TWI468879B - Charged particle beam lithography system and target positioning device - Google Patents

Description

Charged particle beam lithography system and target positioning device

The present invention relates to a charged particle beam exposure system, such as a lithography system for unmasked image projection, scanning and non-scanning electron microscopy, and the like.

Charged particle beam lithography systems, such as electron beam unshielded lithography systems, are well known and have no need to change and mount masks as compared to conventional mask-based lithography systems. Or the relationship of the reticle, so it has the advantage that it can be made as needed. Instead of the method, the image to be projected to make the integrated circuit is stored in the memory of the computer that controls the unmasked exposure system.

Such known charged particle beam exposure systems typically include a charged particle column placed in a vacuum chamber. The charged particle column comprises a charged particle source comprising a charged particle extraction member and a plurality of electrostatic lens structures for focusing and deflecting one or more charged particles on and above a target (eg, a wafer) The purpose of the beam. Furthermore, the charged particle column further includes a modulation component for modulating the one or more charged particle beams that are dependent on whether the image to be projected needs to be exposed at a particular location.

During this projection, the target area is guided by a platform supporting the object based on the projected area of the charged particle column. For this new type of maskless lithography, it is difficult to design a suitable platform, at least not commercially available. Can be adapted for use in maskless lithography It is said that at least in terms of size, cost, and vacuum compatibility, most known platforms are not suitable.

As such, electromagnetic scattering fields that are often present at actuators (especially electromagnetic actuators) are generally undesirable in such systems because any electrical changes in the magnetic field may affect the position of the charged particle beam. Known systems are capable of reducing the electromagnetic field caused by an electromagnetic actuator by arranging the electromagnetic actuator at a position away from the target bearing surface and providing a multiple shield in the electromagnetic actuator fluctuation.

It is an object of the present invention to provide a charged particle beam lithography system; and to provide an operation method that utilizes an object locating device that is optimized for charged particle beam exposure of a target.

According to a first aspect, the present invention provides a charged particle beam lithography system comprising: a charged particle optical column that is arranged in a vacuum chamber for projecting a charged particle beam to a target Above the object, wherein the charged particle optical column comprises a deflecting member for deflecting the charged particle beam in a deflecting direction, a target positioning device comprising a carrier for carrying the target a carrier, and a platform for carrying and moving the carrier in a first direction, wherein the first direction is different from the deflecting direction, and wherein the target positioning device comprises a first actuator Translating the platform in the first direction relative to the charged particle optical column, wherein the carrier is movably arranged on the platform And wherein the target positioning device comprises a holding member for holding the carrier in accordance with the platform.

During exposure of an object in a lithography system in accordance with the present invention, the target is moved in the first direction relative to the one or more charged particle beams by activating the first actuator And the deflecting members in the charged particle optical column are simultaneously activated to deflect the one or more charged particle beams in the deflecting direction. With this type of exposure, a narrow area in the target may be exposed to project an image to be projected at this area. The length of this elongated region depends on the extent of travel of the platform, while the width of the elongated region depends on the extent of the deflection. During illumination of this elongated region, the target at the top of the carrier will remain substantially in the same position. After the elongated region has been illuminated, the carrier with the target at the top can be moved such that the new region is exposed to the charged particle beam. In order to maintain the position of the carrier relative to the platform, at least in the deflecting direction, at least during projection, the target positioning device of the present invention includes a retaining member for holding the carrier in accordance with the platform. The holding member is capable of stably holding the platform, particularly during driving of the platform in the first direction.

Preferably, the retaining members are arranged such that when the platform is held, there is no or at least minimal leakage magnetic field and/or electric field, and/or fluctuations in the magnetic and/or electric fields. In this case, there is no disturbance and/or interference to the track, and thus there is no disturbance and/or interference with the position of the charged particle beam.

In an embodiment, the carrier is movable in a second direction, wherein The second direction is different from the first direction, and preferably the second direction is substantially the same as the deflecting direction. In a further embodiment, the second direction is substantially perpendicular to the first direction, thereby providing an orthogonal target localization.

In one embodiment, the platform is a first platform, and wherein the target positioning device comprises a second platform between the carrier and the first platform, wherein the second platform is arranged to be used The carrier is moved in the second direction, and wherein the retaining members are arranged to stop or prevent movement of the second platform.

In a first embodiment, the holding member includes a piezoelectric motor for moving the carrier in the second direction. A piezoelectric motor, in particular a resonant piezoelectric motor, is capable of simultaneously providing a driving action for moving the carrier in the second direction and a holding action for fixing the position of the carrier relative to the platform, at least during projection. Preferably, the piezoelectric motor is arranged as an actuator of the second platform. The use of such a piezoelectric motor in a lithography system in accordance with the present invention does not require shielding the motor from damage by the charged particle optical column, at least during the holding action. Such a piezoelectric motor can be arranged adjacent to the target of the carrier and the tip, which can improve the accuracy of positioning the carrier in accordance with the platform. Furthermore, such piezoelectric motors can also be arranged inside a shield member for at least partially shielding the charged particle optical column from environmental magnetic fields and/or electric fields.

In one embodiment, the carrier is interposed and/or constrained between two opposing piezoelectric motors. In this case, any force or momentum exerted on the carrier by one of the piezoelectric motors may be at least partially The ground is offset by the force or momentum exerted by the other of the two opposing piezoelectric motors. This provides very precise and stable retention of the carrier during exposure of the target; and/or provides very precise and stable movement of the carrier in the direction of deflection, for example, in continuous exposure between.

In a second embodiment, the retaining member includes an extendable and collapsible jaw member that can be placed in an extended position for clamping and thereby retaining the carrier in accordance with the platform; and can be placed in At the retracted position, the carrier is released in accordance with the platform and the carrier is allowed to move in accordance with the platform. The jaw members provide a mechanical interlock between the carrier and the platform.

In one embodiment, the retaining member includes a releasable latching member for locking the position of the carrier in accordance with the platform and allowing the carrier to be moved in accordance with the platform when the latching member is released. The latch members provide a mechanical interlock between the carrier and the platform.

In an embodiment, the jaw member or the latching member comprises a piezoelectric element. These piezoelectric elements may be driven by electrical signals and are well suited for use in ultra-clean and vacuum environments that are often required in lithography systems.

In one embodiment, the target positioning device includes a second actuator, preferably separate from the jaw member or the latch member for moving the carrier in the second direction. In this embodiment, when the position of the carrier is held by the holding member in accordance with the platform, it is not necessary to generate any fixed momentum from the second actuator. When the carrier is held, the second actuator may be turned off to advance at least during image projection Step down any magnetic field and / or electric field.

In an embodiment, the second actuators are arranged to reduce and/or minimize leakage of magnetic fields and/or electric fields (eg, electromagnetic scattering fields) to the first portion when the second actuator is turned off. Two actuators outside.

To reduce leakage of the magnetic field and/or electric field, the second actuator may be provided with a shielding member to at least partially prevent leakage of magnetic fields and/or electric fields to the outside of the second actuator.

Alternatively, and even in addition, in an embodiment, the second actuator comprises an inductive motor. In one embodiment, the inductive motor includes a core made of a non-ferromagnetic material. In an embodiment, the non-ferromagnetic material comprises aluminum. These actuators are substantially free of any magnetic material and thus do not have any magnetic field and/or electric field leaking out of the actuator at least when turned off. Such a second actuator is used in a lithography system in accordance with the present invention which does not need to be shielded from damage by the charged particle optical column. Such a second actuator can be arranged adjacent to the carrier and the target of the tip, which can improve the accuracy of positioning the carrier in accordance with the platform. Furthermore, such a second actuator can also be arranged inside a shield member for at least partially shielding the charged particle optical column from environmental magnetic fields and/or electric fields.

Conversely, the first actuator (which is driven when a charged particle beam is projected onto the target) is preferably arranged outside of the optical column shield member, the shield member being used The charged particle optical column is at least partially shielded from damage by environmental magnetic fields and/or electric fields. Or even in addition to this, the first actuator can also be arranged away from the platform Distance. In one embodiment, the target positioning device is arranged in a vacuum chamber, wherein the first actuator is placed outside of the first vacuum chamber. In one embodiment, the optical shielding members may be arranged such that the lining of the first vacuum chamber or may be integrated into the wall of the first vacuum chamber.

In an embodiment, the target positioning device includes a coupling member for releasably coupling the carrier to the second actuator. Due to the relationship of the coupling members, for example, when the second actuator is in the holding position of the platform, the carrier may be decoupled from the second actuator. In this case, any momentum from the second actuator is not transmitted to the carrier. More importantly, in this embodiment, a second actuator may be used that will be arranged to provide a short stroke and preferably a precise stroke to move the carrier in accordance with the platform. Basically, the combination of the retaining member and the coupling member described above provides the possibility of using a short stroke second actuator. To move the carrier in accordance with the platform, a method comprising the steps of: a. actuating the coupling member and preferably canceling the holding member; b. actuating the second actuator for use in the second direction Moving the carrier; c. canceling the second actuator and preferably actuating the retaining member; d. canceling the coupling member; and e. actuating the second actuator for the second actuation The device (especially its drive component) returns in the reverse direction in the second direction. To advance further in the second direction, the coupling member will be activated again and the holding member will be cancelled, and the steps described above will be further repeated.

In an embodiment, the coupling member comprises a piezoelectric element. In one embodiment, the piezoelectric elements are arranged to couple the carrier to the second actuator in an extended position of the piezoelectric elements and for use in the piezoelectric elements The coupling of the carrier to the actuator is released in the retracted position. In one embodiment, the piezoelectric elements are arranged to seat the carrier at the top end of the second actuator at least when the carrier is coupled to the second actuator.

According to a second aspect, the present invention provides an object locating device for the charged particle beam lithography system described above.

According to a third aspect, the present invention provides a method for projecting an image onto a region of a target in the charged particle beam lithography system described above, specifically wherein the method includes the following Step: i activating the holding member; ii projecting at least a portion of the image onto at least a portion of the region using a combination of the following steps: activating the first actuator to move the target in the first direction; A charged particle optical column is activated to project the charged particle beam onto the target; and the deflecting member is activated to deflect the charged particle beam in a deflecting direction; iii the charged particle The optical beam is moved outside of the region and/or the charged particle optical column is removed; and iv the retaining member is removed for moving the carrier in the second direction.

According to a fourth aspect, the present invention is directed to a method for projecting an image onto a region of a target in the charged particle beam lithography system described above, specifically, wherein the target Positioning device includes a first actuator for moving the platform relative to the charged particle optical column in a first direction, and wherein the target positioning device includes a piezoelectric motor for moving the second direction a carrier, wherein the method comprises the steps of: i controlling the piezoelectric motor to hold the position of the carrier in the second direction so as not to move; ii at least a portion of the image using a combination of the following steps Projecting on at least a portion of the region: activating the first actuator to move the target in the first direction; activating the charged particle optical column to project the charged particle beam at the target And actuating the deflecting member to deflect the charged particle beam in a deflecting direction; iii moving the charged particle optical beam to the outside of the region and/or canceling the charged particle optical column; Iv controlling the piezoelectric motor to move the carrier in the second direction.

According to a fifth aspect, the present invention relates to a method for projecting an image onto a certain area of a target in the charged particle beam lithography system described above, specifically, wherein the target The positioning device includes a first actuator for moving the platform relative to the charged particle optical column in a first direction, and wherein the target positioning device includes a second actuator for use in the second Moving the carrier in a direction, wherein the method comprises the steps of: i canceling the second actuator and actuating the holding member for holding the position of the carrier in the second direction so as not to move; Ii projecting at least a portion of the image onto at least a portion of the region using a combination of the steps of: activating the first actuator to move the target in the first direction; activating the charged particle optical column, Projecting the charged particle beam onto the target; and activating the deflecting member to deflect the charged particle beam in a deflecting direction; iii moving the charged particle optical beam to the region Externally and/or canceling the charged particle optical column; and iv canceling the holding member and activating the second actuator to move the carrier in the second direction.

In one embodiment, the method described above further includes the steps of: v. moving the carrier in the second direction at a distance equal to or less than the deflecting member deflecting the charged particle beam in the second direction Degree.

In an embodiment, steps i, ii, iii, iv, and v in the above method are repeatedly performed, and preferably, are repeatedly performed repeatedly.

In an embodiment of the method described above, the charged particle optical column is cancelled by avoiding the charged particle beam from reaching the target. In an embodiment of the method described above, the source of charged particles in the charged particle optical column is turned off or the cathode of the charged particle source is switched to a positive potential higher than the anode of the charged particle source. Each of the particle optical columns is eliminated, wherein the charged particle source is preferably an electron source.

According to another aspect, the present invention provides a charged particle beam lithography system comprising: a charged particle optical column that is arranged in a vacuum chamber for use Projecting a charged particle beam onto a target, wherein the charged particle optical column includes a deflecting member for deflecting the charged particle beam in a deflecting direction, a target positioning device, The utility model comprises a carrier for carrying the target, and a platform for carrying and moving the carrier along the first direction, wherein the first direction is different from the deflection direction, wherein the target The positioning device includes a first actuator for moving the platform in the first direction relative to the charged particle optical column, wherein the carrier is movably arranged on the platform, and wherein The target positioning device includes a retaining member for holding the carrier in the first relative position in accordance with the platform.

The carrier is moveable in a second direction, wherein the second direction is substantially the same as the deflection direction.

The retaining members can be arranged to at least minimize leakage magnetic fields and/or electric fields, and/or fluctuations in such magnetic fields and/or electric fields, at least when the carrier is held to the platform.

The retaining member includes an extendable and collapsible jaw member that can be placed at the extended position to clamp and thereby retain the carrier in accordance with the platform; and can be placed at the retracted position for use in accordance with the The platform releases the carrier and allows the carrier to be moved in accordance with the platform.

The jaw stop member includes a piezoelectric element.

The retaining member can include a piezoelectric motor for moving the carrier in a second direction.

The carrier can be inserted and/or constrained in two opposing piezoelectric motors between.

The target positioning device includes a second actuator for moving the carrier in the second direction.

The second actuator will be arranged to at least minimize magnetic field and/or electric field leakage to the outside of the second actuator (e.g., electromagnetic scattering field) at least when the second actuator is closed.

The second actuator includes an inductive motor.

The inductive motor includes a core made of a non-ferromagnetic material.

The target positioning device includes a coupling member for releasably coupling the carrier to the second actuator.

The coupling members are arranged to minimize at least leakage magnetic fields and/or electric fields, and/or fluctuations in the magnetic fields and/or electric fields, at least when the carrier is not coupled to the second actuator.

The coupling member includes a piezoelectric element.

The charged particle beam lithography system as described above, further comprising an optical column shielding member for at least partially shielding the charged particle optical column from damage by an environmental magnetic field and/or an electric field.

The first actuator will be arranged outside the optical column shielding member, and wherein the holding member will be arranged inside the shielding member.

The target positioning device includes a second actuator for moving the carrier in a second direction, and the second actuator is arranged inside the shield member.

The optical column shield members are arranged as linings of the vacuum chamber.

The first actuator will be arranged outside of the vacuum chamber.

According to another aspect, the present invention provides an object locating device for the charged particle beam lithography system described above.

According to another aspect, the present invention provides a method for projecting an image onto a region of a target in a charged particle beam lithography system in a charged particle beam lithography system as described above, The method comprises the steps of: i starting the holding member; ii projecting at least a portion of the image onto at least a portion of the region using a combination of the steps of: actuating the first actuator to move the first direction a target object; the charged particle optical column is activated to project the charged particle beam onto the target; and the deflecting member is activated to deflect the charged particle beam in a deflecting direction; The charged particle optical beam moves to the outside of the region and/or cancels the charged particle optical column; and iv cancels the holding member for moving the carrier in the second direction.

According to another aspect, the present invention provides a method for projecting an image onto a region of a target in a charged particle beam lithography system as described above, wherein the charged particle beam lithography system The holding member includes a piezoelectric motor for moving the carrier in a second direction, the method comprising the steps of: i controlling the piezoelectric motor to hold the platform in the second direction a position such that it does not move; ii projecting at least a portion of the image onto at least a portion of the region using a combination of the following steps: activating the first actuator to move the target in the first direction Activating the charged particle optical column for projecting the charged particle beam onto the target; and activating the deflecting member to deflect the charged particle beam in a deflecting direction; iii charging the beam The particle optical beam moves outside of the region and/or cancels the charged particle optical column; and iv controls the piezoelectric motor to move the carrier in the second direction.

According to another aspect, the present invention provides a method for projecting an image onto a region of a target in a charged particle beam lithography system as described above, wherein the charged particle beam lithography system The target positioning device includes a second actuator for moving the carrier in a second direction, the method comprising the steps of: i canceling the second actuator and activating the holding member for the second Positioning the platform in the direction so that it does not move; ii projecting at least a portion of the image onto at least a portion of the region using a combination of the following steps: activating the first actuator for use in the first direction Moving the target in the middle; A charged particle optical column is activated to project the charged particle beam onto the target; and the deflecting member is activated to deflect the charged particle beam in a deflecting direction; iii the charged particle The optical beam moves outside of the area and/or cancels the charged particle optical column; and iv cancels the holding member and activates the second actuator to move the carrier in the second direction.

A method according to the above aspect, wherein a target positioning device comprises a coupling member for releasably coupling the carrier to the second actuator, and further comprising the step of: a. activating the coupling member b. activating the second actuator to move the carrier in a second direction; c. canceling the second actuator; d. canceling the coupling member; and e. activating the second actuator, The second actuator (especially its driving component) is used to reverse back in the second direction.

The method according to the previous aspect, further comprising the step of: v. moving the carrier in the second direction a distance equal to or less than a degree to which the deflecting member deflects the charged particle beam in the second direction.

According to the method of the previous aspect, wherein steps i, ii, iii, iv, and v are repeatedly performed.

The method according to the above aspect, wherein in step iii, the charged particle optics is cancelled by avoiding the charged particle beam from reaching the target column.

The method according to the above aspect, wherein the charging is cancelled by turning off a charged particle source in the charged particle optical column or by switching the cathode of the charged particle source to a positive potential higher than the anode of the charged particle source. Particle optical column.

The opinions and features described and illustrated in this specification can be applied separately as necessary. These individual views, especially those mentioned in the accompanying dependent patent application, may be the main content of the divided patent application.

Figure 1 shows diagrammatically a system 1 for charged particle beam lithography using a bulky array of parallel charged particle beams (so-called cp beams). In this example, the charged particle beams are electron beams. One of these cp beams 2 is shown in FIG.

All cp beams are separately controlled in a known manner by a modulator to write a pattern on top of object 3 (in this case, a wafer). The main advantage of this system is that it can be written in very small structures and without expensive masks compared to conventional optical systems. The latter will significantly reduce the start-up costs of batch production, making the system very advantageous for prototype and medium production.

The system according to the present invention consists of three main subsystems: a data path subsystem (not shown in Figure 1); a charged particle optical column 4, for example, an electron optical column; and a target positioning device 5.

The charged particle optical column 4 creates a bulky array of parallel focused cp beams 2 that are emitted from the bottom of the charged particle optical column 4. Each cp beam is controlled by this data path. In a manner known per se, the cp beams are "turned on" and "off" and the position of the cp beams is adjusted based on the data in a small range. In the last part of the charged particle optical column, which is actually at the projection lens 41, the cp beams 2 are deflected back and forth, which substantially traverses the target or wafer module 51. The first direction of motion X is such that the purpose of writing a feature pattern or representing a structure over the object 3 is achieved.

Due to the nature of the cp beam 2, their orbits may change due to magnetic fields and/or electric fields. Among the charged particle optical columns 4, this will be used to control the cp beams 2 and to project the cp beams 2 onto the target 3. To shield the charged particle optical column 4 from environmental magnetic fields and/or electric fields (which may interfere with the orbit of the cp beam 2 and thus induce a deviation from the position of the cp beam 2 on the target 3 The destruction, at least the charged particle optical column 4 will have a shield 6 comprising one or more layers of μ-metal. In the example shown in FIG. 1, the target positioning device 5 is also placed in the shield 6. The shield 6 is arranged in a suitable manner into the vacuum chamber of the charged particle optical column 4 and the lining of the vacuum chamber of the target positioning device 5. This shield will be arranged to substantially attenuate the earth magnetic field. In an important configuration, the attenuation factor will be approximately 1000 times.

The target positioning device 5 places an object 3 in the focal plane of the charged particle optical column 4 and moves it below. The target The positioning device 5 includes: a target module 51 for holding a target; and a platform component for being in the first X direction by a platform (hereinafter further referred to as the x platform 52) and by a A carrier (hereinafter further referred to as the y-platform 54) moves the target in the second Y direction. In this exemplary embodiment, the X direction is substantially perpendicular to the Y direction, and the X and Y directions form a plane substantially perpendicular to the charged particle optical column 4.

As discussed above, during writing of a pattern, the cp beams 2 are deflected back and forth across the X direction, and the target 3 moves the x platform 52 by using the first actuator 53. It is moved below in the X direction. This scan results in a write path whose width depends on the degree of deflection of the cp beam 2 in the direction of deflection and the length depends on the length of travel of the x-platform 52. In particular, the length of the write path may extend over the entire target 3 area.

During the writing of each write path, essentially only the first actuator needs to be driven. The first actuator 53 is arranged in the shield 6 for shielding the charged particle optical column 4 from being damaged by the magnetic field and/or electric field from the first actuator 53 during writing of a pattern. outside. Therefore, the shield member 6 of the charged particle optical column 4 can also be used to shield the charged particle optical column 4 from damage by the magnetic field and/or electric field from the first actuator 53.

In the exemplary embodiment as shown in FIG. 1, the first actuator 53 is arranged inside the vacuum chamber 50 of the target positioning device 5. Alternatively, the first actuator 53 may be arranged outside the vacuum chamber 50 of the target positioning device 5.

Furthermore, both the first actuator 53 and the platform 52 are connected to each other in a rigid manner. In the example shown in FIG. 1, both the first actuator 53 and the platform 52 are rigidly coupled to a base plate 503. This rigid connection will ensure that the actuator or motor 53 remains aligned with the platform 52. In one embodiment, the substrate plate 503 is arranged to provide a very rigid construction, preferably with a very low coefficient of thermal expansion. In one embodiment, the base plate 503 includes a granite slab or a granite table top.

Therefore, when the cp beams 2 are projected onto the object 3, substantially only the first actuator 53 needs to be driven during writing of a write path (slight correction in the Z direction) Except perhaps possible, the Z direction is substantially perpendicular to the XY plane). During any other movement, magnetic fields and/or electric fields and fluctuations may be allowed to be present in addition to during writing. Therefore, an actuator for moving the target positioning device 5 in the Y and/or Z direction is placed inside the shield 6 of the charged particle optical column 4.

When the target 3 is moved in the Y direction (for example, moving the target 3 toward the next write path after the previous write path has been written), for example, by turning off the target The cp beam 2 may prevent the cp beam 2 from reaching the target 3; and/or the target 3 may be moved to allow the cp beam 2 to be located on the target 3 to be shot by the cp The position outside the area illuminated by the beam 2. During this movement in the Y direction, magnetic fields and/or electric fields and fluctuations may be allowed therein.

For example, the target positioning device 5 can be moved in the X direction such that the cp beams 2 fall on the beam sensor 7, as shown in Figure 1, the beam sensor 7 The system is placed on the x platform 52 near the target 51 tables. During this movement in the Y direction, the beam sensor 7 can be used to measure the characteristic characteristics of the cp beams 2 before writing to the next write path.

An exemplary embodiment of the target positioning device 5 is shown in more detail in Figures 2 and 3. In this embodiment, the target positioning device 5 includes a support frame 55 having two linear bearings 56 extending in the X direction. The center of gravity level 57 of the target positioning device 5 falls within the plane of the linear bearings 56.

The linear bearings 56 will support the x platform 52 and allow the x platform 52 to move smoothly along the X direction. To drive the x platform 52, the present embodiment provides two first actuators or x actuators 53. The x actuators 53 are placed outside the shield 6. Each of the x actuators 53 includes a push rod 58 that extends through the shield 6 and is coupled to the x platform 52. As shown in FIG. 3, the x actuator 53 applies a force to the x platform 52 through the push rod 58 to apply the point 581 to the center of gravity 57 of the target positioning device 5.

A y platform 54 is placed at the top of the x platform 52. The y-platform 54 includes a short stroke actuator 59, as will be described in more detail below.

A target module 51 is placed on top of the y stage 54. The target module 51 may have a short stroke platform with six degrees of freedom, and a target table for holding the target is placed at the top end.

As shown in FIGS. 4A and 4B, by pushing or contracting the push-pull rods 58 by the first actuator 53, the target module 51 can be moved in the X direction.

5A to 5E schematically show the short stroke actuator of the y stage 54 How the 59 works. 6 and 7 schematically show cross sections of the y-platform obtained along the line II-II in Figs. 5A to 5E. In these figures, the activated piezoelectric element is represented by a shaded area or a shaded area.

When the x platform 52 is driven to perform writing of a certain pattern, the position of the target module 51 above the y platform 54 is fixed and held. To hold the position of the target module 51 above the y-platform 54 in accordance with the x-platform 5 in the Y direction, the y-platform 54 is provided with a first pressure that can be placed in the holding position as shown in FIGS. 6 and 5A. Electrical component 541, wherein the piezoelectric component 541 clamps the y-platform 54 between the sidewalls 521 of the x-platform 52. To provide proper positioning in the Z direction, the y-platform 54 is provided with a second piezoelectric element 542 that can be placed in a support position as shown in Figures 6 and 5A, wherein the piezoelectric elements 542 Located on the x platform 52.

To move the y-platform 54 in the Y-direction, the first piezoelectric element 541 is placed in the released position as shown in Figures 7 and 5B, wherein the piezoelectric elements 541 are shrunk and The clamping force is not provided on the side wall 521 of the x platform 52. Furthermore, the y-platform 54 is further provided with a third piezoelectric element 543 which can be placed in the support position as shown in Figures 7 and 5B, wherein the third piezoelectric element 543 is located The short stroke actuator 59 and thus the y platform 54 will sit over the short stroke actuator 59, and the y stage 54 will be coupled to the actuator 59 by a third piezoelectric element 543. . Note that in the held or locked position as shown in FIGS. 6 and 5A, the third piezoelectric elements 543 will contract and the y-platform 54 will not be supported by the short-stroke actuator 59.

When the y platform 54 is seated over the short stroke actuator 59, as shown As shown in 5B, the actuator 59 may produce a short stroke in the Y direction as shown in Figure 5C. During this stroke, the actuator 59 thus moves the target module 51 above the y-platform 54 in the Y direction.

After the y-platform 54 is moved by the distance Y+ in the Y direction, the second piezoelectric element 542 is stretched, the third piezoelectric element 543 is shrunk, and the y-platform 54 is now due to the second piezoelectric type. Element 542 is supported by x platform 52 and disengages from short stroke actuator 59. Next, the first piezoelectric element 541 is placed in a holding position, wherein the first piezoelectric element 541 clamps the y-platform 54 between the side walls 521 of the x-platform 52, as shown in FIG. 5D. Shown.

Next, the short stroke actuator 59 may return to its original position by moving the distance Y- in the reverse direction, which may result in the same situation as the short stroke actuator 59 shown in Figure 5A.

By repeating this procedure, the y-platform 54 can be moved in the Y direction in a stepwise manner. When the short stroke actuator 59 is initially placed on the left hand side, as shown in FIG. 5A, the y stage 54 can be moved to the right in a stepwise manner. When the short stroke actuator 59 is initially placed on the right hand side, as shown in Figure 5D, the y stage 54 can be moved to the left in a stepwise manner.

In the second exemplary embodiment shown in FIG. 8, the XY stage includes two X-platform substrates 86, both of which are arranged on top of a common substrate plate 85. Each X platform substrate 86 carries an X platform carrier 861. The X platform carrier portion 861 is provided with a flex portion 862 (see FIG. 9) for connecting the Y beam column 84 to the X platform carrier portions 861. The Y-pillars 84 bridge the space between the X platforms and are provided to connect to the flexures The interface member 842 of the folded portion 862.

The Y beam column includes a Y platform having a Y carrier portion 844 or a carrier for carrying a target module (not shown). Specifically, in use, the target is arranged at the top of the target module, and the target module is arranged at the top of the Y platform through an interface plate 81. The Y carrier portion 844 or carrier is provided with a plurality of interface pins 843, as shown in Figure 10B, the interface plate 81 having been removed.

In particular, the interface pins 843 can provide a kinematic mount to accurately position the target module over the carrier or Y carrier 844. When the number of degrees of freedom of a base (the number of freely moving axes) plus the number of physical constraints applied to the base is six, the base can be referred to as a power base. Therefore, the side of the interface plate 81 facing the Y carrier portion 844 has a "cone, groove, and flat" base as schematically shown in FIG. 10A, wherein the interface pins 843 are respectively elastic. The component or spring 811 is held in the groove and the cone.

As shown in the cross-section of Figure 11, the Y-pillars 84 provide a common base plate for the two linear platforms 845, 846 arranged in parallel. The carriers of the linear platforms 845, 846 are pre-stressed and provide the necessary stiffness of the construction.

In this embodiment, the Y carrier portion 844 is rigidly connected to the carrier portion of the first linear platform 846 through a rigid interface 847, and is connected to the second linear line through a flex portion 848. The carrier of the platform 845 to absorb the linear platforms 845, 846 and/or the Y carrier Any thermal expansion of portion 844.

Furthermore, at least one of the linear platforms 845, 846 (the second linear platform 845 used in this embodiment) is provided with a rule 96 that can cooperate with the linear encoder head 95 to provide the Y carrier. Positioning information in the second direction or the Y direction.

In this embodiment, the opposite sides of the Y-pillars 84 in the Y direction are provided with piezoelectric motors 91, 91', both of which have extension members 92, 92' that pass through the piezoelectric elements. driven. The stretching members 92, 92' can act on adjacent ceramic drive plates 93, 93' which are arranged on opposite sides of the Y carrier portion 844, on the one hand for use in accordance with the Y The beam post 84 holds the position of the Y carrier portion 844 and, on the other hand, moves the Y carrier portion 844 along the linear platforms 845, 846 of the Y beam column 84. In this exemplary embodiment, the Y carrier portion 844 or carrier is interposed and constrained between the two opposing piezoelectric motors 91, 91'.

It is to be understood that the above description is included to explain the operation of the preferred embodiments and not to limit the scope of the invention. Those skilled in the art will appreciate from the above discussion that the spirit and scope of the present invention encompass many variations.

For example, in addition to using a piezoelectric element, other actuators may be used instead to clamp and hold the carrier to the platform. Such alternative actuators may include: pneumatic actuators, hydraulic actuators, or other types of mechanical actuators.

Therefore, the object positioning device having the holding member according to the present invention Suitably arranged to minimize electrical changes in the magnetic field that may interfere with the orbit of the charged particle beam, and thus may be arranged to be optimized for use in a charged particle exposure system (eg, for unshielded images) Target locating device among projected lithography systems (especially multi-beam charged particle exposure systems).

1‧‧‧Charged particle beam lithography system

2‧‧‧cp beam

3‧‧‧ Targets

4‧‧‧ charged particle optical column

5‧‧‧Target positioning device

6‧‧‧Shield

7‧‧‧beam sensor

41‧‧‧Projection lens

50‧‧‧vacuum room

51‧‧‧ Target Module / Wafer Module

52‧‧‧x platform

53‧‧‧First Actuator/x Actuator

54‧‧‧y platform

55‧‧‧Support frame

56‧‧‧Linear bearings

57‧‧‧ Center of gravity

58‧‧‧Pushing rod

59‧‧‧Short-stroke actuator

81‧‧‧Interface Tablet

84‧‧‧Y Liangzhu

85‧‧‧Base plate

86‧‧‧X platform base

91‧‧‧ Piezoelectric motor

91'‧‧‧ Piezoelectric motor

92‧‧‧Extension parts

92’‧‧‧Stretching parts

93‧‧‧ceramic drive plate

93’‧‧‧Ceramic drive plate

95‧‧‧Linear encoder head

96‧‧‧ ruler

503‧‧‧Base plate

521‧‧‧ side wall

541‧‧‧First piezoelectric element

542‧‧‧Second piezoelectric element

543‧‧‧ Third piezoelectric element

The 581‧‧‧x actuator applies a force to the application point of the x platform through the push rod

