具有乙烯性不飽和鍵為較佳,但亦可為不具有乙烯性不飽和雙鍵之含羧基的樹脂。若含羧基的樹脂為不具有乙烯性不飽和鍵之情形時,為了將組成物作成為光硬化性,以併用分子中具有1個以上的乙烯性不飽和基之化合物(光反應性單體)為較佳。作為乙烯性不飽和雙鍵,係以丙烯酸或甲基丙烯酸或來自於該等之衍生物者為較佳。Further, from the viewpoint of photocurability or developability, it is preferable to have an ethylenically unsaturated bond in the molecule in addition to a carboxyl group, but it may also be a carboxyl group-containing resin having no ethylenically unsaturated double bond. . When the carboxyl group-containing resin does not have an ethylenically unsaturated bond, in order to make the composition photocurable, a compound having one or more ethylenically unsaturated groups in the molecule (photoreactive monomer) is used in combination. It is better. As the ethylenically unsaturated double bond, acrylic acid or methacrylic acid or a derivative derived therefrom is preferred.

作為上述分子中含有羧基、且分子內不含有乙烯性不飽和鍵之含羧基的樹脂,係可舉例如下:(1)藉由使不飽和羧酸(例如,丙烯酸、甲基丙烯酸等)與具有不飽和雙鍵之化合物(例如,苯乙烯、α-甲基苯乙烯、低階烷基(甲基)丙烯酸酯、異丁烯等)進行共聚合後所得到的含羧基的樹脂;(2)使具有不飽和雙鍵之化合物與縮水甘油(甲基)丙烯酸酯之共聚物之環氧基,與1分子中具有1個羧 基、且不具有乙烯性不飽和鍵之有機酸(例如,碳數2~17之烷基羧酸、含芳香族基之烷基羧酸等)反應,再使所生成的二級羥基與飽和或不飽和多元酸酐反應後所得到的含羧基的樹脂;(3)使含羥基之聚合物(例如,含烯烴系羥基之聚合物、丙烯酸系多元醇、橡膠系多元醇、聚乙烯縮醛、苯乙烯烯丙醇系樹脂、纖維素類等)與飽和或不飽和多元酸酐反應後所得到的含羧基的樹脂;(4)使雙環氧化合物(例如,雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、溴化雙酚A型環氧樹脂、氫化雙酚A型環氧樹脂、聯酚型環氧樹脂、聯二甲酚型環氧樹脂等)與二羧酸(例如,草酸、丙二酸、琥珀酸、鄰苯二甲酸、間苯二甲酸等)之反應生成物,與飽和或不飽和多元酸酐反應後所得到的含羧基的樹脂;及,(5)使二官能環氧化合物與雙酚類(例如,雙酚A、雙酚F等)之反應生成物,與飽和或不飽和多元酸酐反應後所得到的含羧基的樹脂等。The carboxyl group-containing resin having a carboxyl group in the molecule and not containing an ethylenically unsaturated bond in the molecule may, for example, be as follows: (1) by having an unsaturated carboxylic acid (for example, acrylic acid, methacrylic acid, etc.) and having a compound having an unsaturated double bond (for example, styrene, α-methylstyrene, lower-order alkyl (meth) acrylate, isobutylene, etc.) obtained by copolymerization of a carboxyl group-containing resin; (2) having An epoxy group of a copolymer of an unsaturated double bond and a glycidyl (meth) acrylate having one carboxy group in one molecule An organic acid having no ethylenic unsaturated bond (for example, an alkyl carboxylic acid having 2 to 17 carbon atoms, an alkyl carboxylic acid having an aromatic group, etc.) is reacted, and the resulting secondary hydroxyl group is saturated with Or a carboxyl group-containing resin obtained by reacting an unsaturated polybasic acid anhydride; (3) a hydroxyl group-containing polymer (for example, an olefin-based hydroxyl group-containing polymer, an acrylic polyol, a rubber-based polyol, a polyvinyl acetal, a carboxyl group-containing resin obtained by reacting a styrene allyl alcohol resin, cellulose, or the like with a saturated or unsaturated polybasic acid anhydride; (4) a diepoxide compound (for example, a bisphenol A type epoxy resin, a double Phenol F type epoxy resin, bisphenol S type epoxy resin, brominated bisphenol A type epoxy resin, hydrogenated bisphenol A type epoxy resin, biphenol type epoxy resin, bisphenol type epoxy resin, etc. a reaction product of a dicarboxylic acid (for example, oxalic acid, malonic acid, succinic acid, phthalic acid, isophthalic acid, etc.), and a carboxyl group-containing resin obtained by reacting with a saturated or unsaturated polybasic acid anhydride; And (5) reacting a difunctional epoxy compound with a bisphenol (for example, bisphenol A, bisphenol F, etc.) , The carboxyl group-containing resin and a saturated or unsaturated polybasic acid anhydride is obtained.

