TWI443844B - Fabrication method of dye-sensitized solar cells and electrochemical analysis device - Google Patents

Fabrication method of dye-sensitized solar cells and electrochemical analysis device Download PDF

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TWI443844B
TWI443844B TW100117154A TW100117154A TWI443844B TW I443844 B TWI443844 B TW I443844B TW 100117154 A TW100117154 A TW 100117154A TW 100117154 A TW100117154 A TW 100117154A TW I443844 B TWI443844 B TW I443844B
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dye
sensitized solar
solar cell
dense layer
electrolyte
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TW201248875A (en
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Jung Chuan Chou
Yi Ming Yu
Cheng Wei Chen
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Univ Nat Yunlin Sci & Tech
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/542Dye sensitized solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Description

染料敏化太陽能電池及其製造方法及電化學分析裝置Dye sensitized solar cell, manufacturing method thereof and electrochemical analyzing device

本發明係有關於一種染料敏化太陽能電池及其製造方法,特別是有關一種具有可增進轉換效率之緻密層的染料敏化太陽能電池及其製造方法。The present invention relates to a dye-sensitized solar cell and a method of manufacturing the same, and more particularly to a dye-sensitized solar cell having a dense layer capable of improving conversion efficiency and a method of manufacturing the same.

20世紀70年代發展之矽晶太陽能電池,總能量轉換效率達到25%以上,但其昂貴造價反而使人望之卻步,亦限制其實際用途,間接造成染料敏化太陽能電池(Dye-sensitized solar cell,DSSC)之發展,此種太陽能電池具製程簡單、可使用較少材料及低生產成本之優點。The crystal energy solar cell developed in the 1970s has a total energy conversion efficiency of more than 25%, but its expensive cost is deterred and limits its practical use, indirectly causing dye-sensitized solar cells (Dye-sensitized solar cells). The development of DSSC) has the advantages of simple process, low material usage and low production cost.

影響染料敏化太陽能電池光電轉換效率(Photoelectric conversion efficiency)之因素有三:There are three factors that affect the photoelectric conversion efficiency of dye-sensitized solar cells:

一、敏化染料:敏化染料之選擇為非常重要的因素之一,染料之優劣會直接影響太陽能電池的光電轉換效率,故敏化染料需符合以下條件:(1)於奈米半導體(例如二氧化鈦奈米粒子)表面需有良好之吸附性,亦即能快速達到吸附平衡,且不易脫落,故染料分子應具有易與奈米半導體表面結合之基團:如-COOH、-SO3 H、-PO3 H2 等,(2)於可見光區有較寬、較強之吸收帶,(3)其氧化態與激發態要有極高之穩定性,(4)激發態壽命長,且需有極高之電荷傳輸效率,(5)具有足夠負之激發態氧化還原電位以保證染料激發態電子能順利注入二氧化鈦導電帶,(6)於氧化還原過程(基態與激發態)中需有相對低之電位,以利於初級和次級電子轉移中之自由能損失。1. Sensitizing dyes: The choice of sensitizing dyes is one of the most important factors. The quality of dyes directly affects the photoelectric conversion efficiency of solar cells. Therefore, sensitizing dyes must meet the following conditions: (1) in nano-semiconductors (for example) The surface of the titanium dioxide nanoparticles needs to have good adsorption, that is, it can quickly reach the adsorption equilibrium and is not easy to fall off, so the dye molecules should have groups which are easy to combine with the surface of the nano semiconductor: such as -COOH, -SO 3 H, -PO 3 H 2 , etc., (2) has a wide and strong absorption band in the visible light region, (3) has a very high stability in the oxidized state and the excited state, and (4) has a long lifetime in the excited state and requires It has a very high charge transfer efficiency, (5) has a sufficiently negative excited state redox potential to ensure that the dye excited state electrons can be smoothly injected into the titanium dioxide conductive band, and (6) in the redox process (ground state and excited state) Low potential to facilitate loss of free energy in primary and secondary electron transfer.

二、半導體電極:半導體電極其性能優劣亦關係太陽能電池之效率,染料敏化太陽能電池對於半導體電極有以下二個要求:(1)半導體電極之表面積越大越佳,(2)適當能階結構,半導體之能帶結構應與染料能階和電解質的氧化還原電位相匹配。Second, the semiconductor electrode: the performance of the semiconductor electrode is also related to the efficiency of the solar cell. The dye-sensitized solar cell has the following two requirements for the semiconductor electrode: (1) the larger the surface area of the semiconductor electrode, the better, (2) the appropriate energy level structure, The energy band structure of the semiconductor should match the dye energy level and the redox potential of the electrolyte.

三、電解質:電解質於染料敏化太陽能電池中擔任傳輸電子與再生染料之功能,長期以來染料敏化太陽能電池以液態電解質為主,因液態電解質種類繁多,電極電位易於控制,但液態電解質仍存在以下缺點:(1)有機溶劑沸點較低,具有高蒸汽壓,易於揮發對染料敏化太陽能電池長期穩定性有所影響,(2)液態電解液密封技術複雜,長期置放會造成電解液洩漏,且密封劑亦可能與電解質發生反應,(3)有機溶劑之毒性,(4)液態電解質中微量水分子可能導致染料脫附,(5)染料敏化太陽能電池形狀設計受限制。雖然液態電解質具有以上缺點,改善染料敏化太陽能電池以上之缺點係目前努力的目標,儘管如此液態電解質所獲得之轉換效率仍較固態電解質高。3. Electrolytes: Electrolytes play the role of transporting electrons and regenerating dyes in dye-sensitized solar cells. For a long time, dye-sensitized solar cells are mainly liquid electrolytes. Due to the wide variety of liquid electrolytes, electrode potentials are easy to control, but liquid electrolytes still exist. The following disadvantages: (1) low boiling point of organic solvent, high vapor pressure, easy to volatilize has an impact on long-term stability of dye-sensitized solar cells, (2) liquid electrolyte sealing technology is complicated, long-term placement will cause electrolyte leakage And the sealant may also react with the electrolyte, (3) the toxicity of the organic solvent, (4) the trace water molecules in the liquid electrolyte may cause the dye to desorb, and (5) the shape design of the dye-sensitized solar cell is limited. Although the liquid electrolyte has the above disadvantages, the improvement of the above disadvantages of the dye-sensitized solar cell is a goal of the current efforts, although the conversion efficiency obtained by the liquid electrolyte is still higher than that of the solid electrolyte.

中華民國發明專利第I241029號「染料敏化太陽能電池及其電極」,染料敏化太陽能電池電極之半導體奈米晶膜中加入金屬粒子,其包括金、銀、鉑、銅等。利用其本身良好之導電性,以提高半導體奈米晶之導電率,加快電子向導電基片遷移之速率,從而改善整個染料敏化太陽能電池之光電轉換效率。The Republic of China Invention Patent No. I241029 "Dye-sensitized solar cell and its electrode", a metal nanocrystalline film of a dye-sensitized solar cell electrode is added with metal particles including gold, silver, platinum, copper, and the like. By using its own good electrical conductivity, the conductivity of the semiconductor nanocrystals is increased, and the rate of electron migration to the conductive substrate is accelerated, thereby improving the photoelectric conversion efficiency of the entire dye-sensitized solar cell.

中華民國發明專利第I274424號「電極、光電轉換元件,及染料敏感化太陽能電池」使用導電性黏劑來黏結碳顆粒或鉑顆粒,形成一具有孔隙性結構之電極,藉此增加電極之有效面積(表面積)。該發明皆可由低成本製造且藉由增加有效面積,使其獲得優良之光電轉換效率。The Republic of China Invention Patent No. I274424 "Electrode, photoelectric conversion element, and dye-sensitized solar cell" uses a conductive adhesive to bond carbon particles or platinum particles to form an electrode having a porous structure, thereby increasing the effective area of the electrode. (surface area). The invention can be manufactured at low cost and obtains excellent photoelectric conversion efficiency by increasing the effective area.

