TWI458000B - - Google Patents

Info

Publication number
TWI458000B
TWI458000B TW101121553A TW101121553A TWI458000B TW I458000 B TWI458000 B TW I458000B TW 101121553 A TW101121553 A TW 101121553A TW 101121553 A TW101121553 A TW 101121553A TW I458000 B TWI458000 B TW I458000B
Authority
TW
Taiwan
Application number
TW101121553A
Other languages
Chinese (zh)
Other versions
TW201351489A (zh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW101121553A priority Critical patent/TW201351489A/zh
Publication of TW201351489A publication Critical patent/TW201351489A/zh
Application granted granted Critical
Publication of TWI458000B publication Critical patent/TWI458000B/zh

Links

TW101121553A 2012-06-15 2012-06-15 分流裝置 TW201351489A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW101121553A TW201351489A (zh) 2012-06-15 2012-06-15 分流裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW101121553A TW201351489A (zh) 2012-06-15 2012-06-15 分流裝置

Publications (2)

Publication Number Publication Date
TW201351489A TW201351489A (zh) 2013-12-16
TWI458000B true TWI458000B (ko) 2014-10-21

Family

ID=50158110

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101121553A TW201351489A (zh) 2012-06-15 2012-06-15 分流裝置

Country Status (1)

Country Link
TW (1) TW201351489A (ko)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200421475A (en) * 2003-04-10 2004-10-16 Grand Plastic Technology Corp Liquid collection apparatus for single wafer spin etcher
US20070119476A1 (en) * 2005-11-25 2007-05-31 Takashi Hara Substrate processing apparatus and substrate processing method
US20080142051A1 (en) * 2006-12-19 2008-06-19 Akio Hashizume Recovery cup cleaning method and substrate treatment apparatus
US20090050175A1 (en) * 2007-08-21 2009-02-26 Takayoshi Tanaka Substrate cleaning apparatus and substrate cleaning method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200421475A (en) * 2003-04-10 2004-10-16 Grand Plastic Technology Corp Liquid collection apparatus for single wafer spin etcher
US20070119476A1 (en) * 2005-11-25 2007-05-31 Takashi Hara Substrate processing apparatus and substrate processing method
US20080142051A1 (en) * 2006-12-19 2008-06-19 Akio Hashizume Recovery cup cleaning method and substrate treatment apparatus
US20090050175A1 (en) * 2007-08-21 2009-02-26 Takayoshi Tanaka Substrate cleaning apparatus and substrate cleaning method

Also Published As

Publication number Publication date
TW201351489A (zh) 2013-12-16

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Legal Events

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GD4A Issue of patent certificate for granted invention patent