又,作為前述分子中具有羧基及分子內乙烯性不飽和鍵之含羧基的感光性預聚物,係可舉例如下:(1)使1分子中具有至少2個環氧基之多官能環氧化合物(例如,酚醛型環氧樹脂等)與不飽和單羧酸(例如,(甲基)丙烯酸等)反應所生成的羥基,再與飽和或不飽和多元酸酐(例如,六氫鄰苯二甲酸酐或四氫鄰苯二 甲酸酐等)反應後所得到的含羧基的感光性預聚物;(2)使1分子中具有至少2個環氧基之多官能環氧化合物(例如,酚醛型環氧樹脂等),與單羧酸(例如,(甲基)丙烯酸等)和1分子中具有與環氧基反應之醇性羥基以外之1個反應性基之化合物(例如,壬基酚等)/更佳為1分子中具有至少1個醇性羥基和與環氧基反應之醇性羥基以外之1個反應性基之化合物(例如,p-羥基苯乙醇等)反應後,再與飽和或不飽和多元酸酐(例如,六氫鄰苯二甲酸酐或四氫鄰苯二甲酸酐等)反應後所得到的含羧基的感光性預聚物;(3)使不飽和羧酸(例如,(甲基)丙烯酸或順丁烯二酸等)與具有乙烯性不飽和雙鍵之化合物(例如,甲基(甲基)丙烯酸酯等)之共聚物的羧基之一部份,與1分子中具有1個環氧基和乙烯性不飽和雙鍵之化合物(例如,縮水甘油(甲基)丙烯酸酯等)反應後所得到的含羧基的感光性預聚物;(4)使不飽和羧酸(例如,(甲基)丙烯酸或順丁烯二酸等)與具有乙烯性不飽和雙鍵之化合物(例如,甲基(甲基)丙烯酸酯等)之共聚物,與1分子中具有1個環氧基和乙烯性不飽和雙鍵之化合物(例如,縮水甘油(甲基)丙烯酸酯等)反應,再使所生成的羥基與飽和或不飽和多元酸酐(例如,六氫鄰苯二甲酸酐或四氫鄰苯二甲酸酐等)反應後所得到的含羧基的感光性預聚物;及,(5)使不飽和二質子酸酐(例如,順丁烯二酸酐 等)與具有乙烯性不飽和雙鍵之化合物(例如,甲基(甲基)丙烯酸酯等)之共聚物,與羥基烷基(甲基)丙烯酸酯(例如,2-羥基乙基(甲基)丙烯酸酯等)反應後所得到的含羧基的感光性預聚物等。Further, as the carboxyl group-containing photosensitive prepolymer having a carboxyl group and an intramolecular ethylenically unsaturated bond in the molecule, for example, (1) a polyfunctional epoxy having at least two epoxy groups in one molecule can be exemplified as follows: a hydroxyl group formed by reacting a compound (for example, a novolac type epoxy resin or the like) with an unsaturated monocarboxylic acid (for example, (meth)acrylic acid, etc.), and a saturated or unsaturated polybasic acid anhydride (for example, hexahydrophthalic acid) Anhydride or tetrahydroortylene (a) a carboxyl group-containing photosensitive prepolymer obtained after the reaction, and (2) a polyfunctional epoxy compound having at least two epoxy groups in one molecule (for example, a novolac type epoxy resin), and a monocarboxylic acid (for example, (meth)acrylic acid or the like) and a compound having one reactive group other than the alcoholic hydroxyl group reactive with an epoxy group in one molecule (for example, nonylphenol, etc.) / more preferably one molecule a compound having at least one alcoholic hydroxyl group and one reactive group other than an alcoholic hydroxyl group reactive with an epoxy group (for example, p-hydroxyphenylethanol), and then a saturated or unsaturated polybasic acid anhydride (for example, a hydroxy group-containing photosensitive prepolymer obtained after the reaction of hexahydrophthalic anhydride or tetrahydrophthalic anhydride; (3) an unsaturated carboxylic acid (for example, (meth)acrylic acid or cis a portion of a carboxyl group of a copolymer of a compound having an ethylenically unsaturated double bond (for example, a methyl (meth) acrylate or the like), and an epoxy group in one molecule; A carboxyl group-containing photosensitive precipitate obtained by reacting a compound having an ethylenically unsaturated double bond (for example, glycidyl (meth) acrylate, etc.) (4) an unsaturated carboxylic acid (for example, (meth)acrylic acid or maleic acid, etc.) and a compound having an ethylenically unsaturated double bond (for example, methyl (meth) acrylate, etc.) a copolymer which reacts with a compound having one epoxy group and an ethylenically unsaturated double bond in one molecule (for example, glycidyl (meth) acrylate, etc.), and then the resulting hydroxyl group is saturated or unsaturated. a carboxyl group-containing photosensitive prepolymer obtained by reacting an acid anhydride (for example, hexahydrophthalic anhydride or tetrahydrophthalic anhydride); and, (5) an unsaturated diproton anhydride (for example, cis Butylene anhydride And a copolymer of a compound having an ethylenically unsaturated double bond (for example, methyl (meth) acrylate, etc.), and a hydroxyalkyl (meth) acrylate (for example, 2-hydroxyethyl (methyl) A carboxyl group-containing photosensitive prepolymer obtained after the reaction, such as an acrylate or the like.