中華民國新型專利第M323109號「具有奈米金粒子作為鑲埋量子點之染料敏化太陽能電池」提供一種具有奈米金粒子作為鑲埋量子點之染料敏化太陽能電池,利用浸泡於奈米金粒子溶液中,增加吸收之頻段,將光電轉換之功能提升,以得到一具有高轉換比之染料敏化太陽能電池結構。The Republic of China new patent No. M323109 "Dye-sensitized solar cells with nano-gold particles as embedded quantum dots" provides a dye-sensitized solar cell with nano-gold particles as embedded quantum dots, which is immersed in nano gold In the particle solution, the absorption band is increased, and the function of photoelectric conversion is improved to obtain a dye-sensitized solar cell structure having a high conversion ratio.

中華民國發明專利第I241721號「染料敏化太陽能電池模組及其製法」揭露一種可以降低導線製程之成本,提高光活躍區以及製程良率的染料敏化太陽能電池模組及其製法;該專利採用積體模組製法,透過合併兩塊分別具有陽極與陰極之陽極板和陰極板的手段,使之共用絕緣體與導線,故能降低導線製程的成本,並使導線與絕緣體的製程步驟於高溫(約400℃)操作,以提高太陽能電池之製程良率;另一方面,由於絕緣體和導線共享的設計,亦可使單位面積內光活躍區增加。The Republic of China Invention Patent No. I241721 "Dye-sensitized solar cell module and its preparation method" discloses a dye-sensitized solar cell module capable of reducing the cost of a wire process, improving a photoactive region and a process yield, and a method for preparing the same; By adopting the integrated module manufacturing method, by combining two anode plates and cathode plates respectively having an anode and a cathode, the insulator and the wire are shared, so that the cost of the wire process can be reduced, and the manufacturing process of the wire and the insulator is performed at a high temperature. (about 400 ° C) operation to improve the process yield of solar cells; on the other hand, due to the design of the insulator and wire sharing, the light active area per unit area can also be increased.

美國發明專利第7,179,988號「Dye sensitized solar cells having foil electrodes」提供一奈米線或奈米孔洞電極,藉此降低電子傳輸路徑。此電極具較大之比表面積,可增加染料吸附面積,以提升染料敏化太陽能電池之效能。U.S. Patent No. 7,179,988, "Dye sensitized solar cells having foil electrodes" provides a nanowire or nanopore electrode, thereby reducing the electron transport path. The electrode has a large specific surface area and can increase the dye adsorption area to enhance the performance of the dye-sensitized solar cell.

本發明提供一種染料敏化太陽能電池,包括:一緻密層修飾半導體電極,包括:一透明導電基板;一緻密層,形成於該透明導電基板上;一多孔性半導體層,形成於該緻密層上;及一染料,形成於該多孔性半導體層上;一電解液,形成於該緻密層修飾半導體電極上;及一輔助電極,形成於該電解液上。The present invention provides a dye-sensitized solar cell comprising: a uniform dense layer modified semiconductor electrode comprising: a transparent conductive substrate; a uniform dense layer formed on the transparent conductive substrate; and a porous semiconductor layer formed on the dense layer And a dye formed on the porous semiconductor layer; an electrolyte formed on the dense layer-modified semiconductor electrode; and an auxiliary electrode formed on the electrolyte.

本發明也提供一種染料敏化太陽能電池製造方法,其步驟包括:提供一透明導電基板;形成一緻密層於該透明導電基板上;形成一多孔性半導體層於該緻密層上;及形成一染料於該多孔性半導體層上,其中該透明導電基板、該緻密層、該多孔性半導體層及該染料構成一緻密層修飾半導體電極;形成一電解液於該緻密層修飾半導體電極上;形成一輔助電極於該電解液上。The present invention also provides a method for fabricating a dye-sensitized solar cell, the method comprising: providing a transparent conductive substrate; forming a uniform dense layer on the transparent conductive substrate; forming a porous semiconductor layer on the dense layer; and forming a a dye on the porous semiconductor layer, wherein the transparent conductive substrate, the dense layer, the porous semiconductor layer and the dye constitute a uniform dense layer modified semiconductor electrode; forming an electrolyte on the dense layer modified semiconductor electrode; forming a An auxiliary electrode is on the electrolyte.

本發明更提供一種染料敏化太陽能電池之電化學分析裝置,其包括:一恆電位儀;一如前述之染料敏化太陽能電池,連接至該恆電位儀;一電腦,連接至該恆電位儀。The invention further provides an electrochemical analysis device for a dye-sensitized solar cell, comprising: a potentiostat; a dye-sensitized solar cell as described above, connected to the potentiostat; a computer connected to the potentiostat .

為使本發明之上述與其他目的、特徵與優點能更明顯易懂,下文特舉出較佳實施例,並配合所附圖式,作詳細說明如下:The above and other objects, features and advantages of the present invention will become more apparent and understood.

請參閱第1圖,其顯示本發明之實施例中一染料敏化太陽能電池30,其包括一緻密層修飾半導體電極10、一電解液31形成於緻密層修飾半導體電極10上及一輔助電極(Counter electrode) 20形成於電解液31上。本發明之染料敏化太陽能電池30具有高轉換效率,且其製程簡單、環保。Referring to FIG. 1, there is shown a dye-sensitized solar cell 30 according to an embodiment of the present invention, comprising a uniform dense layer modified semiconductor electrode 10, an electrolyte 31 formed on the dense layer modified semiconductor electrode 10, and an auxiliary electrode ( Counter electrode 20 is formed on the electrolyte 31. The dye-sensitized solar cell 30 of the present invention has high conversion efficiency and is simple in process and environmentally friendly.

請參閱第2圖,其顯示本發明之實施例中一緻密層修飾半導體電極10之詳細結構,其包括一透明導電基板11,而在透明導電基板11上依序形成有一緻密層12、一多孔性半導體層13以及一染料14。Please refer to FIG. 2 , which shows a detailed structure of the uniform-layer-modified semiconductor electrode 10 in the embodiment of the present invention, which comprises a transparent conductive substrate 11 , and a uniform dense layer 12 is formed on the transparent conductive substrate 11 in sequence. The porous semiconductor layer 13 and a dye 14.

透明導電基板11可為各種硬式或可撓式導電基板,包括但不限於氧化銦錫玻璃基板、氧化氟錫玻璃基板或氧化銦錫可撓式基板。透明導電基板11的厚度可約為175-2200 μm。The transparent conductive substrate 11 can be any hard or flexible conductive substrate, including but not limited to an indium tin oxide glass substrate, a oxyfluoride glass substrate or an indium tin oxide flexible substrate. The transparent conductive substrate 11 may have a thickness of about 175-2200 μm.

緻密層12可為一緻密、電阻高(例如高10 Mohm)及能隙與二氧化鈦相近之薄膜,包括例如氧化鋅、二氧化鈦或釕金屬摻雜二氧化鈦。緻密層12可藉由射頻濺鍍法(Radio frequency sputtering system),例如射頻共濺鍍法(Radio frequency co-sputtering system)形成於透明導電基板11上。緻密層12的厚度可約為16-155 nm。The dense layer 12 can be a dense, high resistance (e.g., 10 Mohm high) film having a similar energy gap to that of titanium dioxide, including, for example, zinc oxide, titanium dioxide or barium metal doped titanium dioxide. The dense layer 12 can be formed on the transparent conductive substrate 11 by a radio frequency sputtering system, such as a radio frequency co-sputtering system. The dense layer 12 can have a thickness of about 16-155 nm.

多孔性半導體層13可由一具高比表面積(例如大於50 m2 /g)、禁帶寬度大(例如大於3 eV)以及易吸附染料之半導體,包括例如二氧化鈦(TiO2 )或氧化鋅(ZnO)。多孔性半導體層13之形成方法可包括下列步驟:(a)混合一半導體粉末,例如二氧化鈦(TiO2 )粉末或氧化鋅(ZnO)粉末,粉末之粒徑可約為20-40 nm、一分散劑(Dispersant),例如2,4-戊二酮(Acetylacetone)或乙基乙酰丙酮(Ethylacetoacetone)、一介面活性劑,例如Triton X-100(C14 H22 O(C2 H4 O)n ,及一溶劑,例如去離子水(Deionized water,D.I. water),以得到一半導體塗佈膠體,上述各成份的一重量混合比例約為30:1:1:50;(b)以例如旋轉塗佈法(Spin-coating)、棒狀塗佈法(Bar coating)或刮刀塗佈法(Blade coating)等方法,將上述塗佈膠體均勻塗佈於緻密層12上;(c)於退火爐內,將上述具有塗佈膠體於其上的緻密層12在一介於400-500℃之間的定溫下進行退火,即完成一多孔性半導體層13。多孔性半導體層13的厚度可約為5-15 μm。The porous semiconductor layer 13 may be a semiconductor having a high specific surface area (for example, more than 50 m 2 /g), a large band gap (for example, more than 3 eV), and a dye-adsorbing dye, including, for example, titanium oxide (TiO 2 ) or zinc oxide (ZnO). ). The method for forming the porous semiconductor layer 13 may include the steps of: (a) mixing a semiconductor powder such as titanium dioxide (TiO 2 ) powder or zinc oxide (ZnO) powder, and the powder may have a particle diameter of about 20-40 nm and a dispersion. Dispersant, such as 2,4-pentanedione or Ethylacetoacetone, a surfactant such as Triton X-100 (C 14 H 22 O(C 2 H 4 O) n , And a solvent, such as Deionized water (DI water), to obtain a semiconductor coating colloid, a weight ratio of each of the above components is about 30:1:1:50; (b) for example, spin coating The coating colloid is uniformly applied to the dense layer 12 by a method such as spin-coating, bar coating or blade coating; (c) in the annealing furnace, The dense layer 12 having the coating colloid thereon is annealed at a constant temperature between 400 and 500 ° C to complete a porous semiconductor layer 13. The thickness of the porous semiconductor layer 13 may be about 5 -15 μm.

染料14包括一可吸收光而激發電子之有機釕金屬錯合物粉末,例如N3(Ruthenium-535)、N719或黑染料(Black dye)。染料14之形成方法可包括下列步驟:(a)混合一染料粉末,例如N3、N719及黑染料,及一溶劑,例如酒精,以得到一染料混合液;(b)以超音波振盪器攪拌染料混合液。接著將上述具有緻密層12及多孔性半導體層13依序形成其上的透明導電基板11浸泡於上述染料14於約60-80℃,0.1-2小時。取出上述透明導電基板11後,即可得到緻密層修飾半導體電極10,其具有緻密層12、多孔性半導體層13及染料14依序形成於透明導電基板11上。Dye 14 includes an organic ruthenium metal complex powder that absorbs light and excites electrons, such as N3 (Ruthenium-535), N719, or Black dye. The method for forming the dye 14 may include the steps of: (a) mixing a dye powder such as N3, N719, and a black dye, and a solvent such as alcohol to obtain a dye mixture; (b) agitating the dye with an ultrasonic oscillator. Mixture. Next, the transparent conductive substrate 11 having the dense layer 12 and the porous semiconductor layer 13 formed thereon in this order is immersed in the dye 14 at about 60-80 ° C for 0.1-2 hours. After the transparent conductive substrate 11 is taken out, a dense layer-modified semiconductor electrode 10 having a dense layer 12, a porous semiconductor layer 13, and a dye 14 sequentially formed on the transparent conductive substrate 11 is obtained.

再度回到第1圖,其中染料敏化太陽能電池30之電解液31可為一具氧化還原能力之電解液,其中可包括一氧化還原電對、一可增加染料敏化太陽能電池性能之添加劑(Additive)及一溶劑。電解液31之形成方法可包括下列步驟:(a)混合一氧化還原電對、添加劑及溶劑,以得到一混合溶液,上述各成份的重量混合比例約為1:5:75;(b)以超音波振盪器攪拌混合溶液。Returning to Fig. 1, the electrolyte 31 of the dye-sensitized solar cell 30 can be a redox capable electrolyte, which may include a redox couple, an additive that increases the performance of the dye-sensitized solar cell ( Additive) and a solvent. The method for forming the electrolyte 31 may include the following steps: (a) mixing a redox couple, an additive, and a solvent to obtain a mixed solution, the weight ratio of each of the above components is about 1:5:75; (b) The ultrasonic oscillator agitates the mixed solution.

電解液31之氧化還原電對可包括I3 - /I- ,而其來源可包括碘(Iodide,I2 )。電解液31之添加劑可包括例如碘化鈉(Sodium iodide,NaI)、碘化鋰(Lithium iodide,LiI)、4-叔丁基吡啶(4-tert-butylpyridine,TBP)及碘化1-丙基-2,3-二甲基咪唑(1-propyl-2,3-dimethylimidazolium iodide,DMPII)。電解液31之溶劑可包括例如乙腈(Acetonitrile)、3-甲氧基丙腈(3-methoxy propionitrile,MPN)及碳酸丙烯酯(Propylene carbonate,PC)。The redox couple of the electrolyte 31 may include I 3 - /I - and its source may include iodine (Iodide, I 2 ). The additive of the electrolyte 31 may include, for example, sodium iodide (NaI), lithium iodide (LiI), 4-tert-butylpyridine (TBP), and 1-propyl iodide. -1,3-dimethylimidazolium iodide (DMPII). The solvent of the electrolytic solution 31 may include, for example, acetonitrile (Acetonitrile), 3-methoxypropionitrile (MPN), and Propylene carbonate (PC).

在一實施例中,電解液31可包括碘化鈉、碘、4-叔丁基吡啶及碳酸丙烯酯。或者,在另一實施例中,電解液31可包括碘化鋰、碘、3-甲氧基丙腈、4-叔丁基吡啶及碘化1-丙基-2,3-二甲基咪唑。In an embodiment, the electrolyte 31 may include sodium iodide, iodine, 4-tert-butylpyridine, and propylene carbonate. Alternatively, in another embodiment, the electrolyte 31 may include lithium iodide, iodine, 3-methoxypropionitrile, 4-tert-butylpyridine, and 1-propyl-2,3-dimethylimidazolium iodide. .

請參閱第3圖,其顯示本發明之實施例中一輔助電極20,其包括一透明導電基板21以及一催化層22形成於透明導電基板21上。Referring to FIG. 3, an auxiliary electrode 20 including a transparent conductive substrate 21 and a catalytic layer 22 formed on the transparent conductive substrate 21 is shown in the embodiment of the present invention.

輔助電極20之透明導電基板21可包括氧化銦錫(ITO)玻璃基板、氧化氟錫(FTO)玻璃基板或氧化銦錫可撓式基板。輔助電極20的厚度可約為175-2200 μm。The transparent conductive substrate 21 of the auxiliary electrode 20 may include an indium tin oxide (ITO) glass substrate, a fluorine fluoride (FTO) glass substrate, or an indium tin oxide flexible substrate. The auxiliary electrode 20 may have a thickness of about 175-2200 μm.

催化層22為一可催化電解液氧化還原反應之材料,其包括鉑金屬、碳及鎳金屬。催化層22可藉由射頻濺鍍法(Radio frequency sputtering system)形成於透明導電基板11上。催化層22之厚度可約為100-160 nm。The catalytic layer 22 is a material that catalyzes the redox reaction of the electrolyte, and includes platinum metal, carbon, and nickel metal. The catalytic layer 22 can be formed on the transparent conductive substrate 11 by a radio frequency sputtering system. The thickness of the catalytic layer 22 can be about 100-160 nm.

