TWI472636B - Coating method and shading element using the method - Google Patents

Description

Coating method and shading element using the coating method

The present invention relates to a coating method and a shading element using the coating method.

The optical film basically achieves its effect by interference, which means that one or more layers of dielectric film or metal film or dielectric film film stack or metal film film stack are plated on the optical element or on the independent substrate to change. Light wave transmission characteristics. At present, many optical instruments, such as sensors, semiconductor lasers, interferometers, glasses, sunglasses, fiber optic communications, etc., require optical films.

At present, the optical film is produced by physical vapor deposition (PVD), which converts the film material from a solid state into a gaseous or ionic state, a gaseous or ionic material, and the evaporation source passes through the space to reach the glass. After the surface reaches the surface of the glass, it will deposit and gradually form a film. Generally, in order to make the film produced with high purity, the coating process must be completed under a high vacuum environment. Therefore, the vacuum coating is extended. Generally, the substrate is washed by an ultrasonic cleaning machine, washed, placed on a jig, sent to a coating machine, and heated and evacuated. After the high vacuum is reached, the coating is started. At the time of coating, the vapor deposition source is heated by an electron gun method or a resistive type to change the plating material into an ionic state, and the vapor deposition time varies depending on the number of layers and the program. After the coating is completed, remove it after the temperature has cooled.

However, in the process of coating the shading element, it is stacked through the metal film. To the shading effect, when it is necessary to obtain a light-shielding film layer with different optical parameters, the target and related parameters are constantly changed, so that the coating process is quite complicated.

In view of the above, it is necessary to provide a coating method which can arbitrarily change the light-shielding effect during the coating process and a light-shielding member to which the coating method is applied.

A coating method for a light shielding component, comprising the steps of: providing a coating machine, a metal palladium material, a test substrate and a substrate to be coated; and placing the metal palladium material and the test substrate into a vacuum chamber of the coating machine, Adjusting the power of the electron beam of the coating machine and the gas release amount of the gas source of the coating machine, so that the metal palladium ions generated by the electron beam bombardment completely react with the released gas; the test substrate is taken out, and the substrate to be coated is placed a vacuum chamber, by adjusting one of the power of the electron beam or the gas release amount of the gas source, forming a film layer on the substrate to be coated, from a side close to the substrate to be coated to a side away from the substrate to be coated, The deposition concentration of the metal palladium material in the film layer is gradually increased, and the deposition concentration of the metal palladium compound is gradually decreased; when the resistance value of the film layer is kept unchanged, the coating film is completed.

A light shielding member comprising a substrate to be coated and a film layer, the film layer being a mixture of metal palladium material and metal palladium material reactant, from a side close to a substrate to be coated to a side away from a substrate to be coated The deposition concentration of the metal palladium material in the film layer is gradually increased, and the deposition concentration of the metal palladium material reactant is gradually decreased, the metal palladium material element has a function of reflecting light, and the metal palladium material reactant has absorption. The role of light.

Compared with the prior art, the present invention can obtain different shading effect shading elements by continuously adjusting the power of the electron beam of the coating machine and the amount of gas flowing into the vacuum chamber without changing the material of the metal palladium material.

10‧‧‧Substrate

20‧‧‧ film layer

1 is a flow chart of a method for coating a light-shielding member according to a first embodiment of the present invention; FIG. 2a is a graph showing the relationship between evaporation amount of metal palladium ions and time in FIG. 1; FIG. 2b is a gas release amount in FIG. Figure 3 is a flow chart of a method for coating a light-shielding member according to a second embodiment of the present invention; Figure 4a is a graph showing the relationship between the evaporation amount of metal palladium ions and time in Figure 3; Figure 3 is a graph showing the relationship between the amount of gas released and time; Figure 5 is a flow chart of the method for coating the shading element according to the third embodiment of the present invention; Figure 6a is the evaporation amount and time of the metal palladium ion in Figure 5. FIG. 6b is a graph showing the relationship between the release amount of the gas and the time in FIG. 5; FIG. 7 is a flow chart of the method for coating the shading element according to the fourth embodiment of the present invention; and FIG. 8a is the metal palladium material of FIG. FIG. 8b is a graph showing the relationship between the amount of gas released in FIG. 7 and time; FIG. 9 is a perspective view of the shading element provided by the embodiment of the present invention; FIG. 10a is an embodiment of the present invention; provide The optical effect of the light shielding member schematic; Fig. 10b based optical effect of the light shielding elements of another embodiment of the present invention is provided FIG.

The invention will be further described in detail below with reference to the accompanying drawings.

First embodiment

As shown in FIG. 1 and FIG. 2a-2b, a method for coating a light-shielding member according to a first embodiment of the present invention includes the following steps: S101a: providing a coating machine, a metal palladium material, a test substrate, and a film to be coated. a substrate comprising: a vacuum chamber, an electron gun and a vapor source, wherein the electron gun, the vapor source, the metal palladium material and the substrate are all located in a vacuum chamber; and the electron gun is used to emit high-intensity electrons The beam evaporates the metal palladium material into an ionic state, the vapor source is used to release a gas which reacts with the metal palladium ion; the metal palladium material has a better effect of reflecting light, and the metal palladium material and The metal palladium reactant of the gas released from the vapor source has a high light absorption effect, and the metal palladium material may be chromium (Cr) or titanium (Ti); the test substrate and the substrate to be coated are the same material. a substrate, which is a transparent glass; S102a: after the metal palladium material and the test substrate are placed in a vacuum chamber of the coating machine, the vacuum chamber is evacuated, and the electron beam of the coating machine bombards the metal palladium material with a first power to make the metal Palladium ionization; placing the test substrate Before the vacuum chamber, the test substrate needs to be washed to prevent the impurities on the substrate from affecting the coating effect. When the metal palladium material is evaporated by heat, it is placed in the vacuum chamber in the state of metal palladium ions; S103a: according to the first power The evaporation of the metal palladium ions in the lower vacuum chamber, the gas source of the coating machine releases the gas, so that the release amount of the gas per second is less than the gas release amount required for the complete reaction of the evaporated metal palladium ions per second; according to the coating machine The amount of evaporation of the metal palladium ions at the first power is then calculated by calculation The gas release amount required for the complete reaction of the metal palladium ion evaporated per second is recorded as the theoretical release amount C, and the gas source of the control coater is released to release the gas at an initial release amount A smaller than the theoretical release amount C; The gas is oxygen or nitrogen, and the metal palladium material reacted with the gas is a kind of oxygen, such as titanium, chromium oxide, titanium nitride and chromium nitride; S104a: gradually increasing The amount of gas source gas released, and simultaneously monitor the resistance value of the film layer coated on the test substrate. When the resistance value of the film layer remains unchanged, note that the gas release amount of the gas source at this time is the critical release amount B. The electron beam power is the second power, and the second power is equal to the first power; according to the light shielding effect to be achieved by the coating layer, the rate of increasing the gas release amount can be arbitrarily changed, thereby changing the film layer; In the process of continuous oxidation or nitridation, since the oxidation resistance of the film layer is the largest, the resistance value of the oxide film layer is completely minimized, and the oxidation resistance or nitridation of the film layer is more complete, and the coating machine passes through Monitoring the resistance value of the coating layer can determine whether the metal palladium ion is complete; when the resistance value of the film layer remains unchanged for a predetermined time, it indicates that the metal palladium ion is completely oxidized or nitrided, and this is recorded. The gas release amount of the gas source is the critical release amount B; S105a: the test substrate is taken out, and the substrate to be coated is placed in a vacuum chamber, and the gas source is released by a preset release amount D equal to the release amount and the critical release amount B. Out of the gas, at time T, increasing the power of the electron beam up to the third power, and the third power is higher than the second power, so that the evaporation of the metal palladium ions per second is greater than the complete reaction of the gas released by the gas source per second. The required amount of gas is released, and a film layer is gradually formed on the substrate to be coated; the third power can be set according to the shading effect of the shading element; S106a: when the resistance value of the film layer remains unchanged, the coating is completed. And from the side of the substrate to be coated to the side away from the substrate to be coated, the metal palladium in the film is simple The deposition concentration is gradually increased, and the deposition concentration of the metal palladium compound is gradually decreased.

After the coating is completed, another substrate to be coated is placed in the vacuum chamber, and the coating process is repeated, and the optical parameters of the obtained shading elements are the same.

Second embodiment

As shown in FIG. 3 and FIG. 4a-4b, a method for coating a light-shielding element according to a second embodiment of the present invention includes the following steps: S101b: same as first embodiment S101a; S102b: same as first embodiment S102a; S103b: According to the evaporation amount of the metal palladium ions in the vacuum chamber at the first power, the gas source of the coating machine releases the gas, so that the release amount of the gas per second is greater than the gas release amount required for the complete reaction of the evaporated metal palladium ions per second. According to the evaporation amount of the metal palladium ion at the first power shown by the coating machine, the calculated amount of the gas discharged per second of the metal palladium ion per second is calculated by the calculation, which is recorded as the theoretical release amount C. And controlling the gas source of the coating machine to release the gas at an initial release amount A greater than the theoretical release amount C; in the embodiment, the gas is oxygen or nitrogen, and the metal palladium material reacts with the gas The palladium reactant is one of oxygen, titanium oxide, chromium oxide, titanium nitride and chromium nitride; S104b: continuously increasing the power of the electron beam bombarding the metal palladium material, and simultaneously monitoring the film coated on the test substrate The resistance value, when the resistance value of the film layer changes, it is recorded that the power of the electron beam is the second power, the gas release amount is the critical release amount B, and the critical release amount B is equal to the initial release amount A; The light-shielding effect of the coating layer can be arbitrarily changed to increase the rate of electron beam power, thereby changing the film layer; in the process of continuous oxidation or nitridation of the film layer, due to the complete oxidation of the film layer The resistance value is the largest, the resistance value of the oxide film layer is the smallest, and the oxidation resistance or nitridation of the film layer is more complete. The coating machine can judge whether the metal palladium ion is complete by monitoring the resistance value of the coating layer in real time; When the resistance value of the film layer remains unchanged for a predetermined time, it indicates that the metal palladium ion is completely oxidized or nitrided; S105b: the test substrate is taken out, and the substrate to be coated is placed in a vacuum chamber, and the gas source is The preset release amount D, which is equal to the critical release amount B, releases the gas. At time T, the power of the electron beam is increased up to the third power, and the third power is higher than the second power, so that the metal palladium ions are generated per second. The amount of evaporation is greater than the amount required for the gas released by the gas source to be completely reacted, and a film layer is gradually formed on the substrate to be coated; the third power can be set according to the shading effect of the shading element; S106b: the same An embodiment S106a.

After the coating is completed, another substrate to be coated is placed in the vacuum chamber, and the coating process is repeated, and the optical parameters of the obtained shading elements are the same.

Third embodiment

As shown in FIG. 5 and FIG. 6a-6b, a method for coating a light-shielding element according to a third embodiment of the present invention includes the following steps: S101c: same as first embodiment S101a; S102c: same as first embodiment S102a; S103c: According to the evaporation amount of the metal palladium ions in the vacuum chamber at the first power, the gas source of the coating machine releases the gas, so that the release amount of the gas per second is less than the gas release amount required for the complete reaction of the evaporated metal palladium ions per second. According to the evaporation amount of the metal palladium ion at the first power shown by the coating machine, and then calculated The gas release amount required for the complete reaction of the metal palladium ion evaporated per second is recorded as the theoretical release amount C, and the gas source of the control coater releases the gas at an initial release amount A smaller than the theoretical release amount C; in the present embodiment The gas is oxygen or nitrogen, and the metal palladium material reacted with the gas is a kind of one of oxygen, titanium, chromium oxide, titanium nitride and chromium nitride; S104c: gradually increasing gas The release amount of the source gas, and simultaneously monitor the resistance value of the film layer coated on the test substrate. When the resistance value of the film layer remains unchanged, note that the release amount of the gas source at this time is the critical release amount B, electron The beam power is the second power, and the second power is equal to the first power; according to the shielding effect to be achieved by the coating layer, the rate of increasing the gas release amount can be arbitrarily changed, thereby causing the film layer to change; In the process of oxidation or nitridation, since the oxidation resistance of the film layer is the largest, the resistance value of the oxide film layer is completely minimized, and the oxidation resistance or nitridation of the film layer is more complete, and the coating machine is monitored by real time. The resistance value of the coating layer can be judged whether the metal palladium ion is complete; when the resistance value of the film layer remains unchanged for a predetermined time, the metal palladium ion is completely oxidized or nitrided; S105c: the test substrate is taken out And placing the substrate to be coated into a vacuum chamber, at time T, the electron beam bombards the metal palladium with a third power equal to the second power, and gradually reduces the gas source until a predetermined release amount D maintains the release of the gas source Invariably, and the preset release amount D is less than the critical release amount B; the evaporation amount of the metal palladium ion per second is greater than the gas release amount required for the complete reaction of the gas released by the gas source per second, and the film to be coated is A film layer is gradually formed on the substrate; the user can obtain a light-shielding element with different light-shielding effects by adjusting the value of the release rate of the critical release amount B by a predetermined reduction amount D; S106c: same as the first embodiment S106a.

After the coating is completed, another substrate to be coated is placed in the vacuum chamber, and the coating process is repeated, and the optical parameters of the obtained shading elements are the same.

Fourth embodiment

As shown in FIG. 7 and FIG. 8a-8b, a method for coating a light-shielding element according to a fourth embodiment of the present invention includes the following steps: S101d: same as first embodiment S101a; S102d: same as first embodiment S102a; S103d: According to the evaporation amount of the metal palladium ions in the vacuum chamber at the first power, the gas source of the coating machine releases the gas, so that the release amount of the gas per second is greater than the gas release amount required for the complete reaction of the evaporated metal palladium ions per second. According to the evaporation amount of the metal palladium ion at the first power shown by the coating machine, and then calculating the gas release amount required to completely react the metal palladium ion evaporated per second, which is recorded as the theoretical release amount C, The gas source of the coating machine is controlled to release the gas at an initial release amount A greater than the theoretical release amount C. In the present embodiment, the gas is oxygen or nitrogen, and the metal palladium reacts with the gas to form a metal palladium. The material reactant is one of oxygen, titanium oxide, chromium oxide, titanium nitride and chromium nitride; S104d: continuously increasing the power of the electron beam bombarding the metal palladium material, and simultaneously monitoring the coating layer on the test substrate The resistance value, when the resistance value of the film layer changes, it is noted that the power of the electron beam is the second power, the gas source release amount is the critical release amount B, and the critical release amount B is equal to the initial release amount A; According to the shading effect of the coating layer, the rate of increasing the power of the electron beam can be arbitrarily changed, thereby changing the film layer; in the process of continuous oxidation or nitridation of the film layer, the maximum resistance of the film layer due to oxidation is the largest. There is no oxide layer at all, the resistance value is the smallest, and the film is oxidized. Or the more complete the nitriding resistance value, the coating machine can determine whether the metal palladium ion is complete by monitoring the resistance value of the coating layer in real time; when the resistance value of the film layer remains unchanged for a predetermined time, it indicates The metal palladium ion is completely oxidized or nitrided; S105d: the test substrate is taken out, and the substrate to be coated is placed in a vacuum chamber, and at time T, the electron beam bombards the metal palladium at a third power equal to the second power, and gradually decreases The amount of gas released by the gas source is maintained until the release amount of the gas source is constant after a predetermined release amount D of less than the critical release amount B; the evaporation of the metal palladium ions per second is greater than the gas released per second by the gas source. The amount of gas required for the reaction is released, and a film layer is gradually formed on the substrate to be coated; the user can obtain different light shielding by adjusting the decreasing rate of the critical release amount B or the value of the preset release amount D. The light-shielding element of the effect; S106d: same as the first embodiment S106a.

After the coating is completed, another substrate to be coated is placed in the vacuum chamber, and the coating process is repeated, and the optical parameters of the obtained shading elements are the same.

As shown in FIG. 9 and FIGS. 10a-10b, the film layer 20 of the light-shielding member is a film layer 20 which is less and more incompletely oxidized or nitrided from the side close to the surface of the substrate 10 to the side away from the surface of the substrate 10. The film layer 20 closest to the surface of the substrate 10 is an oxidized or chlorinated metal palladium material as a light absorbing layer of the light shielding member; the film layer 20 farthest from the surface of the substrate 10 is the most incomplete metal pentoxide material which is oxidized or chlorinated. As the light blocking layer of the shading element; the higher the proportion of the light blocking layer in the grading film layer, the lower the light transmittance, but the higher the light reflectance; the higher the proportion of the light absorbing layer in the grading film layer, the light reflectance Decrease, but the light transmittance is improved; by adjusting the ratio between the light absorbing layer and the light blocking layer, the shading effect of the shading element required by the user is achieved.

As shown in FIG. 9, the shading element prepared by the method provided in the first embodiment, the second, the third and the fourth embodiment comprises: a substrate 10 and a film layer 20, wherein the film layer 20 is a metal palladium material and a metal palladium. The mixture of material reactants, from the side close to the substrate 10 to the side away from the substrate 10, the deposition concentration of the metal palladium element in the film layer 20 is gradually increased, and the deposition concentration of the metal palladium reactant is gradually decreased. . The metal palladium material has a function of reflecting light, and the metal palladium reactant has a function of absorbing light. The metal palladium material is chromium or titanium, and the user can control the thickness of the film layer 20 according to the optical effect required by the light shielding element, which is an oxide or nitride of a metal palladium element. In this embodiment, the metal palladium reactant is one of titanium oxide or titanium nitride, chromium oxide or chromium nitride.

The invention can obtain the shading elements with different shading effects by continuously adjusting the power of the electron beam of the coating machine and the amount of gas flowing into the vacuum chamber without changing the material of the metal palladium material.

In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

10‧‧‧Substrate

20‧‧‧ film layer

Claims (11)

A coating method for a light shielding component, comprising the steps of: providing a coating machine, a metal palladium material, a test substrate and a substrate to be coated; and placing the metal palladium material and the test substrate into a vacuum chamber of the coating machine, Adjusting the power of the electron beam of the coating machine and the gas release amount of the gas source of the coating machine, so that the metal palladium ions generated by the electron beam bombardment completely react with the released gas; the test substrate is taken out, and the substrate to be coated is placed in a vacuum a cavity, by adjusting one of the power of the electron beam or the gas release amount of the gas source, and finally maintaining the power of the electron beam and the gas release amount of the gas source at a certain value, forming a film layer on the substrate to be coated, And from the side close to the substrate to be coated to the side away from the substrate to be coated, the deposition concentration of the metal palladium element in the film layer is gradually increased, and the deposition concentration of the metal palladium reactant is gradually decreased; After the resistance value remains unchanged, the coating is completed. The method for coating a light-shielding member according to claim 1, wherein: in the coating process on the test substrate, when the gas of the set gas source is released per second, the amount of metal palladium ions evaporated per second is completely When the amount of gas required for the reaction is adjusted, the gas release amount of the gas source is gradually adjusted to a critical release amount of the metal palladium ion completely reacted. The method for coating a light-shielding member according to claim 1, wherein: when the test substrate is coated, the gas of the set gas source is released per second more than the metal palladium ion per second evaporated. When the amount of gas is required, the electron beam power is gradually adjusted to allow the released gas to completely react to a second power. The method for coating a light-shielding member according to the second or third aspect of the invention, wherein: in the process of coating the substrate to be coated, the gas source is released with a predetermined release amount, and the predetermined release amount is equal to The critical release amount increases the electron beam power to a third power, and the third power is large At the second power, the amount of evaporation of the metal palladium ions per second is greater than the amount required for the complete reaction of the gas released by the gas source per second, and the shading elements having different shading effects are obtained by setting different third powers. The method for coating a light-shielding member according to the second or third aspect of the invention, wherein: in the coating process of the substrate to be coated, the electron beam is caused to bombard the palladium material with a third power, and the third power is equal to The second power reduces the gas release amount of the gas source to a predetermined release amount, and the predetermined release amount is less than the critical release amount, so that the evaporation amount of the metal palladium ion per second is greater than the gas reaction of the gas source released per second. The amount required, the shading elements with different shading effects are obtained by setting different preset release amounts. The method for coating a light-shielding member according to claim 1, wherein the metal palladium material is chromium or titanium. The method for coating a light-shielding member according to claim 1, wherein the gas released by the gas source is oxygen or nitrogen. A light shielding member comprising a substrate to be coated and a film layer, wherein the film layer is a mixture of a metal palladium material and a metal palladium material reactant, from a side near the substrate to be coated to a distance away from the film to be coated On one side of the substrate, the deposition concentration of the metal palladium material in the film layer is gradually increased, and the deposition concentration of the metal palladium material is gradually decreased, and the metal palladium material has a function of reflecting light, the metal palladium material The reactants have the effect of absorbing light. The shading element of claim 8, wherein the metal palladium material is titanium or chromium. The shading element of claim 8, wherein the film layer has a different thickness depending on optical requirements. The shading element of claim 8, wherein the metal palladium reactant is an oxide or nitride of a simple material.