又,上述樹脂之合成所使用之多官能環氧樹脂為雙酚A構造、雙酚F構造、聯酚構造、聯酚酚醛構造、雙二甲酚構造,特別是若為具有聯苯基酚醛構造之化合物及其氫化物時,所得到的光硬化性組成物之硬化物因低翹曲、彎折耐性為優越,故宜。Further, the polyfunctional epoxy resin used for the synthesis of the above resin is a bisphenol A structure, a bisphenol F structure, a biphenol structure, a biphenol novolac structure, or a bisxylenol structure, and particularly has a biphenylphenol phenol structure. When the compound and the hydride thereof are used, the cured product of the photocurable composition is preferably low in warpage and bending resistance.

尚,於此所謂的(甲基)丙烯酸酯係總稱丙烯酸酯、甲基丙烯酸酯及該等之混合物的用語,以下關於其他類似之表現亦為相同。Here, the term "(meth)acrylate" is generally referred to as acrylate, methacrylate, and the like, and the following similar expressions are also the same.

又,上述有機黏結劑之酸價係以20~200mgKOH/g之範圍為較佳,又較佳為40~150mgKOH/g之範圍。若有機黏結劑之酸價為20mgKOH/g以上時,可得到塗膜之密著性,且對於光硬化性組成物之情形時,鹼液顯影將為良好。又,若酸價為200mgKOH/g以下時,可抑制顯影液所致之曝光部的溶解,不會使線變得比所需要的更細,又,可抑制曝光部與未曝光部無區別地被顯影液溶解剝離,故容易得到正常的阻劑圖型之描繪。Further, the acid value of the organic binder is preferably in the range of 20 to 200 mgKOH/g, and more preferably in the range of 40 to 150 mgKOH/g. When the acid value of the organic binder is 20 mgKOH/g or more, the adhesion of the coating film can be obtained, and in the case of the photocurable composition, the alkali solution development is good. In addition, when the acid value is 200 mgKOH/g or less, the dissolution of the exposed portion by the developer can be suppressed, the line can be made thinner than necessary, and the exposed portion and the unexposed portion can be suppressed from being indistinguishable. Since the developer is dissolved and peeled off, it is easy to obtain a normal resist pattern drawing.

上述有機黏結劑之重量平均分子量係依樹脂骨架而有所不同,但,一般而言以2,000~150,000為較佳。若重量平均分子量為2,000以上時,不黏性能優越,且曝光後之塗膜之耐濕性為良好,於顯影時未產生膜減 少,故解像度將為良好。又,若重量平均分子量為150,000以下時,將為顯影性良好,且儲存穩定性亦為優越。又較佳為5,000~100,000。The weight average molecular weight of the above organic binder varies depending on the resin skeleton, but is generally preferably 2,000 to 150,000. When the weight average molecular weight is 2,000 or more, the non-stick property is excellent, and the moisture resistance of the coating film after exposure is good, and no film reduction occurs during development. Less, so the resolution will be good. Moreover, when the weight average molecular weight is 150,000 or less, it is excellent in developability, and storage stability is also excellent. It is preferably 5,000 to 100,000.

(其他成分)(other ingredients)

於本發明之光硬化性組成物中,只要無損本發明之效果,亦可調合除了上述成分以外之習知添加劑。作為添加劑,可舉例如熱聚合抑制劑、紫外線吸收劑、矽烷偶合劑、可塑劑、耐燃劑、防靜電劑、抗老化劑、抗菌‧防黴劑、消泡劑、調平劑、填充料、增黏劑、密著性賦予劑、搖變性賦予劑、著色劑、除了上述以外之光聚合起始劑、光起始助劑、增感劑等。如同阻焊劑般於基材表面上進行塗佈、乾燥後、光硬化之情形時,亦可使用溶劑。又,作為阻焊劑來使用時,以調合環氧化合物等之熱硬化性樹脂等之熱硬化性成分為較佳。In the photocurable composition of the present invention, conventional additives other than the above components may be blended as long as the effects of the present invention are not impaired. Examples of the additive include a thermal polymerization inhibitor, a UV absorber, a decane coupling agent, a plasticizer, a flame retardant, an antistatic agent, an antiaging agent, an antibacterial, an antifungal agent, an antifoaming agent, a leveling agent, and a filler. A tackifier, a tackifier, a shake imparting agent, a colorant, a photopolymerization initiator other than the above, a photoinitiating aid, a sensitizer, and the like. A solvent may also be used in the case of coating, drying, or photohardening on the surface of the substrate like a solder resist. Moreover, when it is used as a solder resist, it is preferable to mix a thermosetting component, such as a thermosetting resin, such as an epoxy compound.

(填充料)(filler)

本發明之光硬化性組成物,亦可含有填充料(無機充填劑)。填充料係為了抑制光硬化性組成物之硬化物之硬化收縮、且使密著性、硬度等之特性提昇而使用。作為填充料,可舉例如:硫酸鋇、無定形矽石、熔融矽石、球狀矽石、滑石、黏土、碳酸鎂、碳酸鈣、氧化鋁、氫氧化鋁、氮化矽、氮化鋁、氮化硼、諾伊博格矽藻土(Neuburg Siliceous Earth)等。The photocurable composition of the present invention may further contain a filler (inorganic filler). The filler is used to suppress the hardening shrinkage of the cured product of the photocurable composition and to improve the properties such as adhesion and hardness. Examples of the filler include barium sulfate, amorphous vermiculite, molten vermiculite, globular vermiculite, talc, clay, magnesium carbonate, calcium carbonate, aluminum oxide, aluminum hydroxide, tantalum nitride, aluminum nitride, and the like. Boron nitride, Neuburg Siliceous Earth, and the like.

填充料之平均粒徑(D50)係以1μm以下為較佳、以0.7μm以下為又較佳、以0.5μm以下為更佳。若平均粒徑超過1μm時,有光硬化性組成物呈白濁之虞,且依用途為不宜。平均粒徑(D50)係可藉由雷射繞射/散射法來進行測定。藉由平均粒徑為上述範圍內,折射率將會趨近於樹脂成分、且穿透性為提昇。The average particle diameter (D50) of the filler is preferably 1 μm or less, more preferably 0.7 μm or less, and still more preferably 0.5 μm or less. When the average particle diameter exceeds 1 μm, the photocurable composition is cloudy and turbid, and it is not suitable depending on the use. The average particle diameter (D50) can be measured by a laser diffraction/scattering method. When the average particle diameter is within the above range, the refractive index will approach the resin component and the permeability will be improved.

(熱硬化性成分)(thermosetting component)

於本發明之光硬化性組成物中,為了賦予耐熱性,可加入熱硬化性成分。作為本發明所使用之熱硬化性成分,可舉例如封端異氰酸酯化合物、胺基樹脂、馬來醯亞胺化合物、苯并樹脂、碳二醯亞胺樹脂、環碳酸酯化合物、多官能環氧化合物、多官能氧雜環丁烷化合物、環硫化物樹脂等之習知慣用的熱硬化性樹脂等。此等之中較佳的熱硬化性成分,其係1分子中具有複數的環狀醚基及環狀硫醚基(以下,簡稱為環狀(硫)醚基)之至少任1種之熱硬化性成分。具有此等環狀(硫)醚基之熱硬化性成分,市售種類為多,並依其構造可賦予多樣的特性。In the photocurable composition of the present invention, a thermosetting component may be added in order to impart heat resistance. The thermosetting component used in the present invention may, for example, be a blocked isocyanate compound, an amine resin, a maleimide compound, or a benzo compound. A conventional thermosetting resin such as a resin, a carbodiimide resin, a cyclic carbonate compound, a polyfunctional epoxy compound, a polyfunctional oxetane compound, or an episulfide resin. Among these, a thermosetting component which is preferably one of a plurality of cyclic ether groups and a cyclic thioether group (hereinafter, simply referred to as a cyclic (thio)ether group) in one molecule is used. Hardening ingredients. The thermosetting component having such a cyclic (thio)ether group is commercially available in a variety of types, and various properties can be imparted depending on the structure.

如此般的分子中具有複數的環狀(硫)醚基之熱硬化性成分,係分子中具有2個以上3、4或5節環的環狀醚基、或環狀硫醚基之任一者或2種類的基之化合物,可舉例如:分子中具有複數的環氧基之化合物,即多官能環氧化合物;分子中具有複數的氧雜環丁烷基之化合物,即多官能氧雜環丁烷化合物;分子中具有複數的硫醚 基之化合物,即環硫化物樹脂等。A thermosetting component having a plurality of cyclic (thio)ether groups in the molecule, which is a cyclic ether group having two or more three, four or five-membered rings or a cyclic thioether group in the molecule. The compound of the two types of the group may, for example, be a compound having a plurality of epoxy groups in the molecule, that is, a polyfunctional epoxy compound; a compound having a plurality of oxetanyl groups in the molecule, that is, a polyfunctional oxy compound. Cyclobutane compound; having a plurality of thioethers in the molecule A compound such as an episulfide resin or the like.

