TWI471663B - Display panel - Google Patents

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TWI471663B
TWI471663B TW101137923A TW101137923A TWI471663B TW I471663 B TWI471663 B TW I471663B TW 101137923 A TW101137923 A TW 101137923A TW 101137923 A TW101137923 A TW 101137923A TW I471663 B TWI471663 B TW I471663B
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Taiwan
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layer
substrate
disposed
display panel
pattern layer
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TW101137923A
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Chinese (zh)
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TW201415137A (en
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Che Chia Chang
Chin An Tseng
Chin Nan Yeh
Sung Yu Su
Jiang Shih Chyuan Fan
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Au Optronics Corp
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Priority to TW101137923A priority Critical patent/TWI471663B/en
Priority to CN201210568501.0A priority patent/CN103116236B/en
Publication of TW201415137A publication Critical patent/TW201415137A/en
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Publication of TWI471663B publication Critical patent/TWI471663B/en

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Description

顯示面板Display panel

本發明係關於一種顯示面板,尤指一種具有避免間隔物產生移動之阻擋圖案層的顯示面板。The present invention relates to a display panel, and more particularly to a display panel having a barrier pattern layer that prevents spacers from moving.

顯示面板,例如液晶顯示面板,主要係由陣列基板、對向基板與設置於其間的液晶層所構成。液晶層的厚度(一般稱為液晶間隙)對於液晶顯示面板的亮度、對比度與反應時間有極大的影響,因此若液晶層的厚度產生偏差而與預設值不同,會嚴重影響顯示品質。由於液晶層是液態,因此液晶層的厚度主要是由設置於陣列基板與對向基板之間的間隔物來控制。然而,習知液晶顯示面板在組裝、搬運或使用過程中,間隔物可能會產生移動而使得液晶間隙產生變異或者導致配向膜受損,使得顯示品質下降。A display panel, such as a liquid crystal display panel, is mainly composed of an array substrate, a counter substrate, and a liquid crystal layer disposed therebetween. The thickness of the liquid crystal layer (generally referred to as a liquid crystal gap) has a great influence on the brightness, contrast, and reaction time of the liquid crystal display panel. Therefore, if the thickness of the liquid crystal layer varies depending on the preset value, the display quality is seriously affected. Since the liquid crystal layer is in a liquid state, the thickness of the liquid crystal layer is mainly controlled by a spacer provided between the array substrate and the opposite substrate. However, in the conventional liquid crystal display panel, during the assembly, handling or use, the spacer may move to cause the liquid crystal gap to mutate or cause the alignment film to be damaged, so that the display quality is degraded.

本發明之目的之一在於提供一種具有用來阻擋間隔物產生移動之阻擋圖案層的顯示面板,以提升顯示面板的顯示品質。One of the objects of the present invention is to provide a display panel having a barrier pattern layer for blocking the movement of spacers to improve the display quality of the display panel.

本發明之一實施例提供一種顯示面板,包括一第一基板、一閘極線、一資料線、一主動開關元件、一畫素電極、一介電層、一共通電極、一導電圖案層、一第二基板、一顯示介質層以及一間隔物。 閘極線、資料線以及主動開關元件設置於第一基板上。畫素電極設置於第一基板上,且畫素電極藉由主動開關元件電性連接閘極線與資料線。介電層設置於第一基板上並覆蓋閘極線、資料線以及主動開關元件。共通電極設置於介電層上,且共通電極具有一第一電阻值。導電圖案層設置於介電層上,且導電圖案層具有一第二電阻值,低於共通電極的第一電阻值。導電圖案層包括一共通線與共通電極電性連接,以及一阻擋圖案層位於閘極線上方。第二基板與第一基板面對設置。顯示介質層設置於第一基板與第二基板之間。間隔物設置於第一基板與第二基板之間。阻擋圖案層設置於間隔物之至少一側,用以阻擋間隔物產生移動。An embodiment of the present invention provides a display panel including a first substrate, a gate line, a data line, an active switching element, a pixel electrode, a dielectric layer, a common electrode, and a conductive pattern layer. a second substrate, a display medium layer and a spacer. The gate line, the data line, and the active switching element are disposed on the first substrate. The pixel electrode is disposed on the first substrate, and the pixel electrode is electrically connected to the gate line and the data line by the active switching element. The dielectric layer is disposed on the first substrate and covers the gate line, the data line, and the active switching element. The common electrode is disposed on the dielectric layer, and the common electrode has a first resistance value. The conductive pattern layer is disposed on the dielectric layer, and the conductive pattern layer has a second resistance value lower than the first resistance value of the common electrode. The conductive pattern layer includes a common line electrically connected to the common electrode, and a barrier pattern layer is located above the gate line. The second substrate is disposed facing the first substrate. The display medium layer is disposed between the first substrate and the second substrate. The spacer is disposed between the first substrate and the second substrate. The barrier pattern layer is disposed on at least one side of the spacer to block the spacer from moving.

本發明之另一實施例提供一種顯示面板,包括一第一基板、一閘極線、一資料線、一主動開關元件、一保護層、一平坦層、一共通電極、一導電圖案層、一介電層、一畫素電極、一第二基板、一顯示介質層以及一間隔物。閘極線、資料線以及主動開關元件設置於第一基板上。保護層設置於第一基板上並覆蓋閘極線、資料線以及主動開關元件。平坦層設置於保護層上。共通電極設置於第一基板上,且共通電極具有一第一電阻值。導電圖案層設置於平坦層上,且導電圖案層具有一第二電阻值,低於共通電極的第一電阻值。導電圖案層包括一共通線與共通電極電性連接;以及阻擋圖案層位於閘極線上方。介電層設置於平坦層上並覆蓋導電圖案層。畫素電極設置於介電層上,且畫素電極藉由主動開關元件電性連接閘極線與資料線。第二基板與第一基板面對設置。顯示介質層設置於第一基 板與第二基板之間。間隔物設置於第一基板與第二基板之間。阻擋圖案層設置於間隔物之至少一側,用以阻擋間隔物產生移動。Another embodiment of the present invention provides a display panel including a first substrate, a gate line, a data line, an active switching element, a protective layer, a flat layer, a common electrode, a conductive pattern layer, and a a dielectric layer, a pixel electrode, a second substrate, a display dielectric layer, and a spacer. The gate line, the data line, and the active switching element are disposed on the first substrate. The protective layer is disposed on the first substrate and covers the gate line, the data line, and the active switching element. The flat layer is disposed on the protective layer. The common electrode is disposed on the first substrate, and the common electrode has a first resistance value. The conductive pattern layer is disposed on the flat layer, and the conductive pattern layer has a second resistance value lower than the first resistance value of the common electrode. The conductive pattern layer includes a common line electrically connected to the common electrode; and the barrier pattern layer is located above the gate line. The dielectric layer is disposed on the flat layer and covers the conductive pattern layer. The pixel electrode is disposed on the dielectric layer, and the pixel electrode is electrically connected to the gate line and the data line by the active switching element. The second substrate is disposed facing the first substrate. Display medium layer is set at first base Between the board and the second substrate. The spacer is disposed between the first substrate and the second substrate. The barrier pattern layer is disposed on at least one side of the spacer to block the spacer from moving.

為使熟習本發明所屬技術領域之一般技藝者能更進一步了解本發明,下文特列舉本發明之較佳實施例,並配合所附圖式,詳細說明本發明的構成內容及所欲達成之功效。The present invention will be further understood by those of ordinary skill in the art to which the present invention pertains. .

請參考第1圖與第2圖。第1圖繪示了本發明之第一實施例之顯示面板的上視示意圖,而第2圖為沿第1圖之剖線A-A’與剖線B-B’繪示之剖面示意圖。為了簡化說明,第1圖與第2圖僅繪示了顯示面板的單一畫素。此外,本發明之顯示面板可為各式非自發光顯示面板例如液晶顯示面板,且不以此為限。如第1圖與第2圖所示,本實施例之顯示面板1包括第一基板10、閘極線GL、資料線DL、主動開關元件SW、畫素電極12、介電層14(第1圖未示)、共通電極26、導電圖案層16、第二基板30(第1圖未示)、顯示介質層18(第1圖未示)以及間隔物(spacer)20(第1圖未示)。第一基板10與第二基板30係面對設置,且第一基板10與第二基板30可分別包括一硬式基板例如玻璃基板,或是一可撓式基板例如塑膠基板,但不以此為限。在本實施例例中,第一基板10係作為陣列基板(或稱為薄膜電晶體基板),而第二基板30係作為對向基板。閘極線GL、資料線DL以及主動開關元件SW設置於第一基板10上。主動開關元件SW可由薄膜電晶體元件加以實現,且主動開關元件SW包括閘極G、 閘極絕緣層22(第1圖未示)、半導體層24、源極S與汲極D。閘極G與閘極線GL電性連接。閘極絕緣層22位於閘極G與半導體層24之間,源極S與汲極D設置於閘極絕緣層22上,並分別位於半導體層24的兩側,且源極S與汲極D分別電性連接半導體層24。源極S與資料線DL電性連接,汲極D可經由閘極絕緣層22之開口22A與畫素電極12電性連接。半導體層24的材料可為例如非晶半導體、多晶半導體、微晶半導體、單晶半導體、奈米晶半導體、有機半導體、或金屬氧化物半導體層、或其它合適的半導體材料、或上述半導體材料的組合。在本實施例中,薄膜電晶體元件為底閘型(bottom gate)薄膜電晶體元件,因此閘極線GL與閘極G可由第一金屬層(一般稱為metal 1)所構成,而資料線DL、源極S與汲極D可由第二金屬層(一般稱為metal 2)所構成,但不以此為限。在其它變化實施例中,薄膜電晶體元件亦可為頂閘型(top gate_薄膜電晶體元件,或其它類型的薄膜電晶體元件。Please refer to Figure 1 and Figure 2. Fig. 1 is a top plan view showing a display panel according to a first embodiment of the present invention, and Fig. 2 is a cross-sectional view taken along line A-A' and line B-B' of Fig. 1; In order to simplify the description, FIGS. 1 and 2 only show a single pixel of the display panel. In addition, the display panel of the present invention may be various non-self-luminous display panels such as liquid crystal display panels, and is not limited thereto. As shown in FIGS. 1 and 2, the display panel 1 of the present embodiment includes a first substrate 10, a gate line GL, a data line DL, an active switching element SW, a pixel electrode 12, and a dielectric layer 14 (first (not shown), the common electrode 26, the conductive pattern layer 16, the second substrate 30 (not shown in FIG. 1), the display medium layer 18 (not shown in FIG. 1), and a spacer 20 (not shown in FIG. 1) ). The first substrate 10 and the second substrate 30 are disposed facing each other, and the first substrate 10 and the second substrate 30 may respectively comprise a rigid substrate such as a glass substrate or a flexible substrate such as a plastic substrate, but limit. In the present embodiment, the first substrate 10 is used as an array substrate (also referred to as a thin film transistor substrate), and the second substrate 30 is used as a counter substrate. The gate line GL, the data line DL, and the active switching element SW are disposed on the first substrate 10. The active switching element SW can be implemented by a thin film transistor element, and the active switching element SW includes a gate G, The gate insulating layer 22 (not shown in FIG. 1), the semiconductor layer 24, the source S, and the drain D. The gate G is electrically connected to the gate line GL. The gate insulating layer 22 is located between the gate G and the semiconductor layer 24. The source S and the drain D are disposed on the gate insulating layer 22, and are respectively located on both sides of the semiconductor layer 24, and the source S and the drain D The semiconductor layer 24 is electrically connected to each other. The source S is electrically connected to the data line DL, and the drain D is electrically connected to the pixel electrode 12 via the opening 22A of the gate insulating layer 22. The material of the semiconductor layer 24 may be, for example, an amorphous semiconductor, a polycrystalline semiconductor, a microcrystalline semiconductor, a single crystal semiconductor, a nanocrystalline semiconductor, an organic semiconductor, or a metal oxide semiconductor layer, or other suitable semiconductor material, or the above semiconductor material. The combination. In this embodiment, the thin film transistor element is a bottom gate thin film transistor element, and thus the gate line GL and the gate G may be composed of a first metal layer (generally referred to as metal 1), and the data line DL, source S and drain D may be formed by a second metal layer (generally referred to as metal 2), but are not limited thereto. In other variant embodiments, the thin film transistor element can also be a top gate type (thin gate) or other type of thin film transistor element.

