TWI455750B - Surface treatment wet process phosphorus-containing electroless nickel plating liquid component recycling system - Google Patents

Surface treatment wet process phosphorus-containing electroless nickel plating liquid component recycling system Download PDF

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TWI455750B
TWI455750B TW101120018A TW101120018A TWI455750B TW I455750 B TWI455750 B TW I455750B TW 101120018 A TW101120018 A TW 101120018A TW 101120018 A TW101120018 A TW 101120018A TW I455750 B TWI455750 B TW I455750B
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Taiwan
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liquid
calcium
permeate
acid
surface treatment
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TW101120018A
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Chinese (zh)
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TW201350182A (en
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Hsin Ming Fu
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Arps Inc
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一種表面處理濕製程含磷無電鎳之鍍液成分的循環利用系統,係用以回收表面處理製程中待處理液所包含的鎳,且該待處理液進一步包含固態顆粒、有機雜質、無機酸鹽、有機酸鹽、重金屬催化劑、鎳及鈉的至少其中之一,該表面處理濕製程含磷無電鎳之鍍液成分的循環利用系統包括:一儲存槽,儲存該待處理液以形成儲存液;一碳纖維過濾器,過該濾儲存槽的儲存液,去除固態顆粒及有機雜質,以形成過濾處理液,該過濾處理液係部分回送至該儲存槽;一收集裝置,包括一第一奈米篩網裝置以及一第一逆滲透裝置,該收集裝置接收並收集該過濾處理液或該儲存液,並且藉由該第一奈米篩網裝置以及該第一逆滲透裝置將該過濾處理液或該儲存液分離成第一濃縮液、第二濃縮液、含鈉滲透液,其中第一濃縮液包含鎳、有機酸鹽及重金屬催化劑,第二濃縮液包含鈣、有機酸鹽及無機酸鹽,而含鈉滲透液只包含鈉;一第一吸附裝置,去除該含鈉滲透液中的鈉,以形成去離子水等級的回收清洗液;一沉積分離裝置,藉外部電力產生電沉積還原作用而將該第一濃縮液中的重金屬催化劑還原成金屬態並析出,產生不含鎳及重金屬催化劑的沉積分離回收液;一純化裝置,包括一鈣沉澱槽、一第二奈米篩網裝置以及一第二逆滲透裝置,藉以利用鈣來源分離該第二濃縮液中無機酸鹽的無機酸而產生包含鈣的含鈣液、包含有機酸鹽中之有機酸的含酸回收液以及包含殘餘離子的逆滲透液;一第二吸附裝置,吸附該逆滲透液中殘餘的離子,以形成具去離水等級的回收液;以及一調配裝置,將回收清洗液、沉積分離回收液、該含酸回收液及該回收液配製組合成再生鍍液及/或再生清洗液。 A recycling system for surface treatment wet process phosphorus-containing electroless nickel plating liquid component, which is used for recovering nickel contained in a liquid to be treated in a surface treatment process, and the liquid to be treated further comprises solid particles, organic impurities, inorganic acid salts , at least one of an organic acid salt, a heavy metal catalyst, nickel and sodium, the recycling system of the surface treatment wet process phosphorus-containing electroless nickel plating liquid component comprises: a storage tank for storing the liquid to be treated to form a storage liquid; a carbon fiber filter, passing through the storage liquid of the filter storage tank, removing solid particles and organic impurities to form a filtering treatment liquid, the filtration treatment liquid is partially returned to the storage tank; and a collecting device comprising a first nano sieve a net device and a first reverse osmosis device, the collecting device receives and collects the filtering treatment liquid or the storage liquid, and the filtering treatment liquid or the first nano osmosis device and the first reverse osmosis device The storage liquid is separated into a first concentrated liquid, a second concentrated liquid, and a sodium-containing permeate, wherein the first concentrated liquid comprises nickel, an organic acid salt and a heavy metal catalyst, and the second The condensate comprises calcium, an organic acid salt and a mineral acid salt, and the sodium-containing permeate comprises only sodium; a first adsorption device removes sodium from the sodium-containing permeate to form a deionized water-grade recovery cleaning solution; a deposition separation device for reducing the heavy metal catalyst in the first concentrated liquid to a metallic state by external electrode