TWI479615B - Semiconductor package and heat sink thereof - Google Patents

Semiconductor package and heat sink thereof Download PDF

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Publication number
TWI479615B
TWI479615B TW101129860A TW101129860A TWI479615B TW I479615 B TWI479615 B TW I479615B TW 101129860 A TW101129860 A TW 101129860A TW 101129860 A TW101129860 A TW 101129860A TW I479615 B TWI479615 B TW I479615B
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Taiwan
Prior art keywords
hole
semiconductor package
carrier
perforation
wall
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TW101129860A
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Chinese (zh)
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TW201409626A (en
Inventor
賴清文
陳建志
賴裕庭
黃承文
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矽品精密工業股份有限公司
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Priority to TW101129860A priority Critical patent/TWI479615B/en
Priority to CN201210305500.7A priority patent/CN103594429B/en
Publication of TW201409626A publication Critical patent/TW201409626A/en
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Publication of TWI479615B publication Critical patent/TWI479615B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

Description

半導體封裝結構及其散熱件Semiconductor package structure and heat sink

本發明係有關一種半導體封裝結構,尤指一種具散熱件之半導體封裝結構及其散熱件。The present invention relates to a semiconductor package structure, and more particularly to a semiconductor package structure having a heat sink and a heat sink thereof.

在現行之半導體封裝結構之散熱技術中,常於結構外側設置散熱件,以藉由該散熱件與空氣接觸而作為散熱途徑,如第1圖所示之半導體封裝結構1,其具有一封裝基板10、設於該封裝基板10上之一半導體元件11、設於該封裝基板10上以覆蓋該半導體元件11之散熱件12、以及包覆該半導體元件11及散熱件12側部之封裝膠體13。其中,該散熱件12具有一中央直通孔120,以令該封裝膠體13經由該中央直通孔120填入該散熱件12內側以包覆該半導體元件11。In the heat dissipation technology of the current semiconductor package structure, a heat dissipating member is often disposed outside the structure to serve as a heat dissipation path by contacting the heat dissipating member with air, such as the semiconductor package structure 1 shown in FIG. 1 having a package substrate. 10. A semiconductor component 11 disposed on the package substrate 10, a heat sink 12 disposed on the package substrate 10 to cover the semiconductor component 11, and an encapsulant 13 covering the semiconductor component 11 and the side of the heat sink 12 . The heat dissipating member 12 has a central through hole 120 for filling the encapsulant 13 through the central through hole 120 to cover the semiconductor element 11 .

然而,習知半導體封裝結構1之製法中,該封裝膠體13包覆該散熱件12側部,致使該散熱件12之部分面積無法與空氣接觸,導致散熱效果差。However, in the manufacturing method of the conventional semiconductor package structure 1, the encapsulant 13 covers the side of the heat dissipating member 12, so that a part of the area of the heat dissipating member 12 cannot be in contact with air, resulting in poor heat dissipation.

再者,藉由該中央直通孔120作為灌膠途徑,容易發生溢膠之問題。Moreover, by using the central through hole 120 as a glue filling route, the problem of overflowing the glue is likely to occur.

第2A至2B圖係為習知半導體封裝結構2之製法的剖視示意圖。如第2A圖所示,設置一半導體元件21於一導線架20上,再設置一散熱件22於該導線架20上以覆蓋該半導體元件21;接著,設置一模具24以包覆該導線架20與散熱件22。2A to 2B are schematic cross-sectional views showing a manufacturing method of the conventional semiconductor package structure 2. As shown in FIG. 2A, a semiconductor component 21 is disposed on a lead frame 20, and a heat sink 22 is disposed on the lead frame 20 to cover the semiconductor component 21. Next, a mold 24 is disposed to cover the lead frame. 20 and heat sink 22.

其中,該散熱件22具有一中央直通孔220及位於周圍之下尖孔221,該中央直通孔220與該模具24之灌膠道243結合成一漏斗狀,以利於該封裝膠體23經由該中央直通孔220填入該散熱件22內側以包覆該半導體元件21,而能均勻且快速地完成灌膠,並藉由該下尖孔221可於灌膠時減輕模內壓力。再者,該模具24係具有三個模件240,241,242,且各該模件240,241,242之間需有間隙,以排出該封裝膠體23中之氣體。The heat dissipating member 22 has a central through hole 220 and a lower peripheral hole 221. The central through hole 220 is combined with the glue channel 243 of the mold 24 to form a funnel shape, so that the encapsulant 23 can pass through the central through line. The hole 220 is filled in the inner side of the heat sink 22 to cover the semiconductor element 21, and the filling can be completed uniformly and quickly, and the lower tip hole 221 can reduce the pressure in the mold during the filling. Furthermore, the mold 24 has three modules 240, 241, 242, and a gap is required between each of the modules 240, 241, 242 to discharge the gas in the encapsulant 23.

如第2B圖所示,形成封裝膠體23以包覆該半導體元件21之後,再移除該模具24。因該封裝膠體23完全封在該散熱件22內,使該散熱件22外側能完全與空氣接觸,因而能有效散熱。As shown in FIG. 2B, after the encapsulant 23 is formed to cover the semiconductor element 21, the mold 24 is removed. Since the encapsulant 23 is completely enclosed in the heat dissipating member 22, the outer side of the heat dissipating member 22 can be completely in contact with the air, thereby effectively dissipating heat.

然而,習知半導體封裝結構2之製法中,因各該模件240,241,242之間具有間隙,致使當進行灌膠時,會於各該模件240,241,242之間的界面處發生溢膠之問題,故於脫模後,該半導體封裝結構2之表面處會有殘膠K。However, in the manufacturing method of the conventional semiconductor package structure 2, since there is a gap between the respective modules 240, 241, 242, when the glue is applied, a problem of overflowing at the interface between the modules 240, 241, 242 occurs, so After demolding, there is residual glue K at the surface of the semiconductor package structure 2.

第3A至3B圖係為習知半導體封裝結構3之示意圖。該半導體封裝結構3具有一封裝基板30、設於該封裝基板30上之一半導體元件31、設於該封裝基板30上以覆蓋該半導體元件31之散熱件32、以及包覆該半導體元件31及散熱件32側部之封裝膠體33。3A to 3B are schematic views of a conventional semiconductor package structure 3. The semiconductor package structure 3 includes a package substrate 30, a semiconductor component 31 disposed on the package substrate 30, a heat sink 32 disposed on the package substrate 30 to cover the semiconductor component 31, and a semiconductor component 31 and The encapsulant 33 on the side of the heat sink 32.

其中,該散熱件32之中央具有一碗型孔330,以令該封裝膠體33經由該碗型孔330填入該散熱件32內側以包覆該半導體元件31,且該散熱件32之四個角落具有通孔 331,當封裝時,該封裝膠體33中之氣體可由該些通孔331逸出,以避免於該封裝膠體33中產生空洞(void)現象。The central portion of the heat dissipating member 32 has a bowl-shaped hole 330, so that the encapsulant 33 is filled into the inner side of the heat dissipating member 32 via the bowl-shaped hole 330 to cover the semiconductor element 31, and four of the heat dissipating members 32 Corner with through hole When the package is encapsulated, the gas in the encapsulant 33 can escape from the through holes 331 to avoid a void phenomenon in the encapsulant 33.

然而,習知半導體封裝結構3之製法中,該碗型孔330之孔壁外表面320a係為平整弧面,故該封裝膠體33將順勢朝該些通孔331流動,致使於該些通孔331處容易溢膠,因而造成該封裝膠體33之浪費。However, in the manufacturing method of the conventional semiconductor package structure 3, the outer surface 320a of the hole of the bowl-shaped hole 330 is a flat curved surface, so that the encapsulant 33 will flow toward the through holes 331, so that the through holes are formed. 331 is easy to overflow, thus causing waste of the encapsulant 33.

再者,該封裝膠體33係包覆該散熱件32側部,致使無法完全排除空洞(void)現象,以致於無法有效散熱。Moreover, the encapsulant 33 covers the side of the heat sink 32, so that the void phenomenon cannot be completely eliminated, so that heat cannot be effectively dissipated.

第4A至4B圖係為習知半導體封裝結構4之製法的剖視示意圖。如第4A圖所示,設置一半導體元件41於一封裝基板40上,再設置一散熱件42於該封裝基板40上以覆蓋該半導體元件41,且該散熱件42具有一中央上尖孔421。接著,設置一模具44以包覆該封裝基板40與散熱件42,使封裝膠體43由側面填入該散熱件42內。4A to 4B are schematic cross-sectional views showing a method of fabricating the conventional semiconductor package structure 4. As shown in FIG. 4A, a semiconductor device 41 is disposed on a package substrate 40, and a heat dissipation member 42 is disposed on the package substrate 40 to cover the semiconductor device 41. The heat dissipation member 42 has a central upper hole 421. . Next, a mold 44 is disposed to cover the package substrate 40 and the heat sink 42 so that the encapsulant 43 is filled into the heat sink 42 from the side.

如第4B圖所示,該封裝膠體43包覆該半導體元件41。當進行側面灌膠模壓製程時,可藉由該中央上尖孔421將該封裝膠體43中之空氣排出,並可防止爆米花效應(popcorn effect)及改進封裝結構可靠性。As shown in FIG. 4B, the encapsulant 43 covers the semiconductor element 41. When the side potting mold is pressed, the air in the encapsulant 43 can be discharged by the central upper sharp hole 421, and the popcorn effect can be prevented and the reliability of the package structure can be improved.

惟,習知半導體封裝結構4之製法中,藉由側面灌膠之方式,其灌膠效率不好,且因該中央上尖孔421之設計導致模內壓力不均勻,並容易於該中央上尖孔421處發生溢膠之問題。However, in the manufacturing method of the conventional semiconductor package structure 4, the potting efficiency is not good by the side potting method, and the pressure in the mold is uneven due to the design of the central upper sharp hole 421, and is easy to be on the center. A problem of overflowing the glue at the sharp hole 421 occurs.

因此,如何克服上述習知技術的種種問題,實已成目前亟欲解決的課題。Therefore, how to overcome the various problems of the above-mentioned prior art has become a problem that is currently being solved.

鑑於上述習知技術之種種缺失,本發明提供一種散熱件,係包括:本體,係具有引通道、相對之第一表面與第二表面,該引通道係具有穿孔與凹陷結構,該穿孔係具有孔壁、與該第一表面同側之第一孔端、及與該第二表面同側之第二孔端,且該穿孔係令該第一與第二表面相互連通,並且該凹陷結構係連結該穿孔之孔壁周圍;以及支撐部,係設於該本體上並向外延伸。In view of the above-mentioned various deficiencies of the prior art, the present invention provides a heat dissipating member, comprising: a body having a lead passage, an opposite first surface and a second surface, the lead passage having a perforated and recessed structure, the perforation having a hole wall, a first hole end on the same side as the first surface, and a second hole end on the same side as the second surface, and the perforation causes the first and second surfaces to communicate with each other, and the recess structure A wall surrounding the hole of the perforation; and a support portion is disposed on the body and extends outward.

本發明復提供一種半導體封裝結構,係包括:承載件;半導體元件,係設置並電性連接於該承載件上;如前述之散熱件,係以其支撐部設於該承載件上,以令該散熱件與該承載件之間形成容置空間,使該半導體元件位於該容置空間中,且該穿孔與該凹陷結構係連通該容置空間,又該本體之第一表面與該穿孔之第一孔端係遠離該承載件,而該本體之第二表面與該穿孔之第二孔端係靠近該承載件;以及封裝膠體,係形成於該容置空間與該凹陷結構中,以包覆該半導體元件。The present invention further provides a semiconductor package structure, comprising: a carrier; a semiconductor component disposed and electrically connected to the carrier; wherein the heat sink is disposed on the carrier with a support portion thereof An accommodating space is formed between the heat dissipating member and the carrier, so that the semiconductor component is located in the accommodating space, and the through hole and the recessed structure are connected to the accommodating space, and the first surface of the body and the through hole are The first hole end is away from the carrier, and the second surface of the body and the second hole end of the hole are close to the carrier; and the encapsulant is formed in the accommodating space and the recess structure to package The semiconductor component is covered.

前述之散熱件及半導體封裝結構中,該支撐部係具有腳端,以置於一承載面(或承載件)上。In the above heat sink and semiconductor package structure, the support portion has a foot end for being placed on a bearing surface (or a carrier).

前述之散熱件及半導體封裝結構中,該第一孔端之孔徑係大於該第二孔端之孔徑。In the heat sink and the semiconductor package structure, the aperture of the first hole end is larger than the aperture of the second hole end.

前述之散熱件及半導體封裝結構中,該穿孔之第一孔端係凸伸於該本體之第一表面,而該凹陷結構係具有連通該本體第二表面之開口,且該開口底部連結該穿孔之第一 孔端周圍。In the above heat sink and the semiconductor package structure, the first hole end of the through hole protrudes from the first surface of the body, and the recess structure has an opening that communicates with the second surface of the body, and the bottom of the opening connects the hole First Around the end of the hole.

前述之散熱件及半導體封裝結構中,該凹陷結構係與該穿孔之孔壁為一體,且該凹陷結構與該穿孔之孔壁係為階梯狀、曲折面狀或曲面狀。In the heat sink and the semiconductor package structure, the recessed structure is integral with the hole wall of the through hole, and the hole structure and the hole wall of the hole are stepped, meandered or curved.

另外,前述之散熱件及半導體封裝結構中,該穿孔之第一孔端與第二孔端係分別凸伸於該第一表面與該第二表面,該凹陷結構之一部分係具有連通該第二表面之開口,且該開口底部連結該穿孔之第一孔端周圍,而另一部分係與該穿孔之孔壁為一體,且該凹陷結構與該穿孔之孔壁係為階梯狀、曲折面狀或曲面狀。In addition, in the heat dissipating member and the semiconductor package structure, the first hole end and the second hole end of the through hole respectively protrude from the first surface and the second surface, and one part of the recess structure has a second connection An opening of the surface, and the bottom of the opening is connected around the first hole end of the perforation, and the other part is integral with the hole wall of the perforation, and the hole structure and the hole wall of the perforation are stepped, meandered or Curved.

由上可知,本發明之半導體封裝結構及其散熱件,係藉由該散熱件之引通道的設計,令該凹陷結構作為緩衝膠體流動之設計,以抑制溢膠,而避免於該穿孔處發生溢膠問題。It can be seen from the above that the semiconductor package structure and the heat dissipating member thereof of the present invention are designed by using the guiding channel of the heat dissipating member to make the recessed structure act as a buffer colloid to suppress overflow and avoid the occurrence of the perforation. Overfilling problem.

以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。The other embodiments of the present invention will be readily understood by those skilled in the art from this disclosure.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術 內容得能涵蓋之範圍內。同時,本說明書中所引用之如“上”、“下”、“第一”、“第二”及“一”等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。It is to be understood that the structure, the proportions, the size, and the like of the present invention are intended to be used in conjunction with the disclosure of the specification, and are not intended to limit the invention. The conditions are limited, so it is not technically meaningful. Any modification of the structure, change of the proportional relationship or adjustment of the size should remain in this book without affecting the effects and the objectives that can be achieved by the present invention. Technology disclosed by the invention The content can be covered. In the meantime, the terms "upper", "lower", "first", "second" and "one" are used in the description for convenience of description, and are not intended to limit the invention. Changes in the scope of implementation, changes or adjustments in their relative relationship, are considered to be within the scope of the present invention.

第5A至5B圖係為本發明之半導體封裝結構5之第一實施例之製法的剖面示意圖。5A to 5B are schematic cross-sectional views showing the manufacturing method of the first embodiment of the semiconductor package structure 5 of the present invention.

如第5A圖所示,設置一半導體元件51於一承載件50上並電性連接該承載件50,再結合一散熱件52於該承載件50上,以覆蓋該半導體元件51。As shown in FIG. 5A, a semiconductor component 51 is disposed on a carrier 50 and electrically connected to the carrier 50, and a heat sink 52 is coupled to the carrier 50 to cover the semiconductor component 51.

所述之散熱件52具有一本體52a、設於該本體52a邊緣之複數支撐部52b、及設於該本體52a中央處之一引通道52c,該支撐部52b係結合於該承載件50上,以令該本體52a與該承載件50之間形成一容置空間S,使該本體52a位於該半導體元件51上方。該引通道52c係具有一上下貫穿之穿孔520與連結該穿孔520之孔壁520c外表面之凹陷結構521,該穿孔520與凹陷結構521均連通該容置空間S。The heat dissipating member 52 has a main body 52a, a plurality of supporting portions 52b disposed at the edge of the main body 52a, and a guiding passage 52c disposed at the center of the main body 52a. The supporting portion 52b is coupled to the supporting member 50. An accommodating space S is formed between the body 52a and the carrier 50 such that the body 52a is located above the semiconductor component 51. The guiding passage 52c has a recessed structure 521 which penetrates the upper and lower through holes 520 and the outer surface of the hole wall 520c of the through hole 520. The through hole 520 and the recessed structure 521 both communicate with the receiving space S.

於本實施例中,該承載件50係為封裝基板、其它半導體元件或導線架,但並不限於上述,且該半導體元件51係藉由如銲線510或導電凸塊(圖略)電性連接該承載件50。該散熱件52之材質可為銅、鋁、合金或其它高導熱材。In this embodiment, the carrier 50 is a package substrate, other semiconductor components or lead frames, but is not limited thereto, and the semiconductor component 51 is electrically connected by a bonding wire 510 or a conductive bump (not shown). The carrier 50 is connected. The heat sink 52 may be made of copper, aluminum, alloy or other high thermal conductive material.

再者,該引通道52c係為凸狀體,而該穿孔520係具有遠離該承載件50之第一孔端520a與靠近該承載件50之第二孔端520b,且該第一孔端520a之孔徑大於該第二 孔端520b之孔徑。Furthermore, the guiding channel 52c is a convex body, and the through hole 520 has a first hole end 520a away from the carrier 50 and a second hole end 520b adjacent to the carrier 50, and the first hole end 520a The aperture is larger than the second The aperture of the hole end 520b.

又,該穿孔520之第一孔端520a係朝相對該承載件50之方向(即朝上)凸伸,令該引通道52c凸於該本體52a表面(即朝相對該承載件50之方向凸伸),且該凹陷結構521係具有朝該承載件50方向之開口521a,以令該凹陷結構521連通該容置空間S,並且該開口521a底部521b連結該穿孔520之第一孔端520a周圍。Moreover, the first hole end 520a of the through hole 520 protrudes in a direction opposite to the carrier member 50 (ie, upwards), so that the guiding channel 52c protrudes from the surface of the body 52a (ie, protrudes in a direction opposite to the carrier member 50). The recessed structure 521 has an opening 521a in the direction of the carrier 50 so that the recessed structure 521 communicates with the accommodating space S, and the bottom 521b of the opening 521a is coupled around the first hole end 520a of the through hole 520. .

另外,該支撐部52b係具有腳端523,以令該支撐部52b藉由該腳端523置於該承載件50上。In addition, the support portion 52b has a foot end 523 for the support portion 52b to be placed on the carrier 50 by the foot end 523.

於其它實施例中,該散熱件52可不具有前述之支撐部52b,亦即以其它支撐結構取代該支撐部52b,只要能將該散熱件52之引通道52c設於該半導體元件51上方即可。In other embodiments, the heat dissipating member 52 may not have the support portion 52b, that is, the supporting portion 52b may be replaced by other supporting structures, as long as the guiding channel 52c of the heat dissipating member 52 can be disposed above the semiconductor component 51. .

如第5B圖所示,經由該穿孔520,將封裝膠體53填入該容置空間S中,以包覆該半導體元件51,且該封裝膠體53復形成於該凹陷結構521中。As shown in FIG. 5B, the encapsulant 53 is filled into the accommodating space S through the through hole 520 to cover the semiconductor element 51, and the encapsulant 53 is formed in the recess structure 521.

於本發明之製法中,係藉由該凹陷結構521之設計以避免發生溢膠。具體地,當進行封裝製程時,因該穿孔520之孔壁520c外表面(即該第一孔端520a外表面)係連結該凹陷結構521,故該封裝膠體53填充至該本體52a下表面後,該封裝膠體53會流至該穿孔520中,同時亦會填入該凹陷結構521中,以緩衝該封裝膠體53之溢膠量。因此,該封裝膠體53雖會充填於該穿孔520中,但受限於該凹陷結構521之充填空間,故能避免於該穿孔520處發生溢膠。In the manufacturing method of the present invention, the design of the recessed structure 521 is used to avoid overflow. Specifically, when the encapsulation process is performed, the outer surface of the hole 520c of the through hole 520 (ie, the outer surface of the first hole end 520a) is coupled to the recess structure 521, so that the encapsulant 53 is filled to the lower surface of the body 52a. The encapsulant 53 will flow into the through hole 520 and will also be filled in the recess structure 521 to buffer the amount of overflow of the encapsulant 53. Therefore, although the encapsulant 53 is filled in the through hole 520, it is limited by the filling space of the recess structure 521, so that overflow of the perforation 520 can be avoided.

再者,於本實施例中,該封裝膠體53於該穿孔520 中之高度h2係低於該封裝膠體53於該凹陷結構521之高度h1,而於其它實施例中,該高度h2可大於或等於該高度h1。另外,該封裝膠體53之材質係含環氧樹脂。Furthermore, in the embodiment, the encapsulant 53 is in the through hole 520. The height h2 is lower than the height h1 of the encapsulation 53 at the recessed structure 521, and in other embodiments, the height h2 may be greater than or equal to the height h1. In addition, the material of the encapsulant 53 is epoxy resin.

又,如第5C及5D圖所示,於另一實施態樣中,該散熱件52’之本體52a上具有凸起部522,且該凸起部522可形成於該本體52a之邊緣(如環狀)或依需求設計。於模壓製程時,藉由該凸起部522止擋該封裝膠體53覆蓋該本體52a上側中間,使該封裝膠體53形成於該散熱件52之側面,即包覆該支撐部52b,以避免影響該本體52a之散熱效果。Moreover, as shown in the fifth embodiment, in another embodiment, the body 52a of the heat dissipating member 52' has a convex portion 522, and the convex portion 522 can be formed at the edge of the body 52a (eg, Ring) or designed according to requirements. The encapsulant 53 is formed on the side of the heat dissipating member 52, that is, the supporting portion 52b is covered to avoid the influence of the encapsulating body 53 on the side of the upper side of the main body 52a. The heat dissipation effect of the body 52a.

第6圖係為本發明之半導體封裝結構6之第二實施例的剖面示意圖。本實施例與第一實施例之差異僅在於散熱件之結構,其它相同製程與結構不再贅述。Figure 6 is a cross-sectional view showing a second embodiment of the semiconductor package structure 6 of the present invention. The difference between this embodiment and the first embodiment lies only in the structure of the heat dissipating member, and other similar processes and structures will not be described again.

如第6圖所示,該引通道62c之穿孔620之第二孔端620b係朝該承載件50方向(即朝下)凸伸,令該引通道62c位於該容置空間S中,且該凹陷結構621係與該穿孔620之孔壁620c為一體,而該凹陷結構621與該穿孔620之孔壁620c係為階梯狀。As shown in FIG. 6, the second hole end 620b of the through hole 620 of the lead-in channel 62c protrudes toward the carrier member 50 (ie, downwardly), so that the lead-in channel 62c is located in the accommodating space S, and the guide hole 62c is located in the accommodating space S. The recessed structure 621 is integral with the hole wall 620c of the through hole 620, and the recessed structure 621 and the hole wall 620c of the through hole 620 are stepped.

再者,該封裝膠體53經由該穿孔620填入該容置空間S與該凹陷結構621中,以包覆該半導體元件51。Moreover, the encapsulant 53 is filled into the accommodating space S and the recess structure 621 via the through hole 620 to cover the semiconductor element 51.

又,於另一態樣中,該凹陷結構621與該穿孔620之孔壁620c亦可為曲面狀或曲折面狀,且所述之曲面狀可為弧面或滑梯面(即底部為平面)。In another aspect, the recessed structure 621 and the hole wall 620c of the through hole 620 may also be curved or meandered, and the curved surface may be a curved surface or a sliding surface (ie, the bottom is a flat surface). .

於本發明之製法中,係藉由該引通道62c位於該容置 空間S中之設計,並藉由階梯狀結構(即該凹陷結構621)以增加溢膠之難度,而能有效抑制溢膠發生。In the manufacturing method of the present invention, the guiding channel 62c is located in the receiving portion. The design in the space S, and by the stepped structure (ie, the recessed structure 621) to increase the difficulty of overflowing, can effectively suppress the occurrence of overflow.

再者,於本實施例中,該封裝膠體53於該穿孔620中之高度h2係等於該封裝膠體53於該凹陷結構621之高度h1,而於其它實施例中,該高度h2可大於或小於該高度h1。Moreover, in the embodiment, the height h2 of the encapsulant 53 in the through hole 620 is equal to the height h1 of the encapsulant 53 in the recess structure 621, and in other embodiments, the height h2 may be greater or less than This height is h1.

第7圖係為本發明之半導體封裝結構7之第三實施例的剖面示意圖。本實施例係結合第一與第二實施例之散熱件之結構,其它相同製程與結構不再贅述。Figure 7 is a cross-sectional view showing a third embodiment of the semiconductor package structure 7 of the present invention. This embodiment combines the structures of the heat dissipating members of the first and second embodiments, and other similar processes and structures will not be described again.

如第7圖所示,該引通道72c之穿孔720之第一孔端720a與第二孔端720b係分別朝該承載件50方向(即朝下)與相對該承載件50之方向(即朝上)凸伸,令該引通道72c之一端位於該容置空間S中,而另一端凸於該本體72a表面(即朝相對該承載件50之方向凸伸),且該凹陷結構721之一部分(即下部)係與該穿孔720之孔壁720c為一體,並且該凹陷結構721與該穿孔720之孔壁720c係為階梯狀721’、曲折面狀或曲面狀(圖略),而另一部分(即上部)係具有連通該容置空間S之開口721a,且該開口721a底部721b係連結該穿孔720之第一孔端720a周圍。As shown in FIG. 7, the first hole end 720a and the second hole end 720b of the through hole 720 of the lead passage 72c are respectively directed toward the carrier 50 (ie, facing downward) and opposite to the carrier 50 (ie, toward the direction of the carrier 50). Projecting, the one end of the guiding channel 72c is located in the accommodating space S, and the other end is convex on the surface of the body 72a (ie, protruding toward the bearing member 50), and a part of the recessed structure 721 The lower portion is integral with the hole wall 720c of the through hole 720, and the concave structure 721 and the hole wall 720c of the through hole 720 are stepped 721', zigzag or curved (not shown), and the other portion The upper portion has an opening 721a that communicates with the accommodating space S, and the bottom portion 721b of the opening 721a is connected around the first hole end 720a of the through hole 720.

於本發明之製法中,係藉由該引通道72c之凹陷結構721(即該開口721a與階梯狀721’)之設計,可有效抑制溢膠,使灌膠效率更好、作業時間短,且不會發生溢膠問題。In the manufacturing method of the present invention, the design of the recessed structure 721 of the lead-through channel 72c (ie, the opening 721a and the stepped shape 721') can effectively suppress the overflow of the glue, so that the filling efficiency is better and the working time is short, and There is no overflow problem.

再者,於本實施例中,該封裝膠體53於該穿孔720 中之高度h2係高於該封裝膠體53於該凹陷結構721之高度h1,而於其它實施例中,該高度h2可小於或等於該高度h1。Furthermore, in the embodiment, the encapsulant 53 is in the through hole 720. The height h2 is higher than the height h1 of the encapsulant 53 at the recessed structure 721, and in other embodiments, the height h2 may be less than or equal to the height h1.

本發明復提供一種半導體封裝結構5,6,7,係包括:一承載件50、設置於該承載件50上之一半導體元件51、設於該承載件50上之一散熱件52,62,72、以及包覆該半導體元件51之封裝膠體53。The present invention provides a semiconductor package structure 5, 6, 7 comprising a carrier 50, a semiconductor component 51 disposed on the carrier 50, and a heat sink 52, 62 disposed on the carrier 50. 72. The encapsulant 53 encapsulating the semiconductor component 51.

所述之半導體元件51係電性連接該承載件50。The semiconductor component 51 is electrically connected to the carrier 50.

所述之散熱件52,62,72係與該承載件50之間形成形成一容置空間S,使該半導體元件51位於該容置空間S中,該散熱件52,62,72之本體52a,62a,72a具有一引通道52c,62c,72c,且該引通道52c,62c,72c係具有連通該容置空間S之一穿孔520,620,720與凹陷結構521,621,721,該穿孔520,620,720係具有孔壁520c,620c,720c、遠離該承載件50之第一孔端520a,620a,720a與靠近該承載件50之第二孔端520b,620b,720b,而該凹陷結構521,621,721係連結該穿孔520,620,720之孔壁520c,620c,720c外表面並連通該容置空間S。The heat dissipating member 52, 62, 72 is formed between the carrier member 50 and the receiving member 50 to form an accommodating space S. The semiconductor device 51 is located in the accommodating space S. The body 52a of the heat dissipating member 52, 62, 72 62a, 72a has a guiding channel 52c, 62c, 72c, and the guiding channel 52c, 62c, 72c has a through hole 520, 620, 720 and a recessed structure 521, 621, 721 connecting the receiving space S, the through hole 520, 620, 720 has a hole wall 520c, 620c , the 720c, away from the first hole end 520a, 620a, 720a of the carrier 50 and the second hole end 520b, 620b, 720b adjacent to the carrier 50, and the recessed structure 521, 621, 721 is connected to the hole wall 520c of the hole 520, 620, 720, The outer surface of the 620c, 720c is connected to the accommodating space S.

再者,該散熱件52,62,72復具有設於該本體52a,62a,72a邊緣並向外延伸之支撐部52b,62b,72b,且該支撐部52b,62b,72b係結合於該承載件50上,以令該本體52a,62a,72a與該承載件50之間形成該容置空間S。Furthermore, the heat dissipating members 52, 62, 72 have support portions 52b, 62b, 72b which are disposed at the edges of the bodies 52a, 62a, 72a and extend outward, and the support portions 52b, 62b, 72b are coupled to the load. The housing 50 is such that the receiving space S is formed between the body 52a, 62a, 72a and the carrier 50.

又,該第一孔端520a,620a,720a之孔徑係大於該第二孔端520b,620b,720b之孔徑。Moreover, the apertures of the first hole ends 520a, 620a, 720a are larger than the apertures of the second hole ends 520b, 620b, 720b.

所述之封裝膠體53係形成於該容置空間S與該凹陷結構521,621,721中。The encapsulation 53 is formed in the accommodating space S and the recessed structures 521, 621, 721.

於一實施例中,該穿孔520之第一孔端520a係朝相對該承載件50之方向凸伸,令該引通道52c朝相對該承載件50之方向凸伸,且該凹陷結構521係具有連通該容置空間S之開口521a,該開口521a底部521b並連結該穿孔520之第一孔端520a周圍。In an embodiment, the first hole end 520a of the through hole 520 protrudes in a direction opposite to the carrier member 50, so that the guiding channel 52c protrudes in a direction opposite to the carrier member 50, and the recessed structure 521 has The opening 521a of the accommodating space S is connected to the bottom 521b of the opening 521a and is connected around the first hole end 520a of the through hole 520.

於一實施例中,該穿孔620之第二孔端620b係朝該承載件50方向凸伸,令該引通道62c位於該容置空間S中,該凹陷結構621係與該穿孔620之孔壁620c為一體,且該凹陷結構621與該穿孔620之孔壁620c係為階梯狀、曲折面狀或曲面狀。In one embodiment, the second hole end 620b of the through hole 620 protrudes toward the carrier member 50, so that the guiding channel 62c is located in the accommodating space S, and the recessed structure 621 is connected to the hole wall of the through hole 620. The 620c is integrated, and the recessed structure 621 and the hole wall 620c of the through hole 620 are stepped, meandered, or curved.

於一實施例中,該穿孔720之第一孔端720a與第二孔端720b係分別朝該承載件50方向與相對該承載件50之方向凸伸,令該引通道72c之一端位於該容置空間S中,而另一端朝相對該承載件50之方向凸伸,且該凹陷結構721之一部分係與該穿孔720之孔壁720c為一體,並且該凹陷結構721與該穿孔720之孔壁720c係為階梯狀721’、曲折面狀或曲面狀,而另一部分係具有連通該容置空間S之開口721a,且該開口721a底部721b連結該穿孔720之第一孔端720a周圍。In one embodiment, the first hole end 720a and the second hole end 720b of the through hole 720 are respectively protruded toward the carrier 50 and opposite to the bearing member 50, so that one end of the guiding channel 72c is located at the end. The space S is disposed, and the other end is protruded toward the bearing member 50, and a portion of the recessed structure 721 is integral with the hole wall 720c of the through hole 720, and the recessed structure 721 and the hole wall of the through hole 720 The 720c is stepped 721', zigzag or curved, and the other portion has an opening 721a that communicates with the accommodating space S, and the bottom 721b of the opening 721a is connected around the first hole end 720a of the through hole 720.

