TWI484570B - - Google Patents

Info

Publication number
TWI484570B
TWI484570B TW101139048A TW101139048A TWI484570B TW I484570 B TWI484570 B TW I484570B TW 101139048 A TW101139048 A TW 101139048A TW 101139048 A TW101139048 A TW 101139048A TW I484570 B TWI484570 B TW I484570B
Authority
TW
Taiwan
Application number
TW101139048A
Other languages
Chinese (zh)
Other versions
TW201417195A (zh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW101139048A priority Critical patent/TW201417195A/zh
Publication of TW201417195A publication Critical patent/TW201417195A/zh
Application granted granted Critical
Publication of TWI484570B publication Critical patent/TWI484570B/zh

Links

TW101139048A 2012-10-23 2012-10-23 圓形式晶粒置放方法 TW201417195A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW101139048A TW201417195A (zh) 2012-10-23 2012-10-23 圓形式晶粒置放方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW101139048A TW201417195A (zh) 2012-10-23 2012-10-23 圓形式晶粒置放方法

Publications (2)

Publication Number Publication Date
TW201417195A TW201417195A (zh) 2014-05-01
TWI484570B true TWI484570B (enExample) 2015-05-11

Family

ID=51293918

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101139048A TW201417195A (zh) 2012-10-23 2012-10-23 圓形式晶粒置放方法

Country Status (1)

Country Link
TW (1) TW201417195A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114972317B (zh) * 2022-06-22 2024-04-05 合肥工业大学 一种方形晶粒放置规划方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1361023A2 (en) * 2002-05-07 2003-11-12 Applied Materials, Inc. Polishing articles for electrochemical mechanical polishing of substrates
US6838753B2 (en) * 2001-12-21 2005-01-04 Samsung Techwin Co., Ltd. Lead-frame strip and method of manufacturing semiconductor packages using the same
TWI263289B (en) * 2002-02-15 2006-10-01 Freescale Semiconductor Inc Process and apparatus for disengaging semiconductor die from an adhesive film
TWI290363B (en) * 2002-05-17 2007-11-21 Gsi Lumonics Corp Method and system for marking a workpiece such as a semiconductor wafer and laser marker for use therein
US7911068B2 (en) * 2006-07-11 2011-03-22 Infineon Technologies Ag Component and method for producing a component

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6838753B2 (en) * 2001-12-21 2005-01-04 Samsung Techwin Co., Ltd. Lead-frame strip and method of manufacturing semiconductor packages using the same
TWI263289B (en) * 2002-02-15 2006-10-01 Freescale Semiconductor Inc Process and apparatus for disengaging semiconductor die from an adhesive film
EP1361023A2 (en) * 2002-05-07 2003-11-12 Applied Materials, Inc. Polishing articles for electrochemical mechanical polishing of substrates
TWI290363B (en) * 2002-05-17 2007-11-21 Gsi Lumonics Corp Method and system for marking a workpiece such as a semiconductor wafer and laser marker for use therein
US7911068B2 (en) * 2006-07-11 2011-03-22 Infineon Technologies Ag Component and method for producing a component

Also Published As

Publication number Publication date
TW201417195A (zh) 2014-05-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees