TWI477629B - Composite target and method for making the same - Google Patents
Composite target and method for making the same Download PDFInfo
- Publication number
- TWI477629B TWI477629B TW099128105A TW99128105A TWI477629B TW I477629 B TWI477629 B TW I477629B TW 099128105 A TW099128105 A TW 099128105A TW 99128105 A TW99128105 A TW 99128105A TW I477629 B TWI477629 B TW I477629B
- Authority
- TW
- Taiwan
- Prior art keywords
- composite target
- preparing
- mass
- target according
- sintering
- Prior art date
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Compositions Of Oxide Ceramics (AREA)
Description
本發明涉及一種複合靶材及其製備方法,尤其涉及一種可製取具有疏水、防紫外線及自清潔功能透明薄膜的複合靶材及該複合靶材的製備方法。 The invention relates to a composite target and a preparation method thereof, in particular to a composite target capable of preparing a transparent film with hydrophobic, ultraviolet shielding and self-cleaning functions and a preparation method of the composite target.
在玻璃表面鍍膜的方法較多,主要有物理氣相沉積、化學氣相沉積及溶膠-凝膠等。物理氣相沉積中常用的真空磁控濺射技術可設計多層複雜膜系,在玻璃基體上鍍覆出性能較佳的膜層,係目前使用最廣泛的玻璃鍍膜技術之一。 There are many methods for coating the surface of glass, mainly physical vapor deposition, chemical vapor deposition and sol-gel. The vacuum magnetron sputtering technology commonly used in physical vapor deposition can design a multi-layer complex film system, and the film layer is coated on the glass substrate, which is one of the most widely used glass coating technologies.
基於玻璃基材的特殊性能,對玻璃鍍膜的膜層有較高的要求,通常要求膜層具有較高的透光率,選擇性透光,高阻隔比,如高的紅外線、紫外線阻隔效果等,因此膜層的選擇設計十分重要。目前要實現在玻璃上製備具有疏水、防紫外線、自清潔效果的透明功能薄膜,通常需要設計相應的多層複合膜系結構,如此一來導致製備薄膜的工藝時間長,產品的成本增加。 Based on the special properties of the glass substrate, there is a high requirement for the film layer of the glass coating. Generally, the film layer is required to have high light transmittance, selective light transmission, high barrier ratio, such as high infrared ray, ultraviolet blocking effect, etc. Therefore, the choice of membrane design is very important. At present, it is necessary to realize a transparent functional film having hydrophobic, ultraviolet shielding and self-cleaning effect on glass, and it is usually required to design a corresponding multilayer composite film structure, which leads to a long process time for preparing the film and an increase in the cost of the product.
有鑒於此,有必要提供一種可製取具有疏水、防紫外線及自清潔功能透明薄膜的複合靶材。 In view of the above, it is necessary to provide a composite target which can produce a transparent film having hydrophobic, ultraviolet shielding and self-cleaning functions.
另外,還有必要提供一種上述複合靶材的製備方法。 In addition, it is also necessary to provide a method of preparing the above composite target.
一種複合靶材,其含有質量百分比為50%-85%的氧化鈦以及餘量的氧化錫或氧化鋁。 A composite target comprising 50% to 85% by mass of titanium oxide and the balance of tin oxide or aluminum oxide.
一種複合靶材的製備方法,其包括以下步驟:將質量百分比為50%-80%的氧化鈦粉體,質量百分比為15%-50%的氧化錫粉體或氧化鋁粉體及質量百分比為5%-10%的黏結劑混合均勻,製得一混合物;將所述混合物放入模具中熱壓製成一坯體;對所述坯體進行高溫燒結;燒結後自然冷卻。 A method for preparing a composite target, comprising the steps of: 50%-80% by mass of titanium oxide powder, 15%-50% by mass of tin oxide powder or alumina powder, and mass percentage 5%-10% of the binder is uniformly mixed to prepare a mixture; the mixture is placed in a mold and hot pressed to form a green body; the green body is sintered at a high temperature; and naturally cooled after sintering.