第8A至8C圖係為本發明之散熱件8,8’,8”之不同實施例之剖視示意圖。所述之散熱件8,8’,8”係包括:一本體80以及至少一支撐部81。8A to 8C are schematic cross-sectional views showing different embodiments of the heat dissipating members 8, 8', 8" of the present invention. The heat dissipating members 8, 8', 8" include: a body 80 and at least one support Section 81.

所述之本體80係具有引通道82、相對之第一表面80a與第二表面80b。The body 80 has a lead-in passage 82 and an opposite first surface 80a and second surface 80b.

所述之支撐部81係設於該本體80上並向外延伸,且係具有腳端813,以令該支撐部81藉由該腳端813置於一承載面上。於本實施例中,該支撐部81係由該本體80之第二表面80b凸伸,但該支撐部81之形成位置並無限制,只需令該本體80下方能遮蓋物件(如半導體元件)即可。The support portion 81 is disposed on the body 80 and extends outwardly, and has a leg end 813 for placing the support portion 81 on a bearing surface by the leg end 813. In this embodiment, the support portion 81 is protruded from the second surface 80b of the body 80. However, the position of the support portion 81 is not limited, so that the object 80 can be covered under the body 80 (such as a semiconductor component). Just fine.

所述之引通道82,82’,82”係具有一穿孔820,820’,820”與一凹陷結構821,821’,821”,該穿孔820,820’,820”係具有孔壁820c,820c’,820c”、與該第一表面80a同側之第一孔端820a,820a’,820a”、及與該第二表面80b同側之第二孔端820b,820b’,820b”,且該穿孔820,820’,820”係令該第一與第二表面80a,80b相互連通,該凹陷結構821,821’,821”並連結該穿孔820,820’,820”之孔壁820c,820c’,820c”周圍,又該第一孔端820a,820a’,820a”之孔徑d大於該第二孔端820b,820b’,820b”之孔徑t。The lead passages 82, 82', 82" have a through hole 820, 820', 820" and a recessed structure 821, 821', 821" having a hole wall 820c, 820c', 820c", a first hole end 820a, 820a', 820a" on the same side of the first surface 80a, and a second hole end 820b, 820b', 820b" on the same side as the second surface 80b, and the hole 820, 820', 820 The first and second surfaces 80a, 80b are interconnected, and the recessed structures 821, 821', 821" are connected to the perforations 820, 820', 820" around the hole walls 820c, 820c', 820c", and the first hole The aperture d of the end 820a, 820a', 820a" is greater than the aperture t of the second aperture end 820b, 820b', 820b".

於一實施例中,如第8A圖所示,該穿孔820之第一孔端820a係凸伸於該本體80之第一表面80a,令該引通道82由該第一表面80a凸伸,且該凹陷結構821係具有連通該第二表面80b之開口821a,該開口821a底部821b係連結該穿孔820之第一孔端820a周圍。其中,該凹陷結構821之深度x係對應該穿孔820之孔壁820c與該本體80之間的相對高度,例如,該本體80之高度L1大於該穿孔 820之第二孔端820b的高度L2。於其它實施例中,該本體80之高度L1亦可小於或等於該穿孔820之孔壁820c之底端(即該第二孔端820b)的高度L2。In an embodiment, as shown in FIG. 8A, the first hole end 820a of the through hole 820 protrudes from the first surface 80a of the body 80, so that the lead channel 82 is protruded from the first surface 80a, and The recessed structure 821 has an opening 821a that communicates with the second surface 80b. The bottom 821b of the opening 821a is connected around the first hole end 820a of the through hole 820. The depth x of the recessed structure 821 corresponds to the relative height between the hole wall 820c of the through hole 820 and the body 80. For example, the height L1 of the body 80 is larger than the through hole. The height L2 of the second hole end 820b of 820. In other embodiments, the height L1 of the body 80 may also be less than or equal to the height L2 of the bottom end of the hole wall 820c of the through hole 820 (ie, the second hole end 820b).

於一實施例中,如第8B圖所示,該穿孔820’之孔壁820c’係由該第二表面80b凸伸,令該引通道82’由該第二表面80b凸伸,且該凹陷結構821’係與該穿孔820’之孔壁820c’為一體,且該凹陷結構821’與該穿孔820’之孔壁820c’係為階梯狀、曲折面狀或曲面狀。In an embodiment, as shown in FIG. 8B, the hole wall 820c' of the through hole 820' is protruded from the second surface 80b, so that the guiding channel 82' is protruded from the second surface 80b, and the recess The structure 821' is integral with the hole wall 820c' of the through hole 820', and the hole structure 821' and the hole wall 820c' of the hole 820' are stepped, meandered or curved.

於一實施例中,如第8C圖所示,該穿孔820”之第一孔端820a”與第二孔端820b”係分別由該第一表面80a與該第二表面80b凸伸,令該引通道82”之一端由該第一表面80a凸伸,而另一端由該第二表面80b凸伸,且該凹陷結構821”之一部分係具有連通該第二表面80b之開口821a,並且該開口821a底部821b連結該穿孔820”之第一孔端820a”周圍,而另一部分係與該穿孔820”之孔壁820c”為一體,且該凹陷結構821”與該穿孔820”之孔壁820c”係為階梯狀821c、曲折面狀或曲面狀。In an embodiment, as shown in FIG. 8C, the first hole end 820a" and the second hole end 820b" of the through hole 820" are respectively protruded from the first surface 80a and the second surface 80b, so that the One end of the guide passage 82" is protruded from the first surface 80a, and the other end is protruded from the second surface 80b, and one portion of the recessed structure 821" has an opening 821a that communicates with the second surface 80b, and the opening The bottom portion 821b of the 821a is joined around the first hole end 820a" of the through hole 820", and the other portion is integral with the hole wall 820c" of the through hole 820", and the recessed structure 821" and the hole wall 820c of the through hole 820"" It is stepped 821c, zigzag or curved.

綜上所述,本發明之半導體封裝結構及其散熱件,主要藉由形成於該散熱片中央處之具有凹陷結構之似碟狀引通道,以防止於該穿孔周圍發生溢膠之問題。In summary, the semiconductor package structure and the heat dissipating member thereof of the present invention mainly prevent a problem of overflowing around the perforation by a dish-like guiding channel formed in the center of the heat dissipating fin having a concave structure.

上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範 圍所列。The above embodiments are intended to illustrate the principles of the invention and its effects, and are not intended to limit the invention. Any of the above-described embodiments may be modified by those skilled in the art without departing from the spirit and scope of the invention. Therefore, the scope of protection of the present invention should be as follows. Listed around.

1,2,3,4,5,6,7‧‧‧半導體封裝結構1,2,3,4,5,6,7‧‧‧ semiconductor package structure

10,30,40‧‧‧封裝基板10,30,40‧‧‧Package substrate

11,21,31,41,51‧‧‧半導體元件11,21,31,41,51‧‧‧ semiconductor components

12,22,32,42,52,52’,62,72‧‧‧散熱件12,22,32,42,52,52’,62,72‧‧‧

120,220‧‧‧中央直通孔120,220‧‧‧Central through hole

13,23,33,43,53‧‧‧封裝膠體13,23,33,43,53‧‧‧Package colloid

20‧‧‧導線架20‧‧‧ lead frame

221‧‧‧下尖孔221‧‧‧deep hole

24,44‧‧‧模具24,44‧‧‧Mold

240,241,242‧‧‧模件240,241,242‧‧‧Modular

243‧‧‧灌膠道243‧‧‧Gum filling road

330‧‧‧碗型孔330‧‧‧ Bowl Hole

330a‧‧‧孔壁外表面330a‧‧‧ outer wall surface

331‧‧‧通孔331‧‧‧through hole

421‧‧‧中央上尖孔421‧‧‧ center sharp hole

50‧‧‧承載件50‧‧‧ Carrying parts

510‧‧‧銲線510‧‧‧welding line

52a,52a’,62a,72a,80‧‧‧本體52a, 52a’, 62a, 72a, 80‧‧‧ ontology

52b,62b,72b,81‧‧‧支撐部52b, 62b, 72b, 81‧‧ ‧ support

52c,62c,72c,82,82’,82”‧‧‧引通道52c, 62c, 72c, 82, 82', 82" ‧ ‧ lead channel

520,620,720‧‧‧穿孔520,620,720‧‧‧ perforation

520a,620a,720a‧‧‧第一孔端520a, 620a, 720a‧‧‧ first hole end

520b,620b,720b‧‧‧第二孔端520b, 620b, 720b‧‧‧ second hole end

520c,620c,720c‧‧‧孔壁520c, 620c, 720c‧‧‧ hole wall

521,621,721‧‧‧凹陷結構521,621,721‧‧‧ recessed structure

521a,721a,821a‧‧‧開口521a, 721a, 821a‧‧‧ openings

521b,721b,821b‧‧‧底部521b, 721b, 821b‧‧‧ bottom

522‧‧‧凸起部522‧‧‧ raised parts

523,813‧‧‧腳端523, 813 ‧ ‧ feet

721’,821c‧‧‧階梯狀721’, 821c‧‧‧ stepped

8,8’,8”‧‧‧散熱件8,8’,8”‧‧‧Solder parts

80a‧‧‧第一表面80a‧‧‧ first surface

80b‧‧‧第二表面80b‧‧‧second surface

820,820’,820”‧‧‧穿孔820, 820’, 820” ‧ ‧ perforation

820a,820a’,820a”‧‧‧第一孔端820a, 820a’, 820a” ‧‧ first hole

820b,820b’,820b”‧‧‧第二孔端820b, 820b’, 820b” ‧‧ second hole end

820c,820c’,820c”‧‧‧孔壁820c, 820c’, 820c” ‧‧ ‧ hole wall

821,821’,821”‧‧‧凹陷結構821,821’,821”‧‧‧ recessed structure

h1,h2,L1,L2‧‧‧高度H1, h2, L1, L2‧‧‧ height

d,t‧‧‧孔徑d, t‧‧‧ aperture

K‧‧‧殘膠K‧‧‧ Residue

S‧‧‧容置空間S‧‧‧ accommodating space

x‧‧‧深度X‧‧‧depth

第1圖係為習知半導體封裝結構之剖視示意圖;第2A至2B圖係為習知半導體封裝結構之製法的剖視示意圖;第3A圖係為習知半導體封裝結構之剖視示意圖;其中,第3B圖係為第3A圖之散熱件之立體圖;第4A至4B圖係為習知半導體封裝結構之製法的剖視示意圖;第5A至5B圖係為本發明之半導體封裝結構之第一實施例之製法的剖視示意圖;第5C圖係為本發明之半導體封裝結構之第一實施例之另一實施態樣之散熱件的上視示意圖;第5D圖係為本發明之半導體封裝結構之第一實施例之另一實施態樣第5C圖的剖視示意圖;第6圖係為本發明之半導體封裝結構之第二實施例之剖視示意圖;第7圖係為本發明之半導體封裝結構之第三實施例之剖視示意圖;以及第8A至8C圖係為本發明之散熱件之不同實施例之剖視示意圖。1 is a cross-sectional view showing a conventional semiconductor package structure; FIGS. 2A to 2B are cross-sectional views showing a conventional semiconductor package structure; and FIG. 3A is a cross-sectional view showing a conventional semiconductor package structure; 3B is a perspective view of the heat sink of FIG. 3A; FIGS. 4A to 4B are schematic cross-sectional views showing the manufacturing method of the conventional semiconductor package structure; and FIGS. 5A to 5B are the first of the semiconductor package structure of the present invention; FIG. 5C is a schematic top view of a heat dissipating member according to another embodiment of the first embodiment of the semiconductor package structure of the present invention; FIG. 5D is a semiconductor package structure of the present invention FIG. 6 is a cross-sectional view showing a second embodiment of the semiconductor package structure of the present invention; and FIG. 7 is a semiconductor package of the present invention; A schematic cross-sectional view of a third embodiment of the structure; and Figures 8A through 8C are schematic cross-sectional views of different embodiments of the heat sink of the present invention.

8‧‧‧散熱件8‧‧‧ Heat sink

80‧‧‧本體80‧‧‧ body

80a‧‧‧第一表面80a‧‧‧ first surface

80b‧‧‧第二表面80b‧‧‧second surface

81‧‧‧支撐部81‧‧‧Support

813‧‧‧腳端813‧‧‧ feet

82‧‧‧引通道82‧‧‧ lead channel

820‧‧‧穿孔820‧‧‧Perforation

820a‧‧‧第一孔端820a‧‧‧first hole end

820b‧‧‧第二孔端820b‧‧‧second hole

820c‧‧‧孔壁820c‧‧‧ hole wall

821‧‧‧凹陷結構821‧‧‧ recessed structure

821a‧‧‧開口821a‧‧‧ openings

821b‧‧‧底部821b‧‧‧ bottom

L1,L2‧‧‧高度L1, L2‧‧‧ height

d,t‧‧‧孔徑d, t‧‧‧ aperture

x‧‧‧深度X‧‧‧depth

Claims (12)

一種半導體封裝結構用之散熱件,係包括:本體,係具有相對之第一表面與第二表面、及引通道,該引通道係具有穿孔與凹陷結構,該穿孔係具有孔壁、與該第一表面同側之第一孔端、及與該第二表面同側之第二孔端,且該穿孔係令該第一與第二表面相互連通,並且該凹陷結構係連結該穿孔之孔壁周圍,其中,該穿孔之第一孔端係凸伸於該本體之第一表面、或該穿孔之第二孔端係凸伸於該本體之第二表面、或者該穿孔之第一孔端與第二孔端係分別凸伸於該第一表面與該第二表面;以及支撐部,係結合該本體並向外延伸。 A heat sink for a semiconductor package structure, comprising: a body having opposite first and second surfaces, and a lead passage having a perforated and recessed structure, the perforation having a hole wall, and the first a first hole end on the same side of the surface, and a second hole end on the same side as the second surface, and the through hole causes the first and second surfaces to communicate with each other, and the recessed structure connects the hole wall of the through hole Surrounding, wherein the first end of the perforation protrudes from the first surface of the body, or the second end of the perforation protrudes from the second surface of the body, or the first end of the perforation The second hole ends respectively protrude from the first surface and the second surface; and the support portion is coupled to the body and extends outward. 如申請專利範圍第1項所述之散熱件,其中,該支撐部係具有腳端,以置於一承載面上。 The heat dissipating member according to claim 1, wherein the support portion has a foot end to be placed on a bearing surface. 如申請專利範圍第1項所述之散熱件,其中,該第一孔端之孔徑係大於該第二孔端之孔徑。 The heat sink of claim 1, wherein the first hole end has a larger aperture than the second hole end. 如申請專利範圍第1項所述之散熱件,其中,當該穿孔之第一孔端係凸伸於該本體之第一表面時,該凹陷結構係具有連通該本體第二表面之開口,且該開口底部連結該穿孔之第一孔端周圍。 The heat sink of claim 1, wherein the recessed structure has an opening that communicates with the second surface of the body when the first end of the through hole protrudes from the first surface of the body, and The bottom of the opening is joined around the first hole end of the perforation. 如申請專利範圍1項所述之散熱件,其中,當該穿孔之第二孔端係凸伸於該本體之第二表面時,該凹陷結構係與該穿孔之孔壁為一體,且該凹陷結構與該穿孔之孔壁係為階梯狀、曲折面狀或曲面狀。 The heat dissipating component of claim 1, wherein when the second hole end of the perforation protrudes from the second surface of the body, the recess structure is integral with the perforated hole wall, and the recess The structure and the perforated hole wall are stepped, meandered or curved. 如申請專利範圍第1項所述之散熱件,其中,當該穿孔之第一孔端與第二孔端係分別凸伸於該第一表面與該第二表面時,該凹陷結構之一部分係具有連通該第二表面之開口,且該開口底部連結該穿孔之第一孔端周圍,而另一部分係與該穿孔之孔壁為一體,且該凹陷結構與該穿孔之孔壁係為階梯狀、曲折面狀或曲面狀。 The heat dissipating member of claim 1, wherein when the first hole end and the second hole end of the perforation protrude from the first surface and the second surface respectively, one part of the concave structure is An opening that communicates with the second surface, and the bottom of the opening is connected around the first hole end of the through hole, and the other part is integral with the hole wall of the hole, and the hole structure and the hole wall of the hole are stepped , zigzag or curved. 一種半導體封裝結構,係包括:承載件;半導體元件,係設置並電性連接於該承載件上;如申請專利範圍第1項所述之散熱件,係以其支撐部設於該承載件上,以令該散熱件與該承載件之間形成容置空間,使該半導體元件位於該容置空間中,且該穿孔與該凹陷結構係連通該容置空間,又該本體之第一表面與該穿孔之第一孔端係遠離該承載件,而該本體之第二表面與該穿孔之第二孔端係靠近該承載件;以及封裝膠體,係形成於該容置空間與該凹陷結構中,以包覆該半導體元件。 A semiconductor package structure comprising: a carrier; a semiconductor component disposed and electrically connected to the carrier; the heat sink according to claim 1 is provided on the carrier by a support portion thereof An accommodating space is formed between the heat dissipating member and the carrier, so that the semiconductor component is located in the accommodating space, and the through hole and the recessed structure are connected to the accommodating space, and the first surface of the body is The first end of the through hole is away from the carrier, and the second surface of the body is adjacent to the carrier with the second end of the through hole; and the encapsulant is formed in the receiving space and the recessed structure To cover the semiconductor component. 如申請專利範圍第7項所述之半導體封裝結構,其中,該支撐部係具有腳端,以置於該承載件上。 The semiconductor package structure of claim 7, wherein the support portion has a foot end for being placed on the carrier. 如申請專利範圍第7項所述之半導體封裝結構,其中,該第一孔端之孔徑係大於該第二孔端之孔徑。 The semiconductor package structure of claim 7, wherein the first hole end has a larger aperture than the second hole end. 如申請專利範圍第7項所述之半導體封裝結構,其中, 當該穿孔之第一孔端係凸伸於該本體之第一表面時,該凹陷結構係具有連通該容置空間之開口,且該開口底部連結該穿孔之第一孔端周圍。 The semiconductor package structure of claim 7, wherein When the first hole end of the through hole protrudes from the first surface of the body, the recess structure has an opening that communicates with the accommodating space, and the bottom of the opening is connected around the first hole end of the through hole. 如申請專利範圍第7項所述之半導體封裝結構,其中,當該穿孔之第二孔端係凸伸於該本體之第二表面時,該凹陷結構係與該穿孔之孔壁為一體,且該凹陷結構與該穿孔之孔壁係為階梯狀、曲折面狀或曲面狀。 The semiconductor package structure of claim 7, wherein when the second hole end of the through hole protrudes from the second surface of the body, the recess structure is integral with the hole wall of the through hole, and The recessed structure and the perforated hole wall are stepped, meandered or curved. 如申請專利範圍第7項所述之半導體封裝結構,其中,當該穿孔之第一孔端與第二孔端係分別凸伸於該第一表面與該第二表面時,該凹陷結構之一部分係與該穿孔之孔壁為一體,且該凹陷結構與該穿孔之孔壁係為階梯狀、曲折面狀或曲面狀,而另一部分係具有連通該容置空間之開口,且該開口底部連結該穿孔之第一孔端周圍。The semiconductor package structure of claim 7, wherein a portion of the recessed structure is formed when the first hole end and the second hole end of the through hole protrude from the first surface and the second surface, respectively The wall of the hole is integral with the hole of the perforation, and the wall of the hole and the hole of the hole is stepped, meandered or curved, and the other part has an opening connecting the receiving space, and the bottom of the opening is connected Around the first hole end of the perforation.
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CN106257652B (en) 2015-06-16 2020-03-27 台达电子企业管理(上海)有限公司 Packaging module and packaging method
TWI695466B (en) * 2019-05-31 2020-06-01 矽品精密工業股份有限公司 Electronic package and manufacturing method thereof

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