TWI473897B - - Google Patents

Info

Publication number
TWI473897B
TWI473897B TW100148248A TW100148248A TWI473897B TW I473897 B TWI473897 B TW I473897B TW 100148248 A TW100148248 A TW 100148248A TW 100148248 A TW100148248 A TW 100148248A TW I473897 B TWI473897 B TW I473897B
Authority
TW
Taiwan
Application number
TW100148248A
Other languages
Chinese (zh)
Other versions
TW201326437A (zh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW100148248A priority Critical patent/TW201326437A/zh
Publication of TW201326437A publication Critical patent/TW201326437A/zh
Application granted granted Critical
Publication of TWI473897B publication Critical patent/TWI473897B/zh

Links

TW100148248A 2011-12-23 2011-12-23 具自轉及公轉複合式真空濺鍍設備 TW201326437A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW100148248A TW201326437A (zh) 2011-12-23 2011-12-23 具自轉及公轉複合式真空濺鍍設備

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW100148248A TW201326437A (zh) 2011-12-23 2011-12-23 具自轉及公轉複合式真空濺鍍設備

Publications (2)

Publication Number Publication Date
TW201326437A TW201326437A (zh) 2013-07-01
TWI473897B true TWI473897B (enExample) 2015-02-21

Family

ID=49224804

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100148248A TW201326437A (zh) 2011-12-23 2011-12-23 具自轉及公轉複合式真空濺鍍設備

Country Status (1)

Country Link
TW (1) TW201326437A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5887391B1 (ja) * 2014-08-22 2016-03-16 三井金属鉱業株式会社 スパッタリングターゲット用ターゲット材の製造方法および爪部材

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4798663A (en) * 1985-02-01 1989-01-17 Leybold-Heraeus Gmbh Sputtering installation for the reactive coating of a substrate with hard materials

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4798663A (en) * 1985-02-01 1989-01-17 Leybold-Heraeus Gmbh Sputtering installation for the reactive coating of a substrate with hard materials

Also Published As

Publication number Publication date
TW201326437A (zh) 2013-07-01

Similar Documents

Publication Publication Date Title
BR112013022641A2 (enExample)
BR112013027245A2 (enExample)
BR112013024383A2 (enExample)
BR112013023185A2 (enExample)
BR112013026905A2 (enExample)
BR112013022995A2 (enExample)
BR112013017670A2 (enExample)
AP3853A (enExample)
BR112013026744A2 (enExample)
BR112013023927A2 (enExample)
BR112013024365A2 (enExample)
BR112013028733A2 (enExample)
BR112013027121A2 (enExample)
AP2016009466A0 (enExample)
BR112013024588A2 (enExample)
BR112013026790A2 (enExample)
BR112013018949A2 (enExample)
BR112013026895A2 (enExample)
BR112013021637A2 (enExample)
BR112013023266A2 (enExample)
BR112013032392A2 (enExample)
BR112013025487A2 (enExample)
BR112013017878A2 (enExample)
BR112013027871A2 (enExample)
BR112013032394A2 (enExample)