本發明複合靶材可用於真空磁控濺射製備具有疏水、防紫外線及自清潔功能的透明薄膜;本發明複合靶材的製備方法工藝簡單、製程週期短,易於設計及控制、應用範圍廣泛。 The composite target of the invention can be used for preparing transparent film with hydrophobic, ultraviolet shielding and self-cleaning functions by vacuum magnetron sputtering; the preparation method of the composite target of the invention has simple process, short process period, easy design, control and wide application range.
為了使本發明的目的、技術方案及優點更加清楚明白,以下結合附圖與實施例對本發明進行進一步詳細說明。 The present invention will be further described in detail below with reference to the accompanying drawings and embodiments.
本發明一較佳實施方式的複合靶材,其含有質量百分比為50%-85%的氧化鈦以及餘量的氧化錫或氧化鋁。 A composite target according to a preferred embodiment of the present invention contains 50% to 85% by mass of titanium oxide and the balance of tin oxide or aluminum oxide.
上述複合靶材的製備方法包括如下步驟:將質量百分比為50%-80%的氧化鈦粉體,質量百分比為15%-50%的氧化錫或氧化鋁粉體,質量百分比為5%-10%的黏結劑混合攪拌均 勻,製得一混合物。該氧化鈦粉體的純度可為97-99%,粒度可為70-90μm。該氧化錫粉體的純度可為97-99%,粒度可為70-90μm。該氧化鋁粉體的純度可為97-99%,粒度可為70-90μm。該黏結劑中含有正矽酸乙脂及有機溶劑,其中正矽酸乙脂及有機溶劑的質量比可為1:10。該有機溶劑可為乙醇或丙酮。 The preparation method of the above composite target comprises the steps of: 50%-80% by mass of titanium oxide powder, 15%-50% by mass of tin oxide or aluminum oxide powder, and the mass percentage is 5%-10 % of the binder is mixed and stirred Evenly, a mixture was prepared. The titanium oxide powder may have a purity of 97 to 99% and a particle size of 70 to 90 μm. The tin oxide powder may have a purity of 97 to 99% and a particle size of 70 to 90 μm. The alumina powder may have a purity of 97 to 99% and a particle size of 70 to 90 μm. The binder contains ethyl ruthenate and an organic solvent, and the mass ratio of the ethyl ruthenate and the organic solvent may be 1:10. The organic solvent can be ethanol or acetone.
取適量上述混合物放入模具中,將該混合物壓製成一坯體。壓製的溫度範圍可為100-300℃,壓力可為100-200噸。 An appropriate amount of the above mixture is placed in a mold, and the mixture is pressed into a green body. The pressing temperature can range from 100 to 300 ° C and the pressure can range from 100 to 200 tons.
對壓製成型的坯體進行高溫燒結,燒結溫度為900-1800℃,燒結時間為3-4h。燒結過程中所述黏結劑中的有機溶劑及有機物被燃燒去除,而該黏結劑中的矽在燒結後以二氧化矽的形式存在於所述複合靶材中。 The press-formed body is subjected to high-temperature sintering at a sintering temperature of 900 to 1800 ° C and a sintering time of 3-4 h. The organic solvent and organic matter in the binder are burned away during sintering, and the cerium in the binder is present in the composite target in the form of cerium oxide after sintering.
燒結完成後自然冷卻,製得所述的複合靶材。 After the sintering is completed, it is naturally cooled to obtain the composite target.
本發明複合靶材可用於真空磁控濺射製備具有疏水、防紫外線及自清潔功能的透明薄膜;本發明複合靶材的製備方法工藝簡單、製程週期短,易於設計及控制、應用範圍廣泛。 The composite target of the invention can be used for preparing transparent film with hydrophobic, ultraviolet shielding and self-cleaning functions by vacuum magnetron sputtering; the preparation method of the composite target of the invention has simple process, short process period, easy design, control and wide application range.
綜上所述,本發明符合發明專利要件,爰依法提出專利申請。惟,以上所述者僅為本發明之較佳實施方式,舉凡熟悉本案技藝之人士,於爰依本發明精神所作之等效修飾或變化,皆應涵蓋於以下之申請專利範圍內。 In summary, the present invention complies with the requirements of the invention patent and submits a patent application according to law. The above description is only the preferred embodiment of the present invention, and equivalent modifications or variations made by those skilled in the art will be covered by the following claims.
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW099128105A TWI477629B (en) | 2010-08-23 | 2010-08-23 | Composite target and method for making the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW099128105A TWI477629B (en) | 2010-08-23 | 2010-08-23 | Composite target and method for making the same |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201209201A TW201209201A (en) | 2012-03-01 |
TWI477629B true TWI477629B (en) | 2015-03-21 |
Family
ID=46763476
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW099128105A TWI477629B (en) | 2010-08-23 | 2010-08-23 | Composite target and method for making the same |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI477629B (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030038028A1 (en) * | 2001-08-17 | 2003-02-27 | W. C. Heraeus Gmbh & Co. Kg | Sputter target based on titanium dioxide |
US20080087866A1 (en) * | 2006-10-13 | 2008-04-17 | H.C. Stark Inc. | Titanium oxide-based sputtering target for transparent conductive film, method for producing such film and composition for use therein |
US20090130418A1 (en) * | 2006-06-08 | 2009-05-21 | Asahi Glass Company Limited | Transparent conductive film, its production method and sputtering target used for its production |
-
2010
- 2010-08-23 TW TW099128105A patent/TWI477629B/en not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030038028A1 (en) * | 2001-08-17 | 2003-02-27 | W. C. Heraeus Gmbh & Co. Kg | Sputter target based on titanium dioxide |
US20090130418A1 (en) * | 2006-06-08 | 2009-05-21 | Asahi Glass Company Limited | Transparent conductive film, its production method and sputtering target used for its production |
US20080087866A1 (en) * | 2006-10-13 | 2008-04-17 | H.C. Stark Inc. | Titanium oxide-based sputtering target for transparent conductive film, method for producing such film and composition for use therein |
Also Published As
Publication number | Publication date |
---|---|
TW201209201A (en) | 2012-03-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN103332868B (en) | A kind of graded index sheet glass and preparation method thereof | |
JP2018165244A (en) | Glass phosphor sheet having multilayered structure | |
CN104275889B (en) | High-performance nano compound heat-insulation film and preparation method thereof | |
JP6461619B2 (en) | Radio wave transmission type multilayer optical coating | |
JP6456297B2 (en) | Method for producing a multilayer glass structure | |
MY169439A (en) | Process for manufacturing a glass substrate comprising printed enamel patterns | |
TWI525060B (en) | An oxide sintered body, a sputtering target, a thin film, and an oxide sintered body | |
TWI483914B (en) | Method for producing a coated component of quartz glass | |
TWI443153B (en) | White inorganic coating composition, and device employing a coating made of the composition | |
CN102653455B (en) | Low-emissivity, low-emissivity coated glass and preparation method thereof | |
TWI477629B (en) | Composite target and method for making the same | |
CN111018528B (en) | Low-emissivity ceramic material under 3-5 mu m wave band and preparation method thereof | |
CN102180653A (en) | Preparation method for high-density indium tin oxide target material | |
CN105579228A (en) | Barrier film and method for producing same | |
CN104276839B (en) | The method for sealing of glass-ceramic | |
EP3730841B1 (en) | Top plate for cooking devices and method for manufacturing same | |
CN101934615A (en) | High-frequency microwave multilayer board bonding sheet and manufacturing method thereof | |
CN102336566A (en) | Composite target and preparation method thereof | |
CN104608441B (en) | A kind of island structure metallic diaphragm coated glass and preparation method thereof | |
JP2010021111A (en) | Glass top plate for heating cooker | |
CN104744034B (en) | The preparation method and application of composition and glass ceramic composite material and its skeleton | |
JP6205938B2 (en) | Glass top plate for gas cooker | |
CN106477915A (en) | Radiation coated glass capable of being toughened and its manufacture method | |
CN104557039A (en) | Intermediate-refraction index evaporation coating material, as well as preparation technique and application thereof | |
CN206244650U (en) | Radiation coated glass capable of being toughened |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |