TWI480418B - Splashguard for high flow vacuum bubbler vessel - Google Patents
Splashguard for high flow vacuum bubbler vessel Download PDFInfo
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- TWI480418B TWI480418B TW102101206A TW102101206A TWI480418B TW I480418 B TWI480418 B TW I480418B TW 102101206 A TW102101206 A TW 102101206A TW 102101206 A TW102101206 A TW 102101206A TW I480418 B TWI480418 B TW I480418B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/02—Feed or outlet devices; Feed or outlet control devices for feeding measured, i.e. prescribed quantities of reagents
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/008—Feed or outlet control devices
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Description
本專利申請案是2009年3月19日申請的美國專利申請案序號第12/407,279號的部分連續專利申請案。This patent application is a contiguous patent application of U.S. Patent Application Serial No. 12/407,279, filed on March 19, 2009.
本發明關於一種用於高流量真空氣泡器容器的防濺器。The present invention relates to a splash guard for a high flow vacuum bubbler container.
當為了CVD而採用蒸氣輸送時,貯存器(container)通常讓惰性載氣穿過該貯存器或者起泡裝置(即,氣泡器),以便將攜帶在該惰性載氣內的化學前驅物蒸氣運送到處理裝置。氣泡器通常具有下管入口,載氣自該下管入口處被引入到貯存器中並處於液態化學前驅物的表面下,其中載氣向上穿過該液態化學前驅物從而起泡,隨著載氣作為氣泡浮出液體表面並且通過設置在化學前驅物液面上方的出口排出貯存器或氣泡器時,該載氣攜帶了化學前驅物。When vapor transport is employed for CVD, a reservoir typically passes an inert carrier gas through the reservoir or bubbler (i.e., bubbler) to transport the chemical precursor vapor carried within the inert carrier gas. Go to the processing unit. The bubbler typically has a lower tube inlet from which the carrier gas is introduced into the reservoir and under the surface of the liquid chemical precursor, wherein the carrier gas passes upwardly through the liquid chemical precursor to foam The gas carries a chemical precursor as it floats out of the liquid surface as a bubble and exits the reservoir or bubbler through an outlet disposed above the liquid surface of the chemical precursor.
使化學前驅物以液態形式(即使是作為小液滴)通過出口離開貯存器是人們不期望的。均質蒸氣被優選作為這種氣泡器的分配產品。這避免了腐蝕、清理、不均勻流動、以及懸浮滴等問題,其中懸浮滴在生產製造期間以及斷開貯 存器期間可能會在出口內積累並且形成顆粒。It is undesirable to have the chemical precursor exit the reservoir through the outlet in liquid form, even as small droplets. Homogeneous vapor is preferred as the distribution product for such bubblers. This avoids problems such as corrosion, cleaning, uneven flow, and floating drops, which are suspended during manufacturing and disconnected. Particles may accumulate and form in the outlet during the storage.
工業實踐中針對該問題嘗試了用於氣泡器的各種形式的防濺器,例如在US 2008/0143002、US 6,520,218、EP 1329540、US 2004/0013577、EP0420596、US 5,589,110、US 7,077,388、US 2003/0042630、US 5,776,255、以及US 4,450,118。這些嘗試中的每一個都僅僅提供了比期望性能更少的防濺器功能,但是如下面所公開的那樣,本發明成功地提供了高液位的防濺器功能,同時仍然允許化學前驅物的高流量或者允許在高真空或高壓力差條件下的流動,如下文將要描述和說明的那樣。Various forms of splash guards for bubblers have been tried in the practice of the art, for example, in US 2008/0143002, US 6,520,218, EP 1329540, US 2004/0013577, EP 0420596, US 5,589,110, US 7,077,388, US 2003/0042630 US 5,776,255 and US 4,450,118. Each of these attempts provides only a spatter function that is less than desired, but as disclosed below, the present invention successfully provides a high level splash guard function while still allowing chemical precursors The high flow rate or flow under high vacuum or high pressure differential conditions, as will be described and illustrated below.
本發明係關於一種貯存器,其具有:一浸管入口,其末端鄰近該貯存器基部;至少一擋盤,其係裝配成一淺型下開式錐體,位於該浸管的出口與該貯存器的出口之間,裝配成於該擋盤與該貯存器側壁的內表面之間提供一狹窄的環狀空間;一徑向向內伸出的環狀偏轉突出部,其係於該側壁上,鄰近該擋盤,該擋盤和偏轉突出部能夠使進入該貯存器出口的液滴減至最少;一肩部,其具有一徑向向內伸出的環狀邊緣,於該偏轉突出部的最內邊緣下方軸向間隔開;及一液位感測器,其末端接近該貯存器的基部,能夠具有高於該液位感測器末端的液面高度。The present invention relates to a reservoir having: a dip tube inlet having an end adjacent to the reservoir base; at least one baffle assembled into a shallow lower open cone at the outlet of the dip tube and the storage Between the outlets of the device, a narrow annular space is provided between the retaining disk and the inner surface of the side wall of the reservoir; a radially inwardly projecting annular deflecting projection is attached to the side wall Adjacent to the baffle, the baffle and deflection projections minimize droplets entering the reservoir outlet; a shoulder having a radially inwardly projecting annular edge on the deflecting projection The innermost edge is axially spaced below; and a liquid level sensor having an end proximate to the base of the reservoir capable of having a liquid level above the end of the liquid level sensor.
本發明也關於一種從貯存器輸送化學前驅物蒸氣的方法,該方法包含:使載氣通過該貯存器的浸管;從該 貯存器將液態化學前驅物攜帶到該載氣中;使該攜帶的化學前驅物和載氣經過於側壁上之徑向向內伸出的環狀偏轉突出部及至少一擋盤,該至少一擋盤係在介於該擋盤的最外邊緣與該貯存器側壁的內表面之間的狹窄環狀空間中。The invention also relates to a method of delivering a chemical precursor vapor from a reservoir, the method comprising: passing a carrier gas through a dip tube of the reservoir; Carrying a liquid chemical precursor into the carrier gas; causing the carried chemical precursor and carrier gas to pass through a radially inwardly projecting annular deflection projection on the sidewall and at least one retaining disk, the at least one The retaining disk is in a narrow annular space between the outermost edge of the retaining disk and the inner surface of the reservoir sidewall.
10‧‧‧氣泡器貯存器10‧‧‧ bubbler reservoir
11‧‧‧貯存器下部11‧‧‧ Lower part of the reservoir
12‧‧‧氣泡器側壁12‧‧‧Bubble side wall
13‧‧‧貯存器基部13‧‧‧Storage base
14‧‧‧浸管14‧‧‧ dip tube
15‧‧‧液面高度15‧‧‧Liquid height
16‧‧‧出口16‧‧‧Export
17‧‧‧貯存器上部17‧‧‧ Upper part of the reservoir
21‧‧‧肩部21‧‧‧ shoulder
22‧‧‧突出部22‧‧‧Protruding
23‧‧‧內表面23‧‧‧ inner surface
24‧‧‧擋盤24‧‧‧
24a‧‧‧擋盤24a‧‧‧
24b‧‧‧擋盤24b‧‧‧
24c‧‧‧擋盤24c‧‧‧
24d‧‧‧擋盤24d‧‧‧
26‧‧‧閥26‧‧‧Valves
27a‧‧‧浸管入口末端27a‧‧‧End of dip tube inlet
27b‧‧‧液面感測器末端27b‧‧‧Liquid sensor end
28‧‧‧液面感測器28‧‧‧Liquid sensor
30‧‧‧閥30‧‧‧ valve
32‧‧‧入口端32‧‧‧ entrance end
34‧‧‧最內邊緣34‧‧‧ innermost edge
36‧‧‧最外邊緣36‧‧‧ outermost edge
38‧‧‧流動路徑38‧‧‧Flow path
圖1係以局部斷面方式顯示的本發明之一具體實施例的側視圖。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a side elevational view of one embodiment of the invention shown in partial cross-section.
圖2係以斷面方式顯示的本發明之一具體實施例的局部側視圖。Figure 2 is a partial side elevational view of one embodiment of the invention shown in cross section.
圖3係以斷面方式顯示的本發明之第二具體實施例的局部側視圖。Figure 3 is a partial side elevational view of a second embodiment of the present invention shown in cross section.
圖4係以斷面方式顯示的本發明之第三具體實施例的局部側視圖。Figure 4 is a partial side elevational view of a third embodiment of the present invention shown in cross section.
圖5係以斷面方式顯示的本發明之第四具體實施例的局部側視圖。Figure 5 is a partial side elevational view of a fourth embodiment of the present invention shown in cross section.
本發明係一種蒸氣生成氣泡器貯存器(vapor generation bubbler container),其係經設計以供用於高真空或高流速條件。該設計防止懸浮滴飛濺及輸送到排出輸送管線中,這兩者都會導致不穩定的化學品質量流輸送。The present invention is a vapor generation bubbler container designed for use in high vacuum or high flow conditions. This design prevents aerosol dripping and transport to the discharge line, both of which result in unstable chemical mass flow.
半導體製造商致力於使用高價值的化學物質, 這些化學物質越來越難以運送以供沉積於真空艙或處理裝置中的晶片上。本發明的氣泡器容器使液態化學物質能於高真空下以蒸氣形態從該貯存器進行輸送,而沒有懸浮滴飛濺及形成於該貯存器出口內,這兩者都會導致不穩定的化學品質量輸送速率。本發明具有一下表面設計,其使帶有化學品蒸氣的載氣的恆定飽和度能夠下降至非常低量的剩餘化學物質。還有,本發明防止懸浮滴飛濺及形成於該貯存器出口內,那將導致不穩定的化學品質量輸送率,即使是當該貯存器內的化學品液位高的時候亦同。以前,用於高真空使用或高流率使用的貯存器必須偕同僅部分裝填的化學品(亦即,裝滿50%)使用。這就需要半導體製造商更加頻繁地更換貯存器(取下處理裝置),而且由於提高貯存器的處理費用而增加化學品的成本。本發明使得該貯存器從裝滿的液態化學品液位到降至非常低液位都能夠使用,並且縮短半導體處理裝置的停機時間。同樣地,因為能有限限制出口內的化學品懸浮粒子,所以能夠減少可能由沉積於出口及所有通往處理艙或處理裝置的輸送配管中之懸浮滴退變所引起的微粒生成現象。在此描述中,較佳為擁有一圓筒形貯存器而且該圓筒的軸在垂直面中。因此,軸向和徑向的描述都是相對於這類貯存器外形和取向而言。Semiconductor manufacturers are committed to using high-value chemicals, These chemicals are increasingly difficult to transport for deposition on wafers in vacuum chambers or processing equipment. The bubbler container of the present invention enables liquid chemicals to be transported from the reservoir in vapor form under high vacuum without splashing and forming in the outlet of the reservoir, both of which result in unstable chemical quality Delivery rate. The present invention has a subsurface design that enables a constant saturation of the carrier gas with chemical vapor to be reduced to a very low amount of residual chemical. Also, the present invention prevents aerosol dripping and formation in the reservoir outlet which results in an unstable chemical mass transfer rate, even when the chemical level in the reservoir is high. Previously, reservoirs used for high vacuum use or high flow rates had to be used with only partially filled chemicals (i.e., 50% full). This requires semiconductor manufacturers to change the reservoir more frequently (removing the processing device) and increase the cost of the chemical by increasing the processing cost of the reservoir. The present invention enables the reservoir to be used from a filled liquid chemical level to a very low level and to reduce downtime of the semiconductor processing apparatus. Likewise, because the chemical suspension particles within the outlet can be limited, it is possible to reduce the phenomenon of particle formation that may be caused by the dewatering of the droplets deposited in the outlet and in all of the transfer piping to the processing chamber or processing unit. In this description, it is preferred to have a cylindrical reservoir and the axis of the cylinder is in a vertical plane. Thus, both axial and radial descriptions are relative to the shape and orientation of such reservoirs.
本發明將該貯存器側壁的內表面上之徑向向內伸出的環狀偏轉突出部與該貯存器上部的一或更多擋盤聯合使用,其通過使攜帶有化學前驅物的載氣於一狹窄的環狀空間中曲折地流到該偏轉突出部的徑向最內邊緣及該等擋盤的 外側,而使該帶有化學前驅物的載氣間接地通到該貯存器出口,其中該狹窄的環狀空間係介於該氣泡器側壁內表面的內徑及該等擋盤的最外直徑或圓周或周長邊緣之間。這將引用本發明的較佳具體實施例加以舉例說明。The present invention uses a radially inwardly projecting annular deflecting projection on the inner surface of the side wall of the reservoir in combination with one or more retaining discs on the upper portion of the reservoir, by passing a carrier gas carrying a chemical precursor Swirling in a narrow annular space to the radially innermost edge of the deflecting projection and the retaining discs Outside, the carrier gas with a chemical precursor is indirectly passed to the outlet of the reservoir, wherein the narrow annular space is between the inner diameter of the inner surface of the side wall of the bubbler and the outermost diameter of the spacers Or between the circumference or the perimeter edge. This will be exemplified by reference to preferred embodiments of the invention.
圖1顯示本發明的氣泡器貯存器10,其具有圓筒形的氣泡器側壁12,而且浸管入口14的入口端終止於液態化學前驅物的液面之下(該液面大致以線15例示),但是於該貯存器基部13上方。1 shows a bubbler reservoir 10 of the present invention having a cylindrical bubbler sidewall 12, and the inlet end of the dip tube inlet 14 terminates below the level of the liquid chemical precursor (the level is substantially line 15 Illustrative), but above the reservoir base 13.
該防濺器包含:(1)擋盤24;及(2)於該側壁12的內表面23上之徑向向內伸出的環狀偏轉突出部22,其中擋板24具有一最外圓周周長邊緣形狀(較佳為圓形),並且向下凹(例如,淺型下開式錐體);該擋盤24和偏轉突出部22合力作用以實現供化學前驅物離開該貯存器10用的曲折流動路徑。該擋盤24向下凹,以便進一步阻撓化學前驅物到該出口16的直接流動,並且通過使凝聚的液滴掉回儲存的化學前驅物(未例示)中收集返還之凝結的化學前驅物。該擋盤24的直徑比該貯存器10的側壁12的圓筒形內表面23的內徑稍小一些。該擋盤24的圓周周長最外邊緣與該貯存器10的側壁12的內表面23之間的空間足以使氣體以最小的壓降通過該空間,但是該空間也夠狹窄而能將液體通路減至最細,該液體可能在穿過該浸管的載氣之高流率或顯著壓力波動的作用之下從該氣泡器的液體內容物噴出。該貯存器10具有一上部17和一下部11及一示範性液面高度15,液面高度15基於填充的程度和分配的持續時間會經歷改變,但是通常都在偏轉 突出部22和擋盤24之下及該入口14和該液位感測器28的末端(分別為27a和27b)上方。The splash guard comprises: (1) a retaining disk 24; and (2) a radially inwardly projecting annular deflecting projection 22 on the inner surface 23 of the side wall 12, wherein the baffle 24 has an outermost circumference The perimeter has an edge shape (preferably circular) and is concave downward (eg, a shallow lower open cone); the retaining disk 24 and the deflecting projection 22 cooperate to effect removal of the chemical precursor from the reservoir 10 The tortuous flow path used. The baffle 24 is recessed to further obstruct the direct flow of the chemical precursor to the outlet 16 and collect the returned condensed chemical precursor by dropping the agglomerated droplets back into the stored chemical precursor (not illustrated). The diameter of the retaining disk 24 is slightly smaller than the inner diameter of the cylindrical inner surface 23 of the side wall 12 of the reservoir 10. The space between the outermost edge of the circumferential circumference of the retaining disk 24 and the inner surface 23 of the side wall 12 of the reservoir 10 is sufficient to allow gas to pass through the space with minimal pressure drop, but the space is also narrow enough to allow liquid passage To the finest, the liquid may be ejected from the liquid contents of the bubbler under the effect of high flow rates or significant pressure fluctuations of the carrier gas passing through the dip tube. The reservoir 10 has an upper portion 17 and a lower portion 11 and an exemplary liquid level height 15, which varies according to the degree of filling and the duration of the dispense, but is usually deflected Above the projection 22 and the stop 24 and above the inlet 14 and the end of the level sensor 28 (27a and 27b, respectively).
圖2顯示該具體實施例的貯存器內部結構的隔離而沒有例示該浸管14。據示一液面感測器28係位於該貯存器中間以便監測液態化學品的液位。該液面感測器的末端接近該貯存器10的基部13。閥30控制推動氣體或者載氣穿過入口14引進該貯存器的下部,該載氣在該貯存器的下部起泡穿過該液態化學品,將該化學品的蒸氣挾帶於該載氣的氣泡中。當該載氣離開該進氣浸管14的下端時,該載氣的起泡動作會引起液態化學品的強烈攪動。當閥26打開時,該出口16上的高真空也會造成該液態化學品的強烈或劇烈攪動。這些任一者均會導致液態化學品朝該出口16起泡或飛濺。與該貯存器或氣泡器10的側壁12相關聯的徑向向內伸出的環狀偏轉突出部22用來使任何起泡或飛濺的液態化學品偏轉以免靠近該擋盤24的最外邊緣,以便保護該出口16的入口端32,以免攝入了液態化學品,而不是指定之被攜於載氣內的化學品蒸氣。該擋盤24和該偏轉突出部22形成供化學前驅物離開該貯存器10用的曲折流動路徑38。Figure 2 shows the isolation of the internal structure of the reservoir of this particular embodiment without exemplifying the dip tube 14. A level sensor 28 is shown positioned intermediate the reservoir to monitor the level of liquid chemicals. The end of the level sensor is adjacent to the base 13 of the reservoir 10. The valve 30 controls the push gas or carrier gas to be introduced into the lower portion of the reservoir through the inlet 14, the carrier gas is bubbled through the liquid chemical at the lower portion of the reservoir, and the vapor of the chemical is carried to the carrier gas. In the bubble. When the carrier gas leaves the lower end of the intake dip tube 14, the bubbling action of the carrier gas causes a strong agitation of the liquid chemical. When the valve 26 is opened, the high vacuum on the outlet 16 can also cause intense or vigorous agitation of the liquid chemical. Either of these can cause liquid chemicals to bubble or splash toward the outlet 16. A radially inwardly projecting annular deflecting projection 22 associated with the side wall 12 of the reservoir or bubbler 10 is used to deflect any foaming or splashing liquid chemicals from the outermost edge of the retaining disk 24. In order to protect the inlet end 32 of the outlet 16 from ingesting liquid chemicals, rather than specifying the chemical vapor carried within the carrier gas. The baffle 24 and the deflecting projection 22 form a tortuous flow path 38 for the chemical precursor to exit the reservoir 10.
在一較佳具體實施例中,該偏轉突出部22在從不銹鋼坯料的實心件銑削成該貯存器或氣泡器10的期間由該側壁12的一部分形成。該偏轉突出部22能夠具有錐形的斷面構造,其最內邊緣34終止於該擋盤24的最外邊緣36的徑向內側。偏轉突出部可以是一完全圍繞於該側壁12的內表面23形成的環狀緣。該擋板24和該偏轉突出部22的組合形成 供該載氣和其所攜帶的化學品蒸氣用的曲折流動路徑38,這樣的路徑對於液相化學品而言極難隨行。In a preferred embodiment, the deflecting projection 22 is formed from a portion of the sidewall 12 during milling from the solid member of the stainless steel blank into the reservoir or bubbler 10. The deflecting projection 22 can have a tapered cross-sectional configuration with its innermost edge 34 terminating radially inward of the outermost edge 36 of the retaining disk 24. The deflecting projection may be an annular rim formed entirely around the inner surface 23 of the side wall 12. The combination of the baffle 24 and the deflecting projection 22 forms A tortuous flow path 38 for the carrier gas and the chemical vapor it carries, such a path is extremely difficult for liquid phase chemicals to follow.
較佳地,該擋盤24軸向間隔地設置在該偏轉突出部22的上方以提供一極狹窄的流動路徑,蒸氣能夠流動,但是液體有困難,也就是說,該擋盤24與該偏轉突出部22彼此接近。也可以,該擋板24能軸向間隔地設置在該偏轉突出部22的下方。此外,也可以,本發明設想多重擋盤,例如一擋盤24軸向間隔地設置在該偏轉突出部上方及一擋盤24a軸向間隔地設置在偏轉突出部下方,圖3;二擋盤24及24b均軸向間隔地設置在該偏轉突出部上方,圖5;二擋盤24c及24d均軸向間隔地設置在該偏轉突出部下方,圖4;在每一擋盤上方和下方軸向間隔地設置一偏轉突出部;以及多數擋盤和偏轉突出部;所有這些均優選如上文所定義般彼此鄰近。Preferably, the retaining disk 24 is axially spaced above the deflecting projection 22 to provide a very narrow flow path for vapor to flow, but the liquid is difficult, that is, the retaining disk 24 and the deflection The projections 22 are close to each other. It is also possible that the baffle 24 is disposed axially spaced below the deflecting projection 22. In addition, the present invention contemplates multiple retaining discs, for example, a retaining disc 24 is disposed axially spaced above the deflecting projection and a retaining disc 24a is axially spaced below the deflecting projection, FIG. 3; 24 and 24b are both disposed axially spaced above the deflecting projection, Figure 5; the second retaining discs 24c and 24d are each axially spaced below the deflecting projection, Figure 4; above and below each of the retaining discs A deflecting projection is provided at intervals; and a plurality of retaining discs and deflecting projections; all of which are preferably adjacent to one another as defined above.
經驗顯示氣泡能夠從該進氣浸管14的末端沿該貯存器或氣泡器10的側壁12上行,在相鄰於該貯存器10側壁12的內表面23處產生最大可能的液流體飛濺流。因此,在一具體實施例中,該偏轉突出部包括被形成為在該偏轉突出部22的最內邊緣34下方軸向間隔開的徑向向內伸出的環狀邊緣之肩部21。該偏轉突出部22與肩部21成比例以致於該偏轉突出部22徑向向內伸出超過該肩部21的徑向向內伸出量。此肩部可以是整個偏轉突出部22之一構成整體的部分,並且能於用單塊不銹鋼坯料或其他金屬坯料形成偏轉突出部的同時被機械加工。肩部21具有二功能。肩部21與該內表面23之間構成一銳角,因而將沿著該內表面向上流動的 液體再引入該貯存器10的內部,從而遠離由該擋板24和該偏轉突出部22各自的邊緣所形成的曲折路徑38。此外,該偏轉突出部22上收集的任何液體均排到該肩部21,然後掉回到收納於該貯存器或氣泡器10下部的液態化學品中。Experience has shown that air bubbles can travel from the end of the intake dip tube 14 along the side wall 12 of the reservoir or bubbler 10, creating the greatest possible splash of liquid fluid at the inner surface 23 adjacent the side wall 12 of the reservoir 10. Thus, in a particular embodiment, the deflecting projection includes a shoulder 21 formed as an annular, radially inwardly projecting annular edge that is axially spaced below the innermost edge 34 of the deflecting projection 22. The deflecting projection 22 is proportional to the shoulder 21 such that the deflecting projection 22 projects radially inwardly beyond the radially inwardly projecting amount of the shoulder 21. This shoulder may be an integral part of one of the entire deflecting projections 22 and can be machined while forming the deflecting projections from a single piece of stainless steel blank or other metal blank. The shoulder 21 has two functions. An acute angle is formed between the shoulder 21 and the inner surface 23, and thus will flow upward along the inner surface The liquid is reintroduced into the interior of the reservoir 10 away from the tortuous path 38 formed by the respective edges of the baffle 24 and the deflecting projection 22. Further, any liquid collected on the deflecting projection 22 is discharged to the shoulder 21 and then dropped back into the liquid chemical contained in the lower portion of the reservoir or bubbler 10.
據示擋盤24和偏轉突出部22較佳係於該貯存器的上方區17(但要咸能理解其他的定位也是可能考慮,只要是其係高於該貯存器中所裝填的化學品的標準上限),或頂部空間或出水高度,這是熟悉此技藝者均能理解的,但至少高於液位15。The shunt plate 24 and the deflecting projection 22 are preferably attached to the upper region 17 of the reservoir (although it is also possible to understand other positioning as long as it is higher than the chemical loaded in the reservoir). The standard upper limit), or the headspace or effluent height, is understood by those skilled in the art, but at least above the liquid level 15.
儘管此具體實施例將該偏轉突出部22和肩部21顯示為與彼此和側壁合為一體,但是預期該偏轉突出部22和肩部21均可能是附接於該側壁12的分離件,例如通過焊接、摩擦接合或機械緊固(例如螺栓、螺釘和類似緊固件)。即使是呈分離件的形式,偏轉突出部22和肩部21也可以與彼此合為一體,或彼此是分離件。Although this particular embodiment shows the deflecting projection 22 and the shoulder 21 as being integral with each other and the side wall, it is contemplated that both the deflecting projection 22 and the shoulder 21 may be separate pieces attached to the side wall 12, such as By welding, frictional joints or mechanical fastening (such as bolts, screws and similar fasteners). Even in the form of a separate piece, the deflecting projection 22 and the shoulder 21 may be integrated with each other or may be separate pieces from each other.
該偏轉突出部22、肩部21和擋盤24協力形成供待穿過該出口16進行分配的化學品的曲折流動路徑38。在某些情況中,在高真空和高流率之下,該液體傾向於在液體表面15上形成泡沫,並進入該貯存器10的上方區17之頂部空間中。由該偏轉突出部22、肩部21和擋盤24所形成的曲折流動路徑38實質上防止這種泡沫到達該出口16。The deflecting projection 22, shoulder 21 and retaining disk 24 cooperate to form a tortuous flow path 38 for the chemical to be dispensed through the outlet 16. In some cases, under high vacuum and high flow rates, the liquid tends to form a foam on the liquid surface 15 and into the headspace of the upper region 17 of the reservoir 10. The tortuous flow path 38 formed by the deflecting projection 22, the shoulder 21 and the retaining disk 24 substantially prevents such foam from reaching the outlet 16.
儘管關於某些具體實施例提到了不銹鋼,但是要理解的是,本發明能夠應用於不同的金屬、玻璃和塑膠上,包括低碳鋼(mild steel)、蒙乃爾合金(Monel alloy)、哈司特鎳 合金(Hastelloy alloy)、鎳合金及熟悉此技藝者已知的構造之類似材料。Although stainless steel is mentioned with respect to certain embodiments, it is to be understood that the invention can be applied to different metals, glass and plastics, including mild steel, Monel alloy, Hass. Nickel Hastelloy alloy, nickel alloy, and similar materials known to those skilled in the art.
本發明在連接到電子元件裝配系統的CVD處理裝置之貯存器的出口和下游配管中提供了液滴形式的液體攜帶量之極度最小化。使用單一擋盤或多重擋盤結合偏轉突出部,將於該氣泡器的出口16中提供如預期的液體攜帶量最少化。The present invention provides an extreme minimization of the amount of liquid carried in the form of droplets in the outlet and downstream piping of the reservoir of the CVD processing apparatus connected to the electronic component assembly system. The use of a single or multiple retaining disc in combination with the deflecting projections will provide as much liquid carryover as expected in the outlet 16 of the bubbler.
儘管據顯示擋盤係為帶有凹部的圓形盤,其中該盤的直徑比該圓筒形容器或氣泡器側壁的內徑稍微更小一些,但是咸能理解,於該貯存器內部側壁處僅提供一狹窄環狀空間的任意形狀的任意擋盤均在本發明的範疇以內。同樣地,具有平滑且徑向向內伸出的邊緣或具有離平滑環狀彎曲有某些偏差的邊緣之任意形式的偏轉突出部均被認為是本發明的一部分。Although it is shown that the retaining disk is a circular disk with a recess, wherein the diameter of the disk is slightly smaller than the inner diameter of the cylindrical container or the side wall of the bubbler, it can be understood that at the inner side wall of the reservoir Any of the discs of any shape providing only a narrow annulus is within the scope of the present invention. Likewise, any form of deflecting projection having a smooth and radially inwardly projecting edge or having an edge that is somewhat offset from a smooth annular bend is considered part of the present invention.
儘管較佳是使用不銹鋼,但是設想任意剛性形式的惰性材料均能用於該防濺器。塑膠、金屬合金、粉末金屬、布料、紡織品及陶瓷都可以考慮。Although stainless steel is preferred, it is contemplated that any rigid form of inert material can be used for the splash guard. Plastics, metal alloys, powdered metals, fabrics, textiles and ceramics can all be considered.
容器10也能用於反向的產品流動,其中出口16發揮加壓氣體入口的功能,以便形成作用於收納於該容器10的液體上之壓頭,並迫使該液體以液相形式排出該浸管14,而與上述蒸氣輸送不同地利用加壓氣體進行來自該貯存器的液體輸送。The container 10 can also be used for reverse product flow wherein the outlet 16 functions as a pressurized gas inlet to form an indenter that acts on the liquid contained in the container 10 and forces the liquid to discharge the dip in liquid phase. The tube 14 carries out liquid delivery from the reservoir using pressurized gas, unlike the vapor delivery described above.
10‧‧‧氣泡器貯存器10‧‧‧ bubbler reservoir
11‧‧‧貯存器下部11‧‧‧ Lower part of the reservoir
12‧‧‧氣泡器側壁12‧‧‧Bubble side wall
13‧‧‧貯存器基部13‧‧‧Storage base
14‧‧‧浸管14‧‧‧ dip tube
15‧‧‧液面高度15‧‧‧Liquid height
16‧‧‧出口16‧‧‧Export
17‧‧‧貯存器上部17‧‧‧ Upper part of the reservoir
21‧‧‧肩部21‧‧‧ shoulder
22‧‧‧突出部22‧‧‧Protruding
23‧‧‧內表面23‧‧‧ inner surface
24‧‧‧擋盤24‧‧‧
26‧‧‧閥26‧‧‧Valves
27a‧‧‧浸管入口末端27a‧‧‧End of dip tube inlet
27b‧‧‧液面感測器末端27b‧‧‧Liquid sensor end
30‧‧‧閥30‧‧‧ valve
28‧‧‧液面感測器28‧‧‧Liquid sensor
32‧‧‧入口端32‧‧‧ entrance end
Claims (11)
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US13/350,989 US8944420B2 (en) | 2009-03-19 | 2012-01-16 | Splashguard for high flow vacuum bubbler vessel |
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TWI480418B true TWI480418B (en) | 2015-04-11 |
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KR (1) | KR20130084265A (en) |
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KR101585054B1 (en) * | 2014-05-09 | 2016-01-14 | 한국생산기술연구원 | Liquid Precursor Delivery System |
US10443128B2 (en) * | 2015-04-18 | 2019-10-15 | Versum Materials Us, Llc | Vessel and method for delivery of precursor materials |
US11926894B2 (en) * | 2016-09-30 | 2024-03-12 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
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US2742886A (en) * | 1954-11-01 | 1956-04-24 | Solomon P Scholl | Fuel generator for internal combustion engines |
US5199963A (en) * | 1992-07-30 | 1993-04-06 | Scarp Arcoline J | Dual filtering vacuum system |
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JPS60170965U (en) * | 1984-04-20 | 1985-11-13 | 日本電池株式会社 | Storage battery liquid stopper |
JPH0644027Y2 (en) * | 1989-06-02 | 1994-11-14 | 古河電池株式会社 | Liquid outlet plug for storage battery |
JPH06196419A (en) * | 1992-12-24 | 1994-07-15 | Canon Inc | Chemical vapor deposition device and manufacture of semiconductor device using same |
JPH09234320A (en) * | 1996-03-01 | 1997-09-09 | Bio Giken Kogyo:Kk | Treatment method for waste gas and apparatus therefor |
JPH1064751A (en) * | 1996-08-14 | 1998-03-06 | Nissin Electric Co Ltd | Gas-insulated d-c capacitor |
JP3615895B2 (en) * | 1997-02-13 | 2005-02-02 | 松下電器産業株式会社 | Liquid cap for lead acid battery |
US7186385B2 (en) * | 2002-07-17 | 2007-03-06 | Applied Materials, Inc. | Apparatus for providing gas to a processing chamber |
JP2005197148A (en) * | 2004-01-09 | 2005-07-21 | Yuasa Corp | Vent plug for lead-acid battery and lead-acid battery |
US8708320B2 (en) * | 2006-12-15 | 2014-04-29 | Air Products And Chemicals, Inc. | Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel |
US8162296B2 (en) * | 2009-03-19 | 2012-04-24 | Air Products And Chemicals, Inc. | Splashguard for high flow vacuum bubbler vessel |
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2013
- 2013-01-11 TW TW102101206A patent/TWI480418B/en active
- 2013-01-16 KR KR1020130004916A patent/KR20130084265A/en not_active Application Discontinuation
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Publication number | Priority date | Publication date | Assignee | Title |
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US2742886A (en) * | 1954-11-01 | 1956-04-24 | Solomon P Scholl | Fuel generator for internal combustion engines |
US5199963A (en) * | 1992-07-30 | 1993-04-06 | Scarp Arcoline J | Dual filtering vacuum system |
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TW201331410A (en) | 2013-08-01 |
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