上述多官能環氧化合物,係1分子中具有2個以上環氧基(環氧乙烷環)之多官能環氧化合物、或將該多官能環氧化合物聚合後所得到的樹脂。作為上述多官能環氧化合物,可舉例如:環氧化植物油;雙酚A型環氧樹脂;氫醌型環氧樹脂、雙酚型環氧樹脂、硫醚型環氧樹脂;溴化環氧樹脂;酚醛型環氧樹脂;聯酚酚醛型環氧樹脂;雙酚F型環氧樹脂;氫化雙酚A型環氧樹脂;縮水甘油胺型環氧樹脂;乙內醯脲型環氧樹脂;脂環式環氧樹脂;三羥基苯基甲烷型環氧樹脂;聯二甲酚型或聯酚型環氧樹脂或該等之混合物;雙酚S型環氧樹脂;雙酚A酚醛型環氧樹脂;四羥苯基乙烷(tetraphenylolethane)型環氧樹脂;雜環式環氧樹脂;鄰苯二甲酸二縮水甘油酯樹脂;四縮水甘油基二甲苯基乙烷樹脂;含萘基之環氧樹脂;具有二環戊二烯骨架之環氧樹脂;縮水甘油甲基丙烯酸酯共聚合系環氧樹脂;環己烷馬來醯亞胺與縮水甘油甲基丙烯酸酯之共聚合環氧樹脂;環氧改質之聚丁二烯橡膠衍生物、CTBN改質環氧樹脂等,但,並非限定於此等中。此等的環氧樹脂係可單獨或組合2種以上來使用。此等之中,特別以雙酚型環氧樹脂為較佳。The polyfunctional epoxy compound is a polyfunctional epoxy compound having two or more epoxy groups (oxirane rings) in one molecule, or a resin obtained by polymerizing the polyfunctional epoxy compound. Examples of the polyfunctional epoxy compound include epoxidized vegetable oil; bisphenol A type epoxy resin; hydroquinone type epoxy resin, bisphenol type epoxy resin, thioether type epoxy resin; and brominated epoxy resin. ; phenolic epoxy resin; phenolic phenolic epoxy resin; bisphenol F epoxy resin; hydrogenated bisphenol A epoxy resin; glycidylamine epoxy resin; Ring epoxy resin; trihydroxyphenylmethane type epoxy resin; dixylenol type or biphenol type epoxy resin or a mixture thereof; bisphenol S type epoxy resin; bisphenol A phenolic type epoxy resin ; tetraphenylolethane type epoxy resin; heterocyclic epoxy resin; diglycidyl phthalate resin; tetraglycidyl xylyl ethane resin; naphthalene-containing epoxy resin Epoxy resin having a dicyclopentadiene skeleton; glycidyl methacrylate copolymerized epoxy resin; copolymerized epoxy resin of cyclohexane maleimide and glycidyl methacrylate; epoxy Modified polybutadiene rubber derivative, CTBN modified epoxy resin, etc. However, not limited thereto, and the like. These epoxy resins may be used alone or in combination of two or more. Among these, a bisphenol type epoxy resin is particularly preferable.

作為上述多官能氧雜環丁烷化合物,除了雙[(3-甲基-3-氧雜環丁烷甲氧基)甲基]醚、雙[(3-乙基-3-氧雜環丁烷甲氧基)甲基]醚、1,4-雙[(3-甲基-3-氧雜環丁烷甲氧基)甲基]苯、1,4-雙[(3-乙基-3-氧雜環丁烷 甲氧基)甲基]苯、(3-甲基-3-氧雜環丁烷)甲基丙烯酸酯、(3-乙基-3-氧雜環丁烷)甲基丙烯酸酯、(3-甲基-3-氧雜環丁烷)甲基丙烯酸酯、(3-乙基-3-氧雜環丁烷)甲基丙烯酸酯或該等之寡聚物或共聚物等之多官能氧雜環丁烷類以外,可舉例如氧雜環丁烷醇、與酚醛樹脂、聚(p-羥基苯乙烯)、cardo型雙酚類、杯芳烴類、間苯二酚杯芳烴類、或倍半矽氧烷等之具有羥基之樹脂之醚化物等。其他,亦可舉具有氧雜環丁烷環之不飽和單體與烷基(甲基)丙烯酸酯之共聚物等。As the above polyfunctional oxetane compound, in addition to bis[(3-methyl-3-oxetanylmethoxy)methyl]ether, bis[(3-ethyl-3-oxetan) Alkyloxy)methyl]ether, 1,4-bis[(3-methyl-3-oxetanylmethoxy)methyl]benzene, 1,4-bis[(3-ethyl-) 3-oxetane Methoxy)methyl]benzene, (3-methyl-3-oxetanyl)methacrylate, (3-ethyl-3-oxetane)methacrylate, (3- Methyl-3-oxetane)methacrylate, (3-ethyl-3-oxetane)methacrylate or polyfunctional oxalates of such oligomers or copolymers Examples of the cyclobutanes include oxetane, phenol resin, poly(p-hydroxystyrene), cardo type bisphenol, calixarene, resorcinol calixarene, or half. An etherified product of a resin having a hydroxyl group such as a decane or the like. Other examples thereof include a copolymer of an oxetane ring-unsaturated monomer and an alkyl (meth) acrylate.