形成緻密層修飾半導體電極10、電解液31、及輔助電極20後,封裝上述元件以完成染料敏化太陽能電池之製備,其中封裝方式為以熱塑膜封裝緻密層修飾半導體電極10及輔助電極20,接著注入電解質於緻密層修飾半導體電極10及輔助電極20之間。熱塑膜可包括例如紫外線硬化樹脂或其他不與電解質反應之材質,以避免熱塑膜與電解質發生反應。After forming the dense layer modified semiconductor electrode 10, the electrolyte 31, and the auxiliary electrode 20, the above components are packaged to complete the preparation of the dye-sensitized solar cell, wherein the semiconductor layer 10 and the auxiliary electrode 20 are modified by a thermoplastic film encapsulation dense layer. Then, an electrolyte is injected between the dense layer-modified semiconductor electrode 10 and the auxiliary electrode 20. The thermoplastic film may include, for example, an ultraviolet curable resin or other material that does not react with the electrolyte to prevent the thermoplastic film from reacting with the electrolyte.

請參閱第4圖,其顯示本發明之實施例中一染料敏化太陽能電池之電化學分析裝置40,其包括一恆電位儀41、一電腦42以及一如前述的染料敏化太陽能電池30。染料敏化太陽能電池30連接於恆電位儀41上。恆電位儀41連接於電腦42上。恆電位儀41之連接方法包括下列步驟:首先提供一染料敏化太陽能電池30,接著將工作電極10連接於恆電位儀41之工作電極端及參考電極端,而後將背電極20連接於恆電位儀41之輔助電極端。Referring to FIG. 4, an electrochemical analysis device 40 for a dye-sensitized solar cell according to an embodiment of the present invention includes a potentiostat 41, a computer 42 and a dye-sensitized solar cell 30 as described above. The dye-sensitized solar cell 30 is connected to a potentiostat 41. The potentiostat 41 is connected to the computer 42. The method of connecting the potentiostat 41 includes the steps of first providing a dye-sensitized solar cell 30, then connecting the working electrode 10 to the working electrode terminal and the reference electrode terminal of the potentiostat 41, and then connecting the back electrode 20 to the constant potential. The auxiliary electrode end of the meter 41.

本發明之優點在於使用緻密層以抑制染料敏化太陽能電池逆反應的發生,進而達到提升染料敏化太陽能電池的轉換效率之功效。The invention has the advantages of using a dense layer to suppress the occurrence of a reverse reaction of the dye-sensitized solar cell, thereby achieving the effect of improving the conversion efficiency of the dye-sensitized solar cell.

以下揭示本發明之較佳實施例。Preferred embodiments of the invention are disclosed below.

【實施例1】[Example 1] 1. 緻密層修飾半導體電極之製備1. Preparation of dense layer modified semiconductor electrode

取一氧化銦錫(Indium tin oxide,ITO)玻璃基板,依序以丙酮、乙醇、去離子水於超音波震盪器中,各自清洗10分鐘。再以氮氣槍使其乾燥,並置於100℃烤箱內20分鐘,蒸發氧化銦錫玻璃基板內含之水份。An indium tin oxide (ITO) glass substrate was taken, and sequentially washed with acetone, ethanol, and deionized water in an ultrasonic oscillator for 10 minutes. It was again dried with a nitrogen gun and placed in an oven at 100 ° C for 20 minutes to evaporate the water contained in the indium tin oxide glass substrate.

接著,使用射頻濺鍍法形成氧化鋅(ZnO)緻密層於氧化銦錫玻璃基板上,其中將ZnO靶材置於R. F.輸出,功率為50 W,製程壓力約為30 mTorr,氬氣(Ar)流量為40 sccm,濺鍍時間為4分鐘。Next, a zinc oxide (ZnO) dense layer is formed on the indium tin oxide glass substrate by RF sputtering, wherein the ZnO target is placed at an RF output with a power of 50 W, a process pressure of about 30 mTorr, and argon (Ar). The flow rate is 40 sccm and the sputtering time is 4 minutes.

形成氧化鋅緻密層於ITO玻璃基板上後,形成多孔性半導體層於氧化鋅緻密層上。多孔性半導體層之一形成方法包括下列步驟:(a)混合3克二氧化鈦粉末、0.1 mL 0.2 M的乙基乙酰丙酮分散劑,0.1mL 0.03 M Triton X-100介面活性劑及5 mL去離子水溶劑,以得到一二氧化鈦塗佈膠體;(b)將上述塗佈膠體均勻塗佈於緻密層上;(c)於退火爐內於450℃進行退火,即可完成一多孔性半導體層。After forming a dense layer of zinc oxide on the ITO glass substrate, a porous semiconductor layer is formed on the zinc oxide dense layer. One method of forming the porous semiconductor layer includes the following steps: (a) mixing 3 grams of titanium dioxide powder, 0.1 mL of 0.2 M ethyl acetylacetone dispersant, 0.1 mL of 0.03 M Triton X-100 surfactant, and 5 mL of deionized water. Solvent to obtain a titania coating colloid; (b) uniformly coating the coating colloid on the dense layer; (c) annealing at 450 ° C in an annealing furnace to complete a porous semiconductor layer.

2. 染料之製備2. Preparation of dyes

取一N3染料(Ruthenium-535,N3)溶於99.8%無水酒精形成一染料溶液,其濃度為3×10-4 M,並以超音波振盪染料溶液15分鐘。A N3 dye (Ruthenium-535, N3) was dissolved in 99.8% absolute alcohol to form a dye solution having a concentration of 3 × 10 -4 M, and the dye solution was ultrasonically shaken for 15 minutes.

3. 電解質之製備3. Preparation of electrolyte

取一碘化鈉(NaI),以碳酸丙烯酯(PC)為溶劑,混合後之濃度為0.5M。Sodium monoiodide (NaI) was taken, and propylene carbonate (PC) was used as a solvent, and the concentration was 0.5 M after mixing.

取一碘(I2 ),以碳酸丙烯酯(PC)為溶劑,混合後之濃度為0.05M。Iodine (I 2 ) was taken, and propylene carbonate (PC) was used as a solvent, and the concentration was 0.05 M after mixing.

取一4-叔丁基吡啶(TBP),以碳酸丙烯酯(PC)為溶劑,混合後之濃度為0.5M。A 4-tert-butylpyridine (TBP) was taken, and propylene carbonate (PC) was used as a solvent, and the concentration was 0.5 M after mixing.

混合上述三種溶液後,以超音波振盪5分鐘,即可完成電解質之製備。After mixing the above three solutions, the electrolyte was prepared by ultrasonic vibration for 5 minutes.

4. 輔助電極之製備4. Preparation of auxiliary electrode

取一氧化銦錫玻璃基板,將鉑金屬濺鍍其上,形成一輔助電極。An indium tin oxide glass substrate is taken, and platinum metal is sputtered thereon to form an auxiliary electrode.

5. 染料敏化太陽能之製備及封裝5. Preparation and packaging of dye-sensitized solar energy

取上述緻密層修飾半導體電極置於上述染料中,並置放於75℃,1小時。The dense layer-modified semiconductor electrode was placed in the above dye and placed at 75 ° C for 1 hour.

以熱塑膜封裝上述緻密層修飾半導體電極及輔助電極,其中熱塑膜之材質為DuPontTM Surlyn1706,接著注入電解質,即完成染料敏化太陽能電池之製備及封裝。The above-mentioned dense layer-modified semiconductor electrode and auxiliary electrode are encapsulated by a thermoplastic film, wherein the thermoplastic film is made of DuPont TM Surlyn 1706, followed by injection of the electrolyte, that is, preparation and packaging of the dye-sensitized solar cell.

【實施例2】[Example 2] 1. 緻密層修飾半導體電極之製備1. Preparation of dense layer modified semiconductor electrode

取一氧化銦錫(ITO)玻璃基板,依序以丙酮、乙醇、去離子水於超音波震盪器中,各自清洗10分鐘,再以氮氣槍使其乾燥,並置於100℃烤箱內20分鐘,蒸發ITO玻璃基板內含之水份。An indium tin oxide (ITO) glass substrate was sequentially placed in an ultrasonic oscillator with acetone, ethanol, and deionized water, and each was washed for 10 minutes, dried with a nitrogen gun, and placed in an oven at 100 ° C for 20 minutes. The water contained in the ITO glass substrate is evaporated.

接著,使用射頻共濺鍍法形成釕摻雜二氧化鈦(TiO2 )緻密層於洗淨之ITO玻璃基板上,其中將TiO2 靶材置於R. F.輸出、釕靶材置於D.C.輸出,將R.F.功率設定為100 W、DC功率為2 W,製程壓力約為30 mTorr,氬氣(Ar)流量為40 sccm,濺鍍時間為2分鐘。Next, a cesium-doped titanium dioxide (TiO 2 ) dense layer is formed on the cleaned ITO glass substrate by RF co-sputtering, wherein the TiO 2 target is placed in the RF output, the bismuth target is placed in the DC output, and the RF power is applied. Set to 100 W, DC power is 2 W, process pressure is approximately 30 mTorr, argon (Ar) flow is 40 sccm, and sputtering time is 2 minutes.

形成釕摻雜二氧化鈦緻密層於ITO玻璃基板上後,形成多孔性半導體層於釕摻雜二氧化鈦緻密層上。多孔性半導體層之形成方法包括下列步驟:(a)混合3克二氧化鈦粉末、0.1 mL 0.2 M乙基乙酰丙酮分散劑、0.1 mL 0.03 M Triton X-100介面活性劑與5 mL去離子水溶劑,以得到一二氧化鈦塗佈膠體;(b)將上述塗佈膠體均勻塗佈於緻密層上;(c)於退火爐內於450℃進行退火,即可完成一多孔性半導體層。After forming a tantalum-doped titanium dioxide dense layer on the ITO glass substrate, a porous semiconductor layer is formed on the tantalum-doped titanium dioxide dense layer. The method for forming a porous semiconductor layer comprises the steps of: (a) mixing 3 grams of titanium dioxide powder, 0.1 mL of 0.2 M ethyl acetylacetone dispersant, 0.1 mL of 0.03 M Triton X-100 surfactant, and 5 mL of deionized water solvent. To obtain a titania coating colloid; (b) uniformly coating the coating colloid on the dense layer; (c) annealing at 450 ° C in an annealing furnace to complete a porous semiconductor layer.

2. 染料之製備2. Preparation of dyes

取一N3染料溶於99.8%無水酒精以形成一染料溶液,其濃度為3x10-4 M,並以超音波振盪染料溶液15分鐘。A N3 dye was dissolved in 99.8% absolute alcohol to form a dye solution having a concentration of 3 x 10 -4 M, and the dye solution was ultrasonically shaken for 15 minutes.

3. 電解質之製備3. Preparation of electrolyte

取一碘化鋰(LiI),以3-甲氧基丙腈(MPN)為溶劑,混合後之濃度為0.5M。Lithium iodide (LiI) was taken, and 3-methoxypropionitrile (MPN) was used as a solvent, and the concentration was 0.5 M after mixing.

取一碘化1-丙基-2,3-二甲基咪唑(DMPII),以MPN為溶劑,混合後之濃度為0.6M。1-propyl-2,3-dimethylimidazolium chloride (DMPII) was taken, and MPN was used as a solvent, and the concentration was 0.6 M after mixing.

取一碘(I2 ),以MPN為溶劑,混合後之濃度為0.05M。Iodine (I 2 ) was taken, and MPN was used as a solvent, and the concentration after mixing was 0.05 M.

取一4-叔丁基吡啶(TBP),以MPN為溶劑,混合後之濃度為0.5M。A 4-tert-butylpyridine (TBP) was taken, and MPN was used as a solvent, and the concentration was 0.5 M after mixing.

混合上述四種溶液後,以超音波振盪5分鐘,即可完成電解質之製備。After mixing the above four solutions, the electrolyte was prepared by ultrasonic vibration for 5 minutes.

4. 輔助電極之製備4. Preparation of auxiliary electrode

取一氧化銦錫玻璃基板,將鉑金屬濺鍍其上,形成一輔助電極。An indium tin oxide glass substrate is taken, and platinum metal is sputtered thereon to form an auxiliary electrode.

5. 染料敏化太陽能元件之製備及封裝5. Preparation and packaging of dye-sensitized solar components

取上述緻密層修飾半導體電極置於上述染料中,並置放於75℃,1小時。The dense layer-modified semiconductor electrode was placed in the above dye and placed at 75 ° C for 1 hour.

以熱塑膜封裝上述緻密層修飾半導體電極及輔助電極,其中熱塑膜之材質為DuPontTM Surlyn1706,接著注入電解質,即完成染料敏化太陽能電池之製備及封裝。The above-mentioned dense layer-modified semiconductor electrode and auxiliary electrode are encapsulated by a thermoplastic film, wherein the thermoplastic film is made of DuPont TM Surlyn 1706, followed by injection of the electrolyte, that is, preparation and packaging of the dye-sensitized solar cell.

【實施例3】[Example 3] 1. 緻密層修飾半導體電極Tight layer modified semiconductor electrode

取一氧化氟錫(FTO)玻璃基板,依序以丙酮、乙醇、去離子水於超音波震盪器中,各自清洗10分鐘。再以氮氣槍使其乾燥,並置於100℃烤箱內20分鐘,蒸發FTO玻璃基板內含之水份。A tin oxyfluoride (FTO) glass substrate was taken, and sequentially washed with acetone, ethanol, and deionized water in an ultrasonic oscillator for 10 minutes. It was again dried with a nitrogen gun and placed in an oven at 100 ° C for 20 minutes to evaporate the water contained in the FTO glass substrate.

接著,使用射頻濺鍍法形成二氧化鈦(TiO2 )緻密層於FTO/玻璃基板上,其中將TiO2 靶材置於R.F.輸出,R.F.功率為100 W,製程壓力約為30 mTorr,氬氣(Ar)流量為40 sccm,濺鍍時間為80分鐘。Next, a titanium dioxide (TiO 2 ) dense layer was formed on the FTO/glass substrate by RF sputtering, wherein the TiO 2 target was placed at the RF output with an RF power of 100 W, a process pressure of about 30 mTorr, and argon (Ar). The flow rate is 40 sccm and the sputtering time is 80 minutes.

形成二氧化鈦緻密層於FTO玻璃基板上之後,形成多孔性半導體層於二氧化鈦緻密層上。多孔性半導體層之形成包括下列步驟:(a)混合3克二氧化鈦粉末、0.1 mL 0.2 M乙基乙酰丙酮分散劑、0.1mL 0.03 M Triton X-100介面活性劑與5 mL去離子水溶劑,以得到一二氧化鈦塗佈膠體;(b)將上述塗佈膠體均勻塗佈於緻密層上;(c)於退火爐內於450℃進行退火,即可完成一多孔性半導體層。After the titanium dioxide dense layer is formed on the FTO glass substrate, a porous semiconductor layer is formed on the titanium dioxide dense layer. The formation of the porous semiconductor layer comprises the steps of: (a) mixing 3 grams of titanium dioxide powder, 0.1 mL of 0.2 M ethyl acetylacetone dispersant, 0.1 mL of 0.03 M Triton X-100 surfactant, and 5 mL of deionized water solvent. A titania coating colloid is obtained; (b) the coating colloid is uniformly applied to the dense layer; and (c) annealing is performed at 450 ° C in an annealing furnace to complete a porous semiconductor layer.

2. 染料之製備2. Preparation of dyes

取一N3染料溶於99.8%無水酒精,並以超音波振盪15分鐘,其濃度為3x10-4 M。A N3 dye was dissolved in 99.8% absolute alcohol and vortexed by ultrasonic for 15 minutes at a concentration of 3 x 10 -4 M.

3. 電解質之製備3. Preparation of electrolyte

取一碘化鋰(LiI),以3-甲氧基丙腈(MPN)為溶劑,混合後之濃度為0.5M。Lithium iodide (LiI) was taken, and 3-methoxypropionitrile (MPN) was used as a solvent, and the concentration was 0.5 M after mixing.

取一碘化1-丙基-2,3-二甲基咪唑(DMPII),以MPN為溶劑,混合後之濃度為0.6M。1-propyl-2,3-dimethylimidazolium chloride (DMPII) was taken, and MPN was used as a solvent, and the concentration was 0.6 M after mixing.

取一碘(I2 ),以MPN為溶劑,混合後之濃度為0.05M。Iodine (I 2 ) was taken, and MPN was used as a solvent, and the concentration after mixing was 0.05 M.

取一4-叔丁基吡啶(TBP),以MPN為溶劑,混合後之濃度為0.5M。A 4-tert-butylpyridine (TBP) was taken, and MPN was used as a solvent, and the concentration was 0.5 M after mixing.

混合上述四種溶液後,以超音波振盪5分鐘,即可完成電解質之製備。After mixing the above four solutions, the electrolyte was prepared by ultrasonic vibration for 5 minutes.

4. 輔助電極之製備4. Preparation of auxiliary electrode

取一氧化氟錫玻璃基板,將鉑金屬濺鍍其上,形成輔助電極。A tin oxyfluoride glass substrate is obtained, and platinum metal is sputtered thereon to form an auxiliary electrode.

5. 染料敏化太陽能之製備及封裝5. Preparation and packaging of dye-sensitized solar energy

取上述緻密層修飾半導體電極置於上述染料中,並置放於75℃,1小時。The dense layer-modified semiconductor electrode was placed in the above dye and placed at 75 ° C for 1 hour.

以熱塑膜封裝上述緻密層修飾半導體電極及輔助電極,其中熱塑膜之材質為DuPontTM Surlyn1706,接著注入電解質,即完成染料敏化太陽能電池之製備及封裝。The above-mentioned dense layer-modified semiconductor electrode and auxiliary electrode are encapsulated by a thermoplastic film, wherein the thermoplastic film is made of DuPont TM Surlyn 1706, followed by injection of the electrolyte, that is, preparation and packaging of the dye-sensitized solar cell.

【實施例4】[Embodiment 4] 1. 染料敏化太陽能電池之電化學分析裝置1. Electrochemical analysis device for dye-sensitized solar cell

提供一染料敏化太陽能電池,其中緻密層修飾半導體電極為工作電極。接著,將染料敏化太陽能電池的工作電極連接於恆電位儀之工作電極端(Working electrode,WE )及參考電極端(Reference electrode,RE ),並將輔助電極連接於恆電位儀之輔助電極端(Counter electrode,CE )。恆電位儀所量得之數據藉由電腦輸出。A dye-sensitized solar cell is provided wherein the dense layer-modified semiconductor electrode is a working electrode. Next, the working electrode of the dye-sensitized solar cell is connected to the working electrode (W E ) and the reference electrode end (R E ) of the potentiostat, and the auxiliary electrode is connected to the auxiliary of the potentiostat. Counter electrode (C E ). The data measured by the potentiostat is output by the computer.

2. 恆電位儀參數設定2. Potentiostat parameter setting

恆電位儀所使用之頻率為10Hz至100kHz、電位則係染料敏化太陽能電池之開路電壓(Voc )。使用此參數進行電化學分析可得染料敏化太陽能電池之交流阻抗圖譜(Nyquist plot)。The potentiostat uses a frequency of 10 Hz to 100 kHz, and the potential is the open circuit voltage (V oc ) of the dye-sensitized solar cell. Using this parameter for electrochemical analysis, a Nyquist plot of the dye-sensitized solar cell can be obtained.

3. 交流阻抗圖譜(Nyquist diagram)3. AC impedance map (Nyquist diagram)

為確保可藉由DuPontTM Surlyn1706熱塑膜封裝電極以控制電解液含量,量測三種分別具有ZnO、TiO2 :Ru(釕金屬摻雜二氧化鈦)及TiO2 緻密層的染料敏化太陽能電池(DSSC)的交流阻抗,其量測圖譜如第5圖所示。在第5圖中,Rs 為第5圖中半圓左方與ZRe 軸相交的點,而根據於T. V. Nguyen,H. C. Lee,O. B. Yang,“The Effect of Pre-thermal Treatment of TiO2 Nano-particles on the Performances of Dye-sensitized Solar Cells,”Solar Energy Materials & Solar Cells,vol. 90,pp. 967-981,2006,Rs 為DSSC中電解質的電阻。第5圖中半圓右方與ZRe 軸相交的點為Rs +Rct ,而根據於N. Fuke,A. Fukui,A. Islam,R. Komiya,R. Yamanaka,H. Harima,L. Han,“Influence of TiO2/electrode Interface on Electron Transport Properties in Back Contact Dye-sensitized Solar Cells,”Solar Energy Materials & Solar Cells,vol. 93,pp. 720-724,2009,Rct 反映出TiO2 /電極之間的界面。To ensure that it can be used by DuPont TM Surlyn 1706 thermoplastic film encapsulation electrode to control the electrolyte content, measuring the AC impedance of three dye-sensitized solar cells (DSSC) with ZnO, TiO 2 :Ru (cerium-doped titanium dioxide) and TiO 2 dense layer, the amount The map is shown in Figure 5. In Fig. 5, R s is the point at the left of the semicircle in Fig. 5 that intersects the Z Re axis, and according to TV Nguyen, HC Lee, OB Yang, "The Effect of Pre-thermal Treatment of TiO 2 Nano-particles on the Performances of Dye-sensitized Solar Cells, "Solar Energy Materials & Solar Cells, vol. 90, pp. 967-981,2006, R s is the resistance of the electrolyte in DSSC. In Fig. 5, the point where the right circle of the semicircle intersects with the Z Re axis is R s + R ct , and according to N. Fuke, A. Fukui, A. Islam, R. Komiya, R. Yamanaka, H. Harima, L. Han, "Influence of TiO2/electrode Interface on Electron Transport Properties in Back Contact Dye-sensitized Solar Cells," Solar Energy Materials & Solar Cells, vol. 93, pp. 720-724, 2009, R ct reflects TiO 2 /electrode The interface between.

第5圖可知,三者DSSC之串聯電阻Rs 皆相同,代表於電解液之含量於不同DSSC時皆固定,因此可證明於封裝時使用DuPontTM Surlyn1706控制電解液含量係一可信賴之方法。使用TiO2 緻密層之DSSC,其電荷轉移阻抗(Charge transfer resistance,Rct )小於ZnO及TiO2 :Ru,此係由於TiO2 緻密層之導電帶低於TiO2 多孔層之導電帶,故電子於傳遞時較為平順,並可得較高之光電轉換效率。而使用ZnO緻密層之Rct 較大的原因,主要係ZnO與TiO2 膠體產生反應,使得其ZnO/TiO2 介面間之缺陷增加,造成電子傳輸不易導致Rct 升高。另一方面,TiO2 :Ru緻密層不會與TiO2 膠體產生反應,但由於其導電帶高於TiO2 多孔層,因此Rct 較TiO2 緻密層高。As can be seen from Fig. 5, the series resistances R s of the three DSSCs are the same, which means that the content of the electrolyte is fixed at different DSSCs, so it can be proved that DuPont TM Surlyn is used for packaging. 1706 Controlling electrolyte content is a reliable method. A DSSC using the dense layer of TiO 2, which charge transfer resistance (Charge transfer resistance, R ct) less than ZnO and TiO 2: Ru, this is due to the conduction band of TiO 2 is lower than a dense layer with a conductive porous layer of TiO 2, so that the electronic It is smoother when delivered, and can achieve higher photoelectric conversion efficiency. The reason why the R ct of the dense layer of ZnO is large is mainly due to the reaction between ZnO and TiO 2 colloid, so that the defects between the ZnO/TiO 2 interface are increased, and the electron transport is not easy to cause R ct to rise. On the other hand, the TiO 2 :Ru dense layer does not react with the TiO 2 colloid, but since its conductive band is higher than the TiO 2 porous layer, R ct is higher than the TiO 2 dense layer.

【比較例1】[Comparative Example 1]

比較例1之製備方式類似於實施例1,其差別是在於比較例1在形成工作電極時,並無應用氧化鋅緻密層於ITO基板上,即係比較例1中之工作電極不包括氧化鋅緻密層。The preparation method of Comparative Example 1 was similar to that of Example 1, except that Comparative Example 1 did not apply a zinc oxide dense layer on the ITO substrate when forming the working electrode, that is, the working electrode in Comparative Example 1 did not include zinc oxide. Tight layer.

【比較例2】[Comparative Example 2]

比較例2之製備方式類似於實施例2,其差別是在於比較例2在製備工作電極時,並無應用釕摻雜二氧化鈦緻密層於ITO基板上,即係比較例2中之工作電極不包括釕摻雜二氧化鈦緻密層。The preparation method of Comparative Example 2 is similar to that of Example 2, except that in Comparative Example 2, when the working electrode was prepared, the tantalum-doped titanium dioxide dense layer was not applied to the ITO substrate, that is, the working electrode in Comparative Example 2 was not included. The cerium is doped with a dense layer of titanium dioxide.

【比較例3】[Comparative Example 3]

比較例3之製備方式類似於實施例3,其差別是在於比較例3在製備工作電極時,並無應用二氧化鈦緻密層於FTO基板上,即係比較例3中之工作電極不包括二氧化鈦緻密層。Comparative Example 3 was prepared in a manner similar to that in Example 3, except that Comparative Example 3 did not apply a titanium dioxide dense layer to the FTO substrate when preparing the working electrode, that is, the working electrode in Comparative Example 3 did not include the titanium dioxide dense layer. .

上述電池之各項功能數據如表一所示:The function data of the above battery is shown in Table 1:

表一中Jsc ,Voc ,FF,η依序分別為短路電流密度(Short-circuit current),開路電壓(Open-circuit voltage),填充因子(Fill factor)以及光電轉換效率(Photoelectric conversion efficiency)。由表一可得知,實施例1、實施例2及實施例3與之電流密度及光電轉換效率皆分別大於比較例1、比較例2及比較例3的電流密度及光電轉換效率,其中使用氧化鋅緻密層可使轉換效率由1.2%(比較例1)提升至1.48%(實施例1),使用釕摻雜二氧化鈦緻密層可使轉換效率由1.98%(比較例2)提升至2.44%(實施例2),而使用二氧化鈦緻密層可使轉換效率由4.01%(比較例3)提升至5.11%(實施例3)。由於本發明之實施例1、2、3分別相對於比較例1、2、3之差別僅在於緻密層的存在,由此可知本發明之實施例1、2、3之較高的電流密度及光電轉換效率應是由緻密層所致。因此,本發明之製備方法所製得的緻密層可有效提升染料敏化太陽能電池之效率。In Table 1, J sc , V oc , FF and η are respectively short-circuit current, open-circuit voltage, fill factor and Photoelectric conversion efficiency. . As can be seen from Table 1, the current density and photoelectric conversion efficiency of Example 1, Example 2 and Example 3 are respectively greater than those of Comparative Example 1, Comparative Example 2 and Comparative Example 3, wherein The zinc oxide dense layer can increase the conversion efficiency from 1.2% (Comparative Example 1) to 1.48% (Example 1). The use of yttrium-doped titanium dioxide dense layer can increase the conversion efficiency from 1.98% (Comparative Example 2) to 2.44% ( Example 2), while using a titanium dioxide dense layer, the conversion efficiency was increased from 4.01% (Comparative Example 3) to 5.11% (Example 3). Since the first, second, and third embodiments of the present invention differ from the comparative examples 1, 2, and 3, respectively, only in the presence of the dense layer, it is understood that the higher current densities of the embodiments 1, 2, and 3 of the present invention are The photoelectric conversion efficiency should be caused by a dense layer. Therefore, the dense layer produced by the preparation method of the present invention can effectively improve the efficiency of the dye-sensitized solar cell.

雖然本發明已以數個較佳實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作任意之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。While the invention has been described above in terms of several preferred embodiments, it is not intended to limit the scope of the present invention, and any one of ordinary skill in the art can make any changes without departing from the spirit and scope of the invention. And the scope of the present invention is defined by the scope of the appended claims.

10‧‧‧緻密層修飾半導體電極10‧‧‧Dense layer modified semiconductor electrode

11‧‧‧透明導電基板11‧‧‧Transparent conductive substrate

12‧‧‧緻密層12‧‧‧Dense layer

13‧‧‧多孔性半導體層13‧‧‧Porous semiconductor layer

14‧‧‧染料14‧‧‧Dyes

20‧‧‧輔助電極20‧‧‧Auxiliary electrode

21‧‧‧透明導電基板21‧‧‧Transparent conductive substrate

22‧‧‧催化層22‧‧‧ Catalytic layer

30‧‧‧染料敏化太陽能電池30‧‧‧Dye-sensitized solar cells

31‧‧‧電解液31‧‧‧ electrolyte

40‧‧‧電化學分析裝置40‧‧‧Electrochemical analysis device

41‧‧‧恆電位儀41‧‧‧potentiostat

42‧‧‧電腦42‧‧‧ computer

第1圖係顯示本發明之實施例中一染料敏化太陽能電池。Fig. 1 is a view showing a dye-sensitized solar cell in an embodiment of the present invention.

第2圖係顯示本發明之實施例中一緻密層修飾半導體電極。Figure 2 is a diagram showing a uniform dense layer modified semiconductor electrode in an embodiment of the present invention.

第3圖係顯示本發明之實施例中一輔助電極。Figure 3 is a view showing an auxiliary electrode in an embodiment of the present invention.

第4圖係顯示本發明之實施例中一染料敏化太陽能電池之電化學分析裝置。Fig. 4 is a view showing an electrochemical analysis apparatus for a dye-sensitized solar cell in an embodiment of the present invention.

第5圖係顯示三種分別具有ZnO、TiO2 :Ru(釕金屬摻雜二氧化鈦)及TiO2 緻密層的染料敏化太陽能電池(DSSC)的交流阻抗圖譜。Figure 5 shows the AC impedance spectra of three dye-sensitized solar cells (DSSC) with ZnO, TiO 2 :Ru (germanium-doped titanium dioxide) and TiO 2 dense layers, respectively.

10...緻密層修飾半導體電極10. . . Dense layer modified semiconductor electrode

11...透明導電基板11. . . Transparent conductive substrate

12...緻密層12. . . Dense layer

13...多孔性半導體層13. . . Porous semiconductor layer

14...染料14. . . dye

Claims (20)

一種染料敏化太陽能電池,包括:一緻密層修飾半導體電極,包括:一透明導電基板;一緻密層,形成於該透明導電基板上,其中該緻密層包括釕金屬摻雜二氧化鈦;一多孔性半導體層,形成於該緻密層上;及一染料,形成於該多孔性半導體層上;一電解液,形成於該緻密層修飾半導體電極上;及一輔助電極,形成於該電解液上。 A dye-sensitized solar cell comprising: a uniform dense layer modified semiconductor electrode comprising: a transparent conductive substrate; a uniform dense layer formed on the transparent conductive substrate, wherein the dense layer comprises a base metal doped titanium dioxide; a porosity a semiconductor layer formed on the dense layer; and a dye formed on the porous semiconductor layer; an electrolyte formed on the dense layer modified semiconductor electrode; and an auxiliary electrode formed on the electrolyte. 如申請專利範圍第1項所述之染料敏化太陽能電池,其中該透明導電基板包括氧化銦錫玻璃基板、氧化氟錫玻璃基板或氧化銦錫可撓式基板。 The dye-sensitized solar cell of claim 1, wherein the transparent conductive substrate comprises an indium tin oxide glass substrate, an oxyfluoride glass substrate or an indium tin oxide flexible substrate. 如申請專利範圍第1項所述之染料敏化太陽能電池,其中該多孔性半導體層包括二氧化鈦或氧化鋅。 The dye-sensitized solar cell of claim 1, wherein the porous semiconductor layer comprises titanium dioxide or zinc oxide. 如申請專利範圍第1項所述之染料敏化太陽能電池,其中該染料為一可吸收光而激發電子之有機釕金屬錯合物粉末。 The dye-sensitized solar cell according to claim 1, wherein the dye is an organic ruthenium metal complex powder capable of absorbing electrons and absorbing electrons. 如申請專利範圍第4項所述之染料敏化太陽能電池,其中該染料包括N3(Ruthenium-535)、N719或黑染料(Black dye)。 The dye-sensitized solar cell of claim 4, wherein the dye comprises N3 (Ruthenium-535), N719 or Black dye. 如申請專利範圍第1項所述之染料敏化太陽能電池,其中該電解液包括一氧化還原電對、一添加劑及一溶劑。 The dye-sensitized solar cell of claim 1, wherein the electrolyte comprises a redox couple, an additive, and a solvent. 如申請專利範圍第6項所述之染料敏化太陽能電池,其中該氧化還原電對為I- /I3 - ,該溶劑為乙腈、3-甲氧基丙腈、碳酸丙烯酯或上述任意組合。The dye-sensitized solar cell of claim 6, wherein the redox couple is I - /I 3 - , the solvent is acetonitrile, 3-methoxypropionitrile, propylene carbonate or any combination thereof . 如申請專利範圍第6項所述之染料敏化太陽能電池,其中該添加劑包括碘化鈉、碘化鋰、4-叔丁基吡啶碘、碘1-丙基-2,3-二甲基咪唑或上述任意組合。 The dye-sensitized solar cell of claim 6, wherein the additive comprises sodium iodide, lithium iodide, 4-tert-butylpyridine iodide, and 1-propyl-2,3-dimethylimidazolium iodide. Or any combination of the above. 如申請專利範圍第1項所述之染料敏化太陽能電池,其中該輔助電極包括一催化層,形成於另一透明導電基板上,且該催化層具有可催化電解液氧化還原反應之材料。 The dye-sensitized solar cell of claim 1, wherein the auxiliary electrode comprises a catalytic layer formed on another transparent conductive substrate, and the catalytic layer has a material capable of catalyzing a redox reaction of the electrolyte. 如申請專利範圍第1項所述之染料敏化太陽能電池,其中該催化層的材質包括鉑金屬、碳或鎳金屬。 The dye-sensitized solar cell of claim 1, wherein the material of the catalytic layer comprises platinum metal, carbon or nickel metal. 一種染料敏化太陽能電池製造方法,其步驟包括:提供一透明導電基板;形成一緻密層於該透明導電基板上,其中該緻密層包括釕金屬摻雜二氧化鈦;形成一多孔性半導體層於該緻密層上;及形成一染料於該多孔性半導體層上,其中該透明導電基板、該緻密層、該多孔性半導體層及該染料構成一緻密層修飾半導體電極;形成一電解液於該緻密層修飾半導體電極上;及形成一輔助電極於該電解液上。 A method for fabricating a dye-sensitized solar cell, comprising the steps of: providing a transparent conductive substrate; forming a uniform dense layer on the transparent conductive substrate, wherein the dense layer comprises a base metal doped titanium dioxide; forming a porous semiconductor layer thereon Forming a dye on the porous semiconductor layer, wherein the transparent conductive substrate, the dense layer, the porous semiconductor layer and the dye constitute a uniform dense layer modified semiconductor electrode; forming an electrolyte in the dense layer Modifying the semiconductor electrode; and forming an auxiliary electrode on the electrolyte. 如申請專利範圍第11項所述之染料敏化太陽能電池製造方法,其中該電解液之形成包括:(a)混合一氧化還原電對、一添加劑以及一溶劑,以 得到一混合溶液;及(b)以超音波振盪器攪拌該混合溶液以形成該電解液。 The method for producing a dye-sensitized solar cell according to claim 11, wherein the forming of the electrolyte comprises: (a) mixing a redox couple, an additive, and a solvent to A mixed solution is obtained; and (b) the mixed solution is stirred with an ultrasonic oscillator to form the electrolyte. 如申請專利範圍第11項所述之染料敏化太陽能電池製造方法,其中該緻密層藉由射頻濺鍍法形成於該透明導電基板上。 The method for fabricating a dye-sensitized solar cell according to claim 11, wherein the dense layer is formed on the transparent conductive substrate by radio frequency sputtering. 如申請專利範圍第11項所述之染料敏化太陽能電池製造方法,其中該多孔性半導體層藉由旋轉塗佈法、棒狀塗佈法或刮刀塗佈法形成於該緻密層上。 The method for producing a dye-sensitized solar cell according to claim 11, wherein the porous semiconductor layer is formed on the dense layer by a spin coating method, a bar coating method, or a knife coating method. 如申請專利範圍第11項所述之染料敏化太陽能電池製造方法,其中該多孔性半導體層之形成包括下列步驟:(a)混合半導體粉末、分散劑、界面活性劑與溶劑,以得到一半導體塗佈膠體;(b)將上述之塗佈膠體均勻塗佈於該緻密層上;及(c)於退火爐內於定溫下進行退火。 The method for producing a dye-sensitized solar cell according to claim 11, wherein the forming of the porous semiconductor layer comprises the steps of: (a) mixing a semiconductor powder, a dispersant, a surfactant, and a solvent to obtain a semiconductor. Coating the colloid; (b) uniformly coating the above-mentioned coating colloid on the dense layer; and (c) annealing in a annealing furnace at a constant temperature. 如申請專利範圍第11項所述之染料敏化太陽能電池製造方法,其中該染料藉由浸泡法吸附於該多孔性半導體層上。 The method for producing a dye-sensitized solar cell according to claim 11, wherein the dye is adsorbed on the porous semiconductor layer by a dipping method. 如申請專利範圍第11項所述之染料敏化太陽能電池製造方法,其中該輔助電極的形成包括:提供一透明導電基板;及以射頻濺鍍法形成一催化層於該透明導電基板上。 The method for manufacturing a dye-sensitized solar cell according to claim 11, wherein the forming of the auxiliary electrode comprises: providing a transparent conductive substrate; and forming a catalytic layer on the transparent conductive substrate by radio frequency sputtering. 一種染料敏化太陽能電池之電化學分析裝置,其包括:一恆電位儀; 一如申請專利範圍第1項所述之染料敏化太陽能電池,連接至該恆電位儀;及一電腦,連接至該恆電位儀。 An electrochemical analysis device for a dye-sensitized solar cell, comprising: a potentiostat; A dye-sensitized solar cell as described in claim 1 is connected to the potentiostat; and a computer connected to the potentiostat. 如申請專利範圍第18項所述之染料敏化太陽能電池之電化學分析裝置,其中該染料敏化太陽能電池之該緻密層修飾半導體電極連接於該恆電位儀之一工作電極端及一參考電極端,且該染料敏化太陽能電池之該輔助電極連接於該恆電位儀之一輔助電極端。 The electrochemical analysis device for a dye-sensitized solar cell according to claim 18, wherein the dense layer modified semiconductor electrode of the dye-sensitized solar cell is connected to one of the working electrode terminals of the potentiostat and a reference electrode Extremely, and the auxiliary electrode of the dye-sensitized solar cell is connected to one of the auxiliary electrode terminals of the potentiostat. 如申請專利範圍第18項所述之染料敏化太陽能電池之電化學分析裝置,其中該恆電位儀之操作頻率為10Hz至100kHz、操作電位為該染料敏化太陽能電池之開路電壓。 The electrochemical analysis device for a dye-sensitized solar cell according to claim 18, wherein the potentiostat has an operating frequency of 10 Hz to 100 kHz and an operating potential of an open circuit voltage of the dye-sensitized solar cell.
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