811‧‧ ‧ spring

842‧‧‧Interface parts

843‧‧‧Interfacing pin

844‧‧‧Y Transport Department

845‧‧‧Linear platform

846‧‧‧Linear platform

847‧‧‧Rigid interface

848‧‧‧Flexing Department

861‧‧‧X Platform Carrier

862‧‧‧Flexing Department

X‧‧‧ direction

Y‧‧‧ direction

Y+‧‧‧ distance

Y-‧‧‧ distance

The present invention has been described with reference to the exemplary embodiments in the accompanying drawings, in which: FIG. 1 is a schematic diagram of a charged particle lithography system; FIG. 2 is a target according to the present invention. A schematic plan view of a first exemplary embodiment of an XY stage of a positioning device; FIG. 3 is a schematic cross-sectional view taken along line II of FIG. 2; FIGS. 4A and 4B schematically show the XY stage in a first direction Or the movement in the X direction; FIGS. 5A to 5E schematically show the movement of the XY stage in the second direction or the Y direction; FIG. 6 schematically shows the section of the XY stage during the movement in the X direction; FIG. 7 schematically shows a section during movement of the XY stage in the Y direction; FIG. 8 schematically shows a second exemplary embodiment of an XY stage of the object positioning device according to the present invention; Fig. 9 is a plan view schematically showing an exploded view of the XY stage of Fig. 8; Fig. 10A and Fig. 10B are schematic plan views of the Y stage shown in Fig. 8; and Fig. 11 is a view schematically showing a section taken along line A-A of Fig. 10A.

1‧‧‧Charged particle beam lithography system

2‧‧‧cp beam

3‧‧‧ Targets

4‧‧‧ charged particle optical column

5‧‧‧Target positioning device

6‧‧‧Shield

7‧‧‧beam sensor

41‧‧‧Projection lens

50‧‧‧vacuum room

51‧‧‧ Target Module / Wafer Module

52‧‧‧x platform

53‧‧‧First Actuator/x Actuator

54‧‧‧y platform

503‧‧‧Base plate

Claims (15)

A charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the charged particle The optical column includes a deflecting member for deflecting the charged particle beam in a deflecting direction, a target positioning device including a carrier for carrying the target, and a carrier for carrying Moving the platform of the carrier along a first direction, wherein the first direction is different from the deflecting direction, wherein the target positioning device comprises a first actuator for opposing the charged particle optical column Moving the platform in the first direction; and a second actuator for moving the platform in the second direction, an optical column shielding member for at least partially shielding the charged particle optical column from Damaged by an environmental magnetic field and/or an electric field, wherein the carrier is movably arranged on the platform, and wherein the target positioning device comprises a holding member for the carrier according to the platform Holding in a first relative position, wherein the first actuator is arranged outside the optical column shielding member, and wherein the holding member and the second actuator are arranged inside the shielding member . . The charged particle beam lithography system of claim 1, wherein the carrier is movable in a second direction, wherein the second direction is substantially the same as the deflection direction. Such as the charged particle beam lithography system of claim 1 of the patent scope, The retaining members are arranged to at least minimize leakage magnetic fields and/or electric fields, and/or fluctuations in the magnetic fields and/or electric fields, at least when the carrier is held to the platform. The charged particle beam lithography system of claim 1, wherein the holding member comprises an extendable and contractible jaw member that can be placed at an extended position for clamping according to the platform and The carrier is thus retained; and can be placed in a retracted position for releasing the carrier in accordance with the platform and allowing the carrier to be moved in accordance with the platform. The charged particle beam lithography system of claim 4, wherein the jaw member comprises a piezoelectric element. The charged particle beam lithography system of claim 1, wherein the holding member comprises a piezoelectric motor for moving the carrier in the second direction. A charged particle beam lithography system according to claim 6 wherein the carrier is interposed and/or constrained between two opposing piezoelectric motors. The charged particle beam lithography system of claim 1, wherein the second actuator is arranged to at least minimize a magnetic field and/or an electric field at least when the second actuator is turned off. Leaks to the outside of the second actuator (eg, electromagnetic scattering field). The charged particle beam lithography system of claim 1, wherein the second actuator comprises an inductive motor. The charged particle beam lithography system of claim 9, wherein the induction motor comprises a core made of a non-ferromagnetic material. The charged particle beam lithography system of claim 1, wherein the target positioning device comprises a coupling member for releasably coupling the carrier to the second actuator. The charged particle beam lithography system of claim 11, wherein the coupling member is arranged to at least minimize leakage magnetic field and/or at least when the carrier is not coupled to the second actuator. Or electric fields, and/or fluctuations in such magnetic and/or electric fields. The charged particle beam lithography system of claim 11, wherein the coupling member comprises a piezoelectric element. The charged particle beam lithography system of claim 1, wherein the optical column shielding member is arranged as a lining of the vacuum chamber. An object locating device for a charged particle beam lithography system according to any of the preceding claims.