作為上述分子中具有複數的環狀硫醚基之環硫化物樹脂,可舉例如三菱化學公司製的YL7000(雙酚A型環硫化物樹脂)、或東都化成公司製的YSLV-120TE等。又,使用相同之合成方法,亦可使用將酚醛型環氧樹脂之環氧基的氧原子取代成硫原子之環硫化物樹脂等。Examples of the episulfide resin having a plurality of cyclic thioether groups in the above-mentioned molecule include YL7000 (bisphenol A type episulfide resin) manufactured by Mitsubishi Chemical Corporation, and YSLV-120TE manufactured by Tosho Kasei Co., Ltd., and the like. Further, an episulfide resin in which an oxygen atom of an epoxy group of a novolac type epoxy resin is substituted with a sulfur atom or the like can be used by the same synthesis method.

又,本發明之光硬化性組成物,除了上述熱硬化性成分外,還可使用三聚氰胺衍生物、苯並胍胺衍生物等的胺基樹脂等之熱硬化性成分。作為如此般的熱硬化性成分,可舉例如:羥甲基三聚氰胺化合物、羥甲基苯並胍胺化合物、羥甲基甘脲化合物、羥甲基尿素化合物、烷氧基甲基化三聚氰胺化合物、烷氧基甲基化苯並胍胺化合物、烷氧基甲基化甘脲化合物、烷氧基甲基化尿素化合物等。關於上述烷氧基甲基之種類並無特別限定,可為例如:甲氧基甲基、乙氧基甲基、丙氧基甲基、丁氧基甲基等。特別是對人體或環境為宜的福馬林濃度為0.2%以下 之三聚氰胺衍生物為較佳。上述熱硬化性成分係可單獨使用1種,亦可組合2種以上來使用。Moreover, in addition to the above-mentioned thermosetting component, the photocurable composition of the present invention may be a thermosetting component such as an amine resin such as a melamine derivative or a benzoguanamine derivative. Examples of such a thermosetting component include a methylol melamine compound, a methylol benzoguanamine compound, a methylol glycoluril compound, a methylol urea compound, an alkoxymethylated melamine compound, and the like. An alkoxymethylated benzoguanamine compound, an alkoxymethylated glycoluril compound, an alkoxymethylated urea compound, or the like. The type of the alkoxymethyl group is not particularly limited, and examples thereof include a methoxymethyl group, an ethoxymethyl group, a propoxymethyl group, and a butoxymethyl group. Especially for humans or the environment, the concentration of formalin is 0.2% or less. A melamine derivative is preferred. The thermosetting component may be used singly or in combination of two or more.

(溶劑)(solvent)

本發明之光硬化性組成物,為了調整組成物之黏度亦可含有有機溶劑。作為有機溶劑,只要是可溶解本發明相關之光聚合起始劑者,可使用習知慣用之種類。可舉例如甲苯、二甲苯、乙酸乙酯、乙酸丁酯、甲醇、乙醇、異丙醇、異丁醇、1-丁醇、二丙酮醇、乙二醇單丁醚、丙二醇單乙醚、丙二醇單甲基醚乙酸酯、萜品醇、甲基乙基酮、卡必醇、卡必醇乙酸酯、丁基卡必醇、丁基卡必醇乙酸酯等。溶劑係可單獨使用1種,亦可組合2種以上來使用。The photocurable composition of the present invention may contain an organic solvent in order to adjust the viscosity of the composition. As the organic solvent, as long as it is a photopolymerization initiator which can dissolve the present invention, a conventionally used type can be used. For example, toluene, xylene, ethyl acetate, butyl acetate, methanol, ethanol, isopropanol, isobutanol, 1-butanol, diacetone alcohol, ethylene glycol monobutyl ether, propylene glycol monoethyl ether, propylene glycol single Methyl ether acetate, terpineol, methyl ethyl ketone, carbitol, carbitol acetate, butyl carbitol, butyl carbitol acetate, and the like. The solvent may be used singly or in combination of two or more.

本發明之光硬化性組成物,係例如以下述之塗佈方法於基材等進行塗佈後再進行紫外線照射,較佳為波長10~420nm,又較佳為250~420nm的紫外線而可硬化。本發明之光硬化性組成物,甚至進行320~420nm的長波長之紫外線的照射,其硬化性亦為優越。The photocurable composition of the present invention is applied to a substrate or the like by, for example, the following coating method, followed by ultraviolet irradiation, preferably at a wavelength of 10 to 420 nm, preferably 250 to 420 nm. . The photocurable composition of the present invention is excellent in hardenability even when irradiated with ultraviolet rays having a long wavelength of 320 to 420 nm.

作為紫外線的照射光源,係可舉例低壓水銀燈、中壓水銀燈、高壓水銀燈、超高壓水銀燈、氙氣燈或金屬鹵素燈、雷射、UV-LED等。Examples of the ultraviolet light irradiation source include a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an ultra high pressure mercury lamp, a xenon lamp or a metal halide lamp, a laser, a UV-LED, and the like.

塗佈方法係可適用浸漬塗佈法、流塗法、輥塗法、棒式塗佈法、網板印刷法、簾幕塗佈法、凹版塗佈印刷法、平板印刷法等之任意的方法。The coating method can be any method such as a dip coating method, a flow coating method, a roll coating method, a bar coating method, a screen printing method, a curtain coating method, a gravure coating method, or a lithography method. .

本發明之光硬化性組成物係以阻焊劑用為較佳。阻焊劑其特徵係將上述本發明之光硬化性組成物於基板上進行塗佈、硬化而成。The photocurable composition of the present invention is preferably a solder resist. The solder resist is characterized in that the photocurable composition of the present invention is coated and cured on a substrate.

關於阻焊劑用之光硬化性組成物之塗佈、硬化之方法,亦皆可採用習知方法。例如可依如下述般的方法。A conventional method can also be employed for the method of coating and hardening the photocurable composition for a solder resist. For example, the method can be as follows.

因應需要,藉由溶劑來稀釋以調整成適合塗佈方法之黏度,將此,於形成有回路之印刷配線板上,例如藉由網板印刷法、簾幕塗佈法、噴塗法、輥塗法等之方法來進行塗佈,並以例如約60~100℃的溫度,藉由使組成物中所含之有機溶劑揮發乾燥,而可形成不黏的塗膜。之後,將雷射光等之活性能量線以如同圖型般地直接進行照射、或通過形成有圖型之光罩並選擇性地藉由紫外線曝光後,使其硬化。若光硬化性組成物為鹼液顯影型之情形時,將未曝光部藉由稀鹼水溶液來顯影後可形成阻劑圖型。再者,依所期望,藉由紫外線之照射後,使加熱硬化或最終硬化(真硬化),而可形成硬化膜(硬化物)。If necessary, it is diluted by a solvent to adjust the viscosity suitable for the coating method, and this is formed on a printed wiring board on which a loop is formed, for example, by screen printing, curtain coating, spray coating, roll coating. The coating is carried out by a method such as a method, and a non-stick coating film can be formed by volatilizing and drying the organic solvent contained in the composition at a temperature of, for example, about 60 to 100 °C. Thereafter, the active energy ray such as laser light is directly irradiated as in the form of a pattern, or is formed by a pattern mask and selectively exposed to ultraviolet light to be cured. When the photocurable composition is in the case of an alkali-developing type, the unexposed portion is developed by a dilute aqueous alkali solution to form a resist pattern. Further, as desired, a cured film (cured material) can be formed by heat curing or final hardening (true hardening) after irradiation with ultraviolet rays.

本發明之光硬化性組成物,除了阻焊劑之外,可使用於印刷配線板之層間絕緣層、或電漿顯示器面板、觸控面板之電極形成用的導電性糊膏等用途。又,本發明之光硬化性組成物,除了以液狀直接於基材上進行塗佈之方法以外,亦可以乾膜之形態使用,該乾膜係具有將光硬化性組成物以預先塗佈並乾燥於對苯二甲酸乙二酯薄膜等之薄膜所形成的塗膜層。The photocurable composition of the present invention can be used for an interlayer insulating layer for a printed wiring board, a conductive display panel, and a conductive paste for forming an electrode of a touch panel, in addition to a solder resist. Further, the photocurable composition of the present invention may be used in the form of a dry film in addition to a method of applying a liquid directly onto a substrate, and the dry film has a photocurable composition coated in advance. And drying the coating layer formed on the film of the ethylene terephthalate film or the like.

[實施例][Examples]

以下,藉由實施例、比較例來更詳細地說明本發明,但,本發明並不受限於此等實施例、比較例。尚,若無特別指明,「份」係意味質量份、「%」係意味質量%。Hereinafter, the present invention will be described in more detail by way of Examples and Comparative Examples. However, the present invention is not limited to the Examples and Comparative Examples. In addition, unless otherwise specified, "parts" means mass parts, and "%" means mass%.

[參考例][Reference example] (光聚合起始劑之5%減量溫度之測定)(Measurement of 5% reduction temperature of photopolymerization initiator)

將IHT公司製的Omnipol TX的5%減量溫度,使用示差熱-熱重量同時測定裝置(TG/DTA),以下述條件、用一定速度來測定昇溫時之重量減少,可求得熱重量為5%減少時之溫度。將所得到的加熱減量曲線表示於圖1。5%減量溫度為318℃。The 5% reduction temperature of Omnipol TX manufactured by IHT Co., Ltd. was measured by a differential thermal-thermal weight simultaneous measurement device (TG/DTA) under the following conditions at a constant rate to obtain a thermal weight of 5 The temperature at which % is reduced. The obtained heating loss curve is shown in Fig. 1. The 5% reduction temperature was 318 °C.

測定樣品:光聚合起始劑(於樣品器皿上計量10mg該樣品)。Assay sample: photopolymerization initiator (10 mg of this sample was metered on the sample vessel).

測定機器:日立High-Tech Science公司製TG/DTA6200。Measuring machine: TG/DTA6200 manufactured by Hitachi High-Tech Science Co., Ltd.

測定範圍:30℃~600℃。昇溫速度:10℃/分鐘。Measuring range: 30 ° C ~ 600 ° C. Heating rate: 10 ° C / min.

[實施例1~5及比較例1~4][Examples 1 to 5 and Comparative Examples 1 to 4] (光硬化性組成物之調製)(modulation of photocurable composition)

將下述表1記載之各成分藉由三軸輥磨機進行混練,以調製光硬化性組成物。表中之調合量的單位係質量份。尚,作為上述一般式(I)所示的光聚合起始劑為使用上述化學式No.1之光聚合起始劑。Each component described in the following Table 1 was kneaded by a triaxial roll mill to prepare a photocurable composition. The unit of the blending amount in the table is part by mass. In addition, the photopolymerization initiator represented by the above general formula (I) is a photopolymerization initiator using the above Chemical Formula No. 1.

對於所得到的光硬化性組成物進行下述之評價。將評價結果表示於下述表2。The following evaluation of the obtained photocurable composition was carried out. The evaluation results are shown in Table 2 below.

<硬化性><hardenability>

將實施例及比較例之光硬化性組成物,於滿銅基板上以塗抹器來進行塗佈,並照射來自於LED光源之波長395nm及405nm的光。確認已硬化之塗膜的沾黏性,並依據以下之基準來進行評價。The photocurable compositions of the examples and the comparative examples were applied by an applicator on a full copper substrate, and light having a wavelength of 395 nm and 405 nm from the LED light source was irradiated. The adhesion of the cured film was confirmed and evaluated based on the following criteria.

○:無黏附者。○: No adhesion.

△:有稍微黏附者。△: There is a slight adhesion.

×:有黏附者。×: There is adhesion.

由表1所示之結果可得,知將肟酯系、烷基 苯酮系、醯基膦氧化物系及二茂鈦系光聚合起始劑之任一者,與上述一般式(I)所示的光聚合起始劑組合之實施例的光硬化性組成物係於硬化性為優越。From the results shown in Table 1, it is known that the oxime ester system, alkyl group Photocurable composition of any of the benzophenone-based, mercaptophosphine oxide-based, and titanocene-based photopolymerization initiators in combination with the photopolymerization initiator represented by the above general formula (I) It is superior to hardenability.

又,在將光感光性單體等作為主成分並以低黏度所構成的噴墨組成物中,分別準備調合有本發明所使用的起始劑及DETX-S者,比較藉由噴墨時的印刷性時,若使用前者時,可無問題地進行印刷,相較於此,若使用後者時,會發生噴嘴阻塞而無法印刷。Further, in an ink jet composition comprising a photo-sensitive monomer or the like as a main component and having a low viscosity, each of the initiators and DETX-S used in the present invention is prepared, and the ink jet is used. In the case of the printability, when the former is used, the printing can be performed without problems. In contrast, when the latter is used, the nozzle is clogged and the printing cannot be performed.

如此般的本發明之硬化物係特別適合於要求上述特性之成形品領域,例如行動電話的按鍵、各種機殼等、或UV成形品材料、光造形用材料、噴墨用材料、3D噴墨印表機用材料等之用途等。Such a cured product of the present invention is particularly suitable for the field of molded articles requiring the above characteristics, such as a button for a mobile phone, various casings, or the like, or a UV molded article material, a material for forming a light, a material for inkjet, and a 3D inkjet. The use of materials for printers, etc.

Claims (4)

一種印刷配線板用光硬化性組成物,其特徵係含有:選自由肟酯系光聚合起始劑、烷基苯酮系光聚合起始劑、醯基膦氧化物系光聚合起始劑、及二茂鈦系光聚合起始劑所成之群之至少1種的光聚合起始劑,與下述一般式(I)所示的光聚合起始劑, (式中,R係表示下述式(II)所示之構造,l1 係表示2~4之整數,m1 係表示1以上之整數), A photocurable composition for a printed wiring board, comprising: an oxime ester photopolymerization initiator, an alkylphenone photopolymerization initiator, a mercaptophosphine oxide photopolymerization initiator, And at least one photopolymerization initiator of the group consisting of a titanocene-based photopolymerization initiator, and a photopolymerization initiator represented by the following general formula (I); (wherein R represents a structure represented by the following formula (II), and l 1 represents an integer of 2 to 4, and m 1 represents an integer of 1 or more), 如請求項1之印刷配線板用光硬化性組成物,其中,進而含有感光性(甲基)丙烯酸酯化合物。The photocurable composition for a printed wiring board according to claim 1, further comprising a photosensitive (meth) acrylate compound. 如請求項1之印刷配線板用光硬化性組成物,其中,進而含有有機黏結劑。The photocurable composition for a printed wiring board according to claim 1, further comprising an organic binder. 一種硬化物,其特徵係將請求項1~3中任一項之印刷配線板用光硬化性組成物硬化而成。A cured product obtained by curing the printed wiring board according to any one of claims 1 to 3 with a photocurable composition.
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JP2015028131A (en) 2015-02-12
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WO2014208405A1 (en) 2014-12-31
TW201504755A (en) 2015-02-01

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