畫素電極12設置於第一基板10上,且畫素電極12藉由主動開關元件SW電性連接閘極線GL與資料線DL。畫素電極12較佳為透明電極,其材料可為例如氧化銦錫(ITO)、氧化銦鋅(IZO)或其它適合透明導電材料。畫素電極12上另外可選擇性包括圖案化金屬材料層(未圖示),可進一步降低畫素電極12的電阻值。本實施例之畫素電極12係位於第一基板10與閘極絕緣層22之間。介電層14設置於第一基板10上並覆蓋閘極線GL、資料線DL以及主動開關元件SW。本實施例之介電層14可為無機介電層例如氧化矽層、氮化 矽層或氮氧化矽層,且其可為共形(conformal)層,但不以此為限。共通電極26設置於介電層14上,共通電極26較佳為透明電極,其材料可為例如氧化銦錫(ITO)、氧化銦鋅(IZO)或其它適合透明導電材料。共通電極26具有複數條狹縫(slit)26S,而畫素電極12為平面電極,但不以此為限。導電圖案層16設置於介電層14上。在本實施例中,共通電極26具有一第一電阻值,而導電圖案層16具有一第二電阻值,低於共通電極26的第一電阻值,第二電阻值可為例如第一電阻值的1/5~1/10000等,但並不以此為限。導電圖案層16可為不透明導電圖案層例如金屬圖案層或合金圖案層,或者導電圖案層16亦可為例如由薄金屬與透明導電材料疊合所形成透明導電圖案層。導電圖案層16包括共通線CL與共通電極26電性連接,以及阻擋圖案層28位於閘極線GL上方。在本實施例中,共通線CL可為一條狀導體結構,其與資料線DL平行設置並部分重疊,但不以此為限。在其它變化實施例中,共通線CL可為一網格狀導體結構,其與資料線DL與閘極線GL部分重疊。共通電極26係與共通線CL直接接觸而電性連接,且共通電極26較佳係形成於共通線CL之後,藉此共通電極26可直接搭接於共通線CL上而形成電性連接。在其它變化實施例中,共通線CL可形成於共通電極26之前,藉此共通線CL可直接搭接於共通電極26上而形成電性連接。另外,在本實施例中,阻擋圖案層28未與共通線CL連接,但不以此為限。在其它變化實施例中,阻擋圖案層28亦可與共通線CL連接。The pixel electrode 12 is disposed on the first substrate 10, and the pixel electrode 12 is electrically connected to the gate line GL and the data line DL by the active switching element SW. The pixel electrode 12 is preferably a transparent electrode, and the material thereof may be, for example, indium tin oxide (ITO), indium zinc oxide (IZO) or other suitable transparent conductive material. Alternatively, the pixel electrode 12 may optionally include a patterned metal material layer (not shown) to further reduce the resistance value of the pixel electrode 12. The pixel electrode 12 of this embodiment is located between the first substrate 10 and the gate insulating layer 22. The dielectric layer 14 is disposed on the first substrate 10 and covers the gate line GL, the data line DL, and the active switching element SW. The dielectric layer 14 of this embodiment may be an inorganic dielectric layer such as a hafnium oxide layer or nitrided. The ruthenium layer or the ruthenium oxynitride layer, and it may be a conformal layer, but is not limited thereto. The common electrode 26 is disposed on the dielectric layer 14. The common electrode 26 is preferably a transparent electrode, and the material thereof may be, for example, indium tin oxide (ITO), indium zinc oxide (IZO) or other suitable transparent conductive material. The common electrode 26 has a plurality of slits 26S, and the pixel electrode 12 is a planar electrode, but is not limited thereto. The conductive pattern layer 16 is disposed on the dielectric layer 14. In this embodiment, the common electrode 26 has a first resistance value, and the conductive pattern layer 16 has a second resistance value lower than the first resistance value of the common electrode 26, and the second resistance value can be, for example, the first resistance value. 1/5~1/10000, etc., but not limited to this. The conductive pattern layer 16 may be an opaque conductive pattern layer such as a metal pattern layer or an alloy pattern layer, or the conductive pattern layer 16 may be a transparent conductive pattern layer formed, for example, by laminating a thin metal and a transparent conductive material. The conductive pattern layer 16 includes a common line CL electrically connected to the common electrode 26, and the barrier pattern layer 28 is located above the gate line GL. In this embodiment, the common line CL may be a strip-shaped conductor structure that is disposed in parallel with the data line DL and partially overlaps, but is not limited thereto. In other variant embodiments, the common line CL may be a grid-like conductor structure that partially overlaps the data line DL and the gate line GL. The common electrode 26 is electrically connected to the common line CL in direct contact with the common line CL, and the common electrode 26 is preferably formed after the common line CL, whereby the common electrode 26 can be directly overlapped on the common line CL to form an electrical connection. In other variant embodiments, the common line CL may be formed before the common electrode 26, whereby the common line CL may be directly overlapped on the common electrode 26 to form an electrical connection. In addition, in the embodiment, the barrier pattern layer 28 is not connected to the common line CL, but is not limited thereto. In other variant embodiments, the barrier pattern layer 28 can also be connected to the common line CL.

顯示介質層18設置於第一基板10與第二基板30之間。顯示介 質層18可包括液晶層,但亦可視顯示面板的類型不同而為其它顯示介質層,例如是有機發光材料層、反射式電泳材料層或者是電潤濕材料層等。間隔物20設置於第一基板10與第二基板30之間。間隔物20的結構可為圓柱結構、角柱結構或其它形狀之結構。間隔物20較佳設置在第二基板30上並面向第一基板10,且間隔物20與第一基板10接觸以維持第一基板10與第二基板30之間的間隙。也就是說,間隔物20係固定於第二基板30上,但僅接觸第一基板10而未完全固定於第一基板10上。顯示面板1更可另包括遮光圖案層32、彩色濾光片34與覆蓋層(overcoat layer)36,設置於第二基板30面對第一基板10的表面,以及透明屏蔽層(圖未示),設置於第二基板30的外表面。遮光圖案層32可為例如黑色矩陣圖案。彩色濾光片34可包括不同顏色的彩色濾光圖案例如紅色濾光圖案、綠色濾光圖案與藍色濾光圖案等。The display medium layer 18 is disposed between the first substrate 10 and the second substrate 30. Display The layer 18 may include a liquid crystal layer, but may be other display medium layers depending on the type of display panel, such as an organic light emitting material layer, a reflective electrophoretic material layer, or an electrowetting material layer. The spacer 20 is disposed between the first substrate 10 and the second substrate 30. The structure of the spacer 20 may be a cylindrical structure, a corner column structure or a structure of other shapes. The spacer 20 is preferably disposed on the second substrate 30 and faces the first substrate 10, and the spacer 20 is in contact with the first substrate 10 to maintain a gap between the first substrate 10 and the second substrate 30. That is, the spacer 20 is fixed to the second substrate 30, but only contacts the first substrate 10 and is not completely fixed to the first substrate 10. The display panel 1 further includes a light shielding pattern layer 32, a color filter 34 and an overcoat layer 36, a surface of the second substrate 30 facing the first substrate 10, and a transparent shielding layer (not shown). And disposed on an outer surface of the second substrate 30. The light shielding pattern layer 32 may be, for example, a black matrix pattern. The color filter 34 may include color filter patterns of different colors such as a red filter pattern, a green filter pattern, a blue filter pattern, and the like.

阻擋圖案層28係設置於間隔物20之至少一側。例如在本實施例中,阻擋圖案層28係設置於間隔物20的一側,精確地說,阻擋圖案層28是設置在間隔物20靠近畫素電極12的一側,但不以此為限。舉例而言,阻擋圖案層28可設置在間隔物20的任一側、任兩側、任三側,或是環繞間隔物20。當間隔物20朝向阻擋圖案層28的方向產生移動時,會受到阻擋圖案層28的限制而使得間隔物20的位移量在可接受的範圍內,因此不會影響到第一基板10與第二基板30的間隙或不會造成配向膜(圖未示)受損。阻擋圖案層28的厚度d應足以限制間隔物20的移動,舉例而言,阻擋圖案層28的厚 度d實質上可介於0.1微米與10微米之間,但不以此為限。另外,阻擋圖案層28與間隔物20之間具有一空隙g,且空隙g的大小可視第一基板10與第二基板30的組裝誤差或其它因素加以調整。例如,阻擋圖案層28與間隔物20的空隙g約為3微米,但不以此為限。再者,由於阻擋圖案層28與共通線CL都是由導電圖案層16所構成,因此可以使用相同的膜層與微影蝕刻製程來形成,不會增加製作成本。另外,在本實施例中,間隔物20較佳與遮光圖案層32在垂直投影方向上重疊,且間隔物20亦可與閘極線GL、資料線DL或主動開關元件SW在垂直投影方向上重疊,藉此間隔物20不會影響顯示面板1的開口率。此外,阻擋圖案層28較佳亦可與遮光圖案層32在垂直投影方向上重疊,藉此阻擋圖案層不會影響顯示面板1的開口率。The barrier pattern layer 28 is disposed on at least one side of the spacer 20. For example, in the embodiment, the barrier pattern layer 28 is disposed on one side of the spacer 20, and specifically, the barrier pattern layer 28 is disposed on the side of the spacer 20 near the pixel electrode 12, but is not limited thereto. . For example, the barrier pattern layer 28 can be disposed on either side of the spacer 20, on either side, on any three sides, or around the spacer 20. When the spacer 20 moves toward the barrier pattern layer 28, it is restricted by the barrier pattern layer 28 such that the displacement amount of the spacer 20 is within an acceptable range, thus not affecting the first substrate 10 and the second The gap of the substrate 30 may not cause damage to the alignment film (not shown). The thickness d of the barrier pattern layer 28 should be sufficient to limit the movement of the spacer 20, for example, the thickness of the barrier pattern layer 28. The degree d may be substantially between 0.1 micrometers and 10 micrometers, but is not limited thereto. In addition, a gap g is formed between the barrier pattern layer 28 and the spacer 20, and the size of the gap g can be adjusted by the assembly error of the first substrate 10 and the second substrate 30 or other factors. For example, the gap g between the barrier pattern layer 28 and the spacer 20 is about 3 micrometers, but not limited thereto. Furthermore, since the barrier pattern layer 28 and the common line CL are both formed of the conductive pattern layer 16, they can be formed using the same film layer and the lithography process without increasing the manufacturing cost. In addition, in the embodiment, the spacers 20 are preferably overlapped with the light shielding pattern layer 32 in the vertical projection direction, and the spacers 20 may also be in the vertical projection direction with the gate lines GL, the data lines DL or the active switching elements SW. The overlapping, whereby the spacer 20 does not affect the aperture ratio of the display panel 1. In addition, the barrier pattern layer 28 preferably overlaps the light-shielding pattern layer 32 in the vertical projection direction, whereby the barrier pattern layer does not affect the aperture ratio of the display panel 1.

本發明之顯示面板並不以上述實施例為限。下文將依序介紹本發明之其它較佳實施例或變化實施例之電激發光顯示面板,且為了便於比較各實施例之相異處並簡化說明,在下文之各實施例中使用相同的符號標注相同的元件,且主要針對各實施例之相異處進行說明,而不再對重覆部分進行贅述。The display panel of the present invention is not limited to the above embodiment. Hereinafter, the electroluminescent display panel of other preferred embodiments or modified embodiments of the present invention will be sequentially described, and the same symbols are used in the following embodiments in order to facilitate the comparison of the differences of the embodiments and simplify the description. The same elements are denoted by the same, and the differences between the embodiments are mainly explained, and the repeated parts will not be described again.

請參考第3圖。第3圖為本發明之第一實施例之第一變化實施樣態之顯示面板的示意圖。如第3圖所示,本第一變化實施樣態之顯示面板2之阻擋圖案層28係設置於間隔物20遠離畫素電極12的一側。Please refer to Figure 3. Fig. 3 is a schematic view showing a display panel of a first variation of the first embodiment of the present invention. As shown in FIG. 3, the barrier pattern layer 28 of the display panel 2 of the first variation embodiment is disposed on the side of the spacer 20 away from the pixel electrode 12.

請參考第4圖。第4圖為本發明之第一實施例之第二變化實施樣態之顯示面板的示意圖。如第4圖所示,本第二變化實施樣態之顯示面板3之阻擋圖案層28係設置於間隔物20之兩相對側。精確地說,阻擋圖案層28係設置於間隔物20靠近畫素電極12的一側與遠離畫素電極12的另一側。Please refer to Figure 4. Fig. 4 is a schematic view showing a display panel of a second variation of the first embodiment of the present invention. As shown in FIG. 4, the barrier pattern layer 28 of the display panel 3 of the second variation embodiment is disposed on opposite sides of the spacer 20. To be precise, the barrier pattern layer 28 is disposed on the side of the spacer 20 adjacent to the pixel electrode 12 and the other side away from the pixel electrode 12.

請參考第5圖。第5圖為本發明之第一實施例之第三變化實施樣態之顯示面板的示意圖。如第5圖所示,本第三變化實施樣態之顯示面板4之阻擋圖案層28係設置於間隔物20靠近主動開關元件SW的一側與遠離主動開關元件SW的另一側。Please refer to Figure 5. Fig. 5 is a schematic view showing a display panel of a third variation of the first embodiment of the present invention. As shown in FIG. 5, the barrier pattern layer 28 of the display panel 4 of the third variation embodiment is disposed on the side of the spacer 20 adjacent to the active switching element SW and the other side away from the active switching element SW.

請參考第6圖。第6圖為本發明之第一實施例之第四變化實施樣態之顯示面板的示意圖。如第6圖所示,本第四變化實施樣態之顯示面板5之阻擋圖案層28係環繞間隔物20。此外,在本第四變化實施樣態中,共通線CL可為網格狀導體結構,並與阻擋圖案層28電性連接。在其它實施樣態中,阻擋圖案層28可環繞間隔物20但不與共通線CL電性連接。Please refer to Figure 6. Fig. 6 is a view showing a display panel of a fourth variation of the first embodiment of the present invention. As shown in FIG. 6, the barrier pattern layer 28 of the display panel 5 of the fourth variation embodiment surrounds the spacer 20. In addition, in the fourth variation embodiment, the common line CL may be a grid-like conductor structure and electrically connected to the barrier pattern layer 28. In other implementations, the barrier pattern layer 28 can surround the spacer 20 but is not electrically connected to the common line CL.

上述實施樣態揭示了阻擋圖案層28的不同形狀與配置,但阻擋圖案層28的形狀與配置並不以上述作法為限,而可視設計不同作變更。The above embodiment discloses different shapes and configurations of the barrier pattern layer 28. However, the shape and configuration of the barrier pattern layer 28 are not limited to the above, and the visual design is different.

請參考第7圖。第7圖繪示了本發明之第二實施例之顯示面板的示意圖。如第7圖所示,不同於第一實施例,本實施例之顯示面板6之畫素電極12係設置於閘極絕緣層22與介電層14之間,且畫素電極12可直接與汲極D接觸而電性連接。例如,畫素電極12可搭接於汲極D上,或是汲極D可搭接於畫素電極12上。在本實施例中,阻擋圖案層28是設置在間隔物20靠近畫素電極12的一側,但不以此為限。阻擋圖案層28的配置可視對於間隔物20的阻擋能力或其它因素而選用第3圖至第6圖所揭示之不同變化實施樣態之任一者或其它配置。Please refer to Figure 7. Figure 7 is a schematic view showing a display panel of a second embodiment of the present invention. As shown in FIG. 7 , unlike the first embodiment, the pixel electrode 12 of the display panel 6 of the present embodiment is disposed between the gate insulating layer 22 and the dielectric layer 14 , and the pixel electrode 12 can directly The bungee D is in contact and electrically connected. For example, the pixel electrode 12 may be overlapped on the drain D, or the drain D may be overlapped on the pixel electrode 12. In this embodiment, the barrier pattern layer 28 is disposed on the side of the spacer 20 adjacent to the pixel electrode 12, but is not limited thereto. The configuration of the barrier pattern layer 28 may be selected from any of the different variations of the modes disclosed in Figures 3 through 6 or other configurations depending on the blocking capability of the spacers 20 or other factors.

請參考第8圖。第8圖繪示了本發明之第三實施例之顯示面板的示意圖。如第8圖所示,不同於第一與第二實施例,本實施例之顯示面板7另包括一平坦層38與一保護層40。保護層40係設置於第一基板10上並覆蓋閘極線GL、資料線DL以及主動開關元件SW,平坦層38設置於介電層14與保護層40之間,且畫素電極12係位於平坦層38與介電層14之間。保護層40具有一開口40A暴露出部分汲極D,平坦層38具有一開口38A暴露出部分汲極D,且畫素電極12經由開口38A與開口40A與汲極D接觸並電性連接。在本實施例中,介電層14與保護層40較佳可為無機介電層例如氧化矽層、氮化矽層或氮氧化矽層,但不以此為限;平坦層38則較佳可為有機介電層例如壓克力層。在本實施例中,阻擋圖案層28是設置在間隔物20靠近畫素電極12的一側,但不以此為限。阻擋圖案層28的配置可視對於間隔物20的阻擋能力或其它因素而選用第3圖 至第6圖所揭示之不同變化實施樣態之任一者或其它配置。Please refer to Figure 8. Figure 8 is a schematic view showing a display panel of a third embodiment of the present invention. As shown in FIG. 8, the display panel 7 of the present embodiment further includes a flat layer 38 and a protective layer 40, unlike the first and second embodiments. The protective layer 40 is disposed on the first substrate 10 and covers the gate line GL, the data line DL, and the active switching element SW. The flat layer 38 is disposed between the dielectric layer 14 and the protective layer 40, and the pixel electrode 12 is located. Between the flat layer 38 and the dielectric layer 14. The protective layer 40 has an opening 40A exposing a portion of the drain D, the flat layer 38 has an opening 38A exposing a portion of the drain D, and the pixel electrode 12 is in contact with and electrically connected to the drain D through the opening 38A and the opening 40A. In this embodiment, the dielectric layer 14 and the protective layer 40 may preferably be an inorganic dielectric layer such as a hafnium oxide layer, a tantalum nitride layer or a hafnium oxynitride layer, but not limited thereto; the planar layer 38 is preferably It can be an organic dielectric layer such as an acryl layer. In this embodiment, the barrier pattern layer 28 is disposed on the side of the spacer 20 adjacent to the pixel electrode 12, but is not limited thereto. The configuration of the barrier pattern layer 28 may be selected from the blocking ability of the spacer 20 or other factors. Any of the different variations of the implementations disclosed in FIG. 6 or other configurations.

請參考第9圖。第9圖繪示了本發明之第四實施例之顯示面板的示意圖。如第9圖所示,不同於第一、第二與第三實施例,本實施例之顯示面板8包括第一基板10、閘極線GL、資料線DL、主動開關元件SW、畫素電極12、介電層14、保護層40、平坦層38、共通電極26、導電圖案層16、第二基板30(第1圖未示)、顯示介質層18以及間隔物20。保護層40係設置於第一基板10上並覆蓋閘極線GL、資料線DL以及主動開關元件SW。平坦層38係設置於保護層40上。共通電極26係設置於第一基板上,精確地說,共通電極26係設置於平坦層38與介電層14之間。畫素電極12係設置於介電層14上。保護層40具有一開口40A暴露出部分汲極D,平坦層38具有一開口38A暴露出部分汲極D,介電層14具有一開口14A暴露出部分汲極D,且畫素電極12經由開口40A、開口38A與開口14A與汲極D接觸並電性連接。此外,畫素電極12藉由主動開關元件SW電性連接閘極線GL與資料線DL。在本實施例中,畫素電極12具有複數條狹縫12S,而共通電極26為平面電極,但不以此為限。共通電極26具有一第一電阻值,而導電圖案層16具有一第二電阻值,低於共通電極26的第一電阻值,第二電阻值可為例如第一電阻值的1/5~1/10000等,但並不以此為限。阻擋圖案層28係設置於間隔物20之至少一側。例如在本實施例中,阻擋圖案層28是設置在間隔物20靠近畫素電極12的一側,但不以此為限。阻擋圖案層28的配置可視對於間隔物20的阻擋能力或其它因素而選用第 3圖至第6圖所揭示之不同變化實施樣態之任一者或其它配置。Please refer to Figure 9. Figure 9 is a schematic view showing a display panel of a fourth embodiment of the present invention. As shown in FIG. 9, unlike the first, second, and third embodiments, the display panel 8 of the present embodiment includes a first substrate 10, a gate line GL, a data line DL, an active switching element SW, and a pixel electrode. 12. A dielectric layer 14, a protective layer 40, a planarization layer 38, a common electrode 26, a conductive pattern layer 16, a second substrate 30 (not shown in FIG. 1), a display dielectric layer 18, and a spacer 20. The protective layer 40 is disposed on the first substrate 10 and covers the gate line GL, the data line DL, and the active switching element SW. The flat layer 38 is disposed on the protective layer 40. The common electrode 26 is disposed on the first substrate. To be precise, the common electrode 26 is disposed between the flat layer 38 and the dielectric layer 14. The pixel electrode 12 is disposed on the dielectric layer 14. The protective layer 40 has an opening 40A exposing a portion of the drain D, the flat layer 38 has an opening 38A exposing a portion of the drain D, the dielectric layer 14 has an opening 14A exposing a portion of the drain D, and the pixel electrode 12 is opened through the opening 40A, the opening 38A and the opening 14A are in contact with and electrically connected to the drain D. In addition, the pixel electrode 12 is electrically connected to the gate line GL and the data line DL by the active switching element SW. In this embodiment, the pixel electrode 12 has a plurality of slits 12S, and the common electrode 26 is a planar electrode, but is not limited thereto. The common electrode 26 has a first resistance value, and the conductive pattern layer 16 has a second resistance value lower than the first resistance value of the common electrode 26, and the second resistance value can be, for example, 1/5~1 of the first resistance value. /10000, etc., but not limited to this. The barrier pattern layer 28 is disposed on at least one side of the spacer 20. For example, in the embodiment, the barrier pattern layer 28 is disposed on the side of the spacer 20 adjacent to the pixel electrode 12, but is not limited thereto. The configuration of the barrier pattern layer 28 may be selected depending on the blocking ability of the spacer 20 or other factors. Any of the different variations of the embodiment disclosed in Figures 3 through 6 or other configurations.

綜上所述,本發明之顯示面板利用阻擋圖案層來阻擋間隔物產生移動,因此可避免因為間隔物的移動導致到第一基板與第二基板的間隙改變或成配向膜受損的問題,進而提升顯示品質。In summary, the display panel of the present invention utilizes the barrier pattern layer to block the spacer from moving, thereby avoiding the problem that the gap between the first substrate and the second substrate is changed or the alignment film is damaged due to the movement of the spacer. In turn, the display quality is improved.

以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。The above are only the preferred embodiments of the present invention, and all changes and modifications made to the scope of the present invention should be within the scope of the present invention.

1‧‧‧顯示面板1‧‧‧ display panel

10‧‧‧第一基板10‧‧‧First substrate

GL‧‧‧閘極線GL‧‧‧ gate line

DL‧‧‧資料線DL‧‧‧ data line

SW‧‧‧主動開關元件SW‧‧‧active switching elements

12‧‧‧畫素電極12‧‧‧ pixel electrodes

14‧‧‧介電層14‧‧‧Dielectric layer

16‧‧‧導電圖案層16‧‧‧conductive pattern layer

18‧‧‧顯示介質層18‧‧‧ Display media layer

20‧‧‧間隔物20‧‧‧ spacers

22‧‧‧閘極絕緣層22‧‧‧ gate insulation

24‧‧‧半導體層24‧‧‧Semiconductor layer

G‧‧‧閘極G‧‧‧ gate

S‧‧‧源極S‧‧‧ source

D‧‧‧汲極D‧‧‧汲

22A‧‧‧開口22A‧‧‧ openings

26‧‧‧共通電極26‧‧‧Common electrode

26S‧‧‧狹縫26S‧‧‧Slit

CL‧‧‧共通線CL‧‧‧Common line

28‧‧‧阻擋圖案層28‧‧‧Block pattern layer

30‧‧‧第二基板30‧‧‧second substrate

32‧‧‧遮光圖案層32‧‧‧Lighting pattern layer

34‧‧‧彩色濾光片34‧‧‧Color filters

36‧‧‧覆蓋層36‧‧‧ Coverage

d‧‧‧厚度D‧‧‧thickness

g‧‧‧空隙g‧‧‧Void

38‧‧‧平坦層38‧‧‧flat layer

40‧‧‧保護層40‧‧‧Protective layer

12S‧‧‧狹縫12S‧‧‧Slit

38A‧‧‧開口38A‧‧‧ openings

40A‧‧‧開口40A‧‧‧ openings

14A‧‧‧開口14A‧‧‧ openings

3‧‧‧顯示面板3‧‧‧ display panel

2‧‧‧顯示面板2‧‧‧ display panel

4‧‧‧顯示面板4‧‧‧ display panel

5‧‧‧顯示面板5‧‧‧ display panel

6‧‧‧顯示面板6‧‧‧ display panel

7‧‧‧顯示面板7‧‧‧ display panel

8‧‧‧顯示面板8‧‧‧ display panel

第1圖繪示了本發明之第一實施例之顯示面板的上視示意圖。FIG. 1 is a top plan view showing a display panel according to a first embodiment of the present invention.

第2圖為沿第1圖之剖線A-A’與剖線B-B’繪示之剖面示意圖。Fig. 2 is a schematic cross-sectional view taken along line A-A' and line B-B' of Fig. 1.

第3圖為本發明之第一實施例之第一變化實施樣態之顯示面板的示意圖。Fig. 3 is a schematic view showing a display panel of a first variation of the first embodiment of the present invention.

第4圖為本發明之第一實施例之第二變化實施樣態之顯示面板的示意圖。Fig. 4 is a schematic view showing a display panel of a second variation of the first embodiment of the present invention.

第5圖為本發明之第一實施例之第三變化實施樣態之顯示面板的示意圖。Fig. 5 is a schematic view showing a display panel of a third variation of the first embodiment of the present invention.

第6圖為本發明之第一實施例之第四變化實施樣態之顯示面板的示意圖。Fig. 6 is a view showing a display panel of a fourth variation of the first embodiment of the present invention.

第7圖繪示了本發明之第二實施例之顯示面板的示意圖。Figure 7 is a schematic view showing a display panel of a second embodiment of the present invention.

第8圖繪示了本發明之第三實施例之顯示面板的示意圖。Figure 8 is a schematic view showing a display panel of a third embodiment of the present invention.

第9圖繪示了本發明之第四實施例之顯示面板的示意圖。Figure 9 is a schematic view showing a display panel of a fourth embodiment of the present invention.

1‧‧‧顯示面板1‧‧‧ display panel

10‧‧‧第一基板10‧‧‧First substrate

DL‧‧‧資料線DL‧‧‧ data line

CL‧‧‧共通線CL‧‧‧Common line

SW‧‧‧主動開關元件SW‧‧‧active switching elements

12‧‧‧畫素電極12‧‧‧ pixel electrodes

14‧‧‧介電層14‧‧‧Dielectric layer

16‧‧‧導電圖案層16‧‧‧conductive pattern layer

18‧‧‧顯示介質層18‧‧‧ Display media layer

20‧‧‧間隔物20‧‧‧ spacers

22‧‧‧閘極絕緣層22‧‧‧ gate insulation

24‧‧‧半導體層24‧‧‧Semiconductor layer

G‧‧‧閘極G‧‧‧ gate

S‧‧‧源極S‧‧‧ source

D‧‧‧汲極D‧‧‧汲

22A‧‧‧開口22A‧‧‧ openings

26‧‧‧共通電極26‧‧‧Common electrode

26S‧‧‧狹縫26S‧‧‧Slit

28‧‧‧阻擋圖案層28‧‧‧Block pattern layer

30‧‧‧第二基板30‧‧‧second substrate

32‧‧‧遮光圖案層32‧‧‧Lighting pattern layer

34‧‧‧彩色濾光片34‧‧‧Color filters

36‧‧‧覆蓋層36‧‧‧ Coverage

g‧‧‧空隙g‧‧‧Void

d‧‧‧厚度D‧‧‧thickness

GL‧‧‧閘極線GL‧‧‧ gate line

Claims (24)

一種顯示面板,包括:一第一基板;一閘極線、一資料線以及一主動開關元件,設置於該第一基板上;一畫素電極,設置於該第一基板上,其中該畫素電極藉由該主動開關元件電性連接該閘極線與該資料線;一介電層,設置於該第一基板上並覆蓋該閘極線、該資料線以及該主動開關元件;一共通電極,設置於該介電層上,該共通電極具有一第一電阻值;一導電圖案層,設置於該介電層上,該導電圖案層具有一第二電阻值,低於該共通電極的該第一電阻值,該導電圖案層包括:一共通線,與該共通電極電性連接;以及一阻擋圖案層,位於該閘極線上方;一第二基板,與該第一基板面對設置;一顯示介質層,設置於該第一基板與該第二基板之間;以及一間隔物(spacer),設置於該第一基板與該第二基板之間;其中該阻擋圖案層係設置於該間隔物之至少一側,用以阻擋該間隔物產生移動。A display panel includes: a first substrate; a gate line, a data line, and an active switching element disposed on the first substrate; a pixel electrode disposed on the first substrate, wherein the pixel The electrode is electrically connected to the gate line and the data line by the active switching element; a dielectric layer is disposed on the first substrate and covers the gate line, the data line and the active switching element; a common electrode Provided on the dielectric layer, the common electrode has a first resistance value; a conductive pattern layer is disposed on the dielectric layer, the conductive pattern layer has a second resistance value lower than the common electrode a first resistance value, the conductive pattern layer includes: a common line electrically connected to the common electrode; and a barrier pattern layer located above the gate line; a second substrate facing the first substrate; a display medium layer disposed between the first substrate and the second substrate; and a spacer disposed between the first substrate and the second substrate; wherein the barrier pattern layer is disposed on the At least one of the spacers , To block movement of the spacer was produced. 如請求項1所述之顯示面板,其中該主動開關元件包括一閘極、一閘極絕緣層、一半導體層、一源極與一汲極,該閘極絕緣層位於該閘極與該半導體層之間,該源極與該汲極位於該半導體層兩側,且該源極與該汲極分別電性連接該半導體層。The display panel of claim 1, wherein the active switching element comprises a gate, a gate insulating layer, a semiconductor layer, a source and a drain, the gate insulating layer is located at the gate and the semiconductor Between the layers, the source and the drain are located on opposite sides of the semiconductor layer, and the source and the drain are electrically connected to the semiconductor layer, respectively. 如請求項2所述之顯示面板,其中該畫素電極係位於該第一基板與該閘極絕緣層之間。The display panel of claim 2, wherein the pixel electrode is located between the first substrate and the gate insulating layer. 如請求項2所述之顯示面板,其中該畫素電極係位該閘極絕緣層與該介電層之間。The display panel of claim 2, wherein the pixel electrode is between the gate insulating layer and the dielectric layer. 如請求項2所述之顯示面板,另包括一平坦層與一保護層,其中該保護層設置於該第一基板上並覆蓋該閘極線、該資料線以及該主動開關元件,該平坦層設置於該介電層與該保護層之間,且該畫素電極係位於該平坦層與該介電層之間。The display panel of claim 2, further comprising a flat layer and a protective layer, wherein the protective layer is disposed on the first substrate and covers the gate line, the data line, and the active switching element, the flat layer And disposed between the dielectric layer and the protective layer, and the pixel electrode is located between the planar layer and the dielectric layer. 如請求項1所述之顯示面板,其中該阻擋圖案層與該閘極線在一垂直投影方向上重疊。The display panel of claim 1, wherein the barrier pattern layer and the gate line overlap in a vertical projection direction. 如請求項1所述之顯示面板,另包括一遮光圖案層,設置於該第二基板上,且該間隔物與該遮光圖案層在一垂直投影方向上重疊。The display panel of claim 1, further comprising a light shielding pattern layer disposed on the second substrate, wherein the spacer and the light shielding pattern layer overlap in a vertical projection direction. 如請求項7所述之顯示面板,其中該阻擋圖案層與該遮光圖案層在該垂直投影方向上重疊。The display panel of claim 7, wherein the barrier pattern layer and the light shielding pattern layer overlap in the vertical projection direction. 如請求項1所述之顯示面板,其中該阻擋圖案層係設置於該間隔 物之兩相對側。The display panel of claim 1, wherein the barrier pattern layer is disposed at the interval The opposite side of the object. 如請求項1所述之顯示面板,其中該阻擋圖案層環繞該間隔物。The display panel of claim 1, wherein the barrier pattern layer surrounds the spacer. 如請求項1所述之顯示面板,其中該阻擋圖案層與該共通線電性連接。The display panel of claim 1, wherein the barrier pattern layer is electrically connected to the common line. 如請求項1所述之顯示面板,其中該阻擋圖案層與該間隔物之間具有一空隙。The display panel of claim 1, wherein the barrier pattern layer has a gap between the spacer and the spacer. 如請求項1所述之顯示面板,其中該阻擋圖案層的厚度實質上介於0.1微米與10微米之間。The display panel of claim 1, wherein the barrier pattern layer has a thickness substantially between 0.1 micrometers and 10 micrometers. 如請求項1所述之顯示面板,其中該間隔物設置在該第二基板上並面向該第一基板。The display panel of claim 1, wherein the spacer is disposed on the second substrate and faces the first substrate. 一種顯示面板,包括:一第一基板;一閘極線、一資料線以及一主動開關元件,設置於該第一基板上;一保護層,設置於該第一基板上並覆蓋該閘極線、該資料線以及該主動開關元件;一平坦層,設置於該保護層上;一共通電極,設置於該第一基板上,該共通電極具有一第一電阻 值;一導電圖案層,設置於該平坦層上,該導電圖案層具有一第二電阻值,低於該共通電極的該第一電阻值,該導電圖案層包括:一共通線,與該共通電極電性連接;以及一阻擋圖案層,位於該閘極線上方;一介電層,設置於該平坦層上,覆蓋該導電圖案層;一畫素電極,設置於該介電層上,其中該畫素電極藉由該主動開關元件電性連接該閘極線與該資料線;一第二基板,與該第一基板面對設置;一顯示介質層,設置於該第一基板與該第二基板之間;以及一間隔物(spacer),設置於該第一基板與該第二基板之間;其中該阻擋圖案層係設置於該間隔物之至少一側,用以阻擋該間隔物產生移動。A display panel includes: a first substrate; a gate line, a data line, and an active switching element disposed on the first substrate; a protective layer disposed on the first substrate and covering the gate line The data line and the active switching element; a flat layer disposed on the protective layer; a common electrode disposed on the first substrate, the common electrode having a first resistance a conductive pattern layer disposed on the flat layer, the conductive pattern layer having a second resistance value lower than the first resistance value of the common electrode, the conductive pattern layer comprising: a common line, common to the common An electrode is electrically connected; and a barrier pattern layer is disposed above the gate line; a dielectric layer is disposed on the planar layer to cover the conductive pattern layer; and a pixel electrode is disposed on the dielectric layer, wherein The pixel electrode is electrically connected to the gate line and the data line by the active switching element; a second substrate is disposed facing the first substrate; a display medium layer is disposed on the first substrate and the first substrate Between the two substrates; and a spacer disposed between the first substrate and the second substrate; wherein the barrier pattern layer is disposed on at least one side of the spacer to block the spacer from being generated mobile. 如請求項15所述之顯示面板,其中該阻擋圖案層與該閘極線在一垂直投影方向上重疊。The display panel of claim 15, wherein the barrier pattern layer and the gate line overlap in a vertical projection direction. 如請求項15所述之顯示面板,另包括一遮光圖案層,設置於該第二基板上,且該間隔物與該遮光圖案層在一垂直投影方向上重疊。The display panel of claim 15, further comprising a light shielding pattern layer disposed on the second substrate, wherein the spacer and the light shielding pattern layer overlap in a vertical projection direction. 如請求項17所述之顯示面板,其中該阻擋圖案層與該遮光圖案層在該垂直投影方向上重疊。The display panel of claim 17, wherein the barrier pattern layer and the light shielding pattern layer overlap in the vertical projection direction. 如請求項15所述之顯示面板,其中該阻擋圖案層係設置於該間隔物之兩相對側。The display panel of claim 15, wherein the barrier pattern layer is disposed on opposite sides of the spacer. 如請求項15所述之顯示面板,其中該阻擋圖案層環繞該間隔物。The display panel of claim 15, wherein the barrier pattern layer surrounds the spacer. 如請求項15所述之顯示面板,其中該阻擋圖案層與該共通線電性連接。The display panel of claim 15, wherein the barrier pattern layer is electrically connected to the common line. 如請求項15所述之顯示面板,其中該阻擋圖案層與該間隔物之間具有一空隙。The display panel of claim 15, wherein the barrier pattern layer has a gap between the spacer and the spacer. 如請求項15所述之顯示面板,其中該阻擋圖案層的厚度實質上介於0.1微米與10微米之間。The display panel of claim 15, wherein the barrier pattern layer has a thickness substantially between 0.1 micrometers and 10 micrometers. 如請求項15所述之顯示面板,其中該間隔物設置在該第二基板上並面向該第一基板。The display panel of claim 15, wherein the spacer is disposed on the second substrate and faces the first substrate.
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