electric power reduction and precipitation, thereby producing a deposition separation recovery liquid containing no nickel and heavy metal catalyst; a purification device including a calcium a sedimentation tank, a second nano-screen device and a second reverse osmosis device for separating the inorganic acid of the inorganic acid salt in the second concentrated liquid by using a calcium source to produce a calcium-containing liquid containing calcium, comprising an organic acid salt An acid-containing recovery liquid of an organic acid and a reverse osmosis liquid containing residual ions; a second adsorption device that adsorbs residual ions in the reverse osmosis liquid to form a recovery liquid having a deionized water level; and a compounding device that will recover The cleaning liquid, the deposition separation recovery liquid, the acid recovery liquid, and the recovery liquid are combined to form a regeneration plating solution and/or a regeneration cleaning liquid. 依據申請專利範圍第1項所述之表面處理濕製程含磷無電鎳之鍍液成分的循環利用系統,其中該待處理液包括鍍液或清洗液。 A recycling system for a surface treatment wet process phosphorus-containing electroless nickel plating bath component according to claim 1, wherein the liquid to be treated comprises a plating solution or a cleaning solution. 依據申請專利範圍第1項所述之表面處理濕製程含磷無電鎳之鍍液成分的循環利用系統,其中該無機酸鹽包括次磷酸、正磷酸及硫酸的至少其中之一的鹽類。 A recycling system for a surface treatment wet process phosphorus-containing electroless nickel plating bath component according to claim 1, wherein the inorganic acid salt comprises a salt of at least one of hypophosphorous acid, orthophosphoric acid and sulfuric acid. 依據申請專利範圍第1項所述之表面處理濕製程含磷無電鎳之鍍液成分的循環利用系統,其中該有機酸鹽係包括乳酸、蘋果酸(malic acid)、醋酸、氨基乙酸(glycine)及琥珀酸(succinic acid)的至少其中之一的鹽類。 A recycling system for a surface treatment wet process phosphorus-containing electroless nickel plating bath component according to claim 1, wherein the organic acid salt comprises lactic acid, malic acid, acetic acid, glycine (glycine) And a salt of at least one of succinic acid. 依據申請專利範圍第1項所述之表面處理濕製程含磷無電鎳之鍍液成分的循環利用系統,其中該重金屬催化劑係包括當作表面處理濕製程中催化劑用的鉍、鉛及錫的至少其中之一的重金屬。 A recycling system for a surface treatment wet process phosphorus-containing electroless nickel plating bath component according to claim 1, wherein the heavy metal catalyst system comprises at least ruthenium, lead and tin as catalysts for surface treatment wet process One of them is heavy metal. 依據申請專利範圍第1項所述之表面處理濕製程含磷無電鎳之鍍液成分的循環利用系統,其中:該第一奈米篩網裝置具有分子級奈米篩網,並將該過濾處理液或該待儲存液分離成該第一濃縮液以及第一滲透液,且該第一滲透液包含無機酸鹽、有機酸鹽以及鈉的至少其中之一;以及該第一逆滲透裝置係藉一高壓幫浦接收該第一滲透液,且該第一逆滲透裝置具有逆滲透膜以提供逆滲透功能,用以將該第一滲透液分離成第二濃縮液以及含鈉滲透液,其中該第二濃縮液包含第一滲透液中鈉以外的其他成分,而該含鈉滲透液只包含鈉而不包含該第一滲透液的其他成分。 A recycling system for a surface treatment wet process phosphorus-containing electroless nickel plating bath component according to claim 1, wherein: the first nano mesh device has a molecular grade nano sieve, and the filtering treatment is performed Dissolving the liquid or the liquid to be stored into the first concentrated liquid and the first permeate, and the first permeate comprises at least one of a mineral acid salt, an organic acid salt, and sodium; and the first reverse osmosis device is borrowed a high pressure pump receives the first permeate, and the first reverse osmosis device has a reverse osmosis membrane to provide a reverse osmosis function for separating the first permeate into a second concentrate and a sodium permeate, wherein The second concentrate contains other components than the sodium in the first permeate, and the sodium-containing permeate contains only sodium and does not contain other components of the first permeate. 依據申請專利範圍第1項或第3項所述之表面處理濕製程含磷無電鎳之鍍液成分的循環利用系統,其中:該鈣沉澱槽係具有熟石灰,用以提供該鈣來源,以結合該第二濃縮液中的無機酸而產生鈣鹽沉澱物及硫酸鈣沉澱物,且該鈣鹽沉澱物包括次磷酸鈣、正磷酸鈣,進而形成沉澱混合液;該第二奈米篩網裝置係具有奈米篩網,用以篩除分離該沉澱混合液中的鈣鹽沉澱物及硫酸鈣沉澱物,形成篩網滲透液以及含鈣液,且該篩網滲透液係包含有機酸及殘餘離子,而該含鈣液包含鈣鹽沉澱物及硫酸鈣沉澱物;以及該第二逆滲透裝置係具有逆滲透膜,用以分離該篩網滲透液中的有機酸、殘餘離子,形成含酸回收液以及逆滲透液,而該含酸回收液係富含有機酸。 A recycling system for a surface treatment wet process phosphorus-containing electroless nickel plating bath component according to claim 1 or 3, wherein the calcium precipitation tank has slaked lime for providing the calcium source for bonding a mineral acid in the second concentrated liquid to produce a calcium salt precipitate and a calcium sulfate precipitate, and the calcium salt precipitate comprises calcium hypophosphite, calcium orthophosphate, thereby forming a precipitation mixture; the second nano mesh device The utility model has a nano screen for screening and separating the calcium salt precipitate and the calcium sulfate precipitate in the precipitation mixture to form a sieve permeate and a calcium-containing liquid, and the sieve permeate comprises organic acid and residual An ion, wherein the calcium-containing liquid comprises a calcium salt precipitate and a calcium sulfate precipitate; and the second reverse osmosis device has a reverse osmosis membrane for separating the organic acid and residual ions in the sieve permeate to form an acid-containing A recovery liquid and a reverse osmosis liquid, and the acid recovery liquid is rich in an organic acid. 依據申請專利範圍第1項所述之表面處理濕製程含磷無電鎳之鍍液成分的循環利用系統,進一步包括一臭氧處理器,用以產生臭氧,並藉臭氧以氧化殘餘的有機雜質。 A recycling system for a surface treatment wet process phosphorus-containing electroless nickel plating bath component according to claim 1, further comprising an ozone processor for generating ozone and oxidizing residual organic impurities by ozone.
TW101120018A 2012-06-04 2012-06-04 Surface treatment wet process phosphorus-containing electroless nickel plating liquid component recycling system TWI455750B (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI612180B (en) * 2017-07-19 2018-01-21 Triumphant Gate Ltd Continuous purification system for chemical displacement gold plating solution and impurity nickel and impurity copper
CN109280908A (en) * 2017-07-19 2019-01-29 凯基有限公司 The continuous purification system of plating by chemical displacement gold solution and Impurity Nickel and impurity copper

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200401051A (en) * 2002-06-18 2004-01-16 Atotech Deutschland Gmbh Electroless nickel plating solutions
CN102452743A (en) * 2010-10-25 2012-05-16 上海丰信环保科技有限公司 Method for treating complex-containing nickel plating wastewater

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200401051A (en) * 2002-06-18 2004-01-16 Atotech Deutschland Gmbh Electroless nickel plating solutions
CN102452743A (en) * 2010-10-25 2012-05-16 上海丰信环保科技有限公司 Method for treating complex-containing nickel plating wastewater

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI612180B (en) * 2017-07-19 2018-01-21 Triumphant Gate Ltd Continuous purification system for chemical displacement gold plating solution and impurity nickel and impurity copper
CN109280908A (en) * 2017-07-19 2019-01-29 凯基有限公司 The continuous purification system of plating by chemical displacement gold solution and Impurity Nickel and impurity copper
CN109280908B (en) * 2017-07-19 2021-03-02 昊鼎环保科技(湖北)有限公司 Continuous purification system for gold plating solution containing impurities of nickel and copper by chemical displacement

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